Compound, acid generator, composition, cured product, method for producing cured product, pattern, and method for producing pattern

Abstract

Provided is a compound having a structure represented by general formula (A). (In formula (A), Ar is a C5-20 aromatic ring group constituting a ring, R31 represents a group represented by general formula (1), and R32 is a group represented by a formula selected from general formulas (IVa), (IVb), (IVc), (IVd), (IVe), (IVf), (IVg), and (IVh); see description for definitions of R33 and a to c.) (See description for disclosures in formulas) (see disclosures in description for symbols in formulas.)

Description

Compound, acid generator, composition, cured product, method for producing cured product, pattern, and method for producing pattern

[0001] The present disclosure relates to a compound that is suitably used as an acid generator, an acid generator containing the compound, a composition and a cured product thereof, a method for producing a cured product using the composition, a pattern, and a method for producing a pattern.

[0002] An acid generator is a substance that generates an acid upon irradiation with energy rays such as light, heat treatment, or the like. Patent Documents 1 and 2 disclose photoacid generators or thermal acid generators composed of sulfonic acid derivative compounds as acid generators. Patent Documents 1 and 2 also describe the use of acid generators with negative resists whose solubility in a developer is reduced by the formation of chemical bonds, such as polymerization or crosslinking, due to the acid generated from the acid generator, and positive resists whose solubility in a developer is increased by the action of acid, such as cleavage of chemical bonds of ester groups or acetal groups. Specific applications of the acid generators include semiconductors, overcoats, paints, adhesives, and inks.

[0003] JP 2016-169173 A

[0004] However, these acid generators have room for improvement in terms of acid generation sensitivity.

[0005] An object of the present invention is to provide a compound having excellent acid generation sensitivity.

[0006] As a result of extensive investigations to solve the above problems, the present inventors have found that an oxime sulfonate compound having a specific structure has excellent acid generation sensitivity, leading to the completion of the present invention.

[0007] That is, the present invention is a compound having a structure represented by the following general formula (A) (hereinafter, sometimes referred to as compound A).

[0008] (wherein Ar is an aromatic ring group having 5 to 20 carbon atoms constituting the ring, R 31 represents a group represented by the following general formula (1), 32is a group represented by a formula selected from the following general formulas (IVa), (IVb), (IVc), (IVd), (IVe), (IVf), (IVg) and (IVh), 33 is a halogen atom, a nitro group, a cyano group, -OR 34 , -COR 34 , -OCOR 34 , -COOR 34 , -SR 34 , -SOR 34 , -SO2R 34 , -NR 35 R 36 , -NR 35 COR 36 , -CONR 35 R 36 , an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, an unsubstituted or substituted heterocyclic ring-containing group having 2 to 20 carbon atoms, or a group in which one or more methylene groups in the hydrocarbon group or the heterocyclic ring-containing group are substituted with a divalent group selected from the following group Ia: 31 , R 32 or R 33 When there are a plurality of R 34 , R 35 and R 36 each independently represents a hydrogen atom, an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, an unsubstituted or substituted heterocycle-containing group having 2 to 20 carbon atoms, or a group in which one or more methylene groups in the hydrocarbon group or the heterocycle-containing group are substituted with a divalent group selected from the following group Ia, and R 34 , R 35 or R 36 When a plurality of groups are present, they may be the same or different, and the substituents substituting one or more hydrogen atoms in the hydrocarbon group having the substituent and the heterocycle-containing group having the substituent are atoms or groups selected from the following Group IIa, a represents an integer of 1 to 20, b represents an integer of 1 to 20, c represents an integer of 0 to 18, and the sum of a, b, and c is 21 or less. (In the formula, R 1represents an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, an unsubstituted or substituted heterocyclic ring-containing group having 2 to 20 carbon atoms, or a group in which one or more methylene groups in the hydrocarbon group or the heterocyclic ring-containing group have been replaced with a divalent group selected from the following group Ia, 2 represents a hydrogen atom, a halogen atom, a nitro group, a cyano group, an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, an unsubstituted or substituted heterocycle-containing group having 2 to 20 carbon atoms, or a group in which one or more methylene groups in the hydrocarbon group or the heterocycle-containing group are replaced with a divalent group selected from Group Ia below, wherein the substituents substituting one or more hydrogen atoms in the substituted hydrocarbon group and the substituted heterocycle-containing group are atoms or groups selected from Group IIa below, and * represents a bonding site. (In the formula, R 51 is OR 81 , N.R. 82 R 83 or a heterocyclic ring-containing group having 2 to 20 carbon atoms and unsubstituted or substituted, R 52 and R 53 are each independently R 81 OR 81 represents R 52 and R 53 may be bonded to form a ring, R 55 , R 56 , R 58 , R 59 , R 61 , R 62 , R 64 , R 65 , R 71 and R 73 represents an unsubstituted or substituted aryl group having 6 to 20 carbon atoms; R 54 , R 57 , R 60 , R 63 , R 66 , R 67 and R 72 each independently represents an unsubstituted or substituted arylene group having 6 to 20 carbon atoms or a single bond; 68represents an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms; R 69 and R 70 are each independently R 81 OR 81 represents R 81 , R 82 and R 83 each independently represent a hydrogen atom or an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, and * represents a bonding site.) Group Ia: -O-, -COO-, -OCO-, -CO-, -CO-CO-, -CO-CO-O-, -CS-, -S-, -SO-, -SO2-, -NR'-, -NR'-CO-, -CO-NR'-, -NR'-COO-, -OCO-NR'- or -SiR'R"-. Group IIa: a halogen atom, a cyano group, a nitro group, -CO-H, -OH, -SH, -NH2, -COOH or -S03H. R' and R" each independently represent a hydrogen atom or an unsubstituted aliphatic hydrocarbon group having 1 to 20 carbon atoms, and when there are multiple R's or R", they may be the same or different.)

[0009] The present invention also provides an acid generator containing the compound, a composition of the compound, a cured product of the composition, a method for producing a cured product by curing the composition, a pattern using the composition, and a method for producing a pattern.

[0010] According to the present invention, a compound having excellent acid generation sensitivity can be provided. The compound of the present invention is also excellent in that a pattern produced from a composition using the compound has high light transmittance in the visible light region. Furthermore, the present invention provides an acid generator having high acid generation sensitivity using the compound, a composition of the compound, a cured product of the composition, a method for producing a cured product by curing the composition, a pattern using the composition, and a method for producing a pattern.

[0011] The present invention relates to a compound, an acid generator, a composition, a cured product, a method for producing the cured product, a pattern, and a method for producing a pattern. The present invention will be described in detail below.

[0012] A. Compound First, the compound of the present invention will be described. One of the characteristics of the compound of the present invention is that it has a structure represented by the following general formula (A). In this embodiment, the compound of the present invention is represented by the following general formula (A).

[0013] (wherein Ar is an aromatic ring group having 5 to 20 carbon atoms constituting the ring, R 31 represents a group represented by the following general formula (1), 32 is a group represented by a formula selected from the following general formulas (IVa), (IVb), (IVc), (IVd), (IVe), (IVf), (IVg) and (IVh), 33 represents a halogen atom, a nitro group, a cyano group, -OR 34 , -COR 34 , -OCOR 34 , -COOR 34 , -SR 34 , -SOR 34 , -SO2R 34 , -NR 35 R 36 , -NR 35 COR 36 , -CONR 35 R 36 , an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, an unsubstituted or substituted heterocyclic ring-containing group having 2 to 20 carbon atoms, or a group in which one or more methylene groups in the hydrocarbon group or the heterocyclic ring-containing group are substituted with a divalent group selected from the following group Ia: 31 , R 32 or R 33 When there are a plurality of R 34 , R 35 and R 36 each independently represents a hydrogen atom, an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, an unsubstituted or substituted heterocycle-containing group having 2 to 20 carbon atoms, or a group in which one or more methylene groups in the hydrocarbon group or the heterocycle-containing group are substituted with a divalent group selected from the following group Ia, and R 34 , R 35 or R36 When a plurality of groups are present, they may be the same or different, and the substituents substituting one or more hydrogen atoms in the hydrocarbon group having the substituent and the heterocycle-containing group having the substituent are atoms or groups selected from the following Group IIa, a represents an integer of 1 to 20, b represents an integer of 1 to 20, c represents an integer of 0 to 18, and the sum of a, b, and c is 21 or less.

[0014] (In the formula, R 1 represents an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, an unsubstituted or substituted heterocyclic ring-containing group having 2 to 20 carbon atoms, or a group in which one or more methylene groups in the hydrocarbon group or the heterocyclic ring-containing group have been replaced with a divalent group selected from the following group Ia, 2 represents a hydrogen atom, a halogen atom, a nitro group, a cyano group, an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, an unsubstituted or substituted heterocycle-containing group having 2 to 20 carbon atoms, or a group in which one or more methylene groups in the hydrocarbon group or the heterocycle-containing group are replaced with a divalent group selected from Group Ia below, wherein the substituents substituting one or more hydrogen atoms in the substituted hydrocarbon group and the substituted heterocycle-containing group are atoms or groups selected from Group IIa below, and * represents a bonding site. (In the formula, R 51 is OR 81 , N.R. 82 R 83 or a heterocyclic ring-containing group having 2 to 20 carbon atoms and unsubstituted or substituted, R 52 and R 53 are each independently R 81 OR 81 represents R 52 and R 53 may be bonded to form a ring, R 55 , R 56 , R 58 , R 59 , R 61 , R 62 , R 64 , R 65, R 71 and R 73 represents an unsubstituted or substituted aryl group having 6 to 20 carbon atoms; R 54 , R 57 , R 60 , R 63 , R 66 , R 67 and R 72 each independently represents an unsubstituted or substituted arylene group having 6 to 20 carbon atoms or a single bond; 68 represents an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms; R 69 and R 70 are each independently R 81 OR 81 represents R 81 , R 82 and R 83 each independently represent a hydrogen atom or an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, and * represents a bonding site.) Group Ia: -O-, -COO-, -OCO-, -CO-, -CO-CO-, -CO-CO-O-, -CS-, -S-, -SO-, -SO2-, -NR'-, -NR'-CO-, -CO-NR'-, -NR'-COO-, -OCO-NR'- or -SiR'R"-. Group IIa: a halogen atom, a cyano group, a nitro group, -CO-H, -OH, -SH, -NH2, -COOH or -S03H. R' and R" each independently represent a hydrogen atom or an unsubstituted aliphatic hydrocarbon group having 1 to 20 carbon atoms, and when there are multiple R's or R", they may be the same or different.)

[0015] According to the present invention, the compound A has excellent acid generation sensitivity because it contains a group represented by a formula selected from the general formulas (IVa), (IVb), (IVc), (IVd), (IVe), (IVf), (IVg), and (IVh) (hereinafter also referred to as "formulas (IVa) to (IVh)"), such as a diketone group (hereinafter sometimes referred to as "IVa group, etc."), and a group represented by the general formula (1). The reason for this excellent acid generation sensitivity is not clear, but is presumed to be as follows. The compound A contains a structure having an IVa group, etc., and a group represented by the general formula (1) (hereinafter sometimes referred to as a specific structure), thereby increasing the light absorption efficiency around 365 nm. Furthermore, the structure of formula (1), which corresponds to the acid generating moiety, has excellent acid generating ability. Due to these factors, the compound A has excellent acid generation efficiency. The specific structure can achieve the desired sensitivity even with a small amount added, compared to a compound that does not have a combination of an IVa group or the like and a group represented by the general formula (1). As a result, the composition has excellent acid generation sensitivity. In addition, the compound A has high light transmittance in the visible light region due to the presence of the IVa group or the like. Therefore, it can be suitably used in resin compositions for forming parts that require transparency.

[0016] Compound A of the present invention will be described in detail below.

[0017] Examples of the halogen atom in the general formula (A) include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom.

[0018] The hydrocarbon group having 1 to 20 carbon atoms in the above general formula (A), formula (1), formulas (IVa) to (IVh), (Ara), (Arb), (Ara1), and (Arb1), and the following (A1) to (A3), is a hydrocarbon group that does not contain an aromatic hydrocarbon ring or a heterocycle, and may have a substituent. A hydrocarbon group having a substituent is a group having a structure in which one or more hydrogen atoms in the hydrocarbon group are substituted with a substituent. Preferred examples of the unsubstituted hydrocarbon group include aliphatic hydrocarbon groups, and specific examples include alkyl groups having 1 to 20 carbon atoms, alkenyl groups having 2 to 20 carbon atoms, cycloalkyl groups having 3 to 20 carbon atoms, and cycloalkylalkyl groups having 4 to 20 carbon atoms. Furthermore, examples of the substituted hydrocarbon group include groups in which one or more hydrogen atoms in the above-mentioned unsubstituted hydrocarbon group have been substituted with a substituent, and examples of the substituent include an atom or group selected from Group IIa, Group IIb, or Group IIc, i.e., a halogen atom, a cyano group, a nitro group, -CO-H, -OH, -SH, -NH, -COOH, or -SOH.

[0019] The alkyl group having 1 to 20 carbon atoms may be linear or branched. Examples of linear alkyl groups include methyl, ethyl, propyl, butyl, hexyl, heptyl, and octyl. Examples of branched alkyl groups include isopropyl, sec-butyl, tert-butyl, isobutyl, isopentyl, tert-pentyl, 2-hexyl, 3-hexyl, 2-heptyl, 3-heptyl, isoheptyl, tert-heptyl, isooctyl, tert-octyl, 2-ethylhexyl, nonyl, isononyl, decyl, dodecyl, tridecyl, tetradecyl, pentadecyl, hexadecyl, hebrotadecyl, and octadecyl.

[0020] The alkenyl group having 2 to 20 carbon atoms may be linear or branched. It may also be a terminal alkenyl group having an unsaturated bond at the terminal, or an internal alkenyl group having an internal unsaturated bond. Examples of terminal alkenyl groups include vinyl, allyl, 2-methyl-2-propenyl, 3-butenyl, 4-pentenyl, and 5-hexenyl. Examples of internal alkenyl groups include 2-butenyl, 3-pentenyl, 2-hexenyl, 3-hexenyl, 2-heptenyl, 3-heptenyl, 4-heptenyl, 3-octenyl, 3-nonenyl, 4-decenyl, 3-undecenyl, 4-dodecenyl, and 4,8,12-tetradecatrienyl allyl.

[0021] Examples of the cycloalkyl group having 3 to 20 carbon atoms include saturated monocyclic alkyl groups having 3 to 20 carbon atoms, saturated polycyclic alkyl groups having 3 to 20 carbon atoms, and groups having 4 to 20 carbon atoms in which one or more hydrogen atoms in the ring of these groups have been substituted with an alkyl group. Examples of the saturated monocyclic alkyl group include cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, cyclooctyl, cyclononyl, and cyclodecyl. Examples of the saturated polycyclic alkyl group include adamantyl, decahydronaphthyl, octahydropentalene, and bicyclo[1.1.1]pentanyl. Examples of the alkyl group substituting a hydrogen atom in the ring of a saturated monocyclic or saturated polycyclic alkyl group include the groups exemplified above as the alkyl group having 1 to 20 carbon atoms. Examples of groups in which one or more hydrogen atoms in the ring of a saturated polycyclic alkyl group have been substituted with an alkyl group include a bornyl group.

[0022] The cycloalkylalkyl group having 4 to 20 carbon atoms refers to a group having 4 to 20 carbon atoms in which a hydrogen atom of an alkyl group is substituted with a cycloalkyl group. The cycloalkyl group in the cycloalkylalkyl group may be monocyclic or polycyclic. Examples of cycloalkylalkyl groups having 4 to 20 carbon atoms and in which the cycloalkyl group is monocyclic include cyclopropylmethyl, 2-cyclobutylethyl, 3-cyclopentylpropyl, 4-cyclohexylbutyl, cycloheptylmethyl, cyclooctylmethyl, 2-cyclononylethyl, and 2-cyclodecylethyl. Examples of cycloalkylalkyl groups having 4 to 20 carbon atoms and in which the cycloalkyl group is polycyclic include 3-3-adamantylpropyl and decahydronaphthylpropyl.

[0023] Examples of the unsubstituted hydrocarbon group in which one or more hydrogen atoms are substituted with a substituent and the substituent is a halogen atom include halogenated alkyl such as trifluoromethyl, pentafluoroethyl, 2-chloroethyl, 2-bromoethyl, heptafluoropropyl, 3-bromopropyl, nonafluorobutyl, tridecafluorohexyl, heptadecafluorooctyl, 2,2,2-trifluoroethyl, 1,1-difluoroethyl, 1,1-difluoropropyl, 1,1,2,2-tetrafluoropropyl, 3,3,3-trifluoropropyl, 2,2,3,3,3-pentafluoropropyl, and 7H-dodecafluorohexyl; halogenated cycloalkyl such as norbornyl-1,1-difluoroethyl, norbornyltetrafluoroethyl, adamantane-1,1,2,2-tetrafluoropropyl, and bicyclo[2.2.1]heptane-tetrafluoromethyl; and halogenated cycloalkylalkyl such as norbornyl-1,1-difluoroethyl, norbornyltetrafluoroethyl, adamantane-1,1,2,2-tetrafluoropropyl, and bicyclo[2.2.1]heptane-tetrafluoromethyl.

[0024] In this specification, examples of the unsubstituted aliphatic hydrocarbon group having 1 to 20 carbon atoms represented by R′ and R″ include the same groups as those exemplified above as the hydrocarbon group having 1 to 20 carbon atoms.

[0025] In the present invention, when a hydrogen atom in a group is substituted with a substituent, the number of carbon atoms in the group defines the number of carbon atoms in the group after the substitution. For example, when a hydrogen atom in the above-mentioned alkyl group having 1 to 20 carbon atoms is substituted, the term "1 to 20 carbon atoms" refers to the number of carbon atoms after the hydrogen atom is substituted, not the number of carbon atoms before the hydrogen atom is substituted. Furthermore, in the present invention, the number of carbon atoms in a group in which a methylene group in a group having a specified number of carbon atoms is replaced with a divalent group defines the number of carbon atoms in the group before the substitution. For example, in this specification, the number of carbon atoms in a group in which a methylene group in an alkyl group having 1 to 20 carbon atoms is replaced with a divalent group is considered to satisfy the requirement of 1 to 20, regardless of the number of carbon atoms after the substitution. However, it is preferable that the number of carbon atoms in the group after the substitution with a methylene group satisfies the requirement of the number of carbon atoms in the group before the substitution.

[0026] The heterocycle-containing group having 2 to 20 carbon atoms in the above general formula (A), formula (1), formulas (IVa) to (IVh), (Ara), (Arb), (Ara1), and (Arb1), and the following formulas (A1) to (A3), is a heterocycle group or a group in which a heterocycle and a hydrocarbon group are bonded, and may have an aromatic hydrocarbon cycle-containing group, an aliphatic hydrocarbon group, or a substituent. In a group in which a heterocycle and a hydrocarbon group are bonded, the bond may be on the heterocycle or on the hydrocarbon group. A heterocycle-containing group having a substituent is a group in which one or more hydrogen atoms in the heterocycle-containing group are substituted with a substituent. The term "2 to 20 carbon atoms" refers to the number of carbon atoms in the entire heterocycle-containing group. In the case of a group in which a heterocycle and a hydrocarbon group are bonded, the number of carbon atoms in not only the heterocycle but also the hydrocarbon group is counted.

[0027] Examples of the unsubstituted heterocycle-containing group include heterocyclic groups such as a pyridyl group, a quinolyl group, a thiazolyl group, a tetrahydrofuran group, a dioxolanyl group, a tetrahydropyranyl group, a morpholylfuran group, a thiophene group, a methylthiophene group, a hexylthiophene group, a benzothiophene group, a pyrrole group, a pyrrolidine group, an imidazole group, an imidazolidine group, an imidazoline group, a pyrazole group, a pyrazolidine group, a piperidine group, a piperazine group, a pyrimidyl group, a furyl group, a thienyl group, a benzoxazol-2-yl group, a thiazole group, an isothiazole group, an oxazole group, an isoxazole group, and a morphonyl group, as well as groups in which one or more hydrogen atoms of an alkyl group are substituted with a heterocycle. Furthermore, examples of the substituted heterocycle-containing group include groups in which one or more hydrogen atoms in the unsubstituted heterocycle-containing group are substituted with a substituent, and examples of the substituent include a halogen atom, a cyano group, a nitro group, —CO—H, —OH, —SH, —NH, —COOH, and —SOH.

[0028] Furthermore, the unsubstituted heterocycle-containing group may be a group in which a heterocycle and an aromatic hydrocarbon ring of a monocyclic structure are linked together, or a group in which a heterocycle and an aromatic hydrocarbon ring of a condensed ring structure are linked together. Examples of the linking group linking two aromatic hydrocarbon rings include a single bond and a carbonyl group. Examples of the heterocycle-containing group in which a heterocycle and an aromatic hydrocarbon ring of a monocyclic structure are linked together include benzothiophene.

[0029] In the above general formula (A), formula (1), formulas (IVa) to (IVh), (Ara), (Arb), (Ara1) and (Arb1), and the following (A1) to (A3), the hydrocarbon group or the heterocycle-containing group in which one or more methylene groups have been replaced with a divalent group selected from the above group Ia, group Ib or group Ic does not have a structure in which a plurality of the divalent groups are adjacent to each other. The plurality of divalent groups here may be the same or different.

[0030] Examples of the hydrocarbon group in which one or more methylene groups have been replaced by a divalent group selected from Group Ia, Group Ib, or Group Ic include a 10-camphoryl group, which is a hydrocarbon group in which a methylene group in a bornyl group has been replaced by —CO—.

[0031] Examples of the unsubstituted aryl group having 6 to 20 carbon atoms in formulas (IVa) to (IVh) include a phenyl group, a methylphenyl group, an ethylphenyl group, and a naphthyl group. Examples of the unsubstituted arylene group having 6 to 20 carbon atoms in formulas (IVa) to (IVh) include a phenylene group, a methylphenylene group, an ethylphenylene group, and a naphthylene group. Examples of the substituent in the aryl group or arylene group having a substituent include a halogen atom, a cyano group, a nitro group, -CO-H, -OH, -SH, -NH, -COOH, or -SOH.

[0032] In the general formula (A) contained in compound A, a is preferably 1 to 20, more preferably 1 to 10, even more preferably 1 or 2, and most preferably 1. Having a number within the above range makes compound A a compound with superior acid generation sensitivity. Furthermore, this is because compound A is easily synthesized and an acid generator with superior acid generation sensitivity can be easily formed. In the general formula (A) contained in compound A, b is preferably 1 to 20, more preferably 1 to 10, even more preferably 1 or 2, and most preferably 1. Having a number within the above range makes compound A a compound with superior acid generation sensitivity. Furthermore, this is because compound A is easily synthesized and an acid generator with superior acid generation sensitivity can be easily formed. In the general formula (A) contained in compound A, c is preferably 0 to 18, more preferably 0 to 10, even more preferably 0 to 3, and even more preferably 0 or 1. Having a number within the above range makes compound A a compound with superior acid generation sensitivity. In addition, it is easy to synthesize and to form an acid generator having excellent acid generation sensitivity. The total of a, b, and c is preferably 21 or less, more preferably 10 or less, even more preferably 5 or less, and most preferably 2 or more and 3 or less, provided that the total is a number that can be bonded to the aromatic ring group Ar. When the total of a, b, and c is within the above range, compound A becomes a compound having excellent acid generation sensitivity. In addition, it is easy to synthesize and to form an acid generator having excellent acid generation sensitivity.

[0033] In formula (A), R 31 , R 32 and R 33 are all bonded to an aromatic ring constituting an aromatic ring group. 31 is a group represented by the general formula (1). 1The substituents substituting one or more hydrogen atoms in the hydrocarbon group having the above substituent and the heterocyclic ring-containing group having the above substituent are preferably halogen atoms, more preferably fluorine atoms, because this facilitates the formation of an acid generator with excellent acid generation sensitivity. 1 is preferably an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, or a group in which one or more methylene groups in the hydrocarbon group have been replaced with a divalent group selected from the following group Ia, and among these, a hydrocarbon group having a substituent having 1 to 20 carbon atoms is preferred, and a hydrocarbon group having a substituent having 1 to 20 carbon atoms, in which the substituent substituting one or more hydrogen atoms of the substituted hydrocarbon group is preferably a halogen atom, because synthesis is easy and an acid generator having excellent acid generation sensitivity can be easily formed. 1 The hydrocarbon group represented by R in the above general formula (1) is preferably a linear or branched alkyl group. 1 The number of carbon atoms in the group represented by the formula (1) is preferably 1 to 10, and more preferably 1 to 5. This is because it is easy to synthesize and makes it easy to form an acid generator with excellent acid generation sensitivity. 1 is preferably a halogenated alkyl group having 1 to 20 carbon atoms, in which one or more hydrogen atoms in an alkyl group having 1 to 20 carbon atoms have been substituted with a halogen atom, and among these, a halogenated alkyl group having 1 to 10 carbon atoms, in which one or more hydrogen atoms in an alkyl group having 1 to 10 carbon atoms have been substituted with a halogen atom, is particularly preferred, a perhaloalkyl group having 1 to 5 carbon atoms, in which all hydrogen atoms in an alkyl group having 1 to 5 carbon atoms have been substituted with a halogen atom, is more preferred, and a perfluoroalkyl group having 1 to 5 carbon atoms, in which all hydrogen atoms in an alkyl group having 1 to 5 carbon atoms have been substituted with a fluorine atom, is most preferred. 1In particular, in the present invention, from the viewpoint of ease of synthesis and superior acid generation sensitivity, it is preferable that R 1 is preferably a perfluoroalkyl group having 1 to 4 carbon atoms, particularly preferably a perfluoroalkyl group having 1 to 2 carbon atoms, and among these, particularly preferably a perfluoroalkyl group having 1 carbon atom, i.e., a trifluoromethyl group.

[0034] R in the above general formula (1) 2 The substituents substituting one or more hydrogen atoms in the hydrocarbon group having the above substituent and the heterocyclic ring-containing group having the above substituent, which are represented by the formula (1), are preferably halogen atoms, more preferably fluorine atoms or chlorine atoms, and more preferably fluorine atoms. This is because it facilitates the formation of an acid generator with excellent acid generation sensitivity. 2 is more preferably a cyano group, an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, or a group in which one or more methylene groups of the hydrocarbon group have been replaced with a divalent group selected from Group Ia above; more preferably a cyano group, an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms with a halogen atom, or a group in which one or more methylene groups in the unsubstituted or substituted hydrocarbon group have been replaced with -COO-; among these, it is even more preferably a cyano group, a hydrocarbon group having 1 to 20 carbon atoms with a halogen atom as a substituent, or a group in which one or more methylene groups in the unsubstituted or substituted hydrocarbon group have been replaced with -COO-; particularly preferably a cyano group or a hydrocarbon group having 1 to 20 carbon atoms with a halogen atom as a substituent, and particularly preferably a hydrocarbon group having 1 to 20 carbon atoms with a halogen atom as a substituent. This is because it facilitates the formation of an acid generator with excellent acid generation sensitivity. R in the above general formula (1) 2 The hydrocarbon group represented by R in the above general formula (1) is preferably a linear or branched alkyl group.2 The number of carbon atoms in the group represented by the formula (1) is preferably 1 to 10, and more preferably 1 to 5. This is because it is easy to synthesize and makes it easy to form an acid generator with excellent acid generation sensitivity. 2 is preferably a halogenated alkyl group having 1 to 20 carbon atoms, in which one or more hydrogen atoms in an alkyl group having 1 to 20 carbon atoms have been substituted with a halogen atom, and among these, a halogenated alkyl group having 1 to 10 carbon atoms, in which one or more hydrogen atoms in an alkyl group having 1 to 10 carbon atoms have been substituted with a halogen atom, is particularly preferred, a perhaloalkyl group having 1 to 5 carbon atoms, in which all hydrogen atoms in an alkyl group having 1 to 5 carbon atoms have been substituted with a halogen atom, is more preferred, a group in which all hydrogen atoms in an alkyl group having 1 to 5 carbon atoms have been substituted with a chlorine atom or a fluorine atom is even more preferred, and among these, a perfluoroalkyl group having 1 to 5 carbon atoms is most preferred. 2 In particular, in the present invention, from the viewpoint of ease of synthesis and superior acid generation sensitivity, R in the general formula (1) is 2 is preferably a perfluoroalkyl group having 1 to 3 carbon atoms, particularly preferably a perfluoroalkyl group having 1 to 2 carbon atoms, and among these, particularly preferably a perfluoroalkyl group having 1 carbon atom, i.e., a trifluoromethyl group.

[0035] R 32 is preferably a group represented by a formula selected from the above general formulas (IVa), (IVf) and (IVh), and is particularly preferably a group represented by general formula (IVf). This is because compound A becomes a compound with superior acid generation sensitivity. In addition, it is easy to synthesize, and an acid generator with superior acid generation sensitivity can be easily formed. R in the above general formula (IVf) 67is preferably a single bond, because Compound A is a compound with superior acid generation sensitivity. In addition, it is easy to synthesize and it is easy to form an acid generator with superior acid generation sensitivity. 68 is preferably an unsubstituted or substituted hydrocarbon group having 1 to 10 carbon atoms, and is particularly preferably an unsubstituted or substituted hydrocarbon group having 1 to 5 carbon atoms, and is particularly preferably an unsubstituted or substituted hydrocarbon group having 1 to 3 carbon atoms, and is most preferably an unsubstituted hydrocarbon group having 1 to 3 carbon atoms. This is because Compound A becomes a compound with superior acid generation sensitivity. In addition, it is easy to synthesize, and an acid generator with superior acid generation sensitivity can be easily formed. In addition, R 33 represents an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, or a group in which one or more methylene groups in the hydrocarbon group have been substituted with a divalent group selected from the following group Ia, in terms of ease of imparting various functions to compound (A), etc.

[0036] The aromatic ring in the aromatic ring group Ar having 5 to 20 carbon atoms constituting the ring may be a 5- to 7-membered monocyclic ring or a fused ring. Examples of monocyclic rings include monocyclic cycloalkanes such as cyclopentane, cyclohexane, and cyclopentene, monocyclic aromatic rings such as benzene, and monocyclic heterocyclic rings such as pyrrolidine, pyrrole, piperazine, morpholine, thiomorpholine, tetrahydropyridine, lactone rings, and lactam rings. Examples of fused rings include naphthalene, anthracene, carbazole, and fluorene. The aromatic ring group Ar may have a linked ring structure in which multiple aromatic rings are linked by a direct bond, -S-, -O-, nitrogen atom, or the like. For example, in the case of a linked ring, the number of 5 to 20 hydrocarbons constituting the ring is the total number of carbon atoms constituting all rings contained in Ar. For example, the number of carbon atoms constituting the carbazole ring is 12, and the number of carbon atoms constituting the fluorene ring is 13. When the aromatic ring group Ar has a fused ring, the same fused ring may have R 31 , R 32 , R 33 is preferably bonded.

[0037] The aromatic ring group Ar is preferably an aromatic ring group having a structure represented by the following general formula (Ara) or (Arb), because this makes the compound A a compound with superior acid generation sensitivity.

[0038] (In the formula, X 1 is a single bond, no bond, oxygen atom, sulfur atom, selenium atom, CR 41 R 42 , CO, NR 43 or PR 44 and X 2 is an oxygen atom, a sulfur atom, a selenium atom, CR 41 R 42 , CO, NR 43 or PR 44 and X 3 is NR 53 and R 41 , R 42 , R 43 and R 44 each independently represents a hydrogen atom, an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, an unsubstituted or substituted heterocyclic ring-containing group having 2 to 20 carbon atoms, or a group in which one or more methylene groups in the hydrocarbon group or the heterocyclic ring-containing group are substituted with a divalent group selected from the following group Ib; R 41 , R 42 , R 43 and R 44 When there are a plurality of R 53 represents a hydrogen atom, a halogen atom, a nitro group, a cyano group, -OR 111 , -COR 111 , -OCOR 111 , -COOR 111 , -SR 111 , -SOR 111 , -SO2R 111 , -NR 112 R 113 , -NR 112 COR 113 , -CONR 112 R 113, an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, an unsubstituted or substituted heterocyclic ring-containing group having 2 to 20 carbon atoms, or a group in which one or more methylene groups in the hydrocarbon group or the heterocyclic ring-containing group are substituted with a divalent group selected from the following group Ib, 111 , R 112 and R 113 each independently represents a hydrogen atom, an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, an unsubstituted or substituted heterocyclic ring-containing group having 2 to 20 carbon atoms, or a group in which one or more methylene groups in the hydrocarbon group or the heterocyclic ring-containing group are substituted with a divalent group selected from the following group Ib; R 111 , R 112 and R 113 When a plurality of each of the groups are present, they may be the same or different, and a substituent substituting one or more hydrogen atoms in the hydrocarbon group having the substituent and the heterocycle-containing group having the substituent is an atom or group selected from the following Group IIb: Group Ib: —O—, —COO—, —OCO—, —CO—, —CO—CO—, —CO—CO—O—, —CS—, —S—, —SO—, —SO2—, —NR'—, —NR'-CO—, —CO—NR'—, —NR'-COO—, —OCO-NR'—, or —SiR'R"-. Group IIb: a halogen atom, a cyano group, a nitro group, —CO—H, —OH, —SH, —NH2, —COOH, or —S03H. R' and R" each independently represent a hydrogen atom or an unsubstituted aliphatic hydrocarbon group having 1 to 20 carbon atoms, and when a plurality of R's or R"s are present, they may be the same or different.

[0039] In addition, from the viewpoint of further increasing the acid generation sensitivity of compound A, it is preferable that in the above general formula (A), a is 1, b is 1, and the following partial structure (Aα) in general formula (A) is a group represented by the following general formula (Ara1) or (Arb1):

[0040] (In the formula, Ar, R 33 and c are the same as in formula (A). 31 *2 represents the bonding point with R 32represents the bonding point with

[0041] (In the formula, X 1 , X 2 , X 3 are the same as those in the general formulae (Ara) and (Arb), respectively, 141 , R 142 , R 151 and R 152 each independently represents a halogen atom, a nitro group, a cyano group, or —OR 121 , -COR 121 , -OCOR 121 , -COOR 121 , -SR 121 , -SOR 121 , -SO2R 121 , -NR 122 R 123 , -NR 122 COR 123 , -CONR 122 R 123 , an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, an unsubstituted or substituted heterocyclic ring-containing group having 2 to 20 carbon atoms, or a group in which one or more methylene groups in the hydrocarbon group or the heterocyclic ring-containing group are substituted with a divalent group selected from the following group Ic, 121 , R 122 and R 123 each independently represents a hydrogen atom, an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, an unsubstituted or substituted heterocycle-containing group having 2 to 20 carbon atoms, or a group in which one or more methylene groups in the hydrocarbon group or the heterocycle-containing group are substituted with a divalent group selected from the following group Ic; R 121 , R 122 and R 123 When a plurality of each of the groups are present, they may be the same or different, and a substituent substituting one or more hydrogen atoms in the hydrocarbon group having the substituent and the heterocycle-containing group having the substituent is an atom or group selected from the following Group IIc, a1 is 0 to 3, a2 is 0 to 3, c1 is 0 to 3, c2 is 0 to 1, *1 is R 31*2 represents the bonding point with R 32 represents a bonding site with.) Group Ic: -O-, -COO-, -OCO-, -CO-, -CO-CO-, -CO-CO-O-, -CS-, -S-, -SO-, -SO2-, -NR'-, -NR'-CO-, -CO-NR'-, -NR'-COO-, -OCO-NR'- or -SiR'R"-. Group IIc: a halogen atom, a cyano group, a nitro group, -CO-H, -OH, -SH, -NH2, -COOH or -S03H. R' and R" each independently represent a hydrogen atom or an unsubstituted aliphatic hydrocarbon group having 1 to 20 carbon atoms, and when a plurality of R' or R" are present, they may be the same or different.)

[0042] X in the above general formulae (Ara) and (Ara1) 1 is a single bond, no bond, CR 41 R 42 , CO, or NR 43 Preferably, X is a single bond or no bond, and most preferably a single bond. This is because Compound A becomes a compound with superior acid generation sensitivity. In addition, it is easy to synthesize, and it is easy to form an acid generator with superior acid generation sensitivity. "No bond" means that X 1 For example, in the following general formula (A1), R 11 and R 20 is not bonded.

[0043] X in the above general formulas (Ara) and (Ara1) 2 is a sulfur atom, CR 41 R 42 or NR 43 It is preferable that CR 41 R 42 or NR 43 It is preferable that the compound A is a compound having excellent acid generation sensitivity, and it is easy to synthesize the compound A, and it is easy to form an acid generator having excellent acid generation sensitivity.

[0044] X in the above general formulae (Ara) and (Ara1) 2 R used in 41 , R 42is preferably a hydrogen atom, an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, or a group in which one or more methylene groups in the hydrocarbon group have been replaced with a divalent group selected from Group Ib above, and is particularly preferably a hydrogen atom or an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, and is particularly preferably a hydrogen atom or an unsubstituted hydrocarbon group having 1 to 20 carbon atoms. This is because Compound A becomes a compound with superior acid generation sensitivity. In addition, it is easy to synthesize, and an acid generator with superior acid generation sensitivity can be easily formed. X in the above general formulae (Ara) and (Ara1) 2 R used in 41 , R 42 The number of carbon atoms in the hydrocarbon group represented by the formula (I) is preferably 1 to 15, more preferably 1 to 10, and particularly preferably 1 to 5. This is because Compound A becomes a compound with superior acid generation sensitivity. In addition, it is easy to synthesize, and an acid generator with superior acid generation sensitivity can be easily formed.

[0045] R in the above general formulas (Ara) and (Ara1) 43 From the viewpoint of ease of synthesis and excellent acid generation sensitivity, R is preferably an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, or a group in which one or more methylene groups in the hydrocarbon group have been replaced with a divalent group selected from Group Ib above, and among these, an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms is preferred, and an unsubstituted hydrocarbon group having 1 to 20 carbon atoms is particularly preferred. 43 From the viewpoint of ease of synthesis and excellent acid generation sensitivity, the number of carbon atoms in the hydrocarbon group represented by the formula (Ara) is preferably 1 to 15, more preferably 2 to 10, and even more preferably 2 to 9. 43 From the viewpoints of ease of synthesis and excellent acid generation sensitivity, the aliphatic hydrocarbon group represented by the formula (I) is preferably a linear or branched alkyl group, and more preferably a branched alkyl group. In the case of a branched alkyl group, it is particularly preferred that the number of carbon atoms is 3 to 9.

[0046] In the general formula (Ara1), a1 is preferably 0 to 3, more preferably 0 to 1, and particularly preferably 0. This is because, when a1 is within the above range, Compound A becomes a compound with superior acid generation sensitivity. Furthermore, synthesis is facilitated, and an acid generator with superior acid generation sensitivity can be easily formed. In the general formula (Ara1), a2 is preferably 0 to 3, more preferably 0 to 1, and particularly preferably 0. This is because, when a1 is within the above range, Compound A becomes a compound with superior acid generation sensitivity. Furthermore, synthesis is facilitated, and an acid generator with superior acid generation sensitivity can be easily formed. In the general formula (Arb1), c1 is preferably 0 to 3, more preferably 0 to 1, and particularly preferably 0. This is because, when a1 is within the above range, Compound A becomes a compound with superior acid generation sensitivity. Furthermore, synthesis is facilitated, and an acid generator with superior acid generation sensitivity can be easily formed. In the general formula (Arb1), c2 is preferably 0 to 1, and particularly preferably 0. When the number is within the above range, Compound A becomes a compound with superior acid generation sensitivity, and is easy to synthesize, making it easy to form an acid generator with superior acid generation sensitivity.

[0047] In the present invention, X in the above general formula (Ara) or (Ara1) 2 is preferably a sulfur atom, and X in (Ara1) 2 is a sulfur atom, and a1 = 0 and a2 = 0 are particularly preferred. 2 is a sulfur atom, it is particularly preferable that Compound A has a structure represented by the following general formula (A1). This is because Compound A has such a structure, which makes it a compound with superior acid generation sensitivity. In addition, this is because it is easy to synthesize and makes it easy to form an acid generator with superior acid generation sensitivity.

[0048] (In the formula, R 11 and R 20 represents a hydrogen atom, a halogen atom, a nitro group, a cyano group, -OR 90 , -COR90 , -OCOR 90 , -COOR 90 , -SR 90 , -SOR 90 , -SO2R 90 , -NR 91 R 92 , -NR 91 COR 92 , -CONR 91 R 92 , a group represented by the following general formula (1), a group represented by a formula selected from the above formulas (IVa) to (IVh), an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, an unsubstituted or substituted heterocycle-containing group having 2 to 20 carbon atoms, or a group in which one or more methylene groups in the hydrocarbon group or the heterocycle-containing group are replaced by a divalent group selected from the above group Ia, or R 11 and R 20 a single bond, —O—, —S—, —Se—, or —CR 41 R 42 -, -CO-, -NR 43 - or -PR 44 represents -, R 12 , R 13 , R 14 , R 15 , R 16 , R 17 , R 18 , and R 19 represents a hydrogen atom, a halogen atom, a nitro group, a cyano group, -OR 90 , -COR 90 , -OCOR 90 , -COOR 90 , -SR 90 , -SOR 90 , -SO2R 90 , -NR 91 R 92 , -NR 91 COR 92 , -CONR 91 R 92, a group represented by the above general formula (1), a group represented by a formula selected from the above formulas (IVa) to (IVh), an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, an unsubstituted or substituted heterocycle-containing group having 2 to 20 carbon atoms, or a group in which one or more methylene groups in the hydrocarbon group or the heterocycle-containing group are replaced by a divalent group selected from the above group Ia, 90 , R 91 and R 92 each independently represents a hydrogen atom, an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, an unsubstituted or substituted heterocycle-containing group having 2 to 20 carbon atoms, or a group in which one or more methylene groups in the hydrocarbon group or the heterocycle-containing group are substituted with a divalent group selected from Group Ia; R 90 , R 91 and R 92 When there are a plurality of each of R, they may be the same or different, and the substituents substituting one or more hydrogen atoms in the hydrocarbon group having the substituent and the heterocycle-containing group having the substituent are atoms or groups selected from the above group IIa. 11 , R 12 , R 13 , R 14 , R 15 , R 16 , R 17 , R 18 , R 19 and R 20 At least one of the above is a group represented by the general formula (1), and at least one of the remaining is a group represented by a formula selected from the above formulas (IVa) to (IVh).

[0049] R in the above general formula (A1) 11 and R 20 represents a hydrogen atom, a halogen atom, a nitro group, a cyano group, -OR 90 , -COR 90 , an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, a group in which one or more methylene groups in the hydrocarbon group are replaced by a divalent group selected from Group Ia above, or R 11 and R 20are bonded to form a single bond, -O-, -S-, -Se-, -CR 41 R 42 -, -CO-, -NR 43 - or -PR 44 - is preferred, and among these, a hydrogen atom, a halogen atom, a nitro group, a cyano group, or R 11 and R 20 a single bond, —O—, or —NR 43 - is preferred, and in particular, a hydrogen atom or R 11 and R 20 is preferably a single bond formed by bonding of the following: Compound A is a compound having superior acid generation sensitivity; and Compound A is easy to synthesize, and an acid generator having superior acid generation sensitivity can be easily formed.

[0050] R in the above general formula (A1) 11 , R 20 are bonded to each other to form -NR 43 -, then R 43 is preferably an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, or a group in which one or more methylene groups in the hydrocarbon group have been replaced with a divalent group selected from Group Ib above, and is particularly preferably an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, and is particularly preferably an unsubstituted hydrocarbon group having 1 to 20 carbon atoms. This is because Compound A becomes a compound with superior acid generation sensitivity. In addition, it is easy to synthesize, and an acid generator with superior acid generation sensitivity can be easily formed. R in the above general formula (A1) 43 The number of carbon atoms in the hydrocarbon group represented by the formula (A1) is preferably 1 to 15, more preferably 1 to 10, and particularly preferably 1 to 5. This is because compound A is a compound with superior acid generation sensitivity. Furthermore, it is easy to synthesize, and an acid generator with superior acid generation sensitivity can be easily formed. 43The hydrocarbon group represented by the formula (I) is preferably a linear or branched alkyl group, and more preferably a linear alkyl group. This is because Compound A becomes a compound with superior acid generation sensitivity. In addition, this is because it is easy to synthesize, and it is easy to form an acid generator with superior acid generation sensitivity.

[0051] R in the above general formula (A1) 12 , R 14 , R 15 , R 16 , R 17 and R 19 are each independently a hydrogen atom, a halogen atom, a nitro group, a cyano group, or —OR 90 , -COR 90 , an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, or a group in which one or more methylene groups in the hydrocarbon group have been replaced with a divalent group selected from Group Ic above, and among these, a hydrogen atom, a nitro group, or a cyano group is preferred, with a hydrogen atom being particularly preferred. This is because Compound A becomes a compound with superior acid generation sensitivity. In addition, it is easy to synthesize, and an acid generator with superior acid generation sensitivity can be easily formed.

[0052] R in the above general formula (A1) 13 represents a hydrogen atom, a halogen atom, a nitro group, a cyano group, -OR 90 , -COR 90 , an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, a group in which one or more methylene groups in the hydrocarbon group are replaced with a divalent group selected from Group Ic above, a group represented by General Formula (1) above, or a group represented by Formulas (IVa) to (IVh) above, and among these, a hydrogen atom, a halogen atom, a nitro group, a cyano group, a group represented by General Formula (1) above, or a group represented by a formula selected from Formulas (IVa) to (IVh) above is preferred, a hydrogen atom, a group represented by General Formula (1) above, or a group represented by a formula selected from Formulas (IVa) to (IVh) above is preferred, and a group represented by General Formula (1) above is particularly preferred. This is because Compound A becomes a compound with superior acid generation sensitivity. Furthermore, it is easy to synthesize, and an acid generator with excellent acid generation sensitivity can be easily formed.

[0053] R in the above general formula (A1) 18 represents a hydrogen atom, a halogen atom, a nitro group, a cyano group, -OR 90 , -COR 90 , an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, a group in which one or more methylene groups in the hydrocarbon group are replaced by a divalent group selected from group Ic above, a group represented by general formula (1) above or a group represented by a formula selected from formulas (IVa) to (IVh) above, and among these, a hydrogen atom, a halogen atom, a nitro group, a cyano group, a group represented by general formula (1) above or a group represented by a formula selected from formulas (IVa) to (IVh) above is preferred, a hydrogen atom, a group represented by general formula (1) above or a group represented by a formula selected from formulas (IVa) to (IVh) above is preferred, and a group represented by a formula selected from formulas (IVa) to (IVh) above is particularly preferred.

[0054] In addition, in the general formula (A1), R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , R 17 , R 18 , R 19 and R 20 At least one of the groups may be a group represented by the general formula (1), 11 , R 12 , R 13 , R 14 , R 15 , R 16 , R 17 , R 18 , R 19 and R 20 At least one of the groups may be a group represented by a formula selected from the above formulas (IVa) to (IVh). 13 and R 18 It is particularly preferred that one of the groups in the formula (A1) is a group represented by the general formula (1) and the other group is a group represented by a formula selected from the formulas (IVa) to (IVh). 13 is a group represented by the general formula (1), and R18 is preferably a group represented by a formula selected from the above formulas (IVa) to (IVh). This is because compound A has superior acid generation sensitivity due to such a structure. In addition, this is because compound A is easy to synthesize and can easily form an acid generator having superior acid generation sensitivity.

[0055] Among the groups represented by a formula selected from general formulas (IVa) to (IVh), a group represented by a formula selected from general formulas (IVa), (IVf), and (IVh) is preferred, and a group represented by general formula (IVf) is particularly preferred. This is because Compound A becomes a compound with superior acid generation sensitivity. In addition, this is because it is easy to synthesize, and an acid generator with superior acid generation sensitivity can be easily formed.

[0056] R in the above general formula (IVf) 67 is preferably a single bond. 68 is preferably an unsubstituted or substituted hydrocarbon group having 1 to 10 carbon atoms, and among these, is preferably an unsubstituted or substituted hydrocarbon group having 1 to 5 carbon atoms, and is particularly preferably an unsubstituted or substituted hydrocarbon group having 1 to 3 carbon atoms, and is preferably an unsubstituted hydrocarbon group having 1 to 3 carbon atoms. This is because Compound A becomes a compound with superior acid generation sensitivity. In addition, it is easy to synthesize, and it becomes easy to form an acid generator with superior acid generation sensitivity.

[0057] In the present invention, X in the above general formula (Ara) or (Ara1) 1 is a single bond, and X 2 NR 43 In formula (Ara) or (Ara1), X 1 is a single bond, and X 2 NR 43 It is particularly preferable that a1 = 0 and a2 = 0. This is because compound A becomes a compound with superior acid generation sensitivity. 1 is a single bond, and X 2 NR 43In the case where Compound A is a compound represented by the formula (A2), it is particularly preferred that Compound A has a structure represented by the following formula (A2). This is because Compound A has excellent acid generation sensitivity, and is easy to synthesize, making it easy to form an acid generator having excellent acid generation sensitivity.

[0058] (R 12' R 13' , R 14' , R 15' , R 16' , R 17' , R 18' and R 19' are each independently a hydrogen atom, a halogen atom, a nitro group, a cyano group, or —OR 90 , -COR 90 , -OCOR 90 , -COOR 90 , -SR 90 , -SOR 90 , -SO2R 90 , -NR 91 R 92 , -NR 91 COR 92 , -CONR 91 R 92 , a group represented by the above general formula (1), a group represented by a formula selected from the above formulas (IVa) to (IVh), an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, an unsubstituted or substituted heterocycle-containing group having 2 to 20 carbon atoms, or a group in which one or more methylene groups in the hydrocarbon group or the heterocycle-containing group are replaced by a divalent group selected from the above group Ia, 90 , R 91 and R 92 each independently represents a hydrogen atom, an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, an unsubstituted or substituted heterocycle-containing group having 2 to 20 carbon atoms, or a group in which one or more methylene groups in the hydrocarbon group or the heterocycle-containing group are substituted with a divalent group selected from Group Ia; R 90 , R 91 and R 92When there are a plurality of each of R, they may be the same or different, and the substituents substituting one or more hydrogen atoms in the hydrocarbon group having the substituent and the heterocycle-containing group having the substituent are atoms or groups selected from the above group IIa. 12' R 13' , R 14' , R 15' , R 16' , R 17' , R 18' and R 19' At least one of the above is a group represented by the general formula (1), and at least one of the remaining is a group represented by a formula selected from the above formulas (IVa) to (IVh).

[0059] R in the above general formula (A2) 12' , R 14' , R 15' , R 16' , R 17' and R 19' are each independently a hydrogen atom, a halogen atom, a nitro group, a cyano group, or —OR 90 , -COR 90 , an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, or a group in which one or more methylene groups in the hydrocarbon group have been replaced with a divalent group selected from Group Ic above, and among these, a hydrogen atom, a nitro group, or a cyano group is preferred, with a hydrogen atom being particularly preferred. This is because Compound A becomes a compound with superior acid generation sensitivity. In addition, it is easy to synthesize, and an acid generator with superior acid generation sensitivity can be easily formed.

[0060] R in the above general formula (A2) 13' represents a hydrogen atom, a halogen atom, a nitro group, a cyano group, -OR 90 , -COR 90, an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, a group in which one or more methylene groups in the hydrocarbon group are replaced with a divalent group selected from Group Ic above, a group represented by General Formula (1) above, or a group represented by Formulas (IVa) to (IVh) above, and among these, a hydrogen atom, a halogen atom, a nitro group, a cyano group, a group represented by General Formula (1) above, or a group represented by a formula selected from Formulas (IVa) to (IVh) above is preferred, a hydrogen atom, a group represented by General Formula (1) above, or a group represented by a formula selected from Formulas (IVa) to (IVh) above is preferred, and a group represented by General Formula (1) above is particularly preferred. This is because Compound A becomes a compound with superior acid generation sensitivity. Furthermore, it is easy to synthesize, and an acid generator with excellent acid generation sensitivity can be easily formed.

[0061] R in the above general formula (A2) 18' represents a hydrogen atom, a halogen atom, a nitro group, a cyano group, -OR 90 , -COR 90 , an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, a group in which one or more methylene groups in the hydrocarbon group are replaced by a divalent group selected from group Ic above, a group represented by general formula (1) above or a group represented by a formula selected from formulas (IVa) to (IVh) above, and among these, a hydrogen atom, a halogen atom, a nitro group, a cyano group, a group represented by general formula (1) above or a group represented by a formula selected from formulas (IVa) to (IVh) above is preferred, a hydrogen atom, a group represented by general formula (1) above or a group represented by a formula selected from formulas (IVa) to (IVh) above is preferred, and a group represented by a formula selected from formulas (IVa) to (IVh) above is particularly preferred.

[0062] In addition, in the general formula (A2), R 12' , R 13' , R 14' , R 15' , R 16' , R 17' , R 18' and R 19' At least one of the groups may be a group represented by the general formula (1), 12' , R13' , R 14' , R 15' , R 16' , R 17' , R 18' and R 19' At least one of the groups may be a group represented by a formula selected from the above formulas (IVa) to (IVh). 13' and R 18' It is particularly preferred that one of the groups in the formula (A1) is a group represented by the general formula (1) and the other group is a group represented by a formula selected from the formulas (IVa) to (IVh). 13' is a group represented by the general formula (1), and R 18' is preferably a group represented by a formula selected from the above formulas (IVa) to (IVh). This is because compound A has superior acid generation sensitivity due to such a structure. In addition, this is because compound A is easy to synthesize and can easily form an acid generator having superior acid generation sensitivity.

[0063] Among the groups represented by a formula selected from general formulas (IVa) to (IVh), a group represented by a formula selected from general formulas (IVa), (IVf), and (IVh) is preferred, and a group represented by general formula (IVf) is particularly preferred. This is because Compound A becomes a compound with superior acid generation sensitivity. In addition, this is because it is easy to synthesize, and an acid generator with superior acid generation sensitivity can be easily formed.

[0064] R in the above general formula (IVf) 67 is preferably a single bond. 68 is preferably an unsubstituted or substituted hydrocarbon group having 1 to 10 carbon atoms, and among these, is preferably an unsubstituted or substituted hydrocarbon group having 1 to 5 carbon atoms, and is particularly preferably an unsubstituted or substituted hydrocarbon group having 1 to 3 carbon atoms, and is preferably an unsubstituted hydrocarbon group having 1 to 3 carbon atoms. This is because Compound A becomes a compound with superior acid generation sensitivity. In addition, it is easy to synthesize, and it becomes easy to form an acid generator with superior acid generation sensitivity.

[0065] R in the above general formula (A2)43 is preferably an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, or a group in which one or more methylene groups in the hydrocarbon group have been replaced with a divalent group selected from Group Ib above, and is particularly preferably an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, and is particularly preferably an unsubstituted hydrocarbon group having 1 to 20 carbon atoms. This is because Compound A becomes a compound with superior acid generation sensitivity. In addition, it is easy to synthesize, and an acid generator with superior acid generation sensitivity can be easily formed. R in the above general formula (A2) 43 The number of carbon atoms in the hydrocarbon group represented by the formula (A2) is preferably 1 to 15, more preferably 2 to 10, and even more preferably 2 to 9. This is because compound A is a compound with superior acid generation sensitivity. Furthermore, it is easy to synthesize, and an acid generator with superior acid generation sensitivity can be easily formed. 43 The hydrocarbon group represented by the formula (I) is preferably a linear or branched alkyl group, and particularly preferably a branched alkyl group. This is because Compound A becomes a compound with superior acid generation sensitivity. In addition, it is easy to synthesize, and an acid generator with superior acid generation sensitivity can be easily formed. Furthermore, it has good solubility in solvents.

[0066] In the present invention, X in the above general formula (Ara) or (Ara1) 1 is a single bond, and X 2 is CR 41 R 42 In the above general formula (Ara) or (Ara1), X 1 is a single bond, and X 2 is CR 41 R 42 It is particularly preferable that a1 = 0 and a2 = 0. This is because compound A becomes a compound with superior acid generation sensitivity. 1 is a single bond, and X 2 is CR 41 R 42In the case of a compound represented by the formula (A3), it is particularly preferred that compound A has a structure represented by the following general formula (A3). This structure makes compound A a compound with superior acid generation sensitivity. Furthermore, it is easy to synthesize and facilitates the formation of an acid generator with superior acid generation sensitivity. Another advantage of the skeleton of formula (A3) is that it is easy to obtain solvent solubility.

[0067] (R 12'' , R 13'' , R 14'' , R 15'' , R 16'' , R 17'' , R 18'' and R 19'' represents a hydrogen atom, a halogen atom, a nitro group, a cyano group, -OR 90 , -COR 90 , -OCOR 90 , -COOR 90 , -SR 90 , -SOR 90 , -SO2R 90 , -NR 91 R 92 , -NR 91 COR 92 , -CONR 91 R 92 , a group represented by the above general formula (1), a group represented by a formula selected from the above formulas (IVa) to (IVh), an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, an unsubstituted or substituted heterocycle-containing group having 2 to 20 carbon atoms, or a group in which one or more methylene groups in the hydrocarbon group or the heterocycle-containing group are replaced by a divalent group selected from the above group Ia, 90 , R 91 and R 92 each independently represents a hydrogen atom, an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, an unsubstituted or substituted heterocycle-containing group having 2 to 20 carbon atoms, or a group in which one or more methylene groups in the hydrocarbon group or the heterocycle-containing group are substituted with a divalent group selected from Group Ia; R 90 , R 91 and R 92When there are a plurality of each of R, they may be the same or different, and the substituents substituting one or more hydrogen atoms in the hydrocarbon group having the substituent and the heterocycle-containing group having the substituent are atoms or groups selected from the above group IIa. 12'' , R 13'' , R 14'' , R 15'' , R 16'' , R 17'' , R 18'' and R 19'' At least one of the above is a group represented by the general formula (1), and at least one of the remaining is a group represented by a formula selected from the above formulas (IVa) to (IVh).

[0068] R 41 , R 42 is preferably a hydrogen atom, an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, or a group in which one or more methylene groups in the hydrocarbon group have been replaced with a divalent group selected from Group Ib above, and is particularly preferably a hydrogen atom or an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, and is particularly preferably a hydrogen atom or an unsubstituted hydrocarbon group having 1 to 20 carbon atoms. This is because Compound A becomes a compound with superior acid generation sensitivity. In addition, it is easy to synthesize, and an acid generator with superior acid generation sensitivity can be easily formed. R in the above general formula (A3) 41 , R 42 The number of carbon atoms in the hydrocarbon group represented by the formula (I) is preferably 1 to 15, more preferably 1 to 10, and particularly preferably 1 to 5. This is because Compound A becomes a compound with superior acid generation sensitivity. In addition, it is easy to synthesize, and an acid generator with superior acid generation sensitivity can be easily formed.

[0069] R in the above general formula (A3) 12'' , R 15'' , R 16'' and R 19'' are each independently a hydrogen atom, a halogen atom, a nitro group, a cyano group, or —OR 90 , -COR 90, an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, or a group in which one or more methylene groups in the hydrocarbon group have been replaced with a divalent group selected from Group Ic above, and among these, a hydrogen atom, a nitro group, or a cyano group is preferred, with a hydrogen atom being particularly preferred. This is because Compound A becomes a compound with superior acid generation sensitivity. In addition, it is easy to synthesize, and an acid generator with superior acid generation sensitivity can be easily formed.

[0070] R in the above general formula (A3) 13'' and R 14'' At least one of the groups is a hydrogen atom, a halogen atom, a nitro group, a cyano group, or —OR 90 , -COR 90 , an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, a group in which one or more methylene groups in the hydrocarbon group are replaced by a divalent group selected from group Ic above, a group represented by general formula (1) above or a group represented by a group selected from formulas (IVa) to (IVh) above, and among these, a hydrogen atom, a halogen atom, a nitro group, a cyano group, a group represented by general formula (1) above or a group represented by a group selected from formulas (IVa) to (IVh) above is preferred, a hydrogen atom, a group represented by general formula (1) above or a group represented by a group selected from formulas (IVa) to (IVh) above is preferred, and a group represented by general formula (1) above is particularly preferred. 14'' However, it is preferable that Compound A satisfies these conditions, because Compound A is a compound with superior acid generation sensitivity, and because Compound A is easy to synthesize, making it easy to form an acid generator with superior acid generation sensitivity.

[0071] In the above general formula (A3), R 17'' and R 18'' At least one of the groups is a hydrogen atom, a halogen atom, a nitro group, a cyano group, or —OR 90 , -COR 90, an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, a group in which one or more methylene groups in the hydrocarbon group have been replaced with a divalent group selected from group Ic above, a group represented by general formula (1) above or a group represented by a group selected from formulas (IVa) to (IVh) above, and among these, a hydrogen atom, a halogen atom, a nitro group, a cyano group, a group represented by general formula (1) above or a group represented by a group selected from formulas (IVa) to (IVh) above is preferred, a hydrogen atom, a group represented by general formula (1) above or a group represented by a group selected from formulas (IVa) to (IVh) above is preferred, and a group represented by a group selected from formulas (IVa) to (IVh) above is particularly preferred. 17'' However, it is preferable that Compound A satisfies these conditions, because Compound A is a compound with superior acid generation sensitivity, and because Compound A is easy to synthesize, making it easy to form an acid generator with superior acid generation sensitivity.

[0072] In addition, in general formula (A3), R 12'' , R 13'' , R 14'' , R 15'' , R 16'' , R 17'' , R 18'' and R 19'' At least one of the groups may be a group represented by the general formula (1), 12'' , R 13'' , R 14'' , R 15'' , R 16'' , R 17'' , R 18'' and R 19'' At least one of the groups may be a group selected from the above formulas (IVa) to (IVh). 13'' and R 18'' one group is a group represented by the above general formula (1) and the other group is a group represented by a group selected from the above formulas (IVa) to (IVh), or 14'' and R 17'' It is particularly preferred that one of the groups in the formula (A1) is a group represented by the general formula (1) and the other group is a group represented by a group selected from the formulas (IVa) to (IVh).14'' is a group represented by the general formula (1), and R 17'' is preferably a group represented by a group selected from the above formulas (IVa) to (IVh). This is because compound A has superior acid generation sensitivity when it has such a structure. In addition, this is because it is easy to synthesize and makes it easy to form an acid generator having superior acid generation sensitivity.

[0073] In general formula (A3), among the groups represented by the groups selected from general formulae (IVa), (IVb), (IVc), (IVd), (IVe), (IVf), (IVg), and (IVh), the groups represented by general formulae (IVa), (IVf), and (IVh) are preferred, and the group represented by the group selected from general formula (IVf) is particularly preferred. This is because compound A becomes a compound with superior acid generation sensitivity. In addition, this is because it is easy to synthesize, and an acid generator with superior acid generation sensitivity can be easily formed.

[0074] Specific examples of the compound A include compounds represented by Nos. 1 to 58 below.

[0075]

[0076]

[0077]

[0078]

[0079]

[0080]

[0081]

[0082]

[0083]

[0084] The method for producing the compound A may be any method that can obtain a compound of the desired structure, and can be synthesized by applying well-known chemical reactions. For example, the method shown in the following scheme can be mentioned. Specifically, a known ketone compound is reacted with hydroxylamine hydrochloride to obtain an oxime compound. Subsequently, the oxime compound is reacted with sulfonic acid anhydride. Next, R 32 In one example, a compound having a group represented by the formula (I) is reacted with a diketone such as chloroglyoxylic acid to obtain Compound A. The reaction conditions in the production method, such as the reaction temperature, reaction time, and amount of raw materials used, are not particularly limited, and known conditions may be employed.

[0085] (The symbols in the formula have the same meanings as those in the general formulas (1), (IVf), and (Ara) above.)

[0086] The compound A has the function of generating an acid. A method commonly used for acid generators can be used to generate an acid from the compound A. Specific examples include a method of irradiating with energy rays, a heat treatment method, and a method of performing these methods simultaneously or sequentially. Examples of the energy rays include g-rays (436 nm), h-rays (405 nm), i-rays (365 nm), visible light, ultraviolet rays, far ultraviolet rays, X-rays, and charged particle beams. Examples of light sources include low-pressure mercury lamps, medium-pressure mercury lamps, high-pressure mercury lamps, ultra-high-pressure mercury lamps, xenon lamps, metal halide lamps, electron beam irradiation devices, X-ray irradiation devices, and lasers (argon lasers, dye lasers, nitrogen lasers, LEDs, helium-cadmium lasers, etc.). The heating temperature in the heat treatment is preferably, for example, 70°C or higher and 450°C or lower, more preferably 100°C or higher and 300°C or lower, and may be 150°C or higher. The heating time in the heat treatment is preferably, for example, 1 minute or higher and 100 minutes or lower. This is because the heat treatment conditions described above can effectively exert the effect of obtaining a composition with little color change.

[0087] Examples of uses of the compound A include an acid generator, more specifically, a photoacid generator that generates an acid upon irradiation with energy rays, a thermal acid generator that generates an acid upon heat treatment, etc. Examples of uses of the acid generator include addition to a composition containing a resin component.The applications of the above composition include, for example, optical filters, paints, coating agents, lining agents, adhesives, printing plates, insulating varnishes, insulating sheets, laminates, printed circuit boards, sealants for semiconductor devices, LED packages, liquid crystal injection ports, organic electroluminescence (EL) devices, optical elements, electrical insulation, electronic components, and separation membranes; molding materials, putties, glass fiber impregnation agents, fillers; passivation films for semiconductors and solar cells; interlayer insulating films and surface protective films used in thin film transistors (TFTs), liquid crystal display devices, organic electroluminescence (EL) display devices, printed circuit boards, and the like; printed circuit boards; and color televisions. PC monitors, personal digital assistants, color filters for CCD image sensors, electrode materials for plasma display panels, printing inks, dental compositions, resins for stereolithography, both liquid and dry films, micromechanical parts, glass fiber cable coatings, holographic recording materials, magnetic recording materials, optical switches, plating masks, etching masks, stencils for screen printing, touch panels such as transparent conductive films, MEMS elements, nanoimprint materials, photofabrication such as two-dimensional and three-dimensional high-density mounting of semiconductor packages, decorative sheets, artificial nails, glass-substitute optical filters Microlens arrays used in films, electronic paper, optical discs, projectors, and optical communication lasers, etc., prism lens sheets used in the backlight of liquid crystal display devices, Fresnel lens sheets used in screens such as projection televisions, lens portions of lens sheets such as lenticular lens sheets, or backlights using such sheets, optical lenses such as microlenses and imaging lenses, optical elements, optical connectors, optical waveguides, insulating packing, heat-shrinkable rubber tubing, O-rings, sealants for display devices, protective materials, optical fiber protective materials, adhesives, die bonding agents, highly heat-dissipating materials, highly heat-resistant sealants, solar cells, fuel cells, and secondary battery components, solid electrolytes for batteries, insulating coating materials, photosensitive drums for copiers, gas separation membranes, civil engineering and construction materials such as concrete protective materials, linings, soil injection agents, sealants, cold and heat storage materials, glass coatings, and foams, tubes, sealants, coating materials, sealants for sterilization treatment equipment, contact lenses, and oxygen-enriched membranes, medical materials such as biochips, automotive parts, and various machine parts. It can be used for various applications, and there is no particular restriction on its use.From the viewpoint of more effectively exerting the effect of excellent acid generation sensitivity of the present invention, the above-mentioned use is preferably for a pattern-forming composition, and for example, it is preferably for a negative composition used together with an acid-hardening component, or for a positive composition used together with an acid-decomposable component (also referred to as an "acid-decomposable resin component"), and more specifically, it is preferably for a composition used for forming an optical lens, an optical element, an optical connector, an optical waveguide, or an interlayer insulating film used in a liquid crystal display device, an organic EL display device, a printed circuit board, etc., which require high acid generation sensitivity.

[0088] B. Acid Generator One of the characteristics of the acid generator of the present invention is that it contains the above-mentioned compound A. By containing compound A, an acid generator having excellent acid generation sensitivity can be easily obtained.

[0089] 1. Compound A The type of compound A used in the acid generator of the present invention may be any type as long as it allows an acid generator having excellent acid generation sensitivity to be easily obtained, and the acid generator may contain only one type or two or more types.

[0090] The content of the compound A in the acid generator of the present invention may be any amount that can easily provide an acid generator with excellent acid generation sensitivity, and is appropriately set depending on the type of acid generator, etc. The content of the compound A in the acid generator of the present invention may be, for example, 100 parts by mass per 100 parts by mass of the solid content of the acid generator, i.e., the solid content of the acid generator may consist solely of the compound A. The content of the compound A in the acid generator of the present invention may be less than 100 parts by mass per 100 parts by mass of the solid content of the acid generator, i.e., the acid generator may be a composition containing the compound A and other components, and may be, for example, more than 20 parts by mass but not more than 99.99 parts by mass. This is because an acid generator with excellent acid generation sensitivity can be easily obtained when the content of the compound A is in the above-mentioned range. When the acid generator of the present invention contains components other than the compound A, from the viewpoint of more easily obtaining an acid generator with excellent acid generation sensitivity, the lower limit of the content of compound A in the acid generator of the present invention is preferably 50 parts by mass or more, more preferably 70 parts by mass or more, and even more preferably 90 parts by mass or more, per 100 parts by mass of the solid content of the acid generator. By setting the upper limit of the content of compound A within the above-mentioned range, an acid generator with excellent acid generation sensitivity can be easily obtained. Furthermore, from the viewpoint of easily controlling the particle size of the acid generator, the upper limit of the content of compound A in the acid generator of the present invention is preferably 99 parts by mass or less, more preferably 95 parts by mass or less, and even more preferably 90 parts by mass or less, per 100 parts by mass of the solid content of the acid generator. By setting the content of compound A within the above-mentioned range, an acid generator with excellent acid generation sensitivity can be easily obtained. The solid content includes all components other than the solvent. Furthermore, when two or more types of compound A are contained, the content of compound A refers to the total amount of compound A.

[0091] The compound A can be the same as that described in the section "A. Compound" above, and therefore the description here will be omitted.

[0092] 2. Other Components The acid generator may contain other components in addition to Compound A. Examples of such other components include a solvent. The solvent is capable of dissolving or dispersing each component in the acid generator. Therefore, even if the solvent is liquid at room temperature (25°C) and atmospheric pressure, Compound A is not included in the solvent. Either water or an organic solvent can be used as the solvent. In the present invention, it is preferable that the solvent is an organic solvent, as this makes it easier to dissolve or disperse Compound A.

[0093] Examples of the organic solvent include carbonates such as propylene carbonate and diethyl carbonate; ketones such as acetone and 2-heptanone; polyhydric alcohols and derivatives thereof such as ethylene glycol, propylene glycol, propylene glycol monoacetate, dipropylene glycol, and monomethyl ether or monophenyl ether of dipropylene glycol monoacetate; cyclic ethers such as dioxane; esters such as ethyl formate and 3-methyl-3-methoxybutyl acetate; aromatic hydrocarbons such as toluene and xylene; and lactones such as γ-caprolactone and δ-caprolactone.

[0094] The content of the solvent in the acid generator can be 1 part by mass or more and 99 parts by mass or less per 100 parts by mass of the acid generator.

[0095] Examples of other components other than the compound A and the solvent include those described in the sections "2. Resin Component" and "3. Other Components" in "C. Composition" below. Examples of the other components include known compounds used as acid generators. The content of the other components can be appropriately set depending on the application of the acid generator, but can be, for example, less than 50 parts by mass, and more preferably 10 parts by mass or less, per 100 parts by mass of the solid content of the acid generator. This is because the acid generator can easily have a high content of compound A, making it easier to obtain an acid generator with excellent acid generation sensitivity.

[0096] 3. Others The acid generator may be produced by any method as long as it contains a desired amount of compound A. When the acid generator contains compound A and other components, a method using a known mixing means can be used.

[0097] The acid generator may be used in the form of an additive to a composition containing a resin component, and specifically, the same applications as those described in the section "A. Compounds" above may be used.

[0098] C. Composition One of the characteristics of the composition of the present invention is that it contains the above-mentioned compound A and a resin component. By containing the above-mentioned compound A, the obtained composition etc. has excellent acid generation sensitivity.

[0099] 1. Compound A The type of compound A used in the composition of the present invention may be any type that can exhibit the effect of excellent acid generation sensitivity, and the composition may contain only one type or two or more types.

[0100] The content of compound A in the composition of the present invention may be any content that can exhibit the effect of excellent acid generation sensitivity, and is appropriately set depending on the type of resin component used, etc. The content of compound A in the composition of the present invention is, for example, preferably 0.05 parts by mass or more and 100 parts by mass or less, and more preferably 0.05 parts by mass or more and 20 parts by mass or less, per 100 parts by mass of the resin component. This is because a composition that can exhibit the effect of excellent acid generation sensitivity can be easily obtained. In addition, this is because a composition with reduced coloration can be easily formed. The content of compound A in the composition of the present invention is, for example, preferably 0.001 parts by mass or more and 20 parts by mass or less, per 100 parts by mass of the solid content of the composition. This is because a composition that can exhibit the effect of excellent acid generation sensitivity can be easily obtained. In addition, this is because a composition with reduced coloration can be easily formed. The content of compound A in the composition of the present invention is, for example, preferably 0.001 parts by mass or more and 20 parts by mass or less, per 100 parts by mass of the composition. This is because a composition that can exhibit the effect of excellent acid generation sensitivity can be easily obtained. In addition, this is because a composition with reduced coloration can be easily formed. In addition, it is easy to form a composition with reduced coloration, etc. When two or more types of compound A are contained, the content of compound A indicates the total amount of compound A.

[0101] The compound A can be the same as that described in the section "A. Compound" above, and therefore the description here will be omitted.

[0102] 2. Resin Component As the resin component, a polymer compound or a component that can become a polymer compound can be used. Furthermore, the resin component may be an acid-reactive component having a structure capable of reacting with the acid generated from compound A, or a non-acid-reactive component that does not react with the acid generated from compound A. However, it is preferable that the resin component be an acid-reactive component. This is because, when the resin component is an acid-reactive component, the composition can easily achieve the effect of excellent acid generation sensitivity possessed by compound A. Furthermore, this is because it is easy to form a composition with reduced coloration, etc.

[0103] As such an acid-reactive component, it is preferable to use an acid-hardening component that hardens by polymerization or crosslinking due to the acid generated from compound A, or an acid-decomposable component whose solubility in a developer increases due to the acid generated from compound A. In the present invention, when the resin component is an acid-hardening component, the effect of excellent acid generation sensitivity can be effectively exhibited, and hardening of the acid-hardening component becomes easy. Furthermore, when the resin component is an acid-decomposable component, the effect of excellent acid generation sensitivity can be effectively exhibited, and decomposition of the acid-decomposable component becomes easy. Furthermore, a composition can be obtained in which coloration is suppressed in non-developed areas that do not undergo a change in solubility in a developer.

[0104] Examples of the acid-curing component include cationically polymerizable compounds. Examples of the cationically polymerizable compounds include cyclic ether compounds such as epoxy compounds and oxetane compounds, vinyl ether compounds, vinyl compounds, styrenes, spiro orthoesters, bicyclo orthoesters, spiro orthocarbonates, lactones, oxazolines, aziridines, cyclosiloxanes, ketals, cyclic acid anhydrides, lactams, and aryldialdehydes, as well as polymerizable or crosslinkable polymers and oligomers having these polymerizable groups in their side chains. These compounds may be used alone or in combination of two or more. Specific examples of such cationically polymerizable compounds include the acid-reactive organic substances described in International Publication No. 2017 / 130896 and the compounds described as cationically polymerizable compounds described in International Publication No. 2014 / 084269 and International Publication No. 2016 / 132413.

[0105] The acid-hardening component can also be a mixture of a crosslinkable resin and a crosslinking agent. Examples of the crosslinkable resin include polyhydroxystyrene and derivatives thereof; polyacrylic acid and derivatives thereof; polymethacrylic acid and derivatives thereof; copolymers of two or more selected from hydroxystyrene, acrylic acid, methacrylic acid, and derivatives thereof; copolymers of two or more selected from hydroxystyrene, styrene, and derivatives thereof; copolymers of three or more selected from cycloolefins and derivatives thereof, maleic anhydride, and acrylic acid and derivatives thereof; copolymers of three or more selected from cycloolefins and derivatives thereof, maleimide, and acrylic acid and derivatives thereof; polynorbornene; one or more polymers selected from the group consisting of metathesis ring-opening polymers; polymers having alkoxysilyl groups; and polymers in which these polymers are partially substituted with acid-labile groups having alkali dissolution control ability. Examples of polymers containing structural units derived from hydroxystyrene, such as polyhydroxystyrene, include the phenolic hydroxyl group-containing resins (QN) described in JP 2018-112670 A. Examples of the crosslinkable resin that can be used include the resist base resin described in WO 2017 / 130896, the resin whose solubility in an alkaline developer changes due to the action of the acid of component (A) described in JP 2003-192665 A, claim 3 of JP 2004-323704 A, and the alkali-soluble resin described in JP 10-10733 A. Examples of the polymer having an alkoxysilyl group that can be used include a compound in which the alkoxysilyl group is not directly bonded to an aromatic ring.

[0106] The crosslinking agent may be any agent capable of crosslinking the crosslinkable resins together in the presence of an acid. Examples of such crosslinking agents include compounds capable of reacting with acidic groups, such as phenolic hydroxyl groups and carboxyl groups, contained in the resins, such as epoxy group-containing compounds, hydroxyl group-containing compounds, alkoxy group-containing compounds, methylol group-containing compounds, and carboxymethyl group-containing compounds. More specific examples of the crosslinking agent include the crosslinking agents described in JP-A-2016-169173 and JP-A-2018-112670.

[0107] The acid-decomposable component may be any component whose solubility in a developer increases due to the acid generated from compound A. Examples of such components include resins having acidic groups such as phenolic hydroxyl groups, carboxyl groups, sulfonyl groups, and silanol groups, in which some or all of the hydrogen atoms of the acidic groups are protected with protecting groups. Examples of resins having such acidic groups include crosslinkable resins used together with crosslinking agents as the acid-hardening component. The positive-type chemically amplified resins described in JP 2018-112670 A can also be used. The protecting group may be any component capable of protecting the acidic group. Examples of such protecting groups include the protecting groups described in JP 2016-169173 A, the acid-labile groups described in WO 2017 / 130896 A, and the acid-dissociable groups described in JP 2018-112670 A. Examples of silanol groups protected with protecting groups include alkoxysilyl groups. Examples of polymers having an alkoxysilyl group that can be used as the acid-decomposable component include those described in JP-A-2019-66828 as "polymer component (A) having a structural unit (I) containing an aromatic ring and an alkoxysilyl group directly bonded to the aromatic ring, and a structural unit (II) containing an acidic group." Examples of the developer include the developer described in the section "G. Pattern manufacturing method" below.

[0108] The acid-reactive component may be, in addition to the acid-hardening component and the acid-decomposable component, a component that reacts with acid. For example, a resin having an alkali-soluble group that is insolubilized by acid may also be used. Specific examples include acid-insolubilized resins that undergo intramolecular or intermolecular crosslinking reactions due to acid-catalyzed dehydration condensation between hydroxyl groups and carboxyl groups, or between carboxyl groups as exemplified below. Examples of acid-insolubilized resins that undergo acid-catalyzed dehydration condensation between carboxyl groups include resins having a phthalic acid structure that undergo dehydration condensation between carboxyl groups in the presence of acid, as shown below.

[0109]

[0110] The non-acid-reactive component can be one that does not react with the acid generated from compound A, more specifically, one that does not undergo hardening, decomposition, change in solubility in an alkaline developer, or the like due to the acid generated from compound A. Examples of the non-acid-reactive component include thermoplastic resins such as polyolefin-based resins, polybutadiene-based resins, polystyrene-based resins, polystyrene-butadiene-based resins, and polystyrene-olefin-based resins.

[0111] The content of the resin component in the composition of the present invention may be any content that can achieve the effect of providing excellent acid generation sensitivity, and is appropriately set depending on the type of resin component used, etc. The content of the resin component in the composition of the present invention can be, for example, 10 parts by mass or more per 100 parts by mass of the solid content of the composition, preferably 30 parts by mass or more and 99.9 parts by mass or less, and more preferably 50 parts by mass or more and 99 parts by mass or less. This is because the effect of providing excellent acid generation sensitivity can be effectively achieved. The content of the resin component in the composition of the present invention can be, for example, 10 parts by mass or more per 100 parts by mass of the composition, more preferably 30 parts by mass or more and 99.9 parts by mass or less, and particularly preferably 50 parts by mass or more and 96 parts by mass or less. This is because the effect of providing excellent acid generation sensitivity can be effectively achieved.

[0112] 3. Solvent The composition may contain a solvent. The solvent is capable of dispersing or dissolving each component in the composition. Therefore, even if the composition is liquid at room temperature (25°C) and atmospheric pressure, the compound A and the resin component are not included in the solvent. Either water or an organic solvent can be used as the solvent. In the present invention, the solvent is preferably an organic solvent, as this facilitates dissolving or dispersing the compound A. The organic solvent may be the same as that described in the section "B. Acid Generator" above. The content of the solvent in the composition of the present invention is appropriately determined depending on the intended use of the composition, and may be, for example, 1 part by mass or more and 99 parts by mass or less per 100 parts by mass of the composition.

[0113] 4. Other Components The composition may contain other components as needed. Such other components may be selected depending on the intended use of the composition, and include, for example, benzotriazole-based, triazine-based, and benzoate-based ultraviolet absorbers; phenol-based, phosphorus-based, and sulfur-based antioxidants; antistatic agents such as cationic surfactants, anionic surfactants, nonionic surfactants, and amphoteric surfactants; flame retardants such as halogen-based compounds, phosphate ester compounds, phosphoric acid amide compounds, melamine-based compounds, fluororesins or metal oxides, (poly)melamine phosphate, and (poly)piperazine phosphate; hydrocarbon-based, fatty acid-based, and aliphatic alcohols. Examples of the other components include lubricants based on aliphatic esters, aliphatic amides, or metal soaps; colorants such as dyes, pigments, and carbon black; inorganic additives based on silica such as fumed silica, fine particle silica, silica stone, diatomaceous earth, clay, kaolin, diatomaceous earth, silica gel, calcium silicate, sericite, kaolinite, flint, feldspar powder, vermiculite, attapulgite, talc, mica, minesotite, pyrophyllite, and silica; fillers such as glass fiber and calcium carbonate; crystallization agents such as nucleating agents and crystallization accelerators; agents imparting rubber elasticity such as silane coupling agents and flexible polymers; and sensitizers. The other components may also include acid diffusion controllers such as amine compounds, amide group-containing compounds, urea compounds, and nitrogen-containing heterocyclic compounds. Examples of the sensitizers include compounds described as spectral sensitizers in JP-A-2008-506749. Examples of the acid diffusion controller include the compounds described in JP 2019-8300 A as "(D) acid diffusion controller." The content of these other components in the composition of the present invention can be 50 parts by mass or less per 100 parts by mass of the composition.

[0114] 5. Others The composition may be produced by any known method as long as it is capable of mixing the components in the desired amounts. For example, a method may be used in which the compound A is dissolved or dispersed in a solvent, and then the resin component is added to the solvent.

[0115] D. Cured Product The cured product of the present invention is a cured product of the above-described composition. The resin component contained in the composition is an acid-curable component.

[0116] According to the present invention, by using the above-mentioned composition, a cured product is obtained in which the acid-curable component has been sufficiently cured.

[0117] The cured product of the present invention uses the above-described composition. The resin component is an acid-curable component. The cured product is a product of the cured acid-curable component, and includes a polymer formed by polymerizing or crosslinking the acid-curable components together. The content of such a composition can be the same as that described in the above section "C. Composition," and therefore, a description thereof will be omitted here.

[0118] The shape of the cured product in plan view can be appropriately set depending on the application of the cured product, and can be, for example, a pattern such as a dot shape or a line shape.

[0119] The uses of the cured product can be the same as those described in the section "A. Compounds" above.

[0120] The method for producing the cured product is not particularly limited as long as it is a method that can form a cured product of the composition into a desired shape. For example, the production methods described in the section "E. Production Methods of Cured Product" below can be used.

[0121] E. Method for Producing a Cured Product Next, a method for producing a cured product of the present invention will be described. One of the features of the method for producing a cured product of the present invention is that it includes a curing step of curing the above-mentioned composition. Furthermore, the resin component contained in the above-mentioned composition is an acid-curable component.

[0122] According to the present invention, by using the above-described composition, the effect of excellent acid generation sensitivity can be effectively exhibited, and a cured product in which the acid-curing component has been sufficiently cured can be easily formed.

[0123] 1. Curing Step The curing step in the present invention is a step of curing the above-described composition. The method for curing the composition may be any method capable of curing the acid-curing component, and a method for generating an acid from compound A may be used. The method for generating an acid from compound A may be any method capable of generating a desired amount of acid from compound A, and examples thereof include a method of irradiating with energy rays, a heat treatment method, and a method of performing these simultaneously or sequentially. Examples of such methods for irradiating with energy rays and heat treatment methods include the same methods as those described in the above section "A. Compound." In this step, it is preferable that the method for generating the acid includes a method of irradiating with energy rays. This is because the effect of excellent acid generation sensitivity can be effectively exerted and the acid-curing component can be effectively cured. The composition contains an acid-curing component as a resin component. The content of such a composition can be the same as that described in the above section "C. Composition," and therefore, a description thereof will be omitted here.

[0124] 2. Other Steps The method for producing a cured product of the present invention may include other steps as necessary in addition to the curing step. Examples of the other steps include a development step in which unpolymerized portions in the coating film of the composition are removed after the curing step to obtain a patterned cured product, a post-baking step in which the cured product is heat-treated after the curing step, a pre-baking step in which the composition is heat-treated to remove solvent in the composition before the curing step, and a step in which a coating film of the composition is formed before the curing step. In the present invention, the other steps preferably include a post-baking step. This is because the acid generated from compound A can be effectively diffused. As a result, it becomes easier to form a cured product in which the acid-curable component has been sufficiently cured.

[0125] Examples of methods for removing the unpolymerized portions in the development step include applying a developer such as an alkaline developer to the unpolymerized portions. Examples of the alkaline developer include commonly used alkaline developers such as tetramethylammonium hydroxide (TMAH) aqueous solution, potassium hydroxide aqueous solution, and potassium carbonate aqueous solution. Examples of the developer include commonly used solvent developers such as propylene glycol monomethyl ether acetate (PEGMEA) and cyclohexanone. The development method using the developer may be any method that can bring the developer into contact with the desired development area, and known methods such as showering, spraying, and immersion can be used. The development step may be performed after the curing step. The heating conditions in the post-baking step may be any conditions that can improve the strength of the cured product obtained in the curing step, such as 200°C to 250°C for 20 to 90 minutes. The heating conditions in the pre-baking step may be any conditions that can remove the solvent in the composition, such as 70°C to 150°C for 30 to 300 seconds. In the step of forming the coating film, the composition can be applied by known methods such as using a spin coater, roll coater, bar coater, die coater, curtain coater, various printing methods, dipping, etc. The coating film can be formed on a substrate. The substrate can be appropriately selected depending on the application of the cured product, and examples include soda glass, quartz glass, semiconductor substrates, wiring boards, metals, paper, plastics, etc. Furthermore, after being formed on the substrate, the cured product can be peeled from the substrate and used, or transferred from the substrate to another adherend and used.

[0126] F. Pattern The pattern of the present invention is produced using a positive resist comprising the composition described above. The resin component contained in the composition is an acid-decomposable component.

[0127] According to the present invention, by using the above-described composition, the effect of excellent acid generation sensitivity can be effectively exhibited, and the acid-decomposable component can be easily decomposed, thereby facilitating the formation of a pattern with excellent dimensional accuracy.

[0128] The pattern of the present invention uses the above-described composition. The resin component is an acid-decomposable component. The above-described pattern is formed by forming a coating film using the above-described composition and then removing unnecessary portions. Specifically, after forming the coating film, the coating film is irradiated with energy rays through a predetermined mask or the like, generating acid in the irradiated portions to increase their solubility in a developer, and then removing the irradiated portions through a development process. The content of such a composition can be the same as that described in the above section "C. Composition," and therefore, a description thereof will be omitted here.

[0129] The shape of the pattern in plan view can be appropriately set depending on the application of the pattern, and can be, for example, a dot-like, line-like or other pattern shape.

[0130] The use of the pattern can be the same as that described in the above section "A. Compounds."

[0131] The method for producing the pattern is not particularly limited as long as it can form the composition into a desired shape. For example, the production method described in the section "G. Pattern Production Method" below can be used.

[0132] G. Pattern Manufacturing Method Next, a pattern manufacturing method of the present invention will be described. The pattern manufacturing method of the present invention includes the steps of forming a coating film using the above-described composition, generating an acid from a compound contained in the formed coating film, and developing the coating film after the step of generating an acid from the compound to remove a portion of the coating film and form a pattern. The resin component contained in the above composition is an acid-decomposable component.

[0133] According to the present invention, by using the above-mentioned composition, a pattern excellent in dimensional accuracy can be obtained.

[0134] 1. Acid Generating Step The acid generating step in the present invention is a step of generating an acid from the compound A contained in the coating film formed using the above-described composition. In this step, the method for generating an acid from the compound A may be any method capable of generating a desired amount of acid from the compound A, and examples thereof include a method of irradiating with energy rays, a heat treatment method, and a method of performing these simultaneously or sequentially. Examples of such methods of irradiating with energy rays and heat treatment methods include the same methods as those described above in the section "A. Compound." In this step, it is preferable that the method for generating the acid includes a method of irradiating with energy rays. This is because this can effectively achieve the effect of obtaining a pattern with excellent dimensional accuracy. Furthermore, in this step, it is preferable that the location in the coating film where the acid is generated is a part of the coating film in plan view. This is because this facilitates the implementation of the pattern forming step described below. The planar shape and thickness of the coating film are appropriately determined depending on the application of the pattern coating film, etc. The composition contains an acid-decomposable component as a resin component. The contents of such a composition can be the same as those described in the above section "C. Composition," and therefore, a description thereof will be omitted here.

[0135] 2. Step of forming a pattern In the present invention, the step of forming a pattern is a step of developing the coating film after the step of generating an acid from the compound, thereby removing a portion of the coating film to form a pattern. Examples of a development method in this step include a development method using a developer. Such a developer and development method may be the same as those described in the above section "E. Method for producing a cured product."

[0136] 3. Other Steps The pattern production method of the present invention includes the acid generating step and the pattern forming step, but can also include other steps as necessary. Examples of such other steps include a step of forming a coating film of the composition before the acid generating step, and a pre-baking step of removing the solvent in the coating film by heat treatment after the coating film forming step. In the present invention, the other steps preferably include a post-exposure bake step. This is because the acid generated from Compound A can be effectively diffused. As a result, the decomposition of the acid-decomposable component can proceed more effectively. The coating film forming step and the pre-baking step can be the same as those described in the above section "E. Method for Producing a Cured Product." The post-exposure bake step can be carried out, for example, at a temperature of 70°C to 150°C for 30 to 300 seconds.

[0137] 4. Others The pattern produced by the above production method and its uses can be the same as those described in the section "A. Composition" above.

[0138] The present disclosure includes the following aspects: [1] A compound having a structure represented by the following general formula (A): (wherein Ar is an aromatic ring group having 5 to 20 carbon atoms constituting the ring, R 31 represents a group represented by the following general formula (1), 32 is a group represented by a formula selected from the following general formulas (IVa), (IVb), (IVc), (IVd), (IVe), (IVf), (IVg) and (IVh), 33 represents a halogen atom, a nitro group, a cyano group, -OR 34 , -COR 34 , -OCOR 34 , -COOR 34 , -SR 34 , -SOR 34 , -SO2R 34 , -NR 35 R 36 , -NR 35 COR 36 , -CONR 35 R 36, an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, an unsubstituted or substituted heterocyclic ring-containing group having 2 to 20 carbon atoms, or a group in which one or more methylene groups in the hydrocarbon group or the heterocyclic ring-containing group are substituted with a divalent group selected from the following group Ia: 31 , R 32 or R 33 When there are a plurality of R 34 , R 35 and R 36 each independently represents a hydrogen atom, an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, an unsubstituted or substituted heterocycle-containing group having 2 to 20 carbon atoms, or a group in which one or more methylene groups in the hydrocarbon group or the heterocycle-containing group are substituted with a divalent group selected from the following group Ia, and R 34 , R 35 or R 36 When a plurality of groups are present, they may be the same or different, and the substituents substituting one or more hydrogen atoms in the hydrocarbon group having the substituent and the heterocycle-containing group having the substituent are atoms or groups selected from the following Group IIa, a represents an integer of 1 to 20, b represents an integer of 1 to 20, c represents an integer of 0 to 18, and the sum of a, b, and c is 21 or less. (In the formula, R 1 represents an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, an unsubstituted or substituted heterocyclic ring-containing group having 2 to 20 carbon atoms, or a group in which one or more methylene groups in the hydrocarbon group or the heterocyclic ring-containing group have been replaced with a divalent group selected from the following group Ia, 2represents a hydrogen atom, a halogen atom, a nitro group, a cyano group, an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, an unsubstituted or substituted heterocycle-containing group having 2 to 20 carbon atoms, or a group in which one or more methylene groups in the hydrocarbon group or the heterocycle-containing group are replaced with a divalent group selected from Group Ia below, wherein the substituents substituting one or more hydrogen atoms in the substituted hydrocarbon group and the substituted heterocycle-containing group are atoms or groups selected from Group IIa below, and * represents a bonding site. (In the formula, R 51 is OR 81 , N.R. 82 R 83 or a heterocyclic ring-containing group having 2 to 20 carbon atoms and unsubstituted or substituted, R 52 and R 53 are each independently R 81 OR 81 represents R 52 and R 53 may be bonded to form a ring, R 55 , R 56 , R 58 , R 59 , R 61 , R 62 , R 64 , R 65 , R 71 and R 73 each independently represents an unsubstituted or substituted aryl group having 6 to 20 carbon atoms; R 54 , R 57 , R 60 , R 63 , R 66 , R 67 and R 72 each independently represents an unsubstituted or substituted arylene group having 6 to 20 carbon atoms or a single bond; 68 represents an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms; R 69 and R 70 are each independently R 81 OR 81 represents R 81 , R 82and R 83 each independently represents a hydrogen atom or an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, and * represents a bonding site. Group Ia: —O—, —COO—, —OCO—, —CO—, —CO—CO—, —CO—CO—O—, —CS—, —S—, —SO—, —SO2—, —NR'—, —NR'-CO—, —CO—NR'—, —NR'-COO—, —OCO-NR'—, or —SiR'R"-. Group IIa: a halogen atom, a cyano group, a nitro group, —CO—H, —OH, —SH, —NH2, —COOH, or —S03H. R' and R" each independently represent a hydrogen atom or an unsubstituted aliphatic hydrocarbon group having 1 to 20 carbon atoms, and when a plurality of R's or R"s are present, they may be the same or different.) [2] The compound according to [1], wherein the aromatic ring group Ar is an aromatic ring group having a structure represented by the following general formula (Ara) or (Arb): (In the formula, X 1 is a single bond, no bond, oxygen atom, sulfur atom, selenium atom, CR 41 R 42 , CO, NR 43 or PR 44 and X 2 is an oxygen atom, a sulfur atom, a selenium atom, CR 41 R 42 , CO, NR 43 or PR 44 and X 3 is NR 53 and R 41 , R 42 , R 43 and R 44 each independently represents a hydrogen atom, an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, an unsubstituted or substituted heterocyclic ring-containing group having 2 to 20 carbon atoms, or a group in which one or more methylene groups in the hydrocarbon group or the heterocyclic ring-containing group are substituted with a divalent group selected from the following group Ib; R 41 , R 42 , R 43 and R 44 When there are a plurality of R 53represents a hydrogen atom, a halogen atom, a nitro group, a cyano group, -OR 111 , -COR 111 , -OCOR 111 , -COOR 111 , -SR 111 , -SOR 111 , -SO2R 111 , -NR 112 R 113 , -NR 112 COR 113 , -CONR 112 R 113 , an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, an unsubstituted or substituted heterocyclic ring-containing group having 2 to 20 carbon atoms, or a group in which one or more methylene groups in the hydrocarbon group or the heterocyclic ring-containing group are substituted with a divalent group selected from the following group Ib, 111 , R 112 and R 113 each independently represents a hydrogen atom, an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, an unsubstituted or substituted heterocyclic ring-containing group having 2 to 20 carbon atoms, or a group in which one or more methylene groups in the hydrocarbon group or the heterocyclic ring-containing group are substituted with a divalent group selected from the following group Ib; R 111 , R 112 and R 113When a plurality of each of the groups are present, they may be the same or different, and a substituent substituting one or more hydrogen atoms in the hydrocarbon group having the substituent and the heterocycle-containing group having the substituent is an atom or group selected from the following Group IIb: Group Ib: -O-, -COO-, -OCO-, -CO-, -CO-CO-, -CO-CO-O-, -CS-, -S-, -SO-, -SO2-, -NR'-, -NR'-CO-, -CO-NR'-, -NR'-COO-, -OCO-NR'- or -SiR'R"-. Group IIb: a halogen atom, a cyano group, a nitro group, -CO-H, -OH, -SH, -NH2, -COOH or -S03H. R' and R" each independently represent a hydrogen atom or an unsubstituted aliphatic hydrocarbon group having 1 to 20 carbon atoms, and when a plurality of R' or R" are present, they may be the same or different. [3] The a is 1, The b is 1, The compound according to [2], wherein the following partial structure (Aα) in the general formula (A) is a group represented by the following general formula (Ara1) or (Arb1): (In the formula, Ar, R 33 and c are the same as in formula (A). 31 *2 represents the bonding point with R 32 represents the bonding point with (In the formula, X 1 , X 2 and X 3 are the same as those in the general formulae (Ara) and (Arb), 141 , R 142 , R 151 and R 152 each independently represents a halogen atom, a nitro group, a cyano group, or —OR 121 , -COR 121 , -OCOR 121 , -COOR 121 , -SR 121 , -SOR 121 , -SO2R 121 , -NR 122 R 123 , -NR 122 COR 123 , -CONR 122 R 123, an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, an unsubstituted or substituted heterocyclic ring-containing group having 2 to 20 carbon atoms, or a group in which one or more methylene groups in the hydrocarbon group or the heterocyclic ring-containing group are substituted with a divalent group selected from the following group Ic, 121 , R 122 and R 123 each independently represents a hydrogen atom, an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, an unsubstituted or substituted heterocycle-containing group having 2 to 20 carbon atoms, or a group in which one or more methylene groups in the hydrocarbon group or the heterocycle-containing group are substituted with a divalent group selected from the following group Ic; R 121 , R 122 and R 123 When a plurality of each of the groups are present, they may be the same or different, and a substituent substituting one or more hydrogen atoms in the hydrocarbon group having the substituent and the heterocycle-containing group having the substituent is an atom or group selected from the following Group IIc, a1 is 0 to 3, a2 is 0 to 3, c1 is 0 to 3, c2 is 0 to 1, *1 is R 31 *2 represents the bonding point with R 32 represents a bonding site with.) Group Ic: -O-, -COO-, -OCO-, -CO-, -CO-CO-, -CO-CO-O-, -CS-, -S-, -SO-, -SO2-, -NR'-, -NR'-CO-, -CO-NR'-, -NR'-COO-, -OCO-NR'- or -SiR'R"-. Group IIc: a halogen atom, a cyano group, a nitro group, -CO-H, -OH, -SH, -NH2, -COOH or -S03H. R' and R" each independently represent a hydrogen atom or an unsubstituted aliphatic hydrocarbon group having 1 to 20 carbon atoms, and when a plurality of R' or R" are present, they may be the same or different.) [4] The R 32 is a group represented by any one of general formulas (IVa), (IVf) and (IVh). [5] R 1 is a hydrocarbon group having 1 to 20 carbon atoms and having a halogen atom as a substituent, and R2 is a cyano group, a hydrocarbon group having 1 to 20 carbon atoms and having a halogen atom as a substituent, or a group in which one or more methylene groups of a hydrocarbon group having 1 to 20 carbon atoms and being unsubstituted or having a halogen atom as a substituent are replaced with —COO—. [6] An acid generator comprising the compound according to any one of [1] to [5]. [7] A composition comprising the compound according to any one of [1] to [5] and a resin component. [8] The composition according to [7], wherein the resin component is an acid-curable resin component. [9] A cured product of the composition according to [8].

[10] A method for producing a cured product, comprising a curing step of curing the composition according to [8].

[11] The composition according to [7], wherein the resin component is an acid-decomposable resin component.

[12] A pattern produced from the composition according to

[11] .

[13] A method for producing a pattern, comprising the steps of forming a coating film using the composition according to

[11] , generating an acid from the compound contained in the formed coating film, and developing the coating film after the step of generating an acid from the compound to remove a portion thereof, thereby forming a pattern.

[14] A pattern comprising the composition according to

[11] .

[15] A positive resist comprising the composition according to

[11] .

[0139] The present invention is not limited to the above-described embodiments. The above-described embodiments are merely examples, and any configuration that is substantially identical to the technical idea described in the claims of the present invention and that provides similar effects is included within the technical scope of the present invention.

[0140] The present disclosure will be described in more detail below with reference to examples, but the present disclosure is not limited to these examples.

[0141] Example 1 (Synthesis of Compound No. 1) N-Alkylation 33.4 g (200 mmol) of carbazole, 3.9 g (12 mmol) of tetrabutylammonium bromide, and 167.7 g (180 mmol) of o-xylene were placed in a 1 L four-neck flask and stirred at room temperature. 93.5 g (800 mmol) of 48% by mass aqueous potassium hydroxide solution was added dropwise. The mixture was heated and stirred at 40°C in an oil bath, and 40.6 g (210 mmol) of 1-bromo-2-ethylhexane was added dropwise. The mixture was heated and stirred at 120°C in an oil bath for 3 hours. After cooling to room temperature, ion-exchanged water was added to separate the oil and water. After washing once with 3% by mass hydrochloric acid and three times with ion-exchanged water, the organic layer was concentrated to obtain 52.3 g of the target intermediate 1-A as a pale red oil in a 94% yield.

[0142]

[0143] Acylation: 25.2 g (90 mmol) of intermediate 1-A, 13.2 g (110 mmol) of DMAP (N,N-dimethyl-4-aminopyridine), and 337.9 g (10 times the theoretical yield) of EDC (1,2-dichloroethane) were placed in a 1 L four-neck flask and stirred at 5°C in an ice bath. 19.9 g (95 mmol) of trifluoroacetic anhydride was added dropwise to the mixture. 36 g (270 mmol) of aluminum chloride was then added in six portions, taking care to avoid heat generation. After warming to room temperature, the mixture was stirred for 3 hours. The reaction solution was poured into ion-exchanged water, and chloroform was added to separate the oil and water. After washing three times with ion-exchanged water, 50 g of silica gel was added to the organic layer, and the mixture was filtered. The filtrate was concentrated to obtain the target crude intermediate 1-B as a yellow oil. This was used in the next reaction without purification.

[0144]

[0145] Oximation Reaction: 18.8 g (50 mmol) of intermediate 1-B, 3.8 g (55 mmol) of hydroxylamine hydrochloride, and 97.6 g of ethanol (5 times the theoretical yield) were placed in a 500 mL four-neck flask and heated to reflux in an oil bath at 90°C for 7 hours. After cooling to room temperature, the solvent was distilled off under reduced pressure, chloroform was added to the residue, and the mixture was washed three times with ion-exchanged water. After concentration, intermediate 1-C was used in the next reaction without purification.

[0146]

[0147] Sulfonation: 13.5 g (40 mmol) of intermediate 1-C, 104.5 g (5 times the theoretical yield) of chloroform, and 8.1 g (80 mmol) of triethylamine were placed in a 300 mL four-neck flask and stirred at 5°C in an ice bath. 16.9 g (60 mmol) of trifluoromethanesulfonic anhydride was added dropwise thereto so that the temperature did not exceed 10°C, and after the dropwise addition was completed, the mixture was stirred at room temperature for 2 hours. The reaction solution was poured into ice water, and after oil-water separation, it was washed three times with ion-exchanged water. After concentration, HPLC analysis showed that the starting ketone body remained, but intermediate 1-D was used in the next reaction without purification.

[0148]

[0149] Diketone Introduction: 10.5 g (20 mmol) of Intermediate 1-D and 62.3 g (6 times the theoretical yield) of EDC were placed in a 300 mL four-neck flask and stirred in an ice bath. 3.6 g (24 mmol) of ethyl chloroglyoxylate was added dropwise. Furthermore, 3.5 g (26 mmol) of aluminum chloride was added in four portions, taking care to avoid heat generation. After confirming the disappearance of the raw materials by HPLC, the reaction solution was poured into ion-exchanged water. After oil-water separation, the organic layer was washed three times with water and then concentrated. The residue was purified by silica gel column chromatography (developing solvent: ethyl acetate:hexane = volume ratio 1:10 to 1:5). Methanol was added to the residue for dispersion washing, and after filtration, hexane was added for further dispersion washing. 2.06 g of the target compound No. 1 was obtained in a 16% yield. 1 H-NMR and 19 The results of F-NMR measurement are shown in Tables 1 and 2.

[0150]

[0151] [Example 2] (Synthesis of Compound No. 2) Compound No. 2 was synthesized in the same manner as Compound No. 1, except that ethyl iodide was used instead of 1-bromo-2-ethylhexane and methyl chloroglyoxylate was used instead of ethyl chloroglyoxylate. The obtained solid was confirmed to be the target product by the following procedure. 1 H-NMR and 19The results were confirmed by F-NMR, and are shown in Tables 1 and 2.

[0152]

[0153] [Example 3] (Synthesis of Compound No. 3) Compound No. 3 was synthesized in the same manner as in the acylation reaction of Compound No. 1, except that fluorene was used instead of carbazole as the main raw material. The obtained solid was confirmed to be the target product by the following procedure. 1 H-NMR and 19 The results were confirmed by F-NMR, and are shown in Tables 1 and 2.

[0154]

[0155] Example 4 Synthesis of Compound No. 4 2.0 g (32 mmol) of Compound No. 1 and 21.5 g (10 times the theoretical yield) of EDC were placed in a 100 mL four-neck flask and stirred in an ice bath. 1.5 g (110 mmol) of aluminum chloride was added in four portions, taking care to avoid heat generation. After confirming the disappearance of the raw materials by HPLC, the reaction solution was poured into ion-exchanged water. After oil-water separation, the organic layer was washed three times with water and then concentrated. The residue was purified by silica gel column chromatography (developing solvent: ethyl acetate:hexane = volume ratio 1:10 to 1:5). 1.27 g of the target compound No. 4 was obtained in a yield of 59%.

[0156]

[0157]

[0158]

[0159] [Examples 5 to 7 and Comparative Examples 1 and 2] According to the formulations shown in Table 3 below, a resin component, an acid generator, and a surfactant were added to propylene glycol monomethyl ether acetate (PGMEA), and the mixture was stirred at 25°C for 1 hour to obtain a composition (PGMEA solution with a solids content of 25% by mass). The following materials were used for each component. The amounts in Table 3 are expressed in parts by mass.

[0160] Resin component: MARUKA LYNKER TST (manufactured by Maruzen Petrochemical Co., Ltd., p-hydroxystyrene-styrene-t-butyl acrylate copolymer, acid-decomposable component) Surfactant: FZ2122 (manufactured by Toray Dow Corning Co., Ltd.) Acid generator: Compounds produced in Examples 1 to 3 (acid generators consisting of Compounds No. 1 to 3) Acid generator: Comparative Compounds No. 1 and 2 shown below

[0161]

[0162] 1. Sensitivity Evaluation The composition prepared above was filtered through a 5 μm microfilter and spin-coated (1300 rpm, 7 s) onto a glass substrate so that the film thickness after pre-baking was 3 μm. Subsequently, the resist was pre-baked at 110° C. for 120 seconds using a hot plate to obtain a positive resist film. After exposure using a high-pressure mercury lamp, PEB (Post Exposure Bake) was performed at 120° C. for 120 seconds, and development was performed with a 2.38 mass% aqueous tetramethylammonium hydroxide solution for 10 seconds to obtain a positive resist pattern. Mask opening: 20 μm, exposure dose: 20 mJ / cm 2 and 40 mJ / cm 2 The line width of the pattern obtained in step 1 (the width of the portion removed by development) was measured using a microscope. The wider the developed width, the higher the sensitivity was evaluated. The results are shown in Table 3.

[0163] 2. Solubility The solubility of each acid generator in PGMEA at 25° C. was evaluated. The results are shown in Table 3. The values ​​shown in Table 3 are soluble concentrations (% by mass).

[0164] 3. Molar absorption coefficient (ε) and transmittance For a positive resist film obtained in the same manner as described in "1. Sensitivity evaluation," the absorption spectrum was measured using a UV-visible spectrophotometer (U-3010, manufactured by Hitachi High-Tech Science), and the molar absorption coefficient at 365 nm and the transmittance at 400 nm were calculated. The results are shown in Table 3.

[0165]

[0166] The absorption coefficients at i-line (365 nm) of Compounds No. 1 to 3 used in Examples 5 to 7 were able to maintain high values. The compositions of the Examples using Compounds No. 1 to 3 of the present invention produced patterns with wider line widths than the developed widths of patterns produced from Comparative Examples using other compounds, confirming their excellent acid generation sensitivity. Furthermore, the transmittance of the positive resist film at 400 nm was the highest in each Example, and highly transparent resist films with suppressed coloration were obtained. Furthermore, Compounds No. 1 to 3 of the present invention had high solubility in solvents. As described above, the compounds of the present invention exhibit high sensitivity, excellent transparency, and sufficient solvent solubility, making them suitable as photoacid generators for use in photoresists.

Claims

1. A compound having a structure represented by the following general formula (A): 【Chemistry 1】 (In the formula, Ar is an aromatic ring group having 5 to 20 carbon atoms constituting the ring, R 31 represents a group represented by the following general formula (1): R 32 is a group represented by a formula selected from the following general formulas (IVa), (IVb), (IVc), (IVd), (IVe), (IVf), (IVg) and (IVh), R 33 is a halogen atom, a nitro group, a cyano group, -OR 34 , -COR 34 , -OCOR 34 , -COOR 34 , -SR 34 , -SOR 34 , -SO 2 R 34 , -NR 35 R 36 , -NR 35 C.O.R. 36 , -CONR 35 R 36 an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, an unsubstituted or substituted heterocycle-containing group having 2 to 20 carbon atoms, or a group in which one or more methylene groups in the hydrocarbon group or the heterocycle-containing group are replaced by a divalent group selected from the following group Ia: R 31 , R 32 Or R 33 When multiple are present, they may be the same or different, R 34 , R 35 and R 36 each independently represents a hydrogen atom, an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, an unsubstituted or substituted heterocycle-containing group having 2 to 20 carbon atoms, or a group in which one or more methylene groups in the hydrocarbon group or the heterocycle-containing group are replaced by a divalent group selected from the following group Ia; R 34 , R 35 Or R 36 When multiple are present, they may be the same or different, The substituents substituting one or more hydrogen atoms in the substituted hydrocarbon group and the substituted heterocycle-containing group are atoms or groups selected from the following Group IIa: a represents an integer from 1 to 20; b represents an integer from 1 to 20; c represents an integer from 0 to 18; The sum of a, b and c is 21 or less. 【Chemistry 2】 (In the formula, R 1 represents an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, an unsubstituted or substituted heterocycle-containing group having 2 to 20 carbon atoms, or a group in which one or more methylene groups in the hydrocarbon group or the heterocycle-containing group are replaced by a divalent group selected from the following group Ia: R 2 represents a hydrogen atom, a halogen atom, a nitro group, a cyano group, an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, an unsubstituted or substituted heterocycle-containing group having 2 to 20 carbon atoms, or a group in which one or more methylene groups in the hydrocarbon group or the heterocycle-containing group are replaced by a divalent group selected from the following group Ia: The substituents substituting one or more hydrogen atoms in the substituted hydrocarbon group and the substituted heterocycle-containing group are atoms or groups selected from the following Group IIa: * indicates the bonding site.) 【Chemistry 3】 (In the formula, R 51 is OR 81 , N.R. 82 R 83 or an unsubstituted or substituted heterocycle-containing group having 2 to 20 carbon atoms, R 52 and R 53 Each independently represents R 81 OR 81 represents R 52 and R 53 may be bonded to form a ring, R 55 , R 56 , R 58 , R 59 , R 61 , R 62 , R 64 , R 65 , R 71 and R 73 each independently represents an unsubstituted or substituted aryl group having 6 to 20 carbon atoms, R 54 , R 57 , R 60 , R 63 , R 66 , R 67 and R 72 each independently represents an unsubstituted or substituted arylene group having 6 to 20 carbon atoms or a single bond; R 68 represents an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, R 69 and R 70 Each independently represents R 81 OR 81 represents R 81 , R 82 and R 83 each independently represents a hydrogen atom or an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms; * indicates the bonding site.) Group Ia: -O-, -COO-, -OCO-, -CO-, -CO-CO-, -CO-CO-O-, -CS-, -S-, -SO-, -SO 2 -, -NR'-, -NR'-CO-, -CO-NR'-, -NR'-COO-, -OCO-NR'- or -SiR'R". Group IIa: halogen atom, cyano group, nitro group, -CO-H, -OH, -SH, -NH 2 , —COOH or —SO 3 H. R' and R" each independently represent a hydrogen atom or an unsubstituted aliphatic hydrocarbon group having 1 to 20 carbon atoms, and when there are a plurality of R' or R", they may be the same or different.

2. The compound according to claim 1 , wherein the aromatic ring group Ar is an aromatic ring group having a structure represented by the following general formula (Ara) or (Arb): 【Chemistry 4】 (In the formula, X 1 is a single bond, no bond, oxygen atom, sulfur atom, selenium atom, CR 41 R 42 , C.O., N.R. 43 Or PR 44 and X 2 is an oxygen atom, a sulfur atom, a selenium atom, CR 41 R 42 , C.O., N.R. 43 Or PR 44 and X 3 is N.R. 53 and R 41 , R 42 , R 43 and R 44 each independently represents a hydrogen atom, an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, an unsubstituted or substituted heterocycle-containing group having 2 to 20 carbon atoms, or a group in which one or more methylene groups in the hydrocarbon group or the heterocycle-containing group are replaced by a divalent group selected from the following group Ib; R 41 , R 42 , R 43 and R 44 When multiple are present, they may be the same or different, R 53 is a hydrogen atom, a halogen atom, a nitro group, a cyano group, -OR 111 , -COR 111 , -OCOR 111 , -COOR 111 , -SR 111 , -SOR 111 , -SO 2 R 111 , -NR 112 R 113 , -NR 112 C.O.R. 113 , -CONR 112 R 11 3 an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, an unsubstituted or substituted heterocycle-containing group having 2 to 20 carbon atoms, or a group in which one or more methylene groups in the hydrocarbon group or the heterocycle-containing group are replaced by a divalent group selected from the following group Ib: R 111 , R 112 and R 113 each independently represents a hydrogen atom, an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, an unsubstituted or substituted heterocycle-containing group having 2 to 20 carbon atoms, or a group in which one or more methylene groups in the hydrocarbon group or the heterocycle-containing group are replaced by a divalent group selected from the following group Ib; R 111 , R 112 and R 113 When there are a plurality of each, they may be the same or different, The substituents substituting one or more hydrogen atoms in the substituted hydrocarbon group and the substituted heterocycle-containing group are atoms or groups selected from the following group IIb: Group Ib: -O-, -COO-, -OCO-, -CO-, -CO-CO-, -CO-CO-O-, -CS-, -S-, -SO-, -SO 2 -, -NR'-, -NR'-CO-, -CO-NR'-, -NR'-COO-, -OCO-NR'- or -SiR'R". Group IIb: halogen atom, cyano group, nitro group, -CO-H, -OH, -SH, -NH 2 , —COOH or —SO 3 H. R' and R" each independently represent a hydrogen atom or an unsubstituted aliphatic hydrocarbon group having 1 to 20 carbon atoms, and when there are a plurality of R' or R", they may be the same or different.

3. a is 1, The b is 1, The compound according to claim 2, wherein the following partial structure (Aα) in the general formula (A) is a group represented by the following general formula (Ara1) or (Arb1). 【Chemistry 5】 (In the formula, Ar, R 33 and c are the same as in formula (A). 31 represents the bonding site with R 32 It represents the bonding point with 【Chemistry 6】 (In the formula, X 1 , X 2 and X 3 are the same as those in the general formulae (Ara) and (Arb), R 141 , R 142 , R 151 and R 152 are each independently Halogen atom, nitro group, cyano group, -OR 121 , -COR 121 , -OCOR 121 , -COOR 121 , -SR 121 , -SOR 121 , -SO 2 R 121 , -NR 122 R 123 , -NR 122 C.O.R. 123 , -CONR 122 R 123 an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, an unsubstituted or substituted heterocycle-containing group having 2 to 20 carbon atoms, or a group in which one or more methylene groups in the hydrocarbon group or the heterocycle-containing group are replaced by a divalent group selected from the following Group Ic: R 121 , R 122 and R 123 each independently represents a hydrogen atom, an unsubstituted or substituted hydrocarbon group having 1 to 20 carbon atoms, an unsubstituted or substituted heterocycle-containing group having 2 to 20 carbon atoms, or a group in which one or more methylene groups in the hydrocarbon group or the heterocycle-containing group are replaced with a divalent group selected from the following group Ic; R 121 , R 122 and R 123 When there are a plurality of each, they may be the same or different, The substituents substituting one or more hydrogen atoms in the substituted hydrocarbon group and the substituted heterocycle-containing group are atoms or groups selected from the following Group IIc: a1 is 0 to 3; a2 is 0 to 3; c1 is 0 to 3; c2 is 0 to 1; *1 is R 31 represents the bonding point with *2 is R 32 It represents the bonding point with (Group Ic: -O-, -COO-, -OCO-, -CO-, -CO-CO-, -CO-CO-O-, -CS-, -S-, -SO-, -SO 2 -, -NR'-, -NR'-CO-, -CO-NR'-, -NR'-COO-, -OCO-NR'- or -SiR'R". Group IIc: halogen atom, cyano group, nitro group, -CO-H, -OH, -SH, -NH 2 , —COOH or —SO 3 H. R' and R" each independently represent a hydrogen atom or an unsubstituted aliphatic hydrocarbon group having 1 to 20 carbon atoms, and when there are a plurality of R' or R", they may be the same or different.

4. The R 32 The compound according to any one of claims 1 to 3, wherein is a group represented by any one of general formulas (IVa), (IVf) and (IVh).

5. R 1 is a hydrocarbon group having 1 to 20 carbon atoms and having a halogen atom as a substituent, R 2 is a cyano group, a hydrocarbon group having 1 to 20 carbon atoms and having a halogen atom as a substituent, or a group in which one or more methylene groups of a hydrocarbon group having 1 to 20 carbon atoms and being unsubstituted or having a halogen atom as a substituent are replaced with -COO-.

6. An acid generator comprising the compound according to any one of claims 1 to 3.

7. A compound according to any one of claims 1 to 3, A resin component, A composition comprising:

8. The composition of claim 7 , wherein the resin component is an acid-curable resin component.

9. A cured product of the composition according to claim 8.

10. A method for producing a cured product, comprising a curing step of curing the composition according to claim 8.

11. The composition according to claim 7 , wherein the resin component is an acid-decomposable resin component.

12. A pattern produced from the composition of claim 11.

13. A step of forming a coating film using the composition according to claim 11, and generating an acid from the compound contained in the formed coating film; a step of developing the coating film after the step of generating an acid from the compound to remove a portion of the coating film and form a pattern; A method for manufacturing a pattern having the above structure.

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