Neutron semiconductor detector and method of manufacturing neutron semiconductor detector

JP2024175382A5Pending Publication Date: 2026-06-11NAT UNIV CORP SHIZUOKA UNIV

Patent Information

Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
NAT UNIV CORP SHIZUOKA UNIV
Filing Date
2023-06-06
Publication Date
2026-06-11

Smart Images

  • Figure 00000000_0000_ABST
    Figure 00000000_0000_ABST
Patent Text Reader

Abstract

To improve spatial resolution.SOLUTION: A neutron semiconductor detector 1 comprises: a first electrode 31; a P layer 32 including a principal surface formed in contact with the first electrode 31, electrically connected to the first electrode 31, and including a boron gallium nitride (BGaN) obtained by mixing gallium nitride (GaN)or GaN as p-type semiconductor and boron nitride (BN); an I layer 33 formed in contact with a back surface of the P layer 32 opposite the principal surface and including BGaN as intrinsic semiconductor; an N layer 34 formed on the I layer 33 and including GaN or aluminum nitride gallium (AlGaN) as N-type semiconductor; and a plurality of second electrodes 35 electrically connected to the N layer 34 and arrayed on the N layer 34.SELECTED DRAWING: Figure 1
Need to check novelty before this filing date? Find Prior Art