Timepiece component and timepiece

Abstract

To provide a timepiece component capable of achieving development of a calm and deep color.SOLUTION: A timepiece component includes: a base material which has a form as a timepiece component and which is mainly made of silicon; and a light reflection layer laid on the base material. The light reflection layer includes first, second, and third layers laid in order from the side close to the base material. The first layer is formed of a silicon oxide. The second layer is formed of silicon. The third layer is formed of a material with a reflective index of 1.7 to 2.7.SELECTED DRAWING: Figure 4

Description

[Technical Field]

[0001] The present invention relates to a timepiece component and a timepiece. [Background technology]

[0002] Patent Document 1 discloses that a light-reflecting layer having a three-layer structure in which a first silicon oxide layer, a silicon layer, and a second silicon oxide layer are stacked in this order on a substrate whose main component is silicon is provided.

[0003] In Patent Document 1, three layers of silicon oxide layers, which are relatively low refractive index layers, and silicon layers, which are relatively high refractive index layers, are alternately laminated on a silicon substrate, which allows for decoration with better color development than when a single silicon oxide layer is laminated on the substrate. [Prior art documents] [Patent documents]

[0004] [Patent Document 1] Japanese Patent Publication No. 2020-148651 Summary of the Invention [Problem to be solved by the invention]

[0005] In Patent Document 1, the third layer is formed using silicon oxide, but in this case, simply changing the thickness of the third layer results in a brighter brightness, making it difficult to achieve a calm, deep color. [Means for solving the problem]

[0006] The timepiece component of the present disclosure has a shape as a timepiece component, and comprises a substrate primarily composed of silicon, and a light-reflecting layer laminated on the substrate, the light-reflecting layer having a first layer, a second layer, and a third layer laminated in that order from the side closest to the substrate, the first layer being formed using silicon oxide, the second layer being formed using silicon, and the third layer being formed using a material with a refractive index of 1.7 to 2.7.

[0007] The timepiece of the present disclosure is characterized by including the timepiece component described above. [Brief explanation of the drawings]

[0008] [Figure 1] FIG. 1 is a front view of a timepiece according to an embodiment, seen from the dial side. [Figure 2] FIG. 2 is a view of the timepiece according to the embodiment as seen from the back cover side. [Figure 3] FIG. 4 is a plan view of an escape wheel portion according to the embodiment. [Figure 4] FIG. 4 is a partial cross-sectional view of an escape wheel portion according to the embodiment. [Figure 5] A model diagram of light reflection by a light-reflecting layer. [Figure 6] 4 is a flowchart of a method for manufacturing an escape gear according to the embodiment. DETAILED DESCRIPTION OF THE INVENTION

[0009] [Embodiment] A timepiece 1 according to an embodiment of the present disclosure will now be described with reference to the drawings. Fig. 1 is a front view of the timepiece 1, and Fig. 2 is a view of the timepiece 1 from the back cover side. In this embodiment, the timepiece 1 is configured as a mechanical wristwatch worn on the user's wrist. The timepiece 1 has a see-through structure that allows part of the movement 40 to be seen from the dial 3 side and the back cover 35 side.

[0010] As shown in Figures 1 and 2, the timepiece 1 has a cylindrical exterior case 5, and a disk-shaped dial 3 is disposed on the inner periphery of the exterior case 5. A window 48A is provided in the dial 3. The timepiece 1 is configured so that part of the movement 40 can be seen through this window 48A. Of the two openings in the exterior case 5, the opening on the front side is closed with a light-transmitting cover crystal 6, and a back cover 35 is attached to the opening on the back side.

[0011] The timepiece 1 also includes a movement 40 housed within the exterior case 5, an hour hand 44A that displays time information, a minute hand 44B, a power reserve hand 44C that indicates the duration of the mainspring, and a small second hand 44D. The hour hand 44A, minute hand 44B, power reserve hand 44C, and small second hand 44D are attached to the axis of the movement 40 and are driven by the movement 40. A crown 7 is provided on the side of the exterior case 5. By operating the crown 7, input according to the operation can be performed.

[0012] Furthermore, in FIG. 1, the escape wheel 101, anchor 28, balance wheel 27, and hairspring 29 that constitute part of the movement 40 can be seen from the dial 3 side through a window 48A provided in the dial 3. The escape wheel 101 comprises an escape wheel portion 100 and a shaft member 102. The escape wheel portion 100 is an example of a timepiece component of the present disclosure.

[0013] The back cover 35 is composed of a ring-shaped frame member 46 that forms the outer periphery, and a window 48B that is formed of a transparent member and fitted into the frame member 46. The movement 40 includes a train wheel 45, a balance cock 13, a manual winding mechanism 60, and an automatic winding mechanism 50.

[0014] The wheel train 45 is provided on the back cover side of the main plate and includes a barrel 21, a center wheel, a third wheel, a fourth wheel 51, an escape wheel 101, an anchor 28, and a balance wheel 27. Figure 2 shows the barrel 21, the fourth wheel 51, the escape wheel 101, the anchor 28, and the balance wheel 27. The escape wheel 101 and the anchor 28 form the escapement 80, and the balance wheel 27 and the hairspring 29 form the governor 70.

[0015] The manual winding mechanism 60 includes a winding stem, a timing pinion, a clutch wheel, a crown wheel 61, a square-head transmission wheel 62, and a square-head wheel 63. In Fig. 2, the crown wheel 61, the square-head transmission wheel 62, and the square-head wheel 63 are shown. The automatic winding mechanism 50 includes an oscillating weight, a bearing, an eccentric wheel, a pawl lever, and a transmission wheel 52. In FIG. In FIG. 2, from the case back 35 side, through a window 48B provided in the case back 35, the barrel complete 21, escape wheel 101, pallet fork 28, balance wheel 27, crown wheel 61, crown transmission wheel 62, crown wheel 63, eccentric wheel, transmission wheel 52, and the like that constitute part of the movement 40 can be seen.

[0016] In this way, in this embodiment, the escape wheel portion 100 of the escape wheel 101 can be seen through the window 48A in the dial 3 and the crystal 6, thereby enhancing the design of the timepiece 1. Furthermore, the escape wheel portion 100 of the escape wheel 101 can be seen from the case back 35 side through the window 48B provided in the case back 35, thereby enhancing the design of the timepiece 1.

[0017] In the timepiece 1, the manner in which the components of the movement 40 can be viewed from the dial 3 side or the back cover 35 side is not limited to the manner described above. For example, the design, size, arrangement and number of windows 48A and 48B may be changed as appropriate to allow desired components of movement 40 to be viewed. In addition, the entire dial 3 may be made of a transparent material so that the entire movement 40 can be seen from the dial side, or the entire back cover 35 may be made of a transparent material so that the entire movement 40 can be seen from the back cover side.

[0018] [Escape gear] Next, the configuration of the escape wheel portion 100 will be described in detail. FIG. 3 is a plan view of the escape wheel portion 100. As shown in FIG. 3, the escape wheel part 100 has an insertion part 110 in the center, through which the shaft member 102 is inserted. The escape wheel portion 100 has a rim portion 111 having a plurality of teeth 112, and a holding portion 115 that holds the shaft member 102. The rim portion 111 is an annular portion on the outer edge of the escape wheel portion 100. The teeth 112 protrude outward from the outer periphery of the rim portion 111, and are formed in a special hook shape. The escape wheel portion 100 has seven holding portions 115. The holding portions 115 are arranged at seven locations in the circumferential direction of the annular rim portion 111 at an equal pitch of 360° / 7. The number of holding portions 115 is not particularly limited and may be in the range of three to seven, or may be seven or more. The holding portion 115 has a first holding portion 113 extending from the rim portion 111, and a second holding portion 114 branching off from the first holding portion 113. The first holding portion 113, the second holding portion 114, and the rim portion 111 are integrally formed from the same material.

[0019] The first holding portion 113 extends in a direction from the rim portion 111 toward the shaft member 102, and is formed so that its width decreases toward the shaft member 102. The tip of the first holding portion 113 on the shaft member 102 side is an abutment portion 113A that abuts against the shaft member 102. This abutment portion 113A is formed in a planar arc shape.

[0020] The second holding portion 114 has a first portion 114A and a second portion 114B. The second holding portion 114 fixes the shaft member 102 to the center of the escape wheel portion 100 and has the function of preventing the escape wheel portion 100 from tilting or coming off with respect to the shaft member 102.

[0021] The first portion 114A is connected to the first holding portion 113, is formed by branching off from the first holding portion 113, and extends in a direction intersecting the extending direction of the first holding portion 113. The second holding portion 114 has a plurality of first portions 114A. The plurality of first portions 114A are arranged approximately parallel to one another. The second portion 114B is connected to the plurality of first portions 114A and extends in a direction toward the shaft member 102. The width dimension of the second portion 114B is approximately constant, and the tip on the shaft member 102 side forms an abutment portion 114C that abuts against the shaft member 102. The abutment portion 114C is formed in a planar arc shape.

[0022] Next, a description will be given of the cross-sectional structure of the escape wheel portion 100. FIG. 4, escape wheel portion 100 has a substrate 8 whose main component is silicon. Substrate 8 has a first surface 8A, a second surface 8B opposite to first surface 8A, and a third surface 8C and a fourth surface 8D connecting first surface 8A and second surface 8B.

[0023] In this specification, the first surface 8A of the base material 8 refers to the surface on the side where the timepiece component is visible when the timepiece component is mounted in a timepiece. When the timepiece component is mounted in a timepiece and is visible from the back cover side of the timepiece, the first surface 8A of the substrate 8 refers to the surface that is located on the back cover side of the timepiece. However, when the timepiece component is visible from both the dial side and the back cover side of the timepiece, the first surface 8A of the substrate 8 refers to the surface that is located on the dial side of the timepiece.

[0024] Here, in the case of this embodiment, the escape wheel portion 100 as a timepiece component can be seen from both the dial 3 side and the back cover 35 side of the timepiece 1, so the first surface 8A of the base material 8 is the surface located on the dial 3 side, and the second surface 8B of the base material 8 is the surface located on the back cover 35 side. In this specification, the substrate 8 refers to a timepiece component in a state where the light-reflecting layer 10 is not formed. In the present embodiment, the substrate 8 refers to the escape wheel part 100 in a state where the light-reflecting layer 10 is not formed. In other words, the substrate 8 has a shape as a timepiece component, and in this embodiment, the substrate 8 has the shape of the escape wheel part 100. In this specification, "mainly composed of silicon" means that the silicon content is 80% by mass or more relative to the entire base material, preferably 90% by mass or more, and more preferably 95% by mass or more. In the following description, the substrate 8 containing silicon as its main component may be referred to as a silicon substrate 8 or simply as a substrate 8.

[0025] First, the configuration of the first surface 8A side of the base material 8 will be described. As shown in Figure 4, the escape wheel portion 100 has a three-layer light-reflecting layer 10 in which a first layer 12, a second layer 14, and a third layer 16 are laminated in this order on the first surface 8A, the second surface 8B, and the third surface 8C of the substrate 8.

[0026] [Base material] The base material 8 is mainly composed of silicon. There are no particular limitations on the type of silicon, and an appropriate silicon can be selected from the viewpoint of processability. Examples of silicon include single crystal silicon and polycrystalline silicon. These may be used alone or in combination of two or more types. The silicon substrate 8 can be manufactured by, for example, photolithography and etching techniques, and can be formed into a complex shape.

[0027] [Light reflective layer] The light-reflecting layer 10 has a first layer 12, a second layer 14, and a third layer 16 on the substrate 8 in this order. In this embodiment, the light-reflecting layer 10 is provided on the first surface 8A, the second surface 8B, the third surface 8C, and the fourth surface 8D of the substrate 8, that is, on the entire surface of the substrate 8, and has a three-layer structure. The light-reflecting layer may have a five-layer structure, for example, but a three-layer structure is preferable from the viewpoint of making it easier to adjust the color.

[0028] [First layer] The first layer 12 is provided on the base material 8. In this embodiment, the first layer 12 is provided on the first surface 8A, the second surface 8B, the third surface 8C, and the fourth surface 8D of the base material 8. In this embodiment, the first layer 12 is formed using silicon oxide. The thickness of the first layer 12 is adjusted appropriately depending on the color to be developed, but is usually preferably 50 nm or more and 600 nm or less. Since the first layer 12 is 50 nm or more, the thickness of the first layer 12 can be easily controlled. Furthermore, since the first layer 12 is 600 nm or less, the formation of the first layer 12 can be prevented from taking too much time. The first layer 12 is preferably a silicon oxide layer formed by thermal oxidation, which makes it easier to obtain a highly uniform silicon oxide layer.

[0029] [Second layer] The second layer 14 is provided on the first layer 12. In this embodiment, the second layer 14 is provided on the entire surface of the first layer 12. In this embodiment, the second layer 14 is made of silicon. The second layer 14 may be an amorphous layer or a polysilicon layer, but is preferably a polysilicon layer. The thickness of the second layer 14 is adjusted appropriately depending on the color to be developed, but is usually preferably 20 nm or more and 300 nm or less. Since the thickness of the second layer 14 is 20 nm or more, it is easy to control the thickness of the second layer 14. Furthermore, since the thickness of the second layer 14 is 300 nm or less, it is possible to prevent the hue from becoming too close to the hue of the second layer 14, which has a high refractive index.

[0030] [Third layer] The third layer 16 is provided on the second layer 14. In this embodiment, the third layer 16 is provided on the entire surface of the second layer 14. In this embodiment, the third layer 16 is formed by ALD (Atomic Layer Deposition) using a material having a refractive index different from that of the second layer 14. Specifically, the third layer 16 is formed by ALD using any one of aluminum oxide, aluminum nitride, silicon nitride, titanium oxide, and hafnium oxide. The ALD method is a technology that deposits metal oxide or metal nitride films on a target object by alternately flowing gases containing metal elements called precursors and reactive gases called reactants, such as water, ozone, oxygen, and ammonia. One of the features of the ALD method is that it is possible to deposit a variety of film types, thanks to the abundance of precursor materials available.

[0031] The thickness of the third layer 16 is adjusted as appropriate depending on the color to be developed, but is typically preferably 10 nm or more and 150 nm or less. As a result, since the third layer 16 is 10 nm or more, the reflectance of the third layer 16 can be ensured, making it easier to achieve the desired hue. Furthermore, since the third layer 16 is 150 nm or less, it is possible to prevent the formation of the third layer 16 from taking too much time.

[0032] Furthermore, the refractive index of the third layer 16 at a wavelength of 632.8 nm is preferably 1.7 or more and 2.7 or less, which reduces the difference in refractive index between the second layer 14, which is made of silicon, and the third layer 16, thereby suppressing color development and achieving a watch component with a calm, deep color.

[0033] The refractive index is a value specific to a substance, and the refractive indexes of the materials of third layer 16 exemplified above are 1.7 for aluminum oxide, 2.0 for aluminum nitride, 1.8 for silicon nitride, 2.5 to 2.7 for titanium oxide, and 1.9 for hafnium oxide. That is, by using any one of aluminum oxide, aluminum nitride, silicon nitride, titanium oxide, and hafnium oxide as the material of third layer 16, the refractive index of third layer 16 can be set to 1.7 or more and 2.7 or less.

[0034] [Light reflectance by the light-reflecting layer] Next, the reflectance of light by the light reflecting layer in which three films are laminated will be described. FIG. 5 is a model diagram of light reflection by a light reflecting layer. When light is incident at an angle of incidence of 0° onto a light-reflecting layer having three laminated layers as shown in Figure 5, the reflectance R of the light can be calculated using the following formulas (1) to (5) described in "Introduction to Photonic Crystals" (Kazuaki Sakoda, Morikita Publishing, pp. 28-32, 41-43, 2004).

[0035]

number

[0036] In the above formulas (1) to (5), λ is the wavelength of light, n j is the refractive index of the jth layer, d_ j is the layer thickness up to the jth layer, E i is the amplitude of the incident light, E r is the amplitude of the reflected light, E t denotes the amplitude of the transmitted light. j is E i The amplitude of light propagating through each layer in the same direction as j is E r is the amplitude of light propagating through each layer in the same direction.

[0037] Looking at equation (5) above, which shows the reflectance R, we can see that the reflectance R can be calculated as the ratio of the 11th and 21st components of the matrix M. Furthermore, each component of M is determined not only by the wavelength λ but also by the refractive index n and layer thickness d. Here, the refractive index n is a value specific to a substance and is therefore determined by the film material, while the layer thickness d can be adjusted by using a manufacturing method that results in the desired value. In other words, to strongly reflect a specific light, or in other words, to achieve a desired hue, the refractive index n and layer thickness d can be manufactured so that they satisfy specific conditions.

[0038] In this embodiment, the ALD method is used to form the third layer 16, and therefore materials having various refractive indices can be used to form the third layer 16. This increases the number of hues that can be realized. Furthermore, when the third layer is stacked on the second layer 14 formed using silicon by thermal oxidation, the film thickness of the silicon layer of the second layer 14 and the third layer 16 varies from one production to the next due to the crystallinity, density, etc., of the silicon layer of the second layer 14. This poses a problem in that it becomes difficult to control the color to a desired hue. In contrast, in this embodiment, the third layer 16 is formed using the ALD method, so the thickness of the second layer 14 does not change, making it easier to control the color to a desired hue. Furthermore, since the first layer 12 formed using silicon oxide is laminated on the base material 8, the durability of the base material 8 can be increased.

[0039] [Manufacturing method for escape gears] Next, a method for manufacturing the escape wheel 101 will be described. FIG. 6 is a flowchart of a method for manufacturing the escape wheel 101. 6, first, an oxide film forming step is performed in step S1. Specifically, a silicon oxide film is formed on one surface of a plate-shaped silicon wafer made of silicon.

[0040] Next, in step S2, a photoresist coating process is carried out. Specifically, a photoresist is coated on the other flat surface of the silicon wafer and dried. Next, in step S3, an exposure and development process is carried out. Specifically, a mask having the shapes of the base material 8 and tie bars of the escape wheel portion 100 is formed.

[0041] Next, in step S4, an etching process is carried out. Specifically, the silicon wafer is etched to form the shapes of the base material 8 of the escape wheel portion 100 and the tie bars that support the base material 8. Here, the silicon oxide film formed in step S1 prevents holes formed by etching from penetrating through. Next, in step S5, an oxide film removal process is performed, specifically, the silicon oxide film formed in step S1 is removed.

[0042] Next, in step S6, a first layer forming step is carried out. Specifically, the first layer 12 is formed by using silicon oxide by thermal oxidation on the entire surface of the silicon wafer etched in step S5. Next, a second layer forming step is carried out in step S7. Specifically, the second layer 14 is formed of silicon by low-pressure CVD on the entire surface of the first layer 12 formed in step S6.

[0043] Next, in step S8, a third layer formation process is performed. Specifically, the third layer 16 is formed by the ALD method on the entire surface of the second layer 14 formed in step S7. In this case, the third layer 16 is formed by the ALD method using a material having a refractive index different from that of the second layer 14, such as one of aluminum oxide, aluminum nitride, silicon nitride, titanium oxide, and hafnium oxide.

[0044] Next, in step S9, a tie bar cutting step is carried out. Specifically, the base material 8 of the escape wheel part 100 and the tie bar supporting the base material 8 are cut. Finally, an assembly process is carried out in step S10. Specifically, the base material 8 of the escape wheel portion 100 cut from the tie bar in step S9 is assembled with the shaft member 102 to manufacture the escape wheel 101.

[0045] As described above, in this embodiment, the ALD method is used to form the third layer 16, and therefore materials having various refractive indices can be used to form the third layer 16. This increases the number of hues that can be realized. Furthermore, since a reflective layer laminating step of laminating light-reflecting layer 10 on the entire surface of base material 8 is carried out before the tie bar cutting step of cutting the tie bars that support base material 8, it is possible to laminate light-reflecting layer 10 on the entire surface of base material 8. Furthermore, since light-reflecting layer 10 is also laminated on the surface of the tie bar, it is possible to make the change in hue at the cut point less noticeable when the tie bar is cut.

[0046] Furthermore, in this embodiment, the first layer 12 is formed by thermal oxidation, and the second layer 14 is formed by low-pressure CVD. In other words, the first layer 12 and the second layer 14 are formed by a method other than ALD, which shortens the time required to manufacture the escape wheel portion 100.

[0047] [Example 1] Next, an example of the present disclosure will be described. In Example 1, a light-reflecting layer was formed on the surface of the substrate under five conditions as shown in Table 1. As shown in Table 1, in Examples 1-1, 1-4, and 1-5, the third layer was formed of silicon nitride by ALD, in Example 1-2 the third layer was formed of aluminum oxide by ALD, and in Example 1-3 the third layer was formed of aluminum nitride by ALD. As a result, the refractive index of the third layer was 1.7 to 2.0. In Examples 1-1 to 1-5, the first layer was formed of silicon oxide by thermal oxidation, and the second layer was formed of silicon by low-pressure CVD. In Table 1, the thickness of the first layer includes a manufacturing error of ±5 nm, the thickness of the second layer includes a manufacturing error of ±3 nm, and the thickness of the third layer includes a manufacturing error of ±5 nm.

[0048] The results suggest that in Examples 1-1 to 1-5, the hue could be controlled to a red color, the lightness L* to 45.0±10.0, the a* to 60.0±10.0, and the b* to 40.0±10.0. In other words, it was suggested that by forming the third layer by the ALD method, a watch component with a red hue and a lightness L* of 45.0±10.0, which is calm and deep, could be obtained.

[0049] In this disclosure, lightness L* refers to the lightness value in the L*a*b* color space defined by the CIE (Commission Internationale d'Eclairage; International Commission on Illumination). An L* value of "0" represents the lightness of an object that does not reflect light at all (completely absorbs light), while an L* value of "100" represents the lightness value of white, which completely reflects light. Chroma C* is an index of color vividness, and is expressed as the distance between the point indicated by a* and b* and the achromatic origin, as shown in the following equation (6):

[0050]

number

[0051] [Table 1]

[0052] [Example 2] In Example 2, a light-reflecting layer was formed on the surface of the substrate under four conditions as shown in Table 2. As shown in Table 2, in Examples 2-1 and 2-4, the third layer was formed of aluminum oxide by the ALD method, in Example 2-2, the third layer was formed of silicon nitride by the ALD method, and in Example 2-3, the third layer was formed of titanium oxide. As a result, the refractive index of the third layer was 1.7 to 2.7. In Examples 2-1 to 2-4, the first layer was formed of silicon oxide by the thermal oxidation method, and the second layer was formed of silicon by the low-pressure CVD method. In Table 2, the thickness of the first layer includes a manufacturing error of ±5 nm, the thickness of the second layer includes a manufacturing error of ±3 nm, and the thickness of the third layer includes a manufacturing error of ±5 nm.

[0053] The results suggest that in Examples 2-1 to 2-4, the hue could be controlled to a green range, the lightness L* to 65.0±10.0, the a* to -65.0±10.0, and the b* to 50.0±10.0. In other words, it was suggested that by forming the third layer by the ALD method, a watch component with a green hue and a lightness L* of 65.0±10.0, which is calm and deep, could be obtained.

[0054] [Table 2]

[0055] [Example 3] In Example 2, a light-reflecting layer was formed on the surface of the substrate under three conditions as shown in Table 3. As shown in Table 3, in Examples 3-1 and 3-3, the third layer was formed of aluminum oxide by ALD, and in Example 3-2, the third layer was formed of aluminum nitride by ALD. As a result, the refractive index of the third layer was 1.7 to 2.0. In Examples 3-1 to 3-3, the first layer was formed of silicon oxide by thermal oxidation, and the second layer was formed of silicon by low-pressure CVD. In Table 3, the thickness of the first layer includes a manufacturing error of ±5 nm, the thickness of the second layer includes a manufacturing error of ±3 nm, and the thickness of the third layer includes a manufacturing error of ±5 nm.

[0056] The results suggest that in Examples 3-1 to 3-3, the hue could be controlled to yellow, the lightness L* to 80.0±10.0, a* to -5.0±10.0, and b* to 83.0±10.0. In other words, it was suggested that by forming the third layer by the ALD method, a watch component with a yellow hue and a lightness L* of 80.0±10.0, which is calm and deep, could be obtained.

[0057] In this manner, in the present disclosure, by forming the third layer from a material with a refractive index of 1.7 to 2.7, it is possible to control the lightness L* to 45.0±10.0 for red hue, 65.0±10.0 for green hue, and 80.0±10.0 for yellow hue, thereby achieving a calm, deep color with the desired hue.

[0058] [Table 3]

[0059] [Variations] The present disclosure is not limited to the above-described embodiments, and includes modifications, improvements, etc. within the scope of achieving the object of the present disclosure. In the above-described embodiment, the timepiece component was configured as the escape wheel portion 100, but is not limited to this. For example, the timepiece component of the present disclosure may be configured as a part housed inside the case, such as a barrel, a pinion, an escape wheel, an anchor, a balance, and a mainspring.

[0060] The escape wheel portion 100 according to the above-described embodiment may have a transparent antifouling layer or antistatic layer on the outermost surface, as long as the decorativeness is not impaired. This provides the escape wheel portion 100 with an antifouling function or an antistatic function. Furthermore, in the manufacturing method of the escape wheel portion 100 according to the above-described embodiment, any desired process can be added as needed. For example, intermediate treatment such as cleaning can be performed between each process.

[0061] Summary of this disclosure The timepiece component of the present disclosure has a shape as a timepiece component, and comprises a substrate primarily composed of silicon, and a light-reflecting layer laminated on the substrate, the light-reflecting layer having a first layer, a second layer, and a third layer laminated in that order from the side closest to the substrate, the first layer being formed using silicon oxide, the second layer being formed using silicon, and the third layer being formed using a material with a refractive index of 1.7 to 2.7. In the present disclosure, the third layer is formed using a material with a refractive index of 1.7 to 2.7, which reduces the difference in refractive index between the second layer, which is formed using silicon, and the third layer, thereby achieving a watch component with a subdued, deep color. Furthermore, when a third layer is stacked on a second layer formed using silicon by thermal oxidation, the thickness of the silicon layer of the second layer 14 and the third layer 16 varies from one manufacturing process to another due to the crystallinity and density of the silicon layer of the second layer. This makes it difficult to control the color to the desired hue. In response to this problem, the present disclosure forms the third layer using the ALD method. Therefore, the thickness of the second layer 14 does not change, and the color can be easily controlled to a desired hue. Furthermore, since the first layer formed using silicon oxide is laminated on the substrate, the durability of the substrate can be increased.

[0062] In the timepiece component of the present disclosure, in the L*a*b* color space defined by the CIE, L*=45.0±10, a*=60.0±10, and b*=40.0±10. This allows for the production of watch components with a red hue and a lightness L* of 45.0±10.0, giving the watch components a calm and deep color.

[0063] In the timepiece component of the present disclosure, the third layer may be formed using any one of aluminum oxide, aluminum nitride, silicon nitride, titanium oxide, and hafnium oxide. This allows the refractive index of the third layer at a wavelength of 632.8 nm to be 1.7 to 2.7.

[0064] In the watch component of the present disclosure, the third layer may be formed using aluminum oxide, the thickness of the first layer may be 162±5 nm, the thickness of the second layer may be 108±3 nm, and the thickness of the third layer may be 66±5 nm. This allows for the production of watch components with a red hue and a lightness L* of 45.0±10.0, giving the watch components a calm and deep color.

[0065] In the watch component of the present disclosure, the third layer may be formed using silicon nitride, the thickness of the first layer may be 170±5 nm, the thickness of the second layer may be 107±3 nm, and the thickness of the third layer may be 55±5 nm. This allows for the production of watch components with a red hue and a lightness L* of 45.0±10.0, giving the watch components a calm and deep color.

[0066] In the watch component of the present disclosure, the third layer may be formed using aluminum nitride, the thickness of the first layer may be 350±5 nm, the thickness of the second layer may be 105±3 nm, and the thickness of the third layer may be 55±5 nm. This allows for the production of watch components with a red hue and a lightness L* of 45.0±10.0, giving the watch components a calm and deep color.

[0067] In the timepiece component of the present disclosure, in the L*a*b* color space defined by CIE, L*=65.0±10, a*=-65.0±10, and b*=50.0±10. This allows for the production of watch components with a green hue and a lightness L* of 65.0±10.0, giving the watch components a calm and deep color.

[0068] In the watch component of the present disclosure, the third layer may be formed using aluminum oxide, the thickness of the first layer may be 450±5 nm, the thickness of the second layer may be 85±3 nm, and the thickness of the third layer may be 51±5 nm. This allows for the production of watch components with a green hue and a lightness L* of 65.0±10.0, giving the watch components a calm and deep color.

[0069] In the watch component of the present disclosure, the third layer may be formed using silicon nitride, the thickness of the first layer may be 450±5 nm, the thickness of the second layer may be 80±3 nm, and the thickness of the third layer may be 55±5 nm. This allows for the production of watch components with a green hue and a lightness L* of 65.0±10.0, giving the watch components a calm and deep color.

[0070] In the watch component of the present disclosure, the third layer may be formed using titanium oxide, the thickness of the first layer may be 430±5 nm, the thickness of the second layer may be 79±3 nm, and the thickness of the third layer may be 36±5 nm. This allows for the production of watch components with a green hue and a lightness L* of 65.0±10.0, giving the watch components a calm and deep color.

[0071] In the timepiece component of the present disclosure, in the L*a*b* color space defined by the CIE, L*=80.0±10, a*=-5.0±10, and b*=83.0±10. This allows for the production of watch components with a yellow hue and a lightness L* of 80.0±10.0, giving the watch components a calm and deep color.

[0072] In the watch component of the present disclosure, the third layer may be formed using aluminum oxide, the thickness of the first layer may be 295±5 nm, the thickness of the second layer may be 38±3 nm, and the thickness of the third layer may be 60±5 nm. This allows for the production of watch components with a yellow hue and a lightness L* of 80.0±10.0, giving the watch components a calm and deep color.

[0073] In the watch component of the present disclosure, the third layer may be formed using aluminum nitride, the thickness of the first layer may be 295±5 nm, the thickness of the second layer may be 83±3 nm, and the thickness of the third layer may be 54±5 nm. This allows for the production of watch components with a yellow hue and a lightness L* of 80.0±10.0, giving the watch components a calm and deep color.

[0074] The timepiece of the present disclosure is characterized by including the timepiece component described above. [Explanation of symbols]

[0075] 1...watch, 3...dial, 5...exterior case, 6...crystal (cover material), 7...crown, 8...base material, 8A...first surface, 8B...second surface, 8C...third surface, 8D...fourth surface, 10...light-reflective layer, 12...first layer, 13...balance cock, 14...second layer, 16...third layer, 21...barrel, 27...balance wheel, 28...pallet fork, 29...hairspring, 35...back cover, 40...movement, 44A...hour hand, 44B...minute hand, 44C...power reserve hand, 44D...small second, 45...wheel train, 46... Frame material, 48A...window, 48B...window, 50...automatic winding mechanism, 51...fourth wheel, 52...transmission wheel, 60...manual winding mechanism, 61...crowned wheel, 62...single-ring transmission wheel, 63...crowned wheel, 70...governor, 80...escapement, 100...escape wheel portion (watch component), 101...escape wheel, 102...shaft member, 110...insertion portion, 111...rim portion, 112...tooth portion, 113...first retaining portion, 113A...contact portion, 114...second retaining portion, 114A...first portion, 114B...second portion, 114C...contact portion, 115...retaining portion.

Claims

1. a base material having a shape suitable for a watch component and containing silicon as a main component; a light-reflecting layer laminated on the base material, the light reflecting layer has a first layer, a second layer, and a third layer stacked in this order from the side closest to the base material, the first layer is formed using silicon oxide; the second layer is formed using silicon; The third layer is formed using a material having a refractive index of 1.7 to 2.

7. A watch component characterized by:

2. The timepiece component according to claim 1, In the L*a*b* color space defined by CIE, L*=45.0±10, a*=60.0±10, b*=40.0±10 A watch component characterized by:

3. The timepiece component according to claim 1, The third layer is formed using any one of aluminum oxide, aluminum nitride, silicon nitride, titanium oxide, and hafnium oxide. A watch component characterized by:

4. The timepiece component according to claim 1, the third layer is formed using aluminum oxide; The thickness of the first layer is 162±5 nm; The thickness of the second layer is 108±3 nm, The thickness of the third layer is 66±5 nm. A watch component characterized by:

5. The timepiece component according to claim 1, the third layer is formed using silicon nitride; The thickness of the first layer is 170±5 nm; The thickness of the second layer is 107±3 nm, The thickness of the third layer is 55±5 nm. A watch component characterized by:

6. The timepiece component according to claim 1, the third layer is formed using aluminum nitride, The thickness of the first layer is 350±5 nm; The thickness of the second layer is 105±3 nm, The thickness of the third layer is 55±5 nm. A watch component characterized by:

7. The timepiece component according to claim 1, In the L*a*b* color space defined by CIE, L*=65.0±10, a*=-65.0±10, b*=50.0±10 A watch component characterized by:

8. The timepiece component according to claim 1, the third layer is formed using aluminum oxide; the thickness of the first layer is 450±5 nm; the second layer has a thickness of 85±3 nm; The thickness of the third layer is 51±5 nm. A watch component characterized by:

9. The timepiece component according to claim 1, the third layer is formed using silicon nitride; the thickness of the first layer is 450±5 nm; the second layer has a thickness of 80±3 nm; The thickness of the third layer is 55±5 nm. A watch component characterized by:

10. The timepiece component according to claim 1, the third layer is formed using titanium oxide, The thickness of the first layer is 430±5 nm; The thickness of the second layer is 79±3 nm, The thickness of the third layer is 36±5 nm. A watch component characterized by:

11. The timepiece component according to claim 1, In the L*a*b* color space defined by the CIE, L*=80.0±10, a*=-5.0±10, b*=83.0±10 A watch component characterized by:

12. The timepiece component according to claim 1, the third layer is formed using aluminum oxide; The thickness of the first layer is 295±5 nm; the second layer has a thickness of 38±3 nm; The thickness of the third layer is 60±5 nm. A watch component characterized by:

13. The timepiece component according to claim 1, the third layer is formed using aluminum nitride, The thickness of the first layer is 295±5 nm; The thickness of the second layer is 83±3 nm, The thickness of the third layer is 54±5 nm. A watch component characterized by:

14. A watch component according to any one of claims 1 to 13 is provided. A watch characterized by

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