Scrubber for semiconductor equipment
The scrubber design with trays and tray holes enhances the contact area between scrubbing solution and gas, improving pollutant removal efficiency by dissolving harmful gases in semiconductor equipment scrubbers.
WO2025211494A1 Publication Date: 2025-10-09OH SEUNG HWAN
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Patent Information
- Application Number
- PCT/KR2024/007963
- Authority / Receiving Office
- WO · WO
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2024-04-05
- Filing Date
- 2024-06-11
- Publication Date
- 2025-10-09
AI Technical Summary
Technical Problem
Existing scrubbers for semiconductor equipment face inefficiencies in the contact area between scrubbing solutions and gases, limiting the effectiveness of pollutant removal.
Method used
A scrubber design with multiple trays and tray holes that form bubbles, increasing the contact area between the scrubbing solution and gas, allowing for enhanced dissolution of hydrophilic gases.
Benefits of technology
Improves scrubbing efficiency by increasing the contact area, effectively dissolving harmful gases in the scrubbing solution, thereby removing pollutants from semiconductor process byproducts.
✦ Generated by Eureka AI based on patent content.
Abstract
The present invention relates to a scrubber for semiconductor equipment, the scrubber being capable of effectively scrubbing gas generated after a semiconductor process is performed. The scrubber for semiconductor equipment comprises: an absorption tower for separating the gas mixture into a first gas and a second gas; a housing that defines, inside the absorption tower, a first scrubbing space in which a first scrubbing process is performed; a first tray that is connected to a first inner wall of the housing and extends in a first direction intersecting the first inner wall; a first tray hole which passes through the first tray in a second direction intersecting the first direction and through which the gas mixture passes; and a solution supply nozzle that provides, to the upper surface of the first tray, a first scrubbing solution for performing the first scrubbing process. The gas mixture passes through the first tray hole and rises in the second direction.
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