Hydrogen production device, hydrogen production method, and power generation device

Abstract

A hydrogen production device according to the present invention comprises: a reaction tank configured such that a plurality of types of materials react with each other to generate hydrogen therein; and a material supply unit configured to repeatedly supply the plurality of types of materials to the inside of the reaction tank. The material supply unit supplies the plurality of types of materials such that mixing with the plurality of types of materials which have been previously supplied does not occur before reaction of the plurality of types of materials which have been previously supplied is finished.

Description

Hydrogen production device, hydrogen production method and power generation device CROSS-REFERENCE TO RELATED APPLICATIONS

[0001] This international application claims priority based on Japanese Patent Application No. 2023-133543, filed with the Japan Patent Office on August 18, 2023, the entire contents of which are incorporated herein by reference.

[0002] The present disclosure relates to a hydrogen production device, a hydrogen production method, and a power generation device.

[0003] Patent Document 1 discloses a hydrogen production device. The hydrogen production device includes a water supply tray and a detachable fuel cartridge. The hydrogen production device supplies water from the water supply tray to the fuel cartridge. A hydrogen generating substance in the fuel cartridge reacts with the water to generate hydrogen.

[0004] JP 2016-35928 A

[0005] However, in such hydrogen production devices, the amount of hydrogen produced decreases as the hydrogen generation reaction between the hydrogen generating substance and water in the fuel cartridge finishes. Hydrogen can be produced again by replacing the fuel cartridge with another fuel cartridge containing hydrogen generating substance that has not yet reacted with water. However, when the fuel cartridge is replaced, hydrogen production stops, making it impossible to generate hydrogen continuously.

[0006] In one aspect of the present disclosure, it is preferable to provide a hydrogen production device capable of sustainably producing hydrogen, a hydrogen production method capable of sustainably producing hydrogen, and a power generation device including a hydrogen production device capable of sustainably producing hydrogen.

[0007] One aspect of the present disclosure is a hydrogen production device comprising: a reaction tank configured to react multiple types of materials inside to generate hydrogen; and a material supply unit configured to repeatedly supply the multiple types of materials into the reaction tank, wherein the material supply unit is configured to supply the multiple types of materials before the reaction of the previously supplied multiple types of materials is completed so that the new materials do not mix with the previously supplied multiple types of materials.

[0008] A hydrogen production device that is one aspect of the present disclosure can produce hydrogen sustainably.

[0009] Another aspect of the present disclosure is a method for producing hydrogen in a reaction vessel by repeatedly supplying the plurality of materials into the reaction vessel, wherein the plurality of materials are supplied before completion of a reaction of the previously supplied plurality of materials so as not to mix with the previously supplied plurality of materials.

[0010] According to a method for producing hydrogen that is another aspect of the present disclosure, hydrogen can be produced sustainably.

[0011] FIG. 1 is a block diagram showing a schematic configuration of a power generation device according to a first embodiment. FIG. 1 is a schematic diagram showing the appearance of the power generation device according to the first embodiment as seen from the front. FIG. 2 is a schematic diagram showing the solid material delivery unit, solid material supply channel, and material supply channel opening / closing unit according to the first embodiment. FIG. 3 is a schematic diagram showing the appearance of the power generation device according to the first embodiment as seen from the left side. FIG. 5A is a schematic diagram showing the material supply channel opening / closing unit in a state where the outlet of the solid material supply channel is open. FIG. 5B is a schematic diagram showing the material supply channel opening / closing unit in a state where the outlet of the solid material supply channel is blocked. FIG. 1 is a schematic diagram showing the hydrogen reaction unit according to the first embodiment, with the front wall of the reaction vessel omitted. FIG. 2 is a schematic side cross-sectional view showing the reaction vessel rotation unit and reaction vessel discharge unit according to the first embodiment. FIG. 3A to FIG. 3E are schematic diagrams showing the position and posture of the first reaction vessel when residue R is discharged from the first reaction vessel by the reaction vessel discharge unit. FIG. 4 is a diagram showing the state in which the reaction vessel group is in the rotation reference position in the hydrogen production device according to the first embodiment. FIG. 5F is a diagram showing the state in which the first reaction vessel is in the supply position in the hydrogen production device according to the first embodiment. 20A to 20F are diagrams showing the hydrogen production device according to the first embodiment, with the first reaction vessel in the reaction position and the second reaction vessel in the discharge position. 20B are diagrams showing the hydrogen production device according to the first embodiment, with the second reaction vessel in the supply position. 20C are diagrams showing the hydrogen production device according to the first embodiment, with the second reaction vessel in the reaction position and the third reaction vessel in the discharge position. 20D are diagrams showing the hydrogen production device according to the first embodiment, with the third reaction vessel in the supply position. 20E are diagrams showing the hydrogen production device according to the first embodiment, with the third reaction vessel in the reaction position and the fourth reaction vessel in the discharge position. 20F are diagrams showing the hydrogen production device according to the first embodiment, with the fourth reaction vessel in the supply position. 20F are diagrams showing the hydrogen production device according to the first embodiment, with the fourth reaction vessel in the reaction position and the first reaction vessel in the discharge position. 20C are graphs showing how the amount of hydrogen produced in each reaction vessel changes over time. 20D are schematic diagrams showing the external appearance of the power generation device according to the first embodiment, as seen from the right side. 20A to 20F are diagrams showing the states of the residue discharge unit when a process of recovering residue from a reaction tank is performed. 20E are schematic diagrams showing the external appearance of the power generation device according to the first embodiment, as seen from the rear.FIG. 29A is a control block diagram of the power generation device of the first embodiment. FIG. 29B is a flowchart showing an outline of the flow of the hydrogen production process executed in the control unit of the first embodiment. FIG. 29C is a block diagram showing an outline of the configuration of the power generation device of the second embodiment. FIG. 29D is a diagram for explaining the hydrogen reaction unit of the second embodiment. FIG. 29E is a side view of a pillar portion of the second embodiment. FIG. 29F is a diagram showing the positions of the pillar portion and the partition wall of the second embodiment. FIG. 29G is a diagram showing the positions of the pillar portion and the partition wall of the second embodiment. FIG. 29H are diagrams showing the movement of the pillar portion of the second embodiment.

[0012] 10...power generation device, 12...hydrogen production device, 14...fuel cell, 16...initial power supply unit, 16a...starting battery, 16b...power supply board, 18...frame, 18a...caster, 20...material supply unit, 22...hydrogen reaction unit, 24...residue discharge unit, 26...hydrogen supply unit, 28...operation display unit, 30...control unit, 30a...CPU, 30b...ROM, 30c...RAM, 30d...input / output unit, 32...solid material storage unit, 32a...storage unit main body, 32b...material flow down path, 34...solid material delivery unit, 34a...outer cylinder unit, 34b...screw, 34c...solid material delivery unit motor, 36...solid material supply channel, 36a...hanging portion, 36b...inclined portion, 36c...outlet, 37...hinge, 38...liquid material storage portion, 40...liquid material delivery portion, 42...liquid material supply channel, 44...material supply channel opening / closing portion, 44a...opening / closing portion main body, 44b...opening portion, 49...reaction tank, 49a...hydrogen supply port, 49b...residue discharge port, 49c...rear wall, 50...reaction vessel group, 51...first reaction vessel, 52...second reaction vessel, 53...third reaction vessel, 54...fourth reaction vessel, 55...opening, 56...reaction vessel rotation portion, 58...reaction vessel discharge portion, 58a...posture control portion, 58b...posture change portion, 58c...central portion, 58d... Inclined portion, 59...hydrogen flow path, 60...reactor pressure gauge, 62...reactor thermometer, 64...reactor pressure release portion, 66...rotating portion main body, 66a...vessel support shaft, 66b...bearing portion, 66c...support member, 68...rotation drive portion, 68a...rotation drive shaft, 70...position measurement portion, 71...rotation reference, 72...pressure portion, 74...reactor discharge portion, 76...reactor discharge control portion, 78...residue storage portion, 80...storage portion discharge portion, 82...storage portion discharge control portion, 84...residue recovery portion, 84a...inlet, 84b...recovery port, 86...impurity removal portion, 86a...first impurity removal portion, 86b...second impurity removal portion, 8 6c...connection path, 88...buffer tank, 90...first hydrogen supply path, 92...second hydrogen supply path, 94...third hydrogen supply path, 96...check valve, 98...tank pressure gauge, 100...power generation device, 101...partition wall, 102...column portion, 102a...residue discharge passage, 102b...inlet, 102c...outlet, 112...hydrogen production device, 120...material supply section, 122...hydrogen reaction section, 136...solid material supply path, 136a...outlet, 136b...hole, 149...reaction tank, 151...first reaction chamber, 152...second reaction chamber, 153...third reaction chamber, 154...fourth reaction chamber, M...electric motor, R...residue

[0013] Illustrative embodiments of the present disclosure will be described with reference to the drawings. First Embodiment (Configuration of Power Generation Device 10) The configuration of the power generation device 10 will be described with reference to FIG. 1. FIG. 1 is a block diagram showing a schematic configuration of the power generation device 10. As shown in FIG. 1, the power generation device 10 includes a hydrogen production device 12, a fuel cell 14, an initial power supply unit 16, and a stand 18. (Hydrogen production device 12) The hydrogen production device 12 is a component that generates hydrogen by reacting granular silicon with an aqueous potassium hydroxide solution. Silicon is a hydrogen-generating substance. The aqueous potassium hydroxide solution is a solvent that reacts with silicon.

[0014] The concentration of the potassium hydroxide aqueous solution is preferably 5% or less. When the concentration of the potassium hydroxide aqueous solution is 5% or less, the potassium hydroxide aqueous solution does not violate the Poisonous and Deleterious Substances Control Act.

[0015] In the following description, the hydrogen generating reaction refers to a reaction in which silicon reacts with an aqueous potassium hydroxide solution to generate hydrogen. The residue R refers to a residue remaining after the hydrogen generating reaction has occurred. The residue R may contain unreacted silicon or unreacted aqueous potassium hydroxide solution.

[0016] 1 , the hydrogen production device 12 includes a material supply unit 20, a hydrogen reaction unit 22, a residue discharge unit 24, a hydrogen supply unit 26, an operation display unit 28, and a control unit 30. (Material Supply Unit 20) The material supply unit 20 supplies silicon and an aqueous potassium hydroxide solution to the hydrogen reaction unit 22. The material supply unit 20 includes a solid material storage unit 32, a solid material delivery unit 34, a solid material supply path 36, a liquid material storage unit 38, a liquid material delivery unit 40, a liquid material supply path 42, and a material supply path opening / closing unit 44.

[0017] Next, the solid material storage section 32 will be described with reference to Figures 2 and 3. Figure 2 is a schematic diagram showing the appearance of the power generation device 10 as seen from the front. As shown in Figures 2 and 3, the solid material storage section 32 is a hopper that stores silicon. The solid material storage section 32 includes a storage section main body 32a and a material flow-down path 32b. Note that H in Figure 3 represents the reaction material H. The reaction material H is a mixture containing silicon and an aqueous potassium hydroxide solution in which a hydrogen generation reaction is occurring. The same applies to H in Figures 10 to 17 and 20A to 20F.

[0018] The reservoir body 32a is a cylindrical member made of stainless steel (SUS304). The lower part of the reservoir body 32a is formed in an inverted cone-like funnel shape. Through-holes are formed in the top and bottom of the reservoir body 32a. An openable lid is attached to the through-hole in the top of the reservoir body 32a.

[0019] The material flow-down passage 32b is a pipe made of stainless steel (SUS304). The material flow-down passage 32b extends linearly downward from the bottom of the storage body 32a. The interior of the storage body 32a and the interior of the material flow-down passage 32b are connected by a through-hole formed in the bottom of the storage body 32a. The silicon stored in the storage body 32a passes through the through-hole formed in the bottom of the storage body 32a and the material flow-down passage 32b and falls into the solid material delivery section 34.

[0020] The solid material reservoir 32 is located on the upper left front side of the power generating device 10 when viewed from the front. Note that Fig. 2 shows the power generating device 10 as viewed from the front. A front view means a view from a viewpoint in front of the power generating device 10. A user can open the top cover of the reservoir main body 32a and replenish silicon into the reservoir main body 32a through a through-hole formed in the top of the reservoir main body 32a.

[0021] Next, the solid material delivery section 34 will be described with reference to Fig. 3. Fig. 3 is a schematic diagram showing the solid material delivery section 34, the solid material supply path 36, and the material supply path opening / closing section 44.

[0022] 3, the solid material delivery unit 34 is a mechanism for delivering a predetermined amount of silicon dropping from the material flow-down path 32b to the solid material supply path 36. The solid material delivery unit 34 includes a cylindrical outer tube 34a, a screw 34b, and a solid material delivery unit motor 34c.

[0023] The outer cylinder 34a is a cylindrical member made of polyvinyl chloride (PVC). The lower end of the outer cylinder 34a is connected to the lower end of the material flow-down passage 32b. The upper end of the outer cylinder 34a is located above a reaction tank 49 (described later). The axial direction of the outer cylinder 34a is inclined with respect to both the horizontal and vertical directions.

[0024] The screw 34b is a member made of stainless steel (SUS304). The screw 34b has a rotating shaft and a blade attached to the outer circumferential surface of the rotating shaft. The blade extends spirally on the outer circumferential surface of the rotating shaft. Most of the screw 34b is housed inside the outer tubular portion 34a. A portion of the rotating shaft of the screw 34b protrudes obliquely upward from the upper end surface of the outer tubular portion 34a. The axial direction of the screw 34b and the axial direction of the outer tubular portion 34a are parallel.

[0025] The solid material delivery motor 34c is disposed above the outer cylinder 34a, and the drive shaft of the solid material delivery motor 34c is connected to a portion of the rotation shaft of the screw 34b that protrudes from the upper end surface of the outer cylinder 34a.

[0026] The screw 34b is driven by a solid material delivery motor 34c and rotates at a predetermined rotational speed for a predetermined period of time. The solid material delivery motor 34c is controlled by a control unit 30, which will be described later. The rotating screw 34b delivers silicon from the lower end to the upper end of the outer tube 34a. Furthermore, the screw 34b delivers silicon in predetermined amounts to a solid material supply path 36, which will be described later and is connected to the upper end of the outer tube 34a.

[0027] The solid material supply path 36 is a hollow tube made of stainless steel (SUS304). The solid material supply path 36 has a hanging portion 36a and an inclined portion 36b. The hanging portion 36a is connected to the upper end of the outer cylinder portion 34a. The interior of the hanging portion 36a is connected to the interior of the outer cylinder portion 34a. The hanging portion 36a extends linearly downward from the upper end of the outer cylinder portion 34a. The inclined portion 36b extends diagonally downward from the lower end of the hanging portion 36a. The inclined portion 36b penetrates the outer wall of the reaction tank 49 (described later) and extends into the interior of the reaction tank 49. The lower end of the inclined portion 36b is located inside the reaction tank 49. Silicon delivered from the upper end of the solid material delivery portion 34 passes through the solid material supply path 36 and falls into the interior of the reaction tank 49. Since the solid material supply path 36 has a downward slope, the silicon moves through the solid material supply path 36 due to its gravity.

[0028] Next, the liquid material storage section 38 will be described with reference to Figures 2 and 4. Figure 4 is a schematic diagram showing the appearance of the power generation device 10 as seen from the left side.

[0029] As shown in Figures 2 and 4, the liquid material storage section 38 is a tank that stores the potassium hydroxide aqueous solution. The liquid material storage section 38 is made of polyethylene. The liquid material storage section 38 has a vertically elongated, flat shape. As shown in Figure 2, the liquid material storage section 38 is located at the lower left side when viewed from the front inside the power generation device 10. An opening with a lid is provided at the top of the liquid material storage section 38 for refilling the potassium hydroxide aqueous solution.

[0030] The liquid material supply path 42 is a pipe made of polytetrafluoroethylene (PTFE). The upstream end of the liquid material supply path 42 is connected to the bottom of the liquid material storage section 38. A through-hole is formed in the bottom of the liquid material storage section 38. The interior of the liquid material storage section 38 and the interior of the liquid material supply path 42 are in communication via the through-hole. The downstream end of the liquid material supply path 42 is connected to the lower side surface of the hanging portion 36a.

[0031] The potassium hydroxide aqueous solution stored in the liquid material storage section 38 flows into the inclined section 36b through the liquid material supply path 42 and the hanging section 36a. Thus, the inclined section 36b is a passage through which both the silicon and the potassium hydroxide aqueous solution pass.

[0032] The liquid material delivery unit 40 is a canned pump for delivering the potassium hydroxide aqueous solution from the liquid material storage unit 38 to the liquid material supply path 42. For example, a pump model NRD-08TE24-R manufactured by Iwaki Corporation can be used as the liquid material delivery unit 40. The control unit 30, which will be described later, controls the liquid material delivery unit 40. The control unit 30 controls, for example, the driving time of the liquid material delivery unit 40, thereby delivering a predetermined amount of the potassium hydroxide aqueous solution from the liquid material storage unit 38 to the liquid material supply path 42.

[0033] The liquid material delivery unit 40 is provided midway along the liquid material supply path 42. As shown in Figure 2, the liquid material delivery unit 40 is located at the lower left when viewed from the front inside the power generation device 10. As shown in Figure 4, the liquid material delivery unit 40 is located in front of the liquid material storage unit 38.

[0034] Next, the material supply path opening / closing unit 44 will be described with reference to Figures 5A and 5B. Figure 5A is a schematic diagram showing the material supply path opening / closing unit 44 in a state in which the outlet 36c of the solid material supply path 36 is open. Figure 5B is a schematic diagram showing the material supply path opening / closing unit 44 in a state in which the outlet 36c is closed.

[0035] 5A and 5B, the material supply path opening / closing unit 44 is a member that can open and close the outlet 36c. The material supply path opening / closing unit 44 includes an opening / closing unit main body 44a and an opening portion 44b.

[0036] The opening / closing unit body 44a is a lid that can close the outlet 36c. The opening / closing unit body 44a includes a stainless steel (SUS304) member and an ethylene propylene diene rubber (EPDM) packing. When the opening / closing unit body 44a closes the outlet 36c, the packing abuts against the outlet 36c. The opening / closing unit body 44a is fixed to the solid material supply path 36 by a hinge 37. The opening / closing unit body 44a is rotatable around the hinge 37.

[0037] The opening portion 44b is a rod-shaped member fixed to one side of the opening / closing unit main body 44a. The opening portion 44b is made of stainless steel (SUS304). The axial direction of the opening portion 44b and the thickness direction of the opening / closing unit main body 44a are generally parallel. The opening portion 44b and the opening / closing unit main body 44a are an integral member having a fixed shape. Therefore, the opening portion 44b and the opening / closing unit main body 44a rotate together around the hinge 37 as the center of rotation.

[0038] 5B, when the opening / closing unit main body 44a closes the outlet 36c, the opening portion 44b extends from the opening / closing unit main body 44a toward the center of a reaction tank 49, which will be described later. Also, as shown in FIG. 5B, when the opening / closing unit main body 44a closes the outlet 36c, the opening portion 44b is located on the movement path of a pressing unit 72, which will be described later.

[0039] 5A and 5B around the rotary drive shaft 68a. When the opening / closing unit main body 44a is not pressed by the pressing unit 72, gravity acting on the material supply path opening / closing unit 44 causes the outlet 36c to close, as shown in FIG.

[0040] 5A, the opening portion 44b is pressed by the pressing portion 72, causing the material supply path opening / closing portion 44 to rotate counterclockwise in FIG. 5A around the hinge 37. At this time, the opening / closing portion main body 44a opens the outlet 36c.

[0041] 5B, when the pressing portion 72 passes through the opening portion 44b, the material supply path opening / closing portion 44 rotates clockwise in FIG. 5B around the hinge 37 as a rotation center due to gravity acting on the material supply path opening / closing portion 44. As a result, the opening / closing portion main body 44a closes the outlet 36c. (Hydrogen Reaction Unit 22) Next, the hydrogen reaction unit 22 will be described with reference to FIG. 6. FIG. 6 is a schematic diagram of the hydrogen reaction unit 22 with the front wall of the reaction tank 49 omitted.

[0042] 6, the hydrogen reaction unit 22 is a section that generates hydrogen by reacting a predetermined amount of silicon supplied from the material supply unit 20 with a predetermined amount of potassium hydroxide aqueous solution. The hydrogen reaction unit 22 includes a reaction tank 49, a reaction vessel group 50, a reaction vessel rotation unit 56, and a reaction vessel discharge unit 58.

[0043] The reaction tank 49 is a tank in which a predetermined amount of silicon supplied from the material supply unit 20 reacts with a predetermined amount of potassium hydroxide aqueous solution to generate hydrogen. The reaction tank 49 is made of stainless steel (SUS304). The reaction tank 49 is cylindrical in shape. The axial direction of the cylindrical shape is parallel to the front-to-rear direction of the power generation device 10. The reaction tank 49 is housed inside the power generation device 10. The reaction tank 49 is located in front of the fuel cell 14, which will be described later.

[0044] A hydrogen supply port 49a is provided on the top surface of the reaction tank 49. Hydrogen generated inside the reaction tank 49 passes through the hydrogen supply port 49a and flows to the hydrogen supply unit 26, which will be described later. A residue discharge port 49b is provided on the bottom surface of the reaction tank 49. Residue R is discharged from the reaction vessel group 50 to the bottom side of the inside of the reaction tank 49. Due to gravity acting on the residue R, the residue R passes through the residue discharge port 49b and is discharged to the outside of the reaction tank 49.

[0045] The reaction vessel 49 also includes a hydrogen flow path 59 , a reaction vessel pressure gauge 60 , a reaction vessel thermometer 62 , and a reaction vessel pressure release section 64 .

[0046] The hydrogen flow path 59 is a stainless steel (SUS304) pipe extending upward from the top surface of the reaction vessel 49. The interior of the hydrogen flow path 59 communicates with the interior of the reaction vessel 49 via the hydrogen supply port 49a. Hydrogen generated in the reaction vessel 49 passes through the hydrogen supply port 49a and the hydrogen flow path 59 and flows into a first hydrogen supply path 90 of the hydrogen supply unit 26, which will be described later.

[0047] The reactor pressure gauge 60 is a general-purpose fluid pressure sensor that measures the pressure inside the reactor 49. The reactor pressure gauge 60 is installed in the hydrogen flow path 59. As the reactor pressure gauge 60, for example, a model manufactured by SMC, part number PSE564-02, can be used.

[0048] The reaction vessel thermometer 62 is a thermocouple that measures the temperature of the reaction vessel 49. The reaction vessel thermometer 62 is installed on the upper outer peripheral surface of the reaction vessel 49. For example, an Omron product, model E52-CA6D-N 2M, can be used as the reaction vessel thermometer 62. The pressure value measured by the reaction vessel pressure gauge 60 and the temperature value measured by the reaction vessel thermometer 62 are input to the control unit 30, which will be described later.

[0049] The reactor pressure release unit 64 is a relief valve for releasing hydrogen to the outside of the reaction tank 49 when the internal pressure of the reaction tank 49 exceeds a preset value. The reaction tank pressure release unit 64 is installed in the hydrogen flow path 59. For example, a model ACV-S2E-80 manufactured by Yamamoto Sangyo Co., Ltd. can be used as the reaction tank pressure release unit 64.

[0050] The reaction vessel group 50 is composed of a first reaction vessel 51, a second reaction vessel 52, a third reaction vessel 53, and a fourth reaction vessel 54. Hereinafter, the first reaction vessel 51, the second reaction vessel 52, the third reaction vessel 53, and the fourth reaction vessel 54 will each be referred to as a "reaction vessel." Furthermore, a "reaction vessel" refers to any one of the first reaction vessel 51, the second reaction vessel 52, the third reaction vessel 53, and the fourth reaction vessel 54.

[0051] Each reaction vessel is a vessel that reacts silicon supplied from the solid material supply line 36 with an aqueous potassium hydroxide solution to generate hydrogen inside the reaction tank 49. Each reaction vessel is made of stainless steel (SUS304). Each reaction vessel has the same shape and size. Each reaction vessel is shaped like a rectangular box with a bottom and an opening 55 on the top surface. Each reaction vessel is housed inside the reaction tank 49.

[0052] The solid material supply path 36 supplies silicon and the potassium hydroxide aqueous solution to each reaction vessel in turn. That is, the solid material supply path 36 supplies silicon and the potassium hydroxide aqueous solution to the first reaction vessel 51, then supplies silicon and the potassium hydroxide aqueous solution to the second reaction vessel 52, then supplies silicon and the potassium hydroxide aqueous solution to the third reaction vessel 53, and then supplies silicon and the potassium hydroxide aqueous solution to the fourth reaction vessel 54. Thereafter, the solid material supply path 36 again supplies silicon and the potassium hydroxide aqueous solution to the first reaction vessel 51, the second reaction vessel 52, the third reaction vessel 53, and the fourth reaction vessel 54 in turn.

[0053] For example, when the solid material supply line 36 is supplying silicon and an aqueous potassium hydroxide solution to one reaction vessel of the reaction vessel group 50, it does not supply silicon and an aqueous potassium hydroxide solution to the other three reaction vessels.

[0054] Each reaction vessel receives silicon and an aqueous potassium hydroxide solution through an opening 55. In each reaction vessel, silicon and the aqueous potassium hydroxide solution react independently to generate hydrogen. The generated hydrogen in each reaction vessel passes through the opening 55 and diffuses into the interior of the reaction tank 49.

[0055] Each reaction vessel is attached to a reaction vessel rotating unit 56, which will be described later. As shown in Fig. 6, in a front view, the reaction vessels are arranged at 90° intervals along the circumferential direction of a circle centered on a rotation drive shaft 68a, which will be described later.

[0056] The reaction vessel rotator 56 will be described with reference to Figures 6 and 7. Figure 7 is a schematic side cross-sectional view showing the reaction vessel rotator 56 and the reaction vessel discharge unit 58. The reaction vessel rotator 56 is a mechanism that rotates and moves each reaction vessel inside the reaction tank 49. As shown in Figure 7, the reaction vessel rotator 56 includes a rotation unit main body 66, a rotation drive unit 68, a position measurement unit 70, and a pressing unit 72.

[0057] The rotating unit main body 66 is a part that rotates and moves each reaction vessel by the driving force of the rotation drive unit 68. The rotating unit main body 66 includes four vessel support shafts 66a, four bearings 66b, and a support member 66c.

[0058] 6, the support member 66c is a disc-shaped member and is disposed on the rear side inside the reaction vessel 49. The thickness direction of the support member 66c is parallel to the front-rear direction of the power generation device 10.

[0059] The four bearings 66b are attached to the support member 66c. Each of the four bearings 66b is a bearing for rotatably supporting one container support shaft 66a. When viewed from the thickness direction of the support member 66c, the four bearings 66b are arranged at 90° intervals along the circumference of a circle centered on the rotation drive shaft 68a. The four bearings 66b are located near the outer edge of the support member 66c.

[0060] Each of the four container support shafts 66a is a rod-shaped member. Each of the four container support shafts 66a is supported by one bearing 66b. The bearing 66b supports a portion of each container support shaft 66a near the center in the longitudinal direction. The axial direction of each of the four container support shafts 66a is parallel to the thickness direction of the support member 66c. Each of the four container support shafts 66a is rotatable relative to the support member 66c around its central axis.

[0061] The four container support shafts 66a are arranged at 90° intervals along the circumference of a circle centered on the rotation drive shaft 68a when viewed from the thickness direction of the support member 66c. Each of the four container support shafts 66a is connected to one of the reaction vessels at its front end. The part of the reaction vessel that is connected to the container support shaft 66a is the center of the rear surface of the reaction vessel.

[0062] The reaction vessel and the vessel support shaft 66a are integrally rotatable with respect to the support member 66c around the vessel support shaft 66a.

[0063] The rotation drive unit 68 includes a rotation drive shaft 68a. The axial direction of the rotation drive shaft 68a is parallel to the thickness direction of the support member 66c and the front-to-rear direction of the power generation device 10. The front end of the rotation drive shaft 68a is connected to the center of the support member 66c. The rotation drive shaft 68a passes through the center of the rear wall 49c of the reaction vessel 49. The rear wall 49c is the portion of the outer wall of the reaction vessel 49 that is located on the rear side of the power generation device 10.

[0064] The rotation drive unit 68 includes an electric motor M for rotating the support member 66c around a rotation drive shaft 68a. The support member 66c rotates clockwise in FIG. 6. The electric motor M is connected to the rear end of the rotation drive shaft 68a. The electric motor M is disposed on the rear side of the reaction tank 49.

[0065] The rotation drive unit 68 is controlled by the control unit 30, which will be described later. When the support member 66c is rotated by the rotation drive unit 68, the four container support shafts 66a, the four bearings 66b, and each reaction vessel also rotate around the rotation drive shaft 68a together with the support member 66c.

[0066] As described above, each reaction vessel can rotate relative to the support member 66c around the vessel support shaft 66a. In addition, the bottom side of each reaction vessel is heavier than the opening 55 side.

[0067] Therefore, the orientation of each reaction vessel is basically such that the opening 55 faces upward (hereinafter referred to as the normal orientation). The orientation of each reaction vessel is not affected by whether or not silicon and an aqueous potassium hydroxide solution are contained therein.

[0068] However, when the residue R is discharged by the reaction vessel discharge unit 58 described later, the orientation of each reaction vessel is the residue discharge orientation shown in Fig. 8D. The residue discharge orientation is an orientation in which the opening 55 is angled downward.

[0069] When each reaction vessel is in the residue discharge position, it discharges the residue R therein. The rotation reference 71 shown in FIG. 7 is fixed to the outer circumferential surface of the rotary drive shaft 68a. The rotation reference 71 rotates together with the rotary drive shaft 68a. There are four rotation references 71. The four rotation references 71 are arranged at equal intervals along the circumferential direction of the rotary drive shaft 68a. The interval between two adjacent rotation references 71 is 90°.

[0070] The position measurement unit 70 is a position sensor that detects the rotation reference 71. The position measurement unit 70 outputs information representing the detection result of the rotation reference 71 (hereinafter referred to as rotation reference information) to the control unit 30. The control unit 30 controls the rotation of the rotary drive shaft 68a based on the rotation reference information.

[0071] 6 and 7, the pressing portion 72 is a rod-shaped member. The pressing portion 72 is attached to the outer periphery of the front surface of the support member 66c. The axial direction of the pressing portion 72 is parallel to the radial direction of the support member 66c. The pressing portion 72 protrudes further outward than the outer periphery of the support member 66c.

[0072] The reaction vessel rotation unit 56 includes four pressing units 72. As shown in Fig. 6, the four pressing units 72 are arranged at equal intervals along the circumferential direction of the support member 66c. The interval between two adjacent pressing units 72 is 90°.

[0073] In the circumferential direction of the support member 66c, the positions of the four pressing portions 72 are midway between the first reaction vessel 51 and the second reaction vessel 52, midway between the second reaction vessel 52 and the third reaction vessel 53, midway between the third reaction vessel 53 and the fourth reaction vessel 54, and midway between the fourth reaction vessel 54 and the first reaction vessel 51.

[0074] When the support member 66c rotates around the rotary drive shaft 68a, the four pressing portions 72 also rotate around the rotary drive shaft 68a. When the pressing portions 72 rotating around the rotary drive shaft 68a pass near the material supply path opening / closing portion 44, they press the opening portion 44b, as shown in Fig. 5A, causing the material supply path opening / closing portion 44 to rotate around the hinge 37. At this time, the outlet 36c of the solid material supply path 36 is opened.

[0075] After the pressing portion 72 passes near the material supply path opening / closing portion 44, the material supply path opening / closing portion 44 rotates clockwise in Fig. 5B around the hinge 37 as a rotation center due to gravity acting on the material supply path opening / closing portion 44. As a result, the opening / closing portion main body 44a closes the outlet 36c of the solid material supply path 36.

[0076] Since the reaction vessel rotating section 56 has four pressing sections 72, when the support member 66c makes one rotation, the material supply path opening / closing section 44 repeatedly opens and closes the outlet 36c of the solid material supply path 36 four times.

[0077] Next, the reaction vessel discharge part 58 will be described with reference to Fig. 7 and Fig. 8A to Fig. 8E. Fig. 8A to Fig. 8E are diagrams showing various states when the reaction vessel discharge part 58 discharges the residue R from the first reaction vessel 51.

[0078] 8A to 8C, the reaction vessel discharge unit 58 includes a posture control unit 58a and a posture changing unit 58b. The posture control unit 58a is provided corresponding to each reaction vessel.

[0079] Here, a description will be given of the attitude control unit 58a corresponding to the first reaction vessel 51. The attitude control units 58a corresponding to the second reaction vessel 52, the third reaction vessel 53, and the fourth reaction vessel 54 also have the same configuration.

[0080] 7, the attitude control unit 58a is fixed to a container support shaft 66a that supports the first reaction container 51. The attitude control unit 58a, the container support shaft 66a, and the first reaction container 51 rotate integrally around the container support shaft 66a.

[0081] As shown in Fig. 7, the attitude control unit 58a is fixed to a portion of the container support shaft 66a that is rearward of the bearing portion 66b. Also, as shown in Fig. 6, the attitude control unit 58a is fixed to a portion of the container support shaft 66a that is closer to the opening 55.

[0082] As shown in FIG. 6 , the attitude control unit 58a is a rod-shaped member. The attitude control unit 58a includes a central portion 58c that extends along a straight line when viewed from the front, and inclined portions 58d at both ends. The longitudinal direction of the central portion 58c is parallel to the width direction of the first reaction vessel 51. The width direction of the first reaction vessel 51 is a direction perpendicular to the direction from the opening 55 toward the bottom. The longitudinal direction of the central portion 58c is also perpendicular to the thickness direction of the support member 66c. The inclined portions 58d are inclined toward the bottom of the first reaction vessel 51.

[0083] 6 and 7, the position changer 58b is a rod-shaped member provided on the rear wall 49c of the reaction vessel 49. The position changer 58b extends forward from the rear wall 49c. The axial direction of the position changer 58b is parallel to the thickness direction of the support member 66c.

[0084] 6, the position changer 58b is located on the lower left side of the support member 66c in a front view, and is located on the path of the position control unit 58a when the support member 66c rotates.

[0085] In a front view, the support member 66c and each reaction vessel rotate clockwise around the rotation drive shaft 68a. With each rotation of the support member 66c and each reaction vessel, the state of the first reaction vessel 51 changes in sequence from the state shown in Fig. 8A to the state shown in Fig. 8E.

[0086] 8A, the attitude control unit 58a corresponding to the first reaction vessel 51 has not yet come into contact with the attitude changing unit 58b. The attitude of the first reaction vessel 51 is the normal attitude.

[0087] When the support member 66c and each reaction vessel further rotate clockwise around the rotation drive shaft 68a from the state shown in Fig. 8A in a front view, the state shown in Fig. 8B is reached. In the state shown in Fig. 8B, the inclined portion 58d of the attitude control unit 58a corresponding to the first reaction vessel 51 abuts against the attitude changing unit 58b. When the attitude control unit 58a and the first reaction vessel 51 are pushed by the attitude changing unit 58b, they start to rotate counterclockwise around the bearing portion 66b in a front view.

[0088] When the support member 66c and each reaction vessel further rotate clockwise around the rotation drive shaft 68a from the state shown in Fig. 8B in a front view, the state shown in Fig. 8C is reached. In the state shown in Fig. 8C, the attitude control unit 58a and the first reaction vessel 51 further rotate counterclockwise around the bearing portion 66b in a front view.

[0089] When the support member 66c and each reaction vessel further rotate clockwise around the rotation drive shaft 68a from the state shown in Figure 8C, the state shown in Figure 8D is reached. In the state shown in Figure 8D, the attitude control unit 58a and the first reaction vessel 51 further rotate counterclockwise around the bearing portion 66b in the front view. As a result, the attitude of the first reaction vessel 51 becomes the residue discharge attitude. Residue R is discharged from the first reaction vessel 51 in the residue discharge attitude. The discharged residue R accumulates on the bottom side inside the reaction tank 49.

[0090] When the support member 66c and each reaction vessel further rotate clockwise around the rotation drive shaft 68a from the state shown in Figure 8D, they reach the state shown in Figure 8E. In the state shown in Figure 8E, the attitude control unit 58a corresponding to the first reaction vessel 51 has already passed the position of the attitude change unit 58b. The attitude control unit 58a is not being pushed by the attitude change unit 58b. Therefore, the attitude of the first reaction vessel 51 returns to the normal attitude.

[0091] Similar to the first reaction vessel 51, the second reaction vessel 52, the third reaction vessel 53, and the fourth reaction vessel 54 also change their positions with each rotation of the support member 66c. (Continuous hydrogen generation reaction by the hydrogen reaction unit 22) The continuous hydrogen generation reaction by the hydrogen reaction unit 22 will be described with reference to FIGS. 9 to 17. The support member 66c and each reaction vessel rotate clockwise around the rotation drive shaft 68a in a front view. With each rotation of the support member 66c and each reaction vessel, the state of the hydrogen reaction unit 22 changes sequentially from the state shown in FIG. 9 to the state shown in FIG. 17.

[0092] 9 , all four pressing portions 72 are away from the open portion 44b, and therefore the outlet 36c of the solid material supply path 36 is closed by the material supply path opening / closing portion 44. Therefore, the material supply portion 20 does not supply silicon and the potassium hydroxide aqueous solution to the hydrogen reaction portion 22.

[0093] 9, all four attitude control units 58a are away from the attitude change units 58b, so that the attitude of each reaction vessel is in the normal attitude. Therefore, no residue R is discharged from each reaction vessel.

[0094] Next, the control unit 30 controls the rotation drive unit 68 to rotate the support member 66c and each reaction vessel around the rotation drive shaft 68a. The direction of rotation is clockwise when viewed from the front. The angle of rotation is approximately 15°. As a result, the arrangement of each reaction vessel becomes as shown in FIG. 10. The control unit 30 controls the rotation of the rotation drive shaft 68a based on the rotation reference information.

[0095] 10, the pressing portion 72 between the first reaction vessel 51 and the fourth reaction vessel 54 presses the opening portion 44b, opening the outlet 36c of the solid material supply path 36. In the state shown in Fig. 10, the first reaction vessel 51 is positioned below the outlet 36c of the solid material supply path 36. Hereinafter, the position below the outlet 36c of the solid material supply path 36 will be referred to as the supply position.

[0096] 10, all four attitude control units 58a are away from the attitude change units 58b, so the attitude of each reaction vessel is in the normal attitude. Therefore, none of the reaction vessels discharges residue R. In addition, since the attitude of the first reaction vessel 51 is in the normal attitude, the first reaction vessel 51 can receive silicon and potassium hydroxide aqueous solution from the material supply unit 20.

[0097] 10 , the control unit 30 drives the solid material delivery unit 34 for a period of time T1 to deliver a predetermined amount of silicon from the solid material storage unit 32 to the solid material supply path 36. The silicon is guided along the solid material supply path 36 into the interior of the reaction tank 49, drops from the outlet 36c through which the material supply path opening / closing unit 44 is open, and is supplied to the first reaction vessel 51 through the opening 55.

[0098] Thereafter, the control unit 30 drives the liquid material delivery unit 40 for a period of time T2 to deliver a predetermined amount of aqueous potassium hydroxide solution from the liquid material storage unit 38 to the middle of the solid material supply path 36 via the liquid material supply path 42. The aqueous potassium hydroxide solution drops from the outlet 36c and is supplied to the first reaction vessel 51. In the first reaction vessel 51, a hydrogen generation reaction begins between the silicon and the aqueous potassium hydroxide solution that were previously supplied.

[0099] The hydrogen generated in the hydrogen generation reaction in the first reaction vessel 51 leaves the first reaction vessel 51, passes through the inside of the reaction tank 49 and the hydrogen supply port 49a, and flows to the hydrogen supply unit 26. In a later state, the hydrogen generated in the hydrogen generation reaction in the second reaction vessel 52, the third reaction vessel 53, and the fourth reaction vessel 54 also flows to the hydrogen supply unit 26.

[0100] Next, the control unit 30 controls the rotation drive unit 68 to rotate the support member 66c and each reaction vessel around the rotation drive shaft 68a. The direction of rotation is clockwise when viewed from the front. The angle of rotation is approximately 39°. As a result, the arrangement of each reaction vessel becomes as shown in FIG. 11. The control unit 30 controls the rotation of the rotation drive shaft 68a based on the rotation reference information.

[0101] Next, the control unit 30 stops the rotation of the support member 66c and each reaction vessel for a predetermined time, which is time T3A or time T3B.

[0102] 11 , all four pressing portions 72 are away from the open portion 44b, and therefore the outlet 36c of the solid material supply path 36 is closed by the material supply path opening / closing portion 44. Therefore, the material supply portion 20 does not supply silicon and the potassium hydroxide aqueous solution to the hydrogen reaction portion 22.

[0103] 11, the attitude control unit 58a corresponding to the second reaction vessel 52 comes into contact with the attitude change unit 58b, and the attitude of the second reaction vessel 52 becomes the residue discharge attitude. If residue R is present in the second reaction vessel 52, the residue R is discharged from the second reaction vessel 52.

[0104] In the state shown in FIG. 11, the first reaction vessel 51, the third reaction vessel 53, and the fourth reaction vessel 54 are all in the normal position.

[0105] Next, the control unit 30 controls the rotation drive unit 68 to rotate the support member 66c and each reaction vessel around the rotation drive shaft 68a. The direction of rotation is clockwise when viewed from the front. The angle of rotation is approximately 51°. As a result, the arrangement of each reaction vessel becomes as shown in FIG. 12. The control unit 30 controls the rotation of the rotation drive shaft 68a based on the rotation reference information.

[0106] 12, the pressing portion 72 between the first reaction vessel 51 and the second reaction vessel 52 presses the opening portion 44b, opening the outlet 36c of the solid material supply path 36. In the state shown in FIG. 12, the second reaction vessel 52 is in the supply position.

[0107] 12, all four attitude control units 58a are away from the attitude change units 58b, so the attitude of each reaction vessel is in the normal attitude. Therefore, none of the reaction vessels discharges residue R. In addition, since the attitude of the second reaction vessel 52 is in the normal attitude, the second reaction vessel 52 can receive silicon and potassium hydroxide aqueous solution from the material supply unit 20.

[0108] 12, the control unit 30 controls the solid material delivery unit 34 to supply silicon to the second reaction vessel 52. The control unit 30 also controls the liquid material delivery unit 40 to supply the potassium hydroxide aqueous solution to the second reaction vessel 52. The manner in which silicon and the potassium hydroxide aqueous solution are supplied in the state shown in Fig. 12 is the same as in the state shown in Fig. 10. In the second reaction vessel 52, a hydrogen generation reaction between the silicon and the potassium hydroxide aqueous solution begins.

[0109] Next, the control unit 30 controls the rotation drive unit 68 to rotate the support member 66c and each reaction vessel around the rotation drive shaft 68a. The direction of rotation is clockwise when viewed from the front. The angle of rotation is approximately 39°. As a result, the arrangement of each reaction vessel becomes as shown in FIG. 13. The control unit 30 controls the rotation of the rotation drive shaft 68a based on the rotation reference information.

[0110] Next, the control unit 30 stops the rotation of the support member 66c and each reaction vessel for a predetermined time, which is time T3A or time T3B.

[0111] 13, all four pressing portions 72 are away from the open portion 44b, and therefore the outlet 36c is closed by the material supply path opening / closing portion 44. Therefore, the material supply portion 20 does not supply silicon and the potassium hydroxide aqueous solution to the hydrogen reaction portion 22.

[0112] 13, the attitude control unit 58a corresponding to the third reaction vessel 53 comes into contact with the attitude change unit 58b, and the attitude of the third reaction vessel 53 becomes the residue discharge attitude. If residue R is present in the third reaction vessel 53, the residue R is discharged from the third reaction vessel 53.

[0113] In the state shown in FIG. 13, the first reaction vessel 51, the second reaction vessel 52, and the fourth reaction vessel 54 are all in the normal position.

[0114] Next, the control unit 30 controls the rotation drive unit 68 to rotate the support member 66c and each reaction vessel around the rotation drive shaft 68a. The direction of rotation is clockwise when viewed from the front. The angle of rotation is approximately 51°. As a result, the arrangement of each reaction vessel becomes as shown in FIG. 14. The control unit 30 controls the rotation of the rotation drive shaft 68a based on the rotation reference information.

[0115] 14, the pressing portion 72 between the second reaction vessel 52 and the third reaction vessel 53 presses the opening portion 44b to open the outlet 36c. In the state shown in FIG. 14, the third reaction vessel 53 is in the supply position.

[0116] 14, all four attitude control units 58a are away from the attitude change units 58b, so the attitude of each reaction vessel is in the normal attitude. Therefore, none of the reaction vessels discharges residue R. In addition, since the attitude of the third reaction vessel 53 is in the normal attitude, the third reaction vessel 53 can receive silicon and potassium hydroxide aqueous solution from the material supply unit 20.

[0117] In the state shown in Fig. 14, the control unit 30 controls the solid material delivery unit 34 to supply silicon to the third reaction vessel 53. The control unit 30 also controls the liquid material delivery unit 40 to supply the potassium hydroxide aqueous solution to the third reaction vessel 53. The manner in which silicon and the potassium hydroxide aqueous solution are supplied in the state shown in Fig. 14 is the same as in the state shown in Fig. 10. In the third reaction vessel 53, a hydrogen generation reaction between the silicon and the potassium hydroxide aqueous solution begins.

[0118] Next, the control unit 30 controls the rotation drive unit 68 to rotate the support member 66c and each reaction vessel around the rotation drive shaft 68a. The direction of rotation is clockwise when viewed from the front. The angle of rotation is approximately 39°. As a result, the arrangement of each reaction vessel becomes as shown in FIG. 15. The control unit 30 controls the rotation of the rotation drive shaft 68a based on the rotation reference information.

[0119] Next, the control unit 30 stops the rotation of the support member 66c and each reaction vessel for a predetermined time, which is time T3A or time T3B.

[0120] 15 , all four pressing portions 72 are away from the open portion 44b, and therefore the outlet 36c is closed by the material supply path opening / closing portion 44. Therefore, the material supply portion 20 does not supply silicon and the potassium hydroxide aqueous solution to the hydrogen reaction portion 22.

[0121] 15, the attitude control unit 58a corresponding to the fourth reaction vessel 54 comes into contact with the attitude change unit 58b, and the attitude of the fourth reaction vessel 54 becomes the residue discharge attitude. If residue R is present in the fourth reaction vessel 54, the residue R is discharged from the fourth reaction vessel 54.

[0122] In the state shown in FIG. 15, the first reaction vessel 51, the second reaction vessel 52, and the third reaction vessel 53 are all in the normal position.

[0123] Next, the control unit 30 controls the rotation drive unit 68 to rotate the support member 66c and each reaction vessel around the rotation drive shaft 68a. The direction of rotation is clockwise when viewed from the front. The angle of rotation is approximately 51°. As a result, the arrangement of each reaction vessel becomes as shown in FIG. 16. The control unit 30 controls the rotation of the rotation drive shaft 68a based on the rotation reference information.

[0124] 16, the pressing portion 72 between the third reaction vessel 53 and the fourth reaction vessel 54 presses the opening portion 44b to open the outlet 36c. In the state shown in FIG. 16, the fourth reaction vessel 54 is in the supply position.

[0125] 16, all four attitude control units 58a are away from the attitude change units 58b, so the attitude of each reaction vessel is in the normal attitude. Therefore, none of the reaction vessels discharges residue R. In addition, since the attitude of the fourth reaction vessel 54 is in the normal attitude, the fourth reaction vessel 54 can receive silicon and potassium hydroxide aqueous solution from the material supply unit 20.

[0126] 16, the control unit 30 controls the solid material delivery unit 34 to supply silicon to the fourth reaction vessel 54. The control unit 30 also controls the liquid material delivery unit 40 to supply the potassium hydroxide aqueous solution to the fourth reaction vessel 54. The manner in which silicon and the potassium hydroxide aqueous solution are supplied in the state shown in Fig. 16 is the same as in the state shown in Fig. 10. In the fourth reaction vessel 54, a hydrogen generation reaction between the silicon and the potassium hydroxide aqueous solution begins.

[0127] Next, the control unit 30 controls the rotation drive unit 68 to rotate the support member 66c and each reaction vessel around the rotation drive shaft 68a. The direction of rotation is clockwise when viewed from the front. The angle of rotation is approximately 39°. As a result, the arrangement of each reaction vessel becomes as shown in FIG. 17. The control unit 30 controls the rotation of the rotation drive shaft 68a based on the rotation reference information.

[0128] Next, the control unit 30 stops the rotation of the support member 66c and each reaction vessel for a predetermined time, which is time T3A or time T3B.

[0129] 17, all four pressing portions 72 are away from the open portion 44b, and therefore the outlet 36c is closed by the material supply path opening / closing portion 44. Therefore, the material supply portion 20 does not supply silicon and the potassium hydroxide aqueous solution to the hydrogen reaction portion 22.

[0130] 17, the attitude control unit 58a corresponding to the first reaction vessel 51 comes into contact with the attitude change unit 58b, and the attitude of the first reaction vessel 51 becomes the residue discharge attitude. If residue R is present in the first reaction vessel 51, the residue R is discharged from the first reaction vessel 51.

[0131] In the state shown in FIG. 17, the second reaction vessel 52, the third reaction vessel 53, and the fourth reaction vessel 54 are all in the normal position.

[0132] 9 to 17. If a sufficient amount of silicon is stored in the solid material storage section 32 and a sufficient amount of potassium hydroxide aqueous solution is stored in the liquid material storage section 38, the hydrogen production device 12 can continuously produce a certain amount of hydrogen or more for a long period of time.

[0133] 18 is a graph showing how the amount of hydrogen produced in the first reaction vessel 51, the amount of hydrogen produced in the second reaction vessel 52, the amount of hydrogen produced in the third reaction vessel 53, and the amount of hydrogen produced in the fourth reaction vessel 54 change over time. In FIG. 18, silicon is represented as "Si" and the potassium hydroxide aqueous solution is represented as "KOH."

[0134] 18, when silicon and an aqueous potassium hydroxide solution are supplied to the first reaction vessel 51, hydrogen production begins in the first reaction vessel 51, and after a predetermined time has passed, hydrogen production ends. The same applies to the second reaction vessel 52, the third reaction vessel 53, and the fourth reaction vessel 54.

[0135] 18 , before hydrogen production in the first reaction vessel 51 is completed, silicon and a potassium hydroxide aqueous solution are supplied to the second reaction vessel 52, and hydrogen production in the second reaction vessel 52 begins. Before hydrogen production in the second reaction vessel 52 is completed, silicon and a potassium hydroxide aqueous solution are supplied to the third reaction vessel 53, and hydrogen production in the third reaction vessel 53 begins. Before hydrogen production in the third reaction vessel 53 is completed, silicon and a potassium hydroxide aqueous solution are supplied to the fourth reaction vessel 54, and hydrogen production in the fourth reaction vessel 54 begins. Before hydrogen production in the fourth reaction vessel 54 is completed, silicon and a potassium hydroxide aqueous solution are supplied to the first reaction vessel 51, and hydrogen production in the first reaction vessel 51 begins.

[0136] Therefore, the hydrogen production device 12 can continuously produce hydrogen. (Residue Discharge Unit 24) The residue discharge unit 24 will be described with reference to Figure 2. The residue discharge unit 24 is a mechanism for discharging the residue R, which is sequentially discharged from each reaction vessel to the bottom of the reaction tank 49, to the outside of the reaction tank 49. The residue discharge unit 24 includes a reaction tank discharge unit 74, a reaction tank discharge control unit 76, a residue storage unit 78, a storage unit discharge unit 80, a storage unit discharge control unit 82, and a residue recovery unit 84.

[0137] The reactor discharge section 74 is a pipe made of polyvinyl chloride. The upper end of the reactor discharge section 74 is connected to a residue discharge port 49b provided at the bottom of the reactor 49. The lower end of the reactor discharge section 74 is connected to an inlet provided in the upper wall of the residue storage section 78. The reactor discharge section 74 extends linearly downward from the bottom of the reactor 49.

[0138] The residue R discharged from each reaction vessel to the bottom of the reaction tank 49 enters the reaction tank discharge section 74 from the residue discharge port 49 b, flows down through the reaction tank discharge section 74 and enters the residue storage section 78.

[0139] The reaction vessel discharge control unit 76 is an electromagnetic valve that controls the discharge of the residue R from the residue discharge port 49 b to the residue storage unit 78 by opening and closing the pipe of the reaction vessel discharge unit 74 .

[0140] The residue storage section 78 is a cylindrical container made of polyvinyl chloride. The residue storage section 78 stores the residue R discharged from the reaction tank 49. An inlet for the residue R is provided on the upper wall of the residue storage section 78. The reaction tank discharge section 74 is connected to the inlet of the residue storage section 78. An outlet for the residue R is provided at the bottom of the residue storage section 78. The bottom of the residue storage section 78 has a tapered shape. A storage section discharge section 80 is connected to the outlet of the residue storage section 78.

[0141] Here, the volume of each reaction vessel is represented by V. The total volume of the internal volume of the residue reservoir 78 and the internal volume of the pipe of the reaction vessel discharge section 74 is smaller than V.

[0142] The reservoir discharge section 80 is a pipe made of polyvinyl chloride. The reservoir discharge section 80 guides the residue R from the residue reservoir 78 to the residue collection section 84. The upper end of the reservoir discharge section 80 is connected to the outlet of the residue reservoir 78. The lower end of the reservoir discharge section 80 is connected to the inlet 84a provided in the upper wall of the residue collection section 84. The reservoir discharge section 80 extends linearly downward from the lower wall of the residue reservoir 78.

[0143] The reservoir discharge control unit 82 is an electromagnetic valve attached to the reservoir discharge unit 80. The reservoir discharge control unit 82 controls the discharge from the residue reservoir 78 to the residue recovery unit 84 by opening and closing the reservoir discharge unit 80.

[0144] The residue collection section 84 will be described with reference to Figure 19. Figure 19 is a schematic diagram showing the appearance of the power generation device 10 as seen from the right side. The residue collection section 84 is a polyvinyl chloride tank. The residue collection section 84 is shaped like a rectangular box with a hollow space inside. An inlet 84a through which the residue R flows down is formed in the upper wall of the residue collection section 84. The residue collection section 84 is equipped with a collection port 84b.

[0145] The volume of the residue collection section 84 is larger than the volume of the residue storage section 78. Here, the volume of the residue R discharged from any of the reaction vessels in one discharge is defined as VR. The volume of the residue collection section 84 is several tens of times VR. A tool such as an electric pump can be inserted into the residue collection section 84 through the collection port 84b to collect the residue R stored in the residue collection section 84. (Process for collecting residue R from reaction vessel 49) The process for collecting residue R from the reaction vessel 49 will be described with reference to Figures 20A to 20F. The state of the residue discharge section 24 changes sequentially from the state shown in Figure 20A to the state shown in Figure 20F in conjunction with the rotation of each reaction vessel and the change in attitude of each reaction vessel.

[0146] 20A, residue R is being discharged from first reaction vessel 51. In addition, reaction vessel discharge control unit 76 closes reaction vessel discharge unit 74. Reservoir discharge control unit 82 opens reservoir discharge unit 80. Residue R discharged from first reaction vessel 51 accumulates on the bottom side inside reaction vessel 49. The portion of reaction vessel discharge unit 74 above reaction vessel discharge control unit 76 is filled with residue R.

[0147] Next, the state shown in Figure 20B is reached. In the state shown in Figure 20B, the discharge of residue R from first reaction vessel 51 has been completed. In the state shown in Figure 20B, first, reservoir discharge control unit 82 closes reservoir discharge unit 80. Then, reaction vessel discharge control unit 76 opens reaction vessel discharge unit 74. At this time, residue R that had accumulated on the bottom side inside reaction vessel 49 flows down through reaction vessel discharge unit 74 and accumulates in residue reservoir 78.

[0148] Here, since the sum of the internal volume of the residue storage section 78 and the internal volume of the pipeline of the reaction tank discharge section 74 is smaller than V, the residue R fills the residue storage section 78 and the reaction tank discharge section 74, and a portion of the residue R remains on the bottom side inside the reaction tank 49.

[0149] Next, the state shown in Figure 20C is reached. In the state shown in Figure 20C, first, the reaction vessel discharge control unit 76 closes the reaction vessel discharge unit 74. Then, the reservoir discharge control unit 82 opens the reservoir discharge unit 80. The residue R accumulated in the residue reservoir 78 flows out into the residue recovery unit 84.

[0150] Next, the state shown in FIG. 20D is reached. In the state shown in FIG. 20D, each reaction vessel rotates clockwise around the rotation drive shaft 68a in front view, more so than in the state shown in FIG. 20C. In the state shown in FIG. 20D, residue R is being discharged from the second reaction vessel 52. The reaction vessel discharge control unit 76 closes the reaction vessel discharge unit 74. The reservoir discharge control unit 82 opens the reservoir discharge unit 80. The residue R discharged from the second reaction vessel 52 accumulates on the bottom side inside the reaction vessel 49. The portion of the reaction vessel discharge unit 74 above the reaction vessel discharge control unit 76 is filled with residue R.

[0151] Next, the state shown in Figure 20E is reached. In the state shown in Figure 20E, the discharge of residue R from second reaction vessel 52 has been completed. In the state shown in Figure 20E, first, reservoir discharge control unit 82 closes reservoir discharge unit 80. Then, reaction vessel discharge control unit 76 opens reaction vessel discharge unit 74. At this time, residue R that had accumulated on the bottom side inside reaction vessel 49 flows down through reaction vessel discharge unit 74 and accumulates in residue reservoir 78.

[0152] Here, since the sum of the internal volume of the residue storage section 78 and the internal volume of the pipeline of the reaction tank discharge section 74 is smaller than V, the residue R fills the residue storage section 78 and the reaction tank discharge section 74, and a portion of the residue R remains on the bottom side inside the reaction tank 49.

[0153] Next, the state shown in Fig. 20F is reached. In the state shown in Fig. 20F, first, the reaction vessel discharge control unit 76 closes the reaction vessel discharge unit 74. Then, the reservoir discharge control unit 82 opens the reservoir discharge unit 80. The residue R accumulated in the residue reservoir 78 flows out into the residue recovery unit 84.

[0154] Thereafter, the residue R discharged from the third reaction vessel 53 and the fourth reaction vessel 54 is also subjected to the same treatment as above.

[0155] In the above process, when the residue R is discharged from the residue storage section 78 to the residue recovery section 84, the reaction vessel discharge section 74 is closed, which prevents the hydrogen generated inside the reaction vessel 49 from being discharged along with the residue R. (Hydrogen Supply Section 26) The hydrogen supply section 26 is a mechanism for removing moisture, which is an impurity, from the hydrogen generated inside the reaction vessel 49 and supplying the hydrogen to the fuel cell 14. As shown in FIG. 1 , the hydrogen supply section 26 includes an impurity removal section 86, a buffer tank 88, a first hydrogen supply channel 90, a second hydrogen supply channel 92, a third hydrogen supply channel 94, and a check valve 96.

[0156] The first hydrogen supply path 90 is a pipe made of PFA resin (a copolymer of tetrafluoroethylene and perfluoroalkoxyethylene). One end of the first hydrogen supply path 90 is connected to the hydrogen flow path 59 shown in FIG. 2. The other end of the first hydrogen supply path 90 is connected to the first impurity removal unit 86a. The first hydrogen supply path 90 guides hydrogen from the reaction vessel 49 to the first impurity removal unit 86a.

[0157] The impurity removal section 86 will be described with reference to Figure 21. Figure 21 is a schematic diagram of the power generation device 10 as seen from the rear. The impurity removal section 86 is a section for removing impurities from hydrogen. Examples of impurities include water. The impurity removal section 86 includes a first impurity removal section 86a, a second impurity removal section 86b, and a connection path 86c.

[0158] The first impurity removal unit 86a and the second impurity removal unit 86b are arranged side by side. Hydrogen generated in the reaction vessel 49 first passes through the first impurity removal unit 86a, then passes through the connection path 86c, and then passes through the second impurity removal unit 86b. The first impurity removal unit 86a and the second impurity removal unit 86b remove moisture from the hydrogen.

[0159] Water is stored inside the first impurity removal unit 86a. The first hydrogen supply path 90 extends into the first impurity removal unit 86a. The other end of the first hydrogen supply path 90 is located in the water stored inside the first impurity removal unit 86a. Relatively high-temperature hydrogen discharged from the other end of the first hydrogen supply path 90 passes through the water. As the hydrogen passes through the water, moisture is removed from the hydrogen.

[0160] The connection path 86c is a pipe made of PFA resin. One end of the connection path 86c is connected to the upper part of the first impurity removal unit 86a. The hydrogen that has passed through the water stored inside the first impurity removal unit 86a flows into the connection path 86c.

[0161] The interior of the second impurity removal section 86b is filled with silica gel. The connection path 86c extends into the interior of the second impurity removal section 86b. The other end of the connection path 86c is located within the silica gel that has filled the interior of the second impurity removal section 86b. Hydrogen discharged from the other end of the connection path 86c passes through the silica gel. As the hydrogen passes through the silica gel, moisture is removed from the hydrogen.

[0162] The second hydrogen supply channel 92 is a pipe made of polyurethane resin. One end of the second hydrogen supply channel 92 is connected to the top of the second impurity removal unit 86 b. Hydrogen that has passed through the silica gel filled inside the second impurity removal unit 86 b flows into the second hydrogen supply channel 92.

[0163] The buffer tank 88 is a cylindrical tank made of stainless steel (SUS304). The other end of the second hydrogen supply line 92 is connected to the buffer tank 88. The second hydrogen supply line 92 introduces hydrogen into the buffer tank 88.

[0164] The buffer tank 88 temporarily stores hydrogen and functions to prevent sudden changes in the pressure and flow rate of hydrogen supplied to the fuel cell 14. The buffer tank 88 is housed inside the power generation device 10. The buffer tank 88 is located on the upper left rear side when viewed from the front. The buffer tank 88 is located above the liquid material storage section 38.

[0165] The buffer tank 88 is equipped with a tank pressure gauge 98 for measuring the pressure inside the buffer tank 88. Measurement information from the tank pressure gauge 98 is input to the control unit 30. The tank pressure gauge 98 is a general-purpose fluid pressure sensor. For example, a model manufactured by SMC, part number PSE564-02, can be used as the tank pressure gauge 98.

[0166] The third hydrogen supply line 94 is a pipe made of polyurethane resin. One end of the third hydrogen supply line 94 is connected to the buffer tank 88. The other end of the third hydrogen supply line 94 is connected to the fuel cell 14. The third hydrogen supply line 94 guides hydrogen from the buffer tank 88 to the fuel cell 14.

[0167] The check valve 96 will be described with reference to Figure 1. As shown in Figure 1, the check valve 96 is disposed midway along the third hydrogen supply line 94. The check valve 96 has the function of preventing hydrogen from flowing back from the fuel cell 14 to the buffer tank 88.

[0168] The check valve 96 opens the third hydrogen supply path 94 for the flow of hydrogen from the buffer tank 88 toward the fuel cell 14. Therefore, the check valve 96 allows the movement of hydrogen from the buffer tank 88 to the fuel cell 14. The check valve 96 closes the third hydrogen supply path 94 for the flow of hydrogen from the fuel cell 14 toward the buffer tank 88. Therefore, the check valve 96 inhibits the movement of hydrogen from the fuel cell 14 to the buffer tank 88. (Operation Display Unit 28) The operation display unit 28 displays information related to the operating status of the power generation device 10. The operation display unit 28 also accepts operations for the power generation device 10. The operation display unit 28 is equipped with a small touch panel display. (Control Unit 30) The control unit 30 will be described with reference to FIG. 22. FIG. 22 is a control block diagram of the power generation device 10. As shown in FIG. 22, the control unit 30 controls the power generation device 10. The control unit 30 includes a CPU 30a, a ROM 30b, a RAM 30c, and an input / output unit 30d.

[0169] The CPU 30a controls the solid material delivery motor 34c, the liquid material delivery unit 40, the rotation drive unit 68, the reaction vessel discharge control unit 76, the reservoir discharge control unit 82, the operation and display unit 28, and the fuel cell 14 via the input / output unit 30d. The control unit 30 reads values ​​input from the reaction vessel pressure gauge 60, the reaction vessel thermometer 62, the position measurement unit 70, the tank pressure gauge 98, and the operation and display unit 28. Specific processing details of the hydrogen production process performed by the control unit 30 will be described later. (Fuel Cell 14) The fuel cell 14 will be described with reference to FIGS. 1 and 2. As shown in FIG. 1, the fuel cell 14 is a device that generates electricity by reacting hydrogen with oxygen in the atmosphere. The hydrogen used by the fuel cell 14 is hydrogen generated in the reaction vessel 49 and from which moisture has been removed by the impurity removal unit 86. The fuel cell 14 is connected to a buffer tank 88 via a third hydrogen supply path 94.

[0170] As shown in FIG. 2, the fuel cell 14 is housed inside the power generation device 10. The fuel cell 14 is located at the rear of the upper right corner when viewed from the front. The fuel cell 14 is located to the right of the buffer tank 88 when viewed from the front. The fuel cell 14 is controlled by the control unit 30. Note that, for example, a model H-200 manufactured by Horizon Fuel Cell Japan Co., Ltd. can be used as the fuel cell 14. (Initial Power Supply Unit 16) The initial power supply unit 16 will be described with reference to FIG. 1. The initial power supply unit 16 is a component that supplies the necessary power to the hydrogen production device 12 until the fuel cell 14 starts generating power. The initial power supply unit 16 includes a start-up battery 16a and a power supply board 16b.

[0171] The start-up battery 16a is a power source when the power switch of the power generation device 10 is turned on. The start-up battery 16a includes a secondary battery.

[0172] The power supply board 16b can switch between the power supply line of the starting battery 16a and the power supply line of the fuel cell 14. After the fuel cell 14 starts generating electricity, the power supply board 16b switches the power source of the hydrogen production device 12 from the starting battery 16a to the fuel cell 14. (Stand 18) The stand 18 will be described with reference to Figures 1 and 2. As shown in Figure 1, the stand 18 has the function of fixing the hydrogen production device 12, the fuel cell 14, and the initial power supply unit 16. As shown in Figure 2, casters 18a are provided at the four corners of the bottom surface of the stand 18. The casters 18a enable the power generation device 10 to be moved. (Hydrogen Production Process by Control Unit 30) Next, the hydrogen production process executed by the control unit 30 will be described with reference to Figure 23. Figure 23 is a flowchart showing an outline of the hydrogen production process executed by the control unit 30.

[0173] The hydrogen production process is realized by the CPU 30 a reading and executing a control program stored in the ROM 30 b. The hydrogen production process starts when a user or the like inputs an execution start command to the control unit 30.

[0174] As shown in FIG. 23, when the user turns on the power switch, the control unit 30 executes an initialization process in step S100.

[0175] In the initialization process, the control unit 30 stops the solid material delivery unit motor 34c, the liquid material delivery unit 40, and the rotation drive unit 68. The control unit 30 also closes the reaction vessel discharge control unit 76 and opens the reservoir discharge control unit 82. Furthermore, the control unit 30 resets the counter to zero.

[0176] In the next step S101, the control unit 30 performs a reference process. In the reference process, the control unit 30 controls the drive of the rotation drive unit 68 to stop each reaction vessel at the rotation reference position for a period of time T4. As shown in FIG. 9 , the rotation reference position is a position where the material supply unit 20 does not supply silicon and potassium hydroxide aqueous solution to the hydrogen reaction unit 22 and where each reaction vessel is in a normal position. The control unit 30 controls the drive of the rotation drive unit 68 based on the rotation reference information.

[0177] In the following step S102, the control unit 30 performs a supply position movement process. In the supply position movement process, the control unit 30 rotates the support member 66c and each reaction vessel around the rotation drive shaft 68a. The direction of rotation is clockwise when viewed from the front. The angle of rotation is approximately 15°. As a result, as shown in FIGS. 10, 12, 14, and 16, one of the first reaction vessel 51, the second reaction vessel 52, the third reaction vessel 53, and the fourth reaction vessel 54 is positioned at the supply position.

[0178] In the subsequent step S103, the control unit 30 performs a solid material supply process. In the solid material supply process, the control unit 30 drives the solid material delivery unit motor 34c for a period of time T1 to supply a predetermined amount of silicon to the reaction vessel located at the supply position.

[0179] In the next step S104, the control unit 30 performs a liquid material supply process. In the liquid material supply process, the control unit 30 drives the liquid material delivery unit 40 for a predetermined time T2, thereby supplying a predetermined amount of potassium hydroxide aqueous solution to the reaction vessel located at the supply position.

[0180] In the next step S105, the control unit 30 performs a counter update process, in which the control unit 30 adds "1" to the counter number of the counter.

[0181] In the subsequent step S106, the control unit 30 performs a reaction position movement process. In the reaction position movement process, the control unit 30 rotates the support member 66c and each reaction vessel around the rotation drive shaft 68a. The direction of rotation is clockwise when viewed from the front. The angle of rotation is approximately 39°.

[0182] In the following step S107, the control unit 30 performs a counter determination process. In the counter determination process, the control unit 30 reads the counter number from the counter, and if the counter number is less than 4, the process proceeds to step S108. If the counter number is 4 or more, the process proceeds to step S109. (1) If the counter number is less than 4, the process proceeds to step S108, where the control unit 30 performs reaction position standby process A. In reaction position standby process A, the control unit 30 stops driving the rotation drive unit 68 for a predetermined time T3A. Thereafter, the process proceeds to step S101. (2) If the counter number is 4 or more, the process proceeds to step S109, where the control unit 30 performs reaction position standby process B. In reaction position standby process B, the control unit 30 stops driving the rotation drive unit 68 for a predetermined time T3B, and thereafter, the process proceeds to step S110.

[0183] In the following step S110, the control unit 30 performs a reaction vessel residue discharge process. In the reaction vessel residue discharge process, the control unit 30 controls the reservoir discharge control unit 82 to close the reservoir discharge unit 80. The control unit 30 then controls the reaction vessel discharge control unit 76 to open the reaction vessel discharge unit 74. This state is then maintained for a predetermined time T5.

[0184] In the following step S111, the control unit 30 performs a storage section residue discharge process. In the storage section residue discharge process, the control unit 30 controls the reaction vessel discharge control unit 76 to close the reaction vessel discharge unit 74. Thereafter, the control unit 30 controls the storage section discharge control unit 82 to open the storage section discharge unit 80. Then, the process proceeds to step S101.

[0185] Thereafter, the control unit 30 repeats the processing of steps S101 to S111 until the silicon in the solid material reservoir 32 or the potassium hydroxide aqueous solution in the liquid material reservoir 38 is depleted, or until the user stops the operation on the operation display unit 28. (Method of Using the Power Generator 10) Next, a method of using the power generator 10 according to the first embodiment will be described. The procedure for using the power generator 10 is as shown in (A) to (H) below. (A) The user puts silicon into the solid material reservoir 32. (B) The user puts the potassium hydroxide aqueous solution into the liquid material reservoir 38. (C) The user turns on the power by operating the power switch on the operation display unit 28. Upon turning on the power, the control unit 30 controls the hydrogen reaction unit 22 to start the hydrogen production process. The hydrogen reaction unit 22 supplies hydrogen to the fuel cell 14 via the hydrogen supply unit 26. The fuel cell 14 generates electricity using the supplied hydrogen. (D) When the amount of silicon stored in the solid material reservoir 32 or the amount of potassium hydroxide solution stored in the liquid material reservoir 38 falls below a preset level, a refill guide message is displayed on the operation display unit 28 to guide the user to refill silicon or potassium hydroxide solution. (E) When a refill guide message is displayed on the operation display unit 28 to guide the user to refill silicon, the user refills silicon into the solid material reservoir 32. When a refill guide message is displayed on the operation display unit 28 to guide the user to refill potassium hydroxide solution, the user refills potassium hydroxide solution into the liquid material reservoir 38. (F) After refilling silicon or potassium hydroxide solution, the user presses a refill completion switch displayed on the operation display unit 28. (G) When the refill completion switch is pressed, the hydrogen reaction unit 22 supplies hydrogen to the fuel cell 14 via the hydrogen supply unit 26. The fuel cell 14 generates electricity using the supplied hydrogen. (H) When the user wishes to stop power generation in the power generation device 10, the user presses a stop switch displayed on the operation display unit 28. (Effects of the Hydrogen Production Device 12) (Effect 1A) The hydrogen production device 12 includes a reaction vessel 49. Silicon reacts with an aqueous potassium hydroxide solution inside the reaction vessel 49 to generate hydrogen. Silicon and an aqueous potassium hydroxide solution correspond to a plurality of types of materials.

[0186] The hydrogen production device 12 includes a material supply unit 20. The material supply unit 20 repeatedly supplies silicon and an aqueous potassium hydroxide solution to the inside of the reaction tank 49. That is, in the state shown in FIG. 10 , the material supply unit 20 supplies silicon and an aqueous potassium hydroxide solution to a first reaction vessel 51 inside the reaction tank 49. Thereafter, in the state shown in FIG. 12 , the material supply unit 20 supplies silicon and an aqueous potassium hydroxide solution to a second reaction vessel 52 inside the reaction tank 49. Thereafter, in the state shown in FIG. 14 , the material supply unit 20 supplies silicon and an aqueous potassium hydroxide solution to a third reaction vessel 53 inside the reaction tank 49. Thereafter, in the state shown in FIG. 16 , the material supply unit 20 supplies silicon and an aqueous potassium hydroxide solution to a fourth reaction vessel 54 inside the reaction tank 49.

[0187] 18 , the material supply unit 20 supplies silicon and the potassium hydroxide aqueous solution to the second reaction vessel 52 before the reaction between the silicon and the potassium hydroxide aqueous solution supplied to the first reaction vessel 51 is completed. The supply of silicon and the potassium hydroxide aqueous solution to the first reaction vessel 51 corresponds to the previous supply of silicon and the potassium hydroxide aqueous solution to the second reaction vessel 52.

[0188] Therefore, the material supply unit 20 supplies silicon and the potassium hydroxide aqueous solution to the second reaction vessel 52 before the reaction between the previously supplied silicon and the potassium hydroxide aqueous solution is completed.

[0189] Similarly, the material supply unit 20 supplies silicon and the potassium hydroxide aqueous solution to the third reaction vessel 53 before the reaction between the silicon supplied to the second reaction vessel 52 and the potassium hydroxide aqueous solution is completed (i.e., before the reaction between the silicon supplied previously and the potassium hydroxide aqueous solution is completed).

[0190] In addition, the material supply unit 20 supplies silicon and the potassium hydroxide aqueous solution to the fourth reaction vessel 54 before the reaction between the silicon supplied to the third reaction vessel 53 and the potassium hydroxide aqueous solution is completed (i.e., before the reaction between the silicon supplied previously and the potassium hydroxide aqueous solution is completed).

[0191] In addition, the material supply unit 20 supplies silicon and the potassium hydroxide aqueous solution to the first reaction vessel 51 before the reaction between the silicon supplied to the fourth reaction vessel 54 and the potassium hydroxide aqueous solution is completed (i.e., before the reaction between the silicon supplied previously and the potassium hydroxide aqueous solution is completed).

[0192] Therefore, the hydrogen production device 12 can produce hydrogen continuously.

[0193] (Effect 1B) The silicon and potassium hydroxide aqueous solution supplied to the second reaction vessel 52 does not mix with the silicon and potassium hydroxide aqueous solution supplied to the first reaction vessel 51. The silicon and potassium hydroxide aqueous solution supplied to the first reaction vessel 51 corresponds to the silicon and potassium hydroxide aqueous solution supplied previously. Therefore, the silicon and potassium hydroxide aqueous solution supplied to the second reaction vessel 52 does not mix with the silicon and potassium hydroxide aqueous solution supplied previously.

[0194] Similarly, the silicon and potassium hydroxide aqueous solution supplied to the first reaction vessel 51, the third reaction vessel 53, and the fourth reaction vessel 54 does not mix with the silicon and potassium hydroxide aqueous solution supplied previously.

[0195] Therefore, the hydrogen production device 12 can keep the hydrogen generation reaction between the previously supplied silicon and potassium hydroxide aqueous solution and the hydrogen generation reaction between the next supplied silicon and potassium hydroxide aqueous solution independent of each other.

[0196] (Effect 1C) The reaction tank 49 includes a group of reaction vessels 50 therein. Each reaction vessel included in the group of reaction vessels 50 has an opening 55. Before the reaction between silicon and the aqueous potassium hydroxide solution supplied to one reaction vessel of the group of reaction vessels 50 is completed, the material supply unit 20 supplies the next supply of silicon and the aqueous potassium hydroxide solution to a reaction vessel other than the one reaction vessel.

[0197] Therefore, hydrogen generating reactions can be easily carried out independently in each reaction vessel.

[0198] (Effect 1D) Each reaction vessel moves to the supply position one by one in order. Therefore, the material supply unit 20 can be fixed, and the configuration of the hydrogen production device 12 can be simplified. Note that the fact that the material supply unit 20 is fixed and each reaction vessel moves corresponds to the fact that each reaction vessel moves relative to the material supply unit 20.

[0199] (Effect 1E) Each reaction vessel stops at the supply position, so that the supplied silicon and potassium hydroxide aqueous solution are less likely to spill from each reaction vessel at the supply position.

[0200] (Effect 1F) Silicon is a solid material. The potassium hydroxide solution is a liquid material. Therefore, the material supplied to each reaction vessel includes both solid and liquid materials. The material supply unit 20 includes a solid material storage unit 32, a liquid material storage unit 38, a solid material supply path 36, and a liquid material supply path 42.

[0201] The solid material reservoir 32 stores silicon. The liquid material reservoir 38 stores a potassium hydroxide aqueous solution. The solid material supply path 36 guides the silicon supplied from the solid material reservoir 32 to each reaction vessel. The liquid material supply path 42 guides the potassium hydroxide aqueous solution supplied from the liquid material reservoir 38 to each reaction vessel. The liquid material supply path 42 is connected midway along the solid material supply path 36.

[0202] This allows the silicon remaining in the solid material supply path 36 to be flushed into each reaction vessel together with the potassium hydroxide aqueous solution. Even if silicon solidifies on the inner wall surface of the solid material supply path 36 due to moisture, making it difficult for the silicon or the potassium hydroxide aqueous solution to pass through the solid material supply path 36, the silicon can be flushed down by the potassium hydroxide aqueous solution, and predetermined amounts of silicon and potassium hydroxide aqueous solution can be supplied to each reaction vessel.

[0203] (Effect 1G) The material supply unit 20 includes a solid material storage unit 32 and a liquid material storage unit 38. The solid material storage unit 32 and the liquid material storage unit 38 correspond to material storage units configured to store a plurality of types of materials.

[0204] The material supply unit 20 includes a solid material supply path 36. The solid material supply path 36 guides silicon supplied from the solid material reservoir 32 and the potassium hydroxide aqueous solution supplied from the liquid material reservoir 38 to each reaction vessel.

[0205] The material supply unit 20 includes a material supply path opening / closing unit 44. The material supply path opening / closing unit 44 opens and closes the solid material supply path 36. The material supply path opening / closing unit 44 can close the solid material supply path 36 when silicon and the potassium hydroxide aqueous solution are not being supplied.

[0206] This allows the solid material supply path 36 to be closed by the material supply path opening / closing unit 44, reducing the inflow of moisture from the reaction vessel 49 into the solid material supply path 36 and suppressing the solidification of silicon in the solid material supply path 36. As a result, it is possible to prevent silicon solidified in the solid material supply path 36 from interfering with the supply of silicon. Furthermore, since it is possible to prevent hydrogen present inside the reaction vessel 49 from flowing into the solid material supply path 36, it is possible to utilize the hydrogen generated inside the reaction vessel 49 without waste.

[0207] (Effect 1H) The hydrogen production device 12 includes a reaction vessel discharge unit 58. The reaction vessel discharge unit 58 discharges the residue R in each reaction vessel from each reaction vessel to the bottom side of the inside of the reaction tank 49.

[0208] Therefore, silicon and potassium hydroxide aqueous solution can be newly supplied to each reaction vessel after the residue R has been discharged. As a result, hydrogen can be produced more efficiently. (Effect 1I) Each reaction vessel is stopped for a predetermined time after silicon and potassium hydroxide aqueous solution are supplied from the material supply unit 20 and before the residue R is discharged by the reaction vessel discharge unit 58. Therefore, the time during which the hydrogen generation reaction occurs can be further extended.

[0209] Furthermore, when the hydrogen generation reaction continues for a long time, it is possible to prevent silicon and potassium hydroxide aqueous solution in which the hydrogen generation reaction has not yet finished from being discharged from each moving reaction vessel. As a result, silicon and potassium hydroxide aqueous solution can be effectively utilized, and hydrogen can be produced continuously for a longer period of time. Furthermore, by stopping each reaction vessel, it is possible to save the power used by the hydrogen production device 12.

[0210] (Effect 1J) The hydrogen production device 12 includes a residue storage unit 78, a reaction vessel discharge control unit 76, and a storage unit discharge control unit 82. The residue storage unit 78 is connected to the reaction vessel 49 via the reaction vessel discharge unit 74, and stores the residue R discharged from the reaction vessel 49. The reaction vessel discharge control unit 76 controls the discharge of the residue R from the reaction vessel 49 to the residue storage unit 78. The storage unit discharge control unit 82 controls the discharge of the residue R stored in the residue storage unit 78 to the outside of the residue storage unit 78.

[0211] By storing the residue R stored in the reaction tank 49 in the residue storage section 78, it is possible to prevent the residue R from accumulating inside the reaction tank 49. It is also possible to discard the residue R stored in the residue storage section 78. As a result, it is possible to prevent the residue R accumulated inside the reaction tank 49 from interfering with the supply of silicon and potassium hydroxide aqueous solution to each reaction vessel.

[0212] (Effect 1K) When discharging the residue R from the reaction tank 49 to the residue storage unit 78, the storage unit discharge control unit 82 controls so that the residue R is not discharged from the residue storage unit 78. When discharging the residue R stored in the residue storage unit 78 to the outside of the residue storage unit 78, the reaction tank discharge control unit 76 controls so that the residue R is not discharged from the reaction tank 49.

[0213] When the residue R is discharged from the reaction tank 49 to the residue storage section 78, the residue R is not discharged from the residue storage section 78, so that the residue R can be stored in the residue storage section 78.

[0214] Furthermore, when the residue R is discharged from the residue storage section 78, the residue R is not discharged from the reaction tank 49, which prevents the hydrogen present in the reaction tank 49 from being released to the outside of the reaction tank 49 together with the residue R. As a result, the hydrogen present inside the reaction tank 49 can be used without waste.

[0215] (Effect 1L) The residue R is discharged from the residue storage section 78 when the residue storage section 78 is filled with the residue R. For example, when the residue storage section 78 is filled with the residue R and some of the residue R remains inside the reaction tank 49, the storage section discharge control section 82 can be set to prevent the residue R from being discharged from the reaction tank 49, and then the residue R accumulated in the residue storage section 78 can be discharged to the outside of the residue storage section 78.

[0216] In this case, it is possible to prevent hydrogen present in the reaction tank 49 from entering the residue storage section 78 and being discharged to the outside of the reaction tank 49 together with the residue R. As a result, the hydrogen generated inside the reaction tank 49 can be used without waste.

[0217] (Effect 1M) The power generation device 10 includes a hydrogen production device 12 and a fuel cell 14. The fuel cell 14 generates electricity using hydrogen produced by the hydrogen production device 12. The hydrogen production device 12 can continuously produce hydrogen and continuously supply it to the fuel cell 14. As a result, the power generation device 10 can continuously generate electricity. <Second Embodiment> (Differences from First Embodiment) The second embodiment has the same basic configuration as the first embodiment, so the following mainly describes the differences. Note that the same reference numerals as those in the first embodiment indicate the same configuration, and reference is made to the preceding explanation.

[0218] A power generation system 100 according to the second embodiment will be described with reference to Fig. 24. Fig. 24 is a block diagram showing a schematic configuration of the power generation system 100. As shown in Fig. 24, the power generation system 100 includes a hydrogen production device 112, a fuel cell 14, an initial power supply unit 16, and a pedestal 18. The fuel cell 14, the initial power supply unit 16, and the pedestal 18 in the second embodiment have the same configurations as the fuel cell 14, the initial power supply unit 16, and the pedestal 18 in the first embodiment, respectively.

[0219] The hydrogen production device 112 includes a material supply unit 120 , a hydrogen reaction unit 122 , a residue discharge unit 24 , a hydrogen supply unit 26 , an operation display unit 28 , and a control unit 30 .

[0220] The residue discharge unit 24, hydrogen supply unit 26, operation display unit 28, and control unit 30 in the second embodiment have the same configurations as the residue discharge unit 24, hydrogen supply unit 26, operation display unit 28, and control unit 30 in the first embodiment, respectively. Also, the material supply unit 120 in the second embodiment has basically the same configuration as the material supply unit 20 in the first embodiment. However, the solid material supply path 136 provided in the material supply unit 120 is partially different from the solid material supply path 36 in the first embodiment. This will be described in detail later.

[0221] The first embodiment is provided with the hydrogen reaction section 22. In contrast, the second embodiment is different in that it is provided with a hydrogen reaction section 122.

[0222] The hydrogen reaction unit 122 will be described with reference to Figures 24 and 25. Figure 25 is a diagram for explaining the hydrogen reaction unit 122. Figure 25 is a diagram viewed from the top surface direction with the top surface of the reaction vessel 149 omitted.

[0223] The hydrogen reaction unit 122 is a part that generates hydrogen by reacting a predetermined amount of silicon supplied from the material supply unit 120 with a predetermined amount of potassium hydroxide aqueous solution. The hydrogen reaction unit 122 includes a reaction tank 149 and a column portion 102.

[0224] 25, the reaction vessel 149 is a cylindrical vessel made of stainless steel (SUS304), with the axial direction of the cylinder parallel to the vertical direction.

[0225] A hydrogen supply port 49a is provided on the top surface of the reaction vessel 149. Hydrogen generated inside the reaction vessel 149 passes through the hydrogen supply port 49a and flows to the hydrogen supply unit 26.

[0226] 24, the reaction vessel 149 includes a reaction vessel pressure gauge 60, a reaction vessel thermometer 62, and a reaction vessel pressure release section 64. The reaction vessel pressure gauge 60, the reaction vessel thermometer 62, and the reaction vessel pressure release section 64 are the same as those in the first embodiment.

[0227] As shown in FIG. 25 , the interior of the reaction tank 149 is divided into four regions by four partition walls 101. The four regions are a first reaction chamber 151, a second reaction chamber 152, a third reaction chamber 153, and a fourth reaction chamber 154. When viewed from the top side of the reaction tank 149, the four partition walls 101 extend radially from the center of the reaction tank 149 toward the periphery. When viewed from the top side of the reaction tank 149, the first reaction chamber 151, the second reaction chamber 152, the third reaction chamber 153, and the fourth reaction chamber 154 each have an arc shape. The lower ends of the four partition walls 101 contact the bottom surface of the reaction tank 149. There are gaps between the upper ends of the four partition walls 101 and the top surface of the reaction tank 149.

[0228] The pillar portion 102 is a cylindrical member extending in the vertical direction. The pillar portion 102 penetrates the reaction tank 149 in the up-down direction. As shown in Figure 25, when viewed from the top side of the reaction tank 149, the pillar portion 102 is located in the center of the reaction tank 149. The inner end faces of the four partition walls 101 each contact the outer peripheral surface of the pillar portion 102. The bottom surface of the reaction tank 149 is inclined downward as it approaches the pillar portion 102.

[0229] The first reaction chamber 151, the second reaction chamber 152, the third reaction chamber 153, and the fourth reaction chamber 154 function in the same manner as the first reaction vessel 51, the second reaction vessel 52, the third reaction vessel 53, and the fourth reaction vessel 54 in the first embodiment.

[0230] That is, silicon and potassium hydroxide aqueous solution are supplied individually at time intervals to the first reaction chamber 151, the second reaction chamber 152, the third reaction chamber 153, and the fourth reaction chamber 154 by the material supply unit 120. A hydrogen generation reaction occurs independently in each of the first reaction chamber 151, the second reaction chamber 152, the third reaction chamber 153, and the fourth reaction chamber 154. Because there are gaps between the upper ends of the four partition walls 101 and the top surface of the reaction tank 149, hydrogen generated in any of the first reaction chamber 151, the second reaction chamber 152, the third reaction chamber 153, and the fourth reaction chamber 154 diffuses to the other reaction chambers. As a result, hydrogen generated in any of the reaction chambers is supplied to the hydrogen supply unit 26 from the hydrogen supply port 49a.

[0231] In the following description, the first reaction chamber 151, the second reaction chamber 152, the third reaction chamber 153, and the fourth reaction chamber 154 will be referred to as "each reaction chamber." Furthermore, the term "reaction chamber" refers to any one of the first reaction chamber 151, the second reaction chamber 152, the third reaction chamber 153, and the fourth reaction chamber 154.

[0232] The column 102 is rotated by the electric motor M provided in the rotation drive unit 68 in a counterclockwise direction when viewed from the top surface side of the reaction tank 149. The material supply unit 120 is fixed to the column 102. Therefore, as the column 102 rotates, the material supply unit 120 also rotates.

[0233] Next, the column portion 102 will be described with reference to FIG. 26 . Here, FIG. 26 is a side view of the column portion 102. As shown in FIG. 26 , the outlet 136a of the solid material supply path 136 is provided on the outer peripheral surface of the column portion 102. The portion of the solid material supply path 136 on the outlet 136a side is a hole 136b penetrating the column portion 102. The hole 136b is inclined so that it becomes lower as it approaches the outlet 136a. When viewed from the top surface side of the reaction vessel 149, when the column portion 102 rotates in a counterclockwise direction, the outlet 136a and the hole 136b also rotate in the same manner as the column portion 102. Note that the solid material supply path 136 has a configuration basically similar to that of the solid material supply path 36 in the first embodiment, but is different in the portion around the outlet 136a.

[0234] The column 102 is also provided with a residue discharge passage 102a. The residue discharge passage 102a is a hole that penetrates the column 102. The residue discharge passage 102a extends from an inlet 102b that opens on the outer circumferential surface of the column 102 to an outlet 102c that opens on the bottom surface of the column 102. The residue discharge passage 102a is inclined so that it becomes lower as it approaches the outlet 102c. The inlet 102b is located lower than the hole 136b.

[0235] When viewed from the top side of the reaction vessel 149, when the column portion 102 rotates counterclockwise, the residue discharge passage 102a also rotates in the same manner as the column portion 102. As in the first embodiment, the hydrogen reaction section 122 includes a residue discharge section 24. The residue discharge passage 102a is connected to the reaction vessel discharge section 74. The residue R discharged from the residue discharge passage 102a flows into the reaction vessel discharge section 74.

[0236] Next, the positional relationship between the hole 136b, the residue discharge passage 102a, and the partition wall 101 will be described with reference to Fig. 27. Fig. 27 is a view of a portion of the column 102 and the partition wall 101 viewed from the top surface of the reaction tank 149.

[0237] As shown in Figure 27, there are four portions on the outer peripheral surface of the pillar portion 102 that are covered by a single partition wall 101. There are four portions on the outer peripheral surface of the pillar portion 102 that are not covered by a partition wall 101. The portions that are not covered by a partition wall 101 are part of the inner wall of one of the reaction chambers. The length of the portion that is covered by a single partition wall 101 in the circumferential direction of the pillar portion 102 is A. The length of the portion that is not covered by a partition wall 101 in the circumferential direction of the pillar portion 102 is B. A and B are approximately the same.

[0238] 27, the hole 136b communicates with the first reaction chamber 151 via the outlet 136a. Silicon and potassium hydroxide aqueous solution are supplied to the first reaction chamber 151. The inlet 102b is covered with the partition wall 101. Therefore, the residue R in each reaction chamber is not discharged from the residue discharge passage 102a.

[0239] Next, the positional relationship between the solid material supply path 136, residue discharge path 102a, and partition wall 101 will be further explained with reference to Figure 28. Here, Figure 28 is a view of the pillar portion 102 and a part of the partition wall 101 as viewed from the top surface of the reaction tank 149. Figure 28 is a view showing a state in which the pillar portion 102 has been rotated approximately 45° clockwise from the state shown in Figure 27 when the reaction tank 149 is viewed from the top surface.

[0240] 28, the outlet 136a is covered by the partition wall 101. Therefore, silicon and the potassium hydroxide aqueous solution are not supplied to each reaction chamber. The residue discharge passage 102a communicates with the first reaction chamber 151 via the outlet 102c. The residue R in the first reaction chamber 151 is discharged from the residue discharge passage 102a.

[0241] Next, the supply of silicon and potassium hydroxide aqueous solution and the operation of discharging the residue R after the reaction will be described with reference to Figures 29A to 29H. Here, Figures 29A to 29H are diagrams for explaining the movement of the column portion 102.

[0242] 29A , the hole 136b communicates with the first reaction chamber 151 via the outlet 136a. Silicon and potassium hydroxide aqueous solution are supplied to the first reaction chamber 151. The inlet 102b is covered with the partition wall 101. The residue R in each reaction chamber is not discharged from the residue discharge passage 102a.

[0243] The state shown in Figure 29B is the state in which the column 102 is rotated 45° counterclockwise as viewed from the top surface from the state shown in Figure 29A and then stopped. In the state shown in Figure 29B, the outlet 136a is covered by the partition wall 101. Silicon and potassium hydroxide aqueous solution are not supplied to each reaction chamber. The residue discharge passage 102a is in communication with the second reaction chamber 152 via the outlet 102c. The residue R in the second reaction chamber 152 is discharged from the residue discharge passage 102a.

[0244] The state shown in Figure 29C is the state in which the column 102 is rotated 45° counterclockwise as viewed from the top surface from the state shown in Figure 29B and then stopped. In the state shown in Figure 29C, the hole 136b communicates with the second reaction chamber 152 via the outlet 136a. Silicon and potassium hydroxide aqueous solution are supplied to the second reaction chamber 152. The inlet 102b is covered by the partition wall 101. The residue R in each reaction chamber is not discharged from the residue discharge passage 102a.

[0245] The state shown in Figure 29D is the state in which the column 102 is rotated 45° counterclockwise as viewed from the top surface from the state shown in Figure 29C and then stopped. In the state shown in Figure 29D, the outlet 136a is covered by the partition wall 101. Silicon and potassium hydroxide aqueous solution are not supplied to each reaction chamber. The residue discharge passage 102a is connected to the third reaction chamber 153 via the outlet 102c. The residue R in the third reaction chamber 153 is discharged from the residue discharge passage 102a.

[0246] The state shown in Figure 29E is the state in which the column 102 is rotated 45° counterclockwise as viewed from the top surface from the state shown in Figure 29D and then stopped. In the state shown in Figure 29E, the hole 136b communicates with the third reaction chamber 153 via the outlet 136a. Silicon and potassium hydroxide aqueous solution are supplied to the third reaction chamber 153. The inlet 102b is covered by the partition wall 101. The residue R in each reaction chamber is not discharged from the residue discharge passage 102a.

[0247] The state shown in Figure 29F is the state in which the column 102 is rotated 45° counterclockwise as viewed from the top surface from the state shown in Figure 29E and then stopped. In the state shown in Figure 29F, the outlet 136a is covered by the partition wall 101. Silicon and potassium hydroxide aqueous solution are not supplied to each reaction chamber. The residue discharge passage 102a is connected to the fourth reaction chamber 154 via the outlet 102c. The residue R in the fourth reaction chamber 154 is discharged from the residue discharge passage 102a.

[0248] The state shown in Figure 29G is the state in which the column 102 is rotated 45° counterclockwise as viewed from the top surface from the state shown in Figure 29F and then stopped. In the state shown in Figure 29G, the hole 136b communicates with the fourth reaction chamber 154 via the outlet 136a. The silicon and potassium hydroxide aqueous solution is supplied to the fourth reaction chamber 154. The inlet 102b is covered by the partition wall 101. The residue R in each reaction chamber is not discharged from the residue discharge passage 102a.

[0249] The state shown in Figure 29H is the state in which the column 102 is rotated 45° counterclockwise as viewed from the top surface from the state shown in Figure 29G and then stopped. In the state shown in Figure 29H, the outlet 136a is covered by the partition wall 101. Silicon and potassium hydroxide aqueous solution are not supplied to each reaction chamber. The residue discharge passage 102a is in communication with the first reaction chamber 151 via the outlet 102c. The residue R in the first reaction chamber 151 is discharged from the residue discharge passage 102a.

[0250] In this way, the column portion 102 is rotated counterclockwise by 45° when viewed from the top surface direction, and silicon and potassium hydroxide aqueous solution are repeatedly supplied to each reaction chamber in turn, and residue R is repeatedly discharged from each reaction chamber in turn.

[0251] Before hydrogen production in the first reaction chamber 151 is completed, silicon and an aqueous potassium hydroxide solution are supplied to the second reaction chamber 152, and hydrogen production begins in the second reaction chamber 152. The silicon and aqueous potassium hydroxide solution supplied to the second reaction chamber 152 does not mix with the silicon and aqueous potassium hydroxide solution supplied to the first reaction chamber 151.

[0252] Before hydrogen production in the second reaction chamber 152 is completed, silicon and an aqueous potassium hydroxide solution are supplied to the third reaction chamber 153, and hydrogen production begins in the third reaction chamber 153. The silicon and aqueous potassium hydroxide solution supplied to the third reaction chamber 153 does not mix with the silicon and aqueous potassium hydroxide solution supplied to the second reaction chamber 152.

[0253] Before hydrogen production in the third reaction chamber 153 is completed, silicon and an aqueous potassium hydroxide solution are supplied to the fourth reaction chamber 154, and hydrogen production begins in the fourth reaction chamber 154. The silicon and aqueous potassium hydroxide solution supplied to the fourth reaction chamber 154 does not mix with the silicon and aqueous potassium hydroxide solution supplied to the third reaction chamber 153.

[0254] Before hydrogen production in the fourth reaction chamber 154 is completed, silicon and potassium hydroxide aqueous solution are supplied to the first reaction chamber 151, and hydrogen production begins in the first reaction chamber 151. The silicon and potassium hydroxide aqueous solution supplied to the first reaction chamber 151 does not mix with the silicon and potassium hydroxide aqueous solution supplied to the fourth reaction chamber 154.

[0255] Therefore, the hydrogen production device 112 can continuously produce hydrogen.

[0256] In the second embodiment, the position of the reaction tank 149 is fixed, and the column portion 102 is rotated. As the column portion 102 rotates, the outlet 136a and the inlet 102b also rotate. As the outlet 136a rotates, the reaction chamber to which silicon and the potassium hydroxide aqueous solution are supplied from the outlet 136a is switched in sequence. As the inlet 102b rotates, the reaction chamber from which the residue R is discharged to the residue discharge passage 102a is switched in sequence. Each reaction chamber moves relative to the outlet 136a, one by one, to a supply position where silicon and the potassium hydroxide aqueous solution are supplied from the outlet 136a.

[0257] When silicon and potassium hydroxide aqueous solution are being supplied to any of the reaction chambers from the outlet 136a, the inlet 102b is covered with the partition wall 101, so that the residue R in any of the reaction chambers is not discharged from the residue discharge passage 102a.

[0258] When the residue R from any of the reaction chambers is being discharged from the residue discharge passage 102a, the outlet 136a is covered with the partition wall 101, so that silicon and the potassium hydroxide aqueous solution are not supplied to any of the reaction chambers. In addition, when the residue R from any of the reaction chambers is being discharged from the residue discharge passage 102a, the outlet 136a is covered with the partition wall 101, so that hydrogen is prevented from entering the solid material supply passage 136.

[0259] (Effects of the Hydrogen Production Device 112) According to the second embodiment described above in detail, in addition to the effects of the first embodiment described above, the following effects are also achieved.

[0260] (Effect 2A) In the second embodiment, the interior of the reaction vessel 149 is divided into four sections by partition walls 101, each forming a reaction chamber. This reduces the number of parts that make up the reaction vessel 149 and reduces the risk of failure of the hydrogen production device 112. <Other Embodiments> Although the embodiments of the present disclosure have been described above, the present disclosure is not limited to the above-described embodiments and can be implemented in various modifications.

[0261] (1) In the first embodiment, the position of each reaction vessel may be fixed relative to the reaction tank 49. Then, silicon and the potassium hydroxide aqueous solution may be supplied to each reaction vessel in sequence by moving the material supply unit 20. In this case, as in the first embodiment, each reaction vessel moves relative to the material supply unit 20.

[0262] (2) In the first embodiment, when each reaction vessel is moved to the supply position in sequence, each reaction vessel may be moved linearly inside the reaction tank 49. Examples of the direction of linear movement include the up-down direction, the left-right direction, or the front-back direction.

[0263] (3) In the first embodiment, the material supply path opening / closing unit 44 may be opened and closed by an electrically powered device such as a motor or a cylinder.

[0264] (4) In the first embodiment, the attitude of each reaction vessel may be changed by an electrically driven device such as a motor or a cylinder.

[0265] (5) In the first embodiment, the bottom of each reaction vessel may be opened and closed to discharge the residue R from each reaction vessel. In the second embodiment, the bottom of each reaction chamber may be opened and closed to discharge the residue R from each reaction chamber.

[0266] (6) In the first embodiment, the number of reaction vessels may be 2, 3, or 5 or more. In the second embodiment, the number of reaction chambers may be 2, 3, or 5 or more.

[0267] (7) In the first and second embodiments, the supply of the potassium hydroxide aqueous solution is started after the supply of silicon is completed. However, this is not limiting. The supply of the potassium hydroxide aqueous solution may be started while silicon is being supplied, the supply of silicon and the potassium hydroxide aqueous solution may be started simultaneously, silicon may be supplied after the supply of the potassium hydroxide aqueous solution is started, or silicon may be supplied after the supply of the potassium hydroxide aqueous solution is completed.

[0268] (8) In the first embodiment, the residue discharge unit 24 discharges the residue R from inside the reaction tank 49 to the outside every time the residue R is discharged from each reaction vessel into the reaction tank 49. However, this is not limited to this, and the residue R discharged from each reaction vessel may be stored inside the reaction tank 49, or the residue discharge unit 24 may discharge the residue R from inside the reaction tank 49 to the outside when a predetermined number of residues R have been discharged from each reaction vessel. The same applies to the second embodiment.

[0269] (9) In the first and second embodiments, the temperature of the reaction tank 49, 149 is not actively controlled, but this is not a limitation and the temperature of the reaction tank 49, 149 may be controlled. When the hydrogen production device 12, 112 is installed in a cold region, the hydrogen production efficiency can be improved by heating the reaction tank 49, 149 with a heater or the like. Furthermore, when the hydrogen production device 12, 112 is installed in a hot region, excessive progress of the hydrogen generation reaction can be suppressed by cooling the reaction tank 49, 149 with a cooling means such as a Peltier element.

[0270] (10) In the first and second embodiments, the hydrogen supply unit 26 is provided with the buffer tank 88. However, this is not limiting, and the buffer tank 88 may be omitted.

[0271] (11) In the first and second embodiments, the power generation devices 10, 100 are described as including the hydrogen production device 12, 112 and the fuel cell 14. However, this is not limited to this. The hydrogen production device 12, 112 may be a stand-alone unit, or the hydrogen production device 12, 112 may be combined with a device other than the fuel cell 14.

[0272] (12) In the first and second embodiments, rotation reference information is generated using the position measurement unit 70 and the rotation reference position 71, and the rotation of the member is controlled based on the rotation reference information. However, this is not limited to this, and the rotation may be controlled using an encoder, a potentiometer, or other means.

[0273] (13) In the first embodiment, each reaction vessel is stopped when silicon and potassium hydroxide aqueous solution are supplied to each reaction vessel at the supply position. However, this is not limited to this, and each reaction vessel may not be stopped at the supply position.

[0274] In the second embodiment, each reaction chamber is stopped when silicon and potassium hydroxide aqueous solution are supplied to each reaction chamber at the supply position, but this is not limitative, and each reaction chamber may not be stopped at the supply position.

[0275] (14) In the first embodiment, each reaction vessel is temporarily stopped after silicon and the potassium hydroxide aqueous solution are supplied to each reaction vessel. However, this is not limited to this, and each reaction vessel may not be stopped.

[0276] In the second embodiment, each reaction chamber is temporarily stopped after silicon and the potassium hydroxide aqueous solution are supplied to the reaction chamber, but this is not limitative, and each reaction chamber may not be stopped.

[0277] (15) In the first embodiment, the residue discharge position is maintained for a predetermined time when discharging residue R from each reaction vessel, but this is not limited to this, and the reaction vessel may be placed in the residue discharge position and then immediately returned to the normal position.

[0278] (16) In the first and second embodiments, silicon is used as the hydrogen generating substance and potassium hydroxide solution is used as the solvent, but this is not limited to this and any suitable substance that reacts to generate hydrogen can be selected.

[0279] Examples of hydrogen generating materials include solid materials. Examples of solid materials include metal-based materials and metal hydrides. Examples of metal-based materials include aluminum, magnesium, magnesium hydroxide, sodium borohydride (SBH), calcium hydroxide, etc. Examples of metal hydrides include MgH ２, NaAlH ４ , LaNi ５ H ６ etc.

[0280] The solvent may be, for example, a liquid material. Examples of the liquid material include water, an acid, and an alkali. Examples of the acid include hydrochloric acid, sulfuric acid, nitric acid, carbonic acid, carboxylic acid, and citric acid. Examples of the alkali include sodium hydroxide, lithium hydroxide, and ammonium hydroxide.

[0281] An example of a combination of a hydrogen generating substance and a solvent is a combination of a metal-based material and an acid. Examples of metal-based materials in this combination include aluminum, magnesium, magnesium hydroxide, sodium borohydride (SBH), calcium hydroxide, etc. Examples of acids in this combination include hydrochloric acid, sulfuric acid, nitric acid, carbonic acid, carboxylic acid, citric acid, etc.

[0282] Another example of the combination is a combination of a non-metallic material and an alkali. The non-metallic material in this combination is, for example, silicon. The alkali in this combination is, for example, sodium hydroxide, lithium hydroxide, ammonium hydroxide, etc. Another example of the combination is MgH ２ , NaAlH ４ , LaNi ５ H ６ and combinations of metal hydrides such as those mentioned above with water.

[0283] (17) In the first and second embodiments, an aqueous potassium hydroxide solution having a potassium hydroxide concentration of 5% or less is used so that the power generation devices 10 and 100 of the present disclosure can be used without filing a notification or appointing a responsible person under the Poisonous and Deleterious Substances Control Act. However, this is not limiting, and an aqueous potassium hydroxide solution having a potassium hydroxide concentration of more than 5% may be used to increase the efficiency of the hydrogen generation reaction. In this case, it is preferable that the members and devices that come into contact with the high-concentration aqueous potassium hydroxide solution have corrosion resistance that can withstand the high-concentration aqueous potassium hydroxide solution.

[0284] (18) The solid material delivery unit 34 in the first and second embodiments is a screw type that delivers silicon by rotating the screw 34b, but is not limited to this. Any other type that can supply a fixed amount of solid material, such as a vibration feeder, a coil feeder, a circle feeder, a throttle type, or a sliding door type, can be used.

[0285] (19) In the first and second embodiments, the volume of the residue storage section 78 is set to be smaller than the volume of one batch of residue R discharged from each reaction vessel or each reaction chamber, but this is not limiting, and the volume of the residue storage section 78 may be set to be larger than the volume of one batch of residue R discharged from each reaction vessel or each reaction chamber. For example, the volume of the residue storage section 78 may be set to be multiple times the volume of one batch of residue R discharged from each reaction vessel or each reaction chamber.

[0286] (20) In the first and second embodiments, the residue storage unit 78 and the residue recovery unit 84 are provided, but this is not limiting, and the residue recovery unit 84 may be omitted. In this case, the residue R may be discharged from the residue storage unit 78 to the outside of the power generation device 10, 100.

[0287] (21) In the first and second embodiments, a secondary battery is used as the starter battery 16a. However, this is not limiting and other power supply sources, such as dry batteries or external power sources, may also be used.

[0288] (22) In the first and second embodiments, the impurity removal unit 86 removes moisture from hydrogen, but this is not limiting. In addition to or instead of removing moisture, oxygen may be removed from hydrogen. When oxygen is removed, a deoxidizer may be used as the impurity removal substance of the impurity removal unit 86.

[0289] (23) In the first and second embodiments, the impurity removal unit 86 includes the first impurity removal unit 86 a and the second impurity removal unit 86 b. However, this is not limiting, and the impurity removal unit 86 may not include one of the first impurity removal unit 86 a and the second impurity removal unit 86 b. Furthermore, the impurity removal unit 86 may include three or more impurity removal units.

[0290] (24) In the first and second embodiments, the impurity removal unit 86 includes the first impurity removal unit 86a and the second impurity removal unit 86b connected in series. However, multiple impurity removal units may be connected in parallel.

[0291] (25) In the first and second embodiments, the substances removed by the first impurity removal unit 86a and the substances removed by the second impurity removal unit 86b were different, but this is not limited to this, and the substances removed by the first impurity removal unit 86a and the substances removed by the second impurity removal unit 86b may be the same.

[0292] (26) In the first and second embodiments, the hydrogen generation reaction may occur simultaneously in three or more reaction vessels or three or more reaction chambers.

[0293] (27) In the first and second embodiments, silicon and the potassium hydroxide aqueous solution are supplied from one solid material supply path 36, 136. However, this is not limited to this, and a silicon supply path and a potassium hydroxide aqueous solution supply path may be provided independently.

[0294] (28) In the first and second embodiments, the silicone formulation is in granular form, but this is not limiting. The silicone formulation may be in the form of a powder smaller than granules. Furthermore, a solid material such as silicone may be a solid formed by compressing powder or the like.

[0295] (29) In the second embodiment, the material supply unit 120 is fixed to the pillar portion 102, and the material supply unit 120 rotates as the pillar portion 102 rotates. However, this is not limited to this, and the material supply unit 120 may be fixed to a member other than the pillar portion 102, and only the pillar portion 102 may rotate.

Claims

1. A hydrogen production device comprising: a reaction tank configured to react multiple types of materials inside and generate hydrogen; and a material supply unit configured to repeatedly supply the multiple types of materials into the reaction tank, wherein the material supply unit is configured to supply the multiple types of materials before the reaction of the previously supplied multiple types of materials is completed so that the multiple types of materials are not mixed with the previously supplied multiple types of materials.

2. A hydrogen production apparatus as described in claim 1, wherein the reaction tank has a plurality of reaction vessels therein each having an opening, and the material supply unit is configured to supply the plurality of types of materials to a reaction vessel other than one of the plurality of reaction vessels before the reaction of the plurality of types of materials supplied to the one reaction vessel is completed.

3. A hydrogen production apparatus as described in claim 2, wherein each reaction vessel included in the plurality of reaction vessels is configured to move one by one in sequence relative to the material supply unit to a position where it can receive the supply of the plurality of types of materials from the material supply unit.

4. A hydrogen production apparatus as described in claim 3, wherein each reaction vessel included in the plurality of reaction vessels is configured to stop at a position where it can receive the supply of the plurality of types of materials from the material supply unit.

5. A hydrogen production apparatus as described in claim 2, wherein the multiple types of materials include a solid material and a liquid material, and the material supply unit comprises: a solid material storage unit configured to store the solid material, a liquid material storage unit configured to store the liquid material, a solid material supply path configured to guide the solid material supplied from the solid material storage unit to the multiple reaction vessels, and a liquid material supply path configured to guide the liquid material supplied from the liquid material storage unit to the multiple reaction vessels, and the liquid material supply path is connected midway through the solid material supply path.

6. A hydrogen production apparatus as described in claim 2, wherein the material supply unit further comprises: a material storage unit configured to store the multiple types of materials; a material supply path configured to guide the multiple types of materials supplied from the material storage unit to the multiple reaction vessels; and a material supply path opening / closing unit configured to open and close the material supply path.

7. A hydrogen production apparatus as described in claim 2, further comprising a reaction vessel discharge section configured to discharge residues remaining after reaction of the multiple types of materials in each of the multiple reaction vessels from each of the reaction vessels to the inside of the reaction tank.

8. A hydrogen production apparatus as described in claim 7, wherein each of the reaction vessels is configured to stop for a predetermined period of time after the multiple types of materials are supplied from the material supply unit and before the residue is discharged by the reaction vessel discharge unit.

9. A hydrogen production apparatus as described in claim 7, further comprising: a residue storage section connected to the reaction tank via a reaction tank discharge section and configured to store the residue discharged from the reaction tank; a reaction tank discharge control section configured to control the discharge of the residue from the reaction tank to the residue storage section; and a storage section discharge control section configured to control the discharge of the residue stored in the residue storage section to the outside of the residue storage section.

10. A hydrogen production apparatus as described in claim 9, wherein, when discharging the residue from the reaction tank to the residue storage section, the storage section discharge control unit controls so that the residue is not discharged from the residue storage section, and, when discharging the residue stored in the residue storage section to the outside of the residue storage section, the reaction tank discharge control unit controls so that the residue is not discharged from the reaction tank.

11. The hydrogen production device according to claim 10, wherein the residue is discharged from the residue storage section when the residue storage section is filled with the residue.

12. A power generation device comprising: the hydrogen production device according to any one of claims 1 to 11; and a fuel cell configured to generate power using hydrogen produced by the hydrogen production device.

13. A method for producing hydrogen in which hydrogen is generated inside a reaction tank by repeatedly supplying multiple types of materials into the reaction tank, wherein the multiple types of materials are supplied so as not to mix with the multiple types of materials previously supplied before the reaction of the multiple types of materials previously supplied is completed.

14. A method for producing hydrogen as described in claim 13, wherein the reaction tank has a plurality of reaction vessels therein each having an opening, and before the reaction of the plurality of materials supplied to one of the plurality of reaction vessels is completed, the plurality of materials are supplied to a reaction vessel other than the one reaction vessel.

15. A method for producing hydrogen as described in claim 14, wherein each reaction vessel included in the plurality of reaction vessels is moved one by one in sequence to a position where it can receive the supply of the plurality of types of materials.

16. A method for producing hydrogen according to claim 15, wherein a residue remaining after the reaction of the plurality of types of materials in each of the reaction vessels is discharged from each of the reaction vessels.

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