Decorative film, electronic member, and touch pad

Abstract

[Problem] To provide a decorative film which has excellent matting effect and imparts metallic texture, while being suppressed in whiteness. [Solution] A decorative film which has a base material and a reflection layer, and which satisfies the requirements (1) and (2) described below. (1) With respect to light having a wavelength of 380-750 nm and made incident on the base material from the side opposite to the reflection layer at an angle of 90° to the surface of the base material on which the reflection layer is not present, when R80(90) is the reflectance of the light emitted at an angle of 80° and R50(90) is the reflectance of the light emitted at an angle of 50°, R50(90) / R80(90) is 0.06 to 0.7. (2) With respect to light having a wavelength of 380-750 nm and made incident on the base material from the side opposite to the reflection layer at an angle of 50° to the surface of the base material on which the reflection layer is not present, when R130(50) is the reflectance of the light emitted at an angle of 130° and R90(50) is the reflectance of the light emitted at an angle of 90°, R90(50) / R130(50) is 0.03 to 0.85.

Description

Decorative films, electronic components, and touchpads

[0001] This invention relates to decorative films, electronic components, and touchpads.

[0002] Electronic devices often use metal frames made of stainless steel, aluminum, or titanium for their casing, due to their superior strength, durability, and metallic appearance. These metal frames, while aesthetically pleasing and tactile, also feature surface treatments such as sandblasting and etching to create a textured surface that resists scratches.

[0003] Furthermore, electronic devices incorporate various sensors such as touchpads, pressure sensors, and electrostatic sensors for operation. To match the appearance of the surrounding metal components, these sensors are often made of glass coated with reflective paint or transparent substrates layered together.

[0004] As a material that achieves higher reflectivity, a method is known in which aluminum flakes having a predetermined major diameter and predetermined thickness are used in combination with a solvent-free ultraviolet-curing ink, thereby arranging the aluminum flakes uniformly in the planar direction and partially overlapping in the intermediate position of the specular gloss layer, and obtaining a similar degree of specular gloss on both sides (see, for example, Patent Document 1).

[0005] A metallic decorative member is known that has the function of diffusing light from specular reflection, and comprises a transparent resin substrate having an uneven surface on its back surface, and a decorative layer laminated on the back surface of the transparent resin substrate, wherein the decorative layer is made up of multiple metal flakes deposited thereon, and the interface between the decorative layer and the transparent resin substrate has a shape that matches the uneven surface (see, for example, Patent Document 2).

[0006] Japanese Patent Publication No. 2005-271405 Japanese Patent Publication No. 2017-113962

[0007] The structure in Patent Document 1, where aluminum flakes having a predetermined major diameter and a predetermined thickness are arranged at an intermediate position of the mirror-finish layer, results in a mirror-like appearance and has optical characteristics with a significant difference in the reflected light at an angle close to specular reflection and the brightness at an angle away from specular reflection. Among paints with conventional reflection characteristics, those containing metal particles in a transparent material are well-known, but they have the problem of low reflectance. Also, the metallic decorative member described in Patent Document 2 did not provide a sufficient matting effect or metallic texture. The problem to be solved by one embodiment of the present invention is to provide a decorative film having an excellent matting effect, imparting a metallic texture, and suppressing a white feeling.

[0008] One embodiment of the present invention includes the following aspects. <1> A decorative film having a base material and a reflection layer, the decorative film satisfying the following requirements (1) and (2); (1) The reflectance of light with a wavelength of 380 to 750 nm that enters from the side opposite to the reflection layer of the base material and exits at an angle of 80° with respect to the surface of the base material that does not have the reflection layer and enters at an angle of 90° is defined as R ８０（９０） and the reflectance of light exiting at an angle of 50° is defined as R ５０（９０） When this is done, R ５０（９０） / R ８０（９０） is 0.06 to 0.7; (2) The reflectance of light with a wavelength of 380 to 750 nm that enters from the side opposite to the reflection layer of the base material and exits at an angle of 130° with respect to the surface of the base material that does not have the reflection layer and enters at an angle of 50° is defined as R １３０（５０） and the reflectance of light exiting at an angle of 90° is defined as R ９０（５０） When this is done, R ９０（５０） / R １３０（５０） is 0.03 to 0.85. <2> The R ５０（９０） / R ８０（９０） is 0.10 to 0.65, and the R ９０（５０） / R １３０（５０）<1> A decorative film according to <1>, wherein the ratio is 0.04 to 0.60. <3> A decorative film according to <1>, wherein the surface of the substrate having the reflective layer is uneven. <4> A decorative film according to <3>, wherein the average value of the total ray reflectance of light with a wavelength of 380 to 750 nm, incident from the surface of the substrate opposite to the surface having the uneven surface and incident at an angle of 80° to the surface of the substrate that does not have the uneven surface, is 50% or more. <5> A decorative film according to any one of <1> to <4>, wherein the reflective layer contains metal flakes, and the shape of the metal flakes is coin-shaped. <6> A decorative film according to any one of <1> to <5>, wherein the reflective layer is a layer made of a curable composition containing an epoxy group or a compound containing a (meth)acryloyl group. <7> A decorative film comprising a substrate having an uneven surface with an arithmetic mean height Sa of 0.6 to 25 μm, and a reflective layer disposed on the uneven surface, wherein the average value of the total ray reflectance of light with a wavelength of 380 to 750 nm incident from the surface of the substrate opposite to the uneven surface and incident at an angle of 80° to the surface of the substrate that does not have the uneven surface is 50% or more. <8> The decorative film according to <7>, wherein the reflective layer is insulating. <9> The decorative film according to <7>, wherein the reflective layer contains metal flakes. <10> The decorative film according to <9>, wherein the metal flakes are aluminum pigment. <11> The decorative film according to <10>, wherein the aluminum pigment has a diameter of 0.5 to 35 μm and a thickness of 0.055 to 1.0 μm. <12> The decorative film according to <9>, wherein the surface of the metal flakes is coated with an insulator. <13> The decorative film according to <12>, wherein the insulator is silica or a resin. <14> The decorative film according to <10>, wherein the surface of the aluminum pigment is coated with an insulator. <15> The decorative film according to <14>, wherein the insulator is silica or a resin. <16> The decorative film according to any one of <3> to <15>, wherein the substrate having irregularities has a maximum transmittance of 80% or more at a wavelength of 380 to 750 nm. <17> An electronic component comprising a support and the decorative film according to any one of <1> to <16>.<18> A touchpad having a decorative film as described in any one of <1> to <16>. <19> A decorative film having a reflective layer containing metal flakes surface-treated with a silane coupling agent, and a substrate.

[0009] According to one embodiment of the present invention, a decorative film is provided that has excellent matte effect, imparts a metallic texture, and suppresses a white appearance.

[0010] Figure 1 is a schematic diagram showing a cross-section of a decorative film according to one embodiment of the present invention. Figure 2 is a schematic diagram showing the measurement of reflected light of a decorative film according to one embodiment of the present invention. Figure 3 is a schematic diagram showing the measurement of reflected light of a decorative film according to one embodiment of the present invention. Figure 4 is a diagram showing a simulation of the reflective characteristics of a decorative film according to one embodiment of the present invention.

[0011] Preferred embodiments of the present invention will be described in detail below. It should be understood that the present invention is not limited to the embodiments described below, but also includes various modifications that do not alter the essence of the invention. In this specification, numerical ranges indicated using "~" include the numerical values ​​before and after "~" as the lower and upper limits, respectively. In this specification, "~" indicating a numerical range means that the units described before or after it are the same unit unless otherwise specified. In this specification, a combination of two or more preferred embodiments is a more preferred embodiment. Furthermore, unless otherwise specified, each component in the composition, or each constituent unit in the polymer, may be included alone or in combination of two or more. Embodiments of the present invention will be described with reference to the drawings as necessary, but these drawings are provided solely for illustrative purposes, and the present invention is not limited in any way to these drawings. Also, please note that the drawings are schematic, and the relationship between thickness and planar dimensions, thickness ratios, etc., may differ from actual values. Furthermore, in the following description, components and applications having the same or substantially the same function and configuration will be denoted by the same reference numerals, and redundant explanations will be omitted. The decorative film of the present invention will be described below with reference to the figures as appropriate.

[0012] (First Embodiment) The decorative film 1 according to one embodiment of the present invention has a base material 41 and a reflective layer 31, as shown in Figure 1. Other layers may be provided between the base material 41 and the reflective layer 31, but it is preferable that the base material 41 and the reflective layer 31 are in contact. In the decorative film 1 according to the first embodiment of the present invention, the side of the base material 41 having the reflective layer 31 is the back surface 22, and the side of the base material opposite to the side having the reflective layer 31 is the front surface 21. The reflective layer 31 is located on the back surface 22 side of the base material which has a front surface 21 and a back surface 22. In the decorative film 1 according to the first embodiment of the present invention, the back surface 22 of the base material 41 may or may not have a desired uneven shape formed thereon. When the back surface 22 of the base material is an uneven surface, it is preferable that the decorative film 1 has the reflective layer 31 on the uneven surface side of the base material 41.

[0013] The decorative film according to this embodiment satisfies the following requirements (1) and (2). The decorative film is a decorative film having a base material and a reflective layer, and by satisfying requirements (1) and (2), it has excellent matte effect, imparts a metallic texture, and suppresses a white appearance. Imparting a metallic texture means having an appearance equivalent to a metal frame having an uneven surface structure. Since the decorative film according to the present invention can achieve an appearance equivalent to a metal frame, electronic devices equipped with the decorative film can be equipped with various sensors inside the decorative film.

[0014] <<Requirement (1)>> (1) The reflectance of light with a wavelength of 380 to 750 nm that is incident from the opposite side of the reflective layer of the substrate and incident at a 90° angle to the surface 21 of the substrate that does not have a reflective layer, and exits at an 80° angle is R ８０（９０） The reflectance of light emitted at a 50° angle is R ５０（９０） When R ５０（９０） / R ８０（９０） The value is 0.06 to 0.7. ５０（９０） / R ８０（９０） When R falls within the above range, the appearance of the resulting decorative film can achieve the look of a metal frame with uneven surfaces, thus improving the design of the decorative film. "Achieving the look of a metal frame" means giving the appearance of a frame made of metal such as stainless steel, aluminum, or titanium, which is used as a housing for electronic devices. By achieving the look of a metal frame, a metallic texture can be given to the product. From the above perspective, R ５０（９０） / R ８０（９０） The reflectance R is preferably 0.10 to 0.65, more preferably 0.15 to 0.60, even more preferably 0.20 to 0.55, and most preferably 0.25 to 0.50. ５０（９０） and reflectance R ８０（９０） This is determined by the measurement method described in the examples below.

[0015] <<Reflectance R ５０（９０） (%) >> R ５０（９０）The amount is preferably 0.2% or more, more preferably 0.3% or more, and more preferably 0.4% or more. ５０（９０） If it is 0.2% or more, R ５０（９０） Because the height does not become too low, it is possible to achieve the appearance of a metal frame when observing the surface of the decorative film horizontally from the surface 21 side of the decorative film.

[0016] <<R ５０（９０） / RA>> Also, reflectance R ５０（９０） Since it varies with total light reflectance (RA), R normalized by RA ５０（９０） If the RA is low, the appearance will be dark when viewed from the horizontal direction, which may affect the visual characteristics with respect to the metal frame. From the viewpoint of ensuring that the appearance does not become too dark and that the appearance of the metal frame can be achieved even when the surface of the decorative film is observed horizontally from the surface 21 side of the decorative film, R ５０（９０） The RA is preferably 0.004 to 0.01, more preferably 0.005 to 0.01, and even more preferably 0.006 to 0.01. The total light reflectance (RA) is determined by the measurement method described in the examples below.

[0017] <<Reflectance R ８０（９０） (%) >> R ８０（９０） The lower limit is preferably 7.5% or less, more preferably 6.5% or less, and even more preferably 6.0% or less. The lower limit is not particularly limited, but is 0. ８０（９０） If the value is 7.5% or less, R ８０（９０） Because the value does not become too high, it is possible to achieve the appearance of a metal frame without it looking like a mirror finish.

[0018] Also, R ８０（９０） This varies depending on the total light reflectance (RA), which will be described later, so R normalized by RA ８０（９０） It is thought that / RA may affect the visual characteristics of the mirror-like finish. From the perspective of further suppressing the appearance of the mirror-like finish, R ８０（９０）The / RA is preferably 0.01 to 0.08, more preferably 0.015 to 0.075, and even more preferably 0.02 to 0.07.

[0019] Figure 2 is a schematic representation of requirement (1) above. As shown in Figure 2, the reflectance R ８０（９０） This refers to the ratio of the amount of light emitted at the 80° position (i.e., reflected light) to the amount of light incident at the 90° position (i.e., incident light), when the direction perpendicular to the surface 21 of the substrate that does not have a reflective layer is defined as 90° and the direction horizontal to the surface 21 is defined as 0°. Light with a wavelength of 380 to 750 nm is used as the incident light and reflected light. The above reflectance R ８０（９０） and the reflectance R, which will be discussed later. １３０（５０） This is determined by the measurement method described in the examples below.

[0020] <<Requirement (2)>> (2) The 130° reflectance of light with a wavelength of 380 to 750 nm that is incident from the opposite side of the reflective layer of the substrate and incident at an angle of 50° to the part of the substrate that does not have a reflective layer is R １３０（５０） The reflectance of light emitted at a 90° angle is R. ９０（５０） When R ９０（５０） / R １３０（５０） The range is 0.03 to 0.85. Figure 3 is a schematic diagram of requirement (2). R ９０（５０） / R １３０（５０） When R is within the above range, even when the decorative film is observed from an oblique angle to the surface of the substrate, the appearance of the decorative film is brighter and the whiteness is suppressed, making it easier to reproduce the appearance of a metal frame. When the whiteness is suppressed, the matte effect is excellent. From the above viewpoint, R ９０（５０） / R １３０（５０） The reflectance R is preferably 0.04 to 0.60, more preferably 0.06 to 0.50, even more preferably 0.08 to 0.4, and particularly preferably 0.1 to 0.35. ９０（５０） and reflectance R １３０（５０） This is determined by the measurement method described in the examples below.

[0021] <<Reflectance R １３０（５０）(%) >> R １３０（５０） The amount is preferably 30% or less, more preferably 20% or less, and even more preferably 15% or less. １３０（５０） If the percentage is 30% or less, it can achieve the appearance of a metal frame, resulting in superior design, and it is less likely to deviate from the original and have a mirror-like appearance.

[0022] <<R １３０（５０） / RA>> Also, R １３０（５０） Since it varies with total light reflectance (RA), R normalized by RA １３０（５０） / RA This may affect the visual characteristics of the mirror-like finish. Even when observing the surface of the decorative film horizontally from the surface 21 side of the decorative film, it is difficult to obtain a mirror-like appearance, R １３０（５０） The upper limit of / RA is preferably 0.90 or less, more preferably 0.6 or less, even more preferably 0.4 or less, and more preferably 0.18 or less. １３０（５０） As the lower limit of / RA is reflectance, it should be 0 or greater, but from the viewpoint of suppressing the impression of whiteness, 0.06 or greater is preferable.

[0023] <<Reflectance R ９０（５０） (%) >> R ９０（５０） Preferably, it is 3.5% or less, more preferably 3.0% or less, even more preferably 2.5% or less, particularly preferably 2.0% or less, and most preferably 1.5% or less. ９０（５０） If R is 3.5% or less, ９０（５０） Because the value does not become too high and excessive scattering characteristics are suppressed, it is possible to prevent the appearance from changing to white.

[0024] <<R ９０（５０） / RA>> Also, R ９０（５０） Since it varies with total light reflectance (RA), R normalized by RA ９０（５０） / RA can influence the perceived whiteness of a color. ９０（５０） The upper limit of / RA is preferably 0.04 or less, more preferably 0.035 or less, even more preferably 0.03 or less, particularly preferably 0.025 or less, and most preferably 0.02 or less.９０（５０） While the lower limit of / RA is usually 0 or greater, from the viewpoint of obtaining a design with suppressed mirror-like appearance, 0.006 or greater is preferred, 0.007 or greater is more preferred, 0.008 or greater is even more preferred, and 0.01 or greater is particularly preferred.

[0025] <Substrate> A transparent substrate is preferred as the substrate. The transparent substrate is not particularly limited, but examples include glass and transparent resins. Examples of the transparent resins mentioned above include cyclic (poly)olefin resins, aromatic polyether resins, polyimide resins, fluorene polycarbonate resins, fluorene polyester resins, polycarbonate resins, polyamide (aramid) resins, polyarylate resins, polysulfone resins, polyethersulfone resins, poly-paraphenylene resins, polyamide-imide resins, polyethylene naphthalate (PEN) resins, polyethylene terephthalate (PET) resins, fluorinated aromatic polymer resins, (modified) acrylic resins, epoxy resins, allyl ester curable resins, silsesquioxane UV curable resins, acrylic UV curable resins, and vinyl UV curable resins.

[0026] The transparent resin may be obtained through synthesis or as a commercially available product. Examples of commercially available transparent resins include E5100, E5102, E5200, E5202, T4100, T4102, T4200, T4202, Cosmoshine A4300, A4360 (all product names, manufactured by Toyobo Co., Ltd.), Lumirror series, Trefan series, Tufftop series (all product names, manufactured by Toray Industries, Inc.), Diafoil series, Acrylite series, Acryprene series (all product names, manufactured by Mitsubishi Chemical Corporation), ARTON FILM series (manufactured by JSR Corporation), and Zeonor Film series (manufactured by Nippon Zeon Co., Ltd.).

[0027] Examples of the above-mentioned glass include quartz glass, soda glass, lead glass, borosilicate glass, phosphoric acid glass, and alumina glass. The above-mentioned glass may be commercially available. Examples of commercially available products include EAGLE XG, AstaGlass, Corning Lotus NXT Glass (all product names, manufactured by Corning Japan Ltd.), D263, BK7 (both product names, manufactured by SCHOTT Corporation), E-FD1L, NBFD15-W, FD60-W, FDS165-W, FDS24-SW, TAFD25, TAFD37A, FDS16-W, FDS18-W, TAFD40-W, and TAFD55-W (all product names, manufactured by HOYA Corporation).

[0028] <<Uneven Surface>> In the decorative film according to the first embodiment of the present invention, it is preferable that the surface of the substrate having the reflective layer has an uneven surface. As shown in Figure 1, having an uneven surface on the back surface 22 of the substrate 41 makes it possible to suppress surface reflection of the decorative film 1 and reduce glossiness. In the decorative film, the surface of the substrate having the reflective layer may be in contact with the reflective layer. The decorative film may also have other layers between the surface of the substrate having the reflective layer and the reflective layer. When the decorative film has the other layers, the surface of the substrate having the reflective layer is the surface closest to the reflective layer. The other layers are layers other than the substrate and the reflective layer, and are synonymous with other layers described later. From the viewpoint of obtaining a decorative film that has excellent matte effect, imparts a metallic texture, and suppresses whiteness, it is preferable that the surface of the substrate having the reflective layer is in contact with the reflective layer.

[0029] [Arithmetic Mean Height Sa and Maximum Height Sz] When the substrate has an uneven surface, the arithmetic mean height Sa of the uneven surface is preferably 0.6 to 12 μm, and the maximum height Sz is preferably 4 to 250 μm. The decorative film has a structure that combines a substrate having an uneven surface with the above-mentioned arithmetic mean height Sa and maximum height Sz within this range, and a reflective layer having high reflectivity arranged on the uneven surface, thereby achieving the appearance of a metal frame with an uneven surface structure. When a decorative film is provided with a substrate having an uneven surface with an arithmetic mean height Sa and maximum height Sz above the above lower limit, it exhibits excellent diffusion of obliquely incident light, achieving the appearance of a metal frame with an uneven structure, and tends not to have a mirror-like appearance. Furthermore, if the arithmetic mean height Sa or the maximum height Sz is above the above lower limit, the decorative film tends not to exhibit dark reflective properties when viewed from an oblique angle. This suppresses the occurrence of Rayleigh scattering and Mie scattering due to the size of the surface irregularities, thus making the decorative film less prone to clouding. Dark reflective properties refer to characteristics where light is easily absorbed and less light is reflected.

[0030] From the above viewpoint, the lower limit of Sa is preferably 0.7 μm or more, and more preferably 1 μm or more. The lower limit of Sz is preferably 5 μm or more, and more preferably 8 μm or more. Furthermore, when Sa is below the upper limit, moderate scattering light occurs, suppressing the appearance of whiteness, and making it possible to better achieve an appearance with a metal frame. From this viewpoint, Sa is preferably 10 μm or less, and more preferably 8 μm or less. The arithmetic mean height Sa and the maximum height Sz are determined by the measurement method described in the examples below.

[0031] The substrate having an uneven surface preferably has a maximum transmittance of 80% or more, more preferably 83% or more, and even more preferably 85% or more at wavelengths of 380 to 750 nm. The maximum transmittance of the above substrate at wavelengths of 380 to 750 nm is determined by the measurement method described in the examples below.

[0032] The substrate may contain a visible light absorber having wavelength absorption characteristics in the range of 380 to 750 nm. The visible light absorber may be dispersed in the substrate or coated on one surface of the substrate.

[0033] The substrate having an uneven surface preferably has a maximum transmittance of 80% or more, more preferably 83% or more, and even more preferably 85% or more at wavelengths of 380 to 750 nm.

[0034] The uneven surface of the substrate can be formed by any method, as long as the arithmetic mean height Sa and maximum height Sz are within the above range. For example, the uneven shape may be formed directly on the substrate surface, or an uneven layer may be formed on the surface of the substrate having a reflective layer to form the uneven surface of the substrate. As a method for forming unevenness directly on the substrate surface, for example, a sandblasting method is used to form unevenness using an abrasive. When forming an uneven layer on the surface of the substrate having a reflective layer to form the uneven surface of the substrate, for example, a coating layer that forms a phase separation structure, a layer in which crosslinkable resin or inorganic oxide particles are dispersed, etc., can be used as the uneven surface of the substrate. Other methods for forming unevenness include a method in which a polymerizable compound, thermoplastic resin, soluble resin, etc. are coated onto the reflective surface of the substrate and then the polymerizable compound is imprinted; a forming method in which a thermoplastic resin layer is formed and then the thermoplastic resin layer is hot-pressed; a forming method in which a soluble resin layer is formed and then the thermoplastic resin layer is extracted into a solvent; a sandblasting method; and a printing method using a curable composition.

[0035] A substrate having an uneven surface preferably has a layer made of a curable composition, as described later, on the surface of the substrate that has a reflective layer. When the layer made of the curable composition is the uneven surface of the substrate, the transmittance of the substrate having an uneven surface increases, and the light reflected by the layer made of the curable composition is emitted efficiently, which can result in a design that better realizes the appearance of a metal frame.

[0036] Furthermore, commercially available substrates having an uneven surface may also be used. Examples of commercially available substrates having an uneven surface include PF23-125, PF21-125, PK21, PFG12 527LNS, PFG12 527HNS, PFT60 538LNF, PFT60 538LLF, PFT60 527LL6, and PFT60 527HL6 (product name, manufactured by Daicel Corporation), NFAG02, NFAG02(L), NFAG0-MH, NFAG-SR10, NFAG0SR5, NFAG0SR3 (product name, manufactured by Panac Corporation), Light-Up Series (GM7, GM2, SXE, SP6F, LSE, EKW, SDW, LDS (product name, manufactured by Kimoto Co., Ltd.)), Opal Series (PBS-630L, PBS- Examples include 630A, PBS-632A, PBS-689G, PBS-680G, PBS-689HG, PBS-680HG, PBS-670G, BS-539, BS-530, BS-531, BS-910, BS-911, BS-912, UDD-147D2, UDD-148D2, SHBS-227CA, SHBS-228C2, and UDD-247D2 (all product names, manufactured by Keiwa Co., Ltd.).

[0037] From the viewpoint of minimizing the deterioration of the appearance of the reflective layer located on the back surface 22, the maximum transmittance of the substrate at wavelengths of 380 to 750 nm is preferably 80% or more, more preferably 85%, and even more preferably 89% or more. Here, the transmittance at wavelengths of 380 to 750 nm refers to the transmittance of all light rays, including the transmittance of directly transmitted light and the transmittance of scattered light. The maximum transmittance of the substrate is determined by the measurement method described in the examples below.

[0038] In addition to the case where the surface of the substrate having the reflective layer has an uneven surface (hereinafter sometimes referred to as "uneven surface A"), the substrate may also have another uneven surface (hereinafter sometimes referred to as "uneven surface B") on the surface opposite to the reflective layer of the substrate (i.e., the surface facing the incident light). The Sa of uneven surface B is preferably 0.001 μm to 15 μm, and more preferably 0.005 μm to 10 μm. The Sa of uneven surface B is determined by the measurement method described in the examples below, similar to the Sa described above.

[0039] When the substrate is measured from the back surface 22 side (i.e., the side with the reflective layer of the substrate), the haze of the substrate is preferably 10% to 98%, more preferably 15% or more, even more preferably 96% or less, and particularly preferably 90% or less. The haze value used is determined by a method measured in accordance with JIS K 7136:2000. The haze of the substrate is also determined by the measurement method described in the examples described later. When the haze is 10% or more, the resulting decorative film has optical properties that suppress reflected light, especially at angles close to specular reflection, and prevent large differences in brightness at angles far from specular reflection, thus achieving the appearance of a metal frame with an uneven surface structure. When the haze is 98% or less, excessive scattered light is suppressed, achieving a metal frame-like appearance with a reduced whiteness.

[0040] The decorative film of the present invention preferably has an average total reflectance of light with wavelengths of 380 to 750 nm (visible light) incident from the surface of the substrate opposite to the surface having the uneven surface, and incident at an angle of 80° to the surface of the substrate that does not have the uneven surface (i.e., surface 21), which is 50% or more, more preferably 60% or more, even more preferably 65% ​​or more, and more preferably 70% or more.

[0041] The thickness of the substrate is not particularly limited, for example, as long as it is within the range of 1 μm to 10 mm. Among these, from the viewpoint of obtaining a decorative film that has excellent matte effect, can impart a metallic texture, and suppresses whiteness, the thickness of the substrate is preferably 0.005 to 1 mm, and more preferably 0.01 to 0.8 mm. The thickness of the substrate is determined by the measurement method described in the examples below.

[0042] <<Reflective Layer>> The reflective layer is not particularly limited as long as a decorative film satisfying requirements (1) and (2) can be obtained, but it is preferably insulating. "Insulating properties" can be determined if the decorative film containing the reflective layer is reactive when used in a capacitive touchpad. From the viewpoint of operating the touchpad with sufficient sensitivity, the surface resistance of the reflective layer is preferably 10^10 Ω□ or more, more preferably 10^12 Ω□ or more, and even more preferably 2 × 10^12 Ω□ or more. The surface resistance of the reflective layer is determined by the measurement method described in the examples below. Furthermore, from the viewpoint of superior insulating properties, the reflective layer preferably contains metal flakes, and more preferably is a layer made of a curable composition containing metal flakes. The reflective layer may also be a vapor-deposited reflective film or a dielectric multilayer film, as described below.

[0043] The reflective layer preferably has an average total reflectance of 60% or more for light with wavelengths of 380 to 750 nm incident at an 80° angle, more preferably 65% ​​or more, and more preferably 70% or more. There is no particular upper limit to the average total reflectance of light with wavelengths of 380 to 750 nm incident at an 80° angle in the reflective layer, but a value of 70% or more is most preferable as it makes it possible to achieve the appearance of a metal frame.

[0044] <Metal Flakes> The shape of the metal flakes is not particularly limited and includes flake type, coin type, powder, etc. Flake type includes, for example, flat flake type, corn flake type, etc. From the viewpoint of obtaining a decorative film that is superior in matte effect, imparts a metallic texture, and suppresses the whiteness, the shape of the metal flakes is preferably coin type. The shape described as coin type is preferably a flattened shape with a difference between diameter and thickness. By making the shape of the metal flakes flattened, the metal flakes are arranged near the uneven surface of the substrate, making it possible to achieve high reflectivity in the resulting decorative film. The shape of the metal flakes can be confirmed by observing the cross-section obtained by cutting the decorative film perpendicular to the thickness direction with a focused ion beam (FIB) or the like using an electron microscope. The flattening ratio D / h, which is the ratio of diameter to thickness, is preferably 10 or more, more preferably 30 or more, and even more preferably 50 or more, from the viewpoint of achieving high reflectivity in the resulting decorative film. Furthermore, from the viewpoint of suppressing thinning and imparting high reflectivity to the resulting decorative film, the aspect ratio D / h is preferably 500 or less, more preferably 400 or less, and even more preferably 250 or less.

[0045] Metal flakes exhibiting high reflectivity can be suitably used. Generally, reflectivity can be determined according to Fresnel's equation, using the refractive index and extinction coefficient of the incident medium and the refractive index and extinction coefficient of the metal flake. Because metals have a higher extinction coefficient due to surface free electrons compared to non-metallic materials, it is not uncommon for materials to have reflectivity of 50% or more. However, it is known that the reflectivity differs from that of a solid metal surface when incident on a metal with a thickness less than the wavelength of light. Furthermore, the reflectivity of thin film materials is calculated from optical admittance. The characteristic matrix (or characteristic matrix) M used for calculating optical admittance. １ It can be expressed as follows:

[0046]

[0047]

[0048] Here, in equations (1) and (2), n is the complex refractive index including the refractive index and extinction coefficient of the metal, λ is the wavelength of light, and d is the physical thickness of the single layer. When the thin film material has multiple layers, the characteristic matrix (or characteristic matrix) is expressed by the following equation (3).

[0049]

[0050] Here, in equation (3), n ｍ is the refractive index of the transparent support or output medium. From equation (3), the optical admittance Y Ｅ It can be expressed by the following equation (4).

[0051]

[0052] The optical admittance of the incident medium is Y ０ In this case, the reflectance R is expressed by the following equation (5).

[0053]

[0054] Assuming resin and glass as the incident and exit media for the metal flakes, and with a refractive index of 1.518 and an extinction coefficient of 0, the reflectance at a wavelength of 550 nm was calculated using optical simulation software (OptiLayer, OptiLayer GmbH) while varying the thickness of the metal flakes, and the results shown in Figure 4 were obtained.

[0055] From the viewpoint of obtaining high reflective properties, the lower limit of the thickness of the metal flake is preferably 55 nm (0.055 μm) or more, more preferably 70 nm (0.070 μm) or more, and even more preferably 80 nm (0.080 μm) or more. By selecting metal flakes with a thickness of 55 nm or more, it is possible to make the average reflectance of all visible light (wavelength 380 to 750 nm) incident on the decorative film from the opposite side of the reflective layer of the substrate and incident at an angle of 80° to the surface of the substrate that does not have a reflective layer 60% or more or 70% or more. If the average reflectance of all light is 70% or more, the resulting decorative film can achieve the appearance of a metal frame, so it is preferable to select the above-mentioned thickness of the metal flake.

[0056] Furthermore, the upper limit of the metal flake thickness is preferably 1.0 μm or less, more preferably 0.5 μm or less, and even more preferably 0.2 μm or less, from the viewpoint of easily reproducing the orientation state that obtains high reflectivity. The thickness of the metal flake is determined as the average value of the thicknesses of any 20 metal flakes observed with an optical microscope or electron microscope on a cross-section cut perpendicular to the surface of the metal flake.

[0057] From the viewpoint of easily achieving an orientation state that can obtain high reflectivity, a flat shape with a radius of curvature of 100 μm or more is preferred for the metal flakes over a curved shape with a cornflake-like surface.

[0058] Preferably, the metal flakes have a diameter D of 0.5 μm or more and 35 μm or less. In this specification, the diameter D of the metal flakes refers to the value at 50% of the cumulative volume (D50) in the particle size distribution measured by dynamic light scattering. When the diameter of the metal flakes is 0.5 μm or more, the generation of edges is suppressed, the absorption characteristics of the metal are reduced, and the gloss tends to be excellent. From this viewpoint, the lower limit of the diameter of the metal flakes is preferably 0.6 μm or more, more preferably 1 μm or more, and even more preferably 5 μm or more. Preferably, the diameter of the metal flakes is 25 μm or less, and more preferably 20 μm or less. Furthermore, when the upper limit of the diameter of the metal flakes is 25 μm or less, the presence of granular metal frames is suppressed, and it becomes possible to achieve the appearance of metal frames with irregularities. In addition, they can be present inside the undulations of the uneven surface of the substrate, and the appearance of metal frames with irregularities tends to be easily obtained.

[0059] From the viewpoint of dispersibility in resins and solvents, and from the viewpoint of obtaining a reflective layer with high insulating properties, it is preferable that the metal flakes are coated with an insulator such as a silica coating, an alumina coating, or a resin coating. Since the resulting decorative film can be used in a capacitive contact sensor because the reflective layer has high insulating properties, it is preferable that the surface of the metal flakes is coated with an insulator, and more preferably that the surface of the metal flakes is coated with silica. Examples of insulators include silica, alumina, and resin. Among these, silica or resin is preferred as the insulator. When silica is used as the insulator, metal flakes surface-treated with a silane coupling agent may be used.

[0060] Examples of metallic flakes include pigments such as aluminum, gold, platinum, silver, and titanium. Among these, from the viewpoint of imparting gloss to the appearance of the resulting decorative film and being less prone to discoloration over time, it is preferable that the metallic flake be at least one pigment selected from the group consisting of aluminum, gold, platinum, and titanium. Furthermore, from the viewpoint of being lightweight and cost-effective, aluminum pigment is more preferable.

[0061] There are no particular restrictions on the aluminum pigment, and any known aluminum pigment can be used. Examples of aluminum pigments include PCF7493A, PCF1401A, PCF1415B, PCF1440, PCF7410A, PCF7130A, PCF7160A, PCF7601A, PCF7620A, PCF7670A, PCF7680A, PCF7680, MTS-D12I, MTR-12I, MTS-D07I, MTR-07I, and the Z series. EMR-DZ460, EMR-D4690, UTF-410, EMR-DU410, TS-408PM, TS-710PM, EMRS-D710, MIJ-406PMA, EMR-DZ460 (all product names, manufactured by Toyo Aluminum Co., Ltd.), FD-5060, FD-4070, FD-408S, FD-508H, FD-512H, GX-4100, GX-310 8, GX-3109, GX-3100, GX-3110, GX-3140, GX-3160, GX-3180, 0-2100, 0-2130, GX-2134, GX-2140, G X-180A, GX-40A, GX-50A, BS-080, BS-100, BS-200, BS-400, BS-800, BS-120, BS-150, BS-210, BS-24 Examples include 0, M-801, M-601, M-301, MC-808, MC-707, MC-606, MC-666, MC-404, AM-1501, MF-50, MF-40, MG-21, MG-11, MG-01, MH-6601, MH-8801, MH-8802, MH-8805, MH-9901, S-8801T (all product names, manufactured by Asahi Kasei Corporation), Bright Silver-20, Bright Silver HSA-20 (all product names, manufactured by VIAVI Solutions Incorporated).

[0062] The aluminum pigment preferably has a diameter of 0.6 to 35 μm and a thickness of 0.055 to 1.0 μm, more preferably a diameter of 1 to 25 μm and a thickness of 0.070 to 0.5 μm, and even more preferably a diameter of 5 to 20 μm and a thickness of 0.080 to 0.2 μm.

[0063] The metal flake content is preferably 30 to 70% by mass, and more preferably 40 to 65% by mass, relative to the total mass of the reflective layer. The metal flake may be present as a single type or as two or more types in the reflective layer.

[0064] One method for forming a reflective layer is to prepare a curable composition containing the above-mentioned metal flakes, coat the curable composition onto a substrate, and then cure it to form a reflective layer. The components contained in the curable composition used to form the reflective layer will be described below.

[0065] <Curable Composition> The curable composition preferably comprises a polymerizable compound, the above-mentioned metal flakes, and an organic solvent. The metal flakes are synonymous with the metal flakes contained in the reflective layer described above, and the preferred embodiments are the same. In a curable composition containing metal flakes, the upper limit of the mass ratio of metal flakes in the curable composition is preferably 30% by mass or more, and more preferably 40% by mass or more, from the viewpoint of obtaining a high reflectivity. Furthermore, from the viewpoint of suppressing peeling of the curable composition after curing, the lower limit of the mass ratio of metal flakes is preferably 70% by mass or less, and more preferably 65% ​​by mass or less.

[0066] <Polymerizable Compounds> Polymerizable compounds are not particularly limited as long as they are compounds having polymerizable functional groups. Polymerizable compounds may be used individually or in combination of two or more. Examples of the polymerizable functional groups include ethylenically unsaturated groups, oxyranyl groups (epoxy groups), oxetanyl groups, N-alkoxymethylamino groups, hydrosiloxane groups, vinylsilyl groups, etc. Examples of the ethylenically unsaturated groups include vinyl groups, styryl groups, allyl groups, (meth)acryloyl groups, (meth)acrylamide groups, and maleimide groups, with (meth)acryloyl groups being preferred among these. From the viewpoint of excellent dimensional stability, epoxy groups, (meth)acryloyl groups, hydrosiloxane groups, or vinylsilyl groups are preferred as polymerizable functional groups, and epoxy groups or (meth)acryloyl groups are more preferred. Furthermore, it is preferable that the curable composition contains a compound containing an epoxy group or a (meth)acryloyl group. As the polymerizable compound, it is preferable to appropriately select and use a compound having two or more polymerizable functional groups in its molecule. Furthermore, from the viewpoint of cut resistance, it is preferable that the curable composition contains polymerizable compounds having at least two polymerizable functional groups in its molecule in a mass proportion of 0.2 or more of the total polymerizable compounds.

[0067] There are no particular limitations on compounds having two or more (meth)acryloyl groups in the molecule. Examples include polyfunctional (meth)acrylates obtained by reacting an aliphatic polyhydroxy compound with (meth)acrylic acid, caprolactone-modified polyfunctional (meth)acrylates, alkylene oxide-modified polyfunctional (meth)acrylates, polyfunctional urethane (meth)acrylates obtained by reacting a hydroxyl-containing (meth)acrylate with a polyfunctional isocyanate, and polyfunctional (meth)acrylates having carboxyl groups obtained by reacting a hydroxyl-containing (meth)acrylate with an acid anhydride. Examples of the above aliphatic polyhydroxy compounds include divalent aliphatic polyhydroxy compounds such as ethylene glycol, propylene glycol, polyethylene glycol, and polypropylene glycol; and trivalent or higher aliphatic polyhydroxy compounds such as glycerin, trimethylolpropane, pentaerythritol, and dipentaerythritol.

[0068] The above-mentioned (meth)acrylate having a hydroxyl group is not particularly limited and includes, for example, 2-hydroxyethyl (meth)acrylate, trimethylolpropane di(meth)acrylate, pentaerythritol tri(meth)acrylate, dipentaerythritol penta(meth)acrylate, glycerol dimethacrylate, etc.; the above-mentioned polyfunctional isocyanates include, for example, tolylene diisocyanate, hexamethylene diisocyanate, diphenylmethylene diisocyanate, isophorone diisocyanate, etc. The above-mentioned acid anhydrides include, for example, anhydrides of dibasic acids and dianhydrides of tetrabasic acids. Specific examples of acid anhydrides include, as anhydrides of the above-mentioned dibasic acids, succinic anhydride, maleic anhydride, glutaric anhydride, itaconic anhydride, phthalic anhydride, hexahydrophthalic anhydride, etc.; and as dianhydrides of the above-mentioned tetrabasic acids, for example, pyromellitic anhydride, biphenyltetracarboxylic acid dianhydride, benzophenonetetracarboxylic acid dianhydride, etc.

[0069] Examples of the alkylene oxide-modified polyfunctional (meth)acrylates mentioned above include bisphenol A di(meth)acrylate modified with at least one selected from ethylene oxide and propylene oxide, isocyanuric acid tri(meth)acrylate modified with at least one selected from ethylene oxide and propylene oxide, trimethylolpropane tri(meth)acrylate modified with at least one selected from ethylene oxide and propylene oxide, pentaerythritol tri(meth)acrylate modified with at least one selected from ethylene oxide and propylene oxide, pentaerythritol tetra(meth)acrylate modified with at least one selected from ethylene oxide and propylene oxide, dipentaerythritol penta(meth)acrylate modified with at least one selected from ethylene oxide and propylene oxide, and dipentaerythritol hexa(meth)acrylate modified with at least one selected from ethylene oxide and propylene oxide.

[0070] Examples of compounds having two or more N-alkoxymethylamino groups in their molecule include compounds having a melamine structure, a benzoguanamine structure, or a urea structure. Here, a melamine structure refers to a chemical structure having one or more triazine rings as its basic framework. A benzoguanamine structure refers to a chemical structure having one or more phenyl-substituted triazine rings as its basic framework. The melamine structure and benzoguanamine structure are concepts that encompass melamine, benzoguanamine, and their condensates. Examples of compounds having two or more N-alkoxymethylamino groups in their molecule include N,N,N',N',N'',N''-hexa(alkoxymethyl)melamine, N,N,N',N'-tetra(alkoxymethyl)benzoguanamine, and N,N,N',N'-tetra(alkoxymethyl)glycoluryl.

[0071] Preferred polymerizable compounds include, among the above, polyfunctional (meth)acrylates obtained by reacting a trivalent or higher aliphatic polyhydroxy compound with (meth)acrylic acid, caprolactone-modified polyfunctional (meth)acrylates, polyfunctional urethane (meth)acrylates, polyfunctional (meth)acrylates having carboxyl groups, N,N,N',N',N'',N''-hexa(alkoxymethyl)melamine and N,N,N',N'-tetra(alkoxymethyl)benzoguanamine.

[0072] <Binder Resin> The curable resin composition may contain a binder resin. Including a binder resin in the curable resin composition can improve the storage stability of the curable resin composition. The binder resin is not particularly limited, but it is preferably a resin having acidic functional groups such as carboxyl groups and phenolic hydroxyl groups. Among these, a polymer having carboxyl groups (hereinafter referred to as "carboxyl group-containing polymer") is preferred as the binder resin. For example, a copolymer of an ethylenically unsaturated monomer having one or more carboxyl groups (hereinafter referred to as "unsaturated monomer (b1)") and another copolymerizable ethylenically unsaturated monomer (hereinafter referred to as "unsaturated monomer (b2)") can be cited.

[0073] Examples of the above-mentioned unsaturated monomer (b1) include (meth)acrylic acid, maleic acid, maleic anhydride, mono[2-(meth)acryloyloxyethyl] succinate, ω-carboxypolycaprolactone mono(meth)acrylate, and p-vinylbenzoic acid. These unsaturated monomers (b1) can be used individually or in combination of two or more.

[0074] Furthermore, examples of the unsaturated monomer (b2) include N-substituted maleimides such as N-phenylmaleimide and N-cyclohexylmaleimide; aromatic vinyl compounds such as styrene, α-methylstyrene, p-hydroxystyrene, p-hydroxy-α-methylstyrene, p-vinylbenzylglycidyl ether, and acenaphthylene.

[0075] Methyl (meth)acrylate, n-butyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, allyl (meth)acrylate, benzyl (meth)acrylate, polyethylene glycol (degree of polymerization 2-10) methyl ether (meth)acrylate, polypropylene glycol (degree of polymerization 2-10) methyl ether (meth)acrylate, polyethylene glycol (degree of polymerization 2-10) mono (meth)acrylate, polypropylene glycol (degree of polymerization 2-10) mono (meth)acrylate, cyclohexyl (meth)acrylate, isobornyl (meth)acrylate, tricyclo[5.2.1.0 ２，６ (meth)acrylic acid esters such as decane-8-yl (meth)acrylate, dicyclopentenyl (meth)acrylate, glycerol mono (meth)acrylate, 4-hydroxyphenyl (meth)acrylate, ethylene oxide-modified (meth)acrylate of paracumylphenol, glycidyl (meth)acrylate, 3,4-epoxycyclohexylmethyl (meth)acrylate, 3-[(meth)acryloyloxymethyl]oxetane, 3-[(meth)acryloyloxymethyl]-3-ethyloxetane;

[0076] Cyclohexyl vinyl ether, isobornyl vinyl ether, tricyclo[5.2.1.0 ２，６ Examples include vinyl ethers such as decane-8-yl vinyl ether, pentacyclopentadecanyl vinyl ether, and 3-(vinyloxymethyl)-3-ethyloxetane; and macromonomers having mono(meth)acryloyl groups at the ends of polymer molecular chains such as polystyrene, polymethyl (meth)acrylate, poly-n-butyl (meth)acrylate, and polysiloxane. These unsaturated monomers (b2) can be used individually or in combination of two or more.

[0077] Furthermore, for example, a carboxyl group-containing polymer having polymerizable unsaturated bonds such as (meth)acryloyl groups in its side chains can also be used as a binder resin. In addition, for example, a copolymer of an unsaturated monomer containing an (meth)acrylic acid ester having an oxyranyl group, such as glycidyl (meth)acrylate, can be used as a binder resin, and the copolymer obtained by reacting this with an unsaturated monomer (b1) to produce hydroxyl groups, and then reacting the resulting copolymer with a polybasic acid anhydride, can also be used as a binder resin.

[0078] Examples of such polybasic acid anhydrides include dibasic acid anhydrides such as maleic anhydride, fumaric anhydride, citraconic anhydride, mesaconic anhydride, itaconic anhydride, tetrahydrophthalic anhydride, methyltetrahydrophthalic anhydride, hexahydrophthalic anhydride, methylhexahydrophthalic anhydride, hymic anhydride, phthalic anhydride, and naphthalene-2,3-dicarboxylic acid anhydride; monoanhydrides of polybasic acids of three or more basic acids such as cyclohexane-1,2,4-tricarboxylic acid anhydride and trimellitic anhydride; and cyclob Examples include dianhydrides of tetrabasic or polybasic acids such as tantetracarboxylic acid dianhydride, cyclopentanetetracarboxylic acid dianhydride, cyclohexanetetracarboxylic acid dianhydride, norbornanetetracarboxylic acid dianhydride, pyromellitic acid dianhydride, biphenyltetracarboxylic acid dianhydride, diphenyl ethertetracarboxylic acid dianhydride, benzophenonetetracarboxylic acid dianhydride, naphthalene-1,4,5,8-tetracarboxylic acid dianhydride, and perylene-3,4,9,10-tetracarboxylic acid dianhydride.

[0079] The binder resin typically has a weight-average molecular weight (Mw) of 1,000 to 100,000, preferably 3,000 to 50,000, in terms of polystyrene, as measured by gel permeation chromatography (GPC) (elution solvent: tetrahydrofuran). Having a weight-average molecular weight (Mw) within this range facilitates the development of cut resistance in the resulting reflective layer. The binder resin can be used alone or in mixtures of two or more types.

[0080] <Polymerization Initiator> The curable composition preferably contains a polymerization initiator. The polymerization initiator may be either a thermal polymerization initiator or a photopolymerization initiator.

[0081] <Thermal Polymerization Initiators> When the polymerization initiator is a thermal polymerization initiator, it is possible to make a thermosetting composition. There are no particular restrictions on the thermal polymerization initiator, and known thermal polymerization initiators can be used. Examples of thermal polymerization initiators include radical polymerization initiators that generate radicals when heated, thermal acid generators that generate acids when heated, and thermal base generators that generate bases when heated.

[0082] <Photopolymerization Initiator> By using a photopolymerization initiator, radiation sensitivity can be imparted to the curable resin composition, resulting in a radiation-sensitive curable resin composition. The photopolymerization initiator is not particularly limited as long as it is a compound that generates an active species capable of initiating polymerization of the polymerizable compound upon exposure to radiation such as visible light, ultraviolet light, far ultraviolet light, electron beams, or X-rays.

[0083] Examples of such photopolymerization initiators include thioxanthone compounds, acetophenone compounds, biimidazole compounds, triazine compounds, O-acyloxime compounds, onium salt compounds, benzoin compounds, benzophenone compounds, α-diketone compounds, polynuclear quinone compounds, diazo compounds, imidosulfonate compounds, and onium salt compounds. The photopolymerization initiator can be used alone or in combination of two or more. Preferably, the photopolymerization initiator is at least one compound selected from the group consisting of thioxanthone compounds, acetophenone compounds, biimidazole compounds, triazine compounds, and O-acyloxime compounds.

[0084] Specific examples of preferred photopolymerization initiators that are thioxanthone compounds include thioxanthone, 2-chlorothioxanthone, 2-methylthioxanthone, 2-isopropylthioxanthone, 4-isopropylthioxanthone, 2,4-dichlorothioxanthone, 2,4-dimethylthioxanthone, 2,4-diethylthioxanthone, and 2,4-diisopropylthioxanthone.

[0085] Furthermore, specific examples of the above-mentioned acetophenone compounds include 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinopropan-1-one, 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)butan-1-one, and 2-(4-methylbenzyl)-2-(dimethylamino)-1-(4-morpholinophenyl)butan-1-one.

[0086] Furthermore, specific examples of the above biimidazole compounds include 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetraphenyl-1,2'-biimidazole, 2,2'-bis(2,4-dichlorophenyl)-4,4',5,5'-tetraphenyl-1,2'-biimidazole, and 2,2'-bis(2,4,6-trichlorophenyl)-4,4',5,5'-tetraphenyl-1,2'-biimidazole.

[0087] Furthermore, when using a biimidazole-based compound as a photopolymerization initiator, it is preferable to use a hydrogen donor in combination, as this can improve sensitivity. Here, "hydrogen donor" refers to a compound that can donate hydrogen atoms to radicals generated from the biimidazole-based compound upon exposure. Examples of hydrogen donors include mercaptan-based hydrogen donors such as 2-mercaptobenzothiazole and 2-mercaptobenzoxazole, and amine-based hydrogen donors such as 4,4'-bis(dimethylamino)benzophenone and 4,4'-bis(diethylamino)benzophenone. In the present invention, hydrogen donors can be used alone or in combination of two or more, but it is preferable to use one or more mercaptan-based hydrogen donors and one or more amine-based hydrogen donors in combination, as this can further improve sensitivity.

[0088] Furthermore, specific examples of the above triazine compounds include 2,4,6-tris(trichloromethyl)-s-triazine, 2-methyl-4,6-bis(trichloromethyl)-s-triazine, 2-[2-(5-methylfuran-2-yl)ethenyl]-4,6-bis(trichloromethyl)-s-triazine, 2-[2-(furan-2-yl)ethenyl]-4,6-bis(trichloromethyl)-s-triazine, and 2-[2-(4-diethylamino-2-methylphenyl)ethenyl]-4,6-bis(tri Examples of triazine compounds having a halomethyl group include chloromethyl)-s-triazine, 2-[2-(3,4-dimethoxyphenyl)ethenyl]-4,6-bis(trichloromethyl)-s-triazine, 2-(4-methoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4-ethoxystyryl)-4,6-bis(trichloromethyl)-s-triazine, and 2-(4-n-butoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine.

[0089] Furthermore, specific examples of O-acyloxime compounds include 1,2-octanedione, 1-[4-(phenylthio)phenyl]-,2-(O-benzoyloxime), ethanone, 1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazole-3-yl]-,1-(O-acetyloxime), ethanone, 1-[9-ethyl-6-(2-methyl-4-tetrahydrofuranylmethoxybenzoyl)-9H-carbazole-3-yl]-,1-(O-acetyloxime), ethanone, 1-[9-ethyl-6-{2-methyl-4-(2,2-dimethyl-1,3-dioxolanyl)methoxybenzoyl}-9H-carbazole-3-yl]-,1-(O-acetyloxime), and the like.

[0090] When using photopolymerization initiators other than biimidazole compounds, such as acetophenone compounds, sensitizers may be used in combination. Examples of such sensitizers include 4,4'-bis(dimethylamino)benzophenone, 4,4'-bis(diethylamino)benzophenone, 4-diethylaminoacetophenone, 4-dimethylaminopropiophenone, ethyl 4-dimethylaminobenzoate, 2-ethylhexyl 4-dimethylaminobenzoate, 2,5-bis(4-diethylaminobenzal)cyclohexanone, 7-diethylamino-3-(4-diethylaminobenzoyl)coumarin, and 4-(diethylamino)chalcone.

[0091] The polymerization initiator content is preferably 0.01 to 120 parts by mass, and more preferably 1 to 100 parts by mass, per 100 parts by mass of the polymerizable compound. By setting the polymerization initiator content within this range, good curability and film properties can be achieved.

[0092] <Organic solvents> There are no particular restrictions on organic solvents as long as they are liquid at room temperature, but methanol, ethanol, 1-propanol, butanol, isopropanol, acetone, methyl ethyl ketone, acetonitrile, dimethyl sulfoxide, dimethylformamide, tetrahydrofuran, dioxane, chloroform, dichloromethane, toluene, benzene, hexane, cyclohexane, chlorobenzene, 1,2-dichloroethane, pyridine, piperidine, aniline, methylene chloride, tetrachloridoethylene, ethyl acetoethyl acetate, ethyl acetate, butyl acetate, isopropylformamide, isobutyl alcohol, n-heptane, methylmethacin Examples include rilate, vinyl chloride, formamide, trichloromethane, tetrachloroethylene, 1,2-dimethoxyethane, N-methyl-2-pyrrolidone, acetylacetone, chloropicrin, trimethylpentanel, 1,4-dioxane, amyl alcohol, cellosolve, butyl glycol, chlorobenzene, isohexane, diethyl ether, terpenes, propylene glycol monomethyl ether (PGME), propylene glycol 1-monomethyl ether 2-acetate (propylene glycol monomethyl ether acetate (PGMEA)), ethylene glycol, isophorone, and isobornyl acrylate.

[0093] <Additives> The curable composition may further contain additives as components other than polymerizable compounds, binder resins, polymerization initiators, and organic solvents. Examples of additives include adhesion aids, surfactants, compatibilizers, defoamers, anti-aging agents, ultraviolet absorbers, antioxidants, heat stabilizers, light stabilizers, phase difference adjusters, near-infrared absorbers, antistatic agents, dispersants, crosslinking agents, processability improvers, chlorine scavengers, flame retardants, crystallization nucleating agents, blocking inhibitors, anti-fogging agents, mold release agents, pigments, dyes, organic or inorganic fillers, neutralizing agents, lubricants, decomposing agents, metal deactivators, anti-fouling agents, and antibacterial agents. Additives can be included in the curable composition to the extent that the effects of the present invention are not impaired. Additives may be used individually or in combination of two or more.

[0094] <Vaporized Reflective Film> The vapor-deposited reflective film is not limited as long as it reflects 50% or more of visible light. Examples of vapor-deposited reflective films include metal vapor-deposited films and dielectric multilayer films. Examples of metals used to form the metal vapor-deposited film include gold, silver, copper, zinc, aluminum, tungsten, titanium, magnesium, nickel, silicon, silicon hydride, and germanium. From the viewpoint of improving adhesion and durability, the metal vapor-deposited film may further have other metal films or metal oxide films on the adhesion surface or surface.

[0095] <Dielectric Multilayer Films> Examples of dielectric multilayer films include layers formed by combining at least two types of materials: a high refractive index material layer and a low refractive index material layer (hereinafter also referred to as the "low refractive index material layer") which has a refractive index lower than that of the high refractive index material layer, and layers formed by combining at least three types of materials: a high refractive index material layer, a low refractive index material layer, and a medium refractive index material layer which has a refractive index lower than that of the high refractive index material layer and higher than that of the low refractive index material layer.

[0096] Examples of materials constituting the high refractive index material layer include titanium oxide, zirconium oxide, tantalum oxide, niobium oxide, lanthanum oxide, zinc oxide, zinc sulfide, barium titanate, and silicon. Furthermore, examples include materials with the above materials as the main component, containing small amounts (for example, 0 to 10% by mass relative to the main component) of titanium oxide, niobium oxide, hafnium oxide, tin oxide, and / or cerium oxide; and materials in which titanium oxide, zirconium oxide, tantalum oxide, niobium oxide, lanthanum oxide, zinc oxide, zinc sulfide, barium titanate, and / or silicon are dispersed in a resin such as the transparent resin.

[0097] Examples of materials constituting the low refractive index layer include materials with a refractive index of less than 1.6, and typically, materials with a refractive index of 1.2 to less than 1.6 are selected. Examples of such materials include silica, lanthanum fluoride, magnesium fluoride, sodium aluminum hexafluoride; resins such as the transparent resin; and a transparent resin in which silica, lanthanum fluoride, magnesium fluoride, and / or sodium aluminum hexafluoride are dispersed.

[0098] Examples of materials constituting the medium refractive index material layer include materials with a refractive index of 1.6 or more and less than 2.0. Examples of such materials include aluminum oxide, bismuth oxide, europium oxide, yttrium oxide, ytterbium oxide, samarium oxide, indium oxide, magnesium oxide, molybdenum oxide; mixtures of these materials with the materials constituting the high refractive index material layer and / or the materials constituting the low refractive index material layer; the materials constituting the high refractive index material layer and the materials constituting the low refractive index material layer; and mixtures of these materials dispersed in a resin such as the transparent resin.

[0099] There are no particular restrictions on the method for forming dielectric multilayer films, as long as a dielectric multilayer film is formed by stacking these material layers. As a method for forming dielectric multilayer films, for example, a dielectric multilayer film can be formed on a transparent substrate by directly using CVD (Chemical Vapor Deposition), sputtering, vacuum deposition, ion-assisted deposition, or ion plating, in which high refractive index material layers and low refractive index material layers are alternately stacked, or by alternately stacking high refractive index material layers, medium refractive index material layers, and low refractive index material layers. When stacking layers containing transparent resin, they can be formed by melt molding, cast molding, preferably by spin coating, dip coating, slit coating, gravure coating, etc.

[0100] <Other Layers> The decorative film according to the present invention may have layers other than the substrate and the reflective layer (hereinafter sometimes referred to as "other layers"), as long as they do not impair the effects of the present invention, and may further have a functional layer as the other layer. Examples of functional layers include an adhesive layer, a light-shielding layer, a scratch-resistant layer, a stray light suppression layer, an adhesion layer, an antistatic layer, a self-healing layer, an anti-reflective layer, a refractive index adjustment layer, an anti-fogging layer, a color adjustment layer, a near-infrared cut layer, a visible light cut layer, and a hard coat layer. The decorative film can be easily laminated to other transparent supports other than the substrate described later by, for example, providing an adhesive layer on the surface 21.

[0101] Other transparent supports besides the substrate include glass and transparent resins. Thermoplastic resins are preferred for the transparent resin. Examples of thermoplastic resins include cyclic polyolefin resins, polyether resins, polyimide resins, polyester resins, polycarbonate resins, polyamide (aramid) resins, polyarylate resins, polysulfone resins, polyethersulfone resins, poly(para)phenylene resins, polyamide-imide resins, polyethylene naphthalate (PEN) resins, fluorinated aromatic polymer resins, (modified) acrylic resins, epoxy resins, polyhydroxystyrene resins, and phenolic resins.

[0102] The stray light suppression layer can be formed from a material that absorbs light of the wavelength used. Examples of materials that suppress stray light of visible light include carbon black, various black pigments and dyes, and materials that are colored black using a mixture of multiple pigments and dyes. When an optical sensor is provided on the side of the decorative film having a reflective layer (back surface 22 side), it is preferable to provide the stray light suppression layer as a functional layer on the side of the substrate opposite to the reflective layer, from the viewpoint of suppressing a decrease in design quality due to stray light.

[0103] The refractive index adjustment layer can be formed using organic or inorganic materials with a refractive index of 1.0 to 3.8, hollow materials containing air, gels, sols, etc. By providing the refractive index adjustment layer on the surface of the decorative film opposite to the reflective layer of the substrate, it becomes possible to adjust the appearance from a specific angle, resulting in a decorative film with superior design.

[0104] The adhesion layer includes a layer containing a compound having an adhesion functional group, a material for adjusting the glass transition temperature, and a material for adjusting the surface free energy. Examples of compounds having the adhesion functional group include compounds having hydroxyl groups, carboxylic acid groups, amide groups, isocyanate groups, and alkoxysilyl groups. Examples of materials for adjusting the surface free energy include leveling agents and surfactants.

[0105] The antistatic layer can be formed from a conductive compound. Examples of conductive compounds include metal pigments, hydrophilic compounds such as polyethers, carbon, silver nanowires, and ITO.

[0106] The self-healing layer can be formed from hydrogen-bonding compounds. Even if scratches, cuts, or scars occur within the self-healing layer, it will repair itself to its original shape over time.

[0107] The color adjustment layer can be formed using a material that has visible light absorption properties. Examples of materials that have visible light absorption properties include plasmon absorbers, pigments, and dyes.

[0108] The anti-fogging layer is a layer whose hydrophilicity and / or hydrophobicity are adjusted, and can be formed from inorganic particles, organic particles, materials that control the arrangement, etc.

[0109] The near-infrared and visible light blocking layers can be formed using plasmon absorbers, dielectric multilayer films, ITO or ATO, zinc oxide, cesium tungsten oxide, colored pigments, dyes, and the like.

[0110] When a decorative film is equipped with an anti-reflective layer, the reflectance at specific wavelengths can be reduced compared to before the anti-reflective layer was applied to the decorative film. Examples of anti-reflective layers include layers of a specific thickness and a refractive index lower than that of the substrate, dielectric multilayer film structures with different refractive indices stacked at predetermined thicknesses, and layers having a moth-eye structure. The hard coat layer can be formed from silica, alumina, zirconia, titania, or condensates of silane alkoxides, titanium alkoxides, or aluminum alkoxides. Layers formed from such compounds can exhibit excellent scratch resistance.

[0111] (Second Embodiment) A decorative film according to one embodiment of the present invention comprises a substrate having an uneven surface with an arithmetic mean height Sa of 0.6 to 25 μm, and a reflective layer disposed on the uneven surface, wherein the average value of the total ray reflectance of light with a wavelength of 380 to 750 nm, incident from the surface of the substrate opposite to the uneven surface and incident at an angle of 80° to the surface of the substrate that does not have the uneven surface, is 50% or more. Having the above configuration, the decorative film has excellent matte effect, imparts a metallic texture, and suppresses a white appearance. In the decorative film according to the second embodiment, the substrate and reflective layer are synonymous with the substrate and reflective layer in the decorative film according to the first embodiment described above, and the preferred embodiments are also the same.

[0112] [Third Embodiment] A decorative film according to one embodiment of the present invention comprises a reflective layer containing metal flakes surface-treated with a silane coupling agent, and a substrate. As a method for achieving higher reflectivity in order to impart a metallic texture, a method is known in which aluminum flakes having a predetermined major diameter and a predetermined thickness (i.e., flattened aluminum pigment) are arranged near the interface of the layer containing the aluminum flakes (see, for example, Patent Document 1 above). However, metal pigment dispersions with high reflectivity tend to be oriented, and as a result of orientation, a metal pigment cake is formed in which the metal pigment settles and solidifies, and the metal pigment cake is difficult to redisperse. Furthermore, a metal pigment dispersion that achieves high reflectivity requires a high concentration of metal pigment in the liquid, and after coating such a metal pigment dispersion onto a substrate, delamination tends to occur between the substrate and the layer formed from the metal pigment dispersion, so there is a need to improve the adhesion between the substrate and the layer formed from the metal pigment dispersion.

[0113] A decorative film according to one embodiment of the present invention, having the above configuration, provides excellent adhesion between the reflective layer and the substrate, and also imparts a metallic texture. Metal flakes surface-treated with a silane coupling agent can improve compatibility with the curable composition used to form the reflective layer. For example, the surface free energy of the metal flakes is controlled, and the wettability of the curable composition on the metal flake surface after coating is improved, allowing the metal flakes and curable composition to disperse homogeneously and facilitating the formation of the reflective layer. Alternatively, for example, if the surface of the metal flakes is treated with a silane coupling agent having functional groups close to the solvent parameters of the curable composition, the possibility of a negative change in Gibbs free energy after mixing of the metal flakes and curable composition in the reflective layer can be increased, suppressing the aggregation of the metal flakes and thus improving the adhesion between the reflective layer and the substrate. Alternatively, treating the surface of the metal flakes with a silane coupling agent having functional groups similar to the solvent parameters of the solvent is expected to contribute to improving the dispersibility of the metal flakes in the dispersion that forms the reflective layer. Alternatively, by controlling the zeta potential of the metal flake surface through surface treatment with a silane coupling agent, aggregation of the metal flakes can be suppressed, and stable dispersion of the metal flakes can be facilitated. Furthermore, for example, treating the metal flakes with a silane coupling agent having reactive groups similar to those of the polymerizable compound that forms the reflective layer (e.g., acrylic groups, methacrylic groups, epoxy groups, etc.) is expected to improve the adhesion between the reflective layer and the substrate by forming a stronger layer through chemical bonding between the metal flakes and the curable composition. Alternatively, treating the surface of the metal flakes with a silane coupling agent having functional groups that can chemically react with the functional groups of the curable composition is also expected to improve the adhesion between the reflective layer and the substrate by obtaining a layer that is strongly bonded by chemical bonds, similar to the above. A decorative film comprising a reflective layer containing metal flakes surface-treated with a silane coupling agent, and a substrate (hereinafter sometimes referred to as "a decorative film having a reflective layer treated with a silane coupling agent").The details of each component are described below.

[0114] [Decorative film with a reflective layer treated with a silane coupling agent] In a decorative film having a reflective layer treated with a silane coupling agent, the metal flakes contained in the substrate and reflective layer are the same as those in the substrate and metal flakes of the decorative film according to the first embodiment of the present invention described above, and the preferred embodiment is also the same.

[0115] <<Metal flakes surface-treated with a silane coupling agent>> The metal flakes are not particularly limited as long as they are metal flakes that have been surface-treated with a silane coupling agent. Metal flakes surface-treated with a silane coupling agent mean that the metal flakes have siloxane bonds on their surface. Metal flakes surface-treated with a silane coupling agent may be metal flakes that have been surface-treated with the silane coupling agent described later, or they may be commercially available products.

[0116] The reflective layer contains metal flakes surface-treated with a silane coupling agent, improving adhesion between the substrate and the reflective layer. Furthermore, when forming the reflective layer using the curable composition described later, the metal flake aggregates (cakes) settled in the curable composition can be redispersed in the solvent, reducing foreign matter such as metal flake aggregates (cakes) and shortening the stirring time of the curable composition. When observed with an optical microscope, these foreign matter can be seen as heterogeneous regions across the entire field of view. Reducing the proportion of foreign matter in the composition improves aesthetic appeal, insulation, and pressure sensitivity, and prevents air bubbles from being incorporated during bonding, thereby improving yield.

[0117] <<Silane Coupling Agent>> The silane coupling agent is not particularly limited as long as it is a compound having a silanol group or an alkoxysilyl group, and known silane coupling agents used as surface treatment agents for metal pigments can be used. Metal flakes surface-treated with a silane coupling agent are bonded to the metal flakes via siloxane bonds, so the surface of the metal flakes will have functional groups different from those of the metal and metal oxide.

[0118] The silane coupling agent preferably has polymerizable functional groups such as (meth)acrylic groups and epoxy groups. The presence of polymerizable functional groups in the silane coupling agent improves adhesion and scratch resistance. From the viewpoint of excellent aggregation stability, the silane coupling agent preferably has one functional silanol group and one alkoxysilyl group. The above-mentioned monofunctionality of the silanol group and alkoxysilyl group means that there is only one hydrolyzable group of the alkoxysilyl group, which is -OR (where R is an alkyl group), or only one OH group of the silanol group. When the silanol group and alkoxysilyl group have one or more functional groups, the excessive bonding of the hydrolyzable group of the alkoxysilyl group or the OH group of the silanol group to the metal flakes is suppressed, which tends to result in excellent aggregation stability.

[0119] Examples of silane coupling agents include isooctyltrimethoxysilane, N-(3-triethoxysilylpropyl)methoxyethoxyethoxyethyl carbamate (PEG3TES), N-(3-triethoxysilylpropyl)methoxyethoxyethoxyethyl carbamate (PEG2TES), 3-(methacryloyloxy)propyltrimethoxysilane, 3-acryloyloxypropyltrimethoxysilane, 3-(methacryloyloxy)propyltriethoxysilane, 3-(methacryloyloxy)propylmethyldimethoxysilane, 3-(acryloyloxypropyl)methyldimethoxysilane, 3-(methacryloyloxy)propyldimethylethoxysilane, vinyldimethylethoxysilane, phenyltrimethoxysilane, n-octyltrimethoxysilane, dodecyltrimethoxysilane, octadecyltrimethoxysilane, and Examples include polypropyltrimethoxysilane, hexyltrimethoxysilane, vinylmethyldiacetoxysilane, vinylmethyldiethoxysilane, vinyltriacetoxysilane, vinyltriethoxysilane, vinyltriisopropoxysilane, vinyltrimethoxysilane, vinyltriphenoxysilane, vinyltri-t-butoxysilane, vinyltris-isobutoxysilane, vinyltriisopropenoxysilane, vinyltris(2-methoxyethoxy)silane, styrylethyltrimethoxysilane, mercaptopropyltrimethoxysilane, 3-glycidoxypropyltrimethoxysilane, acrylic acid, methacrylic acid, oleic acid, stearic acid, dodecanoic acid, 2-(2-(2-methoxyethoxy)ethoxy)acetic acid (MEEAA), β-carboxyethyl acrylate, 2-(2-methoxyethoxy)acetic acid, methoxyphenylacetic acid, and mixtures thereof.

[0120] Examples of commercially available silane coupling agents include Silquest (Crompton South Charleston, WV), DOWSIL series (manufactured by Dow Toray Industries, Inc.), KMB series, KBE series (manufactured by Shin-Etsu Chemical Co., Ltd.), GENIOSIL series (manufactured by Asahi Kasei Wacker Silicone Co., Ltd.), and NXT Silane series (manufactured by Momentive Performance Materials Japan LLC).

[0121] The content of metal flakes surface-treated with a silane coupling agent is preferably 30 to 100% by mass, more preferably 40 to 100% by mass, and even more preferably 50 to 100% by mass, relative to the total mass of the reflective layer. The metal flakes surface-treated with a silane coupling agent may be one type alone or two or more types in combination.

[0122] [Method for forming a reflective layer] As a method for forming a reflective layer containing metal flakes surface-treated with a silane coupling agent, for example, a curable composition having metal flakes surface-treated with a silane coupling agent, a polymerizable compound, an organic solvent, and a polymerization initiator is prepared, and the curable composition is coated onto a substrate and then cured to form a reflective layer. The polymerizable compound, organic solvent, and polymerization initiator used in forming the reflective layer of a decorative film having a silane coupling agent treated reflective layer are the same as the polymerizable compound, organic solvent, and polymerization initiator used in forming the reflective layer of a decorative film according to the first embodiment of the present invention, and the preferred embodiments are also the same.

[0123] A metal pigment curable composition comprising metal flakes surface-treated with a silane coupling agent, a polymerizable compound, and an organic solvent may further contain a silane coupling agent. The presence of a silane coupling agent is preferable from the viewpoint of strengthening the bond between the metal pigment and the substrate and improving adhesion. It is also preferable from the viewpoint of improving scratch resistance.

[0124] A decorative film having a reflective layer treated with a silane coupling agent may optionally include a functional layer in addition to the reflective layer and the substrate. Furthermore, a decorative film having a reflective layer treated with a silane coupling agent may optionally include other transparent supports besides the substrate. The functional layer and other transparent supports are synonymous with the functional layer in the decorative film according to the first embodiment of the present invention, and the preferred embodiments are similar.

[0125] <<Applications of the Decorative Film>> The decorative film of the present invention is useful, for example, as a decorative film for sensors, as it can achieve an appearance equivalent to that of various metal housings (frames). As a decorative film for sensors, it can be applied to touchpads, pressure sensors, electrostatic sensors, fingerprint authentication systems, etc. of smartphones, tablet terminals, wearable devices, and PCs.

[0126] The present invention will be described below with reference to examples, but the present invention is not limited in any way by these examples. Unless otherwise specified, "parts" and "%" mean "parts by mass" and "mass%".

[0127] <<Method for Forming a Substrate with Uneven Surfaces>> The following method was used to form the uneven surfaces of the substrates used in the examples and comparative examples described later. <Imprint Formation 1> A UV-curable composition 1 (manufactured by Sanyo Chemical Industries, Ltd., product name: FineCular RM-64) was applied to the substrates listed in Table 6 by spin coating to a thickness of 5 μm. A release agent (manufactured by Daikin Industries, Ltd., product name: Optool DSX) was applied to the uneven surface of a nickel mold having an uneven surface, and dried at room temperature (25°C) for 1 hour. Using a nanoimprint forming apparatus (manufactured by SCIVAX Corporation, model number: FLAN200-TCU100), the surface of the substrate coated with UV-curable composition 1 was pressed onto the uneven surface of the mold coated with the release agent, transferring the uneven shape of the mold while applying ultraviolet light at a metal halide lamp irradiance of 270 mW / cm². ２ and integrated light intensity of 500 mJ / cm ２ A substrate with an uneven surface was fabricated by irradiating it under these conditions.

[0128] <Sandblasting 1> Using a sandblasting machine (Shinto Kogyo Co., Ltd., model number: MY-30), an abrasive (Fuji Co., Ltd., product name: Alumina particle Fujirandom WA) was sprayed onto the substrates listed in Table 6, and the spraying pressure was changed according to the type of transparent support to create substrates with uneven surfaces.

[0129] <Transfer 1> Using a sandblasting machine (manufactured by Shinto Kogyo Co., Ltd., model number: MY-30), an abrasive (manufactured by Fuji Co., Ltd., product name: Alumina Particle Fujirandom WA) was sprayed onto a stainless steel plate (SUS304) to obtain a stainless steel plate A with an uneven surface. Separately, 25 parts by mass of thermoplastic resin (manufactured by JSR ARTON Manufacturing Co., Ltd., product name: ARTON G7810) and 0.5 parts by mass of ultraviolet absorber (manufactured by BASF Co., Ltd., product name: TINUVIN460) were dissolved in 80 parts by mass of methylene chloride (manufactured by Tokyo Chemical Industry Co., Ltd.) to prepare a resin solution. The obtained resin solution was applied to the uneven surface of the stainless steel plate A prepared above to form a resin layer. This stainless steel plate A was dried at room temperature for 4 hours in a sealed state, then further dried in an oven at 70°C to 150°C, and the resin layer was peeled off the stainless steel plate to obtain a substrate with an uneven surface.

[0130] <Coating 1> A curable resin composition A was prepared by mixing 5 parts by mass of (octahydro-4,7-methano-1H-indendiyl)bis(methylene) diacrylate (manufactured by Shin-Nakamura Chemical Industry Co., Ltd.), 0.3 parts by mass of Omnirad 184 (manufactured by IGM RESINS BV), 20 parts by mass of methyl ethyl ketone (manufactured by Tokyo Chemical Industry Co., Ltd.), and 5 parts by mass of crosslinkable particles (manufactured by Nippon Shokubai Co., Ltd., product name: Epostor M0). Next, the curable resin composition A was applied to the substrates listed in Table 6 using a bar coater to a coating thickness of 16 μm. After drying the substrates coated with curable resin composition A in an oven at 70°C for 5 minutes, the curing was performed using a UV conveyor (I-Graphics Co., Ltd. I-UV curing device, model US2-X040 560 Hz) with a metal halide lamp irradiance of 270 mW / cm². ２ and integrated light intensity of 500 mJ / cm ２ A substrate with uneven surfaces was prepared by curing the curable resin composition A under the specified conditions.

[0131] <Coating 2> A curable resin composition B was prepared in the same manner as in Coating 1, except that 3 parts by mass of dicyclopentanyl methacrylate (manufactured by Showa Denko Materials K.K.) and 2 parts by mass of pentaerythritol tetraacrylate (manufactured by Shin Nakamura Chemical Industry Co., Ltd.) were used instead of (octahydro-4,7-methano-1H-indendiyl)bis(methylene) diacrylate, and crosslinkable particles (manufactured by Nippon Shokubai Co., Ltd., model number: Epostor L15) were used instead of crosslinkable particles (manufactured by Nippon Shokubai Co., Ltd., Epostor M0). A substrate with uneven surfaces was prepared by coating and curing the mixture on a transparent support using the same procedure as in Coating 1, except that curable resin composition B was used.

[0132] <<Method for Forming the Reflective Layer>> <Metal Film Deposition Film 1> The substrate was placed in the substrate placement section of an ion-assisted deposition apparatus (model number: Sapio 1300i, manufactured by Showa Vacuum Co., Ltd.) with the uneven surface facing downwards, and fixed in a position where the uneven surface was in contact with the deposition material. After sealing the chamber, a vacuum was created and the substrate was heated to 90°C. Then, crushed aluminum foil (manufactured by Toyo Aluminum Co., Ltd.) was placed in a crucible as the deposition material and heated to form a 300 nm thick metal film (metal film deposition film 1) on the uneven surface of the substrate.

[0133] <Dielectric Multilayer Film 1> The substrate was fixed in the substrate placement section of an ion-assisted deposition apparatus (model: Sapio 1300i, manufactured by Showa Vacuum Co., Ltd.) with the uneven surface facing downwards, so that the uneven surface was in contact with the deposition material. After sealing the chamber, a vacuum was created and the substrate was heated to 90°C. Then, while irradiating with oxygen ions or oxygen ions and argon ions, TiO was deposited onto the uneven surface of the substrate. ２ (Manufactured by Canon Optron Corporation, product name: OS-50) and SiO ２ (Manufactured by Canon Optron Corporation, SiO ２ A dielectric multilayer film 1 was formed on the uneven surface of the substrate by alternately depositing these materials. The thickness of the dielectric multilayer film 1 is shown in Table 1. In Table 1, "uneven surface" refers to the uneven surface of the substrate.

[0134]

[0135] <<Preparation of Metal Flake-Containing Curable Composition>> <Curable Composition 1> 1 part by mass of polymerizable compound 1 listed in Table 2 below, 1.5 parts by mass of aluminum pigment 1 listed in Table 3 below as metal flakes, 0.3 parts by mass of polymerization initiator (product name: Omnirad 184, manufactured by IGM RESINS BV), 2.5 parts by mass of butyl carbitol as an organic solvent, and 0.01 parts by mass of additive 1 listed in Table 4 below were weighed into a container. After sealing the container, the mixture was stirred for 5 hours at room temperature and 80 rpm using a mix rotor to prepare curable composition 1 with the composition listed in Table 5 below. The obtained curable composition 1 was stirred again immediately before use in forming the reflective layer in the examples or comparative examples described later.

[0136] <Curable Compositions 2-23> Curable compositions 2-23 were prepared in the same procedure as curable composition 1, except that the polymerizable compound, metal flakes, polymerization initiator, organic solvent, and additives in curable composition 1 were changed to the polymerizable compound, metal flakes, polymerization initiator, organic solvent, and additives listed in Tables 2-5 below, in terms of type and amount. The obtained curable compositions 2-23 were stirred again immediately before use in forming the reflective layer in the examples or comparative examples described later.

[0137]

[0138]

[0139]

[0140]

[0141] Details of raw materials not described above are as follows: <<Polymerization Initiator>> ・CPI-100P: Photopolymerization initiator, manufactured by Sunapro Co., Ltd. <<Solvent>> ・PGMEA: Propylene glycol monomethyl ether acetate ・PGME: Propylene glycol monomethyl ether

[0142] The physical properties of the substrates and other materials prepared in the examples and comparative examples described later were measured according to the following method.

[0143] <Arithmetic surface height Sa and maximum height Sz of uneven surface> With the uneven surface facing upwards, an image was captured using a laser microscope (Keyence Corporation, model number: VHX-200) in laser light source mode with a 10x objective lens. After tilt correction was performed on the resulting plane, the arithmetic surface height Sa and maximum height Sz were calculated.

[0144] <Transmittance of Substrates with Uneven Surfaces> The substrate was placed with the uneven surface facing downwards, and the total light transmittance (Tt) from wavelengths of 380 nm to 750 nm was measured using a spectroscopic haze meter (HSP-150VIR, manufactured by Murakami Color Technology Laboratory Co., Ltd.). The maximum value of the total light transmittance was defined as the maximum transmittance (%).

[0145] <Haze> The haze of the prepared substrate was measured in accordance with JIS K 7136:2000 using a haze meter (manufactured by Toyo Seiki Seisakusho Co., Ltd., product name: Haze Guard II).

[0146] <Thickness> The thickness of the substrate was measured at five points on a 3cm x 3cm substrate sample surface using a digital dial gauge (Mitutoyo Corporation, ID-C1012), and the arithmetic mean of the obtained values ​​was used.

[0147] <Visual comparison evaluation with metal frames having uneven surfaces> [R of decorative film in the examples and comparative examples] ５０（９０） / R ８０（９０） [Measurement] Metal frames with surface irregularities diffuse light due to the surface irregularities, resulting in a higher diffuse reflectance compared to metal frames without surface irregularities. In the measurement sample of the fabricated decorative film, the average value R of the reflectance at wavelengths of 380 to 750 nm was measured when light was incident from the opposite side of the substrate's reflective layer, at a 90° angle (i.e., perpendicular) from the surface of the substrate that does not have a reflective layer, and then exited at a 10° angle from the perpendicular direction. ８０（９０） The values ​​were measured using a spectrophotometer (manufactured by JASCO Corporation, model numbers V-7300 and VAR-7030). The angle of "10° from the vertical" means the angle at which the vertical is 10° from the vertical, with the vertical direction being 0° and the direction horizontal to the surface of the substrate being 90°. The average value R of wavelengths 380-750 nm emitted at an angle of 10° from the vertical.８０（９０） " is the ratio of the amount of light emitted (i.e., reflected light) measured at the 80° position to the amount of light incident (i.e., incident light) from the 90° position, when the direction perpendicular to the surface 21 without the reflective layer of the base material is 90° and the direction horizontal to the surface 21 is 0°. Similarly, in the measurement sample of the decorative film, the average value R of the reflectance of wavelengths from 380 to 750 nm that enters from the side opposite to the reflective layer of the base material, enters at an angle of 90° (i.e., the vertical direction) from the surface without the reflective layer of the base material, and then exits at an angle of 40° from the vertical direction ５０（９０） was measured. The angle of "40° from the vertical direction" means the angle at the 40° position from the vertical direction when the vertical direction is 0° and the direction horizontal to the surface of the base material is 90°. "The average value R of wavelengths from 380 to 750 nm that exits at an angle of 40° from the vertical direction ５０（９０） " is the ratio of the amount of light emitted (i.e., reflected light) measured at the 50° position to the amount of light incident (i.e., incident light) from the 90° position, when the direction perpendicular to the surface 21 without the reflective layer of the base material is 90° and the direction horizontal to the surface 21 is 0°.

[0148] [Measurement of R ５０（９０） / R ８０（９０） of the metal frame] A housing having an aluminum frame with irregularities having a surface Sa of 0.6 μm and the outermost surface being anodized was prepared as a comparative sample. In this housing, the reflectance R ８０（９０） when light with wavelengths from 380 to 750 nm that enters from the irregular surface and enters at an angle of 90° with respect to the irregular surface exits at an angle of 80°, and the reflectance when exiting at an angle of 50° is R ５０（９０） When R ５０（９０） / R ８０（９０） was measured using a spectrophotometer (manufactured by JASCO Corporation, model numbers: V - 7300 and VAR - 7030), it was 0.06. Also, a housing of a stainless steel frame with irregularities having a surface Sa of 32 μm prepared separately. In this housing, the reflectance R of light with wavelengths from 380 to 750 nm that enters from the irregular surface and enters at an angle of 90° with respect to the irregular surface and exits at an angle of 80°８０（９０） and the reflectance when emitted at an angle of 50° is R ５０（９０） of R when ５０（９０） / R ８０（９０） was measured using a spectrophotometer (manufactured by Hitachi High-Technologies Corporation, model number: U4100), and it was 0.7. R ５０（９０） / R ８０（９０） is in the range of 0.06 to 0.7, and since the appearance with a metal frame having irregularities on the surface is realized, it can be determined that a metallic texture is imparted. Also, R ５０（９０） / R ８０（９０） For a decorative film with a value of less than 0.06, when observing the decorative film obliquely, the appearance is dark and it can be determined that there is a deviation from the appearance of the metal frame (that is, a metallic texture is not imparted).

[0149] Therefore, in the decorative films produced in the examples and comparative examples, those with R ５０（９０） / R ８０（９０） being 0.15 or more and 0.6 or less were designated as "AA", those with 0.06 or more and less than 0.15, or more than 0.6 and 0.7 or less were designated as "A", and those less than 0.06 and more than 0.7 were designated as "B". When the evaluation result is "AA" or "A", it can be determined that the decorative film has a metallic texture imparted.

[0150] <Whiteness> A substrate having a surface with high whiteness has a strong scattering effect and a tendency for the ratio of regular reflection to be low with respect to the total light reflectance. Using a spectrophotometer (manufactured by Hitachi High-Technologies Corporation, model number: U4100), for the decorative films produced in the examples or comparative examples, the average value RA of the total light reflectance of light with wavelengths from 380 to 750 nm that is incident from the side opposite to the surface having irregularities of the substrate and at an angle of 80° with respect to the surface not having the irregular surface of the substrate was measured to numerically represent the whiteness. Also, using a spectrophotometer (manufactured by JASCO Corporation, model numbers: V-7300 and VAR-7030), for the decorative films produced in the examples or comparative examples, after being incident at an angle of 50° from the horizontal direction with respect to the surface not having the irregular surface of the substrate, the average value R of the reflectance of light with wavelengths from 380 to 750 nm that is reflected at an angle of 130° from the horizontal direction with respect to the surface not having the irregular surface of the substrate１３０（５０） The average value of the reflectance R was measured. １３０（５０） This refers to the ratio of the amount of emitted light (i.e., reflected light) measured at a position 130° from the horizontal to the amount of incident light (i.e., reflected light) measured at a position 50° from the horizontal, when the horizontal direction is defined as 0° for a surface of the substrate that does not have an uneven surface. Furthermore, it refers to the average value R of the reflectance of the decorative film prepared in the example or comparative example, with wavelengths of 380-750 nm, after light is incident at a 50° angle from the horizontal and reflected at a 90° angle from the horizontal. ９０（５０） The following measurements were taken. Those with a high whiteness have a low proportion of specular reflection, and R ９０（５０） / R １３０（５０） The R tends to be high. Therefore, in the prepared sample, the R measured from the surface of the substrate with irregularities was ９０（５０） / R １３０（５０） The evaluation was conducted with a score of 0.85 or less designated as "A" and a score exceeding 0.85 designated as "B". If the evaluation result is "A", it can be determined that the whiteness of the surface of the substrate in the decorative film is suppressed.

[0151] <Specular Surface Appearance> Substrates with a mirror-like surface (specular surface appearance) tend to have a high proportion of specular reflection relative to the total light reflectance. Using a spectrophotometer (Hitachi High-Tech Corporation, model number: U4100), the average value RA of the total light reflectance of light with wavelengths of 380 to 750 nm was measured when light was incident on the substrate from the side opposite to the surface with irregularities and incident at an angle of 80° to the surface without irregularities. The specular surface appearance was then quantified and evaluated. In addition, using spectrophotometers (JASCO Corporation, model numbers: V-7300 and VAR-7030), the average value R of the reflectance of light with wavelengths of 380 to 750 nm, incident on the substrate from the side opposite to the surface with irregularities and incident at an angle of 50° to the surface without irregularities, and emitted at a 130° angle was measured for the decorative films prepared in the examples and comparative examples. １３０（５０）The following was measured. In addition, for the decorative films prepared in the examples and comparative examples, the average value R of the reflectance of light with a wavelength of 380 to 750 nm emitted at a 90° angle from light incident on the substrate from the side opposite to the surface having the uneven surface, and incident on the surface of the substrate without the uneven surface at a 50° angle, was measured. ９０（５０） The following was measured. Decorative films that show a mirror-like appearance (mirror-like feel) have a high proportion of specular reflection, R ９０（５０） / R １３０（５０） R tends to be low. ９０（５０） / R １３０（５０） A score of 0.1 or higher was designated as "AA," a score of 0.03 or higher but less than 0.1 was designated as "A," and a score of less than 0.03 was designated as "B." If the evaluation result is "AA" or "A," it can be determined that the mirror-like appearance of the substrate surface in the decorative film is suppressed.

[0152] <Cut Resistance> For the evaluation of cut resistance, except that a load of 150g was used instead of 750g, the pencil hardness was measured by pressing a pencil of known hardness against the reflective layer and the functional layer provided on the reflective layer of the decorative films prepared in the examples and comparative examples, in accordance with JIS K5600. The pencil hardness was judged visually, and the hardness of the pencil that did not show scratches, plastic deformation, or cohesive failure on the surface of the reflective layer or functional layer was defined as the pencil hardness. A hardness of 6B or higher was designated as "A", and a hardness of less than 6B was designated as "B". If the evaluation result for cut resistance is "A", the decorative film can be judged to have superior cut resistance. If the evaluation result is "B", the cut resistance can be judged to be at a level that is not problematic for practical use.

[0153] <Warpage> To evaluate warpage, the decorative films prepared in the examples and comparative examples were sandwiched between 5 mm thick SUS plates and left at room temperature for 72 hours. After that, the decorative films were cut to 100 mm x 100 mm to be used as measurement samples. The measurement samples were then placed on a smooth surface, and the extent to which the edges of the measurement samples were deflected vertically from the surface was measured and evaluated. A deflection of 5 mm or more was designated as "B," and a deflection of 5 mm or less was designated as "A." If the evaluation result is "A," it can be concluded that the decorative film has excellent shape stability. If the evaluation result is "B," it can be concluded that the shape stability is at a level that does not pose a practical problem.

[0154] <Insulation> A surface resistance terminal (URS, manufactured by Nitto Seikou Analytech Co., Ltd.) was connected to a conductivity evaluation device (Highrestor-UP MCP-HT450, manufactured by Nitto Seikou Analytech Co., Ltd.). The resistance of the reflective layer (i.e., the surface coated with the curable resin composition) of the decorative films prepared in the examples and comparative examples was measured. Surface resistances of 10^4 Ω□ or more and less than 10^12 Ω□ were classified as "B", and surface resistances of 10^12 Ω□ or more were classified as "A". If the evaluation result is "A", it can be determined that the reflective layer has excellent insulation properties. If the evaluation result is "B", it can be determined that the insulation properties are at a level that does not pose a practical problem. For decorative films having a functional layer on the reflective layer (i.e., the surface coated with the curable resin composition), the surface resistance of the functional layer was measured and evaluated.

[0155] [Example 1] A 0.4 mm thick glass plate (manufactured by CORNING INC., product name: EAGLE XG) was coated on one side with a textured surface A using the method described in Coating 1 above. The transmittance, haze, Sa and Sz of the textured surface were measured on the obtained substrate according to the measurement method described above. The haze of the substrate with the textured surface was 49%. The obtained textured surface had a Sa of 7 μm and an Sz of 173 μm. The curable composition 1 was coated onto the textured surface A of the substrate using a bar coater to a thickness of 32 μm, and then dried in an oven at 90°C for 10 minutes. Using a UV conveyor (I-Graphics I-UV curing device, model: US2-X040 560 Hz), under a nitrogen atmosphere, the metal halide lamp irradiance was 270 mW / cm². ２ and integrated light intensity of 500 mJ / cm ２ Under these conditions, the coated surface was UV irradiated (from the direction of the surface A). Subsequently, the surface of the substrate not coated with curable composition 1 was irradiated (from the back surface A) under a nitrogen atmosphere with a metal halide lamp at an irradiance of 270 mW / cm². ２ and integrated light intensity of 500 mJ / cm ２ A decorative film was prepared by curing the curable composition 1 by UV irradiation under the conditions described above. When the obtained decorative film was subjected to the above-mentioned <evaluation of the appearance of a metal frame with surface irregularities>, R ５０（９０） / R ８０（９０） The value was 0.26. Also, in the evaluation of <whiteness>, R ９０（５０） / R １３０（５０） The value was 0.07, and the <cut resistance> was B and the <insulation> was B. The obtained evaluation results are shown in Table 7.

[0156] [Examples 2-3, 6-11, 13 and 15-25] Except for changing the type of substrate, the method of forming surface A, and the type of curable composition used to form the reflective layer in Example 1 to those listed in Table 6, substrates were prepared and decorative films were made using these substrates according to the same procedure as in Example 1. The "Method of forming surface A" column for Examples 7-11 and 20-24 in Table 6 is marked with "-". This means that in Examples 7-11 and 20-24, surface A was not formed because substrates with surface irregularities were used. Various physical properties of the prepared substrates and evaluation results of the obtained decorative films are shown in Table 7.

[0157] [Example 4] A substrate having an uneven surface was prepared according to the same procedure as in Example 1, except that the type of substrate and the method of forming the uneven surface A were changed to those described in Table 6. The curable composition 4 described in Table 5 was coated onto the uneven surface A of the substrate using a bar coater to a film thickness of 32 μm, and then dried in an oven at 90°C for 10 minutes. After that, a UV conveyor (I-Graphics, I-UV curing device, model US2-X040 560 Hz) was used under a nitrogen atmosphere and a metal halide lamp irradiance of 270 mW / cm². ２ and integrated light intensity of 500 mJ / cm ２ Under these conditions, UV irradiation was performed on the surface A of the substrate, and then the uncoated surface (back surface A) of the curable composition 4 was subjected to a nitrogen atmosphere and a metal halide lamp irradiated at 270 mW / cm². ２ and integrated light intensity of 500 mJ / cm ２ UV irradiation was performed under the specified conditions. Afterward, the material was dried at 150°C for 1 hour to produce a decorative film. The obtained decorative film was evaluated in the same manner as in Example 1. The evaluation results are shown in Table 7.

[0158] [Example 5] The type of substrate and the method of forming the uneven surface A were changed from those in Example 1 to those described in Table 6. A substrate having an uneven surface was then prepared following the same procedure as in Example 1. Various physical properties of the obtained substrate were measured in the same manner as in Example 1. The curable composition 5 described in Table 5 was coated onto the uneven surface A of the obtained substrate using a bar coater to a film thickness of 32 μm, and then dried in an oven at 90°C for 10 minutes. After that, it was dried at 150°C for 1 hour to form a layer (reflective layer) made of the curable composition 5 on the uneven surface of the substrate. The evaluation results of the obtained film are shown in Table 7.

[0159] <Preparation of Functional Layer 2> Functional resin composition B was prepared by mixing 240 parts by mass of pigment dispersion (manufactured by Tokushiki Co., Ltd., product name: IRBK-0006), 50 parts by mass of polymerizable compound (manufactured by Kyoeisha Chemical Co., Ltd., product name: Light Acrylate DCP-A), 0.3 parts by mass of surfactant (manufactured by Shin-Etsu Chemical Co., Ltd., product name: KP-624), 1.5 parts by mass of polymerization initiator (manufactured by BASF Corporation), 50 parts by mass of silica dispersion (manufactured by Nissan Chemical Industries, Ltd., product name: MEK-AUP-2140Z), and 200 parts by mass of solvent (manufactured by Tokyo Chemical Industry Co., Ltd., propylene glycol monomethyl ether).

[0160] <Preparation of Decorative Film with Functional Layer> Functional resin composition B was applied to the uneven surface of the substrate prepared above using a bar coater (coating thickness 16 μm) on top of a layer (reflective layer) made of curable composition 5. After drying in an oven at 70°C for 5 minutes, the film was cured using a UV conveyor (I-Graphics, I-UV curing device, model: US2-X040 560 Hz) with a metal halide lamp illuminance of 270 mW / cm². ２ and integrated light intensity of 500 mJ / cm ２ A decorative film was prepared by curing a surface coated with functional resin composition B under the specified conditions by UV irradiation, thereby providing a functional layer 2 with stray light suppression capabilities. The obtained decorative film was evaluated in the same manner as in Example 1. The results are shown in Table 7.

[0161] [Example 12] Except for changing the type of substrate and the method of forming the uneven surface A in Example 1 to the type of substrate and the method of forming the uneven surface A described in Table 6, a substrate having an uneven surface was prepared according to the same procedure as in Example 1. Various physical properties of the obtained substrate were measured in the same manner as in Example 1. The curable composition 12 described in Table 5 was coated onto the uneven surface A of the obtained substrate using a bar coater to a film thickness of 32 μm, and then dried in an oven at 90°C for 10 minutes. After that, it was dried at 150°C for 1 hour. The evaluation results of the obtained film are shown in Table 7.

[0162] [Example 14] Using the substrates described in Table 6, a substrate with uneven surfaces was prepared by the method described in "Sandblasting 1" above. Next, according to the method described in "Coating 1" above, curable resin composition A was applied to the uneven surface of the prepared substrate, and then cured to produce a substrate with uneven surfaces. Various physical properties of the obtained substrate were measured in the same manner as in Example 1. Furthermore, a decorative film was prepared by following the same procedure as in Example 1, except that the substrate prepared above was used and the type of curable composition used to form the reflective layer was changed to that described in Table 6. Various physical properties of the prepared substrate and the evaluation results of the obtained decorative film are shown in Table 7.

[0163] [Comparative Examples 1-3] Decorative films were prepared according to the same procedure as in Example 1, except that the type of substrate and the type of curable composition used to form the reflective layer were changed to those listed in Table 6. The evaluation results of the obtained films are shown in Table 7.

[0164]

[0165]

[0166] [Example 101] 100 parts by mass of aluminum pigment (manufactured by Toyo Aluminum Co., Ltd., product name: EMR-D4690), 20 parts by mass of silane coupling agent (manufactured by Shin-Etsu Chemical Co., Ltd., product name: KBM-303), 20 parts by mass each of polymerizable compound 2 and polymerizable compound 10, 1 part by mass of polymerization initiator (manufactured by IGM RESINS BV, product name: OMNIRAD184), 240 parts by mass of solvent (manufactured by Tokyo Chemical Industry Co., Ltd., propylene glycol monomethyl ether (PGME)), and 1 part by mass of water were mixed, and then stirred for 1 hour using a stirrer (manufactured by AS ONE Corporation, model number: AUTOMATIC LAB-MIXER HM-10H) to prepare a curable composition. The redispersibility of the obtained curable composition was evaluated as described later. The obtained curable composition was stirred for 10 minutes using a stirrer (AS ONE Corporation, model: AUTOMATIC LAB-MIXER HM-10H), and then applied to a substrate (Toyobo Co., Ltd., product name: Cosmo Shine In A4160) to a thickness of 20 μm using an applicator. After application, it was dried in an 80°C oven for 3 minutes. Subsequently, curing was performed using a UV conveyor (I-Graphics, I-UV curing device, model US2-X040 560 Hz) with a metal halide lamp irradiance of 270 mW / cm². ２ and integrated light intensity of 500 mJ / cm ２ A decorative film was prepared by UV irradiation from both sides of the substrate under the specified conditions, resulting in a reflective layer containing aluminum pigment surface-treated with a silane coupling agent being formed on the substrate. The obtained decorative film was evaluated as follows. The results of the reflectance and adhesion evaluations are shown in Table 8.

[0167] -Evaluation- <Reflectance> The reflectance was measured using a spectrophotometer (Hitachi High-Tech Corporation, model number: U-4100). An alumina reflector was used as the baseline, and the resulting decorative film was fixed to the surface through which the light source irradiated and emitted using a reflectance measurement jig. The slit width was set to 1 nm, and data was acquired at 1 nm intervals to measure the total reflectance of unpolarized light from the side of the substrate that does not have a reflective layer. Based on the obtained total reflectance data, the maximum value from wavelengths of 380 nm to 750 nm was defined as the reflectance (%). If the total reflectance is 30% or higher, it is considered to have high reflectance, and it can be determined that the resulting decorative film can impart a metallic texture.

[0168] <Adhesion Evaluation> The obtained decorative film was subjected to a cross-cut test as described in JIS K5600-5-6:1999 "General Test Methods for Paints". The measurement samples after the cross-cut test were evaluated according to the test result classifications 0 to 5 as described in JIS K5600-5-6:1999. Samples with a test result classification of 0 or 1 were designated as "A", samples with a test result classification of 2 or 3 were designated as "B", and samples with a test result classification of 4 or 5 were designated as "C". If the test result is A or B, it can be determined that the adhesion between the substrate and the reflective layer is excellent.

[0169] <Redispersibility> 2 mL of the curable composition was placed in a 5 mL glass bottle (manufactured by Nichiden Rika Glass Co., Ltd.) and left to stand at room temperature for one week to allow the aluminum pigment contained in the curable composition to settle. This glass bottle was stirred with a stirrer (manufactured by AS ONE Corporation, model number: AUTOMATIC LAB-MIXER HM-10H) at maximum stirring intensity to redisperse the aluminum pigment. When the curable composition was visually observed from the bottom of the glass bottle after 120 seconds of redispersion, those in which no decrease in the aluminum pigment precipitate cake was observed were classified as "A", and those in which a decrease in the aluminum pigment precipitate cake was observed were classified as "B". If the evaluation result is A, it can be judged that the curable composition has excellent redispersibility.

[0170] <Agglomeration Stability> After allowing the curable composition to stand at room temperature for one week, it was stirred for 10 minutes using a stirrer (AS ONE Corporation, AUTOMATIC LAB-MIXER HM-10H) and then applied to a substrate (Toyobo Co., Ltd., product name: Cosmo Shine In A4160) to a thickness of 20 μm using an applicator. After application, it was dried in an 80°C oven for 3 minutes. Subsequently, it was cured using a UV conveyor (I-Graphics, I-UV curing device, model US2-X040 560 Hz) with a metal halide lamp irradiance of 270 mW / cm². ２ and integrated light intensity of 500 mJ / cm ２ Measurement samples were prepared by UV irradiation under the specified conditions. The surface of the obtained measurement films was visually observed, and samples with 20 or more foreign particles of 0.1 mm or larger per A4 size were classified as "C", samples with 5 or more but less than 20 foreign particles as "B", and samples with 5 or fewer foreign particles as "A". If the evaluation result is A, it can be determined that the curable composition has excellent aggregation stability.

[0171] [Examples 102-111] Decorative films were prepared in the same procedure as in Example 101, except that the types of aluminum pigment and silane coupling agent were changed to the raw materials listed in the table. The reflectivity and adhesion of the obtained decorative films were evaluated. The results of this evaluation are shown in Table 8 or 9. In addition, the redispersibility and aggregation stability of each curable composition were evaluated separately. The results are shown in Table 8 or 9.

[0172] [Comparative Example 101] A decorative film was prepared in the same procedure as in Example 1, except that the aluminum pigment in Example 1 was replaced with the raw material listed in the table and the silane coupling agent was not used. The reflectance and adhesion of the obtained films were evaluated. The results of this evaluation are shown in Table 10. In addition, the redispersibility and aggregation stability of each curable composition were evaluated separately. The results are shown in Table 10.

[0173]

[0174]

[0175]

[0176] Of the raw materials listed in the table above, the details of the raw materials not described above are as follows: <<Silane coupling agent>> ・KBM-402: A compound having the following structure.

[0177]

[0178] KMB-403: A compound having the following structure.

[0179]

[0180] KBM-502: A compound having the following structure.

[0181]

[0182] KMB-1003: A compound having the following structure.

[0183]

[0184] KMB-5103: A compound having the following structure.

[0185]

[0186] KMB-903: A compound having the following structure.

[0187]

[0188] KMB-9659 HASSY: A compound having the following structure.

[0189]

[0190] KMB-802: A compound having the following structure.

[0191]

[0192] KMB-9007n: A compound having the following structure.

[0193]

[0194] KMB-573: A compound having the following structure.

[0195]

[0196] <<Aluminum Pigments>> ・EMR-D410 (Manufactured by Toyo Aluminum Co., Ltd., aluminum pigment, thickness 0.1 μm) ・FD5090 (Manufactured by Asahi Kasei Chemicals, aluminum pigment, thickness 0.11 μm) ・EMR-D710 (Manufactured by Toyo Aluminum Co., Ltd., aluminum pigment, thickness 0.045 μm)

[0197] <<Polymerization Initiator>> ・OMNIRAD184 (Photopolymerization Initiator, manufactured by IGM RESINS BV)

[0198] The decorative film according to the present invention has excellent matte finish, imparts a metallic texture, and reduces whiteness, making it suitable for use in trackpads, pressure sensors, electrostatic sensors, fingerprint authentication systems, and the like in smartphones, tablet devices, wearable devices, and PCs.

[0199] 1: Decorative film 21: Front surface 22: Back surface 31: Reflective layer 41: Substrate

Claims

1. A decorative film having a substrate and a reflective layer, wherein the decorative film satisfies the following requirements (1) and (2): (1) The reflectance of light with a wavelength of 380 to 750 nm that is incident on the substrate from the side opposite to the reflective layer and incident on the surface of the substrate that does not have a reflective layer at an angle of 90°, and which is emitted at an angle of 80° is R ８０（９０） The reflectance of light emitted at a 50° angle is R ５０（９０） When R ５０（９０） / R ８０（９０） (2) The reflectance of light with a wavelength of 380 to 750 nm that is incident from the opposite side of the reflective layer of the substrate and incident at an angle of 50° to a surface of the substrate that does not have a reflective layer, and exits at an angle of 130° is R １３０（５０） The reflectance of light emitted at a 90° angle is R. ９０（５０） When R ９０（５０） / R １３０（５０） The range is 0.03 to 0.

85.

2. The R ５０（９０） / R ８０（９０） is 0.10 to 0.65, and the R ９０（５０） / R １３０（５０） is 0.04 to 0.

60. The decorative film according to claim 1.

3. The decorative film according to claim 1, wherein the surface of the substrate having the reflective layer has an uneven surface.

4. The decorative film according to claim 3, wherein the average value of the total light reflectance of light with a wavelength of 380 to 750 nm, when incident on the substrate from the side opposite to the surface having the uneven surface and incident at an angle of 80° to the surface of the substrate that does not have the uneven surface, is 50% or more.

5. The decorative film according to claim 1, wherein the reflective layer contains metal flakes, and the shape of the metal flakes is coin-shaped.

6. The decorative film according to claim 1, wherein the reflective layer is a layer made of a curable composition containing an epoxy group or a compound containing a (meth)acryloyl group.

7. A decorative film comprising a substrate having an uneven surface with an arithmetic mean height Sa of 0.6 to 25 μm, and a reflective layer disposed on the uneven surface, wherein the average value of the total light reflectance of light with wavelengths of 380 to 750 nm, incident from the surface of the substrate opposite to the uneven surface and incident at an angle of 80° to the surface of the substrate that does not have the uneven surface, is 50% or more.

8. The decorative film according to claim 7, wherein the reflective layer is insulating.

9. The decorative film according to claim 7, wherein the reflective layer contains metal flakes.

10. The decorative film according to claim 9, wherein the metal flakes are aluminum pigment.

11. The decorative film according to claim 10, wherein the aluminum pigment has a diameter of 0.5 to 35 μm and a thickness of 0.055 to 1.0 μm.

12. The decorative film according to claim 9, wherein the surface of the metal flakes is coated with an insulator.

13. The decorative film according to claim 12, wherein the insulator is silica or resin.

14. The decorative film according to claim 10, wherein the surface of the aluminum pigment is coated with an insulator.

15. The decorative film according to claim 14, wherein the insulator is silica or resin.

16. The decorative film according to any one of claims 3 to 15, wherein the substrate having irregularities has a maximum transmittance of 80% or more at a wavelength of 380 to 750 nm.

17. An electronic component comprising a support and a decorative film according to any one of claims 1 to 15.

18. A touchpad having a decorative film according to any one of claims 1 to 15.

19. A decorative film comprising a reflective layer containing metal flakes surface-treated with a silane coupling agent, and a substrate.

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