Compounds or their tautomers, compositions, laminates, optical films, image-forming materials, and methods for producing compounds or their tautomers.

Abstract

A compound represented by formula (1) or a tautomer thereof; a composition; a layered product; an optical film; an image-forming material; and a method for producing the compound or tautomer thereof. [In formula (1), R1 to R4 are each a hydrogen atom, etc., R20 is a group represented by formula (2), etc., A is an aromatic hydrocarbon group, etc., B is a cationic aromatic hydrocarbon group, etc., and * is a bonding site, with the proviso that any compounds meeting [a] or [b] and the tautomers of these are excluded. [a]: A is a group represented by formula (P), R20 is a hydrogen atom, * is a bonding site, R1 and R3 are the same, and R2 and R4 are the same. [b]: A is a group represented by formula (P), R20 is a group represented by formula (2), * is a bonding site, B is a group represented by formula (Q), R1 and R3 are the same, and R2 and R4 are the same.]

Description

[Technical Field]

[0001] This disclosure relates to compounds or tautomers thereof, compositions, laminates, optical films, image-forming materials, and methods for producing compounds or tautomers thereof. [Background technology]

[0002] Conventionally, dihydroperimidinesquaryllium compounds having a squarylium skeleton are known (see, for example, U.S. Patent No. 5,380,635). Dihydroperimidinesquaryllium compounds are compounds that have a maximum absorption in the wavelength range of 780 nm to 830 nm and are considered useful as near-infrared absorbing materials. Furthermore, squarylium compounds having two or more squarylium skeletons and exhibiting a maximum absorption in a longer wavelength region have also been reported (see, for example, Japanese Patent Publication No. 10-204310 and International Publication No. 2007 / 091683). [Overview of the project] [Problems that the invention aims to solve]

[0003] In recent years, near-infrared absorbing materials have been required to be able to absorb longer wavelengths of light sufficiently. For example, there is a demand for the development of compounds that have maximum absorption in the near-infrared region at wavelengths longer than 850 nm. In this regard, the squarylium compound described in U.S. Patent No. 5,380,635 has a maximum absorption in the wavelength range of 780 nm to 830 nm, so it cannot be said that it absorbs light in the wavelength range longer than 850 nm sufficiently. On the other hand, the squarylium compound described in Japanese Patent Publication No. 10-204310 and International Publication No. 2007 / 091683 has a maximum absorption in the near-infrared region on the wavelength side longer than 850 nm, and it is presumed that it can absorb light in the wavelength range longer than 850 nm sufficiently. However, according to the inventor's research, the squarylium compound described in Japanese Patent Publication No. 10-204310 and International Publication No. 2007 / 091683 becomes discolored in the visible region, and the squarylium compound described in Japanese Patent Publication No. 10-204310 tends to have poor light resistance, and it has been found that when exposed to light, its absorption capacity for light in the near-infrared region decreases significantly.

[0004] One embodiment of this disclosure aims to solve the problem of providing a novel compound or its tautomer that has suppressed coloration in the visible region, has maximum absorption in the near-infrared region at wavelengths longer than 850 nm, and exhibits excellent lightfastness. Other embodiments of this disclosure aim to solve the problems described above, which are to provide compositions, laminates, optical filters, and image-forming materials comprising the above-mentioned compound or its tautomers. Further embodiments of this disclosure aim to solve the problem of providing a method for producing the above compound or its tautomers. [Means for solving the problem]

[0005] The following embodiments are specific means for solving the above problems. <1> A compound represented by the following formula (1) or a tautomer thereof.

[0006] [ka]

[0007] In formula (1), R 1 , R 2 , R3 and R 4 each independently represents a hydrogen atom, an alkyl group, or an aryl group, and R 5 , R 6 , R 7 and R 8 each independently represents a hydrogen atom, an alkyl group, or an aryl group, and R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 and R 17 each independently represents a hydrogen atom, a halogen atom, a nitro group, an alkyl group, an aryl group, a hydroxy group, an alkoxy group, an aryloxy group, an acyloxy group, a cyano group, a carboxy group, an alkoxycarbonyl group, a carbamoyl group, an acyl group, an amino group, an amide group, a carbamoylamino group, an alkoxycarbonylamino group, a sulfonamide group, a sulfo group, a sulfamoyl group, an alkylthio group, or an arylthio group, and R 20 represents a hydrogen atom, a halogen atom, a nitro group, an alkyl group, an aryl group, a hydroxy group, an alkoxy group, an aryloxy group, an acyloxy group, a cyano group, a carboxy group, an alkoxycarbonyl group, a carbamoyl group, an acyl group, an amino group, an amide group, a carbamoylamino group, an alkoxycarbonylamino group, a sulfonamide group, a sulfo group, a sulfamoyl group, an alkylthio group, an arylthio group, or a group represented by the following formula (2), and A represents an aromatic hydrocarbon group, a heterocyclic group, or a heterocyclic methine group. In formula (2), B represents a cationic aromatic hydrocarbon group, a cationic heterocyclic group, or a cationic heterocyclic methine group, and * represents the bonding position.

[0008]

Chemical formula

[0009] In formula (1), R 1 and R 2 , and R 3 and R 4These may each be bonded together to form a ring, R 1 and R 5 , R 2 and R 6 , R 3 and R 7 , and R 4 and R 8 These may each be bonded together to form a ring, R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , R 17 , and R 20 Each of these groups may bond with an adjacent group to form a ring.

[0010] However, this excludes compounds that fall under [a] and [b] below, as well as their tautomers. (a) In formula (1), A is a group represented by the following formula (P), and R 20 is a hydrogen atom, and R 1 and R 3 They are identical, and R 2 and R 4 They are identical. (b) In formula (1), A is a group represented by the following formula (P), and R 20 A is the group represented by the above formula (2), B is the group represented by the following formula (Q), and R 1 and R 3 They are identical, and R 2 and R 4 They are identical.

[0011] [ka]

[0012] In formula (P), R 1 and R 2 Each of these independently represents a hydrogen atom, an alkyl group, or an aryl group, and R 5 and R 6 Each of these independently represents a hydrogen atom, an alkyl group, or an aryl group, and R14 , R 15 , R 16 , and R 17 Each of these independently represents a hydrogen atom, a halogen atom, a nitro group, an alkyl group, an aryl group, a hydroxyl group, an alkoxy group, an aryloxy group, an acyloxy group, a cyano group, a carboxyl group, an alkoxycarbonyl group, a carbamoyl group, an acyl group, an amino group, an amide group, a carbamoylamino group, an alkoxycarbonylamino group, a sulfonamide group, a sulfo group, a sulfamoyl group, an alkylthio group, or an arylthio group. 20 * represents a hydrogen atom, halogen atom, nitro group, alkyl group, aryl group, hydroxy group, alkoxy group, aryloxy group, acyloxy group, cyano group, carboxy group, alkoxycarbonyl group, carbamoyl group, acyl group, amino group, amide group, carbamoylamino group, alkoxycarbonylamino group, sulfonamide group, sulfo group, sulfamoyl group, alkylthio group, arylthio group, or a group represented by formula (2) above, and * represents the bond position.

[0013] [ka]

[0014] In formula (Q), R 1 and R 2 Each of these independently represents a hydrogen atom, an alkyl group, or an aryl group, and R 5 and R 6 Each of these independently represents a hydrogen atom, an alkyl group, or an aryl group, and R 14 , R 15 , R 16 , and R 17 Each of these independently represents a hydrogen atom, halogen atom, nitro group, alkyl group, aryl group, hydroxy group, alkoxy group, aryloxy group, acyloxy group, cyano group, carboxy group, alkoxycarbonyl group, carbamoyl group, acyl group, amino group, amide group, carbamoylamino group, alkoxycarbonylamino group, sulfonamide group, sulfo group, sulfamoyl group, alkylthio group, or arylthio group, and * represents the bond position.

[0015] <2> The compound or its tautomer according to <1>, wherein A in the above formula (1) is a group represented by the following formula (A-1), a group represented by the formula (A-2), a group represented by the formula (A-3), a group represented by the formula (A-4), or a group represented by the formula (A-5).

[0016]

Chemical formula

[0017] In formula (A-1), formula (A-2), formula (A-3), formula (A-4), and formula (A-5), R 101 , R 102 , R 103 , R 104 , R 105 , R 106 , R 107 , R 108 , R 109 , R 110 , R 111 , R 112 , R 113 , R 114 , R 115 , R 116 , R 117 , R 118 , R 119 , R 120 , R 121 , R 122 , R 123 , and R 124 each independently represents a hydrogen atom, a halogen atom, a nitro group, an alkyl group, an aryl group, a hydroxy group, an alkoxy group, an aryloxy group, an acyloxy group, a cyano group, a carboxy group, an alkoxycarbonyl group, a carbamoyl group, an acyl group, an amino group, an amide group, a carbamoylamino group, an alkoxycarbonylamino group, a sulfonamide group, a sulfo group, a sulfamoyl group, an alkylthio group, or an arylthio group, X represents -O-, -S-, -CH=CH-, or -CR 125 R 126 -, R 125 and R 126 each independently represents an alkyl group, R 117The bond between the carbon atom to which it is attached and R 118 The bond between the carbon atom to which it is attached and * represents a single bond or a double bond, * represents the bonding position, and R 101 R 102 R 103 R 104 R 105 R 106 R 107 R 108 R 109 R 110 R 111 R 112 R 113 R 114 R 115 R 116 R 117 R 118 R 119 R 120 R 121 R 122 R 123 R 124 R 125 and R 12 6 Each may combine with an adjacent group to form a ring.

[0018] <3> The compound or its tautomer according to <1> or <2>, wherein B in the above formula (2) is a group represented by the following formula (B-1), a group represented by the formula (B-2), a group represented by the formula (B-3), a group represented by the formula (B-4), or a group represented by (B-5).

[0019]

Chemical formula

[0020] In formula (B-1), formula (B-2), formula (B-3), formula (B-4), and (B-5), R 201 R 202 R 203 R 204 R 205 R 206 R 207 R 208 R 209 R 210 R211 , R 212 , R 213 , R 214 , R 215 , R 216 , R 217 , R 218 , R 219 , R 220 , R 221 , R 222 , R 223 , and R 224 Each of these independently represents a hydrogen atom, a halogen atom, a nitro group, an alkyl group, an aryl group, a hydroxyl group, an alkoxy group, an aryloxy group, an acyloxy group, a cyano group, a carboxyl group, an alkoxycarbonyl group, a carbamoyl group, an acyl group, an amino group, an amide group, a carbamoylamino group, an alkoxycarbonylamino group, a sulfonamide group, a sulfo group, a sulfamoyl group, an alkylthio group, or an arylthio group, where X is -O-, -S-, -CH=CH-, or -CR 225 R 226 - represents R 225 and R 226 R represents an alkyl group. 217 The carbon atom and R that are bonded together 218 The bond between the carbon atom to which it is bonded represents a single or double bond, and * represents the bond position. 201 , R 202 , R 203 , R 204 , R 205 , R 206 , R 207 , R 208 , R 209 , R 210 , R 211 , R 212 , R 213 , R 214 , R 215 , R 216 , R 217 , R 218 , R 219 , R 220 , R 221 , R 222 , R 223 , R 224 , R 225 , and R 226 Each of these groups may bond with an adjacent group to form a ring.

[0021] <4> R in equation (1) above 5 , R 6 , R 7 , and R 8 However, representing a hydrogen atom <1> ~ <3> A compound or a tautomer thereof described in any one of the following. <5> R in equation (1) above 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , and R 17 However, representing a hydrogen atom <1> ~ <4> The compound described in any one of the following lists or Its tautomer. <6> R in equation (1) above 20 However, it represents a hydrogen atom or a group represented by formula (2) above. <1> ~ <5> A compound or a tautomer thereof described in any one of the following. <7> <1> ~ <6> A composition comprising any one of the compounds described in that statement or a tautomer thereof. <8> Further contains resin <7> The composition described above. <9> It is a curable composition. <7> or <8> The composition described above. <10> Near-infrared absorbing material <7> ~ <9> A composition as described in any one of the following. <11> A support, and provided on the support, <7> ~ <10> A laminate comprising a film formed by any one of the compositions described in the present invention. <12> <1> ~ <6> An optical filter containing any one of the compounds described in that statement or a tautomer thereof. <13> <1> ~ <6> An image-forming material comprising any one of the compounds described in that statement or a tautomer thereof.

[0022] <14> <1> ~ <6> A method for producing the compound or its tautomer described in any one of the following: A method for producing a compound or a tautomer thereof, comprising reacting a compound represented by the following formula (3) with a compound represented by the following formula (4).

[0023] [ka]

[0024] In formula (3), R 1 , R 2 , R 3 , and R 4 Each of these independently represents a hydrogen atom, an alkyl group, or an aryl group, and R 5 , R 6 , R 7 , and R 8 Each of these independently represents a hydrogen atom, an alkyl group, or an aryl group, and R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , and R 17 Each of these independently represents a hydrogen atom, a halogen atom, a nitro group, an alkyl group, an aryl group, a hydroxyl group, an alkoxy group, an aryloxy group, an acyloxy group, a cyano group, a carboxyl group, an alkoxycarbonyl group, a carbamoyl group, an acyl group, an amino group, an amide group, a carbamoylamino group, an alkoxycarbonylamino group, a sulfonamide group, a sulfo group, a sulfamoyl group, an alkylthio group, or an arylthio group. 20 This represents a hydrogen atom, a halogen atom, a nitro group, an alkyl group, an aryl group, a hydroxyl group, an alkoxy group, an aryloxy group, an acyloxy group, a cyano group, a carboxyl group, an alkoxycarbonyl group, a carbamoyl group, an acyl group, an amino group, an amide group, a carbamoylamino group, an alkoxycarbonylamino group, a sulfonamide group, a sulfo group, a sulfamoyl group, an alkylthio group, an arylthio group, or a group represented by formula (2) above.

[0025] [ka]

[0026] In formula (3), A represents an aromatic hydrocarbon group, a heterocyclic group, or a heterocyclic methine group.

[0027] <15> In formula (4) above, A is the group represented by formula (A-1) above, and R in formula (3) above. 20 However, the group is represented by formula (2) above, and B in formula (2) above is the group represented by formula (B-1) above, In formula (4) above, A is the group represented by formula (A-2) above, and R in formula (3) above. 20 However, the group is represented by formula (2) above, and B in formula (2) above is the group represented by formula (B-2), In formula (4) above, A is the group represented by formula (A-3) above, and R in formula (3) above. 20 However, the group is represented by formula (2) above, and B in formula (2) above is the group represented by formula (B-3) above, In formula (4) above, A is the group represented by formula (A-4), and in formula (3) above, R 20 However, the group is represented by formula (2) above, and B in formula (2) above is the group represented by formula (B-4), or In formula (4) above, A is the group represented by formula (A-5) above, and R in formula (3) above. 20 However, the group is represented by formula (2) above, and B in formula (2) above is the group represented by formula (B-5) above. <14> A method for producing the compound described above or its tautomer. [Effects of the Invention]

[0028] According to one embodiment of the present disclosure, a novel compound or its tautomer is provided that exhibits suppressed coloration in the visible region, has maximum absorption in the near-infrared region at wavelengths longer than 850 nm, and has excellent photoresistance. Other embodiments of the present disclosure provide compositions, laminates, optical filters, and image-forming materials comprising the above compound or its tautomers. Further embodiments of this disclosure provide a method for producing the above compound or its tautomers. [Modes for carrying out the invention]

[0029] The following provides a detailed description of this disclosure. While the requirements described below may be based on typical embodiments of this disclosure, this disclosure is not limited to such embodiments and may be modified as appropriate within the scope of the purposes of this disclosure.

[0030] In this disclosure, a numerical range indicated using "~" means a range that includes the numbers written before and after "~" as the lower limit and upper limit, respectively. In the numerical ranges described in stages in this disclosure, the upper or lower limit stated in one numerical range may be replaced with the upper or lower limit of another numerical range described in stages. Furthermore, in the numerical ranges described in this disclosure, the upper or lower limit stated in one numerical range may be replaced with the values ​​shown in the examples.

[0031] In this disclosure, when referring to the amount of each component in a composition, if there are multiple substances corresponding to each component in the composition, it means the total amount of all multiple components present in the composition unless otherwise specified.

[0032] In this disclosure, a combination of two or more preferred embodiments is a more preferred embodiment.

[0033] In this disclosure, the term "solids" means components excluding solvents, and "solvent" means water and organic solvents.

[0034] In this disclosure, the term "process" includes not only independent processes but also processes that cannot be clearly distinguished from other processes, as long as their intended purpose is achieved.

[0035] In this disclosure, "(meth)acrylic" is a term that encompasses both "acrylic" and "methacrylic," "(meth)acrylate" is a term that encompasses both "acrylate" and "methacrylate," and "(meth)acryloyl" is a term that encompasses both "acryloyl" and "methacryloyl."

[0036] In this disclosure, "monomer" and "monomer" are synonymous.

[0037] In this disclosure, "n-" means normal.

[0038] In this disclosure, unless otherwise specified, molecular weights where a molecular weight distribution exists refer to weight-average molecular weights (Mw; the same applies hereinafter).

[0039] The weight-average molecular weight (Mw) in this disclosure is the value measured by gel permeation chromatography (GPC). For GPC measurements, the HLC(registered trademark)-8220GPC [manufactured by Tosoh Corporation] is used as the measuring device, and three columns—TSKgel(registered trademark) Super HZ2000 [4.6mm ID × 15cm, manufactured by Tosoh Corporation], TSKgel(registered trademark) Super HZ4000 [4.6mm ID × 15cm, manufactured by Tosoh Corporation], and TSKgel(registered trademark) Super HZ-H [4.6mm ID × 15cm, manufactured by Tosoh Corporation]—are connected in series, and N-methylpyrrolidone (NMP) is used as the eluent. The measurement conditions are a sample concentration of 0.3 mass%, a flow rate of 0.35 ml / min, a sample injection volume of 10 μL, and a measurement temperature of 40°C, and a differential refractive index (RI) detector is used as the detector. The calibration curve will be prepared using six samples from Tosoh Corporation's "Standard Samples TSK standard, polystyrene": "F-80", "F-20", "F-4", "F-2", "A-5000", and "A-1000".

[0040] The term "substituent" in this disclosure is not particularly limited and can be arbitrarily selected from the following group of substituents. Substituents: halogen atom, alkyl group, alkenyl group, alkynyl group, aryl group, heterocyclic group, cyano group, hydroxy group, nitro group, carboxy group, alkoxy group, aryloxy group, heterocyclic oxy group, acyloxy group, carbamoyloxy group, alkoxycarbonyloxy group, aryloxycarbonyloxy group, amino group, acylamino group, aminocarbonylamino group, alkoxycarbonylamino group, aryloxycarbonylamino group, sulfamoylamino group, alkylsulfonylamino group, arylsulfonylamino group, mercapto group, alkylthio group, arylthio group, heterocyclic thio group, sulfamoyl group, sulfo group, alkylsulfinyl group, arylsulfinyl group, alkylsulfonyl group, arylsulfonyl group, acyl group, aryloxycarbonyl group, alkoxycarbonyl group, carbamoyl group, arylazo group, heterocyclic azo group, imide group, phosphino group, phosphinyl group, phosphinyloxy group, phosphinylamino group, silyl group.

[0041] [The compound represented by formula (1) or its tautomer] The compounds disclosed herein are compounds represented by formula (1) or tautomers thereof. The compounds disclosed herein are novel compounds that exhibit suppressed coloration in the visible region, have maximum absorption in the near-infrared region at wavelengths longer than 850 nm, and have excellent photoresistance.

[0042] The term "tautomer" refers to a compound that exists as two or more isomers that can easily interconvert from one to the other. Examples of tautomers include isomers that arise when a proton bonded to one atom in a molecule moves to another atom, and isomers that arise when the charge localized to a specific atom in a molecule moves to another atom.

[0043] [ka]

[0044] In formula (1), R1 , R 2 , R 3 , and R 4 Each of these independently represents a hydrogen atom, an alkyl group, or an aryl group, and R 5 , R 6 , R 7 , and R 8 Each of these independently represents a hydrogen atom, an alkyl group, or an aryl group, and R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , and R 17 Each of these independently represents a hydrogen atom, a halogen atom, a nitro group, an alkyl group, an aryl group, a hydroxyl group, an alkoxy group, an aryloxy group, an acyloxy group, a cyano group, a carboxyl group, an alkoxycarbonyl group, a carbamoyl group, an acyl group, an amino group, an amide group, a carbamoylamino group, an alkoxycarbonylamino group, a sulfonamide group, a sulfo group, a sulfamoyl group, an alkylthio group, or an arylthio group. 20 A represents a hydrogen atom, halogen atom, nitro group, alkyl group, aryl group, hydroxy group, alkoxy group, aryloxy group, acyloxy group, cyano group, carboxy group, alkoxycarbonyl group, carbamoyl group, acyl group, amino group, amide group, carbamoylamino group, alkoxycarbonylamino group, sulfonamide group, sulfo group, sulfamoyl group, alkylthio group, arylthio group, or a group represented by the following formula (2), where A represents an aromatic hydrocarbon group, a heterocyclic group, or a heterocyclic methine group. In formula (2), B represents a cationic aromatic hydrocarbon group, a cationic heterocyclic group, or a cationic heterocyclic methine group, and * represents the bond position.

[0045] [ka]

[0046] In formula (1), R 1 and R 2 , and R 3and R 4 These may each be bonded together to form a ring, R 1 and R 5 , R 2 and R 6 , R 3 and R 7 , and R 4 and R 8 These may each be bonded together to form a ring, R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , R 17 , and R 20 Each of these groups may bond with an adjacent group to form a ring.

[0047] However, this excludes compounds that fall under [a] and [b] below, as well as their tautomers. [a] In formula (1), A is a group represented by the following formula (P), and R 20 is a hydrogen atom, and R 1 and R 3 They are identical, and R 2 and R 4 They are identical. [b] In formula (1), A is a group represented by the following formula (P), and R 20 A is the group represented by the above formula (2), B is the group represented by the following formula (Q), and R 1 and R 3 They are identical, and R 2 and R 4 They are identical.

[0048] [ka]

[0049] In formula (P), R 1 and R 2 Each of these independently represents a hydrogen atom, an alkyl group, or an aryl group, and R 5 and R 6Each of these independently represents a hydrogen atom, an alkyl group, or an aryl group, and R 14 , R 15 , R 16 , and R 17 Each of these independently represents a hydrogen atom, a halogen atom, a nitro group, an alkyl group, an aryl group, a hydroxyl group, an alkoxy group, an aryloxy group, an acyloxy group, a cyano group, a carboxyl group, an alkoxycarbonyl group, a carbamoyl group, an acyl group, an amino group, an amide group, a carbamoylamino group, an alkoxycarbonylamino group, a sulfonamide group, a sulfo group, a sulfamoyl group, an alkylthio group, or an arylthio group. 20 * represents a hydrogen atom, halogen atom, nitro group, alkyl group, aryl group, hydroxy group, alkoxy group, aryloxy group, acyloxy group, cyano group, carboxy group, alkoxycarbonyl group, carbamoyl group, acyl group, amino group, amide group, carbamoylamino group, alkoxycarbonylamino group, sulfonamide group, sulfo group, sulfamoyl group, alkylthio group, arylthio group, or a group represented by formula (2) above, and * represents the bond position.

[0050] [ka]

[0051] In formula (Q), R 1 and R 2 Each of these independently represents a hydrogen atom, an alkyl group, or an aryl group, and R 5 and R 6 Each of these independently represents a hydrogen atom, an alkyl group, or an aryl group, and R 14 , R 15 , R 16 , and R 17Each of these independently represents a hydrogen atom, halogen atom, nitro group, alkyl group, aryl group, hydroxy group, alkoxy group, aryloxy group, acyloxy group, cyano group, carboxy group, alkoxycarbonyl group, carbamoyl group, acyl group, amino group, amide group, carbamoylamino group, alkoxycarbonylamino group, sulfonamide group, sulfo group, sulfamoyl group, alkylthio group, or arylthio group, and * represents the bond position.

[0052] The following describes the compound represented by formula (1) or its tautomers in detail.

[0053] In formula (1), R 1 , R 2 , R 3 , and R 4 Each of these independently represents a hydrogen atom, an alkyl group, or an aryl group.

[0054] R 1 , R 2 , R 3 , and R 4 The alkyl group represented by may be a linear alkyl group, a branched alkyl group, or a cyclic alkyl group. R 1 , R 2 , R 3 , and R 4 The alkyl group represented is preferably an alkyl group having 1 to 30 carbon atoms, and more preferably an alkyl group having 1 to 12 carbon atoms. R 1 , R 2 , R 3 , and R 4Preferred alkyl groups represented by are, for example, methyl group, ethyl group, n-propyl group, isopropyl group, cyclopropyl group, 2-pentyl group, n-butyl group, iso-butyl group, sec-butyl group, tert-butyl group, n-amyl group, iso-amyl group, n-hexyl group, n-octyl group, 2-ethylhexyl group, n-nonyl group, n-decyl group, undecyl group, dodecyl group, hydroxymethyl group, 2-hydroxyethyl group, 2-acetyloxyethyl group, benzyl group, 4-methylbenzyl group, cyclohexyl group, or cyclopentyl group.

[0055] R 1 , R 2 , R 3 , and R 4 The aryl group represented by may or may not have substituents. R 1 , R 2 , R 3 , and R 4 When the aryl group represented by has substituents, halogen atoms or alkyl groups are preferred as substituents, for example. R 1 , R 2 , R 3 , and R 4 The aryl group represented by is preferably an aryl group having 6 to 30 carbon atoms, and more preferably an aryl group having 6 to 10 carbon atoms. R 1 , R 2 , R 3 , and R 4 Examples of aryl groups represented by R include the phenyl group, p-tolyl group, naphthyl group, m-chlorophenyl group, and o-hexadecanoylaminophenyl group. Among these, R 1 , R 2 , R 3 , and R 4 The aryl group represented is preferably a phenyl group which may have substituents.

[0056] In formula (1), R 1 and R 2 , and R 3 and R4 These may be joined together to form a ring. R 1 and R 2 , R 3 and R 4 The ring formed by the bonding of these elements is preferably a saturated or unsaturated carbon ring, and more preferably a 5-membered to 12-membered ring. R 1 and R 2 , R 3 and R 4 The rings formed by the bonding of these molecules are preferably, for example, cyclobutane, cyclopentane, cyclohexane, cycloheptane, cyclooctane, cyclododecane, or adamantane, and these rings may have substituents. Preferred substituents are, for example, halogen atoms or alkyl groups. R 1 and R 2 , R 3 and R 4 Specific examples of cases where the ring formed by the bonding of these compounds has substituents include 4-methylcyclohexane, 3-methylcyclohexane, 2-methylcyclohexane, 3,5-dimethylcyclohexane, cyclohexane-4-one, cyclohexane-3-one, indan, and fluorene.

[0057] In formula (1), R 5 , R 6 , R 7 , and R 8 Each of these independently represents a hydrogen atom, an alkyl group, or an aryl group.

[0058] R 5 , R 6 , R 7 , and R 8 The alkyl group represented by may or may not have substituents. R 5 , R 6 , R 7 , and R 8 The alkyl group represented by may be a linear alkyl group, a branched alkyl group, or a cyclic alkyl group. R 5 , R 6 , R 7 , and R 8 The alkyl group represented is preferably an alkyl group having 1 to 30 carbon atoms, and more preferably an alkyl group having 1 to 15 carbon atoms. R 5 , R 6 , R 7 , and R 8 Examples of alkyl groups represented by include methyl group, ethyl group, n-propyl group, isopropyl group, tert-butyl group, n-octyl group, eicosyl group, 2-chloroethyl group, 2-cyanoethyl group, benzyl group, 2-ethylhexyl group, vinyl group, allyl group, prenyl group, geranyl group, oleyl group, propargyl group, cyclohexyl group, cyclopentyl group, 2-hydroxyethyl group, 2-hydroxypropyl group, 7-trimethoxysilyl-4-oxa-2-hydroxyheptyl group, 7-triethoxysilyl-4-oxa-2-hydroxyheptyl group, 2- (3-trimethoxysilylaminocarbonyloxy)ethyl group, 2-(3-triethoxysilylaminocarbonyloxy)ethyl group, or 3-trimethoxysilylpropyl group are preferred, and methyl group, ethyl group, 2-ethylhexyl group, 2-hydroxyethyl group, 7-trimethoxysilyl-4-oxa-2-hydroxyheptyl group, 7-triethoxysilyl-4-oxa-2-hydroxyheptyl group, 2-(3-trimethoxysilylaminocarbonyloxy)ethyl group, or 2-(3-triethoxysilylaminocarbonyloxy)ethyl group are more preferred.

[0059] R 5 , R 6 , R 7 , and R 8 The aryl group represented by may or may not have substituents. R 5 , R 6 , R 7 , and R 8 Preferred substituents that the aryl group represented by may have are, for example, halogen atoms or alkyl groups. R 5 , R 6 , R7 , and R 8 The aryl group represented by is preferably an aryl group having 6 to 30 carbon atoms, and more preferably an aryl group having 6 to 10 carbon atoms. R 5 , R 6 , R 7 , and R 8 Examples of aryl groups represented by R include the phenyl group, p-tolyl group, naphthyl group, m-chlorophenyl group, and o-hexadecanoylaminophenyl group. Among these, R 5 , R 6 , R 7 , and R 8 The aryl group represented is preferably a phenyl group which may have substituents.

[0060] In formula (1), R 1 and R 5 , R 2 and R 6 , R 3 and R 7 , and R 4 and R 8 These may be joined together to form a ring. R 1 and R 5 , R 2 and R 6 , R 3 and R 7 , R 4 and R 8 The ring formed by the bonding of these elements is preferably, for example, a nitrogen-containing five-membered ring or a nitrogen-containing six-membered ring. R 1 and R 5 , R 2 and R 6 , R 3 and R 7 , R 4 and R 8 The ring formed by the bonding of these elements is preferably, for example, pyrrolidine or piperidine.

[0061] In formula (1), R 5 , R 6 , R 7 , and R 8For example, from the viewpoint of light resistance, it is particularly preferable that it be a hydrogen atom.

[0062] In formula (1), R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , and R 17 Each of these independently represents a hydrogen atom, a halogen atom, a nitro group, an alkyl group, an aryl group, a hydroxyl group, an alkoxy group, an aryloxy group, an acyloxy group, a cyano group, a carboxyl group, an alkoxycarbonyl group, a carbamoyl group, an acyl group, an amino group, an amide group, a carbamoylamino group, an alkoxycarbonylamino group, a sulfonamide group, a sulfo group, a sulfamoyl group, an alkylthio group, or an arylthio group.

[0063] R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , and R 17 The halogen atoms represented are preferably, for example, fluorine atoms, chlorine atoms, bromine atoms, or iodine atoms, with fluorine atoms or chlorine atoms being more preferred.

[0064] R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , and R 17 The alkyl group represented by may or may not have substituents. R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , and R 17The alkyl group represented by may be a linear alkyl group, a branched alkyl group, or a cyclic alkyl group. R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , and R 17 The alkyl group represented is preferably an alkyl group having 1 to 30 carbon atoms, and more preferably an alkyl group having 1 to 15 carbon atoms. R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , and R 17 Examples of alkyl groups represented by include methyl group, ethyl group, n-propyl group, isopropyl group, tert-butyl group, n-octyl group, eicosyl group, benzyl group, 2-ethylhexyl group, allyl group, prenyl group, geranyl group, oleyl group, propargyl group, cyclohexyl group, cyclopentyl group, 2-hydroxyethyl group, 7-trimethoxysilyl-4-oxa-2-hydroxyheptyl group, 7-triethoxysilyl-4-oxa-2-hydroxyheptyl group, and 2-(3-trimethoxysilylaminocarbonyl A 2-(3-triethoxysilylaminocarbonyloxy)ethyl group, or a 3-trimethoxysilylpropyl group is preferred, and a methyl group, an ethyl group, a 2-ethylhexyl group, a 2-hydroxyethyl group, a 7-trimethoxysilyl-4-oxa-2-hydroxyheptyl group, a 7-triethoxysilyl-4-oxa-2-hydroxyheptyl group, a 2-(3-trimethoxysilylaminocarbonyloxy)ethyl group, or a 2-(3-triethoxysilylaminocarbonyloxy)ethyl group is more preferred.

[0065] R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16, and R 17 The aryl group represented by may or may not have substituents. R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , and R 17 Preferred substituents that the aryl group represented by may have include, for example, halogen atoms, alkyl groups, or alkoxy groups. R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , and R 17 The aryl group represented by is preferably an aryl group having 6 to 30 carbon atoms, and more preferably an aryl group having 6 to 10 carbon atoms. R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , and R 17 Specific examples of aryl groups represented by R include the phenyl group, p-tolyl group, naphthyl group, m-chlorophenyl group, and o-hexadecanoylaminophenyl group. Among these, R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , and R 17 The aryl group represented is preferably a phenyl group which may have substituents.

[0066] R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , and R 17The alkoxy group represented by may be a linear alkoxy group, a branched alkoxy group, or a cyclic alkoxy group. R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , and R 17 The alkoxy group represented by is preferably an alkoxy group having 1 to 30 carbon atoms. R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , and R 17 The alkoxy group represented is preferably, for example, a methoxy group, an ethoxy group, an n-propoxy group, or a tert-butoxy group.

[0067] R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , and R 17 The aryloxy group represented by may or may not have substituents. R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , and R 17 Preferred substituents that the aryloxy group represented by may have include, for example, halogen atoms or alkyl groups. R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , and R 17The aryloxy group represented is preferably an aryloxy group having 6 to 30 carbon atoms. R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , and R 17 The aryloxy group represented by is preferably, for example, a phenoxy group, a 4-chlorophenoxy group, or a 4-methylphenoxy group.

[0068] R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , and R 17 The acyloxy group represented is preferably an acyloxy group having 2 to 30 carbon atoms. R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , and R 17 The acyloxy group represented by is preferably, for example, an acetyloxy group, a propionyloxy group, a pivaloyloxy group, a 2-ethylhexanoyloxy group, a benzoyloxy group, or a 4-methoxyoxy group.

[0069] R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , and R 17 As an example of an alkoxycarbonyl group represented by , an alkoxycarbonyl group having 1 to 30 carbon atoms in the alkoxy moiety is preferred, and a methoxycarbonyl group, an ethoxycarbonyl group, or a 2-ethoxyethoxycarbonyl group are preferred.

[0070] R 10 , R 11, R 12 , R 13 , R 14 , R 15 , R 16 , and R 17 The carbamoyl group represented by may or may not have substituents. R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , and R 17 A preferred substituent for the carbamoyl group represented by is, for example, an alkyl group. R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , and R 17 The carbamoyl group represented by is preferably a carbamoyl group having 1 to 30 carbon atoms, and more preferably a carbamoyl group having 1 to 15 carbon atoms. R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , and R 17 Specific examples of the carbamoyl group represented by include the N,N-dimethylcarbamoyl group, the N,N-diethylcarbamoyl group, the morpholinocarbonyl group, the N,N-di-n-octylaminocarbonyl group, the Nn-octylcarbamoyl group, the N-3-trimethoxysilylpropylcarbamoyl group, and the N-3-triethoxysilylpropylcarbamoyl group. R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , and R 17Preferred carbamoyl groups represented by include, for example, N,N-dimethylcarbamoyl group, N,N-diethylcarbamoyl group, N-3-trimethoxysilylpropylcarbamoyl group, or N-3-triethoxysilylpropylcarbamoyl group.

[0071] R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , and R 17 The acyl group represented is preferably an acyl group having 2 to 30 carbon atoms, and more preferably an acyl group having 2 to 15 carbon atoms. R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , and R 17 Specific examples of acyl groups represented by R include acetyl group, pivaloyl group, 2-ethylhexanoyl group, stearoyl group, benzoyl group, and p-methoxybenzoyl group. Among these, R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , and R 17 The acyl group represented by is preferably, for example, an acetyl group, a pivaloyl group, or a 2-ethylhexanoyl group.

[0072] R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , and R 17 The amino group represented by is preferably an unsubstituted amino group, a primary amino group, or a secondary amino group, and more preferably a methylamino group, dimethylamino group, ethylamino group, diethylamino group, pyrrolidino group, piperidino group, or morpholino group.

[0073] R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , and R 17 The amide group represented by may or may not have substituents. R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , and R 17 A preferred substituent for the amide group represented by is, for example, an alkyl group. R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , and R 17 The amide group represented by is preferably a formamide group, an acetamide group, a propionylamino group, a benzamide group, or a phthalimide group.

[0074] R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , and R 17 The carbamoylamino group represented by may or may not have substituents. R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , and R 17 A preferred substituent for the carbamoylamino group represented by is, for example, an alkyl group. R 10 , R 11 , R12 , R 13 , R 14 , R 15 , R 16 , and R 17 As the carbamoylamino group represented by , for example, a dimethylcarbamoylamino group or a diethylcarbamoylamino group is preferred.

[0075] R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , and R 17 As the alkoxycarbonylamino group represented by , for example, an alkoxycarbonylamino group having 1 to 30 carbon atoms in the alkoxy moiety is preferred, and a methoxycarbonylamino group or an ethoxycarbonylamino group is a preferred example.

[0076] R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , and R 17 Preferred sulfonamide groups represented by include, for example, methanesulfonamide, ethanesulfonamide, trifluoromethanesulfonamide, benzenesulfonamide, or 4-toluenesulfonamide.

[0077] R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , and R 17 The sulfamoyl group represented by may or may not have substituents. R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , and R17 A preferred substituent for the sulfamoyl group represented by is, for example, an alkyl group. R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , and R 17 As the sulfamoyl group represented by , for example, a methylsulfamoyl group or a dimethylsulfamoyl group is preferred.

[0078] R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , and R 17 The alkylthio group represented by is preferably an alkylthio group having 1 to 30 carbon atoms in the alkyl portion, and a methylthio group or an ethylthio group is a preferred example.

[0079] R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , and R 17 As for the arylthio group represented by , for example, an arylthio group having 6 to 30 carbon atoms in the aryl moiety is preferred, and a phenylthio group or a 4-methylthio group is a preferred example.

[0080] In formula (1), R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , and R 17 For example, from the viewpoint of light resistance, it is particularly preferable that it be a hydrogen atom.

[0081] In formula (1), R 20This represents a hydrogen atom, a halogen atom, a nitro group, an alkyl group, an aryl group, a hydroxyl group, an alkoxy group, an aryloxy group, an acyloxy group, a cyano group, a carboxyl group, an alkoxycarbonyl group, a carbamoyl group, an acyl group, an amino group, an amide group, a carbamoylamino group, an alkoxycarbonylamino group, a sulfonamide group, a sulfo group, a sulfamoyl group, an alkylthio group, an arylthio group, or a group represented by formula (2) above.

[0082] In formula (1), R 20 Details of halogen atoms, alkyl groups, aryl groups, alkoxy groups, aryloxy groups, acyloxy groups, alkoxycarbonyl groups, carbamoyl groups, acyl groups, amino groups, amide groups, carbamoylamino groups, alkoxycarbonylamino groups, sulfonamide groups, sulfamoyl groups, alkylthio groups, and arylthio groups represented by R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , and R 17 This is similar to what was shown earlier.

[0083] R 20 For example, from the viewpoint of light resistance, it is preferable that this is a hydrogen atom or a group represented by formula (2) above.

[0084] In formula (2), B represents a cationic aromatic hydrocarbon group, a cationic heterocyclic group, or a cationic heterocyclic methine group.

[0085] The cationic aromatic hydrocarbon group represented by B may or may not have substituents. The cationic aromatic hydrocarbon group represented by B may have substituents such as halogen atoms, alkyl groups, aryl groups, alkoxy groups, alkoxycarbonyl groups, or amino groups. Specific examples of the cationic aromatic hydrocarbon group represented by B include benzene cations, naphthalene cations, anthracene cations, phenanthrene cations, chrysene cations, pyrene cations, and azulene cations, which may have substituents. As the cationic aromatic hydrocarbon group represented by B, the group represented by formula (B-1) or formula (B-2), described below, is particularly preferred.

[0086] The cationic heterocyclic group represented by B may or may not have substituents. Preferred substituents that the cationic heterocyclic group represented by B may have include, for example, halogen atoms, alkyl groups, aryl groups, alkoxy groups, or alkoxycarbonyl groups. The cationic heterocyclic group represented by B is preferably, for example, a pyrrole cation or an imidazole cation, which may have substituents, and the group represented by formula (B-3) described later is particularly preferred.

[0087] The cationic heterocyclic methine group represented by B may or may not have substituents. The cationic heterocyclic methine group represented by B may have substituents such as halogen atoms, alkyl groups, aryl groups, alkoxy groups, or alkoxycarbonyl groups. Specific examples of the cationic heterocyclic methine group represented by B include the cation of benzoxazole-2-ylidenemethyl, the cation of benzothiazole-2-ylidenemethyl, the cation of benzimidazole-2-ylidenemethyl, the cation of indole-2-ylidenemethyl, the cation of quinoline-2-ylidenemethyl, and the cation of quinoline-4-ylidenemethyl, which may have substituents. As the cationic heterocyclic methine group represented by B, the group represented by formula (B-4) or formula (B-5), described later, is particularly preferred.

[0088] In formula (2), B is preferably a group represented by formula (B-1), formula (B-2), formula (B-3), formula (B-4), or formula (B-5), as described above. Among these, B is particularly preferably a group represented by formula (B-2). The compounds of this disclosure in which B in formula (2) is the group represented by formula (B-2) tend to have a maximum absorption in the near-infrared region on the longer wavelength side and exhibit better photoresistance compared to cases where B in formula (2) is another group.

[0089] [ka]

[0090] In equations (B-1), (B-2), (B-3), (B-4), and (B-5), R 201 , R 202 , R 203 , R 204 , R 205 , R 206 , R 207 , R 208 , R 209 , R 210 , R 211 , R 212 , R 213 , R 214 , R 215 , R 216 , R 217 , R 218 , R 219 , R 220 , R 221 , R 222 , R 223 , and R 224Each of these independently represents a hydrogen atom, a halogen atom, a nitro group, an alkyl group, an aryl group, a hydroxyl group, an alkoxy group, an aryloxy group, an acyloxy group, a cyano group, a carboxyl group, an alkoxycarbonyl group, a carbamoyl group, an acyl group, an amino group, an amide group, a carbamoylamino group, an alkoxycarbonylamino group, a sulfonamide group, a sulfo group, a sulfamoyl group, an alkylthio group, or an arylthio group, where X is -O-, -S-, -CH=CH-, or -CR 225 R 226 - represents R 225 and R 226 R represents an alkyl group. 217 The carbon atom and R that are bonded together 218 The bond between the carbon atom to which it is bonded represents a single or double bond, and * represents the bond position. 201 , R 202 , R 203 , R 204 , R 205 , R 206 , R 207 , R 208 , R 209 , R 210 , R 211 , R 212 , R 213 , R 214 , R 215 , R 216 , R 217 , R 218 , R 219 , R 220 , R 221 , R 222 , R 223 , R 224 , R 225 , and R 226 Each of these groups may bond with an adjacent group to form a ring.

[0091] In equations (B-1), (B-2), (B-3), (B-4), and (B-5), R 201 , R 202 , R 203 , R 204 , R 205 , R 206 , R 207 , R 208 , R 209 , R210 , R 211 , R 212 , R 213 , R 214 , R 215 , R 216 , R 217 , R 218 , R 219 , R 220 , R 221 , R 222 , R 223 , and R 224 Specific examples of halogen atoms, alkyl groups, aryl groups, alkoxy groups, aryloxy groups, acyloxy groups, alkoxycarbonyl groups, carbamoyl groups, acyl groups, amino groups, amide groups, carbamoylamino groups, alkoxycarbonylamino groups, sulfonamide groups, sulfamoyl groups, alkylthio groups, and arylthio groups represented by R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , and R 17 This is similar to what was shown earlier.

[0092] In formula (B-1), R 201 , R 202 , R 203 , R 204 , R 205 , and R 206 Each of these independently represents a hydrogen atom, a halogen atom, a nitro group, an alkyl group, an aryl group, a hydroxyl group, an alkoxy group, an aryloxy group, an acyloxy group, a cyano group, a carboxyl group, an alkoxycarbonyl group, a carbamoyl group, an acyl group, an amino group, an amide group, a carbamoylamino group, an alkoxycarbonylamino group, a sulfonamide group, a sulfo group, a sulfamoyl group, an alkylthio group, or an arylthio group.

[0093] R 201 and R 202 Each of these is preferably independently a hydrogen atom, an alkyl group, or an aryl group.

[0094] R 201 and R202 The alkyl group represented by may or may not have substituents. R 201 and R 202 The alkyl group represented by may be a linear alkyl group, a branched alkyl group, or a cyclic alkyl group. R 201 and R 202 The alkyl group represented is preferably an alkyl group having 1 to 30 carbon atoms. R 201 and R 202 Preferred alkyl groups represented by are, for example, methyl, ethyl, n-propyl, isopropyl, n-octyl, eicosyl, benzyl, 2-ethylhexyl, allyl, prenyl, geranyl, oleyl, propargyl, cyclohexyl, cyclopentyl, or 2-hydroxyethyl groups. R 201 and R 202 These may bond to form a pyrrolidine ring or a piperidine ring.

[0095] R 201 and R 202 The aryl group represented by may or may not have substituents. R 201 and R 202 Preferred substituents that the aryl group represented by may have include, for example, a halogen atom, an alkyl group, or another aryl group. R 201 and R 202 The aryl group represented by is preferably an aryl group having 6 to 30 carbon atoms. R 201 and R 202 The aryl group represented by is preferably, for example, a phenyl group, a p-tolyl group, a naphthyl group, or an m-chlorophenyl group.

[0096] R 203 , R 204 , R 205 , and R 206Preferably, each of these is independently a hydrogen atom, an alkyl group (e.g., a methyl group), an aryl group (e.g., a phenyl group), an amide group (e.g., an acetamide group and a pivaloylamino group), a hydroxyl group, or an alkoxy group (e.g., a methoxy group).

[0097] In formula (B-2), R 207 , R 208 , R 209 , R 210 , R 211 , R 212 , and R 213 Each of these independently represents a hydrogen atom, a halogen atom, a nitro group, an alkyl group, an aryl group, a hydroxyl group, an alkoxy group, an aryloxy group, an acyloxy group, a cyano group, a carboxyl group, an alkoxycarbonyl group, a carbamoyl group, an acyl group, an amino group, an amide group, a carbamoylamino group, an alkoxycarbonylamino group, a sulfonamide group, a sulfo group, a sulfamoyl group, an alkylthio group, or an arylthio group, and is preferably a hydrogen atom or an alkyl group (for example, a methyl group, an ethyl group, and an iso-propyl group).

[0098] In formula (B-3), R 214 , R 215 , and R 216 Each of these independently represents a hydrogen atom, a halogen atom, a nitro group, an alkyl group, an aryl group, a hydroxyl group, an alkoxy group, an aryloxy group, an acyloxy group, a cyano group, a carboxyl group, an alkoxycarbonyl group, a carbamoyl group, an acyl group, an amino group, an amide group, a carbamoylamino group, an alkoxycarbonylamino group, a sulfonamide group, a sulfo group, a sulfamoyl group, an alkylthio group, or an arylthio group, and is preferably a hydrogen atom or an alkyl group (for example, a methyl group and an ethyl group).

[0099] In formula (B-4), R 217 , R 218 , and R 219Each independently represents a hydrogen atom, a halogen atom, a nitro group, an alkyl group, an aryl group, a hydroxy group, an alkoxy group, an aryloxy group, an acyloxy group, a cyano group, a carboxy group, an alkoxycarbonyl group, a carbamoyl group, an acyl group, an amino group, an amide group, a carbamoylamino group, an alkoxycarbonylamino group, a sulfonamide group, a sulfo group, a sulfamoyl group, an alkylthio group, or an arylthio group.

[0100] R 217 and R 218 are each independently preferably a hydrogen atom or an alkyl group (e.g., a methyl group). It is also preferable that they are linked to form a ring (e.g., a benzene ring and a naphthalene ring). R 219 is preferably an alkyl group. R 219 The alkyl group represented by may have a substituent or may not have a substituent. R 219 The alkyl group represented by may be a linear alkyl group, a branched alkyl group, or an alkyl group having a cyclic structure. R 219 The alkyl group represented by is preferably an alkyl group having 1 to 30 carbon atoms. R 219 Examples of the alkyl group represented by include a methyl group, an ethyl group, an n-propyl group, an n-butyl group, an iso-butyl group, an n-amyl group, an iso-amyl group, an n-octyl group, an eicosyl group, a benzyl group, a 2-ethylhexyl group, an allyl group, a prenyl group, a geranyl group, an oleyl group, a propargyl group, a cyclohexyl group, a cyclopentyl group, or a 2-hydroxyethyl group.

[0101] In formula (B-4), X represents -O-, -S-, -CH=CH-, or -CR 125 R 126 -, and R 125 and R 126 each independently represent an alkyl group. R 225 and R 226may combine to form a ring. X is preferably -O-, -S-, or -CH=CH-. -CR represented by X 125 R 126 - is preferably, for example, dimethylmethylene, cyclohexylidene, or dibenzylmethylene.

[0102] In formula (B-5), R 220 , R 221 , R 222 , R 223 , and R 224 each independently represent a hydrogen atom, a halogen atom, a nitro group, an alkyl group, an aryl group, a hydroxy group, an alkoxy group, an aryloxy group, an acyloxy group, a cyano group, a carboxy group, an alkoxycarbonyl group, a carbamoyl group, an acyl group, an amino group, an amide group, a carbamoylamino group, an alkoxycarbonylamino group, a sulfonamide group, a sulfo group, a sulfamoyl group, an alkylthio group, or an arylthio group.

[0103] R 220 , R 221 , R 222 , and R 223 are each independently preferably a hydrogen atom, an alkyl group (e.g., a methyl group), an aryl group (e.g., a phenyl group), a hydroxy group, or an alkoxy group (e.g., a methoxy group). R 224 is preferably an alkyl group. R 224 The alkyl group represented by may be a straight-chain alkyl group, a branched alkyl group, or an alkyl group having a cyclic structure. R 224 The alkyl group represented by is preferably an alkyl group having 1 to 30 carbon atoms. R 224Preferred alkyl groups represented by are, for example, methyl group, ethyl group, n-propyl group, n-butyl group, iso-butyl group, n-amyl group, iso-amyl group, n-octyl group, eicosyl group, benzyl group, 2-ethylhexyl group, allyl group, prenyl group, geranyl group, oleyl group, propargyl group, cyclohexyl group, cyclopentyl group, or 2-hydroxyethyl group.

[0104] In formula (1), R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , R 17 , and R 20 Each of these groups may bond with an adjacent group to form a ring. The formed ring may be saturated or unsaturated. The rings formed are preferably, for example, a benzene ring and a naphthalene ring.

[0105] In formula (1), A represents an aromatic hydrocarbon group, a heterocyclic group, or a heterocyclic methine group.

[0106] The aromatic hydrocarbon group represented by A may or may not have substituents. Preferred substituents that the aromatic hydrocarbon group represented by A may have include, for example, a halogen atom, an alkyl group, an aryl group, an alkoxy group, an alkoxycarbonyl group, or an amino group. Specific examples of the aromatic hydrocarbon group represented by A include benzene, naphthalene, anthracene, phenanthrene, chrysene, pyrene, and azulene, which may have substituents. As the aromatic hydrocarbon group represented by A, the group represented by formula (A-1) or formula (A-2), described below, is particularly preferred.

[0107] The heterocyclic group represented by A may or may not have substituents. Preferred substituents that the heterocyclic group represented by A may have include, for example, halogen atoms, alkyl groups, aryl groups, alkoxy groups, or alkoxycarbonyl groups. The heterocyclic group represented by A is preferably pyrrole or imidazole, which may have substituents, and the group represented by formula (A-3) described later is particularly preferred.

[0108] The heterocyclic methine group represented by A may or may not have substituents. Preferred substituents that the heterocyclic methine group represented by A may have include, for example, halogen atoms, alkyl groups, aryl groups, alkoxy groups, or alkoxycarbonyl groups. Specific examples of the heterocyclic methine group represented by A include benzoxazole-2-ylidenemethyl, benzothiazole-2-ylidenemethyl, benzimidazole-2-ylidenemethyl, indole-2-ylidenemethyl, quinoline-2-ylidenemethyl, and quinoline-4-ylidenemethyl, which may have substituents. As the heterocyclic methine group represented by A, the group represented by formula (A-4) or formula (A-5), described later, is particularly preferred.

[0109] In formula (1), A is preferably a group represented by formula (A-1), formula (A-2), formula (A-3), formula (A-4), or formula (A-5), as described above. Among these, A is particularly preferably a group represented by formula (A-2). Compounds of the present disclosure in which A in formula (1) is the group represented by formula (A-2) tend to have a maximum absorption in the near-infrared region at longer wavelengths and exhibit better photoresistance compared to cases where A in formula (1) is another group.

[0110] [ka]

[0111] In formula (A-1), formula (A-2), formula (A-3), formula (A-4), and formula (A-5), R 101 , R 102 , R 103 , R 104 , R 105 , R 106 , R 107 , R 108 , R 109 , R 110 , R 111 , R 112 , R 113 , R 114 , R 115 , R 116 , R 117 , R 118 , R 119 , R 120 , R 121 , R 122 , R 123 , and R 124 each independently represents a hydrogen atom, a halogen atom, a nitro group, an alkyl group, an aryl group, a hydroxy group, an alkoxy group, an aryloxy group, an acyloxy group, a cyano group, a carboxy group, an alkoxycarbonyl group, a carbamoyl group, an acyl group, an amino group, an amide group, a carbamoylamino group, an alkoxycarbonylamino group, a sulfonamide group, a sulfo group, a sulfamoyl group, an alkylthio group, or an arylthio group, X represents -O-, -S-, -CH=CH-, or -CR 125 R 126 -, R 125 and R 126 each independently represents an alkyl group, the bond between the carbon atom to which R 117 is bonded and the carbon atom to which R 118 is bonded represents a single bond or a double bond, * represents the bonding position, R 101 , R 102 , R 103 , R 104 , R 105 , R 106 , R[[ID=CO]] 107 CO , R 108 , R 109 , R 110 , R 111 , R 112 , R 113 , R 114 , R 115 , R116 , R 117 , R 118 , R 119 , R 120 , R 121 , R 122 , R 123 , R 124 , R 125 , and R 126 Each of these groups may bond with an adjacent group to form a ring.

[0112] In equations (A-1), (A-2), (A-3), (A-4), and (A-5), R 101 , R 102 , R 103 , R 104 , R 105 , R 106 , R 107 , R 108 , R 109 , R 110 , R 111 , R 112 , R 113 , R 114 , R 115 , R 116 , R 117 , R 118 , R 119 , R 120 , R 121 , R 122 , R 123 , and R 124 Specific examples of halogen atoms, alkyl groups, aryl groups, alkoxy groups, aryloxy groups, acyloxy groups, alkoxycarbonyl groups, carbamoyl groups, acyl groups, amino groups, amide groups, carbamoylamino groups, alkoxycarbonylamino groups, sulfonamide groups, sulfamoyl groups, alkylthio groups, and arylthio groups represented by R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , and R 17 This is similar to what was shown earlier.

[0113] In formula (A-1), R 101 , R 102 , R103 , R 104 , R 105 , and R 106 Each of these independently represents a hydrogen atom, a halogen atom, a nitro group, an alkyl group, an aryl group, a hydroxyl group, an alkoxy group, an aryloxy group, an acyloxy group, a cyano group, a carboxyl group, an alkoxycarbonyl group, a carbamoyl group, an acyl group, an amino group, an amide group, a carbamoylamino group, an alkoxycarbonylamino group, a sulfonamide group, a sulfo group, a sulfamoyl group, an alkylthio group, or an arylthio group.

[0114] R 101 and R 102 Each of these is preferably independently a hydrogen atom, an alkyl group, or an aryl group.

[0115] R 101 and R 102 The alkyl group represented by may or may not have substituents. R 101 and R 102 The alkyl group represented by may be a linear alkyl group, a branched alkyl group, or a cyclic alkyl group. R 101 and R 102 The alkyl group represented is preferably an alkyl group having 1 to 30 carbon atoms. R 101 and R 102 Preferred alkyl groups represented by are, for example, methyl, ethyl, n-propyl, isopropyl, n-octyl, eicosyl, benzyl, 2-ethylhexyl, allyl, prenyl, geranyl, oleyl, propargyl, cyclohexyl, cyclopentyl, or 2-hydroxyethyl groups. R 101 and R 102 These may bond to form a pyrrolidine ring or a piperidine ring.

[0116] R 101 and R 102The aryl group represented by may or may not have substituents. R 101 and R 102 Preferred substituents that the aryl group represented by may have include, for example, a halogen atom, an alkyl group, or another aryl group. R 101 and R 102 The aryl group represented by is preferably an aryl group having 6 to 30 carbon atoms. R 101 and R 102 The aryl group represented by is preferably, for example, a phenyl group, a p-tolyl group, a naphthyl group, or an m-chlorophenyl group.

[0117] R 103 , R 104 , R 105 , and R 106 Preferably, each of these is independently a hydrogen atom, an alkyl group (e.g., a methyl group), an aryl group (e.g., a phenyl group), an amide group (e.g., an acetamide group and a pivaloylamino group), a hydroxyl group, or an alkoxy group (e.g., a methoxy group).

[0118] In formula (A-2), R 107 , R 108 , R 109 , R 110 , R 111 , R 112 , and R 113 Each of these independently represents a hydrogen atom, a halogen atom, a nitro group, an alkyl group, an aryl group, a hydroxyl group, an alkoxy group, an aryloxy group, an acyloxy group, a cyano group, a carboxyl group, an alkoxycarbonyl group, a carbamoyl group, an acyl group, an amino group, an amide group, a carbamoylamino group, an alkoxycarbonylamino group, a sulfonamide group, a sulfo group, a sulfamoyl group, an alkylthio group, or an arylthio group, and is preferably a hydrogen atom or an alkyl group (for example, a methyl group, an ethyl group, and an iso-propyl group).

[0119] In formula (A-3), R 114 , R 115 , and R116 Each of these independently represents a hydrogen atom, a halogen atom, a nitro group, an alkyl group, an aryl group, a hydroxyl group, an alkoxy group, an aryloxy group, an acyloxy group, a cyano group, a carboxyl group, an alkoxycarbonyl group, a carbamoyl group, an acyl group, an amino group, an amide group, a carbamoylamino group, an alkoxycarbonylamino group, a sulfonamide group, a sulfo group, a sulfamoyl group, an alkylthio group, or an arylthio group, and is preferably a hydrogen atom or an alkyl group (for example, a methyl group and an ethyl group).

[0120] In formula (A-4), R 117 , R 118 , and R 119 Each of these independently represents a hydrogen atom, a halogen atom, a nitro group, an alkyl group, an aryl group, a hydroxyl group, an alkoxy group, an aryloxy group, an acyloxy group, a cyano group, a carboxyl group, an alkoxycarbonyl group, a carbamoyl group, an acyl group, an amino group, an amide group, a carbamoylamino group, an alkoxycarbonylamino group, a sulfonamide group, a sulfo group, a sulfamoyl group, an alkylthio group, or an arylthio group.

[0121] R 117 and R 118 Each of these is preferably independently a hydrogen atom or an alkyl group (e.g., a methyl group). It is also preferable that they are linked together to form a ring (e.g., a benzene ring and a naphthalene ring). R 119 It is preferable that it be an alkyl group. R 119 The alkyl group represented by may or may not have substituents. R 119 The alkyl group represented by may be a linear alkyl group, a branched alkyl group, or a cyclic alkyl group. R 119 The alkyl group represented is preferably an alkyl group having 1 to 30 carbon atoms. R 119Preferred alkyl groups represented by are, for example, methyl group, ethyl group, n-propyl group, n-butyl group, iso-butyl group, n-amyl group, iso-amyl group, n-octyl group, eicosyl group, benzyl group, 2-ethylhexyl group, allyl group, prenyl group, geranyl group, oleyl group, propargyl group, cyclohexyl group, cyclopentyl group, or 2-hydroxyethyl group.

[0122] In equation (A-4), X is -O-, -S-, -CH=CH-, or -CR 125 R 126 - represents R 125 and R 126 Each of these independently represents an alkyl group. R 125 and R 126 They may combine to form a ring. X is preferably -O-, -S-, or -CH=CH-. X represents -CR 125 R 126 For example, dimethylmethylene, cyclohexylidene, or dibenzylmethylene are preferred.

[0123] In formula (A-5), R 120 , R 121 , R 122 , R 123 , and R 124 Each of these independently represents a hydrogen atom, a halogen atom, a nitro group, an alkyl group, an aryl group, a hydroxyl group, an alkoxy group, an aryloxy group, an acyloxy group, a cyano group, a carboxyl group, an alkoxycarbonyl group, a carbamoyl group, an acyl group, an amino group, an amide group, a carbamoylamino group, an alkoxycarbonylamino group, a sulfonamide group, a sulfo group, a sulfamoyl group, an alkylthio group, or an arylthio group.

[0124] R 120 , R 121 , R 122 , and R 123Each of these is preferably independently a hydrogen atom, an alkyl group (e.g., a methyl group), an aryl group (e.g., a phenyl group), a hydroxyl group, or an alkoxy group (e.g., a methoxy group). R 124 It is preferable that it be an alkyl group. R 124 The alkyl group represented by may be a linear alkyl group, a branched alkyl group, or a cyclic alkyl group. R 124 The alkyl group represented is preferably an alkyl group having 1 to 30 carbon atoms. R 124 Preferred alkyl groups represented by are, for example, methyl group, ethyl group, n-propyl group, n-butyl group, iso-butyl group, n-amyl group, iso-amyl group, n-octyl group, eicosyl group, benzyl group, 2-ethylhexyl group, allyl group, prenyl group, geranyl group, oleyl group, propargyl group, cyclohexyl group, cyclopentyl group, or 2-hydroxyethyl group.

[0125] The following are specific examples of compounds represented by formula (1), but this disclosure is not limited to these examples. Note that "Me" represents a methyl group, "Et" represents an ethyl group, and "Ph" represents a phenyl group (the same applies hereafter).

[0126] [ka]

[0127] [ka]

[0128] [ka]

[0129] [ka]

[0130] [ka]

[0131] [ka]

[0132] The compound represented by formula (1) and its tautomers have maximum absorption in the near-infrared region at wavelengths longer than 850 nm. The maximum absorption wavelength of the compound represented by formula (1) and its tautomers is preferably in the wavelength range of 850 nm to 1200 nm, and more preferably in the wavelength range of 900 nm to 1200 nm.

[0133] The molar extinction coefficient at the maximum absorption wavelength of the compound represented by formula (1) and its tautomers is preferably 100,000 L / (mol·cm) or more, more preferably 120,000 L / (mol·cm) or more, and even more preferably 150,000 L / (mol·cm) or more.

[0134] The maximum absorption wavelength and molar extinction coefficient mentioned above are measured using a spectrophotometer. For specific measurement methods, refer to the measurement methods described in the examples below.

[0135] The molecular weight of the compound represented by formula (1) and its tautomers is not particularly limited, but is preferably 500 to 3000, and more preferably 700 to 2000.

[0136] [Method for producing the compound represented by formula (1) or its tautomers] The method for producing the compound represented by formula (1) or its tautomer (i.e., the compound of this disclosure) (hereinafter also referred to as the "production method of this disclosure") is not particularly limited. The compounds of this disclosure can be produced by known methods or by reference to known methods, but they can be produced more preferably by the production methods of this disclosure described below. That is, the compounds of this disclosure can be produced by a simpler method compared to conventional methods for producing compounds having two or more squarylium skeletons, as shown below.

[0137] The manufacturing method of the present disclosure includes reacting a compound represented by the following formula (3) with a compound represented by the following formula (4). [ka]

[0138] In formula (3), R 1 , R 2 , R 3 , and R 4 Each of these independently represents a hydrogen atom, an alkyl group, or an aryl group. R in equation (3) 1 , R 2 , R 3 , and R 4 These are R in equation (1), respectively. 1 , R 2 , R 3 , and R 4 Since this is synonymous with the same thing, and the preferred form is also the same, we will omit the explanation here.

[0139] In formula (3), R 5 , R 6 , R 7 , and R 8 Each of these independently represents a hydrogen atom, an alkyl group, or an aryl group. R in equation (3) 5 , R 6 , R 7 , and R 8 R in equation (1) 5 , R 6 , R 7, and R 8 Since this is synonymous with the same thing, and the preferred form is also the same, we will omit the explanation here.

[0140] In formula (3), R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , and R 17 Each of these independently represents a hydrogen atom, a halogen atom, a nitro group, an alkyl group, an aryl group, a hydroxyl group, an alkoxy group, an aryloxy group, an acyloxy group, a cyano group, a carboxyl group, an alkoxycarbonyl group, a carbamoyl group, an acyl group, an amino group, an amide group, a carbamoylamino group, an alkoxycarbonylamino group, a sulfonamide group, a sulfo group, a sulfamoyl group, an alkylthio group, or an arylthio group. R in equation (3) 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , and R 17 R in equation (1) 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , and R 17 Since this is synonymous with the same thing, and the preferred form is also the same, we will omit the explanation here.

[0141] In formula (3), R 20 This represents a hydrogen atom, a halogen atom, a nitro group, an alkyl group, an aryl group, a hydroxyl group, an alkoxy group, an aryloxy group, an acyloxy group, a cyano group, a carboxyl group, an alkoxycarbonyl group, a carbamoyl group, an acyl group, an amino group, an amide group, a carbamoylamino group, an alkoxycarbonylamino group, a sulfonamide group, a sulfo group, a sulfamoyl group, an alkylthio group, an arylthio group, or a group represented by formula (2). R in equation (3) 20R in equation (1) 20 Since this is synonymous with the same thing, and the preferred form is also the same, we will omit the explanation here.

[0142] [ka]

[0143] In formula (4), A represents an aromatic hydrocarbon group, a heterocyclic group, or a heterocyclic methine group. In equation (4), A is the same as A in equation (1), and the preferred embodiment is also the same; therefore, an explanation is omitted here.

[0144] In the manufacturing method of the present disclosure, which involves reacting a compound represented by formula (3) with a compound represented by formula (4), the following embodiments 1, 2, 3, 4, or 5 are preferred, with embodiment 2 being more preferred. Appearance 1: In formula (4), A is the group represented by formula (A-1), and R in formula (3) 20 The embodiment wherein the group is represented by formula (2), and B in formula (2) is the group represented by formula (B-1). Appearance 2: In formula (4), A is the group represented by formula (A-2), and R in formula (3) 20 The embodiment wherein the group is represented by formula (2), and B in formula (2) is the group represented by formula (B-2). Appearance 3: In formula (4), A is the group represented by formula (A-3), and R in formula (3) 20 The embodiment wherein the group is represented by formula (2), and B in formula (2) is the group represented by formula (B-3). Appearance 4: In formula (4), A is the group represented by formula (A-4), and R in formula (3) is the same. 20 The embodiment wherein the group is represented by formula (2), and B in formula (2) is the group represented by formula (B-4). Appearance 5: In formula (4), A is the base represented by formula (A-5), and R in formula (3) 20 The embodiment wherein the group is represented by formula (2), and B in formula (2) is the group represented by formula (B-5).

[0145] The reaction between the compound represented by formula (3) and the compound represented by formula (4) can be carried out in an organic solvent. The organic solvent is not particularly limited, but is preferably an aromatic hydrocarbon such as benzene, toluene, chlorobenzene, or xylene, an alcohol such as n-butanol, iso-butanol, or n-pentanol, or a mixture thereof, and is particularly preferably a mixture of toluene and n-butanol. The reaction is preferably carried out under reflux of an organic solvent while azeotropically dehydrating the water produced.

[0146] The reaction ratio between the compound represented by formula (3) and the compound represented by formula (4) can be appropriately set depending on the structure of the desired compound represented by formula (1).

[0147] The reaction temperature is not particularly limited, but is preferably between 15°C and the boiling point of the reaction solvent. The reaction time is not particularly limited, but it can be, for example, 1 to 48 hours.

[0148] The manufacturing method disclosed herein allows for the production of a compound represented by formula (1) with a desired structure by controlling conditions such as the reaction ratio and reaction time between the compound represented by formula (3) and the compound represented by formula (4), and exhibits excellent manufacturability.

[0149] <Application> The applications of the compounds disclosed herein are not particularly limited. Applications of the compounds disclosed herein include, for example, optical films (e.g., infrared-cutting films and heat-shielding films for displays or solid-state image sensors (e.g., CCDs and CMOS)), photothermal conversion materials (e.g., write-once optical discs, laser welding materials, and flash melt fixing materials), image forming materials (e.g., security inks and invisible barcode inks), medical materials (e.g., diagnostic markers and photodynamic therapy agents), lenses with the function of absorbing or cutting near-infrared rays (e.g., camera lenses for digital cameras, mobile phones, and in-car cameras, and optical lenses such as F-theta lenses and pickup lenses), agricultural coatings for selective use of sunlight, protective eyewear, and sunglasses. The compounds disclosed herein can also be used to prevent the copying of confidential documents. In addition, the compounds disclosed herein can be used in heat-retaining fibers, eye strain prevention agents, and positioning marking agents for photographs or films. Furthermore, they can also be used to impart camouflage properties (so-called camouflage performance) to fibers and the like against infrared reconnaissance.

[0150] [Composition] The compositions of this disclosure include a compound represented by formula (1) described above or a tautomer thereof (i.e., the compounds of this disclosure). Because the composition of this disclosure contains the compound of this disclosure, discoloration in the visible region is suppressed, it has a maximum absorption in the near-infrared region at wavelengths longer than 850 nm, and it has excellent light resistance. For example, when the composition of this disclosure is used to form a film, a film can be obtained in which discoloration in the visible region is suppressed, it has a maximum absorption in the near-infrared region at wavelengths longer than 850 nm, and it has excellent light resistance. The composition of this disclosure is suitable as a near-infrared absorbing material.

[0151] The compositions of this disclosure can be suitably used, for example, as optical films, photothermal conversion materials, image-forming materials, medical materials, lenses having the function of absorbing or cutting near-infrared rays, agricultural coatings intended for the selective use of sunlight, protective eyewear, sunglasses, etc., or as materials for forming these.

[0152] The compositions of this disclosure are preferably colorless and transparent, but may be colored to such an extent that the hue is not clearly discernible.

[0153] (The compound represented by formula (1) or its tautomer) Details of the compound represented by formula (1) or its tautomers (i.e., the compounds of this disclosure) included in the compositions of this disclosure are as previously described and therefore will not be explained further.

[0154] The compositions of this disclosure may contain only one compound of this disclosure, or may contain two or more compounds.

[0155] The content of the compounds in the compositions of this disclosure is not particularly limited and can be set as appropriate depending on the purpose. The content of the compound of the Disclosure in the composition of the Disclosure is preferably, for example, 0.1% to 90% by mass with respect to the total solid content of the composition. The lower limit is more preferably 0.5% by mass or more, and even more preferably 1% by mass or more. The upper limit is more preferably 85% by mass or less, and even more preferably 50% by mass or less.

[0156] (Other near-infrared absorbers) The compositions of this disclosure may further contain compounds having near-infrared absorbing ability other than the compounds of this disclosure (hereinafter also referred to as "other near-infrared absorbers"). The composition of this disclosure, when containing other near-infrared absorbers in addition to the compound of this disclosure, can ensure shielding of near-infrared rays in wavelength regions that cannot be sufficiently shielded by the compound of this disclosure alone. Other near-infrared absorbers include, for example, pyrrolopyrrole compounds, cyanine compounds, merocyanine compounds, oxonol compounds, squarylium compounds, crokonium compounds, phthalocyanine compounds, naphthalocyanine compounds, quatalylene compounds, pentalylene compounds, hexalylene compounds, diinmonium compounds, dithiol metal complex compounds, triarylmethane compounds, pyromethene compounds, azomethine compounds, anthraquinone compounds, and benzodifuranone compounds.

[0157] Examples of pyrrolopyrrole compounds include those described in Japanese Patent Publication No. 2009-263614, Japanese Patent Publication No. 2011-068731, and International Publication No. 2015 / 166873. Examples of cyanine compounds include those described in Japanese Patent Publication No. 2009-108267, Japanese Patent Publication No. 2002-194040, Japanese Patent Publication No. 2015-172004, Japanese Patent Publication No. 2015-172102, Japanese Patent Publication No. 2008-088426, and International Publication No. 2016 / 190162. Examples of squarylium compounds include those described in Japanese Patent Publication No. 2011-208101, Japanese Patent No. 6065169, International Publication No. 2016 / 181987, Japanese Patent Publication No. 2015-176046, International Publication No. 2016 / 190162, Japanese Patent Publication No. 2016-074649, Japanese Patent Publication No. 2017-067963, International Publication No. 2017 / 135359, Japanese Patent Publication No. 2017-114956, Japanese Patent No. 6197940, and International Publication No. 2016 / 120166. Examples of croconium compounds include those described in Japanese Patent Publication No. 2017-082029. Examples of phthalocyanine compounds include those described in Japanese Patent Publication No. 2012-077153, Japanese Patent Publication No. 2006-343631, and Japanese Patent Publication No. 2013-195480. Examples of naphthalocyanine compounds include those described in Japanese Patent Publication No. 2012-077153.

[0158] If the composition of this disclosure contains other near-infrared absorbers, it may contain only one other near-infrared absorber or two or more other near-infrared absorbers.

[0159] If the composition of this disclosure contains other near-infrared absorbers, the content of the other near-infrared absorbers is not particularly limited, but is preferably 0.1% to 90% by mass, based on the total solid content mass of the composition.

[0160] The total content of the compound of the disclosure and other near-infrared absorbers in the composition of the disclosure is not particularly limited, but is preferably 0.1% to 90% by mass, based on the total solid content of the composition.

[0161] (UV absorber) The compositions of this disclosure preferably include an ultraviolet absorber. The ultraviolet absorbers are not particularly limited and include, for example, aminobutadiene compounds, dibenzoylmethane compounds, salicylate compounds, benzophenone compounds, benzotriazole compounds, indole compounds, and triazine compounds. Details of these compounds can be found in Japanese Patent Publication No. 2012-208374, Japanese Patent Publication No. 2013-068814, and Japanese Patent Publication No. 2016-162946, the contents of which are incorporated herein by reference.

[0162] Examples of UV absorbers include those described in Japanese Patent Publication No. 2003-128730, 2003-129033, 2014-077076, 2015-164994, 2015-168822, 2018-135282, 2018-168089, 2018-168278, 2018-188589, 2019-001767, 2020-023697, 2020-041013, and Patent No. 5518613. Compounds described in Japanese Patent Publication No. 5868465, Japanese Patent Publication No. 6301526, Japanese Patent Publication No. 6354665, Japanese Patent Publication No. 2017-503905, International Publication No. 2015 / 064674, International Publication No. 2015 / 064675, International Publication No. 2017 / 102675, International Publication No. 2017 / 122503, International Publication No. 2018 / 190281, International Publication No. 2018 / 216750, International Publication No. 2019 / 087983, European Patent No. 2379512, and European Patent No. 2951163 can be used.

[0163] Furthermore, commercially available UV absorbers include the benzotriazole compounds Tinuvin® P, Tinuvin® 234, Tinuvin® 326, Tinuvin® 571, and Tinuvin® 970 (all manufactured by BASF), and the triazine compounds Tinuvin® 1577 and Tinuvin® 1600 (both manufactured by BASF). Furthermore, a commercially available UV absorber with polymerizable groups is RUVA-93 [product name, ingredients: 2-[2-hydroxy-5-(2-methacryloyloxyethyl)phenyl]2H-benzo[d][1,2,3]triazole, manufactured by Otsuka Chemical Co., Ltd.].

[0164] If the compositions of this disclosure contain ultraviolet absorbers, they may contain only one type of ultraviolet absorber or two or more types.

[0165] If the composition of this disclosure contains an ultraviolet absorber, the content of the ultraviolet absorber is not particularly limited, but is preferably 0.01% to 10% by mass, and more preferably 0.01% to 5% by mass, based on the total solid content of the composition.

[0166] (solvent) The compositions of this disclosure may contain solvents. The solvent is not particularly limited and can be appropriately selected, for example, taking into consideration the applicability of the composition disclosed and the solubility of each component contained in the composition disclosed.

[0167] Examples of solvents include water and organic solvents. The solvent is preferably an organic solvent. The compounds contained in the compositions of the present disclosure tend to have excellent solubility in organic solvents. The organic solvent is not particularly limited and includes, for example, ester compounds, ether compounds, ketone compounds, and aromatic hydrocarbon compounds. Details of these compounds can be found in International Publication No. 2015 / 166779, which is incorporated herein by reference.

[0168] Specific examples of organic solvents include dichloromethane, chloroform, methyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl acetate, butyl acetate, cyclohexyl acetate, ethyl cellosolve acetate, ethyl carbitol acetate, butyl carbitol acetate, ethyl lactate, 1-methoxy-2-propyl acetate, diethylene glycol dimethyl ether, 2-heptanone, cyclohexanone, cyclopentanone, propylene glycol monomethyl ether, 3-methoxy-N,N-dimethylpropanamide, and 3-butoxy-N,N-dimethylpropanamide.

[0169] If the compositions of this disclosure contain a solvent, they may contain only one solvent or two or more solvents.

[0170] If the composition of this disclosure contains a solvent, the solvent content is not particularly limited and can be set as appropriate depending on the purpose. However, if the solvent contains an aromatic hydrocarbon compound (for example, benzene, toluene, xylene, and ethylbenzene), the content of the aromatic hydrocarbon compound is preferably 50 ppm (parts per million) or less, more preferably 10 ppm or less, even more preferably 1 ppm or less, and particularly preferably 0 ppm, based on the total mass of the solvent, taking environmental considerations into account.

[0171] (Surfactants) The compositions of this disclosure may contain surfactants. Examples of surfactants include those described in paragraph

[0017] of Japanese Patent No. 4502784 and paragraphs

[0060] to

[0071] of Japanese Unexamined Patent Publication No. 2009-237362. As the surfactant, at least one selected from the group consisting of fluorine-based surfactants, hydrocarbon-based surfactants, and silicone-based surfactants is preferred. Nonionic surfactants other than hydrocarbon-based surfactants are also preferred.

[0172] As fluorinated surfactants, acrylic compounds having a molecular structure with a functional group containing a fluorine atom, where the fluorine atom-containing functional group is cleaved when heated and the fluorine atom volatilizes, can be preferably used. Examples of commercially available fluorinated surfactants include the MegaFac DS series manufactured by DIC Corporation (see, for example, the Chemical Daily (February 22, 2016) and the Nikkei Sangyo Shimbun (February 23, 2016)), and MegaFac® DS-21, described below, can be cited as an example. Furthermore, as a fluorine-based surfactant, a copolymer of a fluorine atom-containing vinyl ether compound having a fluorinated alkyl group or a fluorinated alkylene ether group and a hydrophilic vinyl ether compound can also be preferably used. In addition, block polymers can also be used as fluorine-based surfactants. Furthermore, as a fluorine-based surfactant, a fluorine-containing polymer compound can also be preferably used, which includes repeating units derived from a (meth)acrylate compound having a fluorine atom and repeating units derived from a (meth)acrylate compound having two or more (preferably five or more) alkylene oxy groups [preferably ethylene oxy groups and / or propylene oxy groups]. Furthermore, fluorine-containing polymers having ethylenically unsaturated bond-containing groups in their side chains can also be used as fluorine-based surfactants. Examples of such fluorine-based surfactants include Megafac® RS-101, RS-102, RS-718K, RS-72-K, etc., manufactured by DIC Corporation, which are also listed later as examples of commercially available products.

[0173] From the viewpoint of environmental suitability, fluorinated surfactants are preferably derived from alternative materials of compounds having a linear perfluoroalkyl group with 7 or more carbon atoms, such as perfluorooctanoic acid (PFOA) and perfluorooctanesulfonic acid (PFOS).

[0174] Commercially available fluorine-based surfactants can be used. Examples of commercially available fluorine-based surfactants include Megafac® F-171, F-172, F-173, F-176, F-177, F-141, F-142, F-143, F-144, F-437, F-475, F-477, F-479, F-482, F-551-A, F-552, F-554, F-555-A, F-556, F-557, F-558, F-559, F-560, F-561, F-565, F-563, F-568, F-575, F-780, and EXP.MFS-33. 0, EXP.MFS-578, EXP.MFS-578-2, EXP.MFS-579, EXP.MFS-586, EXP.MFS-587, EXP.MFS-628, EXP.MFS-631, EXP.MFS-603, R-41, R-41-LM, R-01, R-40, R-40-LM, RS-43, TF-1956, RS-90, R-94, RS-72-K, and DS-21 [all manufactured by DIC Corporation], Florard FC430, FC431, and FC171 (all manufactured by Sumitomo 3M Co., Ltd.), Surflon® S-382, SC-101, SC-103, SC-104, SC-105, SC-1068, SC-381, SC-383, S-393, and KH-40 (all manufactured by AGC Inc.), PolyFox PF636, PF656, PF6320, PF6520, and PF7002 (all manufactured by OMNOVA Corporation), and F-Tergent® Examples include 710FL, 710FM, 610FM, 601AD, 601ADH2, 602A, 215M, 245F, 251, 212M, 250, 209F, 222F, 208G, 710LA, 710FS, 730LM, 650AC, 681, and 683 (all manufactured by NEOS Corporation), and U-120E (all manufactured by Unichem Corporation).

[0175] Examples of hydrocarbon surfactants include glycerol, trimethylolpropane, trimethylolethane, and their ethoxylates and propoxylates (e.g., glycerol propoxylate, glycerol ethoxylate, etc.). Examples of hydrocarbon surfactants include polyoxyethylene lauryl ether, polyoxyethylene stearyl ether, polyoxyethylene oleyl ether, polyoxyethylene octylphenyl ether, polyoxyethylene nonylphenyl ether, polyethylene glycol dilaurate, polyethylene glycol distearate, and sorbitan fatty acid esters.

[0176] Commercially available hydrocarbon-based surfactants can be used. Examples of commercially available hydrocarbon surfactants include Pluronic® L10, L31, L61, L62, 10R5, 17R2, and 25R2 [all manufactured by BASF], Tetronic® 304, 701, 704, 901, 904, and 150R1 [all manufactured by BASF], HYDROPALAT WE 3323 [all manufactured by BASF], Solspers® 20000 [all manufactured by Nippon Lubrizol Co., Ltd.], NCW-101, NCW-1001, and NCW-1002 [all manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.], Paionin D-1105, D-6112, D-6112-W, and D-6315 [all manufactured by Takemoto Oil & Fat Co., Ltd.], and Orfin®. Examples include E1010 (manufactured by Nisshin Chemical Industry Co., Ltd.) and Surfinol® 104, 400, and 440 (manufactured by Nisshin Chemical Industry Co., Ltd.).

[0177] Examples of silicone-based surfactants include linear polymers consisting of siloxane bonds, and modified siloxane polymers in which organic groups are introduced into the side chains and / or terminals.

[0178] Commercially available silicone-based surfactants can be used. Examples of commercially available silicone-based surfactants include Megafac® EXP.S-309-2, EXP.S-315, EXP.S-503-2, EXP.S-505-2 (all manufactured by DIC Corporation), DC3PA, SH7PA, DC11PA, SH21PA, SH28PA, SH29PA, SH30PA, SH8400, and DOWSIL® 8032. ADDITIVE (all manufactured by DuPont-Toray Specialty Materials Co., Ltd.), X-22-4952, X-22-4272, X-22-6266, KF-351A, K354L, KF-355A, KF-945, KF-640, KF-642, KF-643, X-22-6191, X-22-4515, KF-6004, KP-34 1, KF-6001, KF-6002, KP-101, KP-103, KP-104, KP-105, KP-106, KP-109, KP-109, KP-112, KP -120, KP-121, KP-124, KP-125, KP-301, KP-306, KP-310, KP-322, KP-323, KP-327, KP-341, K P-368, KP-369, KP-611, KP-620, KP-621, KP-626, and KP-652 (all manufactured by Shin-Etsu Chemical Co., Ltd.), F-4440, TSF-4300, TSF-4445, TSF-4460, and TSF-4452 (all manufactured by Momentive Performance Materials, Inc.), and BYK300, BYK Examples include 306, BYK307, BYK310, BYK320, BYK323, BYK325, BYK330, BYK313, BYK315N, BYK331, BYK333, BYK345, BYK347, BYK348, BYK349, BYK370, BYK377, BYK378, and BYK323 [all manufactured by BYK Chemie].

[0179] If the compositions of this disclosure contain surfactants, they may contain only one surfactant or two or more surfactants.

[0180] If the composition of this disclosure contains a surfactant, the surfactant content is preferably 0.01% to 3% by mass, more preferably 0.01% to 1% by mass, and even more preferably 0.05% to 0.8% by mass, based on the total solid content of the composition.

[0181] (resin) The compositions of this disclosure may further include resins. The resin is not particularly limited and includes, for example, (meth)acrylic resin, polyester resin, polycarbonate resin, vinyl polymer (e.g., polydiene resin, polyalkene resin, polystyrene resin, polyvinyl ether resin, polyvinyl alcohol resin, polyvinyl ketone resin, polyfluorovinyl resin, and polybrominated vinyl resin), polythioether resin, polyphenylene resin, polyurethane resin, polysulfonate resin, nitrosopolymer resin, polysiloxane resin, polysulfide resin, polythioester resin, polysulfone resin, polysulfonamide resin, polyamide resin, polyimine resin, polyurea resin, polyphosphazene resin, polysilane resin, polysilazane resin, polyfuran resin, and polybenzoxazole. Examples include resins, polyoxadiazole resins, polybenzothiadinophenothiazine resins, polybenzothiazole resins, polypyradinoquinoxaline resins, polypyromelliimide resins, polyquinoxaline resins, polybenzimidazole resins, polyoxoisoindoline resins, polydioxoisoindoline resins, polytriazine resins, polypyridazine resins, polypiperazine resins, polypyridine resins, polypiperidine resins, polytriazole resins, polypyrazole resins, polypyrrolidine resins, polycarborane resins, polyoxabicyclononane resins, polydibenzofuran resins, polyphthalide resins, polyacetal resins, polyimide resins, olefin resins, cyclic olefin resins, epoxy resins, and cellulose acylate resins. For details regarding the resin, refer to, for example, paragraphs

[0075] to

[0097] of Japanese Patent Publication No. 2009-263616, which are incorporated herein by reference.

[0182] As for the resin, it is preferable that it is at least one resin selected from the group consisting of (meth)acrylic resin, polyester resin, polystyrene resin, polyurethane resin, polycarbonate resin, epoxy resin, and cellulose acylate resin, from the viewpoint of having good compatibility with the compounds of this disclosure and being able to easily obtain a film with suppressed planar unevenness when a film is formed. More preferably, it is at least one resin selected from the group consisting of (meth)acrylic resin, polyester resin, polystyrene resin, polyurethane resin, epoxy resin, and cellulose acylate resin.

[0183] An example of a commercially available (meth)acrylic resin is the SK Dyne series from Soken Chemical Co., Ltd. [Product example: SK Dyne® SF2147].

[0184] An example of a commercially available polyester resin is the Byron series manufactured by Toyobo Co., Ltd. [Example product: Byron 500].

[0185] As for the polystyrene resin, a resin containing 50% by mass or more of repeating units derived from styrene monomers, more preferably 70% by mass or more, and even more preferably 85% by mass or more, based on the total number of repeating units, is preferred. Specific examples of styrene monomers include styrene and its derivatives. Here, "styrene derivative" refers to a compound in which another group is bonded to styrene. Specific examples of styrene derivatives include alkylstyrenes (e.g., o-methylstyrene, m-methylstyrene, p-methylstyrene, 2,4-dimethylstyrene, o-ethylstyrene, and p-ethylstyrene). Furthermore, specific examples of styrene derivatives include substituted styrenes (e.g., hydroxystyrene, tert-butoxystyrene, vinylbenzoic acid, o-chlorostyrene, and p-chlorostyrene) in which a hydroxyl group, alkoxy group, carboxyl group, halogen, etc., is introduced to the benzene ring of styrene. Polystyrene resins may contain repeating units derived from monomers other than styrene monomers. Examples of other monomers include alkyl (meth)acrylates, unsaturated carboxylic acid monomers, unsaturated dicarboxylic acid anhydride monomers, unsaturated nitrile monomers, and conjugated dienes. Specific examples of alkyl (meth)acrylates include methyl (meth)acrylate, cyclohexyl (meth)acrylate, methylphenyl (meth)acrylate, and isopropyl (meth)acrylate. Specific examples of unsaturated carboxylic acid monomers include methacrylic acid, acrylic acid, itaconic acid, maleic acid, fumaric acid, and cinnamic acid. Specific examples of unsaturated dicarboxylic acid anhydride monomers include maleic anhydride, as well as anhydrides of itaconic acid, ethyl maleic acid, methyl itaconic acid, and chloromaleic acid. Specific examples of unsaturated nitrile monomers include acrylonitrile and methacrylonitrile. Specific examples of conjugated dienes include 1,3-butadiene, 2-methyl-1,3-butadiene (isoprene), 2,3-dimethyl-1,3-butadiene, 1,3-pentadiene, and 1,3-hexadiene. Examples of commercially available polystyrene resins include AS-70 (acrylonitrile-styrene copolymer resin, manufactured by Nippon Steel Chemical & Material Co., Ltd.) and SMA2000P (styrene-maleic acid copolymer, manufactured by Kawahara Oil & Chemical Co., Ltd.).

[0186] Examples of epoxy resins include bisphenol A type epoxy resin, bisphenol F type epoxy resin, phenol novolac type epoxy resin, cresol novolac type epoxy resin, and aliphatic epoxy resin. Examples of commercially available bisphenol A type epoxy resins include JER827, JER828, JER834, JER1001, JER1002, JER1003, JER1055, JER1007, JER1009, and JER1010 (all manufactured by Mitsubishi Chemical Corporation), as well as PICLON® 860, EPICLON® 1050, EPICLON® 1051, and EPICLON® 1055 (all manufactured by DIC Corporation). Examples of commercially available bisphenol F type epoxy resins include JER806, JER807, JER4004, JER4005, JER4007, and JER4010 (all manufactured by Mitsubishi Chemical Corporation), EPICLON® 830 and EPICLON® 835 (both manufactured by DIC Corporation), and LCE-21 and RE-602S (both manufactured by Nippon Kayaku Co., Ltd.). Examples of commercially available phenol novolac type epoxy resins include JER152, JER154, JER157S70, and JER157S65 (all manufactured by Mitsubishi Chemical Corporation), as well as EPICLON® N-740, EPICLON® N-770, and EPICLON® N-775 (all manufactured by DIC Corporation). Examples of commercially available cresol novolac type epoxy resins include EPICLON® N-660, EPICLON® N-665, EPICLON® N-670, EPICLON® N-673, EPICLON® N-680, EPICLON® N-690, and EPICLON® N-695 (all manufactured by DIC Corporation), as well as EOCN-1020 (all manufactured by Nippon Kayaku Co., Ltd.).

[0187] As the cellulose acylate resin, for example, the cellulose acylate described in paragraphs

[0016] to

[0021] of Japanese Patent Publication No. 2012-215689 is preferred.

[0188] The resin is preferably an alkali-soluble resin. In this disclosure, "alkali-soluble" means soluble in a 1 mol / L sodium hydroxide solution at 25°C. "Soluble" means soluble in 100 mL of solvent (0.1 g or more). The alkali-soluble resin is preferably a resin having a group that promotes alkali solubility (hereinafter also referred to as "acid group"). Examples of acidic groups include carboxyl groups, phosphate groups, sulfonic acid groups, and phenolic hydroxyl groups. Among these, the carboxyl group is preferred as the acid group. If the resin has acidic groups, it may have only one type of acidic group or two or more types.

[0189] The alkali-soluble resin is preferably a polymer having carboxyl groups in its side chains. Examples of alkali-soluble resins include alkali-soluble phenolic resins such as (meth)acrylic acid copolymers, itaconic acid copolymers, crotonic acid copolymers, maleic acid copolymers, partially esterified maleic acid copolymers, and novolac-type resins; acidic cellulose derivatives having carboxyl groups in their side chains; and polymers having hydroxyl groups to which acid anhydrides have been added.

[0190] The alkali-soluble resin is particularly preferably a copolymer of (meth)acrylic acid and another monomer copolymerizable with this (meth)acrylic acid [i.e., a (meth)acrylic acid copolymer]. Other monomers copolymerizable with (meth)acrylic acid include, for example, alkyl (meth)acrylates, aryl (meth)acrylates, and vinyl compounds. Other monomers copolymerizable with (meth)acrylic acid include methyl (meth)acrylate, ethyl (meth)acrylate, propyl (meth)acrylate, butyl (meth)acrylate, isobutyl (meth)acrylate, pentyl (meth)acrylate, hexyl (meth)acrylate, octyl (meth)acrylate, phenyl (meth)acrylate, benzyl (meth)acrylate, tolyl (meth)acrylate, naphthyl (meth)acrylate, cyclohexyl (meth)acrylate, styrene, α-methylstyrene, vinyltoluene, glycidyl methacrylate, acrylonitrile, vinyl acetate, N-vinylpyrrolidone, tetrahydrofurfuryl methacrylate, polystyrene macromonomers, and polymethyl methacrylate macromonomers. Other monomers copolymerizable with (meth)acrylic acid include, for example, N-substituted maleimides described in Japanese Patent Publication No. 10-300922 (e.g., N-phenylmaleimide and N-cyclohexylmaleimide). In a (meth)acrylic acid copolymer, the other monomer copolymerizable with (meth)acrylic acid may be one type or two or more types.

[0191] Furthermore, as alkali-soluble resins, benzyl (meth)acrylate / (meth)acrylic acid copolymers, benzyl (meth)acrylate / (meth)acrylic acid / 2-hydroxyethyl (meth)acrylate copolymers, and polypolymers consisting of benzyl (meth)acrylate / (meth)acrylic acid / other monomers are also preferred examples. Furthermore, preferred examples of alkali-soluble resins include copolymers of 2-hydroxyethyl (meth)acrylate, as well as the copolymers described in Japanese Patent Publication No. 7-140654: 2-hydroxypropyl (meth)acrylate / polystyrene macromonomer / benzyl methacrylate / methacrylic acid copolymer, 2-hydroxy-3-phenoxypropyl acrylate / polymethyl methacrylate macromonomer / benzyl methacrylate / methacrylic acid copolymer, 2-hydroxyethyl methacrylate / polystyrene macromonomer / methyl methacrylate / methacrylic acid copolymer, and 2-hydroxyethyl methacrylate / polystyrene macromonomer / benzyl methacrylate / methacrylic acid copolymer.

[0192] For details regarding alkali-soluble resins, refer to, for example, the descriptions in Japanese Patent Publication No. 2012-208494 and Japanese Patent Publication No. 2012-198408, the contents of which are incorporated herein by reference.

[0193] The acid value of the alkali-soluble resin is not particularly limited, but is preferably, for example, 30 mg KOH / g to 30 mg KOH / g. The lower limit is more preferably 50 mg KOH / g or more, and even more preferably 70 mg KOH / g or more. The upper limit is more preferably 150 mg KOH / g or less, and even more preferably 120 mg KOH / g or less. In this disclosure, the acid value is a value measured in accordance with the method described in JIS K0070:1992.

[0194] The resin may have polymerizable groups. The compositions of this disclosure, when containing a resin having polymerizable groups, can form a hard film even when they do not contain, for example, the polymerizable compounds described later. Examples of polymerizable groups include (meth)allyl groups and (meth)acryloyl groups.

[0195] Examples of commercially available polymerizable resins include the Dianaal BR series [Resin type: polymethyl methacrylate (PMMA), product examples: Dianaal® BR-80, BR-83, and BR-87, manufactured by Mitsubishi Chemical Corporation], Photomer 6173 [Resin type: COOH-containing polyurethane acrylic oligomer, manufactured by Diamond Shamrock], Viscoat R-264 and KS Resist 106 [both manufactured by Osaka Organic Chemical Industry Co., Ltd.], Cyclomer P series [product example: Cyclomer® P (ACA)Z230AA], and Plaxel CF200 series [both manufactured by Daicel Corporation], EBECRYL® 3800 [manufactured by Daicel Ornex Co., Ltd.], and Acrycure® RD-F8 [manufactured by Nippon Shokubai Co., Ltd.].

[0196] The weight-average molecular weight (Mw) of resins other than epoxy resins is not particularly limited, but is preferably 3,000 or more, more preferably 4,000 or more, and even more preferably 5,000 or more. Furthermore, the weight-average molecular weight (Mw) of resins other than epoxy resins is preferably 2,000,000 or less, more preferably 1,000,000 or less, and even more preferably 500,000 or less. The weight-average molecular weight (Mw) of the epoxy resin is preferably 100 or more, and more preferably 200 or more. Furthermore, the weight-average molecular weight (Mw) of the epoxy resin is preferably 2,000,000 or less, more preferably 1,000,000 or less, and even more preferably 500,000 or less.

[0197] The total light transmittance of the resin is preferably 80% or higher, more preferably 85% or higher, and even more preferably 90% or higher. In this disclosure, the total light transmittance of the resin is a value measured based on the information described on pages 225-232 of "Experimental Chemistry Course 4th Edition 29 Polymer Materials and Media" edited by the Chemical Society of Japan (Maruzen, 1992).

[0198] If the compositions of this disclosure contain resins, they may contain only one type of resin or two or more types of resins.

[0199] If the composition of this disclosure contains a resin, the resin content is not particularly limited, but is preferably 1% to 99.9% by mass with respect to the total solid content of the composition. The lower limit is more preferably 5% by mass or more, and even more preferably 7% by mass or more. The upper limit is more preferably 99% by mass or less, and even more preferably 95% by mass or less.

[0200] (polymerizable compound) The compositions of this disclosure may contain polymerizable compounds. The compositions of this disclosure, when containing polymerizable compounds, can be used as curable compositions (so-called curable compositions) that harden upon energy application.

[0201] The polymerizable compound can be any compound that can be polymerized and cured by energy application, and is not particularly limited. Preferably, the polymerizable compound is a compound having a polymerizable group. The polymerizable group is preferably a group having an ethylenically unsaturated bond. Specific examples of polymerizable groups include vinyl groups, (meth)allyl groups, (meth)acryloyl groups, (meth)acryloyloxy groups, (meth)acryloylamino groups, and vinylphenyl groups.

[0202] The polymerizable compound may be a monomer, a prepolymer (i.e., a dimer, trimer, or oligomer), a mixture thereof, or a (co)polymer of a compound selected from the monomer and prepolymer. Examples of monomers include unsaturated carboxylic acids, esters of unsaturated carboxylic acids, and amides of unsaturated carboxylic acids. Specific examples of unsaturated carboxylic acids include acrylic acid, methacrylic acid, itaconic acid, crotonic acid, isocrotonic acid, and maleic acid.

[0203] As the polymerizable compound, at least one selected from the group consisting of (meth)acrylate monomers and styrene monomers is preferred.

[0204] Specific examples of (meth)acrylate monomers include methyl (meth)acrylate, ethyl (meth)acrylate, butyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, glycidyl (meth)acrylate, benzyl (meth)acrylate, 2-(2-phenoxy)ethyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, n-octyl (meth)acrylate, isooctyl (meth)acrylate, n-nonyl (meth)acrylate, isononyl (meth)acrylate, n-decyl (meth)acrylate, iso Decyl (meth)acrylate, n-dodecyl (meth)acrylate, n-tridecyl (meth)acrylate, n-tetradecyl (meth)acrylate, n-hexadecyl (meth)acrylate, stearyl (meth)acrylate, isobornyl (meth)acrylate, dicyclopentenyl (meth)acrylate, dicyclopentanyl (meth)acrylate, dicyclopentenyloxyethyl (meth)acrylate, 1-hydroxyheptyl (meth)acrylate, 1-hydroxybutyl (meth)acrylate, 1-hydroxypentyl, 2-hydroxybutyl Sibutyl (meth)acrylate, ethylene glycol diacrylate, ethylene glycol dimethacrylate, polyethylene glycol diacrylate, polyethylene glycol dimethacrylate, ethoxylated bisphenol A diacrylate, ethoxylated bisphenol A dimethacrylate, ethoxylated trimethylolpropane triacrylate, ethoxylated trimethylolpropane trimethacrylate, ethoxylated glycerin triacrylate, ethoxylated glycerin trimethacrylate, ethoxylated pentaerythritol tetraacrylate, Ethoxylated pentaerythritol tetramethacrylate, ethoxylated dipentaerythritol hexaacrylate, polyglycerin monoethylene oxide polyacrylate, polyglycerin polyethylene glycol polyacrylate, dipentaerythritol hexaacrylate, dipentaerythritol hexamethacrylate, neopentyl glycol diacrylate, neopentyl glycol dimethacrylate, pentaerythritol triacrylate, pentaerythritol trimethacrylate, trimethylolpropane triacrylate,Examples include trimethylolpropane trimethacrylate, tricyclodecanedimethanol diacrylate, tricyclodecanedimethanol dimethacrylate, 1,6-hexanediol diacrylate, and 1,6-hexanediol dimethacrylate.

[0205] Examples of (meth)acrylate monomers include ethylene oxy-modified pentaerythritol tetraacrylate [Example of a commercially available product: NK Ester ATM-35E, manufactured by Shin Nakamura Chemical Industry Co., Ltd.], dipentaerythritol triacrylate [Example of a commercially available product: KAYARAD® D-330, manufactured by Nippon Kayaku Co., Ltd.], dipentaerythritol tetraacrylate [Example of a commercially available product: KAYARAD® D-320, manufactured by Nippon Kayaku Co., Ltd.], and dipentaerythritol penta(meth)acrylate [Example of a commercially available product: KAYARAD®] D-310 (manufactured by Nippon Kayaku Co., Ltd.), diglycerin ethylene oxide modified (meth)acrylate (example of a commercially available product: M-460, manufactured by Toagosei Co., Ltd.), pentaerythritol tetraacrylate (example of a commercially available product: A-TMMT, manufactured by Shin Nakamura Chemical Industry Co., Ltd.), and 1,6-hexanediol diacrylate (example of a commercially available product: KAYARAD® HDDA, manufactured by Nippon Kayaku Co., Ltd.) can be preferably used, and their oligomer types can also be used. Furthermore, as (meth)acrylate monomers, RP-1040 manufactured by Nippon Kayaku Co., Ltd., dipentaerythritol hexa(meth)acrylate [examples of commercially available products: KAYARAD® DPHA manufactured by Nippon Kayaku Co., Ltd., and A-DPH-12E manufactured by Shin Nakamura Chemical Industry Co., Ltd.], and compounds containing structures in which the (meth)acryloyl groups of these are linked via ethylene glycol residues, propylene glycol residues, etc., can be preferably used, and their oligomer types can also be used.

[0206] Specific examples of styrene monomers include styrene, methylstyrene, dimethylstyrene, trimethylstyrene, ethylstyrene, fluorostyrene, chlorostyrene, methoxystyrene, tert-butoxystyrene, and divinylbenzene.

[0207] As polymerizable compounds, for example, at least one selected from the group consisting of methyl (meth)acrylate, ethyl (meth)acrylate, butyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, benzyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, dipentaerythritol hexaacrylate, and pentaerythritol triacrylate is particularly preferred from the viewpoint of being liquid at room temperature.

[0208] Polymerizable compounds containing a group having an ethylenically unsaturated bond may further contain acidic groups such as a carboxyl group, a sulfonic acid group, a phosphate group, or a phosphonic acid group. Polymerizable compounds containing an acidic group and a group having an ethylenically unsaturated bond are, for example, polyfunctional monomers obtained by reacting an unreacted hydroxyl group of an aliphatic polyhydroxy compound with a non-aromatic carboxylic acid anhydride to give it an acidic group, and compounds in which the aliphatic polyhydroxy compound is at least one of pentaerythritol and dipentaerythritol are particularly preferred. Polymerizable compounds containing an acidic group and a group having an ethylenically unsaturated bond are described, for example, in paragraphs

[0025] to

[0030] of Japanese Patent Application Publication No. 2004-239942. These descriptions are incorporated herein by reference. Examples of commercially available polymerizable compounds containing acidic groups and groups having ethylenically unsaturated bonds include the Aronics series M-305, M-510, and M-520, which are polybasic acid-modified acrylic oligomers manufactured by Toagosei Co., Ltd. The acid value of polymerizable compounds containing acidic groups and groups having ethylenically unsaturated bonds is not particularly limited, but is preferably, for example, 0.1 mg KOH / g to 40 mg KOH / g. The lower limit is more preferably 5 mg KOH / g or more. The upper limit is more preferably 30 mg KOH / g or less.

[0209] As polymerizable compounds, compounds having a caprolactone structure are also preferred. For example, as a compound having a caprolactone structure, one can refer to the description in Japanese Patent Publication No. 2013-253224, which is incorporated herein by reference. Examples of commercially available compounds containing a caprolactone structure include SR-494, a tetrafunctional acrylate with four ethylene oxy chains manufactured by Sartomer Co., Ltd.; DPCA-60, a hexafunctional acrylate with six pentylene oxy chains manufactured by Nippon Kayaku Co., Ltd.; and TPA-330, a trifunctional acrylate with three isobutylene oxy chains manufactured by Nippon Kayaku Co., Ltd.

[0210] Regarding polymerizable compounds, the details of their use, such as the structure of the polymerizable compound to be used, whether to use them alone or in combination of two or more, and the amount to be included, can be arbitrarily set in accordance with the final performance design of the composition (preferably a curable composition). For example, from the viewpoint of sensitivity, polymerizable compounds are preferably compounds having a structure with a large amount of polymerizable groups per molecule, and in many cases, they are preferably compounds with two or more functionalities. For example, from the viewpoint of film strength, polymerizable compounds may include trifunctional or more compounds [e.g., hexafunctional (meth)acrylate monomers]. For example, it is also effective to select polymerizable compounds by considering their compatibility and dispersibility with each component contained in the composition. As polymerizable compounds, compounds having different functional numbers and / or different polymerizable groups [e.g., (meth)acrylate compounds, styrene compounds, and vinyl ether compounds] may be used in combination.

[0211] The molecular weight of the polymerizable compound is not particularly limited, but is preferably 100 to 3000, more preferably 250 to 2600, even more preferably 280 to 2200, and particularly preferably 300 to 2200.

[0212] If the composition of this disclosure contains a polymerizable compound, it may contain only one polymerizable compound or two or more polymerizable compounds.

[0213] If the composition of this disclosure contains a polymerizable compound, the content of the polymerizable compound is not particularly limited, but is preferably 1% to 90% by mass with respect to the total solid content of the composition. The lower limit is more preferably 15% by mass or more, and even more preferably 40% by mass or more. The upper limit is more preferably 80% by mass or less, and even more preferably 75% by mass or less.

[0214] (Polymerization initiator) The compositions of this disclosure (preferably curable compositions) may contain polymerization initiators. The polymerization initiator can be any compound capable of generating the initiator species necessary for the polymerization reaction through energy transfer, and is not particularly limited. Known polymerization initiators can be used. Examples of polymerization initiators include photopolymerization initiators and thermal polymerization initiators.

[0215] The polymerization initiator is preferably a photopolymerization initiator. As a photopolymerization initiator, one that is photosensitive to light in the ultraviolet to visible regions is preferred. Alternatively, the photopolymerization initiator may be an activator that interacts with a photoexcited sensitizer to generate active radicals.

[0216] Examples of photopolymerization initiators include halogenated hydrocarbon derivatives (e.g., compounds having a triazine skeleton and compounds having an oxadiazole skeleton), acylphosphine compounds, hexaarylbiimidazoles, oxime compounds (e.g., oxime ester compounds), organic peroxides, thio compounds, ketone compounds, aromatic onium salts, aminoacetophenone compounds, and hydroxyacetophenone compounds. Examples of acylphosphine compounds include the acylphosphine initiator described in Japanese Patent Publication No. 4225898. Examples of oxime compounds include the compounds described in Japanese Patent Publication No. 2001-233842, the compounds described in Japanese Patent Publication No. 2000-080068, the compounds described in Japanese Patent Publication No. 2006-342166, and the compounds described in paragraphs

[0073] to

[0075] of Japanese Patent Publication No. 2016-006475. Among oxime compounds, oxime ester compounds are preferred. Examples of aminoacetophenone compounds include the compounds described in Japanese Patent Publication No. 2009-191179 and the aminoacetophenone-based initiators described in Japanese Patent Publication No. 10-291969.

[0217] Examples of thermal polymerization initiators include azo compounds, organic peroxides, and inorganic peroxides. Specific examples of azo compounds include 2,2'-azobis(isobutyrate)dimethyl, 2,2'-azobisisobutyronitrile, 2,2'-azobis(2,4-dimethyl-4-methoxyvaleronitrile), 2,2'-azobis(2,4-dimethylvaleronitrile), dimethyl-2,2'-azobis(2-methylpropionate), 2,2'-azobis(2-methylbutyronitrile), 1,1'-azobis(cyclohexane-1-carbonitride), 2,2'-azobis(N-butyl-2-methylpropionamide), dimethyl-1,1'-azobis(1-cyclohexanecarboxylate), and 2,2'-azobis[2-(2-imidazolin-2-yl)propane]2 hydrochloride. Specific examples of organic peroxides include 1,1-di(tert-hexylperoxy)cyclohexane, 1,1-di(tert-butylperoxy)cyclohexane, 2,2-di(4,4-di-(tert-butylperoxy)cyclohexyl)propane, tert-hexylperoxyisopropyl monocarbonate, tert-butylperoxy-3,5,5-trimethylhexanoate, tert-butylperoxylaurate, dicumylperoxide, di-tert-butylperoxide, tert-butylperoxy-2-ethylhexanoate, tert-hexylperoxy-2-ethylhexanoate, cumenehydroperoxide, and tert-butylhydroperoxide. Specific examples of inorganic peroxides include potassium persulfate, ammonium persulfate, and hydrogen peroxide.

[0218] The polymerization initiator may be a synthetic product or a commercially available product. Examples of commercially available photopolymerization initiators include IRGACURE® OXE01 (manufactured by BASF), TR-PBG-304 (manufactured by Changzhou Strong Electronic New Materials Co., Ltd.), and ADEKA® NCI-831 and ADEKA® NCI-930 (manufactured by ADEKA). Other commercially available photopolymerization initiators that are hydroxyacetophenone compounds include Omnirad® 184, Omnirad® 1173, Omnirad® 2959, and Omnirad® 127 (all manufactured by IGM Resins BV). Examples of commercially available photopolymerization initiators that are aminoacetophenone compounds include Omnirad® 907, Omnirad® 369, Omnirad® 369E, and Omnirad® 379EG (all manufactured by IGM Resins BV). Examples of commercially available photopolymerization initiators that are acylphosphine compounds include Omnirad® 819 and Omnirad® TPO (both manufactured by IGM Resins BV). Examples of commercially available oxime compounds used as photopolymerization initiators include Irgacure® OXE01, Irgacure® OXE02 (manufactured by BASF), and Irgacure® OXE03 (all manufactured by BASF).

[0219] If the compositions of this disclosure contain polymerization initiators, they may contain only one polymerization initiator or two or more.

[0220] If the composition of this disclosure contains a polymerization initiator, the content of the polymerization initiator is not particularly limited, but is preferably 0.1% to 20% by mass with respect to the total solid content of the composition. The lower limit is more preferably 0.3% by mass or more, and even more preferably 0.4% by mass or more. The upper limit is more preferably 15% by mass or less, and even more preferably 10% by mass or less.

[0221] (Other ingredients) The compositions of this disclosure may, as necessary, include components other than those described herein (so-called other components), provided that they do not impair the effects of this disclosure. Other ingredients include various additives. Examples of additives include colorfastness inhibitors, preservatives, fungicides, and antistatic agents.

[0222] [Laminated structure] The laminate of the present disclosure comprises a support and a film provided on the support and formed from the composition of the present disclosure described above. The laminate of the present disclosure comprises a film formed from a composition of the present disclosure containing the compound of the present disclosure, and therefore has maximum absorption in the near-infrared region at wavelengths longer than 850 nm and excellent light resistance.

[0223] The laminate of this disclosure can be suitably used as a near-infrared shielding material. The support material is preferably transparent to the extent that it does not impair optical performance. In this disclosure, "the support is transparent" means that the support is optically transparent, and specifically refers to the total light transmittance of the support being 85% or higher. The total light transmittance of the support is preferably 90% or higher, and more preferably 95% or higher.

[0224] The support material is not particularly limited, and examples include glass and resin film. Examples of resins used as materials for resin films include ester resins [e.g., polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polybutylene terephthalate (PBT), and polycyclohexanedimethylene terephthalate (PCT)], olefin resins [e.g., polypropylene (PP) and polyethylene (PE)], polyvinyl chloride (PVA), and tricellulose acetate (TAC). Among these, PET is preferred as the resin material for the resin film, for example, from the viewpoint of versatility.

[0225] The thickness of the support is not particularly limited and can be selected as appropriate depending on the application or purpose. Generally, the thickness of the support is preferably 5 μm to 2500 μm, and more preferably 20 μm to 500 μm.

[0226] The support may be peelable. The laminate of the present disclosure, which has a peelable support, is preferably used, for example, as a polarizing plate. Examples of supports with peelability include supports that have been surface-treated with a release agent on one or both sides (so-called easy-peel treatment). Examples of release agents include silicone-based release agents (e.g., silicone), wax-based release agents (e.g., paraffin wax), and fluorine-based release agents (e.g., fluorine-based resins).

[0227] A film formed by the composition of the present disclosure may be a dried product of the composition of the present disclosure or a cured product of the composition of the present disclosure.

[0228] The thickness of the film formed by the composition of this disclosure is not particularly limited, but is preferably 0.1 μm to 2500 μm, and more preferably 1 μm to 500 μm.

[0229] -Method for manufacturing laminates- The method for manufacturing the laminate of this disclosure is not particularly limited, and conventionally known manufacturing methods can be employed. The laminate of the present disclosure can be manufactured, for example, by coating the composition of the present disclosure onto a transparent support to form a composition layer, and then curing the composition layer by applying energy. The method for imparting energy to the composition layer is not particularly limited and includes, for example, heating and light irradiation. Light irradiation is preferred as the method of imparting energy, and ultraviolet irradiation is more preferred.

[0230] When curing the composition layer by ultraviolet irradiation, an ultraviolet lamp can be used for ultraviolet irradiation, for example. The amount of ultraviolet light irradiation is not particularly limited, but for example, 10 mJ / cm² 2 ~1000 mJ / cm 2 It is preferable that the amount of ultraviolet light irradiation is within the above range, the curing of the composition layer tends to be more favorable. When irradiating with ultraviolet light, in order to suppress curing inhibition by oxygen and further promote surface hardening of the composition layer, an inert gas such as nitrogen gas may be introduced into the space area where ultraviolet irradiation is performed, thereby replacing the air in the ultraviolet irradiation area with the inert gas and lowering the oxygen concentration. The oxygen concentration in the space where ultraviolet irradiation is performed is not particularly limited, but is preferably, for example, 0.01% to 5%. The temperature at which the composition layer is cured can be increased in order to accelerate the curing reaction of the composition layer. From the viewpoint of further accelerating the curing reaction of the composition layer, the temperature at which the composition layer is cured is preferably 25°C to 100°C, more preferably 30°C to 80°C, and even more preferably 40°C to 70°C.

[0231] In the method for manufacturing the laminate of the present disclosure, if the composition of the present disclosure contains a solvent, it is preferable from the viewpoint of improving the curability of the composition layer to dry the composition layer to reduce the amount of solvent before curing the composition layer. The method for drying the composition layer is not particularly limited, and conventionally known drying methods can be used. Methods for drying the composition layer include, for example, blowing hot air onto it, passing it through a drying zone controlled to a predetermined temperature, and conveying it using a conveyor roll equipped with a heater.

[0232] [Optical filters] The optical filters of this disclosure include the compounds of this disclosure described herein. The optical filter of this disclosure can function as a near-infrared shielding filter. In this disclosure, "near-infrared shielding filter" means a filter that transmits light of visible wavelengths (so-called visible light) and blocks at least a portion of light of near-infrared wavelengths (so-called near-infrared light). Here, the near-infrared shielding filter may transmit all light of visible wavelengths, or it may transmit light of a specific wavelength range within the visible range and block light of a specific wavelength range.

[0233] The thickness of the optical filter in this disclosure is not particularly limited and can be appropriately selected depending on the purpose. The thickness of the optical filter of this disclosure is preferably, for example, 0.1 μm to 2500 μm, and more preferably 1 μm to 500 μm.

[0234] The optical filter of this disclosure preferably has a light transmittance of 70% or more, more preferably 80% or more, and even more preferably 90% or more, for all wavelengths in the range of 400 nm to 650 nm when the thickness is 200 μm or less. The optical filter of this disclosure preferably has a maximum absorption wavelength in the range of 700 nm to 1200 nm.

[0235] -Manufacturing method for optical filters- The optical filters of this disclosure can be manufactured using a composition of this disclosure (hereinafter also referred to as the "resin composition") comprising at least the compounds and resins of this disclosure, or a composition of this disclosure (so-called curable composition) comprising at least the compounds and polymerizable compounds of this disclosure. The following describes an example of a preferred method for manufacturing the optical filters of this disclosure. However, matters common to the compounds and compositions of this disclosure described above will not be explained.

[0236] The optical filters of this disclosure can be manufactured, for example, by a method that includes the step of forming a composition layer by coating the composition of this disclosure (preferably a resin composition or a curable composition) onto a support. The support in the method for manufacturing the optical filter of this disclosure is synonymous with the support in the laminate of this disclosure, and the preferred embodiment is also the same; therefore, a detailed explanation is omitted here.

[0237] Examples of support materials include semiconductor substrates such as silicon. Other examples of support materials include those described in the section on laminates of this disclosure. The support may have, for example, an organic film or an inorganic film formed on it. Examples of materials for organic films include the resins mentioned above. The support may have, for example, a charge-coupled device (CCD), a complementary metal-oxide-semiconductor (CMOS) device, and a transparent conductive film formed on it. The support may have a black matrix formed on it that isolates each pixel. The support may be provided with an undercoat layer, if necessary, to improve adhesion with adjacent layers, prevent diffusion of materials, or flatten the surface of the support. When using a support made of glass (a so-called glass substrate) as the support material, it is preferable to form an inorganic film on the surface of the glass substrate or to dealkalize the glass substrate before use.

[0238] The method for applying the composition of this disclosure onto a support is not particularly limited, and known application methods can be employed. Coating methods include the drop method (so-called drop casting method); slit coating method; spray method; roll coating method; rotary coating method (so-called spin coating method); casting method; slit and spin method; pre-wetting method (e.g., coating method described in Japanese Patent Publication No. 2009-145395); various printing methods such as inkjet (e.g., on-demand method, piezo method, and thermal method), nozzle jet and other ejection system printing, flexographic printing, screen printing, gravure printing, reverse offset printing, and metal mask printing; transfer methods using molds, etc.; and nanoimprint methods.

[0239] The composition layer formed on the support may be subjected to a drying treatment (pre-baking). When pre-baking is performed, the pre-baking temperature is not particularly limited, but is preferably 150°C or lower, more preferably 120°C or lower, and even more preferably 110°C or lower. When the pre-baking temperature is 150°C or lower, for example, when the photoelectric conversion film of an image sensor is formed from an organic material, the properties of the organic material can be maintained more effectively. The lower limit of the pre-bake temperature can be, for example, 50°C or higher, or 80°C or higher. The pre-bake time is not particularly limited, but is preferably 10 to 3000 seconds, more preferably 40 to 2500 seconds, and even more preferably 80 to 220 seconds. The pre-baking method is not particularly limited, but examples include a hot plate and a convection oven (a so-called hot air circulating dryer).

[0240] After pre-baking, further heat treatment (post-baking) may be performed. When post-baking is performed, the post-baking temperature is not particularly limited, but is preferably, for example, 100°C to 240°C. Furthermore, from the viewpoint of film hardening, for example, a post-baking temperature of 180°C to 240°C is more preferable. The post-bake time is not particularly limited, but is preferably 2 to 10 minutes, and more preferably 4 to 8 minutes. Post-baking methods are not particularly limited, but examples include hot plates and convection ovens (so-called hot air circulating dryers).

[0241] When manufacturing the optical filter of this disclosure, if the composition of this disclosure is a curable composition, the method for manufacturing the optical filter of this disclosure preferably includes a step of performing a curing treatment on the composition layer formed as described above. Applying a hardening treatment to the composition layer can improve the mechanical strength of the optical filter. The hardening treatment is not particularly limited, but examples include full-surface exposure treatment and full-surface heating treatment. In this disclosure, "exposure" includes not only irradiation with light of various wavelengths, but also irradiation with radiation such as electron beams and X-rays. Exposure is preferably performed by irradiation with radiation. The radiation is not particularly limited, but electron beams, KrF, ArF, ultraviolet light such as g-rays, h-rays, and i-rays, and visible light are particularly preferred. The exposure method is not particularly limited, and examples include stepper exposure and exposure using a high-pressure mercury lamp. The exposure dose is not particularly limited, but for example, 5 mJ / cm 2 ~3000 mJ / cm 2 It is preferable that this be the case. The lower limit is 10 mJ / cm². 2 It is more preferable that the concentration be 50 mJ / cm² or higher. 2 It is even more preferable that the levels be greater than or equal to the above. The upper limit is 2000 mJ / cm². 2 It is more preferable that the following conditions are met: 1000 mJ / cm² 2 The following is even more preferable:

[0242] The method for manufacturing an optical filter according to this disclosure may include a step of forming a pattern. Examples of pattern formation methods include a pattern formation method using photolithography and a pattern formation method using dry etching.

[0243] [Image forming materials] The image-forming material of this disclosure includes a compound represented by formula (1) described above or a tautomer thereof (i.e., the compound of this disclosure). The image-forming material disclosed herein is particularly suitable for use as an image recording material for recording invisible images. Specific examples of image-forming materials include inkjet recording materials, thermal recording materials, pressure-sensitive recording materials, recording materials using electrophotographic methods, transfer-type silver halide photosensitive materials, printing inks, recording pens, and stamps. Among these, the image-forming materials disclosed herein are particularly suitable for use as inkjet recording materials or recording materials using electrophotographic methods.

[0244] The image-forming material disclosed herein preferably includes a liquid medium. The liquid medium is not particularly limited, and for example, the same solvent as in the composition of this disclosure can be used. The liquid medium when the image-forming material of this disclosure is an aqueous composition will be described later.

[0245] The image-forming material of the present disclosure may contain the compound of the present disclosure dissolved in a liquid medium, or it may contain the compound dispersed in a liquid medium as solid particles.

[0246] Image-forming materials containing the compounds of this disclosure as solid particles can be prepared by dispersing the compounds of this disclosure in a liquid medium using a dispersion device. The distributed device is not particularly limited, and conventionally known distributed devices can be used. Specific examples of dispersion devices include ball mills, sand mills, bead mills, roll mills, jet mills, paint shakers, attritors, ultrasonic dispersers, and dispersers.

[0247] The volume-average particle diameter of the particles is not particularly limited, but is preferably 10 nm to 250 nm, more preferably 20 nm to 250 nm, and even more preferably 30 nm to 230 nm. When the volume-average particle diameter of the particles is within the above range, the storage stability of the image-forming material is improved, and sufficient optical density can be obtained.

[0248] The volume-average particle size of the particles is measured using a particle size distribution analyzer employing dynamic light scattering. For example, a particle size distribution analyzer manufactured by Microtrac-Bell Co., Ltd. (product name: UPA-EX150) can be used. However, the analyzer is not limited to this.

[0249] The image-forming material of this disclosure may contain only one of the compounds of this disclosure, or it may contain two or more of them.

[0250] The content of the compound of this disclosure in the image-forming material is not particularly limited and can be set as appropriate depending on the purpose. Generally, from the viewpoint of being able to sufficiently exhibit infrared absorption ability, the content of the compound of this disclosure in the image-forming material is preferably 0.001% to 30% by mass, more preferably 0.01% to 10% by mass, and even more preferably 0.05% to 5% by mass, based on the total mass of the image-forming material.

[0251] When the image-forming material of this disclosure is an aqueous composition, examples of the liquid medium include water and a mixture of water and an organic solvent.

[0252] The water content in the liquid medium is preferably 30% to 100% by mass, and more preferably 50% to 100% by mass, relative to the total mass of the liquid medium.

[0253] While there are no particular limitations on the type of water, distilled water, deionized water, deionized distilled water, and pure water are preferred, for example, from the viewpoint of having fewer impurities.

[0254] When the liquid medium contains an organic solvent in addition to water, the organic solvent may include, for example, alcohol compounds such as methanol, ethanol, propanol, isopropanol, butanol, isobutanol, sec-butanol, t-butanol, pentanol, hexanol, cyclohexanol, and benzyl alcohol; polyhydric alcohol compounds such as ethylene glycol, diethylene glycol, triethylene glycol, polyethylene glycol, propylene glycol, dipropylene glycol, polypropylene glycol, butylene glycol, hexanediol, pentanediol, glycerin, hexanetriol, and thiodiglycol; ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, diethylene glycol monomethyl ether, diethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monobutyl ether, dipropylene glycol monomethyl ether, and triethylene Examples include glycol derivatives such as ethylene glycol monomethyl ether, ethylene glycol diacetate, ethylene glycol monomethyl ether acetate, triethylene glycol monoethyl ether, ethylene glycol monophenyl ether, 3-methyl-3-methoxybutanol, and 3-methoxybutanol; amine compounds such as ethanolamine, diethanolamine, triethanolamine, N-methyldiethanolamine, N-ethyldiethanolamine, morpholine, N-ethylmorpholine, ethylenediamine, diethylenetriamine, triethylenetetramine, polyethyleneimine, and tetramethylpropylenediamine; and organic solvents that are soluble in water, such as formamide, N,N-dimethylformamide, N,N-dimethylacetamide, dimethyl sulfoxide, sulfolane, 2-pyrrolidone, N-methyl-2-pyrrolidone, N-vinyl-2-pyrrolidone, 2-oxazolidone, 1,3-dimethyl-2-imidazolidinone, acetonitrile, acetone, methyl ethyl ketone, tetrahydrofuran, and butyl cellosolve.

[0255] If the image-forming material of the present disclosure is an aqueous composition, the image-forming material of the present disclosure may further contain an aqueous resin. Examples of aqueous resins include resins that dissolve in water, water-dispersible resins that disperse in water, colloidal dispersion resins, and mixtures thereof.

[0256] Here, "water-soluble resin" refers to a resin that dissolves in water at 25°C at a concentration of 1% by mass or more. Specific examples of water-soluble resins include gelatin, vinyl resins (e.g., polyvinyl alcohol), and water-soluble cellulose derivatives (e.g., carboxymethylcellulose).

[0257] Examples of water-dispersible resins include hydrophobic synthetic resins. Specific examples of water-dispersible resins include acrylic resins, styrene-acrylic resins, vinyl resins, polyurethanes, polyesters, polyamides, and fluororesins. Examples of acrylic resins include homopolymers or copolymers obtained by polymerization of at least one monomer selected from the group consisting of acrylic acid, acrylic acid ester compounds (e.g., alkyl acrylate), acrylamide, acrylonitrile, methacrylic acid, methacrylic acid ester compounds (e.g., alkyl methacrylate), methacrylamide, and methacrylonitrile. Among these, as the acrylic resin, a homopolymer or copolymer obtained by polymerization of at least one monomer selected from the group consisting of acrylic acid ester compounds and methacrylic acid ester compounds is preferred, and a homopolymer or copolymer obtained by polymerization of at least one monomer selected from the group consisting of acrylic acid ester compounds and methacrylic acid ester compounds having an alkyl group having 1 to 6 carbon atoms is more preferred.

[0258] If the image-forming material of this disclosure further includes an aqueous resin, the aqueous resin may be included as an aqueous dispersion of resin particles.

[0259] Commercially available products can be used as aqueous dispersions of resin particles. Examples of commercially available aqueous dispersions of resin particles include: Superflex 830, 460, 870, 420, and 420NS [manufactured by Daiichi Kogyo Seiyaku Co., Ltd.; polyurethane], Bondic 1370NS and 1320NS [manufactured by DIC Corporation; polyurethane], Hydran Hw140SF, WLS201, WLS202, and WLS213 [manufactured by DIC Corporation; polyurethane], Olestar UD350, UD500, and UD600 [manufactured by Mitsui Chemicals, Inc.; polyurethane], Neolets R972, R966, and R9660 [manufactured by Kusumoto Kasei Co., Ltd.; polyurethane], Finetex Es650 and Es2200 [manufactured by DIC Corporation; polyester], and Byronal (registered trademark). Examples include MD1100, MD1400, and MD1480 [manufactured by Toyobo Co., Ltd.; polyester], Jurimar (registered trademark) ET325, ET410, AT-613, and SEK301 [manufactured by Nippon Junyaku Kogyo Co., Ltd.; acrylic resin], Boncoat AN117 and AN226 [manufactured by DIC Corporation; acrylic resin], Luxstar DS616 and DS807 [manufactured by DIC Corporation; styrene-butadiene rubber], Nippol LX110, LX206, LX426, and LX433 [manufactured by Nippon Zeon Co., Ltd.; styrene-butadiene rubber], and Nippol LX513, LX1551, LX550, and LX1571 [manufactured by Nippon Zeon Co., Ltd.; acrylonitrile-butadiene rubber].

[0260] The image-forming material disclosed herein preferably further contains a surfactant. If the image-forming material of this disclosure further contains a surfactant, for example, the dispersibility of particles may be improved. Also, if the image-forming material of this disclosure further contains a surfactant, for example, the quality of the formed image may be improved. The surfactant in the image-forming material of this disclosure is synonymous with the surfactant in the composition of this disclosure, and the preferred embodiment is also the same; therefore, a detailed explanation is omitted here.

[0261] If the image-forming material of the Disclosure is an ink, the image-forming material of the Disclosure comprises the compound and liquid medium of the Disclosure. Specific examples of inks include lithographic inks, inkjet inks, UV-curing inks, inks for writing instruments (e.g., ballpoint pens), toners, inks for vermilion ink pads, inks for self-inking stamps, textile printing inks, letterpress inks, intaglio inks (e.g., gravure printing), stencil printing inks (e.g., screen printing), and flexographic inks. When the image-forming material of the present disclosure is an ink, the compound of the present disclosure is preferably dispersed as solid particles in a liquid medium, and the liquid medium is preferably water or a mixture of water and an organic solvent.

[0262] If the image-forming material of the present disclosure is an ink, the image-forming material of the present disclosure may contain various additives as necessary, provided that they do not impair the effects of the present disclosure. Examples of additives include resins, drying inhibitors (so-called wetting agents), colorfastness inhibitors, emulsifying stabilizers, penetration enhancers, preservatives, fungicides, pH adjusters, surface tension adjusters, defoamers, viscosity modifiers, dispersants, dispersion stabilizers, rust inhibitors, and chelating agents. Furthermore, the fade-preventing agent is used to improve the preservation of images formed by the ink, which is an image-forming material of this disclosure. Examples of resins include those similar to the resins in the compositions of this disclosure. The additives can be directly incorporated into the image-forming material of this disclosure if the image-forming material of this disclosure is an aqueous composition.

[0263] The recording medium used when forming an image with the image-forming material of the present disclosure is not particularly limited, but examples include ordinary uncoated paper, coated paper and other types of paper, resin films formed from various non-absorbent resin materials used in so-called flexible packaging, and metal foils. Specific examples of paper include pure white roll paper, kraft paper, cardboard, fine paper, OCR paper, art paper, coated paper, mirror-coated paper, condenser paper, and paraffin paper. Specific examples of resin films include polyester film, polypropylene (PP) film, cellophane, acetate film, polycarbonate (PC) film, acrylic resin film, polyethylene terephthalate (PET) film, biaxially oriented polystyrene (OPS) film, biaxially oriented polypropylene (OPP) film, biaxially oriented nylon (ONy) film, polyvinyl chloride (PVC) film, polyethylene (PE) film, and triacetate (TAC) film. Other recording media include laminated paper, which is paper coated with resin, and composite substrates, which have a metal layer such as copper or aluminum formed on paper or resin film. [Examples]

[0264] The present disclosure will be described in detail below with reference to examples. However, the present disclosure is not limited to the following examples.

[0265] [Synthesis of Compounds] (Example 1: Synthesis of compound Y-2) Compound Y-2 was synthesized as follows.

[0266] [ka]

[0267] 645 mg of compound I-1, 376 mg of compound I-2, 5 mL of n-butanol, and 5 mL of toluene were added to a 50 mL round-bottom flask. The mixture was heated under reflux for 4 hours while removing the resulting water using a Dean-Stark trap. The reaction mixture was cooled to 22°C and concentrated under reduced pressure. 20 mL of methanol was added to the residue, and the precipitated crystals were collected by filtration. Recrystallization was performed using 10 mL of acetonitrile to obtain 169 mg of compound Y-2.

[0268] 1 ¹H-NMR confirmed that compound Y-2 has the following structure.

[0269] [ka]

[0270] The Y-2NMR data for the compound is shown below.

[0271] (Compound Y-2) 1 H-NMR(CDCl3) δ = 10.89 (br.s, 1H), 10.40 (br.s, 1H), 10.11 (br.s, 1H), 8.45 (s, 1H), 8.22 (t, 1H), 8.07 (d, 1H), 8.01-7.91 (m, 3H), 7.66 (t, 1H), 7.53 (t, 1H), 7.38 (d, 1H), 7.31 (t, 1H), 6.85 (d, 1H), 6.75 (d, 1H), 6.73-6.64 (m, 2H), 6.38 (d, 1H), 6.09 (s, 1H), 4.35-4.16 (m, 3H), 2.11-1.69 (m, 15H), 2.01 (s, 6H), 1.16-0.92 (m, 30H)

[0272] (Example 2: Synthesis of compound Y-44) Compound Y-44 was synthesized as follows.

[0273] [ka]

[0274] 672 mg of compound I-1, 566 mg of compound I-2, 6 mL of n-butanol, and 6 mL of toluene were added to a 50 mL round-bottom flask. The mixture was heated under reflux for 6 hours while removing the generated water using a Dean-Stark trap. The reaction mixture was cooled to 23°C and concentrated under reduced pressure. The residue was purified by silica gel chromatography to obtain 406 mg of compound Y-44.

[0275] 1¹H-NMR confirmed that compound Y-44 has the following structure.

[0276] [ka]

[0277] The Y-44 NMR data for the compound is shown below.

[0278] (Compound Y-44) 1 H-NMR(CDCl3) δ = 10.50 (br.s, 2H), 9.88 (br.s, 2H), 8.29-7.80 (m, 12H), 7.61 (t, 2H), 7.48 (t, 2H), 7.35 (d, 2H),6.61 (d, 2H), 6.16 (s,2H), 4.29 (t, 4H), 2.17-1.60 (m, 18H), 1.99 (s, 12H), 1.10-0.90 (m, 36H)

[0279] (Example 3: Synthesis of Compound Y-35) Compound Y-35 was synthesized as follows.

[0280] [ka]

[0281] 643 mg of compound I-1, 305 mg of compound I-3, 4 mL of n-butanol, and 6 mL of toluene were added to a 50 mL round-bottom flask. The mixture was heated under reflux for 3 hours while removing the resulting water using a Dean-Stark trap. The reaction mixture was cooled to 26°C and concentrated under reduced pressure. The residue was purified by silica gel chromatography to obtain 360 mg of compound Y-35.

[0282] 1 ¹H-NMR confirmed that compound Y-35 has the following structure.

[0283] [ka]

[0284] The Y-35 NMR data for the compound is shown below.

[0285] (Compound Y-35) 1 H-NMR(CDCl3) δ = 11.17 (br.s, 1H), 10.91 (s, 1H), 10.19 (br.s,1H), 8.60 (s, 1H), 8.32 (d, 1H), 8.16 (d, 1H), 8.09 (s, 1H), 7.94 (d, 1H), 7.58 (d, 1H), 7.47 (d, 1H), 7.32 (t, 1H), 6.82 (d, 1H), 6.74 (d, 1H), 6.71-6.61 (m, 2H), 6.40 (s,1H), 4.33 (br.s, 1H), 3.33 (s, 3H), 3.12 (m, 1H), 2.54 (s, 3H), 2.23-1.74 (m, 12H), 1.38 (d, 6H), 1.14-0.95 (m, 24H)

[0286] (Example 4: Synthesis of Compound Y-55) Compound Y-55 was synthesized as follows.

[0287] [ka]

[0288] 644 mg of compound I-1, 652 mg of compound I-3, 4 mL of n-butanol, and 8 mL of toluene were added to a 50 mL round-bottom flask. The mixture was heated under reflux for 2 hours while removing the water generated using a Dean-Stark trap. Further, 242 mg of compound I-3 was added, and heating under reflux was continued for 6 hours while removing the water generated. The reaction mixture was cooled to 22°C and concentrated under reduced pressure. The residue was purified by silica gel chromatography to obtain 73 mg of compound Y-55.

[0289] 1 ¹H-NMR confirmed that compound Y-55 has the following structure.

[0290] [ka]

[0291] The Y-55 NMR data for the compound is shown below.

[0292] (Compound Y-55) 1 H-NMR(CDCl3) δ = 10.76 (br.s, 2H), 10.61 (br.s, 2H), 8.64 (s, 2H), 8.40 (d, 2H), 8.15-7.96 (m, 4H), 7.69-7.51 (m, 4H), 6.72-6.63 (m, 4H), 3.35 (s, 6H), 3.15 (m, 2H), 2.55 (s, 6H), 2.23-1.91 (m, 12H), 1.39 (d, 12H), 1.06 (d, 24H)

[0293] (Comparative Example 1: Comparative Compound R-1) Comparative compound R-1, having the structure shown below, was used.

[0294] (Comparative Example 2: Comparative Compound R-2) A comparative compound R-2 having the following structure was used.

[0295] (Comparative Example 3: Comparative Compound R-3) Comparative compound R-3, having the structure shown below, was used.

[0296] [ka]

[0297] <Spectroscopic properties> The absorption spectra of each compound in Examples 1-4 and Comparative Examples 1-3 were measured according to the following procedure, and the maximum absorption wavelength (λmax) and molar extinction coefficient (ε) were determined. The results are shown in Table 1. Chloroform is used as the solvent, and the concentration in the chloroform is 5 × 10 -6 Solutions were prepared by dissolving the compound to a concentration of mol / L (liter; the same applies hereafter). Each prepared solution was placed in a 1 cm cell, and the absorption spectrum was measured using a spectrophotometer (product name: UV-3600, manufactured by Shimadzu Corporation) as the measuring device.

[0298] [Table 1]

[0299] [Manufacturing of laminates] (Example 5) 4.2 mg of compound Y-2 and 1.1 g of Dianal® BR-80 [Resin type: polymethyl methacrylate (PMMA), manufactured by Mitsubishi Chemical Corporation] were added to 7.6 g of chloroform and stirred and mixed at room temperature for 30 minutes to obtain a resin composition. The obtained resin composition was spin-coated onto a glass plate serving as a transparent support and dried at 100°C for 2 minutes. In this manner, a laminate comprising a film (thickness: 10 μm) which is a cured product of the resin composition was obtained on the transparent support.

[0300] (Example 6) In Example 5, the same procedure as in Example 5 was followed, except that compound Y-44 3.1 mg was used instead of compound Y-2 4.2 mg, to obtain a laminate comprising a film (thickness: 10 μm) which is a cured product of the resin composition on a transparent support.

[0301] (Example 7) In Example 5, the same procedure as in Example 5 was performed, except that 2.6 mg of compound Y-35 was used instead of 4.2 mg of compound Y-2, to obtain a laminate comprising a film (thickness: 10 μm) which is a cured product of the resin composition on a transparent support.

[0302] (Example 8) In Example 5, the same procedure as in Example 5 was followed, except that 3.1 mg of compound Y-55 was used instead of 4.2 mg of compound Y-2. A laminate comprising a film (thickness: 10 μm) which is a cured product of the resin composition was obtained on a transparent support.

[0303] (Comparative Example 4) In Example 5, the same procedure was followed as in Example 5, except that 2.1 mg of comparative compound R-1 was used instead of 4.2 mg of compound Y-2. A laminate comprising a film (thickness: 10 μm), which is a cured product of the resin composition, was obtained on a transparent support.

[0304] (Comparative Example 5) In Example 5, the same procedure as in Example 5 was performed, except that 2.6 mg of comparative compound R-2 was used instead of 4.2 mg of compound Y-2, to obtain a laminate comprising a film (thickness: 10 μm) which is a cured product of the resin composition on a transparent support.

[0305] (Comparative Example 6) In Example 5, the same procedure was followed as in Example 5, except that 2.6 mg of comparative compound R-3 was used instead of 4.2 mg of compound Y-2. A laminate comprising a film (thickness: 10 μm), which is a cured product of the resin composition, was obtained on a transparent support.

[0306] [evaluation] <Lightfastness> The light resistance of the films in each laminate of Examples 5-8 and Comparative Examples 4-6 was evaluated by light irradiation under the following conditions. Specifically, the following procedures were performed. The absorbance of the film in the laminate at its maximum absorption wavelength (λmax) (hereinafter referred to as "absorbance at λmax before light irradiation") was measured using a spectrophotometer [product name: UV-3600, manufactured by Shimadzu Corporation]. Next, the film on the laminate was irradiated with light under the following conditions, and the absorbance of the film at the maximum absorption wavelength (λmax) one hour after light irradiation (hereinafter referred to as "absorbance at λmax after light irradiation") was measured using a spectrophotometer [product name: UV-3600, manufactured by Shimadzu Corporation] as the measuring device. The percentage of absorbance remaining was calculated from the absorbance at λmax before and after light irradiation, using the following formula. The results are shown in Table 2. A higher percentage of absorbance retention indicates a higher retention rate of the compound contained in the film (for example, compound Y-2 in Example 5), and thus superior lightfastness.

[0307] Absorbance retention rate (%) = [Absorbance at λmax after light irradiation / Absorbance at λmax before light irradiation] × 100

[0308] -conditions- Test equipment: Xenon weather meter XL75Z [product name, manufactured by Suga Test Instruments Co., Ltd.] Irradiance: 10klx (40w / m 2 ) Irradiation time: 1 hour Tank temperature: 23℃ Humidity inside the tank: 5%RH

[0309] In addition, the color of the laminate before light irradiation was observed visually, and the absorbance of the laminate at 500 nm before light irradiation was measured. The results are shown in Table 2.

[0310] [Table 2]

[0311] As shown in Table 2, the laminates of Examples 5 to 8, which included a film containing the compound represented by formula (1), all showed high absorbance retention rates, confirming that the compound represented by formula (1) has excellent lightfastness. On the other hand, the laminate of Comparative Example 4, which has a film containing comparative compound R-1, and the laminate of Comparative Example 5, which has a film containing comparative compound R-2, both showed lower absorbance retention rates compared to the laminate of the example, confirming that the lightfastness of comparative compound R-1 and comparative compound R-2 is inferior to that of the compound represented by formula (1). The laminate of Comparative Example 5, which included a film containing comparative compound R-2, and the laminate of Comparative Example 6, which included a film containing comparative compound R-3, both exhibited more pronounced coloration compared to the laminate of the example. This confirmed that comparative compounds R-2 and R-3 were inferior to the compound represented by formula (1) in suppressing coloration in the visible range.

[0312] The disclosure of Japanese Patent Application No. 2021-133007, filed on 17 August 2021, is incorporated herein by reference in its entirety. All documents, patent applications, and technical standards described herein are incorporated by reference in the same manner as if each individual document, patent application, and technical standard were specifically and individually incorporated by reference.

Claims

1. A compound represented by the following formula (1) or a tautomer thereof. 【Chemistry 1】 In formula (1), R １ , R ２ , R ３ , and R ４ each independently represents a hydrogen atom, an alkyl group, or an aryl group, and R ５ , R ６ , R ７ , and R ８ each independently represents a hydrogen atom, an alkyl group, or an aryl group, and R １０ , R １１ , R １２ , R １３ , R １４ , R １５ , R １６ , and R １７ each independently represents a hydrogen atom, a halogen atom, a nitro group, an alkyl group, an aryl group, a hydroxy group, an alkoxy group, an aryloxy group, an acyloxy group, a cyano group, a carboxy group, an alkoxycarbonyl group, a carbamoyl group, an acyl group, an amino group, an amide group, a carbamoylamino group, an alkoxycarbonylamino group, a sulfonamide group, a sulfo group, a sulfamoyl group, an alkylthio group, or an arylthio group, and R ２０ represents a hydrogen atom, a halogen atom, a nitro group, an alkyl group, an aryl group, a hydroxy group, an alkoxy group, an aryloxy group, an acyloxy group, a cyano group, a carboxy group, an alkoxycarbonyl group, a carbamoyl group, an acyl group, an amino group, an amide group, a carbamoylamino group, an alkoxycarbonylamino group, a sulfonamide group, a sulfo group, a sulfamoyl group, an alkylthio group, an arylthio group, or a group represented by the following formula (2), and A is a group represented by the following formula (A-2) or a group represented by formula (A-4). In formula (2), B represents a cationic aromatic hydrocarbon group, a cationic heterocyclic group, or a cationic heterocyclic methine group, and * represents the bond position. 【Chemistry 2】 In formula (1), R １ and R ２ , and R ３ and R ４ These may each be bonded together to form a ring, R １ and R ５ , R ２ and R ６ , R ３ and R ７ , and R ４ and R ８ These may each be bonded together to form a ring, R １０ , R １１ , R １２ , R １３ , R １４ , R １５ , R １６ , R １７ , and R ２０ Each of these groups may bond with an adjacent group to form a ring. 【Transformation 3】 In formulas (A-2) and (A-4), R 107, R 109, R 111, and R 112 each represent a hydrogen atom, R 108, R 110, and R 113 each independently represent an alkyl group, R 117 and R 118 each bond to an adjacent group to form a benzene ring or a naphthalene ring, the benzene ring or naphthalene ring is substituted with an alkyl group, a halogen atom, or an alkoxy group, R 119 represents an alkyl group, X represents -O-, -S-, -CH=CH-, or -CR 125 R 126-, R 125 and R 126 each independently represent an alkyl group, and R 117 bonds to a carbon atom and R 118 The bond between the atom to which the atom is bonded represents either a single or double bond, and * indicates the bond position. However, this excludes compounds that fall under [a] and [b] below, as well as their tautomers. [a] In formula (1), A is a group represented by the following formula (P), and R ２０ is a hydrogen atom, R １ and R ３ They are identical, and R ２ and R ４ They are identical. [b] In formula (1), A is a group represented by the following formula (P), and R ２０ A is the group represented by formula (2) above, B is the group represented by the following formula (Q), and R １ and R ３ They are identical, and R ２ and R ４ They are identical. 【Chemistry 4】 In formula (P), R １ and R ２ Each of these independently represents a hydrogen atom, an alkyl group, or an aryl group, and R ５ and R ６ Each of these independently represents a hydrogen atom, an alkyl group, or an aryl group, and R １４ , R １５ , R １６ , and R １７ Each of these independently represents a hydrogen atom, a halogen atom, a nitro group, an alkyl group, an aryl group, a hydroxyl group, an alkoxy group, an aryloxy group, an acyloxy group, a cyano group, a carboxyl group, an alkoxycarbonyl group, a carbamoyl group, an acyl group, an amino group, an amide group, a carbamoylamino group, an alkoxycarbonylamino group, a sulfonamide group, a sulfo group, a sulfamoyl group, an alkylthio group, or an arylthio group. ２０ * represents a hydrogen atom, halogen atom, nitro group, alkyl group, aryl group, hydroxy group, alkoxy group, aryloxy group, acyloxy group, cyano group, carboxy group, alkoxycarbonyl group, carbamoyl group, acyl group, amino group, amide group, carbamoylamino group, alkoxycarbonylamino group, sulfonamide group, sulfo group, sulfamoyl group, alkylthio group, arylthio group, or a group represented by formula (2) above, and * represents the bond position. 【Transformation 5】 In formula (Q), R １ and R ２ Each of these independently represents a hydrogen atom, an alkyl group, or an aryl group, and R ５ and R ６ Each of these independently represents a hydrogen atom, an alkyl group, or an aryl group, and R １４ , R １５ , R １６ , and R １７ Each of these independently represents a hydrogen atom, halogen atom, nitro group, alkyl group, aryl group, hydroxy group, alkoxy group, aryloxy group, acyloxy group, cyano group, carboxy group, alkoxycarbonyl group, carbamoyl group, acyl group, amino group, amide group, carbamoylamino group, alkoxycarbonylamino group, sulfonamide group, sulfo group, sulfamoyl group, alkylthio group, or arylthio group, and * indicates the bond position.

2. The compound according to claim 1 or a tautomer thereof, wherein B in formula (2) is a group represented by the following formula (B-1), a group represented by the formula (B-2), a group represented by the formula (B-3), a group represented by the formula (B-4), or a group represented by the formula (B-5). 【Transformation 6】 In formulas (B-1), (B-2), (B-3), (B-4), and (B-5), R ２０１ , R ２０２ , R ２０３ , R ２０４ , R ２０５ , R ２０６ , R ２０７ , R ２０８ , R ２０９ , R ２１０ , R ２１１ , R ２１２ , R ２１３ , R ２１４ , R ２１５ , R ２１６ , R ２１７ , R ２１８ , R ２１９ , R ２２０ , R ２２１ , R ２２２ , R ２２３ , and R ２２４ each independently represents a hydrogen atom, a halogen atom, a nitro group, an alkyl group, an aryl group, a hydroxy group, an alkoxy group, an aryloxy group, an acyloxy group, a cyano group, a carboxy group, an alkoxycarbonyl group, a carbamoyl group, an acyl group, an amino group, an amide group, a carbamoylamino group, an alkoxycarbonylamino group, a sulfonamide group, a sulfo group, a sulfamoyl group, an alkylthio group, or an arylthio group; X represents -O-, -S-, -CH=CH-, or -CR ２２５ R ２２６ -; R ２２５ and R ２２６ represent an alkyl group; the bond between the carbon atom to which R ２１７ is attached and the carbon atom to which R ２１８ is attached represents a single bond or a double bond; * represents the bonding position; R ２０１ , R ２０２ ] , R ２０３ , R ２０４ , R ２０５ , R ２０６ , R ２０７ , R ２０８ , R ２０９ , R ２１０ , R ２１１ , R ２１２ , R ２１３ , R ２１４ , R ２１５ , R ２１６ , R ２１７ , R ２１８ , R ２１９ , R ２２０ , R ２２１ , R ２２２ , R ２２３ , R ２２４ , R ２２５ , and R ２２６ Each of these groups may bond with an adjacent group to form a ring.

3. R in formula (1) ５ , R ６ , R ７ , and R ８ However, the compound according to claim 2, or a tautomer thereof, which represents a hydrogen atom.

4. R in formula (1) １０ , R １１ , R １２ , R １３ , R １４ , R １５ , R １６ , and R １７ However, the compound according to claim 2, or a tautomer thereof, which represents a hydrogen atom.

5. R in formula (1) ２０ The compound according to claim 2 or a tautomer thereof, wherein the compound represents a hydrogen atom or a group represented by formula (2).

6. A composition comprising the compound described in any one of claims 1 to 5 or a tautomer thereof.

7. The composition according to claim 6, further comprising a resin.

8. The composition according to claim 6, which is a curable composition.

9. The composition according to claim 6, which is a near-infrared absorbing material.

10. A laminate comprising a support and a film provided on the support and formed from the composition described in claim 6.

11. An optical filter comprising the compound described in any one of claims 1 to 5 or a tautomer thereof.

12. An image-forming material comprising the compound described in any one of claims 1 to 5 or a tautomer thereof.

13. A method for producing the compound or its tautomer according to any one of claims 2 to 5, A method for producing a compound or a tautomer thereof, comprising reacting a compound represented by the following formula (3) with a compound represented by the following formula (4). 【Transformation 7】 In formula (3), R １ , R ２ , R ３ , and R ４ Each of these independently represents a hydrogen atom, an alkyl group, or an aryl group, and R ５ , R ６ , R ７ , and R ８ Each of these independently represents a hydrogen atom, an alkyl group, or an aryl group, and R １０ , R １１ , R １２ , R １３ , R １４ , R １５ , R １６ , and R １７ Each of these independently represents a hydrogen atom, a halogen atom, a nitro group, an alkyl group, an aryl group, a hydroxyl group, an alkoxy group, an aryloxy group, an acyloxy group, a cyano group, a carboxyl group, an alkoxycarbonyl group, a carbamoyl group, an acyl group, an amino group, an amide group, a carbamoylamino group, an alkoxycarbonylamino group, a sulfonamide group, a sulfo group, a sulfamoyl group, an alkylthio group, or an arylthio group. ２０ This represents a hydrogen atom, a halogen atom, a nitro group, an alkyl group, an aryl group, a hydroxyl group, an alkoxy group, an aryloxy group, an acyloxy group, a cyano group, a carboxyl group, an alkoxycarbonyl group, a carbamoyl group, an acyl group, an amino group, an amide group, a carbamoylamino group, an alkoxycarbonylamino group, a sulfonamide group, a sulfo group, a sulfamoyl group, an alkylthio group, an arylthio group, or a group represented by formula (2) above. 【Transformation 8】 In formula (4), A is the group represented by formula (A-2) or the group represented by formula (A-4).

14. A in formula (4) is a group represented by formula (A-2), and R in formula (3) ２０ However, the group is represented by formula (2), and B in formula (2) is the group represented by formula (B-2), or In formula (4), A is the group represented by formula (A-4), and R is in formula (3). ２０ A method for producing the compound or tautomer thereof according to claim 13, wherein the group is represented by formula (2), and B in formula (2) is represented by the group (B-4).

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