Sampling and measurement methods and equipment

Abstract

The present application provides a sampling measurement method and device. The method includes: periodically sampling and measuring the work-in-progress of the production unit according to the sampling ratio of the production unit corresponding to the process, wherein each production unit is used to complete at least one process; determining the stability index of the production unit corresponding to the process according to the measurement results of the work-in-progress of the production unit corresponding to the process; adjusting the sampling ratio of the production unit corresponding to the process according to the stability index of the production unit corresponding to the process, and using the adjusted sampling ratio as the latest sampling ratio. Thus, on the basis of ensuring the stability of the process, the optimal measurement allocation of the measuring machine is achieved.

Description

Technical Field

[0001] The present application relates to semiconductor technology, and more particularly to a sampling measurement method and device. Background Art

[0002] The production process of semiconductor devices includes multiple processes. In order to monitor process stability and improve product yield, it is necessary to sample and measure the work-in-progress of each process in the production process to determine whether each process meets the quality requirements.

[0003] The current sampling measurement method is often that engineers select a fixed proportion of work-in-progress from each process for measurement based on their own experience. When the capacity of the measurement machine is fixed, such a sampling measurement method is not conducive to achieving the optimal measurement allocation of the measurement machine. Summary of the invention

[0004] The present application provides a sampling measurement method and equipment, which realizes the optimal measurement allocation of the measurement machine on the basis of ensuring process stability.

[0005] In a first aspect, the present application provides a sampling measurement method, comprising:

[0006] Periodically sampling and measuring the work-in-progress of the production unit according to the sampling ratio of the production unit corresponding to the process, wherein each production unit is used to complete at least one process;

[0007] Determining the stability index of the process corresponding to the production unit according to the measurement results of the work-in-progress of the process corresponding to the production unit;

[0008] According to the stability index of the process corresponding to the production unit, the sampling ratio of the process corresponding to the production unit is adjusted, and the adjusted sampling ratio is used as the latest sampling ratio.

[0009] In one embodiment, determining the stability index of the process corresponding to the production unit according to the measurement result of the work-in-progress of the process corresponding to the production unit includes:

[0010] Determine a plurality of stability measurement parameters of the process corresponding to the production unit according to the measurement results of the work-in-progress of the process corresponding to the production unit;

[0011] According to each stability measurement parameter and the weight corresponding to each stability measurement parameter, a stability index of the process corresponding to the production unit is determined.

[0012] In one embodiment, determining the stability index of the process corresponding to the production unit according to each stability measurement parameter and the weight corresponding to each stability measurement parameter includes:

[0013] According to the weight corresponding to each stability measurement parameter, a weighted sum is performed on multiple stability measurement parameters to obtain a stability index of the process corresponding to the production unit.

[0014] In one embodiment, the stability measurement parameter includes at least two of the number of alarms, the number of abnormal measurement results, and a process capability index.

[0015] In one embodiment, adjusting the sampling ratio of the process corresponding to the production unit according to the stability index of the process corresponding to the production unit includes:

[0016] If the stability index of the process corresponding to the production unit is greater than or equal to the first threshold, reducing the sampling ratio of the process corresponding to the production unit;

[0017] If the stability index of the process corresponding to the production unit is less than or equal to the second threshold, the sampling ratio of the process corresponding to the production unit is increased.

[0018] In one embodiment, adjusting the sampling ratio of the process corresponding to the production unit according to the stability index of the process corresponding to the production unit includes:

[0019] If the stability index of the process corresponding to the production unit is greater than or equal to the previous stability index, then reducing the sampling ratio of the process corresponding to the production unit;

[0020] If the stability index of the process corresponding to the production unit is smaller than the previous stability index, the sampling ratio of the process corresponding to the production unit is increased.

[0021] In one embodiment, adjusting the sampling ratio of the process corresponding to the production unit according to the stability index of the process corresponding to the production unit includes:

[0022] If the stability index of the process corresponding to the production unit is greater than or equal to the average value of the stability index within the first preset time period, then reducing the sampling ratio of the process corresponding to the production unit;

[0023] If the stability index of the process corresponding to the production unit is less than the average value of the stability index within the first preset time period, the sampling ratio of the process corresponding to the production unit is increased.

[0024] In one embodiment, the method further comprises:

[0025] If within the second preset time period, the latest sampling ratio of the corresponding process of the production unit is greater than the third threshold, then the stability abnormality alarm information is output.

[0026] In a second aspect, the present application provides a sampling and measuring device, comprising:

[0027] A measuring device, used for periodically sampling and measuring the work-in-progress of the production unit according to the sampling ratio of the production unit corresponding to the process, wherein each production unit is used to complete at least one process;

[0028] The control device is used to determine the stability index of the process corresponding to the production unit according to the measurement results of the work-in-progress of the process corresponding to the production unit; and adjust the sampling ratio of the process corresponding to the production unit according to the stability index of the process corresponding to the production unit, and use the adjusted sampling ratio as the latest sampling ratio.

[0029] In one embodiment, the control device is used to:

[0030] Determine a plurality of stability measurement parameters of the process corresponding to the production unit according to the measurement results of the work-in-progress of the process corresponding to the production unit;

[0031] According to each stability measurement parameter and the weight corresponding to each stability measurement parameter, a stability index of the process corresponding to the production unit is determined.

[0032] In one embodiment, the control device is used to:

[0033] According to the weight corresponding to each stability measurement parameter, a weighted sum is performed on multiple stability measurement parameters to obtain a stability index of the process corresponding to the production unit.

[0034] In one embodiment, the stability measurement parameter includes at least two of the number of alarms, the number of abnormal measurement results, and a process capability index.

[0035] In one embodiment, the control device is used to:

[0036] When the stability index of the process corresponding to the production unit is greater than or equal to the first threshold, reducing the sampling ratio of the process corresponding to the production unit;

[0037] When the stability index of the process corresponding to the production unit is less than or equal to the second threshold, the sampling ratio of the process corresponding to the production unit is increased.

[0038] In one embodiment, the control device is used to:

[0039] When the stability index of the process corresponding to the production unit is greater than or equal to the previous stability index, reducing the sampling ratio of the process corresponding to the production unit;

[0040] When the stability index of the process corresponding to the production unit is smaller than the previous stability index, the sampling ratio of the process corresponding to the production unit is increased.

[0041] In one embodiment, the control device is used to:

[0042] When the stability index of the process corresponding to the production unit is greater than or equal to the average value of the stability index within the first preset time period, reducing the sampling ratio of the process corresponding to the production unit;

[0043] When the stability index of the process corresponding to the production unit is less than the average value of the stability index within the first preset time period, the sampling ratio of the process corresponding to the production unit is increased.

[0044] In one embodiment, the device further comprises: an alarm device, configured to:

[0045] When the latest sampling ratio of the corresponding process of the production unit is greater than the third threshold value within the second preset time period, stability abnormality alarm information is output.

[0046] The present application provides a sampling measurement method and equipment, which periodically samples and measures the work-in-progress of the production unit according to the sampling ratio of the production unit corresponding to the process, determines the stability index of the production unit corresponding to the process according to the measurement result of the work-in-progress of the production unit corresponding to the process, adjusts the sampling ratio of the production unit corresponding to the process according to the stability index of the production unit corresponding to the process, and uses the adjusted sampling ratio as the latest sampling ratio. Since the latest sampling ratio is related to the process stability of the production unit, effective monitoring of the process stability is guaranteed, and optimal measurement allocation of the measurement machine is achieved. BRIEF DESCRIPTION OF THE DRAWINGS

[0047] In order to more clearly illustrate the technical solutions of the embodiments of the present application, a brief introduction will be given below to the drawings required for use in the description of the embodiments. Obviously, the drawings described below are some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without creative labor.

[0048] Figure 1 A schematic diagram of a production unit provided in an embodiment of the present application;

[0049] Figure 2 A schematic diagram of a flow chart of a sampling and measuring method provided in an embodiment of the present application;

[0050] Figure 3 A sampling ratio fluctuation curve provided in an embodiment of the present application;

[0051] Figure 4 A schematic diagram of the structure of a sampling and measuring device provided in an embodiment of the present application. DETAILED DESCRIPTION

[0052] In order to make the purpose, technical solution and advantages of the embodiments of the present application clearer, the technical solution in the embodiments of the present application will be clearly and completely described below in conjunction with the drawings in the embodiments of the present application. Obviously, the described embodiments are part of the embodiments of the present application, not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of this application.

[0053] Before describing the sampling and measuring method provided by the present application, the production process of semiconductor devices is described first. The production process of semiconductor devices includes multiple processes, which can be completed in one or more production units of a production machine. Each production unit can be used to complete one or more processes, such as Figure 1 As shown in , the production unit can be a chamber in a production machine. In order to monitor process stability and improve product yield, during the production of semiconductor devices, samples of work-in-progress of each process in the production machine are measured to determine whether the work-in-progress produced by each process meets quality requirements.

[0054] After sampling the work-in-progress, the measurement process is completed by the measuring machine. Since the capacity of the measuring machine is fixed, engineers often select a fixed proportion of work-in-progress from each process for measurement based on their own experience during sampling to avoid excessive sampling that exceeds the capacity of the measuring machine. However, this sampling and measurement method that relies on manual experience is not conducive to achieving the optimal measurement allocation of the measuring machine. For this reason, a method for dynamically adjusting the sampling and measurement ratio is proposed in the embodiment of the present application to achieve the optimal measurement allocation of the measuring machine while ensuring the stability of the process.

[0055] The sampling and measuring method provided by the present application is described in detail below in conjunction with specific embodiments. It is understandable that the following specific embodiments can be combined with each other, and the same or similar concepts or processes may not be described in detail in some embodiments.

[0056] Figure 2 A flow chart of a sampling and measuring method provided in an embodiment of the present application. Figure 2 As shown, the sampling measurement method includes:

[0057] S201. Periodically sample and measure the work-in-progress of the production unit according to the sampling ratio of the production unit corresponding to the process.

[0058] Each production unit is used to complete at least one process.

[0059] The process corresponding to the production unit is the process that the production unit is currently used to complete. In the embodiment of the present application, the sampling ratio of the production unit corresponding to the process is dynamically adjusted. When sampling for the first time, the sampling ratio of the production unit corresponding to the process can be pre-set, such as a pre-set empirical value. For the second and subsequent samplings, the sampling ratio of the production unit corresponding to the process can be the latest sampling ratio after dynamic adjustment. It can be understood that in the periodic sampling and measurement of the work-in-progress of the production unit stated in this step, each sampling and measurement is performed according to the latest sampling ratio.

[0060] Different production units can be used to complete the same or different processes. For different production units that complete the same process, the sampling ratios of the corresponding processes may be the same or different; for different production units that complete different processes, the sampling ratios of the corresponding processes may be the same or different. The sampling ratio of the corresponding process of each production unit is dynamically adjusted according to the method of the embodiments of the present application.

[0061] S202. Determine a stability index of the process corresponding to the production unit according to the measurement result of the work-in-progress of the process corresponding to the production unit.

[0062] After sampling the work-in-process of the corresponding process of the production unit each time, the sampled work-in-process is measured using a measuring machine to obtain a measurement result. The measurement result can characterize the stability of the production unit in completing the process. Therefore, the stability index of the production unit's corresponding process can be determined based on the measurement result of the work-in-process of the corresponding process of the production unit.

[0063] S203. According to the stability index of the process corresponding to the production unit, the sampling ratio of the process corresponding to the production unit is adjusted, and the adjusted sampling ratio is used as the latest sampling ratio.

[0064] If the stability index of the production unit corresponding to the process indicates that the production unit completes the process more stably, the sampling ratio of the production unit corresponding to the process can be reduced to reduce its sampling measurement. If the stability index of the production unit corresponding to the process indicates that the production unit completes the process more stably, the sampling ratio of the production unit corresponding to the process can be increased to increase its sampling measurement. The adjusted sampling ratio is used as the latest sampling ratio, so that the latest sampling ratio is used for sampling measurement next time, thereby ensuring effective monitoring of process stability and achieving optimal measurement allocation of measuring equipment.

[0065] The sampling and measurement method of the embodiment of the present application periodically samples and measures the work-in-progress of the production unit according to the sampling ratio of the production unit corresponding to the process, determines the stability index of the production unit corresponding to the process according to the measurement result of the work-in-progress of the production unit corresponding to the process, adjusts the sampling ratio of the production unit corresponding to the process according to the stability index of the production unit corresponding to the process, and uses the adjusted sampling ratio as the latest sampling ratio. Since the latest sampling ratio is related to the process stability of the production unit, effective monitoring of the process stability is guaranteed, and optimal measurement allocation of the measuring machine is achieved.

[0066] Based on the above embodiment, the determination of the stability index of the process corresponding to the production unit according to the measurement result of the work-in-progress of the process corresponding to the production unit in S202 is described.

[0067] Optionally, multiple stability measurement parameters of the process corresponding to the production unit are determined based on the measurement results of the work-in-progress of the process corresponding to the production unit; and the stability index of the process corresponding to the production unit is determined based on each stability measurement parameter and the weight corresponding to each stability measurement parameter.

[0068] The process stability of the process corresponding to the production unit can be measured from multiple aspects, that is, the process stability of the process corresponding to the production unit can be measured by multiple stability measurement parameters. Therefore, according to the measurement results of the work-in-progress of the process corresponding to the production unit, each stability measurement parameter of the process corresponding to the production unit is determined respectively. Since the influence of each stability measurement parameter on the process stability of the process corresponding to the production unit may be different, that is, the importance of each stability measurement parameter may be different, a corresponding weight can be set for each stability measurement parameter, and the stability index of the process corresponding to the production unit is determined according to each stability measurement parameter and the weight corresponding to each stability measurement parameter.

[0069] Optionally, the stability index of the process corresponding to the production unit is determined according to each stability measurement parameter and the weight corresponding to each stability measurement parameter, including: according to the weight corresponding to each stability measurement parameter, weighted summation of multiple stability measurement parameters is performed to obtain the stability index of the process corresponding to the production unit.

[0070] Optionally, the stability measurement parameters include at least two of the number of alarms, the number of abnormal measurement results, and the process capability index. The process capability index (CP or CPK) is a measure of the actual production capacity of a production machine under control for a certain period of time (the ability to meet the process technology requirements). The larger the process capability index, the stronger the process capability, that is, the higher the ability of the produced wafers to meet the requirements; and the larger the number of alarms and the number of abnormal measurement results, the more unstable the process.

[0071] Since the larger the process capability index is, the stronger the process capability is, and the larger the number of alarms and the number of abnormal measurement results are, the more unstable the process is. Optionally, when calculating the stability index, the inverse of the number of alarms and the number of abnormal measurement results can be calculated first, and then weighted summed with the process capability index. The larger the stability index is, the more stable the process is. Optionally, the inverse of the number of alarms, the inverse of the number of abnormal measurement results, and the process capability index are multiplied by the corresponding weights, and the weighted sum is performed to obtain the stability index. Optionally, when calculating the stability index, the inverse of the process capability index can be calculated first, and then weighted summed with the number of alarms and the number of abnormal measurement results. The smaller the stability index is, the more stable the process is. Optionally, the number of alarms, the number of abnormal measurement results, and the inverse of the process capability index are multiplied by the corresponding weights, and the weighted sum is performed to obtain the stability index.

[0072] For example, a production unit is used to complete the process of growing 100nm silicon dioxide (SiO2). After sampling and measuring the production unit, the stability measurement parameters obtained include the number of alarms 2, the number of abnormal measurement results 5, and the process capability index 1.5. If the weights of the number of alarms, the number of abnormal measurement results, and the process capability index are 0.2, 0.4, and 0.4, respectively, the reciprocal of the number of alarms, the reciprocal of the number of abnormal measurement results, and the process capability index are weighted and summed according to the weights, and the stability index of the corresponding process of the production unit is 0.78. Furthermore, the sampling ratio of the corresponding process of the production unit can be adjusted according to the stability index.

[0073] Based on the above embodiment, the adjustment of the sampling ratio of the production unit corresponding to the process according to the stability index of the production unit corresponding to the process in S203 is further described. It should be noted that in the following embodiments, the larger the stability index, the more stable the process. For the case where the smaller the stability index, the more stable the process, the adjustment of the sampling ratio is opposite to that in the following embodiments.

[0074] Optionally, if the stability index of the process corresponding to the production unit is greater than or equal to a first threshold, the sampling ratio of the process corresponding to the production unit is reduced; if the stability index of the process corresponding to the production unit is less than or equal to a second threshold, the sampling ratio of the process corresponding to the production unit is increased.

[0075] For example, assuming that the first threshold is 4 and the second threshold is 2, if the stability index of the production unit corresponding process is greater than or equal to 4, it means that the production unit process is relatively stable, and the sampling ratio of the production unit corresponding process can be reduced, so that the production capacity of the measurement machine can be used for other production units corresponding processes. If the stability index of the production unit corresponding process is less than or equal to 2, it means that the production unit process is relatively unstable, and the sampling ratio of the production unit corresponding process can be increased to increase the monitoring of the stability of the production unit corresponding process and ensure the product yield. If the stability index of the production unit corresponding process is greater than 2 and less than 4, the sampling ratio of the production unit corresponding process can be left unchanged, and sampling and measurement can continue to be performed according to the original sampling ratio.

[0076] Optionally, if the stability index of the process corresponding to the production unit is greater than or equal to the previous stability index, the sampling ratio of the process corresponding to the production unit is reduced; if the stability index of the process corresponding to the production unit is less than the previous stability index, the sampling ratio of the process corresponding to the production unit is increased.

[0077] For example, assuming that the stability index of the process corresponding to the production unit in the previous sampling measurement was 4, and the stability index in this sampling measurement was 5, it means that the stability of the process corresponding to the production unit has improved compared with the previous sampling measurement. Therefore, the sampling ratio of the process corresponding to the production unit can be reduced, so that the production capacity of the measuring machine can be used for other processes corresponding to the production unit. Assuming that the stability index of the process corresponding to the production unit in the previous sampling measurement was 4, and the stability index in this sampling measurement was 4, it means that the stability of the process corresponding to the production unit has not changed, that is, the process corresponding to the production unit has been relatively stable. Therefore, the sampling ratio of the process corresponding to the production unit can be reduced, so that the production capacity of the measuring machine can be used for other processes corresponding to the production unit. Assuming that the stability index of the corresponding process of the production unit in the previous sampling measurement was 3, and the stability index of the current sampling measurement was 2, it means that the stability of the corresponding process of the production unit has decreased compared with the previous sampling measurement. Therefore, it is necessary to increase the sampling ratio of the corresponding process of the production unit to increase the monitoring of the stability of the corresponding process of the production unit and ensure the product yield.

[0078] It should be noted that when comparing the stability index of the corresponding process of the production unit during this sampling and measurement with the stability index of the previous time, if the difference between the two is small, for example, the difference is less than the preset difference threshold, then it can be considered that the stability index this time is the same as the previous stability index. When the stability index this time is less than the stability index of the previous time, and the difference is greater than or equal to the preset difference threshold, it is determined that the stability index of the corresponding process of the production unit is less than the stability index of the previous time, thereby avoiding repeated adjustment of the sampling ratio when the stability index has not changed significantly.

[0079] Optionally, if the stability index of the process corresponding to the production unit is greater than or equal to the average value of the stability index within the first preset time period, the sampling ratio of the process corresponding to the production unit is reduced; if the stability index of the process corresponding to the production unit is less than the average value of the stability index within the first preset time period, the sampling ratio of the process corresponding to the production unit is increased.

[0080] Multiple sampling measurements are performed within a first preset time period, and the stability index of each sampling measurement is determined, and then the average value of the stability index within the first preset time period is determined. The process stability of the production unit within a period of time is ensured by the average value of the stability index within the first preset time period, and the length of the first preset time period can be set as needed. For example, assuming that the stability index of the current sampling measurement of the production unit corresponding to the process is 4, and the average value of the stability index in the first preset time period before the current sampling measurement is 3, it means that the stability of the production unit corresponding to the process is improved compared with the previous first preset time period. Therefore, the sampling ratio of the production unit corresponding to the process can be reduced, so that the production capacity of the measuring machine can be used for other production units corresponding processes. Assuming that the stability index of the current sampling measurement of the production unit corresponding to the process is 4, and the average value of the stability index in the first preset time period before the current sampling measurement is 4, it means that the stability of the production unit corresponding to the process has not changed, that is, the production unit corresponding to the process has been relatively stable. Therefore, the sampling ratio of the production unit corresponding to the process can also be reduced, so that the production capacity of the measuring machine can be used for other production units corresponding processes. Assuming that the stability index of the current sampling measurement of the corresponding process of the production unit is 4, and the average value of the stability index in the first preset time period before the current sampling measurement is 5, it means that the stability of the corresponding process of the production unit has decreased compared with the previous first preset time period. Therefore, it is necessary to increase the sampling ratio of the corresponding process of the production unit to increase the monitoring of the stability of the corresponding process of the production unit and ensure the product yield.

[0081] It should be noted that when adjusting the sampling ratio, for each production unit, after multiple sampling measurements are performed and the stability index of each sampling measurement is determined, the sampling ratio can be measured according to the stability index of the multiple sampling measurements. For example, the stability index of multiple sampling measurements can be weighted and summed, and the sampling ratio can be measured according to the stability index obtained by the weighted sum. Optionally, the weight of the stability index of the sampling measurement closer to the current time can be set to be larger, while the weight of the stability index farther from the current time can be set to be smaller, so as to ensure that the stability index can not only characterize the stability of the corresponding process of the production unit over a period of time, but also characterize the current stability of the corresponding process of the production unit.

[0082] On the basis of the above-mentioned embodiment, in the method of the embodiment of the present application, an alarm can also be issued for process stability according to the sampling ratio.

[0083] Optionally, if within the second preset time period, the latest sampling ratios of the corresponding processes of the production units are all greater than the third threshold value, a stability abnormality alarm message is output.

[0084] By analyzing the latest sampling ratio of each sampling measurement within the second preset time period, the process stability can be monitored. For example, Figure 3 The sampling ratio fluctuation curve shown in is used to monitor the process stability, and the length of the second preset time period can be set as needed. If the latest sampling ratio of the process corresponding to the production unit is always greater than the third threshold value, it means that the process stability of the process corresponding to the production unit has always been poor, which causes the sampling ratio to continue to remain at a high level and cannot be reduced. Therefore, in this case, a stability abnormality alarm message can be output to prompt taking preventive measures to solve the problem.

[0085] Optionally, in an embodiment of the present application, for specific products or specific processes, a measurement method with a fixed sampling ratio can be adopted. That is, for specific products or specific processes, the sampling ratio is not adjusted according to stability measurement parameters or stability indicators to ensure that the needs of some special situations are met.

[0086] Optionally, in an embodiment of the present application, when adjusting the sampling ratio, upper and lower limits of the sampling ratio can be set to ensure that the measuring machine is not overloaded or does not perform any measurement. The upper and lower limits of the sampling ratio corresponding to the process of different production units may be different, and can be set specifically according to actual conditions.

[0087] It should also be noted that the values ​​of the first threshold, the second threshold, the stability measurement parameter, the weight or the stability index in the aforementioned embodiments are only used to illustrate the methods of the embodiments of the present application. In actual applications, these values ​​can be obtained based on actual conditions or measured or calculated based on actual conditions.

[0088] Figure 4 This is a schematic diagram of the results of a sampling and measuring device provided in an embodiment of the present application. Figure 4 As shown, the sampling and measuring device 400 includes:

[0089] The measuring device 401 is used to periodically sample and measure the work-in-progress of the production unit according to the sampling ratio of the production unit corresponding to the process, wherein each production unit is used to complete at least one process;

[0090] The control device 402 is used to determine the stability index of the process corresponding to the production unit according to the measurement results of the work-in-progress of the process corresponding to the production unit; and adjust the sampling ratio of the process corresponding to the production unit according to the stability index of the process corresponding to the production unit, and use the adjusted sampling ratio as the latest sampling ratio.

[0091] In one embodiment, the control device 402 is used to:

[0092] Determine multiple stability measurement parameters of the process corresponding to the production unit according to the measurement results of the work-in-progress of the process corresponding to the production unit;

[0093] According to each stability measurement parameter and the weight corresponding to each stability measurement parameter, the stability index of the corresponding process of the production unit is determined.

[0094] In one embodiment, the control device 402 is used to:

[0095] According to the weight corresponding to each stability measurement parameter, multiple stability measurement parameters are weighted and summed to obtain the stability index of the corresponding process of the production unit.

[0096] In one embodiment, the stability measurement parameter includes at least two of the number of alarms, the number of abnormal measurement results, and a process capability index.

[0097] In one embodiment, the control device 402 is used to:

[0098] When the stability index of the process corresponding to the production unit is greater than or equal to the first threshold, reducing the sampling ratio of the process corresponding to the production unit;

[0099] When the stability index of the process corresponding to the production unit is less than or equal to the second threshold, the sampling ratio of the process corresponding to the production unit is increased.

[0100] In one embodiment, the control device 402 is used to:

[0101] When the stability index of the process corresponding to the production unit is greater than or equal to the previous stability index, the sampling ratio of the process corresponding to the production unit is reduced;

[0102] When the stability index of the process corresponding to the production unit is less than the previous stability index, the sampling ratio of the process corresponding to the production unit is increased.

[0103] In one embodiment, the control device 402 is used to:

[0104] When the stability index of the process corresponding to the production unit is greater than or equal to the average value of the stability index within the first preset time period, reducing the sampling ratio of the process corresponding to the production unit;

[0105] When the stability index of the process corresponding to the production unit is less than the average value of the stability index within the first preset time period, the sampling ratio of the process corresponding to the production unit is increased.

[0106] In one embodiment, the sampling and measuring device 400 further includes an alarm device, which is used to output stability abnormality alarm information when the latest sampling ratio of the corresponding process of the production unit is greater than a third threshold value within a second preset time period.

[0107] The sampling and measuring device provided in the embodiment of the present application is used to implement the sampling and measuring method in the aforementioned embodiment. Its implementation principle and technical effect are similar and will not be repeated here.

[0108] Those skilled in the art can understand that all or part of the steps of implementing the above-mentioned method embodiments can be completed by hardware related to program instructions. The aforementioned program can be stored in a computer-readable storage medium. When the program is executed, the steps of the above-mentioned method embodiments are executed; and the aforementioned storage medium includes: ROM, RAM, disk or optical disk and other media that can store program codes.

[0109] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present application, rather than to limit it. Although the present application has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that they can still modify the technical solutions described in the aforementioned embodiments, or replace some or all of the technical features therein with equivalents. However, these modifications or replacements do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of the present application.

Claims

1. A sampling and measuring method, characterized in that: include: Periodically sampling and measuring the work-in-progress of the production unit according to the sampling ratio of the production unit corresponding to the process, wherein each production unit is used to complete at least one process; Determining the stability index of the process corresponding to the production unit according to the measurement results of the work-in-progress of the process corresponding to the production unit; According to the stability index of the process corresponding to the production unit, the sampling ratio of the process corresponding to the production unit is adjusted, and the adjusted sampling ratio is used as the latest sampling ratio; Determining the stability index of the process corresponding to the production unit according to the measurement result of the work-in-progress of the process corresponding to the production unit includes: Determine a plurality of stability measurement parameters of the process corresponding to the production unit according to the measurement results of the work-in-progress of the process corresponding to the production unit; According to each stability measurement parameter and the weight corresponding to each stability measurement parameter, a stability index of the process corresponding to the production unit is determined.

2. The method according to claim 1, characterized in that The step of determining the stability index of the process corresponding to the production unit according to each stability measurement parameter and the weight corresponding to each stability measurement parameter includes: According to the weight corresponding to each stability measurement parameter, a weighted sum is performed on multiple stability measurement parameters to obtain a stability index of the process corresponding to the production unit.

3. The method according to any one of claims 1 to 2, characterized in that: The stability measurement parameters include at least two of the number of alarms, the number of abnormal measurement results, and a process capability index.

4. The method according to any one of claims 1 to 2, characterized in that: The step of adjusting the sampling ratio of the process corresponding to the production unit according to the stability index of the process corresponding to the production unit comprises: If the stability index of the process corresponding to the production unit is greater than or equal to the first threshold, reducing the sampling ratio of the process corresponding to the production unit; If the stability index of the process corresponding to the production unit is less than or equal to the second threshold, the sampling ratio of the process corresponding to the production unit is increased.

5. The method according to any one of claims 1-2, characterized in that: The step of adjusting the sampling ratio of the process corresponding to the production unit according to the stability index of the process corresponding to the production unit comprises: If the stability index of the process corresponding to the production unit is greater than or equal to the previous stability index, then reducing the sampling ratio of the process corresponding to the production unit; If the stability index of the process corresponding to the production unit is smaller than the previous stability index, the sampling ratio of the process corresponding to the production unit is increased.

6. The method according to any one of claims 1-2, characterized in that: The step of adjusting the sampling ratio of the process corresponding to the production unit according to the stability index of the process corresponding to the production unit comprises: If the stability index of the process corresponding to the production unit is greater than or equal to the average value of the stability index within the first preset time period, then reducing the sampling ratio of the process corresponding to the production unit; If the stability index of the process corresponding to the production unit is less than the average value of the stability index within the first preset time period, the sampling ratio of the process corresponding to the production unit is increased.

7. The method according to any one of claims 1-2, characterized in that: The method further comprises: If within the second preset time period, the latest sampling ratio of the corresponding process of the production unit is greater than the third threshold, then the stability abnormality alarm information is output.

8. A sampling and measuring device, characterized in that: include: A measuring device, used for periodically sampling and measuring the work-in-progress of the production unit according to the sampling ratio of the production unit corresponding to the process, wherein each production unit is used to complete at least one process; A control device, for determining a stability index of the process corresponding to the production unit according to a measurement result of the work-in-progress of the process corresponding to the production unit; and adjusting a sampling ratio of the process corresponding to the production unit according to the stability index of the process corresponding to the production unit, and using the adjusted sampling ratio as the latest sampling ratio; The control device is used to: Determine a plurality of stability measurement parameters of the process corresponding to the production unit according to the measurement results of the work-in-progress of the process corresponding to the production unit; According to each stability measurement parameter and the weight corresponding to each stability measurement parameter, a stability index of the process corresponding to the production unit is determined.

9. The device according to claim 8, characterized in that The control device is used to: According to the weight corresponding to each stability measurement parameter, a weighted sum is performed on multiple stability measurement parameters to obtain a stability index of the process corresponding to the production unit.

10. The device according to any one of claims 8 to 9, characterized in that: The control device is used to: When the stability index of the process corresponding to the production unit is greater than or equal to the first threshold, reducing the sampling ratio of the process corresponding to the production unit; When the stability index of the process corresponding to the production unit is less than or equal to the second threshold, the sampling ratio of the process corresponding to the production unit is increased.

11. The device according to any one of claims 8 to 9, characterized in that: The control device is used to: When the stability index of the process corresponding to the production unit is greater than or equal to the previous stability index, reducing the sampling ratio of the process corresponding to the production unit; When the stability index of the process corresponding to the production unit is smaller than the previous stability index, the sampling ratio of the process corresponding to the production unit is increased.

12. The device according to any one of claims 8 to 9, characterized in that: The control device is used to: When the stability index of the process corresponding to the production unit is greater than or equal to the average value of the stability index within the first preset time period, reducing the sampling ratio of the process corresponding to the production unit; When the stability index of the process corresponding to the production unit is less than the average value of the stability index within the first preset time period, the sampling ratio of the process corresponding to the production unit is increased.

13. The device according to any one of claims 8 to 9, characterized in that: The device also includes: an alarm device, which is used to: When the latest sampling ratio of the corresponding process of the production unit is greater than the third threshold value within the second preset time period, the stability abnormality alarm information is output.

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