Substrate processing apparatus and method for detecting conditions inside a processing container
The substrate processing apparatus addresses the challenge of detecting internal conditions in processing containers by using an imaging unit to monitor loading/unloading ports and spaces, preventing substrate collisions and fluid leaks, thus improving processing safety and efficiency.
Patent Information
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- TOKYO ELECTRON LTD
- Filing Date
- 2024-12-06
- Publication Date
- 2026-06-18
AI Technical Summary
Existing substrate processing systems face challenges in accurately detecting the internal conditions of processing containers, particularly during loading and unloading, which can lead to substrate damage due to collisions with residual substrates.
A substrate processing apparatus equipped with a processing container, a lid body, and an imaging unit that allows imaging of the loading/unloading port and processing space without obstructing the view, enabling detection of conditions within the container, including the presence of residual substrates and sealing member abnormalities.
The apparatus effectively detects the presence of residual substrates and sealing member issues, reducing the risk of substrate damage and fluid leakage, thereby enhancing processing efficiency and safety.
Smart Images

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