A device for removing thallium from industrial wastewater

Abstract

This utility model discloses an industrial wastewater thallium removal device. It mainly utilizes the combined action of a wastewater reaction system, a chemical dosing system, and a sedimentation system. Thallium is removed by adding chemicals, which convert the thallium into insoluble substances. These substances are then rapidly settled through flocculation and sedimentation, effectively removing thallium from the wastewater. The main technical solution of this utility model is as follows: an industrial wastewater thallium removal device, wherein a wastewater reaction system is connected to a chemical dosing system. The wastewater reaction system receives wastewater, and the chemical dosing system adds chemicals to the wastewater reaction system to react with thallium to form insoluble compounds. A sedimentation system is connected to the wastewater reaction system to receive the reaction water transmitted from the wastewater reaction system, separate the insoluble compounds, and discharge the resulting purified water.

Description

Technical Field

[0001] This utility model relates to the field of wastewater treatment technology, and in particular to a thallium removal device for industrial wastewater. Background Technology

[0002] Thallium, a highly toxic heavy metal, has attracted widespread attention due to its presence in the environment. Its diverse applications in industry and medicine make thallium emissions a major challenge for environmental protection. Thallium pollution not only damages ecosystems but may also pose a threat to human health through the food chain. Therefore, developing effective thallium removal technologies is crucial to solving this problem.

[0003] Currently, thallium removal technologies mainly include chemical treatment, bioremediation, and physical separation. Chemical treatment technologies typically involve converting thallium into insoluble compounds or complexes, thereby reducing its solubility and bioavailability in water. These chemical processes can be implemented in wastewater treatment plants by adding specific chemicals such as sulfides or phosphates to precipitate thallium ions. In addition, advanced oxidation technologies are also used to break down the structure of organothallium compounds, making them easier to remove.

[0004] Bioremediation is a process that utilizes microorganisms or plants to absorb, accumulate, and transform thallium. Some microorganisms can reduce thallium ions to metallic thallium, which is then fixed within the cell wall or inside the cell. This method is widely used in the remediation of natural water bodies and soils because it not only removes thallium but also improves soil structure and promotes ecological restoration. However, the efficiency of bioremediation is affected by various factors, including temperature, pH, and the type of microorganism.

[0005] Physical separation techniques focus on directly removing thallium from water using filtration, adsorption, or electrochemical methods. For example, activated carbon adsorption is a commonly used physical treatment method that effectively removes thallium and other heavy metals from water. Ion exchange resins are also widely used in industrial wastewater treatment to remove thallium ions from solution through exchange reactions. Electrochemical methods achieve separation by causing thallium to deposit on the electrode surface through electrolysis.

[0006] Each thallium removal technology has its unique advantages and limitations. Chemical treatment technologies are generally costly and may produce secondary pollution; bioremediation requires a long time and its effectiveness is limited by environmental conditions; while physical separation technologies, although simple to operate, may require frequent replacement of adsorbent materials. Utility Model Content

[0007] In view of this, this utility model provides an industrial wastewater thallium removal device, mainly used to solve the problem of poor performance of existing thallium removal technologies.

[0008] To achieve the above objectives, this utility model mainly provides the following technical solutions:

[0009] This utility model provides a thallium removal device for industrial wastewater, comprising:

[0010] Wastewater reaction system (100), dosing system (200) and sediment settling system (300);

[0011] The wastewater reaction system (100) is connected to the dosing system (200). The wastewater reaction system (100) is used to receive wastewater, and the dosing system (200) is used to add reagents to the wastewater reaction system (100) to react with at least thallium to form an insoluble compound.

[0012] The sedimentation system (300) is connected to the wastewater reaction system (100). The sedimentation system (300) is used to receive the reaction water transmitted by the wastewater reaction system (100), separate insoluble compounds, and discharge the resulting clean water.

[0013] The wastewater reaction system (100) includes a primary reaction tank (110), a secondary reaction tank (120), at least one tertiary reaction tank (130), a water supply pump (170), and a first ball valve (180). The water supply pump (170) is used to connect to the wastewater supply system. The water supply pump (170) is connected to the primary reaction tank (110) through the first ball valve (180). The primary reaction tank (110) is connected to the secondary reaction tank (120). The tertiary reaction tank (130) is connected to the secondary reaction tank (120). The tertiary reaction tank (130) is connected to the sediment settling system (300).

[0014] The dosing system (200) includes multiple reagent tanks, each used to hold different reagents. The primary reaction tank (110), secondary reaction tank (120), and tertiary reaction tank (130) are connected to the different reagent tanks.

[0015] Among them, the bottom of the primary reaction tank (110), the secondary reaction tank (120) and the tertiary reaction tank (130) are respectively provided with a drain port, which is used to discharge the wastewater in the primary reaction tank (110), the secondary reaction tank (120) and the tertiary reaction tank (130).

[0016] The wastewater reaction system (100) also includes a first agitator (140), and at least the secondary reaction tank (120) and the tertiary reaction tank (130) are provided with a first agitator (140) for stirring the wastewater in the secondary reaction tank (120) and the tertiary reaction tank (130);

[0017] And / or, the wastewater reaction system (100) also includes a pH measuring element (150), and a pH measuring element (150) is respectively installed in the primary reaction tank (110), the secondary reaction tank (120) and the tertiary reaction tank (130) to detect the pH value in the primary reaction tank (110), the secondary reaction tank (120) and the tertiary reaction tank (130).

[0018] The dosing system (200) includes multiple reagent tanks, including an acid reagent tank (210), an alkali reagent tank (220), a pretreatment reagent tank (230), a thallium removal reagent tank (240), a flocculant reagent tank (250), and a dosing pump (280). The acid reagent tank (210), alkali reagent tank (220), pretreatment reagent tank (230), thallium removal reagent tank (240), and flocculant reagent tank (250) are respectively connected to the wastewater reaction system (100) through the dosing pump (280).

[0019] Acid tank (210) and alkali tank (220) discharge acid and alkali into wastewater reaction system (100) before pretreatment tank (230) and thallium removal tank (240). Flocculant tank (250) discharges flocculant into wastewater reaction system (100) after pretreatment tank (230) and thallium removal tank (240). Thallium removal tank (240) is used to discharge reactants into wastewater reaction system (100) to react with thallium to form insoluble compounds.

[0020] The dosing system (200) includes multiple chemical tanks and a dosing platform (260), with the dosing platform (260) supporting the multiple chemical tanks;

[0021] The dosing system (200) includes a baffle plate surrounding the dosing platform (260);

[0022] The dosing system (200) includes a chemical discharge pump (270), which is connected to the chemical tank and is used to discharge the chemical from the chemical tank to the dosing platform (260).

[0023] The wastewater reaction system (100) also includes an outer shell (160), a dosing platform (260) connected to the outer shell (160), and a reagent tank detachably connected to the dosing platform (260).

[0024] The dosing system (200) also includes a second agitator (290), which is provided inside the dosing tank for agitating the dosing agent inside the tank.

[0025] The bottom sludge settling system (300) includes an inclined plate settling tank (310), a clear water tank (320), an effluent pump (330), a third ball valve (370), and a sludge discharge pump (380). The inclined plate settling tank (310) includes an inclined plate settling area (311) and a sludge settling hopper (312). Multiple inclined plates are installed in the inclined plate settling area (311) above the sludge settling hopper (312). The inclined plate settling area (311) is connected to the wastewater reaction system (100). The clear water tank (320) is connected to the inclined plate settling area (311). The effluent pump (330) is connected to the clear water tank (320).

[0026] The bottom opening of the sludge settling hopper (312) is connected to the sludge discharge pump (380) via a third ball valve (370);

[0027] Wastewater overflows into the inclined plate settling zone (311) in the wastewater reaction system (100). Insoluble compounds are at least partially deposited in the sludge settling hopper (312) by the action of the inclined plate. The inclined plate settling zone (311) is used to overflow clean water into the clean water tank (320). The water pump (330) is used to discharge the clean water in the clean water tank (320).

[0028] The sediment settling system (300) also includes an electric three-way valve (340), a fourth ball valve (350) and a fifth ball valve (360). The effluent pump (330) is connected to the input end of the electric three-way valve (340) through the fourth ball valve (350). The first output end of the electric three-way valve (340) is used to discharge clean water, and the second output end is connected to the input end of the wastewater reaction system (100) through the fifth ball valve (360).

[0029] The sediment settling system (300) also includes a water quality testing device (390), which is located in the clear water tank (320) and is used to test the water quality in the clear water tank (320).

[0030] This also includes:

[0031] The automatic control system is connected to the wastewater reaction system (100), the dosing system (200), and the sediment settling system (300), respectively.

[0032] Switching components;

[0033] The automatic control system includes a local control unit and a remote control unit;

[0034] When the switching unit is in the first state, the local control unit does not generate an automatic control signal. The automatic control system receives instructions from the operator to control the wastewater reaction system (100), the dosing system (200), and the sediment settling system (300).

[0035] The local control unit is connected to the remote control unit and is used to receive remote control information from the remote control unit. When the switching unit is in the second state, the local control unit is used to generate automatic control signals based on the received remote control information or the data fed back by the wastewater reaction system (100), the dosing system (200) and the sediment settling system (300) to control the wastewater reaction system (100), the dosing system (200) and the sediment settling system (300).

[0036] This invention proposes an industrial wastewater thallium removal device. It primarily utilizes the combined action of a wastewater reaction system, a chemical dosing system, and a sedimentation system. Chemicals are added to remove thallium, converting it into insoluble substances that are then rapidly settled through flocculation and sedimentation. This effectively removes thallium from the wastewater. Finally, the sediment and supernatant are discharged after passing quality tests, ensuring both effective thallium removal and stable operation. Furthermore, the integration of an automated control system simplifies the operation process, reduces manual operation frequency, alleviates workload, and ensures stable thallium removal performance. This device shows promising application prospects and is worthy of widespread adoption. Attached Figure Description

[0037] Figure 1 A schematic diagram of the main structure of an industrial wastewater thallium removal device provided in an embodiment of this utility model;

[0038] Figure 2 A top view of an industrial wastewater thallium removal device provided in this embodiment of the present invention;

[0039] Figure 3 A connection diagram of an industrial wastewater thallium removal device provided for an embodiment of this utility model. Detailed Implementation

[0040] To further illustrate the technical means and effects adopted by this utility model to achieve its intended purpose, the following detailed description, in conjunction with the accompanying drawings and preferred embodiments, details the specific implementation method, structure, features, and effects of an industrial wastewater thallium removal device proposed according to this utility model.

[0041] like Figure 1-3 As shown, this utility model embodiment provides an industrial wastewater thallium removal device, comprising:

[0042] Wastewater reaction system (100), dosing system (200) and sediment settling system (300);

[0043] The wastewater reaction system (100) is connected to the dosing system (200), the wastewater reaction system (100) is used to receive wastewater, and the dosing system (200) is used to add reagents to the wastewater reaction system (100) to at least react with thallium to form an insoluble compound;

[0044] The sedimentation system (300) is connected to the wastewater reaction system (100). The sedimentation system (300) is used to receive the reaction water transmitted by the wastewater reaction system (100), separate insoluble compounds, and discharge the resulting clean water.

[0045] In some embodiments, the apparatus includes an automatic control system connected to a wastewater reaction system (100), a dosing system (200), and a sediment settling system (300), respectively.

[0046] The wastewater reaction system (100) may include multi-stage reaction zones, capable of pH adjustment and pretreatment reactions. Through precise control of reagent dosing, automatic monitoring of water quality changes, and real-time adjustment of treatment parameters, it achieves efficient removal of thallium from wastewater. In one embodiment, the wastewater reaction system (100) includes a primary reaction tank (110), a secondary reaction tank (120), at least one tertiary reaction tank (130), a water supply pump (170), and a first ball valve (180). In some embodiments, the wastewater reaction system (100) further includes a housing (160) that encloses the wastewater reaction system (100) and the sediment settling system (300). An inlet (161) is provided on the housing (160), and the water supply pump (170) is connected to the wastewater supply system through the inlet (161). The water supply pump (170) is connected to the primary reaction tank (110) through the first ball valve (180). The primary reaction tank (110) is connected to the secondary reaction tank (120), the tertiary reaction tank (130) is connected to the secondary reaction tank (120), and the tertiary reaction tank (130) is connected to the sediment settling system (300). Multiple tertiary reaction tanks (130) can be used as needed, such as... Figure 2 As shown, there can be two tertiary reaction tanks (130). Level sensors are installed in the primary reaction tank (110), secondary reaction tank (120), and tertiary reaction tank (130), and these level sensors are connected to an automatic control system. The automatic control system is connected to a water supply pump (170) and a first ball valve (180), which is used to regulate the water flow. The water supply pump (170) can be a metering pump, or a metering device can be connected between the automatic control system and the water supply pump (170). Thallium-containing wastewater enters the primary reaction tank (110) via the wastewater supply system and metering device using automated control.

[0047] In one embodiment, the wastewater reaction system (100) further includes a first agitator (140), which is installed in at least the secondary reaction tank (120) and the tertiary reaction tank (130) to agitate the wastewater in the secondary reaction tank (120) and the tertiary reaction tank (130). The wastewater reaction system (100) also includes a pH measuring device (150), which is installed in the primary reaction tank (110), the secondary reaction tank (120), and the tertiary reaction tank (130) to detect the pH value in the primary reaction tank (110), the secondary reaction tank (120), and the tertiary reaction tank (130). Both the pH measuring device (150) and the first agitator (140) are connected to an automatic control system.

[0048] In some embodiments, the bottom of the primary reaction tank (110), secondary reaction tank (120), and tertiary reaction tank (130) are respectively provided with vents. A vent pipe is connected to the vent, and a vent valve is connected to the vent pipe. The outer shell (160) has an external vent (162), the vent pipe is connected to the external vent (162), and the vent valve is connected to the automatic control system, so that wastewater in the primary reaction tank (110), secondary reaction tank (120), and tertiary reaction tank (130) can be discharged to the outside of the outer shell (160) as needed.

[0049] The dosing system (200) includes multiple reagent tanks, each holding different reagents. A primary reaction tank (110), a secondary reaction tank (120), and a tertiary reaction tank (130) are connected to these tanks. This allows for the addition of different reagents to different reaction tanks to achieve different stages of chemical treatment. For example, the primary reaction tank (110) primarily assists in reactions such as pH adjustment or acidification. After the reaction, the wastewater overflows into the secondary reaction tank (120), where pH adjustment (e.g., alkalinity adjustment) can be performed, and other necessary reagents can be added as needed. After thallium removal, the wastewater enters one of the tertiary reaction tanks (130), where the reagents react chemically and physically with the thallium in the wastewater, removing it. After thallium removal, the wastewater flows from one of the three-stage reaction tanks (130) into the other, where flocculants are added to coagulate and enlarge fine particles, achieving sedimentation. Then, the wastewater from the other of the three-stage reaction tanks (130) enters the sediment settling system (300) to achieve sedimentation, thus realizing liquid-solid separation. It is worth noting that the reactions in the primary reaction tank (110), secondary reaction tank (120), and tertiary reaction tank (130) are not limited to the above implementation method and can be adjusted as needed.

[0050] In a more specific embodiment, the dosing system (200) includes multiple reagent tanks, including an acid reagent tank (210), an alkali reagent tank (220), a pretreatment reagent tank (230), a thallium removal reagent tank (240), a flocculant reagent tank (250), and a dosing pump (280). The acid reagent tank (210), alkali reagent tank (220), pretreatment reagent tank (230), thallium removal reagent tank (240), and flocculant reagent tank (250) are respectively connected to the wastewater reaction system (100) via the dosing pump (280). The dosing pump (280) is connected to the automatic control system. The reagent tanks are also connected to the reagent tank inlet (2110) via reagent tank ball valves (2120). The reagent tank inlet (2110) is used to connect to the clean water supply system, and the reagent tank ball valves (2120) are connected to the automatic control system. Acid tank (210) and alkali tank (220) discharge acid and alkali into the wastewater reaction system (100) before the pretreatment tank (230) and the thallium removal tank (240). For example, the acid tank (210) is connected to the primary reaction tank (110), and the alkali tank (220) is connected to the secondary reaction tank (120). Flocculant tank (250) discharges flocculant into the wastewater reaction system (100) after the pretreatment tank (230) and the thallium removal tank (240). The thallium removal tank (240) is used to discharge reactants into the wastewater reaction system (100) to react with thallium to form insoluble compounds. For example, the pretreatment reagent tank (230) is connected to the secondary reaction tank (120), the thallium removal reagent tank (240) is connected to one of the tertiary reaction tanks (130), and the flocculant reagent tank (250) is connected to the other of the tertiary reaction tanks (130). The acid reagent tank (210) can be used to hold sulfuric acid, the alkali reagent tank (220) can be used to hold sodium hydroxide, and the flocculant reagent tank (250) can be used to hold polyacrylamide (PAM).

[0051] In one embodiment, the dosing system (200) further includes a second agitator (290), which is disposed inside the reagent tank for agitating the reagent inside the tank. The second agitator (290) is connected to an automatic control system. A liquid level detection device is disposed inside the reagent tank and is connected to the automatic control system.

[0052] The reagents are accurately weighed manually and then added to the reagent tanks. At the start of the preparation process, the automatic control system first automatically opens the ball valves (2120) corresponding to multiple reagent tanks to release water into them. When the liquid level sensor indicates that the liquid level has reached the specified position, the automatic control system closes the ball valves (2120) and starts the second agitator (290) to begin stirring. The second agitator (290) maintains the stirring state for a preset time, such as 10 minutes. After stirring is completed, the system controls the dosing pumps (280) of each reagent tank to transport the proportionally prepared reagents to each reaction tank through the pipeline system as needed. The automatic control system controls the first agitator (140) in each reaction tank to start, so that the reagents and wastewater are stirred evenly and reacted. Specifically, the automatic control system controls the water supply pump (170) to supply water to the primary reaction tank (110), and the water will then overflow from the primary reaction tank (110) to the secondary reaction tank (120) and the tertiary reaction tank (130) in stages. The automatic control system monitors the pH value of each reaction tank in real time. If the pH value of a certain reaction tank decreases, the automatic control system will activate the dosing system to add pH adjusting agent to that reaction tank. Once the pH value returns to the set value, the dosing pump (280) corresponding to the pH adjusting agent will be shut off. When the liquid level sensor in the agent tank detects that the liquid level has reached the minimum level, the automatic control system will sound an alarm indicating that the agent is depleted.

[0053] The sedimentation system (300) is used to separate insoluble compounds and can employ a variety of devices suitable for solid-liquid separation. In one embodiment, the sedimentation system (300) includes an inclined plate sedimentation tank (310), a clear water tank (320), an effluent pump (330), a third ball valve (370), and a sludge discharge pump (380). The inclined plate sedimentation tank (310) includes an inclined plate sedimentation zone (311) and a sludge sedimentation hopper (312). Multiple inclined plates are installed in the inclined plate sedimentation zone (311) above the sludge sedimentation hopper (312). The inclined plate sedimentation zone (311) is connected to the wastewater reaction system (100). The clear water tank (320) is connected to the inclined plate sedimentation zone (311), and the effluent pump (330) is connected to the clear water tank (320). The bottom opening of the sludge settling hopper (312) is connected to the sludge discharge pump (380) via a third ball valve (370). The system is reinforced with a carbon steel frame, and the equipment enclosure is made of 20mm thick PP board. The internal partition is also made of 20mm thick PP board, with internal bracing added. The inclined plate is a PP inclined plate fixed by a bracket, and the sludge settling hopper (312) is a conical hopper, which enables rapid settling and separation to remove small solid particles and achieve solid-liquid separation. An overflow trough is provided at the upper position of the inclined plate settling area (311), and the supernatant overflows to the clear water tank (320). The clear water tank (320) is equipped with a level gauge interlocked with a water pump (330) for level control, which is used for the collection, transfer, and water quality monitoring sampling of the purified water after thallium removal. The specific implementation method will be described later. The bottom sludge of the sludge settling hopper (312) is transported to the filter press through the third ball valve (370) and the sludge discharge pump (380). When the sludge settling hopper (312) is full, the automatic control system opens the third ball valve (370) and the sludge discharge pump (380) for cleaning. A sludge discharge port (163) is provided on the housing (160), and the sludge discharge pipe connected to the sludge discharge pump (380) can be connected to the sludge discharge port (163) to discharge the sludge outside the housing (160).

[0054] The automated control system includes a host computer control station. This control station is located in the control room and connects to upstream, downstream, and peripheral systems via Ethernet. The host computer control station performs data communication monitoring and scheduling management. The automated control system will be described in more detail below with reference to specific embodiments.

[0055] In one embodiment, the dosing system (200) includes multiple chemical tanks and a dosing platform (260), the dosing platform (260) supporting the multiple chemical tanks. The dosing system (200) includes a baffle plate surrounding the dosing platform (260). The dosing system (200) includes a chemical discharge pump (270), connected to each chemical tank, for discharging the chemical from the chemical tanks to the dosing platform (260).

[0056] A residual chemical pump (270) is connected to the automatic control system. After the chemical dosing is completed, or when the chemical tank needs to be cleaned, the residual chemical or water from cleaning the chemical tank is discharged to the dosing platform (260) via the residual pump (270). The dosing platform (260) is equipped with a baffle to enclose the dosing area and prevent chemical overflow. The height of the baffle can be 200 mm. In some embodiments, the dosing platform (260) is also connected to a drain hole and a drain pipe to promptly discharge the liquid accumulated on the dosing platform (260).

[0057] In one embodiment, the dosing platform (260) is connected to the outer casing (160), and the reagent tank is detachably connected to the dosing platform (260). The dosing platform (260) is integrally welded to the side of the outer casing (160), and a grid of feet is provided under the dosing platform (260) to fix the reagent tank onto the dosing platform (260) during installation. The reagent tank also has a dosing pump fixing slot for fixing the dosing pump (280). After installation, the dosing system (200), the outer casing (160), the wastewater reaction system (100), and the sediment settling system (300) form a single unit, facilitating transfer and transportation.

[0058] In one embodiment, the outer casing (160) may enclose the wastewater reaction system (100) and the sediment settling system (300) only on the sides and bottom, while the top is open. The outer casing (160) is provided with a plurality of sight glass openings (164) through which the wastewater reaction inside the equipment can be observed.

[0059] In one embodiment, each reaction zone is equipped with a cover plate, such as the primary reaction tank (110), the secondary reaction tank (120), and the tertiary reaction tank (130), as well as the inclined plate settling tank (310) and the clear water tank (320). The cover plates are made of high-molecular-weight polyvinyl chloride, which is pressure-resistant, corrosion-resistant, and impact-resistant. Sampling ports (165) are provided on the cover plates to facilitate observation and sampling of the reaction process.

[0060] To ensure the quality of the discharged clean water, in one embodiment, the sediment settling system (300) further includes an electric three-way valve (340), a fourth ball valve (350), and a fifth ball valve (360). The effluent pump (330) is connected to the input end of the electric three-way valve (340) through the fourth ball valve (350). The first output end of the electric three-way valve (340) is used to discharge clean water, and the second output end is connected to the input end of the wastewater reaction system (100) through the fifth ball valve (360), such as to the input end of the primary reaction tank (110) in the wastewater reaction system (100). The sediment settling system (300) also includes a water quality testing device (390), which is located in the clean water tank (320) and is used to test the water quality in the clean water tank (320).

[0061] The water quality testing device (390), the electric three-way valve (340), the fourth ball valve (350), and the fifth ball valve (360) are all connected to the automatic control system. The water quality testing device (390) monitors the water quality in real time, such as pH and thallium content. When the water quality in the clear water tank (320) meets the requirements, the fourth ball valve (350) and the outlet pump (330) are opened, the electric three-way valve (340) is switched, and the fifth ball valve (360) is closed, so that qualified water can be discharged. In some embodiments, a clear water outlet (166) is provided on the outer casing (160), and the first output end of the electric three-way valve (340) is connected to the clear water outlet (166) through a pipe to discharge clear water to the outside of the outer casing (160). When the water quality in the clear water tank (320) is not up to standard, the fourth ball valve (350) and the outlet pump (330) are opened, the electric three-way valve (340) is switched, and the fifth ball valve (360) is opened, so that the water in the clear water tank (320) can re-enter the primary reaction tank (110) in the wastewater reaction system (100) for secondary reaction, thereby achieving selective recycling treatment according to the water quality.

[0062] The industrial wastewater thallium removal device offers three control modes: local manual control, automatic control, and remote control via a host computer control station.

[0063] The industrial wastewater thallium removal device also includes a switching element. The switching element can be a mechanical button or a virtual button on the human-machine interface device on the control box of the automatic control system.

[0064] The automatic control system includes a local control unit and a remote control unit;

[0065] When the switching unit is in the first state, the local control unit does not generate an automatic control signal. The automatic control system receives instructions from the operator to control the wastewater reaction system (100), the dosing system (200), and the sediment settling system (300) to achieve local manual control. If the "manual / automatic" switch on the control box is set to "manual", the operator can start or stop the equipment and perform various valve and pump switching operations through the buttons on the local control box.

[0066] The local control unit is connected to the remote control unit and is used to receive remote control information from the remote control unit. When the switch is in the second state, the local control unit generates automatic control signals based on the received remote control information or data fed back from the wastewater reaction system (100), the dosing system (200), and the sediment settling system (300) to control the wastewater reaction system (100), the dosing system (200), and the sediment settling system (300) to achieve automatic control and remote control by the host computer control station. For example, the operator can activate the "automatic" operation mode through the monitoring interface of the host computer system using a mouse or keyboard. When the "manual / automatic" switch on the control box is set to "automatic", the PLC will continuously monitor system parameters and signals and upload them to the host computer system in real time, so that the operator can observe the real-time status of the equipment and system parameters on the monitoring interface. The PLC automatically controls the operation of the equipment based on preset logic and algorithms and real-time data. In the "automatic" operation mode, the operator can also remotely control the equipment through the interface of the host computer monitoring system, and remotely control the start, stop, and parameter modification of the equipment through a mouse or keyboard. In remote control mode, the operator sends commands directly to the PLC via a host computer, and the PLC controls the equipment according to the commands. This mode allows the operator to perform precise control without touching the equipment.

[0067] More specifically, the automatic control system mainly consists of an equipment layer and a control layer, each layer carrying specific functions to ensure the smooth operation of the entire system. The following is a detailed description of these two layers and their functions:

[0068] Equipment layer:

[0069] The equipment layer mainly consists of intelligent devices such as PLCs, intelligent power meters, and actuators. The intelligent power meters and actuators include, as described in the aforementioned embodiments, a water supply pump (170), a first ball valve (180), a first agitator (140), a pH measuring device (150), a dosage pump (280), a reagent discharge pump (270), a third ball valve (370), a sludge discharge pump (380), an electric three-way valve (340), a fourth ball valve (350), a fifth ball valve (360), and a water quality testing device (390). By endowing the field control and sensing devices in production applications with intelligent characteristics, the equipment layer utilizes the network bus on the equipment network to realize the transmission of control commands, information, and diagnostic data between field devices and the controller. This not only improves the reliability and maintainability of the field devices but also enhances the level of intelligence.

[0070] Control layer:

[0071] The control layer consists of a host computer and PLC control stations distributed across the process sections, directly responsible for controlling the production process. This includes key functions such as interlocking and cyclic control, drive control, and measurement monitoring, ensuring the efficiency and safety of the production process.

[0072] communication:

[0073] Communication between different control levels is accomplished by independent networks at each level, all of which conform to open standards, ensuring smooth information flow between levels and overall system coordination.

[0074] The automatic control system includes a host control station, which consists of a mobile industrial computer and configuration software. This host control station is located in the control room and connects to upper, lower, and peripheral systems via Ethernet. The host control station performs data communication monitoring and scheduling management. As the monitoring and management center of the production process, the host control station is responsible for assigning operational targets to the PLC control station and issuing commands to control the start and stop of process equipment. It comprehensively monitors the production process, ensuring that equipment operates efficiently and safely according to preset process requirements. The host computer monitors in real time the automatic control, alarm, protection, operation, and adjustment aspects of the production process, as well as key parameters and equipment status of each process flow, divided into three areas:

[0075] Equipment control area: Provides start / stop buttons for each pump, agitator, and valve, as well as flow control, system start / stop waiting, and can realize the aforementioned local manual control mode. Such as control of water supply pump (170), first ball valve (180), first agitator (140), dosage pump (280), chemical discharge pump (270), third ball valve (370), sludge discharge pump (380), electric three-way valve (340), fourth ball valve (350), fifth ball valve (360), etc.

[0076] Parameter setting area: Set important parameters for system operation, such as pH threshold range adjustment, turbidity range adjustment, drainage level adjustment, and mixing time for drug preparation.

[0077] Alarm and Fault Zone: Displays real-time system alarm information (such as low liquid level in medicine tank, abnormal pH value) and provides troubleshooting guidance.

[0078] The functions of the host computer monitoring system are mainly divided into three categories:

[0079] The first major category of management functions includes: Real-time dynamic diagram generation: generating real-time dynamic diagrams of the process flow, allowing operators to intuitively understand the current production status. The host computer interface provides a clear and user-friendly interface to vividly and graphically reflect the real-time data of the process flow.

[0080] Alarm Management: Completes the storage, display, and retrieval of alarm information, ensuring that operators can promptly detect and handle abnormal situations.

[0081] Historical data management: The functions of storing, displaying, and querying historical data and historical trend curves provide convenience for the retrospective analysis of the production process.

[0082] The second major category of equipment control functions: Based on graphical and menu-driven operation modes, operators can remotely control the equipment by issuing commands to start or stop the equipment via keyboard or mouse from the operator station in the central control room.

[0083] The third category of communication functions: The host computer monitoring system communicates with other systems, such as with each field PLC station, to ensure smooth information flow and coordinated operation of all parts of the production system.

[0084] The main functions of the host computer monitoring system include dynamic graphics and real-time data display, as described below:

[0085] Dynamic graphics and real-time data display:

[0086] The host computer monitoring system dynamically displays the system's process flow and the operating status of each major process equipment on a color monitor in real time.

[0087] The system tracks operational trends in processes such as chemical dosing, as well as production data including technological and electrical aspects of each step. This enables production managers to monitor the current operational status of thallium-containing wastewater treatment and conduct multi-level monitoring from general layout to detailed diagrams. Specific screens include:

[0088] Thallium-containing wastewater treatment process flow diagram: This diagram shows the entire process flow of thallium-containing wastewater treatment, helping operators to get an overall overview.

[0089] Control system overview diagram: Shows the overall architecture and status of the entire control system.

[0090] Real-time curves: Dynamically display the real-time changing trends of each key parameter, facilitating monitoring and adjustment.

[0091] Historical curves: Show the historical data trends of key parameters, providing a reference for data analysis and process optimization.

[0092] Parameter settings: Provides an interface for setting and adjusting process parameters, ensuring that they can be flexibly adjusted according to actual needs.

[0093] Thallium-containing wastewater treatment parameter display: Real-time display of key thallium-containing wastewater treatment parameters for each process helps monitor treatment efficiency.

[0094] Status and loop diagrams of major equipment: A detailed display of the operating status of major equipment and the working status of each control loop.

[0095] The monitoring screen supports hierarchical expansion, allowing users to access corresponding sub-screens from the main screen and further view the process diagrams of individual devices. The composition of each screen is explained below:

[0096] Thallium-containing wastewater treatment process flow diagram: This diagram shows the overall process of thallium-containing wastewater treatment, including the location and operating status of each treatment stage and the main equipment.

[0097] Control System Overview: Shows the overall layout of the control system and the status of its components, including the PLC control station and communication network.

[0098] Real-time curves: Dynamically display the changing trends of key process parameters over a period of time in the form of curves, facilitating real-time monitoring.

[0099] Historical Curves: Provides graphs of historical data to help production managers perform data backtracking and trend analysis.

[0100] Parameter settings: The interface allows operators to set and adjust key parameters in the thallium-containing wastewater treatment process, including flow rate, temperature, and pressure.

[0101] Thallium-containing wastewater treatment parameter display: Real-time display of important parameters at each treatment stage, such as pH value and suspended solids concentration.

[0102] Status and loop diagrams of major equipment: Displays detailed operating status and control loop diagrams of major equipment, which helps in accurate monitoring and fault diagnosis.

[0103] This device integrates advanced pH adjustment technology, pretreatment reaction processes, and multi-stage reaction zones. Through precise control of reagent dosing, automatic monitoring of water quality changes, and real-time adjustment of treatment parameters, it achieves highly efficient removal of thallium from wastewater. Simultaneously, the system is equipped with an intelligent host computer monitoring interface that can display the real-time operating status of each treatment unit, water quality parameters, and alarm information, facilitating remote monitoring and management by operators. Furthermore, the system features manual and automatic switching capabilities, ensuring flexibility and stability under various operating conditions, making it highly efficient, intelligent, and environmentally friendly in the field of wastewater treatment.

[0104] The above description is merely a specific embodiment of this utility model, but the protection scope of this utility model is not limited thereto. Any variations or substitutions that can be easily conceived by those skilled in the art within the technical scope disclosed in this utility model should be included within the protection scope of this utility model. Therefore, the protection scope of this utility model should be determined by the protection scope of the claims.

Claims

1. An industrial wastewater thallium removal device, characterized by, include: Wastewater reaction system (100), dosing system (200) and sediment settling system (300); The wastewater reaction system (100) is connected to the dosing system (200). The wastewater reaction system (100) is used to receive wastewater, and the dosing system (200) is used to add a reagent to the wastewater reaction system (100) to react with at least thallium to form an insoluble compound. The sediment settling system (300) is connected to the wastewater reaction system (100). The sediment settling system (300) is used to receive the reaction water transmitted by the wastewater reaction system (100), separate the insoluble compounds, and discharge the resulting clean water. The sedimentation system (300) includes an inclined plate sedimentation tank (310), a clear water tank (320), and an effluent pump (330). The inclined plate sedimentation tank (310) includes an inclined plate sedimentation zone (311) and a sludge sedimentation hopper (312). The inclined plate sedimentation zone (311) is connected to the wastewater reaction system (100). The clear water tank (320) is connected to the inclined plate sedimentation zone (311). The effluent pump (330) is connected to the clear water tank (320). The sediment settling system (300) also includes a water quality testing device (390), which is located in the clear water tank (320) and is used to test the water quality in the clear water tank (320); The sediment settling system (300) also includes an electric three-way valve (340) and a fifth ball valve (360). The effluent pump (330) is connected to the input end of the electric three-way valve (340). The first output end of the electric three-way valve (340) is used to discharge the clean water. The second output end of the electric three-way valve (340) is connected to the input end of the wastewater reaction system (100) through the fifth ball valve (360).

2. The industrial wastewater thallium removal device according to claim 1, characterized in that, The wastewater reaction system (100) includes a primary reaction tank (110), a secondary reaction tank (120), at least one tertiary reaction tank (130), a water supply pump (170), and a first ball valve (180). The water supply pump (170) is used to connect to the wastewater supply system. The water supply pump (170) is connected to the primary reaction tank (110) through the first ball valve (180). The primary reaction tank (110) is connected to the secondary reaction tank (120). The tertiary reaction tank (130) is connected to the secondary reaction tank (120). The tertiary reaction tank (130) is connected to the sediment settling system (300). The dosing system (200) includes multiple reagent tanks, each used to hold different reagents, and the primary reaction tank (110), the secondary reaction tank (120) and the tertiary reaction tank (130) are connected to the different reagent tanks.

3. The industrial wastewater thallium removal device according to claim 2, characterized in that, The bottom of the primary reaction tank (110), the secondary reaction tank (120) and the tertiary reaction tank (130) are respectively provided with a drain port, which is used to discharge wastewater from the primary reaction tank (110), the secondary reaction tank (120) and the tertiary reaction tank (130).

4. The industrial wastewater thallium removal device according to claim 2, characterized in that, The wastewater reaction system (100) further includes a first agitator (140), and the first agitator (140) is provided in at least the secondary reaction tank (120) and the tertiary reaction tank (130) for agitating the wastewater in the secondary reaction tank (120) and the tertiary reaction tank (130); And / or, the wastewater reaction system (100) further includes a pH measuring element (150), and the primary reaction tank (110), the secondary reaction tank (120) and the tertiary reaction tank (130) are respectively provided with pH measuring elements (150) to detect the pH value in the primary reaction tank (110), the secondary reaction tank (120) and the tertiary reaction tank (130).

5. The industrial wastewater thallium removal device according to claim 1, characterized in that, The dosing system (200) includes multiple reagent tanks, including an acid reagent tank (210), an alkali reagent tank (220), a pretreatment reagent tank (230), a thallium removal reagent tank (240), a flocculant reagent tank (250), and a dosing pump (280). The acid reagent tank (210), the alkali reagent tank (220), the pretreatment reagent tank (230), the thallium removal reagent tank (240), and the flocculant reagent tank (250) are respectively connected to the wastewater reaction system (100) through the dosing pump (280). The acid reagent tank (210) and the alkali reagent tank (220) discharge acid and alkali into the wastewater reaction system (100) before the pretreatment reagent tank (230) and the thallium removal reagent tank (240). The flocculant reagent tank (250) discharges flocculant into the wastewater reaction system (100) after the pretreatment reagent tank (230) and the thallium removal reagent tank (240). The thallium removal reagent tank (240) is used to discharge reactants into the wastewater reaction system (100) to react with thallium to form the insoluble compound.

6. The industrial wastewater thallium removal device according to claim 1, characterized in that, The dosing system (200) includes multiple reagent tanks and a dosing platform (260), wherein the dosing platform (260) carries the multiple reagent tanks; The dosing system (200) includes a baffle plate surrounding the dosing platform (260); The dosing system (200) includes a residual drug pump (270), which is connected to the drug tank. The residual drug pump (270) is used to discharge the drug in the drug tank to the dosing platform (260).

7. The industrial wastewater thallium removal device according to claim 6, characterized in that, The wastewater reaction system (100) also includes a housing (160), the dosing platform (260) is connected to the housing (160), and the reagent tank is detachably connected to the dosing platform (260); The dosing system (200) also includes a second stirring element (290), which is provided inside the drug tank for stirring the drug in the drug tank.

8. The industrial wastewater thallium removal device according to claim 1, characterized in that, The bottom sludge settling system (300) includes a third ball valve (370) and a sludge discharge pump (380), and multiple inclined plates are installed in the inclined plate settling area (311) above the sludge settling hopper (312); The bottom opening of the sludge settling hopper (312) is connected to the sludge discharge pump (380) through the third ball valve (370); Wastewater overflows from the wastewater reaction system (100) to the inclined plate settling zone (311), and the insoluble compounds are at least partially deposited in the sludge settling hopper (312) by the action of the inclined plate. The inclined plate settling zone (311) is used to overflow the clean water to the clean water tank (320), and the water pump (330) is used to discharge the clean water in the clean water tank (320).

9. The industrial wastewater thallium removal device according to claim 8, characterized in that, The sediment settling system (300) also includes a fourth ball valve (350), and the water pump (330) is connected to the input end of the electric three-way valve (340) through the fourth ball valve (350).

10. The industrial wastewater thallium removal device of claim 1, wherein, Also includes: The automatic control system is connected to the wastewater reaction system (100), the dosing system (200), and the sediment settling system (300), respectively. Also includes: switching components; The automatic control system includes a local control unit and a remote control unit; When the switching element is in the first state, the local control unit does not generate an automatic control signal, and the automatic control system receives instructions from the operator to control the wastewater reaction system (100), the dosing system (200), and the sediment settling system (300). The local control unit is connected to the remote control unit and is used to receive remote control information from the remote control unit. When the switching unit is in the second state, the local control unit is used to generate an automatic control signal based on the received remote control information or the data fed back by the wastewater reaction system (100), the dosing system (200), and the sediment settling system (300) to control the wastewater reaction system (100), the dosing system (200), and the sediment settling system (300).

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