Composition

Abstract

Alkali-soluble material-containing composition, cured film, and method for producing the same.

Description

【Technical Field】 【0001】 The present invention relates to a composition containing an alkali-soluble material. The present invention also relates to a method for producing a cured film using the same, a cured film formed therefrom, an optical conversion device including the cured film, and a display device including the optical conversion device. 【Background Art】 【0002】 A black matrix for a color filter used in a color display device is formed by mixing a light-shielding black pigment such as carbon black and an alkali-soluble resin to form a resist composition, applying this, exposing and developing it, and patterning it. The black matrix is used, for example, in a liquid crystal display element to prevent light leakage between non-switching pixels and maintain high contrast. In addition, in amorphous silicon and oxide semiconductors, leakage current due to photoexcitation occurs when light hits, so the black matrix layer suppresses the leakage current by blocking light from reaching the thin film transistor portion (Patent Document 1). 【0003】 A photosensitive colored resin composition for forming a partition wall containing a fluorine atom-containing resin having a crosslinking group as a liquid repellent has been proposed (Patent Document 2). In recent years, compositions considering environmental impact have been demanded. For example, fluorine-containing compounds such as perfluoroalkyl substances (PFASs) may cause environmental pollution, and it is required to reduce the blending amount. 【Prior Art Documents】 【Patent Documents】 【0004】 【Patent Document 1】 Japanese Patent Application Laid-Open No. 2018-203599 【Patent Document 2】 Japanese Patent No. 6885518 【Summary of the Invention】 【Problems to be Solved by the Invention】 【0005】 Surprisingly, the inventors have found that there are one or more significant problems that desire improvement as listed below. Providing a composition capable of forming a cured film having oil-repellent properties on the upper part and oil-attracting properties on the lower part; Providing a patternable composition for creating a bank that shows oil-repellent properties at the bank top and oil-attracting properties at the bank bottom; Preferably, after the bank is created, providing a patternable composition that shows oil-repellent properties at the bank top and oil-attracting properties at the bank bottom and on the side surface of the bank at the opening; Providing a bank that shows oil-attracting properties with respect to ink at the bank opening, preferably capable of filling the bank opening with ink without gaps, and shows oil-repellent properties with respect to ink at the bank top, preferably capable of preferably repelling ink at the bank top, and / or providing a patternable composition for forming the bank. Preferably, the above ink is a quantum dot ink, more preferably, the above ink is an acrylic monomer-containing ink, and even more preferably, the above ink does not contain a solvent; Providing a patternable composition that cures under lower temperature conditions than conventional compositions; Providing a composition containing a pigment that does not adversely affect patterning, preferably the pigment is a black pigment; Providing a composition capable of patterning with high resolution; Providing a composition capable of achieving a thicker film as a partition material for a display device; Preferably, providing a composition containing a black pigment capable of achieving a thicker film as a partition material for a display device; Providing a composition considering environmental impact; Providing a composition that can be developed with a low-concentration alkaline developer other than an organic developer considering environmental impact. 【Means for Solving the Problems】 【0006】 As a result of intensive studies by the inventors, (I) An alkali-soluble material, and (II) A fluorine-containing compound having a crosslinking group A composition comprising: A composition in which the mass ratio of the content of the (II) component to the content of the (I) component ((II) / (I)) is 0.0000005 to 0.01 has been found. 【0007】 In another aspect, the present invention relates to A step of applying the above composition to a substrate to form a coating film, A step of heating the coating film and a method for producing a cured film comprising the same. 【0008】 In another aspect, the present invention relates to a cured film produced or producible by the above method. 【0009】 In another aspect, the present invention relates to A cured film comprising a polymer derived from an alkali-soluble material and a fluorine-containing compound having a crosslinking group. 【0010】 In another aspect, the present invention relates to an optical conversion device comprising the above cured film. 【0011】 In another aspect, the present invention relates to a display device comprising the above cured film or the above optical conversion device. [Advantages of the Invention] 【0012】 According to the present invention, it is possible to obtain one or more of the following effects. Providing a composition capable of forming a cured film having oil repellency on the upper part and oleophilicity on the lower part; Providing a patternable composition for creating a bank that shows oil repellency at the top of the bank and oleophilicity at the bottom of the bank; Preferably, after the formation of the bank, a patternable composition is provided which exhibits oil repellency at the top of the bank and lipophilicity at the bottom of the bank and on the side surfaces of the bank at the opening; Providing a bank that exhibits lipophilicity with respect to ink at the bank opening, preferably capable of filling the ink without gaps at the bank opening, and exhibiting oil repellency with respect to ink at the top of the bank, preferably capable of preferably repelling the ink well at the top of the bank, and / or providing a patternable composition for forming the bank. Preferably, the ink is a quantum dot-containing ink, more preferably, the ink is an acrylic monomer-containing ink, and even more preferably, the ink does not contain a solvent; Providing a patternable composition that cures under lower temperature conditions than conventional compositions; Providing a composition containing a pigment that does not adversely affect patterning, preferably the pigment is a black pigment; Providing a composition that takes environmental impact into consideration. 【Embodiments for Carrying Out the Invention】 【0013】 Further advantages of the present invention will become apparent from the following detailed description. However, the above summary and the following details are for explaining the present invention and do not limit the invention of the claims. 【0014】 [Definitions] In this specification, unless otherwise specified, symbols, units, abbreviations, and terms shall have the following meanings. In this specification, unless otherwise specified and mentioned, the singular form includes the plural form, and "one" and "the" mean "at least one". In this specification, unless otherwise mentioned, the elements of a certain concept can be expressed by multiple types, and when the amount thereof (for example, mass% or mol%) is described, the amount means the sum of those multiple types. "And / or" includes all combinations of elements and also includes use alone. 【0015】 In this specification, when a numerical range is indicated using ~ or -, these include both endpoints and the units are common. For example, 5~25 mol% means 5 mol% or more and 25 mol% or less. 【0016】 In this specification, (meth)acrylate means acrylate, methacrylate, or a mixture of acrylate and methacrylate according to common general knowledge. In this specification, monomer means a single monomer and refers to something that can form a polymer (including oligomers) by reacting with other monomers. In this specification, the polymer may be in the form of an oligomer. The mass average molecular weight of the polymer is not particularly limited, but is preferably 1,000~100,000, and more preferably 2,000~30,000. Here, the mass average molecular weight is the styrene-equivalent mass average molecular weight by gel permeation chromatography. 【0017】 In this specification, alkyl means a group obtained by removing any one hydrogen from a linear or branched saturated hydrocarbon, including linear alkyl and branched alkyl. Cycloalkyl means a group obtained by excluding one hydrogen from a saturated hydrocarbon containing a cyclic structure, and optionally includes a linear or branched alkyl as a side chain in the cyclic structure. 【0018】 In this specification, aryl means a group obtained by removing any one hydrogen from an aromatic hydrocarbon. Alkylene means a group obtained by removing any two hydrogens from a linear or branched saturated hydrocarbon. Arylene means a hydrocarbon group obtained by removing any two hydrogens from an aromatic hydrocarbon. 【0019】 In this specification, "C x~y ", "C x ~C y " and "C x " and the like indicate the number of carbons in a molecule or substituent. For example, C 1~6Alkyl means an alkyl having 1 to 6 carbons (such as methyl, ethyl, propyl, butyl, pentyl, hexyl, etc.). Further, the fluoroalkyl as used herein means a compound in which one or more hydrogens in the alkyl are replaced by fluorine, and fluoroaryl means a compound in which one or more hydrogens in the aryl are replaced by fluorine. 【0020】 In this specification, when a polymer has a plurality of types of repeating units, these repeating units copolymerize. These copolymerizations are any one of alternating copolymerization, random copolymerization, block copolymerization, graft copolymerization, or a mixture thereof. In this specification, % represents mass %, and the ratio represents a mass ratio. 【0021】 In this specification, the unit of temperature uses Celsius. For example, 20 degrees means 20 degrees Celsius. The additive refers to the compound itself having its function (for example, in the case of a base generator, the compound itself that generates a base). There may also be a form in which the compound is dissolved or dispersed in a solvent and added to the composition. As one form of the present invention, such a solvent is preferably contained in the composition according to the present invention as a solvent (V) or as another component. 【0022】 <Composition> The composition according to the present invention is (I) An alkali-soluble material, and (II) A fluorine-containing compound having a crosslinking group and comprises. In one form of the present invention, the present invention essentially consists of (I) an alkali-soluble material and (II) a fluorine-containing compound having a crosslinking group, In another form of the present invention, the present invention consists of (I) an alkali-soluble material and (II) a fluorine-containing compound having a crosslinking group. 【0023】 The composition according to the present invention is preferably a film-forming composition, and more preferably a cured film-forming composition. The composition according to the present invention is preferably a photosensitive composition, more preferably a negative photosensitive composition. Preferably, the composition according to the present invention (III) a colorant (preferably an organic colorant and / or an inorganic colorant, more preferably an organic and / or inorganic black colorant), (IV) a polymerization initiator, and / or (V) a solvent and further comprises. The composition according to the present invention exhibits better effects when forming a film with a thickness of 100 μm or less, and is preferably a negative photosensitive composition for thick films that exhibits more effects when forming a thick film. In the present invention, the film thickness is measured at 3 to 5 locations by a ULBAC stylus surface profiler, and the average value is taken. The viscosity of the composition according to the present invention is preferably 0.1 to 10,000 cP, more preferably 1.0 to 8,000 cP. Here, the viscosity is measured at 25 °C with a rotational viscometer. 【0024】 (I) an alkali-soluble material The composition according to the present invention comprises (I) an alkali-soluble material (hereinafter sometimes referred to as component (I). The same applies to other components). The alkali-soluble material is an alkali-soluble monomer, an alkali-soluble polymer, or a mixture thereof. The alkali-soluble material preferably has a partial structure having an acid group. The acid group is preferably an acid group having an acid dissociation index (pKa) of 7 or less, more preferably -OH, -COOH, -SO3H, -OSO3H, -PO3H2, -OPO3H2, -CONHSO2, -SO2NHSO2-, and particularly preferably -COOH. By having these acid groups, preferably carboxy groups, the solubility of the alkali-soluble material in a developer at a low concentration can be effectively improved. 【0025】 When the alkali-soluble material is an alkali-soluble monomer, preferably, the alkali-soluble monomer is a compound containing one or more (meth)acryloyloxy groups, more preferably two or more (meth)acryloyloxy groups. Preferably, the alkali-soluble material is a compound containing two or more (meth)acryloyloxy groups and / or an alkali-soluble polymer. More preferably, the alkali-soluble material comprises a compound containing two or more (meth)acryloyloxy groups, and even more preferably further comprises an alkali-soluble polymer. 【0026】 Compound containing two or more (meth)acryloyloxy groups For the sake of simplicity, the compound containing two or more (meth)acryloyloxy groups may hereinafter be referred to as a (meth)acryloyloxy group-containing compound. Here, the (meth)acryloyloxy group is a general term for an acryloyloxy group and a methacryloyloxy group. This compound is a compound capable of reacting with an acryloyl group-containing compound, an alkali-soluble polymer, etc. to form a crosslinked structure. Here, in order to form a crosslinked structure, a compound containing two or more acryloyloxy groups or methacryloyloxy groups, which are reactive groups, is required, and preferably contains three or more acryloyloxy groups or methacryloyloxy groups in order to form a higher-order crosslinked structure. 【0027】 As such a compound containing two or more (meth)acryloyloxy groups, esters obtained by reacting (α) a polyol compound having two or more hydroxyl groups with (β) two or more (meth)acrylic acids are preferably used. Examples of this (α) polyol compound include compounds having a saturated or unsaturated aliphatic hydrocarbon, an aromatic hydrocarbon, a heterocyclic hydrocarbon, a primary, secondary, or tertiary amine, an ether, etc. as a basic skeleton and having two or more hydroxyl groups as substituents. This polyol compound may contain other substituents, such as a carboxy group, a carbonyl group, an amino group, an ether bond, a thiol group, a thioether bond, etc., as long as the effects of the present invention are not impaired. 【0028】 Preferred polyol compounds include alkyl polyols, aryl polyols, polyalkanolamines, cyanuric acid, or dipentaerythritol. Here, when the polyol compound has three or more hydroxyl groups, it is not necessary for all hydroxyl groups to react with (meth)acrylic acid, and they may be partially esterified. That is, these esters may have unreacted hydroxyl groups. Such esters include tris(2-acryloxyethyl) isocyanurate, dipentaerythritol hexa(meth)acrylate, tripentaerythritol octa(meth)acrylate, pentaerythritol tetra(meth)acrylate, dipropylene glycol diacrylate, tripropylene glycol diacrylate, trimethylolpropane triacrylate, polytetramethylene glycol dimethacrylate, trimethylolpropane trimethacrylate, ditrimethylolpropane tetraacrylate, tricyclodecane dimethanol diacrylate, 1,9-nonanediol diacrylate, 1,6-hexanediol diacrylate, 1,10-decanediol diacrylate, and the like. Among these, from the viewpoints of reactivity and the number of crosslinkable groups, tris(2-acryloxyethyl) isocyanurate and dipentaerythritol hexaacrylate are preferred. Also, in order to adjust the shape of the formed pattern, two or more of these compounds can be combined. Specifically, it is preferable to combine a compound containing three (meth)acryloyloxy groups and a compound containing two (meth)acryloyloxy groups. 【0029】 Such compounds are preferably molecules that are relatively smaller than the alkali-soluble polymer from the viewpoint of reactivity. For this reason, it is preferable that the molecular weight is 2,000 or less, and it is more preferable that the molecular weight is 1,500 or less. 【0030】 The content of this (meth)acryloyloxy group-containing compound is adjusted according to the types of polymers and (meth)acryloyloxy group-containing compounds used, etc. Based on the total mass excluding the solvent of the composition, it is preferably 5 to 90% by mass, more preferably 30 to 70% by mass, and even more preferably 40 to 70% by mass. When combined with an alkali-soluble polymer, from the perspective of compatibility with the alkali-soluble polymer, the content of the (meth)acryloyloxy group-containing compound is preferably 10 to 95% by mass, more preferably 30 to 90% by mass, and even more preferably 50 to 80% by mass based on the total mass of component (I). These (meth)acryloyloxy group-containing compounds may be used alone or in combination of two or more. 【0031】 Alkali-soluble polymer It is desirable to select an alkali-soluble polymer that dissolves in an organic solvent such as propylene glycol monomethyl ether acetate (hereinafter referred to as PGMEA), shows water solubility, and dissolves in an alkali developer before exposure. Preferably, the alkali-soluble polymer has a structural part having an acid group, and more preferably is a polymer obtained by copolymerizing a structural part having an acid group and a structural part having no acid group. Here, preferred acid groups are acid groups with an acid dissociation index (pKa) of 7 or less, more preferably -OH, -COOH, -SO3H, -OSO3H, -PO3H2, -OPO3H2, -CONHSO2, -SO2NHSO2-, and particularly preferably -COOH. By having these acid groups, preferably carboxy groups, the solubility of the alkali-soluble polymer in a developer with a low concentration can be effectively improved. 【0032】 The alkali-soluble polymer (which may be in the form of an oligomer) used in the present invention preferably contains an acryloyl group. Preferably, the alkali-soluble polymer is composed of a (meth)acrylic polymer, a siloxane polymer, a siloxane (meth)acrylic polymer, or a mixture thereof. Further, the alkali-soluble polymer used in the present invention is not particularly limited, but is preferably selected from polysiloxanes containing a siloxane bond in the main skeleton and (meth)acrylic polymers. Among these, it is more preferable to use a (meth)acrylic polymer from the viewpoint of being suitably used for a low-temperature process. More preferably, it is an acrylic polymer. 【0033】 The alkali dissolution rate of the alkali-soluble polymer is measured and calculated as follows using a 0.03 mass% KOH (potassium hydroxide) aqueous solution as the alkali solution. The alkali-soluble polymer is diluted to 35 mass% in PGMEA and dissolved while stirring for 1 hour using a stirrer at room temperature. In a clean room under an atmosphere of temperature 23.0 ± 0.5°C and humidity 50 ± 5.0%, the prepared alkali-soluble polymer solution is dropped onto the center of a 4-inch silicon wafer with a thickness of 525 μm using a pipette, spin-coated to a thickness of 2 ± 0.1 μm, and then the solvent is removed by heating on a hot plate at 100°C for 90 seconds. The film thickness of the coating film is measured using a spectroscopic ellipsometer (J.A.Woollam). Next, the silicon wafer having this film is gently immersed in a 6-inch glass petri dish containing 100 ml of a 0.03 mass% KOH aqueous solution adjusted to 23.0 ± 0.1°C, and then left standing, and the time until the coating film disappears is measured. The dissolution rate is obtained by dividing by the time until the film in the portion 10 mm inside from the wafer edge disappears. When the dissolution rate is extremely slow, the wafer is immersed in the KOH aqueous solution for a certain period of time, then the film thickness measurement is performed, and the dissolution rate is calculated by dividing the change in film thickness before and after immersion by the immersion time. The above measurement method is performed 5 times, and the average of the obtained values is taken as the dissolution rate of the alkali-soluble polymer. Preferably, the alkali-soluble polymer refers to a polymer in which the coating film in the portion within 10 mm from the wafer edge dissolves and disappears in a 0.03 mass% KOH aqueous solution within 10 minutes in the measurement and calculation of the alkali dissolution rate. 【0034】 (Polysiloxane) The alkali-soluble polymer may contain a siloxane (Si—O—Si) bond as a main skeleton. In the present invention, a polymer containing a siloxane bond as a main skeleton is referred to as a polysiloxane. The skeleton structure of the polysiloxane can be classified into a silicone skeleton (the number of oxygen atoms bonded to a silicon atom is 2), a silsesquioxane skeleton (the number of oxygen atoms bonded to a silicon atom is 3), and a silica skeleton (the number of oxygen atoms bonded to a silicon atom is 4) according to the number of oxygen atoms bonded to the silicon atom. In the present invention, any of these may be used. The polysiloxane molecule may contain a plurality of combinations of these skeleton structures. Preferably, the polysiloxane used in the present invention contains a silsesquioxane skeleton. Polysiloxanes generally have a silanol group or an alkoxysilyl group. Such a silanol group and an alkoxysilyl group mean a hydroxyl group and an alkoxy group directly bonded to silicon forming a siloxane skeleton. Here, the silanol group and the alkoxysilyl group are considered to not only promote the curing reaction when forming a cured film using the composition, but also contribute to the reaction with a silicon-containing compound described later. For this reason, it is preferable that the polysiloxane has these groups. 【0035】 (Acrylic polymer) The acrylic polymer preferably used in the present invention can be selected from generally used acrylic polymers such as polyacrylic acid, polymethacrylic acid, alkyl polyacrylate, and alkyl polymethacrylate. As an example, the acrylic polymer used in the present invention preferably contains a repeating unit containing an acryloyl group, and preferably, the acrylic polymer has a structural portion having an acid group. Here, preferred acid groups are those with an acid dissociation index (pKa) of 7 or less, more preferably -OH, -COOH, -SO3H, -OSO3H, -PO3H2, -OPO3H2, -CONHSO2, -SO2NHSO2-, and particularly preferably -COOH. By having these acid groups, preferably a carboxy group, the solubility of the alkali-soluble polymer in a developer at a low concentration can be effectively improved. 【0036】 The polymer unit containing an acid group (e.g., a carboxy group, etc.) is not particularly limited as long as it is a polymer unit containing an acid group in the side chain, but a polymer unit derived from an unsaturated carboxylic acid, an unsaturated carboxylic anhydride, or a mixture thereof is preferred. 【0037】 The polymer unit containing an alkoxysilyl group may be a polymer unit containing an alkoxysilyl group in the side chain, but a polymer unit derived from a monomer represented by the following formula (B) is preferred. X B -(CH2) a -Si(OR B ) b (CH3) 3-b (B) In the formula, X B is a vinyl group, a styryl group, or a (meth)acryloyloxy group, R B is a methyl group or an ethyl group, a is an integer from 0 to 3, and b is an integer from 1 to 3. 【0038】 Further, it is preferable that the polymer contains a polymer unit containing a hydroxyl group, which is derived from a hydroxyl group-containing unsaturated monomer. 【0039】 The weight average molecular weight of the alkali-soluble polymer, preferably an acrylic polymer, according to the present invention is not particularly limited, but is preferably from 1,000 to 40,000, more preferably from 2,000 to 30,000. Here, the weight average molecular weight is the styrene-equivalent weight average molecular weight by gel permeation chromatography. Further, the number of acid groups is such that the solid content acid value is usually from 40 to 190 mgKOH / g, more preferably from 60 to 150 mgKOH / g, from the viewpoint of enabling development with a low-concentration alkali developer and achieving both reactivity and storage stability. 【0040】 Further, when the composition according to the present invention is a photosensitive composition, a cured film is formed through coating, exposure, and development on a substrate. At this time, it is necessary that a difference in solubility occurs between the exposed portion and the unexposed portion, and the coating film in the unexposed portion should have a solubility in the developer of a certain level or more. For example, if the dissolution rate of the coating film after pre-baking in a 2.38 mass% KOH aqueous solution (hereinafter sometimes referred to as alkali dissolution rate or ADR; details will be described later) is 50 Å / second or more, it is considered possible to form a pattern by exposure-development. However, since the required solubility varies depending on the average film thickness of the cured film formed and the development conditions, an alkali-soluble polymer suitable for the development conditions should be appropriately selected. Although it varies depending on the type and addition amount of the photosensitizer and silanol condensation catalyst contained in the composition, for example, if the average film thickness is from 0.1 to 100 μm (1,000 to 1,000,000 Å), the dissolution rate in a 2.38 mass% KOH aqueous solution is preferably from 50 to 20,000 Å / second, more preferably from 100 to 10,000 Å / second. 【0041】 The polysiloxane and acrylic polymer used in the present invention are not particularly limited, and for example, the polysiloxane, acrylic polymer, etc. described in WO2021 / 018927A1 can be preferably used. The alkali-soluble polymer may be one kind or a mixture of two or more kinds. Combinations of an acrylic polymer and a polysiloxane, two or more kinds of acrylic polymers, two or more kinds of polysiloxanes, etc. can also be used. In a preferred embodiment, from the viewpoint of being able to form a film and a cured film at a low temperature, the alkali-soluble polymer used in the present invention is a mixture of one or more acrylic polymers, more preferably two acrylic polymers. More preferably, the alkali-soluble polymer is dissolved in an organic solvent such as PGMEA, shows water solubility, and it is desirable to select two acrylic polymers that dissolve in an alkali developer before exposure. More preferably, both of the two acrylic polymers have a structural part having an acid group and are polymers obtained by copolymerizing a structural part having an acid group and a structural part having no acid group. Here, preferred acid groups are acid groups having an acid dissociation index (pKa) of 7 or less. More preferably, from the viewpoint of effectively improving the solubility of the alkali-soluble polymer in a developer at a low concentration, they are -OH, -COOH, -SO3H, -OSO3H, -PO3H2, -OPO3H2, -CONHSO2, -SO2NHSO2-, and particularly preferably -COOH. 【0042】 The content of component (I) is preferably 5 to 99.9% by mass, more preferably 70 to 90% by mass, based on the total mass excluding the solvent of the composition. 【0043】 (II) Fluorine-containing compound having a crosslinking group The composition according to the present invention comprises (II) a fluorine-containing compound having a crosslinking group. Component (II) is preferably a fluorine-containing surfactant having a crosslinking group. The crosslinking group of component (II) is preferably an epoxy group or an ethylenically unsaturated group, more preferably an ethylenically unsaturated group. 【0044】 Component (II) preferably has a perfluoroalkyl group or a perfluoroalkylene chain, and may have both. By having these groups, the oil repellency of the upper part of the formed film can be improved. Examples of the perfluoroalkyl group include a perfluorobutyl group, a perfluorohexyl group, and a perfluorooctyl group. Examples of the perfluoroalkylene ether chain include -CF2-O-, -(CF2)2-O-, -(CF2)3-O-, -CF2-C(CF3)O-, -C(CF3)-CF2-O-, and divalent groups having these repeating units. 【0045】 Specific examples of the component (II) include, for example, an acrylic copolymer having an epoxy group and a perfluoroalkyl group, an acrylic copolymer having an epoxy group and a perfluoroalkylene ether chain, an acrylic copolymer having an ethylenically unsaturated group and a perfluoroalkyl group, an acrylic copolymer having an ethylenically unsaturated group and a perfluoroalkylene ether chain, an epoxy (meth)acrylate polymer having an epoxy group and a perfluoroalkyl group, an epoxy (meth)acrylate polymer having an epoxy group and a perfluoroalkylene ether chain, an epoxy (meth)acrylate polymer having an ethylenically unsaturated group and a perfluoroalkyl group, an epoxy (meth)acrylate polymer having an ethylenically unsaturated group and a perfluoroalkylene ether chain, and the like. Preferably, an acrylic copolymer having an ethylenically unsaturated group and a perfluoroalkyl group and an acrylic copolymer having an ethylenically unsaturated group and a perfluoroalkylene ether chain are preferred, and an acrylic copolymer having an ethylenically unsaturated group and a perfluoroalkylene ether chain is more preferred. Examples of commercially available products of the acrylic copolymer having an ethylenically unsaturated group and a perfluoroalkylene ether chain include, for example, "Megafac RS-72-K", "Megafac RS-78", "Megafac RS-90" and the like. 【0046】 The fluorine atom content ratio in the compound in the component (II) is not particularly limited, but is preferably 5 to 50% by mass, more preferably 10 to 40% by mass, and still more preferably 25 to 35% by mass. 【0047】 (II) The molecular weight of the component is not particularly limited. A higher molecular weight is preferable because it can suppress fluidity during baking and prevent outflow from the film. The number average molecular weight is preferably from 100 to 100,000, more preferably from 500 to 10,000. 【0048】 Fluorine-containing surfactants are generally known to be incorporated into the composition for the purpose of improving coatability and imparting water / oil repellency to the surface of the coating film. One of the features of the present invention is that the amount of the (II) component incorporated is extremely less than the amount usually incorporated for the above purpose. By incorporating this extremely small amount, it is achieved that the upper part of the formed film (preferably a bank) has oil repellency, and the bottom or the side surface of the opening of the formed film (preferably a bank) has lipophilicity. As a result, for example, when a bank is formed, at the top of the bank, it shows ink repellency against quantum dot ink, preventing color mixing, while near the opening of the bank, it shows ink affinity, enabling efficient embedding of the ink. Although not bound by theory, it is considered to be due to the following reasons. Since the composition of the present invention contains an extremely small amount of the (II) component, the (II) component accumulates only in the upper surface layer part of the film during film formation, and by undergoing a crosslinking reaction or the like with other components, a liquid-repellent part is formed only on the uppermost surface, and a liquid-affinity part is efficiently and effectively formed on the side part and the opening part. After the cured film is formed, the (II) component is suppressed from moving and eluting. Furthermore, in recent years, there has been a demand for environmentally friendly compositions, and the fact that the (II) component can exhibit its effect in this extremely small amount is a great advantage from the perspective of environmental impact. 【0049】 Preferably, in the present invention, "bank" means a partition wall or a black matrix disposed between each display pixel of an optical display device and dividing the display pixel, and means a bank or a black matrix as described in, for example, JP2021-075660A, WO2017-138607A1, JP2018-203599A. 【0050】 The mass ratio ((II) / (I)) of the content of component (II) to the content of component (I) is from 0.0000005 to 0.01, preferably from 0.00001 to 0.005, and more preferably from 0.00003 to 0.004. From the viewpoints of the optimal surface free energy, the oil repellency on the upper part of the formed film (preferably the bank), and the lipophilicity on the bottom part or the side surface of the opening of the formed film (preferably the bank), it is further desirable to be in the range of 0.0001 to 0.0035. 【0051】 (III) Colorant The composition according to the present invention may further contain (III) a colorant. Preferably, (III) the colorant is an organic colorant and / or an inorganic colorant. In a preferred embodiment, component (III) includes an organic and / or inorganic black colorant, more preferably an organic black colorant, still more preferably a black colorant composed of a mixture of two or more organic colorants, and even more preferably includes a mixture of red and blue-green organic colorants mixed to exhibit black. 【0052】 When the black colorant used in the present invention is an organic colorant or a pigment, it is preferable to combine two or more organic colorants or pigments. By mixing various colors such as red, green, and blue, a black coloring material can be obtained. The organic colorants and pigments are selected from those having structures such as azo-based, phthalocyanine-based, quinacridone-based, benzimidazolone-based, isoindolinone-based, dioxazine-based, indanthrene-based, perylene-based, etc. Preferred combinations of pigments include, for example, one or more selected from the group consisting of C.I. Pigment Orange 43, C.I. Pigment Orange 64, and C.I. Pigment Orange 72, and one or more selected from the group consisting of C.I. Pigment Blue 60, C.I. Pigment Green 7, C.I. Pigment Green 36, and C.I. Pigment Green 58. More preferably, it is a combination of one selected from the group consisting of C.I. Pigment Orange 43, C.I. Pigment Orange 64, and C.I. Pigment Orange 72, and C.I. Pigment Blue 60. Other organic pigments may be further combined with this combination. 【0053】 (III) The content of the component is preferably 1 to 80% by mass, more preferably 3 to 30% by mass, and still more preferably 5 to 10% by mass based on the total mass of the (I) component. The content of the colorant is based on the mass of the pigment itself. That is, although there are cases where the colorant is obtained in a dispersed state using a dispersant, in this case, the mass of the colorant does not include anything other than the pigment. 【0054】 The colorant used in the present invention can also be used in combination with a dispersant. As the dispersant, for example, an organic compound-based dispersant such as the polymer dispersant described in JP-A-2004-292672 may be used. 【0055】 (IV) Polymerization initiator The composition according to the present invention can further contain a polymerization initiator. This polymerization initiator includes a polymerization initiator that generates an acid, a base, or a radical by radiation, and a polymerization initiator that generates an acid, a base, or a radical by heat. In the present invention, the reaction starts immediately after radiation irradiation, and since the reheating step performed before the development step after radiation irradiation can be omitted, the former is preferable in terms of shortening the process and cost, and more preferably a photo radical generator is preferable. 【0056】 The photo radical generator can improve the resolution by strengthening the shape of the pattern and increasing the contrast of development. The photo radical generator used in the present invention is a photo radical generator that emits radicals when irradiated with radiation. Here, examples of the radiation include visible light, ultraviolet rays, infrared rays, X-rays, electron beams, α-rays, or γ-rays. 【0057】 The content of the photo radical generator varies depending on the type and amount of the active substance generated by the decomposition of the photo radical generator, the required sensitivity, and the dissolution contrast between the exposed part and the unexposed part. However, based on the total mass of the component (I), it is preferably 0.1 to 10% by mass, more preferably 0.5 to 5% by mass. From the viewpoint of ensuring sufficient dissolution contrast between the exposed part and the unexposed part and exhibiting the addition effect, the addition amount is preferably 0.1% by mass or more. On the other hand, cracks may occur in the formed film, or the colorless transparency of the film may be reduced due to significant coloring caused by the decomposition of the photo radical generator, or the electrical insulation of the cured product may deteriorate or gas may be released due to the thermal decomposition of the photo radical generator, causing problems in subsequent processes. Further, from the viewpoint of preventing a decrease in the resistance of the film to a photoresist stripper mainly composed of monoethanolamine or the like, the addition amount of the photo radical generator is preferably less than 50% by mass. In order to obtain optimal curing conditions, it is preferable to adjust the amount of the photo radical generator according to the heating temperature (cure temperature) of the post-exposure heating step. agent. 【0058】 Examples of the photo radical generator include azo-based, peroxide-based, acylphosphine oxide-based, alkylphenone-based, oxime ester-based, and titanocene-based initiators. Among them, alkylphenone-based, acylphosphine oxide-based, and oxime ester-based initiators are preferred, such as 2,2-dimethoxy-1,2-diphenylethane-1-one, 1-hydroxy-cyclohexyl phenyl ketone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, 1-[4-(2-hydroxyethoxy)phenyl]-2-hydroxy-2-methyl-1-propan-1-one, 2-hydroxy-1-{4-[4-(2-hydroxy-2-methylpropionyl)benzyl]phenyl}-2-methylpropan-1-one, 2-methyl-1-(4-methylthiophenyl)-2-morpholinopropan-1-one, 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-1-butanone, 2-(dimethylamino)-2-[(4-methylphenyl)methyl]-1-[4-(4-morpholinyl)phenyl]-1-butanone, 2,4,6-trimethylbenzoyldiphenylphosphine oxide, bis(2,4,6-trimethylbenzoyl)phenylphosphine oxide, 1,2-octanedione, 1-[4-(phenylthio)-2-(O-benzoyloxime)], ethanone, 1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazole-3-yl]-1-(O-acetoxime), etc. 【0059】 (V) Solvent The composition according to the present invention can further contain (V) a solvent. This solvent is not particularly limited as long as it can uniformly dissolve or disperse the above-described components and the components added as necessary. Examples of the solvent that can be used in the present invention include ethylene glycol monoalkyl ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, and ethylene glycol monobutyl ether; diethylene glycol dialkyl ethers such as diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol dipropyl ether, and diethylene glycol dibutyl ether; ethylene glycol alkyl ether acetates such as methyl cellosolve acetate and ethyl cellosolve acetate; propylene glycol monoalkyl ethers such as propylene glycol monomethyl ether and propylene glycol monoethyl ether; propylene glycol alkyl ether acetates such as PGMEA, propylene glycol monoethyl ether acetate, and propylene glycol monopropyl ether acetate; aromatic hydrocarbons such as benzene, toluene, and xylene; ketones such as methyl ethyl ketone, acetone, methyl amyl ketone, methyl isobutyl ketone, and cyclohexanone; alcohols such as ethanol, propanol, butanol, hexanol, cyclohexanol, ethylene glycol, and glycerin; esters such as ethyl lactate, ethyl 3-ethoxypropionate, and methyl 3-methoxypropionate; cyclic esters such as γ-butyrolactone. Among these, from the viewpoints of availability, ease of handling, and solubility of the alkali-soluble material, it is preferable to use PGMEA. 【0060】 The solvent content of the composition according to the present invention can be arbitrarily adjusted according to the method of applying the composition or the like. For example, when applying the composition by spray coating, the proportion of the solvent in the composition can be 90% by mass or more. Also, in slit coating used for coating a large substrate, it is usually 60% by mass or more, preferably 70% by mass or more. The properties of the composition of the present invention do not change significantly depending on the amount of the solvent. 【0061】 (VI) Crosslinking agent The composition according to the present invention can further contain a (VI) crosslinking agent. The (VI) component is different from the (I) and (II) components. Examples of the crosslinking agent include melamine compounds having a methylol group, an alkoxymethyl group, etc., isocyanate compounds, thiol compounds, and the like. Among specific examples of the crosslinking agent, specific examples of the melamine compound include Nikalac MW-390, Nikalac MW-100LM, Nikalac MX-750LM, Nikalac MX-270, Nikalac MX-280, etc., which have an imino group, a methylol group, a methoxymethyl group, etc. Examples of the isocyanate compound include X-12-9659 or KBM-9659, X-12-9659 or KBM-585 (Shin-Etsu Chemical Co., Ltd.). Also, polymers containing these structures, or polymers in which a part of these structures is substituted by a silicone group are also preferred. In addition to silane compounds, examples include Karenz AOI, Karenz MOI-BM, Karenz MOI-BP, Karenz BEI, Karenz MT (Showa Denko K.K.), and others, such as hexamethylene diisocyanate and cyclohexane diisocyanate. In one embodiment of the present invention, the crosslinking agent is a thiol compound. The content of the crosslinking agent is preferably 1 to 20% by mass, more preferably 5 to 15% by mass, based on the total mass of the component (I). The crosslinking agent can be used alone or as a mixture of two or more. By setting the content of the crosslinking agent within the above range, for example, in a low temperature range of about 80°C to 95°C, the crosslinking reaction of the crosslinking agent can be improved, and further, the amount of the component (II) used can also be reduced, making it possible to obtain a cured film with desired performance while being more environmentally considerate. 【0062】 (VII) Additive The composition according to the present invention may optionally contain a (VII) additive other than the components described above. Such additives include at least one of a developer dissolution accelerator, a scum remover, an adhesion enhancer, a polymerization inhibitor, an antifoaming agent, a surfactant different from (II), a sensitizer, a curing agent, or a mixture thereof. The content of the (VII) additive is preferably 3% by mass or less, more preferably 1% by mass or less, based on the total mass excluding the solvent of the composition. In a preferred embodiment, the (VI) additive is not included, that is, the content is 0% by mass. 【0063】 <Method for manufacturing a cured film> The method for manufacturing a cured film according to the present invention includes a coating step of applying the above-described composition onto a substrate to form a coating film, and a step of heating the coating film. Preferably, the method for manufacturing a cured film further includes a step of exposing the coating film and a step of developing the coating film. More preferably, the method for manufacturing a cured film according to the present invention includes, in this order, a step of applying the above-described composition onto a substrate to form a coating film, a step of exposing the coating film, a step of developing the coating film, and a step of heating the coating film, and more preferably includes a pre-baking step after the coating step and before the exposure step. The method for manufacturing a cured film of the present invention will be described in the order of steps as follows. 【0064】 (1) Coating step First, apply the above-described composition to a substrate. The formation of the coating film of the composition in the present invention can be carried out by any method conventionally known as a method for applying a photosensitive composition. Specifically, it can be arbitrarily selected from dip coating, roll coating, bar coating, brush coating, spray coating, doctor coating, flow coating, spin coating, slit coating, and the like. As the substrate to which the composition is applied, an appropriate substrate such as a silicon substrate, a glass substrate, or a resin film can be used. Various semiconductor elements and the like may be formed on these substrates as necessary. When the substrate is a film, gravure coating can also be used. If desired, a drying step can be separately provided after the coating film is formed. Further, if necessary, the coating step can be repeated once or more than twice to make the film thickness of the formed coating film as desired. 【0065】 (2) Pre-baking step After forming a coating film by applying the composition, it is preferable to pre-bake (pre-heat treat) the coating film in order to dry the coating film and reduce the residual amount of the solvent in the coating film. The pre-baking step is generally carried out at a temperature of 40 to 150°C, preferably 50 to 100°C, for 10 to 300 seconds, preferably 30 to 120 seconds, when using a hot plate, and for 1 to 30 minutes when using a clean oven. 【0066】 (3) Exposure step After forming a coating film, if desired, irradiate the surface of the coating film with light. As the light source used for the light irradiation, any light source conventionally used in the pattern formation method can be used. Examples of such light sources include lamps such as high-pressure mercury lamps, low-pressure mercury lamps, metal halides, xenon, laser diodes, and LEDs. As the irradiation light, ultraviolet rays such as g-line, h-line, and i-line are usually used. Except for ultra-fine processing such as semiconductors, it is common to use light of 360 to 430 nm (high-pressure mercury lamp) for patterning of several μm to several tens of μm. The energy of the irradiation light depends on the light source and the film thickness of the coating film, but generally ranges from 1 to 1000 mJ / cm 2 , preferably 5 to 500 mJ / cm 2, more preferably 10 to 300 mJ / cm 2 is used. From the viewpoint of obtaining sufficient resolution, the irradiation light energy is preferably higher than 5 mJ / cm 2 , and from the viewpoints of preventing exposure unevenness and occurrence of halation, the irradiation light energy is preferably 500 mJ / cm 2 or less. 【0067】 A general photomask can be used to irradiate light in a pattern. Such a photomask can be arbitrarily selected from well-known ones. The environment during irradiation is not particularly limited, but generally, the ambient atmosphere (in the air) or nitrogen atmosphere may be used. Also, when forming a film on the entire surface of the substrate, light may be irradiated onto the entire surface of the substrate. In the present invention, the pattern film includes the case where a film is formed on the entire surface of such a substrate. 【0068】 (4) Post-exposure baking step After exposure, in order to promote the reaction between polymers in the film by the reaction initiator generated at the exposed locations, post-exposure baking can be performed as necessary. This heat treatment is not for completely curing the coating film, unlike the heat treatment step (6) described later. Instead, it is performed so that only the desired pattern remains on the substrate after development, and the other parts can be removed by development. Therefore, it is not essential in the present invention. 【0069】 When performing post-exposure heating, a hot plate, an oven, a furnace, or the like can be used. Since it is not preferable for the acid in the exposed area generated by light irradiation to diffuse to the unexposed area, the heating temperature should not be excessively high. From such a viewpoint, the range of the post-exposure heating temperature is preferably 40°C to 150°C, and more preferably 60°C to 120°C. In order to control the curing rate of the composition, stepwise heating can also be applied as necessary. Also, the atmosphere during heating is not particularly limited, but for the purpose of controlling the curing rate of the composition, it can be selected from an inert gas such as nitrogen, under vacuum, under reduced pressure, in oxygen gas, and the like. Further, the heating time is preferably a certain amount or more in order to maintain higher uniformity of the temperature history within the wafer surface, and is preferably not excessively long in order to suppress the diffusion of the generated acid. From such a viewpoint, the heating time is preferably 20 seconds to 500 seconds, and more preferably 40 seconds to 300 seconds. 【0070】 (5) Development process After exposure, if necessary, post-exposure heating is performed, and then the coating film is developed. As the developer used in the development, any developer conventionally used for developing a photosensitive composition can be used. Preferred developers include aqueous solutions of alkaline compounds such as tetraalkylammonium hydroxide, choline, alkali metal hydroxides, alkali metal metasilicates (hydrates), alkali metal phosphates (hydrates), aqueous sodium carbonate solutions, ammonia, alkylamines, alkanolamines, and heterocyclic amines. Particularly preferred alkaline developers are aqueous solutions of tetramethylammonium hydroxide, potassium hydroxide, sodium hydroxide, or aqueous sodium carbonate solutions. These alkaline developers may further contain water-soluble organic solvents such as methanol and ethanol, or surfactants, if necessary. In the present invention, development can be carried out using a developer having a lower concentration than the 2.38 mass% TMAH developer usually used as a developer. Examples of such developers include 0.05 to 1.5 mass% TMAH aqueous solution, 0.1 to 2.5 mass% aqueous sodium carbonate solution, 0.01 to 1.5 mass% potassium hydroxide aqueous solution, and the like. The development time is usually 10 to 300 seconds, preferably 30 to 180 seconds. The development method can also be arbitrarily selected from conventionally known methods. Specifically, methods such as dipping in a developer (dip), paddle, shower, slit, cap coat, and spray can be mentioned. By this development, a pattern can be obtained. After development with the developer, it is preferable to perform water washing. 【0071】 (6) Heating step The coating film is cured by heating. As the heating device used in the heating step, the same one as that used for post-exposure heating described above can be used. The heating temperature in this heating step is not particularly limited as long as the coating film can be cured and can be arbitrarily determined. However, when polysiloxane is used, if silanol groups in the polysiloxane remain, the chemical resistance of the cured film may become insufficient or the dielectric constant of the cured film may increase. From such a perspective, a relatively high temperature is generally selected as the heating temperature. However, the composition according to the present invention can be cured at a relatively low temperature. Specifically, it is preferably cured by heating at 350 °C or lower. In order to keep the residual film rate after curing high, the curing temperature is more preferably 300 °C or lower, and particularly preferably 250 °C or lower. On the other hand, in order to promote the curing reaction and obtain a sufficient cured film, the curing temperature is preferably 70 °C or higher, and more preferably 80 °C or higher. Also, the heating time is not particularly limited and is generally 10 minutes to 24 hours, preferably 20 minutes to 3 hours. Note that this heating time is the time after the temperature of the pattern film reaches the desired heating temperature. Usually, it takes several minutes to several hours for the pattern film to reach the desired temperature from the temperature before heating. 【0072】 The cured film formed in this way exhibits the effects of the present application if the average film thickness is 100 μm or less, and is preferably a film with a thickness of 0.1 to 100 μm. More preferably, it is 5 to 25 μm, and even more preferably 8 to 20 μm. 【0073】 The optical density (OD) of the cured film is preferably 1.5 or more on average at wavelengths of 400 to 700 nm, and more preferably 2 or more. Here, the measurement of the optical density is performed by a Spectrophotometer CM-5 (Konica Minolta). In a preferred embodiment, the OD at each of the wavelengths of 460 nm, 540 nm, and 630 nm is preferably 1.5 or more, and more preferably 2 or more. The cured film according to the present invention is excellent in light-shielding properties and can be used as a partition material for display devices. Since the cured film according to the present invention can be thickened, it can be suitably used for quantum dots and organic electronic luminescence devices that require a thicker partition material. 【0074】 In another aspect, the present invention relates to a cured film produced or producible by the above method. 【0075】 In another aspect, the present invention relates to a cured film comprising a polymer derived from an alkali-soluble material and a fluorine-containing compound having a crosslinking group. Preferably, this cured film is preferably patterned, more preferably a patterned bank. Preferably, the cured film further contains a colorant. More preferably, the colorant is an organic colorant and / or an inorganic colorant, and still more preferably, the colorant contains an organic and / or inorganic black colorant. 【0076】 In another aspect, the present invention relates to a light conversion device comprising a cured film. 【0077】 In another aspect, the present invention relates to a display device comprising a cured film or a light conversion device. 【0078】 Preferred embodiments are given below. [Embodiment 1] (I) An alkali-soluble material, and (II) A fluorine-containing compound having a crosslinking group comprising a composition, A composition in which the mass ratio of the content of component (II) to the content of component (I) ((II) / (I)) is from 0.0000005 to 0.01. Preferably it is from 0.00001 to 0.005, more preferably from 0.00003 to 0.004. From the viewpoints of the optimum surface free energy, the oil repellency on the upper part of the formed film (preferably a bank), and the lipophilicity on the bottom or the side surface of the opening of the formed film (preferably a bank), it is further desirable to be in the range of 0.0001 to 0.0035. Preferably, the composition is a cured film-forming composition. Preferably, the composition is a photosensitive composition. More preferably, the composition is a negative photosensitive composition. Preferably, the composition further comprises (III) a colorant, preferably the colorant is an organic colorant and / or an inorganic colorant, and more preferably the colorant comprises an organic and / or inorganic black colorant. (IV) a polymerization initiator, and / or (V) a solvent and further comprises. 【0079】 [Embodiment 2] The composition according to Embodiment 1, wherein the crosslinking group is an epoxy group or an ethylenically unsaturated group, preferably an ethylenically unsaturated group. 【0080】 [Embodiment 3] The composition according to Embodiment 1 or 2, wherein the fluorine-containing surfactant having the crosslinking group has a perfluoroalkyl group or a perfluoroalkylene chain, preferably the perfluoroalkyl group is selected from the group consisting of a perfluorobutyl group, a perfluorohexyl group, and a perfluorooctyl group, and the perfluoroalkylene ether chain is selected from -CF2-O-, -(CF2)2-O-, -(CF2)3-O-, -CF2-C(CF3)O-, -C(CF3)-CF2-O-, and divalent groups having these repeating units. Preferably, the fluorine-containing surfactant having the crosslinking group has an ethylenically unsaturated group and a perfluoroalkylene ether chain. 【0081】 [Embodiment 4] (I) The composition according to any one of Embodiments 1 to 3, wherein the alkali-soluble material is a compound containing two or more (meth)acryloyloxy groups and / or an alkali-soluble polymer. Preferably, the compound containing two or more (meth)acryloyloxy groups is an ester obtained by reacting (α) a polyol compound having two or more hydroxyl groups with (β) two or more (meth)acrylic acids. Preferably, (α) the polyol compound has a basic skeleton of a saturated or unsaturated aliphatic hydrocarbon, an aromatic hydrocarbon, a heterocyclic hydrocarbon, a primary, secondary, or tertiary amine, an ether, etc., and has two or more hydroxyl groups as substituents. Preferably, (α) the polyol compound further contains one or more substituents selected from the group consisting of a carboxy group, a carbonyl group, an amino group, an ether bond, a thiol group, and a thioether bond. Preferably, (α) the polyol compound is selected from the group consisting of an alkyl polyol, an aryl polyol, a polyalkanolamine, cyanuric acid, and dipentaerythritol. Preferably, it is tris(2-acryloxyethyl) isocyanurate, dipentaerythritol hexaacrylate, or a combination thereof. More preferably, it is a combination of a compound containing three (meth)acryloyloxy groups and a compound containing two (meth)acryloyloxy groups. Preferably, the molecular weight of the compound containing two or more (meth)acryloyloxy groups is 2,000 or less, and more preferably 1,500 or less. Preferably, the content of the compound containing two or more (meth)acryloyloxy groups is 5 to 90% by mass, more preferably 30 to 70% by mass, and still more preferably 40 to 70% by mass based on the total mass excluding the solvent of the composition. Preferably, the alkali-soluble polymer is selected from the group consisting of (meth)acrylic polymers, siloxane polymers, siloxane (meth)acrylic polymers, and mixtures thereof. The alkali dissolution rate of the alkali-soluble polymer is measured and calculated as follows using a 0.03 mass% aqueous KOH solution as the alkali solution. The alkali-soluble polymer is diluted to 35 mass% in PGMEA and dissolved while stirring for 1 hour using a stirrer at room temperature. In a clean room under an atmosphere of 23.0 ± 0.5°C and 50 ± 5.0% humidity, the prepared alkali-soluble polymer solution is dropped onto a 4-inch silicon wafer with a thickness of 525 μm at the center using a pipette, spin-coated to a thickness of 2 ± 0.1 μm, and then the solvent is removed by heating on a hot plate at 100°C for 90 seconds. The film thickness of the coating film is measured using a spectroscopic ellipsometer (manufactured by J.A.Woollam). Next, the silicon wafer having this film is gently immersed in a 6-inch glass petri dish containing 100 ml of a 0.03 mass% aqueous KOH solution adjusted to 23.0 ± 0.1°C, and then left standing, and the time until the coating film disappears is measured. The dissolution rate is obtained by dividing by the time until the film in the portion 10 mm inside from the edge of the wafer disappears. When the dissolution rate is extremely slow, the wafer is immersed in the aqueous KOH solution for a certain period of time, then the film thickness is measured, and the dissolution rate is calculated by dividing the change in film thickness before and after immersion by the immersion time. The above measurement method is performed 5 times, and the average of the obtained values is taken as the dissolution rate of the alkali-soluble polymer. Preferably, the alkali-soluble polymer refers to one in which the coating film in the portion 10 mm inside from the edge of the wafer dissolves and disappears in a 0.03 mass% aqueous KOH solution within 10 minutes in the measurement and calculation of the alkali dissolution rate. 【0082】 [Embodiment 5] (I) The composition according to any one of Embodiments 1 to 4, wherein the alkali-soluble material comprises a compound containing two or more (meth)acryloyloxy groups. 【0083】 [Embodiment 6] (I) The composition according to Embodiment 5, wherein the alkali-soluble material further comprises an alkali-soluble polymer. Preferably, the content of the compound containing two or more (meth)acryloyloxy groups is preferably 10 to 95% by mass, more preferably 30 to 90% by mass, and still more preferably 50 to 80% by mass based on the total mass of the component (I). 【0084】 [Embodiment 7] The composition according to any one of Embodiments 1 to 6, further comprising (III) a colorant. Preferably, the (III) colorant is an organic and / or inorganic black colorant, more preferably comprises an organic black colorant, still more preferably comprises a black colorant composed of a mixture of two or more organic colorants, and even more preferably comprises a mixture of red and blue-green organic colorants mixed to exhibit black. Preferably, the content of the (III) colorant is 3 to 80% by mass, more preferably 5 to 50% by mass based on the total mass of the component (I). 【0085】 [Embodiment 8] The composition according to any one of Embodiments 1 to 7, further comprising (IV) a polymerization initiator. Preferably, the polymerization initiator is a photo radical generator. Preferably, the content of the photo radical generator is preferably 0.1 to 10% by mass, more preferably 0.5 to 5% by mass based on the total mass of the component (I). 【0086】 [Embodiment 9] The composition according to any one of Embodiments 1 to 8, further comprising (VI) a solvent. Preferably, the (VI) solvent is one or a combination of ethylene glycol monoalkyl ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, and ethylene glycol monobutyl ether; diethylene glycol dialkyl ethers such as diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol dipropyl ether, and diethylene glycol dibutyl ether; ethylene glycol alkyl ether acetates such as methyl cellosolve acetate and ethyl cellosolve acetate; propylene glycol monoalkyl ethers such as propylene glycol monomethyl ether and propylene glycol monoethyl ether; propylene glycol alkyl ether acetates such as PGMEA, propylene glycol monoethyl ether acetate, and propylene glycol monopropyl ether acetate; aromatic hydrocarbons such as benzene, toluene, and xylene; ketones such as methyl ethyl ketone, acetone, methyl amyl ketone, methyl isobutyl ketone, and cyclohexanone; alcohols such as ethanol, propanol, butanol, hexanol, cyclohexanol, ethylene glycol, and glycerin; esters such as ethyl lactate, ethyl 3-ethoxypropionate, and methyl 3-methoxypropionate; and cyclic esters such as γ-butyrolactone. Preferably, the composition according to the present invention further contains a (VI) crosslinking agent, more preferably a thiol compound. Preferably, the composition according to the present invention contains a (VII) additive. The content of the (VII) additive is preferably 3% by mass or less, more preferably 1% by mass or less, based on the total mass of the composition excluding the solvent. 【0087】 [Embodiment 10] A method for producing a cured film, comprising a step of applying the composition according to any one of Embodiments 1 to 9 to a substrate to form a coating film, and a step of heating the coating film. Preferably, the method for producing the cured film further includes a step of exposing the coating film and a step of developing the coating film. More preferably, the method for producing the cured film includes, in this order, a step of applying the composition according to any one of Embodiments 1 to 9 to a substrate to form a coating film, a step of exposing the coating film, a step of developing the coating film, and a step of heating the coating film. Even more preferably, the method further includes a pre-baking step after the applying step and before the exposing step. 【0088】 [Embodiment 11] A cured film produced or producible by the method according to Embodiment 11. 【0089】 [Embodiment 12] A cured film comprising a polymer derived from an alkali-soluble material and a fluorine-containing compound having a crosslinking group. Preferably, the cured film is patterned. Even more preferably, the cured film is a patterned bank. Preferably, the cured film further contains a colorant. More preferably, the colorant is an organic colorant and / or an inorganic colorant. Even more preferably, the colorant comprises an organic and / or inorganic black colorant. 【0090】 [Embodiment 13] The cured film according to Embodiment 11 or 12, having an average film thickness of 0.1 to 100 μm, preferably 1 to 50 μm, more preferably 1 to 25 μm, and even more preferably 5 to 20 μm. 【0091】 [Embodiment 14] The cured film according to any one of Embodiments 11 to 13, having an oil-repellent upper part and an oil-attractive lower part. Preferably, the cured film is patterned. Even more preferably, the cured film is a patterned bank. 【0092】 [Embodiment 15] An optical conversion device comprising the cured film according to any one of Embodiments 11 to 14. 【0093】 [Embodiment 16] A display device comprising the cured film according to any one of Embodiments 11 to 14, or the optical conversion device according to Embodiment 15. 【0094】 Hereinafter, the present invention will be described more specifically with reference to Examples and Comparative Examples, but the present invention is not limited to these Examples and Comparative Examples at all. 【0095】 <Example 1> To a PGMEA solution containing 100 parts by mass of a mixture of acrylic polymer A (Shin-Nakamura Chemical Co., Ltd.) and acrylic polymer B (Natco Co., Ltd.) mixed at a mass ratio of 3:1, 3.1 parts by mass of polymerization initiator A (ADEKA Corporation) and polymerization initiator B (IGM Resins B.V.) were added respectively, 170 parts by mass of (meth)acryloyloxy group-containing compound A (Shin-Nakamura Chemical Co., Ltd.), 20 parts by mass of crosslinking agent A (Showa Denko K.K.), 15 parts by mass of colorant A (Toyo Color Co., Ltd.), 1.9 parts by mass of colorant B (Hayashibara Co., Ltd.), 1.7 parts by mass of colorant C (Hayashibara Co., Ltd.), 2.2 parts by mass of colorant D (Hayashibara Co., Ltd.), and 0.6 parts by mass of fluorine-containing surfactant A having a crosslinking group (DIC Corporation) were added, and further PGMEA was added to prepare a solution having a solid content ratio of 35% by mass to obtain the composition of Example 1. 【0096】 <Examples 2 to 12 and Comparative Example 1> The compositions of Examples 2 to 12 and Comparative Example 1 were prepared in the same manner as in Example 1, except that the composition was changed as shown in Table 1. 【Table 1】 In the table, (meth)acryloyloxy group-containing compound A: dipentaerythritol hexaacrylate "A-DPH", Shin-Nakamura Chemical Co., Ltd., acrylic polymer A: acrylic random polymer made from carboxyl acid monomer and monomer containing at least one aromatic ring group, Shin-Nakamura Chemical Co., Ltd., Acrylic Polymer B: 2-Methyl-2-propenoic acid, polymer with 2-hydroxyethyl 2-methyl-2-propenoate, 2-isocyanatoethyl 2-propenoate and methyl 2-methyl-2-propenoate, Natco Co., Ltd. Fluorine-containing Compound A with a crosslinking group: "RS-90", DIC Corporation Fluorine-containing Compound B with a crosslinking group: "RS-72-A", DIC Corporation Colorant A: Black colorant, Toyo Color Co., Ltd. Colorant B: Cyanine dye, Hayashibara Co., Ltd. Colorant C: Cyanine dye, Hayashibara Co., Ltd. Colorant D: Coumarin dye, Hayashibara Co., Ltd. Polymerization Initiator A: "NCI-831", ADEKA Corporation Polymerization Initiator B: "Omnirad784", IGM Resins B.V. Crosslinking Agent A: Thiol compound "KarenzMT PE-1", Showa Denko K.K. 【0097】 (Pattern Fabrication) Each of the obtained compositions was applied onto a glass substrate by spin coating (MS-A100, MIKASA), and after application, pre-baked on a hot plate (HHP-411V, AS ONE) at 60 °C for 90 seconds and adjusted to have an average film thickness of 10 μm. Exposure was performed using an i-line exposure machine (NES2W-ghi06, Nikon), and a 150x150 μm hole pattern was fabricated using 0.03 mass% KOH as the developer. The patterned substrate was placed in an oven (DP-200, Yamato) at 85 °C and heated for 30 minutes to promote curing. The pattern was checked for the presence or absence of residues using an optical microscope (MX61A, OLYMPUS) and SEM (JSM-7100, JEOL). The obtained results are as shown in Table 1. 【0098】 (Optical Density Measurement) For optical density measurement, a substrate without a pattern is prepared. In the exposure process, the entire surface of the substrate is exposed without using a photomask. In other processes, the film is fabricated using the same procedures as in pattern fabrication. The transmission spectrum is measured with a spectrophotometer (CM-5, KONICA MINOLTA), and the OD values at wavelengths of 460, 540, and 650 nm are calculated. The obtained results are as shown in Table 1. 【0099】 (Measurement of surface free energy) For surface free energy measurement, a substrate without a pattern is prepared. In the exposure process, the entire surface of the substrate is exposed without using a photomask. In other processes, the film is fabricated using the same procedures as in pattern fabrication. The fabricated substrate is set on a contact angle meter (DropMaster700, Kyowa), and the contact angles of 3 μL of distilled water and diiodomethane are measured. The surface free energy is calculated from the Owens-Wendt theoretical formula and the obtained contact angle values. The obtained results are as shown in Table 1. 【0100】 (Preparation of ink) Ink A is prepared by mixing the materials described in Table 2 below. The ink can also be prepared using the materials and methods described in, for example, WO2021 / 116139A1. 【Table 2】 In the table, the method for preparing the monomer mixture is as follows. 1,6-Hexanediol diacrylate (HDDA) is pre-purified by passing it through a molecular sieve before use. Next, 2 g of the pre-purified HDDA and 8 g of lauryl acrylate (LA, viscosity: 4.0 cP, BP: 313.2 °C) are mixed in a glass vial (HDDA:LA = 2:8) to obtain a monomer mixture. 【0101】 (Ink spreading test) One drop (10 pl) of Ink A is placed in a 150x150 μm hole pattern using an inkjet printer (Dimatix DMP-2831, FujiFilm). The size of the droplets was measured using an optical microscope (VK-X1000, KEYENCE), and the spread of the ink was evaluated. Similarly, one drop of Ink A was dropped onto the bank, and the spread of the ink was evaluated. The results obtained are as shown in Table 1. The unit of the numerical values is μm.

Claims

[Claim 1] (I) Alkali-soluble materials, and (II) Fluorine-containing compounds having a crosslinking group A composition comprising, A composition in which the mass ratio of the content of component (II) to the content of component (I) ((II) / (I)) is 0.0000005 to 0.

01. [Claim 2] The composition according to claim 1, wherein the crosslinking group is an epoxy group or an ethylenically unsaturated group. [Claim 3] The composition according to claim 1 or 2, wherein the fluorine-containing compound having the crosslinking group has a perfluoroalkyl group or a perfluoroalkylene chain. [Claim 4] (I) The composition according to claim 1 or 2, wherein the alkali-soluble material is a compound and / or an alkali-soluble polymer containing two or more (meth)acryloyloxy groups. [Claim 5] (I) The composition according to claim 1 or 2, wherein the alkali-soluble material comprises a compound containing two or more (meth)acryloyloxy groups. [Claim 6] (I) The composition according to claim 5, wherein the alkali-soluble material further comprises an alkali-soluble polymer. [Claim 7] (III) The composition according to claim 1 or 2, further comprising a coloring agent. [Claim 8] (IV) The composition according to claim 1 or 2, further comprising a polymerization initiator. [Claim 9] (V) The composition according to claim 1 or 2, further comprising a solvent. [Claim 10] A step of applying the composition according to claim 1 or 2 to a substrate to form a coating film, The process of heating the coating film and A method for producing a cured film comprising the above. [Claim 11] A cured film manufactured or that can be manufactured by the method of claim 10. [Claim 12] A cured film comprising an alkali-soluble material and a polymer derived from a fluorine-containing compound having a crosslinking group. [Claim 13] The cured film according to claim 11, wherein the upper part of the cured film is oil-repellent and the lower part is lipophilic. [Claim 14] A light conversion device comprising the cured film described in claim 11. [Claim 15] A display device comprising the cured film described in claim 11.