High temperature protection method for glass substrate production channel

Abstract

The present disclosure provides a high-temperature protection method for a glass substrate production channel. The present application relates to the field of glass production technology. Among them, an inert gas is introduced into a platinum channel; the platinum channel is heated; the introduction of inert gas into part of the platinum channel is stopped; and glass liquid is transported into the platinum channel. The high-temperature protection method for a glass substrate production channel provided in the present application introduces an inert gas for a first preset time into the platinum channel before heating the platinum channel and introducing glass liquid, thereby preventing the platinum channel from being oxidized at high temperatures, thereby preventing crystals precipitated from the platinum channel from penetrating into the glass liquid, and preventing defects such as needle-shaped platinum, rhodium or gold precipitated particles from being generated on the glass substrate, thereby reducing product defects and improving the yield rate.

Description

Technical Field

[0001] The present disclosure relates to the technical field of glass production, and in particular to a high temperature protection method for a glass substrate production channel. Background Art

[0002] At present, the temperature of the glass channel of the liquid crystal display glass substrate (TFT-LCD) production line is between 1200-1500℃ during normal production. The platinum channel is made of precious metals such as platinum (Pt), rhodium (Rh), platinum-rhodium alloy, etc. These materials are very stable at room temperature or around 1200℃ and are not easily oxidized. However, when the production line undergoes technical transformation, cold repair or hot repair, the precious metals undergo recovery, purification or processing, and the crystal structure will undergo slight changes, which may cause crystals to precipitate at high temperatures and penetrate into the glass liquid. The quality requirements of the glass liquid for liquid crystal display are extremely strict during the production process. The glass liquid infiltrated with crystals will produce defects such as needle-shaped platinum, rhodium gold, and gold precipitation particles after the production of the glass substrate.

[0003] In the prior art, the crystal precipitation of precious metals in the platinum channel is reduced by insulating the platinum channel, but this method is generally ineffective.

[0004] Therefore, how to provide a method that can reduce the precipitation of platinum channel crystals at high temperatures becomes an urgent problem to be solved. Summary of the invention

[0005] A technical problem to be solved by the present disclosure is: how to reduce the crystal precipitation of platinum channels at high temperatures.

[0006] In order to solve the above technical problems, the present disclosure provides a high temperature protection method for a glass substrate production channel, comprising:

[0007] Introducing inert gas into the platinum channel;

[0008] Heating the platinum channel;

[0009] Stop the introduction of inert gas into some platinum channels;

[0010] Transport glass liquid to the platinum channel.

[0011] In this embodiment, introducing the inert gas into the platinum channel comprises:

[0012] Inert gas is introduced into the first part, the second part, the third part and the fourth part of the platinum channel through the first gas supply port, the second gas supply port, the third gas supply port and the fourth gas supply port respectively.

[0013] In this embodiment, introducing the inert gas into the first part, the second part, the third part and the fourth part of the platinum channel through the first gas supply port, the second gas supply port, the third gas supply port and the fourth gas supply port respectively comprises:

[0014] opening the first valve of the first gas supply port at a first preset time before the platinum channel is heated, and introducing an inert gas into the first part through the first gas supply port;

[0015] opening the fourth valve of the fourth gas supply port at a second preset time before the platinum channel is heated up, and introducing inert gas into the fourth part through the fourth gas supply port;

[0016] The second valve of the second gas supply port and the third valve of the third gas supply port are opened at a third preset time before the platinum channel is heated, and inert gas is introduced into the second part and the third part through the second gas supply port and the third gas supply port respectively.

[0017] In this embodiment, opening the first valve of the first gas supply port at a first preset time before the platinum channel is heated, and introducing the inert gas into the first part through the first gas supply port comprises:

[0018] Opening the first valve of the first gas supply port at a first preset time before the platinum channel is heated, and introducing the inert gas at a first preset flow rate for a fourth preset time into the first gas supply port through the first gas supply device;

[0019] measuring the oxygen content in the first portion;

[0020] If the oxygen content in the first part is within a first preset range, an inert gas is introduced into the first gas supply port through the first gas supply device at a second preset flow rate.

[0021] In this embodiment, opening the fourth valve of the fourth gas supply port at the second preset time before the platinum channel is heated, and introducing the inert gas into the fourth part through the fourth gas supply port comprises:

[0022] Open the fourth valve of the fourth gas supply port at a second preset time before the platinum channel is heated up, and introduce the inert gas of a first preset flow rate for a fifth preset time into the fourth gas supply port through the fourth gas supply device;

[0023] measuring the oxygen content in the fourth portion;

[0024] If the oxygen content in the fourth part is within the first preset range, the inert gas is introduced into the fourth gas supply port through the first gas supply device at a second preset flow rate.

[0025] In this embodiment, opening the second valve of the second gas supply port and the third valve of the third gas supply port at a third preset time before the platinum channel is heated, and introducing the inert gas into the second part and the third part through the second gas supply port and the third gas supply port respectively comprises:

[0026] At a third preset time before the platinum channel is heated up, the second valve of the second gas supply port and the third valve of the third gas supply port are opened, and the inert gas of the first preset flow rate for the fifth preset time is introduced into the second gas supply port and the third gas supply port respectively through the second gas supply device and the third gas supply device;

[0027] measuring the oxygen content in the second and third portions;

[0028] If the oxygen content in the second part and the third part is within the first preset range, the inert gas is introduced into the second gas supply port and the third gas supply port respectively through the second gas supply device and the third gas supply device at a second preset flow rate.

[0029] In this embodiment, before delivering the glass liquid to the platinum channel, the process includes:

[0030] The first part, the second part, the third part and the fourth part are connected to form a connected platinum channel.

[0031] In this embodiment, stopping the introduction of the inert gas into some of the platinum channels includes:

[0032] At a seventh preset time before the first part, the second part, the third part and the fourth part are connected, the fourth valve of the fourth air supply port is closed to stop supplying air to the fourth part;

[0033] The first valve of the first gas supply port and the second valve of the second gas supply port are closed at an eighth preset time before the glass liquid reaches the first gas supply port and the second gas supply port, and gas supply to the first part and the second part is stopped in sequence.

[0034] In this embodiment, after delivering the glass liquid to the platinum channel, the method further includes:

[0035] After the second gas supply port discharges the glass liquid for the ninth preset time, the third gas supply port is closed.

[0036] In this embodiment, the inert gas is argon or nitrogen.

[0037] Through the above technical scheme, the present disclosure provides a high-temperature protection method for a glass substrate production channel, wherein the glass substrate production channel includes a platinum channel, and glass liquid circulates in the platinum channel. In the present application, an inert gas is introduced into the platinum channel, and the inert gas is continuously introduced for a period of time, so that the air in the platinum channel is discharged, the oxygen content is reduced, and then the platinum channel is heated. Since the inside of the platinum channel is filled with an inert gas with relatively stable physical properties and a low oxygen content, the platinum channel is not easily oxidized at a high temperature below 1600°C, thereby protecting the inner wall of the platinum channel and preventing the precious metal from crystallizing at high temperatures. After the heating is completed, the introduction of the inert gas into part of the platinum channel is stopped, and the glass liquid is transported into the platinum channel, thereby completing the transmission of the glass liquid. The high-temperature protection method for a glass substrate production channel provided in the present application introduces an inert gas for a first preset time into the platinum channel before the platinum channel is heated up and the glass liquid is introduced, thereby preventing the platinum channel from being oxidized at high temperatures, thereby preventing crystals precipitated from the platinum channel from penetrating into the glass liquid, and preventing the glass substrate from producing defects such as needle-shaped platinum, rhodium or gold precipitated particles, thereby reducing product defects and improving the yield rate. BRIEF DESCRIPTION OF THE DRAWINGS

[0038] In order to more clearly illustrate the embodiments of the present disclosure or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present disclosure. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.

[0039] Figure 1 It is a flow chart of a high temperature protection method for a glass substrate production channel disclosed in an embodiment of the present application;

[0040] Figure 2 is a flow chart of another high temperature protection method for a glass substrate production channel disclosed in an embodiment of the present application;

[0041] Figure 3 It is a structural schematic diagram of a glass substrate production channel device disclosed in an embodiment of the present application;

[0042] Figure 4 It is a structural schematic diagram of an air supply device disclosed in an embodiment of the present application.

[0043] Description of reference numerals:

[0044] 1. Glass substrate production channel device; 11. Platinum channel; 111. First part; 112. Second part; 113. Third part; 114. Fourth part; 115. First air supply port; 116. Second air supply port; 117. Third air supply port; 118. Fourth air supply port; 119. Liquid inlet. DETAILED DESCRIPTION

[0045] The following is a further detailed description of the embodiments of the present disclosure in conjunction with the accompanying drawings and examples. The detailed description of the following embodiments and the accompanying drawings are used to exemplarily illustrate the principles of the present disclosure, but cannot be used to limit the scope of the present disclosure. The present disclosure can be implemented in many different forms and is not limited to the specific embodiments disclosed herein, but includes all technical solutions that fall within the scope of the claims.

[0046] The present disclosure provides these embodiments to make the present disclosure thorough and complete, and to fully express the scope of the present disclosure to those skilled in the art. It should be noted that unless otherwise specifically stated, the relative arrangement of the parts and steps, the composition of the materials, the numerical expressions and the numerical values ​​set forth in these embodiments should be interpreted as being merely exemplary, and not as limiting.

[0047] It should be noted that, in the description of the present disclosure, unless otherwise specified, the meaning of "multiple" is greater than or equal to two; the terms "upper", "lower", "left", "right", "inner", "outer", etc., indicating the orientation or positional relationship, are only for the convenience of describing the present disclosure and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation of the present disclosure. When the absolute position of the object being described changes, the relative positional relationship may also change accordingly.

[0048] In addition, the words "first", "second" and similar words used in the present disclosure do not indicate any order, quantity or importance, but are only used to distinguish different parts. "Vertical" does not mean vertical in the strict sense, but is within the tolerance range. "Parallel" does not mean parallel in the strict sense, but is within the tolerance range. "Include" or "comprising" and similar words mean that the elements before the word include the elements listed after the word, and do not exclude the possibility of including other elements.

[0049] It should also be noted that in the description of the present disclosure, unless otherwise clearly specified and limited, the terms "installed", "connected", and "connected" should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or an integral connection; it can be directly connected or indirectly connected through an intermediate medium. For ordinary technicians in this field, the specific meanings of the above terms in the present disclosure can be understood according to the specific circumstances. When a specific device is described as being located between a first device and a second device, there may or may not be an intermediate device between the specific device and the first device or the second device.

[0050] All terms used in the present disclosure have the same meanings as those understood by those of ordinary skill in the art to which the present disclosure belongs, unless otherwise specifically defined. It should also be understood that terms defined in general dictionaries, for example, should be interpreted as having meanings consistent with their meanings in the context of the relevant technology, and should not be interpreted in an idealized or extremely formal sense, unless explicitly defined as such herein.

[0051] Technologies, methods, and equipment known to ordinary technicians in the relevant art may not be discussed in detail, but where appropriate, the technologies, methods, and equipment should be considered part of the specification.

[0052] like Figure 1 As shown, the present application provides a high temperature protection method for a glass substrate production channel, comprising:

[0053] S101, introducing an inert gas into the first part, the second part, the third part and the fourth part of the platinum channel through the first gas supply port, the second gas supply port, the third gas supply port and the fourth gas supply port respectively;

[0054] like Figure 3As shown, the glass substrate production channel device is a transmission channel for glass liquid in the process of glass substrate production. The glass substrate production channel device 1 includes a platinum channel 11 and a gas supply device. The platinum channel 11 includes a first part 111, a second part 112, a third part 113 and a fourth part 114. The first part 111, the second part 112, the third part 113 and the fourth part 114 are detachably connected. Before the glass liquid is input into the platinum channel 11, the first part 111, the second part 112, the third part 113 and the fourth part 114 are split structures. The first part 111 is provided with a first gas supply port 114. 15. The first air supply port 115 is arranged above the first part 111 and is arranged obliquely. A liquid inlet 119 is also arranged at one end of the first part 111 away from the second part 112; a second air supply port 116 is arranged on the second part 112, a third air supply port 117 is arranged on the third part 113, and a fourth air supply port 118 is arranged on the fourth part 114. The second air supply port 116, the third air supply port 117 and the fourth air supply port 118 are arranged at the bottom. In the prior art, the first air supply port 115 is used for exhaust, and the second air supply port 116, the third air supply port 117 and the fourth air supply port 118 are used for unloading and discharging liquid. The first gas supply port 115, the second gas supply port 116, the third gas supply port 117 and the fourth gas supply port 118 are all connected to a gas supply device, which is used to introduce inert gas into the first part 111, the second part 112, the third part 113 and the fourth part 114 through the first gas supply port 115, the second gas supply port 116, the third gas supply port 117 and the fourth gas supply port 118 respectively.

[0055] S102, heating the platinum channel;

[0056] The platinum channel is heated to the temperature during normal production, approximately between 1200-1500°C.

[0057] S103, stop introducing inert gas into some platinum channels;

[0058] After the inert gas is introduced into the platinum channel for a certain period of time, the air in the platinum channel is discharged and the platinum channel is filled with the inert gas with relatively stable physical properties. At this time, the platinum channel is not easily oxidized below 1600°C. At this time, the introduction of inert gas into part of the platinum channel is stopped to avoid waste.

[0059] S104, transporting molten glass to the platinum channel.

[0060] After stopping the introduction of some inert gases into the platinum channel, glass liquid is transported into the platinum channel. Since the platinum channel is filled with inert gases, the precious metal in the platinum channel can be prevented from oxidizing and precipitating crystals at high temperatures, thereby preventing the crystals from entering the glass liquid.

[0061] The present disclosure provides a high-temperature protection method for a glass substrate production channel, wherein the glass substrate production channel includes a platinum channel, and glass liquid circulates in the platinum channel. In the present application, an inert gas is introduced into the platinum channel, and the inert gas is continuously introduced for a period of time, so that the air in the platinum channel is discharged, the oxygen content is reduced, and then the platinum channel is heated. Since the inside of the platinum channel is filled with an inert gas with relatively stable physical properties and a low oxygen content, the platinum channel is not easily oxidized at a high temperature below 1600°C, thereby protecting the inner wall of the platinum channel and preventing the precious metal from crystallizing at high temperatures. After the heating is completed, the introduction of the inert gas into part of the platinum channel is stopped, and glass liquid is transported into the platinum channel, thereby completing the transmission of the glass liquid. The high-temperature protection method for a glass substrate production channel provided in the present application introduces an inert gas for a first preset time into the platinum channel before the platinum channel is heated up and the glass liquid is introduced, thereby preventing the platinum channel from being oxidized at high temperatures, thereby preventing crystals precipitated from the platinum channel from penetrating into the glass liquid, and preventing the glass substrate from producing defects such as needle-shaped platinum, rhodium or gold precipitated particles, thereby reducing product defects and improving the yield rate.

[0062] In this embodiment, S101, introducing inert gas into the first part, the second part, the third part and the fourth part of the platinum channel through the first gas supply port, the second gas supply port, the third gas supply port and the fourth gas supply port respectively includes:

[0063] S1011, opening the first valve of the first gas supply port at a first preset time before the platinum channel is heated, and introducing an inert gas into the first part through the first gas supply port;

[0064] At a first preset time before the platinum channel is heated up, the first valve of the first gas supply port is opened, and the inert gas is introduced into the first part through the first gas supply port by the gas supply device. The first preset time is two hours.

[0065] S1012, opening the fourth valve of the fourth gas supply port a second preset time before the platinum channel is heated, and introducing an inert gas into the fourth part through the fourth gas supply port;

[0066] At a second preset time before the platinum channel heats up, the fourth valve of the fourth gas supply port is opened, and the inert gas is introduced into the fourth part through the fourth gas supply port by the gas supply device. The second preset time is one and a half hours.

[0067] S1013, opening the second valve of the second gas supply port and the third valve of the third gas supply port at a third preset time before the platinum channel is heated, and introducing inert gas into the second part and the third part through the second gas supply port and the third gas supply port respectively;

[0068] At the third preset time before the platinum channel heats up, the second valve and the third valve of the second gas supply port and the third gas supply port are opened, and the inert gas is introduced into the second part and the third part through the second gas supply port and the second gas supply port by the gas supply device. The third preset time is one hour.

[0069] In this embodiment, inert gas is introduced into the platinum channel some time before the platinum channel needs to be heated to transfer glass liquid. Two hours before the platinum channel is heated, the inert gas is introduced into the first part through the first gas supply port. One and a half hours before the platinum channel is heated, the inert gas is introduced into the fourth part through the fourth gas supply port. One hour before the platinum channel is heated, the inert gas is introduced into the second part and the third part through the second gas supply port and the third gas supply port. This ensures that the interior of the platinum channel is filled with inert gas after heating, thereby avoiding oxidation crystallization of the platinum channel, while saving costs.

[0070] like Figure 2 As shown, another high temperature protection method for a glass substrate production channel provided by the present application includes:

[0071] S201, opening a first valve of a first gas supply port at a first preset time before the platinum channel is heated, and introducing an inert gas at a first preset flow rate for a fourth preset time to the first gas supply port through a first gas supply device;

[0072] First, the platinum channel and the gas supply device are tested. At the first preset time before the platinum channel is heated up, the first valve of the first gas supply port is opened, and the first gas supply device introduces the inert gas of the fourth preset time into the first part at the first preset flow rate through the first gas supply port. When the inert gas is introduced into the first part at the first preset flow rate for the fourth preset time, the cavity of the first part is basically filled with the inert gas. The first preset time is two hours, the first preset flow rate is 40NL / min, and the fourth preset time is 20 minutes.

[0073] S202, measuring the oxygen content in the first part;

[0074] After the inert gas is introduced into the first portion at a first preset flow rate for a fourth preset time, an oxygen content test is performed on the first portion.

[0075] S203, if the oxygen content in the first part is within the first preset range, introducing an inert gas into the first gas supply port through the first gas supply device at a second preset flow rate;

[0076] If the content obtained by the test of the first part is within the first preset range, and the first preset range is close to 0%, it proves that the air in the first part has been basically exhausted, there is no oxygen, and the first part is basically filled with inert gas. At this time, the inert gas is continuously introduced into the first air supply port through the first air supply device at a second preset flow rate, and the second preset flow rate is 18-30NL / min; if the oxygen content measured in the first part exceeds the first preset range, that is, it is much greater than 0%, then the first part is leaking and needs to be repaired.

[0077] S204, opening the fourth valve of the fourth gas supply port at a second preset time before the platinum channel is heated, and introducing a first preset flow rate of inert gas for a fifth preset time into the fourth gas supply port through the fourth gas supply device;

[0078] At the second preset time before the platinum channel is heated up, the fourth valve of the fourth gas supply port is opened, and the fourth gas supply device introduces the inert gas for the fifth preset time into the fourth part at the first preset flow rate through the fourth gas supply port. When the inert gas is introduced at the first preset flow rate for the fifth preset time, the cavity of the fourth part is basically filled with the inert gas. The second preset time is one and a half hours, the first preset flow rate is 40NL / min, and the fifth preset time is 15 minutes.

[0079] S205, measuring the oxygen content in the fourth portion;

[0080] After the inert gas is introduced into the fourth portion at the first preset flow rate for a fifth preset time, an oxygen content test is performed on the fourth portion.

[0081] S206, if the oxygen content in the fourth part is within the first preset range, introducing an inert gas into the fourth gas supply port through the first gas supply device at a second preset flow rate;

[0082] If the content obtained by the test of the fourth part is within the first preset range, and the first preset range is close to 0%, it proves that the air in the fourth part has been basically emptied, there is no oxygen, and the fourth part is basically filled with inert gas. At this time, the inert gas is continuously introduced into the fourth gas supply port through the fourth gas supply device at a second preset flow rate, and the second preset flow rate is 18-30NL / min; if the oxygen content measured in the fourth part exceeds the first preset range, that is, it is much greater than 0%, then the fourth part is leaking and the fourth part needs to be repaired.

[0083] S207, opening the second valve of the second gas supply port and the third valve of the third gas supply port at a third preset time before the platinum channel is heated, and introducing a first preset flow rate of inert gas for a sixth preset time into the second gas supply port and the third gas supply port through the second gas supply device and the third gas supply device, respectively;

[0084] At the third preset time before the platinum channel is heated, the second valve of the second gas supply port and the third valve of the third gas supply port are opened, and the second gas supply device and the third gas supply device respectively introduce the inert gas for the sixth preset time into the second part and the third part through the second gas supply port and the third gas supply port at the first preset flow rate. When the inert gas is introduced into the second part and the third part at the first preset flow rate for the sixth preset time, the cavities of the second part and the third part are basically filled with inert gas. The third preset time is one hour, the first preset flow rate is 40NL / min, and the sixth preset time is 10 minutes.

[0085] S208, measuring the oxygen content in the second part and the third part;

[0086] After the inert gas is introduced into the second part and the third part at the first preset flow rate for a sixth preset time, an oxygen content test is performed on the second part and the third part.

[0087] S209, if the oxygen content in the second part and the third part is within the first preset range, introducing inert gas into the second gas supply port and the third gas supply port respectively through the second gas supply device and the third gas supply device at a second preset flow rate;

[0088] If the content obtained by testing the second and third parts is within the first preset range, which is close to 0%, it proves that the air in the second and third parts has been basically exhausted, there is no oxygen, and the second and third parts are basically filled with inert gas. At this time, the inert gas is continuously introduced into the second and third parts respectively through the second air supply device and the third air supply device at a second preset flow rate, and the second preset flow rate is 18-30NL / min; if the oxygen content measured in the second and third parts exceeds the first preset range, that is, much greater than 0%, the second and third parts are leaking, and the second and third parts need to be repaired.

[0089] S210, heating the platinum channel;

[0090] S211, closing the fourth valve of the fourth gas supply port to stop supplying gas to the fourth part at a seventh preset time before connecting the first part, the second part, the third part and the fourth part;

[0091] Seventh preset time before connecting the first part, the second part, the third part and the fourth part, the fourth valve of the fourth air supply port is closed, the fourth air supply device stops supplying air to the fourth part, the fourth air supply device is disconnected from the fourth air supply port, and the fourth air supply port resumes the pre-feeding state. The seventh preset time is half an hour.

[0092] S212, closing the first valve of the first gas supply port and the second valve of the second gas supply port at an eighth preset time before the glass liquid reaches the first gas supply port and the second gas supply port, and stopping gas supply to the first part and the second part in sequence;

[0093] After the first part, the second part, the third part and the fourth part are connected, the first gas supply valve is closed before the eighth preset time before the glass liquid reaches the first gas supply port, the first gas supply port is disconnected from the first gas supply device, the gas supply to the first part is stopped, and the first gas supply port returns to a normal exhaust state; the second gas supply valve is closed before the eighth preset time before the glass liquid reaches the second gas supply port, the second gas supply port is disconnected from the second gas supply device, the gas supply to the second part is stopped, and the second gas supply port returns to a normal pre-discharge state. The eighth preset time is half an hour.

[0094] S213, transporting glass liquid from the liquid inlet of the first part into the platinum channel;

[0095] After the first part, the second part, the third part and the fourth part are connected, the fourth gas supply port, the first gas supply port and the second gas supply port are disconnected from the gas supply device in turn, and after the gas supply to the platinum channel through the fourth gas supply port, the first gas supply port and the second gas supply port is stopped, the glass liquid enters the platinum channel from the liquid inlet of the first part, thereby realizing the transmission of the glass liquid, and during the transmission process, the glass liquid will be unloaded from the second gas supply port that is already in a pre-discharge state.

[0096] S214, transporting glass liquid to the platinum channel;

[0097] The molten glass is transported from the liquid inlet of the first part to the platinum channel, and the molten glass is discharged from the second gas supply port during the transportation process.

[0098] S215, after the second gas supply port discharges the glass liquid for the ninth preset time, the third gas supply port is closed.

[0099] Half an hour after the second air supply port stops unloading, the third air supply port is disconnected from the air supply device, and the air supply to the platinum channel through the third air supply port is stopped. The third air supply port is changed to a pre-discharge state, so that the glass liquid can be unloaded from the third air supply port. When the glass liquid reaches the fourth air supply port, it is transmitted from the fourth air supply port to the next structure, thereby realizing the transmission of the glass liquid by the platinum channel.

[0100] like Figures 2 to 4In another high temperature protection method for a glass substrate production channel provided in the present application, the first gas supply port, the fourth gas supply port, the second gas supply port and the third gas supply port are supplied with gas in sequence two hours, one and a half hours, one hour and one hour before the platinum channel is heated, so that the inert gas enters the first part, the fourth part, the second part and the third part in sequence, and after supplying gas to the first part for 20 minutes, the oxygen content is measured. If the oxygen content is close to 0%, the gas supply flow rate is adjusted to 18-30NL / min, and then the inert gas is continuously blown in. After supplying gas to the fourth part for 15 minutes, the oxygen content is measured. If When the oxygen content is close to 0%, adjust the gas flow rate to 18-30NL / min, and then continue to blow in inert gas. After supplying gas to the second and third parts for 10 minutes, measure the oxygen content. If the oxygen content is close to 0%, adjust the gas flow rate to 18-30NL / min, and then continue to blow in inert gas, so as to complete the gas supply to the first, second, third and fourth parts, and then heat the first, second, third and fourth parts respectively, and detect the operation of the equipment in real time during the heating process, and after the heating is completed, heat the first, second and third parts. The first and second parts are connected in sequence, and then the glass liquid is transported from the liquid inlet of the first part, and 0.5 hours before the first, second, third and fourth parts are connected and hot docking is achieved, the connection between the fourth gas supply port and the fourth gas supply device is released, so that the fourth gas supply port is restored to the pre-feeding state, and 0.5 hours before the glass liquid reaches the first gas supply port and the second gas supply port, the first gas supply port and the second gas supply port are closed in sequence, 0.5 hours before the glass liquid reaches the second gas supply port, the first gas supply port is closed 0.5 hours before the glass liquid reaches the second gas supply port, and the connection between the first gas supply port and the second gas supply port and the first gas supply device and the second gas supply device is released, so that the first gas supply port is restored to the pre-feeding state The second gas supply port is used to restore the pre-discharge state, and then the glass liquid is transferred to the platinum channel from the liquid inlet of the first part. In this process, the second gas supply port is used for unloading. After the second gas supply port stops unloading for half an hour, the third gas supply port is closed, and the connection between the third gas supply port and the third gas supply device is released, so that the third gas supply port is restored to the pre-feeding state, thereby completing the application of the platinum channel in the glass substrate production process. By supplying and stopping gas supply at the above time, costs are saved, and 99.9% of inert gas is blown into the platinum channel, air is discharged, and the internal oxygen content is reduced. Since the inert gas is an inert gas with relatively stable physical properties, the precious metal on the inner wall of the platinum channel will not be oxidized below 1600°C, thereby reducing the defects of needle-shaped platinum, rhodium or gold precipitation particles on the glass substrate, reducing the generation of gold precipitation particles, reducing product defects, and improving the yield rate.

[0101] In this embodiment, the inert gas is argon or nitrogen.

[0102] In this embodiment, when filling argon, the on-site inspection personnel always pay attention to the pressure of the argon cylinder. If the pressure is insufficient (<0.3MPa), replace it with a new bottle in time. One bottle is replaced approximately every 20 hours. The actual replacement time is based on the on-site pressure display.

[0103] The present disclosure provides a high-temperature protection method for a glass substrate production channel, wherein the glass substrate production channel includes a platinum channel, and glass liquid circulates in the platinum channel. In the present application, an inert gas is introduced into the platinum channel, and the inert gas is continuously introduced for a period of time, so that the air in the platinum channel is discharged, the oxygen content is reduced, and then the platinum channel is heated. Since the inside of the platinum channel is filled with an inert gas with relatively stable physical properties and a low oxygen content, the platinum channel is not easily oxidized at a high temperature below 1600°C, thereby protecting the inner wall of the platinum channel and preventing the precious metal from crystallizing at high temperatures. After the heating is completed, the introduction of the inert gas into part of the platinum channel is stopped, and glass liquid is transported into the platinum channel, thereby completing the transmission of the glass liquid. The high-temperature protection method for a glass substrate production channel provided in the present application introduces an inert gas for a first preset time into the platinum channel before the platinum channel is heated up and the glass liquid is introduced, thereby preventing the platinum channel from being oxidized at high temperatures, thereby preventing crystals precipitated from the platinum channel from penetrating into the glass liquid, and preventing the glass substrate from producing defects such as needle-shaped platinum, rhodium or gold precipitated particles, thereby reducing product defects and improving the yield rate.

[0104] So far, various embodiments of the present disclosure have been described in detail. In order to avoid obscuring the concept of the present disclosure, some details known in the art are not described. Based on the above description, those skilled in the art can fully understand how to implement the technical solution disclosed here.

[0105] Although some specific embodiments of the present disclosure have been described in detail by way of examples, it should be understood by those skilled in the art that the above examples are for illustration only and are not intended to limit the scope of the present disclosure. It should be understood by those skilled in the art that the above embodiments may be modified or some technical features may be replaced by equivalents without departing from the scope and spirit of the present disclosure. In particular, the various technical features mentioned in the various embodiments may be combined in any manner as long as there is no structural conflict.

Claims

1. A high temperature protection method for a glass substrate production channel, It is characterized in that include: Introducing inert gas into the platinum channel; heating the platinum channel; stopping the introduction of inert gas into the portion of the platinum channels; delivering glass liquid to the platinum channel; The step of introducing an inert gas into the platinum channel comprises: Introducing inert gas into the first part, the second part, the third part and the fourth part of the platinum channel through the first gas supply port, the second gas supply port, the third gas supply port and the fourth gas supply port respectively; The step of introducing the inert gas into the first part, the second part, the third part and the fourth part of the platinum channel through the first gas supply port, the second gas supply port, the third gas supply port and the fourth gas supply port respectively comprises: opening a first valve of the first gas supply port at a first preset time before the platinum channel is heated, and introducing an inert gas into the first part through the first gas supply port; opening a fourth valve of a fourth gas supply port at a second preset time before the platinum channel is heated, and introducing an inert gas into the fourth part through the fourth gas supply port; The second valve of the second gas supply port and the third valve of the third gas supply port are opened at a third preset time before the platinum channel is heated, and inert gas is introduced into the second part and the third part through the second gas supply port and the third gas supply port respectively.

2. The high temperature protection method for a glass substrate production channel according to claim 1, It is characterized in that The step of opening the first valve of the first gas supply port at a first preset time before the platinum channel is heated up, and introducing the inert gas into the first part through the first gas supply port comprises: Opening the first valve of the first gas supply port at a first preset time before the platinum channel is heated, and introducing the inert gas at a first preset flow rate for a fourth preset time into the first gas supply port through the first gas supply device; measuring the oxygen content in the first portion; If the oxygen content in the first part is within a first preset range, an inert gas is introduced into the first gas supply port through the first gas supply device at a second preset flow rate.

3. The high temperature protection method for a glass substrate production channel according to claim 1, It is characterized in that The step of opening the fourth valve of the fourth gas supply port at a second preset time before the platinum channel is heated up, and introducing the inert gas into the fourth part through the fourth gas supply port comprises: Opening a fourth valve of a fourth gas supply port at a second preset time before the platinum channel is heated, and introducing a first preset flow rate of inert gas at a fifth preset time into the fourth gas supply port through a fourth gas supply device; measuring the oxygen content in the fourth portion; If the oxygen content in the fourth part is within the first preset range, the inert gas is introduced into the fourth gas supply port through the first gas supply device at a second preset flow rate.

4. The high temperature protection method for a glass substrate production channel according to claim 1, It is characterized in that The step of opening the second valve of the second gas supply port and the third valve of the third gas supply port at a third preset time before the platinum channel is heated, and introducing the inert gas into the second part and the third part through the second gas supply port and the third gas supply port, respectively, comprises: Open the second valve of the second gas supply port and the third valve of the third gas supply port at a third preset time before the platinum channel is heated, and introduce a first preset flow rate of inert gas for a sixth preset time into the second gas supply port and the third gas supply port respectively through the second gas supply device and the third gas supply device; measuring the oxygen content in the second and third portions; If the oxygen content in the second part and the third part is within the first preset range, the inert gas is introduced into the second gas supply port and the third gas supply port respectively through the second gas supply device and the third gas supply device at a second preset flow rate.

5. The high temperature protection method for a glass substrate production channel according to claim 1, It is characterized in that Before delivering the glass liquid to the platinum channel, the method includes: The first part, the second part, the third part and the fourth part are connected to form a connected platinum channel.

6. The high temperature protection method for a glass substrate production channel according to claim 5, It is characterized in that The stopping of introducing the inert gas into part of the platinum channels comprises: At a seventh preset time before the first part, the second part, the third part and the fourth part are connected, the fourth valve of the fourth air supply port is closed to stop supplying air to the fourth part; The first valve of the first gas supply port and the second gas supply port are closed at an eighth preset time before the glass liquid reaches the first gas supply port and the second gas supply port, and gas supply to the first part and the second part is stopped in sequence.

7. The high temperature protection method for a glass substrate production channel according to claim 6, It is characterized in that After delivering the glass liquid to the platinum channel, the method further includes: After the second gas supply port discharges the glass liquid for a ninth preset time, the third gas supply port is closed.

8. The high temperature protection method for a glass substrate production channel according to claim 1, It is characterized in that The inert gas is argon or nitrogen.

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