Coated glass and laminated glass
By setting multiple composite functional layers and optical reflection layers on the glass, the problems of high cost and manufacturing difficulty of HUD functional glass are solved, achieving high-quality projection display and multi-functional integration, and improving the durability and environmental adaptability of the glass.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-12-17
- Publication Date
- 2026-04-03
AI Technical Summary
To achieve HUD functionality in existing glass car windows, multiple functional layers need to be stacked, which is costly. Furthermore, the customization of wedge-shaped film molds is difficult, leading to challenges in production and manufacturing control.
The method involves setting multiple composite functional layers and optical reflection layers on the glass, including optical reflection layers with alternating high crystallinity layers and low crystallinity layers, combined with antireflection layers, ultraviolet isolation layers, infrared heat insulation layers and defogging layers, and forming a multi-layer thin film structure through vacuum coating technology.
It effectively eliminates ghosting, improves brightness and projection display quality, and integrates ultraviolet isolation, electric heating and infrared heat insulation functions to enhance the glass's wear resistance, environmental resistance and high and low temperature resistance.
Smart Images
Figure CN224077259U_ABST
Abstract
Description
Technical Field
[0001] This application relates to the field of glass technology, specifically to a coated glass and a laminated glass. Background Technology
[0002] The demand for performance-oriented glass windows, such as car windshields, windows and sunroofs, high-speed rail windows, bullet train windows, and cruise ship windows, is becoming increasingly apparent. Various functional requirements need to be met through the layering of different functional layers, but this generally results in high costs. For glass with HUD (Head-Up Display) functionality, multiple functional layers need to be layered on top of each other, and wedge-shaped films are used to address the issue of glass ghosting. However, because this method has very high optical requirements, custom-made wedge-shaped film molds are needed for each car model, resulting in high costs for the wedge-shaped films and significantly increasing the difficulty of production and manufacturing control. Summary of the Invention
[0003] This application provides a coated glass and a laminated glass to eliminate ghosting in the glass and improve the quality of projection display.
[0004] A first aspect of this application provides a coated glass, comprising,
[0005] Substrate;
[0006] A functional layer is disposed on the substrate;
[0007] An optical reflective layer is disposed on the side of the functional layer away from the substrate.
[0008] In some embodiments, the optical reflective layer includes at least one highly crystalline layer and at least one low-crystalline layer, the highly crystalline layer and the low-crystalline layer being alternately disposed, wherein the first highly crystalline layer is closer to the substrate than the first low-crystalline layer.
[0009] In some embodiments, the optical reflective layer is selected from one or more of the following: silicon oxide / niobium oxide composite film, silicon oxide / titanium oxide composite film, silicon oxynitride / titanium oxide composite film, silicon oxynitride / niobium oxide composite film, silicon oxide / niobium oxide / silicon oxide composite film, silicon oxide / niobium oxide / silicon oxide composite film, silicon oxide / titanium oxide / silicon oxide composite film, and silicon oxynitride / titanium oxide / silicon oxide composite film.
[0010] In some embodiments, the thickness of the optical reflective layer ranges from 50 to 800 nm.
[0011] In some embodiments, the reflectivity of the optical reflective layer is greater than or equal to 8%.
[0012] In some embodiments, the functional layer includes any one of an anti-reflective layer, an ultraviolet shielding layer, an infrared heat insulation layer, and a defogging layer.
[0013] In some embodiments, the functional layer includes a first antireflection layer, an ultraviolet isolation layer, an infrared heat insulation layer, a defogging layer, and a second antireflection layer, which are sequentially stacked in a direction away from the substrate.
[0014] In some embodiments, the coated glass satisfies any of the following conditions:
[0015] The materials of the first antireflection layer and the second antireflection layer are selected from one or more of silicon oxide, silicon oxynitride, silicon niobium oxide, titanium oxide, and titanium oxynitride, and the thickness of the first antireflection layer and the second antireflection layer ranges from 5 to 800 nm.
[0016] The material of the ultraviolet isolation layer is selected from one or more of indium oxide, zinc oxide, tin oxide, titanium oxide, zinc magnesium oxide, titanium tantalum oxide, indium tin oxide, and aluminum zinc oxide, and the thickness of the ultraviolet isolation layer ranges from 2 to 500 nm.
[0017] The material of the infrared heat insulation layer is selected from one or more of tungsten and tungsten oxide, silver, gold, palladium, silver-gold alloy, silver-palladium alloy, vanadium and vanadium oxide, iridium manganate, titanium, nickel, chromium, titanium-nickel alloy, iron-chromium alloy, cesium-doped tungsten oxide, indium tin oxide, zinc aluminum oxide, zinc tin oxide, and fluorine-doped tin oxide. The thickness of the infrared heat insulation layer ranges from 2 to 5000 nm.
[0018] The material of the defogging layer is selected from one or more of indium tin oxide, zinc aluminum oxide, zinc boron oxide, zinc gallium oxide, zinc indium gallium oxide, fluorine-doped tin oxide, silver nanomesh, and porous silver nanofilm, and the thickness of the defogging layer ranges from 10 to 1200 nm.
[0019] In some embodiments, the functional layer includes a first antireflection layer, an ultraviolet isolation layer, an infrared heat insulation layer, a first defogging layer, a second antireflection layer, a second defogging layer, and a third antireflection layer, which are sequentially stacked in a direction away from the substrate.
[0020] In some embodiments, a low-reflection hardening layer is further disposed on the side of the optical reflective layer away from the substrate. The material of the low-reflection hardening layer is selected from one or more of zirconia, tungsten oxide, nickel chromium oxide, silicon oxynitride, and aluminum oxide. The thickness of the low-reflection hardening layer ranges from 15 to 500 nm.
[0021] A second aspect of this application provides a laminated glass, comprising,
[0022] First substrate glass;
[0023] A functional layer is disposed on the first substrate glass;
[0024] The second substrate glass is disposed on the side of the functional layer away from the first substrate glass;
[0025] An optical reflective layer is disposed on the side of the second substrate glass away from the first substrate glass.
[0026] This application offers the following advantages: It provides coated glass and laminated glass, incorporating a functional layer and an optical reflective layer within the glass structure. By introducing a multi-layered, multifunctional functional layer, the functionality of the thin film on the glass surface is enhanced. Furthermore, the optical reflective layer adjusts the reflectivity of the glass's optical projection, helping to eliminate ghosting, improve brightness, and enhance the quality of the projection display. This allows for the integration of projection functionality with various optional functions such as ultraviolet isolation, electric heating, and infrared heat insulation. Additionally, the addition of a low-reflectivity hardening layer 400 and a waterproof and wear-resistant layer 500 further improves the glass structure's resistance to wear and scratches, environmental conditions, high and low temperatures, and moisture. Attached Figure Description
[0027] To more clearly illustrate the technical solutions in the embodiments of this application, the accompanying drawings used in the description of the embodiments will be briefly introduced below. Obviously, the accompanying drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.
[0028] Figure 1 An exemplary schematic diagram of a coated glass structure is shown.
[0029] Figure 2 An exemplary schematic diagram of another type of coated glass is shown.
[0030] Figure 3 An exemplary schematic diagram of another type of coated glass is shown.
[0031] Figure 4 An exemplary schematic diagram of a laminated glass structure is shown.
[0032] Figure 5 An exemplary schematic diagram of another type of laminated glass is shown.
[0033] Figure 6 An exemplary schematic diagram illustrates the sequence of steps in a glass manufacturing method.
[0034] Explanation of component markings in the attached diagram: 100-substrate, 110-first substrate glass, 120-second substrate glass, 200-functional layer, 210-dielectric layer, 220-first antireflective layer, 230-ultraviolet isolation layer, 240-infrared heat insulation layer, 250-defogging layer, 251-first defogging layer, 252-second defogging layer, 260-second antireflective layer, 270-third antireflective layer, 300-optical reflection layer, 400-low-reflection hardening layer, 500-waterproof and wear-resistant layer, 600-adhesive layer. Detailed Implementation
[0035] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. Based on the embodiments of this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application. In addition, it should be understood that the specific embodiments described herein are only for illustration and explanation of this application and are not intended to limit this application. In this application, unless otherwise stated, directional terms such as "up," "down," "left," and "right" generally refer to up, down, left, and right in the actual use or working state of the device, specifically the drawing directions in the accompanying drawings.
[0036] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined with "first" or "second" may explicitly or implicitly include at least one of that feature.
[0037] This application provides a coated glass and a laminated glass, which are described in detail below. It should be noted that the order of description of the following embodiments is not intended to limit the preferred order of the embodiments of this application. Furthermore, in the following embodiments, the descriptions of each embodiment have their own emphasis; parts not described in detail in a certain embodiment can be referred to in the relevant descriptions of other embodiments.
[0038] Please see Figure 1 An embodiment of this application provides a coated glass, including a substrate 100, a functional layer 200, and an optical reflective layer 300.
[0039] For example, the substrate 100, the functional layer 200, and the optical reflective layer 300 can be disposed sequentially. Of course, in other examples, other films and structures can also be disposed between the substrate 100 and the functional layer 200, or between the functional layer 200 and the optical reflective layer 300, and this embodiment does not constitute an undue limitation thereof.
[0040] The substrate 100 can be a planar substrate or a curved substrate, and is typically made of a transparent material. The substrate 100 can be made of materials such as glass, plexiglass, PET, PC, PMMA, or PI, and the example in this embodiment does not impose any undue limitations on its composition.
[0041] The functional layer 200 is used to implement the required functions. Here, the functional layer 200 is provided on the substrate 100 to realize the corresponding functional requirements.
[0042] An optical reflective layer 300 is disposed on the side of the functional layer 200 away from the substrate 100 so that the coated glass can meet the requirements of optical projection.
[0043] The embodiments of this application adjust the reflectivity of the glass optical projection by setting the optical reflective layer 300, which helps to eliminate ghosting and improve brightness, and improve the quality of the projection display.
[0044] In some embodiments, the optical reflective layer 300 is selected from one or more of the following: silicon oxide / niobium oxide composite film, silicon oxide / titanium oxide composite film, silicon oxynitride / titanium oxide composite film, silicon oxynitride / niobium oxide composite film, silicon oxide / niobium oxide / silicon oxide composite film, silicon oxide / niobium oxide / silicon oxide composite film, silicon oxide / titanium oxide / silicon oxide composite film, and silicon oxynitride / titanium oxide / silicon oxide composite film.
[0045] Here, A / B composite film refers to a composite film layer that simultaneously possesses two film layers: one of material A and one of material B. For example, a silicon oxide / niobium oxide composite film refers to a composite film layer that includes at least one silicon oxide film layer and at least one niobium oxide film layer. For instance, this composite film layer includes one silicon oxide film layer and one niobium oxide film layer disposed thereon. A / B / C composite film refers to a composite film layer that simultaneously possesses three film layers: one of material A, one of material B, and one of material C. For example, a silicon oxide / niobium oxide / silicon oxide composite film refers to a composite film layer that simultaneously possesses three film layers: one of silicon oxide, one of niobium oxide, and one of silicon oxide. Typically, these composite film layers include several film layers stacked sequentially in the order described in the composite film layer name. For example, a silicon oxide / niobium oxide / silicon oxide composite film is formed by sequentially stacking silicon oxide, niobium oxide, and silicon oxide film layers.
[0046] The composite film is constructed by achieving optical matching through the different refractive indices of optical materials, thereby achieving the desired optical effect. For example, it can be constructed by sequentially stacking a first high-refractive-index film layer, a low-refractive-index film layer, and a second high-refractive-index film layer, wherein the refractive indices of both the first and second high-refractive-index film layers are higher than those of the low-refractive-index film layer, and their refractive indices can be the same or different. Alternatively, it can be constructed by sequentially stacking a first low-refractive-index film layer, a high-refractive-index film layer, and a second low-refractive-index film layer, wherein the refractive indices of both the first and second low-refractive-index film layers are lower than those of the high-refractive-index film layer, and their refractive indices can be the same or different.
[0047] In some embodiments, typically, as the number of layers stacked in the optical reflective layer 300 increases, the film thickness increases, and the reflectivity increases accordingly. However, excessively thick glass will also produce other defects, such as inconvenience in use due to excessive thickness. Exemplarily, embodiments of this application may set the thickness of the optical reflective layer 300 to a range of 50 to 800 nm.
[0048] In some embodiments, the reflectivity and transmittance of the optical reflective layer 300 are controlled by a composite film layer configuration. Exemplarily, the performance of the optical reflective layer is controlled by a micro / nano structure formed through fitting and coating of optical materials.
[0049] For example, micro / nano structure refers to the degree of crystallinity of the film layer. The optical reflective layer 300 includes a highly crystalline layer and a low-crystalline layer. The low-crystalline layer is stacked on the highly crystalline layer. The highly crystalline layer is located on the side of the low-crystalline layer closer to the substrate 100, and the low-crystalline layer is located on the side of the highly crystalline layer away from the substrate 100.
[0050] During the film preparation process, the degree of crystallinity varies due to differences in pressure and the presence of dopant gases. In sputter deposition, lower pressure results in higher crystallinity, and vice versa. Furthermore, when nitrogen is used as the dopant gas, the crystallinity is higher because nitrogen does not occupy vacancies in the film's elements; conversely, oxygen results in lower crystallinity.
[0051] Therefore, during film deposition and sputtering, the degree of crystallinity of the film can be changed by adjusting the process parameters and doping gas, thereby forming a highly crystalline layer with a higher degree of crystallinity and a less crystalline layer with a lower degree of crystallinity. The highly crystalline layer has a higher degree of crystallinity than the less crystalline layer.
[0052] For example, the aforementioned A / B composite membrane can be a composite membrane layer comprising a highly crystalline layer and a low crystalline layer.
[0053] It is understood that in some embodiments, the optical reflective layer 300 may include at least one highly crystalline layer and at least one low-crystalline layer, with the highly crystalline layer and low-crystalline layer alternating. The first highly crystalline layer is closer to the substrate 100 than the first low-crystalline layer. The degree of crystallinity of each highly crystalline layer may be the same or different, and the degree of crystallinity of each low-crystalline layer may also be the same or different, but the degree of crystallinity of the highly crystalline layer is higher than that of the adjacent low-crystalline layer. For example, a first highly crystalline layer, a first low-crystalline layer, a second highly crystalline layer, and a second low-crystalline layer may be stacked sequentially. Alternatively, the aforementioned A / B / C composite film may consist of a first highly crystalline layer, a first low-crystalline layer, and a second highly crystalline layer stacked sequentially.
[0054] In some embodiments, the reflectivity of the optical reflective layer 300 is greater than or equal to 8%.
[0055] For example, reflectance can be measured using a spectrophotometer, or by using an integrating sphere to measure reflectance and obtain the sum of direct reflectance, diffuse reflectance, secondary reflectance, and multilayer reflectance. Of course, those skilled in the art can also use other methods to test reflectance, which is feasible for them.
[0056] In some embodiments, please refer to Figures 2 to 5 The aforementioned functional layer 200 includes any one of the following: antireflection layer, ultraviolet isolation layer 230, infrared heat insulation layer 240, and defogging layer 250.
[0057] The antireflective layer is used to reduce the reflectivity of the glass. For example, the material of the antireflective layer is selected from one or more of silicon oxide (SiOx), silicon oxynitride (SiNOx), silicon niobium oxide (NbSiOx), titanium oxide (TiOx), and titanium oxynitride (TiNOx).
[0058] The ultraviolet (UV) shielding layer 230 is used to block the penetration of ultraviolet rays. Exemplarily, the material of the UV shielding layer 230 is selected from one or more of indium oxide (InOx), zinc oxide (ZNOx), tin oxide (SnOx), titanium oxide (TiOX), zinc magnesium oxide (MgZnOx), titanium tantalum oxide (TaTiOx), indium tin oxide (ITO), and aluminum zinc oxide (AZO).
[0059] The infrared heat insulation layer 240 is used to reflect infrared heat and reduce infrared radiation. Exemplarily, the material of the infrared heat insulation layer 240 is selected from one or more of the following: tungsten and tungsten oxide (W&WOx), silver (Ag), gold (Au), palladium (Ba), silver-gold alloys, silver-palladium alloys, vanadium and vanadium oxide (V&VOx), iridium manganate, titanium (Ti), nickel (Ni), chromium (Cr), titanium-nickel alloys, iron-chromium alloys, cesium-doped tungsten oxide (CSXWO3), indium tin oxide (ITO), aluminum zinc oxide (AZO), zinc tin oxide (ZnSnOx), and fluorine-doped tin oxide (FTO).
[0060] The defogging layer 250 is used to achieve functions such as defogging and defrosting. Exemplarily, the defogging layer 250 is a conductive film defogging layer, which has a connected conductive film and electrodes. Applying voltage to the electrodes heats the conductive film, causing the glass surface temperature to rise, thereby achieving the defogging and defrosting functions. The material of the defogging layer 250 can be selected from one or more of indium tin oxide (ITO), aluminum zinc oxide (AZO), boron zinc oxide (BZO), gallium zinc oxide (GZO), indium gallium zinc oxide (IGZO), fluorine-doped tin oxide (FTO), silver nanomesh, and porous silver nanofilm.
[0061] In some embodiments, a dielectric layer 210 may be provided between the functional layer 200 and the substrate 100, between the functional layer 200 and the optical reflective layer 300, between each functional layer 200, and between the optical reflective layer 300 and other layers. The dielectric layer 210 is used to increase the adhesion and optical matching performance between the subsequent film layers and the substrate 100 or between each film layer.
[0062] For example, please refer to Figures 2 to 5 The material of the dielectric layer 210 is selected from one or more of silicon oxide / silicon nitride / silicon oxynitride (SiNOx), indium tin oxide (ITO), aluminum zinc oxide (AZO), boron zinc oxide (BZO), gallium zinc oxide (GZO), indium gallium zinc oxide (IGZO), fluorine-doped tin oxide (FTO), niobium oxide (NbOx), zinc tin oxide (ZnSnOx), zinc oxide (ZnOx), tin oxide (SnOx), tungsten oxide (WOx), and titanium oxide (TiOx).
[0063] In some embodiments, please refer to Figure 2 and Figure 3 A low-reflection hardening layer 400 can also be provided on the side of the optical reflective layer 300 away from the substrate 100.
[0064] The low-reflectivity hardening layer 400 is used to improve the hardness and adhesion of glass. The material of the low-reflectivity hardening layer 400 is selected from one or more of the following: zirconia (ZrOx), tungsten oxide (WOx), nickel-chromium oxide (NiCrOx), silicon oxynitride (SiNx), and aluminum oxide (AlOx). The thickness of the low-reflectivity hardening layer 400 can range from 15 to 500 nm.
[0065] In some embodiments, a waterproof and wear-resistant layer 500 is further provided on the side of the low-reflection hardening layer 400 away from the optical reflection layer 300. The waterproof and wear-resistant layer 500 is used to improve the wear resistance of the outermost part of the glass and the environmental stability inside the glass.
[0066] For example, the material of the waterproof and wear-resistant layer 500 is selected from one or more of silicon oxide (SiOx), silicon oxynitride (SiNOx), silicon oxide (Siox) and silicon nitride (SiNx) stack, titanium oxide (Tiox), titanium oxynitride (TiNOx), titanium oxide (Tiox) and titanium nitride (TiNx) stack.
[0067] In some embodiments, please refer to Figure 2 The antireflective layer includes a first antireflective layer 220 and a second antireflective layer 260. The materials and thicknesses of the first antireflective layer 220 and the second antireflective layer 260 can be the same or different. For example, the functional layer 200 includes a first antireflective layer 220, an ultraviolet isolation layer 230, an infrared heat insulation layer 240, a defogging layer 250, and a second antireflective layer 260, which are sequentially stacked in the direction away from the substrate 100.
[0068] In some embodiments, please refer to Figure 3 The antireflective layer includes a first antireflective layer 220, a second antireflective layer 260, and a third antireflective layer 270. The materials and thicknesses of the first antireflective layer 220, the second antireflective layer 260, and the third antireflective layer 270 can be the same or different. The defogging layer 250 includes a first defogging layer 251 and a second defogging layer 252. The materials and thicknesses of the first defogging layer 251 and the second defogging layer 252 can be the same or different. The functional layer 200 includes a first antireflective layer 220, an ultraviolet isolation layer 230, an infrared heat insulation layer 240, a first defogging layer 251, a second antireflective layer 260, a second defogging layer 252, and a third antireflective layer 270, which are sequentially stacked in the direction away from the substrate 100. It is understood that in other embodiments, only one antireflective layer may be provided, or more layers may be provided, or no antireflective layer may be provided. The examples in this embodiment do not constitute an undue limitation.
[0069] In some embodiments, the thickness of the first antireflective layer 220 ranges from 5 to 800 nm. When a second antireflective layer 260 and / or a third antireflective layer 270 are provided, the thicknesses of the second and third antireflective layers can also range from 5 to 800 nm. The thickness of the ultraviolet blocking layer 230 ranges from 2 to 500 nm; the thickness of the infrared heat-insulating layer 240 ranges from 2 to 5000 nm; and the thickness of the defogging layer 250 ranges from 10 to 1200 nm.
[0070] This application embodiment enhances the functionality of the glass surface film by introducing a multi-layered composite functional layer 200 into the glass structure. Furthermore, by adding an optical reflective layer 300, projection, ultraviolet isolation, electric heating, and infrared heat insulation functions are integrated. In addition, the addition of a low-reflectivity hardening layer 400 and a waterproof and wear-resistant layer 500 significantly improves the film's wear and scratch resistance, environmental resistance, high and low temperature resistance, and moisture resistance.
[0071] Accordingly, please refer to Figure 3 and Figure 4 The embodiments of this application also provide a laminated glass, which includes a first substrate glass 110, a functional layer 200, a second substrate glass 120, and an optical reflective layer 300.
[0072] The functional layer 200 is disposed on the first substrate glass 110; the second substrate glass 120 is disposed on the side of the functional layer 200 away from the first substrate glass 110; and the optical reflective layer 300 is disposed on the side of the second substrate glass 120 away from the first substrate glass 110. Exemplarily, the first substrate glass 110, the functional layer 200, the second substrate glass 120, and the optical reflective layer 300 are sequentially stacked. Furthermore, an adhesive layer 600 may be disposed between the functional layer 200 and the second substrate glass 120, and the adhesive layer 600 may be a film such as PVB / EVA / SGP / PMMA.
[0073] The first substrate glass 110 can be an outer glass, and the second substrate glass 120 can be an inner glass.
[0074] The structure of the functional layer 200, optical reflective layer 300, etc. of the laminated glass can be referred to in the aforementioned embodiments, and will not be described in detail in this embodiment.
[0075] This laminated glass enhances the functionality of the glass surface film by introducing multiple functional layers 200 with composite functions into its structure. It adds a functional coating layer and an anti-reflective layer to the side of the second substrate glass 120 close to the first substrate glass 110, and adds an optical reflection layer 300 to the side of the first substrate glass 110 away from the second substrate glass 120. This integrates projection HUD functions, ultraviolet isolation, electric heating and infrared heat insulation functions. Furthermore, the wear-resistant and waterproof layer and the hardening layer greatly improve the wear-resistant, scratch-resistant, environmentally resistant, high and low temperature resistant and water vapor resistant properties of the laminated glass.
[0076] Accordingly, embodiments of this application also provide a method for manufacturing glass for producing glass having an optical reflective layer 300. Please refer to [link to relevant documentation]. Figure 6 For example, the manufacturing method includes the following steps S1 to S9.
[0077] Step S1. Forming a dielectric layer 210.
[0078] Exemplarily, in step S1, a dielectric layer 210 is deposited on the substrate 100 by methods such as vacuum deposition or evaporation deposition. The thickness of the dielectric layer 210 is 3 to 50 nm, and its deposition material is selected from one or more of silicon oxide / silicon nitride / silicon oxynitride (SiNOx), indium tin oxide (ITO), aluminum zinc oxide (AZO), boron zinc oxide (BZO), gallium zinc oxide (GZO), indium gallium zinc oxide (IGZO), fluorine-doped tin oxide (FTO), niobium oxide (NbOx), zinc or tin-containing oxides (ZnSnOx, ZnOx, SnOx), tungsten oxide (WOx), and titanium oxide (TiOx). The dielectric layer 210 helps to increase the adhesion between the glass of the substrate 100 and the surface of the film layer thereon.
[0079] Step S2. Form the first antireflection layer 220.
[0080] Exemplarily, in step S2, a first antireflection layer 220 is deposited on the substrate 100 or the dielectric layer 210 by methods such as vacuum deposition or evaporation deposition. The thickness of this first antireflection layer is 5 to 800 nm, and the deposited material is selected from one or more of silicon oxide (SiOx), silicon oxynitride (SiNOx), silicon niobium oxide (NbSiOx), titanium oxide (TiOx), and titanium oxynitride (TiNOx). The first antireflection layer 220 helps reduce the reflectivity of the glass surface. Exemplarily, it can reduce the reflectivity of the glass surface to below 1%.
[0081] Step S3. Form an ultraviolet isolation layer 230.
[0082] Exemplarily, in step S3, an ultraviolet (UV) isolation layer 230 is deposited on the first antireflective layer 220 using methods such as vacuum deposition or evaporation deposition. The thickness of the UV isolation layer 230 is 2 to 500 nm, and its deposition material is selected from one or more of indium oxide (InOx), zinc oxide (ZNOx), tin oxide (SnOx), titanium oxide (TiOX), zinc magnesium oxide (MgZnOx), titanium tantalum oxide (TaTiOX), indium tin oxide (ITO), and aluminum zinc oxide (AZO). The UV isolation layer 230 helps to block ultraviolet rays. Exemplarily, it can block more than 99.995% of ultraviolet rays.
[0083] In this embodiment, UV protection is achieved by sputtering a UV-protective film, eliminating the need for UV-resistant materials doped into the film. The UV-protective layer 230 has one or more optical films to completely block UV rays of different wavelengths. For example, it can achieve an SPF of 50+.
[0084] Step S4. Form an infrared heat insulation layer 240.
[0085] Exemplarily, in step S4, an infrared heat-insulating layer 240 is deposited on the ultraviolet blocking layer by methods such as vacuum deposition or evaporation deposition. The thickness of the infrared heat-insulating layer 240 is 2 to 5000 nm, and its deposition material is selected from one or more of tungsten and tungsten oxide (W&WOx), silver, gold, palladium, silver-gold alloy, silver-palladium alloy, vanadium and vanadium oxide (V&VOx), iridium manganate, titanium (Ti), nickel (Ni), chromium, titanium-nickel alloy, iron-chromium alloy, cesium-doped tungsten oxide (CSXWO3), indium tin oxide (ITO), zinc aluminum oxide (AZO), zinc tin oxide (ZnSnOx), and fluorine-doped tin oxide (FTO). The infrared heat-insulating layer 240 can isolate infrared radiation. Exemplarily, it can isolate 50% to 99.7% of infrared light.
[0086] In this embodiment, an infrared reflective layer is sputtered to replace the film doped with infrared absorbing material. Doping the film with infrared absorbing material would cause the heat absorbed by the glass to continue to transfer to the other side of the glass, increasing the internal temperature. The infrared heat insulation layer 240 mainly reflects infrared energy to reduce infrared radiation heat. Especially when the glass provided in this embodiment is used in vehicles, it can achieve better heat insulation effect and prevent heat from being transferred into the vehicle.
[0087] Step S5. Form a demisting layer 250, which has electrodes.
[0088] For example, in step S5, a defogging layer 250 is deposited on the infrared heat insulation layer 240 by methods such as vacuum deposition or evaporation deposition. The thickness of the defogging layer 250 is 10 to 1200 nm, and the resistance is <80 ohms. Silver paste lines are printed on both sides of the defogging layer 250 as electrodes to achieve the voltage-based defogging function. The material of the defogging layer 250 can be selected from one or more of indium tin oxide (ITO), aluminum zinc oxide (AZO), boron zinc oxide (BZO), gallium zinc oxide (GZO), indium gallium zinc oxide (IGZO), fluorine-doped tin oxide (FTO), silver nanomesh, and porous silver nanofilm.
[0089] The defogging layer 250 heats the glass using surface heating. In some embodiments, the defogging layer 250 can also be divided into several regions by means of area laser, mask, etching, etc., and each region or several regions can be independently controlled for heating.
[0090] Here, by setting a planar defogging layer 250, better defogging and defrosting functions can be achieved through surface heating, resulting in more uniform and stable heating, and the heating power can be designed and adjusted according to actual needs.
[0091] Transparent oxide films made of materials such as ITO, AZO, FTO, and BZO possess good high conductivity and high carrier concentration. Therefore, within the film thickness and resistance range set in the embodiments of this application, they exhibit good infrared reflectivity and transparency, resulting in good low-radiation and energy-saving performance. By adjusting the resistance range of the defogging layer within 250Ω, the heating, defogging, and defrosting functions at different voltages and power levels can be fully satisfied.
[0092] Step S6. Form the second antireflection layer 260.
[0093] Exemplarily, in step S6, a second antireflective layer 260 is deposited on the defogging layer 250 by methods such as vacuum deposition or evaporation deposition. The thickness of the second antireflective layer 260 is 18 to 500 nm, and its material is selected from one or more of silicon oxide (SiOx), silicon oxynitride (SiNOx), silicon niobium oxide (NbSiOx), titanium oxide (TiOx), and titanium oxynitride (TiNOx). The presence of the second antireflective layer 260 can reduce the reflectivity of the functional layer 200. Exemplarily, after adding the second antireflective layer 260, the reflectivity of the coating surface can be reduced from 10-15% to below 2%.
[0094] Step S7. Form the optical reflective layer 300.
[0095] For example, in step S7, an optical reflective layer 300 is deposited on the second antireflective layer 260 by methods such as vacuum deposition or evaporation deposition. The thickness of the optical reflective layer 300 is 50 to 800 nm. For example, the reflectivity of the optical reflective layer 300 is greater than 8% to achieve better optical reflection projection function.
[0096] The deposition material of the optical reflective layer 300 can be selected from one or more of silicon oxide (SiOx) and niobium oxide (NbOx), silicon oxide (SiOx) and titanium oxide (TiOx), silicon oxynitride (SiNOx) and titanium oxide (TiOx), silicon oxynitride (SiNOx) and niobium oxide (NbOx), silicon oxide (SiOx) and niobium oxide (NbOx) and silicon oxide (CrOx), silicon oxide (SiNOx) and niobium oxide (NbOx) and silicon oxide (CrOx), silicon oxide (SiOx) and titanium oxide (TiOx) and silicon oxide (CrOx), silicon oxynitride (SiNOx) and titanium oxide (TiOx) and silicon oxide (CrOx).
[0097] Step S8. Form a low-reflectivity hardened layer 400.
[0098] For example, a low-reflection hardening layer 400 is deposited on the optical reflective layer 300 using methods such as vacuum deposition or evaporation deposition. The thickness of the low-reflection hardening layer 400 is 15 to 500 nm, and its material is selected from one or more of zirconia oxide (ZrOx), tungsten oxide (WOx), nickel-chromium oxide (NiCrOx), silicon oxynitride (SiNx), and aluminum oxide (AlOx). The low-reflection hardening layer 400 can improve the hardness of the glass surface and ensure the normal projection function of the optical reflective layer 300. For example, the low-reflection hardening layer 400 can make the hardness of the glass surface as high as 4H or higher.
[0099] Step S9. Form a waterproof and wear-resistant layer 500.
[0100] For example, the antireflection layer is deposited using methods such as vacuum deposition or evaporation deposition, with a film thickness of 20 to 150 nm. The material is selected from one or more of silicon oxide (SiOx), silicon oxynitride (SiNOx), silicon oxide (SiOx), and silicon nitride (SiNx), titanium oxide (TiOx), titanium oxynitride (TiNOx), titanium oxide (TiOx), and titanium nitride (TiNx). For example, when the material is silicon oxide (SiOx) and silicon nitride (SiNx), it is a composite film of silicon oxide (SiOx) and silicon nitride (SiNx).
[0101] The 500 waterproof and abrasion-resistant coating helps improve the stability of glass under normal use conditions, enhances its resistance to water and gas erosion, abrasion and scratches, and oxidation, and also helps the glass meet the standards for acid and alkali resistance and boiling water testing.
[0102] First, depositing a dielectric layer 210 on the substrate 100 helps increase the adhesion and optical matching between the subsequent functional films and the substrate 100. Depositing a first antireflective layer 220 on the dielectric layer helps reduce the reflectivity of the glass. Depositing an ultraviolet blocking layer 230 on the first antireflective layer 220 helps block the penetration of ultraviolet rays. Depositing an infrared heat-insulating layer 240 on the ultraviolet blocking layer 230 helps to reflect a large amount of infrared heat, reducing infrared radiation. Depositing an anti-fogging layer 250 on the infrared heat-insulating layer 240 allows for heating of the conductive film by applying voltage to the electrodes, raising the temperature of the glass surface and achieving anti-fogging and defrosting functions. A second antireflective layer 260 is then deposited on the antireflective layer 250 to further reduce reflectivity. An optical reflective layer 300 is then deposited on the second antireflective layer 260 to meet the requirements of optical projection. Finally, a low-reflection hardening layer 400 is deposited on the optical reflective layer 300 to ensure the hardness and adhesion performance of the film. An additional 500mm waterproof and wear-resistant layer is applied to the outermost layer to ensure the wear resistance and environmental stability of the outermost membrane.
[0103] In some embodiments, any one of the aforementioned steps S1 to S6 and S8 and S9 may be omitted. For example, at least one of steps S2 to S6 may be performed. For instance, in some embodiments, step S2 is performed to form a first antireflective layer 220 on the substrate 100, and then step S7 is performed to form an optical reflective layer 300 on the first antireflective layer 220; alternatively, steps S2, S3, and S4 may be performed sequentially followed by step S7 to form a first antireflective layer 220, an ultraviolet blocking layer, an infrared heat-insulating layer 240, and an optical reflective layer 300 that are sequentially stacked on the substrate 100.
[0104] Therefore, in some embodiments, the method of manufacturing the glass may be considered to include the steps of forming a functional layer 200 and an optical reflective layer 300 on a substrate 100.
[0105] In some embodiments, the substrate 100 may include a first glass substrate 110 and a second glass substrate 120, that is, the glass manufacturing method is used to manufacture laminated glass. In this case, the steps of forming the functional layer 200 and the optical reflection layer 300 on the substrate 100 can be refined as follows: forming the functional layer 200 on the first glass substrate 110; connecting the second glass substrate 120 to the side of the functional layer 200 away from the first glass substrate by an adhesive layer 600; and forming the optical reflection layer 300 on the side of the second glass substrate 120 away from the adhesive layer 600.
[0106] It is understood that the order described in this specification does not necessarily imply a limitation on the order in which the steps are performed. For example, the step of forming the optical reflective layer 300 may be performed before, after, or simultaneously with the step of bonding the second glass substrate 120 to the functional layer 200. The examples in this embodiment do not constitute an undue limitation.
[0107] Furthermore, in any of the above embodiments, a low-reflection hardening layer 400 and a waterproof and wear-resistant layer 500 can be sequentially formed on the side of the optical reflective layer 300 away from the substrate 100.
[0108] Application Example 1
[0109] Please see Figure 2 A coated glass is provided, comprising a substrate 100, a dielectric layer 210, a first antireflective layer 220, an ultraviolet isolation layer 230, an infrared heat insulation layer 240, a defogging layer 250, a second antireflective layer 260, an optical reflection layer 300, a low-reflection hardening layer 400, and a waterproof and wear-resistant layer 500 arranged sequentially.
[0110] Application Example 2
[0111] Please see Figure 3 A coated glass is provided, comprising a substrate 100, a dielectric layer 210, a first antireflective layer 220, an ultraviolet isolation layer 230, an infrared heat insulation layer 240, a first defogging layer 251, a second antireflective layer 260, a second defogging layer 252, a third antireflective layer 270, an optical reflection layer 300, a low-reflection hardening layer 400, and a waterproof and wear-resistant layer 500, arranged sequentially.
[0112] Here, the ultraviolet (UV) blocking layer 230 is positioned relatively close to the substrate 100, meaning it can be close to the outer layer and in contact with sunlight to block UV rays. The infrared heat-insulating layer 240 is located after the UV blocking layer 230 to block infrared energy. The first defogging layer 251 and the second defogging layer 252 are located after the UV blocking layer 230 and the infrared heat-insulating layer 242 to insulate the glass and prevent a large temperature difference between the inside of the glass and the indoor environment, thereby reducing fog formation. The anti-reflective layers help reduce the visible light reflectivity of these functional thin film layers, ensuring that strong reflections and glare are not perceived by the naked eye.
[0113] Application Example 3
[0114] Please see Figure 4A coated glass is provided, specifically a laminated glass, comprising a first glass substrate 110, a dielectric layer 210, a first antireflective layer 220, an ultraviolet isolation layer 230, an infrared heat insulation layer 240, an antifog layer 250, a second antireflective layer 260, an adhesive layer 600, a second glass substrate 120, an optical reflection layer 300, a low-reflection hardening layer 400, and a waterproof and wear-resistant layer 500, arranged sequentially.
[0115] Application Example 4
[0116] Please see Figure 5 A coated glass is provided, specifically a laminated glass, comprising a first glass substrate 110, a dielectric layer 210, a first antireflective layer 220, an ultraviolet isolation layer 230, an infrared heat insulation layer 240, a first defogging layer 251, a second antireflective layer 260, a second defogging layer 252, a third antireflective layer 270, an adhesive layer 600, a second glass substrate 120, an optical reflection layer 300, a low-reflection hardening layer 400, and a waterproof and wear-resistant layer 500, arranged sequentially.
[0117] It is understood that the terms used in the embodiments of this application have the same meaning. For any content not described in detail in a certain embodiment, the specific implementation details can be referred to the descriptions in other embodiments. The examples and technical effects shown in the foregoing embodiments can be implemented accordingly. For repeated parts, this embodiment will not elaborate further.
[0118] The coated glass and laminated glass provided in this application have been described in detail above. Specific examples have been used to illustrate the principles and implementation methods of this application. The description of the above embodiments is only for the purpose of helping to understand the method and core ideas of this application. At the same time, for those skilled in the art, there will be changes in the specific implementation methods and application scope based on the ideas of this application. Therefore, the content of this specification should not be construed as a limitation of this application.
Claims
1. A coated glass, characterized in that, include, Substrate; A functional layer is disposed on the substrate; An optical reflective layer is disposed on the side of the functional layer away from the substrate; The optical reflective layer includes at least one highly crystalline layer and at least one low-crystalline layer, which are alternately arranged, with the first highly crystalline layer being closer to the substrate than the first low-crystalline layer.
2. The coated glass according to claim 1, characterized in that, The optical reflective layer is selected from one or more of the following: silicon oxide / niobium oxide composite film, silicon oxide / titanium oxide composite film, silicon oxynitride / titanium oxide composite film, silicon oxynitride / niobium oxide composite film, silicon oxide / niobium oxide / silicon oxide composite film, silicon oxide / titanium oxide / silicon oxide composite film, and silicon oxynitride / titanium oxide / silicon oxide composite film.
3. The coated glass according to claim 1, characterized in that, The thickness of the optical reflective layer ranges from 50 to 800 nm.
4. The coated glass according to claim 1, characterized in that, The reflectivity of the optical reflective layer is greater than or equal to 8%.
5. The coated glass according to claim 1, characterized in that, The functional layer includes any one of the following: anti-reflective layer, ultraviolet isolation layer, infrared heat insulation layer, and defogging layer.
6. The coated glass according to claim 1, characterized in that, The functional layer includes a first antireflection layer, an ultraviolet isolation layer, an infrared heat insulation layer, a defogging layer, and a second antireflection layer, which are sequentially stacked in the direction away from the substrate.
7. The coated glass according to claim 6, characterized in that, The coated glass satisfies any one of the following conditions: The materials of the first antireflection layer and the second antireflection layer are selected from silicon oxide, silicon oxynitride, silicon niobium oxide, titanium oxide, and titanium oxynitride, and the thickness of the first antireflection layer and the second antireflection layer ranges from 5 to 800 nm. The material of the ultraviolet isolation layer is selected from one of indium oxide, zinc oxide, tin oxide, titanium oxide, zinc magnesium oxide, titanium tantalum oxide, indium tin oxide, and aluminum zinc oxide, and the thickness of the ultraviolet isolation layer ranges from 2 to 500 nm. The material of the infrared heat insulation layer is selected from tungsten and tungsten oxide, silver, gold, palladium, silver-gold alloy, silver-palladium alloy, vanadium and vanadium oxide, iridium manganate, titanium, nickel, chromium, titanium-nickel alloy, iron-chromium alloy, cesium-doped tungsten oxide, indium tin oxide, zinc aluminum oxide, zinc tin oxide, and fluorine-doped tin oxide. The thickness of the infrared heat insulation layer ranges from 2 to 5000 nm. The material of the defogging layer is selected from one of indium tin oxide, zinc aluminum oxide, zinc boron oxide, zinc gallium oxide, zinc indium gallium oxide, fluorine-doped tin oxide, silver nanomesh, and porous silver nanofilm, and the thickness of the defogging layer ranges from 10 to 1200 nm.
8. The coated glass according to claim 1, characterized in that, The functional layer includes a first antireflection layer, an ultraviolet isolation layer, an infrared heat insulation layer, a first defogging layer, a second antireflection layer, a second defogging layer, and a third antireflection layer, which are sequentially stacked in the direction away from the substrate.
9. The coated glass according to claim 1, characterized in that, A low-reflection hardening layer is also provided on the side of the optical reflective layer away from the substrate. The material of the low-reflection hardening layer is selected from one of zirconia, tungsten oxide, nickel chromium oxide, silicon oxynitride, and aluminum oxide. The thickness of the low-reflection hardening layer ranges from 15 to 500 nm.
10. A laminated glass, characterized in that, include, First substrate glass; A functional layer is disposed on the first substrate glass; The second substrate glass is disposed on the side of the functional layer away from the first substrate glass; An optical reflective layer is disposed on the side of the second substrate glass away from the first substrate glass; The optical reflective layer includes at least one highly crystalline layer and at least one low-crystalline layer, which are alternately arranged, with the first highly crystalline layer being closer to the substrate than the first low-crystalline layer.