Exhaust device with built-in PECVD (plasma enhanced chemical vapor deposition) reaction box
By setting a closed reaction zone and surrounding exhaust port in the PECVD reaction box, the gas uniformity problem caused by the change in the workpiece size is solved, the stability of coating and gas uniformity is achieved, and the coating inhomogeneity is reduced.
Patent Information
- Application Number
- CN202420818364.X
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-04-19
- Publication Date
- 2024-12-31
- Estimated Expiration
- 2034-04-19
AI Technical Summary
After the workpiece size increases, the process gas uniformity is difficult to ensure, resulting in the problem of coating unevenness.
An exhaust device with built-in PECVD reaction box is designed. By setting a spray electrode and a ground electrode in the vacuum chamber, a closed reaction zone is formed, and an exhaust port is arranged around the edge of the coating temperature zone on the ground electrode, and heating plasma is used. The gas flow field is compensated for temperature to ensure gas uniformity and control the uniformity of process gas through the exhaust passages in the split reaction zone.
Under the change of workpiece size, the uniformity of the temperature of the coating temperature zone and the plasma gas are achieved, the influence of coating inhomogeneity is reduced, and the uniformity of the coating and the uniform distribution of process gas are ensured.
Smart Images
Figure CN222274687U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of photovoltaics, in particular to an exhaust device with a built-in PECVD reaction box. Background Art
[0002] The PECVD deposition system widely used in industry at present is a vacuum electromagnetic system with a vacuum pressure of 10-500Pa. A pair of flat-plate electrodes are often used in the vacuum chamber to excite the plasma system. The process gas enters the reaction zone through the spray-shaped electrode, and the plasma is excited by the electrode to react on the workpiece substrate to form a thin film deposition or etching surface. After the reaction is completed, the process gas and the reaction gas are discharged from the reaction zone through the exhaust hole; the two electrode plates that excite the plasma are the grounded positive electrode and the excitation electrode (negative electrode) used to excite the plasma. Usually, a frequency of 13.56MHz (RF) and very high frequency 40MHz or 60MHz (VHF) are used to excite an RF or very high frequency impedance matcher connected to a power supply that provides plasma excitation power. In the industry, process gases enter the reaction zone mostly through porous spray electrodes, but open exhaust is mostly used for exhaust after the reaction.
[0003] The existing technology controls the uniformity of the gas by letting air into the spray channel of the spray electrode, which can ensure the initial uniformity of the coating in the early stage of the reaction. However, as the reaction proceeds, the gas uniformity is affected by the disturbance of the open exhaust, and as the size of the workpiece becomes larger, the uniformity of the gas becomes increasingly difficult to ensure. Summary of the invention
[0004] The utility model provides an exhaust device with a built-in PECVD reaction box, which solves the technical problems existing in the above-mentioned prior art.
[0005] According to one aspect of the utility model, there is provided an exhaust device with a built-in PECVD reaction box, characterized in that it comprises: a vacuum chamber and a plasma activation system, the vacuum chamber is composed of a vacuum chamber upper cover plate and a vacuum chamber main body, a spray electrode and a ground electrode are relatively arranged in the vacuum chamber, a spray electrode reaction box is connected above the spray electrode, an adjustable mechanism is arranged at the lower edge of the spray electrode reaction box, the ground electrode is connected to a lifting system below, the spray electrode reaction box, the ground electrode and the adjustable mechanism form a closed reaction zone, and at least one exhaust port is arranged inwardly at a certain interval at the edge of the coating temperature zone on the ground electrode.
[0006] Furthermore, the exhaust port is in the shape of a circle, an oblong hole, a rectangle, a square, a trapezoid or a cross, or a combination thereof.
[0007] Another object of the utility model is to provide an exhaust device with a built-in PECVD reaction box, characterized in that it includes: a vacuum chamber and a plasma activation system, the vacuum chamber is composed of a vacuum chamber upper cover plate and a vacuum chamber main body, a plurality of groups of spray electrodes and ground electrodes are relatively arranged in the vacuum chamber, a spray electrode reaction box is connected above the spray electrode, an adjustable mechanism is arranged at the lower edge of the spray electrode reaction box, the ground electrode is connected to the lifting system below, the spray electrode reaction box, the ground electrode and the adjustable mechanism form a plurality of closed reaction zones, and at least one exhaust port is arranged inwardly at a certain interval around the edge of the coating temperature zone on the ground electrode.
[0008] Furthermore, the exhaust port is in the shape of a circle, an oblong hole, a rectangle, a square, a trapezoid or a cross, or a combination thereof.
[0009] Furthermore, spray electrode / ground electrode pairs and exhaust ports with different coordinate distributions are arranged in the reaction zone.
[0010] It can be seen from the technical solution provided by the utility model that, by adopting the utility model, at least one exhaust port is arranged inwardly at a certain interval at the edge of the coating temperature zone on the ground electrode, and the temperature field generated by the flow field of the heated plasma gas is used to compensate the temperature of the edge of the temperature field. Since the fluid inlet usually adopts a spray structure, it does not affect the uniform distribution of the fluid in the coating temperature zone, so the temperature of the coating temperature zone and the uniformity of the plasma gas can be met at the same time. At the same time, the reaction zone is closed and divided into zones, and an exhaust channel is set at the edge of the divided reaction zone to control the uniformity of the process gas, so that it is not affected by changes in the size of the workpiece.
[0011] The above description is only an overview of the technology of the utility model. In order to more clearly understand the technical means of the utility model, it can be implemented according to the contents of the specification. In order to make the above and other purposes, features and advantages of the utility model more obvious and easy to understand, the specific implementation methods of the utility model are listed below. BRIEF DESCRIPTION OF THE DRAWINGS
[0012] By reading the detailed description of the preferred embodiment below, various other advantages and benefits will become clear to those of ordinary skill in the art. The accompanying drawings are only used for the purpose of illustrating the preferred embodiment and are not considered to be limitations of the present invention. In addition, the same reference symbols are used to represent the same components throughout the accompanying drawings.
[0013] Figure 1 It is a schematic diagram of the structure of the exhaust device of the built-in PECVD reaction box of the utility model.
[0014] Figure 2for Figure 1 Schematic diagram of the ground electrode and the exhaust channel thereon.
[0015] Figure 3 It is a schematic structural diagram of another embodiment of the exhaust device of the built-in PECVD reaction box of the utility model.
[0016] Figure 4 for Figure 3 Schematic diagram of the ground electrode and the exhaust channel thereon. DETAILED DESCRIPTION
[0017] The exemplary embodiments of the present invention will be described in more detail below with reference to the accompanying drawings. Although the exemplary embodiments of the present invention are shown in the accompanying drawings, it should be understood that the present invention can be implemented in various forms and should not be limited by the embodiments described herein. On the contrary, these embodiments are provided to enable a more thorough understanding of the present invention and to fully convey the scope of the present invention to those skilled in the art.
[0018] The exhaust device of a built-in PECVD reaction box provided by the utility model is described in detail below. The contents not described in detail in the embodiments of the utility model belong to the prior art known to professional and technical personnel in the field. If no specific conditions are specified in the embodiments of the utility model, the conventional conditions in the field or the conditions recommended by the manufacturer shall be followed.
[0019] See also Figure 1 and Figure 2 The utility model discloses an exhaust device for a built-in PECVD reaction box, comprising: a vacuum chamber and a plasma activation system, wherein the vacuum chamber is composed of a vacuum chamber upper cover plate and a vacuum chamber main body, wherein a spray electrode and a ground electrode are relatively arranged in the vacuum chamber, wherein a spray electrode reaction box is connected above the spray electrode, wherein an adjustable mechanism is arranged at the lower edge of the spray electrode reaction box, wherein the ground electrode is connected to a lifting system below, wherein the spray electrode reaction box, the ground electrode and the adjustable mechanism form a closed reaction zone, and wherein at least one exhaust port is arranged inwardly in a circle at a certain interval at the edge of the coating temperature zone on the ground electrode.
[0020] In a closed space, the setting of the gas outlet will affect the isobaric surface of the gas and the distribution of the gas. Therefore, a reasonable setting of the outlet position of the closed space will make the isobaric surface at the workpiece coating close to a plane. As a specific embodiment, the vacuum chamber upper cover plate 102 and the vacuum chamber body 101 constitute a vacuum chamber, and the vacuum system 114 provides a vacuum environment for the vacuum chamber. The spray electrode 104, the ground electrode 109, the RF / VHF system 111, and the ground 112 form a plasma activation system for exciting the process gas into plasma gas. The spray electrode reaction box 103, the ground electrode 109, and the adjustable mechanism 107 form a closed reaction area. The silicon wafer and the carrier 106 enter the reaction zone through the workpiece channel 110. The lifting system 113 drives the ground electrode 109 to move to the adjustable mechanism 107, and the silicon wafer and the carrier 106 are sealed in the reaction zone. The process gas passes through the air inlet channel 108 in the spray electrode 104 and is excited into plasma to undergo a deposition reaction on the workpiece surface to form a thin film. The gases during and after the reaction are discharged from the reaction zone through the exhaust channel. During the reaction, a uniform isobaric surface is formed in the closed reaction zone to ensure the uniformity of the coating.
[0021] As a specific embodiment, the shape of the exhaust port can be circular, oblong, rectangular, square, trapezoidal or cross-shaped, or a combination thereof.
[0022] See also Figure 3 and Figure 4 In this embodiment, there are 4 pairs of spray electrodes / ground electrodes, 4 exhaust outlets, a vacuum chamber upper cover plate 202, and a vacuum chamber body 201 to form a vacuum chamber, and a vacuum system 214 provides a vacuum environment for the vacuum chamber. The spray electrode 204, the ground electrode 209, the RF / VHF system 211, and the ground 212 form a plasma activation system for exciting the process gas into plasma gas. The spray electrode reaction box 203, the ground electrode 209, and the adjustable mechanism 207 form a closed reaction zone. The silicon wafer and the carrier 206 enter the reaction zone through the workpiece channel 210, and the lifting system 213 drives the ground electrode 209 to move to the adjustable mechanism 207, and the silicon wafer and the carrier 206 are sealed in the reaction zone. The process gas passes through the air inlet channel 208 in the spray electrode 204 and is excited into plasma to perform a deposition reaction on the workpiece surface to form a thin film. The gas during and after the reaction is discharged from the reaction zone through the exhaust channel. During the reaction, the uniform isobaric surface in the closed reaction zone ensures the uniformity of the coating.
[0023] As a specific embodiment, different spray electrode / ground electrode pairs and exhaust ports can be set in the reaction zone according to the size of the workpiece to maintain the uniformity of the gas. The coordinate distribution corresponding to the spray electrode 104 / ground electrode 109 is X1, X2, ..., Xn, Y1, Y2, ..., Yn, and the corresponding X1Y1, X2Y2, XnYn, constitutes a plurality of reaction zones.
[0024] According to the utility model, exhaust ports are arranged at least one circle inwardly at a certain interval at the edge of the coating temperature zone on the ground electrode, and the temperature field generated by the flow field of the heated plasma gas is used to perform temperature compensation on the edge of the temperature field. Since the fluid inlet usually adopts a spray structure, it does not affect the uniform distribution of the fluid in the coating temperature zone, so the temperature of the coating temperature zone and the uniformity of the plasma gas can be met at the same time. At the same time, the reaction zone is closed and divided into zones, and exhaust channels are arranged at the edges of the divided reaction zones to control the uniformity of the process gas, so that it is not affected by changes in the size of the workpiece, and the influence of uneven coating caused by the increasing size of the coated workpiece can be minimized.
[0025] It should be clear that the present invention is not limited to the specific configurations and processes described above and shown in the figures. For the sake of simplicity, a detailed description of the known methods is omitted here. In the above embodiments, several specific steps are described and shown as examples. However, the method process of the present invention is not limited to the specific steps described and shown, and those skilled in the art can make various changes, modifications and additions, or change the order between the steps after understanding the spirit of the present invention.
Claims
1. An exhaust device for a built-in PECVD reaction box, characterized in that: include: A vacuum chamber and a plasma activation system, wherein the vacuum chamber is composed of a vacuum chamber upper cover plate and a vacuum chamber body, wherein a spray electrode and a ground electrode are arranged opposite to each other in the vacuum chamber, wherein a spray electrode reaction box is connected to the top of the spray electrode, wherein an adjustable mechanism is arranged at the lower edge of the spray electrode reaction box, wherein the ground electrode is connected to a lifting system below, wherein the spray electrode reaction box, the ground electrode and the adjustable mechanism form a closed reaction zone, and wherein at least one exhaust port is arranged inwardly in a circle at a certain interval at the edge of the coating temperature zone on the ground electrode.
2. The exhaust device of the built-in PECVD reaction box according to claim 1, characterized in that: The exhaust port is in the shape of a circle, an oblong hole, a rectangle, a square, a trapezoid or a cross, or a combination thereof.
3. An exhaust device for a built-in PECVD reaction box, characterized in that: include: A vacuum chamber and a plasma activation system, wherein the vacuum chamber is composed of a vacuum chamber upper cover plate and a vacuum chamber body, wherein a plurality of groups of spray electrodes and ground electrodes are arranged relatively in the vacuum chamber, wherein a spray electrode reaction box is connected above the spray electrode, wherein an adjustable mechanism is arranged at the lower edge of the spray electrode reaction box, wherein the ground electrode is connected to a lifting system below, wherein the spray electrode reaction box, the ground electrode and the adjustable mechanism form a plurality of closed reaction zones, and wherein at least one exhaust port is arranged inwardly in a circle at a certain interval at the edge of the coating temperature zone on the ground electrode.
4. The exhaust device of the built-in PECVD reaction box according to claim 3, characterized in that: The exhaust port is in the shape of a circle, an oblong hole, a rectangle, a square, a trapezoid or a cross, or a combination thereof.
5. The exhaust device of the built-in PECVD reaction box according to claim 3, characterized in that: Spray electrode / ground electrode pairs and exhaust ports with different coordinate distributions are arranged in the reaction zone.