Operation graphical user interface (2) of computer chip manufacturing practical training platform

Abstract

1. The name of the design product: the operation graphical user interface (2) of the computer chip manufacturing practical training platform. 2. The use of the design product: running programs. 3. The design points of the design product: the interface content and interaction mode of the graphical user interface in the screen. 4. The picture or photo that best indicates the design points: design 1 front view. 5. The computer is a common design, no design points, omit the rear view, left view, right view, top view, and bottom view of designs 1 to 6. 6. Design 1 is designated as the basic design. 7. The use of the graphical user interface: the interface is mainly used for the operation control of the chip manufacturing practical training platform, and users can personally manipulate on the platform to complete the core process steps and truly experience the whole process of chip manufacturing. 8. The human-computer interaction mode of the graphical user interface: there are six device graphical option buttons of "PECVD", "CMP", "LPCVD", "PVD", "CCP Etcher", and "Ion implantation" in the interface of design 1 front view, by clicking the "PECVD" device graphical option button, jump to design 1 interface change state diagram 1; there is a "next step" option button in the upper right corner of design 1 interface change state diagram 1, by clicking the "next step" option button, jump to design 1 interface change state diagram 2; there is a "next step" option button in the upper right corner of design 1 interface change state diagram 2, after filling in the parameters in the middle of design 1 interface change state diagram 2, click the "next step" option button to jump to design 1 interface change state diagram 3. There are six device graphical option buttons of "PECVD", "CMP", "LPCVD", "PVD", "CCP Etcher", and "Ion implantation" in the interface of design 2 front view (same as design 1), by clicking the "CMP" device graphical option button, jump to design 2 interface change state diagram 1; there is a "next step" option button in the upper right corner of design 2 interface change state diagram 1, by clicking the "next step" option button, jump to design 2 interface change state diagram 2; there is a "next step" option button in the upper right corner of design 2 interface change state diagram 2, after filling in the parameters in the middle of design 2 interface change state diagram 2, click the "next step" option button to jump to design 2 interface change state diagram 3. In the design 3 main view interface is provided with "PECVD", "CMP", "LPCVD", "PVD", "CCP Etcher" and "Ion implantation" six equipment graphical option button (same as design 1), by clicking "LPCVD" equipment graphical option button, jump to design 3 interface change state diagram 1; Design 3 interface change state diagram 1 is provided with "next" option button in the upper right corner, by clicking "next" option button, jump to design 3 interface change state diagram 2; Design 3 interface change state diagram 2 is provided with "next" option button in the upper right corner, after filling in the parameters in the middle of design 3 interface change state diagram 2, by clicking "next" option button, jump to design 3 interface change state diagram 3. In the design 4 main view interface is provided with "PECVD", "CMP", "LPCVD", "PVD", "CCP Etcher" and "Ion implantation" six equipment graphical option button (same as design 1), by clicking "PVD" equipment graphical option button, jump to design 4 interface change state diagram 1; Design 4 interface change state diagram 1 is provided with "next" option button in the upper right corner, by clicking "next" option button, jump to design 4 interface change state diagram 2; Design 4 interface change state diagram 2 is provided with "next" option button in the upper right corner, after filling in the parameters in the middle of design 4 interface change state diagram 2, by clicking "next" option button, jump to design 4 interface change state diagram 3. In the design 5 main view interface is provided with "PECVD", "CMP", "LPCVD", "PVD", "CCP Etcher" and "Ion implantation" six equipment graphical option button (same as design 1), by clicking "CCP Etcher" equipment graphical option button, jump to design 5 interface change state diagram 1; Design 5 interface change state diagram 1 is provided with "next" option button in the upper right corner, by clicking "next" option button, jump to design 5 interface change state diagram 2; Design 5 interface change state diagram 2 is provided with "next" option button in the upper right corner, after filling in the parameters in the middle of design 5 interface change state diagram 2, by clicking "next" option button, jump to design 5 interface change state diagram 3. In the design 6 main view interface is equipped with "PECVD", "CMP", "LPCVD", "PVD", "CCP Etcher" and "lon implantation" six equipment graphic option button (same as design 1), by clicking "lon implantation" equipment graphic option button, jump to design 6 interface change state diagram 1, design 6 interface change state diagram 1 right upper corner is equipped with "next" option button, by clicking "next" option button, jump to design 6 interface change state diagram 2, design 6 interface change state diagram 2 right upper corner is equipped with "next" option button, in design 6 interface change state diagram 2 middle part fills out parameter, by clicking "next" option button, jump to design 6 interface change state diagram 3.

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