Manufacturing method for semiconductor devices
By bonding semiconductor elements on substrates with varying elastic moduli and removing the harder first substrate, the method addresses distortion issues in semiconductor manufacturing, improving accuracy and reducing costs.
Patent Information
- Authority / Receiving Office
- JP · JP
- Patent Type
- Patents
- Current Assignee / Owner
- TOKYO ELECTRON LTD
- Filing Date
- 2022-10-04
- Publication Date
- 2026-06-02
AI Technical Summary
Existing semiconductor device manufacturing methods face challenges in suppressing distortion of multilayer films in memory cell arrays, leading to reduced patterning accuracy and increased manufacturing costs due to substrate warping and the need for additional thinning processes.
A method involving bonding a first semiconductor element to a second semiconductor element on substrates with differing elastic moduli, where the first substrate is harder than the second, and then removing the first substrate to form a laminate, using a separation layer to minimize distortion and simplify the process.
This approach effectively suppresses distortion of multilayer films, maintains patterning accuracy, enhances productivity, and reduces manufacturing costs by eliminating the need for substrate thinning steps.
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