Antibacterial method and antibacterial apparatus

The antibacterial method addresses contamination risks in cell culture spaces by alternating ozone, light, and liquid treatments with ion treatments, ensuring a safe and clean environment for workers and cells.

JP7847401B2Active Publication Date: 2026-04-17SHARP KK
View PDF 11 Cites 0 Cited by

Patent Information

Authority / Receiving Office
JP · JP
Patent Type
Patents
Current Assignee / Owner
SHARP KK
Filing Date
2021-08-12
Publication Date
2026-04-17

AI Technical Summary

Technical Problem

Existing sterilization methods for maintaining a clean environment in cell culture spaces, such as those using formalin, peracetic acid, or ultraviolet light, pose health risks and can lead to contamination due to residue or exposure during the time required to ensure safety.

Method used

An antibacterial method involving alternating antimicrobial treatments with ozone gas, antimicrobial light, and antimicrobial liquid particles, combined with an ion treatment using positive and negative cluster ions, controlled by a unit to maintain a hygienic environment without harmful residues.

Benefits of technology

The method effectively maintains a clean and safe environment by alternating treatments to ensure minimal adverse effects on humans and cells, allowing safe entry and operation within the treated space.

✦ Generated by Eureka AI based on patent content.

Smart Images

  • Figure 0007847401000001
    Figure 0007847401000001
  • Figure 0007847401000002
    Figure 0007847401000002
  • Figure 0007847401000003
    Figure 0007847401000003
Patent Text Reader

Abstract

This antimicrobial device (50) is provided with an antimicrobial unit (60), an ionization unit (70), and a control unit (80). The antimicrobial unit (60) transmits, toward a target space (14), at least one among light having an antimicrobial effect, a gas having an antimicrobial effect, liquid particles having an antimicrobial effect. The ionization unit (70) transmits ions toward the target space (14). The control unit (80) controls the antimicrobial unit (60) and the ionization unit (70). The antimicrobial effects of light, gas, and liquid particles are stronger than the antimicrobial effect of ions.
Need to check novelty before this filing date? Find Prior Art

Description

[Technical Field]

[0001] This invention relates to an antibacterial method and an antibacterial apparatus. [Background technology]

[0002] When performing cell culture, the work is carried out in a clean space (sterile space) to prevent contamination. Patent Document 1 discloses an example of a safety cabinet that forms a clean space. [Prior art documents] [Patent Documents]

[0003] [Patent Document 1] Japanese Patent Publication No. 2016-165249 [Overview of the project] [Problems that the invention aims to solve]

[0004] To maintain a clean environment, sterilization treatment is necessary at appropriate intervals in cell culture. Common sterilization methods include formalin, peracetic acid preparations, hydrogen peroxide, or ultraviolet light. However, since such sterilization treatments are harmful to humans, it is essential to ensure that no residue of the substances used in the sterilization treatment remains before workers enter the clean environment. There was a possibility of contamination occurring in the clean environment during the time required to ensure the absence of residue, or when workers entered the clean environment.

[0005] This invention has been made in view of the above-mentioned problems, and aims to provide an antibacterial method and an antibacterial device that can maintain a good sanitary environment in a target space. [Means for solving the problem]

[0006] According to a first aspect of the present invention, the antimicrobial method comprises at least two antimicrobial treatment steps and an ion treatment step. In the antimicrobial treatment step, at least one of the following is sent towards the target space: light having antimicrobial properties, a gas having antimicrobial properties, and liquid particles having antimicrobial properties. In the ion treatment step, ions are sent towards the target space. The start time of the ion treatment step is included between the start time of the previous antimicrobial treatment step and the start time of the next antimicrobial treatment step, and the end time of the ion treatment step is after the end time of the previous antimicrobial treatment step.

[0007] According to a second aspect of the present invention, the antibacterial device comprises an antibacterial unit, an ion unit, and a control unit. The antibacterial unit sends at least one of the following towards a target space: light having antibacterial properties, a gas having antibacterial properties, and liquid particles having antibacterial properties. The ion unit sends ions towards the target space. The control unit controls the antibacterial unit and the ion unit. [Effects of the Invention]

[0008] According to the antibacterial method and apparatus of the present invention, a good hygienic environment can be maintained in the target space. [Brief explanation of the drawing]

[0009] [Figure 1] This figure shows the configuration of an antibacterial system according to Embodiment 1 of the present invention. [Figure 2] This is a flowchart showing the antibacterial method according to Embodiment 1. [Figure 3] This is a diagram showing the configuration of the antibacterial system according to Embodiment 1. [Figure 4] This is a timetable showing the antibacterial method according to Embodiment 1. [Figure 5] This is a flowchart showing the antibacterial method according to Embodiment 1. [Figure 6] This figure shows the configuration of the antibacterial system according to Embodiment 2 of the present invention. [Figure 7] This figure shows the configuration of the antibacterial system according to Embodiment 3 of the present invention. [Figure 8] This figure shows the configuration of the antibacterial system according to Embodiment 4 of the present invention. [Modes for carrying out the invention]

[0010] Embodiments of the present invention will be described below with reference to the drawings. In the drawings, the same or corresponding parts will be denoted by the same reference numerals and will not be repeated in the description.

[0011] [Embodiment 1] The antimicrobial system 100 will be described with reference to Figure 1. Figure 1 is a diagram showing the configuration of the antimicrobial system 100 according to Embodiment 1 of the present invention. As shown in Figure 1, the antimicrobial system 100 is a cell culture facility for culturing cells of multicellular organisms involved in regenerative medicine, for example, and for operators to perform cell culture work. The cells are, for example, cells derived from plants or animals, and in Embodiment 1, they are induced pluripotent stem cells (iPS cells). The antimicrobial system 100 may also be used as a system for culturing cells other than those for regenerative medicine.

[0012] Specifically, the antibacterial system 100 comprises a workroom 10 and an antibacterial device 50. The antibacterial system 100 may also comprise multiple workrooms 10. Furthermore, the antibacterial system 100 may also comprise multiple antibacterial devices 50.

[0013] The workspace 10 has multiple walls 11, a floor 12, and a ceiling 13. The multiple walls 11, the floor 12, and the ceiling 13 define the workspace 14. The workspace 14 is an example of a target space. The workspace 14 is a space for performing cell culture and related tasks. A door 15 is provided on at least one of the multiple walls 11. The opening and closing of the door 15 allows workers to enter and exit the workspace 14.

[0014] The workspace 14 includes, for example, a safety cabinet 21, a clean chamber 22, and an incubator 23. The arrangement of the safety cabinet 21, clean chamber 22, and incubator 23 is not particularly limited; only a portion of these three components may be arranged.

[0015] The antibacterial device 50 comprises an antibacterial unit 60, an ion unit 70, and a control unit 80.

[0016] The antibacterial device 50 is placed in at least one of the multiple walls 11, floor 12, and ceiling 13. Specifically, the antibacterial device 50 is placed on the ceiling 13.

[0017] The antibacterial unit 60 delivers at least one of the following towards the working space 14: light with antibacterial properties, gas with antibacterial properties, and liquid particles with antibacterial properties. In other words, the antibacterial unit 60 performs an antibacterial treatment process. In this specification, the concept of antibacterial includes not only killing microorganisms such as bacteria, molds, and viruses, but also suppressing the growth and proliferation of microorganisms.

[0018] Specifically, the antibacterial unit 60 comprises an ozone generator and an ozone delivery unit. The ozone generator is a discharge device that generates ozone (O3) from oxygen molecules (O2) by discharge, for example. Ozone (O3) is an example of a gas that has antibacterial properties. Specifically, the ozone generator includes a pair of discharge electrodes (not shown). Examples of discharge methods include plasma discharge or corona discharge.

[0019] The dispensing unit sends ozone (O3) towards the workspace 14. The dispensing unit is a fan. The fan rotates. The fan generates airflow by rotating. The airflow generated by the dispensing unit contains ozone (O3), and the dispensing unit sends the ozone (O3) towards the workspace 14. Specifically, the installation position and airflow direction of the antibacterial unit 60 are set so that the airflow generated by the dispensing unit reaches every corner of the workspace 14. As a result, ozone (O3) is diffused throughout the entire workspace 14.

[0020] When ozone (O3) is released into the air, it surrounds the surface of microorganisms. Ozone (O3) can inactivate microorganisms and reduce their life activities. However, because ozone (O3) is a highly reactive species with very strong oxidizing power, if it is released not only onto microorganisms but also onto humans and cells, it may have adverse effects on them.

[0021] The ion unit 70 sends ions toward the workspace 14. In other words, the ion unit 70 performs an ion processing step.

[0022] The antibacterial effect of ions is weaker than that of ozone (O3). However, ions can inactivate microorganisms and reduce their life activities. Furthermore, ions have little to no adverse effects on humans and cells.

[0023] Specifically, the ion generating unit is a discharge device that generates ions by electrical discharge. More specifically, the ion generating unit is a discharge device that generates positive and negative ions by electrical discharge. The ion generating unit may also be a discharge device that generates only positive or negative ions by electrical discharge.

[0024] The control unit 80 controls the antibacterial unit 60 and the ion unit 70. The control unit 80 is, for example, a computer. The control unit 80 includes, for example, a processor such as a CPU (Central Processing Unit). Specifically, the control unit 80 switches the antibacterial unit 60 and the ion unit 70 on and off. On means, for example, turning on the power. Off means, for example, turning off the power.

[0025] In detail, the control unit 80 turns on the antibacterial unit 60 during the first period and turns it off outside of the first period. In other words, during the first period, the control unit 80 performs an antibacterial treatment process in which it sends ozone (O3) from the antibacterial unit 60 towards the workspace 14. The control unit 80 also performs the antibacterial treatment process at least twice. For example, the control unit 80 performs the antibacterial treatment process with a predetermined interval (e.g., one day, one week) between each step.

[0026] Furthermore, the control unit 80 turns on the ion unit 70 during the second period and turns off the ion unit 70 outside of the second period. In other words, during the second period, the control unit 80 performs an ion processing step in which ions are sent from the ion unit 70 toward the workspace 14.

[0027] Part of the second period is the period from after the antimicrobial treatment process is performed until before the next antimicrobial treatment process is performed. In other words, part of the second period is the period from after the antimicrobial treatment process is performed until before the antimicrobial treatment process immediately following it is performed. Specifically, the start time of the ion treatment process is included in the period from the start time of the previous antimicrobial treatment process until before the start time of the next antimicrobial treatment process. More specifically, the start time of the ion treatment process may be before the end time of the previous antimicrobial treatment process, at the same time as the end time of the previous antimicrobial treatment process, or after the end time of the previous antimicrobial treatment process. Also, the end time of the ion treatment process is after the end time of the previous antimicrobial treatment process. More specifically, the end time of the ion treatment process may be before the start time of the next antimicrobial treatment process, at the same time as the start time of the next antimicrobial treatment process, or after the start time of the next antimicrobial treatment process. Preferably, the ion treatment process is performed throughout the entire period from after the antimicrobial treatment process is performed until before the next antimicrobial treatment process is performed. More preferably, the start time of the ion treatment process is earlier than the end time of the preceding antimicrobial treatment process.

[0028] As explained above with reference to Figure 1, according to Embodiment 1, the start time of the ion treatment process is included in the period from the start time of the previous antibacterial treatment process to before the start time of the next antibacterial treatment process. Also, the end time of the ion treatment process is after the end time of the previous antibacterial treatment process. In other words, ions are sent into the workspace 14 between the time the previous antibacterial treatment process is executed and the time the next antibacterial treatment process is executed. As a result, since ions are present in the workspace 14 between the time the previous antibacterial treatment process is executed and the time the next antibacterial treatment process is executed, the hygienic environment of the workspace 14 can be maintained in good condition.

[0029] Next, with reference to Figure 2, the antibacterial method according to Embodiment 1 will be described. Figure 2 is a flowchart of the antibacterial method according to Embodiment 1. As shown in Figure 2, the antibacterial method includes processes S1 to S6. The antibacterial method is performed by the antibacterial system 100.

[0030] First, in process S1, the antibacterial unit 60 starts an antibacterial treatment process in which it sends ozone (O3) towards the work space 14 under the control of the control unit 80. As a result, ozone (O3) is present in the work space 14.

[0031] Next, in process S2, the antibacterial unit 60 terminates the antibacterial treatment process in which it sends ozone (O3) toward the work space 14 under the control of the control unit 80.

[0032] Next, in process S3, the ion unit 70 starts an ion processing process in which it sends ions toward the workspace 14, under the control of the control unit 80. As a result, ions are present in the workspace 14.

[0033] Next, in process S4, the ion unit 70 terminates the ion processing step of sending ions toward the work space 14 under the control of the control unit 80.

[0034] Next, in process S5, the antibacterial unit 60 starts an antibacterial treatment process in which it sends ozone (O3) toward the workspace 14 under the control of the control unit 80. As a result, ozone (O3) is present in the workspace 14.

[0035] Next, in process S6, the antibacterial unit 60 terminates the antibacterial treatment process in which it sends ozone (O3) toward the work space 14 under the control of the control unit 80. Then, the antibacterial method is completed.

[0036] As described above with reference to Figure 2, according to Embodiment 1, two antibacterial treatment steps are performed with a predetermined interval between them. In addition, ions are introduced into the workspace 14 between the execution of one antibacterial treatment step and the execution of the next antibacterial treatment step. As a result, since ions are present in the workspace 14 between the execution of one antibacterial treatment step and the execution of the next antibacterial treatment step, a good hygienic environment in the workspace 14 can be maintained.

[0037] Now, let's describe the ion unit 70. Specifically, the ion unit 70 comprises an ion generating unit and an ion delivery unit.

[0038] Specifically, the ion generating unit includes a pair of discharge electrodes (not shown). More specifically, a positive voltage is applied to one of the pair of discharge electrodes. When a positive voltage is applied to the discharge electrode, water molecules (H2O) in the air are electrically decomposed by the discharge, mainly producing hydrogen ions (H2O). + This is generated. And the generated hydrogen ions H + Water molecules (H2O) from the air condense around it, forming a stable cluster ion H with a positive charge. + (H2O) m A stable cluster ion H with a positive charge is formed. m is a natural number. + (H2O) m This is an example of a positive ion. Note that cluster ions H + (H2O) m The formation of this substance can be confirmed by time-resolved mass spectrometry.

[0039] A negative voltage is applied to the other of the pair of discharge electrodes. When a negative voltage is applied to the discharge electrode, oxygen molecules (O2) in the air are ionized by the discharge, mainly generating oxygen molecular ions (superoxide ions) O2 - And the generated oxygen molecular ions (superoxide ions) O2 - Water molecules (H2O) in the air aggregate around it, forming a stable cluster ion O2 - (H2O) n where n is a natural number. The stable cluster ion O2 - (H2O) n is an example of a negative ion. The generation of the cluster ion H + (H2O) m can be confirmed by time-of-flight mass spectrometry.

[0040] The sending unit sends the cluster ions H + (H2O) m and the cluster ions O2 - (H2O) n towards the working space 14. The sending unit is a fan. The fan rotates. The fan generates wind by rotating. The wind generated by the sending unit contains the cluster ions H + (H2O) m and the cluster ions O2 - (H2O) n and the sending unit can send the cluster ions H + (H2O) m and the cluster ions O2 - (H2O) n towards the working space 14. Specifically, the installation position and the blowing direction of the ion unit 70 are set so that the wind generated by the sending unit reaches every corner of the working space 14. As a result, the cluster ions H + (H2O) m and the cluster ions O2 - (H2O) n diffuse throughout the working space 14.

[0041] For example, the cluster ions H + (H2O)m and cluster ions O2 - (H2O) n When released into the air simultaneously, it surrounds the surface of microorganisms. And instantaneously, cluster ions H + (H2O) m and cluster ions O2 - (H2O) n When these combine, [·OH] (hydroxyl radical) is generated on the surface of the microorganism. Since [·OH] is a highly oxidative and active species, it can inactivate the microorganism and reduce its life activities.

[0042] In detail, the ion unit 70 contains cluster ions H in the workspace 14. + (H2O) m and cluster ions O2 - (H2O) n The concentrations are 7000 particles / cm³ each. 3 As described above, cluster ion H + (H2O) m and cluster ions O2 - (H2O) n It is preferable to supply cluster ions H. + (H2O) m and cluster ions O2 - (H2O) n The concentrations are 7000 particles / cm³ each. 3 If the above conditions are met, the growth and proliferation of bacteria and viruses can be reduced.

[0043] Also, cluster ion H + (H2O) m and cluster ions O2 - (H2O) n The upper limit of the concentration varies depending on the type of cell being cultured. Therefore, before starting cell culture, the cluster ion H in the workspace 14 should be adjusted according to the type of cell being cultured. + (H2O) m and cluster ions O2 - (H2O) nThe concentration may be set. Specifically, the ion unit 70 controls cluster ions H in the workspace 14. + (H2O) m and cluster ions O2 - (H2O) n The concentrations are, respectively, 1 million particles / cm³. 3 Cluster ion H + (H2O) m and cluster ions O2 - (H2O) n It is preferable to supply cluster ions H. + (H2O) m and cluster ions O2 - (H2O) n The concentrations are, respectively, 1 million particles / cm³. 3 The following conditions allow for antibacterial action without adversely affecting cells.

[0044] Next, with reference to Figure 3, the antibacterial method according to Embodiment 1 will be described in detail. Figure 3 is a diagram showing the configuration of the antibacterial system 100 according to Embodiment 1. As shown in Figure 3, the antibacterial device 50 further comprises an ozone discharge unit 90.

[0045] The ozone discharge unit 90 discharges ozone (O3) from the workspace 14. Specifically, the ozone discharge unit 90 is a fan. The fan rotates. The fan generates airflow by rotating.

[0046] The control unit 80 switches the ozone discharge unit 90 on and off. Specifically, the control unit 80 turns on the ozone discharge unit 90 during a predetermined period after the first period. In other words, the control unit 80 performs an ozone (O3) discharge process during a predetermined period after the first period. As a result, there is no ozone (O3) in the workspace 14. Therefore, people can be present in the workspace 14. Specifically, the concentration of ozone (O3) in the workspace 14 is measured using an ozone detector or the like, and workers are allowed to enter the workspace 14 only after the ozone (O3) concentration has fallen below a safe standard value.

[0047] The antibacterial method according to Embodiment 1 will now be described in detail with reference to Figures 4 and 5. Figure 4 is a timetable showing the antibacterial method according to Embodiment 1. As shown in Figure 4, the antibacterial method includes an antibacterial treatment step P1, a discharge treatment step P2, an ion treatment step P3, a work step P4, and a preservation treatment step P5. The antibacterial method is performed by the antibacterial system 100.

[0048] In task P4, the worker performs cell culture-related tasks in workspace 14. Task P4 is performed outside of the first period. In other words, the worker is not present in workspace 14 during the first period. As a result, the worker is not adversely affected by ozone (O3).

[0049] In preservation process P5, cells of multicellular organisms involved in regenerative medicine are preserved and cultured in workspace 14. Preservation process P5 is performed outside of the first period. In other words, the cells are not present in workspace 14 during the first period. As a result, the cells are not adversely affected by ozone (O3).

[0050] Figure 5 is a flowchart showing the antibacterial method according to Embodiment 1. The antibacterial method includes processes S101 to S112.

[0051] As shown in Figures 4 and 5, the antimicrobial treatment process P1 is started at time t1. Specifically, in process S101, the antimicrobial unit 60 starts sending ozone (O3) towards the workspace 14 under the control of the control unit 80. As a result, ozone (O3) is present in the workspace 14.

[0052] Next, at time t2, the ion treatment process P3 is started. Specifically, in process S102, the ion unit 70 is controlled by the control unit 80 to produce cluster ions H + (H2O) m and cluster ions O2 - (H2O) n The process of sending the cluster ions H towards the workspace 14 is initiated. As a result, cluster ions H are sent to the workspace 14. + (H2O) m and cluster ions O2- (H2O) n is present.

[0053] Next, at time t3, the antibacterial treatment step P1 is terminated. Specifically, in process S103, under the control of the control unit 80, the antibacterial unit 60 finishes sending ozone (O3) toward the work space 14.

[0054] Next, at time t3, the discharge treatment step P2 is started. Specifically, in process S104, under the control of the control unit 80, the ozone discharge unit 90 starts discharging ozone (O3) from the work space 14.

[0055] Next, at time t4, the discharge treatment step P2 is terminated. Specifically, in process S105, under the control of the control unit 80, the ozone discharge unit 90 finishes discharging ozone (O3) from the work space 14. As a result, no ozone (O3) is present in the work space 14.

[0056] Next, at time t4, operation P4 is started. Specifically, in process S106, an operator starts performing operation P4 related to cell culture in the work space 14. Specifically, when the door 15 is opened and closed, the operator enters the work space 14. In the work space 14, together with the operator, cluster ion H + (H2O) m and cluster ion O2 - (H2O) n are present.

[0057] Next, at time t5, operation P4 is terminated. Specifically, in process S107, an operator finishes performing operation P4 related to cell culture in the work space 14. Specifically, in the work space 14, together with the operator, cluster ion H + (H2O) m and cluster ion O2 - (H2O) n are present. When the door 15 is opened and closed, the operator exits the work space 14.

[0058] Next, at time t5, the storage process step P5 is started. Specifically, in process S108, starting to perform cell culture in the working space 14. Specifically, in the working space 14, together with the cells, cluster ions H + (H2O) m and cluster ions O2 - (H2O) n are present.

[0059] Next, at time t6, the storage process step P5 is ended. Specifically, in process S109, ending the performance of cell culture in the working space 14. Specifically, in the working space 14, together with the cells, cluster ions H + (H2O) m and cluster ions O2 - (H2O) n are present.

[0060] Next, at time t6, the ion treatment step P3 is ended. Specifically, in process S110, under the control of the control unit 80, the ion unit 70 ends sending the cluster ions H + (H2O) m and the cluster ions O2 - (H2O) n towards the working space 14. Specifically, the door 15 is opened and closed, and an operator enters and exits the working space 14 to take out the cultured cells from the working space 14.

[0061] Next, at time t6, the antibacterial treatment step P1 is started. Specifically, in process S111, under the control of the control unit 80, the antibacterial unit 60 starts sending ozone (O3) towards the working space 14. As a result, ozone (O3) is present in the working space 14.

[0062] Next, at time t7, the antibacterial treatment step P1 is ended. Specifically, in process S112, under the control of the control unit 80, the antibacterial unit 60 ends sending ozone (O3) towards the working space 14. And the antibacterial method ends.

[0063] As explained above with reference to Figure 5, according to Embodiment 1, while the ion treatment step P3 is being performed between the execution of the antimicrobial treatment step P1 and the execution of the next antimicrobial treatment step P1, the worker performs the cell culture work P4 and the preservation treatment step P5. As a result, the worker can perform work P4 and the preservation treatment step P5 in a workspace 14 where a good hygienic environment is maintained. In detail, after the antimicrobial treatment step P1, the ion treatment step P3 is continued at the stage when the worker enters the room and performs the work. As a result, even if microorganisms contaminate the workspace 14 when the worker enters the room, the microorganisms can be killed or their growth and proliferation can be suppressed, and the hygienic environment of the workspace 14 can be maintained.

[0064] [Embodiment 2] Next, with reference to Figure 6, the antibacterial system 200 according to Embodiment 2 of the present invention will be described. Furthermore, the antibacterial system 200 of Embodiment 2 differs from Embodiment 1 in that it is set in an operating room. Also, the antibacterial system 200 of Embodiment 2 differs from Embodiment 1 in that it is equipped with a plurality of ultraviolet light sources 260. Below, the differences between Embodiment 2 and Embodiment 1 will be described, and the explanation of parts that overlap with Embodiment 1 will be omitted.

[0065] Figure 6 shows the configuration of an antimicrobial system 200 according to Embodiment 2 of the present invention. As shown in Figure 6, the antimicrobial system 200 is, for example, an operating room where a doctor performs surgery on a patient.

[0066] For example, surgical equipment 221 is located in the workspace 14.

[0067] The antibacterial device 50 is equipped with multiple ultraviolet light sources 260. Each of the multiple ultraviolet light sources 260 is equipped with an ultraviolet light source. The ultraviolet light source emits ultraviolet light. Ultraviolet light is an example of light that has antibacterial properties. Specifically, the installation positions and number of ultraviolet light sources 260 are set so that the ultraviolet light reaches every corner of the workspace 14. As a result, the entire workspace 14 is irradiated with ultraviolet light.

[0068] Ultraviolet light, when irradiated onto microorganisms, can inactivate them and reduce their life activities. However, because ultraviolet light has very high energy, irradiating not only microorganisms but also humans and cells with it can have adverse effects on them.

[0069] In detail, the control unit 80 turns on the ultraviolet light source unit 260 during the first period and turns off the ultraviolet light source unit 260 outside of the first period. In other words, during the first period, the control unit 80 performs an antibacterial treatment process in which ultraviolet light is irradiated from the ultraviolet light source unit 260 toward the workspace 14.

[0070] As described above with reference to Figure 6, according to Embodiment 2, an antimicrobial treatment step is performed in which ultraviolet light is irradiated toward the workspace 14 at predetermined intervals (for example, 1 day, 1 week). Furthermore, between the execution of the antimicrobial treatment step and the execution of the next antimicrobial treatment step, cluster ions H are introduced into the workspace 14. + (H2O) m and cluster ions O2 - (H2O) n This is released. As a result, cluster ions H are released into the workspace 14. + (H2O) m and cluster ions O2 - (H2O) n Because of its presence, the presence of microorganisms in the workspace 14 can be suppressed. Furthermore, since ultraviolet light irradiation does not leave any residue of substances such as ozone (O3), it is possible to enter the room the moment the ultraviolet light source 260 is turned off.

[0071] [Embodiment 3] Next, with reference to Figure 7, the antibacterial system 300 according to Embodiment 3 of the present invention will be described. Furthermore, the antibacterial system 300 of Embodiment 3 differs from Embodiment 1 in that it is a food factory. Also, the antibacterial device 50 of Embodiment 3 differs from Embodiment 1 in that it includes a liquid spray unit 360 and a liquid tank 390. Below, the differences between Embodiment 3 and Embodiment 1 will be described, and the explanation of parts that overlap with Embodiment 1 will be omitted.

[0072] Figure 7 shows the configuration of an antimicrobial system 300 according to Embodiment 3 of the present invention. As shown in Figure 7, the antimicrobial system 300 is, for example, a food factory where workers process food using yeast.

[0073] For example, factory equipment 321 is located in the workspace 14.

[0074] The antibacterial device 50 comprises a liquid spray unit 360 and a liquid tank 390. The liquid spray unit 360 is, for example, a device that sprays ethanol from the liquid tank 390 as liquid particles. Ethanol is an example of liquid particles that have antibacterial properties.

[0075] In detail, the installation position and spray direction of the liquid spray unit 360 are set so that the liquid particles reach every corner of the work space 14. As a result, the ethanol diffuses throughout the entire work space 14.

[0076] When ethanol is released into the air, it surrounds the surface of microorganisms. Ethanol can inactivate microorganisms and reduce their life activities. However, if ethanol is released not only onto microorganisms but also onto humans and yeast, it may have adverse effects on humans and yeast.

[0077] In detail, the control unit 80 turns on the liquid spray unit 360 during the first period and turns off the liquid spray unit 360 outside of the first period. In other words, during the first period, the control unit 80 performs an antimicrobial treatment process in which ethanol is sprayed from the liquid spray unit 360 toward the workspace 14.

[0078] As described above with reference to Figure 7, according to Embodiment 3, an antimicrobial treatment step is performed in which ethanol is sprayed towards the workspace 14 at predetermined intervals (for example, 1 day, 1 week). Furthermore, between the execution of the antimicrobial treatment step and the execution of the next antimicrobial treatment step, cluster ions H are introduced into the workspace 14. + (H2O) m and cluster ions O2 - (H2O) nThis is released. As a result, cluster ions H are released into the workspace 14. + (H2O) m and cluster ions O2 - (H2O) n Because of its presence, the hygienic environment of the workspace 14 can be maintained in good condition.

[0079] [Embodiment 4] Next, with reference to Figure 8, the antibacterial system 400 according to Embodiment 4 of the present invention will be described. Furthermore, the antibacterial system 400 of Embodiment 4 differs from Embodiment 1 in that it is a containment container. Below, the differences between Embodiment 4 and Embodiment 1 will be described, and the explanation of parts that overlap with Embodiment 1 will be omitted.

[0080] Figure 8 shows the configuration of the antimicrobial system 400 according to Embodiment 4 of the present invention. As shown in Figure 8, the antimicrobial system 400 is, for example, a container for containing food SA.

[0081] Specifically, the antimicrobial system 400 comprises a containment container 410 and an antimicrobial device 50.

[0082] The container 410 has multiple walls 411, a bottom wall 412, and a top wall 413. The multiple walls 411, the bottom wall 412, and the top wall 413 define a storage space 414. The storage space 414 is an example of a target space. The storage space 414 is a space for storing food. A door 415 is provided on at least one of the multiple walls 411. Food SA enters and exits the storage space 414 by opening and closing the door 415.

[0083] The antibacterial device 50 is placed in at least one of the multiple walls 411, the bottom wall 412, and the top wall 413. Specifically, the antibacterial device 50 is placed on the top wall 413.

[0084] As described above with reference to Figure 8, according to Embodiment 4, an antimicrobial treatment process is performed in which ozone (O3) is sent towards the containment space 414 after a predetermined period of time (for example, one day, one week). Furthermore, between the execution of the antimicrobial treatment process and the execution of the next antimicrobial treatment process, cluster ions H3 are introduced into the containment space 414. + (H2O) m and cluster ions O2 - (H2O) n This is released. As a result, cluster ions H are released into the containment space 414. + (H2O) m and cluster ions O2 - (H2O) n Because of its presence, the sanitary environment of containment space 414 can be maintained in good condition.

[0085] Embodiments of the present invention have been described above with reference to the drawings. However, the present invention is not limited to the above embodiments and can be implemented in various forms without departing from its essence. Furthermore, various inventions can be formed by appropriately combining the multiple components disclosed in each of the above embodiments. For example, some components may be deleted from all the components shown in the embodiments. Furthermore, components from different embodiments may be appropriately combined. The drawings schematically show each component for ease of understanding, and the thickness, length, number, spacing, etc. of each component shown may differ from the actual dimensions due to the convenience of drawing creation. Also, the speed, material, shape, dimensions, etc. of each component shown in the above embodiments are examples and are not particularly limited, and various modifications are possible without substantially departing from the configuration of the present invention.

[0086] (1) As described with reference to Figures 1 to 5, in Embodiment 1, the ion treatment step was performed once during the period from the execution of the antibacterial treatment step to the execution of the next antibacterial treatment step, but the present invention is not limited thereto. The ion treatment may be performed multiple times during the period from the execution of the antibacterial treatment step to the execution of the next antibacterial treatment step. In other words, the control unit 80 may repeatedly turn the ion unit 70 on and off during the period from the execution of the antibacterial treatment step to the execution of the next antibacterial treatment step.

[0087] (2) In Embodiment 1, the antibacterial unit 60 supplied ozone (O3) towards the workspace 14, but the present invention is not limited thereto. The antibacterial unit 60 may also supply hydrogen peroxide gas towards the workspace 14.

[0088] (3) In Embodiment 3, the liquid injection unit 360 was a device that injected ethanol as liquid particles, but the present invention is not limited thereto. The liquid injection unit 360 may also be a device that injected formalin as liquid particles. [Industrial applicability]

[0089] This invention can be used in the field of antimicrobial methods and antimicrobial devices. [Explanation of symbols]

[0090] 14 Target Space 50 Antibacterial device 60 Antibacterial Department 70 Ion section 80 Control Unit

Claims

1. An antibacterial treatment step in which at least one of a gas having antibacterial properties and liquid particles having antibacterial properties is delivered to the target space, An ion treatment step of sending ions having a weaker antibacterial effect than the antibacterial effect of the gas and liquid particles toward the target space, A discharge treatment step for discharging the gas or liquid particles from the target space, Includes, The ion treatment step is started after the antibacterial treatment step has started and before the antibacterial treatment step has finished, and ends after the antibacterial treatment step has finished. The aforementioned discharge treatment process is completed after the ion treatment process has started and before the ion treatment process has finished. An antimicrobial method wherein no worker is present in the target space during the execution of the antimicrobial treatment step, and the worker performs work in the target space during the execution of the ion treatment step.

2. An antibacterial unit that delivers at least one of the following towards a target space: light with antibacterial properties, gas with antibacterial properties, and liquid particles with antibacterial properties. An ion unit that sends ions having a weaker antibacterial effect than the antibacterial effect of the gas and liquid particles toward the target space, A discharge unit for discharging the gas or liquid particles from the target space, The system comprises a control unit that controls the discharge unit, the antibacterial unit, and the ion unit, The control unit, After the antibacterial unit has started to deliver the at least one type toward the target space, and before it has finished delivering the at least one type toward the target space, the ion unit is instructed to start delivering the ions toward the target space, and after the antibacterial unit has finished delivering the at least one type toward the target space, the ion unit is instructed to stop delivering the ions toward the target space. Control is performed to discharge the gas or liquid particles from the target space such that the discharge is terminated after the ion unit has started sending the ions toward the target space and before it has finished sending the ions. An antimicrobial apparatus in which, during the execution of the antimicrobial treatment step, no worker is present in the target space, and during the execution of the ion treatment step, the worker performs work in the target space.

Citation Information

Patent Citations

  • Method of sterilizing clean room* etc*

    JP1980122555A

  • Shiitake mushroom laccase gene

    JP2002065282A

  • Air cleaner

    JP2002065828A

  • Sterilization / deodorization device

    JP2003153995A

  • Air conditioner

    JP2003294280A