Processing system and display device

Abstract

To provide a processing system capable of appropriately processing an object.MEANS: A processing system includes a processing device that can process an object, a measurement device that can measure a three-dimensional shape of the object, and a control device for controlling the processing device, the control device controls the processing device on the basis of three-dimensional shape information of a second area of the object acquired on the basis of a measurement result acquired by measuring a first area of the object by using the measurement device and model information representing a three-dimensional model of the object, three-dimensional shape information of the second area is acquired without measuring a three-dimensional shape of the second area by the measuring device, and at least a portion of the second area is processed by the processing device on the basis of the three-dimensional shape information of the second area.SELECTED DRAWING: Figure 1

Description

[Technical field]

[0001] The present invention relates to the technical field of a processing system capable of processing an object and a display device used in the processing system. [Background technology]

[0002] As a processing system capable of processing an object, Patent Document 1 describes a processing device that irradiates a processing light onto the surface of an object to form a structure. This type of processing device is required to process the object appropriately. [Prior art documents] [Patent documents]

[0003] [Patent Document 1] International Publication No. 2000 / 054925 Brochure Summary of the Invention

[0004] According to a first aspect, there is provided a processing system comprising a processing device capable of processing an object, a measuring device capable of measuring a three-dimensional shape of at least a part of the object, and a control device for controlling the processing device, wherein the control device controls the processing device based on three-dimensional shape information of a second region of the surface of the object which is obtained based on measurement results obtained by measuring a first region of the surface of the object using the measuring device and model information representing a three-dimensional model of at least a part of the object, and the three-dimensional shape information of the second region is obtained without measuring the three-dimensional shape of the second region by the measuring device, and at least a part of the second region is processed by the processing device based on the three-dimensional shape information of the second region.

[0005] According to a second aspect, a processing system is provided, comprising a processing device capable of processing an object, a measuring device capable of measuring the three-dimensional shape of at least a part of the object, and a display device that displays information about the object, wherein the display device displays object information representing the shape of the processed object after the processing device processes the object, first processing area information representing a first processing area processed based on the measurement results by the measuring device, and second processing area information representing a second processing area processed based on model information representing a three-dimensional model of at least a part of the object.

[0006] According to a third aspect, there is provided a processing system comprising a processing device capable of processing an object, a measuring device capable of measuring the shape of at least a part of the object, and a control device that controls the processing device, wherein the control device controls the processing device based on measurement results obtained by measuring a first region of a surface of the object using the measuring device and model information representing the shape of a second region of the surface of the object.

[0007] According to a fourth aspect, a processing system is provided, comprising a processing device capable of processing an object, a measuring device capable of measuring the shape of at least a part of the object, and a display device that displays information about the object, wherein the display device displays object information representing the shape of the object, first processing area information about a first processing area processed using the measurement results by the measuring device, and second processing area information about a second processing area processed using at least a part of model information representing a model of the object.

[0008] According to a fifth aspect, there is provided a processing system comprising a processing device capable of processing an object, a measuring device capable of measuring the shape of at least a part of the object, and a display device that displays information about the object, wherein the display device displays the information about the object based on the results of the measuring device and model information representing a model of the object.

[0009] According to a sixth aspect, a processing system is provided, comprising a processing device capable of processing an object, a measuring device capable of measuring the shape of at least a part of the object, and a control device that controls the processing device, wherein the measuring device measures a second area of ​​the surface of the object based on measurement results obtained by measuring a first area of ​​the surface of the object and model information representing the shape of the second area of ​​the surface of the object, and the control device controls the processing device based on at least the measurement results of the second area.

[0010] According to a seventh aspect, there is provided a processing system comprising a processing device capable of processing an object, a first measuring device capable of measuring the shape of at least a part of the object, a second measuring device capable of measuring the shape of at least a part of the object, and a control device that controls the processing device, wherein the second measuring device measures a second area of ​​the surface of the object based on a first measurement result obtained by measuring a first area of ​​the surface of the object by the first measuring device and model information representing the shape of the second area of ​​the surface of the object, and the control device controls the processing device based on at least the measurement result of the second area.

[0011] According to an eighth aspect, there is provided a display device capable of displaying information about an object processed by a processing system including a processing device capable of processing an object, a measuring device capable of measuring the shape of at least a part of the object, and a control device that controls the processing device based on measurement results obtained by measuring a first region of the surface of the object using the measuring device and model information representing the shape of a second region of the surface of the object, wherein the display device displays object information representing the shape of the object, first region information relating to the first region, and second region information relating to the second region.

[0012] According to a 9th aspect, there is provided a display device capable of displaying information about an object processed by a processing system including a processing device capable of processing an object and a measuring device capable of measuring the shape of at least a portion of the object, the display device displaying object information representing the shape of the object, first processing area information relating to a first processing area processed using measurement results by the measuring device, and second processing area information relating to a second processing area processed using at least a portion of model information representing a model of the object. [Brief description of the drawings]

[0013] [Figure 1] FIG. 1 is a perspective view that illustrates a schematic overall structure of a processing system according to a first embodiment. [Diagram 2] FIG. 2 is a system configuration diagram showing the system configuration of the machining system according to the first embodiment. [Diagram 3] FIG. 3 is a perspective view showing an example of a workpiece. [Figure 4] FIG. 4 is a flowchart showing the flow of the first machining operation. [Diagram 5] FIG. 5 is a perspective view showing a measuring device measuring the shape of a turbine, which is an example of a workpiece. [Figure 6] Each of FIG. 6(a) and FIG. 6(b) is a schematic diagram for explaining the operation of correcting the information on the state of the second region. [Figure 7] FIG. 7 is a conceptual diagram conceptually showing a state in which pattern matching is performed between a workpiece model and a workpiece indicated by workpiece measurement information. [Figure 8] FIG. 8 is a cross-sectional view showing a movement trajectory of a machining head that moves relatively to a workpiece based on machining path information. [Figure 9] Each of Figs. 9(a) to 9(c) is a cross-sectional view showing the movement trajectory of a machining head that moves relatively to a workpiece based on machining path information. [Figure 10]Each of Fig. 10(a) to Fig. 10(c) is a cross-sectional view showing the movement trajectory of a machining head that moves relatively to a workpiece based on machining path information. [Figure 11] FIG. 11 is a flowchart showing the flow of the second machining operation. [Figure 12] FIG. 12 is a flowchart showing the flow of the third machining operation. [Figure 13] Figure 13(a) is an oblique view showing a measuring device that measures the shape of a workpiece when the positional relationship between the measuring device and the workpiece is in a first positional relationship, and Figure 13(b) is an oblique view showing a measuring device that measures the shape of a workpiece after the positional relationship between the measuring device and the workpiece is changed from the first positional relationship to a second positional relationship. [Figure 14] FIG. 14 is a flowchart showing the flow of the fourth machining operation. [Figure 15] FIG. 15 is a flowchart showing the flow of the fifth machining operation. [Figure 16] FIG. 16 is a flowchart showing the flow of the sixth machining operation. [Figure 17] FIG. 17 is a flowchart showing the flow of the measurement operation. [Figure 18] FIG. 18 is a system configuration diagram showing the system configuration of the machining system according to the second embodiment. [Figure 19] FIG. 19 is a plan view showing an example of an image including work shape information, first region information, and second region information. [Figure 20] FIG. 20 is a perspective view that illustrates a schematic overall structure of a processing system according to the third embodiment. [Figure 21] FIG. 21 is a system configuration diagram showing the system configuration of the machining system according to the third embodiment. [Figure 22] FIG. 22 is a perspective view that illustrates a schematic overall structure of a processing system according to the fourth embodiment. [Diagram 23] FIG. 23 is a system configuration diagram showing the system configuration of the machining system according to the fourth embodiment. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0014] Hereinafter, an embodiment of a processing system and a display device will be described with reference to the drawings. Hereinafter, an embodiment of a processing system and a display device will be described using a processing system SYS that processes a workpiece W using processing light EL. However, the present invention is not limited to the embodiment described below.

[0015] In the following description, the positional relationships of the various components that make up the machining system SYS are described using an XYZ orthogonal coordinate system defined by mutually orthogonal X-, Y-, and Z-axes. For the sake of convenience, the X- and Y-axes are assumed to be horizontal (i.e., a specific direction within a horizontal plane) and the Z-axis is assumed to be vertical (i.e., a direction perpendicular to the horizontal plane, essentially an up-down direction). The rotation directions (in other words, tilt directions) around the X-, Y-, and Z-axes are referred to as the θX, θY, and θZ directions, respectively.

[0016] (1) Machining system SYSa according to the first embodiment First, a machining system SYS of a first embodiment (hereinafter, the machining system SYS of the first embodiment will be referred to as a "machining system SYSa") will be described.

[0017] (1-1) Overall structure of processing system SYSa First, the structure of the machining system SYSa of the first embodiment will be described with reference to Fig. 1 and Fig. 2. Fig. 1 is a perspective view showing the structure of the machining system SYSa of the first embodiment. Fig. 2 is a system configuration diagram showing the system configuration of the machining system SYSa of the first embodiment.

[0018] As shown in FIGS. 1 and 2, the processing system SYSa includes a processing unit 1, a measuring unit 2, a stage unit 3, and a control device 4. The processing unit 1, the measuring unit 2, and the stage unit 3 are housed in a housing 5. However, at least a part of the processing unit 1, the measuring unit 2, and the stage unit 3 may not be housed in the housing 5. In other words, the processing system SYSa may not include a housing 5 that houses the processing unit 1, the measuring unit 2, and the stage unit 3. The internal space of the housing 5 may be purged with a purge gas such as nitrogen gas or argon gas, or may not be purged with a purge gas. The internal space of the housing 5 may be evacuated, or may not be evacuated.

[0019] The machining unit 1 is capable of machining the workpiece W under the control of the control device 4. The workpiece W is an object machined by the machining unit 1. The workpiece W may be, for example, a metal, an alloy (e.g., duralumin, etc.), a semiconductor (e.g., silicon), a resin, a composite material such as CFRP (Carbon Fiber Reinforced Plastic), paint (for example, a paint layer applied to a substrate), glass, or an object made of any other material.

[0020] The machining unit 1 irradiates the workpiece W with the processing light EL in order to machine the workpiece W. The processing light EL may be any type of light as long as it can machine the workpiece W by irradiating it to the workpiece W. In the first embodiment, the processing light EL is described using an example in which the processing light EL is laser light, but the processing light EL may be a type of light other than laser light. Furthermore, the wavelength of the processing light EL may be any wavelength as long as it can machine the workpiece W by irradiating it to the workpiece W. For example, the processing light EL may be visible light or invisible light (e.g., at least one of infrared light, ultraviolet light, and extreme ultraviolet light). The processing light EL may include pulsed light (e.g., pulsed light having an emission time of picoseconds or less). Alternatively, the processing light EL may not include pulsed light. In other words, the processing light EL may be continuous light.

[0021] The machining unit 1 may perform a removal process to remove a part of the workpiece W by irradiating the workpiece W with the processing light EL. When performing the removal process, the machining unit 1 may form a riblet structure on the workpiece W. The riblet structure may include a structure capable of reducing the resistance of the surface of the workpiece W to the fluid (particularly, at least one of frictional resistance and turbulent frictional resistance). The riblet structure may include a structure capable of reducing noise generated when the fluid and the surface of the workpiece W move relatively. For example, the riblet structure may include a structure in which grooves extending along a first direction (e.g., Y-axis direction) along the surface of the workpiece W are arranged in a plurality of rows along a second direction (e.g., X-axis direction) along the surface of the workpiece W and intersecting the first direction. The fluid here means a medium (e.g., at least one of gas and liquid) flowing relative to the surface of the workpiece W. For example, when the surface of the workpiece W moves relative to the medium under a condition in which the medium itself is stationary, the medium may be referred to as a fluid. The state in which the medium is stationary may mean a state in which the medium is not moving relative to a predetermined reference object (for example, the earth's surface).

[0022] When performing removal processing, the processing system SYSa may form an arbitrary structure having an arbitrary shape on the surface of the workpiece W. An example of the arbitrary structure is a structure that generates vortices in the flow of a fluid on the surface of the workpiece W. Another example of the arbitrary structure is a structure for imparting hydrophobicity to the surface of the workpiece W. Another example of the arbitrary structure is a micro- or nanometer-order fine texture structure (typically an uneven structure) formed regularly or irregularly. The fine texture structure may include at least one of a shark skin structure and a dimple structure that have a function of reducing resistance by a fluid (gas and / or liquid). The fine texture structure may include a lotus leaf surface structure that has at least one of a liquid repellent function and a self-cleaning function (for example, having a lotus effect). The fine texture structure may include at least one of a fine protrusion structure having a liquid transport function (see U.S. Patent Publication No. 2017 / 0044002), a concave-convex structure having a lyophilic function, a concave-convex structure having an antifouling function, a moth-eye structure having at least one of a reflectance reducing function and a liquid repellent function, a concave-convex structure that exhibits a structural color by intensifying only light of a specific wavelength by interference, a pillar array structure having an adhesive function using van der Waals forces, a concave-convex structure having an aerodynamic noise reducing function, a honeycomb structure having a droplet collecting function, as well as a concave-convex structure that improves adhesion with a layer formed on the surface, and a concave-convex structure for reducing frictional resistance. Here, the fine texture structure does not have to have a specific function. The processing system SYSa may smooth the surface of the workpiece W. Here, smoothing the surface may mean processing the surface so that the surface after processing is smoother than the surface before processing. The processing system SYSa may also remove burrs present on the surface of the workpiece W.

[0023] An example of the workpiece W to be processed by removal (for example, a riblet structure is formed by the removal) is a turbine WT shown in FIG. 3. As shown in FIG. 3, the turbine WT may include a disk-shaped rotor RT rotatable around a rotation axis RX and a plurality of turbine blades BL extending radially from the outer circumferential surface of the rotor RT. In this case, the processing unit 1 may form a riblet structure on at least a part of the surface of the plurality of turbine blades BL. The processing unit 1 may form a riblet structure on at least a part of the surface of the rotor RT. Although not shown, another example of the workpiece W to be processed by removal is a fan or a propeller. A fan is a member used in a blower or the like to form a gas flow. A propeller is a member that converts the rotational force output from a prime mover including at least one of an engine and a motor into the propulsive force of a moving body including at least one of an airplane and a ship. Although not shown, another example of the workpiece W to be processed by removal is a die. In this case, the mold formed by the removal process may be used to form at least one of a film having a riblet structure (or other structure) on the surface and a resin part, etc. Note that the workpiece W is not limited to the objects exemplified here.

[0024] In addition to or instead of the removal processing, the processing unit 1 may perform additional processing to add a new structure to the workpiece W by irradiating the workpiece W with processing light EL. In this case, the processing unit 1 may perform the additional processing to form the above-mentioned riblet structure on the surface of the workpiece W. In addition to or instead of at least one of the removal processing and the additional processing, the processing unit 1 may perform marking processing to form a desired mark on the surface of the workpiece W by irradiating the workpiece W with processing light EL.

[0025] In order to process the workpiece W, the processing unit 1 includes a processing light source 11 that generates processing light EL, a processing head 12, and a head drive system 13.

[0026] The processing head 12 irradiates the workpiece W with the processing light EL from the processing light source 11. The processing head 12 processes the workpiece W by irradiating the workpiece W with the processing light EL. For this reason, the processing head 12 may be referred to as a processing device. In order to irradiate the workpiece W with the processing light EL, the processing head 12 is equipped with an irradiation optical system 121. The processing head 12 irradiates the workpiece W with the processing light EL via the irradiation optical system 121. The irradiation optical system 121 may, for example, focus the processing light EL on the surface of the workpiece W. The irradiation optical system 121 may, for example, control the optical characteristics of the processing light EL. Examples of optical characteristics of the processing light EL include at least one of the intensity of the processing light EL, changes in the intensity of the processing light EL over time, the focusing position of the processing light EL, the angle of incidence of the processing light EL relative to the workpiece W, the shape of the processing light EL within an optical plane intersecting the optical axis of the irradiation optical system 121, the intensity distribution of the processing light EL within that optical plane, and the number of pulses of the processing light (only when the processing light is pulsed light).

[0027] The head drive system 13 moves the processing head 12 along at least one of the X-axis direction, the Y-axis direction, and the Z-axis direction under the control of the control device 4. The head drive system 13 may move the processing head 12 along at least one of the θX direction, the θY direction, and the θZ direction in addition to or instead of at least one of the X-axis direction, the Y-axis direction, and the Z-axis direction. When the processing head 12 moves, the positional relationship between the processing head 12 and a stage 32 (and further, a workpiece W placed on the stage 32), which will be described later, changes. Furthermore, when the positional relationship between the processing head 12 and the stage 32 and the workpiece W changes, the irradiation position of the processing light EL on the workpiece W changes.

[0028] The measurement unit 2 includes a measurement head 21 and a head drive system 22. The measurement head 21 includes measuring devices 211 and 212. However, the measurement head 21 may include one of the measuring devices 211 and 212, but may not include the other of the measuring devices 211 and 212.

[0029] Each of the measuring devices 211 and 212 is capable of measuring the state of a measurement object. In this embodiment, an example will be described in which the measurement object is at least a part of the workpiece W. However, the measurement object may include an object other than the workpiece W. In this case, each of the measuring devices 211 and 212 may measure the state of at least a part of the workpiece W. The measurement results (hereinafter appropriately referred to as "workpiece measurement information") obtained by each of the measuring devices 211 and 212 measuring at least a part of the workpiece W are output from the measurement unit 2 to the control device 4.

[0030] The state of the workpiece W may include the position of the workpiece W. The position of the workpiece W may include the position of the surface of the workpiece W. The position of the surface of the workpiece W may include the position of each surface portion obtained by dividing the surface of the workpiece W in at least one of the X-axis direction, the Y-axis direction, and the Z-axis direction. The position of the surface of the workpiece W may include the position of each surface portion obtained by dividing the surface of the workpiece W in at least one of the θX direction, the θY direction, and the θZ direction. Note that the position of each surface portion in at least one of the θX direction, the θY direction, and the θZ direction may be considered to be equivalent to the attitude of each surface portion (that is, the orientation of each surface portion (e.g., the orientation of the normal of each surface portion), which is substantially equivalent to the amount of inclination of each surface portion with respect to at least one of the X-axis, the Y-axis, and the Z-axis). In this case, it can be said that the state of the workpiece substantially includes the shape of the workpiece W. In addition, the state of the workpiece W may include the size of the workpiece W (e.g., the size in at least one of the X-axis direction, the Y-axis direction, and the Z-axis direction).

[0031] Each of the measuring devices 211 and 212 may be capable of measuring a three-dimensional shape of at least a portion of the workpiece W as the shape of at least a portion of the workpiece W. However, each of the measuring devices 211 and 212 may be capable of measuring a two-dimensional shape of at least a portion of the workpiece W. Each of the measuring devices 211 and 212 may be capable of measuring a one-dimensional shape (i.e., length) of at least a portion of the workpiece W.

[0032] The measurement accuracy (in other words, measurement resolution) of the measuring device 211 is different from the measurement accuracy of the measuring device 212. In the first embodiment, an example will be described in which the measurement accuracy of the measuring device 212 is lower than the measurement accuracy of the measuring device 211. When the measurement accuracy of the measuring device 212 is lower than the measurement accuracy of the measuring device 211, the measuring device 212 may be a measuring device that measures a relatively wide range with relatively low measurement accuracy (in other words, roughly or coarsely), the measuring device 211 may be a measuring device that measures a relatively narrow range with relatively high measurement accuracy (in other words, finely or finely), the measuring device 212 may be a wide-area measuring device, and the measuring device 211 may be a narrow-area measuring device. The time required for the measuring device 211 to perform measurement may be longer than the time required for the measuring device 212 to perform measurement. Specifically, the time required for the measuring device 211 to measure one portion of one measurement object may be longer than the time required for the measuring device 212 to measure the same portion of the same measurement object. However, the measurement accuracy of the measuring device 211 may be the same as the measurement accuracy of the measuring device 212.

[0033] The measurement accuracy may mean the limit value of the fineness of the measurement (e.g., an index value for evaluating the minimum measurable size). The measurement accuracy may mean the magnitude of the measurement error relative to the size (e.g., length) of the measurement object (in this case, the smaller the measurement error relative to the size of the measurement object, the higher the measurement accuracy). When the measurement result is obtained as point cloud data, the measurement error may mean the variation accuracy of the point cloud. When the measurement operation is performed multiple times, the measurement accuracy may mean the variation of the measurement results of the multiple measurement operations (i.e., the accuracy of the repeated measurements). The measurement accuracy may mean other accuracy.

[0034] Each of the measuring devices 211 and 212 non-contactly measures the state of at least a part of the workpiece W. For example, each of the measuring devices 211 and 212 may include an optical measuring device capable of optically measuring the state of at least a part of the workpiece W. Examples of optical measuring devices include an imaging device (i.e., a camera) capable of imaging the workpiece W, a measuring device using a light cutting method that projects slit light onto the surface of the workpiece W and measures the shape of the projected slit light, a measuring device using a pattern projection method that projects a light pattern onto the surface of the workpiece W and measures the shape of the projected pattern, a measuring device using a time-of-flight method that projects light onto the surface of the workpiece W and measures the distance to the workpiece W from the time it takes for the projected light to return at multiple positions on the workpiece W, a measuring device using a moire topography method (specifically, a grating irradiation method or a grating projection method), a measuring device using a holographic interferometry method, a measuring device using an autocollimation method, a measuring device using a stereo method, a measuring device using an astigmatism method, a measuring device using a critical angle method, a measuring device using a knife edge method, a measuring device using an interferometry method, and at least one of a measuring device using a confocal method. In any case, each of the measuring devices 211 and 212 may be provided with a light receiver that receives light from at least a part of the workpiece W. The light from at least a portion of the workpiece W received by the receiver may include light caused by measurement light irradiated onto the workpiece W to measure the state of the workpiece W (e.g., at least one of reflected light, scattered light, and transmitted light of the measurement light). The light from at least a portion of the workpiece W received by the receiver may include light caused by ambient light (e.g., light from the workpiece W irradiated with ambient light).

[0035] The measuring device 211 can measure at least a part of the workpiece W included in the measurement field of view of the measuring device 211 (in other words, the measurable range). On the other hand, the measuring device 211 cannot measure at least a part of the workpiece W that is not included in the measurement field of view of the measuring device 211. Here, the measurement field of view may mean an area that satisfies the condition that the light receiver of the measuring device 211 can receive light from an object included therein. Note that, like the measuring device 211, the measuring device 212 can measure at least a part of the workpiece W that is included in the measurement field of view of the measuring device 212, but cannot measure at least a part of the workpiece W that is not included in the measurement field of view of the measuring device 212.

[0036] The size of the measurement field of view of the measuring device 211 is different from the size of the measurement field of view of the measuring device 212. In the first embodiment, an example will be described in which the size of the measurement field of view of the measuring device 212 is larger than the size of the measurement field of view of the measuring device 211. In this case, the measurement field of view of the measuring device 211 may be included in the measurement field of view of the measuring device 212. When the measurement field of view of the measuring device 211 is included in the measurement field of view of the measuring device 212, the measuring device 212 can measure at least a part of the state of the workpiece W that the measuring device 211 cannot measure. However, the size of the measurement field of view of the measuring device 212 may be smaller than the size of the measurement field of view of the measuring device 211. The size of the measurement field of view of the measuring device 212 may be the same as the size of the measurement field of view of the measuring device 211. At least a part of the measurement field of view of the measuring device 211 may not be included in at least a part of the measurement field of view of the measuring device 212.

[0037] The head driving system 22 moves the measurement head 21 along at least one of the X-axis direction, the Y-axis direction, the Z-axis direction, the θX direction, the θY direction, and the θZ direction under the control of the control device 4. That is, the measurement head 21 (more specifically, each of the measuring devices 211 and 212 included in the measurement head 21) can be moved by the head driving system 22. Note that moving the measurement head 21 along at least one of the θX direction, the θY direction, and the θZ direction may be considered equivalent to changing the posture of the measurement head 21 around at least one of the X-axis, the Y-axis, and the Z-axis. Alternatively, moving the measurement head 21 along at least one of the θX direction, the θY direction, and the θZ direction may be considered equivalent to rotating (or rotating and moving) the measurement head 21 around at least one of the X-axis, the Y-axis, and the Z-axis. When the measurement head 21 moves, the positional relationship between the measurement head 21 and the stage 32 (and further the workpiece W placed on the stage 32) described later changes. Furthermore, when the positional relationship between the stage 32 and the workpiece W and the measurement head 21 changes, the positional relationship between the stage 32 and the workpiece W and the measurement fields of view of the measuring devices 211 and 212 changes.

[0038] The stage unit 3 includes a base 31 , a stage 32 , and a stage drive system 33 .

[0039] The base plate 31 is placed on the bottom surface of the housing 5 (or on a support surface such as a floor surface on which the housing 5 is placed). A stage 32 is placed on the base plate 31. A vibration isolation device (not shown) for reducing the transmission of vibrations of the base plate 31 to the stage 32 may be installed between the base plate 31 and the bottom surface of the housing 5 or a support surface such as a floor surface on which the housing 5 is placed. The stage 32 may be configured to be supported by air bearings so as to float above the base plate 31.

[0040] A workpiece W is placed on the stage 32. The stage 32 does not have to hold the workpiece W placed on the stage 32. In other words, the stage 32 does not have to apply a holding force to the workpiece W placed on the stage 32 to hold the workpiece W. Alternatively, the stage 32 may hold the workpiece W placed on the stage 32. In other words, the stage 32 may apply a holding force to the workpiece W placed on the stage 32 to hold the workpiece W. For example, the stage 32 may hold the workpiece W by vacuum adsorption and / or electrostatic adsorption.

[0041] The stage drive system 33 moves the stage 32 along at least one of the X-axis direction, the Y-axis direction, the Z-axis direction, the θX direction, the θY direction, and the θZ direction. Moving the stage 32 along at least one of the θX direction, the θY direction, and the θZ direction may be considered equivalent to changing the posture of the stage 32 (and further the workpiece W placed on the stage 32) around at least one of the X-axis, the Y-axis, and the Z-axis. Alternatively, moving the stage 32 along at least one of the θX direction, the θY direction, and the θZ direction may be considered equivalent to rotating (or rotationally moving) the stage 32 around at least one of the X-axis, the Y-axis, and the Z-axis.

[0042] When the stage 32 moves, the positional relationship between the stage 32 (and further the workpiece W placed on the stage 32) and each of the processing head 12 and the measurement head 21 changes. Therefore, moving the stage 32 is equivalent to changing the positional relationship between the stage 32 and each of the workpiece W and each of the processing head 12 and the measurement head 21. Furthermore, when the positional relationship between the workpiece W and the processing head 12 changes, the irradiation position of the processing light EL on the workpiece W changes. Furthermore, when the positional relationship between the workpiece W and the measurement head 21 changes, the positional relationship between the workpiece W and the measurement field of view of the measuring devices 211 and 212 changes.

[0043] The control device 4 controls the operation of the machining system SYSa. For example, the control device 4 may generate machining control information for machining the workpiece W, and control at least one of the machining unit 1, the measuring unit 2, and the stage unit 3 based on the machining control information so that the workpiece W is machined according to the generated machining control information. That is, the control device 4 may control the machining of the workpiece W. For example, the control device 4 may generate measurement control information for measuring the workpiece W, and control at least one of the machining unit 1, the measuring unit 2, and the stage unit 3 based on the measurement control information so that the workpiece W is measured according to the generated measurement control information. That is, the control device 4 may control the measurement of the workpiece W.

[0044] The control device 4 may include, for example, a calculation device and a storage device. The calculation device may include, for example, at least one of a CPU (Central Processing Unit) and a GPU (Graphics Processing Unit). The control device 4 functions as a device that controls the operation of the machining system SYSa by the calculation device executing a computer program. This computer program is a computer program for making the control device 4 (for example, the calculation device) perform (i.e., execute) the operation to be performed by the control device 4, which will be described later. In other words, this computer program is a computer program for making the control device 4 function so as to make the machining system SYSa perform the operation to be described later. The computer program executed by the calculation device may be recorded in a storage device (i.e., a recording medium) included in the control device 4, or may be recorded in any storage medium (for example, a hard disk or a semiconductor memory) built into the control device 4 or externally attachable to the control device 4. Alternatively, the calculation device may download the computer program to be executed from a device external to the control device 4 via a network interface.

[0045] The control device 4 may not be provided inside the processing system SYSa. For example, the control device 4 may be provided as a server or the like outside the processing system SYSa. In this case, the control device 4 and the processing system SYSa may be connected by a wired and / or wireless network (or a data bus and / or a communication line). As the wired network, a network using a serial bus type interface represented by at least one of IEEE1394, RS-232x, RS-422, RS-423, RS-485, and USB may be used. As the wired network, a network using a parallel bus type interface may be used. As the wired network, a network using an interface conforming to Ethernet (registered trademark), represented by at least one of 10BASE-T, 100BASE-TX, and 1000BASE-T, may be used. As the wireless network, a network using radio waves may be used. An example of a network using radio waves is a network conforming to IEEE802.1x (for example, at least one of wireless LAN and Bluetooth (registered trademark)). A network using infrared rays may be used as the wireless network. A network using optical communication may be used as the wireless network. In this case, the control device 4 and the processing system SYSa may be configured to be able to transmit and receive various information via the network. The control device 4 may be able to transmit information such as commands and control parameters to the processing system SYSa via the network. The processing system SYSa may include a receiving device that receives information such as commands and control parameters from the control device 4 via the network. Alternatively, a first control device that performs a part of the processing performed by the control device 4 may be provided inside the processing system SYSa, while a second control device that performs another part of the processing performed by the control device 4 may be provided outside the processing system SYSa.

[0046] As a recording medium for recording the computer program executed by the arithmetic device, at least one of CD-ROM, CD-R, CD-RW, flexible disk, MO, DVD-ROM, DVD-RAM, DVD-R, DVD+R, DVD-RW, DVD+RW, Blu-ray (registered trademark), magnetic medium such as magnetic tape, magneto-optical disk, semiconductor memory such as USB memory, and any other medium capable of storing a program may be used. The recording medium may include a device capable of recording a computer program (for example, a general-purpose device or a dedicated device in which a computer program is implemented in a state in which it can be executed in at least one of the forms of software and firmware). Furthermore, each process or function included in the computer program may be realized by a logical processing block realized in the control device 4 by the control device 4 (i.e., a computer) executing the computer program, or may be realized by hardware such as a predetermined gate array (FPGA, ASIC) provided in the control device 4, or may be realized in a form in which a logical processing block and a partial hardware module that realizes some elements of the hardware are mixed.

[0047] (1-2) Operation of the machining system SYSa Next, the operation of the machining system SYSa will be described. As described above, the machining system SYSa machines the workpiece W. That is, the machining system SYSa performs a machining operation for machining the workpiece W. In addition, the machining system SYSa measures the workpiece W. That is, the machining system SYSa performs a measurement operation for measuring the workpiece W. Therefore, hereinafter, the machining operation and the measurement operation will be described in order.

[0048] (1-2-1) Machining operation First, a description will be given of the machining operation for machining the workpiece W. In the first embodiment, the machining system SYSa performs at least one of the first machining operation to the sixth machining operation. Therefore, the first machining operation to the sixth machining operation will be described in order below.

[0049] (1-2-1-1) 1st machining operation First, the first processing operation will be described with reference to Fig. 4. Fig. 4 is a flowchart showing the flow of the first processing operation.

[0050] As shown in FIG. 4, first, the workpiece W is placed on the stage 32 (step S11). For example, the workpiece W may be placed on the stage 32 by an operator of the processing system SYSa. At this time, the processing system SYSa may present the operator with information regarding a target placement position at which the workpiece W should be placed on the stage 32. For example, the processing system SYSa may present the operator with information regarding the target placement position by forming a marker indicating the target placement position (for example, a marker formed by a light-emitting means such as an LED) on the stage 32. The operator may place the workpiece W at the target placement position based on the presented information. The workpiece W may be placed on the stage 32 using a transport robot or the like.

[0051] Thereafter, the machining system SYSa corrects the placement error of the workpiece W (step S12). The placement error corresponds to the amount of deviation between the target placement position where the workpiece W should be placed on the stage 32 and the actual placement position where the workpiece W is actually placed on the stage 32. In order to correct the placement error, first, at least one of the measuring devices 211 and 212 measures the state of the workpiece W. Specifically, at least one of the measuring devices 211 and 212 measures the position of the workpiece W on the stage 32. Here, at least one of the measuring devices 211 and 212 may measure the position of a part of the workpiece W. The part of the workpiece W may include a feature point of the workpiece W. As a result, the control device 4 can generate information on the actual placement position based on the workpiece measurement information. Also, the target placement position is usually known to the control device 4. For this reason, the control device 4 calculates the placement error based on the information on the actual placement position included in the workpiece measurement information and the information on the target placement position, which is known information. Thereafter, the control device 4 judges whether or not the placement error is greater than a predetermined allowable threshold value TH1. If it is judged that the placement error is greater than the allowable threshold value TH1, the control device 4 may perform an operation of prompting the operator to re-place the workpiece W. As a result, the placement error is corrected to zero or to a smaller value. However, if the processing system SYSa is equipped with a workpiece moving device for moving the workpiece W on the stage 32, the control device 4 may control the workpiece moving device to correct the placement error. However, the processing system SYSa does not have to perform the operation of step S12.

[0052] Thereafter, the measuring device 212 measures the shape of at least a part of the workpiece W (step S13). Specifically, the measuring device 212 measures the shape of at least a part of the workpiece W included in the measurement field of view of the measuring device 212 (step S13). As a result, the control device 4 can acquire information on the shape of the workpiece W related to the measurement result of the shape of at least a part of the workpiece W from the workpiece measurement information. As described above, the measuring device 212 can measure not only the shape of the workpiece W but also the position (including the posture) and size of the workpiece W as the state of the workpiece W. For this reason, in the first embodiment, the operation of measuring the shape of at least a part of the workpiece W may be considered to be equivalent to the operation of measuring the state of at least a part of the workpiece W. In this case, the control device 4 may acquire information on the measurement result of the position of at least a part of the workpiece W and information on the measurement result of the size of at least a part of the workpiece W from the workpiece measurement information. In addition to or instead of the measuring device 212, the measuring device 211 may measure the shape of at least a part of the workpiece W in step S13.

[0053] Here, because the workpiece W is a three-dimensional object, the entire surface of the workpiece W is not necessarily included in the measurement field of view of the measuring device 212. In other words, while a portion of the surface of the workpiece W is included in the measurement field of view of the measuring device 212, there is a possibility that another portion of the surface of the workpiece W is not included in the measurement field of view of the measuring device 212. In other words, in a situation where the measuring device 212 is measuring the surface shape of a portion of the workpiece W, there is a possibility that another portion of the surface of the workpiece W is located in a blind spot area that cannot be measured by the measuring device 212.

[0054] For example, Fig. 5 shows a measuring device 212 measuring the shape of a turbine WT, which is an example of a workpiece W. Here, when the positional relationship between the measuring device 212 and the workpiece W does not change (i.e., is fixed), light from a first region W1 (region shown by a solid line in Fig. 5) of the workpiece W can reach the measuring device 212, while light from a second region W2 (region shown by a dotted line in Fig. 5) of the workpiece W may not reach the measuring device 212. Specifically, for example, light from the first region W1 including a surface portion of the surface of the workpiece W facing the measuring device 2 side may reach the measuring device 2, while light from the second region W2 including a surface portion of the surface of the workpiece W facing the opposite side to the measuring device 2 may not reach the measuring device 2. For example, light from a first region W1 including a surface portion of the surface of the workpiece W facing the front side as viewed from the measurement device 2 may be able to reach the measurement device 212, while light from a second region W2 including a surface portion of the surface of the workpiece W facing the back side as viewed from the measurement device 2 may not be able to reach the measurement device 212. For example, light from the first region W1 including a surface portion of the surface of the workpiece W where there is no obstacle (e.g., a part of the workpiece W or an object other than the workpiece W) that blocks the light between the first region W1 and the measurement device 212 may be able to reach the measurement device 212, while light from the second region W2 including a surface portion of the surface of the workpiece W where there is an obstacle between the first region W1 and the measurement device 212 may not be able to reach the measurement device 212. As shown in FIG. 5, typically, the first region W1 and the second region W2 are adjacent to each other.

[0055] The state in which the positional relationship between the measuring device 212 and the workpiece W does not change may be considered to be equivalent to a state in which the measuring device 212 and the workpiece W are each located at a fixed position in the processing system SYSa. The state in which the positional relationship between the measuring device 212 and the workpiece W does not change may be considered to be equivalent to a state in which the measuring device 212 is placed at a first predetermined position in the processing system SYSa and the workpiece W is placed at a second predetermined position in the processing system SYSa. Note that the "position" in the first embodiment may include a position in at least one of the X-axis direction, the Y-axis direction, and the Z-axis direction. Alternatively, the "position" in the first embodiment may include a position (so-called posture) in at least one of the θX direction, the θY direction, and the θZ direction in addition to or instead of a position in at least one of the X-axis direction, the Y-axis direction, and the Z-axis direction.

[0056] In this manner, a state in which light from the first region W1 can reach the measurement device 212 while light from the second region W2 cannot reach the measurement device 212 corresponds to a state in which the first region W1 is included in the measurement field of view of the measurement device 212 while the second region W2 is not included in the measurement field of view of the measurement device 212. In other words, a state in which light from the first region W1 can reach the measurement device 212 while light from the second region W2 cannot reach the measurement device 212 corresponds to a state in which the first region W1 is included in the measurement field of view of the measurement device 212 while the second region W2 is located in a blind spot region that cannot be measured by the measurement device 212.

[0057] In this case, the control device 4 can obtain information on the shape of the first region W1 from the workpiece measurement information. Alternatively, the control device 4 may obtain information on at least one of the position and size of the first region W1 in addition to information on the shape of the first region W1 from the workpiece measurement information. On the other hand, the control device 4 cannot obtain information on the shape (and further, the position and size) of the second region W2 from the workpiece measurement information. In this case, in order to obtain information on the shape, etc. of the second region W2, the machining system SYSa may change the positional relationship between the measuring device 212 and the workpiece W so that at least a part of the second region W2 is included in the measurement field of view of the measuring device 212, and then measure the shape, etc. of at least a part of the second region W2 using the measuring device 212. However, even in this case, there is a possibility that a part of the second region W2 is not included in the measurement field of view of the measuring device 212. For this reason, the processing system SYSa needs to change the positional relationship between the measuring device 212 and the workpiece W until the entire surface of the workpiece W is included in the measurement field of view of the measuring device 212 (i.e., the entire surface shape, etc. of the workpiece W is measured by the measuring device 212), and then repeat the operation of measuring the shape, etc. of at least a part of the workpiece W using the measuring device 212. For this reason, a relatively long time is required to obtain information (hereinafter referred to as "workpiece information") regarding the state of the workpiece W on the stage 32 (i.e., the shape, position, and size of the workpiece W). As a result, the throughput regarding the processing of the workpiece W may deteriorate. Furthermore, the workpiece information may include a measurement error caused by measuring the shape, etc. of at least a part of the workpiece W while repeatedly changing the positional relationship between the measuring device 212 and the workpiece W. In addition, even if the positional relationship between the measuring device 212 and the workpiece W is changed, depending on the shape of the workpiece W, there may be cases where the entire surface shape, etc. of the workpiece W cannot be measured by the measuring device 212.

[0058] Therefore, in the first embodiment, the control device 4 employs a method different from the method of measuring the overall shape of the workpiece W using the measuring device 212 to obtain information on the shape of the second region W2. That is, the control device 4 obtains information on the shape of the second region W2 without measuring the overall shape of the second region W2 using the measuring device 212. Specifically, the control device 4 obtains information on the shape of the second region W2 from model information representing a three-dimensional model of at least a part of the workpiece W (hereinafter referred to as the "workpiece model WM"). The workpiece model WM is, for example, a three-dimensional model having a shape that is the same as or similar to the ideal or designed shape of the workpiece W. Alternatively, the workpiece model WM may be, for example, a three-dimensional model generated based on information on the shape of the workpiece obtained by measuring the workpiece W using a predetermined measuring method. Since the control device 4 obtains information on the shape of the second region W2 from the model information, the model information may include at least information representing the shape of the second region W2 (for example, information representing the three-dimensional model of the second region W2). When a microstructure is machined on the workpiece W, the workpiece model WM may be a shape model that does not include the microstructure. When the workpiece model WM is used for inspection after machining, the workpiece model WM may be a shape model that reflects the microstructure.

[0059] Here, if the model information represents a three-dimensional model of the workpiece W, it is also conceivable that the control device 4 may use the model information itself as the workpiece information without using the workpiece measurement information. However, the model information is merely information representing the ideal or designed shape of the workpiece W. The model information is merely information representing the shape of the workpiece W measured at a certain point in time. For this reason, the model information only includes information relating to only the shape of the workpiece W. In other words, the model information does not include information relating to the position and size of the workpiece W on the stage 32. In addition, the shape of the workpiece W actually placed on the stage 32 does not necessarily match the shape of the workpiece W indicated by the model information. For this reason, the model information is merely information that does not reflect the actual shape of the workpiece W actually placed on the stage 32.

[0060] Therefore, in this embodiment, the control device 4 uses both the model information and the workpiece measurement information to generate workpiece information including information on the respective states (i.e., shape, position, and size) of the first area W1 and the second area W2 on the stage 32 (step S14). In order to generate the workpiece information using both the model information and the workpiece measurement information, the control device 4 first acquires the workpiece measurement information from the measuring device 212. Furthermore, the control device 4 acquires the model information. The model information may be recorded in a memory (i.e., a recording medium) provided in the control device 4. The model information may be recorded in any recording medium (e.g., a hard disk or a semiconductor memory) built into the control device 4 or externally attachable to the control device 4. In this case, the control device 4 may acquire the model information by reading the model information from these recording media as necessary. The model information may be recorded in a device external to the control device 4. The model information may be recorded in a device external to the machining system SYSa (e.g., a server, a database, or any other information processing device). In this case, the control device 4 may acquire the model information by downloading workpiece model data from the external device as necessary. Incidentally, this model information may be recorded in the above-mentioned recording medium or the like by a user or an operator of the machining system SYSa.

[0061] Thereafter, the control device 4 generates work information by associating the work measurement information with the model information. Specifically, the control device 4 performs an alignment process for arranging the work model WM indicated by the model information at at least a part of the position of the work W indicated by the work measurement information in the measurement coordinate system, which is a three-dimensional coordinate system used to identify the position of the work W measured by the measurement device 212. That is, the control device 4 performs an alignment process for translating, enlarging, reducing, and / or rotating the work model WM in the measurement coordinate system to bring the work model WM closer to the work W indicated by the work measurement information. When the alignment process is completed, the shape, position, and size of the work model WM in the measurement coordinate system can be considered to be substantially equivalent to the shape, position, and size of the work W in the measurement coordinate system, respectively. That is, the shape, position, and size of the work model WM in the measurement coordinate system can be considered to be substantially equivalent to the shape, position, and size of the work W on the stage 32, respectively. Therefore, the control device 4 can generate work information based on the result of the alignment process.

[0062] Information on the shape, position and size of the part of the workpiece model WM corresponding to the first region W1 can be considered to be equivalent to information on the shape, position and size of the first region W1 of the workpiece W contained in the workpiece measurement information. On the other hand, the workpiece measurement information is information obtained by actually measuring the workpiece W. For this reason, the workpiece measurement information is assumed to be relatively more reliable than the model information. For this reason, the control device 4 may generate workpiece information including information on at least one of the shape, position and size of the workpiece W by combining information on at least one of the shape, position and size of the first region W1 of the workpiece W contained in the workpiece measurement information and information on at least one of the shape, position and size of the part of the workpiece model WM corresponding to the second region W2. Specifically, the control device 4 obtains information on at least one of the shape, position and size of the first region W1 of the workpiece W from the workpiece measurement information. The control device 4 obtains information on at least one of the shape, position and size of the part of the workpiece model WM corresponding to the second region W2 from the result of the alignment process. Thereafter, the control device 4 generates work information by using information on at least one of the shape, position, and size of the portion of the work model WM corresponding to the second region W2 as information on at least one of the shape, position, and size of the second region W2 of the work W. That is, in the first embodiment, it can be said that the control device 4 generates the work information using the work measurement information in principle, and supplements information that is lacking in generating the work information (i.e., information that is necessary to generate the work information but is not included in the work measurement information) with the model information.

[0063] Alternatively, instead of using information on the state (i.e., shape, position, and size) of the part of the workpiece model WM corresponding to the second region W2 as information on the state of the second region W2 of the workpiece W as it is, the control device 4 may generate (in other words, may obtain) information on the state of the second region W2 of the workpiece W based on information on the state of the first region W1 of the workpiece W obtained from the workpiece measurement information and information on the state of the part of the workpiece model WM corresponding to the second region W2. For example, as described above, the first region W1 and the second region W2 are usually adjacent to each other. Therefore, it is assumed that the possibility that the state of the first region W1 and the state of the second region W2 are unnaturally significantly different at the boundary between the first region W1 and the second region is relatively low. Therefore, if the state of the first region W1 indicated by the workpiece measurement information and the state of the second region W2 indicated by the result of the alignment process are unnaturally significantly different at the boundary between the first region W1 and the second region, there is a possibility that the reliability of either the state of the first region W1 indicated by the workpiece measurement information or the state of the second region W2 indicated by the result of the alignment process is low. Here, as described above, the workpiece measurement information is assumed to be more reliable than the model information. Therefore, the control device 4 may consider the state of the first region W1 indicated by the workpiece measurement information to be a true value, and may correct the information on the state of the second region W2 indicated by the result of the alignment process based on the information on the state of the first region W1 indicated by the workpiece measurement information. In this case, the control device 4 may generate the workpiece information by combining the information on the state of the first region W1 indicated by the workpiece measurement information and the corrected information on the state of the second region W2. In this case, the control device 4 may consider that it has generated the information on the state of the second region W2 to be included in the workpiece information based on the information on the state of the first region W1 indicated by the workpiece measurement information and the information on the state of the second region W2 indicated by the result of the alignment process.

[0064] An example of the operation of correcting information on the state of the second region W2 will be described with reference to Fig. 6(a) and Fig. 6(b). As shown in Fig. 6(a), the work measurement information indicates that the first region W1 is a plane whose Z-axis position coordinate (i.e., height) is uniformly 100 in the measurement coordinate system, while the result of the alignment process indicates that the second region W2 is a plane whose Z-axis position coordinate is 80 in the measurement coordinate system. In this case, the Z-axis position coordinate of the surface of the work W changes suddenly from 100 to 80 at the boundary between the first region W1 and the second region W2. In this case, the control device 4 may correct the Z-axis position coordinate of the second region W2 indicated by the result of the alignment process based on the Z-axis position coordinate of the first region W1 indicated by the work measurement information. In other words, the control device 4 may generate the Z-axis position coordinate of the second region W2 to be included in the work information based on the Z-axis position coordinate of the first region W1 indicated by the work measurement information and the Z-axis position coordinate of the second region W2 indicated by the result of the alignment process. For example, as shown in Fig. 6(b), the control device 4 may generate the average value (=(100+80) / 2=90) of the Z-axis position coordinate of the first region W1 indicated by the work measurement information (=100) and the Z-axis position coordinate of the second region W2 indicated by the result of the alignment process (=80) as the Z-axis position coordinate of the second region W2 to be included in the work information.

[0065] The control device 4 may perform a pattern matching process as a part of the alignment process. A specific example of the alignment process including the pattern matching process will be described below. The control device 4 extracts measurement feature points, which are feature points of the workpiece W, based on the workpiece measurement information. The control device 4 extracts a plurality of (e.g., three or more) measurement feature points. Since the workpiece measurement information includes information on the state of the first region W1 but does not include information on the state of the second region W2, the control device 4 extracts a plurality of measurement feature points from the first region W1 of the workpiece W. Note that the feature points may include at least one of an edge, a vertex, a corner, and an end portion of an object, for example. Furthermore, the control device 4 extracts workpiece model feature points, which are a plurality of feature points of the workpiece model WM and correspond to the measurement feature points, based on the workpiece model WM. In particular, the control device 4 extracts a plurality of (e.g., three or more) workpiece model feature points. The control device 4 extracts a plurality of workpiece model feature points from a portion of the workpiece model WM that corresponds to the first region W1. Thereafter, the control device 4 performs pattern matching between the workpiece model WM and the workpiece W indicated by the workpiece measurement information based on the workpiece model feature points and the measurement feature points. Specifically, as shown in FIG. 7, which is a conceptual diagram conceptually showing the state of pattern matching between the workpiece model WM and the workpiece W indicated by the workpiece measurement information, the control device 4 translates, enlarges, reduces, and / or rotates the workpiece model WM so that the workpiece model feature points approach the measurement feature points. The control device 4 translates, enlarges, reduces, and / or rotates the workpiece model WM until the deviation between the workpiece model feature points and the measurement feature points becomes equal to or less than a predetermined amount (typically, until it becomes a minimum). As a result, in the measurement coordinate system, the shape of the part of the workpiece model WM corresponding to the first region W1 matches the shape of the first region W1 of the workpiece W indicated by the workpiece measurement information, the position of the part of the workpiece model WM corresponding to the first region W1 matches the position of the first region W1 of the workpiece W indicated by the work measurement information, and the size of the part of the workpiece model WM corresponding to the first region W1 matches the size of the first region W1 of the workpiece W indicated by the work measurement information.Therefore, as a result of the alignment process, the control device 4 can identify, within the measurement coordinate system, the shape, position and size of the part of the work model WM corresponding to the second area W2 as the shape, position and size of the second area W2 of the work W on the stage 32.

[0066] The control device 4 may perform the alignment process using any algorithm for performing the alignment process. One example of such an algorithm is an ICP (Interactive Closest Point) algorithm for performing alignment of a plurality of point clouds (for example, the point cloud including the above-mentioned work model feature points and the point cloud including the measurement feature points).

[0067] 4, thereafter, the control device 4 generates processing control information based on the workpiece information generated in step S14 (step S15). The processing control information may include information used by the control device 4 to control at least one of the processing unit 1, the measuring unit 2, and the stage unit 3 to process the workpiece W.

[0068] The machining control information may include machining path information. The machining path information may include information about a tool path, which is a movement trajectory of the irradiation area of ​​the machining light EL on the workpiece W. As described above, the irradiation area of ​​the machining light EL on the workpiece W moves when the head drive system 13 moves the machining head 12 and / or the stage drive system 33 moves the stage 32. For this reason, the machining path information may be considered to be equivalent to information about the movement trajectory of at least one of the machining head 12 and the stage 32 (workpiece W). In other words, the machining path information may be considered to be equivalent to information for moving at least one of the machining head 12 and the stage 32 (workpiece W). When at least one of the machining head 12 and the stage 32 moves, the positional relationship between the machining head 12 and the stage 32 (workpiece W) changes. For this reason, the machining path information may be considered to be equivalent to information for changing the positional relationship between the machining head 12 and the stage 32 (workpiece W).

[0069] The work information includes information regarding the shape, position, and size of the workpiece W. Therefore, the machining path information may include information for moving at least one of the machining head 12 and the stage 32 in accordance with at least one of the shape, position, and size of the workpiece W. For example, as shown in Fig. 8 which shows the movement trajectory of the machining head 12 moving relatively to the workpiece W based on the machining path information, the machining path information may include information for moving the machining head 12 relatively along a movement trajectory parallel to the workpiece W (for example, to the surface of the workpiece W).

[0070] Generating the processing control information may include correcting the processing control information already generated. For example, if the shape of the workpiece W assumed by the already generated processing control information is different from the shape of the workpiece W indicated by the workpiece information, the control device 4 may correct the already generated processing control information so that appropriate processing control information according to the shape of the workpiece W indicated by the workpiece information is generated. For example, if the size of the workpiece W assumed by the already generated processing control information is different from the size of the workpiece W indicated by the workpiece information, the control device 4 may correct the already generated processing control information so that appropriate processing control information according to the size of the workpiece W indicated by the workpiece information is generated. For example, if the position of the workpiece W assumed by the already generated processing control information is different from the position of the workpiece W indicated by the workpiece information, the control device 4 may correct the already generated processing control information so that appropriate processing control information according to the position of the workpiece W indicated by the workpiece information is generated.

[0071] As an example, FIG. 9(a) shows a movement trajectory of the machining head 12 based on machining path information for relatively moving the machining head 12 along the surface of the workpiece W in order to machine the workpiece W having a flat surface. Then, an example will be described in which, under a situation in which machining path information for moving the machining head 12 as shown in FIG. 9(a) has already been generated, workpiece information indicating that the surface of the workpiece W is curved (i.e., the shape of the surface of the workpiece W is different from the expected shape) is generated as shown in FIG. 9(b). In this case, when the machining head 12 moves relative to the workpiece W based on the already generated machining path information, the machining head 12 cannot move along a movement trajectory parallel to the surface of the workpiece W as shown in FIG. 9(b). Therefore, the control device 4 may correct the already generated machining path information so that machining path information for relatively moving the machining head 12 along a movement trajectory parallel to the surface of the workpiece W, which is a curved surface, is generated as shown in FIG. 9(c).

[0072] As an example, FIG. 10(a) shows a movement trajectory of the machining head 12 based on machining path information for relatively moving the machining head 12 along the surface of the workpiece W in order to machine the workpiece W whose surface is parallel to the XY plane. Then, an example will be described in which, under a situation in which machining path information for moving the machining head 12 as shown in FIG. 10(a) has already been generated, workpiece information indicating that the surface of the workpiece W is inclined with respect to the XY plane (that is, the position (posture) of the workpiece W is different from the expected position (posture)) is generated as shown in FIG. 10(b). In this case, when the machining head 12 moves with respect to the workpiece W based on the already generated machining path information, the machining head 12 cannot move along a movement trajectory parallel to the surface of the workpiece W as shown in FIG. 10(b). Therefore, the control device 4 may correct the already generated machining path information so that it becomes machining path information for relatively moving the machining head 12 along a movement trajectory parallel to the surface of the workpiece W that is inclined with respect to the XY plane as shown in FIG. 10(c).

[0073] In the above description, the control device 4 corrects the processing control information so that the processing head 12 moves relatively to the workpiece W along a desired movement trajectory. However, in addition to or instead of correcting the processing control information, the control device 4 may correct information regarding the position of the workpiece W so that the processing head 12 moves relatively to the workpiece W along a desired movement trajectory. In short, in a situation where a second object (e.g., the processing head 12) moves relatively to a first object (e.g., the workpiece W) serving as a reference, the control device 4 may correct at least one of the information regarding the first object and the information regarding the second object so that the second object moves relatively to the first object along a desired movement trajectory.

[0074] The control device 4 may correct (or generate) the processing control information using a part of the work information. Specifically, as described above, the work information is generated based on the work measurement information and the model information. Here, the work measurement information is information obtained by actually measuring the first region W1 of the work W. Therefore, information on the shape (further, position and size) of the first region W1 included in the work information is assumed to be more reliable than information on the shape (further, position and size) of the second region W2 included in the work information and generated based on the model information. Therefore, the control device 4 may correct (or generate) the processing control information using information on the state of the first region W1 (i.e., at least one of the shape, position and size) from the work information.

[0075] 4 again, the control device 4 then controls at least one of the machining unit 1, the measuring unit 2, and the stage unit 3 to machine the workpiece W based on the machining control information generated in step S15 (step S16). That is, the machining system SYSa starts machining the workpiece W. Therefore, in the first machining operation, it can be said that the measuring device 212 measures the shape of the workpiece W before the machining unit 1 starts machining the workpiece W. It can be said that the control device 4 generates the workpiece information before the machining unit 1 starts machining the workpiece W. Note that since the machining control information is generated based on the workpiece measurement information and the model information, it can be considered that the control device 4 controls at least one of the machining unit 1, the measuring unit 2, and the stage unit 3 to machine the workpiece W based on the workpiece measurement information and the model information.

[0076] Here, as described above, the work information includes information on the state of the first region W1 indicated by the work measurement information and information on the state of the second region W2 indicated by the result of the alignment process. In this case, the control device 4 may be considered to control at least one of the machining unit 1, the measurement unit 2, and the stage unit 3 to machine the first region W1 of the work W based on the information on the state of the first region W1 in the work information. In other words, the control device 4 may be considered to control at least one of the machining unit 1, the measurement unit 2, and the stage unit 3 to machine the first region W1 of the work W based on the work measurement information. In other words, the first region W1 may be considered to be machined using the work measurement information. Similarly, the control device 4 may be considered to control at least one of the machining unit 1, the measurement unit 2, and the stage unit 3 to machine the second region W2 of the work W based on the information on the state of the second region W2 in the work information. In other words, the control device 4 may be considered to control at least one of the machining unit 1, the measuring unit 2, and the stage unit 3 to machine the second region W2 of the workpiece W using at least a part of the model information (more specifically, using a result of the alignment process performed using at least a part of the model information). In other words, the second region W2 may be considered to be machined using the model information.

[0077] Thereafter, after the processing of the workpiece W is completed, at least one of the measuring devices 211 and 212 measures the processed workpiece W (step S17). The control device 4 may determine whether or not the workpiece W has been properly processed based on the measurement result (i.e., workpiece measurement information) of at least one of the measuring devices 211 and 212. In other words, the control device 4 may determine whether or not the processing quality of the workpiece W is proper. However, the operation of step S17 does not have to be performed.

[0078] By performing the first machining operation described above, even if a part of the workpiece W is not included in the measurement field of view of the measuring device 212, the control device 4 can generate workpiece information including information on the state of the part of the workpiece W not included in the measurement field of view of the measuring device 212 on the stage 32. Therefore, the machining system SYSa can appropriately machine the workpiece W based on the workpiece information. In particular, the machining system SYSa does not need to change the positional relationship between the measuring device 212 and the workpiece W until the entire shape, etc. of the workpiece W is measured by the measuring device 212, and then repeat the operation of measuring the shape, etc. of at least a part of the workpiece W using the measuring device 212. Therefore, the machining system SYSa can appropriately machine the workpiece W without deteriorating the throughput related to the machining of the workpiece W.

[0079] In the first machining operation, at least one of the measuring devices 211 and 212 may measure the shape of a machined portion of the workpiece W that is machined by the machining unit 1. On the other hand, at least one of the measuring devices 211 and 212 may not need to measure the shape of a non-machined portion of the workpiece W that is not machined by the machining unit 1. In this case, information on the shape of the machined portion may be obtained from the workpiece measurement information, and information on the shape of the non-machined portion may be obtained from the model information.

[0080] In addition, in the first machining operation, measurement portions of the workpiece W whose shape is measured by at least one of the measuring devices 211 and 212, and non-measurement portions of the workpiece W whose shape is not measured by at least one of the measuring devices 211 and 212 may be specified in advance by the user.

[0081] (1-2-1-2) 2nd machining operation Next, the second processing operation will be described with reference to Fig. 11. Fig. 11 is a flowchart showing the flow of the second processing operation. Note that, in the following, operations that have already been described will be given the same step numbers, and detailed descriptions thereof will be omitted.

[0082] As shown in FIG. 11, in the second machining operation, as in the first machining operation, the workpiece W is placed (step S11), and the machining system SYSa corrects a placement error of the workpiece W (step S12).

[0083] Thereafter, the measuring device 212 measures the shape of at least a portion of the workpiece W (step S231). Thereafter, the measuring device 211 measures the shape of at least a portion of the workpiece W (step S232). That is, in the second embodiment, both the measuring devices 211 and 212 measure the shape of at least a portion of the workpiece W. Note that the operations of steps S231 and S232 may be the same as the operation of step S13 in FIG. 4 described above.

[0084] The measuring device 211 may measure the shape of a measured portion of the workpiece W whose shape has been measured by the measuring device 212 (for example, at least a part of the first region W1 described above). For example, when the difference between the shape of the measured portion indicated by the workpiece measurement information including the measurement result of the measuring device 212 and the shape of the measured portion indicated by the model information (hereinafter referred to as "shape difference") is greater than a predetermined allowable threshold value TH2, there is a possibility that the reliability of either the workpiece measurement information or the model information is low. In this case, in the first embodiment, in principle, the workpiece measurement information is considered to be more reliable than the model information. However, in some cases, there is a possibility that the workpiece measurement information is less reliable than the model information. Therefore, in the second embodiment, when the shape difference regarding the measurement result of the measuring device 212 is greater than the allowable threshold value TH2, the measuring device 211, which has a higher measurement accuracy than the measuring device 212, may measure the shape of the measured portion. In this case, the control device 4 may generate the workpiece information using the workpiece measurement information indicating the measurement result of the measuring device 211 in addition to or instead of the workpiece measurement information indicating the measurement result of the measuring device 212. On the other hand, if the shape difference regarding the measurement result of the measuring device 212 is smaller than the allowable threshold TH2, the reliability of the workpiece measurement information is assumed to be high. In this case, the measuring device 211 does not need to measure the shape of the measured portion. Note that even if the shape difference regarding the measurement result of the measuring device 212 is larger than the allowable threshold TH2, the measuring device 211 may not measure the shape of the measured portion.

[0085] The shape difference may mean a difference (effectively a position difference) between the shape of the measured portion (e.g., the first region W1) indicated by the work measurement information and the shape of a portion of the work model WM indicated by the model information that corresponds to the measured portion. In order to calculate the shape difference, the control device 4 may perform the above-mentioned alignment process and calculate a difference between the shape of the measured portion (e.g., the first region W1) indicated by the work measurement information and the shape of a portion of the work model WM that corresponds to the measured portion after the alignment process has been performed.

[0086] Such a shape difference can be said to be information indicating the manufacturing accuracy (in other words, the manufacturing quality) of the workpiece W. This is because if the manufacturing accuracy is high, the shape difference approaches zero. For this reason, the control device 4 may store information regarding the shape difference as log information. The log information may be used to evaluate the manufacturing accuracy of the workpiece W.

[0087] In addition, the allowable threshold value TH2 used in the second machining operation may be set to a desired value that can distinguish between a state in which the shape difference is so large that it cannot be ignored in order to achieve the objective of being able to properly machine the workpiece W, and a state in which the shape difference is so small that it can be ignored without causing any problems in order to achieve the objective of being able to properly machine the workpiece W.

[0088] A plurality of tolerance thresholds TH2 having different values ​​may be used. For example, a first tolerance threshold TH2 to be compared with a shape difference related to a measurement result of a processed portion of the workpiece W that is processed by the processing unit 1, and a second tolerance threshold TH2 to be compared with a shape difference related to a measurement result of a non-processed portion of the workpiece W that is not processed by the processing unit 1 may be used. In this case, the first tolerance threshold TH2 may be a value different from the second tolerance threshold TH2. The first tolerance threshold TH2 may be a value larger than the second tolerance threshold TH2.

[0089] Furthermore, a high-precision measurement portion of the workpiece W whose shape is measured by the measuring device 211 having a relatively high measurement accuracy and a low-precision measurement portion of the workpiece W whose shape is measured by the measuring device 212 having a relatively low measurement accuracy may be specified in advance by the user. The shape of the processed portion of the workpiece W that is processed by the processing unit 1 may be measured by the measuring device 212 having a relatively low measurement accuracy, and the shape of the non-processed portion of the workpiece W that is not processed by the processing unit 1 may be measured by the measuring device 212 having a relatively low measurement accuracy.

[0090] The measuring device 211 may measure the state of a part of the workpiece W that is extracted as a measurement feature point used when performing the above-mentioned pattern matching. In this case, since the state of the measurement feature point is measured with higher accuracy, alignment (e.g., pattern matching) between the workpiece model WM indicated by the model information and the workpiece W indicated by the workpiece measurement information is performed with higher accuracy.

[0091] As described above, when at least a part of the measurement field of view of the measuring device 211 is not included in at least a part of the measurement field of view of the measuring device 212, a part of the workpiece W that is not included in the measurement field of view of the measuring device 212 may be included in the measurement field of view of the measuring device 211. Alternatively, when the size of the measurement field of view of the measuring device 211 is larger than the measurement field of view of the measuring device 212, a part of the workpiece W that is not included in the measurement field of view of the measuring device 212 may be included in the measurement field of view of the measuring device 211. For example, when the measuring device 211 is a measuring device that can move the measurement field of view, a part of the workpiece W that is not included in the measurement field of view of the measuring device 212 may be included in the measurement field of view of the measuring device 211. In this case, the measuring device 211 may measure the shape of an unmeasured part of the workpiece W whose shape has not been measured by the measuring device 212.

[0092] Thereafter, in the second machining operation, as in the first machining operation, the control device 4 generates work information using both the model information and the work measurement information (step S14), generates machining control information based on the work information (step S15), and controls at least one of the machining unit 1, the measurement unit 2 and the stage unit 3 to machine the work W based on the machining control information (step S16).

[0093] By performing the second processing operation described above, the processing system SYSa can obtain the same effects as those that can be obtained by performing the first processing operation described above.

[0094] (1-2-1-3) Third machining operation Next, the third processing operation will be described with reference to Fig. 12. Fig. 12 is a flowchart showing the flow of the third processing operation.

[0095] As shown in FIG. 12, in the third machining operation, as in the first machining operation, the workpiece W is placed (step S11), the machining system SYSa corrects the placement error of the workpiece W (step S12), and the measuring device 212 measures the shape of the workpiece W (step S13).

[0096] Thereafter, the control device 4 determines whether or not the difference (i.e., shape difference) between the shape of the workpiece W indicated by the workpiece measurement information (specifically, the shape of the first region W1) and the shape of the workpiece W indicated by the model information is greater than a predetermined allowable threshold value TH3 (step S31). Note that the allowable threshold value TH3 used in the third machining operation may be the same as or different from the allowable threshold value TH2 used in the second machining operation. The allowable threshold value TH3 may be set to a desired value determined from the same viewpoint as the allowable threshold value TH2.

[0097] If it is determined in step S31 that the shape difference is greater than the allowable threshold value TH3 (step S31: Yes), it is assumed that there is a possibility that the reliability of either the workpiece measurement information or the model information is low. In this case, in the third machining operation, as in the first embodiment, it is assumed that, in principle, the workpiece measurement information is more reliable than the model information. In other words, the control device 4 generates the workpiece information without using the model information that is assumed to be unreliable.

[0098] In order to generate work information without using model information, the measuring device 212 measures a plurality of portions of the work W in sequence (step S32). Specifically, the control device 4 changes the positional relationship between the measuring device 212 and the work W so that at least a part of an unmeasured portion (e.g., the second region W2) of the work W whose shape has not yet been measured by the measuring device 212 is newly included in the measurement field of the measuring device 212, and then repeats the operation of measuring the shape, etc. of at least a part of the unmeasured portion using the measuring device 212. For example, FIG. 13(a) shows the measuring device 212 that measures the shape of the work W when the positional relationship between the measuring device 212 and the work W is in a first positional relationship. When the positional relationship between the measuring device 212 and the work W is in the first positional relationship, the first region W1 of the work W is included in the measurement field of the measuring device 212, while the second region W2 of the work W is not included in the measurement field of the measuring device 212. FIG. 13(b) shows the measuring device 212 measuring the shape of the workpiece W after the positional relationship between the measuring device 212 and the workpiece W is changed from the first positional relationship to the second positional relationship. As shown in FIG. 13(a) and FIG. 13(b), when the positional relationship between the measuring device 212 and the workpiece W is changed, at least a part of the second region W2 of the workpiece W that was not included in the measurement field of the measuring device 212 is newly included in the measurement field of the measuring device 212. For example, a third region W3 that is a part of the second region W2 of the workpiece W that was not included in the measurement field of the measuring device 212 before the positional relationship between the measuring device 212 and the workpiece W was changed is included in the measurement field of the measuring device 212 before the positional relationship between the measuring device 212 and the workpiece W is changed. As a result, the measuring device 212 can measure the shape of the third region W3.

[0099] The control device 4 changes the positional relationship between the measuring device 212 and the workpiece W until the entire workpiece W is included in the measurement field of view of the measuring device 212 (i.e., the entire shape, etc. of the workpiece W is measured by the measuring device 212), and then repeats the operation of measuring the shape, etc. of at least a portion of the workpiece W using the measuring device 212. However, the control device 4 may also change the positional relationship between the measuring device 212 and the workpiece W until a certain proportion of the workpiece W is included in the measurement field of view of the measuring device 212 (i.e., the shape, etc. of a certain proportion of the workpiece W is measured by the measuring device 212), and then repeats the operation of measuring the shape, etc. of at least a portion of the workpiece W using the measuring device 212.

[0100] By repeating the above-described operations, the control device 4 can acquire work measurement information indicating the measurement results of multiple portions of the workpiece W. The control device 4 uses the acquired work measurement information as workpiece information.

[0101] On the other hand, if it is determined in step S31 that the shape difference is not greater than the allowable threshold value TH3, it is assumed that the reliability of both the workpiece measurement information and the model information is high. Therefore, in this case, also in the third machining operation, similarly to the first machining operation, the control device 4 generates workpiece information using both the model information and the workpiece measurement information (step S14).

[0102] Thereafter, in the third machining operation, as in the first machining operation, the control device 4 generates machining control information based on the work information (step S15), and controls at least one of the machining unit 1, the measurement unit 2, and the stage unit 3 to machine the work W based on the machining control information (step S16).

[0103] By performing the third machining operation described above, the machining system SYSa can obtain the same effect as that obtained by performing the first machining operation described above. Furthermore, in the third machining operation, in a situation where the reliability of the model information is assumed to be low, the machining system SYSa changes the positional relationship between the measuring device 212 and the workpiece W so that at least a part of the unmeasured part of the workpiece W is included in the measurement field of the measuring device 212, and then repeats the operation of measuring the shape, etc. of at least a part of the unmeasured part using the measuring device 212. As a result, the machining system SYSa can prevent a deterioration in the machining quality of the workpiece W caused by machining the workpiece W based on the unreliable model information. That is, in the third machining operation, in a situation where the reliability of the model information is assumed to be low, the machining system SYSa prioritizes preventing a deterioration in the machining quality of the workpiece W caused by the unreliable model information over preventing a deterioration in the throughput related to the machining of the workpiece W. As a result, the machining system SYSa can machine the workpiece W with high precision. On the other hand, in a situation where the reliability of the model information is not expected to be low, the machining system SYSa prioritizes preventing a deterioration in the throughput regarding the machining of the workpiece W, since there is a low possibility that the machining quality of the workpiece W will be degraded due to unreliable model information. As a result, the machining system SYSa can machine the workpiece W with high precision while preventing a deterioration in the throughput regarding the machining of the workpiece W.

[0104] In the above description, when the shape difference is greater than the allowable threshold value TH3, the measuring device 212 measures the multiple parts of the workpiece W in sequence, and the control device 4 uses the workpiece measurement information indicating the measurement results of the multiple parts of the workpiece W as the workpiece information. Here, the workpiece information corresponding to the workpiece measurement information indicating the measurement results of the multiple parts (typically the entire workpiece W) should be more reliable than the workpiece measurement information indicating the measurement results of a part of the workpiece W (for example, only the first region W1) and the workpiece information generated based on the model information. In other words, the workpiece information corresponding to the workpiece measurement information indicating the measurement results of the multiple parts of the workpiece W should indicate the state of the workpiece W on the stage 32 with higher accuracy than the workpiece measurement information indicating the measurement results of a part of the workpiece W and the workpiece information generated based on the model information. Therefore, when high-precision machining of the workpiece W is prioritized, the measuring device 212 may measure the multiple parts of the workpiece W in sequence, and the control device 4 may use the workpiece measurement information indicating the measurement results of the multiple parts of the workpiece W as the workpiece information. On the other hand, as described above, when the measuring device 212 measures multiple portions of the workpiece W in sequence, the throughput for machining the workpiece W deteriorates. Therefore, when priority is given to preventing deterioration of the throughput for machining the workpiece W, the control device 4 may generate the workpiece information using both the model information and the workpiece measurement information. In other words, regardless of the magnitude relationship between the shape difference and the allowable threshold value TH3, the operation mode of the machining system SYSa may be switched between a high-precision machining mode in which the workpiece W is machined with high precision by using workpiece measurement information indicating the measurement results of multiple portions of the workpiece W as workpiece information, and a throughput improvement mode in which priority is given to the throughput for machining the workpiece W by generating workpiece information using both the model information and the workpiece measurement information.

[0105] Also, in the above description, the measuring device 212 repeats the operation of measuring the shape of at least a part of the workpiece W until the entire shape of the workpiece W is measured. However, the measuring device 212 may repeat the operation of measuring the shape of at least a part of the workpiece W until the shape of the processing portion of the workpiece W that is processed (i.e., is to be processed) by the processing unit 1 is measured. In other words, the shape of the non-processing portion of the workpiece W that is not processed (i.e., is not to be processed) by the processing unit 1 does not need to be measured.

[0106] (1-2-1-4) 4th machining operation Next, the fourth machining operation will be described with reference to Fig. 14. Fig. 14 is a flowchart showing the flow of the fourth machining operation.

[0107] As shown in FIG. 14, in the fourth machining operation, as in the first machining operation, the workpiece W is placed (step S11), the machining system SYSa corrects the placement error of the workpiece W (step S12), the measuring device 212 measures the shape of the workpiece W (step S13), the control device 4 generates workpiece information using both the workpiece measurement information and the model information (step S14), the control device 4 generates processing control information based on the workpiece information (step S15), and the control device 4 controls at least one of the machining unit 1, the measuring unit 2 and the stage unit 3 to machine the workpiece W based on the processing control information (step S16).

[0108] After the machining unit 1 starts machining the workpiece W, the measuring device 212 measures the shape of at least a part of the workpiece W (step S41). That is, in the fourth machining operation, the measuring device 212 measures the shape of at least a part of the workpiece W during at least a part of the machining period after the machining unit 1 starts machining the workpiece W (step S41). Note that the operation of step S41 may be the same as the operation of step S13, and therefore a detailed description thereof will be omitted. Note that, in step S41 as well, the measuring device 211 may measure the shape of at least a part of the workpiece W instead of the measuring device 212, as in step S13.

[0109] After the machining unit 1 starts machining the workpiece W, the positional relationship between the workpiece W and the measuring device 212 may change. The measuring device 212 may measure the shape of at least a part of the workpiece W when the positional relationship between the workpiece W and the measuring device 212 changes after the machining unit 1 starts machining the workpiece W. In this case, as described above with reference to FIG. 13(a) and FIG. 13(b), at least a part (e.g., the third area W3) of the second area W2 of the workpiece W that was not included in the measurement field of the measuring device 212 before the machining unit 1 starts machining the workpiece W is newly included in the measurement field of the measuring device 212 after the machining unit 1 starts machining the workpiece W. As a result, the measuring device 212 can measure the shape of at least a part (e.g., the third area W3) of the second area W2 of the workpiece W, the shape of which could not be measured before the machining unit 1 starts machining the workpiece W, after the machining unit 1 starts machining the workpiece W. In other words, after the machining unit 1 starts machining the workpiece W, the control device 4 can acquire workpiece measurement information indicating the measurement results of the shape of at least a part of the second region W2 (e.g., the third region W3) that could not be acquired before the machining unit 1 started machining the workpiece W. In the following explanation of the fourth machining operation, an example will be described in which in step S41, the measuring device 212 measures the shape of the third region W3, and the control device 4 acquires workpiece measurement information indicating the measurement results of the shape of the third region W3.

[0110] Thereafter, the control device 4 determines whether or not the difference (i.e., shape difference) between the shape of the workpiece W indicated by the workpiece measurement information acquired in step S41 (i.e., the shape of the third region W3) and the shape of the workpiece W indicated by the model information (i.e., the shape of the third region W3) is greater than a predetermined allowable threshold value TH4 (step S42). The allowable threshold value TH4 used in the fourth machining operation may be the same as or different from at least one of the allowable threshold value TH2 used in the second machining operation and the allowable threshold value TH3 used in the third machining operation. The allowable threshold value TH4 may be set to a desired value determined from the same viewpoint as at least one of the allowable threshold values ​​TH2 and TH3.

[0111] If it is determined in step S42 that the shape difference is greater than the allowable threshold value TH4 (step S42: Yes), it is assumed that the shape of the third region W3 indicated by the model information is not accurate. Therefore, it is assumed that the work information generated before the machining unit 1 starts machining the workpiece W does not accurately indicate the state of the third region W3. In this case, the control device 4 regenerates the work information based on the work measurement information indicating the measurement result of the shape of the third region W3 (step S43). Specifically, the control device 4 generates the work information based on the work measurement information and model information indicating the measurement result of the shapes of the first region W1 and the third region W3, using a method similar to the method of generating the machining control information based on the work measurement information and model information indicating the measurement result of the shape of the first region W1. In other words, the control device 4 may regenerate work information including information regarding the shape, position and size of the work W by combining information regarding the shape, position and size of each of the first region W1 and the third region W3 of the work W contained in the work measurement information with information regarding the shape, position and size of the portion of the work model WM excluding the first region W1 and the third region W3.

[0112] Thereafter, the control device 4 corrects the processing control information based on the workpiece information regenerated in step S43 (step S44). Note that the control device 4 may directly correct the processing control information based on the workpiece measurement information indicating the measurement result of the shape of the third region W3 without regenerating the workpiece information in step S43.

[0113] On the other hand, if the result of the determination in step S42 is that the shape difference is smaller than the allowable threshold value TH4 (step S42: No), the shape of the third region W3 indicated by the model information is assumed to be accurate. Therefore, it is assumed that the workpiece information generated before the machining unit 1 starts machining the workpiece W accurately indicates the state of the third region W3. In this case, the control device 4 does not need to regenerate the workpiece information.

[0114] Thereafter, the machining system SYSa repeats the operations of step S16 and steps S41 to S44 (step S45) until the machining of the workpiece W is completed. After the machining of the workpiece W is completed, at least one of the measuring devices 211 and 212 may measure the machined workpiece W (step S17).

[0115] By performing the fourth machining operation described above, the machining system SYSa can obtain the same effect as that obtained by performing the first machining operation described above. Furthermore, in the fourth machining operation, when the positional relationship between the workpiece W and the measuring device 212 changes after the machining unit 1 starts machining the workpiece W, the machining system SYSa can use the measuring device 212 to measure the shape of the third region W3 of the workpiece W, the shape of which could not be measured before the machining unit 1 starts machining the workpiece W. Therefore, in the fourth machining operation, the proportion of the unmeasured portion of the workpiece W, the shape of which has never been measured by the measuring device 212, to the entire workpiece W gradually decreases. As a result, the proportion of the information supplemented based on the model information (i.e., information on the state of the unmeasured portion) to the workpiece information gradually decreases. In other words, the state of the workpiece W indicated by the workpiece information gradually becomes more accurate. Therefore, the machining system SYSa can machine the workpiece W with high accuracy compared to the case where the workpiece information is not regenerated after the machining unit 1 starts machining the workpiece W.

[0116] (1-2-1-5) 5th machining operation Next, the fifth processing operation will be described with reference to Fig. 15. Fig. 15 is a flowchart showing the flow of the fifth processing operation.

[0117] As shown in FIG. 15, in the fifth machining operation, as in the fourth machining operation, the workpiece W is placed (step S11), the machining system SYSa corrects the placement error of the workpiece W (step S12), the measuring device 212 measures the shape of the workpiece W (step S13), the control device 4 generates workpiece information using both the workpiece measurement information and the model information (step S14), the control device 4 generates machining control information based on the workpiece information (step S15), and the control device 4 controls at least one of the machining unit 1, the measuring unit 2 and the stage unit 3 to machine the workpiece W based on the machining control information (step S16).

[0118] After the machining unit 1 starts machining the workpiece W, the measuring device 212 measures the shape of at least a part of the workpiece W (step S51). That is, in the fifth machining operation, similarly to the fourth machining operation, the measuring device 212 measures the shape of at least a part of the workpiece W during at least a part of the machining period after the machining unit 1 starts machining the workpiece W (step S51). Note that the operation of step S53 may be the same as the operation of step S13, and therefore a detailed description thereof will be omitted.

[0119] Thereafter, in the fifth machining operation, similarly to the fourth machining operation, the control device 4 determines whether or not the shape difference is greater than the allowable threshold value TH4 (step S42).

[0120] As a result of the judgment in step S42, if it is judged that the shape difference is larger than the allowable threshold value TH4 (step S42: No), in the fifth machining operation, similarly to the fourth machining operation, the control device 4 regenerates the work information based on the work measurement information acquired after the machining unit 1 starts machining the workpiece W (i.e., the work measurement information indicating the measurement result of the shape of the third region W3) (step S43). However, in the fifth machining operation, the measuring device 211, which has a higher measurement accuracy than the measuring device 212, measures the shape of the third region W3 (i.e., a part of the workpiece W whose shape could not be measured before the machining unit 1 starts machining the workpiece W) again (step S52). Thereafter, the control device 4 regenerates the work information based on the work measurement information acquired by the measuring device 211 measuring the third region W3 (step S43).

[0121] Thereafter, in the fifth machining operation, similarly to the fourth machining operation, the control device 4 corrects the machining control information based on the workpiece information regenerated in step S43 (step S44). Also, as a result of the determination in step S42, if it is determined that the shape difference is smaller than the allowable threshold value TH4 (step S42: No), the measuring device 211 does not need to measure the third region W3, and the control device 4 does not need to regenerate the workpiece information.

[0122] By performing the fifth machining operation described above, the machining system SYSa can obtain the same effect as that obtainable by performing the fifth machining operation described above. Furthermore, in the fifth machining operation, the control device 4 regenerates the work information based on the work measurement information acquired by the measuring device 211, which has higher measurement accuracy than the measuring device 212, measuring the third region W3. Therefore, compared with the work information regenerated based on the work measurement information acquired by the measuring device 212 measuring the third region W3, the work information regenerated in the fifth machining operation is likely to show the state of the work W with higher accuracy. Therefore, the machining system SYSa can machine the work W with high accuracy.

[0123] (1-2-1-6) 6th machining operation Next, the sixth processing operation will be described with reference to Fig. 16. Fig. 16 is a flowchart showing the flow of the sixth processing operation.

[0124] The sixth machining operation is an operation for machining a plurality of workpieces W having the same shape and size. Hereinafter, the sixth machining operation performed for machining N workpieces W#1 to W#N (N is a constant indicating an integer equal to or greater than 2) having the same shape and size will be described.

[0125] As shown in Fig. 16, the machining system SYSa performs at least one of the first to fifth machining operations described above to machine the workpiece W#1 to be machined first (step S60). When the workpiece W#1 is machined by performing the third machining operation, the machining system SYSa may measure multiple portions of the workpiece W in sequence using the measuring device 212 without performing the determination operation of step S31 in Fig. 12 (step S32 in Fig. 12). Then, after the processing of the workpiece W is completed, the workpiece W#2 to be processed next is placed on the stage 32 (step S61). Note that the operation of step S61 may be the same as the operation of step S11 in FIG. 4 described above, and therefore a detailed description thereof will be omitted.

[0126] Thereafter, the control device 4 judges whether or not the difference (i.e., shape difference) between the shape of the workpiece W#1 indicated by the workpiece measurement information acquired for machining the workpiece W#1 and the shape of the workpiece W#1 indicated by the model information is greater than a predetermined allowable threshold value TH5 (step S62). The allowable threshold value TH5 used in the sixth machining operation may be the same as or different from at least one of the allowable threshold value TH2 used in the second machining operation, the allowable threshold value TH3 used in the third machining operation, and the allowable threshold value TH4 used in the fourth machining operation. The allowable threshold value TH5 may be set to a desired value determined from the same viewpoint as at least one of the allowable threshold values ​​TH2 to TH4.

[0127] As a result of the judgment in step S62, when it is judged that the shape difference is smaller than the allowable threshold value TH5 (step S62: No), it is assumed that the shape of the actual workpiece W#1 is substantially the same as the ideal or designed shape of the workpiece W#1 indicated by the model information. In other words, it is assumed that the workpiece W#1 is manufactured with high precision so that the shape of the workpiece W#1 is the ideal or designed shape. In this case, it is assumed that the workpieces W#2 to W#N are also manufactured with high precision so that the shapes of the workpieces W#2 to W#N are each the ideal or designed shape. For this reason, the workpiece information generated to machine the workpiece W#1 can be regarded as indicating not only the state (shape, etc.) of the workpiece W#1 but also the state (shape, etc.) of each of the workpieces W#2 to W#N. As a result, the machining control information generated based on the workpiece information generated to machine the workpiece W#1 can be used not only as information for machining the workpiece W#1 but also as information for machining each of the workpieces W#2 to W#N. Specifically, for example, the machining path information generated to machine the workpiece W#1 can be used not only as information indicating the movement trajectory of the machining head 12 relative to the workpiece W#1, but also as information indicating the movement trajectory of the machining head 12 relative to each of the workpieces W#2 to W#N. Therefore, in this case, the control device 4 uses the machining control information generated to machine the workpiece W#1 as the machining control information for machining each of the workpieces W#2 to W#N, instead of newly generating the machining control information for machining each of the workpieces W#2 to W#N. In other words, the machining system SYSa does not need to perform the operations of steps S63 to S65 described later for generating the machining control information for machining each of the workpieces W#2 to W#N.

[0128] On the other hand, if it is determined in step S62 that the shape difference is greater than the allowable threshold value TH5 (step S62: Yes), it is assumed that the shape of the actual workpiece W#1 is different from the ideal or designed shape of the workpiece W indicated by the model information. In other words, it is assumed that the shape of the workpiece W#1 is not the ideal or designed shape because the manufacturing accuracy of the workpiece W#1 is low. In this case, the manufacturing accuracy of at least one of the workpieces W#2 to W#N may also be low. For this reason, as described above, the workpiece information generated to machine the workpiece W#1 may not indicate the respective states (shapes, etc.) of the workpieces W#2 to W#N. As a result, the processing control information generated based on the workpiece information generated to machine the workpiece W#1 may not be usable as information for processing each of the workpieces W#2 to W#N. Therefore, in this case, the control device 4 newly generates processing control information for processing each of the workpieces W#2 to W#N. Specifically, the measuring device 212 measures the shape of the workpiece W#2 (step S63), the control device 4 generates workpiece information using both the workpiece measurement information and the model information (step S64), and the control device 4 generates processing control information based on the workpiece information (step S65). Note that the operations from step S63 to S65 may be the same as the operations from step S13 to S15 in Fig. 4 described above, respectively, and therefore detailed description thereof will be omitted.

[0129] In step S63, the measuring device 212 may selectively measure the shape of a portion of the workpiece W#2 where the shape difference is relatively large. For example, the control device 4 may specify a portion of the workpiece W#2 of interest where the difference from the shape of the workpiece W indicated by the model information is relatively large based on the workpiece measurement information and the model information acquired for machining the workpiece W#1. The portion of interest may include a portion of the workpiece W#1 corresponding to a portion of the workpiece W#1 where the difference from the shape of the workpiece W indicated by the model information is relatively large. Thereafter, the measuring device 212 may selectively measure the shape of the portion of interest.

[0130] Thereafter, the control device 4 controls at least one of the processing unit 1, the measuring unit 2, and the stage unit 3 to process the workpiece W#2 based on the processing control information (step S66). After the processing of the workpiece W#2 is completed, at least one of the measuring devices 211 and 212 may measure the processed workpiece W#2 (step S67). Note that the operations from step S66 to S67 may be the same as the operations from step S16 to S17 in FIG. 4 described above, and therefore detailed description thereof will be omitted.

[0131] Thereafter, the operations from step S61 to step S67 are repeated until machining of a plurality of workpieces W (that is, N workpieces W#1 to W#N) is completed (step S68).

[0132] By performing the sixth machining operation described above, the machining system SYSa can obtain the same effects as those obtainable by performing the first machining operation described above. Furthermore, in the sixth machining operation, the control device 4 does not need to generate multiple pieces of work information corresponding to the multiple workpieces W respectively. The control device 4 does not need to generate multiple pieces of machining control information corresponding to the multiple workpieces W respectively. Therefore, the throughput of the machining of the workpieces W is improved compared to the case where multiple pieces of work information corresponding to the multiple workpieces W respectively are generated (and further, multiple pieces of machining control information corresponding to the multiple workpieces W respectively are generated).

[0133] (1-2-2) Measurement operation Next, the measurement operation will be described with reference to Fig. 17. Fig. 17 is a flowchart showing the flow of the measurement operation.

[0134] As shown in FIG. 17, in the measurement operation, as in the processing operation, the workpiece W is placed (step S11), the processing system SYSa corrects the placement error of the workpiece W (step S12), the measuring device 212 measures the shape of the workpiece W (step S13), and the control device 4 generates workpiece information using both the workpiece measurement information and the model information (step S14).

[0135] Thereafter, the control device 4 generates measurement control information (step S71). The measurement control information may include information used by the control device 4 to control at least one of the machining unit 1, the measuring unit 2, and the stage unit 3 to measure the workpiece W.

[0136] The measurement control information may include measurement path information. The measurement path information may be considered to be equivalent to information regarding the movement trajectory of at least one of the measurement head 21 and the stage 32 (workpiece W). In other words, the measurement path information may be considered to be equivalent to information for moving at least one of the measurement head 21 and the stage 32 (workpiece W). When at least one of the measurement head 21 and the stage 32 moves, the positional relationship between the measurement head 21 and the stage 32 (workpiece W) changes. For this reason, the measurement path information may be considered to be equivalent to information for changing the positional relationship between the measurement head 21 and the stage 32 (workpiece W).

[0137] The measurement path information is different from the machining path information including information for controlling the movement or position of the machining head 12 in that the measurement path information includes information for controlling the movement or position of the measurement head 21. Other features of the measurement path information may be the same as other features of the machining path information. Therefore, the control device 4 may generate the measurement control information in a manner similar to that for generating the machining path information (and further, the machining control information). For example, the control device 4 may generate the measurement control information including information for moving at least one of the measurement head 21 and the stage 32 in accordance with the state (shape, etc.) of the workpiece W. For example, when the state of the workpiece W assumed by the already generated measurement control information is different from the state of the workpiece W indicated by the workpiece information, the control device 4 may modify the already generated measurement control information so that appropriate measurement control information corresponding to the state of the workpiece W indicated by the workpiece information is generated.

[0138] As described above, the work information includes information on the state of the first region W1 measured by the measuring device 212 and information on the state of the second region W2 not measured by the measuring device 212. In this case, the control device 4 may generate measurement control information based on the work information (particularly, information on the state of the second region W2) so that at least one of the measuring devices 211 and 212 measures the shape of at least a part of the second region W2 not measured by the measuring device 212. For example, the control device 4 may generate measurement control information so that at least one of the measuring devices 211 and 212 measures the shape of the third region W3 (see FIG. 13(b)), which is at least a part of the second region W2 not measured by the measuring device 212.

[0139] Thereafter, the control device 4 controls at least one of the processing unit 1, the measuring unit 2, and the stage unit 3 so that at least one of the measuring devices 211 and 212 measures the shape of the workpiece W based on the measurement control information generated in step S71 (step S71). For example, the control device 4 may control at least one of the processing unit 1, the measuring unit 2, and the stage unit 3 so that at least one of the measuring devices 211 and 212 measures the shape of the third region W3 (see FIG. 13(b)), which is at least a part of the second region W2 not measured by the measuring device 212, based on the measurement control information. Note that when the measuring device 212 measures the shape of the first region W1 of the workpiece W in step S13, there is a possibility that both the measuring devices 211 and 212 cannot measure the shape of the third region W3 unless the positional relationship between the measuring head 21 and the workpiece W is changed. Therefore, in this case, the control device 4 may control at least one of the head driving system 22 and the stage driving system 33 based on the measurement control information so as to change the positional relationship between the measurement head 21 and the workpiece W until the third region W3 is included in the measurement field of view of at least one of the measuring devices 211 and 212. After the positional relationship between the measurement head 21 and the workpiece W is changed until the third region W3 is included in the measurement field of view of at least one of the measuring devices 211 and 212, at least one of the measuring devices 211 and 212 measures the shape of the third region W3.

[0140] The workpiece measurement information indicating the measurement results in steps S13 and S72 may be used to generate processing control information. In this case, the control device 4 may generate the processing control information based on the workpiece measurement information indicating the measurement results in steps S13 and S72, instead of generating the processing control information by performing a part of the above-mentioned first to sixth processing operations.

[0141] By performing the measurement operation described above, even if a part of the workpiece W is not included in the measurement field of view of the measuring device 212, the control device 4 can generate workpiece information including information on the state on the stage 32 of the part of the workpiece W that is not included in the measurement field of view of the measuring device 212. Therefore, the machining system SYSa can appropriately measure the workpiece W based on the workpiece information.

[0142] An example of a situation where such a measurement operation is performed is a situation where processing control information for processing the inside of an inner wall that defines a hole formed in the workpiece W is generated. In this case, at least one of the measuring devices 211 and 212 first measures the shape of at least a part of the workpiece W, and the control device 4 generates workpiece information using both the workpiece measurement information and the model information. Then, the control device 4 uses the generated workpiece information to generate measurement control information that the control device 4 uses to control at least one of the processing unit 1, the measurement unit 2, and the stage unit 3 to measure the shape of the hole formed in the workpiece W (for example, to measure the shape of the inner wall surrounding the hole). Then, based on the measurement control information, the control device 4 controls at least one of the processing unit 1, the measurement unit 2, and the stage unit 3 so that at least one of the measuring devices 211 and 212 measures the shape of the hole formed in the workpiece W. Then, the control device 4 uses the workpiece measurement information to generate processing control information that the control device 4 uses to control at least one of the processing unit 1, the measurement unit 2, and the stage unit 3 to process the inner wall that defines the hole formed in the workpiece W. Thereafter, the control device 4 controls at least one of the machining unit 1, the measuring unit 2, and the stage unit 3 so as to machine the inner wall that defines the hole formed in the workpiece W based on the machining control information.

[0143] In addition, the control device 4 may generate the measurement control information based on the work information generated before the machining unit 1 starts machining the workpiece W (i.e., the workpiece information generated in step S14) during the process of performing at least one of the first to third machining operations. That is, the control device 4 may generate the measurement control information based on the work information generated before the machining unit 1 starts machining the workpiece W during at least a part of the non-machining period before the machining unit 1 starts machining the workpiece W. This measurement control information may include information for controlling at least one of the machining unit 1, the measuring unit 2, and the stage unit 3 so as to measure the workpiece W during at least a part of the machining period after the machining unit 1 starts machining the workpiece W. This measurement control information may include information for controlling at least one of the machining unit 1, the measuring unit 2, and the stage unit 3 so as to measure the workpiece W during at least a part of the non-machining period before the machining unit 1 starts machining the workpiece W. This measurement control information may include information for controlling at least one of the machining unit 1, the measuring unit 2, and the stage unit 3 so as to measure the workpiece W during at least a part of the machining end period after the machining unit 1 finishes machining the workpiece W.

[0144] In addition, the control device 4 may generate measurement control information based on the work information regenerated after the machining unit 1 starts machining the workpiece W (i.e., the workpiece information regenerated in step S43) during the process of performing at least one of the fourth and fifth machining operations. That is, the control device 4 may generate measurement control information based on the work information regenerated after the machining unit 1 starts machining the workpiece W during at least a part of the machining period after the machining unit 1 starts machining the workpiece W. This measurement control information may include information for controlling at least one of the machining unit 1, the measuring unit 2, and the stage unit 3 so as to measure the workpiece W during at least a part of the machining period after the machining unit 1 starts machining the workpiece W. This measurement control information may include information for controlling at least one of the machining unit 1, the measuring unit 2, and the stage unit 3 so as to measure the workpiece W during at least a part of the machining end period after the machining unit 1 finishes machining the workpiece W.

[0145] Furthermore, when at least one of the measuring devices 211 and 212 measures multiple workpieces W having the same shape and size in sequence, the machining system SYSa may perform an operation similar to the sixth machining operation. Specifically, when it is determined that the shape difference is smaller than the allowable threshold value TH5, the control device 4 may use the measurement control information generated for measuring the workpiece W#1 as the measurement control information for measuring each of the workpieces W#2 to W#N, instead of newly generating measurement control information for measuring each of the workpieces W#2 to W#N.

[0146] (2) Machining system SYSb according to the second embodiment Next, a machining system SYS of a second embodiment (hereinafter, the machining system SYS of the second embodiment will be referred to as "machining system SYSb") will be described with reference to Fig. 18. Fig. 18 is a system configuration diagram showing the system configuration of the machining system SYSb of the second embodiment. Note that components that have already been described are given the same reference symbols, and detailed descriptions thereof will be omitted.

[0147] 18, the processing system SYSb of the second embodiment is different from the processing system SYSa of the first embodiment in that the processing system SYSb includes a display 6b. Other features of the processing system SYSb may be the same as other features of the processing system SYSa.

[0148] The display 6b is a display device capable of displaying a desired image under the control of the control device 4. In the second embodiment, the display 6b may display an image including information related to the workpiece W.

[0149] For example, as described above, the workpiece W includes a first region W1 whose shape has been measured by at least one of the measuring devices 211 and 212, and a second region W2 whose shape has not been measured by the measuring device 211 and the measuring device 212. In other words, the workpiece W includes the first region W1 that is machined based on workpiece measurement information that is the measurement result of at least one of the measuring devices 211 and 212, and the second region W2 that is machined based on model information. In this case, the display 6b may display an image including workpiece shape information that represents the shape of the workpiece W, first region information that represents the first region W1, and second region information that represents the second region W2.

[0150] An example of an image including the work shape information, the first region information, and the second region information is shown in FIG. 19. As shown in FIG. 19, the display 6b may display the work image WI obtained by imaging the work W or simulating the work W in a display manner in which the first image portion WI1 corresponding to the first region W1 and the second image portion WI2 corresponding to the second region W2 are distinguishable. In this case, it can be said that the display 6b displays the first image portion WI1 corresponding to the first region information and the second image portion WI2 corresponding to the second region information superimposed on the work image WI corresponding to the object information. As an example of a display manner in which the first image portion WI1 and the second image portion WI2 are distinguishable, at least one of a display manner in which the color of the first image portion WI1 and the color of the second image portion WI2 are different and a display manner in which the brightness of the first image portion WI1 and the brightness of the second image portion WI2 are different can be given. At least one of the work image WI, the first image portion WI1, and the second image portion WI2 may be generated from model information.

[0151] The display 6b may display an image including information about the workpiece W (for example, a workpiece image WI in which the first image portion WI1 and the second image portion WI2 shown in FIG. 19 can be distinguished) before the machining unit 1 starts machining the workpiece W. In this case, the display 6b may display an image including object information that represents the shape of the workpiece W before machining (for example, a workpiece image WI obtained by imaging the workpiece W before machining or that imitates the workpiece W before machining).

[0152] The display 6b may display an image including information about the workpiece W (for example, a workpiece image WI in which the first image portion WI1 and the second image portion WI2 shown in FIG. 19 can be distinguished) during at least a part of the machining period in which the machining unit 1 is machining the workpiece W. In this case, the display 6b may display an image including object information that represents the shape of the workpiece W during machining (for example, a workpiece image WI obtained by imaging the workpiece W during machining or that imitates the workpiece W during machining).

[0153] The display 6b may display an image including information about the workpiece W (for example, a workpiece image WI in which the first image portion WI1 and the second image portion WI2 shown in FIG. 19 can be distinguished) after the machining unit 1 has finished machining the workpiece W. In this case, the display 6b may display an image including object information that represents the shape of the workpiece W after machining (for example, a workpiece image WI obtained by imaging the workpiece W after machining or that imitates the workpiece W after machining).

[0154] The machining system SYSb of the second embodiment described above can achieve the same effects as those achieved by the machining system SYSa of the first embodiment described above. Furthermore, since the machining system SYSb displays an image including the work shape information, the first region information, and the second region information, the operator of the machining system SYSb can recognize whether each portion of the work W has been machined based on the work measurement information or based on the model information.

[0155] The first region W1 of the workpiece W is machined based on the workpiece measurement information obtained by actually measuring the first region W1. Therefore, the shape of the first region W1 after machining is relatively likely to match the design shape of the workpiece W after machining. That is, the first region W1 is relatively likely to be machined with high precision (in other words, with high quality). On the other hand, the second region W2 of the workpiece W is machined based on the model information instead of the workpiece measurement information obtained by actually measuring the second region W2. Therefore, the shape of the second region W2 after machining may not match the design shape of the workpiece W after machining. That is, the second region W2 may not be machined with high precision (in other words, with high quality). In this case, the operator of the machining system SYSb can distinguish between the first region W1, which is relatively likely to be machined with high precision, and the second region W2, which may not be machined with high precision, by referring to the image displayed on the above-mentioned display 6b. As a result, the operator can check the machining quality of the second region W2 with emphasis. That is, the image including the first region information and the second region information can be used as information indicating the processing quality of the workpiece W. For this reason, the control device 4 may store the first region information and the second region information as log information. The log information may be used to evaluate the processing quality of the workpiece W.

[0156] Further, the machining system SYSb may include a projector (i.e., a projection device) capable of projecting a desired image onto a desired projection surface in addition to or instead of the display 6b. For example, the projector may project a desired image onto at least a part of the surface of the workpiece W. In this case, at least a part of the surface of the workpiece W is used as the projection surface. For example, the projector may project information on the content of the machining performed on the workpiece W onto the surface of the workpiece W. For example, when the workpiece W is machined so that a structure (for example, the above-mentioned riblet structure) is formed on the workpiece W, the projector may project an image simulating the structure formed on the workpiece W by the machining operation onto the surface of the workpiece W before the machining unit 1 starts machining the workpiece W. In this case, the operator of the machining system SYSc can visually recognize the structure formed on the workpiece W actually placed on the stage 32. For example, the projector may project an image simulating the structure actually formed on the workpiece W by the machining operation onto the surface of the workpiece W after the machining unit 1 finishes machining the workpiece W. In this case, the operator of the machining system SYSc can visually recognize the structure actually formed on the workpiece W actually placed on the stage 32.

[0157] (3) Machining system SYSc according to the third embodiment Next, a processing system SYS of a third embodiment (hereinafter, the processing system SYS of the third embodiment will be referred to as the "processing system SYSc") will be described. The processing system SYSc of the third embodiment differs from the processing system SYSa of the first embodiment described above in that additional processing of the workpiece W may be performed by irradiating the workpiece W with processing light EL. For example, the processing system SYSc may form a three-dimensional structure on the workpiece W by performing additional processing.

[0158] As an example, the processing system SYSc may perform additive processing based on, for example, a laser metal deposition (LMD) method. In this case, the processing system SYSc may form a model by processing a modeling material M with processing light EL. The modeling material M is a material that can be melted by irradiation with processing light EL of a predetermined intensity or more. For example, at least one of a metallic material and a resinous material can be used as the modeling material M. However, other materials different from the metallic material and the resinous material may be used as the modeling material M. The modeling material M is a powder or granular material. In other words, the modeling material M is a powder or granular material. However, the modeling material M does not have to be a powder or granular material. For example, at least one of a wire-shaped modeling material and a gas-shaped modeling material may be used as the modeling material M. However, the processing system SYSc may form a three-dimensional structure ST by performing additive processing based on other additive processing methods.

[0159] An example of a processing system SYSc of the third embodiment that performs additional processing based on the laser build-up welding method is shown in Figs. 20 and 21. Fig. 20 is a system configuration diagram showing the system configuration of the processing system SYSc of the third embodiment. Fig. 21 is a perspective view showing the appearance of the processing system SYSc of the third embodiment. As shown in Figs. 20 and 21, the processing system SYSc of the third embodiment is different from the processing system SYSa of the first embodiment described above in that it includes a processing unit 1c instead of the processing unit 1. The processing system SYSc is different from the processing system SYSa in that it includes a material supply source 7c. Other features of the processing system SYSc may be similar to other features of the processing system SYSa.

[0160] The processing unit 1c differs from the processing unit 1 in that it includes a processing head 12c instead of the processing head 12. Other features of the processing unit 1c may be similar to other features of the processing unit 1. The processing head 12c differs from the processing head 12 in that it further includes a material nozzle 122c. Other features of the processing head 12c may be similar to other features of the processing head 12.

[0161] The material nozzle 122c supplies (e.g., ejects, jets, spouts, or sprays) the modeling material M. For this reason, the material nozzle 122c may be referred to as a material supply device. Specifically, the material nozzle 122c is physically connected to a material supply source 7c, which is a supply source of the modeling material M, via a supply pipe (not shown). The material nozzle 122c supplies the modeling material M supplied from the material supply source 7c. The material nozzle 122c is aligned with the irradiation optical system 121 so as to supply the modeling material M toward the irradiation position of the processing light EL from the irradiation optical system 121. The material nozzle 122c and the irradiation optical system 121 may be aligned with each other so that the material nozzle 122c supplies the modeling material M to a molten pool formed by the processing light EL emitted from the irradiation optical system 121. The material nozzle 122c does not have to supply the modeling material M to the molten pool. For example, the processing system SYSc may melt the forming material M from the material nozzle 122c using processing light EL from the irradiation optical system 121 before the forming material M reaches the workpiece W, and adhere the molten forming material M to the workpiece W.

[0162] The machining system SYSc of the third embodiment as described above can appropriately perform additional machining on the workpiece W. Furthermore, the machining system SYSc can obtain the same effects as those obtainable by the machining system SYS of the first embodiment described above.

[0163] (4) Machining system SYSd according to the fourth embodiment Next, a processing system SYS of a fourth embodiment (hereinafter, the processing system SYS of the fourth embodiment is referred to as "processing system SYSd") will be described. The processing system SYSd of the fourth embodiment is different from the processing system SYSa of the first embodiment described above in that the workpiece W may be machined using a tool 123d (see FIG. 22 and FIG. 23 described later) for machining the workpiece W in addition to or instead of the processing light EL. That is, the processing system SYSd is different from the processing system SYSa in that the workpiece W may be machined. For example, the processing system SYSd may cut, grind, polish, or cut the workpiece W by bringing the tool 123d into contact with the workpiece W. For example, the processing system SYSd may machine the workpiece W so that the shape of the workpiece W becomes a desired shape. For example, the processing system SYSd may machine the workpiece W so that a desired structure is formed on the workpiece W. For example, the processing system SYSd may machine the workpiece W so that a desired structure is formed on the surface of the workpiece W. For example, the processing system SYSd may machine the workpiece W so that the surface of the workpiece W is polished.

[0164] An example of such a processing system SYSd of the fourth embodiment is shown in FIG. 22 and FIG. 23. FIG. 22 is a block diagram showing the system configuration of the processing system SYSd of the fourth embodiment. FIG. 23 is a cross-sectional view showing the structure of the processing system SYSd of the fourth embodiment. As shown in FIG. 22 and FIG. 23, the processing system SYSd is different from the processing system SYSa in that it may not include the processing light source 11. Furthermore, the processing system SYSd is different from the processing system SYSa in that it may not include the irradiation optical system 121. Specifically, the processing system SYSd is different from the processing system SYSa in that it includes a processing unit 1d including a processing head 12d not including the irradiation optical system 121, instead of the processing unit 1 including the processing head 12 including the irradiation optical system 121. In other words, the processing system SYSd is different from the processing system SYSa in that it may not include the configuration requirements for irradiating the processing light EL to the workpiece W. Furthermore, the processing system SYSd is different from the processing system SYSa in that it includes a processing head 12d including a tool 123d, instead of the processing head 12. Other features of the processing system SYSd may be similar to other features of the processing system SYSa.

[0165] The machining system SYSd of the fourth embodiment as described above can appropriately perform machining on the workpiece W. Furthermore, the machining system SYSd can obtain the same effects as those obtainable by the machining system SYS of the first embodiment described above.

[0166] (5) Other modifications In the above description, the machining unit 1 is provided with the head drive system 13. However, the machining unit 1 does not have to be provided with the head drive system 13. In other words, the machining head 12 does not have to move. In the above description, the measurement unit 2 is provided with the head drive system 22. However, the measurement unit 2 does not have to be provided with the head drive system 22. In other words, the measurement head 21 does not have to move. In the above description, the stage unit 3 is provided with the stage drive system 33. However, the stage unit 3 does not have to be provided with the stage drive system 33. In other words, the stage 32 does not have to move.

[0167] In the above description, the processing unit 1 (particularly, each of the processing units 1 in the first and second embodiments and the processing unit 1c in the third embodiment) processes the workpiece W by irradiating the workpiece W with processing light EL. However, the processing unit 1 may process the workpiece W by irradiating the workpiece W with any energy beam other than light (this energy beam may be referred to as a "processing beam"). In this case, the processing unit 1 may be equipped with a beam source capable of generating any energy beam in addition to or instead of the processing light source 11. Examples of any energy beam include charged particle beams such as electron beams and ion beams. Another example of any energy beam includes electromagnetic waves.

[0168] The requirements of each of the above-described embodiments may be combined as appropriate. Some of the requirements of each of the above-described embodiments may not be used. The requirements of each of the above-described embodiments may be replaced with the requirements of other embodiments as appropriate. In addition, to the extent permitted by law, the disclosures of all publications and U.S. patents relating to the devices, etc. cited in each of the above-described embodiments are incorporated by reference into the present description.

[0169] Furthermore, the present invention can be modified as appropriate within the scope that does not contradict the gist or concept of the invention that can be read from the claims and the entire specification, and processing systems and display devices involving such modifications are also included in the technical concept of the present invention. [Explanation of symbols]

[0170] 1 Processing unit 12 Processing head 13 Head drive system 2. Measurement Unit 21 Measuring Head 211, 212 Measuring equipment 22 Head drive system 3 Stage Unit 32 Stages 33 Stage drive system 4. Control device EL processing light SYS Machining System Double work

Claims

1. A processing device capable of processing an object; a measuring device capable of measuring a three-dimensional shape of at least a part of the object; A control device for controlling the processing device; Equipped with The control device includes: controlling the processing device based on three-dimensional shape information of a second region of the surface of the object that is obtained based on a measurement result obtained by measuring a first region of the surface of the object using the measurement device and model information that represents a three-dimensional model of at least a part of the object; the three-dimensional shape information of the second region is obtained without measuring the three-dimensional shape of the second region by the measurement device; At least a portion of the second region is processed by the processing device based on the three-dimensional shape information of the second region. Processing system.

2. A processing device capable of processing an object; a measuring device capable of measuring a three-dimensional shape of at least a part of the object; a display device that displays information about the object; Equipped with The display device displays, after the processing device processes the object, Object information representing a shape of the processed object; First machining area information representing a first machining area machined based on a measurement result by the measuring device; second processing area information representing a second processing area in which processing has been performed based on model information representing a three-dimensional model of at least a part of the object; A processing system that displays.

3. the measurement device is a first measurement device, a second measuring device capable of measuring a three-dimensional shape of at least a part of the object; The measurement accuracy of the second measurement device is lower than the measurement accuracy of the first measurement device; and The three-dimensional shape information of the second region is obtained based on the measurement result obtained by measuring the first region using the first measuring device, the model information, and the measurement result obtained by measuring the second region using the second measuring device. The processing system of claim 1 .

4. the measurement device is a first measurement device, a second measuring device capable of measuring a three-dimensional shape of at least a part of the object; the measurement accuracy of the second measuring device is lower than the measurement accuracy of the first measuring device; The second processed area is an area processed based on the model information and the measurement result by the second measuring device. The processing system of claim 2 .

5. when the metrology device is located at a first predetermined location within the processing system; the first region of the object disposed at a second predetermined position in the processing system is included in a measurable range of the measurement device; The second region of the object disposed at the second predetermined position in the processing system includes a portion that is not included in a measurable range of the measurement device. The processing system according to claim 1 or 3.

6. When the measurement device is disposed at a first predetermined position of the processing device, the first processing region of the object disposed at a second predetermined position of the processing device is included in a measurable range of the measurement device; The second processing area of ​​the object arranged at the second predetermined position of the processing device includes a portion that is not included in the measurable range of the measurement device. The processing system according to claim 2 or 4.

7. A display device for displaying information about the object is further provided, The display device displays first region information representing the first region and second region information representing the second region together with object information representing a shape of the object.

6. The processing system according to claim 1, 3 or 5.

8. The measuring device measures a three-dimensional shape of at least a part of the object before the processing device starts processing the object; The control device determines a three-dimensional shape of the first region before the processing device starts processing the object.

8. The processing system according to claim 1, 3, 5 or 7.

9. The measuring device measures a three-dimensional shape of at least a part of the object before the processing device starts processing the object; A control device is provided for determining a three-dimensional shape of at least the first processing area and the second processing area before the processing device starts to process the object.

7. The processing system according to claim 2, 4 or 6.

10. the control device is capable of modifying processing control information for processing the object based on at least a three-dimensional shape of the first region; The processing device is capable of processing the object based on the modified processing control information.

9. The processing system according to claim 1, 3, 5, 7 or 8.

11. The display device displays the first processing area information and the second processing area information superimposed on object information representing the object.

10. The processing system according to claim 2, 4, 6 or 9.

12. The second region is adjacent to the first region.

11. The processing system according to claim 1, 3, 5, 7, 8 or 10.

13. A processing device capable of processing an object; A measuring device capable of measuring a shape of at least a part of the object; A control device for controlling the processing device; Equipped with The control device includes: The processing device is controlled based on a measurement result obtained by measuring a first region of the surface of the object using the measuring device and model information representing a shape of a second region of the surface of the object. Processing system.

14. A processing device capable of processing an object; A measuring device capable of measuring a shape of at least a part of the object; a display device that displays information about the object; Equipped with The display device displays object information representing a shape of the object, first machining area information relating to a first machining area machined using a measurement result by the measuring device, and second machining area information relating to a second machining area machined using at least a part of model information representing a model of the object. Processing system.

15. the measurement device is a first measurement device, a second measuring device capable of measuring a shape of at least a part of the object; the measurement accuracy of the second measuring device is lower than the measurement accuracy of the first measuring device; Shape information of the second region is obtained based on the measurement result obtained by measuring the first region using the first measuring device, the model information, and the measurement result obtained by measuring the second region using the second measuring device. The processing system of claim 13.

16. the measurement device is a first measurement device, a second measuring device capable of measuring a shape of at least a part of the object; the measurement accuracy of the second measuring device is lower than the measurement accuracy of the first measuring device; The second processed area is an area processed based on the model information and the measurement result by the second measuring device. The processing system of claim 14.

17. the metrology device is fixedly disposed within the processing system; the first region of the object fixedly disposed within the processing system is included in a measurable range of the measurement device; The second region of the object fixedly disposed within the processing system includes a portion that is not included in a measurable range of the metrology device.

16. The processing system according to claim 13 or 15.

18. The measurement device is fixedly disposed within the processing device, the first processing region of the object fixedly disposed within the processing device is included in a measurable range of the measurement device, The second processing area of ​​the object fixedly disposed within the processing device includes a portion that is not included in the measurable range of the measurement device.

17. The processing system according to claim 14 or 16.

19. The measuring device is movable; the first region of the object positioned at a first predetermined position of the processing device is included in a measurable range of the measurement device positioned at a second predetermined position; The second region of the object located at the first predetermined position of the processing device includes a portion that is not included in a measurable range of the measuring device located at the second predetermined position.

18. A processing system according to claim 13, 15 or 17.

20. The measuring device is movable; the first processing region of the object positioned at a first predetermined position of the processing device is included in a measurable range of the measurement device positioned at a second predetermined position; The second processing region of the object positioned at the first predetermined position of the processing device includes a portion that is not included in a measurable range of the measuring device positioned at the second predetermined position.

19. A processing system according to claim 14, 16 or 18.

21. A display device for displaying information about the object is further provided, The display device displays first region information representing the first region and second region information representing the second region together with object information representing a shape of the object.

20. The processing system of claim 13, 15, 17 or 19.

22. The measuring device measures a shape of at least a part of the object before the processing device starts processing the object; The control device determines a shape of the first region before the processing device starts processing the object.

22. The processing system of claim 13, 15, 17, 19 or 21.

23. the first and second measuring devices measure a shape of at least a part of the object before the processing device starts processing the object; The control device determines shapes of at least the first region and the second region before the processing device starts processing the object.

16. The processing system of claim 15.

24. The control device is capable of correcting processing control information for processing the object based on at least a shape of the first region, The processing device is capable of processing the object based on the modified processing control information.

24. The processing system of any one of claims 13, 15, 17, 19 and 21 to 23.

25. The display device displays the first processing area information and the second processing area information superimposed on object information representing the object.

21. The processing system of any one of claims 14, 16, 18 and 20.

26. The display device displays at least one of the first and second area information before the processing device starts processing the object.

22. The processing system of claim 21.

27. The display device displays at least one of the first and second area information while the processing device is processing the object.

27. The processing system according to claim 21 or 26.

28. The display device displays at least one of the first and second area information after the processing device finishes processing the object.

28. The processing system of claim 21, 26 or 27.

29. The display device displays at least one of the first and second processing area information while the processing device is processing the object.

26. The processing system of claim 14, 16, 18, 20 or 25.

30. The display device displays at least one of the first and second processing area information after the processing device finishes processing the object.

30. The processing system of claim 14, 16, 18, 20, 25 or 29.

31. The display device displays the first and second region information together with object information that represents a shape of the object before processing.

29. The processing system of any one of claims 21 and 26 to 28.

32. The display device displays the first and second region information together with object information that indicates a shape of the object after processing.

32. The processing system of any one of claims 21, 26 to 28 and 31.

33. The display device displays the first and second region information together with object information representing the shape of the object being machined.

33. The processing system of any one of claims 21, 26-28 and 31-32.

34. The display device displays the first and second processing area information together with object information that indicates a shape of the object before processing.

31. The processing system of claim 14, 16, 18, 20, 25, 29 or 30.

35. The display device displays the first and second processing area information together with object information that indicates a shape of the object after processing.

35. The processing system of claim 14, 16, 18, 20, 25, 29, 30 or 34.

36. The display device displays the first and second machining area information together with object information representing a shape of the object during machining.

36. The processing system of any one of claims 14, 16, 18, 20, 25, 29, 30, 34 or 35.

37. The second region is adjacent to the first region, The shape information of the second region is obtained without measuring the shape of the second region by the measuring device.

34. The processing system of any one of claims 13, 15, 17, 19, 21 to 24, 26 to 28 and 31 to 33.

38. The measuring device measures a shape of at least a part of the object during at least a part of a processing period after the processing device starts processing the object, a control device that generates processing control information for processing the object and measurement control information for measuring the object based on a measurement result of the measuring device during at least a part of the processing period; 38. The processing system of any one of claims 1 to 37.

39. The measurement device (i) measures a shape of the first region during at least a portion of a non-processing period before the processing device starts processing the object, and (ii) measures a shape of a third region, which is at least a portion of the second region, during at least a portion of a processing period after the processing device starts processing the object; The control device (i) generates, during at least a portion of the non-machining period, at least one of processing control information for processing the object and measurement control information for measuring the object, using measurement results obtained by measuring the first region using the measuring device and shape information of the second region obtained based on the model information, and (ii) generates, during at least a portion of the machining period, at least one of the processing control information and the measurement control information, using measurement results obtained by measuring the first and third regions using the measuring device and shape information of the second region obtained based on the model information.

38. The processing system of any one of claims 1, 3, 5, 7, 8, 10, 13, 15, 17, 19, 21 to 24, 26 to 28, 31 to 33 and 37.

40. During the non-processing period, the second region is not included in a measurable range of the measuring device, During the processing period, the second area is included in the measurable range.

40. The processing system of claim 39.

41. a position change device for changing a positional relationship between the object and the measurement device, The measuring device measures a shape of the second region when the position change device changes the positional relationship so that the second region is included in a measurable range of the measuring device during at least a part of the processing period.

41. A processing system according to claim 39 or 40.

42. The control device generates at least one of the processing control information and the measurement control information when a difference between a shape of the second region indicated by the measurement result and a shape of the second region indicated by the model information exceeds an allowable threshold during at least a part of the processing period.

42. The processing system of any one of claims 39 to 41.

43. The control device does not generate at least one of the processing control information and the measurement control information when the difference does not exceed the allowable threshold during at least a portion of the processing period.

43. The processing system of claim 42.

44. the measurement device is a first measurement device, a second measuring device capable of measuring a shape of at least a part of the object; The measurement accuracy of the second measuring device is lower than the measurement accuracy of the first measuring device.

43. The processing system of any one of claims 1, 3, 5, 7, 8, 10, 13, 15, 17, 19, 21 to 24, 26 to 28, 31 to 33, 37 and 39 to 42.

45. The control device generates at least one of processing control information for processing the object and measurement control information for measuring the object, using a measurement result obtained by measuring the first area using at least one of the first and second measuring devices and shape information of the second area obtained based on the model information.

45. The processing system of claim 44.

46. When a difference between a shape of the first region indicated by a measurement result of the second measurement device and a shape of the first region indicated by the model information exceeds an allowable threshold, the first measurement device measures a three-dimensional shape of the first region; The control device generates at least one of processing control information for processing the object and measurement control information for measuring the object, using a measurement result obtained by measuring the first area using the first measuring device and shape information of the second area obtained based on the model information.

46. ​​A processing system according to claim 44 or 45.

47. The control device generates measurement control information for measuring a shape of a third region of the object, using a measurement result obtained by measuring the first region using the measurement device and shape information of the second region obtained based on the model information.

47. The processing system of any one of claims 1, 3, 5, 7, 8, 10, 13, 15, 17, 19, 21 to 24, 26 to 28, 31 to 33, 37 and 39 to 46.

48. a position change device for changing a positional relationship between the object and the measurement device, the position change device changes the positional relationship based on the measurement control information after the measurement device measures the shape of the first area so that the third area is included in a measurable range of the measurement device; The measurement device measures a shape of the third area after the position change device changes the positional relationship so that the third area is included in the measurable range.

48. The processing system of claim 47.

49. During a period in which the measurement device measures the first area, the third area is not included in a measurable range of the measurement device.

49. A processing system according to claim 47 or 48.

50. The control device generates processing control information for processing the object using a measurement result obtained by measuring the first and third regions using the measurement device and shape information of the second region obtained based on the model information.

50. The processing system of any one of claims 47 to 49.

51. When a difference between the shape of the first region indicated by the measurement result of the measuring device and the shape of the first region indicated by the model information exceeds an allowable threshold, (i) the measuring device measures the shape of a third region of the object, and (ii) the control device generates at least one of processing control information for processing the object and measurement control information for measuring the object, using the measurement result obtained by measuring the first and third regions using the measuring device.

51. The processing system of any one of claims 1, 3, 5, 7, 8, 10, 13, 15, 17, 19, 21 to 24, 26 to 28, 31 to 33, 37 and 39 to 50.

52. The control device generates at least one of the processing control information and the measurement control information by using a measurement result obtained by measuring the first and third regions using the measurement device, but without using the model information.

52. The processing system of claim 51.

53. The control device generates at least one of processing control information for processing the object and measurement control information for measuring the object, using a measurement result obtained by measuring the first area and a third area of ​​the object using the measurement device and shape information of the second area obtained based on the model information.

53. The processing system of any one of claims 1, 3, 5, 7, 8, 10, 13, 15, 17, 19, 21 to 24, 26 to 28, 31 to 33, 37 and 39 to 52.

54. The measuring device measures a plurality of different shapes of the third region.

54. The processing system of any one of claims 51 to 53.

55. a position change device for changing a positional relationship between the object and the measurement device, the position change device changes the positional relationship so that the third area is included in a measurable range of the measurement device after the measurement device measures the shape of the first area; The measurement device measures a shape of the third area after the position change device changes the positional relationship so that the third area is included in the measurable range.

55. The processing system of any one of claims 51 to 54.

56. During a period in which the measurement device measures the first area, the third area is not included in a measurable range of the measurement device.

56. The processing system of any one of claims 51 to 55.

57. the objects include a first object and a second object having the same shape as the first object; In a situation where a difference between a shape of the first region of the first object indicated by a measurement result of the measuring device and a shape of the first region indicated by the model information does not exceed a tolerance threshold, when the processing system processes the first object and then processes the second object in the same manner as the first object, (i) the measuring device does not measure the shape of the first region of the second object, and (ii) the second object is processed using processing control information generated for processing the first object, and / or the second object is measured using measurement control information generated for measuring the first object.

57. The processing system of any one of claims 1, 3, 5, 7, 8, 10, 13, 15, 17, 19, 21 to 24, 26 to 28, 31 to 33, 37 and 39 to 56.

58. the objects include a first object and a second object having the same shape as the first object; In a situation where a difference between a shape of the first region of the first object indicated by a measurement result of the measuring device and a shape of the first region indicated by the model information does not exceed an allowable threshold, when the processing system processes the second object in the same manner as the first object after processing the first object, (i) the measuring device measures a shape of the first region of the second object that is distributed in an area narrower than the first region of the first object, and (ii) the control device generates at least one of processing control information for processing the second object and measurement control information for measuring the second object, using a measurement result obtained by measuring the first region of the second object using the measuring device.

58. The processing system of any one of claims 1, 3, 5, 7, 8, 10, 13, 15, 17, 19, 21 to 24, 26 to 28, 31 to 33, 37 and 39 to 57.

59. The processing control information includes information for changing a positional relationship between the object and the processing device.

59. The processing system of any one of claims 10, 24, 38 to 43, 45 to 46, 51 to 58.

60. The measurement control information includes information for changing a positional relationship between the object and the measurement device.

59. The processing system of any one of claims 38 to 43 and 45 to 58.

61. The processing device processes the object by irradiating the object with processing light.

61. The processing system of any one of claims 1 to 60.

62. The processing device performs subtractive processing or additive processing on the object.

62. The processing system of any one of claims 1 to 61.

63. The processing device machines the object.

63. The processing system of any one of claims 1 to 62.

64. A processing device capable of processing an object; A measuring device capable of measuring a shape of at least a part of the object; a display device that displays information about the object; Equipped with The display device displays information about the object based on the result of the measurement device and model information representing a model of the object. Processing system.

65. A processing device capable of processing an object; A measuring device capable of measuring a shape of at least a part of the object; A control device for controlling the processing device; Equipped with the measurement device measures a second region of the surface of the object based on a measurement result obtained by measuring a first region of the surface of the object and model information representing a shape of the second region of the surface of the object; The control device is a processing system that controls the processing device based on at least the measurement result of the second area.

66. A processing device capable of processing an object; A first measuring device capable of measuring a shape of at least a part of the object; A second measuring device capable of measuring a shape of at least a part of the object; A control device for controlling the processing device; Equipped with the second measurement device measures a second region of the surface of the object based on a first measurement result obtained by measuring the first region of the surface of the object by the first measurement device and model information representing a shape of the second region of the surface of the object; The control device is a processing system that controls the processing device based on at least the measurement result of the second area.

67. A display device capable of displaying information about an object processed by a processing system including a processing device capable of processing an object, a measuring device capable of measuring a shape of at least a part of the object, and a control device that controls the processing device based on a measurement result obtained by measuring a first region of a surface of the object using the measuring device and model information representing a shape of a second region of the surface of the object, The display device displays object information indicating a shape of the object, first region information regarding the first region, and second region information regarding the second region.

68. A display device capable of displaying information about an object to be processed by a processing system including a processing device capable of processing an object and a measuring device capable of measuring a shape of at least a part of the object, The display device displays object information representing the shape of the object, first processing area information relating to a first processing area processed using measurement results by the measuring device, and second processing area information relating to a second processing area processed using at least a portion of model information representing a model of the object.

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