Dust-free polymeric kettle polishing device

Abstract

The utility model discloses a dust-free polymeric kettle polishing device, which relates to the technical field of chemical engineering kettle devices and comprises a driving shaft, a supporting disc is fixedly mounted on the outer side of the driving shaft, a polishing seat is fixedly mounted at the top end of the driving shaft, and rubber scrapers are distributed on the outer side of the polishing seat at equal intervals. And the inner side of the polishing seat is in threaded connection with a jacking convex shaft, a first polishing assembly is movably installed on the outer side of the polishing seat, and a second polishing assembly is arranged at the top of the supporting disc. According to the dust-free polymeric kettle polishing device, a first polishing assembly is extruded by manually rotating a jacking convex shaft, and when the jacking convex shaft rotates on the inner side of a polishing base, a convex block on the outer side of the jacking convex shaft can extrude an extrusion block to extrude a telescopic block towards the outer side to be attached to the inner wall of a polymeric kettle; and then the driving motor is powered on, the driving shaft can drive the supporting disc and the polishing base to do circular motion, the polishing piece and the polishing column can rotate along the inner wall of the polymerization kettle, and multi-stage polishing is achieved.

Description

Technical Field

[0001] The utility model relates to the technical field of chemical kettle polishing devices, in particular to a dust-free polymerization kettle polishing device. Background Art

[0002] In chemical production, polymerization kettles are often used to carry out chemical polymerization reactions on various chemical raw materials. In the production process, polymerization kettles will have different degrees of material sticking to the kettle. The material sticks to the inner wall of the polymerization kettle to form wall scale, which causes the heat transfer coefficient to decrease, and the material is difficult to discharge during the stripping and drying process. The wall scale is mixed into the material and reduces the product quality. Therefore, the inner wall of the polymerization kettle must be polished after long-term use to ensure the stability of the subsequent reaction.

[0003] In daily use, the existing polymerization kettle polishing device cannot meet the polishing needs of the reactor. The polishing device can only perform a single polishing on the inner wall of the reactor and cannot achieve multi-level polishing. It is easy to generate floating dust during polishing, the grinding efficiency is low, and the polishing effect is not obvious. The tightness between the polishing sheet and the inner wall of the reactor cannot be adjusted, and only a single size of reactor can be polished. Utility Model Content

[0004] The utility model provides a dust-free polymerization kettle polishing device, which has the advantages of simple operation, realizing multi-stage grinding, being able to adjust the polishing degree, spraying polishing liquid to absorb floating dust, and improving polishing efficiency, so as to solve the problem of low efficiency and poor polishing effect of traditional polishing devices.

[0005] To achieve the above purpose, the utility model provides the following technical solutions: a dust-free polymerizer polishing device, comprising a driving shaft, a support plate is fixedly installed on the outside of the driving shaft, a polishing seat is fixedly installed on the top of the driving shaft, rubber scrapers are evenly distributed on the outside of the polishing seat, a top pressing convex shaft is threadedly connected on the inside of the polishing seat, a polishing assembly 1 is movably installed on the outside of the polishing seat, and a polishing assembly 2 is arranged on the top of the support plate;

[0006] The polishing assembly 1 comprises a guide rail, a telescopic block and an extrusion block, wherein the guide rail is fixedly mounted on the inner bottom wall of the polishing seat, the extrusion block is movably mounted on the inner wall of the guide rail, and the telescopic block is fixedly mounted on one end of the extrusion block;

[0007] The second polishing assembly includes a connecting seat, a hinged rod, and a polishing sheet. The connecting seat is fixedly installed at the bottom end of the polishing seat, one end of the hinged rod is movably installed on the inner side wall of the connecting seat, and the polishing sheet is movably installed at one end of the hinged rod.

[0008] As a preferred technical solution of the utility model, the polishing component also includes a polishing column, a liquid storage cylinder, and a slot. The polishing column is movably installed at one end of the telescopic block, the liquid storage cylinder is movably installed on the inner side of the telescopic block, and the slot is opened on the outer side of the liquid storage cylinder.

[0009] As a preferred technical solution of the utility model, the number of the hinged rods is two groups, wherein one end of another group of hinged rods is movably connected to the top of the support plate, and the other end is movably connected to the polishing sheet.

[0010] As a preferred technical solution of the utility model, an extension portion is provided at one end of the extrusion block, and the extension portion is chamfered.

[0011] As a preferred technical solution of the utility model, the middle part of the liquid storage cylinder is filled with polishing liquid, and the outer side of the liquid storage cylinder is provided with a leakage hole.

[0012] Compared with the prior art, the utility model provides a dust-free polymerization reactor polishing device, which has the following beneficial effects:

[0013] 1. The dust-free polymerizer polishing device squeezes the polishing component by manually rotating the top pressure cam. When the top pressure cam rotates on the inner side of the polishing seat, the convex block on the outer side of the top pressure cam squeezes the extrusion block to squeeze the telescopic block outward to fit the inner wall of the polymerizer. Then, the driving motor is energized, and the driving shaft drives the supporting plate and the polishing seat to perform circular motion. At this time, the polishing sheet and the polishing column rotate along the inner wall of the polymerizer, thereby realizing multi-stage polishing.

[0014] 2. The dust-free polymerization kettle polishing device stores the polishing liquid by setting a liquid storage cylinder. When the liquid storage cylinder is subjected to centrifugal force, the polishing liquid will flow out along the leakage hole and adhere to the inner wall of the polymerization kettle, cooperate with the polishing column and the polishing sheet for polishing, and at the same time absorb the floating dust generated by polishing. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] Figure 1 It is a three-dimensional schematic diagram of a dust-free polymerization kettle polishing device of the utility model;

[0016] Figure 2 It is a schematic diagram of the overall structure of the utility model;

[0017] Figure 3 It is a schematic diagram of the overall structure of the utility model;

[0018] Figure 4 It is a schematic diagram of the overall structure of the utility model;

[0019] Figure 5 It is a three-dimensional schematic diagram of the connection between the polishing sheet, the hinged rod and the connecting seat.

[0020] In the figure: 1. driving shaft; 2. supporting plate; 3. polishing seat; 4. rubber scraper; 5. top pressure cam; 6. telescopic block; 7. hinged rod; 8. polishing sheet; 9. guide rail; 10. polishing column; 11. extrusion block; 12. slot; 13. connecting seat; 14. liquid storage cylinder. DETAILED DESCRIPTION

[0021] The following will be combined with the drawings in the embodiments of the utility model to clearly and completely describe the technical solutions in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.

[0022] See also Figure 1-Figure 5 The utility model discloses a dust-free polymerizer polishing device, comprising a driving shaft 1, a supporting plate 2 is fixedly mounted on the outer side of the driving shaft 1, a polishing seat 3 is fixedly mounted on the top of the driving shaft 1, rubber scrapers 4 are evenly distributed on the outer side of the polishing seat 3, a top pressing convex shaft 5 is threadedly connected on the inner side of the polishing seat 3, a polishing component 1 is movably mounted on the outer side of the polishing seat 3, and a polishing component 2 is arranged on the top of the supporting plate 2, wherein a driving motor is arranged at one end of the driving shaft 1 to provide a driving source for the device.

[0023] Specifically, the polishing assembly 1 includes a guide rail 9, a telescopic block 6, and an extrusion block 11. The guide rail 9 is fixedly mounted on the inner bottom wall of the polishing seat 3, the extrusion block 11 is movably mounted on the inner wall of the guide rail 9, and the telescopic block 6 is fixedly mounted on one end of the extrusion block 11.

[0024] In this embodiment, a guide rail 9 is provided for installing the extrusion block 11, wherein the extrusion block 11 can move on the inner wall of the guide rail 9. When the extrusion block 11 moves on the inner wall, it will drive the telescopic block 6 to move, so as to achieve the fitting of the polishing component 1 with the inner wall of the polymerization kettle.

[0025] Specifically, polishing component 1 also includes a polishing column 10, a liquid storage cylinder 14, and a slot 12. The polishing column 10 is movably installed at one end of the telescopic block 6, the liquid storage cylinder 14 is movably installed on the inner side of the telescopic block 6, and the slot 12 is opened on the outer side of the liquid storage cylinder 14.

[0026] In this embodiment, a polishing column 10 is provided to fine-polish the inner wall of the polymerization kettle, and a liquid storage cylinder 14 is used to coat the inner wall of the polymerization kettle with polishing liquid to attach the floating dust generated during polishing, wherein a semicircular hole adapted to the slot 12 is provided on the inner side of the telescopic block 6, and the side of the circular hole is engaged with the slot 12.

[0027] Specifically, the polishing component 2 includes a connecting seat 13, a hinged rod 7, and a polishing plate 8. The connecting seat 13 is fixedly installed at the bottom end of the polishing seat 3, one end of the hinged rod 7 is movably installed on the inner wall of the connecting seat 13, and the polishing plate 8 is movably installed at one end of the hinged rod 7.

[0028] In this embodiment, the articulated rod 7 is installed by setting a connecting seat 13, wherein the connecting seat 13 and the articulated rod 7 are connected by a pin, and the polishing sheet 8 and the two groups of articulated rods 7 are movably connected by the pin, wherein the polishing sheet 8 is used to roughly polish the inner wall of the polymerization kettle.

[0029] Specifically, there are two groups of hinged rods 7 , one end of another group of hinged rods 7 is movably connected to the top of the support plate 2 , and the other end is movably connected to the polishing sheet 8 .

[0030] In this embodiment, two sets of hinged rods 7 are provided to support the polishing sheet 8, and the polishing sheet 8 can be fine-tuned during polishing.

[0031] Specifically, an extension portion is provided at one end of the extrusion block 11, and the extension portion is chamfered.

[0032] In this embodiment, an extension portion is provided at one end of the extrusion block 11 for use with the pressing cam 5. When the pressing cam 5 rotates on the inner side of the polishing seat 3, the convex block on the outer side of the pressing cam 5 will squeeze the extrusion block 11 to squeeze the telescopic block 6 outward to fit the inner wall of the polymerization kettle.

[0033] Specifically, the middle of the liquid storage cylinder 14 is filled with polishing liquid, and the outer side of the liquid storage cylinder 14 is provided with a leakage hole.

[0034] In this embodiment, a liquid storage cylinder 14 is provided to store the polishing liquid. When the liquid storage cylinder 14 is subjected to centrifugal force, the polishing liquid will flow out along the leakage hole and adhere to the inner wall of the polymerization kettle, cooperate with the polishing column 10 and the polishing sheet 8 for polishing, and at the same time absorb the floating dust generated by polishing.

[0035] The working principle and use process of the utility model are as follows: when in use, the polishing device is inserted into the inner wall of the polymerization kettle, with one end of the support plate 2 facing the bottom of the polymerization kettle, and then the polishing component 1 is squeezed by manually rotating the top pressure cam 5. When the top pressure cam 5 rotates on the inner side of the polishing seat 3, the convex block on the outer side of the top pressure cam 5 will squeeze the extrusion block 11 to squeeze the telescopic block 6 outward to fit the inner wall of the polymerization kettle, and then the driving motor is energized. At this time, the driving shaft 1 will drive the support plate 2 and the polishing seat 3 to perform circular motion. At this time, the polishing sheet 8 and the polishing column 10 will rotate along the inner wall of the polymerization kettle to achieve polishing. When the liquid storage cylinder 14 is subjected to centrifugal force, the polishing liquid will flow out along the leakage hole and adhere to the inner wall of the polymerization kettle, cooperate with the polishing column 10 and the polishing sheet 8 for fine polishing, and at the same time, it will absorb the floating dust generated by polishing to achieve dust-free polishing.

[0036] It should be noted that, in this article, terms such as "comprises", "includes" or any other variations thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only those elements, but also includes other elements not explicitly listed, or also includes elements inherent to such process, method, article or device. In the absence of more restrictions, an element defined by the sentence "comprises a ..." does not exclude the existence of other identical elements in the process, method, article or device including the element.

[0037] Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. A dust-free polymerizer polishing device, comprising a drive shaft (1), characterized in that: A support plate (2) is fixedly mounted on the outer side of the driving shaft (1), a polishing seat (3) is fixedly mounted on the top end of the driving shaft (1), rubber scrapers (4) are equidistantly distributed on the outer side of the polishing seat (3), a pressing convex shaft (5) is threadedly connected on the inner side of the polishing seat (3), a polishing component 1 is movably mounted on the outer side of the polishing seat (3), and a polishing component 2 is arranged on the top of the supporting plate (2); The polishing assembly 1 comprises a guide rail (9), a telescopic block (6), and an extrusion block (11); the guide rail (9) is fixedly mounted on the inner bottom wall of the polishing seat (3); the extrusion block (11) is movably mounted on the inner wall of the guide rail (9); and the telescopic block (6) is fixedly mounted on one end of the extrusion block (11); The second polishing assembly comprises a connecting seat (13), a hinged rod (7), and a polishing sheet (8); the connecting seat (13) is fixedly mounted on the bottom end of the polishing seat (3); one end of the hinged rod (7) is movably mounted on the inner side wall of the connecting seat (13); and the polishing sheet (8) is movably mounted on one end of the hinged rod (7).

2. The dust-free polymerization reactor polishing device according to claim 1, characterized in that: The polishing assembly 1 further comprises a polishing column (10), a liquid storage cylinder (14), and a slot (12); the polishing column (10) is movably mounted on one end of the telescopic block (6); the liquid storage cylinder (14) is movably mounted on the inner side of the telescopic block (6); and the slot (12) is provided on the outer side of the liquid storage cylinder (14).

3. The dust-free polymerization reactor polishing device according to claim 1, characterized in that: The number of the hinged rods (7) is two groups, wherein one end of the other group of hinged rods (7) is movably connected to the top of the support plate (2), and the other end is movably connected to the polishing plate (8).

4. The dust-free polymerization reactor polishing device according to claim 1, characterized in that: An extension portion is provided at one end of the extrusion block (11), and the extension portion is chamfered.

5. The dust-free polymerization reactor polishing device according to claim 2, characterized in that: The middle part of the liquid storage cylinder (14) is filled with polishing liquid, and the outer side of the liquid storage cylinder (14) is provided with a leakage hole.

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