Tin plating machine coating uniformity control device
By using a tin plating machine coating uniformity control device and a magnetic connection structure of rotating ring and fan-shaped parts, the problem of uneven coating caused by reduced electroplating solution component density is solved, thereby improving coating uniformity and adhesion.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- TONGLING XUN AIRCRAFT ELECTRIC CO LTD
- Filing Date
- 2025-06-16
- Publication Date
- 2026-06-09
AI Technical Summary
During the electroplating process, the density of the effective components in the electroplating solution decreases over time, affecting the structural properties of the coating. This is especially true when electroplating metal ceramics or hard alloys, where the uniformity of the coating is difficult to control.
A tin plating uniformity control device is adopted, which adjusts the discharge rate and flow rate of the tin plating solution through the rotating ring, fan-shaped parts and magnetic connection structure in the stirring tank to ensure the uniformity of the plating layer.
It achieves uniform stirring and control of tin plating solution, improves the uniformity and adhesion of the coating, and meets the coating deposition requirements of different performance requirements.
Smart Images

Figure CN224337770U_ABST
Abstract
Description
Technical Field
[0001] This application relates to the field of tin plating machine technology, and more specifically, to a device for controlling the uniformity of tin plating coating in a tin plating machine. Background Technology
[0002] Brush plating is a rapid, room-temperature electroplating method that does not require a plating bath. It relies on a plating pen to provide the plating solution needed for electrodepositing a metal coating. The plating pen can quickly deposit a metal coating wherever it goes. By changing the type of plating solution or operating parameters, metal coatings that meet different performance requirements can be deposited. Since the coating is formed by the regular stacking of metal atoms as basic units on the base metal, the coating is dense and firmly bonded to the base metal. The higher the current and the longer the time of brush plating, the thicker the coating (greater than 3-5 mm). It is precisely because brush plating can obtain metal coatings with good adhesion, large thickness, dense microstructure, and wide hardness range at the repair site that brush plating repair technology is increasingly widely used in equipment maintenance.
[0003] When electroplating certain metal ceramics or hard alloys to improve certain performance indicators of a workpiece, the requirements for the composition and structure of the electroplated layer are very strict. During the electroplating process, the effective component density of the electroplating solution generally decreases over time. If the concentration cannot be replenished in time to ensure the required concentration, it will eventually affect the structural performance of the plating layer.
[0004] To address the aforementioned issues, this application provides a device for controlling the uniformity of tin plating coating in a tin plating machine. Utility Model Content
[0005] The tin plating machine coating uniformity control device provided in this application adopts the following technical solution:
[0006] A tin plating machine coating uniformity control device includes a stirring tank. The lower end of the stirring tank is fixedly connected to a spraying component. A first annular groove is formed on the outer surface of the stirring tank, and a second annular groove is formed on the inner wall of the stirring tank. A first circular block is arranged at the center of the interior of the stirring tank. A second circular block is rotatably connected to the lower end of the first circular block. A first sector-shaped component is uniformly fixedly connected to the outer surface of the first circular block, and a second sector-shaped component is uniformly fixedly connected to the outer surface of the second circular block. An extension block is fixedly connected to the upper end of the second circular block.
[0007] Furthermore, a rotating ring is rotatably connected to the outer surface of the mixing tank, the rotating ring is rotatably engaged with the first ring groove, and a magnetic suction ring is fixedly connected to the inner wall of the rotating ring.
[0008] Through the above technical solution, the first annular groove is used to limit the rotating ring and prevent it from detaching from the outer surface of the mixing tank, and the magnetic ring is used to magnetically connect with the magnetic plate to form a whole.
[0009] Furthermore, the second sector-shaped component is attached to the lower end of the first sector-shaped component, and an arc-shaped block is fixedly connected to the outer end of the second sector-shaped component, and a magnetic suction plate is fixedly connected to the outer end of the arc-shaped block.
[0010] Through the above technical solution, the second sector component is used to block the gap between the first sector components in order to adjust the relative gap between the first sector components and the second sector component, that is, to limit the size of the gap from which the tin plating liquid is discharged.
[0011] Furthermore, the arc-shaped block is rotatably engaged with the second annular groove, and the magnetic plate is magnetically attracted to the magnetic ring.
[0012] Through the above technical solution, the arc-shaped block and the second annular groove rotate and engage, so that the second annular groove limits the arc-shaped block and prevents the second sector from detaching from the lower end of the first sector. The presence of the magnetic suction plate and the magnetic suction ring is used to connect the second sector and the rotating ring into a whole, so that the rotating ring can drive the second sector to rotate synchronously when it rotates.
[0013] Furthermore, a circular groove is formed at the center of the lower end of the first circular block, and a limiting ring groove is formed on the inner wall of the circular groove. A retaining ring is fixedly connected to the upper end of the extension block. The extension block is rotatably engaged with the circular groove, and the retaining ring is rotatably engaged with the limiting ring groove.
[0014] With the above technical solution, the circular groove is used to place the extension block, and the limiting ring groove is used to place the retaining ring. The presence of the limiting ring groove and the retaining ring is to prevent the extension block from leaving the interior of the circular groove.
[0015] In summary, this application includes the following beneficial technical effects:
[0016] This application enables the second sector to be attached to the lower end of the first sector and rotated to adjust the gap between the second sector and the first sector, thereby adjusting the rate and flow of the tin plating solution discharge. Through the magnetic connection between the magnetic ring and the magnetic plate, the rotating ring and the arc block can be connected as a whole, so that the rotation of the rotating ring can synchronously drive the second sector attached to the lower end of the first sector to rotate. Attached Figure Description
[0017] Figure 1 This is a schematic diagram of the overall structure of this application;
[0018] Figure 2 This is a schematic diagram of the mixing tank structure of this application;
[0019] Figure 3 This is a schematic diagram of the rotating ring structure of this application;
[0020] Figure 4 This is a schematic diagram of the structure of the first and second circular blocks in this application.
[0021] Explanation of the labels in the diagram:
[0022] 1. Mixing tank; 11. First annular groove; 12. Second annular groove; 2. Ejector; 3. Rotating ring; 31. Magnetic ring; 4. First circular block; 41. First sector-shaped component; 42. Circular groove; 421. Limiting annular groove; 5. Second circular block; 51. Second sector-shaped component; 511. Arc-shaped block; 5111. Magnetic plate; 52. Extension block; 521. Retaining ring. Detailed Implementation
[0023] The technical solutions in the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. All other embodiments obtained by those skilled in the art based on the embodiments of this application without creative effort are within the scope of protection of this application.
[0024] In the description of this application, it should be noted that the terms "upper," "lower," "inner," "outer," "top / bottom," etc., indicating the orientation or positional relationship are based on the orientation or positional relationship shown in the accompanying drawings, and are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this application. Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance.
[0025] In the description of this application, it should be noted that, unless otherwise expressly specified and limited, the terms "installed," "equipped with," "sleeved / connected," "connected," etc., should be interpreted broadly. For example, "connection" can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium; it can be a connection within two components. Those skilled in the art can understand the specific meaning of the above terms in this application based on the specific circumstances.
[0026] Example:
[0027] This application discloses a device for controlling the uniformity of tin plating in a tin plating machine. Please refer to [link to relevant documentation]. Figures 1-4The mixing tank includes a mixing tank 1, with a spray nozzle 2 fixedly connected to the lower end of the mixing tank 1. A first annular groove 11 is formed on the outer surface of the mixing tank 1, and a second annular groove 12 is formed on the inner wall of the mixing tank 1. A first circular block 4 is set at the center of the interior of the mixing tank 1. A second circular block 5 is rotatably connected to the lower end of the first circular block 4. A first fan-shaped component 41 is evenly fixedly connected to the outer surface of the first circular block 4. A second fan-shaped component 51 is evenly fixedly connected to the outer surface of the second circular block 5. An extension block 52 is fixedly connected to the upper end of the second circular block 5.
[0028] A rotating ring 3 is rotatably connected to the outer surface of the mixing tank 1. The rotating ring 3 is rotatably engaged with the first ring groove 11. A magnetic suction ring 31 is fixedly connected to the inner wall of the rotating ring 3.
[0029] The first annular groove 11 is used to limit the rotating ring 3 and prevent the rotating ring 3 from detaching from the outer surface of the mixing tank 1. The magnetic ring 31 is used to magnetically connect with the magnetic plate 5111 so that they are connected as a whole.
[0030] The second sector-shaped component 51 is attached to the lower end of the first sector-shaped component 41. An arc-shaped block 511 is fixedly connected to the outer end of the second sector-shaped component 51, and a magnetic suction plate 5111 is fixedly connected to the outer end of the arc-shaped block 511.
[0031] The second sector 51 is used to block the gap between the first sector 41 in order to adjust the relative gap between the first sector 41 and the second sector 51, that is, to limit the size of the gap from which the tin plating liquid is discharged.
[0032] The arc-shaped block 511 is rotatably engaged with the second annular groove 12, and the magnetic plate 5111 is magnetically engaged with the magnetic ring 31.
[0033] The arc-shaped block 511 rotates and engages with the second annular groove 12, so that the second annular groove 12 limits the arc-shaped block 511 and prevents the second sector 51 from detaching from the lower end of the first sector 41. The magnetic suction plate 5111 and the magnetic suction ring 31 are used to connect the second sector 51 and the rotating ring 3 into a whole, so that the rotating ring 3 can drive the second sector 51 to rotate synchronously when it rotates.
[0034] A circular groove 42 is provided at the center of the lower end of the first circular block 4. A limiting ring groove 421 is provided on the inner wall of the circular groove 42. A retaining ring 521 is fixedly connected to the upper end of the extension block 52. The extension block 52 is rotatably engaged with the circular groove 42, and the retaining ring 521 is rotatably engaged with the limiting ring groove 421.
[0035] The circular groove 42 is used to place the extension block 52, and the limiting ring groove 421 is used to place the retaining ring 521. The presence of the limiting ring groove 421 and the retaining ring 521 is to prevent the extension block 52 from leaving the interior of the circular groove 42.
[0036] The implementation principle of this embodiment is as follows: When it is necessary to adjust and control the uniformity of the tin plating liquid sprayed from the tin plating machine, firstly, the rotating ring 3 is rotated. Under the mutual magnetic attraction between the magnetic ring 31 and the magnetic plate 5111, the rotating ring 3 synchronously drives the arc block 511 to rotate along the second ring groove 12. At this time, the arc block 511 will drive the second sector 51 to rotate against the lower end of the first sector 41, so that the second sector 51 rotates completely into the gap between the first sector 41, thereby the second sector 51 and the first sector 41 are in a uniform position. The interaction of the fan-shaped parts 41 forms a closed loop on the inner wall of the mixing tank 1, allowing the tin plating solution to be placed inside the mixing tank 1 and stirred efficiently and evenly. When the rate of tin plating solution discharge needs to be adjusted, the rotating ring 3 is rotated again to adjust the gap between the second fan-shaped part 51 and the first fan-shaped part 41, thereby widening the gap and accelerating the rate of tin plating solution discharge. This allows the tin plating solution to flow evenly towards the ejector 2 through the gap between the second fan-shaped part 51 and the first fan-shaped part 41.
[0037] The above are all preferred embodiments of this application, and are not intended to limit the scope of protection of this application. Therefore, all equivalent changes made in accordance with the structure, shape and principle of this application should be covered within the scope of protection of this application.
Claims
1. A tinning machine coating uniformity control device, comprising a stirring barrel (1), characterized in that: The lower end of the mixing tank (1) is fixedly connected to the ejector (2). A first annular groove (11) is formed on the outer surface of the mixing tank (1). A second annular groove (12) is formed on the inner wall of the mixing tank (1). A first circular block (4) is set at the center of the interior of the mixing tank (1). A second circular block (5) is rotatably connected to the lower end of the first circular block (4). A first fan-shaped component (41) is uniformly fixedly connected to the outer surface of the first circular block (4). A second fan-shaped component (51) is uniformly fixedly connected to the outer surface of the second circular block (5). An extension block (52) is fixedly connected to the upper end of the second circular block (5).
2. The tinning machine coating uniformity control device of claim 1, wherein: A rotating ring (3) is rotatably connected to the outer surface of the mixing tank (1). The rotating ring (3) is rotatably engaged with the first ring groove (11). A magnetic suction ring (31) is fixedly connected to the inner wall of the rotating ring (3).
3. The tin plating uniformity control device according to claim 1, characterized in that: The second sector-shaped component (51) is attached to the lower end of the first sector-shaped component (41). An arc-shaped block (511) is fixedly connected to the outer end of the second sector-shaped component (51), and a magnetic suction plate (5111) is fixedly connected to the outer end of the arc-shaped block (511).
4. The tin plating uniformity control device according to claim 3, characterized in that: The arc-shaped block (511) is rotatably engaged with the second annular groove (12), and the magnetic suction plate (5111) is magnetically attracted to the magnetic suction ring (31).
5. The tin plating uniformity control device according to claim 1, characterized in that: A circular groove (42) is provided at the center of the lower end of the first circular block (4), and a limiting ring groove (421) is provided on the inner wall of the circular groove (42).
6. The tin plating uniformity control device according to claim 5, characterized in that: The upper end of the extension block (52) is fixedly connected to a retaining ring (521), the extension block (52) is rotatably engaged with the circular groove (42), and the retaining ring (521) is rotatably engaged with the limiting ring groove (421).