Ion beam preparation method and ion beam apparatus

JP7876000B2Active Publication Date: 2026-06-18HITACHI HIGH TECH CORP
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Patent Information

Application Number
JP2024572538
Authority / Receiving Office
JP · JP
Patent Type
Patents
Current Assignee / Owner
Filing Date
2023-01-23
Publication Date
2026-06-18
Estimated Expiration
2043-01-23

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Abstract

In the present invention, the straight edge of the opening of a movable aperture is made orthogonal to the optical axis of an ion beam. This ion beam adjustment method, in which a sample is irradiated through a movable aperture having an opening of which at least one side is a straight edge, includes: irradiating the sample with an ion beam having a first focus and an ion beam having a second focus different from the first focus (S207); and adjusting the position of the opening of the movable aperture on the basis of the positional relationship between a first side corresponding to the straight edge of a first irradiation trace on the sample formed by the ion beam having the first focus and a second side corresponding to the straight edge of a second irradiation trace on the sample formed by the ion beam of the second focus (S209).
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Citation Information

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  • Focusing ion beam machining device and its method

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    JP2005123196A