Coating and developing apparatus

CN114222948BActive Publication Date: 2026-06-30TOKYO ELECTRON LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
TOKYO ELECTRON LTD
Filing Date
2020-08-05
Publication Date
2026-06-30

AI Technical Summary

Technical Problem

Existing coating and developing equipment lacks an efficient cleaning process during resist coating and developing, resulting in low processing efficiency.

Method used

A coating and developing apparatus is designed, comprising an infeed/outfeed station, a processing station, a pre-coating cleaning section, and a post-coating cleaning section. The processing efficiency is improved through physical cleaning and heat treatment. The pre-coating cleaning section performs physical cleaning on the front side of the substrate, the post-coating cleaning section cleans the back side of the substrate, and the developing section supplies developing solution to the front side of the substrate and heats it.

Benefits of technology

It achieves an efficient coating and development process, improves cleaning effect and processing efficiency, and ensures substrate quality.

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Abstract

The coating and developing apparatus (1) of the present invention includes an infeed / outfeed station (S1), a processing station (S4), a pre-coating cleaning unit (23), and a post-coating cleaning unit (54). The infeed / outfeed station includes a cassette holding unit (11) that holds a cassette (C) containing a plurality of substrates (W). The processing station includes: a coating processing unit (COT) that coats the front side of the substrate with resist; a developing processing unit (DEV) that supplies developing solution to the front side of the substrate exposed by the exposure apparatus (EXP) for developing; and heating units (BK1, BK2) for heating the substrate. The pre-coating cleaning unit is disposed between the infeed / outfeed station and the exposure apparatus and performs physical cleaning on the front side of the substrate before coating. The post-coating cleaning unit is disposed between the processing station and the exposure apparatus and performs physical cleaning on the back side of the substrate after coating.
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