Sanitary washing equipment and toilet equipment

Abstract

To provide a sanitary washing device and a toilet device that can dispense a sufficient amount of washing water. [Solution] A sanitary cleaning device comprising: a cleaning nozzle configured to move back and forth between a retracted position and an extended position; device cleaning units 6 and 53 that discharge water to a part of the sanitary cleaning device for cleaning; a cleaning nozzle water circuit that circulates the cleaning water discharged from the cleaning nozzle to the cleaning nozzle; and device cleaning unit water circuits L2 to L4, which are composed of water circuits different from the cleaning nozzle water circuit and circulate the cleaning water discharged from the device cleaning unit to the device cleaning unit.

Description

Technical Field

[0001] The present disclosure relates to a sanitary cleaning device and a toilet device.

Background Art

[0002] In a toilet device, a nozzle cleaning unit and a shutter cleaning unit for cleaning a cleaning nozzle discharge cleaning water using the same water circuit as the cleaning nozzle for cleaning a local area (see, for example, Patent Document 1).

Prior Art Documents

Patent Documents

[0003]

Patent Document 1

Summary of the Invention

Problems to be Solved by the Invention

[0004] In a configuration where cleaning water is discharged using the same water circuit as in the prior art, there is a limit to the amount of cleaning water. An object of the present disclosure is to provide a sanitary cleaning device and a toilet device capable of making the amount of cleaning water discharged sufficient.

Means for Solving the Problems

[0005] The present disclosure is a sanitary cleaning device provided in a functional unit arranged in a toilet and having a body cleaning function, including a cleaning nozzle configured to be able to advance and retreat between a storage position and an extended position, a device cleaning unit that discharges water to a part of the sanitary cleaning device for cleaning, a cleaning nozzle water circuit that circulates the cleaning water discharged from the cleaning nozzle to the cleaning nozzle, and a device cleaning unit water circuit that is constituted by a water circuit different from the cleaning nozzle water circuit and circulates the cleaning water discharged from the device cleaning unit to the device cleaning unit.

Brief Description of the Drawings

[0006] [Figure 1]This is a perspective view of a toilet device according to one embodiment. [Figure 2] This is a view of the functional unit from the front, with the cover removed. [Figure 3] This is a front view of the functional unit with the cover and shutter removed. [Figure 4] This is a perspective view of the shutter cleaning section from an oblique angle above. [Figure 5] This is a perspective view of the front of the functional section, seen from a diagonal downward angle. [Figure 6] This is a perspective view of the front of the functional unit, with the shutter mechanism removed, seen from a diagonal downward angle. [Figure 7] This is a cross-sectional view of the unitized cleaning nozzle and support frame, seen from the side. [Figure 8] This is a perspective view of the cleaning section on the underside of the nozzle, seen from an oblique upward angle. [Figure 9] This is a plan view of the functional unit with the cover removed, seen from above. [Figure 10] This is a diagram showing the washing water circuit. [Figure 11] This diagram shows the timing of the cleaning operations of the cleaning nozzle, nozzle cleaning unit, and shutter cleaning unit by the cleaning control unit. [Figure 12] This diagram shows the timing of the cleaning operations of the cleaning nozzle, nozzle cleaning unit, and shutter cleaning unit by the cleaning control unit according to another embodiment. [Modes for carrying out the invention]

[0007] One embodiment of the toilet device 1 will be described with reference to the drawings. In the following description, the front-to-back direction as seen from the perspective of a user seated on the toilet seat (not shown) will be denoted as the front-to-back direction Y. The left-to-right direction as seen from the perspective of a user seated on the toilet seat will be denoted as the left-to-right direction X. The up-and-down direction along the vertical direction with respect to the floor surface on which the toilet 2 is installed will be denoted as the up-and-down direction Z.

[0008] As shown in Figure 1, the toilet device 1 according to this embodiment comprises a toilet bowl 2, a toilet seat (not shown), a toilet lid 3, and a functional unit 4. The toilet bowl 2 is formed with an opening facing upward. The toilet bowl 2 is made of, for example, ceramic or resin. The toilet seat (not shown) and the toilet lid 3 are rotatably mounted above the toilet bowl 2.

[0009] As shown in Figures 1 and 2, the toilet bowl 2 has a toilet bowl 21, an upper surface 22, a toilet bowl recess 23, and an outer peripheral wall 24. The toilet bowl 21 is located on the front side of the toilet bowl 2. The toilet bowl 21 has an opening 211 at the top. The outer peripheral wall 24 surrounds the outside of the toilet bowl 21 and the piping, etc.

[0010] The toilet bowl recess 23 is positioned along the rear edge of the opening 211 of the toilet bowl 21 and is formed as a recess from the upper surface of the upper surface portion 22. As shown in Figure 2, the toilet bowl recess 23 has a bottom surface 231, a pair of side walls 232, and a rear wall 233 (see Figures 8, 9, and 11). In this embodiment, both the upper surface of the upper surface portion 22 of the toilet bowl 2 and the bottom surface 231 of the toilet bowl recess 23 of the toilet bowl 2 are the upper surface of the toilet bowl 2.

[0011] As shown in Figure 1, the functional unit 4 is positioned at the rear of the toilet bowl 2. In the toilet bowl 2, the majority of the functional unit 4 at the rear is positioned on the rear portion of the upper surface 22 of the toilet bowl 2, while a portion of the front is positioned above the upper part of the toilet bowl recess 23 and above the rear side of the toilet bowl 21. The functional unit 4 has a functional unit protrusion 42. The functional unit protrusion 42 is formed on the front side of the functional unit 4, projecting downwards from the functional unit 4. The functional unit protrusion 42 is positioned in the toilet bowl recess 23 of the toilet bowl 2 when the functional unit 4 is installed on the upper surface 22 of the toilet bowl 2 other than the toilet bowl recess 23.

[0012] The functional unit 4 comprises at least a sanitary cleaning device 5 for cleaning the user's private parts. As shown in Figures 1 and 2, the functional unit 4 includes a functional component comprising the sanitary cleaning device 5, a base plate 41 (base member), and a cover member 411 that covers the outer shape of the functional unit. At least a portion of the functional component of the functional unit 4 is arranged on the base plate 41.

[0013] Functional components are installed on the base plate 41 and other installation positions in consideration of various functions and the positional relationship with other members. Functional components include, for example, a warming device for a toilet seat (not shown), a toilet cleaning device equipped with a cleaning tank, a sanitary cleaning device 5 (see FIG. 3) for cleaning the user's private parts, a hose, a power supply unit, a control circuit board, an electric opening and closing unit for electrically opening and closing the toilet seat and lid 3, a valve unit, various pipes, etc.

[0014] The sanitary cleaning device 5 has a body cleaning function. As shown in FIG. 3 and the like, it includes a pair of cleaning nozzles 51 that can move forward and backward, a shutter part 52 (see FIG. 2) for opening and closing the front-side opening of the cleaning nozzle 51, a nozzle cleaning part 53 (see FIG. 7), a shutter cleaning part 6 (see FIG. 2 and the like), a warm air drying device 54, and a cleaning control part 55 (see FIG. 10). In FIG. 3, the illustration of the shutter part 52 is omitted.

[0015] The pair of cleaning nozzles 51 are arranged apart from each other in the left-right direction X at the center in the left-right direction X on the front side of the functional part 4. The pair of cleaning nozzles 51 are each used for anal cleaning or bidet cleaning to clean the user's private parts. The cleaning nozzle 51 discharges cleaning water toward the body through a nozzle water discharge port 51a (see FIG. 7) provided at the upper part of the tip side.

[0016] The pair of cleaning nozzles 51 can move forward and backward between a storage position shown in FIGS. 3 and 7 and an extended position that protrudes forward from the shutter part 52 in the front-back direction Y from that position. The storage position of the cleaning nozzle 51 is a position where the cleaning nozzle 51 is stored inside the shutter part 52. The extended position of the cleaning nozzle 51 is a position where it extends forward to clean the user's private parts. A rack of a nozzle drive mechanism (not shown) is provided on the back side of the cleaning nozzle 51.

[0017] The nozzle drive mechanism not shown includes a long rack, a pinion, and a motor. The pinion meshes with the rack and is rotated by the drive of the motor. The cleaning nozzle 51 is advanced obliquely downward with respect to the support frame 501 that is unitized with the cleaning nozzle 51 to form a cleaning nozzle unit by the nozzle drive mechanism not shown, so that the tip thereof is configured to push the back surface (inner surface) of the shutter portion 52 from the back side to the front side in FIG. 2.

[0018] As shown in FIG. 7, a nozzle lower cleaning portion 536 as a nozzle lower surface cleaning portion is provided unitarily with the cleaning nozzle 51 below the cleaning nozzle 51. As shown in FIG. 8, a pair of nozzle lower cleaning portions 536 are provided and are formed in a cylindrical shape having a space for circulating cleaning water inside. An enlarged water discharge port 5361 that constitutes a water discharge hole that spreads left and right from the base side of the nozzle lower cleaning portion 536 toward the end surface is formed on the end surface of the tip portion of the nozzle lower cleaning portion 536. Thereby, the cleaning water is discharged so as to spread in the left and right directions from the enlarged water discharge port 5361, enabling cleaning over the width of the cleaning nozzle 51 with respect to the back side (lower side) of the cleaning nozzle 51. As a result, the nozzle lower cleaning portion 536 can be made small in shape, and a wide water spraying effect on the back side of the cleaning nozzle 51 can be obtained.

[0019] As shown in Figure 7, an upper nozzle cleaning section 535, which serves as a nozzle top surface cleaning section, is provided above the cleaning nozzle 51, unitized with the cleaning nozzle 51. The upper nozzle cleaning section 535 has an outlet 5351 formed as a through-hole that constitutes a water discharge hole. The outlet 5351 does not widen as much as the enlarged water discharge outlet 5361, and therefore one outlet 5351 discharges cleaning water onto the upper surface of the cleaning nozzle 51 in a narrower area than the enlarged water discharge outlet 5361. Multiple such outlets 5351 are formed. This makes it possible to clean the front (upper) side of the cleaning nozzle 51 with water covering the width of the cleaning nozzle 51. For this reason, the upper nozzle cleaning section 535 discharges cleaning water at a faster flow rate and a higher flow rate (instantaneous flow rate, which is the flow rate per unit time) than the lower nozzle cleaning section 536. This allows the upper nozzle cleaning section 535 to be made smaller, and a high flow rate effect for the cleaning water can be obtained on the upper surface of the cleaning nozzle 51.

[0020] On the upper side of the cleaning nozzle 51, closer to the base relative to the tip of the cleaning nozzle 51, a silver ion supply unit 537, which constitutes the disinfectant water supply unit, is provided as a unit with the cleaning nozzle 51. The silver ion supply unit 537 supplies silver ions to the cleaning water, thereby making the cleaning water disinfectant water, which can then be discharged from the outlet 5351 of the nozzle upper cleaning unit 535 to the cleaning nozzle 51. This makes it possible to disinfect the cleaning nozzle 51.

[0021] The shutter section 52 is positioned in the center of the left-right direction X on the front side of the functional section protrusion 42. The shutter section 52 is formed as a plate extending in the left-right direction X (lateral direction) of the toilet bowl 2. When the shutter section 52 is in the closed position, it is formed as a plane with a downward slope that goes down from the front to the rear (see Figure 7, etc.).

[0022] The shutter section 52 opens and closes the opening 432 of the functional section front frame 43, which is formed in front of the cleaning nozzle 51, as the cleaning nozzle 51 moves forward and backward, and its back surface is pressed against the cleaning nozzle 51. The functional section front frame 43 is fixed to the base plate 41. The functional section front frame 43 has an opening 432 (front opening) which constitutes the front opening of the cleaning nozzle 51. The opening 432 is an open portion formed on the front side of the functional section 4. When the shutter section 52 is in the closed position, it is positioned in the opening 432 of the functional section front frame 43.

[0023] As shown in Figures 2 and 3, the hot air drying device 54 is positioned behind the shutter section 52 in the closed position, on the outside of one side in the left-right direction X. The hot air drying device 54 has a hot air outlet 541. The hot air outlet 541 is formed to open upward behind the opening 432 of the functional section front frame 43. The hot air drying device 54 can, for example, blow hot air from the hot air outlet 541 towards the human body with the shutter section 52 open at a predetermined timing after the cleaning operation of the sanitary cleaning device 5, or blow hot air onto the back surface of the shutter section 52 after cleaning with the shutter section 52 closed to blow away water droplets.

[0024] As shown in Figure 10, the sanitary cleaning device 5 has a cleaning water circuit 56 through which cleaning water flows to clean the front and back surfaces of the cleaning nozzle 51 and the shutter section 52. The cleaning water circuit 56 supplies cleaning water to the nozzle cleaning section 53 and the shutter cleaning section 6, which are the cleaning sections of the device. In this embodiment, cleaning also includes cleaning with disinfectant water (silver ion water, hypochlorous acid), high-temperature water, foam cleaning, etc.

[0025] As shown in Figure 10, the cleaning water circuit 56 includes a cleaning water supply channel L1 that supplies cleaning water to the sanitary cleaning device 5, a left-side shutter cleaning channel L2, a right-side shutter cleaning channel L3, and a nozzle cleaning channel L4. The nozzle cleaning channel L4 branches into a nozzle upper side channel L41 and a nozzle lower side channel L42 midway. The flow rate of cleaning water in the cleaning water supply channel L1 is greater than the flow rate of cleaning water in the cleaning nozzle water circuit, which is composed of a hose that circulates cleaning water from the nozzle discharge port 51a of the cleaning nozzle 51 toward the human body to the cleaning nozzle 51. This makes it possible to clean the cleaning nozzle 51 and the shutter section 52 with a sufficient flow rate of cleaning water. Furthermore, the flow rates of cleaning water discharged from the nozzle cleaning section 53 and the shutter cleaning section 6 are each greater than the flow rates of cleaning water discharged from the cleaning nozzle 51. This makes it possible to clean the cleaning nozzle 51 with a sufficient flow rate of discharged water. In all the above, "flow rate" refers to instantaneous flow rate (flow rate per unit time).

[0026] The cleaning water circuit 56 consists of a nozzle cleaning unit 53, a shutter cleaning unit 6, a solenoid valve 571, a pressure reducing valve 572, a vacuum breaker 573, and a disc valve 564, and performs each cleaning operation of the sanitary cleaning device 5.

[0027] The left-side shutter cleaning channel L2, the right-side shutter cleaning channel L3, the nozzle cleaning channel L4, the nozzle upper side channel L41, and the nozzle lower side channel L42 are, for example, made of rubber hoses. These constitute a water circuit for the device cleaning section, which is a different water circuit from the water circuit for the cleaning nozzle, which is made up of hoses that circulate cleaning water discharged from the nozzle outlet 51a of the cleaning nozzle 51 toward the human body to the cleaning nozzle 51. Here, "different water circuits" means that each water circuit has its own independently openable and closable water supply valve, rather than being opened and closed by a common water supply valve. That is, the cleaning water circuit 56 is made up of a solenoid valve 571, but in the cleaning nozzle water circuit (not shown), there is another water supply valve (water supply valve for cleaning nozzles) that can be opened and closed independently of the solenoid valve 571. The right-side shutter cleaning channel L3 constitutes a dedicated water circuit that circulates cleaning water only to the shutter cleaning section 6. The nozzle cleaning channel L4 (nozzle upper side channel L41, nozzle lower side channel L42) constitutes a dedicated water circuit that supplies cleaning water only to the nozzle cleaning unit 53. This allows cleaning by the nozzle cleaning unit 53 to be performed simultaneously with the cleaning operation of the cleaning nozzle 51 without reducing the flow rates of each. Furthermore, it becomes possible to perform nozzle cleaning first and shutter cleaning afterward, thereby allowing dirt generated during nozzle cleaning to be washed away to the outside of the main body of the functional unit (base plate 41, cover member 411) by shutter cleaning.

[0028] The solenoid valve 571, pressure reducing valve 572, vacuum breaker 573, and disc valve 564 are provided and connected in this order in the cleaning water supply channel L1. The opening and closing operations of the solenoid valve 571 and disc valve 564 are controlled by the cleaning control unit 55. By controlling the opening and closing operations of the solenoid valve 571 and disc valve 564, the nozzle cleaning unit 53 and shutter cleaning unit 6 discharge cleaning water.

[0029] The upstream end of the left shutter cleaning channel L2 is connected to a disc valve 564, and the downstream end of the left shutter cleaning channel L2 is connected to an inlet 615 at the left end of the shutter cleaning unit 6. The upstream end of the right shutter cleaning channel L3 is connected to a disc valve 564, and the downstream end of the right shutter cleaning channel L3 is connected to an inlet 616 at the left end of the shutter cleaning unit 6. The cleaning water flowing into inlets 615 and 616 flows through the internal channels of the shutter cleaning unit 6 and is discharged from the front outlet 611 and the rear outlet 621 of the shutter cleaning unit 6.

[0030] The upstream end of the nozzle cleaning channel L4 is connected to a disc valve 564, the downstream end of the nozzle upper side channel L41, to which the nozzle cleaning channel L4 branches off, is connected to the nozzle upper cleaning section 535 of the nozzle cleaning unit 53, and the downstream end of the nozzle lower side channel L42 is connected to the nozzle lower cleaning section 536 of the nozzle cleaning unit 53. The cleaning water that flows through the nozzle upper cleaning section 535 is discharged from the outlet 5351 of the nozzle upper cleaning section 535 onto the upper surface of the cleaning nozzle 51. The cleaning water that flows through the nozzle lower cleaning section 536 is discharged from the outlet 5361 of the nozzle lower cleaning section 536 onto the lower surface of the cleaning nozzle 51.

[0031] The shutter cleaning unit 6 cleans the front surface 52a and back surface 52b (see Figure 7) of the shutter unit 52 when the shutter unit 52 is closed, with the opening 432 closed. The shutter cleaning unit 6 is positioned above the upper end of the shutter unit 52. When the shutter unit 52 is in the closed position with the opening 432 closed, the shutter cleaning unit 6 discharges cleaning water downwards onto the shutter unit 52.

[0032] In this embodiment, "the state in which the shutter unit 52 closes the opening 432" or "the state in which the shutter unit 52 is in the closed position with the opening 432 closed" does not mean that the shutter unit 52 completely closes the opening 432. "The state in which the shutter unit 52 closes the opening 432" or "the state in which the shutter unit 52 is in the closed position with the opening 432 closed" also includes, for example, a state in which the shutter unit 52 is generally blocking the opening 432 when it is slightly open due to being pushed by the cleaning nozzle 51.

[0033] As shown in Figures 5, 6, and 7, the shutter cleaning unit 6 includes a front cleaning water discharge unit 61 (front side cleaning unit), a rear side cleaning water discharge unit 62 (back side cleaning unit), a receiving unit 64, and a cleaning unit fixing unit 66.

[0034] The front cleaning water discharge section 61 has a plurality of front water outlets 611, as shown in Figures 5 and 6. The plurality of front water outlets 611 discharge cleaning water onto the front surface 52a of the shutter section 52. The back cleaning water discharge section 62 has a plurality of back water outlets 621. The plurality of back water outlets 621 discharge cleaning water onto the back surface 52b of the shutter section 52. The front surface 52a and back surface 52b of the shutter section 52 are treated with a hydrophilic coating or textured finish to allow the cleaning water to spread. Such a hydrophilic coating may be applied to at least one of the front surface 52a and back surface 52b, and the hydrophilic coating is not limited to textured finish.

[0035] The front cleaning water discharge section 61 and the rear cleaning water discharge section 62 discharge cleaning water that has been temporarily circulated in the cleaning water distribution section 63. As shown in Figures 2 and 3, the cleaning water distribution section 63 is located inside the cover member 411 at the upper part of the front of the functional section 4. The cleaning water distribution section 63 is formed in a hollow shape that extends in the left-right direction X. The lower surface 632 of the cleaning water distribution section 63 is formed in a planar shape that has a width in the front-back direction Y and extends in the left-right direction X.

[0036] The lower surface 632 of the cleaning water distribution section 63 has multiple front outlets 611 of the front cleaning discharge section 61 and multiple rear outlets 621 of the rear cleaning discharge section 62. As shown in Figure 4, both ends of the cleaning water distribution section 63 in the left-right direction X have inlets 615 and 616, respectively, which are connected to the downstream end of the left shutter cleaning flow path L2 and the downstream end of the right shutter cleaning flow path L3. Inlets 615 and 616 are welded to the shutter cleaning section 6 to form a single unit. Cleaning water is introduced into the cleaning water distribution section 63 via the left shutter cleaning flow path L2 and the right shutter cleaning flow path L3. The cleaning water that has temporarily flowed through the cleaning water distribution section 63 is discharged toward the shutter section 52 by the multiple front outlets 611 of the front cleaning discharge section 61 and the multiple rear outlets 621 of the rear cleaning discharge section 62.

[0037] As shown in Figures 5 and 6, the multiple front outlets 611 and multiple rear outlets 621 are arranged in two rows, front to back, on the lower surface 632 of the washing water distribution section 63. The multiple front outlets 611 are located on the front side in the front-to-back direction Y of the lower surface 632 of the washing water distribution section 63, and the multiple rear outlets 621 are located on the rear side in the front-to-back direction Y. The multiple front outlets 611 and multiple rear outlets 621 are arranged in a linear fashion in the left-to-right direction X, alternating between each other, so that their positions in the left-to-right direction X do not overlap in the area where the shutter section 52 is provided in the left-to-right direction X.

[0038] As shown in Figure 7, the multiple front water outlets 611 are formed by through holes that penetrate the lower surface 632 of the washing water flow section 632 diagonally in the vertical direction Z, on the front side in the front-to-back direction Y of the lower surface 632 of the washing water flow section 63. As shown in Figure 5, the multiple front water outlets 611 open downward so that washing water flows along the front surface 52a of the shutter section 52 when the shutter section 52 is in the closed position.

[0039] Multiple front outlets 611 open downwards, in the direction of the upper bent portion 521 of the shutter section 52. As a result, the cleaning water discharged from the multiple front outlets 611 is discharged along the upper bent portion 521 of the shutter section 52 and flows along the front surface 52a of the shutter section 52, thereby cleaning the front surface 52a of the shutter section 52. Furthermore, since the direction of water discharge from the outlets 611 is parallel to the front surface 52a of the shutter section 52, it is possible to reduce the impact of variations in the shutter section 52. In addition, even when cleaning water is discharged from the front outlets 611 and rear outlets 621 with the shutter section 52 removed, it is possible to avoid the cleaning water from the multiple front outlets 611 and rear outlets 621 coming into contact with a person.

[0040] As shown in Figure 7, the multiple rear outlets 621 are formed by through holes that penetrate the lower surface 632 of the washing water distribution section 63 diagonally in the vertical direction Z, behind the multiple front outlets 611 on the lower surface 632 of the washing water distribution section 63. As shown in Figure 5, when the shutter section 52 is in the closed position, the multiple rear outlets 621 open downward so that washing water flows along the back surface 52b (see Figure 7) of the shutter section 52.

[0041] Multiple rear-facing water outlets 621 open downwards, in a direction that aligns with the back surface 52b of the shutter section 52. As a result, the cleaning water discharged from the multiple rear-facing water outlets 621 is discharged along the back surface 52b of the shutter section 52 and flows along the back surface 52b of the shutter section 52, thereby cleaning the back surface 52b of the shutter section 52. Furthermore, this opening direction is such that the shutter cleaning section 6 discharges the cleaning water in a direction where electrical components (not shown) housed inside the functional section 4 are not located. Here, "a direction where electrical components are not located" includes not only a direction in which electrical components are not located on the extension of the direction in which the cleaning water is discharged from the shutter cleaning section 6, but also a direction in which the cleaning water discharged from the shutter cleaning section 6 does not come into contact with the electrical components. Therefore, it is possible to avoid the electrical components being exposed to water.

[0042] Furthermore, multiple front outlets 611 and rear outlets 621 are formed on the lower surface 632. Since the number of nozzle outlets 51a of the cleaning nozzle 51 is smaller and the total opening area is smaller, the flow rate of the cleaning water discharged from the nozzle cleaning section 53 is faster than the flow rate of the cleaning water discharged from the shutter cleaning section 6. This makes it possible to obtain a powerful cleaning effect on the cleaning nozzle 51. In addition, the flow rate of the cleaning water discharged from the shutter cleaning section 6 is greater than the flow rate of the cleaning water discharged from the nozzle cleaning section 53. This makes it possible to thoroughly clean the front and back surfaces of the shutter section 52, which has a larger surface area than the cleaning nozzle 51.

[0043] As shown in Figure 4, the receiving portion 64 is provided in a pair at predetermined intervals in the longitudinal direction of the shutter cleaning portion 6 in the central part of the shutter cleaning portion 6. The receiving portion 64 is made up of a plate-shaped member that is integrally fixed to the shutter cleaning portion 6 and has a positional relationship perpendicular to the longitudinal direction of the shutter cleaning portion 6.

[0044] A rotating shaft engagement portion 643 is formed in the upper front part of the receiving portion 64, which is a notch into which the rotating shaft 583 of the shutter portion 52 can be detachably engaged. By engaging the rotating shaft 583 of the shutter portion 52 with the rotating shaft engagement portion 643, the shutter portion 52 is rotatably supported by the shutter cleaning portion 6. This makes it possible to integrate the shutter portion 52 with the shutter cleaning portion 6 as a single component, and minimizes variations in the shutter portion 52 that is the target of water discharge.

[0045] The rear end portion 642 of the receiving portion 64 is in contact with the support frame 501 that supports the cleaning nozzle 51. As a result, the shutter cleaning unit 6 is supported on the base plate 41 at a position away from the inlets 615 and 616 that are welded to the shutter cleaning unit 6. Therefore, when attaching the shutter unit 52 to the shutter arm 58, which is engaged by pushing the rotating shaft 583 into the rotating shaft engaging portion 643, the receiving portion 64 that is in contact with the support frame 501 can resist the pushing force and prevent the shutter cleaning unit 6 from bending.

[0046] As shown in Figure 7, the rear end portion 642 of the receiving portion 64 abuts against the support frame 501 which is unitized with the cleaning nozzle 51. This positions the shutter cleaning unit 6 relative to the cleaning nozzle 51. Therefore, it is possible to suppress variations in the position of the shutter cleaning unit 6 relative to the cleaning nozzle 51.

[0047] The cleaning unit fixed part 66 is provided integrally with the shutter cleaning unit 6 at a position closer to the center in the longitudinal direction of the shutter cleaning unit 6 than the inlets 615 and 616 of the shutter cleaning unit 6. The cleaning unit fixed part 66 is fixed to the base plate 41 by screws, thereby fixing the shutter cleaning unit 6 to the base plate 41.

[0048] A shutter arm 58 is fixed to the back surface 52b of the shutter section 52 to support the shutter section 52. The shutter arm 58 has a supported portion 581 that extends in the longitudinal direction of the shutter section 52, and a pair of plate-shaped shutter fixing portions 582 that extend downward from both ends of the supported portion 581. The shutter section 52 is fixed to the lower part of the shutter fixing portions 582, thereby allowing the shutter arm 58 to support the shutter section 52. A rotating shaft 583 passes through the supported portion 581. The rotating shaft 583 engages with a rotating shaft engaging portion 643. As a result, the shutter section 52 and the shutter arm 58 are rotatably supported with respect to the receiving portion 64.

[0049] Next, the timing of the cleaning operations of the cleaning nozzle 51, nozzle cleaning unit 53, and shutter cleaning unit 6 by the cleaning control unit 55 will be explained. As shown in Figure 11, the cleaning control unit 55 controls each cleaning operation of the sanitary cleaning device 5. The cleaning control unit 55 controls the cleaning water circuit 56 to perform cleaning control of the sanitary cleaning device 5.

[0050] First, the cleaning control unit 55 controls the pre-cleaning operation by discharging cleaning water from the cleaning nozzle 51 and the nozzle cleaning unit 53 when the cleaning nozzle 51 is in the retracted position ("retracted" in Figure 11). Next, the cleaning control unit 55 controls the localized cleaning operation ("buttocks cleaning" in Figure 11) by advancing the cleaning nozzle 51 to the extended position ("cleaning position" in Figure 11), which is a position that protrudes beyond the shutter unit 52, and discharging cleaning water from the cleaning nozzle 51 to clean the user's private parts.

[0051] Next, the cleaning control unit 55 controls the retraction of the cleaning nozzle 51, returning it to its stored position ("stored" in Figure 11). Simultaneously, the cleaning control unit 55 controls the discharge of cleaning water from the upper nozzle cleaning unit 535 and the lower nozzle cleaning unit 536 of the nozzle cleaning unit 53 to clean the cleaning nozzle 51 while it is returning to its stored position, and also cleans the cleaning nozzle 51 when it has returned to its stored position. Finally, the cleaning control unit 55 terminates the discharge of cleaning water from the upper nozzle cleaning unit 535 and the lower nozzle cleaning unit 536 of the nozzle cleaning unit 53.

[0052] Next, the cleaning control unit 55 controls the closed shutter unit 52 to start discharging cleaning water from the front outlet 611 and the rear outlet 621 of the shutter cleaning unit 6. This allows the cleaning water to flow along the front 52a and rear 52b of the shutter unit 52, preventing the cleaning water from strongly contacting the shutter unit 52 and splashing.

[0053] Then, after a predetermined time has elapsed, the cleaning control unit 55 controls the discharge of cleaning water from the front water outlet 611 and the rear water outlet 621 of the shutter cleaning unit 6 to end. In other words, the cleaning of the shutter unit 52 by the shutter cleaning unit 6 starts after the cleaning of the cleaning nozzle 51 by the nozzle cleaning unit 53 has started, and the cleaning of the shutter unit 52 by the shutter cleaning unit 6 ends after the cleaning of the cleaning nozzle 51 by the nozzle cleaning unit 53 has ended. This makes it possible to remove any dirt that has been scattered by the cleaning of the cleaning nozzle 51 and has adhered to the shutter unit 52 by cleaning the shutter unit 52.

[0054] After the user has left the toilet seat, the washing control unit 55 controls the washing nozzle 51 to move forward to the extended position (the "washing position" in Figure 11). Next, the washing control unit 55 controls the washing nozzle 51 to retract, returning it to the stored position (the "stored" position in Figure 11). At the same time, the washing control unit 55 controls the dispensing of washing water from the nozzle washing unit 53 to perform a post-wash.

[0055] In the post-cleaning process, the amount, flow rate (instantaneous flow rate), and flow velocity of the cleaning water discharged by the nozzle cleaning unit 53 are greater than the amount of cleaning water discharged by the nozzle cleaning unit 53 in the pre-cleaning process. This makes it possible to clean the cleaning nozzles 51 immediately after they have been cleaned with more cleaning water in the post-cleaning process than in the pre-cleaning process, which is performed on cleaning nozzles 51 that are hardly dirty.

[0056] Next, the cleaning control unit 55 controls the silver ion supply unit 537 to supply silver ions to the cleaning water after the post-cleaning, and controls the cleaning water to be treated as disinfectant water and discharged from the nozzle upper cleaning unit 5351 to the cleaning nozzle 51. In other words, the silver ion supply unit 537 and the nozzle upper cleaning unit 535, acting as disinfectant water supply units, discharge disinfectant water to the cleaning nozzle 51 after the user has left the toilet and after the post-cleaning. This makes it possible to disinfect the cleaning nozzle 51 with disinfectant water when the dirt has been reliably removed by the post-cleaning and when the user is not seated. Therefore, although disinfection requires a predetermined time, it is possible to ensure that predetermined time after the disinfectant water is discharged.

[0057] Preferred embodiments of this disclosure have been described. This disclosure is not limited to the embodiments described above and may be modified as appropriate. For example, in another embodiment, as shown in Figure 12, after the localized washing operation ("buttock washing" in Figure 12) in which washing water is discharged from the washing nozzle 51 to wash the user's private parts is completed, and after washing the washing nozzle 51 is started by discharging washing water from the upper nozzle washing section 535 and the lower nozzle washing section 536 of the nozzle washing unit 53, and before the washing nozzle 51 moves to the storage position ("storage" in Figure 12), post-washing is started by discharging disinfectant water onto the washing nozzle 51. Then, after the washing of the washing nozzle 51 by discharging washing water from the upper nozzle washing section 535 and the lower nozzle washing section 536 of the nozzle washing unit 53 is completed, post-washing may be completed. For example, the device may have a cover cleaning unit that discharges cleaning water to clean the cover member 411, which serves as the main body cover, and a dedicated water circuit that circulates the cleaning water only to the cover cleaning unit. In this case, the cover cleaning unit can clean the main body cover after the shutter unit has been cleaned by the shutter cleaning unit. Alternatively, for example, the system may have a base cleaning unit that discharges cleaning water to clean the base member, and a dedicated water circuit that circulates the cleaning water only to the base cleaning unit. In this case, the base cleaning unit can clean the base member after the shutter unit has been cleaned by the shutter cleaning unit. [Explanation of symbols]

[0058] 1 Toilet unit, 2 Toilet bowl, 4 Functional unit, 5 Sanitary cleaning unit, 6 Shutter cleaning unit (unit cleaning unit), 41 Base plate (base member), 51 Cleaning nozzle, 52 Shutter unit, 53 Nozzle cleaning unit (unit cleaning unit), 61 Front cleaning water discharge unit (front side cleaning unit), 62 Back cleaning water discharge unit (back side cleaning unit), 64 Receiving unit, 535 Nozzle upper cleaning unit (disinfectant water supply unit), 536 Nozzle lower cleaning unit, 537 Silver ion supply unit (disinfectant water supply unit), L2 Left side shutter cleaning flow path (water circuit for unit cleaning unit), L3 Right side shutter cleaning flow path (water circuit for unit cleaning unit), L4 Nozzle cleaning flow path (water circuit for unit cleaning unit),

Claims

1. A sanitary washing device having a human body washing function, which is installed in the functional part of a toilet bowl, A cleaning nozzle configured to move back and forth between a retracted position and an extended position, A cleaning unit that sprays water onto a part of the sanitary cleaning device to perform cleaning, A water circuit for a cleaning nozzle that circulates the cleaning water discharged from the cleaning nozzle to the cleaning nozzle, The device includes a water circuit for the device cleaning section, which is composed of a different water circuit from the water circuit for the cleaning nozzle, and which circulates the cleaning water discharged from the device cleaning section to the device cleaning section. The aforementioned water circuit for the cleaning nozzle is equipped with a water supply valve for the cleaning nozzle. The water circuit for the device cleaning section is equipped with a water supply valve for the device cleaning section that is different from the water supply valve for the cleaning nozzle. The device cleaning unit includes a nozzle cleaning unit that discharges cleaning water to clean the cleaning nozzle. The water circuit for the device cleaning section has a dedicated water circuit for circulating cleaning water to the nozzle cleaning section. The flow rate of cleaning water in the water circuit for the cleaning section of the device is greater than the flow rate of cleaning water in the water circuit for the cleaning nozzle. Sanitary cleaning equipment.

2. The sanitary cleaning device according to claim 1, further comprising a disinfectant water supply unit that enables the disinfectant water to be discharged to the cleaning nozzle as cleaning water.

3. The sanitary cleaning device according to claim 1, wherein the dedicated water circuit is branched in the middle into a flow path on the upper side of the nozzle and a flow path on the lower side of the nozzle.

4. The nozzle upper side flow path is connected to the nozzle upper side cleaning section, The nozzle lower side flow path is connected to the nozzle lower side cleaning section, The sanitary cleaning device according to claim 3, wherein the upper nozzle cleaning section discharges cleaning water at a faster flow rate than the lower nozzle cleaning section.

5. The nozzle upper side flow path is connected to the nozzle upper side cleaning section, The nozzle lower side flow path is connected to the nozzle lower side cleaning section, The sanitary cleaning device according to claim 3, wherein the upper nozzle cleaning section discharges cleaning water at a greater flow rate than the lower nozzle cleaning section.

6. The nozzle upper side flow path is connected to the nozzle upper side cleaning section, The sanitary cleaning device according to claim 3, wherein the upper nozzle cleaning section has a discharge port consisting of a plurality of through holes.

7. A shutter section that opens and closes an opening formed in front of the cleaning nozzle, It comprises a shutter cleaning unit that discharges cleaning water to clean the shutter unit, The sanitary cleaning device according to claim 1, wherein the water circuit for the device cleaning section has a dedicated water circuit for the shutter that circulates cleaning water to the shutter cleaning section.

8. The sanitary cleaning device according to claim 7, wherein the flow velocity of the cleaning water discharged from the nozzle cleaning unit is faster than the flow velocity of the cleaning water discharged from the shutter cleaning unit.

9. The sanitary cleaning device according to claim 7, wherein the flow rate of cleaning water discharged from the shutter cleaning unit is greater than the flow rate of cleaning water discharged from the nozzle cleaning unit.

10. The functional unit has a main body cover, The device cleaning unit has a cover cleaning unit that discharges cleaning water to clean the main body cover, The sanitary cleaning device according to claim 1, wherein the water circuit for the device cleaning section has a dedicated water circuit for circulating cleaning water to the cover cleaning section.

11. The functional part has a base member, The device cleaning unit has a base cleaning unit that discharges cleaning water to clean the base member, The sanitary cleaning device according to claim 1, wherein the water circuit for the device cleaning section has a dedicated water circuit for circulating cleaning water to the base cleaning section.

12. The sanitary cleaning device according to claim 1, further comprising a cleaning control unit that controls the cleaning nozzle to discharge water from the nozzle cleaning unit to perform a pre-cleaning when the cleaning nozzle is in the retracted position, and to discharge water from the nozzle cleaning unit to perform a post-cleaning after the user has removed themselves from the toilet seat.

13. The sanitary cleaning apparatus according to claim 12, wherein the cleaning control unit controls the flow rate of cleaning water discharged by the nozzle cleaning unit in the post-cleaning to be greater than the flow rate of cleaning water discharged in the pre-cleaning.

14. The sanitary cleaning apparatus according to claim 12, wherein the cleaning control unit controls the flow rate of the cleaning water discharged by the nozzle cleaning unit in the post-cleaning stage to be faster than the flow rate of the cleaning water discharged in the pre-cleaning stage.

15. A disinfectant water supply unit that enables the disinfectant water to be discharged to the washing nozzle as disinfectant water for use with washing water. The sanitary cleaning device according to claim 12, wherein the cleaning control unit controls the disinfectant water supply unit to discharge disinfectant water to the cleaning nozzle after the user has removed themselves from the toilet seat and performed the post-cleaning with normal water.

16. A disinfectant water supply unit is provided which allows the disinfectant water to be discharged to the washing nozzle as disinfectant water. The sanitary cleaning apparatus according to claim 12, wherein the cleaning control unit controls the cleaning unit to start post-cleaning by discharging disinfectant water to the cleaning nozzle before the cleaning nozzle moves to the storage position, and to end the post-cleaning of disinfectant water after cleaning by discharging water from the nozzle cleaning unit is completed.

17. A toilet bowl and A functional unit located at the rear of the toilet bowl, A toilet device comprising a sanitary washing device according to any one of claims 1 to 16.

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