Torque pump and chemical liquid supply unit

Abstract

An exemplary embodiment of the present invention provides a pump for supplying liquid. The pump includes: a flexible tube body including a pump chamber; a first flange disposed at one end of the tube body; a second flange disposed at the other end of the tube body; and a drive unit for transmitting rotational force to the tube body to twist the tube body, wherein the tube body has a curved portion bent at a predetermined angle.

Description

Technical Field

[0001] The present invention relates to a pump and a chemical liquid supply device including the pump. Background Technology

[0002] To manufacture semiconductor devices or liquid crystal displays, various processes are performed on a substrate, such as photography, etching, ashing, ion implantation, thin film deposition, and cleaning. Among these processes, the photography, etching, ashing, and cleaning processes involve liquid handling, which supplies liquid to the substrate.

[0003] Typically, liquid processing involves treating a substrate with liquid by discharging a processing liquid from a nozzle.

[0004] Various pumps are used in liquid handling processes to supply chemical liquids. Among them, micro pumps (Entegris, rolling diaphragm pumps) are difficult to apply to microprocessing equipment (ArF, EUV equipment) due to their low chemical liquid displacement rate and the high likelihood of particles caused by stagnant photoresist (PR).

[0005] Another type of EPT pump (developed jointly by the Korea Institute of Industrial Technology and Koganei, using the tubular diaphragm method) requires a ball screw, LM guide, and LM block to convert the rotational force of the motor into the force of vertical movement, which increases the size of the pump. Summary of the Invention

[0006] This invention aims to provide a torque pump and a chemical liquid supply unit that can improve the chemical liquid displacement rate.

[0007] The present invention has also been dedicated to providing a torque pump and chemical liquid supply unit that can be reduced in size.

[0008] The present invention has also been dedicated to providing a torque pump and a chemical liquid supply unit that can compensate for the length of the pipe based on the torsional deformation of the pipe.

[0009] The problems to be solved by this invention are not limited to those described above. Those skilled in the art will clearly understand any problems not mentioned below based on the following description.

[0010] An exemplary embodiment of the present invention provides a torque pump comprising: a tube including a pump chamber communicating with a chemical liquid inlet and a chemical liquid outlet; and a drive unit for transmitting rotational force to the tube to twist the tube, wherein the tube has a non-linear shape.

[0011] In addition, the tube may have a curved portion that bends at a predetermined angle.

[0012] In addition, the pipe may include: a flexible pipe body; a first flange disposed at one end of the pipe body; and a second flange disposed at the other end of the pipe body, and the second flange is connected to the drive unit and is rotated.

[0013] Furthermore, the tube body can be configured such that a first central axis passing through one end of the tube body and a second central axis passing through the other end of the tube body intersect each other at the curved portion.

[0014] In addition, the tube body can be configured as an elliptical or rectangular cross-section with a large aspect ratio.

[0015] In addition, the torque pump may also include a compensation member disposed on the first flange and compensating for vertical length deformation when the pipe body is twisted.

[0016] Furthermore, the compensation member can be either a rolling diaphragm or an elastic member.

[0017] Furthermore, the drive unit may have a rotating shaft connected to the second flange; and the rotating shaft may be positioned on the same line as the second central axis.

[0018] Another exemplary embodiment of the present invention provides an apparatus for supplying a chemical liquid, the apparatus comprising: a pump for supplying the chemical liquid to a nozzle, the nozzle discharging the chemical liquid onto a substrate; a collection tank temporarily storing the chemical liquid to be supplied from the pump to the nozzle; a bottle containing the chemical liquid stored in the collection tank; and a filter disposed in a path for supplying the chemical liquid from the collection tank to the pump, wherein the pump comprises: a tube including a pump chamber communicating with a chemical liquid inlet and a chemical liquid outlet and having a non-linear shape; and a drive unit for transmitting rotational force to the tube to twist the tube.

[0019] In addition, the tube may have a curved portion that bends at a predetermined angle.

[0020] In addition, the pipe may include: a flexible pipe body; a first flange disposed at one end of the pipe body; and a second flange disposed at the other end of the pipe body, and the second flange may be connected to the drive unit.

[0021] Furthermore, the tube body can be configured such that a first central axis passing through one end of the tube body and a second central axis passing through the other end of the tube body intersect each other at the curved portion.

[0022] In addition, the tube body can be configured as an elliptical or rectangular cross-section with a large aspect ratio.

[0023] In addition, the torque pump may also include a compensation member disposed on the first flange and compensating for vertical length deformation when the pipe body is twisted.

[0024] Furthermore, the compensation member can be either a rolling diaphragm or an elastic member.

[0025] Furthermore, the drive unit may have a rotating shaft connected to the second flange; and the rotating shaft may be positioned on the same line as the second central axis.

[0026] Another exemplary embodiment of the present invention provides a torque pump comprising: a flexible tube body including a pump chamber; a first flange disposed at one end of the tube body; a second flange disposed at the other end of the tube body; and a drive unit for transmitting rotational force to the tube body to twist the tube body, wherein the tube body has a curved portion bent at a predetermined angle.

[0027] Furthermore, the tube body can be configured such that a first central axis passing through one end of the tube body and a second central axis passing through the other end of the tube body intersect each other at the curved portion.

[0028] In addition, the tube body can be configured as an elliptical or rectangular cross-section with a large aspect ratio.

[0029] In addition, the torque pump may also include a compensation member disposed on the first flange and compensating for vertical length deformation when the pipe body is twisted, wherein the compensation member may be either a rolling diaphragm or an elastic member.

[0030] According to an exemplary embodiment of the present invention, the chemical liquid displacement rate can be replaced.

[0031] According to an exemplary embodiment of the present invention, the size of the pump can be reduced.

[0032] According to an exemplary embodiment of the present invention, the tube can be stably twisted.

[0033] According to an exemplary embodiment of the present invention, stable torsional operation of the tube can be achieved by compensating for the length of the tube based on the torsional deformation of the tube. Attached Figure Description

[0034] Figure 1 This is a perspective view schematically illustrating a substrate processing apparatus according to an exemplary embodiment of the present invention.

[0035] Figure 2 It is shown Figure 1 Cross-sectional view of the coating block and developing block of the substrate processing equipment.

[0036] Figure 3 yes Figure 1 Top view of the substrate processing equipment.

[0037] Figure 4 This is an example diagram showing the hand of a delivery robot.

[0038] Figure 5 It is shown schematically. Figure 3 A top plan view of an example heat treatment chamber, and Figure 6 yes Figure 5 Front view of the heat treatment chamber.

[0039] Figure 7 This is a cross-sectional view illustrating an exemplary embodiment of a liquid processing chamber for liquid processing of a rotating substrate W by supplying processing liquid to the substrate W.

[0040] Figure 8 yes Figure 7 Top view of the liquid handling chamber.

[0041] Figure 9 It is shown Figure 3 A perspective view of an example of a delivery robot.

[0042] Figure 10 This is a diagram showing the configuration of the liquid supply unit.

[0043] Figure 11 It is shown Figure 10 The diagram shows the pump.

[0044] Figure 12 It is shown Figure 11 The pump shown is a perspective view.

[0045] Figure 13 This is a diagram showing the operating status of the pump.

[0046] Figure 14 It is a diagram showing various cross-sectional shapes of the tube body.

[0047] Figure 15 and Figure 16 This is a diagram showing a pump according to the second embodiment.

[0048] Figure 17 This is a diagram showing a pump according to a third embodiment.

[0049] Figure 18 This is a diagram illustrating an example of a modified compensation component. Detailed Implementation

[0050] Advantages and features, as well as methods for implementing them, will become apparent when the exemplary embodiments described in detail with reference to the accompanying drawings are consulted. However, this disclosure is not limited to the exemplary embodiments disclosed herein, but will be practiced in various forms, and the exemplary embodiments are provided so that this disclosure is fully disclosed and its scope will be fully understood by those skilled in the art, and this disclosure will be limited only by the scope of the appended claims.

[0051] Even if not defined, all terms used herein (including technical or scientific terms) have the same meaning as commonly accepted by one of ordinary skill in the relevant art to which this invention pertains. Terms defined by a general dictionary may be interpreted as having the same meaning as in the text of related technologies and / or this application, and even if a term is not clearly defined herein, it is not to be conceptualized or over-formally interpreted. The terminology used in this specification is for the purpose of describing exemplary embodiments and is not intended to limit the invention.

[0052] In this specification, unless otherwise stated, the singular form includes the plural form. The term "comprising" and / or various variations of the verb do not exclude the presence or addition of one or more other compositions, components, elements, steps, operations, and / or devices in addition to those mentioned. Furthermore, "provided" and "having" should be interpreted in the same manner.

[0053] The apparatus of this exemplary embodiment is described as being used to perform a photolithography process on a substrate such as a semiconductor wafer or a flat panel display panel, but this is for ease of description, and the invention can also be used in other apparatuses that use pumps to supply chemical liquids to process the substrate.

[0054] In the following text, reference will be made to Figures 1 to 17 Description of embodiments of the present invention.

[0055] Figure 1 This is a perspective view schematically illustrating a substrate processing apparatus according to an exemplary embodiment of the present invention. Figure 2 It is shown Figure 1 A cross-sectional view of the coating block and developing block of the substrate processing equipment, and Figure 3 yes Figure 1 Top view of the substrate processing equipment.

[0056] refer to Figures 1 to 3 According to an exemplary embodiment of the present invention, the substrate processing apparatus 10 includes a transposition module 100, a processing module 300, and an interface module 500.

[0057] According to an exemplary embodiment, the transposition module 100, the processing module 300, and the interface module 500 are arranged in a row in sequence. Hereinafter, the arrangement direction of the transposition module 100, the processing module 300, and the interface module 500 is referred to as the first direction 12, the direction perpendicular to the first direction 12 when viewed from above is defined as the second direction 14, and the direction perpendicular to both the first direction 12 and the second direction 14 is defined as the third direction 16.

[0058] The transposition module 100 transfers the substrate W from the container F containing the substrate W to the processing module 300, and receives the fully processed substrate W into the container F. The longitudinal direction of the transposition module 100 is arranged in the second direction 14. The transposition module 100 includes a loading port 110 and a transposition frame 130. The loading port 110 is located on the side opposite to the processing module 300 relative to the transposition frame 130. The container F containing the substrate W is placed on the loading port 110. Multiple loading ports 110 can be provided, and the multiple loading ports 110 can be arranged along the second direction 14.

[0059] As container F, an airtight container F, such as a front-opening unified pod (FOUP), can be used. Container F can be placed on loading port 110 by a conveying device (not shown) (such as an overhead conveyor, overhead transporter, or automated guided vehicle) or by an operator.

[0060] A transposition robot 132 is disposed inside a transposition frame 130. A guide rail 136, whose longitudinal direction is disposed along a second direction 14, is disposed within the transposition frame 130, and the transposition robot 132 is configured to be movable on the guide rail 136. The transposition robot 132 includes a hand on which a substrate W is placed, and the hand is configured to be movable back and forth, rotatable about a third direction 16, and movable in the third direction 16.

[0061] The processing module 300 performs a coating process and a developing process on the substrate W. The processing module 300 can receive the substrate W contained in the container F and perform substrate processing. The processing module 300 includes coating blocks 300a and developing blocks 300b. The coating blocks 300a perform the coating process on the substrate W, and the developing blocks 300b perform the developing process on the substrate W. Multiple coating blocks 300a are provided and are stacked on top of each other. Multiple developing blocks 300b are provided and are stacked on top of each other. Figure 1 In an exemplary embodiment, two coating blocks 300a and two developing blocks 300b are respectively provided. The coating blocks 300a may be disposed below the developing blocks 300b. According to the example, the two coating blocks 300a perform the same process and may be arranged in the same structure. Furthermore, the two developing blocks 300b may perform the same process and may be arranged in the same structure.

[0062] refer to Figure 3 The coating block 300a includes a heat treatment chamber 320, a transfer chamber 350, a liquid treatment chamber 360, and buffer chambers 312 and 316. The heat treatment chamber 320 performs a heat treatment process on the substrate W. The heat treatment process may include a cooling process and a heating process. The liquid treatment chamber 360 supplies liquid to the substrate W to form a liquid film. The liquid film may be a photoresist film or an anti-reflective film. The transfer chamber 350 transfers the substrate W between the heat treatment chamber 320 and the liquid treatment chamber 360 in the coating block 300a.

[0063] The transfer chamber 350 is configured such that its longitudinal direction is parallel to the first direction 12. A transfer robot 350 is disposed within the transfer chamber 900. The transfer robot 352 transfers substrates between the heat treatment chamber 320, the liquid treatment chamber 360, and the buffer chambers 312 and 316. According to an example, the transfer robot 900 includes a hand on which the substrate W is placed, and the hand may be configured to be movable forward and backward, rotatable about a third direction 16, and movable in the third direction 16. A guide rail 356, whose longitudinal direction is parallel to the first direction 12, is disposed within the transfer chamber 350, and the transfer robot 900 may be configured to be movable on the guide rail 356.

[0064] Figure 4 This is an example diagram showing the hand of a delivery robot.

[0065] refer to Figure 4 The hand 910 includes a hand body 910a and support fingers 910b. The hand body 910a is formed in a generally horseshoe shape, with its inner diameter larger than the diameter of the substrate. However, the shape of the hand body 910a is not limited to this. The support fingers 910b are mounted inwardly at four locations, including the front end of the hand body 910a. The hand body 910a has a vacuum flow path (not shown) formed therein. The vacuum flow path (not shown) is connected to a vacuum pump via a vacuum line.

[0066] Return to reference Figures 1 to 3 Multiple heat treatment chambers 320 are provided. The heat treatment chambers 320 are arranged along a first direction 12. The heat treatment chambers 320 are located on one side of the transfer chamber 350.

[0067] Figure 5 It is shown schematically. Figure 3 A top plan view of an example heat treatment chamber, and Figure 6 yes Figure 5 Front view of the heat treatment chamber.

[0068] refer to Figure 5 and Figure 6 The heat treatment chamber 320 includes a shell 321, a cooling unit 322, a heating unit 323, and a conveyor plate 324.

[0069] The housing 321 is configured as a generally rectangular parallelepiped shape. An entrance (not shown) is formed on the side wall of the housing 321, through which the substrate W enters and exits. The entrance may remain open. Optionally, a door (not shown) may be provided to open and close the entrance. A cooling unit 322, a heating unit 323, and a conveyor plate 324 are disposed inside the housing 321. The cooling unit 322 and the heating unit 323 are arranged along a second direction 14. According to an example, the cooling unit 322 may be positioned closer to the conveyor chamber 350 than the heating unit 322.

[0070] The cooling unit 322 has a cooling plate 322a. When viewed from above, the cooling plate 322a may have a generally circular shape. The cooling plate 322a is provided with a cooling member 322b. According to an example, the cooling member 322b is formed inside the cooling plate 322a and may be configured as a flow path for cooling fluid to flow through.

[0071] Heating unit 323 includes a heating plate 323a, a cover 323c, and a heater 323b. When viewed from above, the heating plate 323a has a generally circular shape. The heating plate 323a has a diameter larger than that of the substrate W. The heater 323b is mounted on the heating plate 323a. The heater 323b can be configured as a heating resistor to which current is applied. The heating plate 323a is provided with lifting pins 323e, which are vertically driven along a third direction 16. The lifting pins 323e receive the substrate W from a conveying device outside the heating unit 323 and place the received substrate W onto the heating plate 323a, or lift the substrate W from the heating plate 323a and transfer the substrate W to the external conveying device. According to an example, three lifting pins 323e can be provided. The cover 323c has a space in its lower portion with an opening.

[0072] The cover 323c is located above the heating plate 323a and moves vertically via the driver 3236d. The space formed by the cover 323c and the heating plate 323a, depending on the movement of the cover 323c, is configured as a heating space for heating the substrate W.

[0073] The conveyor plate 324 is configured in a generally disc-shaped form and has a diameter corresponding to the diameter of the substrate W. A notch 324b is formed at the edge of the conveyor plate 324. The notch 324b may have a shape corresponding to the protrusion 3543 formed on the hand 354 of the aforementioned conveyor robot 352. Furthermore, the notch 324b is configured to correspond to the number of protrusions 3543 formed on the hand 354 and is formed at positions corresponding to the protrusions 3543. When the upper and lower positions of the hand 354 and the conveyor plate 324 change, in which the hand 354 and the conveyor plate 324 are aligned in the vertical direction, the substrate W is conveyed between the hand 354 and the conveyor plate 324. The conveyor plate 324 is mounted on a guide rail 324d and can move along the guide rail 324d between a first region 3212 and a second region 3214 via a driver 324c. A plurality of slit-shaped guide grooves 324a are provided in the conveyor plate 324. Guide grooves 324a extend from the end of conveyor plate 324 into the interior of conveyor plate 324. The longitudinal direction of guide grooves 324a is arranged along the second direction 14, and guide grooves 324a are spaced apart from each other along the first direction 12. When the substrate W is conveyed between conveyor plate 324 and heating unit 323, guide grooves 324a prevent conveyor plate 324 and lifting pin 323e from interfering with each other.

[0074] The substrate W is cooled while the transfer plate 324, on which the substrate W is placed, is in contact with the cooling plate 322a. The transfer plate 324 is made of a material with high thermal conductivity, which allows for good heat transfer between the cooling plate 322a and the substrate W. According to an example, the transfer plate 324 may be made of a metallic material.

[0075] Heating units 323 disposed in some of the heat treatment chambers 320 can supply gas while heating the substrate W to improve the adhesion rate of the photoresist to the substrate. According to an example, the gas may be hexamethyldisilane (HMDS) gas.

[0076] Return to reference Figures 1 to 3 Multiple liquid handling chambers 360 are provided. Some of the liquid handling chambers 360 can be stacked on top of each other. The liquid handling chambers 360 are located on one side of the transfer chamber 350. The liquid handling chambers 360 are arranged side by side along a first direction 12. Some of the liquid handling chambers 360 are located adjacent to the transposition module 100. Hereinafter, the liquid handling chamber 360 located adjacent to the transposition module 100 is referred to as the front liquid handling chamber 362. Other liquid handling chambers 360 are located adjacent to the interface module 500. Hereinafter, the liquid handling chamber 360 located adjacent to the interface module 500 is referred to as the rear liquid handling chamber 364.

[0077] A front liquid treatment chamber 362 applies a first liquid to the substrate W, and a rear liquid treatment chamber 284 applies a second liquid to the substrate W. The first liquid and the second liquid can be different types of liquids. According to an exemplary embodiment, the first liquid is an anti-reflective film, and the second liquid is a photoresist. The photoresist can be applied to the substrate W coated with the anti-reflective film. Alternatively, the first liquid can be a photoresist, and the second liquid can be an anti-reflective film. In this case, the anti-reflective film can be applied to the substrate W coated with the photoresist. Alternatively, the first liquid and the second liquid are the same type of liquid, and both the first liquid and the second liquid can be photoresist.

[0078] The developing block 300b has the same structure as the coating block 300a, and the liquid treatment chamber in the developing block 300b supplies developer to the substrate.

[0079] Interface module 500 connects processing module 300 to external exposure apparatus 700. Interface module 500 includes interface frame 510, additional process chamber 520, interface buffer 530, and interface robot 550.

[0080] A fan filter unit for forming a downward airflow therein can be disposed at the upper end of the interface frame 510. An additional process chamber 520, an interface buffer 530, and an interface robot 550 are disposed inside the interface frame 510. The additional process chamber 340 can perform a predetermined additional process before loading the substrate W, which has already been fully processed in the coating block 300a, into the exposure apparatus 700. Optionally, the additional process chamber 520 can perform a predetermined additional process before loading the substrate W, which has already been fully processed in the exposure apparatus 700, into the developing block 300b. According to one example, the additional process can be an edge exposure process that exposes the edge region of the substrate W, a top surface cleaning process that cleans the upper surface of the substrate W, or a lower surface cleaning process that cleans the lower surface of the substrate W. Multiple additional process chambers 520 are provided, and they can be arranged to stack on top of each other. All additional process chambers 520 can be configured to perform the same process. Optionally, a portion of the additional process chambers 520 can be configured to perform different processes.

[0081] Interface buffer 530 provides space for the substrate W to temporarily reside during transport between coating block 300a, additional process chamber 520, exposure apparatus 700 and developing block 300b. Multiple interface buffers 530 can be provided, and multiple interface buffers 530 can be arranged to be stacked on top of each other.

[0082] According to the example, the additional process chamber 520 may be arranged on one side of the transfer chamber 350 based on an extension line in the longitudinal direction, and the interface buffer 530 may be arranged on the other side of the transfer chamber.

[0083] An interface robot 550 transfers a substrate W between a coating block 300a, an additional process chamber 520, an exposure apparatus 700, and a developing block 300b. The interface robot 550 may have a transfer hand for transferring the substrate W. The interface robot 550 may be configured as one or more robots. According to an example, the interface robot 550 has a first robot 552 and a second robot 554. The first robot 552 may be configured to transfer the substrate W between the coating block 300a, the additional process chamber 520, and the interface buffer 530, and the second robot 554 may be configured to transfer the substrate W between the interface buffer 530 and the exposure apparatus 700, and further configured to transfer the substrate W between the interface buffer 530 and the developing block 300b.

[0084] The first robot 552 and the second robot 554 each include a transfer hand on which a base plate W is placed, and the hand may be configured to be movable back and forth, rotatable about an axis parallel to a third direction 16, and movable along the third direction 16.

[0085] The structure of the liquid processing chamber will be described in detail below. The description will take a liquid processing chamber disposed in a coating block as an example. Furthermore, the liquid processing chamber will be described based on the case of a chamber for applying photoresist to a substrate. However, the liquid processing chamber can also be a chamber for forming a film (such as a protective film or an anti-reflective film) on the substrate W. Additionally, the liquid processing chamber can be a chamber for developing the substrate W by supplying developer to the substrate W.

[0086] Figure 7 This is a cross-sectional view illustrating an exemplary embodiment of a liquid processing chamber for liquid processing of a rotating substrate W by supplying processing liquid to the substrate W. Figure 8 yes Figure 7 Top view of the liquid handling chamber.

[0087] refer to Figure 7 and Figure 8 The liquid handling chamber 1000 includes a housing 1100, a first processing unit 1201a, a second processing unit 1201b, a liquid supply unit 1400, an exhaust unit 1600, and a controller 1800.

[0088] The housing 1100 is configured as a rectangular cylindrical shape with an internal space. Openings 1101a and 1101b are formed on one side of the housing 1100. Openings 1101a and 1101b serve as channels for inserting and removing the substrate W. Doors 1103a and 1103b are installed in the openings 1101a and 1101b, and the doors 1103a and 1103b open and close the openings 1101a and 1101b.

[0089] A fan filter unit 1130 is disposed on the upper wall of the housing 1100 to supply a downward airflow into the interior space. The fan filter unit 1130 includes a fan for introducing outside air into the interior space and a filter for filtering the outside air.

[0090] The first processing unit 1201a and the second processing unit 1201b are disposed within the internal space of the housing 1100. The first processing unit 1201a and the second processing unit 1201b are arranged along one direction. Hereinafter, the arrangement direction of the first processing unit 1201a and the second processing unit 1201b will be referred to as the unit arrangement direction, and... Figure 11 It is shown in the X-axis direction.

[0091] The first processing unit 1201a has a first processing container 1220a and a first support unit 1240a.

[0092] The first processing container 1220a has a first internal space 1222a. The first internal space 1222a is provided with an open top.

[0093] A first support unit 1240a supports a substrate W within a first internal space 1222a of a first processing container 1220a. The first support unit 1240a includes a first support plate 1242a, a first drive shaft 1244a, and a first actuator 1246a. The first support plate 1242a has a circular top surface. The first support plate 1242a has a diameter smaller than the diameter of the substrate W. The first support plate 1242a is configured to support the substrate W under vacuum pressure. Optionally, the first support plate 1242a may have a mechanical clamping structure for supporting the substrate W. The first drive shaft 1244a is coupled to the center of the bottom surface of the first support plate 1242a, and a first actuator 1246a is disposed on the first drive shaft 1244a to provide rotational force to the first drive shaft 1244a. The first actuator 1246a may be a motor.

[0094] The second processing unit 1201b includes a second processing container 1220b and a second support unit 1240b, and the second support unit 1240b includes a second support plate 1242b, a second drive shaft 1244b, and a second driver 1246b. The second processing container 1220b and the second support unit 1240b have substantially the same structure as the first processing container 1220a and the first support unit 1240a.

[0095] Liquid supply unit 1400 supplies liquid to substrate W. Liquid supply unit 1400 includes a first nozzle 1420a, a second nozzle 1420b, and a processing liquid nozzle 1440. The first nozzle 1420a supplies liquid to substrate W disposed on a first support unit 1240a, and the second nozzle 1420b supplies liquid to substrate W disposed on a second support unit 1240b. The first nozzle 1420a and the second nozzle 1420b may be configured to supply the same type of liquid. According to an example, the first nozzle 1420a and the second nozzle 1420b may supply a rinsing solution for cleaning substrate W. For example, the rinsing solution may be water. According to another example, the first nozzle 1420a and the second nozzle 1420b may supply a removal solution for removing photoresist from edge regions of substrate W. For example, the removal solution may be a diluent. Each of the first nozzle 1420a and the second nozzle 1420b may rotate about its axis of rotation between a processing position and a standby position. The processing position is the position where liquid is discharged onto the substrate W, and the standby position is the position where the first nozzle 1420a and the second nozzle 1420b are in standby mode and do not discharge liquid onto the substrate W.

[0096] Processing liquid nozzle 1440 supplies processing liquid to substrates W disposed on the first support unit 1240a and the second support unit 1240b. The processing solution may be a photoresist. Nozzle driver 1448 drives processing liquid nozzle 1440 such that processing liquid nozzle 1440 moves along guide 1442 between a first processing position, a standby position, and a second processing position. The first processing position is for supplying processing liquid to substrate W supported by the first support unit 1240a, and the second processing position is for supplying processing liquid to substrate W supported by the second support unit 1240b. The standby position is when the nozzle waits at the standby port 1444 located between the first processing unit 1201a and the second processing unit 1201b, and no photoresist is discharged from the processing liquid nozzle 1440.

[0097] The gas-liquid separation plate 1229a can be disposed within the internal space 1201a of the first processing container 1220a. The gas-liquid separation plate 1229a can be configured to extend upward from the bottom wall of the first processing container 1220a. The gas-liquid separation plate 1229a can be configured as annular.

[0098] According to the example, the exterior of the gas-liquid separation plate 1229a can be configured as a discharge space for discharging liquid, and the interior of the gas-liquid separation plate 1229a can be configured as an exhaust space for discharging atmosphere. A discharge pipe 1228a for discharging the treated liquid is connected to the bottom wall of the first processing container 1220a. The discharge pipe 1228a discharges the treated liquid introduced between the side wall of the first processing container 1220a and the gas-liquid separation plate 1229a to the exterior of the first processing container 1220a. Airflow flowing into the space between the side wall of the first processing container 1220a and the gas-liquid separation plate 1229a is introduced into the gas-liquid separation plate 1229a. During this process, the treated liquid contained in the airflow is discharged from the discharge space to the exterior of the first processing container 1220a through the discharge pipe 1228a, and the airflow is introduced into the exhaust space of the first processing container 1220a.

[0099] Although not shown, a lifting drive may be provided for adjusting the relative height of the first support plate 1242a and the first processing container 1220a.

[0100] Figure 9 It is shown Figure 3 A perspective view of an example of a delivery robot.

[0101] In the following text, based on Figure 9 Robot 900 is Figure 3 The invention is described in the context of a transfer robot. However, unlike this, the transfer robot can be a transposition robot, and optionally, it can be another robot disposed in the substrate processing apparatus 10.

[0102] refer to Figure 9 The conveying robot 900 may include a robot body 902, a horizontal drive unit 930, and a vertical drive unit 940.

[0103] The robot body 902 may include a hand 910 that can move back and forth (X direction) and rotate (θ direction) while supporting the substrate, and a hand drive unit 920 that includes a base supporting the hand 910.

[0104] The hand-driven unit 920 moves the hand 910 horizontally, and the hand 910 is driven solely by the hand-driven unit 920. The hand-driven unit 920 includes a connecting arm 912 connected to an internal drive unit (not shown), and the hand 910 is mounted at one end of the connecting arm 912. In this exemplary embodiment, the transfer robot 900 includes two hands 910, but the number of hands 910 can be increased depending on the processing efficiency of the substrate processing equipment 10. A rotating unit (not shown) is mounted below the hand-driven unit 920. The rotating unit is coupled to the hand-driven unit 920 and rotates to cause the hand-driven unit 920 to rotate. Therefore, the hands 910 rotate together.

[0105] The horizontal drive unit 930 and the vertical drive unit 940 are mounted on a body frame 990.

[0106] The body frame 990 can be arranged in the form of several frames connected to each other. The body frame 990 may include an upper horizontal drive unit 930a and a lower horizontal drive unit 930b for guiding the robot body in the Y direction, a vertical auxiliary frame 992 erected in the vertical direction between the upper and lower horizontal drive units 930a and the lower horizontal drive unit 930b, a horizontal auxiliary frame 993 extending parallel to the lower horizontal drive unit 930b to form the body frame 990, and an auxiliary frame 994 for connecting the ends of the upper and lower horizontal drive units 930a and the lower horizontal drive unit 930b to the horizontal auxiliary frame 993 to form the side shape of the body frame 990.

[0107] In this way, since the main frame 990 is connected by multiple auxiliary frames 992, 993 and 994, the rigidity of the main frame 990 is strengthened, thereby enhancing its durability, such as being able to fully maintain its shape even during long-term use.

[0108] As described above, horizontal drive units 930a and 930b are travel guides for moving the robot body 902 along the Y direction and are connected to the two front ends of the vertical drive unit 940. Specifically, in horizontal drive units 930a and 930b, a horizontal drive unit (not shown) including a conveyor belt is constructed in the inner surface of the lower horizontal drive unit 930b. Therefore, the robot body 902 moves horizontally along the horizontal drive units 930a and 930b by being driven by the conveyor belt.

[0109] The vertical drive unit 940 is a travel drive unit for moving the robot body 902 along the Z direction, and is connected to the horizontal drive units 930b and 930a. Therefore, the robot body 902 can be guided by the horizontal drive units 930b and 930a to move along the Y direction, and simultaneously guided by the vertical drive unit 940 to move along the Z direction. In other words, the robot body 902 can move along an inclined direction corresponding to the sum of the Y and Z directions.

[0110] On the other hand, the vertical drive unit 940 is formed by multiple frames spaced apart from each other (e.g., two vertical frames), allowing the robot body 902 to freely enter and leave the space between the two frames.

[0111] The vertical drive unit including the conveyor belt (hereinafter referred to as the vertical drive unit) is constructed in the vertical frame 950 of the vertical drive unit 940.

[0112] Figure 10This is a diagram showing the configuration of the liquid supply unit.

[0113] refer to Figure 10 The liquid supply unit 1400 includes a nozzle 1420, a liquid receiving component 1410, a liquid supply line 1430, a collection tank 1450, a pump 2000, a filter 1460, and a purification line 1470. Here, the nozzle may include... Figure 7 The first nozzle 1420a, the second nozzle 1420b, and the treatment fluid nozzle 1440 are shown.

[0114] A liquid supply line 1430 connects a nozzle 1420 and a liquid receiving member 1410. In the liquid supply line 1430, a collection tank 1450, a pump 2000, and a filter 1460 are installed between the nozzle 1420 and the liquid receiving member 1410. The liquid receiving member 1410 has a receiving space for containing the processed liquid. The liquid receiving member 1410 may be a bottle for containing the processed liquid. The processed liquid may be a photoresist containing fluorine (F).

[0115] In the collection tank 1450, air bubbles in the processing liquid flowing through the liquid supply line 1430 can be removed. The collection tank 1450 is positioned between the nozzle 1420 and the liquid receiving member 1410 in the liquid supply line 1430.

[0116] Pump 2000 pressurizes the liquid supply line 1430, causing the processed liquid flowing through the liquid supply line 1430 to be supplied in a direction toward nozzle 1420. Pump 2000 is located downstream of the collection tank 1450 in the liquid supply line 1430. According to an example, pump 2000 can discharge the processed liquid by applying torque to the pipe to cause a change in the volume of the pipe.

[0117] Filter 1500 filters impurities from the process fluid flowing through liquid supply line 1200. Pump 1500 is positioned between collection tank 1300 and pump 2000 in liquid supply line 1200. In liquid supply line 1200, filter 1500 may be positioned closer to pump 2000 than collection tank 1300. Impurities are filtered out as the process fluid passes through filter 1500.

[0118] Purification line 1470 is connected to liquid supply line 1200, so that the processed liquid that has passed through pump 2000 is returned to collection tank 1300.

[0119] Figure 11 It is shown Figure 10 The diagram of the pump shown is as follows. Figure 12 It is shown Figure 11 The perspective view of the pump shown, and Figure 13 This is a diagram showing the operation of the pump.

[0120] refer to Figures 11 to 13 Pump 2000 may include pipe 2100 and drive unit 2900.

[0121] Pump 2000 is a method of discharging treatment liquid from pipe 2100 by applying torque to pipe 2100 to cause a volume change.

[0122] For example, pipe 2100 may include a flexible pipe body 2110, a first flange 2120 disposed at one end of pipe body 2110, a second flange 2130 disposed at the other end of pipe body 2110, and a compensation member 2180.

[0123] The tube 2100 performs torsional motion by a rotational force applied from the outside. The tube 2100 can be made of a flexible polymer material. Of course, any material can be used as long as the material of the tube 2100 can be twisted when an external force is applied. The tube 2100 is preferably manufactured to have elastic restoring force, such that when the externally applied force is released, the tube can return to its initial state. Of course, the tube 2100 can be manufactured without elastic restoring force. This is because the tube 2100 can return to its initial state by using a force applied from the outside using a torsional motion against the tube 2100. However, when the tube 2100 is manufactured to have elastic restoring force so that the tube 2100 can return to its initial state on its own, the load of the externally applied force can be reduced, making it preferable that the tube 2100 has elastic restoring force.

[0124] The tube body 2110 has a certain length and includes a hollow portion (pump chamber). Both ends of the tube body 2110 are open to allow the processing fluid to enter and exit. Referring to the cross-section of the tube body 2110, although the tube body 2110 is shown as an elliptical shape with a large aspect ratio, the shape of the tube body is not limited to this. Here, the aspect ratio can be from 1:2 to 1:10.

[0125] like Figure 14 As shown, the tube bodies 2110a and 2110b can be configured with various cross-sectional shapes, such as elliptical and rectangular with rounded corners.

[0126] Return to reference Figures 11 to 13 The tube body 2110 has a non-linear shape in the longitudinal direction. The tube body 2110 has a curved portion 2119 that bends at a predetermined angle in the middle, and a first central axis S1 passing through one end of the tube body 2110 and a second central axis S2 passing through the other end of the tube body 2110 can be configured to intersect each other in the curved portion 2119. For reference, based on the curved portion 2119, the tube body 2110 can be divided into an upper body 2111 through which the first central axis S1 passes and a lower body 2112 through which the second central axis S2 passes.

[0127] Therefore, the pump has a shape in which the pipe body 2100 is bent at a predetermined angle, such that when the pipe body 2110 is rotated by the drive unit 2900, the pipe body 2110 folds from the bent portion 2119, rather than from both ends of the pipe body 2110. Furthermore, the upper part 2111 of the pipe body 2110 can have a smaller torsional deformation than the lower part 2112. This is because the rotational force of the drive unit 2900 is concentrated on the lower part 2112 and the bent portion 2119. Therefore, the pipe body 2110 can be stably torsiond through the bent portion 2119. Here, the bending angle of the pipe body 2110 can be varied.

[0128] On the other hand, the tube body 2110 may have different cross-sectional shapes between the upper and lower ends.

[0129] Return to reference Figures 11 to 13 A first flange 2120 is connected to the upper end of the pipe body 2110 to seal the upper portion of the pipe body 2110. An inlet 2122 for introducing treatment fluid into the interior space of the pipe body 2110 may be formed in the first flange 2120. As another example, the inlet 2122 may be formed on the side of the pipe body 2110 adjacent to the first flange 2120. A liquid supply line 1430 is connected to the inlet 2122.

[0130] A second flange 2130 is connected to the lower end of the pipe body 2110 to seal the lower portion of the pipe body 2110. The second flange 2130 may be configured to have an outlet 2132 through which the treatment fluid is discharged from the interior space of the pipe body 2110.

[0131] The first flange 2120 can be fixed to a separate structure, preventing rotation. The second flange 2130 is connected to the rotation shaft 2920 of the drive unit 2900 to rotate by receiving rotational force. Although not shown, the second flange 2130 may include an inner flange that rotates by the rotation shaft 2920 and an outer flange having an outlet 2132. Bearings may be disposed between the outer flange and the inner flange, such that the outer flange does not rotate even when the inner flange rotates, and the flow path between the internal space of the connecting pipe body 2110 and the outlet can be disposed in the inner and outer flanges. With this structure, when the second flange 2130 rotates, torsion of the liquid supply line 1430 connected to the outlet 2132 can be prevented.

[0132] Compensating member 2180 may be disposed between first flange 2120 and fixed flange 2150. Fixed flange 2150 may be fixedly mounted on surrounding structure. Compensating member 2180 is used to compensate for vertical length deformation when pipe body 2110 is torn. For example, compensating member 2180 may include rolling diaphragm 2182.

[0133] like Figure 13 As shown, the length of tube 2100 shortens during the torsion of driven unit 2900, and in this case, the rolling diaphragm 2182 of compensation member 2180 compensates for the reduced distance, making stable tube torsion motion possible.

[0134] The drive unit 2900 transmits rotational force to the tube to twist the tube 2100. The drive unit 349 may include a motor. The drive unit 2900 may include a speed reducer or the like for speed control.

[0135] The drive unit 2900 is connected to the variable member 2700. The rotational force of the drive unit 2900 can be provided to the second flange 2130 through the variable member 2700.

[0136] According to the present invention, since the force of the motor of the drive unit 2900 is transmitted as a force that directly twists the tube, no additional device (such as an LM guide or a ball screw) is required to change the direction of the force, thereby reducing the size of the pump.

[0137] The operation of a pump with the above structure is as follows.

[0138] During the suction operation of pump 2100, when the tube body 2110 returns to its initial state (in which inlet 2122 is open and outlet 2132 is closed), the treatment fluid is introduced into the hollow part of the tube body 2110 through inlet 2122. During the discharge operation of pump 2100, when inlet 2122 is closed and the tube body 2110 is twisted with outlet 2132 open, the treatment fluid filling the hollow part of the tube body 2110 is discharged through outlet 2132 due to the reduction in volume of the hollow part of the tube body 2110.

[0139] Figure 15 and Figure 16 This is a diagram showing a pump according to the second embodiment.

[0140] refer to Figure 15 and Figure 16 According to the second embodiment, the pump 2000a includes a drive unit 2900a, a pipe body 2110a, a first flange 2120a, a second flange 2130a, and a compensation member 2180a, and these components are configured and function as described above. Figure 11 The drive unit 2900, pipe body 2110, first flange 2120, second flange 2130 and compensation member 2180 shown are basically similar, and in the following, examples of modifications will be described mainly in terms of differences from this embodiment.

[0141] In this modified example, the compensation member 2180a is provided in the form of an elastomer, such as a spring 2184, which is different. For example, the spring 2184 can be connected to the first flange 2120a via a ball joint 2186.

[0142] Figure 17 This is a diagram showing a pump according to a third embodiment.

[0143] refer to Figure 17 According to the third embodiment, the pump 2000b includes a drive unit 2900b, a pipe body 2110b, a first flange 2120b, a second flange 2130b, and a compensation member 2180b, and these components are configured and function as described above. Figure 11 The drive unit 2900, pipe body 2110, first flange 2120, second flange 2130 and compensation member 2180 shown are basically similar, and examples of modifications will be described mainly in terms of differences from this embodiment.

[0144] The present embodiment is characterized in that the outlet 2132b is provided in the pipe body 2110b. The outlet 2132b is formed on one side of the upper body 2111b of the pipe body. The upper body 2111b of the pipe body 2110b is the portion in which the torsional deformation generated is less than the torsional deformation of the lower body 2112b, and is the portion suitable for forming the outlet 2132b.

[0145] Figure 18 This is a diagram illustrating an example of a modified compensation component.

[0146] like Figure 18 As shown, the rolling diaphragm 2182c of the compensation member 2180c is directly connected to one end of the pipe body 2110c, and the interior of the rolling diaphragm 2182c is configured to communicate with the pipe body 2110c. In this case, the inlet 2122c is provided on the flange 2120c on which the upper end of the rolling diaphragm 2182c is fixed. Therefore, the treatment fluid can be introduced into the rolling diaphragm 2182c through the inlet 2122c and can move to the pump chamber of the pipe body 2110c.

[0147] The foregoing detailed description illustrates the present invention. Furthermore, the above description illustrates and describes exemplary embodiments of the invention, and the invention can be used in various other combinations, modifications, and environments. That is, modifications or alterations can be made to the foregoing within the scope of the inventive concept disclosed herein, its equivalents, and / or within the scope of the art or knowledge. The foregoing exemplary embodiments describe the optimal state for carrying out the technical spirit of the invention, and various variations are possible for specific applications and uses of the invention. Therefore, the above detailed description of the invention is not intended to limit the invention to the disclosed exemplary embodiments. Moreover, the appended claims should be interpreted to include other exemplary embodiments as well.

Claims

1. A torque pump, comprising: The tube includes an upper body, a lower body, and a pump chamber, the pump chamber being connected to a chemical liquid inlet and a chemical liquid outlet; as well as A drive unit, which transmits rotational force to the tube to twist the tube, The upper body has a first central axis, and the lower body has a second central axis. The tube, when not twisted, has a non-linear shape such that the first central axis and the second central axis intersect each other at the curved portion of the tube.

2. The torque pump according to claim 1, wherein the bent portion is bent at a predetermined angle.

3. The torque pump according to claim 2, wherein the tube comprises: A flexible tube body, comprising the upper body and the lower body; The first flange is disposed at one end of the pipe body; A second flange is located at the other end of the pipe body. The second flange is connected to the drive unit and is rotated.

4. The torque pump according to claim 3, wherein the upper body and the lower body of the flexible tube body are connected at the bend.

5. The torque pump according to claim 3, wherein the tube body is configured to have an elliptical or rectangular cross-section with an aspect ratio of 1:2 to 1:

10.

6. The torque pump according to claim 3, further comprising: A compensating member is provided on the first flange and compensates for the vertical length deformation of the pipe body when it is twisted.

7. The torque pump according to claim 6, wherein the compensation member is an elastic member.

8. The torque pump of claim 4, wherein the drive unit has a rotating shaft connected to the second flange; and The rotation axis is positioned on the same line as the second central axis.

9. An apparatus for supplying a chemical liquid, the apparatus comprising: A pump for supplying a chemical liquid to a nozzle, the nozzle discharging the chemical liquid onto a substrate; A collection tank, wherein the chemical liquid to be supplied from the pump to the nozzle is temporarily stored; Bottle, the bottle containing a chemical liquid stored in the collection tank; as well as A filter is installed in the path through which the chemical liquid is supplied from the collection tank to the pump. The pump mentioned above includes: The tube includes an upper body, a lower body, and a pump chamber, the pump chamber being connected to a chemical liquid inlet and a chemical liquid outlet and having a non-linear shape; as well as A drive unit, which transmits rotational force to the tube to twist the tube, The upper body has a first central axis, and the lower body has a second central axis. The tube, when not twisted, has a non-linear shape such that the first central axis and the second central axis intersect each other at the curved portion of the tube.

10. The device according to claim 9, wherein the bent portion is bent at a predetermined angle.

11. The device of claim 10, wherein the tube comprises: A flexible tube body, comprising the upper body and the lower body; The first flange is disposed at one end of the pipe body; A second flange is located at the other end of the pipe body. The second flange is connected to the drive unit.

12. The device of claim 11, wherein the upper body and the lower body of the flexible tube body are connected at the bend.

13. The device according to claim 11, wherein the tube body is configured to have an elliptical or rectangular cross-section with an aspect ratio of 1:2 to 1:

10.

14. The device according to claim 11, further comprising: A compensating member is provided on the first flange and compensates for the vertical length deformation of the pipe body when it is twisted.

15. The device according to claim 14, wherein the compensation member is an elastic member.

16. The device of claim 12, wherein the drive unit has a rotating shaft connected to the second flange; and The rotation axis is positioned on the same line as the second central axis.

17. A torque pump, comprising: The flexible tube body includes a pump chamber, an upper body, and a lower body; A first flange is disposed at one end of the upper body of the flexible tube body; and A second flange is disposed at one end of the lower body of the flexible tube body; and A drive unit is used to transmit rotational force to the flexible tube body to twist the lower part of the flexible tube body. When the tube is not twisted, the lower end of the upper body and the upper end of the lower body of the flexible tube body are connected at a bend at a predetermined angle.

18. The torque pump of claim 17, wherein the upper body has a first central axis and the lower body has a second central axis, and The flexible tube body has a non-linear shape when not twisted, such that the first central axis and the second central axis intersect each other at the curved portion.

19. The torque pump according to claim 18, wherein the tube body is configured to have an elliptical or rectangular cross-section with an aspect ratio of 1:2 to 1:

10.

20. The torque pump according to claim 17, further comprising: A compensating member is disposed on the first flange and compensates for the vertical length deformation of the pipe body when it is torn. The compensation component mentioned above is an elastic component.

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