Display device

Abstract

To provide a display device capable of preventing generation of a residual film at the time of forming a metal pattern.SOLUTION: A display device comprises: a substrate comprising a display region where pixels are arranged and a non-display region where a pad is arranged so as to surround the display region; a dam that is arranged between the display region and the pad; a sealing film that covers the pixels and the dam arranged in the display region; a first metal pattern that is formed as a pattern on the sealing film from the non-display region; an insulation layer that covers the first metal pattern and the sealing film; and a second metal pattern that is formed as a pattern on the insulation layer in the non-display region. The first metal pattern is not formed in a dam region where the dam is formed. The second metal pattern is formed in the dam region, and is connected to the first metal pattern via a contact hole penetrating the insulation layer.SELECTED DRAWING: Figure 6

Description

[Technical field]

[0001] The present invention relates to a display device. [Background technology]

[0002] As the information society develops, the demand for display devices to display images is increasing in various ways. As a result, various display devices such as liquid crystal displays (LCDs), plasma display panels (PDPs), and organic light emitting displays (OLEDs) are being used.

[0003] Among display devices, organic light emitting display devices are self-emitting devices and have superior viewing angles and contrast ratios compared to liquid crystal display devices (LCDs), and do not require a separate backlight, making them lightweight and thin, and advantageous in terms of power consumption.In addition, organic light emitting display devices can be driven with a low direct current voltage, and have the advantages of a fast response speed and particularly low manufacturing costs.

[0004] However, since an organic light emitting display device includes an organic light emitting element in each pixel, the organic light emitting element has a drawback in that it is easily deteriorated due to external factors such as moisture and oxygen from the outside. To prevent this, an encapsulation layer is formed in the organic light emitting display device to prevent moisture and oxygen from the outside from penetrating into the organic light emitting element.

[0005] The encapsulation layer includes at least one inorganic layer and at least one organic layer, thereby preventing oxygen or moisture from penetrating into the organic light-emitting layer and the electrodes. Here, the at least one organic layer is generally made of a polymer, and is formed by applying it in liquid form onto the substrate and then undergoing a curing process. Since such an organic layer has fluidity until the curing process, it may overflow outside the area where the encapsulation layer is to be formed. To solve these problems, a dam that blocks the flow of the organic layer is recently formed along the periphery of the organic light-emitting device.

[0006] On the other hand, when a dam is formed in this manner, the organic light-emitting display device has an uneven surface on which deposition is performed due to the generation of steps caused by the dam. As a result, when another layer is deposited on the dam, the following problems may occur.

[0007] When a metal pattern is formed on a dam through a process using a photoresist pattern, there is a problem that metal in an area where the metal pattern should be removed is not properly removed and remains as a residual film. Summary of the Invention [Problem to be solved by the invention]

[0008] An object of the present invention is to provide a display device capable of preventing the occurrence of a residual film during the formation of a metal pattern. [Means for solving the problem]

[0009] A display device according to an embodiment of the present invention includes a substrate including a display region in which pixels are arranged and a non-display region in which pads are arranged surrounding the display region, a dam arranged between the display region and the pads, a sealing film covering the pixels arranged in the display region and the dam, a first metal pattern patterned on the sealing film from the non-display region, an insulating layer covering the first metal pattern and the sealing film, and a second metal pattern patterned on the insulating layer from the non-display region, wherein the first metal pattern is not formed in the dam region where the dam is formed, and the second metal pattern is formed on the dam region and is connected to the first metal pattern through a contact hole penetrating the insulating layer. Effect of the Invention

[0010] In the embodiment of the present invention, the touch sensing layer is directly formed on the encapsulation layer, so that there is no need to align the first and second substrates when they are bonded together.

[0011] Furthermore, in the embodiment of the present invention, since the first metal pattern is not formed in the dam region, it is possible to prevent a residual film from remaining when the first metal pattern is formed.

[0012] In addition, the embodiment of the present invention can reduce the step caused by the dam by forming an insulating layer of sufficient thickness on the first metal pattern to cover not only the display area but also the dam area, thereby preventing a residual film from remaining on the dam when forming the second metal pattern, for example, the first touch line or the second touch line.

[0013] In addition, an embodiment of the present invention can reduce the resistance of the first touch line or the second touch line by forming an auxiliary line in the non-display area to overlap the first touch line or the second touch line and connecting the first touch line or the second touch line to the auxiliary line.

[0014] In addition, in the embodiments of the present invention, the auxiliary line may be formed in the same layer and with the same material as the bridge electrode, the first touch electrode, or the second touch electrode, thereby making it possible to form the auxiliary line without a separate additional process. [Brief description of the drawings]

[0015] [Figure 1] FIG. 1 is a perspective view showing a display device according to an embodiment of the present invention. [Diagram 2] FIG. 2 is a block diagram showing a display device according to an embodiment of the present invention. [Diagram 3] FIG. 3 is a cross-sectional view that illustrates one side of the display panel of FIG. [Figure 4] FIG. 4 is a plan view illustrating a first substrate according to an embodiment of the present invention. [Diagram 5] FIG. 5 is a plan view illustrating an example of a touch sensing layer disposed on the first substrate of FIG. [Figure 6] FIG. 6 is a cross-sectional view showing the first embodiment of II' in FIG. [Figure 7] FIG. 7 is a cross-sectional view showing the second embodiment of II' in FIG. [Figure 8] FIG. 8 is a cross-sectional view showing the third embodiment of II' in FIG. [Figure 9] FIG. 9 is a cross-sectional view showing the fourth embodiment of II' in FIG. [Figure 10] FIG. 10 is a plan view showing another example of the touch sensing layer disposed on the first substrate of FIG. [Figure 11] FIG. 11 is a cross-sectional view showing an example of a II-II' section in FIG. [Figure 12] FIG. 12 is a cross-sectional view showing an example of a line III-III' in FIG. [Figure 13] FIG. 13 is a plan view illustrating a first substrate according to another embodiment of the present invention. [Figure 14] FIG. 14 is a cross-sectional view showing an example in which a plurality of dams are formed in the first embodiment of II' in FIG. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0016] The advantages and features of the present invention, as well as the methods for achieving them, will become clear from the following detailed description of the embodiments in conjunction with the accompanying drawings. However, the present invention is not limited to the embodiments disclosed below, and may be embodied in various different forms. The embodiments are provided merely to complete the disclosure of the present invention and to fully inform those skilled in the art of the invention of the scope of the invention. The present invention is defined only by the scope of the claims.

[0017] The shapes, sizes, ratios, angles, numbers, etc. disclosed in the drawings to explain the embodiments of the present invention are merely illustrative, and the present invention is not limited to the matters shown in the drawings. The same reference numerals may refer to the same components throughout the specification. In addition, in describing the present invention, if a detailed description of related known technology is deemed to unnecessarily obscure the gist of the present invention, the detailed description will be omitted.

[0018] When the terms "comprise," "have," "consist of," and the like are used as mentioned in this specification, other parts may be added unless "only" is used. When a component is expressed in the singular, the plural is included unless otherwise expressly stated.

[0019] When interpreting elements, they are to be interpreted as including a range of error even if there is no explicit statement to the contrary.

[0020] When describing a positional relationship between two parts, for example "on top of", "at the top of", "at the bottom of", "next to", etc., one or more other parts may be located between the two parts, as long as "immediately" or "directly" is not used.

[0021] In the case of an explanation of a temporal relationship, for example, when the temporal sequence is explained using "after", "following", "next to", or "before", it can also include cases where the two are not consecutive, as long as "immediately" or "directly" is not used.

[0022] Although the terms "first", "second" and the like are used to describe various components, these components are not limited by these terms. These terms are used only to distinguish one component from another. Therefore, the first component described below may be the second component within the technical concept of the present invention.

[0023] The "X-axis direction," "Y-axis direction," and "Z-axis direction" should not be interpreted only in terms of a geometric relationship in which their relationship is perpendicular to each other, and may mean that the configuration of the present invention has a broader directionality than the range in which it can functionally operate.

[0024] The term "at least one" should be understood to include all combinations that can be presented from one or more of the relevant items. For example, "at least one of the first, second and third items" means not only the first, second or third item, respectively, but also all combinations of the first, second and third items that can be presented from two or more of the third items.

[0025] The features of the various embodiments of the present invention may be partially or fully combined or combined with each other, and various technical interlocking and driving operations may be possible, and each embodiment may be implemented independently of each other, or may be implemented together in a linked relationship.

[0026] DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.

[0027] Fig. 1 is a perspective view showing a display device according to an embodiment of the present invention, and Fig. 2 is a block diagram showing a display device according to an embodiment of the present invention.

[0028] 1 and 2, a display device according to an embodiment of the present invention includes a display panel 110, a scan driver 120, a data driver 130, a timing controller 160, a host system 170, a touch driver 180, and a touch coordinate calculation unit 190.

[0029] The touch screen integrated display device according to the embodiment of the present invention may be implemented in a flat panel display device such as a liquid crystal display (LCD), a field emission display (FED), a plasma display panel (PDP), an organic light emitting display (OLED), an electrophoresis display (EPD), etc. In the following embodiments, the touch screen integrated display device according to the embodiment of the present invention will be described mainly in the case where it is implemented in an organic light emitting display device, but it should be noted that the present invention is not limited thereto.

[0030] The display panel 110 includes a display area where pixels (P) are provided to display an image. Data lines (D1 to Dm, m is a positive integer of 2 or more) and scan lines (S1 to Sn, n is a positive integer of 2 or more) are formed on the display panel 110. The data lines (D1 to Dm) may be formed to intersect with the scan lines (S1 to Sn). The pixels (P) may be formed in an area defined by the intersecting structure of the scan lines and the data lines.

[0031] Each pixel (P) of the display panel 110 may be connected to one of the data lines (D1 to Dm) and one of the scan lines (S1 to Sn). Each pixel (P) of the display panel 110 may include a driving transistor that adjusts a drain-source current according to a data voltage applied to a gate electrode, a scan transistor that is turned on by a scan signal of a scan line and supplies a data voltage of the data line to the gate electrode of the driving transistor, an organic light emitting diode that emits light according to the drain-source current of the driving transistor, and a capacitor that stores the voltage of the gate electrode of the driving transistor. As a result, each pixel (P) may emit light according to a current supplied to the organic light emitting diode.

[0032] The scan driver 120 receives a scan control signal (GCS) from the timing controller 160. The scan driver 120 supplies scan signals to the scan lines (S1 to Sn) in response to the scan control signal (GCS).

[0033] The scan driver 120 may be formed in a gate driver in panel (GIP) manner in a non-display area on one or both sides of the display area of ​​the display panel 110. Alternatively, the scan driver 120 may be fabricated in a driver chip, mounted on a flexible film, and attached to the non-display area on one or both sides of the display area of ​​the display panel 110 in a tape automated bonding (TAB) manner.

[0034] The data driver 130 receives digital video data (DATA) and a data control signal (DCS) from the timing controller 160. The data driver 130 converts the digital video data (DATA) into analog positive / negative data voltages according to the data control signal (DCS) and supplies the analog data voltages to the data lines. That is, pixels to which the data voltages are supplied are selected according to the scan signal of the scan driver 120, and the data voltages are supplied to the selected pixels.

[0035] The data driver 130 may include a plurality of source drive ICs 131 as shown in Fig. 1. Each of the plurality of source drive ICs 131 may be mounted on a flexible film 140 by a chip on film (COF) or chip on plastic (COP) method. The flexible film 140 is attached on pads provided in a non-display area of ​​the display panel 110 using an anisotropic conducting film, so that the plurality of source drive ICs 131 may be connected to the pads.

[0036] The circuit board 150 may be attached to the flexible film 140. The circuit board 150 may implement a number of circuits implemented in a driving chip. For example, the timing controller 160 may be implemented on the circuit board 150. The circuit board 150 may be a printed circuit board or a flexible printed circuit board.

[0037] The timing controller 160 receives digital video data (DATA) and timing signals from the host system 170. The timing signals may include a vertical synchronization signal, a horizontal synchronization signal, a data enable signal, a dot clock, and the like. The vertical synchronization signal is a signal that defines one frame period. The horizontal synchronization signal is a signal that defines one horizontal period required to supply a data voltage to pixels of one horizontal line of the display panel (DIS). The data enable signal is a signal that defines a period during which valid data is input. The dot clock is a signal that is repeated at a predetermined short period.

[0038] The timing controller 160 generates a data control signal (DCS) for controlling the operation timing of the data driver 130 and a scan control signal (GCS) for controlling the operation timing of the scan driver 120 based on the timing signal in order to control the operation timing of the scan driver 120 and the data driver 130. The timing controller 160 outputs the scan control signal (GCS) to the scan driver 120 and outputs digital video data (DATA) and the data control signal (DCS) to the data driver 130.

[0039] The host system 170 may be implemented as a navigation system, a set-top box, a DVD player, a Blu-ray player, a personal computer (PC), a home theater system, a broadcast receiver, a telephone system, etc. The host system 170 includes a system on chip (SoC) with a built-in scaler and converts digital video data (DATA) of an input image into a format suitable for display on the display panel 110. The host system 170 transmits the digital video data (DATA) and a timing signal to the timing controller 160.

[0040] In addition to the data lines (D1 to Dm) and the scan lines (S1 to Sn), the display panel 110 may be formed with first and second touch electrodes. The first touch electrodes may be formed to cross the second touch electrodes. The first touch electrodes may be connected to the first touch driver 181 through first touch lines (T1 to Tj, j is a positive integer of 2 or more). The second touch electrodes may be connected to the second touch driver 182 through second touch lines (R1 to Ri, i is a positive integer of 2 or more). A touch sensor may be formed at each of the intersections of the first and second touch electrodes. In the embodiment of the present invention, an example in which the touch sensor is embodied as a mutual capacitance has been shown, but it should be noted that the present invention is not limited thereto. A detailed description of the first and second touch electrodes will be given below in conjunction with FIG. 5.

[0041] The touch driver 180 supplies driving pulses to the first touch electrodes through the first touch lines (T1 to Tj) and senses the amount of change in each of the touch sensors through the second touch lines (R1 to Ri). That is, in FIG. 2, it has been mainly described that the first touch lines (T1 to Tj) are Tx lines that supply driving pulses and the second touch lines (R1 to Ri) are Rx lines that sense the amount of change in each of the touch sensors.

[0042] The touch driver 180 includes a first touch driver 181, a second touch driver 182, and a touch controller 183. The first touch driver 181, the second touch driver 182, and the touch controller 183 may be integrated into one ROIC (Read-out IC).

[0043] The first touch driver 181 selects a first touch line to which a driving pulse is to be output under the control of the touch controller 183, and supplies the driving pulse to the selected first touch line. For example, the first touch driver 181 may sequentially supply driving pulses to the first touch lines (T1 to Tj).

[0044] The second touch driver 182 selects a second touch line that receives a change amount of the touch sensor under the control of the touch controller 183, and receives the change amount of the touch sensor through the selected second touch line. The second touch driver 182 samples the change amount of the touch sensor received through the second touch lines (R1 to Ri) and converts it into touch raw data (TRD), which is digital data.

[0045] The touch controller 183 may generate a Tx setup signal for setting a first touch line through which a driving pulse is output in the first touch driver 181, and an Rx setup signal for setting a second touch line through which a touch sensor voltage is received in the second touch driver 182. In addition, the touch controller 183 generates a timing control signal for controlling the operation timing of the first touch driver 181 and the second touch driver 182.

[0046] The touch coordinate calculation unit 190 receives touch row data (TRD) from the touch driving unit 180. The touch coordinate calculation unit 190 calculates touch coordinates according to a touch coordinate calculation method, and outputs touch coordinate data (HIDxy) including information of the touch coordinates to the host system 170.

[0047] The touch coordinate calculation unit 190 may be implemented as a Micro Controller Unit (MCU). The host system 170 analyzes the touch coordinate data (HIDxy) input from the touch coordinate calculation unit 190 and executes an application program associated with the coordinates where the user has touched. The host system 170 transmits digital video data (DATA) and a timing signal to the timing controller 160 according to the executed application.

[0048] The touch driver 180 may be included in the source driver IC 131 or may be manufactured as a separate driver chip and mounted on the circuit board 150. In addition, the touch coordinate calculator 190 may be manufactured as a driver chip and mounted on the circuit board 150.

[0049] FIG. 3 is a cross-sectional view illustrating one side of the display panel of FIG.

[0050] Referring to FIG. 3, the display panel 110 may include a first substrate 111, a second substrate 112, a thin film transistor layer 10 disposed between the first substrate 111 and the second substrate 112, an organic light-emitting element layer 20, an encapsulation layer 30, and a touch sensing layer 40.

[0051] The first substrate 111 can be a plastic film or a glass substrate.

[0052] A thin film transistor layer 10 is formed on the first substrate 111. The thin film transistor layer 10 may include scan lines, data lines, and thin film transistors. Each of the thin film transistors includes a gate electrode, a semiconductor layer, and source and drain electrodes. When the scan driver is formed in a GIP (gate driver in panel) manner, the scan driver may be formed together with the thin film transistor layer 10.

[0053] An organic light emitting element layer 20 is formed on the thin film transistor layer 10. The organic light emitting element layer 20 includes a first electrode, an organic light emitting layer, a second electrode, and a bank. Each of the organic light emitting layers may include a hole transporting layer, an organic light emitting layer, and an electron transporting layer. In this case, when a voltage is applied to the first electrode and the second electrode, holes and electrons move to the light emitting layer through the hole transporting layer and the electron transporting layer, respectively, and combine with each other in the light emitting layer to emit light. Since pixels are provided in the region where the organic light emitting element layer 20 is formed, the region where the organic light emitting element layer 20 is formed may be defined as a display region. The peripheral region of the display region may be defined as a non-display region.

[0054] An encapsulation layer 30 is formed on the organic light emitting device layer 20. The encapsulation layer 30 serves to prevent oxygen or moisture from penetrating into the organic light emitting device layer 20. The encapsulation layer 30 may include at least one inorganic film.

[0055] The touch sensing layer 40 is formed on the encapsulation layer 30. The touch sensing layer 40 includes first and second touch electrodes for sensing a user's touch, and may include bridge electrodes that electrically connect the first touch electrodes and electrically connect the second touch electrodes.

[0056] Hereinafter, the encapsulation layer 30 and the touch sensing layer 40 according to the first embodiment of the present invention will be described in more detail with reference to FIGS.

[0057] First Example Fig. 4 is a plan view showing a first substrate according to an embodiment of the present invention, and Fig. 5 is a plan view showing an example of a touch sensing layer disposed on the first substrate of Fig. 4. Fig. 6 is a cross-sectional view showing the first embodiment of I-I' of Fig. 5.

[0058] Referring to Figures 4 to 6, the first substrate 111 is divided into a display area (DA) and a non-display area (NDA), and a pad area (PA) where a pad (PAD) is formed and a dam (DAM) may be formed in the non-display area (NDA).

[0059] In the display area (DA) of the first substrate 111, a thin film transistor layer 10 and an organic light emitting element layer 20 are formed.

[0060] The thin film transistor layer 10 includes a thin film transistor 210 , a gate insulating film 220 , an interlayer insulating film 230 , a protective film 240 and a planarizing film 250 .

[0061] A buffer film (not shown) is formed on one surface of the first substrate 111. The buffer film (not shown) is formed on one surface of the first substrate 111 to protect the thin film transistor 210 and the organic light emitting element 260 from moisture that may penetrate through the first substrate 111, which is susceptible to moisture permeation. The one surface of the first substrate 111 may be a surface facing the second substrate 112. The buffer film (not shown) may be made of a plurality of inorganic films alternately stacked. For example, the buffer film (not shown) may be formed of a multi-layer in which one or more inorganic films selected from silicon oxide film (SiOx), silicon nitride film (SiNx), and SiON are alternately stacked. The buffer film (not shown) may be omitted.

[0062] A thin film transistor 210 is formed on the buffer film (not shown). The thin film transistor 210 includes an active layer 211, a gate electrode 212, a source electrode 213, and a drain electrode 214. Although FIG. 6 illustrates an example in which the thin film transistor 210 is formed in a top gate manner in which the gate electrode 212 is located on the top of the active layer 211, it should be noted that the present invention is not limited to this. That is, the thin film transistor 210 may be formed in a bottom gate manner in which the gate electrode 212 is located on the bottom of the active layer 211, or in a double gate manner in which the gate electrode 212 is located both on the top and bottom of the active layer 211.

[0063] An active layer 211 is formed on the buffer film (not shown). The active layer 211 may be made of a silicon-based semiconductor material or an oxide-based semiconductor material. A light-shielding layer for blocking external light incident on the active layer 211 may be formed between the buffer film (not shown) and the active layer 211.

[0064] A gate insulating layer 220 may be formed on the active layer 211. The gate insulating layer 220 may be formed of an inorganic layer, for example, a silicon oxide layer (SiOx), a silicon nitride layer (SiNx), or a multilayer thereof.

[0065] A gate electrode 212 and a gate line may be formed on the gate insulating film 220. The gate electrode 212 and the gate line may be formed of a single layer or multiple layers made of any one of molybdenum (Mo), aluminum (Al), chromium (Cr), gold (Au), titanium (Ti), nickel (Ni), neodymium (Nd), and copper (Cu), or an alloy thereof.

[0066] An interlayer insulating film 230 may be formed on the gate electrode 212 and the gate line. The interlayer insulating film 230 may be formed of an inorganic film, for example, a silicon oxide film (SiOx), a silicon nitride film (SiNx), or a multi-layer thereof.

[0067] A source electrode 213, a drain electrode 214, and a data line may be formed on the interlayer insulating film 230. Each of the source electrode 213 and the drain electrode 214 may be connected to the active layer 211 through a contact hole penetrating the gate insulating film 220 and the interlayer insulating film 230. The source electrode 213, the drain electrode 214, and the data line may be formed of a single layer or multiple layers made of any one of molybdenum (Mo), aluminum (Al), chromium (Cr), gold (Au), titanium (Ti), nickel (Ni), neodymium (Nd), and copper (Cu), or an alloy thereof.

[0068] A protective film 240 for insulating the thin film transistor 210 may be formed on the source electrode 213, the drain electrode 214, and the data line. The protective film 240 may be formed of an inorganic film, for example, a silicon oxide film (SiOx), a silicon nitride film (SiNx), or a multi-layer thereof.

[0069] A planarization film 250 for planarizing steps caused by the thin film transistor 210 can be formed on the protective film 240. The planarization film 250 can be formed of an organic film such as an acrylic resin, an epoxy resin, a phenolic resin, a polyamide resin, or a polyimide resin.

[0070] An organic light emitting element layer 20 is formed on the thin film transistor layer 10. The organic light emitting element layer 20 includes an organic light emitting element 260 and a bank 270.

[0071] The organic light emitting element 260 and the bank 270 are formed on the planarization film 250. The organic light emitting element includes a first electrode 261, an organic light emitting layer 262, and a second electrode 263. The first electrode 261 may be an anode electrode, and the second electrode 263 may be a cathode electrode.

[0072] The first electrode 261 may be formed on the planarization film 250. The first electrode 261 is connected to the source electrode 213 of the thin film transistor 210 through a contact hole penetrating the protective film 240 and the planarization film 250. The first electrode 261 may be formed of a metal material with high reflectivity, such as a laminated structure of aluminum and titanium (Ti / Al / Ti), a laminated structure of aluminum and ITO (ITO / Al·ITO), an APC alloy, and a laminated structure of an APC alloy and ITO (ITO / APC / ITO). The APC alloy is an alloy of silver (Ag), palladium (Pd), and copper (Cu).

[0073] The bank 270 may be formed on the planarization film 250 to cover the edge of the first electrode 261 in order to define the pixel (P). That is, the bank 270 serves as a pixel defining film that defines the pixel (P). The bank 270 may be formed of an organic film such as an acrylic resin, an epoxy resin, a phenolic resin, a polyamide resin, or a polyimide resin.

[0074] An organic light-emitting layer 262 is formed on the first electrode 261 and the bank 270. The organic light-emitting layer 262 may include a hole transporting layer, at least one light-emitting layer, and an electron transporting layer. In this case, when a voltage is applied to the first electrode 261 and the second electrode 263, holes and electrons move to the light-emitting layer through the hole transporting layer and the electron transporting layer, respectively, and combine with each other in the light-emitting layer to emit light.

[0075] The organic light emitting layer 262 may be a white light emitting layer that emits white light. In this case, it may be formed to cover the first electrode 261 and the bank 270. In this case, a color filter (not shown) may be formed on the second substrate 112.

[0076] Alternatively, the organic light emitting layer 262 may be composed of a red light emitting layer that emits red light, a green light emitting layer that emits green light, or a blue light emitting layer that emits blue light. In this case, the organic light emitting layer 262 may be formed in an area corresponding to the first electrode 261, and a color filter may not be formed on the second substrate 112.

[0077] The second electrode 263 is formed on the organic light emitting layer 262. When the organic light emitting display device is formed in a top emission structure, the second electrode 263 may be formed of a transparent metal material (TCO, Transparent Conductive Material) such as ITO or IZO that can transmit light, or a semi-transmissive metal material such as magnesium (Mg), silver (Ag), or an alloy of magnesium (Mg) and silver (Ag). A capping layer may be formed on the second electrode 263.

[0078] On the organic light emitting element layer 20, the sealing layer 30 is formed not only in the display area (DA) but also in the non-display area (NDA) of the first substrate 111. The sealing layer 30 includes a sealing film 280 and a dam (DAM).

[0079] The encapsulation film 280 serves to prevent oxygen or moisture from penetrating into the organic light emitting layer 262 and the second electrode 263. To this end, the encapsulation film 280 may include at least one inorganic film and at least one organic film. For example, the encapsulation film 280 may include a first inorganic film 281, an organic film 282, and a second inorganic film 283.

[0080] A first inorganic film 281 may be disposed on the second electrode 263. The first inorganic film 281 may be formed to cover the second electrode 263. An organic film 282 may be disposed on the first inorganic film 281. The organic film 282 may be formed to a sufficient thickness to prevent particles from passing through the first inorganic film 281 and entering the organic light emitting layer 262 and the second electrode 263. A second inorganic film 283 may be disposed on the organic film 282. The second inorganic film 283 may be formed to cover the organic film 282.

[0081] Each of the first inorganic film 281 and the second inorganic film 283 can be made of silicon nitride, aluminum nitride, zirconium nitride, titanium nitride, hafnium nitride, tantalum nitride, silicon oxide, aluminum oxide, or titanium oxide. The organic film 282 can be made of an acrylic resin, an epoxy resin, a phenolic resin, a polyamide resin, or a polyimide resin.

[0082] The dam (DAM) is disposed in the non-display area (NDA) to block the flow of the organic film 282 constituting the encapsulation film 280. More specifically, the dam (DAM) is formed to surround the outer periphery of the display area (DA) to block the flow of the organic film 282 constituting the encapsulation film 280. In addition, the dam (DAM) is disposed between the display area (DA) and the pad area (PA) to block the flow of the organic film 282 so that the organic film 282 constituting the encapsulation film 280 does not invade the pad area (PA). Thus, the dam (DAM) can prevent the organic film 282 from being exposed to the outside of the display device or invading the pad area (PA).

[0083] Such a dam (DAM) may be formed simultaneously with the planarization film 250 or the bank 270 of the pixel (P) and may be made of the same material as the planarization film 250 or the bank 270. In this case, the dam (DAM) may be made of an organic material such as an acrylic resin, an epoxy resin, a phenolic resin, a polyamide resin, or a polyimide resin.

[0084] 6, the dam (DAM) is not covered by the first inorganic film 281, but is not limited thereto. The first inorganic film 281 may be formed to cover the dam (DAM) if it covers the display area (DA).

[0085] The touch sensing layer 40 is formed on the encapsulation layer 30. The touch sensing layer 40 includes a first touch electrode (TE), a second touch electrode (RE), a bridge electrode (BE), a first metal pattern, a second metal pattern, an insulating layer 310, and a passivation film 320.

[0086] A buffer layer (not shown) is formed on the sealing layer 30. The buffer layer (not shown) is formed so that the pads (PAD) are exposed in the display area (DA) and the non-display area (NDA). The buffer layer (not shown) is formed so as to cover the dam (DAM). Such a buffer layer (not shown) may be omitted.

[0087] A bridge electrode (BE) and a first metal pattern are formed on the buffer layer. The bridge electrode (BE) is formed in the display area (DA) and electrically connects the first touch electrode (TE) formed on the insulating layer 310. In order to prevent the first touch electrode (TE) and the second touch electrode (RE) from being short-circuited with each other at their crossing area, the first touch electrodes (TE) adjacent to each other in the first direction (Y-axis direction) may be electrically connected through the bridge electrode (BE). The bridge electrode (BE) is disposed in a layer different from the first and second touch electrodes (TE, RE) and may be connected to the adjacent first touch electrodes (TE) through the first contact hole (CH1). The bridge electrode (BE) may cross the second touch electrode (RE).

[0088] Here, the first contact holes (CH1) may be formed penetrating the insulating layer 310. The bridge electrode (BE) is disposed under the insulating layer 310 and exposed through the two first contact holes (CH1). The bridge electrode (Be) is connected to two adjacent first touch electrodes (TE).

[0089] The first metal pattern is formed in the non-display area (NDA) and is formed in the same layer as the bridge electrode (BE). The first metal pattern is disposed at a distance from the bridge electrode (BE) disposed at one end of the bridge electrode (BE). The first metal pattern is not formed in the dam area. Since a dam (DAM) is formed in the dam area, there is a step due to the dam (DAM). If the first metal pattern is formed up to the dam area, a residual film may be generated during the manufacturing process due to the step due to the dam (DAM), and as a result, metal patterns that should be electrically insulated may be connected to each other. In order to prevent such problems from occurring, the present invention is characterized in that the first metal pattern is not formed in the dam area.

[0090] The first metal pattern may be an auxiliary line (AL) connected to the first touch line (TL) or the second touch line (RL) to reduce the resistance of the first touch line (TL) or the second touch line (RL). The auxiliary line (AL) may include a first auxiliary line (AL1) patterned between the display area (DA) and a dam area where a dam (DAM) is formed. The auxiliary line (AL) may also include a second auxiliary line (AL2) patterned not only between the dam area and the pad area (PA) but also up to the pad area (PA). The second auxiliary line (AL2) may be connected to a pad (PAD) in the pad area (PA) and connected to the first touch driver 181 or the second touch driver 182 through the pad (PAD). Meanwhile, since the first auxiliary line (AL1) and the second auxiliary line (AL2) are formed with the dam area in between, the first auxiliary line (AL1) and the second auxiliary line (AL2) are physically separated from each other.

[0091] An insulating layer 310 is formed on the bridge electrodes (BE) and the first metal pattern. The insulating layer 310 is disposed on the bridge electrodes (BE) to insulate the bridge electrodes (BE) from the second touch electrodes (RE). The insulating layer 310 is disposed between the bridge electrodes (BE) to insulate the bridge electrodes (BE) from each other.

[0092] The insulating layer 310 is formed not only in the display area (DA) but also in the non-display area (NDA). In particular, the insulating layer 310 is formed to cover the dam area to reduce the step caused by the dam (DAM). The insulating layer 310 is formed to have a sufficient thickness so that the second metal pattern does not generate a residual film due to the step during the manufacturing process. It is preferable that the insulating layer 310 has a thickness thicker than 1 / 2 the height of the dam (DAM).

[0093] A first touch electrode (TE), a second touch electrode (RE), and a second metal pattern are formed on the insulating layer 310. The first touch electrode (TE) and the second touch electrode (RE) are formed in the display area (DA). The first touch electrodes (TE) are arranged in a first direction (Y-axis direction) and connected to each other, and the second touch electrodes (RE) are arranged in a second direction (X-axis direction) and connected to each other. The first direction (Y-axis direction) may be parallel to the scan lines (S1 to Sn), and the second direction (X-axis direction) may be parallel to the data lines (D1 to Dm). Alternatively, the first direction (Y-axis direction) may be parallel to the data lines (D1 to Dm), and the second direction (X-axis direction) may be parallel to the scan lines (S1 to Sn).

[0094] Each of the first touch electrodes (TE) connected in the first direction (Y-axis direction) is electrically insulated from the adjacent first touch electrode (TE) in the second direction (X-axis direction). Each of the second touch electrodes (RE) connected in the second direction (X-axis direction) is electrically insulated from the adjacent second touch electrode (RE) in the first direction (Y-axis direction).

[0095] As a result, a mutual capacitance corresponding to a touch sensor can be formed at the intersection area of ​​the first touch electrode (TE) and the second touch electrode (RE).

[0096] The second metal pattern is formed in the non-display area (NDA) and is patterned to overlap the first metal pattern, and the second metal pattern may be formed in the dam area, different from the first metal pattern.

[0097] The second metal pattern may be a first touch line (TL) patterned to extend from the first touch electrode (TE) disposed at one end of the first touch electrodes (TE) connected to each other in the first direction (Y-axis direction) to the pad area (PA). The first touch line (TL) may be connected to the pad (PAD) in the pad area (PA) and connected to the first touch driver 181 through the pad (PAD). Therefore, the first touch electrodes (TE) connected to each other in the first direction (Y-axis direction) may input a driving pulse from the first touch driver 181 through the first touch line (TL).

[0098] The first touch line (TL) is formed overlapping the auxiliary line (AL). The first touch line (TL) may be connected to the first auxiliary line (AL1) through the second contact hole (CH2). The second contact hole (CH2) may be formed penetrating the insulating layer 310. The first touch line (TL) is disposed in the insulating layer 310 and connected to the first auxiliary line (AL1) through the second contact hole (CH2) exposing the first auxiliary line (AL1). The first touch line (TL) may be connected to the second auxiliary line (AL2) through the third contact hole (CH3). The third contact hole (CH3) may be formed penetrating the insulating layer 310. The first touch line (TL) is disposed in the insulating layer 310 and connected to the second auxiliary line (AL2) through the third contact hole (CH3) exposing the second auxiliary line (AL2).

[0099] Although not specifically shown in the drawing, the second metal pattern may be a second touch line (RL) patterned to extend from a second touch electrode (RE) disposed at one end of the second touch electrodes (RE) connected to each other in the second direction (X-axis direction) to the pad area (PA). The second touch line (RL) may be connected to a pad (PAD) in the pad area (PA) and connected to the second touch driver 182 through the pad (PAD). Therefore, the second touch driver 182 may input a change amount of the touch sensor of the second touch electrodes (RE) connected to each other in the second direction (X-axis direction).

[0100] The second touch line (RL) is formed overlapping the auxiliary line (AL). The second touch line (RL) may be connected to the first auxiliary line (AL1) through a second contact hole (CH2). The second contact hole (CH2) may be formed penetrating the insulating layer 310. The second touch line (RL) is disposed in the insulating layer 310 and connected to the first auxiliary line (AL1) through a second contact hole (CH2) exposing the first auxiliary line (AL1). The second touch line (RL) may be connected to the second auxiliary line (AL2) through a third contact hole (CH3). The third contact hole (CH3) may be formed penetrating the insulating layer 310. The second touch line (RL) is disposed in the insulating layer 310 and connected to the second auxiliary line (AL2) through a third contact hole (CH3) exposing the second auxiliary line (AL2).

[0101] A passivation film 320 is formed on the insulating film 310, the first touch electrode (TE) and the second touch electrode (RE). The passivation film 320 blocks harmful external environments and maintains stable characteristics of the display device.

[0102] In the embodiment of the present invention, the touch sensing layer 40 is directly formed on the encapsulation layer 30, so that there is no need to align the first substrate 111 and the second substrate 112 when they are bonded together.

[0103] As described above, the present invention forms the insulating layer 310 with a sufficient thickness to cover not only the display area (DA) but also the dam area, thereby reducing the step caused by the dam (DAM). As a result, the present invention can prevent a residual film from remaining when forming a second metal pattern, for example, a first touch line (TL) or a second touch line (RL), formed on the dam (DAM).

[0104] Furthermore, the present invention can reduce the resistance of the first touch line (TL) or the second touch line (RL) by forming an auxiliary line (AL) to overlap the first touch line (TL) or the second touch line (RL) and connecting the first touch line (TL) or the second touch line (RL) to the auxiliary line (AL).

[0105] Furthermore, in the present invention, the auxiliary line (AL) can be formed in the same layer and with the same material as the bridge electrode (BE), so that the auxiliary line (AL) can be formed without a separate additional process.

[0106] Furthermore, the present invention prevents residual film from remaining when forming the auxiliary line (AL) by not forming the auxiliary line (AL) in the dam region, but connecting it to the first touch line (TL) or the second touch line (RL) through the second contact hole (CH2) and the third contact hole (CH3).

[0107] Second Example FIG. 7 is a cross-sectional view showing the second embodiment of II' in FIG.

[0108] The display device shown in Fig. 7 is different from the display device shown in Fig. 6 in that the auxiliary line (AL) includes only the first auxiliary line (AL1). In the following, the specific contents of the same configuration as in Fig. 6 will be omitted.

[0109] Referring to FIG. 7, the first substrate 111 is divided into a display area (DA) and a non-display area (NDA), and a pad area (PA) where a pad (PAD) is formed and a dam (DAM) can be formed in the non-display area (NDA).

[0110] In the display area (DA) of the first substrate (11), a thin film transistor layer 10 and an organic light emitting element layer 20 are formed.

[0111] The thin film transistor layer 10 includes a thin film transistor 210 , a gate insulating film 220 , an interlayer insulating film 230 , a protective film 240 and a planarizing film 250 .

[0112] An organic light emitting element layer 20 is formed on the thin film transistor layer 10. The organic light emitting element layer 20 includes an organic light emitting element 260 and a bank 270.

[0113] On the organic light emitting element layer 20, the sealing layer 30 is formed not only in the display area (DA) but also in the non-display area (NDA) of the first substrate 111. The sealing layer 30 includes a sealing film 280 and a dam (DAM).

[0114] The touch sensing layer 40 is formed on the encapsulation layer 30. The touch sensing layer 40 includes a first touch electrode (TE), a second touch electrode (RE), a bridge electrode (BE), a first metal pattern, a second metal pattern, an insulating layer 310, and a passivation film 320.

[0115] A buffer layer is formed on the sealing layer 30. The buffer layer is formed so that the pads (PAD) are exposed in the display area (DA) and the non-display area (NDA). The buffer layer is formed so as to cover the dam (DAM). Such a buffer layer may be omitted.

[0116] A bridge electrode (BE) and a first metal pattern are formed on the buffer layer. The bridge electrode (BE) is formed in the display area (DA) and electrically connects the first touch electrode (TE) formed on the insulating layer 310. In order to prevent the first touch electrode (TE) and the second touch electrode (RE) from being short-circuited with each other at their crossing area, the first touch electrodes (TE) adjacent to each other in the first direction (Y-axis direction) may be electrically connected through the bridge electrode (BE). The bridge electrode (BE) is disposed in a layer different from the first and second touch electrodes (TE, RE) and may be connected to the adjacent first touch electrodes (TE) through the first contact hole (CH1). The bridge electrode (BE) may cross the second touch electrode (RE).

[0117] The first metal pattern is formed in the non-display area (NDA) and is formed in the same layer as the bridge electrode (BE). The first metal pattern is disposed at a distance from the bridge electrode (BE) disposed at one end of the bridge electrode (BE). The first metal pattern is not formed in the dam area. Since a dam (DAM) is formed in the dam area, there is a step due to the dam (DAM). If the first metal pattern is formed up to the dam area, a residual film may be generated during the manufacturing process due to the step due to the dam (DAM), and as a result, metal patterns that should be electrically insulated may be connected to each other. In order to prevent such problems from occurring, the present invention is characterized in that the first metal pattern is not formed in the dam area.

[0118] The first metal pattern may be an auxiliary line (AL) connected to the first touch line (TL) or the second touch line (RL) to reduce the resistance of the first touch line (TL) or the second touch line (RL). The auxiliary line (AL) may include a first auxiliary line (AL1) patterned between the display area (DA) and a dam area where a dam (DAM) is formed.

[0119] An insulating layer 310 is formed on the bridge electrodes (BE) and the first metal pattern. The insulating layer 310 is disposed on the bridge electrodes (BE) to insulate the bridge electrodes (BE) from the second touch electrodes (RE). The insulating layer 310 is disposed between the bridge electrodes (BE) to insulate the bridge electrodes (BE) from each other.

[0120] The insulating layer 310 is formed not only in the display area (DA) but also in the non-display area (NDA). In particular, the insulating layer 310 is formed to cover the dam area to reduce the step caused by the dam (DAM). The insulating layer 310 is formed to have a sufficient thickness so that the second metal pattern does not generate a residual film due to the step during the manufacturing process. It is preferable that the insulating layer 310 has a thickness thicker than 1 / 2 the height of the dam (DAM).

[0121] A first touch electrode (TE), a second touch electrode (RE), and a second metal pattern are formed on the insulating layer 310. The first touch electrode (TE) and the second touch electrode (RE) are formed in the display area (DA). The first touch electrode (TE) is arranged in a first direction (Y-axis direction) and connected to each other, and the second touch electrode (RE) is arranged in a second direction (X-axis direction) and connected to each other. The first direction (Y-axis direction) may be parallel to the scan lines (S1 to Sn), and the second direction (X-axis direction) may be parallel to the data lines (D1 to Dm). Alternatively, the first direction (Y-axis direction) may be parallel to the data lines (D1 to Dm), and the second direction (X-axis direction) may be parallel to the scan lines (S1 to Sn).

[0122] Each of the first touch electrodes (TE) connected in the first direction (Y-axis direction) is electrically insulated from the adjacent first touch electrode (TE) in the second direction (X-axis direction). Each of the second touch electrodes (RE) connected in the second direction (X-axis direction) is electrically insulated from the adjacent second touch electrode (RE) in the first direction (Y-axis direction).

[0123] As a result, a mutual capacitance corresponding to a touch sensor can be formed at the intersection area of ​​the first touch electrode (TE) and the second touch electrode (RE).

[0124] A second metal pattern is formed in the non-display area (NDA) and patterned to overlap the first metal pattern.

[0125] The second metal pattern may be a first touch line (TL) that is extended from the first touch electrode (TE) disposed at one end of the first touch electrodes (TE) connected to each other in the first direction (Y-axis direction) and patterned to the pad area (PA). The first touch line (TL) may be connected to the pad (PAD) in the pad area (PA) and connected to the first touch driver 181 through the pad (PAD). Therefore, the first touch electrodes (TE) connected to each other in the first direction (Y-axis direction) may input a driving pulse from the first touch driver 181 through the first touch line (TL).

[0126] The first touch line (TL) is formed overlapping with the auxiliary line (AL). The first touch line (TL) may be connected to the first auxiliary line (AL1) through a second contact hole (CH2). The second contact hole (CH2) may be formed penetrating the insulating layer 310. The first touch line (TL) is disposed in the insulating layer 310 and connected to the first auxiliary line (AL1) through the second contact hole (CH2) exposing the first auxiliary line (AL1).

[0127] Although not specifically shown in the drawings, the second metal pattern may be a second touch line (RL) patterned to extend from the second touch electrode (RE) disposed at one end of the second touch electrodes (RE) connected to each other in the second direction (X-axis direction) to the pad area (PA). The second touch line (RL) may be connected to the pad (PAD) in the pad area (PA) and connected to the second touch driver 182 through the pad (PAD). Therefore, the second touch driver 182 may input the amount of change occupied by the touch sensor of the second touch electrodes (RE) connected to each other in the second direction (X-axis direction).

[0128] The second touch line (RL) is formed overlapping the auxiliary line (AL). The second touch line (RL) may be connected to the first auxiliary line (AL1) through a second contact hole (CH2). The second contact hole (CH2) may be formed penetrating the insulating layer 310. The second touch line (RL) is connected to the first auxiliary line (AL1) through the second contact hole (CH2) disposed in the insulating layer 310 and exposing the first auxiliary line (AL1).

[0129] A passivation film 320 is formed on the insulating film 310, the first touch electrode (TE) and the second touch electrode (RE). The passivation film 320 blocks harmful external environments and maintains stable characteristics of the display device.

[0130] Third Example FIG. 8 is a cross-sectional view showing the third embodiment of II' in FIG.

[0131] The display device shown in Fig. 8 is different from the display device shown in Fig. 6 in that the auxiliary line (AL) includes only the second auxiliary line (AL2). In the following, the specific contents of the same configuration as in Fig. 6 will be omitted.

[0132] Referring to FIG. 8, the first substrate 111 is divided into a display area (DA) and a non-display area (NDA), and a pad area (PA) where a pad (PAD) is formed and a dam (DAM) can be formed in the non-display area (NDA).

[0133] In the display area (DA) of the first substrate (11), a thin film transistor layer 10 and an organic light emitting element layer 20 are formed.

[0134] The thin film transistor layer 10 includes a thin film transistor 210 , a gate insulating film 220 , an interlayer insulating film 230 , a protective film 240 and a planarizing film 250 .

[0135] An organic light emitting element layer 20 is formed on the thin film transistor layer 10. The organic light emitting element layer 20 includes an organic light emitting element 260 and a bank 270.

[0136] On the organic light emitting element layer 20, the sealing layer 30 is formed not only in the display area (DA) but also in the non-display area (NDA) of the first substrate 111. The sealing layer 30 includes a sealing film 280 and a dam (DAM).

[0137] The touch sensing layer 40 is formed on the encapsulation layer 30. The touch sensing layer 40 includes a first touch electrode (TE), a second touch electrode (RE), a bridge electrode (BE), a first metal pattern, a second metal pattern, an insulating layer 310, and a passivation film 320.

[0138] A buffer layer is formed on the sealing layer 30. The buffer layer is formed so that the pads (PAD) are exposed in the display area (DA) and the non-display area (NDA). The buffer layer is formed so as to cover the dam (DAM). Such a buffer layer may be omitted.

[0139] A bridge electrode (BE) and a first metal pattern are formed on the buffer layer. The bridge electrode (BE) is formed in the display area (DA) and electrically connects the first touch electrode (TE) formed on the insulating layer 310. In order to prevent the first touch electrode (TE) and the second touch electrode (RE) from being short-circuited with each other at their crossing area, the first touch electrodes (TE) adjacent to each other in the first direction (Y-axis direction) may be electrically connected through the bridge electrode (BE). The bridge electrode (BE) is disposed in a layer different from the first and second touch electrodes (TE, RE) and may be connected to the adjacent first touch electrodes (TE) through the first contact hole (CH1). The bridge electrode (BE) may cross the second touch electrode (RE).

[0140] The first metal pattern is formed in the non-display area (NDA) and is formed in the same layer as the bridge electrode (BE). The first metal pattern is disposed at a distance from the bridge electrode (BE) disposed at one end of the bridge electrode (BE). The first metal pattern is not formed in the dam area. Since a dam (DAM) is formed in the dam area, there is a step due to the dam (DAM). If the first metal pattern is formed up to the dam area, a residual film may be generated during the manufacturing process due to the step due to the dam (DAM), and as a result, metal patterns that should be electrically insulated may be connected to each other. In order to prevent this problem from occurring, the present invention is characterized in that the first metal pattern is not formed in the dam area.

[0141] The first metal pattern may be an auxiliary line (AL) connected to the first touch line (TL) or the second touch line (RL) to reduce the resistance of the first touch line (TL) or the second touch line (RL). The auxiliary line (AL) may include a second auxiliary line (AL2) patterned not only between the dam region and the pad region (PA) but also up to the pad region (PA). The second auxiliary line (AL2) may be connected to a pad (PAD) in the pad region (PA) and connected to the first touch driver 181 or the second touch driver 182 through the pad (PAD).

[0142] 8 shows that the second auxiliary line (AL2) is patterned up to the pad area (PA), but is not limited thereto. The second auxiliary line (AL2) may be formed only between the dam area and the pad area (PA) and not in the pad area (PA).

[0143] An insulating layer 310 is formed on the bridge electrodes (BE) and the first metal pattern. The insulating layer 310 is disposed on the bridge electrodes (BE) to insulate the bridge electrodes (BE) from the second touch electrodes (RE). The insulating layer 310 is disposed between the bridge electrodes (BE) to insulate the bridge electrodes (BE) from each other.

[0144] The insulating layer 310 is formed not only in the display area (DA) but also in the non-display area (NDA). In particular, the insulating layer 310 is formed to cover the dam area to reduce the step caused by the dam (DAM). The insulating layer 310 is formed to have a sufficient thickness so that the second metal pattern does not generate residual film due to the step during the manufacturing process. It is preferable that the insulating layer 310 has a thickness larger than 1 / 2 the height of the dam (DAM).

[0145] A first touch electrode (TE), a second touch electrode (RE), and a second metal pattern are formed on the insulating layer 310. The first touch electrode (TE) and the second touch electrode (RE) are formed in the display area (DA). The first touch electrode (TE) is arranged in a first direction (Y-axis direction) and connected to each other, and the second touch electrode (RE) is arranged in a second direction (X-axis direction) and connected to each other. The first direction (Y-axis direction) may be parallel to the scan lines (S1 to Sn), and the second direction (X-axis direction) may be parallel to the data lines (D1 to Dm). Alternatively, the first direction (Y-axis direction) may be parallel to the data lines (D1 to Dm), and the second direction (X-axis direction) may be parallel to the scan lines (S1 to Sn).

[0146] Each of the first touch electrodes (TE) connected in the first direction (Y-axis direction) is electrically insulated from the adjacent first touch electrode (TE) in the second direction (X-axis direction). Each of the second touch electrodes (RE) connected in the second direction (X-axis direction) is electrically insulated from the adjacent second touch electrode (RE) in the first direction (Y-axis direction).

[0147] As a result, a mutual capacitance corresponding to a touch sensor can be formed at the intersection area of ​​the first touch electrode (TE) and the second touch electrode (RE).

[0148] A second metal pattern is formed in the non-display area (NDA) and patterned to overlap the first metal pattern.

[0149] The second metal pattern may be a first touch line (TL) patterned to extend from the first touch electrode (TE) disposed at one end of the first touch electrodes (TE) connected to each other in the first direction (Y-axis direction) to the pad area (PA). The first touch line (TL) may be connected to the pad (PAD) in the pad area (PA) and connected to the first touch driver 181 through the pad (PAD). Therefore, the first touch electrodes (TE) connected to each other in the first direction (Y-axis direction) may input a driving pulse from the first touch driver 181 through the first touch line (TL).

[0150] The first touch line (TL) is formed overlapping with the auxiliary line (AL). The first touch line (TL) may be connected to the second auxiliary line (AL2) through a third contact hole (CH3). The third contact hole (CH3) may be formed penetrating the insulating layer 310. The first touch line (TL) is connected to the second auxiliary line (AL2) through the third contact hole (CH3) disposed in the insulating layer 310 and exposing the second auxiliary line (AL2).

[0151] Although not specifically shown in the drawings, the second metal pattern may be a second touch line (RL) patterned to extend from the second touch electrode (RE) disposed at one end of the second touch electrodes (RE) connected to each other in the second direction (X-axis direction) to the pad area (PA). The second touch line (RL) may be connected to the pad (PAD) in the pad area (PA) and connected to the second touch driver 182 through the pad (PAD). Therefore, the second touch driver 182 may input the amount of change occupied by the touch sensor of the second touch electrodes (RE) connected to each other in the second direction (X-axis direction).

[0152] The second touch line (RL) is formed overlapping the auxiliary line (AL). The second touch line (RL) may be connected to the second auxiliary line (AL2) through a third contact hole (CH3). The third contact hole (CH3) may be formed penetrating the insulating layer 310. The second touch line (RL) is connected to the second auxiliary line (AL2) through the third contact hole (CH3) disposed in the insulating layer 310 and exposing the second auxiliary line (AL2).

[0153] A passivation film 320 is formed on the insulating film 310, the first touch electrode (TE) and the second touch electrode (RE). The passivation film 320 blocks harmful external environments and maintains stable characteristics of the display device.

[0154] Fourth Example FIG. 9 is a cross-sectional view showing the fourth embodiment of II' in FIG.

[0155] The display device shown in Fig. 9 is different from the display device shown in Fig. 6 in that a bridge electrode (BE) is disposed on the first touch electrode (TE) and the second touch electrode (RE). In the following, detailed contents of the same configuration as in Fig. 6 will be omitted.

[0156] Referring to FIG. 9, the first substrate 111 is divided into a display area (DA) and a non-display area (NDA), and a pad area (PA) where a pad (PAD) is formed and a dam (DAM) can be formed in the non-display area (NDA).

[0157] In the display area (DA) of the first substrate (11), a thin film transistor layer 10 and an organic light emitting element layer 20 are formed.

[0158] The thin film transistor layer 10 includes a thin film transistor 210 , a gate insulating film 220 , an interlayer insulating film 230 , a protective film 240 and a planarizing film 250 .

[0159] An organic light emitting element layer 20 is formed on the thin film transistor layer 10. The organic light emitting element layer 20 includes an organic light emitting element 260 and a bank 270.

[0160] On the organic light emitting element layer 20, the sealing layer 30 is formed not only in the display area (DA) but also in the non-display area (NDA) of the first substrate 111. The sealing layer 30 includes a sealing film 280 and a dam (DAM).

[0161] The touch sensing layer 40 is formed on the encapsulation layer 30. The touch sensing layer 40 includes a first touch electrode (TE), a second touch electrode (RE), a bridge electrode (BE), a first metal pattern, a second metal pattern, an insulating layer 310, and a passivation film 320.

[0162] A buffer layer is formed on the sealing layer 30. The buffer layer is formed so that the pads (PAD) are exposed in the display area (DA) and the non-display area (NDA). The buffer layer is formed so as to cover the dam (DAM). Such a buffer layer may be omitted.

[0163] A first touch electrode (TE), a second touch electrode (RE) and a first metal pattern are formed on the buffer layer.

[0164] A first touch electrode (TE) and a second touch electrode (RE) are formed in a display area (DA). The first touch electrodes (TE) are arranged in a first direction (Y-axis direction) and connected to each other, and the second touch electrodes (RE) are arranged in a second direction (X-axis direction) and connected to each other. The first direction (Y-axis direction) may be parallel to the scan lines (S1 to Sn), and the second direction (X-axis direction) may be parallel to the data lines (D1 to Dm). Alternatively, the first direction (Y-axis direction) may be parallel to the data lines (D1 to Dm), and the second direction (X-axis direction) may be parallel to the scan lines (S1 to Sn).

[0165] Each of the first touch electrodes (TE) connected in the first direction (Y-axis direction) is electrically insulated from the adjacent first touch electrode (TE) in the second direction (X-axis direction). Each of the second touch electrodes (RE) connected in the second direction (X-axis direction) is electrically insulated from the adjacent second touch electrode (RE) in the first direction (Y-axis direction).

[0166] As a result, a mutual capacitance corresponding to a touch sensor can be formed at the intersection area of ​​the first touch electrode (TE) and the second touch electrode (RE).

[0167] The first metal pattern is formed in the non-display area (NDA) and is formed in the same layer as the first touch electrode (TE) and the second touch electrode (RE). The first metal pattern may be extended from the first touch electrode (TE) or the second touch electrode (RE) to form a pattern. The first metal pattern is not formed in the dam area. Since a dam (DAM) is formed in the dam area, there is a step due to the dam (DAM). If the first metal pattern is formed up to the dam area, a residual film may be generated during the manufacturing process due to the step due to the dam (DAM), and as a result, metal patterns that need to be electrically insulated may be connected to each other. In order to prevent such problems from occurring, the present invention is characterized in that the first metal pattern is not formed in the dam area.

[0168] The first metal pattern may be a first touch line (TL) that transmits a driving pulse input from the first touch driver 181 to the pad (PAD) to the first touch electrode (TE). The first touch line (TL) is formed by physically separating one first touch line (TL1) patterned between the display area (DA) and the dam area, and another first touch line (TL2) patterned between the dam area and the pad area (PA). One first touch line (TL1) is extended from the first touch electrode (TE) disposed at one end of the first touch electrodes (TE) connected to each other in the first direction (Y-axis direction) and patterned between the display area (DA) and the dam area where the dam (DAM) is formed. In addition, another first touch line (TL2) is patterned not only between the dam area and the pad area (PA) but also up to the pad area (PA). The other first touch line (TL2) may be connected to the pad (PAD) in the pad area (PA) and connected to the first touch driver 181 through the pad (PAD).

[0169] Although not specifically shown in the drawing, the first metal pattern may be a second touch line (RL) that transmits a change in the amount of a touch sensor input from the second touch driver 182 to the pad (PAD) to the second touch electrode (RE). The second touch line (RL) is formed by physically separating one second touch line (RL1) patterned between the display area (DA) and the dam area, and another second touch line (RL2) patterned between the dam area and the pad area (PA). One second touch line (RL1) is extended from the second touch electrode (RE) disposed at one end of the second touch electrodes (RE) connected to each other in the second direction (X-axis direction) and is patterned between the display area (DA) and the dam area where the dam (DAM) is formed. In addition, another second touch line (RL2) is patterned not only between the dam area and the pad area (PA) but also to the pad area (PA). Another second touch line RL2 may be connected to the pad PAD in the pad area PA and connected to the second touch driver 182 through the pad PAD.

[0170] An insulating layer 310 is formed on the first touch electrode (TE), the second touch electrode (RE) and the first metal pattern. The first touch electrode (TE), the second touch electrode (RE) and the first metal pattern can be disposed in the same layer. The insulating layer 310 can be disposed not only on the first touch electrode (TE) and the second touch electrode (RE), but also between the first touch electrode (TE) and the second touch electrode (RE). Each of the first touch electrodes (TE) can be insulated from each of the second touch electrodes (RE) by the insulating layer 310.

[0171] The insulating layer 310 is formed not only in the display area (DA) but also in the non-display area (NDA). In particular, the insulating layer 310 is formed to cover the dam area to reduce the step caused by the dam (DAM). The insulating layer 310 is formed to have a sufficient thickness so that the second metal pattern does not generate residual film due to the step during the manufacturing process. It is preferable that the insulating layer 310 has a thickness greater than 1 / 2 the height of the dam (DAM).

[0172] A bridge electrode (BE) and a second metal pattern are formed on the insulating layer 310. The bridge electrode (BE) is formed in the display area (DA) and electrically connects the first touch electrodes (TE). More specifically, the first touch electrodes (TE) adjacent to each other in a first direction (Y-axis direction) may be electrically connected through the bridge electrode (BE) to prevent the first touch electrodes (TE) and the second touch electrodes (RE) from shorting each other at their crossing regions. The bridge electrode (BE) may be disposed in a layer different from the first and second touch electrodes (TE, RE) and may be connected to the adjacent first touch electrodes (TE) through a first contact hole (CH1). The bridge electrode (BE) may cross the second touch electrodes (RE).

[0173] Here, the first contact holes (CH1) may be formed penetrating the insulating layer 310. The bridge electrode (BE) is connected to two adjacent first touch electrodes (TE) through two first contact holes (CH1) formed in the insulating layer 310 and exposing the two adjacent first touch electrodes (TE), and connects the two first contact holes (CH1).

[0174] The second metal pattern is formed in the non-display area (NDA) and is formed in the same layer as the bridge electrode (BE). The second metal pattern is spaced apart from the bridge electrode (BE) that is disposed at one end of the bridge electrode (BE). The second metal pattern is patterned to overlap the first metal pattern, and may be formed in the dam area, unlike the first metal pattern.

[0175] The second metal pattern may be an auxiliary line (AL) for connecting the first touch lines (TL) physically separated into two to each other and for reducing the resistance of the first touch line (TL) by being connected to the first touch line (TL). The auxiliary line (AL) may be patterned to extend from a position spaced apart from the bridge electrode (BE) disposed at one end of the bridge electrode (BE) to the pad area (PA) as shown in Fig. 9, but is not limited thereto. In order to electrically connect the first touch lines (TL1, TL2) physically separated into two and not formed in the dam area, the auxiliary line (AL) must be formed only in the dam area, and does not need to be formed in the pad area (PA).

[0176] The auxiliary line (AL) is formed overlapping the first touch line (TL). The auxiliary line (AL) may be connected to one of the first touch lines (TL1) through a second contact hole (CH2). The second contact hole (CH2) may be formed penetrating the insulating layer 310. The auxiliary line (AL) is connected to one of the first touch lines (TL1) through a second contact hole (CH2) disposed in the insulating layer 310 and exposing one of the first touch lines (TL1). The auxiliary line (AL) may be connected to another of the first touch lines (TL2) through a third contact hole (CH3). The third contact hole (CH3) may be formed penetrating the insulating layer 310. The auxiliary line (AL) is connected to another of the first touch lines (TL2) through a third contact hole (CH3) disposed in the insulating layer 310 and exposing another of the first touch lines (TL2). As a result, the auxiliary line (AL) electrically connects one first touch line (TL1) and the other first touch line (TL2).

[0177] Although not specifically shown in the drawing, the second metal pattern may be an auxiliary line (AL) for connecting the second touch lines (RL) physically separated into two to each other and for reducing the resistance of the second touch line (RL) by being connected to the second touch line (RL). The auxiliary line (AL) may be patterned to extend from a position spaced apart from the bridge electrode (BE) disposed at one end of the bridge electrode (BE) to the pad area (PA), but is not limited thereto. In order to electrically connect the second touch lines (RL1, RL2) physically separated into two and not formed in the dam area, the auxiliary line (AL) must be formed only in the dam area, and does not have to be formed to the pad area (PA).

[0178] The auxiliary line (AL) is formed overlapping the second touch line (RL). The auxiliary line (AL) may be connected to one of the second touch lines (RL1) through a second contact hole (CH2). The second contact hole (CH2) may be formed penetrating the insulating layer 310. The auxiliary line (AL) is connected to one of the second touch lines (RL1) through a second contact hole (CH2) disposed in the insulating layer 310 and exposing one of the second touch lines (RL1). The auxiliary line (AL) may be connected to another of the second touch lines (RL2) through a third contact hole (CH3). The third contact hole (CH3) may be formed penetrating the insulating layer 310. The auxiliary line (AL) is connected to another of the second touch lines (RL2) through a third contact hole (CH3) disposed in the insulating layer 310 and exposing the other of the second touch lines (RL2). As a result, the auxiliary line (AL) electrically connects one second touch line (RL1) and the other second touch line (RL2).

[0179] A passivation film 320 is formed on the insulating layer 310, the bridge electrode (BE) and the second metal pattern. The passivation film 320 blocks harmful external environments and maintains stable characteristics of the display device.

[0180] As described above, the present invention forms the insulating layer 310 to a sufficient thickness to cover not only the display area (DA) but also the dam area, thereby reducing the step caused by the dam (DAM). This makes it possible to prevent a residual film from remaining when forming a second metal pattern, for example, an auxiliary line (AL), formed on the dam (DAM).

[0181] Furthermore, the present invention can reduce the resistance of the first touch line (TL) or the second touch line (RL) by forming an auxiliary line (AL) to overlap the first touch line (TL) or the second touch line (RL) and connecting the first touch line (TL) or the second touch line (RL) to the auxiliary line (AL).

[0182] Furthermore, in the present invention, the auxiliary line (AL) can be formed in the same layer and with the same material as the bridge electrode (BE), so that the auxiliary line (AL) can be formed without a separate additional process.

[0183] Furthermore, the present invention prevents residual film from remaining when forming the first touch line (TL) or the second touch line (RL) by not forming the first touch line (TL) or the second touch line (RL) in the dam region, but by connecting the first touch line (TL) or the second touch line (RL) to the auxiliary line (AL) through the second and third contact holes (CH2, CH3).

[0184] Fifth Example Fig. 10 is a plan view showing another example of the touch sensing layer disposed on the first substrate of Fig. 4. Fig. 11 is a cross-sectional view showing an example of II-II' in Fig. 10, and Fig. 12 is a cross-sectional view showing an example of III-III' in Fig. 10.

[0185] The display device shown in Figures 10 to 12 is different from the display device shown in Figures 5 to 6 in that the first touch electrode (TE) and the second touch electrode (RE) are formed in different layers. In the following, specific details of the same configuration as in Figures 5 to 6 will be omitted.

[0186] Referring to Figures 10 to 12, the first substrate 111 is divided into a display area (DA) and a non-display area (NDA), and a pad area (PA) where a pad (PAD) is formed and a dam (DAM) can be formed in the non-display area (NDA).

[0187] In the display area (DA) of the first substrate 11, a thin film transistor layer 10 and an organic light emitting element layer 20 are formed.

[0188] The thin film transistor layer 10 includes a thin film transistor 210 , a gate insulating film 220 , an interlayer insulating film 230 , a protective film 240 and a planarizing film 250 .

[0189] An organic light emitting element layer 20 is formed on the thin film transistor layer 10. The organic light emitting element layer 20 includes an organic light emitting element 260 and a bank 270.

[0190] On the organic light emitting element layer 20, the sealing layer 30 is formed not only in the display area (DA) but also in the non-display area (NDA) of the first substrate 111. The sealing layer 30 includes a sealing film 280 and a dam (DAM).

[0191] The touch sensing layer 40 is formed on the encapsulation layer 30. The touch sensing layer 40 includes a first touch electrode (TE), a second touch electrode (RE), a first metal pattern, a second metal pattern, an insulating layer 310, and a passivation film 320.

[0192] A buffer layer is formed on the sealing layer 30. The buffer layer is formed so that the pads (PAD) are exposed in the display area (DA) and the non-display area (NDA). The buffer layer is formed so as to cover the dam (DAM). Such a buffer layer may be omitted.

[0193] On the buffer layer, a first touch electrode (TE) and a second touch electrode (RE) are formed in a display area (DA). The first touch electrode (TE) is extended in a first direction (X-axis direction) and has a line shape, and the second touch electrode (RE) is extended in a second direction (Y-axis direction) and has a line shape. The first direction (X-axis direction) may be parallel to the scan lines (S1 to Sn), and the second direction (Y-axis direction) may be parallel to the data lines (D1 to Dm). Alternatively, the first direction (X-axis direction) may be parallel to the data lines (D1 to Dm), and the second direction (Y-axis direction) may be parallel to the scan lines (S1 to Sn).

[0194] Meanwhile, an insulating layer 310 is disposed between the first touch electrode (TE) and the second touch electrode (RE), so that the first touch electrode (TE) and the second touch electrode (RE) are electrically insulated from each other. Also, each of the first touch electrodes (TE) extended in the first direction is electrically insulated from the first touch electrode (TE) adjacent thereto in the second direction. Each of the second touch electrodes (RE) extended in the second direction is electrically insulated from the second touch electrode (RE) adjacent thereto in the first direction.

[0195] As a result, a mutual capacitance corresponding to a touch sensor can be formed at the intersection area of ​​the first touch electrode (TE) and the second touch electrode (RE).

[0196] Meanwhile, the insulating layer 310 is formed not only in the display area (DA) but also in the non-display area (NDA). In particular, the insulating layer 310 is formed to cover the dam area to reduce the step caused by the dam (DAM). The insulating layer 310 is formed to have a sufficient thickness so that the second metal pattern does not generate a residual film due to the step during the manufacturing process. It is preferable that the insulating layer 310 has a thickness larger than 1 / 2 the height of the dam (DAM).

[0197] The first metal pattern is formed in the non-display area (NDA) and is formed in the same layer as the second touch electrode (RE). The first metal pattern is characterized in that it is not formed in the dam area. Since a dam (DAM) is formed in the dam area, there is a step due to the dam (DAM). If the first metal pattern is formed up to the dam area, a residual film may be generated during the manufacturing process due to the step due to the dam (DAM), and as a result, metal patterns that should be electrically insulated may be connected to each other. In order to prevent such problems from occurring, the present invention is characterized in that the first metal pattern is not formed in the dam area.

[0198] The first metal pattern may be an auxiliary line (AL) spaced apart from the second touch electrode (RE) disposed at one end in the first direction among the second touch electrodes (RE). The auxiliary line (AL) may include a first auxiliary line (AL1) patterned between the display area (DA) and a dam area where a dam (DAM) is formed. The auxiliary line (AL) may also include a second auxiliary line (AL2) patterned not only between the dam area and the pad area (PA) but also up to the pad area (PA). The second auxiliary line (AL2) may be connected to the pad (PAD) in the pad area (PA) and connected to the first touch driver 181 through the pad (PAD). Meanwhile, since the first auxiliary line (AL1) and the second auxiliary line (AL2) are formed with the dam area in between, the first auxiliary line (AL1) and the second auxiliary line (AL2) are physically separated. Although both the first auxiliary line (AL1) and the second auxiliary line (AL2) are shown in the drawing, the present invention is not limited thereto. In another embodiment, the auxiliary line (AL) may include only one of the first auxiliary line (AL1) and the second auxiliary line (AL2). Such an auxiliary line (AL) may be connected to the first touch line (TL) to reduce the resistance of the first touch line (TL).

[0199] Also, the first metal pattern may be a second touch line (RL) extended from the second touch electrode (RE) disposed at one end in the second direction among the second touch electrodes (RE). The second touch line (RL) is formed by physically separating one second touch line (RL1) patterned between the display area (DA) and the dam area and another second touch line (RL2) patterned between the dam area and the pad area (PA). One second touch line (RL1) is extended from the second touch electrode (RE) disposed at one end in the second direction among the second touch electrodes (RE) connected to each other in the second direction (X-axis direction) and is patterned between the display area (DA) and the dam area where the dam (DAM) is formed. Also, another second touch line (RL2) is patterned not only between the dam area and the pad area (PA) but also up to the pad area (PA). Another second touch line (RL2) may be connected to the pad (PAD) in the pad area (PA) and connected to the second touch driver 182 through the pad (PAD).

[0200] The second metal pattern is formed in the non-display area (NDA) and is formed in the same layer as the first touch electrode (TE). The second metal pattern is patterned to overlap the first metal pattern, and unlike the first metal pattern, can also be formed in the dam area.

[0201] The second metal pattern may be a first touch line (TL) that is extended from the first touch electrode (TE) disposed at one end in the first direction among the first touch electrodes (TE) and patterned to the pad area (PA). The first touch line (TL) may be connected to the pad (PAD) in the pad area (PA) and connected to the first touch driver 181 through the pad (PAD). Therefore, the first touch electrode (TE) connected in the first direction (Y-axis direction) may input a driving pulse from the first touch driver 181 through the first touch line (TL).

[0202] The first touch line (TL) is formed overlapping with the first auxiliary line (AL1) and the second auxiliary line (AL2) formed in the same layer as the second touch electrode (RE). The first touch line (TL) may be connected to the first auxiliary line (AL1) through the second contact hole (CH2). The second contact hole (CH2) may be formed penetrating the insulating layer 310. The first touch line (TL) is disposed in the insulating layer 310 and connected to the first auxiliary line (AL1) through the second contact hole (CH2) exposing the first auxiliary line (AL1). The first touch line (TL) may be connected to the second auxiliary line (AL2) through the third contact hole (CH3). The third contact hole (CH3) may be formed penetrating the insulating layer 310. The first touch line (TL) is disposed in the insulating layer 310 and connected to the second auxiliary line (AL2) through the third contact hole (CH3) exposing the second auxiliary line (AL2).

[0203] Also, the second metal pattern may be an auxiliary line (AL) spaced apart from the first touch electrode (TE) arranged at one end in the second direction of the first touch electrode (TE). The auxiliary line (AL) may be patterned to extend from a position spaced apart from the first touch electrode (TE) to the pad area (PA), but is not limited thereto. In order to electrically connect the second touch lines (RL1, RL2) that are not formed in the dam area and are physically separated into two, the auxiliary line (AL) must be formed in the dam area, but does not need to be formed in the pad area (PA). Such an auxiliary line (AL) can connect the second touch lines (RL) that are physically separated into two to each other, and can also reduce the resistance of the second touch line (RL) by connecting with the second touch line (RL).

[0204] The auxiliary line (AL) formed in the same layer as the first touch electrode (TE) is formed to overlap with the second touch line (RL). The auxiliary line (AL) may be connected to one of the second touch lines (RL1) through a second contact hole (CH2). The second contact hole (CH2) may be formed to penetrate the insulating layer 310. The auxiliary line (AL) is connected to one of the second touch lines (RL1) through a second contact hole (CH2) disposed in the insulating layer 310 and exposing one of the second touch lines (RL1). The auxiliary line (AL) may be connected to another of the second touch lines (RL2) through a third contact hole (CH3). The third contact hole (CH3) may be formed to penetrate the insulating layer 310. The auxiliary line (AL) is connected to another of the second touch lines (RL2) through a third contact hole (CH3) disposed in the insulating layer 310 and exposing the other of the second touch lines (RL2). As a result, the auxiliary line (AL) electrically connects one second touch line (RL1) and the other second touch line (RL2).

[0205] A passivation film 320 is formed on the insulating layer 310 and the first touch electrode (TE). The passivation film 320 blocks harmful external environments and maintains stable characteristics of the display device.

[0206] In the first to fifth embodiments of the present invention, the formation of one dam (DAM) is described, but the present invention is not limited to this. The first to fifth embodiments of the present invention can also be applied to a structure in which a plurality of dams (DAM) are formed, as shown in FIG.

[0207] More specifically, the first substrate 111 is divided into a display area (DA) and a non-display area (NDA), and in the non-display area (NDA), a pad area (PA) where a pad (PAD) is formed, a first dam (DAM1), and a second dam (DAM2) may be formed.

[0208] The first dam (DAM1) and the second dam (DAM2) are disposed in the non-display area (NDA) to block the flow of the organic layer 282 constituting the encapsulation layer 280. More specifically, the first dam (DAM1) is formed to surround the outer periphery of the display area (DA) and can primarily block the flow of the organic layer 282 constituting the encapsulation layer 280. In addition, the first dam (DAM1) is disposed between the display area (DA) and the pad area (PA) and can primarily block the flow of the organic layer 282 to prevent the organic layer 282 constituting the encapsulation layer 280 from invading the pad area (PA).

[0209] In addition, the second dam (DAM2) is formed to surround the outer periphery of the first dam (DAM1) and can secondarily block the organic layer 282 from overflowing onto the outer periphery of the first dam (DAM1). Thus, the first dam (DAM1) and the second dam (DAM2) can more effectively prevent the organic layer 282 from being exposed to the outside of the display device or from invading the pad area (PA).

[0210] The first dam (DAM1) and the second dam (DAM2) may be formed simultaneously with the planarization film 250 or the bank 270 of the pixel (P) and may be made of the same material as the planarization film 250 or the bank 270. In this case, the dam (DAM) may be made of an organic material such as an acrylic resin, an epoxy resin, a phenolic resin, a polyamide resin, or a polyimide resin.

[0211] The first metal pattern is formed in the non-display area (NDA) and is not formed in the dam area where the first dam (DAM1) and the second dam (DAM2) are formed.

[0212] An insulating layer 310 may be formed on the first metal pattern. The insulating layer 310 may be formed not only in the display area (DA) but also in the non-display area (NDA), and may be formed to cover the dam area in particular, thereby reducing steps caused by the first dam (DAM1) and the second dam (DAM2). The insulating layer 310 may be formed to have a sufficient thickness to fill a space generated when the first dam (DAM1) and the second dam (DAM2) are spaced apart.

[0213] A second metal pattern may be formed on the insulating layer 310. The second metal pattern may be formed in a non-display area (NDA) and may also be formed in a dam area where a first dam (DAM1) and a second dam (DAM2) are formed, unlike the first metal pattern. The second metal pattern may be connected to the first metal pattern through a contact hole penetrating the insulating layer 310.

[0214] Although the embodiments of the present invention have been described in detail above with reference to the accompanying drawings, the present invention is not necessarily limited to these embodiments, and various modifications can be made within the scope of the technical idea of ​​the present invention. Therefore, the embodiments disclosed in the present invention are for illustration purposes, not for limiting the technical idea of ​​the present invention, and the scope of the technical idea of ​​the present invention is not limited by these embodiments. Therefore, the embodiments described above should be understood as illustrative and not restrictive in all respects. The scope of protection of the present invention should be interpreted according to the claims, and all technical ideas within the scope equivalent thereto should be interpreted as being included in the scope of the present invention. [Explanation of symbols]

[0215] 100: Touch screen integrated display device 110: Display panel 111: First substrate 112: Second board 120: Scan drive unit 130: Data Drive Unit 131: Source drive IC 140: Flexible film 150: Circuit board 160: Timing controller 170: Host system 180: Touch drive unit 181: First touch drive unit 182: Second touch drive unit 183: Touch controller 190: Touch coordinate calculation unit 10: Thin film transistor layer 20: Organic light-emitting element layer 30: Sealing layer 40: Touch sensing layer 210: Thin film transistor 211: Active layer 212: Gate electrode 213: Source electrode 214: Drain electrode 220: Gate insulating film 230: Interlayer insulating film 240:Protective film 250: Flattening film 260: Organic light-emitting element 261: 1st electrode 262: Organic light-emitting layer 263:Second electrode

Claims

1. a substrate including a display area in which pixels are arranged, and a non-display area adjacent to the display area and including at least one pad; a dam disposed between the display area and the pad; a sealing film covering the pixels arranged in the display region and including at least one inorganic film covering the dam; a bridge electrode and a first metal pattern disposed on the sealing film; an insulating layer disposed over the bridge electrode and the first metal pattern; and a first touch electrode, a second touch electrode, and a second metal pattern disposed on the insulating layer; each of the first metal pattern and the second metal pattern is disposed in the non-display area; The first metal pattern at least partially overlaps the second metal pattern in the non-display area.

2. The display device according to claim 1 , wherein at least a portion of the first metal pattern overlaps with the second metal pattern disposed in an area where the dam is not disposed.

3. The display of claim 1 , wherein the second metal pattern is disposed over the dam, and at least a portion of the second metal pattern overlaps the dam.

4. the first touch electrode is electrically connected to the bridge electrode through a first contact hole in the insulating layer; The display device according to claim 1 , wherein the bridge electrode connects two adjacent first touch electrodes to each other.

5. The display device of claim 1 , wherein the second metal pattern is electrically connected to the first metal pattern through a second contact hole in the insulating layer.

6. The display device of claim 1 , wherein the first touch electrodes are aligned in a first direction, and the second touch electrodes are aligned in a second direction different from the first direction.

7. The display device according to claim 1 , wherein the first metal pattern is formed in a same layer as the bridge electrode, and the second metal pattern is formed in a same layer as the first touch electrode and the second touch electrode.

8. The display device of claim 1 , wherein the second metal pattern is a first touch line electrically connecting the pad and the first touch electrode.

9. The display device of claim 1 , wherein the second metal pattern is a second touch line electrically connecting the pad and the second touch electrode.

10. The display device of claim 1 , wherein the second metal pattern overlaps the first metal pattern and the insulating layer therebetween.

11. The display device of claim 1 , wherein the first metal pattern is disposed between the display area and the dam.

12. The display device according to claim 1 , wherein the first touch electrode and the second touch electrode are formed in the same layer.

13. The display device of claim 12 , wherein the second touch electrodes are connected to each other in a second direction.

14. A display device as described in claim 5, wherein the sealing film has a flat surface and a curved surface, and the second contact hole is formed in the insulating layer arranged on the curved surface of the sealing film.

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