Functional imprint optical structures for optical devices
The method of forming optical device structures using a first and second device material layer with nanoimprint lithography addresses the inefficiencies of conventional manufacturing, resulting in improved efficiency and reduced costs while enhancing image quality and field of view.
JP2026517667APending Publication Date: 2026-06-02APPLIED MATERIALS INC
Patent Information
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- APPLIED MATERIALS INC
- Filing Date
- 2024-08-08
- Publication Date
- 2026-06-02
Smart Images
Figure 2026517667000001_ABST
Abstract
Embodiments of the present disclosure include apparatus and methods for optical devices. In one embodiment, a method for forming an optical device generally includes: arranging a first material device layer on a substrate; patterning a portion of the first material device layer to form a first plurality of device structures within the first material device layer; arranging a second material device layer on an unpatterned portion of the first device material layer; and patterning the second material device layer to form a second plurality of device structures arranged on the first material device layer.
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