Cleaning system and cleaning base station

Abstract

A cleaning system and a cleaning base station. The cleaning system comprises a cleaning robot and a cleaning base station. The cleaning robot comprises a cleaning element (3) for cleaning an operating surface. The cleaning base station comprises a base (1) for supporting the cleaning robot, wherein a cleaning tank (2) for accommodating the cleaning element (3) is articulated on the base (1). The cleaning tank (2) is configured to be movable between a first position and a second position relative to the base (1). At the first position, the cleaning tank (2) is configured to rotate to hold liquid, the liquid level of which is configured to be higher than the bottom of the cleaning element (3); and at the second position, the cleaning tank (2) is configured to turn over to enable the liquid to flow out therefrom. By providing the cleaning tank (2) for holding liquid, the cleaning element (3) can be fully soaked in the cleaning tank (2), thereby improving the cleaning effect on the cleaning element (3). In addition, there is no need to additionally provide a drainage power module, thereby reducing product costs.

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