Composition for improving skin condition after radiofrequency (RF) microneedling treatment, or after radiofrequency (RF) treatment or microneedling treatment.

JP2026096143APending Publication Date: 2026-06-12POLA CHEMICAL INDUSTRIES INC

Patent Information

Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
POLA CHEMICAL INDUSTRIES INC
Filing Date
2025-04-17
Publication Date
2026-06-12

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Abstract

To discover a novel composition that has an effect of improving the skin condition after radiofrequency (RF) microneedling treatment, or after radiofrequency (RF) treatment, or after microneedling treatment. [Solution] A composition for improving skin condition after radiofrequency (RF) microneedling treatment, radiofrequency (RF) treatment, or microneedling treatment, comprising D-pantothenyl alcohol.
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Claims

[Claim 1] A composition containing D-pantothenyl alcohol for improving skin condition after radiofrequency (RF) microneedling treatment, or after radiofrequency (RF) treatment or microneedling treatment. [Claim 2] A composition for improving skin condition after radiofrequency (RF) microneedling, radiofrequency (RF) treatment, or microneedling, which is for promoting improvement of skin pores after radiofrequency (RF) treatment, after radiofrequency (RF) treatment, or after microneedling treatment, for promoting suppression of sebum secretion after said treatment, for promoting improvement of acne scars after said treatment, for promoting improvement of skin brightness after said treatment, for promoting improvement of skin elasticity after said treatment, for promoting improvement of skin hardness after said treatment, for promoting improvement of skin texture after said treatment, for promoting improvement of skin wrinkles after said treatment, for promoting improvement of skin sagging after said treatment, for promoting recovery of stratum corneum moisture content after said treatment, for promoting recovery of skin barrier function after said treatment, for reducing skin roughness after said treatment, for reducing skin flushing after said treatment, for reducing skin redness after said treatment, for reducing skin pain after said treatment, and / or for reducing skin swelling after said treatment. [Claim 3] The aforementioned skin condition improving composition comprises suppressing the expression of genes for inflammatory factors and / or the production of the relevant proteins, and / or promoting the expression of genes related to collagen production and / or the production of the relevant proteins, and / or suppressing the expression of genes related to collagen degradation and / or the production of the relevant proteins, as described in claim 1 or 2, for use after radiofrequency (RF) microneedling treatment, after radiofrequency (RF) treatment, or after microneedling treatment. [Claim 4] The aforementioned skin condition improving composition is applied to the skin before, during, and / or after radiofrequency (RF) microneedling treatment, radiofrequency (RF) treatment, or microneedling treatment using needles of 0.1 mm or larger and / or using a frequency of 0.5 MHz or higher, and comprises promoting the improvement of pores by radiofrequency (RF) microneedling treatment, radiofrequency (RF) treatment, or microneedling treatment, promoting the improvement of skin elasticity, promoting the recovery of stratum corneum moisture content, and / or reducing skin redness, as described in claim 1 or 2. [Claim 5] The aforementioned skin condition improving composition is applied to the skin for three days or more in a total amount of the active ingredient, preferably in the range of 0.001 to 10 g / day, as described in claim 1 or 2, for use after radiofrequency (RF) microneedling treatment, after radiofrequency (RF) treatment, or after microneedling treatment. [Claim 6] A composition for improving the skin condition after radiofrequency (RF) microneedling treatment, radiofrequency (RF) treatment, or microneedling treatment, characterized by containing 0.01% to 20% by mass of D-pantothenyl alcohol as an active ingredient, according to claim 1 or 2. [Claim 7] A skin condition improving agent consisting of D-pantothenyl alcohol, used after radiofrequency (RF) microneedling treatment, or after any other radiofrequency (RF) treatment. [Claim 8] A cosmetic method for improving skin condition after radiofrequency (RF) microneedling, radiofrequency (RF) treatment, or microneedling treatment (excluding medical procedures), characterized by applying a skin condition improving composition containing D-pantothenyl alcohol to the skin before, during, and / or after radiofrequency (RF) microneedling treatment, radiofrequency (RF) treatment, or microneedling treatment. [Claim 9] A composition comprising D-pantothenyl alcohol for suppressing the expression of inflammatory factor genes and / or the production of the relevant proteins, and / or for promoting the expression of collagen production-related genes and / or the production of the relevant proteins, and / or for suppressing the expression of collagen degradation-related genes and / or the production of the relevant proteins.