Electroless nickel plating wastewater pretreatment tank body device

Abstract

The utility model provides a kind of chemical nickel plating wastewater pretreatment tank body device, it is characterized in that, including integrated reaction tank and integrated in the pH adjusting area, dosing mixing area, mixed reaction area and strengthening mixing reaction area communicated in sequence in the reaction tank.The utility model realizes the dynamic coupling of active oxidizing material and pollutant conversion efficiency in wastewater treatment process by the synergic control of hydraulic circulation unit and oxidation breakage module, to build the directional reaction system of complex nickel decomposition-phosphate generation. In summary, the device effectively solves the bottleneck problem of treatment efficiency caused by uneven mixing, incomplete breakage and excessive land occupation in traditional oxidation process, provides zero mechanical stirring loss, high pollutant conversion rate and land area reduction intensive technical scheme for electroplating wastewater pretreatment.

Description

Technical Field

[0001] This utility model relates to a wastewater treatment device, and more specifically, a pretreatment tank device for chemical nickel plating wastewater. Background Technology

[0002] With the rapid development of my country's manufacturing industry, the electroplating industry, as a key supporting industry, has seen its products widely applied in important sectors of the national economy such as automobiles, electronics, and metallurgy. Among these, electroless nickel plating technology, with its uniform coating and corrosion resistance, has become a core process for surface treatment of high-end components, playing a crucial role in precision manufacturing. This technology reduces deposited nickel ions at high temperatures using reducing agents such as sodium hypophosphite. During this process, brighteners, organic complexing agents, and pH buffers must be continuously added to maintain the stability of the plating solution. The resulting wastewater contains high concentrations of pollutants such as complexed nickel, organophosphonates, ammonia nitrogen, and total phosphorus, posing a significant challenge to wastewater treatment. Two major difficulties exist in treating this type of wastewater: first, the pollutants have complex forms, and the stable complexes formed by organic complexing agents and nickel ions are difficult to remove using conventional precipitation methods; second, the synergistic effect of the components is significant, and the coexistence of multiple pollutants leads to low efficiency of a single process, especially the simultaneous breaking down and removing of non-orthophosphates and complexed nickel, which is extremely difficult. Oxidation methods are widely used in pretreatment due to their strong adaptability and low cost, but the existing "civil engineering reaction tank + mechanical stirring" model has obvious defects: low mixing efficiency, dead corners in mechanical stirring lead to insufficient contact between the reagent and wastewater, affecting the complex breaking effect; high operation and maintenance costs, the mixer is easily corroded and damaged, and maintenance requires shutdown and tank cleaning; poor space utilization, large reaction tanks occupy a large area, which restricts the spatial planning of the plant area.

[0003] To address this challenge, there is an urgent need to develop a highly efficient and integrated pretreatment device that can improve system reliability and land utilization while achieving efficient pollutant conversion. Based on this, we have invented a pretreatment tank device for electroless nickel plating wastewater. This device achieves dynamic coupling of the conversion efficiency of active oxidants and pollutants during wastewater treatment through the coordinated control of a hydraulic circulation unit and an oxidation complex-breaking module, thereby constructing a directional reaction system for the decomposition of complexed nickel and the generation of orthophosphate. In summary, this equipment effectively solves the bottleneck problems in treatment efficiency caused by uneven mixing, incomplete complex breaking, and excessive land occupation in traditional oxidation processes, providing an intensive technical solution for electroplating wastewater pretreatment with zero mechanical stirring loss, high pollutant conversion rate, and reduced land area. Summary of the Invention

[0004] To solve the above-mentioned technical problems, this utility model provides a pretreatment tank device for chemical nickel plating wastewater, which adopts the following technical solution: It includes an integrated reaction tank and, within the reaction tank, sequentially connected pH adjustment zone, dosing and mixing zone, mixing reaction zone, and enhanced mixing reaction zone, with the following vertical partitions serving as the physical boundaries of the functional zones: First vertical partition 9: Separates the pH adjustment zone and the dosing and mixing zone, and its top is provided with a first flow port 12 to connect the two zones; The second vertical partition 15 separates the dosing and mixing zone from the mixing and reaction zone, and its top is provided with a second flow port 17 to connect the two zones; The sixth vertical partition 21 separates the mixing reaction zone from the enhanced mixing reaction zone, and its top is provided with a fourth flow port 25 to connect the two zones.

[0005] Furthermore, the pH adjustment zone is provided with an inlet 1, an acid addition port 2, a circulation inlet 7, a circulation inlet pipe 6, a circulation outlet pipe 4, a circulation outlet 3, a circulation pump 5, a first horizontal baffle 8, a first deflector 10, and an online pH meter 11; the chemical mixing zone is provided with a chemical addition port 13, a second horizontal baffle 14, and a second deflector 16; the mixing reaction zone is provided with a third vertical baffle 18, a fourth vertical baffle 19, and a fifth vertical baffle 20, wherein: the third vertical baffle 18 is provided with a third deflector 22 at the bottom, the fourth vertical baffle 19 is provided with a third overflow port 24 at the top, and the fifth vertical baffle 20 is provided with a fourth deflector 23 at the bottom; the enhanced mixing reaction zone is provided with a third horizontal baffle 26, a fourth horizontal baffle 27, and a seventh vertical baffle 28, and an outlet 29 at the end.

[0006] Furthermore, the internal partition layout of each functional area is as follows: pH adjustment zone: The first horizontal partition 8 is vertically arranged between the first vertical partition 9 and the side wall of the device. The three intersect each other perpendicularly to form a double chamber structure, wherein the first baffle 10 is located at the bottom of the first horizontal partition 8. Dosing and mixing zone: The second transverse partition 14 is vertically arranged between the second vertical partition 15 and the side wall of the device. The three intersect each other perpendicularly to form a double chamber structure. The second baffle 16 is located at the bottom of the second transverse partition 14. Mixing reaction zone: The third vertical baffle 18, the fourth vertical baffle 19 and the fifth vertical baffle 20 are alternately arranged to form a serpentine flow channel with alternating "bottom baffle port → top flow port"; Enhanced mixing reaction zone: The third transverse partition 26, the fourth transverse partition 27 and the seventh vertical partition 28 cross each other to divide the four chambers. The bottom of the third transverse partition 26 is provided with a fifth baffle 30 and the bottom of the fourth transverse partition 27 is provided with a sixth baffle 31.

[0007] Furthermore, a fifth overflow port 32 is provided above the seventh vertical partition 28.

[0008] Furthermore, the installation positions of all flow ports (12, 17, 24, 25, 32) meet the following requirements: located at the top of the vertical partition and connected to the channel wall; all have a size of 15cm × 15cm; and are 10-20cm high from the top of the device.

[0009] Furthermore, the circulating pump 5 is connected to the circulating inlet 7 via the circulating inlet pipe 6 and to the circulating outlet 3 via the circulating outlet pipe 4.

[0010] Compared with existing technologies, the advantages of this utility model are: (1) Save space resources by freeing up the sequencing batch pool to serve as a backup pool for other difficult-to-treat wastewater in the plant.

[0011] (2) To achieve precise addition of sodium hypochlorite reagent, effectively avoid waste, and thus reduce the treatment cost of chemical nickel wastewater.

[0012] (3) This device has a simple structure and is easy to replicate and promote. It can easily meet the treatment needs of both large and small water volumes.

[0013] (4) This device occupies a small area and has a low investment cost.

[0014] (5) The use of hydraulic fluidization avoids the corrosion problem associated with mechanical stirring and significantly reduces the equipment failure rate.

[0015] (6) Ensure that the quality of the effluent is stable and meets the standards. The nickel and total phosphorus in the effluent are stable and meet the emission requirements specified in Table 2 of the "Electroplating Pollutant Discharge Standard" (GB21900 2008). Attached Figure Description

[0016] Figure 1 This is a top view of the present invention. Figure 2 This is the front view of the present invention. Figure 3 This is a schematic diagram of the structure of this utility model.

[0017] Wherein: 1-Inlet, 2-Acidification port, 3-Circulation outlet, 4-Circulation outlet pipe, 5-Circulation pump, 6-Circulation inlet pipe, 7-Circulation inlet, 8-First horizontal baffle, 9-First vertical baffle, 10-First baffle, 11-Online pH meter, 12-First overflow port, 13-Dosing port, 14-Second horizontal baffle, 15-Second vertical baffle, 16-Second baffle, 17-Second overflow port 18-Third vertical baffle, 19-Fourth vertical baffle, 20-Fifth vertical baffle, 21-Sixth vertical baffle, 22-Third baffle, 23-Fourth baffle, 24-Third overflow port, 25-Fourth overflow port, 26-Third transverse baffle, 27-Fourth transverse baffle, 28-Seventh vertical baffle, 29-Outlet, 30-Fifth baffle, 31-Sixth baffle, 32-Fifth overflow port. Detailed Implementation

[0018] The present invention will be further described and illustrated below with reference to the accompanying drawings and specific embodiments.

[0019] As shown in the figure, this utility model provides a pretreatment tank device for chemical nickel plating wastewater, characterized in that it includes an integrated reaction tank and a pH adjustment zone, a chemical dosing and mixing zone, a mixing reaction zone, and an enhanced mixing reaction zone integrated within the reaction tank and connected in sequence, and the following vertical partitions are provided as physical boundaries of the functional zones: First vertical partition 9: Separates the pH adjustment zone and the dosing and mixing zone, and its top is provided with a first flow port 12 to connect the two zones; The second vertical partition 15 separates the dosing and mixing zone from the mixing and reaction zone, and its top is provided with a second flow port 17 to connect the two zones; The sixth vertical partition 21 separates the mixing reaction zone from the enhanced mixing reaction zone, and its top is provided with a fourth flow port 25 to connect the two zones.

[0020] The pH adjustment zone is equipped with an inlet 1, an acid addition port 2, a circulation inlet 7, a circulation inlet pipe 6, a circulation outlet pipe 4, a circulation outlet 3, a circulation pump 5, a first horizontal baffle 8, a first deflector 10, and an online pH meter 11; the chemical mixing zone is equipped with a chemical addition port 13, a second horizontal baffle 14, and a second deflector 16; the mixing reaction zone is equipped with a third vertical baffle 18, a fourth vertical baffle 19, and a fifth vertical baffle 20, wherein: the third vertical baffle 18 has a third deflector 22 at its bottom, the fourth vertical baffle 19 has a third overflow port 24 at its top, and the fifth vertical baffle 20 has a fourth deflector 23 at its bottom; the enhanced mixing reaction zone is equipped with a third horizontal baffle 26, a fourth horizontal baffle 27, and a seventh vertical baffle 28, and an outlet 29 at its end.

[0021] The internal partition layout of each functional area is as follows: pH adjustment zone: The first horizontal partition 8 is vertically arranged between the first vertical partition 9 and the side wall of the device. The three intersect each other perpendicularly to form a double chamber structure, wherein the first baffle 10 is located at the bottom of the first horizontal partition 8. Dosing and mixing zone: The second transverse partition 14 is vertically arranged between the second vertical partition 15 and the side wall of the device. The three intersect each other perpendicularly to form a double chamber structure. The second baffle 16 is located at the bottom of the second transverse partition 14. Mixing reaction zone: The third vertical baffle 18, the fourth vertical baffle 19 and the fifth vertical baffle 20 are alternately arranged to form a serpentine flow channel with alternating "bottom baffle port → top flow port"; Enhanced mixing reaction zone: The third transverse partition 26, the fourth transverse partition 27 and the seventh vertical partition 28 cross each other to divide the four chambers. The bottom of the third transverse partition 26 is provided with a fifth baffle 30 and the bottom of the fourth transverse partition 27 is provided with a sixth baffle 31.

[0022] A fifth overflow port 32 is provided above the seventh vertical partition 28.

[0023] The installation positions of all flow ports (12, 17, 24, 25, 32) meet the following requirements: located at the top of the vertical partition and connected to the channel wall; all have a size of 15cm × 15cm; and are 10-20cm high from the top of the device.

[0024] The circulating pump 5 is connected to the circulating inlet 7 via the circulating inlet pipe 6 and to the circulating outlet 3 via the circulating outlet pipe 4.

[0025] The system's processing flow is as follows: Wastewater enters the pH adjustment zone through inlet 1. Driven by circulating pump 5 (circulating inlet 7 → circulating inlet pipe 6 → circulating pump 5 → circulating outlet pipe 4 → circulating outlet 3), it forms turbulent flow with the first baffle 10 at the bottom of the transverse baffle 8. The pH is precisely adjusted by online pH meter 11 in conjunction with acid addition port 2. Subsequently, it overflows through the first overflow port 12 at the top of vertical baffle 9 to the dosing and mixing zone, where it is initially mixed with the reagent added by dosing port 13 through the second baffle 16 on the second transverse baffle 14. Then, it flows into the mixing reaction zone and reacts along the serpentine flow channel (vertical baffles 18 / 19 / 20 / 21) through the alternating baffles 22 / 4 baffle 23 and the third overflow port 24 / 4 overflow port 25. Finally, it enters the enhanced mixing reaction zone, where it forms a cross baffle through the third transverse baffle 26, the fourth transverse baffle 27, and the seventh vertical baffle 28. After enhanced mixing at the fifth baffle 30 / sixth baffle 31 at the bottom, the water is discharged from the outlet 29.

[0026] This invention achieves dynamic coupling of the conversion efficiency of active oxidants and pollutants during wastewater treatment through the coordinated control of a hydraulic circulation unit and an oxidation complex-breaking module, thereby constructing a directional reaction system for the decomposition of complexed nickel and the generation of orthophosphate. In summary, this device effectively solves the bottleneck problems in treatment efficiency caused by uneven mixing, incomplete complex breaking, and excessive floor space in traditional oxidation processes, providing an intensive technical solution for the pretreatment of electroplating wastewater with zero mechanical stirring loss, high pollutant conversion rate, and reduced floor space. Example

[0027] To make the objectives, technical solutions, and advantages of the embodiments of this utility model clearer, the technical solutions of the embodiments of this utility model will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this utility model, and not all embodiments.

[0028] A pretreatment tank device for chemical nickel plating wastewater was trial-produced using the above technical solution, such as... Figure 1 , Figure 2 and Figure 3 As shown.

[0029] The system includes an inlet 1, an acid inlet 2, a circulating outlet 3, a circulating outlet pipe 4, a circulating pump 5, a circulating inlet pipe 6, a circulating inlet 7, a first horizontal baffle 8, a first vertical baffle 9, a first deflector 10, an online pH meter 11, a first overflow port 12, a chemical dosing port 13, a second horizontal baffle 14, a second vertical baffle 15, a second deflector 16, a second overflow port 17, a third vertical baffle 18, a fourth vertical baffle 19, a fifth vertical baffle 20, a sixth vertical baffle 21, a third deflector 22, a fourth deflector 23, a third overflow port 24, a fourth overflow port 25, a third horizontal baffle 26, a fourth horizontal baffle 27, a seventh vertical baffle 28, an outlet 29, a fifth deflector 30, a sixth deflector 31, and a fifth overflow port 32.

[0030] The device includes an integrated reaction tank and, within the reaction tank, sequentially connected pH adjustment zone, dosing and mixing zone, mixing reaction zone, and enhanced mixing reaction zone, with the following vertical partitions serving as the physical boundaries of the functional zones: First vertical partition 9: Separates the pH adjustment zone and the dosing and mixing zone, and its top is provided with a first flow port 12 to connect the two zones; The second vertical partition 15 separates the dosing and mixing zone from the mixing and reaction zone, and its top is provided with a second flow port 17 to connect the two zones; The sixth vertical partition 21 separates the mixing reaction zone from the enhanced mixing reaction zone, and its top is provided with a fourth flow port 25 to connect the two zones.

[0031] The pH adjustment zone is equipped with an inlet 1, an acid addition port 2, a circulation inlet 7, a circulation inlet pipe 6, a circulation outlet pipe 4, a circulation outlet 3, a circulation pump 5, a first horizontal baffle 8, a first deflector 10, and an online pH meter 11; the chemical mixing zone is equipped with a chemical addition port 13, a second horizontal baffle 14, and a second deflector 16; the mixing reaction zone is equipped with a third vertical baffle 18, a fourth vertical baffle 19, and a fifth vertical baffle 20, wherein: the third vertical baffle 18 has a third deflector 22 at its bottom, the fourth vertical baffle 19 has a third overflow port 24 at its top, and the fifth vertical baffle 20 has a fourth deflector 23 at its bottom; the enhanced mixing reaction zone is equipped with a third horizontal baffle 26, a fourth horizontal baffle 27, and a seventh vertical baffle 28, and an outlet 29 at its end.

[0032] The internal partition layout of each functional area is as follows: pH adjustment zone: The first horizontal partition 8 is vertically arranged between the first vertical partition 9 and the side wall of the device. The three intersect each other perpendicularly to form a double chamber structure, wherein the first baffle 10 is located at the bottom of the first horizontal partition 8. Dosing and mixing zone: The second transverse partition 14 is vertically arranged between the second vertical partition 15 and the side wall of the device. The three intersect each other perpendicularly to form a double chamber structure. The second baffle 16 is located at the bottom of the second transverse partition 14. Mixing reaction zone: The third vertical baffle 18, the fourth vertical baffle 19 and the fifth vertical baffle 20 are alternately arranged to form a serpentine flow channel with alternating "bottom baffle port → top flow port"; Enhanced mixing reaction zone: The third transverse partition 26, the fourth transverse partition 27 and the seventh vertical partition 28 cross each other to divide the four chambers. The bottom of the third transverse partition 26 is provided with a fifth baffle 30 and the bottom of the fourth transverse partition 27 is provided with a sixth baffle 31.

[0033] A fifth overflow port 32 is provided above the seventh vertical partition 28.

[0034] The installation positions of all flow ports (12, 17, 24, 25, 32) meet the following requirements: located at the top of the vertical partition and connected to the channel wall; all have a size of 15cm × 15cm; and are 15cm high from the top of the device.

[0035] The circulating pump 5 is connected to the circulating inlet 7 via the circulating inlet pipe 6 and to the circulating outlet 3 via the circulating outlet pipe 4.

[0036] At one of our company's project sites in Ningbo, a pilot-scale device was used to treat wastewater from on-site chemical nickel plating. The experimental results are as follows: Table 1 Raw water quality 325 1200 20 3.1 For the on-site water sample test, a dynamic test was adopted. The sodium hypochlorite reagent dosage of the device was set to 50~60 ml / L, the reaction time was set to 60 min, and the reaction pH was set to 3.0~4.0. After the reaction, the pH of the effluent was adjusted to 11.0 for precipitation. The total nickel and total phosphorus data in the supernatant were detected. The experimental data are shown in Table 2.

[0037] Table 2 Dynamic test data Total nickel in effluent (mg / L) <0.1 <0.1 <0.1 <0.1 Total phosphorus in effluent (mg / L) 3.0 2.1 1.0 2.5 The results show that, in this project, the heavy metal removal rate is as high as 99.9% or more after treatment by the device provided by this utility model, and the total nickel and total phosphorus in the precipitated water meet the emission requirements of Table 2 of the "Electroplating Pollutant Emission Standard" (GB21900-2008).

[0038] The above-described embodiments are merely illustrative of one implementation of this utility model and are not intended to limit it. It should be noted that those skilled in the art can modify the technical solutions described in the above embodiments or make equivalent substitutions for some or all of the technical features; however, these modifications or substitutions do not cause the essence of the corresponding technical solutions to depart from the protection scope of this utility model. All other embodiments obtained by those skilled in the art based on the embodiments of this utility model without creative effort are within the protection scope of this utility model.

Claims

1. A pretreatment tank device for chemical nickel plating wastewater, characterized in that, It includes an integrated reaction tank and, within the reaction tank, sequentially connected pH adjustment zone, dosing and mixing zone, mixing reaction zone, and enhanced mixing reaction zone, with the following vertical partitions serving as the physical boundaries of the functional zones: First vertical partition (9): Separates the pH adjustment zone from the dosing and mixing zone, and its top is provided with a first flow port (12) to connect the two zones; The second vertical partition (15) separates the dosing and mixing zone from the mixing and reaction zone. A second flow port (17) is provided at the top of the partition to connect the two zones. The sixth vertical partition (21) separates the mixing reaction zone from the enhanced mixing reaction zone, and its top is provided with a fourth flow port (25) to connect the two zones.

2. The device for pretreatment of chemical nickel plating wastewater according to claim 1, characterized in that: The pH adjustment area is equipped with an inlet (1), an acid addition port (2), a circulation inlet (7), a circulation inlet pipe (6), a circulation outlet pipe (4), a circulation outlet (3), a circulation pump (5), a first transverse baffle (8), a first baffle (10), and an online pH meter (11). The dosing and mixing zone is provided with a dosing port (13), a second transverse partition (14) and a second baffle (16). The mixing reaction zone is provided with a third vertical partition (18), a fourth vertical partition (19), and a fifth vertical partition (20), wherein: The bottom of the third vertical partition (18) is provided with a third baffle (22). The fourth vertical partition (19) has a third flow port (24) at the top. The bottom of the fifth vertical partition (20) is provided with a fourth baffle (23). The enhanced mixing reaction zone is provided with a third transverse baffle (26), a fourth transverse baffle (27) and a seventh vertical baffle (28), and an outlet (29) at the end.

3. The device for pretreatment of chemical nickel plating wastewater according to claim 2, characterized in that, The internal partition layout of each functional area is as follows: pH adjustment zone: The first horizontal partition (8) is vertically arranged between the first vertical partition (9) and the side wall of the device. The three intersect each other perpendicularly to form a double chamber structure, wherein the first baffle (10) is located at the bottom of the first horizontal partition (8); Dosing and mixing zone: The second transverse partition (14) is vertically arranged between the second vertical partition (15) and the side wall of the device. The three intersect each other perpendicularly to form a double chamber structure. The second baffle (16) is located at the bottom of the second transverse partition (14). Mixing reaction zone: The third vertical baffle (18), the fourth vertical baffle (19) and the fifth vertical baffle (20) are alternately set to form a serpentine flow channel with alternating "bottom baffle port → top flow port"; Enhanced mixing reaction zone: The third transverse partition (26), the fourth transverse partition (27) and the seventh vertical partition (28) are cross-shaped to divide the four chambers. The bottom of the third transverse partition (26) is provided with a fifth baffle (30) and the bottom of the fourth transverse partition (27) is provided with a sixth baffle (31).

4. The device for pretreatment tank of chemical nickel plating wastewater according to claim 2, characterized in that, The seventh vertical partition (28) is provided with a fifth flow outlet (32).

5. The device for pretreatment of electroless nickel plating wastewater according to claim 4, characterized in that, The installation positions of all flow ports (12, 17, 24, 25, 32) meet the following requirements: located at the top of the vertical partition and connected to the channel wall; all have a size of 15cm × 15cm; and are 10-20cm high from the top of the device.

6. The device for pretreatment tank of chemical nickel plating wastewater according to claim 2, characterized in that, The circulating pump (5) is connected to the circulating inlet (7) through the circulating inlet pipe (6) and to the circulating outlet (3) through the circulating outlet pipe (4).

Images