OLED display panel and preparation method thereof

Abstract

This invention provides an OLED display panel and its fabrication method. The OLED display panel includes a display area and a non-display area located on at least one side of the display area. The OLED display panel includes a substrate, an auxiliary electrode located on the substrate and within the non-display area, a first film layer on the substrate, a second film layer on the substrate and the first film layer, and a first electrode on the second film layer. The first film layer has a first opening for accommodating the auxiliary electrode, and the second film layer has a second opening above the first opening. The width of the second opening is greater than the width of the first opening, forming a stepped surface between the first and second openings. The first electrode overlaps with the auxiliary electrode pattern through the stepped surface and the first opening. By forming a stepped surface structure at the overlap hole between the first electrode and the auxiliary electrode, the slope of the first and second film layers at the overlap hole edge is segmented, improving the continuity and reliability of the first electrode at the overlap hole.

Description

Technical Field

[0001] This invention relates to the field of display technology, and more particularly to an OLED display panel and its manufacturing method. Background Technology

[0002] AMOLED (Active-matrix organic light emitting diode) display technology has been widely used in the display market due to its high contrast, wide viewing angle, and fast response speed.

[0003] As a current-driven display technology, AMOLED is highly sensitive to differences in trace resistance. AMOLED display devices are divided into top-emitting and bottom-emitting devices. Top-emitting devices, in particular, use thin cathodes as transparent electrodes. The overlap resistance between the cathode and traces, as well as the resistance differences caused by variations in cathode thickness under different display surface morphologies, have a significant impact on the overall resistance of the OLED (Organic Light-Emitting Diode). At the junction of the cathode and traces, openings in the organic layer are required. The length and angle of these openings significantly affect the cathode thickness and continuity (the larger the angle, the worse the continuity and reliability of the cathode at the opening area).

[0004] like Figure 1 The figure shows a cross-sectional structural diagram of a conventional OLED display panel in the prior art. As can be seen from the figure, the OLED display panel includes a substrate 10, a buffer layer 11, a planarization layer (PLN) 12, an anode 13, an OLED light-emitting layer 14, a cathode layer 15, and an auxiliary electrode 16, as well as an overlap hole where the auxiliary electrode is located. The sidewalls of the overlap hole are generally a single planarization layer or a stack of a buffer layer and a planarization layer, such as... Figure 1 As shown in regions A1 and A2, the sidewalls formed by the stack of buffer layer and planarization layer are relatively high and have a steep slope. Since the cathode is made by vapor deposition, the steeper the slope, the thinner the cathode will be on the slope. Therefore, the continuity and reliability of the cathode at the overlap hole slope are poor, which in turn affects the reliability of the OLED display device.

[0005] Therefore, existing OLED display panels have a technical problem where the continuity and reliability of the cathode at the overlap hole are poor due to the large slope at the overlap hole between the cathode and the auxiliary electrode, which needs to be improved. Summary of the Invention

[0006] This invention provides an OLED display panel and its manufacturing method to alleviate the technical problem of poor continuity and reliability of the cathode at the overlap hole caused by the large slope at the overlap hole between the cathode and the auxiliary electrode in existing OLED display panels.

[0007] To solve the above problems, the technical solution provided by the present invention is as follows:

[0008] This invention provides an OLED display panel, including a display area and a non-display area located on at least one side of the display area. The OLED display panel includes:

[0009] substrate;

[0010] An auxiliary electrode is located on the substrate and within the non-display area;

[0011] A first film layer is located on the substrate and has a first opening to accommodate the auxiliary electrode;

[0012] A second film layer is located on the substrate and the first film layer, and a second opening is provided above the first opening; the width of the second opening is greater than the width of the first opening, so that a stepped surface is formed between the first opening and the second opening;

[0013] The first electrode is located on the second film layer and overlaps with the auxiliary electrode pattern through the stepped surface and the first opening.

[0014] In the OLED display panel provided in the embodiments of the present invention, the second film layer includes a first portion located on the first film layer and a second portion connected to the first portion. The first portion is provided with a second opening, the second portion covers the side of the first film layer, and the thickness of the second portion is greater than the thickness of the first portion.

[0015] In the OLED display panel provided in the embodiments of the present invention, the thickness of the first film layer is greater than the thickness of the first portion of the film layer.

[0016] In the OLED display panel provided in this embodiment of the invention, the difference between the width of the second opening and the width of the first opening is greater than the film thickness of the first portion of the film layer.

[0017] In the OLED display panel provided in this embodiment of the invention, the difference between the width of the second opening and the width of the first opening is more than twice the thickness of the first partial film layer.

[0018] In the OLED display panel provided in the embodiments of the present invention, the second opening is formed by a first sidewall of the second film layer near the display area and a second sidewall away from the display area, and the first opening is formed by a first sidewall of the first film layer near the display area and a second sidewall away from the display area; the first distance between the first sidewall of the second film layer and the first sidewall of the first film layer is different from the second distance between the second sidewall of the second film layer and the second sidewall of the first film layer.

[0019] In the OLED display panel provided in this embodiment of the invention, the first distance is more than 1.5 times greater than the second distance.

[0020] In the OLED display panel provided in the embodiments of the present invention, the first film layer includes one of a buffer layer and an interlayer insulating layer, and the second film layer includes one of a planarization layer and a pixel definition layer.

[0021] Furthermore, embodiments of the present invention also provide a method for manufacturing an OLED display panel, comprising:

[0022] Provide substrate;

[0023] An auxiliary electrode is fabricated on the substrate;

[0024] A first film layer is prepared, which is located on the substrate and has a first opening to accommodate the auxiliary electrode;

[0025] A second film layer is prepared, which is located on the substrate and the first film layer, and a second opening is provided above the first opening; the width of the second opening is greater than the width of the first opening, so that a step surface is formed between the first opening and the second opening;

[0026] A first electrode is prepared, which is located on the second film layer and overlaps with the auxiliary electrode pattern through the stepped surface and the first opening.

[0027] In the OLED display panel fabrication method provided in this embodiment of the invention, the step of fabricating the second film layer includes:

[0028] Organic materials are coated onto the substrate and the first film layer using a slot coating method.

[0029] The coated organic material film is processed to form the second opening, resulting in the second film. The second film includes a first portion located on the first film and a second portion connected to the first portion. The first portion is provided with the second opening, and the second portion covers the side of the first film. The thickness of the second portion is greater than the thickness of the first portion.

[0030] The beneficial effects of this invention are as follows: This invention provides an OLED display panel and a method for manufacturing the same; the OLED display panel includes a display area and a non-display area located on at least one side of the display area, the OLED display panel includes a substrate, an auxiliary electrode located on the substrate and within the non-display area, a first film layer located on the substrate, a second film layer located on the substrate and the first film layer, and a first electrode located on the second film layer, wherein the first film layer has a first opening for accommodating the auxiliary electrode, the second film layer has a second opening above the first opening, the width of the second opening is greater than the width of the first opening, so that a stepped surface is formed between the first opening and the second opening, and the first electrode overlaps with the pattern of the auxiliary electrode through the stepped surface and the first opening. In this embodiment of the invention, by forming a stepped surface structure at the overlap hole between the first electrode and the auxiliary electrode, the slope of the first film layer and the second film layer at the edge of the overlap hole is segmented, improving the continuity and reliability of the first electrode at the overlap hole. Attached Figure Description

[0031] To more clearly illustrate the technical solutions in the embodiments of this application, the accompanying drawings used in the description of the embodiments will be briefly introduced below. Obviously, the accompanying drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0032] Figure 1 A schematic cross-sectional view of a conventional OLED display panel in the prior art provided for embodiments of the present invention;

[0033] Figures 2 to 6 This is a schematic diagram of the cross-sectional structure of an OLED display panel provided in an embodiment of the present invention. Detailed Implementation

[0034] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0035] In the description of this invention, it should be understood that the terms "center," "longitudinal," "lateral," "length," "width," "thickness," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," and "outer," etc., indicating orientation or positional relationships based on the orientation or positional relationships shown in the accompanying drawings, are only for the convenience of describing the invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of the invention. Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of indicated technical features. Thus, features defined with "first" and "second" may explicitly or implicitly include one or more of the stated features. In the description of this invention, "a plurality of" means two or more, unless otherwise explicitly specified.

[0036] In this application, the term "exemplary" is used to mean "serving as an example, illustration, or description." Any embodiment described as "exemplary" in this application is not necessarily to be construed as being more preferred or advantageous than other embodiments. The following description is provided to enable any person skilled in the art to make and use the invention. Details are set forth in the following description for purposes of explanation. It should be understood that those skilled in the art will recognize that the invention can be made without using these specific details. In other instances, well-known structures and processes will not be described in detail to avoid obscuring the description of the invention with unnecessary detail. Therefore, the invention is not intended to be limited to the embodiments shown, but is consistent with the broadest scope of the principles and features disclosed in this application.

[0037] The present invention addresses the technical problem of poor continuity and reliability of the cathode at the overlap hole due to the large slope at the overlap hole between the cathode and the auxiliary electrode in existing OLED display panels.

[0038] To alleviate the above problems, this application provides an OLED display panel. Specifically, the OLED display panel provided in this application includes a display area and a non-display area located on at least one side of the display area. The OLED display panel includes a substrate, an auxiliary electrode located on the substrate and within the non-display area, a first film layer located on the substrate, a second film layer located on the substrate and the first film layer, and a first electrode located on the second film layer. The first film layer is provided with a first opening for receiving the auxiliary electrode, and the second film layer is provided with a second opening above the first opening. The width of the second opening is greater than the width of the first opening, so that a stepped surface is formed between the first opening and the second opening. The first electrode overlaps with the pattern of the auxiliary electrode through the stepped surface and the first opening.

[0039] The display panel provided in this application will be described in detail below through specific embodiments.

[0040] In one embodiment, please refer to Figure 6 , Figure 6 A cross-sectional structural diagram of an OLED display panel is provided for embodiments of the present invention, such as... Figure 6 As shown, the OLED display panel provided in this embodiment of the invention includes a display area 001 and a non-display area 002 located on at least one side of the display area 001. The OLED display panel includes:

[0041] substrate 21;

[0042] The auxiliary electrode 22 is located on the substrate 21 and within the non-display area 002;

[0043] The first film layer 23 is located on the substrate 21 and has a first opening to accommodate the auxiliary electrode 22;

[0044] The second film layer 24 is located on the substrate 21 and the first film layer 23, and a second opening is provided above the first opening; the width W2 of the second opening is greater than the width W1 of the first opening, so that a stepped surface is formed between the first opening and the second opening.

[0045] The first electrode 25 is located on the second film layer 24 and overlaps with the pattern of the auxiliary electrode 22 through the stepped surface and the first opening.

[0046] It is understood that the films listed above are not all of the OLED display panels. The figures only show the relative positions of the films and they are not necessarily in direct contact.

[0047] like Figure 6As shown, the display area 001 and the non-display area 002 of the OLED display panel are separated by a wavy line. The left part of the figure shows the structure of the display area 001 (not fully shown in the figure), and the right part of the figure shows the structure of the non-display area 002.

[0048] It should be noted that, in the embodiments of this application, the first electrode 25 refers to the cathode of the OLED display panel; the first film layer 23 exists only in a portion of the area to assist the second film layer 24 in forming a stepped surface.

[0049] This invention provides an OLED display panel and its fabrication method. The OLED display panel includes a display area and a non-display area located on at least one side of the display area. The OLED display panel includes a substrate, an auxiliary electrode located on the substrate and within the non-display area, a first film layer located on the substrate, a second film layer located on the substrate and the first film layer, and a first electrode located on the second film layer. The first film layer has a first opening for accommodating the auxiliary electrode, and the second film layer has a second opening above the first opening. The width of the second opening is greater than the width of the first opening, forming a stepped surface between the first opening and the second opening. The first electrode overlaps with the auxiliary electrode pattern through the stepped surface and the first opening. This embodiment of the invention, by forming a stepped surface structure at the overlap hole between the first electrode and the auxiliary electrode, segments the slope of the first film layer and the second film layer at the edge of the overlap hole, improving the continuity and reliability of the first electrode at the overlap hole.

[0050] In one embodiment, such as Figure 6 As shown, the second film layer 24 includes a first portion 241 located on the first film layer 23 and a second portion 242 connected to the first portion 241. The first portion 241 is provided with the second opening, and the second portion 242 covers the side of the first film layer 23. The thickness d2 of the second portion 242 is greater than the thickness d1 of the first portion 241.

[0051] It is understood that in this embodiment, the second film layer 24 consists of two continuous parts. The first film layer 23 exists only in a partial area and is covered by the second film layer 24. The portion of the second film layer 24 covering the first film layer 23 is the first part 241 of the second film layer 24, and this first part 241 is thinner. The second part 242 of the second film layer 24 is connected to the first part 241, and this second part 242 is thicker, that is, the thickness of the second part 242 is greater than the thickness of the first part 241. In addition, the second opening on the second film layer 24 is located in the first part 241 of the second film layer 24 and above the first opening of the first film layer 23. The width W2 of the second opening is greater than the width W1 of the first opening. Therefore, a portion of the first film layer 23 is exposed at the bottom of the second opening. This portion and the first part 241 of the second film layer 24 form a stepped structure, i.e., a stepped surface. This reduces the slope between the second film layer 24 and the auxiliary cathode. When the first electrode 25 is deposited on top of the second film layer 24, the risk of failure of the first electrode 25 will not increase due to the steep slope. It should be noted that since the first electrode 25 is made by vapor deposition, the steeper the slope, the thinner the thickness of the first electrode 25 on the slope. Therefore, a small slope is beneficial to improving the continuity of the first electrode 25 film formation, thereby improving the reliability of the OLED device.

[0052] In one embodiment, such as Figure 6 As shown, the thickness d3 of the first film layer 23 is greater than the thickness d1 of the first portion 241 film layer; specifically, the thickness of the first portion 241 film layer is thinner, which is beneficial to reduce the slope at the step surface, thereby improving the continuity and reliability of the film formation of the first electrode 25 and reducing the risk of failure of the first electrode 25.

[0053] In one embodiment, such as Figure 6 As shown, the difference between the width W2 of the second opening and the width W1 of the first opening is greater than the film thickness of the first portion 241 film layer. It can be understood that the difference between the width W2 of the second opening and the width W1 of the first opening determines the gentleness of the slope at the step surface. The larger the difference, the longer the slope and the smaller the angle, that is, the gentler the slope. Therefore, the difference between the width W2 of the second opening and the width W1 of the first opening must be at least greater than the film thickness of the first distributed film layer in order to form a gentler slope, which is conducive to improving the continuity and reliability of the film formation of the first electrode 25.

[0054] Preferably, in one embodiment, such as Figure 6As shown, the difference between the width W2 of the second opening and the width W1 of the first opening is more than twice the film thickness of the first portion 241 film layer. Specifically, the greater the difference between the width W2 of the second opening and the width W1 of the first opening, the gentler the slope at the step surface. When the difference between the width W2 of the second opening and the width W1 of the first opening is more than twice the film thickness of the first portion 241 film layer, the slope at the step surface is relatively small, which is more conducive to improving the continuity and reliability of the film formation of the first electrode 25.

[0055] In one embodiment, such as Figure 6 As shown, the second opening is formed by the first sidewall 261 of the second film layer 24 near the display area and the second sidewall 262 away from the display area 001, and the first opening is formed by the first sidewall 271 of the first film layer 23 near the display area 001 and the second sidewall 272 away from the display area 001; the first distance between the first sidewall 261 of the second film layer 24 and the first sidewall 271 of the first film layer 23 is different from the second distance between the second sidewall 262 of the second film layer 24 and the second sidewall 272 of the first film layer 23.

[0056] It should be noted that in this embodiment, the first electrode 25 extends from the display area 001 to the non-display area 002, and connects with the auxiliary electrode 22 at the first opening of the non-display area 002 to reduce the resistance of the display device. Therefore, the gentleness of the slope of the step surface near the display area 001 is particularly important to the continuity and reliability of the first electrode 25. So, under normal circumstances, the step surface near the display area 001 is gentler than the step surface far from the display area 001, that is, the first distance is greater than the second distance.

[0057] Preferably, in one embodiment, the first distance is more than 1.5 times the second distance; specifically, the first distance is more than 1.5 times the second distance. Since the second distance is smaller, it is beneficial to reduce the bezel width of the OLED display device, that is, to achieve a narrow bezel.

[0058] In one embodiment, the first film layer 23 includes one of a buffer layer and an interlayer insulating layer, and the second film layer 24 includes one of a planarization layer and a pixel definition layer.

[0059] Accordingly, this application also provides a method for preparing an OLED display panel, the method comprising:

[0060] Provide substrate;

[0061] An auxiliary electrode is fabricated on the substrate;

[0062] A first film layer is prepared, which is located on the substrate and has a first opening to accommodate the auxiliary electrode;

[0063] A second film layer is prepared, which is located on the substrate and the first film layer, and a second opening is provided above the first opening; the width of the second opening is greater than the width of the first opening, so that a step surface is formed between the first opening and the second opening;

[0064] A first electrode is prepared, which is located on the second film layer and overlaps with the auxiliary electrode pattern through the stepped surface and the first opening.

[0065] Now combined Figures 2 to 6 The method for preparing the OLED display panel provided in the embodiments of this application will be described.

[0066] like Figures 2 to 6 As shown, the method for manufacturing an OLED display panel provided in this application includes the following steps:

[0067] Step 1: Provide a substrate.

[0068] Specifically, such as Figure 2 As shown, the substrate 21 is an array substrate, which may include an active layer, a gate electrode, a gate insulating layer, a source electrode and a drain electrode, a passivation layer and a planarization layer disposed on the substrate, which will not be described in detail here.

[0069] Step 2: Prepare auxiliary electrodes on the substrate.

[0070] like Figure 3 As shown, the auxiliary electrode 22 is formed on the substrate 21 and located in the non-display area 002 of the OLED display panel. The auxiliary electrode 22 can overlap with the first electrode to reduce the sheet resistance of the first electrode.

[0071] Step 3: Prepare the first film layer.

[0072] like Figure 4 As shown, a first film layer 23 is formed on the substrate 21, and a first opening is provided in the first film layer 23 to accommodate the auxiliary electrode 22. The first film layer 23 can be a buffer layer or an interlayer insulating layer. In this embodiment, the first film layer 23 is a buffer layer, which can include a single layer of insulating film such as silicon nitride (SiNx) and silicon oxide (SiOx) or a multilayer film of silicon nitride (SiNx) and silicon oxide (SiOx) stacked together. The thickness of the buffer layer is generally 0.1 to 2 micrometers. The buffer layer prevents the penetration of impurities or unwanted components such as moisture.

[0073] Step 4: Prepare the second film layer.

[0074] like Figure 5 As shown, a second film layer 24 is formed on the substrate 21 and the first film layer 23. The second film layer 24 has a second opening corresponding to the first opening above the first opening. The width W2 of the second opening is greater than the width W1 of the first opening, so that a stepped surface is formed between the first opening and the second opening.

[0075] In one embodiment, the step of preparing the second film layer includes:

[0076] Step 41: Apply organic material to the substrate 21 and the first film layer 23 using a slot coating method.

[0077] Step 42: Process the coated organic material film layer to form the second opening, and obtain the second film layer 24. The second film layer 24 includes a first portion 241 located on the first film layer 23 and a second portion 242 connected to the first portion 241. The first portion 241 is provided with the second opening, and the second portion 242 covers the side of the first film layer 23. The thickness of the second portion 242 is greater than the thickness of the first portion 241.

[0078] Specifically, the second film layer 24 can be a planarization layer or a pixel definition layer; in this embodiment, the second film layer 24 is a planarization layer, which is usually thick and is used to provide a flat surface for the deposition of the anode; the material of the planarization layer is generally a polymer, and the thickness is about 1 to 5 micrometers.

[0079] Step 5: Prepare the first electrode.

[0080] Specifically, such as Figure 6 As shown, a first electrode 25 is deposited on the second film layer 24 by vapor deposition. The first electrode 25 overlaps with the pattern of the auxiliary electrode 22 through the stepped surface and the first opening. The first electrode 25 is generally prepared by vapor deposition or magnetron sputtering. The material used may include a material layer with a low work function, such as Li, Ca, LiF / Ca, LiF / Al, Al, Mg, Ag, Pt, Pd, Ni, Au, Nd, Ir, Cr, BaF2, Ba or its compounds or mixtures (e.g., a mixture of Ag and Mg). It may also include a transparent metal oxide layer disposed on the material layer with the low work function.

[0081] This completes the production of the OLED display panel.

[0082] As can be seen from the above description, in the OLED display panel manufacturing method provided in this application, by forming a stepped surface structure at the overlap hole of the first electrode and the auxiliary electrode, the slope of the first film layer and the second film layer at the edge of the overlap hole is segmented, thereby improving the continuity and reliability of the first electrode at the overlap hole.

[0083] As can be seen from the above embodiments:

[0084] This invention provides an OLED display panel and its fabrication method. The OLED display panel includes a display area and a non-display area located on at least one side of the display area. The OLED display panel includes a substrate, an auxiliary electrode located on the substrate and within the non-display area, a first film layer located on the substrate, a second film layer located on the substrate and the first film layer, and a first electrode located on the second film layer. The first film layer has a first opening for accommodating the auxiliary electrode, and the second film layer has a second opening above the first opening. The width of the second opening is greater than the width of the first opening, forming a stepped surface between the first opening and the second opening. The first electrode overlaps with the auxiliary electrode pattern through the stepped surface and the first opening. By forming a stepped surface structure at the overlap hole between the first electrode and the auxiliary electrode, this invention segments the slope of the first film layer and the second film layer at the edge of the overlap hole, improving the continuity and reliability of the first electrode at the overlap hole, thereby improving the reliability of the OLED display device.

[0085] In summary, although the present invention has been disclosed above with reference to preferred embodiments, the above preferred embodiments are not intended to limit the present invention. Those skilled in the art can make various modifications and refinements without departing from the spirit and scope of the present invention. Therefore, the scope of protection of the present invention shall be determined by the scope defined in the claims.

Claims

1. An OLED display panel, comprising a display area and a non-display area located on at least one side of the display area, characterized in that, The OLED display panel includes: substrate; An auxiliary electrode is located on the substrate and within the non-display area; A first film layer is located on the substrate and has a first opening to accommodate the auxiliary electrode; A second film layer is located on the substrate and the first film layer, and a second opening is provided above the first opening; the width of the second opening is greater than the width of the first opening, so that a stepped surface is formed between the first opening and the second opening; The first electrode is located on the second film layer and overlaps with the auxiliary electrode pattern through the stepped surface and the first opening; The second membrane layer includes a first portion located on the first membrane layer and a second portion connected to the first portion. The first portion is provided with the second opening, and the second portion covers the side of the first membrane layer. The thickness of the second portion is greater than the thickness of the first portion. The difference between the width of the second opening and the width of the first opening is greater than the thickness of the first portion of the film layer; The second opening is formed by a first sidewall of the second film layer near the display area and a second sidewall away from the display area, and the first opening is formed by a first sidewall of the first film layer near the display area and a second sidewall away from the display area; the first distance between the first sidewall of the second film layer and the first sidewall of the first film layer is greater than the second distance between the second sidewall of the second film layer and the second sidewall of the first film layer.

2. The OLED display panel according to claim 1, characterized in that, The thickness of the first membrane layer is greater than the thickness of the first portion of the membrane layer.

3. The OLED display panel according to claim 1, characterized in that, The difference between the width of the second opening and the width of the first opening is more than twice the thickness of the first portion of the film layer.

4. The OLED display panel according to claim 1, characterized in that, The first distance is more than 1.5 times the second distance.

5. The OLED display panel according to any one of claims 1 to 4, characterized in that, The first film layer includes one of a buffer layer and an interlayer insulating layer, and the second film layer includes one of a planarization layer and a pixel definition layer.

6. A method for manufacturing an OLED display panel as described in any one of claims 1 to 5, characterized in that, include: Provide substrate; An auxiliary electrode is fabricated on the substrate; A first film layer is prepared, which is located on the substrate and has a first opening to accommodate the auxiliary electrode; A second film layer is prepared, which is located on the substrate and the first film layer, and a second opening is provided above the first opening; the width of the second opening is greater than the width of the first opening, so that a step surface is formed between the first opening and the second opening; A first electrode is prepared, which is located on the second film layer and overlaps with the auxiliary electrode pattern through the stepped surface and the first opening.

7. The method for preparing an OLED display panel according to claim 6, characterized in that, The steps for preparing the second film layer include: Organic materials are coated onto the substrate and the first film layer using a slot coating method. The coated organic material film is processed to form the second opening, resulting in the second film. The second film includes a first portion located on the first film and a second portion connected to the first portion. The first portion is provided with the second opening, and the second portion covers the side of the first film. The thickness of the second portion is greater than the thickness of the first portion.

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