High-purity water secondary treatment device

By designing a high-purity water secondary treatment device in the hydrogen peroxide production system and utilizing multi-stage detection and treatment units, the problems of low resistivity and unstable pH value of high-purity water were solved, realizing the secondary treatment of high-purity water and ensuring the stability and safety of water quality.

CN223522379UActive Publication Date: 2025-11-07HANGZHOU MINGXIN HYDROGEN PEROXIDE
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Patent Information

Application Number
CN202422727997.2
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-11-08
Publication Date
2025-11-07
Estimated Expiration
2034-11-08

AI Technical Summary

Technical Problem

In existing technologies, the resistivity of high-purity water is low and pH value detection is not perfect during the hydrogen peroxide production process, resulting in high concentrations of sodium and boron ions, which affects water quality.

Method used

Design a high-purity water secondary treatment device, which connects a high-purity water source, an EDI water supply pump, a UV filter component, an EDI device, a boron removal resin tank, and a high-purity water tank through pipelines. It is equipped with multiple resistivity and pH value detection instruments and pneumatic valves to achieve secondary treatment of high-purity water and ensure that the water quality meets the standards.

Benefits of technology

It effectively reduced the concentration of sodium and boron ions in high-purity water, improved resistivity, and perfected pH value detection, thus ensuring the quality and safety of water used in the hydrogen peroxide production system and guaranteeing the stability and safety of the system's water supply.

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Abstract

The utility model relates to the technical field of water treatment, in particular to a high-purity water secondary treatment device which comprises a high-purity water source, a high-purity water tank, an EDI water supply pump, a UV filter assembly, an EDI device, a boron removal resin tank, an EDI water producing tank, an ultrapure water pump and a water using tank which are sequentially communicated through pipelines, a first resistivity detection instrument, a first pH value detection instrument and a first pneumatic valve are respectively arranged in the middle of the pipeline between the high-purity water source and the high-purity water tank. When any one of the resistivity and the pH value detected by the second resistivity detection instrument and the second pH value detection instrument is not qualified, the high-purity water in the boron removal resin tank returns to the interior of the high-purity water tank again, and is treated again through the EDI water supply pump, the UV filter assembly, the EDI device and the boron removal resin tank. The concentration of sodium boron ions in the treated water is reduced, the resistivity is improved, the pH value detection is perfected, and the quality and safety of the water for the hydrogen peroxide production system are guaranteed.
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Description

TECHNICAL FIELD

[0001] The utility model relates to water treatment technical field, concretely is a kind of high-purity water secondary treatment device. BACKGROUND

[0002] Hydrogen peroxide (hydrogen peroxide) is widely used in chemical industry, medicine, environmental protection and other fields. With the continuous growth of market demand, domestic hydrogen peroxide production capacity is getting larger and larger, and the competition is getting more and more fierce. In order to improve the competitiveness, enterprises put forward higher requirements for product quality. In the production process of hydrogen peroxide, the solubility of hydrogen peroxide in water and working fluid is different, and the density difference between working fluid and water is used to extract the working fluid containing hydrogen peroxide with pure water, and the aqueous solution of hydrogen peroxide (commonly known as hydrogen peroxide) is obtained.

[0003] At present, the high-purity water used for extraction in hydrogen peroxide industry is generally produced by ultrafiltration and secondary reverse osmosis device, which has some defects and deficiencies:

[0004] 1. Low resistivity: high concentration of sodium and boron ions, secondary reverse osmosis device cannot remove sodium and boron ions well.

[0005] 2. pH value detection is not perfect: the water supply position is far away, and the pH value fluctuates. INVENTION CONTENTS

[0006] The utility model aims at providing a kind of high-purity water secondary treatment device to solve the problems of low resistivity and imperfect pH value detection.

[0007] In order to achieve the above purpose, the utility model provides the following technical scheme: a kind of high-purity water secondary treatment device, comprising:

[0008] High-purity water source, high-purity water tank, EDI water supply pump, UV filtration assembly, EDI device, boron removal resin tank, EDI water tank, ultrapure water pump and water tank are connected in sequence by pipeline, first resistivity detection instrument, first pH value detection instrument and first pneumatic valve are respectively arranged in part of pipeline between high-purity water source and high-purity water tank, boron removal resin tank, EDI water tank and high-purity water tank are connected in communication through three-way pipe, second resistivity detection instrument, second pH value detection instrument and third pneumatic valve are respectively arranged in part of communication pipeline between boron removal resin tank and EDI water tank, and second pneumatic valve is arranged in the middle part of communication pipeline between high-purity water tank and boron removal resin tank and EDI water tank, so that when the flow value detected by second resistivity detection instrument and second pH value detection instrument is unqualified, third pneumatic valve is closed and second pneumatic valve is opened, so that high-purity water returns to the inside of high-purity water tank through boron removal resin tank.

[0009] Preferably, the UV filtering assembly comprises a filtering tube, both ends of the filtering tube are respectively fixedly embedded with a liquid inlet pipe and a liquid outlet pipe communicated with the inside of the filtering tube, the inner wall of the filtering tube is fixedly provided with a protection pipe, the filtering tube and the protection pipe are both pipe-shaped structures with one end open, both ends of the inner wall of the protection pipe are respectively threadedly connected with a first fixing pipe and a second fixing pipe, the inner wall of the first fixing pipe and the second fixing pipe is fixedly provided with an ultraviolet lamp tube, the surface of the protection pipe is rotatably provided with a transparent spiral blade, and the transparent spiral blade is closely attached to the surface of the protection pipe, so that the transparent spiral blade scrapes off impurities on the surface of the protection pipe while guiding the high-purity water in the filtering tube.

[0010] Preferably, one end of the opposite surface of the first fixing pipe and the second fixing pipe is respectively fixedly connected with a plurality of connecting rods, so that the first fixing pipe drives the second fixing pipe to rotate synchronously through the connecting rods, one end of the filtering tube is threadedly connected with an end cover, and the surface of the servo motor is fixedly connected with a sealing ring, and one end of the sealing ring is closely attached to the inner wall of the end cover.

[0011] Preferably, one end of the inner wall of the transparent spiral blade is fixedly connected with a rotating pipe, the inner wall of the rotating pipe is movably penetrated and extends to the outside of the filtering tube, the inner wall of the rotating pipe is rotatably connected with a positioning column through a sealing bearing, and the positioning column is fixedly connected to one end of the protection pipe, one end of the positioning column away from the protection pipe is fixedly connected with a positioning support, and the positioning support is fixedly connected to one end of the filtering tube, one end of the protection pipe away from the positioning column is fixedly connected with an annular support, and the annular support is fixedly connected to the inner wall of the filtering tube.

[0012] Preferably, the surface of one end of the rotating pipe away from the filtering tube is fixedly connected with a first gear, the surface of the first gear is engaged with a second gear, the middle part of the second gear is fixedly connected with a servo motor, and the servo motor is fixedly connected to one end of the filtering tube.

[0013] Preferably, the surface of the rotating pipe away from the transparent spiral blade is fixedly connected with a sealing ring, and the surface of the sealing ring is closely attached with a rubber ring, and the rubber ring is fixedly connected to the inner wall of the filtering tube.

[0014] Compared with the prior art, the present application has the following advantages:

[0015] When the resistance and the pH value detected by the second resistivity detector and the second pH value detector are any one of the two, the high-purity water in the boron removal resin tank is returned to the inside of the high-purity water tank, and is treated again through the EDI water supply pump, the UV filtering assembly, the EDI device and the boron removal resin tank, so that the high-purity water is treated twice, the sodium and boron plasma concentration of the treated water is reduced, the resistivity is improved, the pH value detection is improved, and the quality and safety of the water used in the hydrogen peroxide production system are ensured.

[0016] The utility model discloses still through servo motor drive second gear rotation simultaneously, and make second gear with first gear meshing and drive rotating pipe rotation, and then make rotating pipe drive transparent spiral blade rotate on the surface of protection pipe, make transparent spiral blade can scrape off the dirt on the surface of protection pipe, avoid dirt influence ultraviolet lamp tube's irradiation intensity, cause the case of lower high -purity water sterilization and disinfection efficiency. BRIEF DESCRIPTION OF DRAWINGS

[0017] Figure 1 It is whole structure flow chart for the utility model discloses a kind of high-purity water secondary treatment device;

[0018] Figure 2 It is UV filter component structure schematic diagram for the utility model discloses a kind of high-purity water secondary treatment device;

[0019] Figure 3 It is UV filter component structure sectional view for the utility model discloses a kind of high-purity water secondary treatment device;

[0020] Figure 4 It is UV filter component structure front view for the utility model discloses a kind of high-purity water secondary treatment device;

[0021] Figure 5 It is UV filter component structure explosion view for the utility model discloses a kind of high-purity water secondary treatment device.

[0022] In the drawing: 1, high-purity water source;2, high-purity water tank;3, EDI water supply pump;4, UV filter component;5, EDI device;6, boron removal resin jar;7, EDI water tank;8, ultrapure water pump;9, water tank;10, first resistivity detection instrument;11, first pH value detection instrument;12, first pneumatic valve;13, second resistivity detection instrument;14, second pH value detection instrument;15, second pneumatic valve;16, third pneumatic valve;

[0023] 401, filter pipe;402, protection pipe;403, first fixed pipe;404, second fixed pipe;405, ultraviolet lamp tube;406, connecting rod;407, transparent spiral blade;408, rotating pipe;409, positioning column;410, positioning support;411, first gear;412, second gear;413, servo motor;414, end cover;415, sealing ring;416, annular support;417, liquid inlet pipe;418, liquid outlet pipe;419, sealing ring;420, rubber ring. DETAILED DESCRIPTION

[0024] Clearly, the described embodiments are merely a part of the embodiments of the present application, rather than all the embodiments. Based on the embodiments of the present application, all the other embodiments obtained by those skilled in the art without creative labor fall within the scope of the present application.

[0025] Please refer to Figures 1-5 The present application provides a technical scheme: a high-purity water secondary treatment device, comprising:

[0026] The high-purity water source 1, the high-purity water tank 2, the EDI water supply pump 3, the UV filter assembly 4, the EDI device 5, the boron removal resin tank 6, the EDI water tank 7, the ultrapure water pump 8 and the water tank 9 are sequentially connected in communication through pipelines. The first resistivity detection instrument 10, the first pH value detection instrument 11 and the first pneumatic valve 12 are respectively arranged in the pipeline between the high-purity water source 1 and the high-purity water tank 2. The boron removal resin tank 6 and the EDI water tank 7 are connected in communication through a three-way pipe with the high-purity water tank 2. The second resistivity detection instrument 13, the second pH value detection instrument 14 and the third pneumatic valve 16 are respectively arranged in the communication pipeline between the boron removal resin tank 6 and the EDI water tank 7. The second pneumatic valve 15 is arranged in the communication pipeline between the high-purity water tank 2, the boron removal resin tank 6 and the EDI water tank 7. When the second resistivity detection instrument 13 and the second pH value detection instrument 14 detect that the flow path value is unqualified, the third pneumatic valve 16 is closed and the second pneumatic valve 15 is opened, so that the high-purity water passes through the boron removal resin tank 6 and returns to the inside of the high-purity water tank 2.

[0027] The above structure in use, by the first resistivity detection instrument 10 and the first pH value detection instrument 11 detection high purity water source 1 into the high purity water tank 2 inside the high purity water, when the resistivity and pH value of the first resistivity detection instrument 10 and the first pH value detection instrument 11 detection any one is not pass, at this time the first pneumatic valve 12 closes the communication between the high purity water source 1 and the high purity water tank 2, then the high purity water in the high purity water source 1 no longer enters the inside of the high purity water tank 2, through the second resistivity detection instrument 13 and the second pH value detection instrument 14 detection boron removal resin tank 6 into the EDI water tank 7 inside the high purity water, when the resistivity and pH value of the second resistivity detection instrument 13 and the second pH value detection instrument 14 detection any one is not pass, at this time the third pneumatic valve 16 closes the communication between the boron removal resin tank 6 and the EDI water tank 7, at the same time the second pneumatic valve 15 opens the communication between the boron removal resin tank 6 and the high purity water tank 2, so that the high purity water in the boron removal resin tank 6 returns to the inside of the high purity water tank 2, and is treated again by the EDI water pump 3, the UV filter assembly 4, the EDI device 5 and the boron removal resin tank 6, realizes the secondary treatment of the high purity water, reduces the sodium and boron ion concentration of the treated water, improves the resistivity and pH value, guarantees the quality and safety of the water used in the hydrogen peroxide production system, effectively monitors the pH value of the inlet and outlet water, guarantees the safety of the system water, and reduces the ion concentration of the pure water.

[0028] The UV filter assembly 4 comprises a filter pipe 401, both ends of the filter pipe 401 are respectively fixedly embedded with an inlet pipe 417 and an outlet pipe 418 in communication with the inside of the filter pipe 401, and the inner wall of the filter pipe 401 is fixedly provided with a protective pipe 402; the filter pipe 401 and the protective pipe 402 are both pipe-shaped structures with one end open; the inner walls of first and second fixed pipes 403 and 404 are fixedly provided with ultraviolet lamp tubes 405; and the surface of the protective pipe 402 is rotatably provided with transparent spiral blades 407, which are closely attached to the surface of the protective pipe 402 to scrape off impurities on the surface of the protective pipe 402 and guide the high-purity water in the filter pipe 401.

[0029] In use, the high-purity water enters the inside of the filter pipe 401 through the inlet pipe 417 and is discharged from the outlet pipe 418; when the high-purity water enters the inner wall of the filter pipe 401, it flows to one end of the outlet pipe 418 along the spiral direction of the transparent spiral blades 407, thereby increasing the time for the high-purity water to enter the inside of the filter pipe 401 and being discharged outward under the guidance of the transparent spiral blades 407, so as to avoid the high-purity water stagnating at dead angle positions in the filter pipe 401 and the situation that the flowing high-purity water has a too high flow rate and the sterilization efficiency of the ultraviolet lamp tubes 405 is low.

[0030] The opposite end of the first fixed pipe 403 and the second fixed pipe 404 is respectively fixedly installed with a plurality of connecting rods 406, so that the first fixed pipe 403 drives the second fixed pipe 404 to rotate synchronously through the connecting rods 406, one end of the filter pipe 401 is threadedly connected with an end cover 414, the surface of a servo motor 413 is fixedly installed with a sealing ring 415, one end of the sealing ring 415 is tightly attached to the inner wall of the end cover 414, one end of the transparent spiral blade 407 is fixedly installed with a rotating pipe 408, the rotating pipe 408 is movably penetrated through the inner wall of the rotating pipe 408 and extends to the outside of the filter pipe 401, the inner wall of the rotating pipe 408 is rotatably connected with a positioning column 409 through a sealing bearing, and the positioning column 409 is fixedly installed at one end of the protective pipe 402, one end of the positioning column 409 away from the protective pipe 402 is fixedly installed with a positioning support 410, and the positioning support 410 is fixedly installed at one end of the filter pipe 401, one end of the protective pipe 402 away from the positioning column 409 is fixedly installed with an annular support 416, and the annular support 416 is fixedly installed on the inner wall of the filter pipe 401.

[0031] The surface of the rotating pipe 408 away from the filter pipe 401 is fixedly installed with a first gear 411, the surface of the first gear 411 is engaged with a second gear 412, the middle part of the second gear 412 is fixedly installed with a servo motor 413, and the servo motor 413 is fixedly installed at one end of the filter pipe 401, the second gear 412 is driven to rotate by the servo motor 413, and the second gear 412 is engaged with the first gear 411 and drives the rotating pipe 408 to rotate, thereby driving the transparent spiral blade 407 to rotate on the surface of the protective pipe 402, so that the transparent spiral blade 407 can scrape off the dirt on the surface of the protective pipe 402, avoiding the influence of the dirt on the irradiation intensity of the ultraviolet lamp 405, and causing the low efficiency of sterilization and disinfection of high-purity water.

[0032] The surface of the rotating pipe 408 away from the transparent spiral blade 407 is fixedly installed with a sealing ring 419, and the surface of the sealing ring 419 is tightly attached to a rubber ring 420, and the rubber ring 420 is fixedly installed on the inner wall of the filter pipe 401, by setting the sealing ring 419 and the rubber ring 420, the leakage of high-purity water from one end of the filter pipe 401 corresponding to the positioning column 409 can be prevented, by setting the sealing ring 415, when the end cover 414 is threadedly tightened with the filter pipe 401, the end cover 414 is tightly attached to the sealing ring 415 and stably limits the first fixed pipe 403 in the inside of the filter pipe 401, so that the ultraviolet lamp 405 can be stably used in the inside of the filter pipe 401.

[0033] Working principle: in use, the utility model discloses a first resistivity detection instrument 10 and first pH value detection instrument 11 detect the high-purity water of high-purity water source 1 into the high-purity water tank 2 inside, when the resistivity and pH value of first resistivity detection instrument 10 and first pH value detection instrument 11 detect any one is not up to the mark, first pneumatic valve 12 closes the communication between high-purity water source 1 and high-purity water tank 2, then the high-purity water in high-purity water source 1 does not enter the inside of high-purity water tank 2, through second resistivity detection instrument 13 and second pH value detection instrument 14 detect the high-purity water of boron removal resin tank 6 into EDI water tank 7 inside, when the resistivity and pH value of second resistivity detection instrument 13 and second pH value detection instrument 14 detect any one is not up to the mark, third pneumatic valve 16 closes the communication between boron removal resin tank 6 and EDI water tank 7, and second pneumatic valve 15 opens the communication between boron removal resin tank 6 and high-purity water tank 2, so that the high-purity water in boron removal resin tank 6 returns to the inside of high-purity water tank 2 again, and is treated again through EDI water pump 3, UV filter assembly 4, EDI device 5 and boron removal resin tank 6, realizes the secondary treatment of high-purity water, makes the water sodium boron plasma concentration after processing reduce, resistivity improves, and pH value detection is improved, guarantees the quality and safety of hydrogen peroxide production system water, effectively monitors the pH value of water in and out, guarantees system water safety, reduces the ion concentration of pure water, and the sodium ion and boron ion concentration is less than 0.1 ppb, and the water resistivity is ≥17MΩ.CM;

[0034] Wherein, when using UV filter assembly 4, high-purity water enters the inside of filter pipe 401 through inlet pipe 417, and is discharged from outlet pipe 418, wherein when high-purity water enters the inner wall of filter pipe 401, it flows to the end of outlet pipe 418 along the spiral direction of transparent spiral blade 407, thereby increasing the time of high-purity water entering the inside of filter pipe 401, and being discharged outward under the guidance of transparent spiral blade 407, thereby avoiding the stagnation of high-purity water at dead angle positions in filter pipe 401, and the situation that the sterilization efficiency of ultraviolet lamp 405 is low due to the too fast flow speed of high-purity water;

[0035] After long-time use of UV filter assembly 4, dirt will be generated on the surface of protective pipe 402, and the sterilization efficiency of ultraviolet lamp 405 will be affected, the second gear 412 is driven to rotate by servo motor 413, and the second gear 412 is engaged with first gear 411 to drive rotating pipe 408 to rotate, thereby driving transparent spiral blade 407 to rotate on the surface of protective pipe 402, so that transparent spiral blade 407 can scrape off the dirt on the surface of protective pipe 402, thereby avoiding the influence of dirt on the irradiation intensity of ultraviolet lamp 405, and the situation that the sterilization and disinfection efficiency of high-purity water is low due to the too low irradiation intensity of ultraviolet lamp 405;

[0036] By setting the sealing ring 419 and the rubber ring 420, the high-purity water can be prevented from leaking from the one end of the filter tube 401 corresponding to the position of the positioning column 409, and by setting the sealing ring 415, when the end cover 414 is screwed with the filter tube 401, the end cover 414 is tightly attached to the sealing ring 415 and the first fixed tube 403 is stably limited in the inside of the filter tube 401, so that the ultraviolet lamp 405 can be stably used in the inside of the filter tube 401.

[0037] It should be noted that the relational terms herein such as first and second and the like are used solely to distinguish one entity or action from another, without necessarily requiring or implying any such actual relationship or order between such entities or actions. Moreover, the terms "comprises", "comprising", or any other variations thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but can include other elements not expressly listed or inherent to such process, method, article, or apparatus.

[0038] Although the embodiments of the present application have been shown and described, it is to be understood that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the present application, the scope of which is defined by the appended claims and their equivalents.

Claims

1. A high-purity water secondary treatment device, characterized in that: The application relates to a high-purity water production system. The UV filtering assembly (4) comprises a filtering pipe (401), the two ends of the filtering pipe (401) are respectively fixedly embedded with liquid inlet pipes (417) and liquid outlet pipes (418) which are communicated with the interiors of the filtering pipes (401), the inner wall of the filtering pipe (401) is fixedly provided with a protection pipe (402), the filtering pipe (401) and the protection pipe (402) are both pipe-shaped structures with one end being open, the inner walls of the two ends of the protection pipe (402) are respectively threadedly connected with first fixing pipes (403) and second fixing pipes (404), the inner walls of the first fixing pipes (403) and the second fixing pipes (404) are fixedly provided with ultraviolet lamp tubes (405), the surface of the protection pipe (402) is rotatably provided with transparent spiral blades (407), and the transparent spiral blades (407) are tightly attached to the surface of the protection pipe (402), so that the transparent spiral blades (407) scrape off impurities on the surface of the protection pipe (402) and guide the high-purity water in the filtering pipe (401) at the same time.

2. The high-purity water secondary treatment device according to claim 1, characterized by: The opposite ends of the first fixing pipes (403) and the second fixing pipes (404) are respectively fixedly connected with a plurality of connecting rods (406), so that the first fixing pipes (403) drive the second fixing pipes (404) to synchronously rotate through the connecting rods (406), one end of the filtering pipe (401) is threadedly connected with an end cover (414), the surface of a servo motor (413) is fixedly connected with a sealing ring (415), and one end of the sealing ring (415) is tightly attached to the inner wall of the end cover (414).

3. The high purity water polishing device of claim 2, wherein: ​ 4. The high-purity water secondary treatment device according to claim 3, characterized by: One end of the transparent spiral blade (407) is fixedly connected with a rotating pipe (408), the inner wall of the rotating pipe (408) is movably penetrated and extends to the outside of the filter pipe (401), the inner wall of the rotating pipe (408) is rotatably connected with a positioning column (409) through a sealing bearing, and the positioning column (409) is fixedly connected at one end of the protection pipe (402), one end of the positioning column (409) away from the protection pipe (402) is fixedly connected with a positioning support (410), and the positioning support (410) is fixedly connected at one end of the filter pipe (401), one end of the protection pipe (402) away from the positioning column (409) is fixedly connected with an annular support (416), and the annular support (416) is fixedly connected with the inner wall of the filter pipe (401).

5. The apparatus for secondary treatment of high purity water according to claim 4, wherein: The surface of one end of the rotating pipe (408) away from the filter pipe (401) is fixedly connected with a first gear (411), the surface of the first gear (411) is engaged with a second gear (412), the middle part of the second gear (412) is fixedly connected with a servo motor (413), and the servo motor (413) is fixedly connected at one end of the filter pipe (401).

6. The high purity water polishing device of claim 5, wherein: The surface of the rotating pipe (408) away from the transparent spiral blade (407) is fixedly connected with a sealing ring (419), and the surface of the sealing ring (419) is tightly combined with a rubber ring (420), and the rubber ring (420) is fixedly connected with the inner wall of the filter pipe (401).