System and method for automated processing of multiple samples in BIB system

Abstract

To disclose a system and a method for efficiently processing a plurality of samples by using a BIB system.SOLUTION: An exemplary method for efficiently processing a plurality of samples using a BIB system (102) according to the present invention comprises: removing an individual sample holder (116) containing a sample (104) from a storage location in the BIB system, where the BIB system comprises a plurality of sample holders arranged in one or more storage locations; loading the individual sample holder onto a sample stage (112) configured to hold the sample holder during polishing of a corresponding sample held by the individual sample holder; causing a BIB source to emit a broad ion beam (108) toward the sample, where the broad ion beam removes at least a portion of the sample upon which it is incident. Once a desired portion of the sample has been removed, the sample holder is removed from the sample stage and returned to the storage location.SELECTED DRAWING: Figure 1

Description

[Background technology]

[0001] Broad ion beam (BIB) polishing systems are used to prepare samples for investigation. Specifically, BIB polishing systems direct a high-energy, unfocused, or minimally focused beam of ions (e.g., argon ions) at a sample, where the beam degrades and / or otherwise removes portions of the sample upon which it impinges. Because broad ion beams do not require focusing or only minimal focusing, BIB polishing systems do not have the optical column limitations of other sample preparation techniques (such as focused ion beam (FIB) milling), and therefore, BIB polishing systems can use much higher primary energy beam currents. Due to the higher primary energy beam current, BIB systems can remove sample material to expose regions of interest more quickly than conventional systems, enabling a faster sample preparation process.

[0002] Unfortunately, while sample material removal is highly efficient, the processed sample must be precisely aligned with a special mask designed to block part of the beam from impinging on areas of the sample where the user does not want removal. This alignment process is time-consuming and requires precise skill, slowing down the sample preparation workflow. Furthermore, because higher-current broad ion beams remove sample material more quickly, the rate of redeposition of the removed material onto the broad ion beam source also increases, forcing users to remove the broad ion beam source more frequently for cleaning, which requires system downtime. Due to these limitations on workflow efficiency, the majority of current uses of BIB polishing systems have been in academic and other non-commercial applications. Therefore, it is desirable to have a new BIB polishing system that can efficiently and accurately process many samples in a shorter time. Summary of the Invention

[0003] Systems and methods for efficiently processing multiple samples using a broad ion beam (BIB) system are disclosed. An exemplary method for efficiently processing multiple samples using a BIB system according to the present invention includes removing individual sample holders containing samples from storage locations within the BIB system, the BIB system including multiple sample holders arranged in one or more storage locations; loading the individual sample holders onto a sample stage configured to hold the sample holders during polishing of the corresponding samples held by the individual sample holders; and causing a BIB source to emit a broad ion beam toward the samples, the broad ion beam removing at least a portion of the sample upon which it is incident. Once the desired portion of the sample has been removed, the sample holder is removed from the sample stage and returned to the storage location. This process can be repeated for multiple samples stored in the BIB system. In this manner, if the samples are pre-aligned, processing of multiple samples can be performed with little user input or oversight. [Brief explanation of the drawings]

[0004] The detailed description will be set forth with reference to the accompanying drawings, in which the left-most digit(s) of a reference number identifies the figure in which the reference number first appears. The same reference number in different figures indicates similar or identical items. [Figure 1] 1 shows a cross-sectional view of an exemplary BIB system according to the present disclosure configured to process multiple samples more efficiently. [Figure 2] 1 illustrates an exemplary environment for more efficient processing of multiple samples within a sample preparation workflow. [Figure 3] 1 depicts an exemplary process for processing samples using a dual BIB system that allows for increased system uptime, in accordance with the present invention. [Figure 4] 1 depicts an exemplary process for processing a sample using a dual-mode optical and BIB milling system for more efficient sample processing in accordance with the present invention. [Figure 5]1 illustrates an exemplary process for processing multiple samples in a dual BIB system with reduced downtime according to the present invention. [Figure 6] 1 depicts an exemplary process for processing samples using a BIB system that allows for increased system uptime, in accordance with the present invention. [Figure 7A] FIG. 1 is an exemplary diagram showing a sample pre-aligned with a first mask and then processed in a BIB system including a second mask. [Figure 7B] FIG. 1 is an exemplary diagram showing a sample pre-aligned with a first mask and then processed in a BIB system including a second mask.

[0005] Like reference numerals refer to corresponding parts throughout the several views of the drawings. Generally, in the figures, elements that are likely to be included in a given example are shown with solid lines, while elements that are optional in a given example are shown with dashed lines. However, elements shown with solid lines are not required for all examples of the present disclosure, and elements shown with solid lines may be omitted from particular examples without departing from the scope of the present disclosure. DETAILED DESCRIPTION OF THE INVENTION

[0006] Disclosed herein are systems and methods for using broad ion beam (BIB) systems for more efficient processing of multiple samples. More specifically, the disclosure includes BIB systems configured to receive and process one or more samples with increased throughput and / or uptime over current BIB systems.

[0007] 1 is a diagram of a cross section 100 of exemplary BIB system(s) 102 according to the present disclosure configured to more efficiently process multiple samples 104. The BIB system 102 includes a BIB source 106 configured to emit a broad ion beam 108 along a BIB axis 110 toward a sample stage region 112. The broad ion beam 108 is configured such that when a portion of the broad ion beam 108 is incident on the sample 104, material of the sample on which the broad ion beam is incident is milled or otherwise removed from the sample. For example, in some embodiments, the BIB source 106 may be an Ar ion source configured to emit a beam of argon ions toward the sample stage 112.

[0008] The sample stage region 112 may include a mask 114 configured to block a portion of the broad ion beam 108 such that sample material corresponding to a portion of interest is not milled or otherwise removed from the sample 104 by the incident ions. For example, Figure 1 shows a first portion of a cross-section of the broad ion beam 108(a) incident on the mask 114 and a second portion of the cross-section of the broad ion beam 108(a) partially incident on a portion of the sample 104 where material will be milled or otherwise removed by the broad ion beam 108. The mask 114 is constructed of a hard material that is not degraded by the broad ion beam 108, allowing it to be used to process multiple samples.

[0009] The sample stage region 112 can also include a holder interface configured to receive a sample holder 116, thereby positioning and holding the holder interface relative to the mask 114 so that the mask protects a portion of the sample 104 during processing. In some embodiments, the sample stage region 112 can include a stage element capable of translating, tilting, or rotating the sample 104 / sample holder 116. Additionally, in such embodiments, the stage element may be further configured to translate, tilt, or rotate the sample 104 / sample holder 116 while the BIB source 106 emits the broad ion beam 108 toward the sample 104. For example, the stage element can be configured to periodically or continuously rotate the sample 104 / sample holder 116 through a series of predetermined angular positions and / or to oscillate the sample 104 / sample holder 116 between two angular positions during milling with a broad ion beam. Such translation / tilting / rotation can occur at a constant or variable rate. In this manner, the stage element can dynamically vary the portion of the sample 104 that is irradiated by the broad ion beam 108 to enable more efficient or otherwise optimized removal of sample material and / or polishing of the target area by the BIB system 102.

[0010] The sample holders 116 are configured to hold the samples 104 during processing and during transport of the samples 104 to, from, and / or within the BIB system 102. FIG. 1 further illustrates the BIB system 102 as including one or more additional samples 104(a) held by corresponding additional sample holders 116(a). In some embodiments, the BIB system 102 has one or more optional sample storage volumes / areas 118 in which sample holders can be placed within the BIB system 102 when the samples 104 they hold are not currently being processed. FIG. 1 also illustrates the BIB system 102 as including a storage cassette 120 configured to hold multiple sample holders 116 arranged within a cassette storage volume 122. The storage cassette 120 is configured to allow many samples 104 and their corresponding sample holders 116 to be transported and / or loaded into the BIB system 102.

[0011] In some embodiments, the sample holder 116 may include one or more optional adjustment elements 124 that allow the sample 104 to be translated, tilted, rotated, or otherwise repositioned relative to the sample holder 116, the broad ion beam 108, and / or the mask 114. In embodiments with such adjustment elements 118, the BIB system 112 may include one or more interface elements that allow a user to manipulate the adjustment elements or the sample holder 116 itself so that the sample 104 has a desired geometric relationship with the mask 114 or mask features (e.g., mask edge 114(a)). While FIG. 1 illustrates the adjustment elements 124 as screws, one skilled in the art will appreciate that there are many types of known adjustment elements that can translate, tilt, rotate, or otherwise reposition a sample relative to various types of sample holders. FIG. 1 also illustrates a sample holder manipulator 126 configured to reposition the sample holder 116 within the BIB system 102. For example, the sample holder manipulator 126 may be configured to move the sample holder between the sample holder storage volume 118 and the sample stage area 112. Additionally, in some embodiments, the sample holder manipulator 126 may be further configured to interface with the adjustment element 124 to effect translation, tilt, rotation, etc. of the sample 104.

[0012] The BIB system 102 also includes a housing 128 that defines an internal volume 130. In some embodiments, the internal volume may be a sealed volume that does not allow gas to pass between the internal volume and the external environment. In such embodiments, the internal volume may include a pumping system 132 configured to adjust the pressure of the internal volume and / or change the gas composition of the environment within the internal volume 130. For example, the pumping system 132 may bring the internal volume 130 to a lower pressure than the outside environment and / or create a vacuum. While FIG. 1 illustrates at least a portion of the pumping system 132 as optionally contained within the internal volume, those skilled in the art will understand that part or all of such a pumping system 132 may be located outside the internal volume 130. Alternatively, the pumping system 132 may cause the gas composition of the environment within the internal volume 130 to consist of an inert gas (e.g., a gas that does not interact with the broad ion beam 108 and / or sample 104 materials during processing). The BIB system 102 is also shown as having a sample holder port 134 through which the sample holder 116 may be inserted into and / or removed from the BIB system 102. Additionally, Figure 1 further shows the BIB system 102 as having an optional cassette port 136 configured to allow a storage cassette 120 to be inserted into and / or removed from the BIB system 102.

[0013] 1 further illustrates the BIB system 102 as including a source housing 138 that defines a source volume 140 configured to house the BIB source 106. The source housing 138 also defines a BIB opening 142 connecting the source volume 140 to the interior volume 130 and a BIB source maintenance opening 144 (e.g., a flange, door, or other type of sealable component that allows the source housing 138 to be switched between a hermetically closed state and a non-hermetically closed state from the external environment) that allows the BIB source 106 to be removed from or reinstalled within the source volume 140 (i.e., the source maintenance opening 144 allows the BIB source 106 to be removed from or accessed through the opening 144 when non-sealed). The BIB system 102 may further include a valve 146 configured to switch between an open state that allows ions emitted from the BIB source 130 to pass from the ion source volume 140 to the internal volume 130 through the BIB opening 142, and a sealed state in which the valve 146 prevents ions or emissions from the sample 104 from passing from the internal volume 130 to the ion source volume 106. Those skilled in the art will appreciate that the valve 146 may correspond to any one of a shutter, a valve, a door, or other sealing mechanism that can be switched between an open state and a closed state.

[0014] 1 shows the valve 146 in an open state to allow the broad ion beam 108 to pass into the interior volume to be incident on the sample 104 and the mask 114. In some embodiments, when the valve 146 is in a closed state, the source volume 140 can be opened to the outside environment (e.g., via the BIB source maintenance opening 144) without affecting the pressure within the interior volume. In this manner, when the valve 146 is in a closed state, the BIB source maintenance opening 144 can be opened to allow the BIB source 106 to be cleaned, adjusted, removed, replaced, and / or otherwise maintained without affecting the pressure or gas composition of the interior volume 130. In such embodiments, the source volume 140 can further include an optional pumping system that can re-establish the pressure and / or gas composition to match the pressure and / or gas composition of the interior volume 130. The BIB source maintenance opening 144 may comprise a port configured to switch between an open state in which the first BIB source 106 may be removed from or reinstalled within the source volume 140, and a closed state in which the source volume 140 is sealed from the external environment.

[0015] Unlike a focused ion beam (FIB) system, the BIB system 102 does not include an optical column including optical elements configured to focus ions emitted by the BIB source 106, resulting in ions having a small spot size in and around the sample plane of the sample 104. Such optical elements can only focus, correct, adjust, and / or otherwise manipulate an ion beam below a certain intensity threshold. Because such optical elements are not required to focus ions emitted by the BIB source 106, the intensity of the broad ion beam (i.e., primary beam current) used in the BIB system 102 can be much greater than in a FIB system. This increased beam current allows the BIB system 102 to remove sample material much faster than a FIB system. Applicant acknowledges that one skilled in the art would understand that, while some optical elements may be included to focus the broad ion beam in the BIB system 102, the inclusion of such elements imposes smaller beam current limitations on the BIB system 102 than on a FIB system.

[0016] Due to the increased beam intensity of the broad ion beam 108, material of the sample 104 onto which the broad ion beam 108 is incident is removed at a faster rate than in a FIB milling process. Specifically, because the broad ion beam 108 has a higher beam intensity and is incident on a larger area of ​​the sample, the rate at which material is removed from the sample 104 is much higher than in a FIB system. Unfortunately, this increase in sample material removal causes a proportional increase in material redeposition as portions of the sample 104 removed by the broad ion beam 108 are redeposited on surfaces within the interior volume 130 and / or source volume 140. In current BIB systems, this redeposition on the BIB source 106 imposes a significant efficiency penalty because redeposition on the BIB source 106 forces users to frequently remove and / or otherwise access the BIB source 106 for cleaning and maintenance. Due to this cleaning and maintenance, current BIB systems have a high percentage of downtime that cannot be used for sample processing.

[0017] 1 illustrates the BIB system 102 as including an optional additional BIB source 148 configured to emit an additional broad ion beam along an emission axis 150. The additional BIB source 148 is shown disposed within an additional source volume 152 defined by an additional source housing 154. The additional source housing 154 also defines an additional BIB opening 156 connecting the additional source volume 148 to the internal volume 130 and an additional BIB source maintenance opening 158 that allows the additional BIB source 148 to be removed from or reinstalled within the additional source volume 148.

[0018] The BIB system 102 may further include an additional valve 148 configured to switch between an open state that allows ions emitted from the additional BIB source 152 to pass from the additional source volume 152 to the internal volume 130 through an additional BIB opening 156 and a sealed state in which the additional valve 160 prevents ions or emissions from the sample 104 from passing from the internal volume 130 to the additional source volume 160. When the valve 160 is in the closed state, the additional source volume 152 may be opened to the external environment (e.g., via the additional BIB source maintenance opening 158) without affecting the pressure within the internal volume 130. Thus, when the valve 160 is in the closed state, the BIB source maintenance opening 158 may be removed to allow the additional BIB source 148 to be cleaned, adjusted, removed, replaced, and / or otherwise maintained without affecting the pressure or gas composition of the internal volume 130.

[0019] 1 shows the valve 160 in a closed state such that sample material removed from the sample 104 via the broad ion beam 108 is not allowed to pass into the additional ion source volume 152 and / or be redeposited on the additional BIB source 148. According to the present invention, because redeposition does not occur on the additional BIB source 140 while the BIB source 148 is in use, the additional BIB source 140 can be used to process the sample 104 (or additional samples) when the BIB source 148 needs to be removed and / or accessed for cleaning and / or maintenance. Therefore, the valve 146 can be closed to seal the source volume 140 from the internal volume 130, allowing the valve 160 to be opened, so that the additional BIB source 148 can be used to emit an additional broad ion beam through the additional BIB opening 156 to process samples. Thus, in some embodiments of the present disclosure, the BIB system 102 can continuously process samples without downtime, significantly improving its efficiency. Additionally, although not shown in FIG. 1, in various embodiments, the BIB system 102 may include only one BIB source, or may include three or more BIB sources.

[0020] FIG. 1 also illustrates the BIB system 102 as optionally including a laser source 162 disposed within the laser volume 164, which may be configured to emit an optical beam through a laser aperture 166 defined by a laser housing 168. The optical beam emitted by the laser source 162 is of higher beam energy and / or intensity than the broad ion beam 108, allowing the optical beam to remove incident sample material at rates 10 to 50 times greater than those possible with a broad ion beam. For example, in less than 10 minutes, an optical laser can remove as much nickel or cobalt as a broad ion beam can remove in 90 minutes. Furthermore, for harder materials, such as graphite, current broad ion beams take up to four hours to remove the same amount of material that an optical beam can remove in less than 10 minutes.

[0021] However, while sample material removal is more rapid with an optical beam, milling and / or processing with the optical beam also causes damage / burns to the remaining sample surface. Therefore, in embodiments of the present invention, the BIB system 102 can use the optical beam to quickly remove an initial portion of the sample 104, and the final portion of the sample 104 that needs to be removed is removed using a broad ion beam from a BIB source (e.g., the BIB source 106, the additional BIB source 148, or another BIB source within the BIB system 102). In this manner, a bulk portion of the sample 104 can be removed using the optical beam, and then the broad ion beam can be used to expose areas of interest and / or create a smoother or damage-free surface.

[0022] 1 further illustrates a computing device 170 associated with the BIB system 102. While FIG. 1 illustrates the computing device 170 as separate from the external device 112, in various embodiments, one or more of these elements may be combined. That is, applicants acknowledge that the computing device 170 may be a component of the BIB system 102, may be a device separate from the BIB system 102 that communicates via a network communication interface, or may be a combination thereof.

[0023] Those skilled in the art will appreciate that the computing device 170 shown in FIG. 1 is merely exemplary and is not intended to limit the scope of the present disclosure. Computing systems and devices may include any combination of hardware or software capable of performing the depicted functions, including computers, network devices, Internet appliances, PDAs, wireless telephones, controllers, etc. Computing device 170 may also be connected to other devices not shown, or alternatively, may operate as a stand-alone system. Additionally, functionality provided by the depicted components may, in some implementations, be combined into fewer components or distributed among additional components. Similarly, in some implementations, functionality of some of the depicted components may not be realized and / or other additional functionality may be available.

[0024] 1 further includes a schematic diagram showing an example computing architecture 180 of computing device 170. The example computing architecture 180 illustrates additional details of hardware and software components that may be used to implement the techniques described in this disclosure. In the example computing architecture 180, the computing hardware 170 of BIB system 102 includes one or more processors 182 and memory 184 communicatively coupled to the one or more processors 182.

[0025] The exemplary computing architecture 180 may include at least a control module 188 and a sample processing module 190 stored in memory 184. The exemplary computing architecture 180 is further shown as including sample information 192 and processing schedule(s) 194 stored in memory 184. The sample information 192 may correspond to data describing sample characteristics, sample identification, sample history, sample condition, sample positioning on a sample holder, sample composition, regions of interest within the sample, and surfaces of interest within the sample. The processing schedule(s) 194 may include one or more methods, settings, or instructions for processing the sample 104 in the BIB system 102 to achieve a desired result (i.e., exposing and polishing surfaces of interest within the sample 104 so that they may be inspected using a charged particle microscope system). For example, the processing schedule 194 may include one or more steps of the methods shown and described in connection with FIGS. 3-6 . The sample processing schedule 194 for a sample may include laser intensity, laser milling time, portion of the sample removed using the laser, BIB intensity, BIB milling time, portion of the sample removed using the BIB, target surface, processing order, sample identification information, area of ​​the sample to be removed, or combinations thereof. For example, the sample processing schedule 194 may be a data structure identifying multiple steps to be performed in a particular order by components of the BIB system 102, and the data structure may also identify various parameters of the components and / or individual steps. In some embodiments, such a processing schedule 194 may be at least partially presented to a user of the BIB system 102 to guide the processing of the sample, may be at least partially used by the computing device 170 to automate and / or adjust settings related to the processing of the sample, or combinations thereof.

[0026] In some embodiments, the sample information 192 and / or individual processing schedule(s) 194 may be entered into the computing device 170 by a user (e.g., using a keypad, keyboard, mouse, voice command, touchscreen, etc.), may be received via a hardware connection (e.g., CD / DVD, USB, HDMI, portable memory, etc.), may be received via a network connection (e.g., Bluetooth, Wi-Fi, Internet, etc.), may be received in association with a sample inserted into the BIB system 102 (e.g., accessible memory on the sample holder 116), may be generated based on sensor information or sample information 192, or a combination thereof. For example, in an exemplary embodiment, the BIB system 102 may be configured to receive an identifier via RFID on the sample holder 116, access the sample information 192 associated with the identifier via a network connection, and then identify or generate a processing schedule 194 for the sample 104 based on the identifier, the sample information, or both.

[0027] As used herein, the term "module" is intended to represent an exemplary division of executable instructions for purposes of discussion, and is not intended to represent any type of requirement or required method, manner, or organization. Thus, while various "modules" are described, their functions and / or similar functions may be arranged differently (e.g., combined into fewer modules, divided into more modules, etc.). Furthermore, while certain functions and modules are described herein as being implemented by software and / or firmware executable on a processor, in other cases, any or all modules may be implemented in whole or in part by hardware (e.g., specialized processing units, etc.) to perform the described functions.

[0028] The control module 188 may be executable by the processor 182 to cause the computing device 170 and / or the BIB system 102 to take one or more actions and / or execute steps in a sample processing schedule. In some embodiments, the control module 188 may be executable to adjust settings of individual components of the BIB system 102 (e.g., a BIB source, a laser source, etc.), cause individual components of the BIB system 102 to perform specific operations (e.g., move a sample holder within the BIB system 102, open or close a valve, emit a broad ion beam, emit an optical beam, align a sample, adjust pressure settings or gases present in volumes 130, 140, and / or 152, etc.), or combinations thereof. For example, the control module 188 may be operable to engage the sample holder manipulator 126 with a desired sample holder 116 stored within the BIB system 102 (e.g., stored in a storage cassette 120 disposed within the cassette storage volume 122, stored in the sample holder storage volume 118, etc.), and translate, tilt, and / or rotate the engaged sample holder 116 into the sample stage region 112 so that it is nested with the mask 114 and the sample 104 has a desired geometric relationship with the mask 114. In such an example, the control module 118 may be further operable to return the sample holder 116 to a location stored within the BIB system 102 once the sample 104 has been processed, and then engage an additional sample holder 116 and then translate the additional sample holder 116 into the sample stage region 112 so that the additional sample 104 can be processed.

[0029] Alternatively or additionally, the control module 188 may cause the display 186 to present a processing protocol to the user and present information about the sample being processed. For example, the control module 188 may present video / image information about the alignment of the sample with the mask 114, the surface of the sample 104 being removed / polished / processed, etc. In some embodiments, the control module 188 may cause the display 186 to present a graphical user interface that includes selectable interfaces that allow the user to enter and / or modify data associated with the sample 104 and / or select protocol steps or component configurations to be used when processing the sample 104.

[0030] The sample processing module 190 may be executable by the processor 182 to at least partially automate the processing of the sample 104 by the BIB system 102. For example, the sample processing module 190 may be executable to reposition the sample holder 116 within the BIB system 102, access sample information 192 for the sample, determine a processing schedule 194 for the sample 104, adjust the configuration of components of the BIB system 102, and / or cause components of the BIB system 102 to perform processing of the sample 104. In accordance with the present invention, the sample processing module 190 can obtain the sample information 192 for the sample 104 to be processed. In various embodiments, the sample processing module 190 may obtain the information by receiving the information from a user input via a wired or wireless connection. Alternatively, or additionally, the sample processing module 190 may obtain the information by determining the information based on sensor information.

[0031] The sample processing module 190 may also be executable to determine a desired component configuration of the components of the BIB system 102 based on user input, sample information 192 for the sample 104, a processing schedule 194 associated with the sample 104, or a combination thereof. For example, based on the sample information 192 indicating the composition of the sample material to be removed and the amount of material to be removed, the sample processing module 190 may determine a desired broad ion beam intensity (e.g., BIB current, acceleration voltage, stage rocking, etc.) and exposure time of the broad ion beam required to process the sample 140, and may adjust the configuration of the BIB source 106 and / or the associated processing schedule 194 accordingly.

[0032] Additionally, the sample processing module 190 may also be executable to retrieve a processing schedule 194 associated with the sample 104 to be processed. Retrieving the processing schedule 194 may correspond to accessing a predetermined processing schedule from an accessible data structure, modifying a predetermined processing schedule, generating a processing schedule for the sample, or a combination thereof. For example, after determining a sample identifier (e.g., by scanning a barcode on the sample holder 116), the sample processing module 190 may use the identifier to access sample information 192 and / or processing schedule 194 from a data structure stored on accessible memory. Alternatively or additionally, a user may input the sample identifier, sample information 194, desired results of the process, the type of processing to occur, etc., which the sample processing module 190 can use to generate a prepared processing schedule 194 that causes the BIB system 102 to perform the desired processing of the sample. For example, based on the specifications of the processing schedule 194, the sample processing module 190 may cause the BIB system 102 to process one or more samples 104 using any of the methods illustrated in FIGS. 3-6. In some embodiments, the sample processing module 190 may provide a series of GUIs on the display 186 that allow a user to approve and / or provide instructions for carrying out the steps of the processing schedule 194. The sample processing module 190 may also be executable to perform some or all of the steps of the processing schedule 194 independent of user input.

[0033] The sample processing module 190 may further be executable by the processor 182 to automatically move sample holders 116 within the BIB system 102 so that many samples 104 can be processed in succession. For example, based on user input identifying multiple samples to be processed, the sample processing module 190 may cause the sample holder manipulator 126 to sequentially move associated sample holders 116 between a storage location (e.g., a storage cassette 120 disposed in the cassette storage volume 122, the sample holder storage volume 118, etc.) and the sample stage area 112 so that each of the identified samples can be processed. Because the sample processing module 190 is further configured to cause the BIB system 102 to perform some or all of the processing steps without user input, the sample processing module 190 enables the BIB system 102 to automatically process multiple samples in rapid succession and without user oversight. In this manner, the BIB systems 102 of the present disclosure allow a single user to oversee sample processing of many samples across multiple BIB systems 102, and / or the BIB systems 102 can be left unsupervised to process a series of samples over an extended period of time.

[0034] Computing device 170 includes one or more processors configured to execute instructions, applications, or programs stored in memory(s) accessible to the one or more processors. In some examples, the one or more processors may include hardware processors, including, but not limited to, a hardware central processing unit (CPU), a graphics processing unit (GPU), etc. While in many cases the techniques are described herein as being performed by one or more processors, in some cases the techniques may be implemented by one or more hardware logic components, such as a field programmable gate array (FPGA), a complex programmable logic device (CPLD), an application specific integrated circuit (ASIC), a system on a chip (SoC), or a combination thereof.

[0035] Memory accessible to one or more processors is an example of a computer-readable medium. Computer-readable media can include two types of computer-readable media: computer storage media and communication media. Computer storage media can include volatile and nonvolatile, removable and non-removable media implemented in any method or technology for storage of information such as computer-readable instructions, data structures, program modules, or other data. Computer storage media include, but are not limited to, random access memory (RAM), read-only memory (ROM), erasable programmable read-only memory (EEPROM), flash memory or other memory technology, compact disc read-only memory (CD-ROM), digital versatile disc (DVD) or other optical storage, magnetic cassettes, magnetic tape, magnetic disk storage or other magnetic storage devices, or any other non-transmission medium that can be used to store desired information and that can be accessed by a computing device. Generally, computer storage media can include computer-executable instructions that, when executed by one or more processing units, cause various functions and / or operations described herein to be performed. In contrast, communication media embodies computer-readable instructions, data structures, program modules, or other data in a modulated data signal such as a carrier wave or other transmission mechanism. As defined herein, computer storage media does not include communication media.

[0036] Those skilled in the art will also understand that items, or portions thereof, may be transferred between memory and other storage devices for memory management and data integrity. Alternatively, in other embodiments, some or all of the software components may execute in the memory of another device and communicate with computing device 170. Some or all of the system components or data structures may also be stored on a non-transitory computer-accessible medium or on a portable product readable by an appropriate drive (e.g., as instructions or structured data), various examples of which are described above. In some embodiments, instructions stored on a computer-accessible medium separate from computing device 170 may be transmitted to computing hardware and computing device 170 via a transmission medium or signal, such as an electrical, electromagnetic, or digital signal carried over a communications medium, such as a wireless link. Various implementations may further include receiving, sending, or storing instructions and / or data implemented in accordance with the preceding description of a computer-accessible medium.

[0037] 2 is a diagram of an exemplary environment 200 with BIB system(s) 102 for more efficiently processing multiple samples within a sample preparation workflow. Specifically, FIG. 2 shows the environment 200 including a sample preparation station 202, a sample transfer device 250, a BIB system 102, and a charged particle microscope 260. However, one skilled in the art will understand how different stations, components, and devices can be used to enable a BIB system 102 according to the present disclosure to efficiently process samples. For example, the exemplary environment 200 and the components / stations / devices therein may be used to practice the methods described in FIGS. 3-6 as well as other processes described herein.

[0038] FIG. 2 depicts the sample preparation station 202 as a hooded work area with controlled pressure and atmospheric gas composition. Specifically, FIG. 2 depicts the sample preparation station 202 with a barrier material 204 defining a working volume 206 and one or more optionally sealable openings 208 through which components can pass between the working volume 206 and the external environment. However, those skilled in the art will understand that the sample preparation station 202 can correspond to an open environment. Furthermore, while the sample preparation station 202 is depicted in FIG. 2 as separate from the BIB system 102, those skilled in the art will understand that in some embodiments, the sample preparation station 202 can be included within the BIB system 102 in a separate chamber forming an interior volume such that samples can be positioned on sample holders of the sample preparation station 202, and different samples are processed by a BIB source within the interior volume of the BIB system 102.

[0039] In some embodiments, a user can select the pressure and atmospheric gas composition within the working volume 206 to best suit the preparation of the desired sample 210 type. The working volume 206 is shown as including exemplary elements for preparing the sample 210 for processing in the BIB system 102. For example, the working volume 206 is shown as including a plurality of samples 210 collected / produced and prepared for examination, a plurality of empty sample holders 212 into which the samples 210 can be placed, an exemplary aid 214 for aligning / positioning the samples on the sample holders, and a sample holder 216 for containing the samples. While the exemplary aid 214 is shown as an optical microscope system, one skilled in the art will understand that different types of sample 210 / preparation workflows may require different types of aids for optimally aligning / positioning the samples on the sample holders.

[0040] In some embodiments of the present invention, the preparation station further includes an additional mask 218 for aligning the sample 210 on the sample holder 212. The additional mask 218 is geometrically configured such that when the sample is aligned and / or positioned such that when the sample holder is nested with the additional mask 218, the sample 210 has a specific geometric relationship between the sample and an edge of the additional mask 218, and when the sample holder is nested with the mask 114 in the BIB system 102, the sample 210 has the same specific geometric relationship between the sample and an edge of the mask 114(a). This geometric similarity between the mask 114 and the additional mask 218 allows the samples to be aligned on their respective sample holders without the potential time that the BIB system 102 can use to process the samples with the broad ion beam and / or optical beam. In some embodiments, aligning the samples in the sample preparation station 202 can correspond to optically aligning the samples without the use of the additional mask 218. For example, the sample can be optically aligned with respect to the sample holder by adjusting an adjustable portion of the sample holder so that the sample is in a desired position when the sample holder is nested with the mask 114 in the BIB system 102. Exemplary methods for optically aligning the sample in this manner include, but are not limited to, adjusting the sample edge to a marked position (e.g., using an optical microscope and / or image recognition algorithms), using laser gate sensing to determine the desired position, etc.

[0041] 2 shows a sample preparation system including a storage cassette 220 configured to hold a plurality of sample holders 216. The storage cassette 220 is configured to allow many samples 204 and their corresponding sample holders 216 to be transported and / or loaded into the BIB system 102. In this manner, a user can use the additional mast 218 to pre-align each of the plurality of samples 210 and then load them into the storage cassette 220.

[0042] 2 further illustrates an optional sample transfer device 204 configured to transfer the sample holder 216 between the sample preparation station 202 and the BIB system 102 and / or between the BIB system 102 and the charged particle microscope 206. In some embodiments, the sample transfer device 204 can maintain a desired pressure and / or gas environment around the sample holder 216 during transfer. In such embodiments, the sample transfer device 204 allows the sample to be prepared in the sample preparation station 202, processed in the BIB system 102, and studied in the charged particle microscope 206 without being exposed to pressures or gases other than the desired pressure and / or gas environment. Alternatively, the sample holder 216 or the storage cassette 220 may itself be transferred between the sample preparation station 202 and the BIB system 102. In some embodiments, the storage cassette 220 may be capable of maintaining the multiple sample holders 216 it houses in a desired pressure and / or gas environment.

[0043] FIG. 2 further illustrates the exemplary environment 200 as including the exemplary BIB system 102 described in connection with FIG. 1 . The BIB system 102 includes a BIB source 106 and an optional additional BIB source 148 configured to emit a broad ion beam along a BIB axis toward a sample stage region 112. The broad ion beam is configured such that, when a portion of the broad ion beam impinges on a sample 210, material of the sample upon which the broad ion beam is incident is milled or otherwise removed from the sample. The sample stage region 112 may include a mask 114 configured to block a portion of the broad ion beam such that sample material corresponding to a portion of interest is not milled or otherwise removed from the sample 210 by the incident ions. The sample stage region 112 may also include a holder interface configured to receive a sample holder 216 so that the mask can be positioned and held relative to the mask 114 to protect a portion of interest within the sample during processing of the sample 210. The BIB system 102 is further illustrated as including an optional laser source 162. The BIB system 102 is configured to process samples as described in the discussion of FIG. 1 and / or according to the methods described in FIGS. 3-6, as well as other processes described herein.

[0044] The exemplary environment 200 is further shown as including a charged particle microscope system 206 for inspecting a sample 210 processed in the BIB system 102 in accordance with the present invention. The exemplary charged particle microscope system(s) 206 may include an electron microscope (EM) setup or an electron lithography setup configured to irradiate and / or otherwise bombard the sample 210 with a beam 222 of charged particles (typically an electron beam or ion beam). In various embodiments, the charged particle microscope system 206 may be or include one or more different types of EM and / or charged particle microscopes, such as, but not limited to, a scanning electron microscope (SEM), a scanning transmission electron microscope (STEM), a transmission electron microscope (TEM), a charged particle microscope (CPM), a dual beam microscope system, etc. Additionally, in some embodiments, a TEM can also operate as a STEM. FIG. 2 illustrates the exemplary charged particle microscope system 206 as a transmission electron microscope (SEM) 224.

[0045] 3 illustrates a sample process 300 for processing samples using a dual BIB system that allows for increased system uptime in accordance with the present invention. Process 300 can be implemented with any of the BIB systems 102 in any environment, including any of the exemplary environment(s) 200 for more efficient processing of multiple samples in a sample preparation workflow.

[0046] In step 302, the sample to be processed is optionally determined. For example, the sample to be processed may be determined based on input received from a user via an interface on the BIB system or via an associated computing device. Alternatively, the sample to be processed may be determined by the BIB system or associated computing device accessing a data structure (i.e., a table, a schedule, metadata, etc.) and / or executing instructions that result in the determination of the next sample to be processed. For example, the BIB system may be configured to sequentially access multiple sample holders stored therein, allowing a user to preload several samples into the BIB system to be automatically processed sequentially. In such an example, the BIB system of the associated computing device tracks the order in which the samples are processed and which sample of the multiple samples is to be processed next.

[0047] In step 304, a processing schedule for the sample is determined. The sample processing schedule corresponds to the BIB system configuration and workflow settings to be followed to achieve the desired processing result of the sample (e.g., BIB strength, BIB milling time, portion of the sample removed using the BIB, target surface, or a combination thereof). In some embodiments, the processing schedule may be entered by a user by selecting a processing schedule from a list of pre-created processing schedules, entering / generating a new processing schedule, entering individual step or configuration instructions, or a combination thereof. For example, an associated computer may present a graphical user interface including selectable interfaces that allow a user to enter and / or modify data related to the sample and / or select protocol steps or component configurations to be used when processing the sample. In another example, if the BIB system is frequently used to process a particular type of sample and prepare it for a particular examination modality, the BIB system or associated computer may store associated processing schedules that a user can select (manually or via metadata associated with the sample, sample holder, etc.) to initiate the frequently used processing configuration / workflow.

[0048] In some embodiments, the processing schedule may be received along with sample information associated with the sample to be processed. The sample information may include one or more of sample identification information, sample composition, target area, target surface, associated processing schedule, etc. Alternatively or additionally, the BIB system or associated computing system may use predefined rules / instructions to determine the processing schedule for the sample based on the sample information. For example, a user may input a sample identifier that the BIB system can use to access a data structure specifying the associated sample information, and the BIB system then uses the predefined rules to create a prepared processing schedule that causes the BIB system to perform the desired processing of the sample. As an example, the BIB system may set the beam intensity of the broad ion beam based on the material composition to be removed and / or adjust the milling time based on the amount of material to be removed.

[0049] In step 306, the sample is prepared for processing. Preparing the sample for processing can include taking the sample from a larger sample or otherwise creating the sample (e.g., growing or depositing a portion of the sample), loading the sample into a sample holder, aligning the sample, transporting the sample to a BIB system, transporting the sample holder to a sample stage area within the BIB system, etc. For example, the BIB system can have a component sample holder transport element retrieve a sample holder associated with the sample to be processed from a storage area and translate, tilt, and / or rotate the sample holder such that the geometric relationship between the sample and a protective mask is such that the mask protects the desired portion of the sample during irradiation / milling.

[0050] In step 308, the BIB source is caused to emit a broad ion beam toward the sample. FIG. 3 further illustrates step 310, which can be performed while the broad ion beam is being emitted toward the sample. In step 310, an additional BIB source is accessed. According to the present invention, the additional BIB source is disposed in a volume that can be selectably sealed from the interior of the BIB system via a valve. In this manner, when the valve is closed, milled material from the sample cannot pass into the volume containing the additional BIB source. Additionally, in some embodiments, the pressure and / or gas configuration is not affected when the additional BIB source is accessed. In various embodiments, accessing the additional BIB source in 310 can include one or more of removing the additional BIB source 312 from the BIB system (e.g., for cleaning, adjustment, repair, etc.), performing maintenance on the additional BIB system 314 (e.g., cleaning, alignment, etc.), replacing the additional BIB source 316 (e.g., reinstalling the BIB source after cleaning / maintenance), and / or installing a new BIB source 318 in the BIB system.

[0051] In step 320, a portion of the sample is removed with a broad ion beam. According to the present invention, step 320 can include milling with a source different from the broad ion beam, such as the dual optics and ion milling process described in FIG. 4. In step 320, a portion of the sample that is not shielded by the protective mask is removed from the sample. In this manner, a region and / or portion of the sample that is to undergo additional processing can be quickly exposed.

[0052] In step 322, it is determined whether another sample should be ground. If the answer at 322 is "yes," the process returns to step 302 and a sample to be processed is selected. In this manner, multiple samples can be processed while additional BIB systems are accessed. If the answer at 322 is "no," process 300 may end.

[0053] 4 illustrates a sample process 400 for processing a sample using a dual-mode optical and BIB milling system for more efficient sample processing in accordance with the present invention. The process 400 can be implemented with any of the BIB systems 102 in any environment, including any of the exemplary environment(s) 200 for more efficient processing of multiple samples in a sample preparation workflow.

[0054] In step 402, the sample to be processed is optionally determined. For example, the sample to be processed may be determined based on input received from a user via an interface on the BIB system or via an associated computing device. Alternatively, the sample to be processed may be determined by the BIB system or associated computing device accessing a data structure (i.e., a table, a schedule, metadata, etc.) and / or executing instructions that result in the determination of the next sample to be processed.

[0055] In step 404, a processing schedule for the specimen is determined. The processing schedule for the specimen corresponds to the BIB system configuration and workflow settings to be followed to achieve a desired processing result for the specimen (e.g., BIB strength, BIB milling time, portion of the specimen removed with the BIB, target surface, or a combination thereof). In various embodiments, the processing schedule may be input by a user, may be received along with sample information associated with the specimen to be processed, or may be determined by the BIB system (e.g., based on the sample information).

[0056] In step 406, the sample is prepared for processing. Preparing the sample for processing can include taking the sample from a larger sample or otherwise creating the sample (e.g., growing or depositing a portion of the sample), loading the sample into a sample holder, aligning the sample, transporting the sample to a BIB system, transporting the sample holder to a sample stage area within the BIB system, etc. For example, the BIB system can have a component sample holder transport element retrieve a sample holder associated with the sample to be processed from a storage area and translate, tilt, and / or rotate the sample holder such that the geometric relationship between the sample and a protective mask is such that the mask protects the desired portion of the sample during irradiation / milling.

[0057] In step 408, a laser source is caused to emit an optical beam (e.g., a laser) toward the sample. The optical beam emitted by the laser source is of higher beam energy and / or intensity than the broad ion beam. In step 410, a first portion of the sample is ablated with the optical beam. Because the intensity of the optical beam is increased, it can ablate incident sample material at a rate 10-50 times greater than possible with a broad ion beam. However, while sample material removal is more rapid with the optical beam, milling and / or processing with the optical beam also causes damage / burns to the remaining sample surface.

[0058] In step 412, the BIB source is caused to emit a broad ion beam toward the sample, and in step 414, a second portion of the sample is removed using the broad ion beam. Because the broad ion beam can remove sample material without damaging the sample surface, the broad ion beam can remove a final portion of the sample (i.e., the damaged portion of the sample) without causing further damage to the sample. In this way, once the majority of the material has been rapidly removed with the optical beam, the broad ion beam can be used to remove a final portion of the sample to expose the region of interest.

[0059] 5 illustrates a sample process 500 for processing multiple samples in a dual BIB system with reduced downtime in accordance with the present invention. Process 500 can be implemented with any of the BIB systems 102 in any environment, including any of the exemplary environment(s) 200 for more efficient processing of multiple samples in a sample preparation workflow.

[0060] In step 502, the sample to be processed is optionally determined. For example, the sample to be processed may be determined based on input received from a user via an interface on the BIB system or via an associated computing device. Alternatively, the sample to be processed may be determined by the BIB system or associated computing device accessing a data structure (i.e., a table, a schedule, metadata, etc.) and / or executing instructions that result in the determination of the next sample to be processed.

[0061] In step 504, a processing schedule for the specimen is determined. The processing schedule for the specimen corresponds to the BIB system configuration and workflow settings to be followed to achieve a desired processing result for the specimen (e.g., BIB strength, BIB milling time, portion of the specimen removed with the BIB, target surface, or a combination thereof). In various embodiments, the processing schedule may be input by a user, may be received along with sample information associated with the specimen to be processed, or may be determined by the BIB system (e.g., based on the sample information).

[0062] In step 506, the sample holder associated with the sample to be processed is removed from a storage location within the BIB system. For example, the BIB system may cause a component sample holder transport element (e.g., a sample holder manipulator) to retrieve the sample holder associated with the sample to be processed from a storage area within the BIB system and / or from within a sample storage / transport device (e.g., a storage cassette).

[0063] In step 508, the sample holder is placed in the sample stage area. Specifically, the sample holder may be translated, tilted, and / or rotated by the sample holder transport element such that the geometric relationship between the sample and the protective mask is such that the mask protects the desired portion of the sample during irradiation / milling. In some embodiments, the sample may also be aligned with the mask based on user and / or sensor input. Alternatively, or in addition, the sample may be realigned using a workflow such as the workflow described in FIG. 6.

[0064] In step 510, the sample is processed. Specifically, a broad ion beam is emitted from the BIB source toward the sample. A first portion of the sample on which the broad ion beam is incident is milled away, while a second portion of the sample, blocked by a protective mask of the BIB source, is not milled away. Alternatively, or additionally, the sample may be processed in the BIB system using other sample preparation workflows, including, but not limited to, the processes described herein.

[0065] In step 512, the sample holder is removed from the sample stage area, i.e., the sample holder is translated, tilted, and / or rotated by the sample holder transport element so that the sample holder is stored in a storage location, a sample transport device, or transported out of the BIB system through a port.

[0066] In step 514, it is determined whether another sample is to be processed. If the answer at 514 is yes, the process returns to step 502 to determine the sample to be processed. If the answer at 514 is no, the process 500 may end.

[0067] 6 illustrates a sample process 300 for processing samples using a BIB system that enables increased system uptime in accordance with the present invention. The process 600 can be implemented with any of the BIB systems 102 in any environment, including any of the exemplary environment(s) 200 for more efficient processing of multiple samples in a sample preparation workflow.

[0068] In step 602, a sample is obtained. Specifically, the sample may be obtained by taking a sample from a larger sample, by growing or depositing a portion of a sample, by milling a portion of a larger sample, or a combination thereof.

[0069] In step 604, the sample is secured to a sample holder, and in step 606, the sample holder is nested with a first mask. The first mask is geometrically similar to a second protective mask in the BIB system, and a sample in a desired alignment with the first mask is also in a desired alignment with the second sample. That is, when the sample is aligned in a desired position on the sample holder with the first mask, no further alignment of the sample is required when the sample holder is subsequently nested within the second mask in the BIB system.

[0070] In step 608, the sample is aligned with the first mask. For example, a user may use an optical microscope, sensors, or vision to manipulate sample alignment elements on the sample holder to translate, tilt, or rotate the sample until it is in the desired aligned position. Once the sample is aligned, the sample holder may be translated into and / or out of a sample storage area within the BIB system and / or a sample storage / transport device (e.g., a storage cassette). For example, after the sample is pre-aligned in this manner, the sample holder may be transported to a storage location within the BIB system where the sample will be processed. In some embodiments, the BIB system may have a separate sample alignment chamber in which some or all of steps 602-608 may be performed, and a sample manipulation element may transport the sample holder containing the aligned sample to a storage location within the BIB system. In this manner, while the user is aligning the sample with the first mask, the BIB system can process the pre-aligned sample using the second mask.

[0071] Alternatively, once the sample is aligned with the first mask, the sample may be loaded into a sample transfer device that protects the sample during transfer / loading into the BIB system where the sample will be processed. Such a transfer device may be configured to transfer a single sample holder or many sample holders. In some embodiments, the transfer device may preserve the pressure or gas environment surrounding the sample during transfer. In this way, the sample may be prepared in a sample preparation area with a controlled pressure and / or gas composition and then transferred to the BIB system without exposing the sample to new pressure / gas composition.

[0072] In step 610, it is determined whether another sample should be aligned. If the answer in 610 is yes, the process returns to step 602 and another sample is acquired. In this manner, multiple samples can be pre-aligned and loaded into a sample storage area within the BIB system and / or from within a sample storage / transport device. Because the user can continuously align many samples, the throughput of sample preparation across multiple samples using this method can be greatly streamlined.

[0073] If the answer in 610 is "no," process 600 continues to step 612, where the sample holder is nested with a second mask in the BIB system. Because the sample was pre-aligned with the first mask, when the sample holder is nested with the second mask, it does not require further alignment. This greatly increases the speed at which samples can be processed in the system.

[0074] In step 614, the sample is processed in the BIB system. For example, a portion of the sample may be removed using an optical beam or a broad ion beam according to any of the processes described herein. Additionally, because much of the user input currently required by current BIB systems is related to the alignment process, by pre-aligning the sample using this process, the required user input can be performed all at once during alignment of multiple samples, and the remaining processing steps can be at least partially automated such that a BIB system in accordance with the present invention can process multiple pre-aligned samples with little or no user input / supervision.

[0075] In step 616, it is determined whether another sample is to be processed. If the answer at 616 is yes, the process returns to step 612, where another sample holder is nested with a second mask. If the answer at 616 is no, the process 600 may end.

[0076] 7A and 7B are exemplary diagrams illustrating a sample 702 that has been pre-aligned with a first mask 704 and then being processed in a BIB system including a second mask 706. Specifically, FIG. 7A shows the sample 702 being aligned on a sample holder 708 using an optical microscope 710. FIG. 7B shows the sample 704 being processed in the BIB system using a broad ion beam 712 from a BIB source 714. Because the sample 702 has been pre-aligned with the first mask 704, and because the second mask 706 is geometrically similar to the first mask 704, the sample 702 does not need to be aligned / positioned in the BIB system.

[0077] Examples of inventive subject matter according to the present disclosure are described in the paragraphs listed below.

[0078] A1. A broad ion beam (BIB) sample preparation system having improved uptime, comprising: a housing defining an internal volume; a sample stage disposed within the internal volume, the sample stage configured to hold a sample holder during polishing of a sample held by the sample holder; a first BIB source configured to emit a first broad ion beam toward the sample in use, the first BIB source disposed within the first source housing; and a second BIB source configured to emit a second broad ion beam toward the sample in use, the first BIB source disposed within the first source housing, the second BIB source configured to be removed while the first BIB source is emitting the first broad ion beam toward the sample. A2. The BIB sample preparation system of paragraph A1, wherein the second source is further configured to be repositioned while the first BIB source is emitting the first broad ion beam toward the sample. A2.1. The BIB sample preparation system of paragraph A2, wherein the first source is configured to be removed while the second source emits a second broad ion beam toward the sample. A2.2. A BIB sample preparation system described in any one of paragraphs A2 to A2.2, wherein the first BIB source is configured to be repositioned while the second BIB source is emitting a second broad ion beam toward the sample. A3. The BIB sample preparation system of any one of paragraphs A1 through A2.2, wherein the first source housing and the second source housing are each at least partially disposed within the interior volume. A4. A BIB sample preparation system described in any one of paragraphs A1 to A3, wherein the first source housing at least partially defines a first volume containing a first BIB source and a first opening connecting the first volume to the internal volume. A4.1. The BIB sample preparation system of paragraph A4, further comprising a first valve configured to switch between an open state that allows ions emitted from the first BIB source to pass from the first volume to the internal volume through the first opening, and a sealed state in which the first valve prevents ions or emissions from the sample from passing from the internal volume to the first volume. A4.1.1. The BIB sample preparation system of paragraph A4.1, wherein when the first valve is in a sealing state, the first volume can be opened to the external environment without affecting the pressure within the internal volume. A4.1.2. The BIB sample preparation system of any one of paragraphs A4.1 to A4.1.1, wherein when the first valve is in a sealed state, the first volume can be opened to the external environment without affecting the composition of the gas within the internal volume. A4.1.3. A BIB sample preparation system described in any one of paragraphs A4.1 to A4.1.2, wherein when the first valve is in a sealed state, the first BIB source can be at least one of removed from and reinstalled in the BIB sample preparation system without affecting the pressure or gas composition within the internal volume. A4.1.4. The BIB sample preparation system of any one of paragraphs A4.1 to A4.1.3, wherein when the first valve is in a sealed state, the first volume can be opened to the external environment without breaking the vacuum within the internal volume. A4.1.5. The BIB sample preparation system of any one of paragraphs A4.1 to A4.1.4, wherein the first valve corresponds to one of a shutter, a valve, or a door. A4.2. A BIB sample preparation system as described in any one of paragraphs A4 to A4.1.5, wherein the first receptacle further defines a first BIB source maintenance opening that allows the first BIB source to be removed from or reinstalled within the first volume. A4.2.1. The BIB sample preparation system of paragraph A4.1, further comprising a first access port configured to switch between an open state in which the first BIB source can be removed from or reinstalled within the first volume, and a closed state in which the first volume is sealed from the external environment. A4.2.2. The BIB sample preparation system described in paragraph A4.2.1, wherein the first container is configured to allow the first volume to be pressurized independently of the internal volume or the second volume when the first valve and the first access port are each in a closed state. A5. A BIB sample preparation system described in any one of paragraphs A1 to A4.2.2, wherein the second source housing at least partially defines a second volume containing a second BIB source and a second opening connecting the second volume to the internal volume. A5.1. The BIB sample preparation system of paragraph A5, further comprising a second valve configured to switch between an open state that allows ions emitted from the second BIB source to pass from the second volume to the internal volume through the second opening, and a sealed state in which the second valve prevents ions or emissions from the sample from passing from the internal volume to the second volume. A5.1.1. The BIB sample preparation system of paragraph A5.1, wherein when the first valve is in a sealing state, the first volume can be opened to the external environment without affecting the pressure within the internal volume. A5.1.2. The BIB sample preparation system of any one of paragraphs A5.1 to A5.1.1, wherein when the first valve is in a sealed state, the first volume can be opened to the external environment without affecting the composition of the gas within the internal volume. A5.1.3. A BIB sample preparation system described in any one of paragraphs A5.1 to A5.1.21, wherein when the first valve is in a sealed state, the first BIB source can be at least one of removed from and reinstalled in the BIB sample preparation system without affecting the pressure or gas composition within the internal volume. A5.1.4. The BIB sample preparation system of any one of paragraphs A5.1 to A5.1.3, wherein when the first valve is in a sealed state, the first volume can be opened to the external environment without breaking the vacuum within the internal volume. A5.1.5. The BIB sample preparation system of any one of paragraphs A5.1 to A5.1.4, wherein the second valve corresponds to one of a shutter, a valve, or a door. A5.2. A BIB sample preparation system described in any one of paragraphs A5 to A5.1.5, wherein the second receptacle further defines a second BIB source maintenance opening that allows the second BIB source to be removed from or reinstalled within the second volume. A5.2.1. The BIB sample preparation system of paragraph A5.1, further comprising a second access port configured to switch between an open state in which the second BIB source may be removed from or reinstalled within the second volume, and a closed state in which the second volume is sealed from the external environment. A5.2.2. The BIB sample preparation system of paragraph A5.2.1, wherein the second containment portion is configured to allow the second volume to be pressurized independently of the internal volume or the first volume when the second valve and the second access port are each in a closed state. A6. The BIB sample preparation system of any one of paragraphs A1 to A5.2.2, further comprising one or more additional BIB sources. A7. A BIB sample preparation system described in any one of paragraphs A1 to A5.2.2, wherein the first BIB source emits a first broad ion beam toward the sample along a first axis, the second BIB source emits a second broad ion beam toward the sample along a second axis, and the angle between the first source and the second source is between 60 degrees and 120 degrees. A8. The BIB sample preparation system of any one of paragraphs A1 to A7, further comprising a processor and memory storing computer-readable instructions that, when executed on the processor, cause the processor to begin performing the method described in any one of paragraphs B1 to B7.2.1.

[0079] B1. A method for operating a broad ion beam (BIB) polisher with improved uptime, comprising: causing a first BIB source to emit a first broad ion beam toward a sample disposed within an internal volume of the BIB polisher, the first broad ion beam removing a portion of the sample upon which it is incident; and removing a second BIB source from the BIB polisher while the first BIB source is emitting the first broad ion beam toward the sample, the second BIB source being configured to emit a second broad ion beam toward the sample when the second BIB source is being used. B2. The method of paragraph B1, further comprising reinstalling the second BIB source in the BIB polishing system. B2.1. The method of paragraph B2, wherein the second BIB source is repositioned while the first BIB source is emitting the first broad ion beam. B2.1.1. The method of paragraph B2.1, wherein the second BIB source is repositioned while the first BIB source is emitting the first broad ion beam toward the sample. B2.1.2. The method of paragraph B2.1, wherein the second BIB source is repositioned while the first BIB source emits the first broad ion beam toward a different sample. B3. The method of any one of paragraphs B1 through B2.1, further comprising causing a second BIB source to emit a second broad ion beam. B3.1. The method of paragraph B3, wherein a second broad ion beam is emitted toward the sample. B3.2. The method of paragraph B3, wherein the second broad ion beam is emitted toward a different sample. B4. The method of any one of paragraphs B1 through B3.2, further comprising installing a third BIB source within the BIB polishing system. B4.1. The method of paragraph B4, wherein the third BIB source is installed while the first BIB source is emitting the first broad ion beam. B4.1.1. The method of paragraph B4.1, wherein the third BIB source is positioned while the first BIB source is emitting the first broad ion beam toward the sample. B4.1.2. The method of paragraph B4.1, wherein the third BIB source is positioned while the first BIB source emits the first broad ion beam toward a different sample. B4.2. The method of any one of paragraphs B4 to B4.1.2, further comprising: causing a third BIB source to emit a third broad ion beam; and removing the first BIB source from the BIB polisher while the third BIB source is emitting the third broad ion beam. B5. The method of any one of paragraphs B1 to B4.2, further comprising the steps of: causing the second BIB source to emit a second broad ion beam toward a new sample placed within the internal volume of the BIB polisher, wherein the second broad ion beam removes a portion of the new sample upon which it is incident; and removing the first BIB source from the BIB polisher while the second BIB source is emitting the second broad ion beam toward the new sample. B6. The method of any one of paragraphs B4.2 to B5, further comprising reinstalling the first BIB source in the BIB polishing system. B6.1. The method of paragraph B6, wherein the first BIB source is repositioned while the second BIB source emits the second broad ion beam. B6.1.1. The method of paragraph B6.1, wherein the first BIB source is repositioned while the second BIB source emits a second broad ion beam toward the sample. B6.1.2. The method of paragraph B6.1, wherein the first BIB source is repositioned while the second BIB source emits a second broad ion beam toward a different sample. B7. The method of any one of paragraphs B1 through B6.1.2, wherein the BIB polisher comprises a source housing defining a housing volume and an opening between the housing volume and the interior volume of the BIB polisher. B7.1. The method of paragraph B7, wherein the second BIB source is disposed within the receptacle volume. B7.2. The method of any one of paragraphs B7 to B7.1, wherein the BIB polisher further comprises a valve configured to switch between an open state that allows ions emitted from the second BIB source to pass from the receptacle volume to the internal volume through the opening, and a sealed state in which the valve prevents ions or emissions from the sample from passing from the internal volume to the receptacle volume. B7.2.1. The method of paragraph B7.2, further comprising switching the valve to a sealing state before removing the second BIB source from the BIB polisher.

[0080] C1. A method for preparing a sample with a combined broad ion beam (BIB) and laser sample preparation system, comprising: placing a sample within an interior volume of the combined sample preparation system; causing a laser source component of the combined sample preparation system to emit an optical beam toward the sample, wherein the optical beam ablates a first portion of the sample on which the optical beam is incident; and causing a BIB source component of the combined sample preparation system to emit a broad ion beam toward the sample, wherein the broad ion beam ablates a second portion of the sample on which the broad ion beam is incident to expose a region of interest. C2. The method of paragraph C1, wherein the sample is irradiated by each of the optical beam and the broad ion beam without removing the sample from the interior volume. C2.1. The method of paragraph C2, wherein the sample is irradiated by each of the optical beam and the broad ion beam without repositioning the sample. C2.2. The method of any one of paragraphs C2 to C2.1, wherein the sample is irradiated by each of the optical beam and the broad ion beam without repositioning the laser source. C2.3. The method of any one of paragraphs C2 to C2.2, wherein the sample is irradiated by each of the optical beam and the broad ion beam without repositioning the BIB source. C3. The method of any one of paragraphs C1 to C2.3, wherein the laser source is configured to irradiate the sample with an optical beam for a first period of time, and the BIB source is configured to irradiate the sample with an optical beam for a first period of time. C3.1. The method of paragraph C2, wherein at least one of the first period of time and the second period of time is a predetermined period of time. C3.2. The method of any one of paragraphs C3 to C3.1, wherein at least one of the first period and the second period is provided via user input. C3.3. The method of any one of paragraphs C3 to C3.2, wherein at least one of the first period of time and the second period of time is determined by accessing sample information associated with the sample. C3.4. The method of any one of paragraphs C3 to C3.3, wherein at least one of the first period and the second period is determined based on the material of the first portion of the sample. C3.5. The method of any one of paragraphs C3 to C3.4, wherein at least one of the first period and the second period is determined based on one or more sensors receiving information indicating that a first portion of the sample has been removed. C3.6. The method of any one of paragraphs C3 to C3.5, wherein at least one of the first period and the second period is determined based on one or more sensors receiving information indicating that a second portion of the sample has been removed. C3.7. The method of any one of paragraphs C3 to C3.6, wherein at least one of the first period and the second period is determined based on one or more sensors receiving information indicating that the target area has been exposed. C3.8. The method of any one of paragraphs C3 to C3.7, wherein at least one of the first period and the second period is determined based on one or more of the laser intensity, the portion of the sample removed using the laser, the BIB intensity, the portion of the sample removed using the BIB, the target surface, or a combination thereof. C4. The method of any one of paragraphs C1 through C3.8, further comprising receiving sample information. C4.1. The method of paragraph C4, wherein the sample information is received via user input. C4.2. The method of paragraph C4, wherein the sample information is received by accessing a data file associated with the sample. C4.3. The method of any one of paragraphs C4 to C4.2, wherein the sample information includes one or more of a sample composition, an area of ​​interest, and a surface of interest. C4.4. The method of any one of paragraphs C4 to C4.3, wherein the sample information includes one or more processing schedules. C4.4.1. The method of paragraph C4.4, further comprising determining one or more processing schedules based on the sample information. C4.4.2. The method of paragraph C4.4, wherein the one or more treatment schedules include one or more of laser intensity, laser milling time, portion of the sample removed using the laser, BIB intensity, BIB milling time, portion of the sample removed using the BIB, target surface, or combinations thereof. C5. The method of any one of paragraphs C1 to C4.4.2, further comprising: placing an additional sample within the interior volume of the combined sample preparation system; causing a laser source component of the combined sample preparation system to emit an additional optical beam toward the additional sample, wherein the additional optical beam ablates an incident first portion of the additional sample; and causing a BIB source component of the combined sample preparation system to emit an additional broad ion beam toward the additional sample, wherein the additional broad ion beam ablates a second portion of the additional sample upon which the additional broad ion beam is incident, exposing an additional region of interest. C6. The method of any one of paragraphs C1 through C5, wherein the optical beam removes sample material 20 times, 30 times, 50 times, or more faster than the broad ion beam.

[0081] D1. A combined broad ion beam (BIB) and laser sample preparation system with improved polishing throughput, the combined sample preparation system comprising: a housing defining an internal volume; a sample stage disposed within the internal volume, the sample stage configured to hold a sample holder during polishing of a sample held by the sample holder; a laser source configured to emit an optical beam toward the sample, in use, the optical beam causing ablation of a first portion of the sample on which the optical beam is incident; and a BIB source configured to emit a broad ion beam toward the sample, in use, the broad ion beam causing ablation of a second portion of the sample on which the broad ion beam is incident to expose an area of ​​interest. D2. The combined sample preparation system of paragraph D1, further comprising a processor and memory storing computer-readable instructions that, when executed on the processor, cause the processor to begin performing the method described in any one of paragraphs C1 to C6.

[0082] E1. A storage cassette for storing a plurality of samples for broad ion beam (BIB) polishing, the storage cassette comprising: a receptacle at least partially defining an internal storage volume; and a plurality of sample holder receptacles disposed within the internal storage volume, each individual sample holder receptacle configured to receive a sample holder containing a corresponding sample for polishing in a BIB system, the storage cassette being configured to be inserted into the BIB system, and each of the sample holder housings being further configured to allow its corresponding sample holder to be removed from the cassette when the cassette is inserted into the BIB system so that the corresponding sample may be polished by the BIB system.

[0083] F1. A broad ion beam (BIB) system for efficiently processing multiple samples, the BIB system comprising: a housing defining an internal volume; a sample stage disposed within the internal volume, the sample stage configured to hold a sample holder during polishing of the sample held by the sample holder; a BIB source configured to emit a broad ion beam toward the sample during use, the first BIB source being disposed within the first source housing; a cassette housing configured to receive and hold a storage cassette of any one of paragraphs E1 through EXX; and a sample holder manipulator configured to remove individual sample holders from the storage cassette and load them onto the sample stage so that the corresponding samples may be processed, and to remove the individual sample holders from the sample stage and load the individual sample holders back into the storage cassette after the corresponding samples have been processed. F2. The BIB system of paragraph F1, further comprising a processor and memory storing computer-readable instructions that, when executed on the processor, cause the processor to begin performing the method described in any one of paragraphs G1 through G6.4.2.

[0084] G1. A method for efficiently processing multiple samples using a broad ion beam (BIB) system, the method including the steps of removing individual sample holders containing the samples from a storage cassette; loading the individual sample holders onto a sample stage configured to hold the sample holders during polishing of the corresponding samples held by the individual sample holders; causing a BIB source to emit a broad ion beam toward the samples, the broad ion beam removing at least a portion of the incident sample; removing the individual sample holders from the sample stage after the corresponding samples have been processed; and loading the individual sample holders back into the storage cassette. G1.1. The method of paragraph G1, further comprising receiving the storage cassette of paragraph E1 for processing in a BIB system. G2. The method of any one of paragraphs G1 to G1.1, wherein the storage cassette stores a plurality of sample holders, each containing a corresponding sample. G2.1. The method of paragraph G2, further comprising the steps of removing another individual sample holder containing another sample from the storage cassette, loading the another individual sample holder onto the sample stage, causing the BIB source to emit another broad ion beam toward the sample, the another broad ion beam removing at least a portion of the another sample upon which it is incident, removing the another individual sample holder from the sample stage after the corresponding another sample has been processed, and loading the another individual sample holder back into the storage cassette. G2.2. The method of any one of paragraphs G2 to G2.1, further comprising repeating the method steps of paragraph G2.1 for one or more additional sample holders stored in a storage cassette. G3. The method of any one of paragraphs G2 to G2.2, wherein the samples in the sample holders stored in the storage cassette are pre-aligned. G3.1. The method of paragraph G2, wherein the specimens are pre-aligned in their respective specimen holders using the method of any one of paragraphs H1 through H9. G4. The method of any one of paragraphs G1 to G3.1, wherein the steps of any one of paragraphs G1 to G3.1 are performed at least in part automatically by a BIB system. G4.1. The method of paragraph G3.1, wherein the steps of any one of paragraphs G1 through G3.1 are performed without user input. G5. The method of any one of paragraphs G1 to C4.1, wherein the BIB source is configured to irradiate the sample with a broad ion beam for a period of time. G5.1. The method of paragraph G5, wherein the period is a predetermined period. G5.2. The method of any one of paragraphs G5 to G5.1, wherein the period is provided via user input. G5.3. The method of any one of paragraphs G5 to G5.2, wherein the period is determined by accessing sample information associated with the sample. G5.4. The method according to any one of paragraphs G5 to G5.3, in which the period is determined based on the material of a portion of the sample. G5.5. The method of any one of paragraphs G5 to C3.4, wherein the period is determined based on one or more sensors receiving information indicating that a portion of the sample has been removed. G5.7. The method of any one of paragraphs G5 through C3.6, wherein the period is determined based on one or more sensors receiving information indicating that the target area has been exposed. G5.8. The method of any one of paragraphs G5 through C3.7, wherein the duration is determined based on one or more of the BIB intensity, the portion of the sample removed with the BIB, the target surface, or a combination thereof. G6. The method of any one of paragraphs G1 to G5.8, further comprising receiving sample information. G6.1. The method of paragraph G6, wherein the sample information is received via user input. G6.2. The method of paragraph G6, wherein the sample information is received by accessing a data file associated with the corresponding sample. G6.2.1. The method of paragraph G6.2, wherein the data file is stored in a memory component of a storage cassette. G6.3. The method of any one of paragraphs G6 to G6.2, wherein the sample information includes one or more of a sample composition, an area of ​​interest, and a surface of interest. G6.4. The method of any one of paragraphs G6 to G6.3, wherein the sample information includes one or more processing schedules. G6.4.1. The method of paragraph G6.4, further comprising determining one or more processing schedules based on the sample information. G6.4.2. The method of paragraph G6.4, wherein the one or more treatment schedules include one or more of BIB intensity, BIB milling time, portion of the sample removed using the BIB, target surface, or a combination thereof.

[0085] H1. A method of pre-aligning a sample for more efficiently processing multiple samples with a broad ion beam (BIB) system, the method comprising: securing the sample to an adjustable portion of a sample holder; nesting the sample holder with a first mask having a first mask edge, the first mask being located outside the broad ion beam (BIB) system; aligning the sample to have a desired geometric relationship with the first mask edge; and nesting the sample holder with a second mask having a second mask edge, the second mask being located within the BIB system, the first mask and the second mask being geometrically similar such that the geometric relationship between the first mask edge and the sample when the sample holder is nested with the first mask is the same as the geometric relationship between the second mask edge and the sample when the sample holder is nested with the second mask. A method comprising: H2. The method of paragraph H1, wherein when the sample holder is nested with the second mask, the sample has a desired geometric relationship with the second edge without any alignment of the sample within the BIB system. H3. The method of paragraph H1 or H2, further comprising irradiating a portion of the second mask and a portion of the sample with a broad ion beam to remove a portion of the sample. H3.1. The method of paragraph H3.1, wherein the second mask is made of a hard material that is not degraded by the broad ion beam. H3.2. The method of any one of paragraphs H3 to H3.1, wherein the second mask blocks a portion of the broad ion beam such that the target portion of the sample is not removed from the sample. H4. The method of any one of paragraphs H1 to H3.2, wherein the aligning corresponds to adjusting an adjustable portion of the sample holder so that the sample is positioned to have a desired geometric relationship relative to the first mask edge. H5. The method of any one of paragraphs H1 through H4, wherein the first mask and the second mask are geometrically identical. H6. The method of any one of paragraphs H1 through H5, wherein the sample is fixed to the sample and aligned within the enclosed environment. H6.1. The method of paragraph H6, wherein the enclosed environment has an inert gas atmosphere. H6.2. The method of any one of paragraphs H6 through H6.1, wherein the enclosed environment has a reduced pressure. H6.3. The method of any one of paragraphs H6 to H6.2, wherein the enclosed environment has a vacuum pressure level. H7. The method of any one of paragraphs H1 to H6.3, further comprising transferring the sample holder and aligned sample from the preparation station to the BIB system. H7.1. The method of paragraph H7, wherein the BIB system is a BIB system described in any one of A1 to A8, D1 to D2, and / or F1 to F2. H7.2. The method of any one of paragraphs H7 through H7.1, wherein the preparation station is a closed environment as described in paragraphs H6 through H6.3. H7.3. The method of any one of paragraphs H7 to H7.2, wherein the step of transferring the sample includes loading the sample into a transfer device configured to interface with both the sample preparation area and the BIB system. H7.3.1. The method of paragraph H7.3, wherein the transfer device is an enclosed compartment for holding the sample holder such that the sample holder is sealed from the environment. H7.3.1.1. The method of paragraph H7.3.1, wherein the enclosed compartment contains an inert gas. 7.3.2. The method of any one of paragraphs H7.3 to H7.3.1.1, wherein the transfer device is a storage cassette described in paragraph E1. H8. The method of any one of paragraphs H1 through H7.3.2, further comprising repeating the method for multiple samples on corresponding sample holders. H9. The method of any one of paragraphs H1 through H8, further comprising processing the sample using a method of any one of paragraphs C1 through C6 and / or G1 through G6.4.2.

[0086] I1. Use of a system described in any one of paragraphs A1 to A8, D1 to D2, E1, and / or F1 to F2 to perform a method described in any one of paragraphs C1 to C6, G1 to G6.4.2, and / or H1 to H9.

[0087] J1. A non-transitory computer-readable medium storing instructions that, when executed on a processor, cause the processor to begin performing the method described in any one of paragraphs C1 through C6, G1 through G6.4.2, and / or H1 through H9.

Claims

1. A method for efficiently processing multiple samples using a broad ion beam (BIB) system, wherein the method is: A step of removing individual sample holders containing samples from storage locations within the BIB system, wherein the BIB system includes a plurality of sample holders arranged in one or more storage locations. During the polishing of the corresponding sample held by the individual sample holders, the step of loading the individual sample holders onto a sample stage configured to hold the sample holders, The steps include: emitting a broad ion beam from a BIB source toward the sample, wherein the broad ion beam removes at least a portion of the incident sample; After the corresponding sample has been processed, the individual sample holders are removed from the sample stage. The steps include loading the individual sample holders back into their storage locations, Methods that include...

2. The storage location is a storage cassette for storing multiple samples for broad ion beam polishing, and the storage cassette is A storage compartment that defines at least partially the internal storage volume, The system comprises a plurality of sample holder housings arranged within the internal storage volume, each of which is configured to receive a sample holder containing a corresponding sample for polishing in the BIB system. The method according to claim 1, wherein the storage cassette is configured to be inserted into the BIB system, and each of the sample holder housings is further configured to allow the corresponding sample holder to be removed from the cassette so that the corresponding sample can be polished by the BIB system when the cassette is inserted into the BIB system.

3. The method according to claim 2, wherein the storage cassette stores a plurality of sample holders, each containing a corresponding sample.

4. The method according to claim 3, further comprising repeating the steps of the method according to claim 1 for one or more additional sample holders stored in the storage cassette.

5. The method according to claim 3, wherein the sample in the sample holder stored in the storage cassette is pre-aligned so that it does not need to be further aligned in the BIB system before being processed.

6. The steps include removing a separate sample holder containing a different sample from the storage location, The steps include loading separate individual sample holders onto the sample stage, The steps include: causing the BIB source to emit another broad ion beam toward the sample, wherein the other broad ion beam removes at least a portion of the other sample upon which it is incident; The steps include removing the other individual sample holder from the sample stage after the corresponding sample has been processed, The steps include loading the other individual sample holders back into their storage locations, The method according to claim 1, further comprising:

7. The method according to claim 1, wherein the method step is performed at least partially automatically by the BIB system.

8. The method according to claim 7, wherein the method step is performed without user input.

9. The method according to claim 1, wherein the BIB source is configured to irradiate the sample with the broad ion beam for a certain period of time.

10. The method according to claim 9, wherein the period is provided via user input.

11. The aforementioned period is The aforementioned portion of the sample has been removed, The target area has been exposed. The method according to claim 9, determined based on one or more sensors that receive information indicating one of the following.

12. The period is, BIB strength and, A portion of the sample removed using BIB, The method according to claim 9, which is determined based on one or more of the target surface and

13. Accessing sample information associated with the aforementioned sample, The period is determined based on the sample information associated with the sample, The method according to claim 9, further comprising:

14. The method according to claim 13, wherein the sample information includes a material that at least partially constitutes a portion of the sample, and the period is determined based on the material.

15. The method according to claim 13, wherein the sample information is received via user input.

16. The method according to claim 13, wherein the sample information is received by accessing a data file associated with the corresponding sample.

17. The method according to claim 16, wherein the data file is stored in a memory component of a storage cassette that holds the sample holder.

18. The method further includes detecting an identifier on the sample holder, wherein the identifier includes an identification code, a scannable identifier image, and RFID. The aforementioned data file is accessed on memory accessible based on the aforementioned identifier. The method according to claim 16.

19. The sample information includes a processing schedule for the sample, and the processing schedule is: BIB strength and, BIB milling time, A portion of the sample removed using BIB, The method according to claim 13, comprising one or more of the target surface and

20. A storage cassette for storing multiple samples for broad ion beam (BIB) polishing, wherein the storage cassette is A storage compartment that defines at least partially the internal storage volume, The system comprises a plurality of sample holder housings arranged within the internal storage volume, each of which is configured to receive a sample holder containing a corresponding sample for polishing in the BIB system. A storage cassette configured to be inserted into the BIB system, wherein each of the sample holder housings is further configured to allow the corresponding sample holder to be removed from the cassette so that the corresponding sample can be polished by the BIB system when the cassette is inserted into the BIB system.

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