Liquid discharge apparatus, determination method, information processing apparatus, storage medium, program product, substrate processing apparatus, and article manufacturing method

Abstract

The present application provides a technique for facilitating determination of a cause of an abnormality in a liquid discharge apparatus. The liquid discharge apparatus has: a discharge head that discharges liquid from a plurality of nozzles; a plurality of piezoelectric elements respectively arranged at the plurality of nozzles; a detection unit that respectively detects, for the plurality of piezoelectric elements, a residual vibration signal corresponding to a deformation of the piezoelectric element due to a pressure wave accompanying operation of the piezoelectric element; and a processing unit that processes the residual vibration signals respectively detected for the plurality of piezoelectric elements. The processing unit performs: a creation step of creating a feature quantity map representing a distribution of a feature quantity of the residual vibration signals in the plurality of nozzles; and a determination step of determining an abnormality based on the feature quantity map.

Description

Technical Field

[0001] This disclosure relates to liquid discharge devices, determination methods, information processing devices, storage media, program products, substrate processing devices, and article manufacturing methods. Background Technology

[0002] In recent years, when manufacturing various functional components, inkjet printers, as substrate processing devices, have been used to apply the material of the functional components onto the substrate to form patterns (patterning) or films. Patterning using inkjet printers has the following advantages: high material utilization efficiency because patterns can be formed on demand; relatively small manufacturing equipment because it is a non-vacuum process; and the ability to perform large-area coating at high speed.

[0003] However, display devices come in various display methods, and in recent years, the development of display devices using organic EL elements has been actively promoted. Due to the high price of organic EL materials, inkjet printers, which have high material utilization efficiency and can perform large-area coating at high speeds, are sometimes used.

[0004] Pattern formation using an inkjet printer involves expelling liquid from a nozzle on the ejector head. In such inkjet printers, techniques for measuring and maintaining the ejector head's condition are essential to maintain productivity. Various methods for measuring the ejector head's condition have been proposed. For example, patent documents 1 and 2 describe techniques for applying a driving voltage to a vibrating plate inside the ejector head and diagnosing the ejector head's condition based on the subsequent residual vibrations.

[0005] Prior art literature

[0006] Patent documents

[0007] Patent Document 1: Japanese Patent Application Publication No. 2006-218872

[0008] Patent Document 2: Japanese Patent Application Publication No. 2012-166507 Summary of the Invention

[0009] The problem that the invention aims to solve

[0010] However, in previous methods for measuring the state of the discharge head, it is sometimes difficult to determine the cause of the abnormality when multiple abnormalities occur simultaneously.

[0011] This disclosure provides techniques that facilitate the determination of the causes of abnormalities in liquid discharge devices.

[0012] Solution for solving the problem

[0013] According to a first aspect of this disclosure, a liquid discharge device is provided, characterized in that the liquid discharge device comprises: a discharge head that discharges liquid from a plurality of nozzles; a plurality of piezoelectric elements respectively disposed in the plurality of nozzles; a detection unit that detects residual vibration signals for each of the plurality of piezoelectric elements, the residual vibration signals corresponding to the deformation of the piezoelectric elements caused by pressure waves generated accompanying the operation of the piezoelectric elements; and a processing unit that processes the residual vibration signals detected for each of the plurality of piezoelectric elements, the processing unit performing: a manufacturing step of creating a feature quantity mapping representing the distribution of feature quantities of the residual vibration signals in the plurality of nozzles; and a determination step of determining an anomaly based on the feature quantity mapping.

[0014] According to a second aspect of this disclosure, a determination method is provided for determining an abnormality in a liquid discharge device having a discharge head discharging liquid from a plurality of nozzles and a plurality of piezoelectric elements respectively disposed in the plurality of nozzles. The determination method comprises: a detection step of detecting residual vibration signals for each of the plurality of piezoelectric elements, the residual vibration signals corresponding to the deformation of the piezoelectric elements caused by pressure waves generated accompanying the operation of the piezoelectric elements; a fabrication step of fabricating a feature quantity map representing the distribution of characteristic quantities of the residual vibration signals in the plurality of nozzles; and a determination step of determining an abnormality based on the feature quantity map.

[0015] According to a third aspect of this disclosure, an information processing apparatus is provided that determines an anomaly in a liquid discharge device having a discharge head discharging liquid from a plurality of nozzles and a plurality of piezoelectric elements respectively disposed in the plurality of nozzles. The information processing apparatus is characterized by having a processor that executes: an acquisition step of acquiring residual vibration signals for each of the plurality of piezoelectric elements, the residual vibration signals corresponding to the deformation of the piezoelectric elements caused by pressure waves generated accompanying the operation of the piezoelectric elements; a fabrication step of fabricating a feature quantity mapping representing the distribution of characteristic quantities of the residual vibration signals in the plurality of nozzles; a determination step of performing an anomaly determination based on the feature quantity mapping; and an output step of outputting data representing the result of the anomaly determination.

[0016] According to a fourth aspect of this disclosure, a storage medium is provided, which is a computer-readable storage medium, characterized in that the storage medium contains a program that causes a processor in an information processing device for determining an anomaly of a liquid discharge device to perform steps, the liquid discharge device having a discharge head discharging liquid from a plurality of nozzles and a plurality of piezoelectric elements respectively disposed on the plurality of nozzles, the program causing the processor to perform the following steps: an acquisition step, acquiring residual vibration signals for each of the plurality of piezoelectric elements, the residual vibration signals corresponding to the deformation of the piezoelectric elements caused by pressure waves generated accompanying the operation of the piezoelectric elements; a fabrication step, fabricating a feature quantity map representing the distribution of feature quantities of the residual vibration signals in the plurality of nozzles; and an output step, performing an anomaly determination based on the feature quantity map and outputting data of the result of the anomaly determination.

[0017] According to a fifth aspect of this disclosure, a program product is provided, characterized in that the program product includes a computer-readable storage medium having a program, the program causing a processor in an information processing device for determining anomalies of a liquid discharge device to execute steps, the liquid discharge device having a discharge head discharging liquid from a plurality of nozzles and a plurality of piezoelectric elements respectively disposed on the plurality of nozzles, the program causing the processor to execute the following steps: an acquisition step, acquiring residual vibration signals for each of the plurality of piezoelectric elements, the residual vibration signals corresponding to the deformation of the piezoelectric elements caused by pressure waves generated accompanying the operation of the piezoelectric elements; a fabrication step, fabricating a feature quantity mapping representing the distribution of feature quantities of the residual vibration signals in the plurality of nozzles; and an output step, performing anomaly determination based on the feature quantity mapping, and outputting data of the result of the anomaly determination.

[0018] According to a sixth aspect of this disclosure, a substrate processing apparatus is provided, the substrate processing apparatus processing a substrate, characterized in that the substrate processing apparatus includes: a stage that holds the substrate and moves it; and a liquid discharge device according to the first aspect, the liquid discharge device discharging liquid onto the substrate held by the stage.

[0019] According to the seventh aspect of this disclosure, a method for manufacturing an article is provided, characterized in that the method comprises: a first step of discharging liquid onto a substrate using a substrate processing apparatus according to the fifth aspect to form a liquid film; a second step of drying the substrate on which the liquid film is formed to form a dry film; and a third step of manufacturing an article from the substrate on which the dry film is formed.

[0020] The effects of the invention

[0021] According to this disclosure, techniques can be provided that are helpful in determining the cause of abnormalities in liquid discharge devices. Attached Figure Description

[0022] Figure 1 This is a diagram showing the configuration of an inkjet device.

[0023] Figure 2 This is a diagram showing the chip's ejection surface.

[0024] Figure 3 This is a diagram showing a block consisting of multiple chips.

[0025] Figure 4 This is a diagram illustrating an example of the liquid flow path inside a component body.

[0026] Figure 5 This is a flowchart illustrating the nozzle anomaly detection and handling process.

[0027] Figure 6 This is a diagram showing an example of residual vibration waveforms and their characteristic quantities.

[0028] Figure 7 This is a diagram illustrating an example of feature mapping.

[0029] Figure 8 This is a diagram used to illustrate the process of anomaly detection based on feature mapping.

[0030] Figure 9 This is a diagram illustrating an example of the control configuration of the discharge head.

[0031] Figure 10 This is a flowchart of the determination method. Detailed Implementation

[0032] Hereinafter, embodiments will be described in detail with reference to the accompanying drawings. Furthermore, the following embodiments do not limit the scope of the claims. Several features are described in the embodiments, but not all of these features are essential technical features, and multiple features can be combined arbitrarily. Furthermore, in the accompanying drawings, the same or identical components are labeled with the same reference numerals, and repeated descriptions are omitted.

[0033] <First Embodiment>

[0034] Reference Figure 1 The configuration of an inkjet apparatus as a substrate processing apparatus will be described. An inkjet apparatus that functions as a substrate processing apparatus for processing display panels or semiconductor substrates applies material of functional elements onto the substrate to form patterns or films. However, this disclosure is not limited to inkjet apparatuses. Figure 1 (a) is a side view. Figure 1 (b) is a top view, showing only the main parts of the inkjet unit for simplicity. As shown in the instruction manual and accompanying drawings... Figure 1As shown, the direction is represented in the XYZ coordinate system, where the plane parallel to the surface of the substrate 1 is set as the XY plane.

[0035] The inkjet apparatus includes a substrate stage 2 that holds and moves a substrate 1, such as a display panel. The substrate 1 can be appropriately selected from glass substrates or plastic substrates, depending on the product to be manufactured. The substrate 1 is typically a plate-shaped member, but its shape is not limited as long as it functions as a substrate. For example, the substrate 1 can be a deformable film or a circular substrate. The substrate 1 on the substrate stage 2 has pixel regions 12 formed by applying a liquid 3 (ink) as a material for forming functional elements, and arranging a large number of display pixels. A predetermined pattern related to device manufacturing is formed in the pixel regions 12. Furthermore, alignment marks 13 are formed around the pixel regions 12 for alignment with the preceding processes of the inkjet apparatus. In this specification, "ink" refers to a liquid used to form patterns or films on the substrate 1. In this specification, the composition of the ink is not particularly limited; for example, a liquid containing a solute and solvent for forming an organic film can be used.

[0036] The substrate stage 2 has the function of holding the substrate 1 while moving in the XY direction. By synchronously driving the Y-direction driving action of the substrate stage 2 and the liquid discharge action of the discharge head 4, the desired pattern can be formed on the substrate 1.

[0037] The discharge head 4 has multiple nozzles for discharging liquid 3. For example, in the case of using three types of liquid 3, the following configuration is sufficient: Figure 1 As shown in (b), multiple nozzles are arranged in three rows in the Y direction, allowing each row to be filled with a different liquid. Furthermore, by arranging multiple nozzles in the X direction, the width of the pattern that can be formed can be changed by a single Y-direction driving motion of the substrate stage 2. For example, if... Figure 1 As shown in (b), multiple nozzles are arranged beyond the X-direction width of the pixel region 12, allowing a pattern to be formed on the entire surface of the pixel region 12 via a single Y-direction driving motion of the substrate stage 2. Furthermore, the flow path inside the nozzles is filled with liquid supplied from the liquid tank 6. Additionally, a piezoelectric element (discharge energy generating element) and a vibrating plate that moves according to the displacement of the piezoelectric element are configured inside the nozzles. By applying voltage to the piezoelectric element, the pressure inside the nozzles is controlled via the vibrating plate, thereby performing the liquid discharge operation.

[0038] The discharge control unit 5 can perform the discharge operation of the discharge head 4 and determine the abnormality of the nozzles. For example, the discharge control unit 5 performs the liquid discharge operation based on the device pattern drawn on the substrate 1. In addition, the discharge control unit 5 can function as a detection unit to detect residual vibration signals for each of the multiple piezoelectric elements. Furthermore, the discharge control unit 5 can function as a processing unit to process the residual vibration signals detected for each of the multiple piezoelectric elements. For example, the discharge control unit 5 can measure the residual vibration of each of the multiple nozzles and determine the state of each of the multiple nozzles based on the measurement results.

[0039] The liquid reservoir 6 has the function of storing liquid 3 and supplying liquid 3 to the discharge head 4. For example, it can perform control such as keeping the pressure of liquid 3 constant at the discharge head 4. In addition, in the case of using multiple liquids in inkjet devices, multiple liquid reservoirs 6 are prepared according to the type of liquid.

[0040] Camera 9 measures alignment mark 13. Height sensor 10 measures the height of substrate 1.

[0041] The main control unit 11 provides comprehensive control over all components, including the substrate stage 2, camera 9, height sensor 10, and ejection control unit 5, to perform pattern formation on the substrate 1. For example, the main control unit 11 holds the substrate 1, which has been transported from outside the inkjet unit, on the substrate stage 2. Then, the main control unit 11 uses the height sensor 10 to measure the height position of the substrate 1, and controls the substrate stage 2 based on the measurement result to perform focus adjustment (alignment in the Z direction). Next, the main control unit 11 uses the camera 9 to measure the alignment mark 13, and controls the substrate stage 2 based on the measurement result to align the ejection head 4 with the substrate 1 in the XY direction. After alignment, the main control unit 11 drives the substrate stage 2 in the Y direction synchronously with the operation of the ejection head 4 to form a device pattern on the substrate.

[0042] The discharge control unit 5 and the main control unit 11 can be constructed, for example, by a PLD (Programmable Logic Device) such as an FPGA (Field Programmable Gate Array), an ASIC (Application Specific Integrated Circuit), a general-purpose computer with embedded programs, or a combination of all or part of them. The discharge control unit 5 and the main control unit 11 can be information processing devices configured inside or outside the liquid discharge device. The information processing device can include a processing unit, a display unit, an input unit, etc. The processing unit can, for example, be a computer including a processor such as a CPU (Central Processing Unit), memory, and a GPU (Graphical Processing Unit).

[0043] In one example, multiple ink discharge heads 4 are arranged in both the X and Y directions. By individually controlling the discharge of ink droplets from each discharge head, the desired ink distribution can be applied to the pixel area 12 on the substrate 1. Figure 9 An example of the control configuration of the discharge head 4 is shown. The discharge head 4 may include multiple nozzles 15. Each of the multiple nozzles 15 constitutes a discharge element including a piezoelectric element (discharge energy generating element). Each of the multiple nozzles 15 is connected to a driver D that drives the piezoelectric element via a flexible cable F. The driver D is connected to a discharge control unit 5 (processing unit). The discharge control unit 5 sends instructions to the driver D for discharging droplets from each nozzle. The driver D applies a drive signal to the piezoelectric element of the nozzle according to the received instructions to perform the discharge process. In addition, the discharge control unit 5 may also send instructions (recovery processing instructions) to the driver D for restoring an abnormal nozzle among the multiple nozzles 15. In this case, the driver D applies a drive signal to the piezoelectric element of the abnormal nozzle according to the received instructions to perform the recovery process. Alternatively, the function of the discharge control unit 5 may also be implemented by the main control unit 11.

[0044] During the formation of the dot matrix pattern using multiple nozzles 15, or during standby, malfunctions such as poor or disordered discharge may occur due to foreign matter adhering to the flow path or near the nozzle opening, ink thickening, ink component precipitation, electrophoresis, etc. This malfunction is caused by a combination of various main factors, including discharge time, flow path shape, distance from the electrode, and time without discharge. The severity of the malfunction will vary depending on each nozzle.

[0045] In recovery processes involving air bubbles causing clogging or severe nozzle blockages that cannot be resolved by pre-discharge, a recovery unit (not shown) can be used. However, recovery processes using a recovery unit require a long time and a large amount of ink. Therefore, recovery processes using a recovery unit are preferably performed only during scheduled maintenance. During normal operation, pre-discharge from multiple nozzles 15 can be appropriately performed to restore malfunctioning nozzles to a normal state.

[0046] The malfunction of each nozzle's discharge can be confirmed using a related signal (residual signal) measured after a specific pressure wave is generated. Specifically, the discharge control unit 5 activates the piezoelectric element by supplying a specific pulse signal to it via the driver D. Accompanying the activation of the piezoelectric element, a specific pressure wave is generated on it. If the piezoelectric element is functioning normally, this pressure wave will cause ink to drip from the nozzle. At this time, the pressure wave generated on the piezoelectric element causes deformation of the vibrating plate, generating an electrical signal corresponding to this deformation (residual vibration). This electrical signal is called the "residual vibration signal." The discharge control unit 5 can determine the malfunction of the piezoelectric element's discharge based on the waveform of the detected residual vibration signal (residual vibration waveform).

[0047] Reference Figure 2 as well as Figure 3 The configuration of the discharge head 4 will be described in detail below. Multiple nozzles 15 are divided into multiple groups. In this embodiment, the discharge head 4 may include multiple chips, each having multiple nozzles. Here, multiple groups correspond to multiple chips. Figure 2 The diagram shows the discharge surface of chip 14, which is one of multiple chips. The dimensions of the discharge surface of chip 14 are, for example, a length of 10-20 mm in the Y direction and a length of 20-30 mm in the X direction. Multiple nozzles 15 are arranged on its discharge surface. The number of nozzles 15 can be hundreds or more. Each nozzle contains a vibrating plate and a liquid flow path.

[0048] exist Figure 3 The diagram shows a module 16 (discharge head module) composed of multiple chips. Module 16 is a component that integrates multiple chips into a single unit. The multiple chips (multiple groups) are divided to form multiple nozzle rows. Figure 3 In the example, eight chips 14a-14h are arranged in module 16. Within a single module, multiple nozzles 15 need to be arranged with equal spacing in the X direction. Therefore, the arrangement of the multiple chips 14a-14h can be, for example, Figure 3The staggered configuration is shown. In inkjet devices, when increasing the width of pattern formation that can be achieved by driving the substrate stage 2 in the Y direction, this is achieved by adding blocks in the X direction. For example, when the substrate 1 is a large size exceeding 2m, approximately 10 to 20 blocks 16 need to be arranged in the X direction to form patterns on it in a single stage drive. Furthermore, when using multiple liquids, this can be achieved by adding blocks 16 in the Y direction corresponding to the type used.

[0049] Next, the liquid supply path from the liquid tank 6 to the chip 14 will be described. In order to keep the velocity, volume, etc. of the liquid discharged from the nozzle 15 constant, it is preferable that the liquid pressure inside the chip is equal in all nozzles. Therefore, the flow paths from the liquid tank 6 to each chip are connected in parallel.

[0050] exist Figure 4 An example of the liquid flow path inside the assembly 16 is shown. A first flow path 17 is connected to the liquid tank 6. The flow paths from the first flow path 17 to each chip are arranged in a hierarchical manner with branch flow paths. The branch flow paths include a second flow path 27 that branches off from the first flow path 17 at a branch point 17-1 toward chips 14a-14d (multiple groups of the first row) which are arranged in a manner that constitute multiple nozzle rows. In addition, the branch flow paths include a third flow path 28 that branches off from the first flow path 17 at a branch point 17-1 toward chips 14e-14h (multiple groups of the second row) which are arranged in a manner that constitute multiple nozzle rows. Furthermore, the branch flow paths include a fourth flow path 29 that branches off from the second flow path 27 at a branch point 17-4 toward chips 14a-14d (multiple groups of the first row). Furthermore, the branch flow path includes a fifth flow path 30 that branches off from the third flow path 28 at branch points 17-2 towards chips 14e-14h (multiple groups of the second team). Liquid discharged from chip 14 returns to liquid tank 6 via liquid flow path 18.

[0051] Next, we will explain the main causes of anomalies that can be detected by the residual vibration waveform of the nozzle and their recovery methods.

[0052] One of the main causes of anomalies is the introduction of air bubbles into the liquid flow path. If air bubbles are introduced into the liquid, they will become trapped in areas of the flow path where flow is prone to stagnation. For example, if air bubbles become trapped near a nozzle, their impact is limited to that nozzle and its surrounding area. On the other hand, if air bubbles become trapped upstream in the flow path, their impact will affect the entire nozzle downstream. For example, in... Figure 4 In the liquid flow path, if air bubbles are trapped in the interval from branch point 17-2 to 17-3, it will affect the nozzles within chip 14g and 14h.

[0053] As a mechanism for recovering air bubbles mixed into the liquid flow path, a degassing filter is sometimes used. By passing the liquid 3 through the degassing filter, the air bubbles contained in the liquid 3 can be removed. In inkjet devices, the degassing filter is disposed in the circulation path of the liquid 3. In addition, by increasing the circulation flow rate of the liquid 3, the recovery time of the liquid 3 containing air bubbles can be shortened.

[0054] Other major causes of the anomaly include the adhesion of foreign matter to the nozzle opening. This is caused by the liquid 3 discharged from the nozzle 15 floating as mist in the space between the discharge head 4 and the substrate 1 and adhering to the nozzle opening. The frequency of this occurrence varies depending on the frequency of nozzle use and the airflow environment between the discharge head 4 and the substrate 1.

[0055] As a mechanism for removing foreign matter adhering to the nozzle opening, there are mechanisms such as those that use a wiper to clean the nozzle surface or those that move a suction pump toward the nozzle surface to attract foreign matter. In an inkjet apparatus, to implement this removal mechanism, the ejector head 4 is equipped with a mechanism that can be driven in the Z direction (Z-drive mechanism). According to this Z-drive mechanism, a space can be provided between the ejector head 4 and the substrate stage 2, allowing the wiper or suction pump to move toward the nozzle surface.

[0056] Another major cause of the anomaly is the change in liquid concentration. The liquid flow path is not a completely closed structure; for example, the liquid is exposed to outside air from the nozzle opening, causing moisture to escape and resulting in an increased concentration. In cases where the liquid from liquid tank 6 is constantly being discharged from the first 4 cycles, the effect of the liquid concentration change will affect the entire nozzle connected to the liquid tank.

[0057] One method to compensate for the effects of changes in liquid concentration is to adjust the voltage driving the vibrating plate configured in the nozzle. If the concentration of liquid 3 increases, the viscosity increases, and the velocity of the droplets discharged from nozzle 15 decreases. On the other hand, the velocity of the droplets varies due to the driving voltage applied to the vibrating plate of the nozzle. Therefore, even when the viscosity of the liquid changes, its effect can be eliminated by adjusting the driving voltage of the vibrating plate.

[0058] Another major cause of the anomaly is fluctuations in liquid flow and pressure. To maintain a constant liquid pressure inside the ejector chip, the inkjet unit implements pressure control in the liquid tank 6, and is designed with uniform pressure loss from the liquid tank to each nozzle. Therefore, if an anomaly occurs in the pressure control of the liquid tank 6, the liquid pressure inside all ejector chips will be affected. Furthermore, if anomalies such as pipe aging occur in the liquid flow path from the liquid tank 6 to each nozzle, the nozzles downstream are easily affected.

[0059] So far, we have illustrated four main causes of anomalies, but the main causes of anomalies are not limited to these.

[0060] Since the aforementioned anomalies are caused by multiple independent factors, an abnormal state may also exist in an inkjet device where multiple factors occur simultaneously. If multiple factors occur at the same time, their respective effects are superimposed on the residual vibration waveform, making it difficult to determine the cause of the anomaly.

[0061] Figure 5 This is a flowchart illustrating the nozzle anomaly detection process in the embodiment.

[0062] In step S101, the discharge control unit 5 measures the residual vibration waveform. The discharge control unit 5 applies a driving voltage to the piezoelectric elements respectively configured in the nozzles of the discharge head 4, and then releases the driving voltage. After the driving voltage is released, the nozzle interior returns to its state before the driving voltage was applied. The vibration of the vibrating plate at this time is measured. Figure 6 The image shows an example of residual vibration waveforms and their characteristics. Figure 6 The residual vibration waveform shown is a standard waveform representing the state of a nozzle capable of stable discharge. If an equivalent vibration waveform can be obtained, the nozzle can be considered to be in normal condition. If the nozzle's poor discharge condition develops, the characteristics of this waveform will change.

[0063] In S102, the discharge control unit 5 detects the characteristics (feature quantities) of the residual vibration waveform. Specific examples of these characteristics could be as follows: Figure 6 At least one of the amplitude, period, and decay rate shown.

[0064] In S103, the discharge control unit 5, based on the characteristics detected in S102, creates a feature quantity map representing the distribution of characteristic quantities of the residual vibration signal. Figure 7 It shows Figure 3 The example shown is a feature mapping of block 16. For simplicity, in... Figure 7 The example shown is of only one component. The feature mapping should have been created for all the nozzles that make up the discharge head 4.

[0065] exist Figure 7 In the diagram, the horizontal axis represents the X-coordinate, and the vertical axis represents the Y-coordinate. Figure 3 The coordinates of the shown components are identical. In this coordinate system, the feature quantities detected in S102 are arranged based on the coordinate information of each nozzle. Furthermore, the nozzle coordinate information can be coordinate information referenced from mechanical design information, or coordinate information obtained through measurements using a camera, etc. This data is, for example, stored in advance in the storage unit (memory) within the discharge control unit 5.

[0066] Here, we will illustrate an example where the characteristic (feature quantity) focuses on amplitude. The characteristic (amplitude) detected in S102 for a nozzle with X-coordinate n and Y-coordinate m is set as Aact(n,m). The normal amplitude of this nozzle is set as Aref(n,m). In this case, the difference between the two (Aact(n,m) - Aref(n,m)) is input into the residual vibration distribution (feature quantity mapping). Furthermore, the normal amplitude is obtained, for example, from data measured after the discharge performance of the discharge head 4 has been verified, or from data measured when the inkjet unit as a whole meets the desired performance. The residual vibration distribution (feature quantity mapping) is created by calculating this difference for all nozzles.

[0067] Furthermore, while the above explanation illustrates an example focusing on amplitude as a characteristic, the characteristics are not limited to amplitude. For instance, in addition to amplitude, period and decay rate can also be detected, and distributions of amplitude, period, and decay rate can be created, with anomaly detection and processing based on these distributions.

[0068] In S104, the discharge control unit 5 performs signal processing on the residual vibration distribution generated in S103. Then, in S105, the discharge control unit 5 performs anomaly determination processing based on the result of the signal processing in S104. In one example, in S104, the discharge control unit 5 calculates the following value.

[0069] • The average value of the feature values ​​of all groups (chips) in the feature value mapping (first average value).

[0070] • The average value of the characteristic quantity of each nozzle column in multiple nozzle columns (second average value).

[0071] • The average value of the characteristic quantity of each chip (group) of multiple chips (multiple chips) (third average value).

[0072] In S105, anomaly determination is made based on the values ​​calculated in S104.

[0073] Additionally, in S104, for example, it is possible to consider processing the variation of the characteristic quantity separated by each flow path based on the correlation between the abnormal state detectable by the residual vibration waveform and the flow path of the liquid. The processing of the variation of the characteristic quantity separated by each flow path can be performed by calculating the deviation relative to the average value. For example, the second and third average values ​​can also be calculated based on the deviations from the first and second average values, respectively. Figure 8 It is a graph that separates the residual vibration distribution into the variation of characteristics for each liquid flow path.

[0074] Figure 8(a) represents the feature mapping obtained in S103. Figure 7 The common component of all nozzles in ), that is, the average value of the characteristic quantities of the entire group of multiple nozzles (the first average value). Figure 8 Region 19-1 in (a) represents the common component of all nozzles.

[0075] Then, the discharge control unit 5 calculates the average value of the characteristic quantity of each nozzle column in the multiple nozzle columns, i.e., the second average value. The second average value can also be set as a characteristic quantity mapping (…). Figure 7 The characteristics of each feature relative to the first average () Figure 8 The average value of the deviation of (a)). In this case, the average value of the deviation of the multiple nozzles of the multiple groups (corresponding to chips 14a to 14d) constituting the first row of the first nozzle column and the average value of the deviation of the multiple nozzles of the multiple groups (corresponding to chips 14e to 14h) constituting the second row of the second nozzle column are calculated as the second average value. Figure 8 (b) is a mapping representing the calculated second average of region 19-2 and the second average of region 19-3.

[0076] Next, the discharge control unit 5 calculates the average value of the characteristic quantity of each chip, i.e., the third average value. For example, the discharge control unit 5 calculates the residual vibration distribution obtained in S103 ( Figure 7 )minus Figure 8 The deviation is obtained by averaging the characteristics of all nozzles shown in (a). Then, the discharge control unit 5 obtains and subtracts the deviation. Figure 8 The deviation is obtained by taking the common component (average value) of each nozzle row shown in (b). Then, the discharge control unit obtains the average value of this deviation for each chip. Figure 8 (c) shows the average value (third average value) of each chip thus obtained, and regions 19–4 to 19–11 represent the residual vibration distribution of the common components extracted from each chip.

[0077] Figure 8 (d) shows the final deviation of each feature quantity relative to the first to third average values ​​obtained in the manner described above (the variation of the feature quantity is mapped by the separated feature quantity).

[0078] In S105, the discharge control unit 5 performs anomaly detection processing based on the signal processing results in S104. For example, by analyzing distributions 19-1 to 19-11 and... Figure 8 The characteristic shown in (d) is compared with a pre-set threshold, and error judgment is handled. The threshold can be a value set for each distribution being compared, or a common value.

[0079] If the overall average value (first average value) shown in region 19-1 exceeds the first threshold, it is determined that the pressure control of liquid tank 6 is abnormal, or the flow path (first flow path) in the section from liquid tank 6 to branch point 17-1 is abnormal, or the concentration of liquid 3 is abnormal.

[0080] consider Figure 8 If the average value (second average value) of the characteristic quantity of multiple nozzles of chips 14a~14d (multiple groups of the first row) in constituting region 19-2 (first nozzle row) exceeds a predetermined threshold (second threshold), the discharge control unit 5 determines that there is an abnormality in the flow path (second flow path) in the interval from branch point 17-1 to branch point 17-4.

[0081] In addition, consider Figure 8 If the average value (second average value) of the characteristic quantity of multiple nozzles of chips 14e~14h (multiple groups of the second row) in the constitutive region 19-3 (second nozzle row) of (b) exceeds the second threshold, the discharge control unit 5 determines that there is an abnormality in the flow path (third flow path) in the interval from branch point 17-1 to branch point 17-2.

[0082] Next, consider the case where, among the multiple groups constituting the first row of nozzles (corresponding to regions 19-4, 19-6, 19-8, and 19-10), there exists a group where the average value (third average value) of the characteristic quantity (or deviation) within the group exceeds the third threshold. In this case, the discharge control unit 5 determines it to be an abnormality relative to the liquid input section of that group, or an abnormality downstream of the branch point 17-4 (the fourth flow path).

[0083] Furthermore, consider the case where, among the multiple groups constituting the second nozzle array (corresponding to regions 19-5, 19-7, 19-9, and 19-11), there exists a group where the average value (third average value) of the characteristic quantity (or deviation) within the group exceeds the third threshold. In this case, the discharge control unit 5 determines it to be an abnormality relative to the liquid input section of that group, or an abnormality downstream of the branch point 17-2 (the fifth flow path).

[0084] exist Figure 8 In the characteristic quantity mapping (or deviation mapping) shown in (d), if there is a group where the characteristic quantity (or deviation) exceeds the fourth threshold, the discharge control unit 5 determines that there is an abnormality in the internal flow path of that group, or an abnormality caused by foreign matter adhering to the nozzle of that group. In addition, abnormalities in the flow path include pressure loss changes caused by air bubbles mixing into the liquid flow path, foreign matter mixing, and long-term aging of pipelines, etc.

[0085] exist Figure 10The flowchart shows a determination method executed by the processor (e.g., discharge control unit 5) of an information processing device that determines abnormalities in the liquid discharge device.

[0086] In S201 (acquisition step), the processor acquires residual vibration signals for each of the multiple piezoelectric elements, corresponding to the deformation of the piezoelectric element caused by the pressure wave generated during the operation of the piezoelectric element.

[0087] In S202 (manufacturing step), the processor creates a feature quantity map representing the distribution of feature quantities of residual vibration signals in multiple nozzles.

[0088] In S203 (determination step), the processor performs anomaly determination based on feature mapping.

[0089] In S204 (output step), the processor outputs the data of the anomaly determination result to, for example, a liquid discharge device.

[0090] <Implementation Method of Article Manufacturing Method>

[0091] The article manufacturing method of this embodiment is suitable for manufacturing articles such as panels for displays like organic EL, microdevices such as semiconductor devices, and components with fine structures. The article manufacturing method of this embodiment includes: a first step of discharging liquid onto a substrate using the aforementioned liquid discharge device to form a discharge liquid film; a second step of drying the substrate on which the discharge liquid film has been formed to form a dry film; and a third step of manufacturing an article from the substrate on which the dry film has been formed. Furthermore, this article manufacturing method includes other well-known steps (firing, cooling, cleaning, oxidation, film formation, vapor deposition, doping, planarization, etching, resist stripping, slicing, bonding, encapsulation, etc.). Compared with conventional methods, the article manufacturing method of this embodiment is advantageous in at least one aspect of article performance, quality, productivity, and production cost.

[0092] (Other implementation methods)

[0093] This invention can also be implemented by providing a program that implements one or more functions of the above embodiments to a system or device via a network or storage medium, and having one or more processors in the computer of the system or device read and execute the program. Alternatively, it can be implemented by a circuit (e.g., an ASIC) that implements one or more functions.

[0094] The invention is not limited to the embodiments described above, and various changes and modifications can be made without departing from the concept and scope of this disclosure. Therefore, the claims are appended to disclose the scope of the invention.

[0095] Explanation of reference numerals in the attached figures

[0096] 1: Substrate, 2: Substrate stage, 4: Discharge head, 5: Discharge control unit, 6: Liquid tank, 11: Main control unit.

Claims

1. A liquid discharge device, characterized in that, The above-mentioned liquid discharge device has: A discharge head that discharges liquid from multiple nozzles; Multiple piezoelectric elements are respectively disposed in the aforementioned multiple nozzles; The testing department detects residual vibration signals for each of the aforementioned piezoelectric elements. These residual vibration signals correspond to the deformation of the piezoelectric elements caused by the pressure waves generated during their operation. as well as The processing unit processes the residual vibration signals detected by the aforementioned piezoelectric elements. The above processing department shall perform the following: The manufacturing process includes: creating a feature quantity mapping representing the distribution of characteristic quantities of the residual vibration signals in the aforementioned multiple nozzles; and... The judgment step involves determining anomalies based on the aforementioned feature mapping.

2. The liquid discharge device as described in claim 1, characterized in that, The aforementioned nozzles are divided into multiple groups. The aforementioned groups are divided in a manner that forms multiple nozzle rows. In the above-mentioned determination step, the processing unit determines an anomaly based on the average value of the feature values ​​of all groups in the above-mentioned feature value mapping, namely the first average value, the average value of the feature values ​​of each nozzle column in the above-mentioned plurality of nozzle columns, namely the second average value, and the average value of the feature values ​​of each group in the above-mentioned plurality of groups, namely the third average value.

3. The liquid discharge device as described in claim 2, characterized in that, The above-mentioned liquid discharge device also has: The liquid reservoir stores liquid; The first flow path is connected to the aforementioned liquid tank; as well as Branch flow paths, which branch off from the first flow path in a hierarchical manner towards the aforementioned multiple groups. In the above-mentioned determination step, if the first average value exceeds the first threshold, the processing unit determines that there is an abnormality in the liquid tank, an abnormality in the first flow path, or an abnormality in the liquid supplied from the liquid tank.

4. The liquid discharge device as described in claim 3, characterized in that, The aforementioned branch flow paths include: a second flow path branching from the first flow path toward multiple groups of the first group of the first nozzle row among the aforementioned plurality of nozzle rows; and a third flow path branching from the first flow path toward multiple groups of the second group of the second nozzle row among the aforementioned plurality of nozzle rows. In the determination step described above, the processing unit determines that the second flow path is abnormal when the second average value in the first nozzle array exceeds the second threshold, and determines that the third flow path is abnormal when the second average value in the second nozzle array exceeds the second threshold.

5. The liquid discharge device as described in claim 4, characterized in that, The aforementioned branch flow paths include: a fourth flow path branching from the second flow path towards multiple groups of the first team; and a fifth flow path branching from the third flow path towards multiple groups of the second team. In the above-mentioned determination step, if there is a group among the multiple groups of the first team whose third average value exceeds the third threshold, the processing unit determines that there is an abnormality in the liquid input section of that group or an abnormality in the fourth flow path. If there is a group among the multiple groups of the second team whose third average value exceeds the third threshold, the processing unit determines that there is an abnormality in the liquid input section of that group or an abnormality in the fifth flow path.

6. The liquid discharge device as described in claim 5, characterized in that, In the above-mentioned determination step, if there is a group in which the above-mentioned characteristic quantity exceeds the fourth threshold, the processing unit determines that the internal flow path of the group is abnormal or that the group is abnormal due to foreign matter adhering to the nozzle.

7. The liquid discharge device as described in claim 6, characterized in that, The second average value and the third average value mentioned above are calculated based on the deviations of the first average value and the second average value mentioned above, respectively. The feature quantity compared with the fourth threshold mentioned above is calculated based on the deviation of the third average value mentioned above.

8. The liquid discharge device as described in claim 1, characterized in that, The aforementioned characteristic quantities include at least one of the amplitude, period, and attenuation rate of the residual vibration signal.

9. A method for determining an abnormality in a liquid discharge device, the liquid discharge device having a discharge head discharging liquid from a plurality of nozzles and a plurality of piezoelectric elements respectively disposed in the plurality of nozzles, characterized in that, The above determination method has the following characteristics: The detection step involves detecting residual vibration signals for each of the aforementioned piezoelectric elements. These residual vibration signals correspond to the deformation of the piezoelectric element caused by the pressure wave generated during its operation. The manufacturing process involves creating a feature quantity mapping that represents the distribution of the feature quantities of the residual vibration signals in the aforementioned multiple nozzles. as well as The judgment step involves determining anomalies based on the aforementioned feature mapping.

10. An information processing apparatus that determines an abnormality in a liquid discharging device, the liquid discharging device having a discharge head discharging liquid from a plurality of nozzles and a plurality of piezoelectric elements respectively disposed in the plurality of nozzles, characterized in that, The aforementioned information processing device has a processor, The processor described above executes: The acquisition step involves acquiring residual vibration signals for each of the aforementioned piezoelectric elements. These residual vibration signals correspond to the deformation of the piezoelectric element caused by the pressure wave generated during the operation of the piezoelectric element. The manufacturing process involves creating a feature quantity mapping that represents the distribution of the feature quantities of the residual vibration signals in the aforementioned multiple nozzles. The judgment step involves anomaly detection based on the aforementioned feature mapping. as well as The output step outputs the data of the above anomaly determination results.

11. A storage medium, which is a computer-readable storage medium, characterized in that, The storage medium contains a program that causes a processor in an information processing device that determines an anomaly in the liquid discharge device to execute steps. The liquid discharge device has a discharge head that discharges liquid from multiple nozzles and multiple piezoelectric elements respectively disposed on the multiple nozzles. The above program causes the processor to perform the following steps: The acquisition step involves acquiring residual vibration signals for each of the aforementioned piezoelectric elements, and these residual vibration signals correspond to the deformation of the piezoelectric element caused by the pressure wave generated during the operation of the piezoelectric element. The manufacturing process involves creating a feature quantity mapping that represents the distribution of the feature quantities of the residual vibration signals in the aforementioned multiple nozzles. as well as The output step involves performing anomaly detection based on the aforementioned feature mapping and outputting the result of the anomaly detection.

12. A program product, characterized in that, The program product contains a computer-readable storage medium with the program. The above procedure causes the processor in the information processing device that determines an abnormality in the liquid discharge device to execute steps. The liquid discharge device has a discharge head that discharges liquid from multiple nozzles and multiple piezoelectric elements respectively disposed on the multiple nozzles. The above program causes the processor to perform the following steps: The acquisition step involves acquiring residual vibration signals for each of the aforementioned piezoelectric elements, and these residual vibration signals correspond to the deformation of the piezoelectric element caused by the pressure wave generated during the operation of the piezoelectric element. The manufacturing process involves creating a feature quantity mapping that represents the distribution of the feature quantities of the residual vibration signals in the aforementioned multiple nozzles. as well as The output step involves performing anomaly detection based on the aforementioned feature mapping and outputting the result of the anomaly detection.

13. A substrate processing apparatus for processing substrates, characterized in that, The aforementioned substrate processing apparatus includes: A stage that holds and moves the aforementioned substrate; and The liquid discharge device according to any one of claims 1 to 8 discharges liquid onto the substrate held by the stage.

14. A method for manufacturing an article, characterized in that, The above-mentioned method of manufacturing the article has the following characteristics: In the first step, liquid is discharged onto the substrate using the substrate processing apparatus according to claim 13 to form a liquid film. In the second step, the substrate on which the liquid film is formed is dried to form a dry film; and The third step involves manufacturing an article from the substrate on which the aforementioned dry film has been formed.

Images