Processing equipment
The strainer design with a flange and protective wall effectively blocks debris entry, ensuring uninterrupted waste liquid flow without energy consumption, addressing the complexity and energy requirements of existing strainer mechanisms.
Patent Information
- Authority / Receiving Office
- JP · JP
- Patent Type
- Patents
- Current Assignee / Owner
- DISCO CORP
- Filing Date
- 2022-08-10
- Publication Date
- 2026-06-03
AI Technical Summary
Existing strainers at waste liquid outlets require energy-consuming mechanisms like air injection to prevent obstruction by machining chips, complicating the device configuration.
A strainer design with a flange portion and protective wall that prevents debris entry, allowing liquid passage without the need for air injection or electricity, comprising a flange anchored to the waste liquid port, a main body with lower openings, and an umbrella-shaped protective wall above the flange to block debris.
Prevents debris accumulation in the strainer body, ensuring uninterrupted waste liquid flow without energy consumption, thus simplifying the device configuration and maintaining operational efficiency.
Smart Images

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Abstract
Description
Technical Field
[0001] The present invention relates to a strainer disposed at a waste liquid outlet of a processing device and the processing device.
Background Art
[0002] Conventionally, as disclosed in Patent Document 1 for example, it is known that a strainer is disposed at the waste liquid outlet of a processing device so that machining chips generated during processing do not flow out from the waste liquid outlet of the processing device.
[0003] When the machining chips generated during processing fall into the strainer, the flow of the waste liquid from the waste liquid outlet is obstructed, and the waste liquid leaks from the water case.
[0004] Therefore, Patent Document 1 discloses a technique provided with an air injection unit that injects air from below the net cage (strainer) toward the net cage, and raises large machining chips by the air injected from the air injection unit, and moves the large machining chips so as to dance while floating above the net cage, so that the flow of the waste liquid from the drain outlet is not obstructed by the large machining chips.
Prior Art Documents
Patent Documents
[0005]
Patent Document 1
Summary of the Invention
Problems to be Solved by the Invention
[0006] In the configuration disclosed in Patent Document 1, a mechanism for air injection is required, the device configuration becomes complicated, and improvement has been desired because it is necessary to use energy such as electric power.
[0007] In view of the above problems, the present invention proposes a novel configuration for ensuring the flow of the waste liquid from the drain outlet without requiring energy such as air injection or electric power. [Means for solving the problem]
[0008] The problems that this invention aims to solve are as described above, and the means for solving these problems will now be explained.
[0009] According to one aspect of the present invention, a strainer is disposed at the wastewater port of a processing apparatus comprising: a holding unit for holding a workpiece; a processing unit for processing the workpiece held by the holding unit; a processing fluid supply unit for supplying processing fluid to the workpiece held by the holding unit; a water case for receiving wastewater containing processing debris; and a wastewater port formed in the water case, the strainer comprising: a flange portion that is anchored to the edge of the wastewater port; a main body portion having an opening for the passage of liquid at a position below the flange portion; and a protective wall having an opening for the passage of liquid at a position above the flange portion, which prevents the processing debris from entering the main body portion.
[0010] Furthermore, according to one aspect of the present invention, the protective wall closes the opening at the top of the main body in an umbrella shape.
[0011] Furthermore, according to one aspect of the present invention, the protective wall is cylindrical and erected from the flange portion.
[0012] Furthermore, according to one aspect of the present invention, a processing apparatus comprising: a holding unit for holding a workpiece; a processing unit for processing the workpiece held by the holding unit; a processing fluid supply unit for supplying processing fluid to the workpiece held by the holding unit; a water case for receiving waste liquid containing processing debris; a waste liquid port formed in the water case; and a strainer disposed at the waste liquid port, wherein the strainer comprises: a flange portion that is anchored to the edge of the waste liquid port; a main body portion having an opening for the liquid to pass through at a position below the flange portion; and a protective wall having an opening for the liquid to pass through at a position above the flange portion, which prevents the processing debris from entering the main body portion. [Effects of the Invention]
[0013] The present invention provides the following effects: In other words, according to one aspect of the present invention, processing debris is prevented from entering the main body by the protective wall, and the problem of waste liquid not flowing out of the waste liquid port due to the accumulation of processing debris in the main body can be prevented. Furthermore, no energy such as air injection or electricity is required. [Brief explanation of the drawing]
[0014] [Figure 1] A diagram showing an example of a processing apparatus in which the strainer according to the present invention is installed. [Figure 2] A diagram showing one embodiment of a strainer. [Figure 3] A diagram showing the installation status of the strainer. [Figure 4] A diagram showing the installation state of the strainer in another embodiment. [Modes for carrying out the invention]
[0015] Embodiments of the present invention will be described below with reference to the drawings. The processing apparatus 1 shown in Figure 1 comprises a holding unit 30 for holding a workpiece W, a processing unit 7 for processing the workpiece W held by the holding unit 30, a processing fluid supply unit 60 for supplying processing fluid to the workpiece W held by the holding unit 30, a water case 4 for receiving waste liquid containing processing scraps, and a waste liquid port 6 formed in the water case 4.
[0016] To explain in detail below, the base 10 of the processing apparatus 1 has its longitudinal direction in the Y-axis direction. The front of the base 10 (-Y direction side) is configured as an loading / unloading area A2 where the workpiece W is loaded and unloaded from the holding unit 30, and the rear of the base 10 (+Y direction side) is configured as a grinding area A1 where the workpiece W held on the holding unit 30 is ground by the processing unit 7. The grinding area A1 is formed within a processing chamber which is formed by a cover (not shown), and the processing unit 7 is housed within the processing chamber.
[0017] Note that the processing device according to the present invention is not limited to a processing unit 7 such as the processing device 1 being a single-axis grinding device. It may be a two-axis grinding device or the like that includes rough grinding means and finish grinding means and can position the workpiece W below the rough grinding means or the finish grinding means by means of a rotating turntable. Further, the processing device may be a cutting device that cuts the workpiece into chips with a rotating cutting blade, or a lathe cutting device that cuts the back surface of the workpiece W with a rotating tool.
[0018] The workpiece W is, for example, a circular semiconductor wafer made of a silicon base material or the like. Note that the workpiece W may be made of gallium arsenide, sapphire, gallium nitride, ceramics, resin, or silicon carbide in addition to silicon, or may be a rectangular package substrate or the like. Further, the workpiece W may have a device formed thereon, or may be a wafer cut out from an ingot on which no device is formed. Further, it may be a semiconductor wafer whose outer peripheral portion is edge-trimmed from one surface side to a predetermined depth.
[0019] The holding unit 30 shown in FIG. 1 for holding the workpiece W includes, for example, a circular holding table 30a that adsorbs and holds the workpiece W, and a frame body 30b that supports the holding table 30a. The holding table 30a is made of a porous member or the like and communicates with a suction source (not shown), and sucks and holds the workpiece W on the holding surface that is the exposed surface of the holding table 30a. Note that the holding surface of the holding table 30a is, for example, an extremely gentle conical slope with the rotation center of the holding unit 30 as the apex.
[0020] As shown in FIG. 1, the holding unit 30 is surrounded by a cover 39 and is rotatable about a rotation axis in the Z-axis direction by table rotation means (not shown) disposed below it. Further, the holding unit 30 is reciprocally movable in the Y-axis direction by Y-axis movement means (not shown) disposed below the cover 39 shown in FIG. 1 and the bellows cover 37 connected before and after the cover 39.
[0021] On the grinding area A1 on the base 10 shown in FIG. 1, a vertical wall 11 is erected. On the front surface of the vertical wall 11, a grinding feed mechanism 5 for grinding feed in the Z-axis direction (vertical direction) in which the processing unit 7 moves away from or approaches the holding unit 30 is disposed. The grinding feed mechanism 5 includes a ball screw 50 having an axial center in the vertical direction, a pair of guide rails 51 disposed in parallel with the ball screw 50, a motor 52 connected to the upper end of the ball screw 50 to rotate the ball screw 50, and a lifting plate 53 whose internal nut is screwed to the ball screw 50 and whose side portion is in sliding contact with the guide rail 51. When the motor 52 rotates the ball screw 50, accordingly, the lifting plate 53 is guided by the guide rail 51 and reciprocates in the Z-axis direction, and the processing unit 7 fixed to the lifting plate 53 is fed for grinding in the Z-axis direction.
[0022] The processing unit 7 for grinding the workpiece W held by the holding unit 30 includes a spindle 70 whose axial direction is the Z-axis direction, a housing 71 that rotatably supports the spindle 70, a motor 72 that rotationally drives the spindle 70, a mount 73 that supports the spindle 70 and the motor 72 and is fixed to the lifting plate 53, and a grinding wheel 74 that is detachably attached to the lower surface of the mount 73.
[0023] The grinding wheel 74 includes a metal annular wheel 74a and a plurality of substantially rectangular parallelepiped-shaped grinding wheels 74b arranged at intervals in the circumferential direction on the lower surface of the annular wheel 74a. Each grinding wheel 74b is formed by fixing diamond abrasive grains or the like with a binder (adhesive), and a grinding surface is formed on the lower surface of each grinding wheel 74b.
[0024] <000A processing fluid supply unit 60 for supplying processing fluid to a workpiece is formed by a nozzle (not shown), a supply passage 60b, and a processing fluid supply source 60a formed on the annular wheel 74a. In addition to providing a nozzle on the grinding wheel 74, a processing fluid injection nozzle directed towards the grinding wheel 74 may also be provided, and the processing fluid may be injected from the processing fluid injection nozzle.
[0026] The processing apparatus 1 is equipped with a controller 19 for controlling each component of the processing apparatus 1. The controller 19 controls the grinding feed operation of the processing unit 7 by the grinding feed mechanism 5, the rotational operation of the grinding wheel 74 in the processing unit 7, and the positioning operation of the holding unit 30 relative to the grinding wheel 74 by the Y-axis moving means.
[0027] Water cases 4 are configured on both sides of the Y-axis movement path of the holding unit 30 to receive processing water (waste liquid) containing processing debris generated when the workpiece W is processed by the processing unit 7. A waste liquid port 6 is formed on the bottom surface 4a of one of the water cases 4. A waste liquid port 6 may also be formed on the bottom surface 4a of the other water case 4.
[0028] As shown in Figure 1, a strainer 20 is installed at the waste liquid port 6. As shown in Figures 2 and 3, the strainer 20 is configured to include a flange portion 22 that is anchored to the edge of the waste liquid port 6, a main body portion 24 having openings (opening 24a, through hole 24c) that allow liquid to pass through at a position below the flange portion 22, and a protective wall 26 that has an opening (through hole 26c) that allows liquid to pass through at a position above the flange portion 22 and prevents processing debris from entering the main body portion 24.
[0029] The strainer 20 in the embodiment shown in Figures 2 and 3 can be constructed, for example, by bending or welding a stainless steel plate, or by using a resin molded product.
[0030] The main body 24 of the strainer 20 is cylindrical and is inserted into the waste liquid passage 9 formed below the waste liquid port 6. From the upper end of the main body 24 when inserted into the waste liquid passage 9, a flange portion 22 is formed that widens in diameter as it goes upwards. From the upper end of the flange portion 22, a protective wall 26 is formed that narrows in diameter as it goes upwards.
[0031] The main body 24 has a rectangular opening 24a formed on its cylindrical side, allowing waste liquid that flows into the main body 24 to be discharged to the outside. Since no processing debris flows into the main body 24, the opening 24a functions to allow only the liquid to pass through, without allowing any processing debris contained in the waste liquid to pass through.
[0032] Furthermore, the lower end of the main body 24 is closed by a bottom surface 24b having multiple through holes 24c formed therein, and waste liquid that flows into the main body 24 is discharged to the outside of the main body 24 through the bottom surface 24b. The bottom surface 24b can be made in the form of a mesh or a perforated mesh (a plate material with multiple through holes arranged in the thickness direction) and has openings (through holes 24c) that allow only the liquid to pass through without allowing processing debris contained in the waste liquid to pass through.
[0033] The entire main body 24 may be constructed from a mesh or perforated mesh. Alternatively, either the opening 24a or the through-hole 24c may be provided.
[0034] The flange portion 22 has a diameter larger than the opening of the waste liquid port 6. When the main body portion 24 is inserted from above the waste liquid port 6, the flange portion 22 catches on the waste liquid port 6, and the strainer 20 is fitted into the waste liquid port 6. The shape of the flange portion 22 is not particularly limited, as long as it is configured to secure the strainer 20 by catching on the edge of the waste liquid port 6.
[0035] The inclined portion constituting the flange 22 can be configured, for example, in the form of a mesh or perforated mesh having multiple through holes 22c, and can be configured to have openings (through holes 22c) that allow only liquid to pass through without allowing processing debris contained in the waste liquid to pass through.
[0036] The protective wall 26 is constructed in a triangular pyramidal shape, and closes the opening at the top of the main body 24 in an umbrella shape, preventing processing debris from entering the main body 24. The inclined portion of the triangular pyramidal shape can be constructed in the form of a mesh or perforated mesh having multiple through holes 26c, and is configured to have openings (through holes 26c) that allow only liquid to pass through without allowing processing debris contained in the waste liquid to pass through.
[0037] The prevention wall 26 is shaped like a triangular pyramid, and its inclination allows processing debris to flow off easily without accumulating on the upper surface of the prevention wall 26. In addition to the triangular pyramid shape, it may also be shaped like a flat plate or a hemispherical shape.
[0038] With the above configuration of the strainer 20, the prevention wall 26 prevents processing debris from entering the main body 24, thus preventing the problem of waste liquid not flowing through the waste liquid port 6 due to the accumulation of processing debris in the main body 24. Furthermore, no energy such as air injection or electricity is required.
[0039] The strainer 40 of another embodiment shown in Figure 4 is configured to include a flange portion 42 that is anchored to the edge of the waste liquid port 6, a main body portion 44 having an opening (opening 44a, through hole 44c) that allows liquid to pass through at a position below the flange portion 42, and a prevention wall 46 that has an opening (through hole 46c) that allows liquid to pass through at a position above the flange portion 42 and prevents processing debris from entering the main body portion 44.
[0040] Similarly, the strainer 40 of the other embodiment shown in Figure 4 can also be constructed, for example, by bending or welding stainless steel sheet metal, or by using a resin molded product.
[0041] The main body 44 and the protective wall 46 of the strainer 40 are made of a continuous cylindrical member, and a flange 42 is formed at the boundary between the main body 44 and the protective wall 46 so as to extend outward from the cylinder. The main body 44 is inserted into the waste liquid passage 9 formed below the waste liquid port 6.
[0042] The main body 44 has a rectangular opening 44a formed on its cylindrical side, through which waste liquid that flows into the main body 44 is discharged to the outside. Since no processing debris flows into the main body 44, the opening 44a functions to allow only the liquid to pass through, without allowing any processing debris contained in the waste liquid to pass through.
[0043] Furthermore, the lower end of the main body 44 is closed by a bottom surface 44b having multiple through holes 44c formed therein, and waste liquid that flows into the main body 44 is discharged to the outside of the main body 44 through the bottom surface 44b. The bottom surface 44b can be made in the form of a mesh or perforated mesh and has openings (through holes 44c) that allow only the liquid to pass through without allowing processing debris contained in the waste liquid to pass through.
[0044] The entire main body 44 may be constructed from a mesh or perforated mesh. Alternatively, either the opening 44a or the through-hole 44c may be provided.
[0045] The flange portion 42 is configured in an annular shape with a diameter larger than the opening of the waste liquid port 6. When the main body portion 44 is inserted from above the waste liquid port 6, the flange portion 42 catches on the waste liquid port 6, and the strainer 40 is fitted into the waste liquid port 6. The shape of the flange portion 42 is not particularly limited as long as it is configured to secure the strainer 40 by catching on the edge of the waste liquid port 6.
[0046] The protective wall 46 can be constructed in the form of a mesh or perforated mesh having multiple through holes 46c, and has an opening (through hole 46c) that allows only liquid to pass through without allowing processing debris contained in the waste liquid to pass through.
[0047] The protective wall 46 protrudes upward from the bottom surface 4a of the water case 4, with its upper end positioned at a predetermined height, in order to prevent processing debris from entering the main body 44. In this embodiment, the predetermined height is set to a position H1 that is higher than the position of the grinding wheel 74 and the holding unit 30, which are sources of scattering of processing fluid and processing debris.
[0048] As a result, the opening 46a at the upper end of the protective wall 46 is set at a position H1 far away from the bottom surface 4a of the water case 4, preventing processing debris from entering through the opening 46a and falling into the main body 44. The opening 46a at the upper end of the protective wall 46 may also be closed with a plate or blocked with a net or perforated mesh.
[0049] With the above configuration of the strainer 40, processing debris is prevented from entering the main body 44 by the prevention wall 46, and the problem of waste liquid not flowing out of the waste liquid port 6 due to the accumulation of processing debris in the main body 44 can be prevented. [Explanation of symbols]
[0050] 1 Processing equipment 4 Water Cases 4a Bottom 6. Drain port 7 Processing Units 9. Wastewater channel 10 base 20 Strainers 22 Guard section 22c Passing hole 24 Main body 24a opening 24b Bottom 24c Passing hole 26 Prevention wall 26c Passing hole 30 holding units 30a Holding table 30b frame 39 Cover 40 Strainer 42 Guard section 44 Main body 44a opening 44b Base 44c Passing hole 46 Prevention wall 46c Passing hole 74 Grinding Wheels 74a Ring Wheel 74b Grinding Wheel W Workpiece
Claims
1. A holding unit for holding the workpiece, A processing unit that performs processing on a workpiece held by the holding unit, A processing fluid supply unit that supplies processing fluid to a workpiece held by the holding unit, A water case that receives waste liquid containing processing scraps, A drain port formed in the water case, A processing apparatus comprising a strainer disposed at the waste liquid port, The strainer has a flange that is secured to the edge of the waste liquid port, A main body having an opening for liquid to pass through at a position below the flange, A processing apparatus comprising: an opening for the passage of liquid at a position above the flange portion, and a protective wall for preventing the processing debris from entering the main body portion.
2. The protective wall closes the opening at the top of the main body in an umbrella shape. The processing apparatus according to feature 1.
3. The protective wall is cylindrical and erected from the flange portion. The processing apparatus according to feature 1.