A method for manufacturing a color filter

Abstract

The invention discloses a method for manufacturing a color filter, which belongs to the technical field of color filter manufacturing. An effective area and an ineffective area are arranged on a substrate; a first mask pattern is used to form a plurality of first color resist blocks on the effective area of ​​the substrate, and at least one first color resist block is formed in the ineffective area; a second mask pattern is used to form a plurality of second color resist blocks on the effective area of ​​the substrate, and at least one second color resist block is formed in the ineffective area; a third mask pattern is used to form a plurality of third color resist blocks on the effective area of ​​the substrate, and a first detection pattern and a second detection pattern are used to form at least one first detection frame and at least one second detection frame in the ineffective area; an alignment pattern is used to form at least one alignment mark in the ineffective area; the method can effectively overcome the problem that the thermal expansion and contraction of the substrate causes the substrate to be misaligned with a driving base plate, affecting display quality.

Description

Technical Field

[0001] The invention belongs to the technical field of color filter manufacturing, and relates to a method for manufacturing a color filter. Background Art

[0002] Color filters are important components of display structures. With the development of market demand, flexible, lightweight, and high-quality display devices are becoming increasingly important. However, existing color filters require a large amount of data collection and processing to determine the sub-pixel deviation, which is manpower-consuming and inefficient. Substrate deformation and alignment accuracy will affect the module fitting accuracy, resulting in fitting deviation that affects display quality. Summary of the invention

[0003] The purpose of the present invention is to provide a method for manufacturing a color filter, which solves the problem that the existing color filter needs to collect and process a large amount of data to determine the sub-pixel deviation, which is manpower-consuming and inefficient; the deformation and alignment accuracy of the substrate will affect the module fitting accuracy, resulting in the fitting deviation affecting the display quality.

[0004] The technical solution adopted by the present invention is as follows:

[0005] A method for manufacturing a color filter, comprising:

[0006] An effective area and an ineffective area are set on the substrate, the effective area is used to form a first color block, a second color block and a third color block arranged in a matrix, and the ineffective area is set around the effective area;

[0007] The mask includes a first mask pattern, a second mask pattern, and a third mask pattern;

[0008] Wherein, a plurality of first color resist blocks are formed on the effective area of ​​the substrate through the first mask pattern, and at least one first color resist block is formed in the ineffective area;

[0009] Forming a plurality of second color blocks on the effective area of ​​the substrate and forming at least one second color block on the ineffective area by using a second mask pattern;

[0010] The third mask pattern includes a first detection pattern and a second detection pattern, and a plurality of third color resist blocks are formed on the effective area of ​​the substrate through the third mask pattern, and at least one first detection frame and at least one second detection frame are formed in the ineffective area through the first detection pattern and the second detection pattern, wherein the first detection frame frames a corresponding first color resist block, and the second detection frame frames a corresponding second color resist block;

[0011] The first mask pattern, the second mask pattern or the third mask pattern includes an alignment pattern, and at least one alignment mark is formed in the non-effective area through the alignment pattern.

[0012] Furthermore, the manufacturing of the photomask comprises the following steps:

[0013] Obtain the expansion and contraction of the substrate in length and width before and after the process;

[0014] According to the expansion and contraction of the length and width directions of the substrate before and after the process, the target value of the first color block, the target value of the second color block and the target value of the third color block, the design values ​​of the first color block, the second color block and the third color block are determined respectively;

[0015] Determine the target values ​​of the first detection frame and the second detection frame according to the cell size of the driving base plate, the target value of the first color block, and the target value of the second color block; determine the design values ​​of the first detection frame and the second detection frame according to the target values ​​of the first detection frame and the second detection frame, and the expansion and contraction of the length and width directions of the substrate before and after the process;

[0016] The base plate is fitted with the driving base plate;

[0017] Obtain the horizontal distance and vertical distance between the first color block, the second color block, the third color block and the positioning Mark on the driving base plate, and determine the positions of the first mask pattern, the second mask pattern and the third mask pattern in the mask according to the expansion and contraction of the length and width directions of the substrate before and after the process;

[0018] Obtain the horizontal distance and vertical distance between the first detection frame, the second detection frame and the positioning Mark on the driving base plate, and determine the positions of the first detection pattern and the second detection pattern corresponding to the first detection frame and the second detection frame in the third mask pattern according to the expansion and contraction of the length and width directions of the substrate before and after the process;

[0019] Obtain the horizontal distance and vertical distance between the alignment Mark and the positioning Mark on the driving base plate to determine the position of the alignment pattern corresponding to the alignment Mark on the first mask pattern, the second mask pattern or the third mask pattern;

[0020] A mask is manufactured according to the first mask pattern, the second mask pattern, or the third mask pattern.

[0021] Furthermore, the first detection frame is a block whose length and width are greater than those of the first alignment color block, and the second detection frame is a block whose length and width are greater than those of the second alignment color block.

[0022] Furthermore, the first mask pattern includes a first alignment and fitting pattern, the second mask pattern includes a second alignment and fitting pattern, and the third mask pattern includes a third alignment and fitting pattern. The first alignment and fitting pattern forms a first alignment and fitting mark in the non-effective area, the second alignment and fitting pattern forms a second alignment and fitting mark in the non-effective area, and the third alignment and fitting pattern forms a third alignment and fitting mark in the non-effective area.

[0023] Furthermore, the manufacturing of the first alignment lamination pattern, the second alignment lamination pattern and the third alignment lamination pattern comprises the following steps:

[0024] Determine the design values ​​of the first alignment mark, the second alignment mark, and the third alignment mark according to the expansion and contraction of the length and width directions of the substrate before and after the process, the target value of the first alignment mark, the target value of the second alignment mark, and the target value of the third alignment mark;

[0025] Based on the expansion and contraction of the substrate in length and width before and after the process, the length and width between the first alignment bonding Mark, the second alignment bonding Mark and the third alignment bonding Mark and the positioning Mark of the driving base plate respectively determine the positions of the first alignment bonding pattern, the second alignment bonding pattern and the third alignment bonding pattern corresponding to the first alignment bonding Mark, the second alignment bonding Mark and the third alignment bonding Mark in the first mask pattern, the second mask pattern and the third mask pattern.

[0026] In summary, due to the adoption of the above technical solution, the beneficial effects of the present invention are:

[0027] 1. The present invention can quickly determine the deviation of the color filter according to the positional relationship between the first detection frame and the first color block in the ineffective area, and the positional relationship between the second detection frame and the second color block in the ineffective area. If the first color block in the ineffective area is located in the first detection frame and the second color block in the ineffective area is located in the second detection frame, the substrate of the color filter meets the requirements. Otherwise, it does not meet the requirements. The deviation data in each direction can be measured according to the relative position difference, which can effectively overcome the influence of the deviation between the substrate and the driving base plate caused by thermal expansion and contraction of the substrate on the display quality, save labor costs, improve work efficiency, and reduce the defective rate. The substrate of the color filter corresponds to the positioning mark on the driving base plate through the alignment mark to determine the fitting position.

[0028] 2. The present invention uses the first alignment fitting Mark, the second alignment fitting Mark and the third alignment fitting Mark on the non-effective area. During bonding, the relative offsets of the first alignment fitting Mark, the second alignment fitting Mark and the third alignment fitting Mark can be comprehensively considered, and the center values ​​of the three offsets are selected as the bonding adjustment values ​​to quickly determine the bonding parameter adjustment direction, improve the bonding accuracy, improve the display quality, and improve the display effect. BRIEF DESCRIPTION OF THE DRAWINGS

[0029] In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the following briefly introduces the drawings required for use in the embodiments. It should be understood that the following drawings only illustrate certain embodiments of the present invention and should not be regarded as limiting the scope. For those skilled in the art, other related drawings can be obtained based on these drawings without creative work, among which:

[0030] Figure 1 is a schematic structural diagram of a color filter of the present invention;

[0031] Figure 2 It is a structural schematic diagram of a color filter with alignment and lamination Mark of the present invention;

[0032] Figure 3 It is a schematic structural diagram of the photomask of the present invention;

[0033] Figure 4 It is a structural schematic diagram of a photomask with an alignment and lamination pattern of the present invention;

[0034] Markings in the figure: 1-non-effective area, 2-effective area, 3-first color block, 4-second color block, 5-third color block, 6-first detection frame, 7-second detection frame, 8-alignment Mark, 9-first alignment and fitting Mark, 10-second alignment and fitting Mark, 11-third alignment and fitting Mark, 12-first mask pattern, 13-alignment pattern, 14-second mask pattern, 15-third mask pattern, 16-first detection pattern, 17-second detection pattern, 18-first alignment and fitting pattern, 19-second alignment and fitting pattern, 20-third alignment and fitting pattern. DETAILED DESCRIPTION

[0035] In order to make the purpose, technical scheme and advantages of the present invention more clearly understood, the present invention is further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present invention and are not used to limit the present invention, that is, the embodiments described are only part of the embodiments of the present invention, rather than all of the embodiments. The components of the embodiments of the present invention described and shown in the drawings herein can be arranged and designed in various different configurations.

[0036] Therefore, the following detailed description of the embodiments of the present invention provided in the accompanying drawings is not intended to limit the scope of the invention claimed for protection, but merely represents selected embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without making creative work are within the scope of protection of the present invention.

[0037] It should be noted that relational terms such as "first" and "second" are used only to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the terms "include", "comprise" or any other variants thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or device. In the absence of further restrictions, the elements defined by the sentence "comprise a ..." do not exclude the existence of other identical elements in the process, method, article or device including the elements.

[0038] Example 1

[0039] like Figure 1 , Figure 3 As shown, the present invention provides a method for manufacturing a color filter, comprising:

[0040] A method for manufacturing a color filter, comprising:

[0041] An effective area 2 and an ineffective area 1 are set on the substrate, the effective area 2 is used to form a first color block 3, a second color block 4 and a third color block 5 arranged in a matrix, and the ineffective area 1 is set around the effective area 2;

[0042] The mask includes a first mask pattern 12, a second mask pattern 14, and a third mask pattern 15;

[0043] Among them, a plurality of first color blocks 3 are formed on the effective area 2 of the substrate through the first mask pattern 12, and at least one first color block 3 is formed in the ineffective area 1;

[0044] A plurality of second color blocks 4 are formed on the effective area 2 of the substrate and at least one second color block 4 is formed on the ineffective area 1 by using a second mask pattern 14;

[0045] The third mask pattern 15 includes a first detection pattern 16 and a second detection pattern 17. A plurality of third color resist blocks 5 are formed on the effective area 2 of the substrate through the third mask pattern 15. At least one first detection frame 6 and at least one second detection frame 7 are formed in the ineffective area 1 through the first detection pattern 16 and the second detection pattern 17. The first detection frame 6 frames a corresponding first color resist block 3, and the second detection frame 7 frames a corresponding second color resist block 4.

[0046] The first mask pattern 12 , the second mask pattern 14 or the third mask pattern 15 includes an alignment pattern 13 , and at least one alignment Mark 8 is formed in the non-effective area 1 through the alignment pattern 13 .

[0047] In the present embodiment, it should be noted that the first mask pattern 12, the second mask pattern 14, and the third mask pattern 15 can be set on a common mask or can be set separately. When the mask is shared, it is only necessary to adjust the relative position between the mask and the substrate, that is, the position of the common mask can be adjusted, the position of the substrate can be adjusted, or the position of the common mask and the substrate can be adjusted. When they are set separately, the first mask pattern 12 corresponds to one mask, the second mask pattern 14 corresponds to one mask, and the third mask pattern 15 corresponds to one mask. This embodiment takes the first mask pattern 12, the second mask pattern 14, and the third mask pattern 15 as an example of separately setting the masks, and the details are as follows:

[0048] First, a first color layer is coated on the substrate, and then a first mask of a first mask pattern 12 is set to form a plurality of first color blocks 3 in the effective area 2 of the substrate by exposure and development, and at least one first color block 3 is formed in the ineffective area. Then, a second color layer is coated, and then a second mask of a second mask pattern 14 is set to form a plurality of second color blocks 4 in the effective area 2 of the substrate by exposure and development, and at least one second color block 4 is formed in the ineffective area. Then, a third color layer is coated, and then a third mask of a third mask pattern 15 is set to form a plurality of third color blocks 5 in the effective area 2 of the substrate by exposure and development, and at least one first detection frame 6 and at least one second detection frame 7 are formed in the ineffective area. The third mask pattern 15 includes a first detection pattern 16 and a second detection pattern 17. The first detection frame 6 and the second detection frame 7 are formed by the first detection pattern 16 and the second detection pattern 17, respectively. In addition, the first mask pattern 12, the second mask pattern 14 or the third mask pattern 15 includes an alignment pattern 13, and at least one alignment Mark 8 is formed in the non-effective area 1 of the substrate through the alignment pattern 13, that is, the alignment Mark 8 can be located in the first color layer, the second color layer or the third color layer. It should be noted that the alignment Mark 8 can be in the shape of a cross, a circle, a square, etc., without specific limitation, as long as it can meet the alignment function. According to the positional relationship between the first detection frame 6 and the first color block 3 of the non-effective area, and the positional relationship between the second detection frame 7 and the second color block 4 of the non-effective area, the deviation of the color filter can be quickly determined. If the first color block 3 of the non-effective area is located in the first detection frame 6 and the second color block 4 of the non-effective area is located in the second detection frame 7, the substrate of the color filter meets the requirements. Otherwise, it does not meet the requirements. The deviation data in each direction can be measured according to the relative position difference, which can effectively overcome the influence of the deviation of the substrate from the driving base plate due to thermal expansion and contraction of the substrate on the display quality, save labor costs, improve work efficiency, and reduce the defective rate. The substrate of the color filter corresponds to the positioning Mark on the driving base plate through the alignment Mark 8 to determine the fitting position.

[0049] Preferably, the first detection frame 6 is a square whose length and width are greater than the first alignment color block, and the second detection frame 7 is a square whose length and width are greater than the second alignment color block. In implementation, the square can be solid or hollow, and the outer frames of the first detection frame 6 and the second detection frame 7 can be marked by solid lines, dashed lines, or dotted lines.

[0050] Example 2

[0051] On the basis of Example 1, the manufacturing of the photomask includes the following steps:

[0052] Obtain the expansion and contraction of the substrate in length and width before and after the process;

[0053] According to the expansion and contraction of the length and width directions of the substrate before and after the process, the target value of the first color block 3, the target value of the second color block 4 and the target value of the third color block 5, the design values ​​of the first color block 3, the second color block 4 and the third color block 5 are determined respectively;

[0054] Determine the target values ​​of the first detection frame 6 and the second detection frame 7 according to the cell size of the driving base plate, the target value of the first color block 3, and the target value of the second color block 4, and determine the design values ​​of the first detection frame 6 and the second detection frame 7 according to the target values ​​of the first detection frame 6 and the second detection frame 7 and the expansion and contraction of the length and width directions of the substrate before and after the process;

[0055] The base plate is fitted with the driving base plate;

[0056] Obtain the horizontal distance and vertical distance between the first color block 3, the second color block 4, the third color block 5 and the positioning Mark on the driving base plate, and determine the positions of the first mask pattern 12, the second mask pattern 14, and the third mask pattern 15 in the mask according to the expansion and contraction of the length and width directions of the substrate before and after the process;

[0057] Obtain the horizontal distance and vertical distance between the first detection frame 6, the second detection frame 7 and the positioning Mark on the driving base plate, and determine the positions of the first detection pattern 16 and the second detection pattern 17 corresponding to the first detection frame 6 and the second detection frame 7 in the third mask pattern 15 according to the expansion and contraction of the length and width directions of the substrate before and after the process;

[0058] Obtain the horizontal distance and vertical distance between the alignment Mark 8 and the positioning Mark on the driving base plate to determine the position of the alignment pattern 13 corresponding to the alignment Mark 8 in the first mask pattern 12, the second mask pattern 14 or the third mask pattern 15;

[0059] The mask is manufactured according to the first mask pattern 12 , the second mask pattern 14 , or the third mask pattern 15 .

[0060] In this embodiment, the size is calculated as follows:

[0061] Assume that the length of the unprocessed substrate is a1 and the width is b1, and the length of the processed substrate is a2 and the width is b2. Assume that the expansion and contraction amount of the substrate in the length direction is x1 and the expansion and contraction amount in the width direction is y1, then x1=(b2-b1) / b1, y1=(a2-a1) / a1.

[0062] Assuming that the target value length of the first color block 3 is c1 and the width is d1, and the design value length is c2 and the width is d2, then c2=c1*(1+y1), d2=d1*(1+x1).

[0063] Assuming that the target length of the second color block 4 is c3 and the width is d3, and the design length is c4 and the width is d4, then c4=c3*(1+y1), d4=d3*(1+x1).

[0064] Assuming that the target length of the third color block 5 is c5 and the width is d5, and the design length is c6 and the width is d6, then c6=c5*(1+y1), d6=d5*(1+x1).

[0065] The length c7 and width d7 of the bottom plate cell, the length c8 and width d8 of the target value of the first detection frame 6, the length c9 and width d9 of the design value of the first detection frame 6, then c8=c7-c1, d8=d7-d1, design value c9=c8*(1+y1), d9=d8*(1+x1).

[0066] The target values ​​of Mark 8 are length c10 and width d10, and the design values ​​are length c11 and width d12, then c11=c10*(1+y1), d11=d10*(1+x1).

[0067] The deviation calculation method is as follows:

[0068] The horizontal distance e1 and the vertical distance f1 between the first color resist block 3 and the positioning Mark of the driving base plate are obtained, and the horizontal design position of the first color resist block 3 = e1*(1+x1), and the vertical design position = f1*(1+y1).

[0069] The horizontal distance e2 and the vertical distance f2 between the second color block 4 and the positioning Mark of the driving base plate are obtained, and the horizontal design position of the first color block 3 = e2*(1+x1), and the vertical design position = f2*(1+y1).

[0070] The horizontal distance e3 and the vertical distance f3 between the third color block 5 and the positioning Mark of the driving base plate are obtained, and the horizontal design position of the first color block 3 = e3*(1+x1), and the vertical design position = f3*(1+y1).

[0071] The horizontal distance e4 and vertical distance f4 between the first detection frame 6 and the positioning Mark on the driving base plate are obtained. The horizontal design position of the first detection frame 6 = e4*(1+x1), and the vertical design position = f4*(1+y1).

[0072] Obtain the horizontal distance e5 and vertical distance f5 between the second detection frame 7 and the positioning Mark on the driving base plate, the horizontal design position of the first detection frame 6 = e5*(1+x1), and the vertical design position = f5*(1+y1).

[0073] Obtain the horizontal distance e6 and vertical distance f6 between the alignment Mark 8 and the positioning Mark on the driving base plate. The horizontal design position of the alignment Mark 8 = e6*(1+x1), and the vertical design position = f6*(1+y1).

[0074] The size and position of the first detection pattern 16 and the second detection pattern 17 are determined by the size and position of the first detection frame 6 and the second detection frame 7, and the size and position of the alignment pattern 13 are determined by the size and position of the alignment Mark 8, so that the first mask pattern 12, the second mask pattern 14 and the third mask pattern 15, as well as the positions of the first mask pattern 12, the second mask pattern 14 and the third mask pattern 15 in the mask are determined by the first color block 3, the second color block 4, the third color block 5, the first detection pattern 16, the second detection pattern 17 and the alignment pattern 13. The substrate of the color filter is prepared by the first mask pattern 12, the second mask pattern 14 and the third mask pattern 15 set in the mask, so as to overcome the display quality affected by the offset of the bonding with the driving base plate due to the thermal expansion and contraction of the substrate, save labor costs, improve work efficiency and reduce the defective rate.

[0075] Example 3

[0076] The difference between this embodiment and embodiment 1 is that Figure 2 , Figure 4 As shown, the first mask pattern 12 includes a first alignment and fitting pattern 18, the second mask pattern 14 includes a second alignment and fitting pattern 19, and the third mask pattern 15 includes a third alignment and fitting pattern 20. The first alignment and fitting pattern 18 forms a first alignment and fitting Mark 9 in the non-effective area, the second alignment and fitting pattern 19 forms a second alignment and fitting Mark 10 in the non-effective area, and the third alignment and fitting pattern 20 forms a third alignment and fitting Mark 11 in the non-effective area.

[0077] In this embodiment, the first alignment lamination Mark 9 is located in the first color layer, the second alignment lamination Mark 10 is located in the second color layer, and the third alignment lamination Mark 11 is located in the third color layer. It should be noted that the first alignment lamination Mark, the second alignment lamination Mark 10, and the third alignment lamination Mark 11 are different colors. Through the first alignment lamination Mark 9, the second alignment lamination Mark 10, and the third alignment lamination Mark 11 on the non-effective area 1, the relative offsets of the first alignment lamination Mark 9, the second alignment lamination Mark 10, and the third alignment lamination Mark 11 can be comprehensively considered during lamination, and the center values ​​of the three offsets can be selected as the lamination adjustment values ​​to quickly determine the adjustment direction of the lamination parameters, improve the lamination accuracy, improve the display quality, and improve the display effect.

[0078] Example 4

[0079] On the basis of Example 3, the manufacturing of the first alignment lamination pattern 18, the second alignment lamination pattern 19 and the third alignment lamination pattern 20 includes the following steps:

[0080] Determine the design values ​​of the first alignment Mark 9, the second alignment Mark 10 and the third alignment Mark 11 respectively according to the expansion and contraction of the length and width directions of the substrate before and after the process, the target value of the first alignment Mark 9, the target value of the second alignment Mark 10 and the target value of the third alignment Mark 11;

[0081] Based on the expansion and contraction of the substrate in length and width before and after the process, the length and width between the first alignment lamination Mark 9, the second alignment lamination Mark 10 and the third alignment lamination Mark 11 and the positioning Mark of the driving base plate respectively determine the positions of the first alignment lamination pattern 18, the second alignment lamination pattern 19 and the third alignment lamination pattern 20 corresponding to the first alignment lamination Mark 9, the second alignment lamination Mark 10 and the third alignment lamination Mark 11 in the first mask pattern 12, the second mask pattern 14 and the third mask pattern 15.

[0082] In this embodiment, the size is calculated as follows:

[0083] Assume that the length of the unprocessed substrate is a1 and the width is b1, and the length of the processed substrate is a2 and the width is b2. Assume that the expansion and contraction amount of the substrate in the length direction is x1 and the expansion and contraction amount in the width direction is y1, then x1=(b2-b1) / b1, y1=(a2-a1) / a1.

[0084] Assume that the target value of the first alignment Mark 9 has a length of c12 and a width of d12, and the design value has a length of c13 and a width of d13, then c13=c12*(1+y1), d13=d12*(1+x1).

[0085] Assume that the target value length of the second alignment Mark 10 is c14 and the width is d14, and the design value length is c15 and the width is d15, then c15=c14*(1+y1), d15=d14*(1+x1).

[0086] Assuming that the target value of the third alignment Mark 11 has a length of c16 and a width of d16, and the design value has a length of c17 and a width of d17, then c17=c16*(1+y1), d17=d16*(1+x1).

[0087] The deviation calculation method is as follows:

[0088] The horizontal distance e7 and the vertical distance f7 between the first alignment and fitting Mark 9 and the positioning Mark of the driving base plate are obtained, and the horizontal design position of the first color resist block 3 = e7*(1+x1), and the vertical design position = f7*(1+y1).

[0089] The horizontal distance e8 and the vertical distance f8 between the second alignment mark 10 and the positioning mark of the driving base plate are obtained, and the horizontal design position of the first color block 3 = e8*(1+x1), and the vertical design position = f8*(1+y1).

[0090] The horizontal distance e9 and the vertical distance f9 between the third alignment mark 11 and the positioning mark of the driving base plate are obtained, and the horizontal design position of the first color block 3 = e9*(1+x1), and the vertical design position = f9*(1+y1).

[0091] The size and position of the first alignment fitting pattern 18, the second alignment fitting pattern 19 and the third alignment fitting pattern 20 are determined by the size and position of the first alignment fitting Mark 9, the second alignment fitting Mark 10 and the third alignment fitting Mark 11, thereby determining the first mask pattern 12, the second mask pattern 14 and the third mask pattern 15, and the positions of the first mask pattern 12, the second mask pattern 14 and the third mask pattern 15 in the mask.

[0092] The above description is only a preferred embodiment of the present invention and is not intended to limit the scope of protection of the present invention. Any modifications, equivalent substitutions and improvements made by any technician familiar with the field within the spirit and principle of the present invention should be included in the scope of protection of the present invention.

Claims

1. A method for manufacturing a color filter, characterized in that: include: An effective area and an ineffective area are set on the substrate, the effective area is used to form a first color block, a second color block and a third color block arranged in a matrix, and the ineffective area is set around the effective area; The mask includes a first mask pattern, a second mask pattern, and a third mask pattern; Wherein, a plurality of first color resist blocks are formed on the effective area of ​​the substrate through the first mask pattern, and at least one first color resist block is formed in the ineffective area; Forming a plurality of second color blocks on the effective area of ​​the substrate and forming at least one second color block on the ineffective area by using a second mask pattern; The third mask pattern includes a first detection pattern and a second detection pattern, and a plurality of third color resist blocks are formed on the effective area of ​​the substrate through the third mask pattern, and at least one first detection frame and at least one second detection frame are formed in the ineffective area through the first detection pattern and the second detection pattern, wherein the first detection frame frames a corresponding first color resist block, and the second detection frame frames a corresponding second color resist block; The first mask pattern, the second mask pattern or the third mask pattern includes an alignment pattern, and at least one alignment mark is formed in the non-effective area by the alignment pattern; The manufacturing of the photomask comprises the following steps: Obtain the expansion and contraction of the substrate in length and width before and after the process; According to the expansion and contraction of the length and width directions of the substrate before and after the process, the target value of the first color block, the target value of the second color block and the target value of the third color block, the design values ​​of the first color block, the second color block and the third color block are determined respectively; Determine the target values ​​of the first detection frame and the second detection frame according to the cell size of the driving base plate, the target value of the first color block, and the target value of the second color block; determine the design values ​​of the first detection frame and the second detection frame according to the target values ​​of the first detection frame and the second detection frame, and the expansion and contraction of the length and width directions of the substrate before and after the process; The base plate is fitted with the driving base plate; Obtain the horizontal distance and vertical distance between the first color block, the second color block, the third color block and the positioning Mark on the driving base plate, and determine the positions of the first mask pattern, the second mask pattern and the third mask pattern in the mask according to the expansion and contraction of the length and width directions of the substrate before and after the process; Obtain the horizontal distance and vertical distance between the first detection frame, the second detection frame and the positioning Mark on the driving base plate, and determine the positions of the first detection pattern and the second detection pattern corresponding to the first detection frame and the second detection frame in the third mask pattern according to the expansion and contraction of the length and width directions of the substrate before and after the process; Obtain the horizontal distance and vertical distance between the alignment Mark and the positioning Mark on the driving base plate to determine the position of the alignment pattern corresponding to the alignment Mark on the first mask pattern, the second mask pattern or the third mask pattern; A mask is manufactured according to the first mask pattern, the second mask pattern, or the third mask pattern.

2. The method for manufacturing a color filter according to claim 1, wherein: The first detection frame is a block whose length and width are greater than those of the first alignment color block, and the second detection frame is a block whose length and width are greater than those of the second alignment color block.

3. The method for manufacturing a color filter according to claim 1, wherein: The first mask pattern includes a first alignment and fitting pattern, the second mask pattern includes a second alignment and fitting pattern, and the third mask pattern includes a third alignment and fitting pattern. The first alignment and fitting pattern forms a first alignment and fitting mark in a non-effective area, the second alignment and fitting pattern forms a second alignment and fitting mark in a non-effective area, and the third alignment and fitting pattern forms a third alignment and fitting mark in a non-effective area.

4. The method for manufacturing a color filter according to claim 3, characterized in that: The manufacturing of the first alignment lamination pattern, the second alignment lamination pattern and the third alignment lamination pattern comprises the following steps: Determine the design values ​​of the first alignment mark, the second alignment mark, and the third alignment mark according to the expansion and contraction of the length and width directions of the substrate before and after the process, the target value of the first alignment mark, the target value of the second alignment mark, and the target value of the third alignment mark; Based on the expansion and contraction of the substrate in length and width before and after the process, the length and width between the first alignment bonding Mark, the second alignment bonding Mark and the third alignment bonding Mark and the positioning Mark of the driving base plate respectively determine the positions of the first alignment bonding pattern, the second alignment bonding pattern and the third alignment bonding pattern corresponding to the first alignment bonding Mark, the second alignment bonding Mark and the third alignment bonding Mark in the first mask pattern, the second mask pattern and the third mask pattern.

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