Display substrate and display device

Abstract

The display substrate and display device provided by the present disclosure comprise a substrate, a plurality of light-sensitive devices, a noise reduction layer, a plurality of light-emitting devices and a black matrix arranged on the substrate in sequence, the black matrix does not shield the plurality of light-emitting devices, the black matrix comprises a plurality of first openings corresponding to the plurality of light-sensitive devices and arranged at at least part of the gaps of the light-emitting devices, the orthographic projection of each first opening is located in the orthographic projection of each light-sensitive device; the orthographic projection of the noise reduction layer at least overlaps with the orthographic projection of the plurality of light-sensitive devices, the noise reduction layer has a plurality of second openings with orthographic projections located in the orthographic projection of each light-sensitive device; the light-sensitive device, the first opening and the second opening satisfy the following relationship: d=X*D1, D2=K*D1, d=D1-(D1+D2)*h1 / (h1+h2+h); d and D2 are the apertures of the first opening and the second opening respectively, D1 is the edge length of the orthographic projection of the photoelectric conversion layer contained in the light-sensitive device on the substrate, h1 and h2 are the distances from the noise reduction layer to the light-sensitive device and the black matrix respectively, h is the thickness of the noise reduction layer, 0X≤0.6, 0.7

Description

Technical Field

[0001] This disclosure relates to the field of display technology, and in particular to a display substrate and a display device. Background Technology

[0002] With the rapid development of the information industry, biometric technology has been used more and more widely. In particular, since different users have different fingerprints, it is easy to verify user identity. Therefore, fingerprint recognition technology has been widely used in mobile terminals, smart homes and other fields to provide security for user information.

[0003] Optical fingerprint recognition is one method of fingerprint identification. The principle of optical fingerprint recognition is as follows: When a finger is placed above a display product, the light emitted by the light-emitting device in the display product illuminates the valleys and ridges of the finger. After reflection from these points, the light then strikes the photosensitive device in the display product. Because the light intensity reflected from the valleys and ridges differs, the photosensitive device generates different electrical signals based on these differences, thus achieving fingerprint recognition. Summary of the Invention

[0004] The display substrate and display device provided in this disclosure are specifically designed as follows:

[0005] On one hand, embodiments of this disclosure provide a display substrate, including:

[0006] Substrate;

[0007] Multiple light-emitting devices are arranged in an array on the substrate.

[0008] A black matrix is ​​located on the side of the layer containing the plurality of light-emitting devices away from the substrate. The orthographic projection of the black matrix on the substrate does not overlap with the orthographic projection of the plurality of light-emitting devices on the substrate. The black matrix includes a plurality of first openings, and the orthographic projection of the plurality of first openings on the substrate is located within the orthographic projection of at least a portion of the gap between each of the light-emitting devices on the substrate.

[0009] Multiple photosensitive devices are located between the layer containing the multiple light-emitting devices and the substrate. The orthographic projection of the multiple photosensitive devices on the substrate is located within the orthographic projection of at least a portion of the gaps between the light-emitting devices on the substrate, and the orthographic projection of the multiple first openings on the substrate is located within the orthographic projection of the multiple photosensitive devices on the substrate.

[0010] A noise reduction layer is located between the layer containing the plurality of photosensitive devices and the light-emitting surface of the plurality of light-emitting devices. The orthographic projection of the noise reduction layer on the substrate overlaps with the orthographic projection of the plurality of photosensitive devices on the substrate. The noise reduction layer includes a plurality of second openings, and the orthographic projection of the plurality of second openings on the substrate is located within the orthographic projection of the plurality of photosensitive devices on the substrate.

[0011] The photosensitive device, the first opening, and the second opening satisfy the following relationship:

[0012] d = X * D1, D2 = K * D1, d = D1 - (D1 + D2) * h1 / (h1 + h2 + h); where,

[0013] d is the diameter of the second opening, D1 is the side length of the orthographic projection of the photoelectric conversion layer contained in the photosensitive device on the substrate, D2 is the diameter of the first opening, h1 is the distance between the surface of the photosensitive device away from the substrate and the surface of the noise reduction layer facing the substrate, h2 is the distance between the surface of the noise reduction layer away from the substrate and the surface of the black matrix facing the substrate, h is the thickness of the noise reduction layer in the direction perpendicular to the substrate, X is greater than 0 and less than or equal to 0.6, and K is greater than 0.7 and less than or equal to 1.

[0014] In some embodiments, in the display substrate provided in the present disclosure, the orthogonal projection of the plurality of photosensitive devices on the substrate is located within at least a portion of the gaps between the light-emitting devices on the substrate.

[0015] In some embodiments, in the display substrate provided in the present disclosure, the plurality of light-emitting devices include a plurality of first light-emitting devices, a plurality of second light-emitting devices, and a plurality of third light-emitting devices, wherein the light-emitting colors of the first light-emitting devices, the light-emitting colors of the second light-emitting devices, and the light-emitting colors of the third light-emitting devices are different;

[0016] The first light-emitting device, the second light-emitting device, and the third light-emitting device are arranged cyclically in the row direction. In two adjacent rows, two adjacent light-emitting devices of the same color are spaced apart by (n-1) light-emitting devices in the column direction, where n is the total number of light-emitting colors.

[0017] The orthogonal projections of the plurality of photosensitive devices on the substrate are located within the orthogonal projections of all the column gaps on both sides of each of the second light-emitting devices on the substrate.

[0018] In some embodiments, in the display substrate provided in the present disclosure, the bottom electrode of the photosensitive device includes an integrally formed first portion and a second portion;

[0019] The first portion and the second portion extend along the column direction, respectively;

[0020] The width of the first portion in the row direction is greater than the width of the second portion in the row direction, and the side of the first portion away from the second light-emitting device and the side of the second portion away from the second light-emitting device are on the same straight line.

[0021] In some embodiments, in the display substrate provided in the present disclosure, at the column gap between the second light-emitting device and the first light-emitting device, the bottom electrode of the photosensitive device further includes a third portion, the third portion being integrally disposed with the end of the second portion away from the first portion, and the third portion extending along the row direction.

[0022] In some embodiments, the display substrate provided in this disclosure further includes: a plurality of transistors, wherein the plurality of transistors are located between the layer containing the plurality of photosensitive devices and the substrate.

[0023] The first terminal of each transistor is electrically connected to the third portion at the gap between the second light-emitting device and the first light-emitting device column, and to the second portion at the gap between the second light-emitting device and the third light-emitting device column.

[0024] In some embodiments, in the display substrate provided in the present disclosure, the shape of the orthographic projection of the first electrode of the transistor on the substrate includes: a first octagon, a second octagon, and a rectangle connecting the first octagon and the second octagon; wherein the first octagon is electrically connected to the bottom electrode of the photosensitive device, and the second octagon is electrically connected to the active layer of the transistor.

[0025] In some embodiments, in the display substrate provided in the present disclosure, the plurality of transistors are arranged in an array on the substrate, the active layers of the transistors in the same row are located on the same straight line, and the active layers of the transistors in the same column are arranged in parallel.

[0026] In some embodiments, in the display substrate provided in the present disclosure, the first light-emitting device emits blue light, the second light-emitting device emits green light, and the third light-emitting device emits red light.

[0027] In some embodiments, the display substrate provided in the present disclosure further includes a plurality of bias lines, which are disposed on the same layer as the anode of the light-emitting device, and there is a gap between the bias lines and the anode of the light-emitting device.

[0028] In some embodiments, in the display substrate provided in the present disclosure, the orthogonal projection of the plurality of bias lines on the substrate is located at the row gap of each of the light-emitting devices, and one of the bias lines is electrically connected to the top electrode of the photosensitive device in the same row.

[0029] In some embodiments, in the display substrate provided in the present disclosure, the bias line is a wavy trace.

[0030] In some embodiments, the display substrate provided in the present disclosure further includes a pixel defining layer, which is located between the anode layer of the light-emitting device and the light-emitting functional layer of the light-emitting device, and the pixel defining layer is reused as the noise reduction layer.

[0031] In some embodiments, the display substrate provided in this disclosure further includes a planarization layer, which is located between the layer containing the light-emitting device and the layer containing the photosensitive device, and the planarization layer is reused as the noise reduction layer.

[0032] In some embodiments, in the display substrate provided in the present disclosure, the noise reduction layer is disposed on the same layer as the anode of the light-emitting device;

[0033] The noise reduction layer includes a plurality of noise reduction sections, each noise reduction section being disposed corresponding to one of the photosensitive devices, and each noise reduction section having a second opening;

[0034] The orthographic projection of the noise reduction part on the substrate is greater than the orthographic projection of the corresponding photosensitive device on the substrate, and there is a gap between the noise reduction part and the anode of the light-emitting device.

[0035] In some embodiments, in the display substrate provided in the present disclosure, the photosensitive device, the first opening, and the second opening are arranged in a one-to-one correspondence.

[0036] In some embodiments, in the display substrate provided in the present disclosure, the orthographic projection of the center of the photosensitive device on the substrate, the orthographic projection of the center of the first opening on the substrate, and the orthographic projection of the center of the second opening on the substrate substantially coincide.

[0037] In some embodiments, in the display substrate provided in the present disclosure, the orthographic projection of the photoelectric conversion layer of the photosensitive device on the substrate, the orthographic projection of the first opening on the substrate, and the orthographic projection of the second opening on the substrate are all rectangular.

[0038] In some embodiments, in the display substrate provided in the present disclosure, D1 is greater than or equal to 8 μm and less than or equal to 20 μm, h1 is greater than or equal to 2 μm and less than or equal to 6 μm, h2 is greater than or equal to 10 μm and less than or equal to 20 μm, and h is greater than or equal to 1 μm and less than or equal to 2 μm.

[0039] On the other hand, this disclosure provides a display device including the display substrate described above. Attached Figure Description

[0040] Figure 1 The diagram shown is a schematic representation of a display substrate provided in an embodiment of this disclosure.

[0041] Figure 2 for Figure 1 A magnified view of a portion of the Z1 region;

[0042] Figure 3 For along Figure 1 Cross-sectional view of line I-II in the middle;

[0043] Figure 4 This is a diagram showing the spatial relationship between the photoelectric conversion layer, the first opening, and the second opening.

[0044] Figure 5 A schematic diagram of the micro-collimated optical path channel formed by the photoelectric conversion layer partially blocked by the second opening and the first opening;

[0045] Figure 6 This is a schematic diagram showing that the second opening does not affect the micro-collimated optical path channel formed by the photoelectric conversion layer and the first opening;

[0046] Figure 7 A graph showing the proportion of valley ridges and the proportion of reflection under different second openings;

[0047] Figure 8 Another curve showing the proportion of valley ridges and the proportion of reflection under different second openings;

[0048] Figure 9 for Figure 1 A magnified view of a portion of the Z2 region;

[0049] Figure 10 This is a schematic diagram of a photosensitive device and the transistors connected to it.

[0050] Figure 11 for Figure 10 A magnified view of a portion of the Z3 region;

[0051] Figure 12 A schematic diagram of a pixel-bound layer reused as a noise reduction layer;

[0052] Figure 13 This is a schematic diagram of a structure where the first planarization layer is reused as a noise reduction layer.

[0053] Figure 14 For along Figure 13 Cross-sectional view of line III-IV in the middle;

[0054] Figure 15 A schematic diagram of a structure in which the anode layer of a light-emitting device is reused as a noise reduction layer;

[0055] Figure 16 For along Figure 15 Cross-sectional view of the V-VI line. Detailed Implementation

[0056] To make the objectives, technical solutions, and advantages of the embodiments of this disclosure clearer, the technical solutions of the embodiments of this disclosure will be clearly and completely described below with reference to the accompanying drawings. It should be noted that the dimensions and shapes of the figures in the drawings do not reflect actual proportions and are only intended to illustrate the content of this disclosure. Furthermore, the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. Obviously, the described embodiments are only some embodiments of this disclosure, not all embodiments. Based on the described embodiments of this disclosure, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this disclosure.

[0057] Unless otherwise defined, the technical or scientific terms used herein shall have the ordinary meaning as understood by one of ordinary skill in the art to which this disclosure pertains. The terms “first,” “second,” and similar terms used in this disclosure and the claims do not indicate any order, quantity, or importance, but are merely used to distinguish different components. Terms such as “comprising” or “including” mean that the element or object preceding the word encompasses the elements or objects listed following the word and their equivalents, without excluding other elements or objects. Terms such as “inner,” “outer,” “upper,” and “lower” are used only to indicate relative positional relationships, and these relative positional relationships may change accordingly when the absolute position of the described object changes.

[0058] To keep the following description of the embodiments of this disclosure clear and concise, detailed descriptions of known functions and known components are omitted.

[0059] In organic light-emitting diode (OLED) displays, the scheme of fabricating the color film (CF) directly on the encapsulation layer (TFE) (Color Film On Encapsulation, COE) can replace the polarizer with the color film, giving the OLED display device higher integration, thinner and lighter weight, and higher transmittance. As a result, the power consumption of the display device can be reduced by about 20% and the lifespan can be increased by about 40% compared to products that use polarizers, making it more suitable for high-speed, low-latency 5G products.

[0060] However, in OLED display devices integrating color filters and photosensitive devices, the total luminous flux received by the photosensitive device includes valley / ridge luminous flux (i.e., reflected light from fingerprints), stray light and other luminous flux, as well as reflected luminous flux from the layers between the light-emitting device and the protective cover (such as encapsulation layers, touch layers, etc.). In other words, the valley / ridge luminous flux that actually carries fingerprint feature signals only accounts for a portion of the total luminous flux, resulting in a low proportion of valley / ridge luminous flux in the total luminous flux received by the photosensitive device, leading to reduced fingerprint recognition accuracy. The valley / ridge proportion is the ratio of the difference between the valley and ridge luminous flux received by a single photosensitive device to the total luminous flux. Furthermore, photosensitive devices have a limited full-well capacity (analogous to a water tank with an upper limit), so increasing the light source intensity cannot indirectly increase the valley / ridge proportion.

[0061] To address the aforementioned technical problems in related technologies, this disclosure provides a display substrate, such as... Figures 1 to 5 As shown, it includes:

[0062] Substrate 101;

[0063] Multiple light-emitting devices 102 are arranged in an array on a substrate 101. Each light-emitting device 102 may include an anode 1021, a light-emitting functional layer 1022, and a cathode 1023 stacked together. The light-emitting functional layer 1022 includes, but is not limited to, a hole injection layer, a hole transport layer, an electron blocking layer, a light-emitting material layer, a hole blocking layer, a hole transport layer, and an electron injection layer.

[0064] The black matrix 103 is located on the side of the layer containing the plurality of light-emitting devices 102 away from the substrate 101. The orthographic projection of the black matrix 103 on the substrate 101 does not overlap with the orthographic projection of the plurality of light-emitting devices 102 on the substrate 101. The black matrix 103 includes a plurality of first openings K1. The orthographic projection of the plurality of first openings K1 on the substrate 101 is located within the orthographic projection of at least a portion of the gap between each light-emitting device 102 on the substrate 101. Generally, the black matrix 103 also has an opening K' for setting the color resist CF. The opening K' is located directly above the light-emitting device 102.

[0065] Multiple photosensitive devices 104 are located between the layer containing multiple light-emitting devices 102 and the substrate 101. The orthographic projections of the multiple photosensitive devices 104 on the substrate 101 lie within the orthographic projections of at least a portion of the gaps between each light-emitting device 102 on the substrate 101, and the orthographic projections of multiple first openings K1 on the substrate 101 lie within the orthographic projections of the multiple photosensitive devices 104 on the substrate 101. Each photosensitive device 104 may include a bottom electrode 1041, a photoelectric conversion layer 1042, and a top electrode stacked together. 1043, wherein the photoelectric conversion layer 1042 can be a PIN structure, specifically including a P-type semiconductor layer, an I-type semiconductor layer (also called an intrinsic semiconductor layer) and an N-type semiconductor layer; wherein the P-type semiconductor layer is located between the bottom electrode 1041 and the I-type semiconductor layer, and the N-type semiconductor layer is located between the I-type semiconductor layer and the top electrode 1043; or, the N-type semiconductor layer is located between the bottom electrode 1041 and the I-type semiconductor layer, and the P-type semiconductor layer is located between the I-type semiconductor layer and the top electrode 1043, which is not limited here;

[0066] The noise reduction layer 105 is located between the layer containing the multiple photosensitive devices 104 and the light-emitting surface of the multiple light-emitting devices 102. The orthographic projection of the noise reduction layer 105 on the substrate 101 overlaps with the orthographic projection of the multiple photosensitive devices 104 on the substrate 101. The noise reduction layer 105 includes multiple second openings K2. The orthographic projection of the multiple second openings K2 on the substrate 101 is located within the orthographic projection of the multiple photosensitive devices 104 on the substrate 101.

[0067] The photosensitive device 104, the first opening K1, and the second opening K2 satisfy the following relationship:

[0068] d = X * D1 (1);

[0069] D2 = K * D1 (2);

[0070] d=D1-(D1+D2)*h1 / (h1+h2+h) (3);

[0071] Wherein, d is the aperture of the second opening K2, D1 is the orthogonal projection side length of the photoelectric conversion layer 1042 contained in the photosensitive device 104 on the substrate 101, D2 is the aperture of the first opening K1, h1 is the distance between the surface of the photosensitive device 104 away from the substrate 101 and the surface of the noise reduction layer 105 facing the substrate 101, h2 is the distance between the surface of the noise reduction layer 105 away from the substrate 101 and the surface of the black matrix 103 facing the substrate 101, h is the thickness of the noise reduction layer 105 in the direction perpendicular to the substrate 101, X is greater than 0 and less than or equal to 0.6, and K is greater than 0.7 and less than or equal to 1.

[0072] In the above-described display substrate provided in the embodiments of this disclosure, by sequentially providing a second opening K2 and a first opening K1 on the light-incident side of the photosensitive device 104, and ensuring that the three satisfy the above relationships (1) to (3), the reflected light from the film layer (e.g., encapsulation layer 107, touch layer 108, etc.) between the light-emitting device 102 and the protective cover plate 106 can be effectively prevented from irradiating the photosensitive device 104, thus effectively increasing the valley-ridge ratio.

[0073] Specifically, such as Figure 6 As shown, the photosensitive device 104 and the first opening K1 form a micro-collimated optical path channel, and the light-receiving angle α of the fingerprint reflection is controlled as follows:

[0074] tanα=(D1+D2) / [2*(h1+h2+h)] (4);

[0075] like Figure 5 As shown, the second opening K2 is used to block the reflected light from the film layer (e.g., encapsulation layer 107, touch layer 108, etc.) between the light-emitting device 102 and the protective cover plate 106, thereby reducing the impact of these reflected lights on the valley-ridge ratio. Furthermore, the second opening K2 cannot completely block the micro-collimated optical path channel formed by the photosensitive device 104 and the first opening K1. Therefore, the second opening K2 and the photosensitive device 104 need to satisfy the following relationship:

[0076] d=D1-2h1*tanα (5);

[0077] Substituting formula (5) into formula (4), we can obtain the relationship between the photosensitive device 104, the first opening K1, and the second opening K2 as shown in formula (3).

[0078] Optionally, such as Figure 2 and Figure 4 As shown, when the orthographic projections of the first opening K1, the second opening K2, and the photoelectric conversion layer 1042 contained in the photosensitive device 104 are all rectangles, the long side of the rectangle satisfies the following relationship:

[0079] d L =D 1L -(D 1L +D 2L )*h1 / (h1+h2+h) (6);

[0080] The direction of the longer side of the rectangle satisfies the following relationship:

[0081] ds=D 1S -(D 1S +D 2S )*h1 / (h1+h2+h) (7);

[0082] Where, d LLet d be the long side of the rectangle containing the second opening K2 (i.e., the diameter of the second opening K2 along its long side). S D is the shorter side of the rectangle containing the second opening K2 (i.e., the diameter of the second opening K2 along its shorter side). 1L D is the long rectangular side of the photoelectric conversion layer 1042 contained in the photosensitive device 104. 1S D is the short rectangular side of the photoelectric conversion layer 1042 contained in the photosensitive device 104. 2L D is the long side of the rectangle containing the first opening K1 (i.e., the diameter of the first opening K1 along its long side). 2S Let K1 be the short side of the rectangle (i.e., the diameter of the first opening K1 in the direction of the short side).

[0083] In some embodiments, D 1L and D 1S D is greater than or equal to 8 μm and less than or equal to 20 μm respectively. 2L and D 2S Greater than 5.6 μm and less than or equal to 20 μm, d L and d S The values ​​are respectively greater than 0 μm and less than or equal to 12 μm, h1 is greater than or equal to 2 μm and less than or equal to 6 μm, h2 is greater than or equal to 10 μm and less than or equal to 20 μm, and h is greater than or equal to 1 μm and less than or equal to 2 μm.

[0084] To find the optimal size of the second opening K2 to reduce the stray light ratio and increase the valley-ridge ratio, this disclosure provides a series of data, as shown in Table 1. In Table 1, "PIN area" represents the area of ​​the photoelectric conversion layer 1042 contained in the photosensitive device 104; d / D1 represents the ratio of the aperture of the second opening K2 to the side length of the photoelectric conversion layer 1042; the valley-ridge ratio represents the ratio of the valley / ridge light flux that actually carries the fingerprint feature signal to the total light flux received by the photosensitive device 104; the reflection ratio represents the ratio of stray light, such as the reflected light flux from the film layer (e.g., encapsulation layer 107, touch layer 108, protective cover 106, etc.) between the light-emitting device 102 and the protective cover 106, to the total light flux received by the photosensitive device 104; 1 indicates no noise reduction layer 105 is provided; 2 to 6 all have noise reduction layers 105, and the aperture of the second opening K2 contained in the noise reduction layers 105 of 2 to 6 gradually decreases.

[0085] As shown in Table 1, with a light source intensity of 1 lm (lumen) and a PIN (i.e., photoelectric conversion layer 1042) area of ​​192 μm, the results are satisfactory. 2In the following cases: without the noise reduction layer 105, the valley-ridge ratio of the photosensitive device 104 is 0.87%, and the reflection ratio is as high as 47%; when d:D1 is 1:1, the second opening K2 does not affect the micro-collimated optical path channel formed by the photosensitive device 104 and the first opening K1, and the reflection ratio decreases to 31%, while the valley-ridge ratio increases to 1.24%; when d:D1 is 0.8:1, the reflection ratio further decreases to 24%, while the valley-ridge ratio further increases to 1.31%; when d:D1 is 0.6:1, the reflection ratio further decreases to 17%, while the valley-ridge ratio further increases to 1.81%; when d:D1 is 0.5:1, the reflection ratio further decreases to 12%, and the valley-ridge ratio is 1.42%, without further increase; when d:D1 is 0.4:1, the reflection ratio further decreases to 9%, and the valley-ridge ratio is 0.97%, without further increase. This disclosure finds that the fingerprint ridge and valley image is clearest when d:D1 is 0.6:1. When the second opening K2 is further reduced (e.g., the d:D1 ratio is reduced to 0.5:1 and 0.4:1), the reflection ratio can be further reduced, but the ridge and valley ratio will not increase. This is because the noise reduction layer 105 blocks the micro-collimated optical path channel formed by the photosensitive device 104 and the first opening K1, causing the ridge and valley information reflected back from the finger to be blocked. Although the reflection ratio decreases, the useful ridge and valley ratio information decreases even faster, ultimately causing the ridge and valley ratio of the fingerprint to decrease in the total light flux received by the photosensitive device 104.

[0086] Table 1

[0087]

[0088]

[0089] Figure 7 The graphs shown in Table 1 are plots of d / D1 versus the proportion of valleys and ridges and the proportion of reflection, respectively. S1(A) represents the curve of d / D1 versus the proportion of valleys and ridges, and S1(B) represents the curve of d / D1 versus the proportion of reflection. (Combined with Table 1 and...) Figure 7 It can be seen that by setting a noise reduction layer 105 with a second opening K2, the proportion of valleys and ridges is the highest when d / D1 = 0.6. At this time, the reflection proportion drops from 47% without the noise reduction layer 105 to 17%, which is about twice the original proportion. The proportion of valleys and ridges increases from 0.87% to 1.81%. This shows that the present invention reduces the proportion of the emitted light from the light-emitting device 102 that is reflected by the various film layers inside the display substrate to the photosensitive device 104 before reaching the finger, thereby indirectly increasing the proportion of valleys and ridges and thus improving the accuracy of in-display fingerprint collection.

[0090] In addition, this disclosure tested a photosensitive device 104 of another size, namely, by changing only the area of ​​the photoelectric conversion layer 1042 contained in the photosensitive device 104 as shown in Table 1, while keeping other parameters unchanged. The results are as follows. Figure 8 As shown. Among them, Figure 8 In the table, S1(A) represents the value in Table 1 and... Figure 7 The curves showing d / D1 versus ridge ratio under the area of ​​the photosensitive device 104 are shown; S1(B) represents the ratio in Table 1 and Figure 7 S1(A) shows the curve of d / D1 versus reflection ratio for the area of ​​photosensitive device 104 shown; S2(B) shows the curve of d / D1 versus ridge ratio for another area of ​​photosensitive device 104 shown; S2(A) shows the curve of d / D1 versus reflection ratio for another area of ​​photosensitive device 104 shown. Figure 8 It can be seen that when d / D1 = 0.6, the proportion of valleys and ridges is the highest, consistent with Table 1 and... Figure 7 The pattern is the same as that in the previous work, which further illustrates the feasibility of the solution provided in this disclosure.

[0091] In some embodiments, in the display substrate provided in the present disclosure, the photosensitive device 104, the first opening K1 and the second opening K2 can be arranged in a one-to-one correspondence, and the orthographic projection of the center of the photosensitive device 104 on the substrate 101, the orthographic projection of the center of the first opening K1 on the substrate 101 and the orthographic projection of the center of the second opening K2 on the substrate 101 are approximately coincident (i.e. exactly coincident, or within the error range caused by factors such as process or measurement), so as to facilitate the formation of a collimated optical path and increase the valley-ridge ratio.

[0092] In some embodiments, in the display substrate provided in the present disclosure, such as Figure 1 As shown, the orthographic projections of the plurality of photosensitive devices 104 on the substrate 101 can lie within at least a portion of the spacing between the light-emitting devices 102 on the substrate 101. Optionally, as... Figure 1As shown, the multiple light-emitting devices 102 may include multiple first light-emitting devices B, multiple second light-emitting devices G, and multiple third light-emitting devices R. The light-emitting colors of the first light-emitting devices B, the second light-emitting devices G, and the third light-emitting devices R are different. For example, the light-emitting color of the first light-emitting device B is blue, the light-emitting color of the second light-emitting device G is green, and the light-emitting color of the third light-emitting device R is red. The first light-emitting devices B, the second light-emitting devices G, and the third light-emitting devices R are arranged cyclically in the row direction. In two adjacent rows, two adjacent light-emitting devices 102 of the same color are spaced (n-1) light-emitting devices 102 apart in the column direction, where n is the total number of light-emitting colors. The orthographic projection of the multiple photosensitive devices 104 on the substrate 101 can be located within the orthographic projection of all column gaps on both sides of each second light-emitting device G on the substrate 101, so that the center line connecting two adjacent photosensitive devices 104 in a row and two adjacent photosensitive devices 104 in an adjacent row forms a regular trapezoid M or an inverted trapezoid N, which is beneficial for realizing large-area fingerprint recognition.

[0093] In some embodiments, in the display substrate provided in the present disclosure, such as Figure 9 and Figure 11 The bottom electrode 1041 of the photosensitive device 104 includes an integrally formed first portion 411 and a second portion 412. The first portion 411 and the second portion 412 extend along the column direction Y. The width of the first portion 411 in the row direction X is greater than the width of the second portion 412 in the row direction X, and the side of the first portion 411 away from the second light-emitting device G and the side of the second portion 412 away from the second light-emitting device G are on the same straight line. In a specific implementation, the first portion 411 is used to carry the photoelectric conversion layer 1042, and the second portion 412 is used to achieve electrical connection with the transistor 109. Furthermore, the narrower width of the second portion 412 effectively reduces the coupling capacitance between the bottom electrode 1041 as a whole and other conductive layers.

[0094] In some embodiments, in the display substrate provided in the present disclosure, such as Figure 1 , Figure 9 and Figure 10As shown, at the column gap between the second light-emitting device G and the first light-emitting device B, the bottom electrode 1041 of the photosensitive device 104 may further include a third portion 413. The third portion 413 is integrally disposed with the end of the second portion 412 away from the first portion 411, and the third portion 413 extends along the row direction X. In a specific implementation, at the column gap between the second light-emitting device G and the first light-emitting device B, the third portion 413 is electrically connected to the transistor 109, and the second portion 412 is electrically connected to the transistor 109 through the third portion 413; at the column gap between the second light-emitting device G and the third light-emitting device R, the second portion 412 is directly electrically connected to the transistor 109, that is, there is no third portion 413 between the second portion 412 and the transistor 109.

[0095] In some embodiments, in the display substrate provided in the present disclosure, such as Figure 3 , Figure 10 and Figure 11 As shown, it may also include: a plurality of transistors 109, which are located between the layer containing the plurality of photosensitive devices 104 and the substrate 101; the first electrode 91 of each transistor 109 is electrically connected to a third portion 413 at the gap between the second light-emitting device G and the first light-emitting device B, and to a second portion 412 at the gap between the second light-emitting device G and the third light-emitting device R, so as to drive the photosensitive device 104 through the transistor 109, which constitutes a passive mode (PPS) driving circuit.

[0096] In some embodiments, in the display substrate provided in the present disclosure, such as Figure 10 and Figure 11 As shown, the orthographic projection of the first electrode 91 of the transistor 109 onto the substrate 101 includes a first octagon 911, a second octagon 912, and a rectangle 913 connecting the first octagon 911 and the second octagon 912. The first octagon 911 is electrically connected to the bottom electrode 1041 of the photosensitive device 104, and the second octagon 912 is electrically connected to the active layer 92. In some embodiments, the area of ​​the first octagon 911 may be larger than the area of ​​the second octagon 912, giving the first electrode 91 a gourd-like shape. Of course, in specific implementations, the orthographic projection of the first electrode 91 of the transistor 109 onto the substrate 101 can also be other shapes, which are not specifically limited here. Optionally, the first electrode 91 of the transistor 109 can be a source or a drain, which is not limited here.

[0097] In some embodiments, in the display substrate provided in the present disclosure, such as Figure 10 and Figure 11As shown, multiple transistors 109 are arranged in an array on the substrate 101. The active layers 92 of transistors 109 in the same row are located on the same straight line, and the active layers 92 of transistors 109 in the same column are arranged in parallel to simplify the layout design of the transistors 109. Furthermore, by Figure 10 As can be seen, the second electrode 93 of transistor 109 is electrically connected to the read line 111, and the gate 94 of transistor 109 is electrically connected to the gate line GL, so as to control the opening and closing of transistor 109 through the gate line GL, and to read the electrical signal output by transistor 109 for fingerprint recognition through the read line 111.

[0098] In some embodiments, in the display substrate provided in the present disclosure, such as Figure 1 and Figure 3 As shown, it may also include multiple bias lines 112, which are disposed in the same layer as the anode 1021 of the light-emitting device 102 to save costs and reduce the number of film layers; and there is a gap between the bias lines 112 and the anode 1021 of the light-emitting device 102, so as to avoid mutual interference between the signals on the two.

[0099] In some embodiments, in the display substrate provided in the present disclosure, such as Figure 1 and Figure 3 As shown, the orthogonal projection of multiple bias lines 112 on the substrate 101 is located at the row gap of each light-emitting device 102, and one bias line 112 is electrically connected to the top electrode 1043 of the photosensitive device 104 in the same row, so as to load a bias signal to the photosensitive device 104 at the column gap through the bias line 112.

[0100] In some embodiments, in the display substrate provided in the present disclosure, such as Figure 1 and Figure 10 As shown, in order to effectively avoid the anode 1021 of the light-emitting device 102, the bias line 112 can be a wavy line. It should be understood that when the space occupied by the anode 1021 of the light-emitting device 102 is small and the row gap between the anodes 1021 is large, there can be enough space to set the bias line 112. In this case, the bias line 112 can be set as a straight line to facilitate the fabrication of the bias line 112.

[0101] In some embodiments, in the display substrate provided in the present disclosure, such as Figure 1 , Figure 3 and Figure 12As shown, the pixel defining layer 110 is located between the anode 1021 of the light-emitting device 102 and the light-emitting functional layer 1022 of the light-emitting device 102. To reduce the number of film layers and achieve a thinner design, the pixel defining layer 110 can be reused as a noise reduction layer 105. Specifically, the pixel defining layer 110 can be made of a material with high light absorption (e.g., black resin) or a material with extremely low reflectivity (e.g., aluminum oxide). Generally, the pixel defining layer 110 has a pixel opening K3, and the light-emitting device 102 is disposed at the pixel opening K3. The area defined by the pixel opening K3 is the effective light-emitting area of ​​the light-emitting device 102.

[0102] In some embodiments, in the display substrate provided in the present disclosure, such as Figure 13 and Figure 14 As shown, it may also include a first planarization layer 113, which is located between the layer where the light-emitting device 102 is located and the layer where the photosensitive device 104 is located. In order to reduce the number of film layers and achieve a thinner design, the planarization layer can be reused as a noise reduction layer 105. Specifically, the first planarization layer 113 may be made of a material with high light absorption (e.g., black resin) or a material with extremely low reflectivity (e.g., aluminum oxide).

[0103] In some embodiments, in the display substrate provided in the present disclosure, such as Figure 15 and 16 As shown, to reduce the number of film layers and achieve a thinner design, the noise reduction layer 105 can be disposed on the same layer as the anode 1021 of the light-emitting device 102. In this case, the noise reduction layer 105 can include multiple noise reduction sections 105', each noise reduction section 105' corresponding to a photosensitive device 104, and each noise reduction section 105' has a second opening K2; the orthographic projection of the noise reduction section 105' on the substrate 101 is larger than the orthographic projection of the corresponding photosensitive device 104 on the substrate 101, and there is a gap between the noise reduction section 105' and the anode 1021 of the light-emitting device 102. Optionally, when both the noise reduction section 105' and the bias line 112 are disposed on the same layer as the anode 1021, the noise reduction section 105' and the bias line 112 can be as follows: Figure 15 The integrated structure shown.

[0104] In some embodiments, in the display substrate provided in the present disclosure, such as Figure 3 , Figure 14 and Figure 16As shown, it may also include: a back film 114, a first buffer layer 115, a first gate insulating layer 116, a second gate insulating layer 117, an interlayer dielectric layer 118, a first insulating layer 119, a second planarization layer 120, a second insulating layer 121, a protective layer 122, a support layer 123, a second buffer layer 124, a third planarization layer 125, a fourth planarization layer 126, a first adhesive layer 127, a second adhesive layer 128, a substrate layer 129, and a driving transistor 130, etc.

[0105] In practical implementation, when a finger touches the substrate layer 129 of the display substrate, the light-emitting device 102 is controlled to light up the surface light source to emit light. The emitted light passes upward through the encapsulation layer 107, color resist CF, protective cover plate 106 and other film layers to reach the fingerprint interface, that is, the contact interface between the finger and the substrate layer 129. The light reflected and scattered back at this interface, through the protective cover plate 106, color resist CF, encapsulation layer 107 and other layers, reaches the photosensitive device 104, which receives it and converts it into an electrical signal. Because the signals reflected by the valleys and ridges are different, fingerprint recognition is performed and a fingerprint image is generated.

[0106] In some embodiments, the protective cover 106 can be an ultra-thin glass (UTG) cover. Since the UTG cover retains the properties of glass while also possessing good flexibility, it can fully meet the needs of foldable products. Specifically, ultra-thin glass (UTG) refers to a glass layer with a thickness on the order of tens of micrometers or less, which is bendable and foldable. Compared to polymer plastic films, ultra-thin glass can effectively prevent screen damage while providing better optical clarity; at the same time, ultra-thin glass is less prone to creases, has good reliability, and does not decompose naturally like plastic, resulting in a long lifespan, thus providing more stable and reliable protection for the display screen. The encapsulation layer 107 may include a first inorganic encapsulation layer 1071, an organic encapsulation layer 1072, and a second inorganic encapsulation layer 1073 stacked together. The transistor 109 and the driving transistor 130 can be top-gate transistors, bottom-gate transistors, or dual-gate transistors, without limitation. Furthermore, the active layer material of the transistor 109 and the driving transistor 130 can be low-temperature polycrystalline silicon, amorphous silicon, oxides, etc., without limitation.

[0107] Based on the same inventive concept, this disclosure also provides a display device, including the display substrate described in the embodiments of this disclosure, which can be an OLED display substrate. Since the principle by which this display device solves the problem is similar to that of the display substrate described above, the implementation of this display device can refer to the embodiments of the display substrate described above, and repeated details will not be elaborated upon. Other essential components of the display substrate are those that should be understood by those skilled in the art, and will not be described in detail here, nor should they be construed as limiting this disclosure.

[0108] In some embodiments, the display device provided in this disclosure can be any product or component with display functionality, such as a mobile phone, tablet computer, television, monitor, laptop computer, digital photo frame, navigator, smartwatch, fitness wristband, or personal digital assistant. The display device provided in this disclosure may also include, but is not limited to, components such as a radio frequency unit, network module, audio output unit, input unit, sensor, display unit, user input unit, interface unit, memory, processor, and power supply. Those skilled in the art will understand that the composition of the above-described display device does not constitute a limitation on the display device; the display device may include more or fewer of the above-described components, or combine certain components, or have different component arrangements.

[0109] Obviously, those skilled in the art can make various modifications and variations to this disclosure without departing from its spirit and scope. Therefore, if such modifications and variations fall within the scope of the claims of this disclosure and their equivalents, this disclosure is also intended to include such modifications and variations.

Claims

1. A display substrate, wherein, include: Substrate; Multiple light-emitting devices are arranged in an array on the substrate. A black matrix is ​​located on the side of the layer containing the plurality of light-emitting devices away from the substrate. The orthographic projection of the black matrix on the substrate does not overlap with the orthographic projection of the plurality of light-emitting devices on the substrate. The black matrix includes a plurality of first openings, and the orthographic projection of the plurality of first openings on the substrate is located within the orthographic projection of at least a portion of the gap between each of the light-emitting devices on the substrate. Multiple photosensitive devices are located between the layer containing the multiple light-emitting devices and the substrate. The orthographic projection of the multiple photosensitive devices on the substrate is located within the orthographic projection of at least a portion of the gaps between the light-emitting devices on the substrate, and the orthographic projection of the multiple first openings on the substrate is located within the orthographic projection of the multiple photosensitive devices on the substrate. A noise reduction layer is located between the layer containing the plurality of photosensitive devices and the light-emitting surface of the plurality of light-emitting devices. The orthographic projection of the noise reduction layer on the substrate overlaps with the orthographic projection of the plurality of photosensitive devices on the substrate. The noise reduction layer includes a plurality of second openings, and the orthographic projection of the plurality of second openings on the substrate is located within the orthographic projection of the plurality of photosensitive devices on the substrate. The photosensitive device, the first opening, and the second opening satisfy the following relationship: d = X * D1, D2 = K * D1, d = D1 - (D1 + D2) * h1 / (h1 + h2 + h); where, d is the diameter of the second opening, D1 is the side length of the orthographic projection of the photoelectric conversion layer contained in the photosensitive device on the substrate, D2 is the diameter of the first opening, h1 is the distance between the surface of the photosensitive device away from the substrate and the surface of the noise reduction layer facing the substrate, h2 is the distance between the surface of the noise reduction layer away from the substrate and the surface of the black matrix facing the substrate, h is the thickness of the noise reduction layer in the direction perpendicular to the substrate, X is greater than 0 and less than or equal to 0.6, and K is greater than 0.7 and less than or equal to 1.

2. The display substrate as claimed in claim 1, wherein, The orthographic projection of the plurality of photosensitive devices on the substrate lies within at least a portion of the spacing between the light-emitting devices on the substrate.

3. The display substrate as described in claim 2, wherein, The plurality of light-emitting devices include a plurality of first light-emitting devices, a plurality of second light-emitting devices, and a plurality of third light-emitting devices, wherein the light-emitting colors of the first light-emitting devices, the light-emitting colors of the second light-emitting devices, and the light-emitting colors of the third light-emitting devices are different; The first light-emitting device, the second light-emitting device, and the third light-emitting device are arranged cyclically in the row direction. In two adjacent rows, two adjacent light-emitting devices of the same color are spaced apart by (n-1) light-emitting devices in the column direction, where n is the total number of light-emitting colors. The orthogonal projections of the plurality of photosensitive devices on the substrate are located within the orthogonal projections of all the column gaps on both sides of each of the second light-emitting devices on the substrate.

4. The display substrate as described in claim 3, wherein, The bottom electrode of the photosensitive device includes an integrally formed first portion and a second portion; The first portion and the second portion extend along the column direction, respectively; The width of the first portion in the row direction is greater than the width of the second portion in the row direction, and the side of the first portion away from the second light-emitting device and the side of the second portion away from the second light-emitting device are on the same straight line.

5. The display substrate as claimed in claim 4, wherein, At the column gap between the second light-emitting device and the first light-emitting device, the bottom electrode of the photosensitive device further includes a third portion, which is integrally disposed with the end of the second portion away from the first portion, and the third portion extends along the row direction.

6. The display substrate as claimed in claim 5, wherein, Also includes: Multiple transistors, wherein the multiple transistors are located between the layer containing the multiple photosensitive devices and the substrate; The first terminal of each transistor is electrically connected to the third portion at the gap between the second light-emitting device and the first light-emitting device column, and to the second portion at the gap between the second light-emitting device and the third light-emitting device column.

7. The display substrate as claimed in claim 6, wherein, The shape of the orthographic projection of the first electrode of the transistor onto the substrate includes: a first octagon, a second octagon, and a rectangle connecting the first octagon and the second octagon; wherein the first octagon is electrically connected to the bottom electrode of the photosensitive device, and the second octagon is electrically connected to the active layer of the transistor.

8. The display substrate as claimed in claim 6 or 7, wherein, The plurality of transistors are arranged in an array on the substrate, with the active layers of the transistors in the same row located on the same straight line and the active layers of the transistors in the same column arranged in parallel.

9. The display substrate according to any one of claims 3 to 8, wherein, The first light-emitting device emits blue light, the second light-emitting device emits green light, and the third light-emitting device emits red light.

10. The display substrate according to any one of claims 1 to 9, wherein, It also includes multiple bias lines, which are disposed in the same layer as the anode of the light-emitting device, and there is a gap between the bias lines and the anode of the light-emitting device.

11. The display substrate as claimed in claim 10, wherein, The orthogonal projection of the multiple bias lines on the substrate is located at the row gap of each of the light-emitting devices, and one of the bias lines is electrically connected to the top electrode of the photosensitive device in the same row.

12. The display substrate as claimed in claim 11, wherein, The bias line is a wavy line.

13. The display substrate according to any one of claims 1 to 12, wherein, It also includes a pixel delimiting layer, which is located between the anode layer of the light-emitting device and the light-emitting functional layer of the light-emitting device, and the pixel delimiting layer is reused as the noise reduction layer.

14. The display substrate according to any one of claims 1 to 12, wherein, It also includes a planarization layer, which is located between the layer containing the light-emitting device and the layer containing the photosensitive device, and the planarization layer is reused as the noise reduction layer.

15. The display substrate according to any one of claims 1 to 12, wherein, The noise reduction layer is disposed in the same layer as the anode of the light-emitting device; The noise reduction layer includes a plurality of noise reduction sections, each noise reduction section being disposed corresponding to one of the photosensitive devices, and each noise reduction section having a second opening; The orthographic projection of the noise reduction part on the substrate is greater than the orthographic projection of the corresponding photosensitive device on the substrate, and there is a gap between the noise reduction part and the anode of the light-emitting device.

16. The display substrate according to any one of claims 1 to 15, wherein, The photosensitive device, the first opening, and the second opening are arranged in a one-to-one correspondence.

17. The display substrate as claimed in claim 16, wherein, The orthographic projection of the center of the photosensitive device on the substrate, the orthographic projection of the center of the first opening on the substrate, and the orthographic projection of the center of the second opening on the substrate approximately coincide.

18. The display substrate according to any one of claims 1 to 17, wherein, The orthographic projection of the photoelectric conversion layer of the photosensitive device on the substrate, the orthographic projection of the first opening on the substrate, and the orthographic projection of the second opening on the substrate are all rectangular.

19. The display substrate as claimed in claim 18, wherein, D1 is greater than or equal to 8 μm and less than or equal to 20 μm, h1 is greater than or equal to 2 μm and less than or equal to 6 μm, h2 is greater than or equal to 10 μm and less than or equal to 20 μm, and h is greater than or equal to 1 μm and less than or equal to 2 μm.

20. A display device, wherein, Includes the display substrate as described in any one of claims 1 to 19.

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