Top (Plaid Cloud Pattern dm26SSTP111ADQ1)
CN309993846SActive Publication Date: 2026-05-26XIAMEN FENGGU FASHION CO LTD
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Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- XIAMEN FENGGU FASHION CO LTD
- Filing Date
- 2025-10-01
- Publication Date
- 2026-05-26
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Figure 000001_ABST
Abstract
1. Name of the product in this design: Top (Plaid Stacked Cloud Layer dm26SSTP111ADQ1). 2. Intended use of this design: for wearing. 3. The key design features of this product are the combination of shape and pattern. 4. The image or photograph that best illustrates the design's key features: the front view. 5. Since the information is already clearly expressed in the submitted views, other views are omitted. 6. Other situations requiring explanation: The clothing models are only for better product display and do not require protection.
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