Phototherapy mask
CN310041061SActive Publication Date: 2026-06-19高奇玉
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Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- 高奇玉
- Filing Date
- 2025-12-09
- Publication Date
- 2026-06-19
Smart Images
Figure 000001_ABST
Abstract
1. Name of the product in this design: Phototherapy Mask. 2. Purpose of this design: To be worn on the face to generate light that irradiates the facial skin, thus achieving cosmetic and therapeutic effects. 3. The key design feature of this product is its shape. 4. The image or photograph that best illustrates the design's key points: a 3D model.
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