Ink composition and method for manufacturing the same, as well as inkjet ink set and inkjet printing system using the ink composition.

The ink composition with controlled organic sulfonic acid and water content addresses clogging and printability issues, ensuring high ejection performance and simplified printing systems.

JP2026110661APending Publication Date: 2026-07-02MAXELL LTD
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Patent Information

Application Number
JP2026068786
Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
Priority Date
2015-09-14
Filing Date
2026-04-17
Publication Date
2026-07-02

AI Technical Summary

Technical Problem

Active energy ray-curable inkjet inks are prone to clogging due to catalyst residues, leading to printability issues and equipment complexity, and aqueous inks cause blurring.

Method used

An ink composition with controlled organic sulfonic acid and water content, combined with specific production methods, to prevent precipitate formation and ensure high ejection properties.

Benefits of technology

The ink composition maintains high ejection performance and prevents clogging, offering improved print quality and simplified printing systems.

✦ Generated by Eureka AI based on patent content.

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Abstract

This invention provides an ink composition with excellent storage stability, inkjet ejection properties, and curability. [Solution] The ink composition disclosed herein comprises a polymerizable compound and a photopolymerization initiator, wherein the polymerizable compound has one or more (meth)acrylates in its molecule, and the content of organic sulfonic acid measured by water extraction at a temperature of 25°C is 1 ppm or more and 50 ppm or less, wherein the water extraction method involves measuring the content of organic sulfonic acid in a measurement solution prepared by mixing the ink composition with water using chromatography, and the water content measured by the Karl Fischer method is 0.01% by mass or more and 0.50% by mass or less relative to the total mass of the ink composition.
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Citation Information

Patent Citations

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