Film deposition apparatus, conductive film manufacturing apparatus, and film deposition method

JP2026094269APending Publication Date: 2026-06-09NIKON CORP

Patent Information

Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
NIKON CORP
Filing Date
2026-02-26
Publication Date
2026-06-09

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Abstract

This invention relates to a mist deposition apparatus and a mist deposition method that atomizes a solution containing fine material particles (nanoparticles) into a mist and sprays it onto a substrate to be treated, thereby forming a thin film of the material on the surface of the substrate. [Solution] A film-forming apparatus for supplying a mist containing fine particles to a substrate and forming a film containing fine particles on the surface of the substrate comprises an air guide member that covers at least a portion of the surface of the substrate, and a mist supply unit that supplies mist to the space between the surface of the substrate and the air guide member, wherein the mist supply unit includes a charge application unit that positively or negatively charges the mist, and a mist ejection unit that ejects the mist charged by the charge application unit into the space, and the air guide member has a wall surface facing the surface of the substrate and includes an electrostatic field generating unit that generates a potential on the wall surface with the same sign as the mist charged by the charge application unit.
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Claims

[Claim 1] A film-forming apparatus that supplies a mist containing fine particles to a substrate and forms a film containing the fine particles on the surface of the substrate, An air guide member covering at least a portion of the surface of the substrate, The system includes a mist supply unit that supplies the mist into the space between the surface of the substrate and the air guide member, The mist supply unit includes a charge-applying unit that positively or negatively charges the mist, and a mist ejection unit that ejects the mist charged by the charge-applying unit into the space. The air guide member has a wall surface facing the surface of the substrate, A film deposition apparatus comprising an electrostatic field generating unit that generates an electrostatic field on the wall surface having the same sign as the mist that is charged by the charge-applying unit.