A display panel and display device

Abstract

Embodiments of the present application disclose a display panel and a display device, the display panel comprising a display area and a light-transmitting area; the display area comprising a cliff-like film layer structure composed of at least one film layer, a vertical projection of a film layer closest to the light-out surface in the cliff-like film layer structure on the light-out surface being in a vertical projection of a film layer farther from the light-out surface; the display panel further comprising a light-shielding layer, the light-shielding layer comprising a light-shielding pattern, the light-shielding pattern being located in the display area and surrounding the light-transmitting area; an edge of the vertical projection of the film layer closest to the light-out surface in the cliff-like film layer structure on the light-out surface being in a vertical projection of the light-shielding pattern on the light-out surface. Embodiments of the present application set the cliff-like film layer structure and set the edge of the vertical projection of the cliff-like film layer structure on the light-out surface in the vertical projection of the light-shielding pattern, thereby avoiding the uneven light-out caused by the cliff-like film layer structure and ensuring the light collection effect of the display panel.

Description

TECHNICAL FIELD

[0001] Embodiments of the present application relate to display technology, and in particular, to a display panel and a display device. BACKGROUND

[0002] With the development of display technology, full-screen almost occupies a large proportion in consumer market, and becomes a hot topic of development direction. Taking mobile phones as an example, smart phones are used more and more widely, and the functions are more and more, which have become an indispensable electronic device in people's daily life.

[0003] Although the full-screen product has many benefits, with the increase of the screen display area, it also brings many problems to the mobile phone design, for example, the under-screen camera product has the problem of poor shooting effect. SUMMARY

[0004] The present application provides a display panel and a display device to ensure that the display panel has high light transmittance, realizes the uniformity of light transmission, and ensures the light collection effect of the display panel.

[0005] In a first aspect, embodiments of the present application provide a display panel, comprising a display area and a light transmission area;

[0006] The display area comprises a cliff film layer structure composed of at least one film layer, and the vertical projection of the film layer closest to the light emitting surface in the cliff film layer structure on the light emitting surface is located in the vertical projection of the film layer farther from the light emitting surface on the light emitting surface.

[0007] The display panel further comprises a light shielding layer, the light shielding layer comprises a light shielding pattern, the light shielding pattern is located in the display area, and the light shielding pattern surrounds the light transmission area.

[0008] The edge of the vertical projection of the film layer closest to the light emitting surface in the cliff film layer structure on the light emitting surface is located in the vertical projection of the light shielding pattern on the light emitting surface.

[0009] In a second aspect, embodiments of the present application further provide a display device comprising the display panel of any one of the first aspect.

[0010] The display panel provided by the embodiments of the present application comprises a display area and a light transmission area, the display area comprises a cliff film layer structure composed of at least one film layer and a light shielding layer. On the light emitting surface, the vertical projection of the film layer closest to the light emitting surface in the cliff film layer structure is located in the vertical projection of the film layer farther from the light emitting surface. Further, on the light emitting surface, the edge of the cliff film layer structure projection is located in the vertical projection of the light shielding pattern, that is, the cliff film layer structure is shielded by the light shielding pattern, avoiding the uneven light emission caused by the cliff film layer structure, and ensuring the light collection effect of the display panel.BRIEF DESCRIPTION OF DRAWINGS BRIEF DESCRIPTION OF DRAWINGS

[0011] Figure 1 A structural schematic diagram of a display panel provided by an embodiment of the present application is shown in FIG. 1.

[0012] Figure 2 A structural schematic diagram of a display panel provided by an embodiment of the present application is shown in FIG. 2. Figure 1 A structural schematic diagram of a display panel provided by an embodiment of the present application is shown in FIG. 3.

[0013] Figure 3 A structural schematic diagram of a display panel provided by an embodiment of the present application is shown in FIG. 4. Figure 1 A structural schematic diagram of a display panel provided by an embodiment of the present application is shown in FIG. 5.

[0014] Figure 4 A structural schematic diagram of a display panel provided by an embodiment of the present application is shown in FIG. 6. Figure 1 A structural schematic diagram of a display panel provided by an embodiment of the present application is shown in FIG. 7.

[0015] Figure 5 A structural schematic diagram of a display panel provided by an embodiment of the present application is shown in FIG. 8. Figure 1 A structural schematic diagram of a display panel provided by an embodiment of the present application is shown in FIG. 9.

[0016] Figure 6 A structural schematic diagram of a display panel provided by an embodiment of the present application is shown in FIG. 10. Figure 1 A structural schematic diagram of a display panel provided by an embodiment of the present application is shown in FIG. 11.

[0017] Figure 7 A top view schematic diagram of a display panel provided by an embodiment of the present application is shown in FIG. 12.

[0018] Figure 8 A structural schematic diagram of a display panel provided by an embodiment of the present application is shown in FIG. 13. Figure 1

[0019] A structural schematic diagram of a display panel provided by an embodiment of the present application is shown in FIG. 14. Figure 9 A structural schematic diagram of a display panel provided by an embodiment of the present application is shown in FIG. 15. Figure 1 A structural schematic diagram of a display panel provided by an embodiment of the present application is shown in FIG. 16. A structural schematic diagram of a display panel provided by an embodiment of the present application is shown in FIG. 17.

[0020] Figure 10 A structural schematic diagram of another display panel provided by an embodiment of the present application is shown in FIG. 18.

[0021] Figure 11 A structural schematic diagram of another display panel provided by an embodiment of the present application is shown in FIG. 19.

[0022] Figure 12 A structural schematic diagram of a display device provided by an embodiment of the present application is shown in FIG. 20. DETAILED DESCRIPTION

[0023] The present application will be further described below in conjunction with the drawings and embodiments. It should be understood that the specific embodiments described herein are merely intended for the purpose of interpretation of the present application and are not limiting of the present application. In addition, it should be noted that only the parts related to the present application are shown in the drawings for the purpose of description.

[0024] Figure 1This is a schematic diagram of the structure of a display panel provided in an embodiment of the present invention. Figure 2 for Figure 1 A schematic diagram of a structure along the central section line AA'. Figure 3 for Figure 1 Another structural schematic diagram along the central section line AA'. Figure 4 for Figure 1 Another structural schematic diagram along the central section line AA'. Figure 5 for Figure 1 Another structural schematic diagram along the central section line AA', see reference. Figures 1 to 5 As shown, the display panel 10 provided in this embodiment of the invention includes a display area 100A and a light-transmitting area 100B; the display area 100A includes a cliff-shaped film structure 200 composed of at least one film layer, wherein the vertical projection of the film layer closest to the light-emitting surface B in the cliff-shaped film structure 200 is located within the vertical projection of the film layer farther from the light-emitting surface B on the light-emitting surface B; the display panel 10 also includes a light-shielding layer 300, which includes a light-shielding pattern 310, located in the display area 100A, and surrounding the light-transmitting area 100B; the edge of the vertical projection of the film layer closest to the light-emitting surface B in the cliff-shaped film structure 200 is located within the vertical projection of the light-emitting pattern 310 on the light-emitting surface B.

[0025] The display panel 10 includes a display area 100A and a light-transmitting area 100B. The display area 100A is used to achieve the display effect of the display panel 10, while the light-transmitting area 100B is used to ensure that the display panel 10 can obtain external light, thus enabling functions such as shooting and user face unlocking. Specifically, both the display area 100A and the light-transmitting area 100B include multiple film layers. To improve the light transmission effect of the light-transmitting area 100B, i.e., to increase the light transmittance of the light-transmitting area 100B, a cliff-shaped film layer structure 200 is set at the film layer of the display area 100A near the light-transmitting area 100B. Through the cliff-shaped film layer structure 200, more external light can be ensured to pass through the light-transmitting area 100B, thereby improving the light transmittance of the display panel 10 and achieving better shooting and user face unlocking effects.

[0026] Specifically, the cliff-like membrane structure 200 includes at least one membrane structure. When the cliff-like membrane structure 200 includes one membrane structure, refer to... Figure 2 As shown, the vertical projection (c1) of the cliff-shaped membrane structure 200 near the light-emitting surface B is at a certain distance from the vertical projection (c2) of the cliff-shaped membrane structure 200 away from the light-emitting surface B. This means the cliff-shaped membrane structure 200 represents the edge region of the membrane layer, and this edge region has a vertical drop relative to the light-emitting surface B. When the cliff-shaped membrane structure 200 includes two or more membrane layers, refer to... Figures 3 to 5As shown in FIG. 2, the vertical projection of the film layer closest to the light-out surface B of the cliff-like film layer structure 200 is a certain distance from the vertical projection of the film layer farthest from the light-out surface B of the cliff-like film layer structure 200, that is, the cliff-like film layer structure 200 includes two or more layers of film layers, and the cliff-like film layer structure 200 is the edge region of the film layers, and the edge region has a drop in the vertical direction of the light-out surface B. In general, the film layer closest to the light-out surface B or the vertical projection of one side on the light-out surface B of the cliff-like film layer structure 200 is located in the film layer farthest from the light-out surface B or the vertical projection of one side on the light-out surface B.

[0027] Further, referring to FIG. 3, Figure 3 As shown in FIG. 3, the vertical projection of the film layer closest to the light-out surface B of the cliff-like film layer structure 200 (c3 in the figure) is a certain distance from the vertical projection of the film layer farthest from the light-out surface B of the cliff-like film layer structure 200 (c4 in the figure), and the shape of the cliff-like film layer structure 200 is approximately inverted trapezoidal. Referring to FIG. 4, Figure 4 As shown in FIG. 4, the vertical projection of the film layer closest to the light-out surface B of the cliff-like film layer structure 200 (c5 in the figure) is a certain distance from the vertical projection of the film layer farthest from the light-out surface B of the cliff-like film layer structure 200 (c5 in the figure), Figure 4 In the cliff-like film layer structure 200, the number of film layers included is less than Figure 3 In the cliff-like film layer structure 200, the number of film layers included is not specifically limited in the embodiment of the present application.

[0028] For example, referring to FIG. 5, Figure 3 and Figure 4 As shown in FIG. 5, the cliff-like film layer structure 200 can be prepared by a punching process, in which different film layers in the corresponding region of the cliff-like film layer structure 200 are punched, and the size of the punching closest to the light-out surface B is greater than the size of the punching farthest from the light-out surface B, so that the cliff-like film layer structure 200 is formed at the edge of the punched region of the different film layers, and the cliff-like film layer structure 200 has a drop in the projection direction of the light-out surface B. Further, referring to FIG. 6, Figure 5 As shown in FIG. 6, in addition to being prepared by punching the film layers, the cliff-like film layer structure 200 can also be prepared by thinning different film layers in the corresponding region of the cliff-like film layer structure 200. Specifically, the size of the film layer closest to the light-out surface B is greater than the size of the film layer farthest from the light-out surface B in the vertical direction of the light-out surface B, so that the cliff-like film layer structure 200 is formed at the edge of the thinned region of the different film layers, and the cliff-like film layer structure 200 has a drop in the projection direction of the light-out surface B.

[0029] Further, the display panel 10 further comprises a light shielding layer 300, through the light shielding layer 300, the transmission of part of the light can be blocked, for example, the crosstalk between the light placed between different display areas, or the transmission of the light of the adverse display effect affects the display effect of the whole display panel 10. Figures 2 to 5 As shown, the light shielding pattern 310 is arranged around the light transmission area 100B, and the light shielding pattern 310 is arranged to ensure that the light enters the light transmission area 100B better, so as to improve the light transmittance of the display panel 10, and to meet the better shooting and user face unlocking effect.

[0030] Specifically, the light shielding layer 300 comprises a light shielding pattern 310, and through the patterning design of the light shielding layer 300, the light shielding range of the light shielding layer 300 can be selectively controlled. Specifically, referring to Figure 2 As shown, when the cliff film layer structure 200 comprises one layer of film layer, and the film layer has a difference at the cliff film layer structure 200, the light transmission effect is not balanced when the light passes through the cliff film layer structure 200, that is, the light diffraction effect occurs. In order to avoid the above-mentioned adverse light transmission effect or adverse light collection effect, the cliff film layer structure 200 is shielded by the light shielding pattern 310, and specifically, the edge of the vertical projection of the film layer closest to the light emitting surface B in the cliff film layer structure 200 on the light emitting surface B (c1 in the figure) is located in the vertical projection of the light shielding pattern 310 on the light emitting surface B. Further, referring to Figures 3 to 5 As shown, when the cliff film layer structure 200 comprises two or more layers of film layer structure, and the film layers at different positions have a difference at the cliff film layer structure 200, the light is reflected when passing through the cliff film layer structure 200, which affects the normal light collection effect. In order to avoid the above-mentioned adverse light collection effect, the cliff film layer structure 200 is shielded by the light shielding pattern 310, and specifically, the edge of the vertical projection of the film layer closest to the light emitting surface B in the cliff film layer structure 200 on the light emitting surface B is located in the vertical projection of the light shielding pattern 310 on the light emitting surface B. Figures 3 to 5 As an example, the edge of the vertical projection of all the film layers included in the cliff film layer structure 200 on the light emitting surface B is located in the vertical projection of the light shielding pattern 310 on the light emitting surface B, that is, the light shielding pattern 310 can be arranged to reduce the reflection of the light at the cliff film layer structure 200, and the range of the light shielding pattern 310 shielding the cliff film layer structure 200 is not specifically limited.

[0031] In summary, the display panel provided by the embodiment of the present application is that the edge of the cliff film layer structure projection on the light emitting surface is located in the vertical projection of the light shielding pattern, that is, the light shielding pattern shields the cliff film layer structure, avoids the uneven light emitting caused by the cliff film layer structure, and ensures the light collection effect of the display panel.

[0032] Figure 6 For Figure 1 Another structural schematic diagram along the section line AA', refer to Figure 2 And Figure 6 As shown in FIG. 4 and FIG. 5, the display panel 10 includes an array substrate 410 and an organic light emitting unit layer 420, the organic light emitting unit layer 420 includes a cathode layer 421, the cathode layer 421 includes a cathode pattern 421A and a cathode connecting line pattern 421B, the cathode pattern 421A and the cathode connecting line pattern 421B are both in the form of a cliff-like film layer structure 200, and the edge of the vertical projection of the cathode pattern 321A and the cathode connecting line pattern 421B on the light emitting surface B is located in the vertical projection of the light shielding pattern 310 on the light emitting surface B.

[0033] Further, the display panel 10 includes an array substrate 410 and an organic light emitting unit layer 420, the array substrate 410 is used to provide driving signals to the organic light emitting unit layer 420 to drive the organic light emitting unit layer 420 to display light emitting. Specifically, the organic light emitting unit layer 420 includes a cathode layer 421, and different organic light emitting unit layers 420 are electrically connected by setting a cathode connecting line. However, the cathode layer 421 and the cathode connecting line generally have low or no light transmittance, so by patterning the cathode layer 421 and the cathode connecting line, i.e., the cathode layer 421 includes a cathode pattern 421A and a cathode connecting line pattern 421B, the light transmittance range of the light transmittance area 100B can be effectively and selectively controlled.

[0034] Further, refer to Figure 2 And Figure 6 As shown in FIG. 4 and FIG. 5, the edge of the cathode pattern 421A is in the form of a cliff-like film layer structure 200, and the vertical projection of the light shielding pattern 310 on the light emitting surface B covers the edge of the cathode pattern 421A, i.e., the light shielding pattern 310 covers the cliff-like film layer structure 200, which can avoid the light transmittance of the edge of the cathode pattern 421A from being non-uniform, i.e., avoid the generation of light diffraction.

[0035] Further, refer to Figure 6As shown, there is a height difference in the film layer at the edge of the cathode connecting pattern 421B, on the side near the light-emitting surface B and the side away from the light-emitting surface B, that is, the edge of the cathode connecting pattern 421B is a cliff-like film layer structure 200. Furthermore, the vertical projection of the light-shielding pattern 310 on the light-emitting surface B covers the edge of its cathode connecting pattern 421B, that is, the light-shielding pattern 310 covers the cliff-like film layer structure 200, which can prevent uneven light transmittance at the edge of the cathode connecting pattern 421B, i.e., avoid light diffraction. Exemplarily, the cathode pattern 421A and the cathode connecting pattern 421B can be fabricated using a laser engraving process, or two vapor deposition processes can be used to prepare the cathode pattern 421A and the cathode connecting pattern 421B. This embodiment of the invention does not specifically limit this, but the light-shielding pattern 310 simultaneously blocks the edges of both the cathode pattern 421A and the cathode connecting pattern 421B.

[0036] In summary, the light transmittance of the display panel 10 is ensured by setting the cathode pattern 421A and / or the cathode connecting line pattern 421B. By blocking the edges of the cathode pattern 421A and / or the cathode connecting line pattern 421B, i.e. the cliff-like film structure 200, the uneven light transmittance is avoided, thus ensuring the overall light collection effect of the display panel 10.

[0037] Continue to refer to Figure 2 and Figure 6 As shown, in the light-shielding pattern 310 that overlaps with the projection of the cathode pattern 421A or the cathode connecting pattern 421B in the cathode layer 421, the width range D1 of the region that does not overlap with the projection of the cathode pattern 421A or the cathode connecting pattern 421B satisfies: 0<D1≤10μm.

[0038] Among them, reference Figure 2 As shown, the cathode pattern 421A in the cathode layer 421 is overlapped and covered by the light-shielding pattern 310, and the light-shielding pattern 310 has portions that do not cover the cathode pattern 421A or do not overlap with the cathode pattern 421A in its perpendicular projection. Specifically, the width range D1 of the portion of the light-shielding pattern 310 that does not cover the cathode pattern 421A or does not overlap with the cathode pattern 421A in its perpendicular projection, and 0 < D1 ≤ 10 μm, for example 2 μm, 5 μm or 8 μm. In this embodiment of the invention, the specific value of the width range D1 is not limited. By ensuring that the width range D1 has a certain value, it is ensured that the light-shielding pattern 310 completely covers the cathode pattern 421A, and that the edges of the cathode pattern 421 are effectively blocked by the light-shielding pattern 310, that is, the cliff-like film structure 200.

[0039] Further reference Figure 6As shown, the cathode wire pattern 421B in the cathode layer 421 is overlapped and covered by the light shielding pattern 310, and the light shielding pattern 310 has a part that does not cover the cathode wire pattern 421B or does not overlap the vertical projection of the cathode wire pattern 421B. Specifically, the light shielding pattern 310 has a part that does not cover the cathode wire pattern 421B or does not overlap the vertical projection of the cathode wire pattern 421B, and the width range D1 of the part is 0 < D1 ≤ 10 μm, for example, 2 μm, 5 μm, or 8 μm. The embodiment of the present application does not limit the specific value of the width range D1. By ensuring that the width range D1 has a certain value, the light shielding pattern 310 completely covers the cathode wire pattern 421B, and ensures that the edge of the cathode wire pattern 421B is effectively shielded by the light shielding pattern 310, that is, the light shielding pattern 310 effectively shields the cliff-like film layer structure 200.

[0040] With reference to the foregoing Figures 3 to 5 As shown, the display panel 10 includes an array substrate 410 and an organic light emitting unit layer 420. The array substrate 410 is provided with a hole 410A or a film layer thinning area 410B, and the edge of the hole 410A or the film layer thinning area 410B forms a cliff-like film layer structure 200. The vertical projection of the hole 410A or the film layer thinning area 410B on the light emitting surface B is located in the vertical projection of the light shielding pattern 310 on the light emitting surface B.

[0041] The display panel 10 includes an array substrate 410 and an organic light emitting unit layer 420. The array substrate 410 is configured to provide a driving signal to the organic light emitting unit layer 420 to drive the organic light emitting unit layer 420 to display light emission. Specifically, the array substrate 410 is provided with a hole 410A or a film layer thinning area 410B. The overall thickness of the film layer can be thinned through the hole 410A or the film layer thinning area 410B, thereby improving the light transmittance of light at the hole 410A or the film layer thinning area 410B and achieving improved overall light transmittance of the display panel 10.

[0042] Further, the hole 410A or the film layer thinning area 410B is provided with an edge that has a drop along the light emitting surface B of the display panel 10, that is, a distance in the vertical projection of the light emitting surface B. The edge is a cliff-like film layer structure 200. The cliff-like film layer structure 200 can improve the light transmittance, but also causes light reflection at the cliff-like film layer structure 200, that is, the edge of the hole 410A or the film layer thinning area 410B, which affects the light collection effect of the display panel 10. The light shielding pattern 310 shields the cliff-like film layer structure 200, thereby ensuring the light transmittance of the display panel 10 while avoiding light reflection and ensuring the light collection effect of the display panel 10. Figure 3 and Figure 4As shown, the light shielding pattern 310 shields the edge of the cutout 410A, that is, the light shielding pattern 310 shields the cliff-like film layer structure 200. For reference Figure 5 As shown, the light shielding pattern 310 shields the edge of the film layer thinning area 410B, that is, the light shielding pattern 310 shields the cliff-like film layer structure 200.

[0043] Further, Figure 7 A top view of a display panel is provided for an embodiment of the present application, for reference Figure 7 As shown, the display panel 10 includes a plurality of organic light emitting unit layers 420, and the organic light emitting unit layers 420 include a cathode pattern 421A and a cathode wire pattern 421B, and the cathode pattern 421A is connected through the cathode wire pattern 421B. Further, the display panel 10 also includes a cutout 410A or a film layer thinning area 410B for improving the light transmittance of the display panel 10. Wherein, the light shielding pattern 310 shields the edges of the cathode pattern 421A and the cathode wire pattern 421B, to avoid uneven light transmittance of the display panel 10, and further, the light shielding pattern 310 surrounds the cutout 410A or the film layer thinning area 410B, thereby forming a light transmittance area 100B, to avoid the reflection of light around the cutout 410A or the film layer thinning area 410B, and further to ensure the overall light collection effect of the display panel 10.

[0044] For reference Figures 3 to 5 As shown, the minimum aperture of the cutout 410A or the film layer thinning area 410B in the direction of the plane where the vertical array substrate 410 is located forms a high-transmittance area 100C; the edge of the high-transmittance area 100C is located in the vertical projection of the light shielding pattern 310 on the light emitting surface B, and the width range D2 of the area where the high-transmittance area 100C and the projection of the light shielding pattern 310 overlap satisfies: 0 < D2 ≤ 5 μm.

[0045] For reference Figures 3 to 5 As shown, the cutout 410A or the film layer thinning area 410B is used to improve the light transmittance of the display panel 10, that is, in the plane where the array substrate 410 is located, the minimum aperture of the cutout 410A or the film layer thinning area 410B forms a high-transmittance area 100C, that is, the light transmittance of the high-transmittance area 100C is the largest, and specifically, the minimum aperture refers to the aperture of the film layer farthest from the light emitting surface B in the cutout 410A or the film layer thinning area 410B.

[0046] For reference Figure 3 and Figure 4As shown, the cutout 410A is overlapped and covered by the light shielding pattern 310, and the light shielding pattern 310 has a part not covering the cutout 410A or not vertically projected on the cutout 410A, that is, the light shielding pattern 310 can completely cover the high-transmittance region 100C, and there is a width range D2 of the area where the high-transmittance region 100C is overlapped with the projection of the light shielding pattern 310. Wherein, 0 < D2 ≤ 5 μm, for example, D2 can be 1 μm, 2 μm or 4 μm, and the embodiment of the present application does not limit the specific value of the width range D2. By ensuring that the width range D2 has a certain value, it is ensured that the light shielding pattern 310 completely covers the high-transmittance region 100C, that is, it is ensured that the light shielding pattern 310 effectively shields the cliff-like film layer structure 200.

[0047] Wherein, referring to Figure 5 As shown, the film layer thinning region 410B is overlapped and covered by the light shielding pattern 310, and the light shielding pattern 310 has a part not covering the film layer thinning region 410B or not vertically projected on the film layer thinning region 410B, that is, the light shielding pattern 310 can completely cover the high-transmittance region 100C, and there is a width range D2 of the area where the high-transmittance region 100C is overlapped with the projection of the light shielding pattern 310. Wherein, 0 < D2 ≤ 5 μm, for example, D2 can be 1 μm, 2 μm or 4 μm, and the embodiment of the present application does not limit the specific value of the width range D2. By ensuring that the width range D2 has a certain value, it is ensured that the light shielding pattern 310 completely covers the high-transmittance region 100C, that is, it is ensured that the light shielding pattern 310 effectively shields the cliff-like film layer structure 200.

[0048] Continuing to refer to Figures 2 to 6 As shown, the display panel 10 further includes an encapsulation layer 500, the encapsulation layer 500 is located on the side of the organic light-emitting unit layer 420 away from the array substrate 410; the encapsulation layer 500 includes at least one organic layer 510 and at least one inorganic layer 520 which are alternately stacked, the organic layer 510 and / or the inorganic layer 520 at least partially fill the cutout 410A or the film layer thinning region 410B; the light shielding layer 300 is located on the side of the encapsulation layer 500 away from the organic light-emitting unit layer 420.

[0049] Wherein, the display panel 10 further includes an encapsulation layer 500, and the encapsulation layer 500 is configured to encapsulate the display panel 10, thereby ensuring stable operation of the display panel 10. Specifically, the encapsulation layer 500 is located on the side of the organic light-emitting unit layer 420 away from the array substrate 410, and the encapsulation layer 500 is configured by stacking the organic layer 510 and the inorganic layer 520, for example, referring to Figures 2 to 6 As shown, the encapsulation layer 500 is configured by two inorganic layers 520 and one organic layer 510, and the organic layer 510 is covered and attached by the two inorganic layers 520, and the embodiment of the present application does not limit the number of layers of the organic layer 510 and the inorganic layer 520 included in the encapsulation layer 500.

[0050] Further reference Figures 3 to 5 As shown, when the light transmittance of the display panel 10 is ensured by setting a hole 410A or a film thinning area 410B, the edge of the hole 410A or the film thinning area 410B is a cliff-like film structure 200. When preparing the hole 410A or the film thinning area 410B, there is a recess inside. When preparing the encapsulation layer 500, the encapsulation layer 500 can fill the recess to ensure the overall flatness of the display panel 10. For example, a portion of the inorganic layer 520 in the encapsulation layer 500 can fill the hole 410A or the film thinning area 410B, or a portion of the organic layer 510 in the encapsulation layer 500 can also fill the hole 410A or the film thinning area 410B, or portions of both the inorganic layer 520 and the organic layer 510 in the encapsulation layer 500 can be filled simultaneously. This embodiment of the invention does not impose specific limitations on these methods. Furthermore, the light-shielding layer 300 is prepared while the display panel 10 is flat due to the encapsulation layer 500, which provides a place for the light-shielding layer 300.

[0051] Continue to refer to Figures 2 to 6 As shown, the organic light-emitting unit layer 420 also includes organic light-emitting units 422, a black matrix 423, and color resist 424. The color resist 424 is located on the light-emitting side of the organic light-emitting unit 422. The color resists corresponding to adjacent organic light-emitting units 422 are different colors. The black matrix 423 is located in at least a portion of the area between two adjacent color resists 424. The light-shielding pattern 310 is on the same layer as the black matrix 423 and is made using the same process.

[0052] Among them, reference Figures 2 to 6As shown, the organic light emitting unit layer 420 includes organic light emitting units 422, black matrices 423 and color resistances 424, wherein the organic light emitting units 422 are used to acquire the driving signals provided by the array substrate 410 and display light emission; the black matrices 423 have the function of blocking light to avoid the light emitted by different organic light emitting units 422 from interfering with each other; the color resistances 424 can replace the polarizer to reduce the reflection of light. Further, the color resistances 424 correspond to the organic light emitting units 422, the color resistances 424 are located on the light emitting side of the organic light emitting units 422, and the color resistances 424 have different colors, such as red color resistances, blue color resistances and green color resistances, which are not specifically limited in the embodiment of the present application. Different colors of light are generated by different colors of color resistances 424, and the light from the outside can reflect the corresponding color of light through the color resistances 424, which has the beneficial effect of reducing reflection. Further, the black matrix 423 is located between two adjacent color resistances 424, and the black matrix 423 has the function of blocking light to avoid the interference of light of different colors. At the same time, the black matrix 423 and the light shielding pattern 310 both have the function of blocking light, the light shielding pattern 310 can be prepared in the same layer as the black matrix using the same process, which reduces the process cost, and the black matrix 423 located around the light transmission area 100B can also be used for the light shielding pattern 310, which further reduces the cost of process preparation.

[0053] Figure 8 For Figure 1 another structure schematic view along the section line AA', as shown in Figure 9 for Figure 1 another structure schematic view along the section line AA', as shown in Figure 8 and Figure 9 As shown, the array substrate 410 includes a substrate 411 and a thin film transistor array layer 431 located on the substrate 411, and the light shielding layer 300 is located between the substrate 411 and the thin film transistor array layer 431.

[0054] Specifically, the array substrate 410 includes a substrate 411 and a thin film transistor array layer 431, and the thin film transistor array layer 431 is located between the array substrate 410 and the organic light emitting unit layer 420. The array substrate 410 drives the organic light emitting units 422 in the organic light emitting unit layer 420 to emit light through the thin film transistor array layer 431, which ensures the light collection effect of the display panel 10.

[0055] For example, as shown in Figure 8 and Figure 9As shown, the light shielding layer 300 is located between the substrate base plate 411 and the thin film transistor array layer 431, and the arrangement of the light shielding layer 300 can avoid the light emitted by the substrate base plate 411 from being reflected at the cliff-like film layer structure 200, thereby affecting the light collection effect of the display panel 10. Further, the display panel 10 further comprises an encapsulation layer 500, the encapsulation layer 500 comprises at least one organic layer 510 and at least one inorganic layer 520, and the encapsulation layer 500 is located on the side of the organic light emitting unit layer 420 away from the substrate base plate 411, and is used for protecting the stability of the display panel 10. Further, the display panel 10 can further comprise a polaroid 600, the polaroid 600 is located on the side of the encapsulation layer 500 away from the substrate base plate 411, thereby avoiding the influence of external light on the light collection effect of the display panel 10. In addition, the display panel 10 can further arrange a touch device between the polaroid 600 and the encapsulation layer 500, so as to ensure the display effect of the display panel 10 and realize the touch function, and the embodiment of the present application does not make specific limitation on this.

[0056] With reference to Figure 8 and Figure 9 As shown, in the direction perpendicular to the substrate base plate 411 and towards the thin film transistor array layer 431, the substrate base plate 411 comprises the first flexible substrate 412, the buffer layer 413 and the second flexible substrate 415; the substrate base plate 411 and the thin film transistor array layer 431 further comprise the first buffer layer 413A and the second buffer layer 413B; and the light shielding layer 300 is located between the first buffer layer 413A and the second buffer layer 413B.

[0057] Specifically, with reference to Figure 8 and Figure 9 As shown, the substrate base plate 411 comprises the first flexible substrate 412, the buffer layer 413 and the second flexible substrate 415, and the first buffer layer 413A is arranged between the first flexible substrate 412 and the second flexible substrate 415, and the second buffer layer 413B is arranged between the second flexible substrate 415 and the thin film transistor array layer 431. Further, the light shielding layer 300 is located between the first buffer layer 413A and the second buffer layer 413B, and the light shielding layer 300 can avoid the light emitted by the substrate base plate 411 from being reflected at the cliff-like film layer structure 200, thereby affecting the light collection effect of the display panel 10.

[0058] With reference to Figures 2 to 9As shown, the array substrate 410 includes a substrate 411 and a thin film transistor array layer 431 on the substrate 411; the thin film transistor array layer 431 includes an active layer 432, a first gate insulating layer 433, a first metal layer 434, a second gate insulating layer 435, a capacitor metal layer 436, an organic interlayer insulating layer 437, a second metal layer 438, a passivation layer 439, a third metal layer 4310 and a planarization layer 4311; the organic light emitting unit layer 420 includes an anode reflective layer 425, a pixel definition layer 426, an organic light emitting layer 427 and a cathode layer 421; the hole 410A penetrates the first gate insulating layer 433, the second gate insulating layer 435, the organic interlayer insulating layer 437, the passivation layer 439 and the pixel definition layer 426 in the direction perpendicular to the plane where the array substrate 410 is located.

[0059] Specifically, referring to Figures 2 to 9 As shown, the thin film transistor array layer 431 includes a plurality of insulating layers and a plurality of metal layers arranged in an alternating stack, and can also constitute a pixel driving circuit. Specifically, the specific implementation of the pixel driving circuit can be set by a person skilled in the art according to the actual situation, which is not limited here. For example, the pixel driving circuit includes "7T1C", "2T1C", etc., wherein "T" represents a thin film transistor, and "C" represents a capacitor. The thin film transistor array layer 431 is electrically connected to the organic light emitting unit layer 420 through the third metal layer 4310, so as to ensure that the thin film transistor array layer 431 drives the organic light emitting unit layer 420 to display and emit light.

[0060] Further, referring to Figures 2 to 9 As shown, the organic light emitting unit layer 420 includes an anode reflective layer 425, a pixel definition layer 426, an organic light emitting layer 427 and a cathode layer 421, and the anode reflective layer 425, the organic light emitting layer 427 and the cathode layer 421 constitute an organic light emitting unit. The pixel definition layer 426 determines the light emitting display width of the organic light emitting unit, so as to ensure the display effect of the display panel 10.

[0061] Further, referring to Figure 4 and Figure 9 As shown, the hole 410A is located between the substrate 411 and the pixel definition layer 426, i.e. penetrates the first gate insulating layer 433, the second gate insulating layer 435, the organic interlayer insulating layer 437, the passivation layer 439 and the pixel definition layer 426 in the direction perpendicular to the plane where the array substrate 410 is located.

[0062] Continuing to refer to Figure 5As shown, the array substrate 410 includes a substrate 411 and a thin film transistor array layer 431 on the substrate 411; the thin film transistor array layer 431 includes a plurality of metal layers and organic layers and inorganic layers between adjacent metal layers; the film layer thickness of the organic layer of the thinning region 410B is less than the film layer thickness of the organic layer of the non-thinning region 410B, and / or the vertical projection of the inorganic layer on the plane of the array substrate 410 does not overlap the thinning region 410B.

[0063] Specifically, the thin film transistor array layer 431 includes a plurality of metal layers and organic layers and inorganic layers between adjacent metal layers, such as an active layer 432, a first gate insulating layer 433, a first metal layer 434, a second gate insulating layer 435, a capacitor metal layer 436, an organic layer interlayer insulating layer 437, a second metal layer 438, a passivation layer 439, a third metal layer 4310 and a planarization layer 4311. Among them, the light transmittance of the organic layer is higher than that of the inorganic layer, that is, when the cliff film layer structure 200 is prepared by preparing the thinning region 410B, the organic layer can be reserved, but the film layer thickness of the organic layer at the thinning region 410B is thinned, that is, the film layer thickness of the organic layer of the thinning region 410B is less than that of the non-thinning region 410B. Further, the inorganic layer can also be prepared by digging holes to prepare the cliff film layer structure 200, that is, the vertical projection of the inorganic layer on the plane of the array substrate 410 does not overlap the thinning region 410B. Further, on the basis of thinning the film layer thickness of the organic layer, the inorganic layer can also be removed, that is, the film layer thickness of the organic layer of the thinning region 410B is less than that of the non-thinning region 410B, and the vertical projection of the inorganic layer on the plane of the array substrate 410 does not overlap the thinning region 410B. The above-mentioned methods can realize the preparation of the thinning region 410B, ensure the light transmittance of the display panel 10, and ensure the light collection effect of the whole display panel 10 by setting the light shielding layer 300.

[0064] Continue to refer to Figure 5 As shown, the array substrate 410 includes a substrate 411 and a thin film transistor array layer 431 on the substrate 411; the thin film transistor array layer 431 includes a plurality of metal layers and organic layers and inorganic layers between adjacent metal layers; the film layer thickness of the inorganic layer of the thinning region 410B is less than the film layer thickness of the organic layer of the non-thinning region 410B.

[0065] Specifically, the thin film transistor array layer 431 includes a plurality of metal layers and organic layers and inorganic layers respectively located between adjacent metal layers, for example, the active layer 432, the first gate insulating layer 433, the first metal layer 434, the second gate insulating layer 435, the capacitor metal layer 436, the organic layer interlayer insulating layer 437, the second metal layer 438, the passivation layer 439, the third metal layer 4310 and the planarization layer 4311. Among them, the film layer thickness of the inorganic layer in the thinning area 410B is thinned, that is, the film layer thickness of the inorganic layer in the thinning area 410B is smaller than the film layer thickness of the organic layer in the non-thinning area 410B, to provide the light transmittance of the display panel 10, and to ensure the light collection effect of the display panel 10 as a whole by setting the light shielding layer 300. The present embodiment does not specifically limit whether the organic layer in the thinning area 410B is thinned or not.

[0066] Figure 10 Another structural schematic diagram of a display panel provided by the embodiment of the present application is provided, Figure 11 Another structural schematic diagram of a display panel provided by the embodiment of the present application is provided, referring to Figure 10 and Figure 11 As shown in the figure, the display panel 10 further includes an under-screen functional area 110, the under-screen functional area 110 includes a display area 100A and a plurality of light-transmitting areas 100B arranged in an array, or the light-transmitting areas 100B are multiplexed as the under-screen functional area 110, and the under-screen functional area 110 does not overlap with the display area 100A.

[0067] Among them, the display panel 10 further includes an under-screen functional area 110, the under-screen functional area 110 can include camera function, temperature sensing and user face unlocking, etc., and the present embodiment does not specifically limit this. As shown in the figure, Figure 10 As shown in the figure, the under-screen functional area 110 includes a display area 100A and a plurality of light-transmitting areas 100B arranged in an array, and only three light-transmitting areas 100B are taken as an example for description, and the present embodiment does not specifically limit the number of light-transmitting areas 100B. Further, as shown in the figure, Figure 11 As shown in the figure, the light-transmitting areas 100B can be multiplexed as the under-screen functional area 110, that is, in the case that the light-transmitting areas 100B do not overlap with the display area 100A, the under-screen functional area 110 also does not overlap with the display area 100A, thereby increasing the screen utilization rate of the display panel 10.

[0068] Based on the same inventive concept, the embodiment of the present application also provides a display device, which includes any one of the display panels provided by the above-mentioned embodiments. Exemplarily, Figure 12 A structural schematic diagram of a display device provided by the embodiment of the present application is provided, referring to Figure 12The display device 1 includes the display panel 10. Therefore, the display device also has the beneficial effects of the display panel in the above embodiments, and the same can be understood with reference to the above explanation of the display panel, which will not be repeated hereinafter.

[0069] The display device 1 provided by the embodiment of the present application can be Figure 12 The mobile phone shown in the figure can also be any electronic product with a display function, including but not limited to the following categories: television, notebook computer, desktop display, tablet computer, digital camera, smart bracelet, smart glasses, vehicle-mounted display, industrial control equipment, medical display screen, touch interactive terminal, etc., and the present application is not specially limited to this.

[0070] Note that the above are only preferred embodiments of the present application and the technical principles applied. Those skilled in the art will understand that the present application is not limited to the specific embodiments described herein, and those skilled in the art can make various obvious changes, re-adjustments, mutual combinations and substitutions without departing from the scope of the present application. Therefore, although the present application has been described in more detail through the above embodiments, the present application is not limited to the above embodiments, and can include more other equivalent embodiments without departing from the concept of the present application, and the scope of the present application is determined by the scope of the appended claims.

Claims

1. A display panel, characterized by, The display panel comprises a display area and a light-transmitting area; The display area comprises a cliff-like film layer structure composed of at least one film layer, and a vertical projection of a film layer closest to the light-out surface in the cliff-like film layer structure on the light-out surface is located in a vertical projection of a film layer farther from the light-out surface on the light-out surface; The display panel further comprises a light-shielding layer, and the light-shielding layer comprises a light-shielding pattern, the light-shielding pattern is located in the display area, and the light-shielding pattern surrounds the light-transmitting area; An edge of a vertical projection of a film layer closest to the light-out surface in the cliff-like film layer structure on the light-out surface is located in a vertical projection of the light-shielding pattern on the light-out surface; The display panel comprises an array substrate and an organic light-emitting unit layer, and the organic light-emitting unit layer comprises a cathode layer; the cathode layer comprises a cathode pattern and a cathode connection line pattern; the cathode pattern and the cathode connection line pattern and an underlying film layer form the cliff-like film layer structure; and an edge of a vertical projection of the cathode pattern and the cathode connection line pattern on the light-out surface is located in a vertical projection of the light-shielding pattern on the light-out surface; Alternatively, the display panel comprises an array substrate and an organic light-emitting unit layer, and a hole is dug in the array substrate or a film layer is thinned in the array substrate, an edge of the hole or the film layer thinned region forms the cliff-like film layer structure; an edge of a vertical projection of the hole or the film layer thinned region on the light-out surface is located in a vertical projection of the light-shielding pattern on the light-out surface; the display panel further comprises an encapsulation layer, and the encapsulation layer is located on a side of the organic light-emitting unit layer away from the array substrate; the encapsulation layer comprises at least one organic layer and at least one inorganic layer which are alternately stacked, and the organic layer and / or the inorganic layer at least partially fills the hole or the film layer thinned region; The light-shielding layer is located on a side of the encapsulation layer away from the organic light-emitting unit layer.

2. The display panel of claim 1, wherein, In the light-shielding pattern overlapping with the projection of the cathode pattern or the cathode connection line pattern in the cathode layer, a width range D1 of a region not overlapping with the projection of the cathode pattern or the cathode connection line pattern satisfies: 0 < D1 ≤ 10 μm.

3. The display panel of claim 1, wherein, A minimum caliber of the hole or the film layer thinned region in a direction perpendicular to a plane in which the array substrate is located forms a high-transmittance area; an edge of the high-transmittance area is located in a vertical projection of the light-shielding pattern on the light-out surface, and a width range D2 of a region in which the high-transmittance area overlaps with the projection of the light-shielding pattern satisfies: 0 < D2 ≤ 5 μm.

4. The display panel of claim 1, wherein, The organic light-emitting unit layer further comprises an organic light-emitting unit, a black matrix and a color resist, the color resist is located on a light-out side of the organic light-emitting unit, the color resist corresponding to adjacent organic light-emitting units is different in color, and the black matrix is located in at least part of a region between two adjacent color resists; The light-shielding pattern and the black matrix are in the same layer and are made by the same process.

5. The display panel of claim 1, wherein, The array substrate comprises a substrate and a thin film transistor array layer on the substrate, and the light-shielding layer is located between the substrate and the thin film transistor array layer.

6. The display panel of claim 5, wherein, The substrate substrate includes a first flexible substrate, a buffer layer and a second flexible substrate stacked in a direction perpendicular to the substrate substrate and towards the thin film transistor array layer; and a second buffer layer and a third buffer layer are further included between the substrate substrate and the thin film transistor array layer; The light shielding layer is located between the second buffer layer and the third buffer layer.

7. The display panel of claim 1, wherein, The array substrate includes a substrate substrate and a thin film transistor array layer located on the substrate substrate; The thin film transistor array layer includes an active layer, a first gate insulating layer, a first metal layer, a second gate insulating layer, a capacitor metal layer, an organic interlayer insulating layer, a second metal layer, a passivation layer, a third metal layer and a planarization layer; The organic light emitting unit layer includes an anode reflection layer, a pixel definition layer, an organic light emitting layer and a cathode layer; The array substrate includes a substrate substrate and a thin film transistor array layer located on the substrate substrate; 8. The display panel of claim 1, wherein, The thin film transistor array layer includes a plurality of metal layers and organic layers and inorganic layers located between adjacent metal layers, respectively; The film layer thickness of the organic layer of the thinning area is less than the film layer thickness of the organic layer of the non-thinning area, and / or the vertical projection of the inorganic layer on the plane of the array substrate does not overlap with the thinning area. The array substrate includes a substrate substrate and a thin film transistor array layer located on the substrate substrate; 9. The display panel of claim 1, wherein, The thin film transistor array layer includes a plurality of metal layers and organic layers and inorganic layers located between adjacent metal layers, respectively; The film layer thickness of the inorganic layer of the thinning area is less than the film layer thickness of the organic layer of the non-thinning area. The display panel further includes an under-screen functional area, the under-screen functional area includes a display area and a plurality of light transmission areas arranged in an array, or the light transmission areas are multiplexed as the under-screen functional area, and the under-screen functional area does not overlap with the display area.

10. The display panel of claim 1, wherein, The display panel includes any one of the display panels in claims 1-10.

11. A display device, characterized by comprising: ​

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