Power supply assembly for generating plasma, and plasma process system

Abstract

The present invention comprises: a) a plurality of microwave power supplies (2a, 2b, 2c, 2d, ... 2n), each of which is designed to generate a microwave power signal using an output of 100 W or more and a frequency of 300 MHz or more to generate plasma (7) in a plasma process chamber (6); b) a base (3) having an upper surface (3a) and a lower surface (3b); c) the microwave power supplies can be disposed on the upper surface (3a) of the base (3) as an assembly (2); d) the upper surface (3a) of the base (3) has a plug contact (4); and e) the microwave power supplies have a plug contact The present invention relates to a power supply assembly (1) having a mating plug element (5) that matches a ct (4), f) the mating plug element of the microwave power supply can be inserted onto the plug contacts of the base and mechanically secured, g) one, in particular, of the microwave power supplies can be individually isolated from the base, especially while the microwave power supply / multiple microwave power supplies and / or one or more other microwave power supplies are operating, and h) the base is designed such that the base is connected to a plasma process chamber and the microwave power supply assembly (2) can be isolated from the base without needing to be isolated from the base.

Description

Technical Field

[0001] The present invention relates to a power supply assembly for generating plasma in a plasma process chamber.

[0002] Furthermore, the present invention relates to a plasma process system having a plasma process chamber, a plurality of applicators disposed in the plasma process chamber for coupling microwave power to generate plasma, and a power supply assembly connected thereto.

[0003] Such plasma process systems are known, for example, from the semiconductor industry for precise material construction, coating and / or etching at the atomic level. Products such as microprocessors, memories, power semiconductors, solar cell modules, or displays are manufactured in this way. Typical arrangements are described, for example, in US10,971,413B2 or US10,707,058B2. These require a power supply assembly suitable for delivering microwave power to the applicators. A large number of applicators are often required, and since these are arranged in geometrically very different configurations, the power wiring is often very complex, difficult to understand, and error-prone. When a failure occurs in the power supply, the entire system often fails for a long period of time, especially in the production of the aforementioned products, which can result in very high costs.

[0004] Therefore, an object of the present invention is to provide a power supply assembly and a plasma processing system that can be maintained easily and quickly.

[0005] This object is achieved by the power supply assembly according to claim 1 and / or the plasma process system according to claim 15.

[0006] Therefore, a power supply assembly, a) Multiple microwave power supplies, each designed to generate microwave power signals using a power of 100W or more and a frequency of 300MHz or more to generate plasma within a plasma process chamber, b) A base having an upper surface and a lower surface, the base being designed in particular so that the upper surface can be positioned away from the plasma process chamber and the lower surface can be positioned facing the plasma process chamber, c) The microwave power supply can be disposed as an assembly, in particular, on the upper surface of the base. d) The base has plug contacts on its upper surface, e) The microwave power supply has a mating element that matches the plug contact, f) The mating plug element of the microwave power supply can be inserted into and mechanically secured to the plug contact of the base, in particular, it can be inserted into and mechanically secured to the plug contact of the base, g) One, in particular, multiple microwave power supplies can be isolated from base to base, especially while these and / or one or more other microwave power supplies are operating. h) The base is designed so that its underside is attached to the top surface of the plasma process chamber, and is mechanically fitted to the plasma process chamber so that microwave power signals can be guided into the plasma process chamber via multiple applicators arranged on the plasma process chamber. i) A power supply assembly is disclosed in which the base is designed to connect to and be isolated from the plasma process chamber without the microwave power supply assembly needing to be separated from the base.

[0007] This allows for the rapid and easy replacement of microwave power supplies, either individually or in combination with the base. The base does not necessarily have to be flat. The base can be curved, for example, convex or concave. The base can also take other forms. The base is designed to be attached to and detachable from the plasma process chamber. Therefore, the base is usually designed differently for each different plasma process chamber. In addition, the terms “top” and “bottom” of the base should not be interpreted as meaning that the top must always be horizontal and oriented towards the sky, or the bottom must always be horizontal and oriented towards the ground. Instead, the orientation should be defined based on the plasma chamber, and the base is designed so that the top faces away from the plasma process chamber and the bottom faces the plasma process chamber. However, the top is the surface that points horizontally upward, and the bottom is often horizontally downward.

[0008] Microwave power supplies can be designed as semiconductor-based power amplifiers, also known as solid-state power amplifiers (SSPAs) or solid-state generators (SSPGs). Unlike magnetron arrays and / or tube amplifiers, semiconductor-based power amplifiers have the advantages of high efficiency, small size, and compactness, and are therefore particularly well suited to this power supply assembly. At the same time, frequency, phase, pulse duration, and output power can be tuned particularly well and precisely. This applies in particular to multiple SSPGs individually, but also when synchronized with a group of SSPGs, especially all of them.

[0009] In one embodiment, the power supply assembly has a housing suitable for enclosing an array of microwave power supplies.

[0010] This protects the microwave power supply assembly from environmental influences and unintentional interference by the operator. At the same time, such a housing can also serve as a shield against electric and / or electromagnetic fields.

[0011] In one embodiment, the power supply assembly features a control system designed to control a microwave power supply.

[0012] The control system can be integrated into one of the microwave power supplies. This makes the power supply assembly even more compact and easier to maintain.

[0013] The control system can also be located outside the microwave power supply, or it can be located inside the housing.

[0014] The control system can also be divided into multiple systems, particularly so that each individual SSPG has its own control system. This allows for automatic handling of individual regulations. In this process, a higher-level SSPG group control system can hierarchically take over higher-level functions, or, if necessary, control individual SSPGs.

[0015] Therefore, even if a failure occurs in the group control system, the individual control systems can continue to function without the group control system, thereby maintaining the process.

[0016] However, if a failure occurs in an individual control system, only that SSPG will fail, and the other SSPGs will not.

[0017] The control system can also be located outside the microwave power supply and outside the housing.

[0018] In one embodiment, one, in particular, several, preferably all, microwave power supplies have a communication port for connection to a control system.

[0019] In one embodiment, the housing has one or more of the following connections: - Power supply connection, for example, AC mains power and / or DC power, - Control systems, especially communications for connecting to signals for synchronization, especially connections for digital communications, - Connect the coolant.

[0020] This makes it possible to disconnect the connection before opening or removing the housing, or before removing the SSPG from the assembly.

[0021] In one embodiment, the microwave power supply is AFT-enabled. In this specification, "AFT-enabled" refers to a characteristic that automatically adjusts the output frequency of the microwave power according to a predefined parameter. A given value can be, for example, a reflected power limit. This makes it possible to individually adjust the power of multiple, and especially all, power supplies.

[0022] AFT allows for coupling as much available microwave power as possible to the plasma process and controlling the frequency to minimize reflections. Such AFT-enabled microwave power supplies are described, for example, in patent application DE10 2021129565A1.

[0023] In one embodiment, multiple, and especially all, microwave power supplies can be individually controlled at their respective frequencies. This makes it possible to individually adjust the power of multiple, and especially all, power supplies. This can be achieved particularly through a control system, preferably through a central control system.

[0024] Therefore, while individual AFTs by multiple, and especially all, SSPGs are possible, AFTs for groups of SSPGs are also advantageous.

[0025] In one embodiment, multiple, and especially all, microwave power supplies can be individually controlled in terms of their power output. This allows for individual power adjustment for multiple, and especially all, power supplies, and therefore makes it possible to influence the power distribution, and thus the distribution of the plasma within the plasma process chamber. This can be achieved particularly through a control system, preferably through a central control system.

[0026] In one aspect, a plurality of, particularly all, microwave power sources can be individually controlled in their phase relative to another microwave power source. This enables individual power adjustment for a plurality of, particularly all, power sources, and thus it is possible to affect the power distribution and, accordingly, the distribution of the plasma in the plasma processing chamber. This can be achieved particularly through a control system, preferably through a central control system.

[0027] In one aspect, the microwave power source can be pulsed. The pulse can be set from 1 Hz to 20 MHz. The pulse duty cycle can be set from 0% to 100%. The pulse can have different output powers. This enables the implementation of multi-level pulses. The pulse can be provided as a pulse packet, called a burst. The pulses of individual microwave power sources can be synchronized with each other. The pulse can also have a sequence. This enables individual power adjustment for a plurality of, particularly all, power sources, and thus it is possible to affect the power distribution and, accordingly, the distribution of the plasma in the plasma processing chamber. This can be achieved particularly through a control system, preferably through a central control system.

[0028] In one aspect, the base plug contact is designed to enable the connection of a microwave cable. This increases flexibility and allows microwave power from a remote microwave power source to be introduced via a microwave line instead of installing a microwave power source.

[0029] In one embodiment, the base plug contact has a protective device that protects the plug contact when the mating plug element is not connected. Such a protective device is described, for example, in patent application DE10 2022111955A1 and disclosed as an "opening constriction device." The aforementioned application is incorporated in whole by reference into this application. Such a protective device reduces contamination when the microwave power supply is unplugged, which simplifies handling when the microwave power supply is replaced. Furthermore, the electromagnetic field is also reduced.

[0030] In one embodiment, the power supply assembly is designed to supply microwave power to a microwave processing configuration located on the process chamber side, such as an antenna array. In this context, an antenna array refers to a configuration with multiple applicators.

[0031] In one embodiment, the base contains a metal, particularly aluminum and / or copper. Preferably, the base is made from one or more of these materials in combination. This makes it possible to achieve good stability. This also allows for good thermal distribution.

[0032] In one embodiment, one, particularly several, preferably all, microwave power supplies have water connections for a cooling liquid. This makes it possible to disconnect the microwave power supplies separately from the water.

[0033] In one embodiment, the base has a cable guide. Therefore, the plug contacts of the base do not need to be aligned with the applicator in the plasma chamber, but can be routed to a different location. This allows for greater flexibility in power supply placement.

[0034] In one embodiment, the base features a power combiner, also called a "combiner" or "coupler." This allows power from multiple power sources connected to the combiner to be directed to a single applicator.

[0035] In one embodiment, the base features a power distributor, also known as a splitter. This allows power from a power supply connected to the splitter to be directed to multiple applicators.

[0036] In one embodiment, the base houses electronic components, such as inductors, capacitors, attenuators, and / or filters. This further simplifies the construction method and makes it extremely compact.

[0037] A plasma process system having the following is also disclosed: a) A plasma process chamber, preferably having a substrate carrier disposed inside, for arranging a substrate for processing using plasma. b) Multiple applicators arranged within the process chamber to generate plasma by coupling microwave power, c) The power supply assembly described above, connected to the applicator.

[0038] With such a plasma process system, the microwave power supply can be replaced particularly quickly and easily, even during the operation of the plasma process, without interrupting its operation.

[0039] The following drawings schematically illustrate exemplary embodiments. [Brief explanation of the drawing]

[0040] [Figure 1] Figures 1a and 1b show the power supply assemblies, respectively. [Figure 2] Figures 2a and 2b show plasma process systems, respectively. [Figure 3] Figure 3 shows a detailed area of ​​the plasma process system equipped with plug contacts. [Figure 4] Figure 4 shows a detailed region of the plasma process system equipped with a coupler at the base. [Figure 5]Figure 5 shows a detailed region of a plasma process system equipped with a splinter at the base. [Figure 6] Figure 6 shows a detailed region of a plasma process system equipped with a splinter at the base.

[0041] Figure 1a shows a first embodiment of the power supply assembly 1. Figure 1b shows an exploded view of the same embodiment of the power supply assembly 1. Figures 2a and 2b show embodiments of a plasma process system 16 comprising the power supply assembly 1 and a plasma process chamber 6, respectively. The same reference numerals are used for the same components. The plasma process system 16 has the following: - A plasma process chamber 6, which preferably has a substrate carrier 19 disposed inside, for arranging a substrate 21 to be processed using plasma 7. - Multiple applicators 8 are arranged within the process chamber 6 to combine microwave power and generate plasma 7. - Power assembly 1 connected to applicator 8.

[0042] The power supply assembly 1 includes a plurality of microwave power supplies 2a, 2b, 2c, 2d, ... 2n, each designed to generate a microwave power signal having a power of 100 W or more and a frequency of 300 MHz or more to generate plasma 7 within the plasma process chamber 6. A substrate carrier 19 is disposed within the plasma process chamber 6, with a substrate 21 positioned on top. During operation, the substrate 21 is processed by the plasma. Etching, coating, or surface modification can be performed.

[0043] The power supply assembly 1 further comprises a base 3 having an upper surface 3a and a lower surface 3b. The base 3 is designed so that the upper surface 3a can be positioned away from the plasma chamber 6, and the lower surface 3b can be positioned facing toward the plasma chamber 6. The base is flat in this respect. However, as already explained above, this is not absolutely necessary.

[0044] The microwave power supplies 2a, 2b, 2c, 2d, ... 2n are arranged as assembly 2 on the upper surface 3a of the base 3.

[0045] The base 3 has a plug contact 4 on its upper surface 3a.

[0046] The microwave power supplies 2a, 2b, 2c, 2d, ... 2n have mating elements 5 that match the plug contacts 4.

[0047] The microwave power supplies 2a, 2b, 2c, 2d, ... 2n can be mechanically fastened by inserting their mating plug elements 5 into the plug contacts 4 of the base 3.

[0048] One, or more, microwave power supplies 2a, 2b, 2c, 2d, ... 2n can each be individually isolated from base 3, especially while these and / or one or more other microwave power supplies are operating, which is also known as the hot-plug function.

[0049] Here, the base 3 is designed such that its lower surface 3b is attached to the upper surface 6a of the plasma process chamber, and is designed to be mechanically fitted to the plasma process chamber 6 so that microwave power signals can be guided to the plasma process chamber 6 via a plurality of applicators 8 disposed on the plasma process chamber 6.

[0050] Base 3 is designed to connect to and be isolated from the plasma process chamber 6 without requiring the microwave power supply assemblies 2a, 2b, 2c, 2d, ... 2n to be separated from Base 3.

[0051] The power supply assembly 1 in Figure 2b has a housing 11 which is suitable for enclosing the microwave power supply assemblies 2a, 2b, 2c, 2d, ... 2n.

[0052] The power supply assembly 1 has a control system 20, which can be installed inside or outside the housing 11 together with the microwave power supplies 2a, 2b, 2c, 2d, ... 2n. The control system 20 is configured to control the microwave power supplies 2a, 2b, 2c, 2d, ... 2n. For this purpose, each of the microwave power supplies 2a, 2b, 2c, 2d, ... 2n has a communication port 17 for connection to the control system 20.

[0053] The upper surface 6a of the plasma process chamber 6 can serve as a cover for the plasma process chamber 6, which is securely and vacuum-sealed to the plasma process chamber 6. The base 3 is easily removable without causing leakage into the plasma chamber 6, i.e., without creating pressure changes within the plasma process chamber 6. The lower surface 3b of the base 3 and the upper surface 6a of the plasma process chamber thus correspond to a quick coupling. For this reason, the assembly 2 can be modified without changing conditions such as the vacuum inside the plasma process chamber 6.

[0054] Housing 11 may have one or more of the following connections: - Power supply, for example, power connections for connecting the mains power supply and / or DC power, -Connection for communication to connect to the control system, - Connect the coolant.

[0055] This makes it possible to disconnect the connection before opening or removing the housing.

[0056] The plug contact 4 on base 3 allows for connection of the microwave line 12.

[0057] Figure 3 shows a detailed view of the plug contact 4 and the mating plug element 5. The plug contact 4 on the base 3 may have a protective device 10 that protects the plug contact 4 when the mating plug element 5 is not connected.

[0058] One, in particular, several, preferably all, microwave power supplies 2a, 2b, 2c, 2d, ... 2n have a water connection 18 for a coolant.

[0059] Figures 4, 5, and 6 show detailed areas of the plasma process system with a combiner 13, splitter 14, or electronic components 15 within the base 3. A cable guide 22 within the base 3 is also shown.

[0060] Although these cable guides 22 within base 3 are shown only in configuration with combiners 13, splitters 14, or electronic components 15 within base 3, this does not necessarily mean that these cable guides 22 can only be provided with such components. Base 3 is also possible in which the cable guides 22 are provided without combiners 13, splitters 14, or electronic components 15.

[0061] The electronic component 15 may include, for example, an inductor, a capacitor, an attenuator, a delay line, and / or a filter.

Claims

1. Power supply assembly (1), a) Multiple microwave power supplies (2a, 2b, 2c, 2d, ..., 2n), each designed to generate a microwave power signal having a power of 100 W or more and a frequency of 300 MHz or more, in order to generate plasma (7) in the plasma process chamber (6), b) A base (3) having an upper surface (3a) and a lower surface (3b), c) The microwave power supplies (2a, 2b, 2c, 2d, ... 2n) can be mounted on the base (3) as an assembly (2), d) The base (3) has a plug contact (4) on the upper surface (3a) of the base (3), e) The microwave power supply (2a, 2b, 2c, 2d, ... 2n) has a mating element (5) that matches the plug contact (4), f) The microwave power supply (2a, 2b, 2c, 2d, ... 2n) is such that the mating element (5) can be inserted into the plug contact (4) of the base (3) and can be mechanically fastened. g) One, in particular, a plurality of the microwave power supplies (2a, 2b, 2c, 2d, ... 2n) can be individually isolated from the base (3), in particular while these and / or one or more other microwave power supplies are operating, h) The base (3) is designed such that the microwave power signal can be guided to the plasma process chamber (6) via a plurality of applicators (8) arranged on the plasma process chamber (6), with the lower surface (3b) of the base (3) attached to the upper surface (6a) of the plasma process chamber (6) and mechanically fitted to the plasma process chamber (6), i) A power supply assembly (1) wherein the base (3) is designed such that the base (3) can be connected to and separated from the plasma process chamber (6) without the assembly (2) of the microwave power supplies (2a, 2b, 2c, 2d, ..., 2n) needing to be separated from the base (3).

2. The power supply assembly (1) according to claim 1, wherein the microwave power supplies (2a, 2b, 2c, 2d-2n) are designed as semiconductor-based power amplifiers.

3. The power supply assembly (1) according to claim 1 or 2, having a housing (11) suitable for enclosing the assembly (2) of the microwave power supplies (2a, 2b, 2c, 2d, ... 2n).

4. The housing (11) has the following connections: - Power supply connection for connecting to a power source, such as an AC mains power supply and / or DC power supply, - Control systems, especially communications for connecting to signals for synchronization, especially connections for digital communications, - A power supply assembly (1) according to claim 3, having one or more of the following: a coolant connection.

5. The power supply assembly (1) according to any one of claims 1 to 4, wherein the microwave power supply (2a, 2b, 2c, 2d to 2n) is AFT compatible.

6. The power supply assembly (1) according to any one of claims 1 to 5, wherein the power supply assembly (1) has a control system (20) designed to control microwave power supplies (2a, 2b, 2c, 2d, ... 2n).

7. The power supply assembly (1) according to any one of claims 1 to 6, wherein one, in particular, several, preferably all, microwave power supplies have a communication port for connection to the control system.

8. A power supply assembly (1) according to any one of claims 1 to 7, wherein a plurality of, in particular all, microwave power supplies (2a, 2b, 2c, 2d, ..., 2n) are individually controllable within their respective frequencies.

9. A power supply assembly (1) according to any one of claims 1 to 8, wherein multiple, in particular all, microwave power supplies (2a, 2b, 2c, 2d to 2n) are individually controllable within their respective power limits.

10. The power supply assembly (1) according to any one of claims 1 to 9, wherein the microwave power supplies (2a, 2b, 2c, 2d to 2n) are pulseable, and in particular, the pulses of the individual microwave power supplies can be synchronized with each other.

11. The power supply assembly (1) according to claim 10, wherein the pulse can be set to 1 Hz or more and 20 MHz, and / or the pause ratio of the pulse can be set to 0% to 100%.

12. The power supply assembly (1) according to any one of claims 1 to 11, wherein the plug contact (4) of the base (3) has a protective device (10) that protects the plug contact (4) when the mating plug element (5) is not connected.

13. The base (3) consists of the following components: - Cable guide (22), - Combiner (13), - Splitter (14), - A power supply assembly (1) according to any one of claims 1 to 12, comprising one or more of the electronic components (15).

14. The power supply assembly (1) according to any one of claims 1 to 13, wherein one, in particular, several, preferably all, microwave power supplies (2a, 2b, 2c, 2d, ..., 2n) have water connections for a coolant.

15. A plasma process system (16), a) A plasma process chamber (6) having a substrate carrier (19) disposed inside for arranging a substrate (21) for processing with plasma (7), b) A plurality of applicators (8) arranged in the plasma process chamber (6) to generate the plasma (7) by coupling microwave power, c) A plasma process system (16) comprising a power supply assembly (1) according to any one of claims 1 to 14, connected to the applicator (8).

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