A plate type PECVD coating equipment carrier plate cavity external self-cleaning device and system

Abstract

The utility model relates to photovoltaic coating equipment field discloses a kind of plate type PECVD coating equipment load plate cavity outer self-cleaning device and system, the device includes the several functional chambers of being located on coating equipment load plate backhaul area and the airtight protection of four around and the load plate conveying mechanism being set in several functional chambers.Functional chamber includes the laser initial washing functional chamber, atmospheric pressure plasma cleaning functional chamber, passivation maintenance functional chamber connected in turn and the waste gas treatment room being communicated with each functional chamber.Each functional chamber is provided with gate valve and / or wind curtain of isolated spraying function of isolation function. Self-cleaning system is to carry out multilayer parallel setting or segmented serial setting according to production demand by multiple self-cleaning devices.The utility model not only can save equipment space and transportation turnover link, and improve the effective utilization of equipment.

Description

Technical Field

[0001] This utility model relates to the field of photovoltaic coating equipment, and in particular to a self-cleaning device and system for the outer cavity of a plate-type PECVD coating equipment. Background Technology

[0002] With the industrialization of flat panel displays, especially heterojunction solar cells, becoming increasingly mature, plate-type PECVD coating equipment, a key component, has gained widespread application due to its high capacity, high coating uniformity, and deposition rate. However, continuous coating in plate-type PECVD equipment inevitably leads to the accumulation of coating byproducts on the carrier and vacuum chamber, which can easily detach and cause dust contamination. Traditional plate-type PECVD coating equipment employs periodic online remote plasma chamber cleaning of the carrier and vacuum chamber for maintenance. However, due to the large amount and complex distribution of byproducts on the carrier, even with periodic cleaning, some deposits still randomly detach from the carrier in the vacuum chamber after repeated temperature and pressure changes. Furthermore, internal cleaning of the carrier inevitably increases the difficulty of self-cleaning the chamber and the online cleaning time. Typically, such internal cleaning maintenance accounts for 10% of the total equipment uptime, reducing equipment utilization. Some equipment on the market also uses independent equipment for wet external cleaning, such as cleaning with chemical solutions followed by rinsing with deionized water (DI water) and finally drying. While the cleaning is thorough and avoids contaminating the internal environment, it also increases equipment space and transportation and turnover, thereby increasing production costs. It also adds a wastewater treatment process, resulting in a large volume of wastewater discharge, high treatment difficulty, and increased treatment costs. Utility Model Content

[0003] The purpose of this invention is to address the shortcomings of existing carrier plate cleaning technologies and to provide a self-cleaning device and system for the outer cavity of a plate-type PECVD coating equipment carrier plate. This system not only provides thorough and efficient cleaning but also avoids the problems of existing technologies, such as occupying equipment startup time, increasing the difficulty of cavity self-cleaning, and increasing production costs.

[0004] To achieve the above objectives, the present invention adopts the following technical solution:

[0005] This utility model discloses a self-cleaning device for the outer cavity of a plate-type PECVD coating equipment. The device includes several functional chambers located on the return area of ​​the coating equipment's plate and sealed on all sides, as well as a plate conveying mechanism disposed in the several functional chambers. The functional chambers include a laser initial cleaning functional chamber, an atmospheric pressure plasma cleaning functional chamber, a passivation maintenance functional chamber, and an exhaust gas treatment chamber connected in sequence to each functional chamber. Each functional chamber is provided with a door valve for isolation and / or an air curtain for isolation spraying.

[0006] Furthermore, the exhaust gas treatment chamber includes a general exhaust gas treatment chamber for filtering solid particles, dust, and treating gases to render them harmless; a fluorine-based media recycling treatment chamber for converting fluorine-containing gases; and a negative pressure pump for exhausting gas. The fluorine-based media recycling treatment chamber includes an inlet pipe, an independent fluorine-based media treatment device, a fluorine-based media recovery unit, and a waste outlet. The independent fluorine-based media treatment device is connected to the exhaust outlet of the atmospheric pressure plasma cleaning functional chamber via the inlet pipe to receive fluorine-containing cleaning exhaust gas. One end of the independent fluorine-based media treatment device is connected to the fluorine-based media recovery unit to send the extracted fluorine-based media into the recovery unit, and the other end is connected to the general exhaust gas treatment chamber via the waste outlet to further treat the defluorinated exhaust gas. The fluorine-based media recovery unit is connected to the inlet of the atmospheric pressure plasma cleaning functional chamber via a pipe for recycling the fluorine-based media.

[0007] Furthermore, the shell of the fluorine-based medium circulation treatment chamber is a double-layer nickel-copper alloy sealed protective cover.

[0008] Furthermore, the laser pre-cleaning functional room includes a laser chamber, which is isolated from the coating equipment and the atmospheric pressure plasma cleaning functional room by a door valve and an air curtain; the laser chamber is equipped with a laser machine and a laser exhaust port, the laser machine is located above the carrier plate conveying mechanism, and the laser machine is equipped with a dust removal hood for electrostatic dust removal; the laser exhaust port is located below the carrier plate conveying mechanism and is connected to the ordinary waste gas treatment room.

[0009] Furthermore, the shell of the laser chamber is a single-layer stainless steel or aluminum alloy sealed protective cover; there are two laser chambers, namely a transverse laser chamber for transverse laser cleaning and a longitudinal laser chamber for longitudinal laser cleaning. The transverse laser chamber is equipped with several transversely moving laser heads, and the longitudinal laser chamber is equipped with several longitudinally moving laser heads; the laser is a high-power green laser.

[0010] Furthermore, the atmospheric pressure plasma cleaning functional chamber includes a plasma cleaning chamber; the plasma cleaning chamber is equipped with several plasma cleaning generators, and a cleaning rectifier is installed below the plasma cleaning generators. The gas source for the plasma cleaning generators is NF3.

[0011] Furthermore, the shell of the plasma cleaning chamber is a double-layer nickel-copper alloy sealed protective cover; a partition cavity is formed between the double protective covers; the inner wall of the plasma cleaning chamber is provided with a fluorine corrosion resistant coating; a cleaning exhaust port connected to the fluorine-based medium circulation treatment chamber is provided in the plasma cleaning chamber; and a partition exhaust port connected to the ordinary waste gas treatment chamber is provided in the partition cavity.

[0012] Furthermore, there are two plasma cleaning chambers: a main plasma cleaning chamber for coarse plasma cleaning and a secondary plasma cleaning chamber for fine plasma cleaning; the main plasma cleaning chamber and the secondary plasma cleaning chamber are interconnected.

[0013] Furthermore, the shell of the passivation and maintenance chamber is a single-layer stainless steel or aluminum alloy sealed protective cover.

[0014] Furthermore, the passivation and maintenance functional chamber includes a passivation functional chamber and a maintenance functional chamber.

[0015] The passivation chamber is equipped with several plasma passivation generators and a passivation rectifier shroud located below the plasma passivation generators; the gas source for the plasma passivation generators is O2 and N2.

[0016] An air curtain is provided between the plasma passivation generators.

[0017] A door valve and an air curtain are installed between the passivation function chamber and the maintenance function chamber.

[0018] The maintenance chamber is equipped with several maintenance rectifiers for introducing maintenance ions and maintenance atmosphere.

[0019] This utility model also discloses a self-cleaning system for the outer cavity of a plate-type PECVD coating equipment, which includes two sets of the above-mentioned self-cleaning devices for the outer cavity of the plate-type PECVD coating equipment, several lifting mechanisms and a conveyor line.

[0020] The two self-cleaning devices are arranged in parallel on two levels, with the head and tail ends of the self-cleaning devices connected to conveyor lines. The conveyor lines are connected to the inlet and outlet ends of the coating equipment through a lifting mechanism.

[0021] Alternatively, the two self-cleaning devices can be set up in segments and in series; the two self-cleaning devices are connected end to end, and a conveyor line for conveying the carrier plates to be cleaned and the carrier plates after cleaning is also set below; the inlet and outlet of the self-cleaning device are connected to the conveyor line, the inlet end and the outlet end of the coating equipment through lifting mechanisms at the beginning and end of the self-cleaning device, respectively.

[0022] This utility model has at least the following technical effects:

[0023] (1) This utility model is installed on the carrier plate return area of ​​the coating equipment. After each coating, the carrier plate can be cleaned and maintained in a timely manner during return, avoiding pollution caused by random shedding of the carrier plate due to the accumulation of deposits. This improves the coating quality, extends the service life of the carrier plate, and solves the problem of cross-contamination of the carrier plate during continuous coating of different process film layers in plate PECVD coating equipment. Compared with the existing external cleaning technology, it does not require a separate carrier plate cleaning device, saving equipment space and transportation turnover links. Compared with the existing internal cleaning technology, it has the following advantages: it does not increase the self-cleaning maintenance time of the coating equipment, reduces the difficulty of internal self-cleaning, saves equipment maintenance time, and improves the effective utilization rate of the equipment.

[0024] (2) This utility model adopts an external atmospheric pressure dry cleaning method, which is more efficient and energy-saving than the existing internal vacuum cleaning technology; and more environmentally friendly and emission-reducing than the external carrier plate wet cleaning technology.

[0025] (3) This utility model is equipped with a waste gas treatment chamber to realize the recycling of fluorine-based cleaning media. Compared with the existing fluorine-based cleaning technology, it has the advantage of turning fluorine-based disposable cleaning products into recyclable fluorine-based cleaning media, which saves expensive materials and is environmentally friendly. Attached Figure Description

[0026] To more clearly illustrate the technical solutions of the embodiments of this utility model, the drawings used in the embodiments will be briefly introduced below. It should be understood that the following drawings only show some embodiments of this utility model and should not be regarded as a limitation on the scope. For those skilled in the art, other related drawings can be obtained based on these drawings without creative effort.

[0027] Figure 1 This is a schematic diagram of the overall structure of Embodiment 1.

[0028] Figure 2 This is a schematic diagram of the laser pre-washing chamber in Example 1.

[0029] Figure 3 This is a schematic diagram of the atmospheric pressure plasma cleaning functional chamber in Example 1.

[0030] Figure 4 This is a schematic diagram of the passivation chamber and the maintenance chamber in Example 1.

[0031] Figure 5 This is a simplified structural diagram of the self-cleaning device in Embodiment 2.

[0032] Figure 6 This is the self-cleaning system with segmented serial configuration in Embodiment 4.

[0033] Figure 7 This is the self-cleaning system with two parallel layers arranged in the upper and lower parts, as described in Example 5.

[0034] Explanation of key component symbols:

[0035] 1. Carrier plate conveying mechanism;

[0036] 2. Laser pre-cleaning chamber; 21. Horizontal laser chamber; 22. Vertical laser chamber; 23. Laser head;

[0037] 3. Atmospheric pressure plasma cleaning chamber; 31. Plasma cleaning generator; 32. Cleaning rectifier; 33. Main plasma cleaning chamber; 34. Secondary plasma cleaning chamber.

[0038] 4. Passivation functional chamber; 41. Plasma passivation generator; 42. Passivation rectifier;

[0039] 5. Maintenance function room; 51. Maintenance fairing;

[0040] 6. Septum cavity;

[0041] 71. First valve; 72. Second valve; 73. Third valve; 74. Fourth valve; 75. Fifth valve.

[0042] 81. First wind curtain; 82. Second wind curtain; 83. Third wind curtain; 84. Fourth wind curtain; 85. Fifth wind curtain; 86. Sixth wind curtain;

[0043] 9. Passivation and maintenance functional chamber;

[0044] 10. First self-cleaning device; 20. Second self-cleaning device; 30. Conveyor line; 40. First lifting mechanism; 50. Second lifting mechanism; 60. Third lifting mechanism; 70. Fourth lifting mechanism; 80. Fifth lifting mechanism. Detailed Implementation

[0045] To make the objectives, technical solutions, and advantages of the embodiments of this utility model clearer, the technical solutions of the embodiments of this utility model will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this utility model, not all embodiments. Based on the embodiments of this utility model, all other embodiments obtained by those skilled in the art without creative effort are within the protection scope of this utility model.

[0046] In this utility model, unless otherwise stated, directional terms such as "up," "down," "left," and "right" are generally understood in conjunction with the accompanying drawings and the directions shown in actual applications.

[0047] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of this utility model, "a plurality of" means two or more, unless otherwise explicitly specified.

[0048] In this utility model, unless otherwise explicitly specified and limited, "above" or "below" the second feature can mean that the first feature is in direct contact with the second feature, or that the first feature is in indirect contact through an intermediate medium. Furthermore, "above," "on top of," and "over" the second feature can mean that the first feature is directly above or diagonally above the second feature, or simply that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" the second feature can mean that the first feature is directly below or diagonally below the second feature, or simply that the first feature is at a lower horizontal level than the second feature.

[0049] The endpoints and any values ​​of the ranges disclosed herein are not limited to the precise ranges or values, and should be understood to include values ​​close to these ranges or values. For numerical ranges, the endpoint values ​​of the various ranges, the endpoint values ​​of the various ranges and individual point values, and individual point values ​​can be combined with each other to obtain one or more new numerical ranges, which should be considered as specifically disclosed herein. The terms "optional" and "discretionary" mean that they may or may not be included (or may or may not be present).

[0050] like Figure 1 As shown, this embodiment discloses a self-cleaning device for the outer cavity of a plate-type PECVD coating equipment. The device includes several functional chambers located on the plate return area of ​​the coating equipment and sealed on all sides, as well as a plate conveying mechanism 1 disposed in the several functional chambers.

[0051] The functional rooms include, in sequence, a laser pre-cleaning functional room 2, an atmospheric pressure plasma cleaning functional room 3, a passivation functional room 4, a maintenance functional room 5, and an exhaust gas treatment room connected to each functional room. Each functional room is equipped with a door valve for isolation and / or an air curtain for isolation spraying.

[0052] In this embodiment, a first valve 71 is provided at the connection between the outlet of the coating equipment carrier plate and the laser pre-cleaning chamber 2; a second valve 72 is provided at the connection between the laser pre-cleaning chamber 2 and the atmospheric pressure plasma cleaning chamber 3; a third valve 73 is provided at the connection between the atmospheric pressure plasma cleaning chamber 3 and the passivation chamber 4; a fourth valve 74 is provided at the connection between the passivation chamber 4 and the maintenance chamber 5; and a fifth valve 75 is provided at the connection between the maintenance chamber 5 and the inlet of the coating equipment carrier plate.

[0053] Specifically, the exhaust gas treatment chamber (not shown in the attached diagram) includes a general exhaust gas treatment chamber for filtering solid particles, smoke, and treating gases to render them harmless; a fluorine-based medium circulation treatment chamber for converting fluorine-containing gases; and a negative pressure pump for exhausting gases. The general exhaust gas treatment chamber filters and purifies the incoming general exhaust gas before releasing it into the atmosphere.

[0054] The fluorine-based media recycling chamber includes an inlet pipe, an independent fluorine-based media treatment unit, a fluorine-based media recovery unit, and a waste outlet. The independent fluorine-based media treatment unit is connected to the exhaust port of the atmospheric pressure plasma cleaning chamber 3 via the inlet pipe, and is used to receive the fluorine-containing cleaning waste gas. One end of the independent fluorine-based media treatment unit is connected to the fluorine-based media recovery unit, used to send the extracted fluorine-based media into the recovery unit; the other end is connected to the ordinary waste gas treatment chamber via the waste outlet, for further treatment of the defluorinated waste gas. The fluorine-based media recovery unit is connected to the inlet of the atmospheric pressure plasma cleaning chamber via a pipe for the recycling of the fluorine-based media. The fluorine-based media recycling chamber uses a dry absorption and desorption method to collect the SiF4 tail gas and other fluorine-containing gases generated from the self-cleaning device. Plasma catalytic oxidation technology is used to replace the F-containing gas from the SiF4 and send it back to the gas supply source of the atmospheric pressure plasma generator, realizing the recycling of the fluorine-based cleaning media.

[0055] Because fluorinated media are toxic and highly corrosive, the shell of the fluorinated media circulation treatment chamber is a double-layered, sealed nickel-copper alloy protective cover. A partition cavity 6 is formed between the two protective covers, providing double protection to prevent the fluorinated media from leaking into the atmosphere. The interior of the fluorinated media circulation treatment chamber is also equipped with a fluorine-resistant coating.

[0056] Specifically, such as Figure 2 As shown, the laser pre-cleaning chamber 2 includes a laser cavity. A first air curtain 81 is installed at the outlet of the first valve 71, and a second air curtain 82 is installed at the inlet of the second valve 72. The isolation and blocking by the valves and air curtains effectively prevent toxic gases, plasma, and other waste gases from flowing into the external environment and causing air pollution. Simultaneously, it also isolates the cleaning medium from the atmospheric pressure plasma cleaning chamber 3 from entering the laser cavity.

[0057] The laser chamber is enclosed by a single-layer stainless steel or aluminum alloy sealed protective cover. The laser chamber contains a laser machine and a laser exhaust port. The laser machine is located above the carrier plate conveying mechanism 1 and is equipped with a dust removal hood for electrostatic dust removal. The laser exhaust port is located below the carrier plate conveying mechanism 1 and is connected to the ordinary waste gas treatment chamber.

[0058] In this embodiment, two laser chambers are provided: a transverse laser chamber 21 for transverse laser cleaning and a longitudinal laser chamber 22 for longitudinal laser cleaning. The transverse laser chamber 21 contains several transversely moving laser heads 23, and the longitudinal laser chamber 22 contains several longitudinally moving laser heads 23. A high-power green laser is used. Using both the transverse and longitudinal laser chambers 21 and 22 in a separate configuration simplifies the internal structure of the laser chambers, reduces the failure rate of the device, and speeds up operation, thereby improving the efficiency of laser cleaning. Combined with the return mechanism of the PECVD coating equipment, its spatial length is sufficient to match the lengths of the two laser chambers.

[0059] During use, the front and sides of the main frame of the carrier plate and the front of the sub-carrier plate are pre-cleaned using a high-energy laser with vaporizable silicon material through the transverse laser chamber 21 and the longitudinal laser chamber 22, removing the surface deposits. A combination of ion and electrostatic dust removal is then used to remove the fumes generated by the laser vaporization or combustion of the silicon material, preventing secondary pollution. A high-power green laser is preferred.

[0060] Specifically, such as Figure 3 As shown, the atmospheric pressure plasma cleaning functional chamber 3 includes a plasma cleaning chamber. Several plasma cleaning generators 31 are installed in the plasma cleaning chamber, and a cleaning rectifier 32 is installed below the plasma cleaning generators 31. The gas source for the plasma cleaning generators 31 is NF3.

[0061] Because fluorine-based media are toxic and highly corrosive, the plasma cleaning chamber is enclosed by a double-layered Monel 400 nickel-copper alloy sealed protective cover. A partition cavity 6 is formed between the two protective covers. The inner wall of the plasma cleaning chamber is coated with a fluorine-resistant coating. A cleaning waste outlet is provided inside the plasma cleaning chamber, which is connected to the fluorine-based media circulation treatment chamber. The fluoride exhaust gas generated during plasma cleaning is treated in the fluorine-based media circulation treatment chamber to generate solid oxides, which are then separated. The fluorine-containing gas is then introduced into the plasma cleaning generator 31 and recycled as the plasma cleaning medium.

[0062] The partition chamber 6 is equipped with a partition exhaust port that connects to the ordinary exhaust gas treatment chamber. Although a small amount of fluorine-containing gas may leak into the partition chamber 6 from the plasma cleaning chamber, the content is low and can be treated by the ordinary exhaust gas treatment chamber, thus reducing exhaust gas treatment costs.

[0063] In this embodiment, two plasma cleaning chambers are provided: a main plasma cleaning chamber 33 for coarse plasma cleaning and a secondary plasma cleaning chamber 34 for fine plasma cleaning. The main plasma cleaning chamber 33 and the secondary plasma cleaning chamber 34 are interconnected. The coordinated cleaning by the main and secondary plasma cleaning chambers allows for rapid cleaning with high intensity followed by fine cleaning with low intensity. This synergy not only increases cleaning efficiency but also allows for independent control of the two plasma cleaning chambers, enhancing the convenience of plasma control. The gas volume can be adjusted according to cleaning requirements, improving the cleaning effect and reducing plasma consumption. Combined with the return mechanism of the PECVD coating equipment, its spatial length is sufficient to match the length of the two laser chambers.

[0064] In use, fluorine-containing source gases such as NF3 are introduced into several plasma cleaning generators 31 to generate high-energy fluorine-containing plasma. Through several cleaning rectifiers 32, in-situ and remote directional flow combined fine cleaning is achieved by the interaction of the carrier plate pulse electric field and the pulsating negative cavity pressure. The preferred range of pulsating negative cavity pressure is -10Pa to -100Pa, and the pulsation period is 4s to 30s. The pump that generates the pulsating negative cavity pressure adopts frequency conversion control.

[0065] Specifically, such as Figure 4 As shown, the passivation chamber 4 is equipped with a third air curtain 83 at the outlet of the third valve 73 and a fourth air curtain 84 at the inlet of the fourth valve 74. The third air curtain 83 not only isolates the cleaning medium from the plasma cleaning chamber but also sprays the carrier plate after cleaning in the plasma cleaning chamber to remove the fluorine-based medium adhering to the carrier plate. This not only facilitates the subsequent passivation process but also prevents leakage of the fluorine-based medium. The fourth air curtain 84 is mainly used to isolate the passivation plasma and spray to remove the passivation plasma adhering to the carrier plate.

[0066] The passivation chamber 4 is equipped with several plasma passivation generators 41 and a passivation rectifier 42 located below the plasma passivation generators 41; wherein, the gas source of the plasma passivation generators 41 is O2, N2, etc.

[0067] In this embodiment, two plasma passivation generators 41 are installed in the passivation chamber 4 to passivate the carrier plate. A fifth air curtain 85 is installed between the two plasma passivation generators 41 to isolate the plasma between them, making the passivation easier to control.

[0068] In use, O2 and N2 gas sources generate N-rich gas through plasma passivation generator 41. + With part of O +Combining plasma, through several passivation rectifiers 42, and in conjunction with the interactive transformation of the carrier plate's pulsed electric field and pulsating negative cavity pressure, achieves all-round surface passivation modification of the aluminum alloy carrier plate, increasing surface density and hardness, reducing the over-cleaning of the carrier plate by NF3 to generate AlF3, and reducing the release of impurities from surface pores. The preferred range of pulsating negative cavity pressure is -10Pa to -100Pa, with a pulsation period of 4s to 30s. The pump generating the pulsating negative cavity pressure adopts frequency conversion control. The carrier plate needs to be sprayed and scrubbed by the third air curtain 83 and the fourth air curtain 84 before and after plasma passivation treatment.

[0069] Specifically, such as Figure 4 As shown, the maintenance function chamber 5 is equipped with a sixth air curtain 86 at the outlet of the fourth valve 74, which works in conjunction with the fifth air curtain 85 to isolate the passivation plasma and spray to remove the passivation plasma attached to the carrier plate, preventing the passivation plasma from leaking.

[0070] The maintenance chamber 5 is equipped with several maintenance rectifiers 51. Maintenance ions and maintenance atmosphere are introduced into the maintenance rectifiers 51 to replace the surface pore gas.

[0071] In this embodiment, the surface pore gas replacement method is as follows: under a clean environment atmosphere, a trace amount of H2 is used. + A gas mixture with hydrogen atoms is used to displace the gas in the pores of the carrier plate surface; the clean environment atmosphere is as follows: temperature: 22 ℃~26 ℃, atmospheric pressure: 86 kPa~106 kPa, relative humidity: 40 %~60%, ozone concentration: not greater than 20μg / m3, cleanliness level: ISO1000.

[0072] Since the passivation chamber 4 and maintenance chamber 5 do not contain toxic gases, their shells are constructed using low-cost single-layer stainless steel or aluminum alloy sealed protective covers. The exhaust outlets of the passivation chamber 4 and maintenance chamber 5 are connected to the ordinary exhaust gas treatment chamber.

[0073] In this embodiment, compressed air is used as the isolation gas in the air curtain. Preferably, the quality grade of the compressed air should meet the requirements of ISO 8573.1 (GB / T 13277-1) class 1.2.2.

[0074] In order to ensure that the exhaust gas in each functional chamber can smoothly enter the exhaust gas treatment chamber, the negative pressure pump in the exhaust gas treatment chamber draws each chamber to a slightly negative pressure. The preferred range of negative pressure difference from normal pressure is -10Pa to -100Pa.

[0075] Depending on the length of the coating equipment and the cleanliness requirements of the carrier plate, the number of laser pre-cleaning chamber 2, atmospheric pressure plasma cleaning chamber 3, and passivation chamber 4 can be increased.

[0076] In this embodiment, a laser suitable for removing large or strongly adhered residues is first used to clean the carrier substrate. The high-energy laser beam instantly vaporizes or peels off deposits (such as amorphous / microcrystalline silicon films or doped amorphous / microcrystalline silicon films) from the substrate surface. Then, plasma cleaning is performed, using ion bombardment and chemical reactions to remove fine particles, organic matter, or debris from the laser cleaning process, while simultaneously activating the substrate surface. Laser cleaning and plasma cleaning complement each other and are both essential. Laser cleaning is preferred over plasma cleaning to avoid surface roughness caused by plasma pretreatment, which could affect the laser's effectiveness.

[0077] In terms of location, the self-cleaning device is set on the carrier plate return area of ​​the coating equipment and is located outside the cavity. Compared with the existing external cleaning technology, it does not require a separate carrier plate cleaning device, saving equipment space and transportation and turnover links. Compared with the existing internal cleaning technology, it has the following advantages: it does not increase the self-cleaning maintenance time of the coating equipment, reduces the difficulty of internal self-cleaning, saves equipment maintenance time, and improves the effective utilization rate of the equipment.

[0078] Example 2:

[0079] like Figure 5 As shown, this embodiment discloses a self-cleaning device for the outer cavity of a plate-type PECVD coating equipment. The device includes several functional chambers located on the plate return area of ​​the coating equipment and sealed on all sides, as well as a plate conveying mechanism 1 disposed in the several functional chambers.

[0080] The functional rooms include, in sequence, a laser pre-cleaning functional room 2, an atmospheric pressure plasma cleaning functional room 3, a passivation and maintenance functional room, and an exhaust gas treatment room connected to each functional room. Each functional room is equipped with a door valve for isolation and / or an air curtain for isolation spraying.

[0081] In this embodiment, the passivation and maintenance function chamber is equipped with several plasma passivation generators, and a passivation and maintenance hood 51 is installed below each plasma passivation generator. Air curtains are installed between adjacent plasma passivation generators, and air curtains are installed at both ends of the passivation and maintenance function chamber to reduce gas mixing and escape during carrier plate transport.

[0082] The passivation maintenance hood 51 is connected to a plasma passivation gas source via a plasma passivation generator, and the passivation maintenance hood 51 is connected to maintenance ions and maintenance atmosphere away from the plasma passivation generator.

[0083] Specifically, the plasma passivation gas source is O2 and N2. The maintenance ions are trace amounts of H2. + A gas mixture with hydrogen atoms. The maintenance atmosphere is a clean environment: temperature: 22℃~26℃, atmospheric pressure: 86 kPa~106 kPa, relative humidity: 40%~60%, ozone concentration: not greater than 20 μg / m³. 3Cleanliness level: ISO 1000.

[0084] In use, the plasma passivation gas source generates N-rich gas through the plasma passivation generator 41. + With part of O + Combining plasma, through several passivation maintenance rectifiers 51, and in conjunction with the interactive transformation of the carrier plate's pulsed electric field and pulsating negative cavity pressure, achieves all-round surface passivation modification of the aluminum alloy carrier plate, increasing surface density and hardness, reducing the over-cleaning of the carrier plate by NF3 to generate AlF3, and reducing the release of impurities from surface pores. The preferred range of pulsating negative cavity pressure is -10Pa to -100Pa, with a pulsation period of 4s to 30s. The pump generating the pulsating negative cavity pressure adopts frequency conversion control.

[0085] After passivation is completed, the plasma passivation gas source is turned off. After being cleaned by air curtain spray, the maintenance ions and maintenance atmosphere are turned on. Through several passivation maintenance rectifiers 51, under the maintenance atmosphere, maintenance ions are used to replace the gas in the pores of the carrier plate surface to achieve carrier plate maintenance.

[0086] The difference between this embodiment and Embodiment 1 is that this embodiment combines the passivation chamber 4 and the maintenance chamber 5 into a single passivation and maintenance chamber, simplifying the device cavity. Apart from the above features, the other technical features are the same as in Embodiment 1.

[0087] This embodiment is a simplified version of the self-cleaning device, suitable for situations where there are space requirements for the equipment.

[0088] Example 3:

[0089] like Figures 1 to 4 As shown, this embodiment discloses a self-cleaning method using the self-cleaning device outside the carrier cavity of a plate-type PECVD coating equipment as described in Embodiments 1 and 2. It utilizes the carrier return area of ​​the plate-type PECVD coating equipment to form several enclosed functional chambers. During carrier return, an external dry cleaning method combining physical and chemical cleaning techniques is used to remove deposits generated on the carrier during coating. This method includes a full-mode cleaning method and an optimized-mode cleaning method. Carriers used in the coating equipment must undergo either a full-mode cleaning method or an optimized-mode cleaning method before they can be reused in the coating equipment.

[0090] During self-cleaning, a full-mode cleaning method is used to clean the carrier plate once before it is sent to the coating equipment. After use in the coating equipment, when the carrier plate is transferred back to the return area, an optimized-mode cleaning method is used to clean it once before it is sent to the coating equipment. This cycle is repeated n times, followed by a full-mode cleaning, where n ranges from 2 to 20. For example, when n=2, the carrier plate returned for the first time is cleaned using the full-mode cleaning method and then sent to the coating equipment. The carrier plate returned for the second time is cleaned using the optimized-mode cleaning method and then sent to the coating equipment. The carrier plate returned for the third time is also cleaned using the optimized-mode cleaning method and then sent to the coating equipment. The carrier plate returned for the fourth time is cleaned using the full-mode cleaning method and then sent to the coating equipment. This cycle continues alternately.

[0091] Specifically, the full-mode cleaning method is as follows:

[0092] First, laser cleaning is performed: In the laser pre-cleaning chamber 2, the front and sides of the main frame of the carrier plate returned from the coating equipment and the front of the sub-carrier plate are pre-cleaned with a high-energy laser to remove the surface adhering layer. Then, the smoke and dust generated by laser vaporization or combustion of silicon material are removed by a combination of ion and electrostatic dust removal to avoid secondary pollution.

[0093] Next, atmospheric pressure plasma cleaning is performed: NF3 or other fluorine-containing source gases are introduced into the plasma cleaning generator 31 to generate high-energy fluorine-containing plasma. This, combined with the interactive transformation of the carrier plate's pulsed electric field and pulsating negative cavity pressure, achieves a fine cleaning process that combines in-situ and remote directional flow, removing residues and dead zones from high-energy laser cleaning. This includes, for example, the p-layer, n-layer, and I-layer deposits generated during each coating process.

[0094] The cleaned carrier plate is then isolated and passivated: several atmospheric pressure plasma generators are used to produce N-rich plasma. + With part of O + Combining plasma with the interactive transformation of pulsed electric field and pulsating negative cavity pressure on the carrier plate achieves all-round surface passivation modification of aluminum alloy carrier plates, increasing surface density and hardness, reducing the over-cleaning of the carrier plate by NF3 to generate AlF3, and reducing the release of impurities from surface pores. The carrier plate needs to be purged with isolation gas before and after plasma passivation treatment.

[0095] Finally, perform carrier plate maintenance: in a clean environment, use a small amount of H... + A gas mixture of hydrogen atoms is used to displace the gas in the pores of the carrier plate surface; the clean environment atmosphere is as follows: temperature: 22 ℃~26 ℃, atmospheric pressure: 86 kPa~106 kPa, relative humidity: 40%~60%, ozone concentration: not greater than 20 μg / m³. 3 Cleanliness level: ISO 1000.

[0096] After maintenance, the substrate is sent to the coating equipment for use.

[0097] Because laser cleaning in the full-mode cleaning method thoroughly cleans the adhering substances on the i-layer, the carrier board is also isolated and passivated after cleaning to extend its service life.

[0098] Specifically, the optimized pattern cleaning method is as follows:

[0099] Laser cleaning is not used. Instead, the laser pre-cleaning chamber 2 is used as a buffer isolation chamber. The carrier plates returned from the coating equipment are directly cleaned using atmospheric pressure plasma to remove island-like deposits and looser upper layers of the i, in, or p layers generated during coating. A small amount of the i-layer is retained as a protective layer for the aluminum alloy carrier plate. Due to the presence of a small amount of the i-layer, the optimized cleaning method can omit plasma passivation treatment. Only harmless spraying, isolation and gas washing treatment, and surface pore gas replacement maintenance are performed on the carrier plates. The carrier plates are then sent to the coating equipment for use.

[0100] To reduce pollution and lower costs through energy recovery, both the full-mode and optimized-mode processes involve waste gas recycling during cleaning: a dry absorption and desorption method is used to collect the SiF4 tail gas and other fluorine-containing gases generated during cleaning from this device. Plasma catalytic oxidation technology is used to replace the F-containing gas from SiF4, which is then recovered by the collector and sent back to the gas supply source of the atmospheric pressure plasma generator, thus realizing the recycling of the fluorine-based cleaning medium.

[0101] This embodiment employs a thorough full-mode cleaning followed by several simplified optimized-mode cleanings. The optimized modes omit laser cleaning and plasma passivation, removing only the loose, island-like deposits generated during each coating process, while retaining a small amount of denser, flat underlayer as a protective layer for the alloy carrier, and performing surface pore gas replacement maintenance. After each coating cycle, the carrier is promptly cleaned and maintained during return, preventing contamination caused by random shedding of accumulated deposits, thus improving coating quality and resolving the issue of cross-contamination during continuous coating of different process layers in plate-type PECVD coating equipment. By combining the optimized and full-mode cleaning methods, the cleaning process is simplified, energy consumption is reduced, and cleaning costs are saved while maintaining the desired cleaning effect. This approach is more streamlined and efficient than existing cleaning technologies.

[0102] The entire cleaning process uses dry cleaning, which is more environmentally friendly and reduces emissions compared to wet cleaning technology for the external carrier plate.

[0103] This embodiment also employs waste gas treatment and recycling to achieve the recycling of fluorine-based cleaning media. Compared with existing fluorine-based cleaning technologies, it has the advantage of transforming disposable fluorine-based cleaning products into recyclable fluorine-based cleaning media, which saves expensive materials and is environmentally friendly.

[0104] Example 4:

[0105] like Figure 6 As shown, this embodiment also discloses a self-cleaning system for the outer cavity of a plate-type PECVD coating equipment, which includes two sets of self-cleaning devices for the outer cavity of the plate-type PECVD coating equipment as described in Embodiment 1 or Embodiment 2, several lifting mechanisms, and a conveyor line 30; the two sets of self-cleaning devices are a first self-cleaning device 10 and a second self-cleaning device 20, respectively.

[0106] When the length of the return zone is greater than the total length of the two self-cleaning devices, the two self-cleaning devices are arranged in segments and in series. Specifically, the first self-cleaning device 10 and the second self-cleaning device 20 are connected end to end, and a conveyor line 30 for conveying the carrier plate to be cleaned and the carrier plate after cleaning is also provided below. The discharge end of the coating equipment is connected to the head end of the first self-cleaning device 10 and the head end of the conveyor line 30 through the first lifting mechanism 40, and the middle part of the conveyor line 30 is connected to the tail end of the first self-cleaning device 10 and the head end of the second self-cleaning device 20 through the second lifting mechanism 50; the tail end of the second self-cleaning device 20 and the tail end of the conveyor line 30 are connected to the feed end of the coating equipment through the third lifting mechanism 60.

[0107] During use, the coating equipment sends the carrier plate to be cleaned into the return area, and the first part of the carrier plate and the second part of the carrier plate are allocated according to the set quantity.

[0108] The first section of the carrier plate to be cleaned is sent into the first self-cleaning device 10 for cleaning via the first lifting mechanism 40. After cleaning, the cleaned carrier plate is transported to the middle of the conveyor line 30 via the second lifting mechanism 50, and finally to the tail of the conveyor line 30. The cleaned carrier plate is then transported to the feeding end of the coating equipment via the third lifting mechanism 60 to complete the cleaning process.

[0109] The carrier plate to be cleaned in the second part is fed into the conveyor line 30 by the first lifting mechanism 40. When it reaches the middle of the conveyor line 30, it is transported to the second self-cleaning device 20 by the second lifting mechanism 50 for cleaning. After cleaning, the carrier plate is transported to the feeding end of the coating equipment by the third lifting mechanism 60 to complete the cleaning.

[0110] In this embodiment, by setting two sets of self-cleaning devices in segments and serially, and transporting them below via a conveyor line 30, the height space of the self-cleaning system is reduced without affecting the cleaning efficiency of multiple sets of self-cleaning devices.

[0111] Example 5:

[0112] like Figure 7As shown, this embodiment also discloses a self-cleaning system for the outer cavity of a plate-type PECVD coating equipment, which includes two sets of self-cleaning devices for the outer cavity of the plate-type PECVD coating equipment as described in Embodiment 1 or Embodiment 2, several lifting mechanisms, and a conveyor line 30; the two sets of self-cleaning devices are a first self-cleaning device 10 and a second self-cleaning device 20, respectively.

[0113] When the length of the return zone is less than the total length of the two self-cleaning devices, the two self-cleaning devices are arranged in parallel, one above the other, with the head and tail ends of the self-cleaning devices connected to the conveyor line 30, respectively. Specifically, the first self-cleaning device 10 and the second self-cleaning device 20 are arranged in parallel, one above the other. The head ends of the first self-cleaning device 10 and the second self-cleaning device 20 are connected to the discharge end of the coating equipment through the fourth lifting mechanism 70, and the tail ends of the first self-cleaning device 10 and the second self-cleaning device 20 are connected to the feed end of the coating equipment through the fifth lifting mechanism 80.

[0114] In use, the coating equipment sends the carrier plate to be cleaned into the return area, and according to the set allocation, it is divided into a first part carrier plate and a second part carrier plate. The first part carrier plate and the second part carrier plate are transported to the first self-cleaning device 10 and the second self-cleaning device 20 respectively by the fourth lifting mechanism 70 for cleaning. After cleaning, the cleaned carrier plate is collected into the feeding end of the coating equipment by the fifth lifting mechanism 80 to complete the cleaning.

[0115] In this embodiment, the insufficient length of the return zone is overcome by arranging two sets of self-cleaning devices in parallel in a double layer. Although the height of the self-cleaning system is greater than that of Embodiment 3, it is structurally simpler, reducing the need for a lifting mechanism, and also has advantages in cleaning efficiency.

[0116] The self-cleaning systems in Examples 4 and 5 are configured with two sets of self-cleaning devices. This is merely one example used to illustrate the technology of this utility model and does not mean that the self-cleaning system can only have two sets of self-cleaning devices. Depending on production needs, any number of self-cleaning devices can be used in segmented serial configurations, parallel layer configurations, or a combination of both.

[0117] The preferred embodiments of this utility model have been described in detail above; however, this utility model is not limited thereto. Within the scope of the technical concept of this utility model, various simple modifications can be made to the technical solution of this utility model, including combining the various technical features in any other suitable manner. These simple modifications and combinations should also be considered as the content disclosed by this utility model and are all within the protection scope of this utility model.

Claims

1. A self-cleaning device for the outer cavity of a plate-type PECVD coating equipment, characterized in that: The device includes several functional chambers located on the carrier plate return area of ​​the coating equipment and sealed on all sides, as well as a carrier plate conveying mechanism set in the several functional chambers. The functional chambers include a laser pre-cleaning functional chamber, an atmospheric pressure plasma cleaning functional chamber, a passivation maintenance functional chamber, and an exhaust gas treatment chamber connected in sequence to each functional chamber. Each functional chamber is equipped with a door valve for isolation and / or an air curtain for isolation spraying. The exhaust gas treatment chamber includes a general exhaust gas treatment chamber for filtering solid particles, dust, and treating gases to render them harmless; a fluorine-based medium circulation treatment chamber for converting fluorine-containing gases; and a negative pressure pump for exhausting gases. The fluorine-based medium circulation treatment chamber includes an inlet pipe, an independent fluorine-based medium treatment device, a fluorine-based medium recovery unit, and an exhaust outlet. The independent fluorine-based medium treatment device is connected to the exhaust outlet of the atmospheric pressure plasma cleaning function chamber via the inlet pipe to receive fluorine-containing cleaning exhaust gas. One end of the independent fluorine-based medium treatment device is connected to the fluorine-based medium recovery unit to send the extracted fluorine-based medium into the recovery unit, and the other end is connected to the general exhaust gas treatment chamber via the exhaust outlet to further treat the defluorinated exhaust gas. The fluorine-based medium recovery unit is connected to the inlet of the atmospheric pressure plasma cleaning function chamber via a pipe for recycling the fluorine-based medium.

2. The self-cleaning device for the outer cavity of the plate-type PECVD coating equipment according to claim 1, characterized in that: The shell of the fluorine-based medium circulation treatment chamber is a double-layer nickel-copper alloy sealed protective cover.

3. The self-cleaning device outside the carrier cavity of the plate-type PECVD coating equipment according to claim 1, characterized in that: The laser pre-cleaning functional room includes a laser chamber. The laser chamber is isolated from the coating equipment and the atmospheric pressure plasma cleaning functional room by valves and air curtains. The laser chamber is equipped with a laser machine and a laser exhaust port. The laser machine is located above the carrier plate conveying mechanism and is equipped with a dust removal hood for electrostatic dust removal. The laser exhaust port is located below the carrier plate conveying mechanism and is connected to the ordinary waste gas treatment room.

4. The self-cleaning device for the outer cavity of the plate-type PECVD coating equipment according to claim 3, characterized in that: The shell of the laser chamber is a single-layer stainless steel or aluminum alloy sealed protective cover; there are two laser chambers, namely a transverse laser chamber for transverse laser cleaning and a longitudinal laser chamber for longitudinal laser cleaning. The transverse laser chamber is equipped with several transversely moving laser heads, and the longitudinal laser chamber is equipped with several longitudinally moving laser heads.

5. The self-cleaning device for the outer cavity of the plate-type PECVD coating equipment according to claim 1, characterized in that: The atmospheric pressure plasma cleaning functional room includes a plasma cleaning chamber; several plasma cleaning generators are installed in the plasma cleaning chamber, and a cleaning rectifier is installed below the plasma cleaning generators. The gas source for the plasma cleaning generators is NF3.

6. The self-cleaning device for the outer cavity of the plate-type PECVD coating equipment according to claim 5, characterized in that: The shell of the plasma cleaning chamber is a double-layer nickel-copper alloy sealed protective cover; a partition cavity is formed between the double protective covers; the inner wall of the plasma cleaning chamber is provided with a fluorine corrosion resistant coating; the plasma cleaning chamber is provided with a cleaning exhaust port that communicates with the fluorine-based medium circulation treatment chamber; the partition cavity is provided with a partition exhaust port that communicates with the ordinary waste gas treatment chamber.

7. The self-cleaning device for the outer cavity of the plate-type PECVD coating equipment according to claim 5, characterized in that: The plasma cleaning chamber is provided in two parts: a main plasma cleaning chamber for coarse plasma cleaning and a secondary plasma cleaning chamber for fine plasma cleaning; the main plasma cleaning chamber and the secondary plasma cleaning chamber are interconnected.

8. The self-cleaning device outside the carrier cavity of the plate-type PECVD coating equipment according to claim 1, characterized in that: The shell of the passivation and maintenance chamber is a single-layer stainless steel or aluminum alloy sealed protective cover.

9. The self-cleaning device outside the carrier cavity of the plate-type PECVD coating equipment according to claim 1, characterized in that: The passivation and maintenance functional room includes a passivation functional room and a maintenance functional room; The passivation functional chamber is equipped with several plasma passivation generators and a passivation rectifier shroud located below the plasma passivation generators. An air curtain is provided between the plasma passivation generators; A door valve and an air curtain are installed between the passivation function room and the maintenance function room; The maintenance chamber is equipped with several maintenance rectifiers for introducing maintenance ions and maintenance atmosphere.

10. A self-cleaning system for the external cavity of a plate-type PECVD coating equipment, characterized in that... Includes two sets of self-cleaning devices for the external cavity of the plate-type PECVD coating equipment as described in any one of claims 1-9, several lifting mechanisms, and conveyor lines; The two self-cleaning devices are arranged in parallel on two levels, with the head and tail ends of the self-cleaning devices connected to conveyor lines. The conveyor lines are connected to the inlet and outlet ends of the coating equipment through a lifting mechanism. Alternatively, the two self-cleaning devices can be set up in segments and in series; the two self-cleaning devices are connected end to end, and a conveyor line for conveying the carrier plates to be cleaned and the carrier plates after cleaning is also set below; the inlet and outlet of the self-cleaning device are connected to the conveyor line, the inlet end and the outlet end of the coating equipment through lifting mechanisms at the beginning and end of the self-cleaning device, respectively.

Images