Ion beam preparation method and ion beam apparatus
JP7876000B2Active Publication Date: 2026-06-18HITACHI HIGH TECH CORP
Patent Information
- Authority / Receiving Office
- JP · JP
- Patent Type
- Patents
- Current Assignee / Owner
- HITACHI HIGH TECH CORP
- Filing Date
- 2023-01-23
- Publication Date
- 2026-06-18
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Abstract
In the present invention, the straight edge of the opening of a movable aperture is made orthogonal to the optical axis of an ion beam. This ion beam adjustment method, in which a sample is irradiated through a movable aperture having an opening of which at least one side is a straight edge, includes: irradiating the sample with an ion beam having a first focus and an ion beam having a second focus different from the first focus (S207); and adjusting the position of the opening of the movable aperture on the basis of the positional relationship between a first side corresponding to the straight edge of a first irradiation trace on the sample formed by the ion beam having the first focus and a second side corresponding to the straight edge of a second irradiation trace on the sample formed by the ion beam of the second focus (S209).
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