Display panel and display device

Abstract

The present application discloses a display panel and a display device. The display panel includes a substrate, a first buffer layer, a first electrode layer, a pixel defining layer, and a second electrode layer. The first buffer layer is formed on one side of the substrate; the first electrode layer is formed on the surface of the first buffer layer facing away from the substrate, and the first electrode layer includes a plurality of first electrodes; the pixel defining layer is formed on the surface of the first buffer layer facing away from the substrate, and includes a plurality of openings corresponding to the first electrodes one by one to expose the first electrodes; the second electrode layer is formed on the surface of the pixel defining layer facing away from the substrate and covers each first electrode; wherein, at least one of the first buffer layer and the pixel defining layer is formed with a convex structure on the surface facing away from the substrate, so that at least one of the first electrode layer and the second electrode layer has a undulating structure adapted to the convex structure. The display panel provided by the present application has better stretchability, thereby improving the display yield of the display panel.

Description

Technical Field

[0001] This application belongs to the field of display technology, and particularly relates to a display panel and a display device. Background Art

[0002] Stretchable display is one of the important frontiers in display technology. In related technologies, since most materials in the display panel are difficult to stretch, they are easily damaged during the stretching process, resulting in poor display of the display panel. Summary of the Invention

[0003] An embodiment of this application provides a display panel and a display device. The stretchable ability of the display panel is better, thereby improving the display yield of the display panel.

[0004] An embodiment of the first aspect of the embodiment of this application provides a display panel, including:

[0005] A substrate;

[0006] A first buffer layer formed on one side of the substrate;

[0007] A first electrode layer formed on the surface of the first buffer layer facing away from the substrate. The first electrode layer includes a plurality of first electrodes;

[0008] A pixel defining layer formed on the surface of the first buffer layer facing away from the substrate, including a plurality of openings corresponding to the first electrodes one by one to expose the first electrodes;

[0009] A second electrode layer formed on the surface of the pixel defining layer facing away from the substrate and covering each of the first electrodes;

[0010] Wherein, at least one of the first buffer layer and the pixel defining layer forms a convex structure on the surface facing away from the substrate, so that at least one of the first electrode layer and the second electrode layer has a undulating structure adapted to the convex structure.

[0011] According to the embodiment of the first aspect of the present invention, the convex structure includes a first convex structure formed on the surface of the first buffer layer facing away from the substrate. The first buffer layer includes a polydimethylsiloxane material layer or a photoresist material layer.

[0012] According to any of the foregoing embodiments of the first aspect of the present invention, the convex structure includes a second convex structure formed on the surface of the pixel defining layer facing away from the substrate. The pixel defining layer includes a polydimethylsiloxane material layer or a photoresist material layer.

[0013] According to any of the foregoing embodiments of the first aspect of the present invention, the display panel further includes:

[0014] A second buffer layer is formed between the substrate and the first buffer layer, and a third convex structure is formed on a surface of the second buffer layer facing away from the substrate.

[0015] A wiring layer is formed on a surface of the second buffer layer facing away from the substrate and has an undulating structure adapted to the third convex structure.

[0016] According to any of the foregoing embodiments of the first aspect of the present invention, the second buffer layer includes a polydimethylsiloxane material layer or a photoresist material layer.

[0017] According to any of the foregoing embodiments of the first aspect of the present invention, the convex structures on the same surface are connected to each other, or there are gaps formed between the convex structures on the same surface.

[0018] According to any of the foregoing embodiments of the first aspect of the present invention, a surface of the convex structure facing away from the substrate is an arc surface.

[0019] According to any of the foregoing embodiments of the first aspect of the present invention, in a cross-section of the convex structure along a direction perpendicular to the substrate, a maximum distance along a direction parallel to the substrate is less than 3 micrometers.

[0020] According to any of the foregoing embodiments of the first aspect of the present invention, the material of the first electrode is a nanosilver wire.

[0021] An embodiment of the second aspect of the present application further provides a display device, including any display panel provided by the first aspect of the present application.

[0022] In the display panel provided by the present application, a convex structure is formed on a surface of at least one of the first buffer layer and the pixel defining layer facing away from the substrate, so that at least one of the first electrode layer and the second electrode layer has an undulating structure adapted to the convex structure, that is, the first electrode layer and / or the second electrode layer has a margin whose area after flattening is larger than the area of the display panel when not stretched. When subjected to a tensile force, the first electrode layer and / or the second electrode layer having the undulating structure stretches under the action of the tensile force, reducing the damage rate of the first electrode layer and / or the second electrode layer under the action of the tensile force, improving the stretchability of the display panel, and thus improving the display yield of the display panel. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings required to be used in the embodiments of the present application will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present application. For those of ordinary skill in the art, other drawings can be obtained based on these drawings without creative efforts.

[0024] Figure 1 is a schematic structural diagram of a display panel provided by an embodiment of the present application;

[0025] Figure 2 is a schematic structural diagram of another display panel provided by an embodiment of the present application;

[0026] Figure 3 is a schematic structural diagram of yet another display panel provided by an embodiment of the present application;

[0027] Figure 4 is a schematic structural diagram of still another display panel provided by an embodiment of the present application;

[0028] Figure 5 is a schematic structural diagram of a second buffer layer provided by an embodiment of the present application;

[0029] Figure 6 is a schematic structural diagram of a first buffer layer provided by an embodiment of the present application;

[0030] Figure 7 is a schematic structural diagram of a pixel defining layer provided by an embodiment of the present application;

[0031] Figure 8 is a schematic structural diagram of a display device provided by an embodiment of the present application.

[0032] In the drawings:

[0033] 1 - display panel; 10 - substrate; 11 - first buffer layer; 12 - first electrode layer; 13 - pixel defining layer; 14 - second electrode layer; 15 - bump structure; 151 - first bump structure; 152 - second bump structure; 16 - second buffer layer; 161 - third bump structure; 17 - wiring layer; 18 - silicon nitride (SiN) layer; 19 - silicon oxide (SiO) layer; 20 - active layer; 21 - gate insulating layer; 22 - gate; 23 - first insulating layer; 24 - second insulating layer; 25 - capacitor; 251 - first electrode plate; 252 - second electrode plate; 26 - third metal layer; 27 - electron injection layer (EIL); 28 - electron transport layer (ETL); 29 - light emitting layer; 30 - hole transport layer (HTL); 31 - hole injection layer (HIL); 2 - display device. Detailed implementation manners

[0034] The features and exemplary embodiments of various aspects of the present application will be described in detail below. In the following detailed description, numerous specific details are set forth in order to provide a comprehensive understanding of the present application. However, it will be apparent to those skilled in the art that the present application may be practiced without some of these specific details. The following description of the embodiments is merely provided to provide a better understanding of the present application by showing examples of the present application.

[0035] It should be noted that, in this document, relational terms such as first and second are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any actual relationship or order between these entities or operations. Moreover, the terms "comprising", "including" or any other variant thereof are intended to cover non-exclusive inclusion, such that a process, method, article or device comprising a series of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such process, method, article or device. Without further limitation, an element defined by the statement "comprising..." does not exclude the presence of additional identical elements in the process, method, article or device comprising the element.

[0036] The inventors have found through research that to achieve stretchable display of a display panel, it is necessary to increase the stretch coefficient of at least some film layers in the display panel, such as the wiring layer, the first electrode layer, and the second electrode layer, etc., to enhance the stretchable performance of the display panel, reduce the stretch failure rate of the film layers in the display panel during the stretching process, and improve the stretchable performance and display yield of the display panel. Based on the research on the above problems, the inventors provide a display panel and a display device.

[0037] To better understand the present application, the following will be combined with Figures 1 to 8 The display panel and display device according to the embodiments of the present application will be described in detail.

[0038] Please refer to Figure 1 , an embodiment of the present application provides a display panel 1, including a substrate 10, and a first buffer layer 11, a first electrode layer 12, a pixel defining layer 13, and a second electrode layer 14 sequentially formed on the substrate 10.

[0039] The substrate 10 may be a flexible substrate 10 to improve the stretchable performance of the display panel 1. Specifically, the material of the substrate 10 may be polyimide, or other flexible materials or elastomeric materials may also be used, and the present application does not make special limitations. During the preparation process, polyimide may be coated on a glass substrate and cured to form the flexible substrate 10.

[0040] The display panel 1 also includes a buffer layer formed on the substrate 10 and a driver device layer for forming a driver device, the driver device includes a transistor and a capacitor 25, etc. The driver device layer includes an active layer 20, a gate insulating layer 21, a first metal layer, a first insulating layer 23, a second metal layer, a second insulating layer 24, a third metal layer 26, etc. During the preparation process, a silicon nitride (SiN) layer 18 and a silicon oxide (SiO) layer 19 can be sequentially formed on the substrate 10 to serve as a buffer layer and play a buffering role. Then, an active layer 20 is formed on the side of the silicon oxide away from the substrate 10 to form a driving transistor. The material of the active layer 20 can be polysilicon (P-Si) or metal oxide, etc. Then, a gate insulating layer 21 is formed on the side of the active layer 20 facing away from the substrate 10; a first metal layer is formed on the side of the gate insulating layer 21 facing away from the substrate 10, the first metal layer includes a gate 22 and a first electrode 251 of the capacitor 25, etc.; then, a first insulating layer 23 is formed, and a second metal layer is formed on the side of the first insulating layer 23 facing away from the substrate 10, the second metal layer includes a second electrode 252 of the capacitor 25; then, a second insulating layer 24 is formed, and a third metal layer 26 is formed on the second insulating layer 24, the third metal layer 26 includes a source and a drain, etc.

[0041] In the display panel 1, a first buffer layer 11 is formed on one side of a substrate 10; a first electrode layer 12 is formed on a surface of the first buffer layer 11 on a side facing away from the substrate 10, and the first electrode layer 12 includes a plurality of first electrodes; a pixel defining layer 13 is formed on a surface of the first buffer layer 11 on a side facing away from the substrate 10, and includes a plurality of openings corresponding to the first electrodes one by one to expose the first electrodes; a second electrode layer 14 is formed on a surface of the pixel defining layer 13 on a side facing away from the substrate 10 and covers each first electrode; wherein, at least one of the first buffer layer 11 and the pixel defining layer 13 is formed with a protruding structure 15 on a surface of the side facing away from the substrate 10, so that at least one of the first electrode layer 12 and the second electrode layer 14 has an undulating structure adapted to the protruding structure 15.

[0042] In the display panel 1 provided in the present application, a protruding structure 15 is formed on the surface of at least one of the first buffer layer 11 and the pixel defining layer 13 on the side facing away from the substrate 10, so that at least one of the first electrode layer 12 and the second electrode layer 14 has an undulating structure adapted to the convex structure 15, that is, the first electrode layer 12 and / or the second electrode layer 14 has a margin whose area after flattening is larger than the area of ​​the display panel 1 when it is not stretched. When subjected to tension, the first electrode layer 12 and / or the second electrode layer 14 with the undulating structure stretches under the action of the tension, thereby reducing the damage rate of the first electrode layer 12 and / or the second electrode layer 14 under the action of the tension, improving the stretchability of the display panel 1, and thus improving the display yield of the display panel 1.

[0043] In the above-described embodiments, a common layer and a light-emitting layer 29 are further included. The common layer includes a first portion located within the opening of the pixel defining layer 13 and a second portion located on the side of the pixel defining layer 13 away from the substrate 10. The common layer includes some or all of an electron injection layer (EIL) 27, an electron transport layer (ETL) 28, a hole blocking layer (HBL), an electron blocking layer (EBL), a hole transport layer (HTL) 30, and a hole injection layer (HIL) 31. The light-emitting layer 29 is located within the opening of the pixel defining layer 13. In a feasible embodiment, a convex structure 15 is formed on the surface of the first buffer layer 11 on the side away from the substrate 10, so that the first electrode layer 12 formed on the first buffer layer 11 has a undulating structure adapted to the convex structure 15. Specifically, the convex structure 15 includes a first convex structure 151 formed on the surface of the first buffer layer 11 on the side away from the substrate 10, and the first buffer layer 11 includes a polydimethylsiloxane material layer or a photoresist material layer.

[0044] In the above-described embodiments, as Figure 1 shown, a first convex structure 151 is formed on the surface of the first buffer layer 11 on the side away from the substrate 10, and the first electrode layer 12 is formed on the surface of the first buffer layer 11 on the side away from the substrate 10, that is, the first electrode layer 12 is in contact with the first buffer layer 11, so that the first electrode layer 12 has a undulating structure adapted to the first convex structure 151, thereby improving the tensile properties of the first electrode layer 12 and preventing the first electrode layer 12 from being damaged during the stretching process and affecting the light-emitting effect of the display panel 1.

[0045] When the first buffer layer 11 includes a polydimethylsiloxane material layer, a first convex structure 151 is formed on the side of the polydimethylsiloxane material layer away from the substrate 10. During the preparation process, the polydimethylsiloxane material can be coated over the entire surface and then cured to form the polydimethylsiloxane material layer; then a photoresist is coated on the polydimethylsiloxane material layer to form a photoresist layer, and a convex is formed on the photoresist layer, and then ashing is performed to make the polydimethylsiloxane material layer form the first convex structure 151, and then the photoresist layer is removed.

[0046] When the first buffer layer 11 includes a photoresist layer, a first convex structure 151 is formed on the side of the photoresist layer away from the substrate 10. During the preparation process, the photoresist can be coated over the entire surface to form a photoresist layer, and the first convex structure 151 is formed on the photoresist layer.

[0047] There are the following two schemes for forming a convex or the first convex structure 151 on the photoresist layer:

[0048] A thermal reflow solution for photoresist: The photoresist layer is exposed using a mask plate with openings formed thereon. Ultraviolet light can be irradiated on the side of the mask plate facing away from the photoresist layer to expose the photoresist layer. Then, the exposed photoresist layer is developed. Then, multiple first convex structures 151 are formed on the photoresist layer through thermal reflow. Then, it is cured to form a photoresist layer with the first convex structures 151 / bumps.

[0049] Another is a gray-scale mask plate exposure and development solution: The photoresist layer is exposed using a gray-scale mask plate. Ultraviolet light can be irradiated on the side of the mask plate facing away from the photoresist layer to expose the photoresist layer. Then, the exposed photoresist layer is developed. Then, multiple first convex structures 151 are formed on the photoresist layer through an ashing process. Then, it is cured to form a photoresist layer with the first convex structures 151 / bumps.

[0050] Specifically, the material of the first electrode is nanosilver wire.

[0051] The nanosilver wire transparent conductive coating solution can be coated on the surface of the first buffer layer 11 facing away from the substrate 10 through a slit coating process, and patterns are formed by laser etching or chemical etching to form the first electrodes. Since the material of the first electrode is nanosilver wire and the stretching performance of the nanosilver wire is excellent, the stretchability of the display area can be improved. When the first electrode layer 12 has a relief structure and is made of silver nanowire material, the stretchability of the first electrode layer 12 can be further improved.

[0052] In another feasible implementation, as Figure 2 shown, the pixel defining layer 13 forms a convex structure 15 on the surface facing away from the substrate 10, so that the portion of the second electrode layer 14 located on the pixel defining layer 13 has a relief structure adapted to the convex structure 15. Specifically, the convex structure 15 includes a second convex structure 152 formed on the surface of the pixel defining layer 13 facing away from the substrate 10, and the pixel defining layer 13 includes a polydimethylsiloxane material layer or a photoresist material layer.

[0053] In the above implementation, the pixel defining layer 13 forms a second convex structure 152 on the surface facing away from the substrate 10. The portion of the second electrode layer 14 located on the surface of the pixel defining layer 13 facing away from the substrate 10 is in contact with the pixel defining layer 13, so that the portion of the second electrode layer 14 located on the surface of the pixel defining layer 13 facing away from the substrate 10 has a relief structure adapted to the second convex structure 152, thereby improving the stretchability of the second electrode layer 14 and preventing the second electrode layer 14 from being damaged during stretching and affecting the light output effect of the display panel 1.

[0054] Since the pixel defining layer 13 includes openings opposite to the respective first electrodes in the first electrode layer 12, and the second electrode layer 14 includes portions that fall into the openings, that is, the portions opposite to the first electrode layer 12. When the first electrode layer 12 has a undulating structure, the portions of the second electrode layer 14 that fall into the openings have a undulating structure adapted to the first electrode layer 12, thereby further improving the stretching performance of the second electrode layer 14.

[0055] The preparation process of the second convex structure 152 is the same as that of the above-mentioned first convex structure 151, and will not be elaborated in this application.

[0056] In another feasible embodiment, as Figure 3 shown, convex structures 15 are formed on the surfaces of the first buffer layer 11 and the pixel defining layer 13 on the side facing away from the substrate 10. Thus, the first electrode layer 12 formed on the first buffer layer 11 has a undulating structure adapted to the convex structure 15, and the portion of the second electrode layer 14 located on the pixel defining layer 13 has a undulating structure adapted to the convex structure 15, thereby simultaneously improving the stretchability of the first electrode layer 12 and the second electrode layer 14 to improve the stretchability of the display area.

[0057] In the above embodiment, the pixel definition layer includes a polydimethylsiloxane material layer or a photoresist material layer. During the preparation process, the first buffer layer 11 having the first convex structure 151 and the first electrode layer 12 having a undulating structure are formed according to the preparation method of the above-mentioned first convex structure 151; then, a polydimethylsiloxane material is coated on the first electrode layer 12 and the first buffer layer 11 and cured to form a polydimethylsiloxane material layer, or a photoresist material is coated and cured to form a photoresist material layer. Since the first electrode layer 12 has a undulating structure and the first buffer layer 11 has the first convex structure 151, the pixel definition layer can be naturally formed with a second convex structure 152 by controlling the thickness of the pixel definition layer, without adding processes. The process is not only simple but also has better stretchability.

[0058] In a feasible embodiment, as Figure 4 shown, the display panel 1 further includes a second buffer layer 16 and a wiring layer 17. The second buffer layer 16 is formed between the substrate 10 and the first buffer layer 11, and a third convex structure 161 is formed on the surface of the second buffer layer 16 facing away from the substrate 10; the wiring layer 17 is formed on the surface of the second buffer layer 16 facing away from the substrate 10 and has a undulating structure adapted to the third convex structure 161.

[0059] In the above-described embodiment, a third convex structure 161 is formed on a surface of the second buffer layer 16 facing away from the substrate 10. The wiring layer 17 is formed on the surface of the second buffer layer 16 facing away from the substrate 10, that is, the wiring layer 17 is in contact with the second buffer layer 16, so that the wiring layer 17 has a undulating structure adapted to the third convex structure 161, thereby improving the tensile property of the wiring layer 17 and preventing the wiring layer 17 from being damaged during the stretching process and affecting the light-emitting effect of the display panel 1.

[0060] In a feasible embodiment, the second buffer layer 16 includes a polydimethylsiloxane material layer or a photoresist material layer.

[0061] The preparation process of the third convex structure 161 is the same as that of the first convex structure 151 described above, and will not be elaborated in this application.

[0062] When the display panel 1 includes the third convex structure 161, it may simultaneously include the first convex structure 151 and / or the second convex structure 152.

[0063] When the display panel 1 simultaneously includes the first convex structure 151, the second convex structure 152, and the third convex structure 161, the third convex structure 161 can be prepared on the second buffer layer 16, and then the wiring layer 17 can be prepared on the second buffer layer 16. The wiring layer 17 can be formed by a physical vapor deposition (PVD) process and may include Ti-Al-Ti arranged in layers, having a undulating structure adapted to the third convex structure 161.

[0064] Then, a first buffer layer 11 is formed on the second buffer layer 16 and the wiring layer 17. The first buffer layer 11 includes a polydimethylsiloxane material layer or a photoresist material layer. During the preparation process, a polydimethylsiloxane material is coated on the wiring layer 17 and the second buffer layer 16 not covered by the wiring layer 17 and cured to form a polydimethylsiloxane material layer, or a photoresist material is coated and cured to form a photoresist material layer. Since the first buffer layer 11 is in contact with the second buffer layer 16 in part and in contact with the wiring layer 17 in part, and the wiring layer 17 has a undulating structure and the second buffer layer 16 has the third convex structure 161, the first convex structure 151 can be naturally formed on the first buffer layer 11 by controlling the thickness of the first buffer layer 11 without adding a process, which is not only simple in process but also better in stretchability.

[0065] Then, a first electrode layer 12 having a undulating structure is formed on the first buffer layer 11, which is the same as the foregoing embodiment and will not be elaborated in this application.

[0066] Then, a pixel defining layer 13 is formed on the first buffer layer 11 and the first electrode layer 12. The pixel defining layer 13 includes a polydimethylsiloxane material layer or a photoresist material layer. During the preparation process, a polydimethylsiloxane material is coated on the first electrode layer 12 and the first buffer layer 11 not covered by the first electrode layer 12 and cured to form a polydimethylsiloxane material layer, or a photoresist material is coated and cured to form a photoresist material layer. Since part of the pixel defining layer 13 is in contact with the first buffer layer 11 and part is in contact with the first electrode layer 12, and the first electrode layer 12 has an undulating structure and the first buffer layer 11 has a first convex structure 151, the second convex structure 152 can be naturally formed by controlling the thickness of the pixel defining layer without adding a process. This not only simplifies the process but also has better stretchability.

[0067] Finally, a second electrode layer 14 with an undulating structure is formed on the pixel defining layer 13.

[0068] Among them, when the pixel defining layer 13, the first buffer layer 11, and the second buffer layer 16 are made of the same material, the stretching coefficients can be the same, further improving the stretching performance of the display panel 1. For example, the pixel defining layer 13, the first buffer layer 11, and the second buffer layer 16 are all made of photoresist material, or the pixel defining layer 13, the first buffer layer 11, and the second buffer layer 16 are all made of polydimethylsiloxane material layer. At the same time, the temperature range that the polydimethylsiloxane material can tolerate is -60°C to 230°C, so as to avoid affecting the polydimethylsiloxane material layer during the subsequent film layer preparation process. For example, when the first electrode layer 12 is made of nano silver wire material and the curing temperature is 110°C, the high temperature tolerance of the polydimethylsiloxane material can avoid affecting the polydimethylsiloxane material layer under the first electrode layer 12 when forming the first electrode layer 12.

[0069] In a feasible implementation manner, the third convex structures 161 are connected to each other, or there are gaps formed between the third convex structures 161, as Figure 5 shown, and the present application does not make special limitations.

[0070] In a feasible implementation manner, the convex structures 15 on the same surface are connected to each other, or there are gaps formed between the convex structures 15 on the same surface. That is, the first convex structures 151 are connected to each other; or there are gaps formed between the first convex structures 151, as Figure 6 shown. The second convex structures 152 are connected to each other; or there are gaps formed between the second convex structures 152, as Figure 7 shown, and the present application does not make special limitations.

[0071] When the raised structures 15 are connected to each other, a smooth transition of the various parts of the film layer located on the raised structure 15 can be achieved, so that the stress of each part of the film layer located on the raised structure 15 is uniform under the action of tension, thereby reducing the occurrence of film layer breakage on the raised structure 15 and improving its service life. In addition, the various parts of the film layer located on the raised structure 15 can have an undulating structure, with a larger stretching margin and better stretching performance.

[0072] When gaps are formed between the protruding structures 15 , the film layer on the protruding structures 15 has a part with an undulating structure and a part with a flat structure, thereby making the display effect of the display panel more uniform.

[0073] In a feasible implementation, the surface of the protruding structure 15 facing away from the substrate 10 is an arc surface. Thus, the first electrode layer 12 and / or the second electrode layer 14 can have an arc-shaped deformation and a smooth transition, and the thickness of each part is more uniform, which prevents the thickness from suddenly changing and causing the thinner position to be easily broken, thereby improving the tensile performance of the first electrode layer 12 and / or the second electrode layer 14 while ensuring the service life of the first electrode layer 12 and / or the second electrode layer 14.

[0074] The surface of the third protrusion structure 161 facing away from the substrate 10 is also an arc surface. Thus, the wiring layer 17 can have an arc-shaped deformation with a smooth transition, and the thickness of each part is more uniform, which prevents the thickness from suddenly changing and causing the thinner part to be easily broken, thereby improving the tensile performance of the wiring layer 17 and ensuring the service life of the wiring layer 17.

[0075] In a possible implementation, Figure 5 As shown, in the cross section of the third protruding structure 161 along the direction perpendicular to the substrate 10, the maximum distance d along the direction parallel to the substrate 10 is less than 3 microns. When the third protruding structure 161 is formed by a grayscale mask exposure and development scheme, d is set according to the characteristic size of the exposure machine used to form the first protruding structure 161. The smaller d is, the better the display effect and the more uniform the image quality. Figure 6 and Figure 7 As shown, in the cross section of the protruding structure 15 along the direction perpendicular to the substrate 10, the maximum distance d along the direction parallel to the substrate 10 is less than 3 microns. This can improve the uniformity of the display, improve the display effect, and make the tensile properties between adjacent film layers similar. Among them, when the protruding structure 15 is formed by the grayscale mask exposure and development scheme, d is set according to the characteristic size of the exposure machine used to form the protruding structure 15. The smaller d is, the better the display effect and the more uniform the image quality.

[0076] The present application also provides a display device 2, such as Figure 8 As shown, it includes any one of the display panels 1 provided in the above embodiments of the present application.

[0077] The display device 2 can be a mobile terminal such as a mobile phone or a tablet, or can be a device such as a display or a television, or can be a wearable display device that conforms to the human body curve. The present application does not make a special limitation. The display panel 1 in the display device 2 has better stretchability, so that planar stretch display or curved stretch display can be realized. When applied to a wearable display device, since the display panel 1 has better stretchability, when the user's activities cause stretching to the display panel 1, the probability of damage to the display panel 1 and the display device 2 can be reduced, and the service life of the display panel 1 and the display device 2 can be extended.

[0078] According to the embodiments of the present application as described above, these embodiments do not describe all the details in detail, nor do they limit the invention to only the specific embodiments. Obviously, according to the above description, many modifications and variations can be made. These embodiments are selected and specifically described in this specification in order to better explain the principles and practical applications of the present application, so that those skilled in the art can make good use of the present application and its modifications based on the present application. The present application is only limited by the claims and their full scope and equivalents.

Claims

1. A display panel, characterized in that, The display panel is used to achieve stretchable display, and the display panel includes: a substrate; a first buffer layer formed on one side of the substrate; a first electrode layer formed on the surface of the first buffer layer facing away from the substrate, and the first electrode layer includes a plurality of first electrodes; a pixel defining layer formed on the surface of the first buffer layer facing away from the substrate, and includes a plurality of openings corresponding to the first electrodes one by one to expose the first electrodes; a second electrode layer formed on the surface of the pixel defining layer facing away from the substrate and covering each of the first electrodes; a second buffer layer formed between the substrate and the first buffer layer, and a third convex structure is formed on the surface of the second buffer layer facing away from the substrate; a wiring layer formed on the surface of the second buffer layer facing away from the substrate, and has a undulating structure adapted to the third convex structure; Wherein, at least one of the first buffer layer and the pixel defining layer forms a convex structure on the surface facing away from the substrate, so that at least one of the first electrode layer and the second electrode layer has a undulating structure adapted to the convex structure; The convex structure includes a first convex structure formed on the surface of the first buffer layer facing away from the substrate, and the first buffer layer includes a polydimethylsiloxane material layer or a photoresist material layer; the pixel defining layer, the first buffer layer and the second buffer layer are made of the same material.

2. The display panel according to claim 1, wherein The convex structure includes a second convex structure formed on the surface of the pixel defining layer facing away from the substrate, and the pixel defining layer includes a polydimethylsiloxane material layer or a photoresist material layer.

3. The display panel according to claim 1, characterized in that, The second buffer layer includes a polydimethylsiloxane material layer or a photoresist material layer.

4. The display panel according to claim 1, wherein The convex structures located on the same surface are connected to each other, or there is a gap formed between the convex structures located on the same surface.

5. The display panel according to claim 1, wherein The surface of the convex structure facing away from the substrate is an arc surface.

6. The display panel according to claim 1, wherein In the cross section of the convex structure along the direction perpendicular to the substrate, the maximum distance along the direction parallel to the substrate is less than 3 microns.

7. The display panel according to claim 1, characterized in that, The material of the first electrode is nanosilver wire.

8. A display device, characterized in that, A display panel according to any one of claims 1-7.

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