Skin care device and care method therefor

Abstract

The present invention of the present disclosure comprises: an input unit into which a cooling gas provision mode is input; and a processor for controlling operations of a high-frequency irradiation unit and a cooling gas provision unit, wherein the processor receives a cooling gas provision mode that is input, acquires information in which a cooling pulse is applied in accordance with the application of a preset high-frequency pulse by being linked to the cooling gas provision mode, applies at least one high-frequency pulse to the high-frequency irradiation unit on the basis of the information, and applies at least one cooling pulse to the cooling gas provision unit.

Description

Skin care device and method of care thereof

[0001] The present disclosure relates to a skin care device and a method for managing the same.

[0002] In general, a high-frequency irradiation device is provided so that when high-frequency is irradiated to the skin, heat is generated by the electrical resistance of the skin, and the tissue is coagulated by the generated heat.

[0003] However, conventional high-frequency irradiation devices can cause pain and burns on the skin surface due to excessive temperature rise.

[0004] To solve this problem, cooling devices are used.

[0005] For example, conventional cooling devices can be classified into water cooling methods using cooling water and gas cooling methods using cooling gas.

[0006] However, conventional cooling devices using a cooling gas method can cool the skin instantly by using cryogenic gas as the cooling gas, but cannot efficiently control the amount of cooling gas.

[0007] Therefore, conventional high-frequency irradiation devices and cooling device-based skin care devices have had difficulty preventing skin burns while suppressing pain by using a cooling method using ultra-low temperature cooling gas when transmitting high-frequency energy to the skin.

[0008] The purpose of the embodiment disclosed in the present disclosure is to provide a method for preventing skin burns while suppressing pain by using a cooling method using a cryogenic cooling gas when transmitting high-frequency energy to the skin.

[0009] The problems to be solved by the present disclosure are not limited to the problems mentioned above, and other problems not mentioned will be clearly understood by those skilled in the art from the description below.

[0010] According to one aspect of the present disclosure for achieving the above-described technical problem, a skin care device includes an input unit for inputting a cooling gas provision mode; and a processor for controlling operations of a high-frequency irradiation unit and a cooling gas provision unit, wherein the processor receives the input cooling gas provision mode, obtains information on application of a cooling pulse according to application of a preset high-frequency pulse linked to the cooling gas provision mode, and, based on the information, applies at least one high-frequency pulse to the high-frequency irradiation unit and applies at least one cooling pulse to the cooling gas provision unit.

[0011] In addition, the information may be first information that the cooling pulse is applied for a preset time at least one of a time before the start of application of the high frequency pulse, from the start of application to the time after the start of application, from the time after the start of application to the time before the end of application, from the time before the end of application to the time after the end of application, and from the time before the end of application to the time after the end of application, and the processor may be characterized in that, based on the first information, the high frequency pulse is applied to the high frequency irradiation unit and the cooling pulse is applied to the cooling gas supply unit.

[0012] In addition, the information may be second information that, when the first high-frequency pulse among the high-frequency pulses is applied, at the start time of application of the first high-frequency pulse, the first cooling pulse among the cooling pulses is applied for a preset time, and the processor may be characterized in that, based on the second information, the first high-frequency pulse is applied to the high-frequency irradiation unit and the first cooling pulse is applied to the cooling gas supply unit.

[0013] In addition, the information may be third information that, when the first high-frequency pulse among the high-frequency pulses is first applied, at the start time of application of the first high-frequency pulse, the second cooling pulse among the cooling pulses is applied for a preset time, and when the first high-frequency pulse is applied for the second time and the second and subsequent applications, at a time before the end of application of the first high-frequency pulse, the third cooling pulse among the cooling pulses is applied for a preset time, and the processor may be characterized in that, based on the third information, it applies the first high-frequency pulse to the high-frequency irradiation unit and applies the second cooling pulse and the third cooling pulse to the cooling gas supply unit.

[0014] In addition, the information may be fourth information that, when the first high-frequency pulse among the high-frequency pulses is applied for the first time, at the start time of application of the first high-frequency pulse, the second cooling pulse among the cooling pulses is applied for a preset time, and when the second, fourth, and fifth applications of the first high-frequency pulses are applied, at the end time of application of the first high-frequency pulse, the fourth cooling pulse among the cooling pulses is applied for a preset time, and the processor may be characterized in that, based on the fourth information, it applies the first high-frequency pulse to the high-frequency irradiation unit and applies the second cooling pulse and the fourth cooling pulse to the cooling gas supply unit.

[0015] In addition, the information may be fifth information that, when the first, second, and fourth first high-frequency pulses among the high-frequency pulses are applied, a fifth cooling pulse among the cooling pulses is applied for a preset time at a time point before the start of application of the first high-frequency pulse, at a time point at the start of application, and at a time point after the start of application, and when the fifth first high-frequency pulse is applied, a sixth cooling pulse among the cooling pulses is applied for a preset time at a time point before the end of application of the first high-frequency pulse, at a time point at the end of application, and at a time point after the end of application, and the processor may be characterized in that, based on the fifth information, it applies the first high-frequency pulse to the high-frequency irradiation unit and applies the fifth cooling pulse and the sixth cooling pulse to the cooling gas supply unit.

[0016] In addition, the information may be sixth information that a seventh cooling pulse among the cooling pulses is applied for a preset time at a time point before the start of application of the first high frequency pulse among the high frequency pulses, at a time point after the start of application, at a time point before the end of application, at a time point after the end of application, and at a time point after the end of application, and the processor may be characterized in that, based on the sixth information, the processor applies the first high frequency pulse to the high frequency irradiation unit and applies the seventh cooling pulse to the cooling gas supply unit.

[0017] In addition, the information may be seventh information that, when a second high frequency pulse among the high frequency pulses is applied, an eighth cooling pulse among the cooling pulses is applied for a preset time at a time point before the start of application of the second high frequency pulse, a time point after the start of application, a time point between the start of application and the end of application, a time point before the end of application, a time point after the end of application, and a time point after the end of application, and the processor may be characterized in that, based on the seventh information, the processor applies the second high frequency pulse to the high frequency irradiation unit and applies the eighth cooling pulse to the cooling gas supply unit.

[0018] In addition, the information may be eighth information that, when a third high-frequency pulse among the high-frequency pulses is applied, at a start time of application of the third high-frequency pulse, a ninth cooling pulse among the cooling pulses is applied for a preset time, and before a time point before application of the third high-frequency pulse ends, a tenth cooling pulse among the cooling pulses is applied for a preset time, and the processor may be characterized in that, based on the eighth information, it applies the third high-frequency pulse to the high-frequency irradiation unit and applies the ninth cooling pulse and the tenth cooling pulse to the cooling gas supply unit.

[0019] In addition, the eighth information may further include information that an 11th cooling pulse among the cooling pulses is applied for a preset time at a first time point and a second time point while the third high-frequency pulse is being applied, and the processor may be characterized in that it further applies the 11th cooling pulse to the cooling gas supply unit based on the information.

[0020] In addition, the eighth information may further include information that, at a third point in time during which the third high-frequency pulse is being applied, a 12th cooling pulse among the cooling pulses is applied for a preset period of time, and the processor may further apply the 12th cooling pulse to the cooling gas supply unit based on the information.

[0021] In addition, the information may be ninth information that the cooling pulse is applied for a preset time at least one of a time point before the start of application of the high frequency small group pulse, from the start of application to the time point after the start of application, from the time point after the start of application to the time point before the end of application, from the time point before the end of application to the time point after the end of application, and from the time point before the end of application to the time point after the end of application, when at least one high frequency small group pulse among the high frequency pulses is applied, and the processor may be characterized in that, based on the ninth information, the high frequency small group pulse is applied to the high frequency irradiation unit and the cooling pulse is applied to the cooling gas providing unit.

[0022] In addition, the information may be 10th information that, when applying a high-frequency small group pulse among the high-frequency pulses, a 13th cooling pulse among the cooling pulses is applied for a preset time at a time point after the start of applying the high-frequency small group pulses, and a 14th cooling pulse among the cooling pulses is applied for a preset time at a time point before the end of application of the high-frequency small group pulses, at the end of application, and at a time point after the end of application, and the processor may be characterized in that, based on the 10th information, it applies the high-frequency small group pulse to the high-frequency irradiation unit and applies the 13th cooling pulse and the 14th cooling pulse to the cooling gas supply unit.

[0023] In addition, the information may be 10th information that, when applying a high-frequency small group pulse among the high-frequency pulses, a 15th cooling pulse among the cooling pulses is applied for a preset time at a time point before the start of application of the high-frequency small group pulse, at a time point after the start of application of the high-frequency small group pulse, and a 16th cooling pulse among the cooling pulses is applied for a preset time at a time point before the end of application of the high-frequency small group pulse, and the processor may be characterized in that, based on the 10th information, the processor applies the high-frequency small group pulse to the high-frequency irradiation unit and applies the 15th cooling pulse and the 16th cooling pulse to the cooling gas providing unit.

[0024] In addition, a skin care method performed by a skin care device according to one aspect of the present disclosure may include a step of inputting a cooling gas provision mode through an input unit of the skin care device; a step of receiving the cooling gas provision mode by a processor of the skin care device; a step of obtaining information on application of a cooling pulse according to application of a preset high-frequency pulse linked to the cooling gas provision mode by the processor; and a step of applying at least one high-frequency pulse to a high-frequency irradiation unit of the skin care device and applying at least one cooling pulse to a cooling gas provision unit of the skin care device based on the information by the processor.

[0025] In addition, a computer program stored in a computer-readable recording medium may be further provided to perform a skin care method in combination with a computer as hardware.

[0026] In addition, a computer-readable recording medium recording a computer program for executing a method for implementing the present disclosure may be further provided.

[0027] According to the aforementioned problem solving means of the present disclosure, when transmitting high-frequency energy to the skin, it provides an effect of preventing skin burns while suppressing pain by using a cooling method using ultra-low temperature cooling gas.

[0028] The effects of the present disclosure are not limited to the effects mentioned above, and other effects not mentioned will be clearly understood by those skilled in the art from the description below.

[0029] FIG. 1 is a drawing showing a skin care device according to the present disclosure.

[0030] Figure 2 is a flowchart showing a skin care method according to the present disclosure.

[0031] FIGS. 3 to 12 are drawings showing examples of a process of applying a high-frequency pulse and a cooling pulse through the processor of FIG. 1.

[0032] Throughout this disclosure, the same reference numerals denote the same components. This disclosure does not describe all elements of the embodiments, and any content that is common in the technical field to which this disclosure pertains or that overlaps between embodiments is omitted. The terms "part, module, element, block" used in the specification may be implemented in software or hardware, and depending on the embodiments, multiple "parts, modules, elements, blocks" may be implemented as a single component, or a single "part, module, element, block" may include multiple components.

[0033] Throughout the specification, when a part is said to be "connected" to another part, this includes not only direct connection but also indirect connection, and indirect connection includes connection via a wireless communication network.

[0034] Additionally, when a part is said to "include" a component, this does not mean that it excludes other components, but rather that it may include other components, unless otherwise specifically stated.

[0035] Throughout the specification, when we say that an element is "on" another element, this includes not only cases where the element is in contact with the other element, but also cases where another element exists between the two elements.

[0036] The terms first, second, etc. are used to distinguish one component from another, and the components are not limited by the aforementioned terms.

[0037] Singular expressions include plural expressions unless the context clearly indicates otherwise.

[0038] The identification codes for each step are used for convenience of explanation and do not describe the order of each step. Each step may be performed in a different order than specified unless the context clearly indicates a specific order.

[0039] The operating principle and embodiments of the present disclosure are described below with reference to the attached drawings.

[0040] The control unit according to the present disclosure in this specification includes various devices capable of performing computational processing and providing results to the user. For example, the control unit according to the present disclosure may include a computer, a server device, and a portable terminal, or may be any one of them.

[0041] Here, the computer may include, for example, at least one of a notebook, desktop, laptop, tablet PC and slate PC equipped with a web browser.

[0042] The server device is a server that processes information by communicating with an external device, and may include at least one of an application server, a computing server, a database server, a file server, a mail server, a proxy server, and a web server.

[0043] A portable terminal is, for example, a wireless communication device that ensures portability and mobility, and may include all kinds of handheld-based wireless communication devices, such as at least one of a PCS (Personal Communication System), GSM (Global System for Mobile communications), PDC (Personal Digital Cellular), PHS (Personal Handyphone System), PDA (Personal Digital Assistant), IMT (International Mobile Telecommunication)-2000, CDMA (Code Division Multiple Access)-2000, W-CDMA (W-Code Division Multiple Access), WiBro (Wireless Broadband Internet) terminal, and a smart phone, and a wearable device, such as at least one of a watch, a ring, a bracelet, an anklet, a necklace, glasses, a contact lens, and a head-mounted device (HMD).

[0044] A skin care device according to the present disclosure can input a cooling gas provision mode, receive the cooling gas provision mode, obtain information on application of a cooling pulse according to application of a preset high-frequency pulse linked to the cooling gas provision mode, and, based on the information, apply at least one high-frequency pulse to a high-frequency irradiation unit and apply at least one cooling pulse to a cooling gas provision unit.

[0045] These skin care devices can prevent skin burns while suppressing pain by using a cooling method using cryogenic cooling gas when transmitting high-frequency energy to the skin.

[0046] Below, we will take a closer look at the skin care device.

[0047] Fig. 1 is a drawing showing the configuration of a skin care device according to the present disclosure.

[0048] Referring to FIG. 1, the skin care device (100) may include an input unit (110), a high-frequency irradiation unit (120), a cooling gas supply unit (130), and a control unit (140).

[0049] The input unit (110) may be provided so that a cooling gas provision mode is input. At this time, the control unit (140) may control the operation of the device to correspond to the input cooling gas provision mode. For example, the input unit (110) may be provided with a hardware-type physical key and a software-type touch key. At this time, the hardware-type physical key may be at least one of a button, a dome switch, a jog wheel, and a jog switch. In addition, the software-type touch key may be at least one of a touchscreen-type virtual key, a soft key, a visual key, and a touch key.

[0050] The high-frequency irradiation unit (120) may be configured to receive a high-frequency pulse from the control unit (140) and irradiate the skin with high-frequency waves. When high-frequency waves are irradiated to the skin through the high-frequency irradiation unit (120), heat is generated due to the electrical resistance of the skin, and the generated heat may coagulate the tissue.

[0051] The cooling gas supply unit (130) may be configured to receive a cooling pulse from the control unit (140) and supply cooling gas to the skin. When cooling gas is supplied through the cooling gas supply unit (130), pain caused by excessive temperature rise in the skin can be reduced and skin burns can be prevented. For example, the cooling gas may be cryogenic gas.

[0052] The control unit (140) may be implemented with a memory (141) that stores data on an algorithm for controlling the operation of components within the device or a program that reproduces the algorithm, and at least one processor (142) that performs the aforementioned operation using the data stored in the memory (141). Here, the memory (141) and the processor (142) may each be implemented as separate chips. Additionally, the memory (141) and the processor (142) may also be implemented as a single chip.

[0053] The memory (141) can store data supporting various functions of the device, programs for the operation of the control unit, input / output data, and a plurality of application programs (or applications) run on the device, data for the operation of the device, and commands. At least some of these application programs can be downloaded from an external server via wireless communication.

[0054] The memory (141) may include at least one type of storage medium among a flash memory type, a hard disk type, an SSD (Solid State Disk type), an SDD (Silicon Disk Drive type), a multimedia card micro type, a card type memory (e.g., SD or XD memory, etc.), a random access memory (RAM), a static random access memory (SRAM), a read-only memory (ROM), an electrically erasable programmable read-only memory (EEPROM), a programmable read-only memory (PROM), a magnetic memory, a magnetic disk, and an optical disk. In addition, the memory (141) may be a database that is separate from the device but is connected by wire or wirelessly.

[0055] The memory (141) can store data related to the operation of the high-frequency irradiation unit (120) and the cooling gas supply unit (130). The processor (142) can control the operation of the high-frequency irradiation unit (120) and the cooling gas supply unit (130).

[0056] Fig. 2 is a flowchart illustrating a skin care method according to the present disclosure. Figs. 3 to 12 are drawings illustrating an example of a process of applying high-frequency pulses and cooling pulses through the processor of Fig. 1.

[0057] As illustrated in FIG. 2, the skin care method may include an input step (S210), a receiving step (S220), an acquisition step (S230), and an authorization step (S240).

[0058] The input unit (110) can input a cooling gas provision mode (S210). For example, a user can input at least one cooling gas provision mode according to the purpose of the cooling gas using the input unit (110).

[0059] The processor (142) can receive a selected cooling gas provision mode through the input unit (110) (S220). For example, the processor (142) can receive at least one cooling gas provision mode according to the purpose of the cooling gas.

[0060] At this time, the memory (141) may store at least one high-frequency pulse application information and at least one cooling pulse application information mapped to each of at least one cooling gas provision mode, and the processor (142) may confirm and obtain information on which a cooling pulse is applied according to the application of a high-frequency pulse mapped to the cooling gas provision mode received from the memory (141) (S230). Based on the information on which a cooling pulse is applied according to the application of a high-frequency pulse, the processor (142) may apply at least one high-frequency pulse to the high-frequency irradiation unit (120) and apply at least one cooling pulse to the cooling gas provision unit (130) (S240).

[0061] As illustrated in FIG. 3, the processor (142) can obtain preset first information (S1) in connection with the cooling gas provision mode.

[0062] At this time, the first information (S1) may be information applied during a preset time (t11 to t1, t1 to t12, t13 to t14) when applying at least one high-frequency pulse (RPS), at least one of a time before the start of application of at least one high-frequency pulse (RPS), from the time when the application starts (t1) to the time after the start of application (t12), from the time after the start of application (t12) to the time before the end of application (t13, t14), from the time before the end of application (t21) to the time when the application ends (t2), from the time before the end of application (t21) to the time after the end of application (t22), when the application of at least one cooling pulse (CPS) starts.

[0063] Here, the first information (S1) may be information that at least one cooling pulse (CPS) is applied with any one of the same width, partially the same width, and different widths during a preset time (t11 to t1, t1 to t12, t13 to t14, t21 to t2, t2 to t22, t23 to t24). In addition, the first information (S1) may be information that at least one cooling pulse (CPS) is applied with any one of the same length, partially the same length, and different lengths during a preset time (t11 to t1, t1 to t12, t13 to t14, t21 to t2, t2 to t22, t23 to t24).

[0064] In addition, the first information (S1) may be information applied during a preset time (t11 to t1, t1 to t12, t13 to t14) when the application of at least one cooling pulse (CPS) starts, at least one of the following: a time before the start of application of at least one high-frequency pulse (RPS), from the time when the application starts (t1) to the time after the start of application (t12), from the time after the start of application (t12) to the time before the end of application (t13, t14), from the time before the end of application (t21) to the time when the application ends (t2), from the time before the end of application (t21) to the time after the end of application (t22), depending on the number of high-frequency pulses (RPS).

[0065] At this time, the processor (142) can apply at least one high-frequency pulse (RPS) to the high-frequency irradiation unit (120) and at least one cooling pulse (CPS) to the cooling gas supply unit (130) based on the first information (S1).

[0066] For example, as illustrated in FIG. 4, the processor (142) can obtain preset second information (S2) in connection with the first cooling gas provision mode.

[0067] Here, the second information (S2) may be information that the application of the first cooling pulse (CPS1) starts at the start time (t1 to t5) of the application of the first high-frequency pulse (RPS1) and is applied for a preset time (t1 to t11, t2 to t21, t3 to t31, t4 to t41, t5 to t51). For example, the second information (S2) may be information that the first cooling pulse (CPS1) is applied with any one of the same width, partially the same width, and different widths for the preset time (t1 to t11, t2 to t21, t3 to t31, t4 to t41, t5 to t51). For another example, the second information (S2) may be information that the first cooling pulse (CPS1) is applied with one of the same length, partially the same length, and different lengths during a preset time (t1 to t11, t2 to t21, t3 to t31, t4 to t41, t5 to t51).

[0068] At this time, the processor (142) can apply a first high-frequency pulse (RPS1) to the high-frequency irradiation unit (120) and apply a first cooling pulse (CPS1) to the cooling gas supply unit (130) based on the second information (S2).

[0069] In addition, the processor (142) may apply an additional cooling pulse (CPS20) for a preset time (t6 to t7, t8 to t9) after the final application start time (t5) of the first high-frequency pulse (RPS1). For example, the processor (142) may apply the additional cooling pulse (CPS20) for a preset time (t6 to t7, t8 to t9) with either the same width or different widths. For another example, the processor (142) may apply the additional cooling pulse (CPS20) for a preset time (t6 to t7, t8 to t9) with either the same length or different widths.

[0070] In addition, the processor (142) can determine at least one of the number of repetitions of the cycle, the number of times the first cooling pulse (CPS1) is applied, and the number of times the additional cooling pulse (CPS20) is applied, depending on the high-frequency irradiation state and the cooling state. At this time, the processor (142) can apply the additional cooling pulse (CPS20) with any one of the same width, partially the same width, and different widths, depending on the high-frequency irradiation state and the cooling state. In addition, the processor (142) can apply the additional cooling pulse (CPS20) with any one of the same length, partially the same length, and different lengths, depending on the high-frequency irradiation state and the cooling state.

[0071] In this disclosure, since the first cooling pulse (CPS1) is applied at the start time (t1 to t5) of the application of the first high-frequency pulse (RPS1), cooling can be performed simultaneously with high-frequency irradiation, thereby preventing skin burns while suppressing pain.

[0072] As another example, as illustrated in FIG. 5, the processor (142) may obtain preset third information (S3) in conjunction with the second cooling gas provision mode. Here, the third information (S3) may include the 3-1 information that, when the first high-frequency pulse (RPS1) is first applied, at the start time (t1) of the application of the first high-frequency pulse (RPS1), the application of the second cooling pulse (CPS2) among the cooling pulses is started and applied for a preset time (t1 to t11).

[0073] In addition, the third information (S3) may include the 3-2 information that the application of the third cooling pulse (CPS3) among the cooling pulses is started at a time point (t21, t31, t41, t51) before the end of the application of the first high-frequency pulse (RPS1) during the second application and the second subsequent application of the first high-frequency pulse (RPS1) and is applied for a preset time (t21 to t2, t31 to t3, t41 to t4, t51 to t5).

[0074] For example, the 3-2 information may be information that the third cooling pulse (CPS3) is applied with any one of the same width, partially the same width, and different widths during a preset time (t21 to t2, t31 to t3, t41 to t4, t51 to t5). For another example, the 3-2 information may be information that the third cooling pulse (CPS3) is applied with any one of the same length, partially the same length, and different lengths during a preset time (t21 to t2, t31 to t3, t41 to t4, t51 to t5).

[0075] At this time, the processor (142) can apply a first high-frequency pulse (RPS1) to the high-frequency irradiation unit (120) and apply a second cooling pulse (CPS2) and a third cooling pulse (CPS3) to the cooling gas supply unit (130) based on the third information (S3).

[0076] In addition, the processor (142) may apply an additional cooling pulse (CPS20) for a preset time (t6 to t7, t8 to t9) after the final application end time (t5) of the first high-frequency pulse (RPS1). For example, the processor (142) may apply the additional cooling pulse (CPS20) for a preset time (t6 to t7, t8 to t9) with either the same width or different widths. For another example, the processor (142) may apply the additional cooling pulse (CPS20) for a preset time (t6 to t7, t8 to t9) with either the same length or different lengths.

[0077] In addition, the processor (142) can determine at least one of the number of repetitions of the cycle, the number of times the second cooling pulse (CPS2) is applied, and the number of times the additional cooling pulse (CPS20) is applied, depending on the high-frequency irradiation state and the cooling state. At this time, the processor (142) can apply the additional cooling pulse (CPS20) with any one of the same width, partially the same width, and different widths, depending on the high-frequency irradiation state and the cooling state. In addition, the processor (142) can apply the additional cooling pulse (CPS20) with any one of the same length, partially the same length, and different lengths, depending on the high-frequency irradiation state and the cooling state.

[0078] In this disclosure, since the second cooling pulse (CPS2) is applied at the start time (t1) of the application of the first high-frequency pulse (RPS1), cooling can be performed before the temperature rises, thereby preventing skin burns. In addition, in the present disclosure, since the application of the third cooling pulse (CPS3) starts at a time (t21, t31, t41, t51) before the end of the application of the first high-frequency pulse (RPS1) and is applied for a preset time (t21 to t2, t31 to t3, t41 to t4, t51 to t5), cooling can be performed even when high-frequency irradiation is performed for a long time, thereby suppressing pain.

[0079] As another example, as illustrated in FIG. 6, the processor (142) can obtain preset fourth information (S4) in connection with the third cooling gas provision mode.

[0080] Here, the fourth information (S4) may include the 4-1 information that, at the first application of the first high-frequency pulse (RPS1), the application of the second cooling pulse (CPS2) starts at the application start time (t1) of the first high-frequency pulse (RPS1) and is applied for a preset time (t1 to t11).

[0081] In addition, the fourth information (S4) may include 4-2 information that the application of the fourth cooling pulse (CPS4) starts at a time point (t21, t41, t51) before the end of application of the first high-frequency pulse (RPS1) during the second, fourth, and fifth applications of the first high-frequency pulse (RPS1) and is applied for a preset time period (t21 to t2, t41 to t4, t51 to t5). For example, the 4-2 information may be information that the fourth cooling pulse (CPS4) is applied with any one of the same width, partially the same width, and different widths during the preset time periods (t21 to t2, t41 to t4, t51 to t5). For another example, the 4-2 information may be information that the 4th cooling pulse (CPS4) is applied with one of the same length, partially the same length, and different lengths during a preset time (t21 to t2, t41 to t4, t51 to t5).

[0082] At this time, the processor (142) can apply a first high-frequency pulse (RPS1) to the high-frequency irradiation unit (120) and apply a second cooling pulse (CPS2) and a fourth cooling pulse (CPS4) to the cooling gas supply unit (130) based on the fourth information (S4).

[0083] In addition, the processor (142) may apply an additional cooling pulse (CPS20) for a preset time (t6 to t7, t8 to t9) after the final application end time (t5) of the first high-frequency pulse (RPS1). For example, the processor (142) may apply the additional cooling pulse (CPS20) for a preset time (t6 to t7, t8 to t9) with either the same width or different widths. For another example, the processor (142) may apply the additional cooling pulse (CPS20) for a preset time (t6 to t7, t8 to t9) with either the same length or different lengths.

[0084] In addition, the processor (142) may determine at least one of the number of repetitions of the cycle, the number of times the second cooling pulse (CPS2) is applied, the number of times the fourth cooling pulse (CPS4) is applied, and the number of times the additional cooling pulse (CPS20) is applied, depending on the high-frequency irradiation state and the cooling state. At this time, the processor (142) may apply the additional cooling pulse (CPS20) with any one of the same width, partially the same width, and different widths, depending on the high-frequency irradiation state and the cooling state. In addition, the processor (142) may apply the additional cooling pulse (CPS20) with any one of the same length, partially the same length, and different lengths, depending on the high-frequency irradiation state and the cooling state.

[0085] In this disclosure, since the application of the second cooling pulse (CPS2) starts at the start time (t1) of the application of the first high-frequency pulse (RPS1) and is applied for a preset time (t1 to t11), cooling can be performed before the temperature rises, thereby preventing skin burns. In addition, in the present disclosure, since the application of the fourth cooling pulse (CPS4) starts at the time (t21, t41, t51) before the end of the application of the first high-frequency pulse (RPS1), and is applied for a preset time (t21 to t2, t41 to t4, t51 to t5) before the end of the application of the first high-frequency pulse (RPS1), cooling can be efficiently performed while efficiently reducing the injection of cooling gas even when high-frequency irradiation is performed for a long time, pain can be efficiently suppressed.

[0086] As another example, as illustrated in FIG. 7, the processor (142) can obtain preset fifth information (S5) in conjunction with the fourth cooling gas provision mode.

[0087] Here, the fifth information (S5) may include the fifth-first information that the fifth cooling pulse (CPS5) is applied at a time point (t11, t21, t41) before the start of application of the first high-frequency pulse during the first, second, and fourth applications of the first high-frequency pulse (RPS1) and is applied for a preset time period (t11 to t12, t21 to t22, t41 to t42). For example, the fifth-first information may be information that the fifth cooling pulse (CPS5) is applied with any one of the same width, partially the same width, and different widths during the preset time periods (t11 to t12, t21 to t22, t41 to t42). Also, for another example, the 5-1 information may be information that the 5th cooling pulse (CPS5) is applied with one of the same length, some same length, and different length during a preset time (t11 to t12, t21 to t22, t41 to t42).

[0088] In addition, the fifth information (S5) may include the fifth-second information that the application of the sixth cooling pulse (CPS6) is started at a time point (t51) before the end of the application of the first high-frequency pulse (RPS1) during the fifth application of the first high-frequency pulse (RPS1) and is applied for a preset time (t51 to t52).

[0089] At this time, the processor (142) can apply a first high-frequency pulse (RPS1) to the high-frequency irradiation unit (120) and apply a fifth cooling pulse (CPS5) and a sixth cooling pulse (CPS6) to the cooling gas supply unit (130) based on the fifth information.

[0090] In addition, the processor (142) may apply an additional cooling pulse (CPS20) for a preset time (t6 to t7, t8 to t9) after the final application end time (t5) of the first high-frequency pulse (RPS1). For example, the processor (142) may apply the additional cooling pulse (CPS20) for a preset time (t6 to t7, t8 to t9) with either the same width or different widths. For another example, the processor (142) may apply the additional cooling pulse (CPS20) for a preset time (t6 to t7, t8 to t9) with either the same length or different lengths.

[0091] In addition, the processor (142) may determine at least one of the number of repetitions of the cycle, the number of times the fifth cooling pulse (CPS5) is applied, the number of times the sixth cooling pulse (CPS6) is applied, and the number of times the additional cooling pulse (CPS20) is applied, depending on the high-frequency irradiation state and the cooling state. At this time, the processor (142) may apply the additional cooling pulse (CPS20) with any one of the same width, partially the same width, and different widths, depending on the high-frequency irradiation state and the cooling state. In addition, the processor (142) may apply the additional cooling pulse (CPS20) with any one of the same length, partially the same length, and different lengths, depending on the high-frequency irradiation state and the cooling state.

[0092] In this disclosure, since the application of the fifth cooling pulse (CPS5) starts at a time point (t11, t21, t41) before the start of application of the first high-frequency pulse (RPS1) and is applied for a preset time (t11 to t12, t21 to t22, t41 to t42), cooling can be efficiently performed while efficiently reducing the injection of cooling gas before the temperature rises when the high-frequency output is strong and short, thereby efficiently preventing skin burns. In addition, in the present disclosure, since the application of the sixth cooling pulse (CPS6) starts at a time point (t51) before the end of application of the first high-frequency pulse (RPS1) and is applied for a preset time (t51 to t52), cooling can be efficiently performed while efficiently reducing the injection of cooling gas even when high-frequency irradiation is performed for a long time, pain can be efficiently suppressed.

[0093] As another example, as illustrated in FIG. 8, the processor (142) can obtain preset sixth information (S6) in connection with the fifth cooling gas provision mode.

[0094] Here, the sixth information (S6) may be information applied during a preset time (t11~t12, t21~t22, t31~t32, t41~t42, t51~t52, t61~t62, t71~t72, t81~t82, t91~t92, t101~t102) when the application of the seventh cooling pulse (CPS7) starts at a time point (t11, t31, t51, t71, t91, t91) before the start of application of the first high-frequency pulse (RPS1) and before the end of application (t21, t41, t61, t81, t101).

[0095] For example, the sixth information (S6) may be information that the seventh cooling pulse (CPS7) is applied with any one of the same width, partially the same width, and different widths during a preset time (t11 to t12, t21 to t22, t31 to t32, t41 to t42, t51 to t52, t61 to t62, t71 to t72, t81 to t82, t91 to t92, t101 to t102). For another example, the sixth information (S6) may be information that the seventh cooling pulse (CPS7) is applied with one of the same length, partially the same length, and different lengths during a preset time (t11~t12, t21~t22, t31~t32, t41~t42, t51~t52, t61~t62, t71~t72, t81~t82, t91~t92, t101~t102).

[0096] At this time, the processor (142) can apply a first high-frequency pulse (RPS1) to the high-frequency irradiation unit (120) and apply a seventh cooling pulse (CPS7) to the cooling gas supply unit (130) based on the sixth information (S6).

[0097] In addition, the processor (142) may apply an additional cooling pulse (CPS20) for a preset time (t111 to t12, t13 to t14) after the final application end time (t10) of the first high-frequency pulse (RPS1). For example, the processor (142) may apply the additional cooling pulse (CPS20) with either the same width or different widths for a preset time (t111 to t12, t13 to t14). For another example, the processor (142) may apply the additional cooling pulse (CPS20) with either the same length or different lengths for a preset time (t111 to t12, t13 to t14).

[0098] In addition, the processor (142) can determine at least one of the number of repetitions of the cycle, the number of times the seventh cooling pulse (CPS7) is applied, and the number of times the additional cooling pulse (CPS20) is applied, depending on the high-frequency irradiation state and the cooling state. At this time, the processor (142) can apply the additional cooling pulse (CPS20) with any one of the same width, partially the same width, and different widths, depending on the high-frequency irradiation state and the cooling state. In addition, the processor (142) can apply the additional cooling pulse (CPS20) with any one of the same length, partially the same length, and different lengths, depending on the high-frequency irradiation state and the cooling state.

[0099] In this disclosure, the application of the seventh cooling pulse (CPS7) starts at a time point (t11, t31, t51, t71, t91) before the start of application of the first high-frequency pulse (RPS1) and at a time point (t21, t41, t61, t81, t101) before the end of application, and is applied for a preset time (t11~t12, t21~t22, t31~t32, t41~t42, t51~t52, t61~t62, t71~t72, t81~t82, t91~t92, t101~t102), so that when the output of the high frequency is strong and short, cooling can be further performed before the temperature rises, so that burns on the skin can be further prevented in advance, and even when the high-frequency irradiation is performed for a long time, cooling can be further performed, so that pain can be reduced. It can be suppressed further.

[0100] As another example, as illustrated in FIG. 9, the processor (142) can obtain preset seventh information (S7) in connection with the sixth cooling gas provision mode.

[0101] Here, the seventh information (S7) may be information that is applied during a preset time (t11~t12, t13~t14, t21~t22, t31~t32, t33~t34, t41~t42, t51~t52, t53~t54, t61~t62) when the application of the second high-frequency pulse (RPS2) starts at a time point (t11, t31, t51) before the start of application of the second high-frequency pulse (RPS2) and at a time point (t21, t41, t61) before the end of application. At this time, the second high-frequency pulse (RPS2) may be wider than the width of the first high-frequency pulse (RPS1).

[0102] For example, the seventh information (S7) may be information that the eighth cooling pulse (CPS8) is applied with any one of the same width, partially the same width, and different widths during a preset time (t11 to t12, t13 to t14, t21 to t22, t31 to t32, t33 to t34, t41 to t42, t51 to t52, t53 to t54, t61 to t62). For another example, the seventh information (S7) may be information that the eighth cooling pulse (CPS8) is applied with any one of the same length, partially the same length, and different lengths during a preset time (t11 to t12, t13 to t14, t21 to t22, t31 to t32, t33 to t34, t41 to t42, t51 to t52, t53 to t54, t61 to t62).

[0103] At this time, the processor (142) can apply a second high-frequency pulse (RPS2) to the high-frequency irradiation unit (120) and apply an eighth cooling pulse (CPS8) to the cooling gas supply unit (130) based on the seventh information (S7).

[0104] In addition, the processor (142) may apply an additional cooling pulse (CPS20) for a preset time (t7 to t8, t9 to t10) after the final application end time (t6) of the second high-frequency pulse (RPS2). For example, the processor (142) may apply the additional cooling pulse (CPS20) for a preset time (t7 to t8, t9 to t10) with either the same width or different widths. For another example, the processor (142) may apply the additional cooling pulse (CPS20) for a preset time (t7 to t8, t9 to t10) with either the same length or different lengths.

[0105] In addition, the processor (142) may determine at least one of the number of repetitions of the cycle, the number of applications of the eighth cooling pulse (CPS8), and the number of applications of the additional cooling pulse (CPS20) according to the high-frequency irradiation state and the cooling state. At this time, the processor (142) may apply the additional cooling pulse (CPS20) with any one of the same width, partially the same width, and different widths according to the high-frequency irradiation state and the cooling state. In addition, the processor (142) may apply the additional cooling pulse (CPS20) with any one of the same length, partially the same length, and different lengths according to the high-frequency irradiation state and the cooling state.

[0106] In this disclosure, the application of the eighth cooling pulse (CPS8) is started at a time point (t11, t31, t51) before the start of application of the second high-frequency pulse (RPS2) and at a time point (t21, t41, t61) before the end of application, and is applied for a preset time (t11 to t12, t13 to t14, t21 to t22, t31 to t32, t33 to t34, t41 to t42, t51 to t52, t53 to t54, t61 to t62), so that when the output of the high frequency is strong and long, cooling can be performed more smoothly before the temperature rises, so that burns on the skin can be prevented in advance, and even when the high-frequency irradiation is performed for a longer time, cooling can be performed more smoothly, so that pain can be prevented in advance.

[0107] As another example, as illustrated in FIG. 10, the processor (142) can obtain preset eighth information (S8) in conjunction with the seventh cooling gas provision mode.

[0108] Here, the eighth information (S8) may include the eighth-first information that, when the third high-frequency pulse (RPS3) is applied, the ninth cooling pulse (CPS9) is applied for a preset first time (t1 to t11) at the start time (t1) of applying the third high-frequency pulse (RPS3). At this time, the third high-frequency pulse (RPS3) may be wider than the width of the second high-frequency pulse (RPS2).

[0109] In addition, the eighth information (S8) may include the 8-2 information that the application of the tenth cooling pulse (CPS10) begins at a time point (t18) before the end of the application of the third high-frequency pulse (RPS3) and is applied for a preset second time period (t18 to t2). At this time, the pulse width corresponding to the second time period (t18 to t2) may be different from or the same as the pulse width corresponding to the first time period (t1 to t11). In addition, the pulse length corresponding to the second time period (t18 to t2) may be different from or the same as the pulse length corresponding to the first time period (t1 to t11).

[0110] At this time, the processor (142) can apply a third high-frequency pulse (RPS3) to the high-frequency irradiation unit (120) and apply a ninth cooling pulse (CPS9) and a tenth cooling pulse (CPS10) to the cooling gas supply unit (130) based on the eighth information.

[0111] In addition, the 8th information (S8) may include the 8-3 information that is applied during a preset third time (t12 to t13, t14 to t15) from the first time (t12) and the second time (t14) while the application of the third high-frequency pulse (RPS3) is ongoing, and the application of the 11th cooling pulse (CPS11) is started.

[0112] At this time, the pulse width corresponding to the third time (t12 to t13, t14 to t15) may be different from or the same as the pulse width corresponding to the first time (t1 to t11). In addition, the pulse width corresponding to the third time (t12 to t13, t14 to t15) may be different from or the same as the pulse width corresponding to the second time (t18 to t2).

[0113] In addition, the pulse length corresponding to the third time (t12 to t13, t14 to t15) may be partially the same as, or may be all the same as, the pulse length corresponding to the first time (t1 to t11) and the pulse length corresponding to the second time (t18 to t2), or may be different from, the pulse length corresponding to the first time (t1 to t11). At this time, the processor (142) may further apply an eleventh cooling pulse (CPS11) to the cooling gas supply unit (130) based on the eighth information (S8).

[0114] In addition, the 8th information (S8) may include the 8-4 information that is applied during the 4th preset time (t16 to t17) from the 3rd time point (t16) during which the 3rd high-frequency pulse (RPS3) is applied until the 12th cooling pulse (CPS12) is applied.

[0115] At this time, the pulse width corresponding to the fourth time (t16 to t17) may be partially the same as the pulse width corresponding to the second time (t18 to t2), or may be all the same or different.

[0116] Additionally, the pulse length corresponding to the fourth time (t16 to t17) may be partially the same as, or may be all the same as, the pulse length corresponding to the first time (t1 to t11), the pulse length corresponding to the second time (t18 to t2), and the pulse length corresponding to the third time (t12 to t13, t14 to t15), or may be different from, the pulse length corresponding to the fourth time (t16 to t17).

[0117] At this time, the processor (142) may further apply a 12th cooling pulse (CPS12) to the cooling gas supply unit (130) based on the 8th information (S8).

[0118] In this disclosure, the ninth cooling pulse (CPS9) is applied for a first preset time (t1 to t11) at the start time (t1) of the application of the third high-frequency pulse (RPS3), the application of the eleventh cooling pulse (CPS11) is started at the first time (t12) and the second time (t14) while the application is ongoing, and is applied for a third preset time (t12 to t13, t14 to t15), the application of the twelfth cooling pulse (CPS12) is started at the third time (t16) while the application is ongoing, and is applied for a fourth preset time (t16 to t17), and the application of the tenth cooling pulse (CPS10) is started at the time (t18) before the end of the application, and is applied for a second preset time (t18 to t2), so that when the output of the high frequency is strong and long, cooling can be performed more continuously before the temperature rises, and burns can be prevented in advance. And, even when high-frequency irradiation is performed for a longer period of time, cooling can be performed more smoothly and continuously, which can further suppress pain.

[0119] As illustrated in FIG. 11, the processor (142) can obtain preset 9th information (S9) in connection with the cooling gas provision mode.

[0120] Here, the ninth information (S9) may be information that at least one cooling pulse (CPS) is applied for a preset time (t11~t1, t1~t12, t13~t14, t21~t2, t2~t22, t23~t24) at least one of the time points before the start of application of at least one high-frequency small group pulse (RSPS), from the time point of application start (t1) to the time point after the start of application (t12), from the time point after the start of application (t12) to the time point before the end of application (t21), from the time point before the end of application (t21) to the time point after the end of application (t2), from the time point before the end of application (t21) to the time point after the end of application (t22, t23, t24) when at least one high-frequency small group pulse (RSPS) is applied.

[0121] At this time, the ninth information (S9) may be information that at least one cooling pulse (CPS) may be applied with the same width for a preset time (t11 to t1, t1 to t12, t13 to t14, t21 to t2, t2 to t22, t23 to t24), or may be information that some are applied with the same width or different widths.

[0122] In addition, the ninth information (S9) may be information that at least one cooling pulse (CPS) may be applied with the same length for a preset time (t11 to t1, t1 to t12, t13 to t14, t21 to t2, t2 to t22, t23 to t24), or may be applied with some of the same length or different lengths.

[0123] In addition, the ninth information (S9) may be information that at least one cooling pulse (CPS) is applied during a preset time (t11~t1, t1~t12, t13~t14, t21~t2, t2~t22, t23~t24) at least one of the time before the start of application of at least one high frequency pulse (RPS), from the time when the application starts (t1) to the time after the start of application (t12), from the time after the start of application (t12) to the time before the end of application (t21), from the time before the end of application (t21) to the time when the application ends (t2), from the time before the end of application (t21) to the time after the end of application (t22, t23, t24), depending on the number of high frequency small group pulses (RSPS).

[0124] Here, the processor (142) may apply at least one high-frequency small group pulse (RSPS) to the high-frequency irradiation unit (120) and apply at least one cooling pulse (CPS) to the cooling gas supply unit (130) based on the ninth information (S9). At this time, the high-frequency small group pulse (RSPS) may be composed of at least one minimum unit high-frequency small pulse (RSPS1) having a short and repetitive width and length.

[0125] For example, as illustrated in FIG. 12, the processor (142) can obtain preset 10th information (S10) (S10) in connection with the 8th cooling gas provision mode.

[0126] Here, the 10th information (S10) may be information that is applied for a preset time (t11 to t12) starting from the time point (t11) after the start of application of the high-frequency small group pulse (RSPS) at the time of the first application of the high-frequency small group pulse (RSPS). Here, the high-frequency small group pulse (RSPS) may be composed of at least one minimum unit of high-frequency small pulse (RSPS1) having a short and repetitive width and length.

[0127] In addition, the 10th information (S10) may further include information that the application of the 14th cooling pulse (CPS14) is started at a time point (t21) before the end of application of the high-frequency small group pulse (RSPS) and is applied for a preset time (t21 to t22).

[0128] For example, the 10th information (S10) may be information that the 13th cooling pulse (CPS13) and the 14th cooling pulse (CPS14) are applied with either the same width or different widths during a preset time (t11 to t12, t21 to t22).

[0129] At this time, the processor (142) can apply a high-frequency small group pulse (RSPS) to the high-frequency irradiation unit (120) based on the 10th information (S10), and can apply a 13th cooling pulse (CPS13) and a 14th cooling pulse (CPS14) to the cooling gas supply unit (130).

[0130] In addition, the tenth information (S10) may be information that the application of the fifteenth cooling pulse (CPS15) starts at a time point (t31) before the start of application of the high-frequency small group pulse (RSPS) during the second application of the high-frequency small group pulse (RSPS) and is applied for a preset time (t31 to t32). Here, the high-frequency small group pulse (RSPS) may be composed of at least one minimum unit of high-frequency small pulse (RSPS1) having a short and repetitive width and length.

[0131] In addition, the 10th information (S10) may further include information that the application of the 16th cooling pulse (CPS16) starts at a time point (t41) before the end of application of the high-frequency small group pulse (RSPS) and is applied for a preset time (t41 to t42).

[0132] For example, the tenth information (S10) may be information that the fifteenth cooling pulse (CPS15) and the sixteenth cooling pulse (CPS16) are applied with either the same width or different widths during a preset time (t31 to t32, t41 to t42). For another example, the tenth information (S10) may be information that the fifteenth cooling pulse (CPS15) and the sixteenth cooling pulse (CPS16) are applied with either the same length or different lengths during a preset time (t31 to t32, t41 to t42).

[0133] At this time, the processor (142) can apply a high-frequency small group pulse (RSPS) to the high-frequency irradiation unit (120) based on the 10th information (S10), and apply a 15th cooling pulse (CPS15) and a 16th cooling pulse (CPS16) to the cooling gas supply unit (130).

[0134] In this disclosure, the application of the 13th cooling pulse (CPS13) starts at a time point (t11) after the start of application of the high-frequency small group pulse (RSPS) and is applied for a preset time (t11 to t12), the application of the 14th cooling pulse (CPS14) starts at a time point (t21) before the end of application of the high-frequency small group pulse (RSPS) and is applied for a preset time (t21 to t22), the application of the 15th cooling pulse (CPS15) starts at a time point (t31) before the start of application of the high-frequency small group pulse (RSPS) and is applied for a preset time (t31 to t32), and the application of the 16th cooling pulse (CPS16) starts at a time point (t41) before the end of application of the high-frequency small group pulse (RSPS) and is applied for a preset time (t41 to t42), so that the temperature of the skin surface repeatedly rises and falls, thereby preventing an overall temperature rise. It can suppress pain while preventing burns in advance, and because the temperature change of the deep skin is not large, it can continuously build up heat.

[0135] Therefore, the skin care device and the care method according to the present disclosure can prevent skin burns while suppressing pain by using a cooling method using ultra-low temperature cooling gas when transmitting high frequency energy to the skin.

[0136] At least one component may be added or deleted to correspond to the performance of the components illustrated in FIGS. 1, 3, and 12. Furthermore, it will be readily apparent to those skilled in the art that the relative positions of the components may be altered to correspond to the performance or structure of the system.

[0137] Although FIG. 2 describes the execution of multiple steps sequentially, this is merely an example of the technical idea of ​​the present embodiment, and a person having ordinary skill in the technical field to which the present embodiment belongs can modify and apply various modifications and variations by changing the order described in FIG. 2 and executing the steps or executing one or more steps among the multiple steps in parallel without departing from the essential characteristics of the present embodiment, and therefore FIG. 2 is not limited to a chronological order.

[0138] The disclosed embodiments have been described with reference to the attached drawings as described above. Those skilled in the art will understand that the present disclosure can be implemented in forms other than the disclosed embodiments without altering the technical spirit or essential features of the present disclosure. The disclosed embodiments are illustrative and should not be construed as limiting.

Claims

1. Input section where cooling gas supply mode is input; and Includes a processor that controls the operation of a high-frequency irradiation unit and a cooling gas supply unit, The above processor, Receive the above input cooling gas provision mode, Obtain information on the application of a cooling pulse according to the application of a preset high-frequency pulse linked to the above cooling gas provision mode, A skin care device characterized in that, based on the above information, at least one high-frequency pulse is applied to the high-frequency irradiation unit and at least one cooling pulse is applied to the cooling gas supply unit.

2. In paragraph 1, The above information is, When the high-frequency pulse is applied, the cooling pulse is first information that is applied for a preset time at least one of a time before the start of application of the high-frequency pulse, from the start of application to the time after the start of application, from the time after the start of application to the time before the end of application, from the time before the end of application to the time after the end of application, and from the time before the end of application to the time after the end of application. The above processor, A skin care device characterized in that, based on the first information, the high-frequency pulse is applied to the high-frequency irradiation unit and the cooling pulse is applied to the cooling gas supply unit.

3. In paragraph 1, The above information is, When the first high frequency pulse among the above high frequency pulses is applied, at the start time of application of the first high frequency pulse, the second information is that the first cooling pulse among the cooling pulses is applied for a preset time, The above processor, A skin care device characterized in that, based on the second information, the first high-frequency pulse is applied to the high-frequency irradiation unit and the first cooling pulse is applied to the cooling gas supply unit.

4. In paragraph 1, The above information is, When the first high frequency pulse among the above high frequency pulses is first applied, at the start time of application of the first high frequency pulse, the second cooling pulse among the above cooling pulses is applied for a preset time, Third information that, during the second application of the first high-frequency pulse and subsequent applications, a third cooling pulse among the cooling pulses is applied for a preset time at a time before the end of application of the first high-frequency pulse. The above processor, A skin care device characterized in that, based on the third information, the first high-frequency pulse is applied to the high-frequency irradiation unit, and the second cooling pulse and the third cooling pulse are applied to the cooling gas supply unit.

5. In paragraph 1, The above information is, When the first high frequency pulse among the above high frequency pulses is first applied, at the start time of application of the first high frequency pulse, the second cooling pulse among the above cooling pulses is applied for a preset time, The fourth information is that, at the time of application of the first high-frequency pulse for the second, fourth and fifth times, the fourth cooling pulse among the cooling pulses is applied for a preset time. The above processor, A skin care device characterized in that, based on the fourth information, the first high-frequency pulse is applied to the high-frequency irradiation unit, and the second cooling pulse and the fourth cooling pulse are applied to the cooling gas supply unit.

6. In paragraph 1, The above information is, The fifth information is that, when the first, second and fourth high frequency pulses among the high frequency pulses are applied, the fifth cooling pulse among the cooling pulses is applied for a preset time at a time point before the start of application of the first high frequency pulse, at a time point at the start of application and at a time point after the start of application, and when the fifth high frequency pulse is applied, the sixth cooling pulse among the cooling pulses is applied for a preset time at a time point before the end of application of the first high frequency pulse, at a time point at the end of application and at a time point after the end of application. The above processor, A skin care device characterized in that, based on the fifth information, the first high-frequency pulse is applied to the high-frequency irradiation unit, and the fifth cooling pulse and the sixth cooling pulse are applied to the cooling gas supply unit.

7. In paragraph 1, The above information is, The sixth information is that when the first high-frequency pulse among the above high-frequency pulses is applied, the seventh cooling pulse among the cooling pulses is applied for a preset time at a time before the start of application of the first high-frequency pulse, at a time after the start of application, at a time before the end of application, at a time after the end of application, and at a time after the end of application. The above processor, A skin care device characterized in that, based on the sixth information, the first high-frequency pulse is applied to the high-frequency irradiation unit and the seventh cooling pulse is applied to the cooling gas supply unit.

8. In paragraph 1, The above information is, When the second high-frequency pulse among the above high-frequency pulses is applied, the seventh information is that the eighth cooling pulse among the cooling pulses is applied for a preset time at a time before the start of application of the second high-frequency pulse, at a time after the start of application, at a time between the start of application and the end of application, at a time before the end of application, at a time after the end of application, and at a time after the end of application. The above processor, A skin care device characterized in that, based on the seventh information, the second high-frequency pulse is applied to the high-frequency irradiation unit, and the eighth cooling pulse is applied to the cooling gas supply unit.

9. In paragraph 1, The above information is, When the third high frequency pulse among the above high frequency pulses is applied, At the start of application of the third high-frequency pulse, the ninth cooling pulse among the cooling pulses is applied for a preset time, The eighth information is that the 10th cooling pulse among the cooling pulses is applied for a preset time before the end of application of the third high-frequency pulse. The above processor, A skin care device characterized in that, based on the eighth information, the third high-frequency pulse is applied to the high-frequency irradiation unit, and the ninth cooling pulse and the tenth cooling pulse are applied to the cooling gas supply unit.

10. In paragraph 9, The above 8th information is, Further including information that, at the first and second points in time during which the third high-frequency pulse is being applied, the 11th cooling pulse among the cooling pulses is applied for a preset period of time; The above processor, A skin care device characterized in that, based on the above information, the 11th cooling pulse is further applied to the cooling gas supply unit.

11. In paragraph 10, The above 8th information is, At a third point in time during which the third high-frequency pulse is being applied, information is further included that the 12th cooling pulse among the cooling pulses is applied for a preset period of time. The above processor, A skin care device characterized in that, based on the above information, the 12th cooling pulse is further applied to the cooling gas supply unit.

12. In paragraph 1, The above information is, When at least one high-frequency small group pulse among the high-frequency pulses is applied, the cooling pulse is applied for a preset time at least one of a time before the start of application of the high-frequency small group pulse, from the start of application to the time after the start of application, from the time after the start of application to the time before the end of application, from the time before the end of application to the time after the end of application, and from the time before the end of application to the time after the end of application, is the ninth information, The above processor, A skin care device characterized in that, based on the above ninth information, the high-frequency small group pulse is applied to the high-frequency irradiation unit and the cooling pulse is applied to the cooling gas supply unit.

13. In paragraph 1, The above information is, When applying a high-frequency small group pulse among the above high-frequency pulses, At a point after the start of application of the high-frequency small group pulse, the 13th cooling pulse among the cooling pulses is applied for a preset time, The 10th information is that the 14th cooling pulse among the cooling pulses is applied for a preset time at a time before the end of application of the high-frequency small group pulse, at the end of application, and at the end of application. The above processor, A skin care device characterized in that, based on the above 10th information, the high-frequency small group pulse is applied to the high-frequency irradiation unit, and the 13th cooling pulse and the 14th cooling pulse are applied to the cooling gas supply unit.

14. In paragraph 1, The above information is, When applying a high-frequency small group pulse among the above high-frequency pulses, At a time point before the start of application of the high-frequency small group pulse, at a time point at which application starts, and at a time point after the start of application, the 15th cooling pulse among the cooling pulses is applied for a preset time, At a point before the end of application of the high-frequency small group pulse, the 10th information is that the 16th cooling pulse among the cooling pulses is applied for a preset time. The above processor, A skin care device characterized in that, based on the above 10th information, the high-frequency small group pulse is applied to the high-frequency irradiation unit, and the 15th cooling pulse and the 16th cooling pulse are applied to the cooling gas supply unit.

15. In a skin care method performed by a skin care device, A step in which a cooling gas provision mode is input through an input portion of the above skin care device; A step of receiving the cooling gas provision mode by the processor of the skin care device; A step of obtaining information that a cooling pulse is applied according to the application of a preset high-frequency pulse linked to the cooling gas provision mode by the processor; and A method comprising the steps of applying at least one high-frequency pulse to a high-frequency irradiation unit of the skin care device and applying at least one cooling pulse to a cooling gas supply unit of the skin care device based on the information by the processor.