Mechanical seal device integrating measurement and control

Abstract

This invention discloses an integrated measurement and control mechanical seal device, comprising a stationary ring arranged end-to-end with a rotating ring. The sealing end of the stationary ring has a monitoring area including a first piezoelectric ceramic layer and a control area including a second piezoelectric ceramic layer. Both the monitoring area and the control area are obtained through additive manufacturing technology. During the operation of the mechanical seal, the monitoring area is used to monitor the contact state of the sealing end face in real time, and the control area is used to adjust the flatness of the sealing end face of the stationary ring in real time based on the contact state monitored by the monitoring area, thereby improving the contact state of the sealing end face. This invention uses a stationary ring with both a monitoring area and a control area, enabling real-time online monitoring and control of the contact state of the sealing end face, reducing frictional wear, and eliminating the need for additional tooling or structures for monitoring or control functions. This minimizes the impact on sealing performance and avoids the economic losses caused by frequent downtime for maintenance of mechanical seal devices in existing technologies.

Description

Technical Field

[0001] This invention relates to the field of active control technology for mechanical seals, and in particular to a measurement and control integrated mechanical seal device. Background Technology

[0002] Mechanical seals, as an excellent form of rotary seal, have been widely used in petrochemical, nuclear energy, aerospace and other fields. Figure 1 It is a typical mechanical seal structure, consisting of five parts: a conventional rotating ring A, a conventional stationary ring B, a spring, a secondary seal, and a transmission mechanism (not shown). The conventional rotating ring A is rigidly fixed to the main shaft and rotates with it. The conventional stationary ring B is flexibly mounted on a stationary ring seat, with the flexible support consisting of a spring and a secondary seal. A friction pair is formed between the conventional stationary ring B and the conventional rotating ring A. Under the action of back pressure, end face film pressure, contact pressure, and flexible support force, the conventional stationary ring B maintains a micron-level clearance balance with the conventional rotating ring. Under normal operating conditions, due to its good tracking performance, the contact between the conventional stationary ring B and the conventional rotating ring A remains within a controllable range. However, manufacturing and assembly errors, performance degradation due to prolonged operation, and abnormal disturbances can all cause seal failure, leading to serious consequences.

[0003] Therefore, it is necessary to conduct online condition monitoring and online performance control of mechanical seals, and to evaluate and adjust the sealing performance in real time. This can not only mitigate abnormal sealing conditions in a timely manner, but also reduce the economic losses caused by downtime.

[0004] Since the function of mechanical seals is to prevent fluid migration, their operating parameters are often very high. Monitoring and control require installing sensors and control mechanisms within the existing sealing structure to perform their respective functions, but this increases installation space and affects sealing performance. For example, installing high-precision sensors is extremely difficult and can easily damage the seal, making existing monitoring technologies largely impractical for engineering applications. The installation of control mechanisms is also extremely complex, and some control methods can affect the sealing pressure. Therefore, there is an urgent need for a monitoring and control solution that is minimally destructive to the sealing structure and has practical engineering applicability.

[0005] In existing piezoelectric ceramic-based control or monitoring schemes, most of them involve embedding or pasting existing ceramic sheets into mechanical seals. The installation of piezoelectric ceramics is extremely difficult, so there is an urgent need for a new piezoelectric ceramic installation scheme for mechanical seals. Summary of the Invention

[0006] This invention aims to at least solve one of the technical problems existing in the prior art. Therefore, one objective of this invention is to propose a measurement and control integrated mechanical seal device, employing a stationary ring with a monitoring zone and a control zone, capable of real-time online monitoring and control of the contact state of the sealing end face, reducing contact friction and wear of the sealing end face, and eliminating the need for additional tooling or structures to implement the monitoring or control functions. This minimizes the impact on sealing performance and avoids the economic losses caused by repeated downtime for maintenance, disassembly, and reassembly of mechanical seal devices in the prior art.

[0007] According to an embodiment of the present invention, a measurement and control integrated mechanical seal device includes a stationary ring disposed end-to-end with a rotating ring. The sealing end of the stationary ring has a monitoring area including a first piezoelectric ceramic layer and a control area including a second piezoelectric ceramic layer. Both the monitoring area and the control area are obtained by additive manufacturing technology. During the operation of the mechanical seal, the monitoring area is used to monitor the contact state of the sealing end face in real time, and the control area is used to adjust the flatness of the sealing end face of the stationary ring in real time according to the contact state of the sealing end face monitored by the monitoring area, so as to improve the contact state of the sealing end face.

[0008] According to an embodiment of the present invention, the integrated measurement and control mechanical seal device has, on the one hand, a monitoring area and a control area obtained through additive manufacturing technology on the sealing end of the stationary ring. This integrates the monitoring area and the control area into the design and manufacturing of the stationary ring, making the stationary ring a reliable integrated structure. No additional tooling or structure needs to be designed for the monitoring or control functions, minimizing the impact on sealing performance. On the other hand, during the operation of the mechanical seal, the monitoring area utilizes the positive voltage effect of the first piezoelectric ceramic layer to monitor the contact state of the sealing end face in real time, while the control area utilizes the inverse piezoelectric effect of the second piezoelectric ceramic layer to control the flatness of the sealing end face of the stationary ring in real time. This improves the contact state of the sealing end face, thereby reducing the contact force on the mechanical seal end face and decreasing frictional wear. This has a significant positive impact on the healthy operation of the equipment. Simultaneously, it avoids the economic losses caused by repeated downtime for maintenance, disassembly, and reassembly of mechanical seal devices in the prior art. Therefore, the integrated measurement and control mechanical seal device of the present invention has high practical engineering value.

[0009] In some embodiments, the monitoring areas are arranged at intervals along the circumferential direction of the stationary ring and near the outer diameter and inner diameter of the stationary ring, respectively, with the monitoring areas located at the outer diameter and the monitoring areas located at the inner diameter corresponding one-to-one in the radial direction.

[0010] In some embodiments, the control areas are arranged at intervals along the circumferential direction of the stationary ring and near the outer diameter and inner diameter of the stationary ring, respectively. The monitoring areas located at the outer diameter and the monitoring areas located at the inner diameter correspond one-to-one in the radial direction, and the control areas and the monitoring areas are evenly and alternately arranged in the circumferential direction of the stationary ring.

[0011] In some embodiments, the control regions are evenly spaced along the circumferential direction of the stationary ring and are arranged at intervals near the outer diameter and inner diameter of the stationary ring, respectively. The control regions located at the outer diameter and the control regions located at the inner diameter are radially corresponding one-to-one. Each radially corresponding control region has a radially corresponding control region arranged adjacent to both sides along the circumferential direction of the stationary ring.

[0012] In some embodiments, the monitoring area includes a first substrate layer, a first piezoelectric ceramic layer, and a first wear-resistant layer stacked sequentially, with the first wear-resistant layer facing the moving ring; the control area includes a first substrate layer, a second piezoelectric ceramic layer, and a second wear-resistant layer stacked sequentially, with the thickness of the second piezoelectric ceramic layer being greater than the thickness of the first piezoelectric ceramic layer, and the second wear-resistant layer facing the moving ring.

[0013] In some embodiments, the monitoring area and the control area are stacked axially and spaced apart along the circumferential direction of the stationary ring, wherein the monitoring area is closer to the moving ring than the control area.

[0014] In some embodiments, the control regions are spaced apart along the circumferential direction of the stationary ring and are respectively spaced apart near the outer diameter and inner diameter of the stationary ring, and the monitoring region and the control regions are overlapped one-to-one in the axial direction.

[0015] In some embodiments, the control region includes a second substrate layer, a second piezoelectric ceramic layer, and an isolation layer stacked sequentially; the monitoring region includes a first piezoelectric ceramic layer and a third wear-resistant layer stacked sequentially, the isolation layer being stacked between the second piezoelectric ceramic layer and the first piezoelectric ceramic layer, the thickness of the second piezoelectric ceramic layer being greater than the thickness of the first piezoelectric ceramic layer, and the third wear-resistant layer facing the moving ring.

[0016] In some embodiments, if sealing end face contact occurs, the first piezoelectric ceramic layer in the monitoring area generates a monitoring voltage signal due to the positive piezoelectric effect. The difference in the monitoring voltage signal of the first piezoelectric ceramic layer in the monitoring area at the corresponding inner diameter and outer diameter reflects the different sealing end face contact states at the corresponding inner diameter and outer diameter. At this time, the input voltage of the second piezoelectric ceramic layer in the control area undergoes a slight deformation due to the inverse piezoelectric effect of the second piezoelectric ceramic, thereby changing the flatness of the sealing end face of the stationary ring.

[0017] In some embodiments, the adjustment of the sealing end face flatness of the stationary ring by the control zone includes the magnitude of the end face taper and waviness index.

[0018] Additional aspects and advantages of the invention will be set forth in part in the description which follows, and in part will be obvious from the description, or may be learned by practice of the invention. Attached Figure Description

[0019] The above and / or additional aspects and advantages of the present invention will become apparent and readily understood from the description of the embodiments taken in conjunction with the following drawings, in which:

[0020] Figure 1 This is a cross-sectional schematic diagram of an existing mechanical seal device;

[0021] Figure 2 This is a schematic diagram of the sealing end face of a stationary ring in the integrated measurement and control mechanical seal device of the present invention.

[0022] Figure 3 This is a schematic diagram of the sealing end face of another stationary ring in the integrated measurement and control mechanical seal device of the present invention.

[0023] Figure 4 for Figure 2 and Figure 3 A cross-sectional schematic diagram of the monitoring area of ​​the central static ring;

[0024] Figure 5 for Figure 2 and Figure 3 A cross-sectional schematic diagram of the control zone of the central static ring;

[0025] Figure 6 This is a schematic diagram of the sealing end face of another stationary ring in the integrated measurement and control mechanical seal device of the present invention;

[0026] Figure 7 for Figure 6 Schematic diagram of the cross-section of the monitoring and control areas;

[0027] Figure 8 This is a schematic diagram of the sealing end face of the regulating stationary ring of the control zone of the present invention, so that the sealing end face produces a positive taper.

[0028] Figure label:

[0029] Conventional dynamic ring A; Conventional static ring B; Static ring 100; Monitoring area 1; First substrate layer 10; First piezoelectric ceramic layer 11; First wear-resistant layer 12; Third wear-resistant layer 13; Control area 2; Second piezoelectric ceramic layer 21; Second wear-resistant layer 22; Second substrate layer 20; Isolation layer 23; Detailed Implementation

[0030] Embodiments of the present invention are described in detail below. Examples of these embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain the present invention, and should not be construed as limiting the present invention.

[0031] The following is combined with Figures 2 to 8 This invention describes an integrated measurement and control mechanical seal device according to an embodiment of the present invention.

[0032] The integrated measurement and control mechanical seal device according to embodiments of the present invention is a fluid sealing device, such as a dry gas sealing device, and is mainly based on traditional mechanical seal devices (e.g., ...). Figure 1 The conventional stationary ring B of the mechanical seal device shown is improved.

[0033] like Figures 2 to 8 As shown, the integrated measurement and control mechanical seal device of this invention includes a stationary ring 100 arranged end-to-end with the rotating ring (not shown in the figure). Thus, the stationary ring 100 and the rotating ring form a pair of mechanical seal rings, and the end faces of the stationary ring 100 and the rotating ring are both sealing end faces. During the mechanical sealing process, the rotating ring rotates while the stationary ring 100 does not rotate. The friction pair between the rotating ring and the stationary ring 100 functions as a mechanical seal (i.e., a rotational seal). The stationary ring 100 is designed to maintain a relatively stable relative motion relationship between its end face and the end face of the rotating ring under various forces. In other words, the friction pair between the rotating ring and the stationary ring 100 has a certain stiffness. As the relative position of the rotating ring and the stationary ring 100 changes, the force exerted by the friction pair on the stationary ring 100 will change to resist this change, thus maintaining a relatively stable relative motion relationship between the end faces of the stationary ring 100 and the rotating ring. This prevents excessive leakage due to excessive distance between the stationary ring 100 and the rotating ring, or rapid damage due to contact.

[0034] The stationary ring 100 has a monitoring area 1 including a first piezoelectric ceramic layer 11 and a control area 2 including a second piezoelectric ceramic layer 21 on its sealing end. Both the monitoring area 1 and the control area 2 are obtained by additive manufacturing technology. That is, the stationary ring 100 can be directly fabricated on the end of the stationary ring 100 substrate facing the moving ring using additive manufacturing methods such as thermal spraying, laser deposition, physical deposition, chemical deposition, magnetron sputtering or coating. The monitoring area 1 with the first piezoelectric ceramic layer 11 and the control area 2 with the second piezoelectric ceramic layer 21 of a certain thickness can be fabricated. In this way, the thickness of the monitoring area 1 and the control area 2 is very thin, which can be at the submicron level to the submillimeter level. Thus, the monitoring area 1 and the control area 2 are integrated into the design and manufacturing of the stationary ring 100 without the need to design additional tooling or structure for the realization of monitoring or control functions, and the impact on sealing performance is small.

[0035] During the operation of the mechanical seal, monitoring zone 1 is used to monitor the contact state of the sealing end face in real time, and control zone 2 is used to adjust the flatness of the sealing end face of the stationary ring 100 in real time according to the contact state of the sealing end face monitored by monitoring zone 1, so as to improve the contact state of the sealing end face. It can be understood that if the sealing end faces come into contact, that is, the sealing end face of the moving ring comes into contact with the sealing end face of the stationary ring, the first piezoelectric ceramic layer 11 of monitoring zone 1 generates a monitoring voltage signal due to the positive piezoelectric effect, reflecting the different contact state of the sealing end face. At this time, the second piezoelectric ceramic layer 21 of control zone 2 is input with voltage, and the second piezoelectric ceramic layer 21 undergoes a slight deformation due to the inverse piezoelectric effect, thereby changing the flatness index such as the taper and waviness of the sealing end face of the stationary ring 100. This improves the operating state of the sealing system and the contact state of the sealing end face in real time and accurately, thereby reducing the contact force of the mechanical seal end face and reducing the contact friction and wear of the mechanical seal end face. This has a great positive significance for the healthy operation of the equipment. At the same time, it can avoid the economic losses caused by multiple shutdowns for maintenance, disassembly and reassembly of mechanical seal devices in the prior art.

[0036] According to an embodiment of the present invention, the integrated measurement and control mechanical seal device has two main advantages. Firstly, the stationary ring 100 has a monitoring area 1 and a control area 2, obtained through additive manufacturing technology, on its sealing end. This integrates the monitoring area 1 and the control area 2 into the design and manufacturing of the stationary ring 100, making the stationary ring a reliable integrated structure. No additional tooling or structure is needed for the monitoring or control functions, minimizing the impact on sealing performance. Secondly, during the operation of the mechanical seal, the monitoring area 1 utilizes the positive voltage effect of the first piezoelectric ceramic layer to monitor the contact state of the sealing end face in real time. The control area 2 utilizes the inverse piezoelectric effect of the second piezoelectric ceramic layer to control the flatness of the sealing end face of the stationary ring in real time, thereby improving the contact state of the sealing end face. This reduces the contact force on the mechanical seal end face and decreases frictional wear, significantly contributing to the healthy operation of the equipment. Furthermore, it avoids the economic losses caused by repeated downtime for maintenance, disassembly, and reassembly of mechanical seal devices in existing technologies. Therefore, the integrated measurement and control mechanical seal device of this invention has high practical engineering value.

[0037] In some embodiments, such as Figure 2 , Figure 3 and Figure 6As shown, monitoring areas 1 are arranged along the circumference of the stationary ring 100, spaced apart near the outer and inner diameters of the stationary ring 100, respectively. The monitoring areas 1 located at the outer diameter and those located at the inner diameter correspond radially. If the moving ring comes into contact with the sealing end face of the stationary ring 100, the first piezoelectric ceramic layer 11 of the monitoring area 1 generates a monitoring voltage signal due to the positive piezoelectric effect. The difference in the monitoring voltage signal of the first piezoelectric ceramic layer 11 at the inner and outer diameters accurately reflects the different contact states of the sealing end faces at the corresponding inner and outer diameters. This is beneficial for the control area 2 to accurately control the flatness of the sealing end face of the stationary ring 100, and to better reduce the contact friction and wear of the mechanical seal end face.

[0038] In some embodiments, such as Figure 2 As shown, the control area 2 is arranged along the circumference of the stationary ring 100, spaced apart near the outer and inner diameters of the stationary ring 100. The monitoring area 1 located at the outer diameter corresponds radially to the monitoring area 1 located at the inner diameter, and the control area 2 and monitoring area 1 are evenly alternated along the circumference of the stationary ring 100. If the moving ring comes into contact with the sealing end face of the stationary ring 100, the first piezoelectric ceramic layer 11 of the monitoring area 1 generates a monitoring voltage signal due to the positive piezoelectric effect. The difference in the monitoring voltage signal of the first piezoelectric ceramic layer 11 at the inner and outer diameters accurately reflects the different contact states of the sealing end faces at the corresponding inner and outer diameters. The control area 2 can accurately control the flatness of the sealing end face of the stationary ring 100, thereby better reducing the frictional wear of the mechanical seal end face.

[0039] In some embodiments, such as Figure 3 As shown, the control zones 2 are evenly spaced along the circumference of the stationary ring 100 and are spaced apart near the outer and inner diameters of the stationary ring 100, respectively. The control zones 1 located at the outer diameter and the control zones 1 located at the inner diameter are radially corresponding one-to-one. Each corresponding control zone 2 is arranged radially adjacent to the two sides along the circumference of the stationary ring 100. If the moving ring and the sealing end face of the stationary ring 100 come into contact, the first piezoelectric ceramic layer 11 of the monitoring zone 1 generates a monitoring voltage signal due to the positive piezoelectric effect. The difference in the monitoring voltage signal of the first piezoelectric ceramic layer 11 at the inner and outer diameters accurately reflects the different contact states of the sealing end faces at the corresponding inner and outer diameters. The control zones 2 can precisely control the flatness of the sealing end face of the stationary ring 100, thereby better reducing the contact friction and wear of the mechanical seal end face.

[0040] In some embodiments, such as Figure 4 As shown, the monitoring area 1 includes a first substrate layer 10, a first piezoelectric ceramic layer 11, and a first wear-resistant layer 12 stacked sequentially, with the first wear-resistant layer 12 facing the moving ring; as Figure 5As shown, the control area 2 includes a first substrate layer 10, a second piezoelectric ceramic layer 21, and a second wear-resistant layer 22 stacked sequentially. The thickness of the second piezoelectric ceramic layer 21 is greater than the thickness of the first piezoelectric ceramic layer 11, and the second wear-resistant layer 22 faces the moving ring. It can be understood that the first piezoelectric ceramic layer 11 and the second piezoelectric ceramic layer 21 are respectively disposed in different regions of the end face of the first substrate layer 10 by additive manufacturing. The first wear-resistant layer 12 and the second wear-resistant layer 22 are respectively disposed on the first piezoelectric ceramic layer 11 and the second piezoelectric ceramic layer 21 by additive manufacturing. Since both the first piezoelectric ceramic layer 11, which serves a monitoring function, and the second piezoelectric ceramic layer 21, which serves a control function, are porous and not wear-resistant, a dense first wear-resistant layer 12 and a dense second wear-resistant layer 22 are respectively disposed on the surfaces of the first piezoelectric ceramic layer 11 and the second piezoelectric ceramic layer 21 to improve the friction and wear performance of the sealing end face of the stationary ring 100.

[0041] In some embodiments, such as Figure 6 and Figure 7 As shown, monitoring area 1 and control area 2 are stacked axially and arranged at intervals along the circumferential direction of stationary ring 100, with monitoring area 1 being closer to the moving ring than control area 2. If the moving ring comes into contact with the sealing end face of stationary ring 100, the first piezoelectric ceramic layer 11 of monitoring area 1 generates a monitoring voltage signal due to the positive piezoelectric effect. The difference in the monitoring voltage signal of the first piezoelectric ceramic layer 11 at the inner diameter and outer diameter accurately reflects the different contact states of the sealing end face at the corresponding inner diameter and outer diameter. Control area 2 can precisely control the flatness of the sealing end face of stationary ring 100, thereby better reducing the contact friction and wear of the mechanical seal end face.

[0042] In some embodiments, the control areas 2 are spaced apart along the circumferential direction of the stationary ring 100 and spaced apart near the outer diameter and inner diameter of the stationary ring 100, respectively. The monitoring area 1 and the control area 2 are overlapped one-to-one in the axial direction. Thus, the monitoring area 1 can accurately monitor the contact state of the sealing end face, and the control area 2 can accurately control the flatness of the sealing end face of the stationary ring 100, thereby better reducing the friction and wear of the mechanical seal end face.

[0043] In some embodiments, the control region 2 includes a second substrate layer 20, a second piezoelectric ceramic layer 21, and an isolation layer 23 stacked sequentially; the monitoring region 1 includes a first piezoelectric ceramic layer 11 and a third wear-resistant layer 13 stacked sequentially, with the isolation layer 23 stacked between the second piezoelectric ceramic layer and the first piezoelectric ceramic layer 11, and the thickness of the second piezoelectric ceramic layer 21 being greater than the thickness of the first piezoelectric ceramic layer 11. It is understood that the second piezoelectric ceramic layer 21, serving as the control function, is disposed on the second substrate layer 20 by additive manufacturing; the isolation layer 23 is disposed on the second piezoelectric ceramic layer 21 by additive manufacturing; the first piezoelectric ceramic layer 11 is disposed on the isolation layer 23 by additive manufacturing; and the third wear-resistant layer 13 is disposed on the first piezoelectric ceramic layer 11 by additive manufacturing. The second piezoelectric ceramic layer 21, which serves as a control function, is porous and not wear-resistant. Therefore, in order to provide wear resistance to the end face of the stationary ring 100, a third wear-resistant layer 13 with a dense structure is provided on the surface of the second piezoelectric ceramic layer 21 to improve the friction and wear performance of the sealing end face of the stationary ring 100.

[0044] In some embodiments, such as Figures 2 to 8 As shown, if the sealing end face of the moving ring and the stationary ring 100 comes into contact, the first piezoelectric ceramic layer 11 in the monitoring area 1 generates a monitoring voltage signal due to the positive piezoelectric effect. The difference in the monitoring voltage signal of the first piezoelectric ceramic layer 11 at the inner diameter and the outer diameter reflects the different contact state of the sealing end face at the corresponding inner diameter and the outer diameter. At this time, the input voltage of the second piezoelectric ceramic layer 21 in the control area 2 causes a slight deformation due to the inverse piezoelectric effect, thereby changing the flatness of the sealing end face of the stationary ring 100.

[0045] In some embodiments, the flatness of the sealing end face of the regulating region 2 adjusts the flatness parameters of the stationary ring, including flatness indices such as end face taper and waviness. For example, as... Figure 8 As shown, the deformation of the control zone 2 located at the inner diameter is greater than that of the control zone 2 located at the outer diameter, thereby causing the sealing end of the stationary ring 100 to have a positive taper, the magnitude of which is... r is the radial dimension of the stationary ring 100, α is the outer axial thickness dimension of the control zone 2 located at the outer diameter, and β is the inner axial thickness dimension of the control zone 2 located at the inner diameter.

[0046] In the description of this specification, the references to terms such as "one embodiment," "some embodiments," "illustrative embodiment," "example," "specific example," or "some examples," etc., indicate that a specific feature, structure, or characteristic described in connection with that embodiment or example is included in at least one embodiment or example of the present invention. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, or characteristics described may be combined in any suitable manner in one or more embodiments or examples.

[0047] Although embodiments of the invention have been shown and described, those skilled in the art will understand that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the invention, the scope of which is defined by the claims and their equivalents.

Claims

1. A combined measuring and control mechanical seal device, characterized in that, The system includes a stationary ring positioned end-to-end with the rotating ring. The sealing end of the stationary ring has a monitoring area including a first piezoelectric ceramic layer and a control area including a second piezoelectric ceramic layer. Both the monitoring area and the control area are obtained through additive manufacturing technology. During the operation of the mechanical seal, the monitoring area is used to monitor the contact state of the sealing end face in real time, and the control area is used to adjust the flatness of the sealing end face of the stationary ring in real time according to the contact state of the sealing end face monitored by the monitoring area, so as to improve the contact state of the sealing end face. The monitoring areas are arranged at intervals along the circumference of the stationary ring and near the outer diameter and inner diameter of the stationary ring, respectively. The monitoring areas located at the outer diameter and the monitoring areas located at the inner diameter correspond one-to-one in the radial direction. The control zones are evenly spaced along the circumference of the stationary ring and are spaced apart near the outer diameter and inner diameter of the stationary ring, respectively. The control zones located at the outer diameter and the control zones located at the inner diameter are radially corresponding one-to-one. Each radially corresponding control zone has a radially corresponding monitoring zone arranged on both sides along the circumference of the stationary ring. The monitoring area includes a first substrate layer, a first piezoelectric ceramic layer, and a first wear-resistant layer stacked sequentially, with the first wear-resistant layer facing the moving ring; the control area includes a first substrate layer, a second piezoelectric ceramic layer, and a second wear-resistant layer stacked sequentially, with the thickness of the second piezoelectric ceramic layer being greater than the thickness of the first piezoelectric ceramic layer, and the second wear-resistant layer facing the moving ring. The first piezoelectric ceramic layer and the second piezoelectric ceramic layer are disposed in different regions of the end face of the first substrate layer by additive manufacturing. The first wear-resistant layer is disposed on the first piezoelectric ceramic layer by additive manufacturing, and the second wear-resistant layer is disposed on the second piezoelectric ceramic layer by additive manufacturing.

2. A combined measuring and control mechanical seal device, characterized in that The system includes a stationary ring positioned end-to-end with the rotating ring. The sealing end of the stationary ring has a monitoring area including a first piezoelectric ceramic layer and a control area including a second piezoelectric ceramic layer. Both the monitoring area and the control area are obtained through additive manufacturing technology. During the operation of the mechanical seal, the monitoring area is used to monitor the contact state of the sealing end face in real time, and the control area is used to adjust the flatness of the sealing end face of the stationary ring in real time according to the contact state of the sealing end face monitored by the monitoring area, so as to improve the contact state of the sealing end face. The monitoring areas are arranged at intervals along the circumference of the stationary ring and near the outer diameter and inner diameter of the stationary ring, respectively. The monitoring areas located at the outer diameter and the monitoring areas located at the inner diameter correspond one-to-one in the radial direction. The monitoring area and the control area are stacked axially and spaced apart along the circumferential direction of the stationary ring, wherein the monitoring area is closer to the moving ring than the control area; The control zones are spaced apart along the circumference of the stationary ring and are respectively spaced apart near the outer diameter and inner diameter of the stationary ring. The monitoring zone and the control zone are overlapped and stacked one-to-one in the axial direction. The control area includes a second substrate layer, a second piezoelectric ceramic layer, and an isolation layer stacked sequentially; the monitoring area includes a first piezoelectric ceramic layer and a third wear-resistant layer stacked sequentially, the isolation layer being stacked between the second piezoelectric ceramic layer and the first piezoelectric ceramic layer, the thickness of the second piezoelectric ceramic layer being greater than the thickness of the first piezoelectric ceramic layer, and the third wear-resistant layer facing the moving ring.

3. A mechanical seal device integrating measurement and control, characterized in that, The system includes a stationary ring positioned end-to-end with the rotating ring. The sealing end of the stationary ring has a monitoring area including a first piezoelectric ceramic layer and a control area including a second piezoelectric ceramic layer. Both the monitoring area and the control area are obtained through additive manufacturing technology. During the operation of the mechanical seal, the monitoring area is used to monitor the contact state of the sealing end face in real time, and the control area is used to adjust the flatness of the sealing end face of the stationary ring in real time according to the contact state of the sealing end face monitored by the monitoring area, so as to improve the contact state of the sealing end face. The monitoring areas are arranged at intervals along the circumference of the stationary ring and near the outer diameter and inner diameter of the stationary ring, respectively. The monitoring areas located at the outer diameter and the monitoring areas located at the inner diameter correspond one-to-one in the radial direction. The control areas are arranged at intervals along the circumference of the stationary ring and near the outer and inner diameters of the stationary ring, respectively, and the control areas and the monitoring areas are evenly alternated along the circumference of the stationary ring. The monitoring area includes a first substrate layer, a first piezoelectric ceramic layer, and a first wear-resistant layer stacked sequentially, with the first wear-resistant layer facing the moving ring; the control area includes a first substrate layer, a second piezoelectric ceramic layer, and a second wear-resistant layer stacked sequentially, with the thickness of the second piezoelectric ceramic layer being greater than the thickness of the first piezoelectric ceramic layer, and the second wear-resistant layer facing the moving ring. The first piezoelectric ceramic layer and the second piezoelectric ceramic layer are disposed in different regions of the end face of the first substrate layer by additive manufacturing. The first wear-resistant layer is disposed on the first piezoelectric ceramic layer by additive manufacturing, and the second wear-resistant layer is disposed on the second piezoelectric ceramic layer by additive manufacturing.

4. In the integrated measurement and control mechanical seal device according to any one of claims 1-3, if sealing end face contact occurs, the first piezoelectric ceramic layer in the monitoring area generates a monitoring voltage signal due to the positive piezoelectric effect, and the difference in the monitoring voltage signal of the first piezoelectric ceramic layer in the monitoring area at the corresponding inner diameter and outer diameter reflects the different sealing end face contact states at the corresponding inner diameter and outer diameter. At this time, the input voltage of the second piezoelectric ceramic layer in the control area undergoes a slight deformation due to the inverse piezoelectric effect of the second piezoelectric ceramic, thereby changing the flatness of the sealing end face of the stationary ring.

5. The integrated measurement and control mechanical seal device according to any one of claims 1-3, wherein the adjustment of the flatness of the sealing end face of the stationary ring in the control zone includes the magnitude of the end face taper and waviness index.

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