Pattern forming apparatus

The patterning apparatus uses a capillary and a voltage-controlled stencil mask with laminated conductors to deposit particles on substrates with high precision, addressing the challenges of denaturation and clogging in conventional methods, enabling complex patterns for organic and biopolymer materials.

JP7873430B2Active Publication Date: 2026-06-12INSTITUTE OF SCIENCE TOKYO +1
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Patent Information

Authority / Receiving Office
JP · JP
Patent Type
Patents
Current Assignee / Owner
INSTITUTE OF SCIENCE TOKYO
Filing Date
2022-01-28
Publication Date
2026-06-12

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Abstract

To provide a pattern formation device which uses a material containing organic substances to form a pattern on a substrate with high accuracy.SOLUTION: A pattern formation device includes: a capillary which is disposed facing a grounded substrate and in which a solution containing a sample may be stored; a power source which applies a voltage to the capillary; a stencil mask which is disposed between the capillary and the substrate and includes an opening through which the sample passes; and an intersection direction actuator which moves the stencil mask in an intersection direction intersecting with a direction in which the sample passes.SELECTED DRAWING: Figure 6
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