Coating apparatus and coating method
The coating apparatus and method address the challenge of achieving uniform film thickness and uniformity in large-area coatings by employing precise control of coating liquid supply and nozzle positioning, resulting in high-performance solar cell production.
JP7876056B2Active Publication Date: 2026-06-18KK TOSHIBA +1
Patent Information
- Application Number
- JP2025504999
- Authority / Receiving Office
- JP · JP
- Patent Type
- Patents
- Current Assignee / Owner
- Filing Date
- 2023-03-08
- Publication Date
- 2026-06-18
- Estimated Expiration
- 2043-03-08
Smart Images
Figure 0007876056000001 
Figure 0007876056000002 
Figure 0007876056000003
Abstract
According to an embodiment of the present invention, a coating apparatus and a coating method that are capable of forming a uniform coating film by a meniscus method are provided. The coating apparatus comprises: a coating bar; a substrate conveying member that conveys a substrate; a plurality of nozzles that supply coating liquid onto the surface of the coating bar; a coating liquid supply member that supplies the coating liquid to the nozzles; and a coating liquid supply amount adjustment member that adjusts the amount of the coating liquid to be supplied to each of the nozzles and is provided on the upstream side of each of the nozzles.
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Citation Information
Patent Citations
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