System, setup, unit and method for beam profile correction

Abstract

A correction setup including an array 2500 of correction units 320, each correction unit being arranged and configured to pass the light of the input light beam IB onto a corresponding input surface IS1 of the correction unit, reducing the excess of that light from a first effective aperture of the input surface, and modifying the beam profile of the input light beam to form an intermediate light beam IMB having a beam profile with a higher illumination distribution factor than that of the input light beam. The output surface IS2 of the correction unit, which is arranged at a distance D from the input surface, is configured and arranged such that the intermediate light beam is increased in the illumination cover area of the output surface and the excess from a second effective aperture of the output surface is reduced as it passes through the output surface. Each input beam can be made parallel 311, 2400 before impinging on the input surface of the corresponding correction unit.

Description

Technical Field

[0001] The present disclosure generally relates to optical systems, setups, and methods for modifying the beam profile of one or more optical beams, and more particularly to modifying the beam profile of an optical beam to improve the far-field performance of a coherent beam combining system.

Background Art

[0002] Beam shaping is typically defined as the modification of the spatial profile of an optical beam. The spatial profile of an optical beam (also referred to as the "beam profile") can typically be defined as the spatial distribution of the intensity / power / energy of the optical beam across a plane that is transverse (i.e., perpendicular) to the propagation path of the optical beam.

[0003] Multi-channel systems such as beam combining systems are typically designed to combine multiple optical beams emitted from multiple light sources (in this case, the positions of the light sources are defined as the output ends of the fibers), such as one or more laser diodes, guided through, for example, a number of laser fibers, into a single far-field (FF: far field) "composite beam". The FF performance of the composite beam can include the FF energy / intensity spatial distribution, and in particular, can depend on the near-field (NF: near field) beam profile where the optical beams are combined.

[0004] In beam combining systems such as CBC systems that use input optical beams of the same / similar wavelength, the beam combining performance is typically related to the FF energy / intensity distribution of the composite beam. However, the optimal beam combining performance corresponds to the minimum FF spatial energy distribution (achieving a single spot in the FF cross-section with the minimum achievable spot size) and the maximum energy concentration (in particular, the minimum energy loss that can depend on the maximum constructive interference of the input beams at the FF distance). These composite beam performance / quality metrics are typically referred to as "power in the bucket" (PIB).

[0005] The near-field (NF) distance range or zone can be defined as the range of distances from the light source position that is greater than a threshold number F0 equal to or close to 1 in Fresnel number, and the far-field (FF) distance range can be defined as the range of distances where the Fresnel number of the beam is less than the threshold F0, provided that the Fresnel number is F = (a 2 / Lλ) is a dimensional parameter defined by.

[0006] In the above equation, "a" is the size of the effective aperture of the beam (the size or width of the effective aperture diameter), "L" is the distance between the light source and the cross-section of the object where the Fresnel number is measured, and "λ" (lambda) is the wavelength of the beam.

[0007] The above estimated value of the FF threshold is usually used as an approximation and is more accurate when the distance from the light source is significantly greater than the aperture size "a".

Summary of the Invention

[0008] Aspects of the disclosed embodiments can relate to a correction setup for modifying the beam profiles of a number of coherent input light beams, the correction setup comprising at least an array of correction units, each correction unit comprising at least passing the corresponding input surface of the correction unit to the light of the corresponding input light beam so as to reduce the excess of the light of the corresponding input light beam from the first effective aperture of the corresponding input surface, modifying the beam profile of the corresponding input light beam to form an intermediate light beam having an intermediate beam profile with a higher illumination inclusion factor than that of the corresponding input light beam, the output surface of the corresponding correction unit having a second effective aperture is arranged at a distance D from the input surface of the corresponding correction unit such that the corresponding intermediate light beam is increased in the illumination cover area of the corresponding output surface and the excess from the corresponding second effective aperture of the corresponding output surface is reduced and passes through the corresponding output surface, Output a number of modified output optical beams that reduce beam overlap and increase the illumination inclusion area in the near-field (NF) cross-section. Comprises an array of modification units arranged and configured to be as such.

[0009] Another aspect of the disclosed embodiments relates to a method of modifying the beam profiles of a number of coherent input optical beams, the method comprising at least Providing an array of modification units, each modification unit having an input surface with a first effective aperture and an output surface with a second effective aperture, each output surface being arranged at a distance D from the corresponding input surface of its modification unit, providing an array of modification units. Passing the light of each input optical beam through the corresponding input surface of the corresponding modification unit so as to reduce the excess of the light of the corresponding input optical beam from the corresponding first effective aperture of the corresponding input surface. Modifying the beam profile of each input optical beam to form an array of intermediate optical beams, each intermediate optical beam having an intermediate beam profile with a higher illumination inclusion factor than that of its corresponding input optical beam of the intermediate optical beam, each intermediate optical beam being such that the intermediate optical beam is increased in the illumination cover area of the corresponding output surface and the excess from the corresponding second effective aperture of the corresponding output surface is reduced and passed through the corresponding output surface, forming an array of intermediate optical beams passed from the input surface to the output surface of the corresponding modification unit, and Outputting a number of modified output optical beams that reduce beam overlap and increase the illumination inclusion area in the near-field (NF) cross-section. Including.

[0010] Another aspect of the disclosed embodiments relates to a modification unit for modifying the beam profile of an input optical beam, the modification unit comprising at least An input light beam is passed through its input surface so as to reduce the excess of the light of the corresponding input light beam from the first effective aperture of the corresponding input surface, and the beam profile of the passed input light beam is modified to form an intermediate light beam having an intermediate beam profile with a higher illumination inclusion factor than that of the corresponding input light beam, and a first optical mask configured and arranged; An intermediate light beam is increased in the illumination cover area and the excess from the second effective aperture is reduced and is arranged at a distance D from the input surface of the corresponding correction unit so as to pass through the output surface of the second optical mask, and a second optical mask having an output surface with a second effective aperture; Comprising.

[0011] Still other aspects of the disclosed embodiments relate to a method of modifying the beam profile of an input light beam, the method comprising at least: Providing at least one correction unit having an input surface with a first effective aperture and an output surface with a second effective aperture, each output surface being arranged at a distance D from the corresponding input surface of its correction unit; Passing the corresponding input surface of each correction unit for the light of each input light beam so as to reduce the excess of the light of the corresponding input light beam from the corresponding first effective aperture of the corresponding input surface; Modifying the beam profile of each input light beam to form a corresponding intermediate light beam having an intermediate beam profile with a higher illumination inclusion factor than that of the corresponding input light beam of that input light beam, each intermediate light beam being increased in the illumination cover area and the excess from the corresponding second effective aperture of the corresponding output surface being reduced and passed through the corresponding output surface, and passing the corresponding intermediate light beam from the input surface to the output surface of the corresponding correction unit; and Outputting a number of corrected output light beams with reduced beam overlap and increased illumination inclusion area in the near field (NF) cross section Including.

[0012] The figures generally illustrate, but do not limit, various examples discussed in this document.

[0013] The number of elements shown in the figures should in no way be construed as limiting, but is for illustrative purposes only.

[0014] For simplicity and clarity of illustration, the elements shown in the figures are not necessarily drawn to scale. For example, the dimensions of some of the elements may be exaggerated relative to other elements for clarity of presentation. Further, reference numerals may be repeated among the figures to indicate corresponding or similar elements. References to elements presented previously are implied without necessarily further referring to the drawing or description in which those elements appear.

Brief Description of the Drawings

[0015]

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DETAILED DESCRIPTION OF THE INVENTION

[0016] Aspects of the disclosed embodiments are generally directed to minimizing natural and unwanted diffraction effects that frequently occur due to limited aperture dimensions, particularly when using diffraction-limited light beams.

[0017] Passing a beam of light (also referred to herein as a "light beam" or "beam") through an aperture typically implies an optical truncation of the "tail" of the beam in the "near field plane" (NFP) that affects both NFP losses and far-field plane (FFP) divergence. By applying the disclosed embodiments' setups, methods, systems, and / or subsystems to Gaussian ("diffraction-limited") incident (input) beams, the truncation effects are reduced, particularly but not limited to, achieving improved FFP bucket power (PIB) beam quality performance for embodiments involving beam combining of multiple input beams.

[0018] For high-performance optical systems, it is necessary to consider the diffraction effects on the beam along the beam path, particularly when high input beam energy is required. For example, in the case of a perfect "single mode" (SM) beam, the intensity beam profile at the NFP is

Number

[0019] In the above equation, σ beam is the Gaussian beam radius defined as the radius of a circle at which the intensity drops to e -2 (13.5%) of its maximum value at the center of the beam. The FFP angular distribution IFF-beam(θ) and the angular diameter θdiv are

Number

[0020] In the above formula, θ div is the circumferential angle, e -2 is the far-field plane (FFP) divergence in. A beam = 2σ beam is the beam near-field diameter. The above formula is given for a "perfect" or "ideal" Gaussian beam.

[0021] The term "perfect / ideal Gaussian shape" relates to a beam without or with substantially no restrictions due to any aperture size / width / diameter. However, in the case of a real physical aperture, the laser beam passing through the aperture is no longer "perfect / ideal" in that sense.

[0022] According to the physical law of diffraction, for a given physical aperture of size (e.g., width / diameter) A1, if it has a Gaussian beam profile with power P beam passing through this aperture, there is a trade-off between the actual divergence of the output beam (output from the aperture) and the amount of beam power blocked by the aperture. For example, if the inventors choose to use a narrow Gaussian beam (σbeam-1 << A) to minimize power loss, the divergence of this beam is usually greater than the magnitude that the beam divergence would be if the inventors had chosen a wider input beam σbeam-2 > σbeam-1.

[0023] FIG. 1A shows, for example, an initial input optical beam IB1 that emanates from the output end of an optical fiber 10 and is collimated by a collimator 11 to have a Gaussian beam profile and a beam width BW1 greater than the aperture width AW1 (AW1 < BW1) when passing through an aperture 12 with an aperture width AW1. In this case, the input beam IB1 is truncated at the edges by the aperture, and the resulting output optical beam FFOB1 that occurs at the far-field (FF) plane position will have a beam profile that includes a main lobe or central lobe and one or more ripple lobes surrounding this lobe. As a result, the energy / power FF spatial distribution of the original input beam spreads (is dispersed) over a much larger region of the FF cross-section, and / or the energy within the central lobe becomes much lower than the total initial input beam IB1 power, resulting in an increased divergence of the FF output beam FFOB1, as well as / or a dramatic power loss and a low FF PIB. The larger the portion where the edges of the input beam IB1 are truncated, the greater the large ripples and power / energy losses will be caused.

[0024] FIG. 1B shows a different case, where the initial input optical beam IB2 emanates from the output end of an optical fiber 20, is collimated by a collimator 21, and has a beam width BW2 smaller than the aperture width AW2 (AW2 > BW2) when passing through an aperture 22 with an aperture width AW2. In this case, the input beam IB2 is not truncated at the edges by the aperture, and the resulting output optical beam FFOB2 that is brought about at the far-field (FF) plane position will have a beam profile that includes a single main lobe without ripples or a lobe with much smaller (lower energy) and / or a lower number of ripples. However, the diameter / width of FFOB2 is too wide for some embodiments, and as a result, the energy is spread (dispersed) over too large a region of the transverse FF plane, resulting in too low a PIB.

[0025] Using either of the cases shown in FIGS. 1A and 1B results in significant power loss and beam divergence in both the NF plane and the FF plane, reaching a minimum total power loss of approximately 13% of the initial total beam power of the input beam in some cases.

[0026] Furthermore, when using a multi-channel system such as a coherent beam combining (CBC) system for combining a number of input optical beams having the same or similar wavelengths, in this system, each of the input beams is passed through different one or more optical elements presenting a limited aperture per input beam, and the FF performance of the combined optical beam can undergo a dramatic increase in beam divergence and / or power loss of the combined beam in a transverse FFP.

[0027] Aspects of the disclosed embodiments relate to optical setups, methods, systems, and subsystems designed to improve or optimize the far-field (FF) performance of single or multiple optical beams by enabling reduction of diffraction effects in the near-field (NF).

[0028] Aspects of the disclosed embodiments relate to a correction setup for modifying the beam profiles of a number of coherent input optical beams, the correction setup can include at least an array of correction units, and each correction unit includes at least passing the corresponding input surface of the correction unit for the light of the corresponding input optical beam so as to reduce the excess of the light of the corresponding input optical beam from a first effective aperture of the corresponding input surface, modifying the beam profile of the corresponding input optical beam to form an intermediate optical beam having an intermediate beam profile with a higher illumination inclusion coefficient than that of the corresponding input optical beam, the output surface of the corresponding correction unit having a second effective aperture is arranged at a distance D from the input surface of the corresponding correction unit such that the corresponding intermediate optical beam passes through the corresponding output surface with an increase in the illumination cover region and a reduction in the excess from the corresponding second effective aperture of the corresponding output surface, outputting a number of corrected output optical beams with reduced beam overlap and increased illumination inclusion region in a near-field (NF) cross-section and arranged and configured as such.

[0029] The term "illumination distribution coefficient" as referred to herein the filling rate of the light beam, or a parameter inversely proportional to the spatial intensity / energy dispersion of the light beam can be defined. This means that the higher the lighting distribution coefficient, the lower the energy / intensity spatial dispersion of the light beam.

[0030] One object of the proposed embodiments is to achieve beam modification of each input light beam that increases the lighting distribution coefficient of the light beam and thus reduces the original energy / intensity spatial dispersion of the light beam.

[0031] To modify each input light beam so as to increase the lighting distribution coefficient of that light beam, the modification unit can be configured to form an intermediate light beam having a flat-top beam profile, a flat-top annular ring profile, a semi-super Gaussian profile having an M-shaped cross-section, or a super Gaussian profile.

[0032] According to some embodiments, the output surface of the corresponding modification unit can be arranged at a distance D from the input surface of the corresponding modification unit such that the light of the corresponding intermediate light beam is passed through the corresponding output surface so as to reduce / prevent / minimize the excess of the light of the corresponding intermediate light beam from the output (second effective) aperture edge of the output surface. Each modification unit of the modification setup can be further configured to output a corresponding output light beam with a higher lighting distribution coefficient radiating symmetry that corresponds to the size of the second effective aperture of the output surface of the corresponding modification unit and that is optionally parallel within the NF. This makes it possible to improve the FF beam combining performance, such as the value / ratio of the higher in-bucket power (PIB), in the NF by minimizing / reducing / eliminating the overlap between them (for adapting the intermediate and output beams to the second effective aperture edges of their corresponding modification units) and maximizing / increasing the effective illumination area per output light beam for an array of output light beams (output from the modification setup).

[0033] In some embodiments, each of the input optical beams can have a Gaussian beam profile or a semi / pseudo-Gaussian beam profile of a first Gaussian order GO1, such as a Bessel function profile having one or more ripples (side rings) consisting of significantly lower total energy / power than that of the full Gaussian profile or of the main lobe of the input beam.

[0034] According to some embodiments, each modification unit of the modification setup can be configured to convert each input optical beam of a Gaussian / semi-Gaussian beam profile of a first Gaussian order GO1 (defined by the spatial energy distribution and / or the peripheral slope of the optical beam) into an output optical beam of a Gaussian / semi-Gaussian beam profile of a higher Gaussian order GO2 (e.g., GO2 is at least 4 orders higher than GO1, i.e., having a much higher spatial energy distribution and a much higher beam profile peripheral slope).

[0035] According to other embodiments, each modification unit of the modification setup can be configured to convert each input optical beam of a Gaussian / semi-Gaussian beam profile of a first Gaussian order GO1 into an M-shaped beam profile cross-section, such as a peak profile having an inner energy-decreasing central lobe or an inner central extreme / minimum energy / intensity peak (examples are shown in detail below).

[0036] According to some embodiments, the input surface of each modification unit can include a first optical mask, such as a first phase mask and / or a first diffraction mask, configured to modify the phase space distribution of the incident input optical beam.

[0037] According to some embodiments, the output surface of each modification unit can optionally include a second optical mask, such as a second phase / diffraction mask, to further modify the spatial phase distribution of the corresponding intermediate optical beam, for example, to parallelize the intermediate optical beam impinging on or passing through it.

[0038] According to some embodiments, the first effective aperture of each modification unit can be defined as the aperture of the first optical mask.

[0039] Additionally or alternatively, the second effective aperture of each modification unit can be defined as the aperture of the second optical mask of the modification unit or the overall size of the fragment including the output surface of the corresponding modification unit.

[0040] According to some embodiments, any one or more of the input optical beam, the intermediate optical beam, and / or the output optical beam can have rotational symmetry.

[0041] According to some embodiments, either the first optical mask and / or the second optical mask can be rotationally symmetric and can define a rotationally symmetric first effective aperture and / or second effective aperture.

[0042] The size and / or shape of the first effective aperture can be made equivalent (the same) to the size and / or shape of the second effective aperture of each modification unit of the modification setup.

[0043] Aspects of the disclosed embodiments relate to a modification setup for modifying the beam profiles of a number of coherent input optical beams, the modification setup can include an array of modification units, each modification unit is arranged and configured to modify the beam profile of each incident input optical beam having an initial beam profile that is Gaussian / semi-Gaussian of the first Gaussian order G01, and thus the corresponding input optical beam is modified to an output optical beam having a Gaussian or semi-Gaussian beam profile of a second Gaussian order GO2 that is higher than the first Gaussian order GO1 of the beam profile of the corresponding input optical beam.

[0044] As used herein, the term "modification" or "beam modification", or any combination of these terms, can relate to any type of operation of an optical beam, including one or more of beam shaping, beam collimation, spatial expansion / convergence of the beam, wavefront manipulation, manipulation of the beam phase distribution, manipulation of the beam intensity / energy spatial distribution, etc.

[0045] According to some embodiments, the modification setup can be configured such that the output optical beam output from the modification setup has minimum overlap and maximum spatial energy distribution between the output optical beams in a near-field (NF) plane transverse to the propagation path of the output optical beam.

[0046] According to some embodiments, to achieve the NF minimum overlap and maximum spatial energy distribution of the output beams output within the NFP, the modification unit of the (optical) modification setup is a first array (FA: first array) comprising a plurality of first modification segments, wherein each first modification segment of the FA is arranged to have a different incident input optical beam passed through that modification segment, and thus the spatial energy distribution of the initial beam profile of the corresponding input optical beam is maximally dispersed over the entire surface area of the effective aperture A1 of the corresponding first modification segment of the FA, resulting in a minimum clipping of the ends of the corresponding input optical beam, and the corresponding first modification segment is further configured to modify the corresponding input optical beam to form an intermediate optical beam having a Gaussian beam profile with a second Gaussian order GO2 higher than the first Gaussian order GO1 of the corresponding input optical beam when the intermediate optical beam reaches a specific formation distance "d" from the output surface of the first modification segment, a first array (FA); A second array (SA) comprising a plurality of second modification segments, each second modification segment of the SA being arranged at a distance D of at least a formation distance "d" from the corresponding first modification segment, and thus the intermediate light beam, the spatial energy distribution of the intermediate light beam of the intermediate light beam profile, being maximally dispersed with a minimum cut-off of the end of the intermediate light beam by the corresponding second effective aperture A2 over the entire surface area of the effective aperture A2 of the corresponding second modification segment of the SA, passes through the second modification segment, and each second modification segment is configured to modify the corresponding intermediate light beam such that it outputs a collimated output light beam of a Gaussian output beam profile of a second Gaussian order GO2, the second array (SA) and can include.

[0047] According to some embodiments, the effective apertures of the first modification segment and / or the second modification segment may not have rotational symmetry and, in fact, may be polygons or semi-polygons such as squares, rectangles, hexagons, etc. Since all of the input / intermediate / output beams have rotational symmetry within the NF plane(s), the modification segments are arranged such that each of the input / intermediate beams passed through the segment impinges on the input surface of the segment with a minimum or no cut-off of the end of the beam at the edge (effective aperture) of the modification segment in the maximum intensity / energy distribution of the beam.

[0048] The embodiments described herein aim to mitigate at least the following typical problems occurring in single-channel or multi-channel systems, namely, 1. NF and / or FF power / energy losses occur because the periphery of the beam is blocked by a finite physical aperture (NFP), and / or 2. The divergence of the output beam(s) caused by a sudden beam "cut" / "clipping" is increased (diffraction effect or FFP "ripple")

[0049] ​The results of these actions can both be reduced simultaneously by converting the input optical beam(s) such that the beam profile of each input optical beam is passed through at least one optical mask having no NFP blocking loss or sudden amplitude step along the beam profile or having a limited effective aperture that can be ignored, while the energy distribution of the input beam is mostly (maximally) dispersed and confined within the input region of the input surface of the optical mask having the limited aperture A1, thereby reducing both the influence of power and the influence of dispersion.

[0050] The terms "optical beam(s)" and "beam(s)" can be used interchangeably herein in relation to any electromagnetic beam(s).

[0051] The term "power-in-bucket" (PIB) as used herein can refer to the ratio between the energy distributions / concentrations across the area of the transverse FF plane such that the optimal PIB is the PIB of the maximum energy / power / intensity that is dispersed across the entire minimum FF plane area.

[0052] The term "beam profile" represents the spatial energy / power / intensity distribution.

[0053] Referring now to FIG. 2, which schematically shows an optical setup 200 using a modified setup 210 having a collimator 211 and a modification unit 220 according to some embodiments.

[0054] The optical setup 200 includes an optical fiber 201 that outputs an input optical beam in a narrow wavelength band that peaks at a specific known wavelength λ (lambda), and a correction setup 210 that includes a collimator 211 and a correction unit 220. The collimator 211 is arranged between a light source (defined as the output end of the optical fiber 201) and the correction unit 220 such that the input optical beam that impinges on the input surface IS of the correction unit 220 is collimated. The input optical beam IB that impinges on the input surface IS of the correction unit 220 can have a beam profile with rotational symmetry, such as a Gaussian beam profile of a first Gaussian order G01, such as order 1 or order 2.

[0055] According to some embodiments, the correction unit 220 is arranged and configured to convert / correct / shape the input optical beam IB so as to output an output optical beam OB having a beam profile with a maximum spatial energy distribution (e.g., maximally spatially distributed with a uniform energy distribution over a specific desired confined region bounded by the final effective aperture FEA). For example, the correction unit 220 can convert / correct an input optical beam IB having a Gaussian beam profile of a first order GO1 into an output beam having a Gaussian beam profile of a second Gaussian order GO2 that is significantly higher than the first Gaussian order GO1 of the input optical beam IB, e.g., an output optical beam that is a super Gaussian (SG) with a Gaussian order greater than GO = 4.

[0056] According to some embodiments, the final effective aperture FEA can be the aperture of the output surface OS of the correction unit 220 itself, and / or any final aperture defined by other elements and / or requirements of the optical setup or the system in which the optical setup is used thereby. For example, if the correction unit 220 is part of an array of correction units used in a coherent beam combining (CBC) system, the final effective aperture FEA is defined by the boundary between adjacent output optical beams in the NF plane, in which case the final effective aperture FEA should be defined such that the output beams do not overlap in the NF plane.

[0057] According to some embodiments, the modification unit 220 is arranged such that, for example, with respect to the position of the collimator 211 and the spatial energy distribution of the input beam, when the input beam passes through the collimator 211, all or the maximum achievable energy / light of the input optical beam IB is passed through the input aperture of the input surface IS of the modification unit 220 in such a way as to (to the extent possible) prevent the energy / light of the input beam IB from exceeding the boundary (input aperture IA) of the input surface IS.

[0058] The optical setup 200 described above provides an output optical beam OB of light that is optimally spatially distributed throughout the region outlined by the final effective aperture FEA in the NF plane, while being maximally confined within that region (i.e., with minimal or no overlap with adjacent final effective apertures FEA), which enables the realization of an optimal / improved PIB of the FF optical output beam FFOB resulting from the NF output optical beam OB, and the FF output beam FFOB will have a beam profile with a maximized spatial energy concentration and minimized energy loss from the initial energy of the input optical beam IB.

[0059] To convert an input optical beam having a Gaussian beam profile with a low first Gaussian order GO1 of the correction unit into an output optical beam having a Gaussian profile with a second (e.g., much) higher Gaussian order GO2, for example, into a super-Gaussian shape, the correction unit can use two diffractive segments, namely, a first diffractive segment arranged and functioning as the inner surface of the correction unit and a second diffractive segment arranged and functioning as the outer surface of the correction unit. Thus, the input beam will pass through the first correction segment and then through the second correction segment. The first correction segment and the second correction segment can be implemented as two separate optical elements (such as diffractive optical elements (DOEs)) or as an optical mask embossed or engraved on the entire (e.g., parallel) sides of both sides of a single monolithic piece. In that case, the first correction segment is embossed / engraved on the entire input side of the correction unit, and the second correction segment is embossed / engraved on the entire output side of the correction unit.

[0060] The optical setup 200 can further include one or more additional optical elements, such as an additional collimator or focusing lens 203, for further manipulating the output beam OB within the NF region.

[0061] FIG. 3 shows an exemplary embodiment of an optical setup 300 using a correction setup 310 having a correction unit 320 that uses two separated and discrete DOEs 321 and 322 to correct the input beam IB.

[0062] The optical setup 300 includes at least a correction setup 310 including a correction unit 320 and a collimator 311, an optical fiber 301 that outputs light from its output end forming the initial input optical beam IB, and one or more additional optical elements, for example, for collimation, focusing, and / or correction of the additional output beam and includes.

[0063] According to some embodiments, the modification unit 320 includes two diffractive optical elements that are parallel and optically aligned with the input optical beam IB, namely, a first DOE 321 and a second DOE 322.

[0064] The collimator 311 of the modification setup 310 can be used to prevent the input optical beam IB from spatially spreading and to generate a parallel input optical beam IB having a planar (flat) wavefront before the input optical beam IB enters / collides with the first DOE 321 of the modification unit 320. The first DOE 321 is arranged such that when the parallel input optical beam IB collides with the input surface IS1 of the first DOE 321, the IB is not or minimally cut off by the adjacent apertures of the first DOE 321.

[0065] The first DOE 321 includes a phase mask (e.g., embossed / engraved across the input side of the DOE 321) designed to spatially vary the phase of the input optical beam IB to convert the input optical beam IB into an intermediate optical beam IMB that gradually changes into an intermediate optical beam IMB having a Gaussian or semi-Gaussian beam profile with an increased Gaussian order GO2 of the overall wavefront of the IB as the IB propagates away from the output surface of the first DOE 321 when the optical beam reaches or exceeds the formation distance "d" required for the optical beam to develop into an intermediate optical beam with a higher (e.g., superior) Gaussian beam profile. Thus, the first DOE 321 and the second DOE 322 can be arranged at a distance D from each other, and the distance D can be made equal to or greater than the formation distance "d" required to create an intermediate optical beam IMB with a Gaussian beam profile of the second (higher) Gaussian order GO2 at a distance D from the first DOE 321.

[0066] The formation distance "d" depends on the wavelength (WL) (or peak wavelength) λ (lambda) of the input optical beam IB and the first aperture A1 of the first optical mask, and A1 2 / λ can be proportional.

[0067] According to some embodiments, the intermediate light beam IMB is also expanded as the IMB propagates from the first DOE 321 to the second DOE 322.

[0068] According to some embodiments, the second DOE 322 may include a second phase mask (e.g., embossed / engraved across its entire input side) arranged and configured to further modify the intermediate light beam IMB to output a parallel output light beam OB having a Gaussian beam profile and a planar wavefront of a second (higher) Gaussian order GO2 > GO1 in the NF plane.

[0069] To achieve a Gaussian output light beam OB in the NF region having a beam profile of a higher second Gaussian order GO2 and being parallel and having a planar wavefront, the position of the second DOE 322 should also be such that the intermediate light beam IMB impinges on the inner surface IS2 of the second DOE 322 and the light of the intermediate light beam IMB is uniformly and maximally spatially dispersed across the entire input surface region IS2 of the second DOE 322, thereby preventing the light from exceeding the adjacent apertures of the second DOE 322. Further, the second DOE 322 may include a phase mask designed to make the intermediate light beam IMB parallel and can reverse / interrupt at least a portion of the spatial phase conversion performed by the first DOE 321 to achieve a planar wavefront.

[0070] The output surface region OS2 of the output surface of the second DOE 322 can coincide with the input surface IS2 of the second DOE 322.

[0071] According to some embodiments, the input and output surfaces of the first DOE 321 and the second DOE 322 can all be made equivalent.

[0072] According to other embodiments, the input surface IS1 and the output surface OS1 of the first DOE 321 can each be made smaller than either the input surface IS2 or the output surface OS2 of the second DOE 322.

[0073] Referring now to FIG. 4, which schematically shows a multi-channel optical setup 400 for CBC of a number of coherent light beams according to some embodiments.

[0074] The multi-channel optical setup 400 can include at least a fiber array 401 including N optical fibers each outputting an input light beam of wavelength WLλ (lambda), and a multi-channel modification setup 410, which can include a collimation array (CA) 411 having at least an array of N collimators, and a modification array 420 having N modification units, the modification array 420 being arranged after the collimation array 411 with respect to the beam propagation direction.

[0075] According to some embodiments, the modification array 420 can include two segmented arrays, namely, (i) a first array (FA) 421 including at least N first modification segments, each first modification segment (FMS: first modification segment) including a first optical (e.g., diffractive / phase) mask, and the FMSs of the FA being arranged adjacent to each other in a tightly packed tile-like pattern, the first array (FA) 421, and a second array (SA) 422 including at least N second modification segments, each second modification segment (SMS: second modification segment) including a second optical (e.g., phase / diffractive) mask, and the SMSs of the SA being arranged adjacent to each other in a tightly packed tile-like pattern, the second array (SA) 422 can be included.

[0076] According to some embodiments, each FMS of the FA 421 is separated from the corresponding SMS of the SA 422 by the same distance D, the distance D being equal to or greater than the formation distance “d” (which depends on the WLλ of the input light beam).

[0077] Each FMS of FA421 is designed and arranged to have the maximum light of the corresponding incident input optical beam to be passed through that FMS (e.g., preventing the clipping of the corresponding input optical beam or resulting in the minimum clipping of the corresponding input optical beam). Each FMS can be configured to modify the corresponding input optical beam to form an intermediate optical beam having a Gaussian beam profile with a second Gaussian order GO2 higher than the first Gaussian order GO1 of the corresponding input optical beam when the corresponding intermediate optical beam reaches a specific formation distance "d" from the outer surface of the corresponding FMS.

[0078] Each SMS of SA422 can be arranged such that, for the corresponding FMS of FA421, when the spatial energy distribution of the corresponding intermediate optical beam of the intermediate beam profile of the corresponding intermediate optical beam is maximally dispersed (e.g., as uniformly dispersed as possible) by the minimum clipping of the corresponding intermediate optical beam by the corresponding second effective aperture A2 of the corresponding SMS of SA422 over the entire surface area of the corresponding SMS where the spatial energy distribution of the corresponding intermediate optical beam is bounded by the corresponding effective aperture A2, the corresponding intermediate optical beam passes through that SMS. Each SMS can be configured to modify the corresponding intermediate optical beam to output a parallel output optical beam having a planar (flat) wavefront and a Gaussian output beam profile with a second Gaussian order GO2.

[0079] The above-described configuration of the optical setup 400 aims to enable improving at least the FF PIB performance (beam quality) of the resulting composite optical beam (the FF composite beam shown as FFCOB in FIG. 4) in the FF region and reducing the energy losses in NF and FF.

[0080] The resulting group (referred to herein as the NF composite optical beam) of output optical beams consisting of Gaussian beam profiles with a second Gaussian order GO2 is optimally output with a minimum overlap and a maximum filling area between the output optical beams and parallel to each other.

[0081] The input / intermediate / output optical beams can be arranged within the NF in any desired formation such as the formation of a hexagon (shown in FIGS. 7A and 7B), the formation of concentric rings, matrix formation, etc.

[0082] To further improve the FF performance of the composite optical beam FFCOB output for the CBC system in the CBC system, one or more additional subsystems / devices / elements are, for example, (i) At least one additional optical element arranged within the FF after the NF or the modified array 420 to reduce the defects in the FF beam performance caused, for example, by the intensity / power reduction gaps formed due to the radial symmetry of the output optical beam output from the modified array 420, and / or to focus or collimate the output optical beam / FF composite optical beam. (ii) A customized correction subsystem including one or more correction arrays arranged between the fiber array 401 and the collimation array 411, between the collimation array 411 and the modified array 420, or after the modified array 420, configured and arranged for reducing any one or more of the errors or aberrations caused by, for example, any one or more of the misalignment errors (misalignments) between segments composed of any two or more of the arrays 401, 411, 421, FA, SA, elements (if any), such as errors, deformations and / or defects, phase / wavefront errors, etc. (iii) One or more feedback subsystems using one or more detection means and signal / data processing means, and optionally one or more additional optical means for controllably measuring and aligning / adjusting the phase and / or polarization of the input optical beam. One or more of the above can be used.

[0083] The CBC system includes At least one array of collimators (collimation array (CA)) for collimating the input optical beam before it impinges on the modification unit of the modification setup. A phase control / locking subsystem for measuring the respective phases of the output optical beam and / or the input optical beam in real time or near real time and adjusting the phase of each input optical beam in real time or near real time based on the corresponding measured real-time or near-real-time measured phase of the optical beam. A beam operation subsystem for phased array or mechanical-based operation of a composite optical beam, i.e., one or more optical elements for combining and / or focusing the output optical beam output from a modified setup. One or more optical elements for directing light irradiated by one or more light sources into each optical fiber. A polarization control / locking subsystem for measuring the respective polarizations of the output optical beam and / or the input optical beam in real time or near real time and adjusting the polarization of each input optical beam in real time or near real time based on the corresponding measured real-time or near-real-time measured polarization of the optical beam. Other subsystems, elements and / or arrays such as can be included or used.

[0084] Figure 5 shows a single-channel optical setup 500 according to some embodiments. The optical setup 500 can include at least (a) an optical fiber 501, and (b) a single-channel monolithic modified setup 510 The single-channel monolithic modified setup 510 can include at least a collimator 511 configured as a graded-index (GRIN) collimator having both an input flat side and an output flat side and connectable / engageable (e.g., by splicing) to the output end of the optical fiber 501, a modification unit 520 including FMS 521 and SMS 522 forming a distance D therebetween and can be included.

[0085] According to the embodiment shown in FIG. 5, the collimator 511 may be connected to the correction unit 520 (e.g., patched, adhered, coupled, or monolithically formed with the correction unit 520), and the FMS 521 may be connected to the SMS 522 (e.g., patched, adhered, coupled, or monolithically formed with the SMS 522) so as to form a monolithic single-channel correction setup 510.

[0086] To realize the monolithic correction setup 510, the (flat) output side / surface of the collimator 511 may be connected / coupled to the input side / surface of the FMS 521. The FMS 521 may include a phase / diffraction mask 521a formed on or in the FMS to perform a first correction on the parallel input beam passed through the FMS. The (flat) output side / surface FMS 531 may be connected to the (flat) input side / surface of the SMS 522, and the output side / surface of the SMS 522 may have a second phase / diffraction mask 522a embossed / engraved thereon as a whole.

[0087] FIG. 6 shows a "multi-channel" optical setup 6000 for a coherent beam combining (CBC) system using a monolithic or semi-monolithic correction setup for correcting multiple coherent diffractions according to some embodiments. The optical setup 6000 can include at least (a) an optical fiber 6001, and (b) a multi-channel monolithic correction setup 6100 The multi-channel monolithic correction setup 6100 can include at least a collimation array 6110 including a number of collimation segments, each collimation segment being configurable as a graded index (GRIN) collimator, and It may include a FA6121 having a plurality of FMSs and a SA6122 having a plurality of SMSs, and a modified array 6120 that forms a distance D between the FA6121 and the SA6122.

[0088] According to the embodiment shown in FIG. 6, each collimation segment of the collimation array 6110 may be connected to the input side / surface of the corresponding FMS of the FA6121 (e.g., butt-jointed, adhered, coupled, or monolithically formed with the input side / surface), and the FA6121 may include a phase / diffraction mask 6121a formed on or in the FMS to perform a first modification on the corresponding collimated input beam passed through the FMS. The output side / surface of each FMS of the FA6121 may be connected to the input side / surface of the corresponding SMS of the SA6122, and the output side / surface of each SMS of the SA6122 may have a second phase / diffraction mask 6122a that is embossed / engraved throughout.

[0089] According to some embodiments, the phase / diffraction / optical mask of each FMS and / or SMS can be obtained by using an engraving method based on evaporation and curing. For example, at least one side of the FMS / SMS can include an anti-reflection coating, and the AR coating is evaporated to form a desired phase mask imprint (embossing / engraving).

[0090] Figures 7A and 7B show the NF energy distribution of a number of beams having a Gaussian beam profile with a first Gaussian order GO = 1 arranged in a hexagonal formation (Figure 7A), and the NF energy distribution of a number of beams having a Gaussian beam profile with a second higher Gaussian order GO = 10 (Figure 7B). The highest energy is represented in dark red, and the lowest energy is represented in dark blue. In this hexagonal formation, it is shown that the gap between adjacent light beams (i.e., the region where there is no or low energy / power / intensity) is much larger when the Gaussian order is lower than that of the beams with a higher Gaussian order. This means that, for example, using the output beam for a higher Gaussian order (preferably, an order above GO = 5) CBC enables improved PIB (minimum achievable light spot and highest intensity / power / energy of the spot) and reduced energy loss performance of the composite beam in the FF plane, as shown in Figure 7C. Figure 7C simulates the light spot resulting from the FF composite light beam of the output light beam shown in Figure 7B having a superior Gaussian-shaped beam profile with a Gaussian order GO = 10. The high FF beam performance of the composite light beam is mainly achieved by higher filling of the composite aperture Ac (in this case, a hexagonal or semi-hexagonal aperture) of the output light beam in the NF plane when using superior Gaussian conversion.

[0091] Figures 8A - 8C show the design of a first diffractive optical element / phase mask / diffractive optical element (DOE) OM1 according to some embodiments. Figure 8A shows the spatial phase distribution (phase profile) of a Gaussian input beam converted once by the first optical mask OM1 of the correction unit (near the output surface of the first optical mask). Figure 8B shows an isometric three-dimensional view of the phase distribution (phase profile) near the output surface of the first optical mask OM1. Figure 8C shows the physical embossing / etching design of the first phase mask OM1.

[0092] As shown in FIG. 8C, according to some embodiments, the design of the first optical mask OM1 can be such that the thickness alternates, with each concentric ring having a different (higher / lower) thickness than either of its adjacent rings.

[0093] FIGS. 9A-9C show the design of a second diffractive optical mask / DOE OM2 according to some embodiments. FIG. 9A shows the spatial phase distribution (phase profile) of an intermediate beam of a super-Gaussian beam profile that has been transformed once by a second phase mask of a modification unit (within the NF, near the output surface of the surface phase mask). FIG. 9B shows an isometric three-dimensional view of the phase distribution (phase profile) near the output surface of the second phase mask. FIG. 9C shows the physical embossing / etching design of the second optical mask OM2.

[0094] As shown in FIG. 9C, according to some embodiments, the design of the second optical mask OM2 can be such that the thickness of one or more outer concentric rings increases, then drops to a much lower thickness, and then the thickness of the concentric rings approaching the center gradually increases.

[0095] Either the first optical mask or the second optical mask can be designed as concentric rings that change the phase of the output light beam portion in a radially symmetric manner (referred to herein as "concentric phase change") by, for example, decreasing / increasing the phase toward the center or the main axis of the concentric ring, as seen in FIG. 10. The decrease / increase in phase between adjacent rings of the first diffractive optical mask and / or the second diffractive optical mask can be, for example, less than or equal to the absolute value of pi: |π|. To achieve such a concentric phase change, the concentric rings of the first diffractive optical mask and / or the second diffractive optical mask can be designed to have a thickness that gradually increases / decreases concentrically toward the center or the main axis of the ring, and the change in thickness between each pair of adjacent rings can be such that the total maximum thickness difference between the distal ring (relative to the center) and the proximal ring is in the range of 1 to 2 times the wavelength value of the corresponding input light beam.

[0096] FIG. 11 shows a cross-section of a superior Gaussian beam profile energy / intensity distribution realized using a simulated correction unit of some embodiments.

[0097] FIG. 12A shows a multi-channel correction setup 900 that also uses a correction array 920 to correct one or more optical aberrations of an optical beam passing through a correction setup 900 according to some embodiments. The correction segment 900 includes at least a collimation array 910 including a number of collimation segments, each collimation segment being connected to a different optical fiber of the fiber array 90, the collimation array 910; a correction array 920 including a number of correction segments, each correction segment being arranged and configured to correct one or more optical aberrations / errors caused, for example, by misalignment of the fiber and the collimation segment, manufacturing errors caused by imperfect manufacturing / fabrication of the collimation segment, etc., the correction array 920; a correction array 930 including an FA931 including a number of FMSs and an SA932 including a number of SMSs, the FA931 and the SA932 being separated from each other via a transparent body 933 connected to the FA931 on one side thereof and to the SA932 on the other (opposite) side thereof to form a distance D between the FA931 and the SA932, the correction array 930 and can include.

[0098] FIG. 12B shows a monolithic multi-channel correction setup 1000 that also uses a correction array 1200 according to some embodiments. The correction setup 900 includes at least a collimation array 1100 including a number of collimation segments, each collimation segment being connectable / spliceable to a different optical fiber of the fiber array 91, the collimation array 1100; A correction array 1200 including a plurality of correction segments, each correction segment being arranged and configured to correct, for example, one or more optical aberrations / errors caused by misalignment of a fiber and a collimation segment, manufacturing errors caused by imperfect manufacturing / fabrication of the collimation segment, etc., the correction array 1200 A correction array 1300 including a FA1310 including a plurality of FMSs and a SA1320 including a plurality of SMSs, the FA1310 and the SA1320 being monolithically connected to each other via a body 1330 that maintains a certain distance D between the FA1310 and the SA1320, the correction array 1300 can include.

[0099] According to some embodiments, as shown in FIG. 12B, the output side of the collimation array 1100 may be monolithically connected to the input side / surface of the correction array 1200, and the output side / surface of the correction array 1200 may be connected to the input side / surface of the correction array 1300.

[0100] According to some embodiments, both the correction arrays 930 and / or 1300 can be configured such that each FMS of the FA30 / 1330 of the correction array is arranged such that it has the maximum light of the corresponding input optical beam passed through the FMS, and when the intermediate optical beam reaches a specific formation distance "d" from the output surface of the first correction segment, the incident input optical beam is corrected to form an intermediate optical beam having a Gaussian beam profile with a second Gaussian order GO2 higher than the first Gaussian order GO1 of the corresponding input optical beam.

[0101] Additionally or alternatively, each SMS of SA932 / 1320 can be arranged such that, for the corresponding FMS, when the spatial energy distribution of the intermediate beam profile of the corresponding intermediate optical beam is maximally dispersed by the minimum clipping of the corresponding intermediate optical beam by the corresponding second effective aperture A2 over the entire surface area of the effective aperture A2 of the corresponding second modified segment of the SA, the corresponding intermediate optical beam passes through that SMS. Each SMS can be configured to modify the corresponding intermediate optical beam to output a parallel corresponding output optical beam having a planar wavefront and a Gaussian-shaped output beam profile of the second Gaussian order GO2.

[0102] Figure 13 shows a schematic diagram of a CBC system 2000 using a "multi-channel" modified set-up with a modified array 2500 to improve FF composite beam performance, according to some embodiments. The CBC system 2000 includes at least a light source 2001, such as a diode light source, that outputs light at a specific peak WLλ (lambda), and a first beam splitting / separating element or device, such as a first beam splitter (BS) 2002, configured and arranged to separate the original optical beam emitted from the light source 2001 to direct a portion of the radiation of that optical beam to be used as a reference optical beam ROB for measuring various beam interference-related characteristics, a second beam splitting / separating element or device, such as a second beam splitting device (BSD) 2003, used to generate N input optical beams, a fiber array 2100 comprising at least N optical fibers, each optical fiber being arranged and configured to direct a different input optical beam separately through that optical fiber, a polarization control array 2200 that may optionally include an array of polarization controllers, each polarization controller being arranged and configured for controllable adjustment of the polarization of the corresponding input optical beam, A phase control array 2300 that may include an array of phase shifters, each phase shifter being arranged and configured for controllable adjustment of the phase of a corresponding input optical beam, the phase control array 2300; A collimation array 2400 that may include an array of collimators, each collimator being arranged and configured for collimation of a corresponding input optical beam, the collimation array 2400; A correction array 2500 that may include an array of correction units, each including an FA 2510 of an FMS and an SA 2520 of an SMS, which are monolithically connected to each other, optionally via a body 2530 that maintains a required distance D therebetween, the correction array 2500; One or more correction arrays, such as a correction array 2600, arranged before and / or after the correction array 2500 with respect to the propagation direction of the input optical beam, the correction array 2600 including an array of correction segments arranged and configured to correct one or more optical errors / aberrations of the input or output optical beam due to various mechanical, inherent, and / or optical causes, such as misalignments between various elements, such as misalignments of the various arrays 2100 / 2200 / 2300 / 2400 / 2500; A main BS 2004 for propagating a respective part of the output optical beam output from the CBC system 2000 parallel to the main optical axis x and propagating another second part of each input beam parallel to a different (e.g., orthogonal) axis y; A detection array 2700 including an array of detectors, such as photodetectors, each detector being configured and arranged to detect light from different positions for measuring one or more characteristics of the interference signal of a corresponding input optical beam with a reference optical beam ROB for determining characteristics related to various performances of the CBC system 2000, the detection array 2700; A small lens array 2750 of collimators or focusing lenses, each lens of the small lens array 2750 being arranged and configured to collect light of different interference signals and direct this light towards a corresponding detector, the small lens array 2750; A main controller 2800 configured to receive updated measurement data / signals from the detection array 2700 in real time or near real time, process / analyze the received updated measurement value signals / data in real time or near real time, and control at least the phase control array 2400 and the polarization control array 2200 based on the analysis / processing results of the received updated signals / data can include.

[0103] As shown in FIG. 13, in the CBC system 2000, a reference optical beam ROB, which can have the same initial optical characteristics of the light source (i.e., at least the same peak WL λ), is directed by one or more optical means / elements such as an optical fiber or a collimation lens 2005 so as to irradiate all output optical beams output from the correction array 2500 uniformly and operably, optionally.

[0104] According to some embodiments, the illumination propagation direction of the reference optical beam ROB can be aligned with the propagation direction (parallel to the axis y) of the second portion of the output beam. The aligned (parallel) propagation directions of the output beam and the reference beam enable the interference signal intensity / pattern within the NF, which represents that each output optical beam interferes with a part of the reference optical beam ROB, to be separately measured by using the corresponding detectors from the detection array 2700. However, the output signal / data output from the corresponding detector indicates the intensity / power resulting from the interference between the corresponding output beam and the reference beam, and the interference indicates the phase difference between the reference phase (the phase of the reference beam) and the output phase (the phase of the output beam), and also indicates the polarization difference. This can be implemented in a feedback loop that enables continuous simultaneous measurement of all detectors for all N channels of the CBC system 2000 and real-time / near real-time phase / polarization correction for each input optical beam for each channel. The adjustment of the phase and / or polarization can be performed in real time, for example, by matching the phases of all channels so that all input beams have the same phase when they exit the collimation array 2400, in order to further improve the PIB performance of the FF composite optical beam.

[0105] The correction array 2500 embedded in the CBC system 2000 provides improved additional NF and FF CBC performance by preventing or reducing further energy losses and beam divergence.

[0106] According to some embodiments, as shown in FIG. 13, the CBC system 2000 can further include one or more additional optical elements, such as elements 2006 and 2007, for example, to beam shape / correct the output composite optical beam within the NF region, for example, to increase the illumination inclusion region (energy distribution) of the energy-beam profile of the composite output optical beam OB, and / or to change the beam profile shape of the composite output optical beam OB for the purpose of improving the FF performance of the composite output optical beam OB.

[0107] According to some embodiments, the CBC system 2000 can further include a phased-array beam operation subsystem that uses an array of phase modulators (modulation array 2900).

[0108] FIG. 14 shows a flow diagram of a method / process for correcting a number of input optical beams according to some embodiments. The method / process includes at least providing an array of correction units (correction array) (21), directing each input optical beam toward the input surface of the corresponding correction unit such that the energy distribution of the input optical beam is maximized within the edge of the first effective aperture of the correction unit (22), and optionally, minimizing / reducing the excess energy of the input optical beam from the corresponding first aperture edge (for example, the dimensions of the first effective aperture edge are defined by the boundary dimensions of the first optical mask through which the input beam passes), correcting each input optical beam with the first optical mask of the corresponding correction unit to form an intermediate optical beam having an illumination distribution coefficient higher than that of the corresponding input optical beam (23), Direct the intermediate light beam to exit from the output surface having the second optical mask such that the energy distribution of the intermediate light beam is maximized within the second effective aperture edge (24), and Output the corrected output light beams while minimizing / reducing the overlap between the output light beams and maximizing / increasing the spatial energy distribution of the output light beams (25). may include.

[0109] According to some embodiments, the second optical mask may be configured such that it can be used for further phase correction of the incident intermediate beam, for collimation of the intermediate light beam, and for the actual coherent beam combination (CBC) of the input light beam array by the correction unit.

[0110] According to some embodiments, the method / process may also include, before the input light beam is incident on the input surface of the correction unit, making each of the input light beams parallel, for example, using a collimation array with a number of collimators, in order to improve the reduction of energy exceeding the edge of the first effective aperture and to improve the required wavefront and / or phase distribution from the input light beam due to a specific design of the first optical mask.

[0111] According to some embodiments, the correction array is a first array (FA) comprising a number of first correction segments, each first correction segment of the FA having different incident input light beams passed through the first correction segment such that the spatial energy distribution of the initial beam profile of the corresponding input light beam is maximally dispersed over the entire surface area of the effective aperture A1 of the corresponding first correction segment of the FA, resulting in a minimum clipping of the corresponding input light beam, and the corresponding first correction segment is further configured to correct the corresponding input light beam such that when the corresponding intermediate light beam reaches a specific formation distance "d" from the corresponding output surface of the first correction segment, the intermediate light beam has a Gaussian beam profile of the second Gaussian order GO2; a first array (FA); A second array (SA) comprising a plurality of second modification segments, each second modification segment of the SA being such that the spatial energy distribution of the intermediate light beam of the intermediate beam profile of the intermediate light beam is maximally dispersed by the minimum cutout of the intermediate light beam by the corresponding second effective aperture A2 over the entire surface area of the corresponding second effective aperture A2 of the SA, and the intermediate light beam passes through its second modification segment when the distance D is equal to or greater than the formation distance "d" with respect to the corresponding first modification segment, and each second modification segment is configured to modify the corresponding intermediate light beam so as to output a parallel output light beam having a Gaussian output beam profile of the second Gaussian order GO2. Second array (SA) can include.

[0112] FIG. 15 shows a flow diagram of a method / process for modifying at least one input light beam according to some embodiments. This method / process includes at least providing at least one modification unit, for each incident input light beam and each modification unit, directing each input beam having a Gaussian profile GO1 towards the input surface IS1 of the corresponding first modification segment (FMS) such that the maximum input beam light passes through the aperture A1 of the FMS and with the minimum / reduced cutout of the input light beam (31), modifying each input beam with the FMS to generate an intermediate beam having a higher distribution coefficient than that of the input light beam, such as a superior Gaussian profile or a semi / pseudo-superior Gaussian profile with a higher Gaussian order GO2 (32), further modifying the corresponding intermediate beam with the SMS to generate an output beam having a planar wavefront and being parallel (e.g., having the same beam profile as that of the intermediate beam when reaching the SMS) (33), outputting an output light beam having a beam profile of a higher order (of Gaussian order GO2) (34) can include.

[0113] According to some embodiments, each modification unit may be configured such that the output optical beam output from the modification unit is maximally dispersed over the entire output surface region of the output surface of the modification unit in the NF plane with respect to the position of the modification unit, and moreover, has a spatial energy distribution that is maximally confined (minimally truncated by the second effective aperture) within the second effective aperture of the output surface of the modification unit.

[0114] Aspects of the disclosed embodiments relate to a modification array and / or modification unit configured to convert / modify an input optical beam having a radially symmetric beam profile (such as a Gaussian beam profile) into an output beam having a spatial distribution of improved / maximized energy / intensity with a beam profile shape that is not radially symmetric (i.e., not a Gaussian profile), for example, polygonal or semi-polygonal, and having a minimum aperture truncation.

[0115] In any case or type of modification unit that converts an input beam into an output beam having a beam profile with a maximum spatial energy distribution / higher spatial energy distribution than that of the corresponding input optical beam, the FMS of the modification unit is arranged / positioned such that the input optical beam has a maximum energy distribution on the inner or outer surface of the FMS with respect to the input optical beam, and / or the SMS is arranged and configured such that the intermediate optical beam impinges on the inner surface of the SMS when the energy distribution of the SMS fills the SMS aperture A2 maximally with a minimum energy / intensity truncation or no energy / intensity truncation of the intermediate optical beam by the aperture A2 of the SMS.

[0116] Here, three types of beam profiles, namely, (i) a super-Gaussian profile SG having a substantially wide flat top, (ii) a Gaussian profile G1 of a low order (e.g., at least 4 Gaussian orders lower than that of the super-Gaussian shape SG), and (iii) an M-shaped (semi / pseudo-super-Gaussian) cross-sectional beam profile MS having a low energy / intensity radiation-shaped depression in its central lobe Refer to FIG. 16 which schematically shows

[0117] Converting the input optical beam to an M-shaped semi-Gaussian profile instead of a standard Gaussian profile may reduce the sensitivity of the CBC system to beam size compared to conversion to a Gaussian profile, and may also increase the sensitivity of the CBC system to misalignment between the first and second optical masks of the modified array.

[0118] Example

[0119] Example 1 is a modified setup for modifying the beam profiles of a number of coherent input optical beams, the modified setup comprising at least an array of modification units, each modification unit comprising at least passing the light of the corresponding input optical beam through the corresponding input surface of the modification unit so as to reduce the excess of the light of the corresponding input optical beam from a first effective aperture of the corresponding input surface, modifying the beam profile of the corresponding input optical beam to form an intermediate optical beam having an intermediate beam profile with a lighting distribution coefficient higher than the lighting distribution coefficient of the corresponding input optical beam, and the output surface of the corresponding modification unit having a second effective aperture is arranged at a distance D from the input surface of the corresponding modification unit such that the corresponding intermediate optical beam is increased in the lighting coverage area and the excess from the corresponding second effective aperture of the corresponding output surface is reduced and passes through the corresponding output surface, arranged and configured to output a number of modified output optical beams with reduced beam overlap and increased lighting inclusion area in the near field (NF) cross section.

[0120] In Example 2, the modified setup of Example 1 can include that each modification unit comprises a first optical mask and a second optical mask arranged to form a distance D therebetween, the first effective aperture being determined by the dimensions of the first optical mask and the second effective aperture being determined by the dimensions of the second optical mask.

[0121] In Example 3, the modified setup of Example 2 can include that the first optical mask is a diffraction mask and the second optical mask is a diffraction mask with a design different from that of the first diffraction mask.

[0122] In Example 4, the modified setup of any one or more of Examples 2 to 3 can include that the first optical mask is configured to modify the corresponding input light beam by changing the phase profile of the corresponding input light beam, and the corresponding second modification segment is configured for further phase profile modification to at least create the corresponding parallel output light beam.

[0123] In Example 5, the setup of any one or more of Examples 1 to 4 can include that each of the corresponding input light beam, intermediate light beam, and output light beam has rotational symmetry.

[0124] In Example 6, the setup of any one or more of Examples 1 to 5 can include that each input light beam has a Gaussian or semi-Gaussian beam profile of the first Gaussian order GO1.

[0125] In Example 7, the modified setup of Example 6 can include that each modification unit of the modified setup modifies by converting each corresponding input light beam into a corresponding intermediate light beam having one of a Gaussian beam profile of the second Gaussian order GO2 higher than the first Gaussian order GO1 of the corresponding input light beam, an M-shaped semi-Gaussian beam profile having a cross-sectional shape including a dip in central energy reduction

[0126] In Example 8, the modified setup of Example 7 can include that the second Gaussian order GO2 of each intermediate light beam is at least 4 orders higher than the first Gaussian order GO1 of each input light beam.

[0127] ​ In Example 9, any one or more of the modification setups from Examples 1 to 8 may include that the array of modification units includes at least a first array (FA) having a large number of first modification segments, each first modification segment of the FA having a first optical mask, and a second array (SA) having a large number of second modification segments, each second modification segment of the SA having a second optical mask, and may include having.

[0128] In Example 10, any one or more of the modification setups from Examples 1 to 9 may include that each modification unit is arranged to be optically aligned with each corresponding incident input light beam.

[0129] In Example 11, any one or more of the modification setups from Examples 1 to 10 may include that the value of the distance D is higher than or equal to a distant threshold value Dth determined based on the wavelength value of the input light beam and the size of the first effective aperture.

[0130] In Example 12, any one or more of the modification setups from Examples 1 to 11 may include that each of the input light beams is directed to different input surfaces of different modification units via different optical fibers, and the position of the light source of each input light beam is the corresponding output end of the corresponding optical fiber.

[0131] In Example 13, the modification setup of Example 12 may include that each optical fiber is optically coupled, connected, or directed directly or indirectly to the corresponding input surface of the corresponding modification unit.

[0132] In Example 14, any one or more of the modification setups from Examples 1 to 13 can include that the modification setup further includes a collimation array (CA) with a number of collimators, the CA is disposed between the light source from which the input light beam emits and the input surface of the modification unit, and each collimator of the CA is configured and arranged to make the corresponding input light beam parallel before the corresponding input light beam reaches the input surface of the corresponding modification unit.

[0133] In Example 15, the modification setup of Example 14 can include that the CA is monolithically combined or coupled with the input side of the modification array such that each collimator of the CA is connected to or engages with the corresponding input surface of the corresponding modification unit.

[0134] In Example 16, any one or more of the modification setups from Examples 1 to 15 can include that all parts of the modification setup are either monolithically directly connected to each other or connected via one or more other connection elements.

[0135] In Example 17, any one or more of the modification setups from Examples 1 to 16 can include that the modification setup is embedded in a coherent beam combining (CBC) system configured to combine input light beams to improve the far field (FF) performance of the composite output beam, at least related to the in-bucket power (PIB) performance of the FF of the composite output beam.

[0136] In Example 18, the modified setup of Example 17 can include at least one of: a CBC system having one or more light sources, at least one array of optical fibers that create an input optical beam, at least one array of collimators for making the input optical beam parallel before it impinges on the modification unit of the modified setup, a phase control subsystem that measures the respective phase of the output optical beam and / or the input optical beam in real time or near real time and adjusts the phase of each input optical beam in real time or near real time based on the corresponding measured real time or near real time measured phase of that optical beam, a beam operation subsystem for phased array or mechanical based operation of the combined optical beam, one or more optical elements for combining and / or focusing the output optical beam output from the modified setup, one or more optical elements for directing the light irradiated by one or more light sources into each of the optical fibers, a polarization control subsystem that measures the respective polarization of the output optical beam and / or the input optical beam in real time or near real time and adjusts the polarization of each input optical beam in real time or near real time based on the corresponding measured real time or near real time measured polarization of that optical beam, a customized passive / active correction subsystem for correcting optical aberrations formed by the array, elements, optical fibers, and / or subsystems of the CBC system and / or by any one or more misalignments therebetween, and an active correction subsystem for actively measuring and correcting in real time or near real time optical aberrations formed by any one or more deformations of the array, elements, optical fibers, and / or subsystems of the CBC system and / or by any one or more misalignments therebetween.

[0137] Example 19 is a method for modifying the beam profile of a number of coherent input optical beams, the method comprising at least providing an array of modification units, each modification unit having an input surface with a first effective aperture and an output surface with a second effective aperture, each output surface being disposed at a distance D from the corresponding input surface of that modification unit. Passing the corresponding input surface of the optical corresponding correction unit for each input optical beam through the corresponding first effective aperture of the corresponding input surface so as to reduce the excess of the light of the corresponding input optical beam. Modifying the beam profile of each input optical beam to form an array of intermediate optical beams, each intermediate optical beam having an intermediate beam profile with an illumination distribution coefficient higher than that of the corresponding input optical beam of the intermediate optical beam, and each intermediate optical beam being passed from the input surface to the output surface of the corresponding correction unit such that the intermediate optical beam is increased in the illumination coverage area and the excess from the corresponding second effective aperture of the corresponding output surface is decreased to pass through the corresponding output surface, and Outputting a number of corrected output optical beams with reduced beam overlap and increased illumination inclusion area in the near-field (NF) cross-section including.

[0138] In Example 20, the method of Example 19 can include that each of the input optical beam, the intermediate optical beam, and the output optical beam has rotational symmetry, and the beam profile of each output optical beam is the same as or similar to that of the corresponding intermediate optical beam of the output optical beam.

[0139] In Example 21, the method of Example 20 can include that each input optical beam consists of a Gaussian or semi-Gaussian beam profile of a first Gaussian order GO1, and each correction unit is configured to convert each input optical beam into an intermediate optical beam having a Gaussian or semi-Gaussian beam profile of a Gaussian order GO2 higher than the first Gaussian order GO1, or one of the beam profiles of an M-shaped cross-section.

[0140] In Example 22, the method of any one or more of Examples 19 to 21 can include that each input optical beam is collimated by a collimator before being incident on the corresponding input surface of the corresponding correction unit.

[0141] Example 23 is a correction unit for modifying the beam profile of an input optical beam, and the correction unit includes at least a first optical mask configured and arranged to pass the input optical beam through an input surface of a correction unit so as to reduce an excess of light of the corresponding input optical beam from a first effective aperture of a corresponding input surface, and to correct a beam profile of the passed input optical beam to form an intermediate optical beam having an intermediate beam profile having an illumination distribution coefficient higher than an illumination distribution coefficient of the corresponding input optical beam, and a second optical mask having an output surface with a second effective aperture, arranged at a distance D from the input surface of the corresponding correction unit such that the intermediate optical beam is increased in an illumination cover area and an excess from the second effective aperture is decreased and passes through the output surface of the second optical mask, comprising.

[0142] In Example 24, the correction unit of Example 23 can include that the first optical mask is a diffraction mask and the second optical mask is a diffraction mask with a design different from that of the first diffraction mask.

[0143] In Example 25, one or more correction units from Example 23 to 24 can include that the first optical mask is configured to correct the input optical beam by changing a phase profile of the input optical beam, and the corresponding second correction mask is configured for further phase profile correction to produce at least a parallel output optical beam.

[0144] In Example 26, one or more correction units from Example 23 to 25 can include that each of the input optical beam, the intermediate optical beam, and the output optical beam has rotational symmetry.

[0145] In Example 27, one or more correction units from Example 23 to 26 can include that the input optical beam has a Gaussian or semi-Gaussian beam profile of a first Gaussian order GO1.

[0146] In Example 28, the modification unit of Example 27 can include that the modification unit modifies the input optical beam by converting the input optical beam into a corresponding intermediate optical beam having one of a Gaussian beam profile with a second Gaussian order GO2 higher than the first Gaussian order GO1 of the corresponding input optical beam and an M-shaped semi-Gaussian beam profile having a cross-sectional shape including a central energy drop.

[0147] In Example 29, the modification unit of Example 28 can include that the second Gaussian order GO2 of each intermediate optical beam is at least 4 orders higher than the first Gaussian order GO1 of each input optical beam.

[0148] In Example 30, one or more modification units from Examples 23 to 29 can include that the value of the distance D is higher than or equal to a remote threshold Dth determined based on the wavelength value of the input optical beam and the size of the first effective aperture.

[0149] In Example 31, one or more modification units from Examples 23 to 30 can include that the modification unit further includes a collimator disposed between the light source from which the input optical beam is emitted and the input surface of the first optical mask, and the collimator is configured and arranged to collimate the corresponding input optical beam before the corresponding input optical beam reaches the input surface of the first optical mask.

[0150] In Example 32, the modification unit of Example 31 can include that the collimator is monolithically combined or coupled to the input side of the modification unit such that the collimator is connected or engaged with the input surface of the optical mask.

[0151] In Example 33, one or more modification units from Examples 23 to 32 can include that all parts of the modification unit are either monolithically directly connected to each other or connected via one or more other connection elements.

[0152] Example 34 is a method for modifying the beam profile of an input optical beam, the method comprising at least providing at least one modification unit having an input surface with a first effective aperture and an output surface with a second effective aperture, each output surface being arranged at a distance D from the corresponding input surface of its modification unit; passing the light of each input optical beam through the corresponding input surface of the corresponding modification unit so as to reduce the excess of the light of the corresponding input optical beam from the corresponding first effective aperture of the corresponding input surface; modifying the beam profile of each input optical beam to form a corresponding intermediate optical beam having an intermediate beam profile with an illumination distribution coefficient higher than that of the corresponding input optical beam of the input optical beam, each intermediate optical beam being passed from the input surface to the output surface of the corresponding modification unit such that the intermediate optical beam is increased in the illumination coverage area and the excess from the corresponding second effective aperture of the corresponding output surface is reduced to pass through the corresponding output surface, and outputting a number of modified output optical beams with reduced beam overlap and increased illumination inclusion area in the near-field (NF) cross-section including.

[0153] In Example 35, the modification unit of Example 34 can include that each of the input optical beam, the intermediate optical beam and the output optical beam is rotationally symmetric, and the beam profile of each output optical beam is the same as or similar to that of the corresponding intermediate optical beam of the output optical beam.

[0154] In Example 36, the modification unit of Example 35 can include that each input optical beam consists of a Gaussian or semi-Gaussian beam profile of a first Gaussian order GO1, and each modification unit is configured to convert each input optical beam into an intermediate optical beam having a Gaussian or semi-Gaussian beam profile of a Gaussian order GO2 higher than the first Gaussian order GO1, or one of a beam profile with an M-shaped cross-section.

[0155] In Example 37, any one or more of the modification units from Examples 34 to 36 can include that each input optical beam is collimated by a collimator before being incident on the corresponding input surface of the corresponding modification unit.

[0156] The above description discloses a limited number of exemplary embodiments of the present invention, but these embodiments should not be construed as imposing any limitations on the scope of the present invention. Rather, they should be regarded as examples of some of the ways in which the present invention can be implemented.

[0157] Each part of the system and / or method described above can be implemented via a computer-readable medium that requires computer-executable instructions, rules, conditions, memory, etc., from programmable hardware and / or software-based means, executable modules, etc., and thus can be regarded as including / using a "dedicated computer".

[0158] The methods / processes and / or systems / devices / subsystems / apparatuses, etc., disclosed in the above specification should not be strictly limited to the flowcharts, block diagrams, and / or graphs provided in the drawings.

[0159] Terms used in the singular may also include the plural, unless explicitly stated otherwise.

[0160] In the specification and claims of this application, the verbs "comprise", "include", and "have", and their cognates, are used to indicate that the described component(s) and / or process / method include(s) / have(s) / comprise(s) at least one of the components / steps / features, etc., listed, and / or at least the components / steps / features, etc., listed.

Claims

1. A modification setup for correcting the beam profiles of multiple coherent light beams, comprising at least, (i) An array of modification units, each modification unit comprising an input surface having a first effective opening and an output surface having a second effective opening, wherein the input surface and the output surface are arranged at a distance D from each other, and each modification unit comprises at least, The beam profile of the input light beam is modified to form an intermediate light beam having an intermediate beam profile with a higher illumination distribution coefficient than the corresponding input light beam, and so the corresponding intermediate light beam is amplified in the illumination cover region of the corresponding output surface, and the excess light of the light beam from the corresponding second effective aperture of the corresponding output surface is reduced as it passes through the corresponding output surface. It outputs multiple modified power beams that reduce beam overlap and increase the illumination coverage area in the near-field (NF) cross-section. An array of modification units arranged and configured in such a manner, (ii) A collimation array (CA) comprising an array of collimators, wherein each collimator of the CA is configured and positioned to make a corresponding input light beam parallel to the corresponding input light beam before it reaches the input surface of the corresponding modification unit, and each collimator of the CA is positioned to allow the light of the corresponding parallel input light beam to pass through the corresponding input surface of the modification unit in such a way that the excess of the light of the corresponding parallel input light beam from the first effective aperture of the corresponding input surface is reduced. A modified setup that includes the necessary modifications.

2. The modification setup according to claim 1, wherein each modification unit comprises a first optical mask and a second optical mask arranged to form a distance D between them, the first effective aperture being determined by the dimensions of the first optical mask and the second effective aperture being determined by the dimensions of the second optical mask.

3. The modified setup according to claim 2, wherein the first optical mask is a diffraction mask, and the second optical mask is a diffraction mask with a different design from that of the first diffraction mask.

4. The modification setup according to claim 2, wherein the first optical mask is configured to modify a corresponding input light beam by changing the phase profile of the corresponding input light beam, and the corresponding second modification segment is configured for at least further phase profile modification to produce a corresponding parallel output light beam.

5. The modified setup according to claim 1, wherein each of the corresponding input light beam, the intermediate light beam, and the output light beam has radiative symmetry.

6. The modified setup according to claim 1, wherein each of the input light beams has a Gaussian or semi-Gaussian beam profile of a first Gaussian order GO1.

7. Each correction unit in the aforementioned correction setup controls each corresponding input light beam. A Gaussian beam profile of the corresponding input optical beam having a second Gaussian order GO2 that is higher than the first Gaussian order GO1, M-shaped semi-Gaussian beam profile with a cross-sectional shape including a central energy drop-off depression. The modification setup according to claim 6, configured to be modified by converting to a corresponding intermediate light beam having one of the following characteristics.

8. The modified setup according to claim 7, wherein the second Gaussian order GO2 of each intermediate light beam is at least four orders higher than the first Gaussian order GO1 of each input light beam.

9. The array of the modification units comprises at least, A first array (FA) having a number of first modification segments, wherein each first modification segment of the FA comprises a first optical mask, and A second array (SA) comprising a number of second modification segments, wherein each second modification segment of the SA comprises a second optical mask. The modified setup according to claim 1, comprising:

10. The modification setup according to claim 1, wherein each modification unit is positioned to be optically aligned with each corresponding incident input light beam.

11. The modified setup according to claim 1, wherein the value of the distance D is higher than or equal to the remote threshold Dth, which is determined based on the wavelength of the input light beam and the size of the first effective aperture.

12. The modification setup according to claim 1, wherein each of the input optical beams is directed to a different input surface of a different modification unit via a different optical fiber, and the position of the light source for each input optical beam is the corresponding output end of the corresponding optical fiber.

13. The modification setup according to claim 12, wherein each optical fiber is optically coupled, connected, or directed directly or indirectly to the corresponding input surface of the corresponding modification unit.

14. The modification setup according to claim 1, wherein the CA is monolithically combined or coupled with the input side of the modification array such that each collimator of the CA is connected to or engages with the corresponding input surface of the corresponding modification unit.

15. The modified setup according to claim 1, wherein at least some parts of the modified setup are combined or connected to one another.

16. The modified setup according to any one of claims 1 to 15, wherein the modified setup is embedded in a coherent beam coupling (CBC) system configured to couple the input optical beams to reduce energy loss and / or to improve the far-field (FF) performance of the composite output beam, at least in relation to the FF in-bucket power (PIB) performance of the composite output beam.

17. The aforementioned CBC system One or more light sources, At least one array of optical fibers that produce the input light beam, A phase control subsystem for measuring the phase of the output light beam and / or the input light beam in real time or near real time, and for adjusting the phase of each input light beam in real time or near real time based on the corresponding measured real-time or near-real-time phase of the light beams. A beam manipulation subsystem for the phased array or machine-based operation of the composite light beam, One or more optical elements for coupling and / or focusing the output light beam output from the modified setup, One or more optical elements for directing light irradiated by one or more of the aforementioned light sources into each of the optical fibers, A polarization control subsystem for measuring the polarization of the output light beam and / or the input light beam in real time or near real time, and adjusting the polarization of each input light beam in real time or near real time based on the corresponding measured real-time or near-real-time polarization of the light beams. A customized passive / active correction subsystem for correcting optical aberrations formed by the array, elements, optical fibers, and / or subsystems of the CBC system and / or by any one or more misalignments between them. An active correction subsystem for actively measuring and correcting optical aberrations formed by any one or more deformations of the array, elements, optical fibers, and / or subsystems of the CBC system, and / or by any one or more misalignments between them, in real time or near real time. A modified setup according to claim 16, further comprising at least one of the following.

18. A method for modifying the beam profiles of multiple coherent light beams, wherein at least, To provide an array of modification units, wherein each modification unit has an input surface having a first effective opening and an output surface having a second effective opening, and each output surface is positioned at a distance D from the corresponding input surface of the modification unit. To provide a collimation array (CA) comprising an array of collimators positioned in front of the array of correction units, Each input light beam is made parallel by the corresponding collimator of the CA, so as to make the light of each input light beam parallel before it is incident on the corresponding input surface of the CA of the corresponding correction unit of the CA. The method involves modifying the beam profile of each incident parallel input light beam to form an array of intermediate light beams, wherein each intermediate light beam has an intermediate beam profile having a higher illumination distribution coefficient than the corresponding parallel input light beam, and each intermediate light beam is passed from the input surface to the output surface of the corresponding modification unit such that the intermediate light beam is amplified in the illumination cover area of ​​the corresponding output surface, and the excess of light from the intermediate light beam from the corresponding second effective aperture of the corresponding output surface is reduced as it passes through the corresponding output surface, and the array of intermediate light beams is formed such that the intermediate light beam is amplified in the illumination cover area of ​​the corresponding output surface, and the excess of light from the intermediate light beam from the corresponding second effective aperture of the corresponding output surface is reduced as it passes through the corresponding output surface, and To output multiple modified output light beams that reduce beam overlap and increase the illumination coverage area in the near-field (NF) cross-section. Includes, A method in which each collimator of the CA is positioned with respect to the input surface of the corresponding correction unit such that the light of the corresponding parallel input light beam passes through the corresponding input surface of the correction unit in such a manner that the excess of the light of the corresponding parallel input light beam from the first effective aperture of the corresponding input surface is reduced.

19. The method according to claim 18, wherein the input light beam, the intermediate light beam, and the output light beam are each radiatively symmetric, and the beam profile of each output light beam is the same as or identical to that of the corresponding intermediate light beam of the output light beam.

20. The method according to claim 19, wherein each input optical beam consists of a Gaussian or semi-Gaussian beam profile of a first Gaussian order GO1, and each modification unit is configured to convert each input optical beam into an intermediate optical beam having either a Gaussian or semi-Gaussian beam profile of a higher Gaussian order GO2 than the first Gaussian order GO1, or an M-shaped cross-section beam profile.

21. A coherent beam coupling (CBC) system, wherein at least, Multiple optical fibers configured to output light from multiple input optical beams of similar or the same wavelength or wavelength range, A collimation array (CA) comprising an array of collimators, wherein each collimator is arranged and configured to parallelize different input light beams, The correction array is an array of correction units and Each modification unit is equipped with, (i) A first optical mask configured and positioned to modify the beam profile of an incident parallel input light beam to form an intermediate light beam having an intermediate beam profile with an illumination distribution coefficient higher than that of the corresponding input light beam, (ii) A second optical mask having an output surface having a second effective aperture, wherein the intermediate light beam is amplified in the illumination cover region and the excess from the second effective aperture is reduced as it passes through the output surface of the second optical mask, the second optical mask being positioned at a distance D from the input surface of the corresponding modification unit Equipped with, Each collimator of the CA is configured and positioned to make the corresponding input light beam parallel to the corresponding input light beam before it reaches the input surface of the corresponding correction unit. A coherent beam coupling system in which each collimator of the CA is positioned with respect to the input surface of the corresponding correction unit such that the light of the corresponding parallel input optical beam passes through the corresponding input surface of the correction unit in a manner that reduces the excess of the light of the corresponding parallel input optical beam from the first effective aperture of the corresponding input surface.

22. The CBC system according to claim 21, wherein the first optical mask is a diffraction mask, and the second optical mask is a diffraction mask with a different design from the first diffraction mask.

23. The CBC system according to claim 21, wherein the first optical mask is configured to modify the input light beam by changing the phase profile of the input light beam, and the corresponding second modification mask is configured for further phase profile modification such as to produce a parallel output light beam.

24. The CBC system according to claim 21, wherein each of the input light beam, the intermediate light beam, and the output light beam has radiative symmetry.

25. The CBC system according to claim 21, wherein the input light beam has a Gaussian or semi-Gaussian beam profile of a first Gaussian order GO1.

26. The aforementioned input light beam, A Gaussian beam profile of the corresponding input optical beam having a second Gaussian order GO2 that is higher than the first Gaussian order GO1, An M-shaped semi-Gaussian beam profile with a cross-sectional shape including a central energy drop-off depression and The CBC system according to claim 25, configured to modify the input light beam by converting it into a corresponding intermediate light beam having one of the following characteristics.

27. The CBC system according to claim 26, wherein the second Gaussian order GO2 of each intermediate light beam is at least four orders higher than the first Gaussian order GO1 of each input light beam.

28. The CBC system according to claim 21, wherein the value of distance D is higher than or equal to the remote threshold Dth, which is determined based on the wavelength of the input light beam and the size of the first effective aperture.

29. The CBC system according to claim 21, wherein each collimator of the CA is monolithically assembled or coupled to the input side of the correction unit such that the collimator is connected to or engages with the input surface of the optical mask.

30. The CBC system according to any one of claims 21 to 29, wherein all parts of the modification unit are either monolithically connected directly to one another or connected via one or more other connecting elements.

31. A method for modifying the beam profile of an input optical beam for a coherent beam coupling (CBC) system, wherein at least, To provide at least one modification unit having an input surface having a first effective opening and an output surface having a second effective opening, wherein each output surface is positioned at a distance D from the corresponding input surface of the modification unit. To provide a collimation array (CA) comprising an array of collimators, wherein each collimator of the CA is configured and positioned to parallel a corresponding input light beam before the corresponding input light beam reaches the input surface of the corresponding correction unit. To direct each light beam onto the corresponding input surface of the corresponding correction unit in such a way as to reduce the excess light from the edge of the first effective aperture of the corresponding input surface, the corresponding collimator of the CA makes each input light beam parallel. The beam profile of each input light beam is modified to form a corresponding intermediate light beam having an intermediate beam profile having a higher illumination distribution coefficient than the illumination distribution coefficient of the corresponding input light beam, wherein each intermediate light beam is passed from the input surface to the output surface of the corresponding modification unit such that the intermediate light beam is increased in the illumination cover region of the corresponding output surface, and the excess from the corresponding second effective aperture of the corresponding output surface is reduced as it passes through the corresponding output surface, and To output a composite optical beam that includes all of the multiple modified output optical beams, which reduce beam overlap directed in the parallel propagation direction in the near-field (NF) region and increase the illumination coverage area. Methods that include...

32. The method according to claim 31, wherein the input light beam, the intermediate light beam, and the output light beam are each radiatively symmetric, and the beam profile of each output light beam is the same as or identical to that of the corresponding intermediate light beam of the output light beam.

33. The method according to claim 32, wherein each input optical beam consists of a Gaussian or semi-Gaussian beam profile of a first Gaussian order GO1, and each modification unit is configured to convert each input optical beam into an intermediate optical beam having either a Gaussian or semi-Gaussian beam profile of a higher Gaussian order GO2 than the first Gaussian order GO1, or an M-shaped cross-section beam profile.

Images