A method for measuring the concentration of slurry in a tailings thickener

Abstract

A method for measuring slurry concentration in a tailings thickening device includes the following steps: obtaining the pressure values ​​at each monitoring point, which are equidistantly located at different heights within the tailings thickening device; calculating the slurry density at each monitoring point; calculating the slurry concentration at each monitoring point; constructing a distribution model of the slurry concentration within the tailings thickening device using nonlinear regression based on the slurry concentration and distance from the liquid surface at each monitoring point; and substituting the distance from the liquid surface at the point to be measured into the distribution model to obtain the slurry concentration at the point to be measured. Compared with existing technologies, this invention offers a simple and rapid measurement method that avoids direct contact with the slurry, preventing interference from the slurry to the monitoring instrument and ensuring the reliability of the monitoring data. It is highly operable, requiring only a pressure sensor to complete the monitoring without adding other auxiliary equipment, thus reducing the complexity of the monitoring system. It is also highly timely and can measure the slurry concentration at any height, providing a basis for subsequent fine-tuning of the slurry concentration.

Description

Technical Field

[0001] This invention relates to the field of slurry concentration measurement, and more specifically to a method for measuring slurry concentration in a tailings thickening device. Background Technology

[0002] Mine tailings are thickened using deep cone thickeners and vertical sand bins to increase slurry concentration, meeting the technical requirements for surface tailings storage and underground goaf filling. During the operation of the tailings thickener, slurry concentration is a critical technical parameter, directly affecting key production indicators such as rake torque and underflow concentration. Due to the complexity of the internal flow field of the tailings thickener, accurate slurry concentration is difficult to obtain. Currently, the main methods for measuring slurry concentration in tailings thickeners are ultrasonic measurement and plumb bob measurement. However, ultrasonic probes are easily affected by slurry adhesion, leading to inaccurate results. Plumb bob measuring instruments are prone to interference with the internal structure of the tailings thickener, making inspection very inconvenient. Furthermore, both ultrasonic and plumb bob methods can only measure the slurry concentration at a certain height in a single measurement, failing to provide more precise measurements. Summary of the Invention

[0003] The purpose of this invention is to overcome the shortcomings of the prior art and provide a more convenient, accurate, and precise method for measuring the slurry concentration in a tailings thickening device.

[0004] To achieve the above objectives, this application adopts the following technical solution.

[0005] A method for measuring slurry concentration in a tailings thickening device, comprising the following steps:

[0006] S1. Obtain the pressure value of each monitoring point. Each monitoring point is located at different heights within the tailings thickening device at equal intervals.

[0007] S2. Calculate the slurry density ρ at each monitoring point using the following formula. n :

[0008] ρ n =(p n -p n-1 ) / gh;

[0009] In the formula, p n , where n is the pressure value at the monitoring point, g is the gravitational acceleration, and h is the distance between adjacent monitoring points;

[0010] S3. Calculate the slurry concentration C at each monitoring point using the following formula. n :

[0011]

[0012] In the formula, ρ t ρ is the density of tailings. w Density of mineral processing wastewater;

[0013] S4. Based on the slurry concentration and distance from the liquid surface at each monitoring point, a distribution model of slurry concentration within the tailings thickening device is constructed using nonlinear regression:

[0014]

[0015] In the formula, a0, a1, and a2 are the correlation coefficients of the distribution model, l n The distance from the monitoring point to the liquid surface is denoted by e, which is the natural index.

[0016] S5. Substitute the distance of the test point from the liquid surface into the above distribution model to obtain the slurry concentration C at the test point.

[0017] Preferably, each monitoring point is located on the inner wall of the tailings thickening device.

[0018] This application has at least the following technical effects or advantages:

[0019] 1. The measurement method of the present invention is simple and quick, does not come into direct contact with the slurry, avoids interference from the slurry with the monitoring instrument, and ensures the reliability of the monitoring data.

[0020] 2. The present invention is highly operable, requiring only a pressure sensor to complete the monitoring without adding other auxiliary equipment, thus reducing the complexity of the monitoring system.

[0021] 3. The present invention has strong timeliness, converting the pressure information of the slurry into concentration data in real time, and can measure the slurry concentration at any height, providing a basis for subsequent fine control of slurry concentration. Attached Figure Description

[0022] Figure 1 This is a schematic flowchart of a method for measuring slurry concentration in a tailings thickening device according to an embodiment of this application.

[0023] Figure 2 This is a schematic diagram showing the layout of each monitoring point in a tailings thickening device according to an embodiment of this application.

[0024] Figure 3 This is a diagram showing the slurry concentration distribution in one embodiment of this application;

[0025] Figure 4 This is a diagram showing the slurry concentration distribution in one embodiment of this application. Detailed Implementation

[0026] To better understand the above technical solutions, the following will provide a detailed explanation of the technical solutions in conjunction with the accompanying drawings and specific implementation methods.

[0027] Example 1

[0028] In this embodiment, the sidewall height of a deep cone thickener in a certain mine is 10m, and the tailings density is 2780kg / m³. 3 The density of the mineral processing wastewater is 1100 kg / m³ 3 .

[0029] like Figures 1-3 As shown, a method for measuring slurry concentration in a tailings thickening device includes the following steps:

[0030] S1. Obtain the pressure value of each monitoring point. Each monitoring point is located at different heights within the tailings thickening device at equal intervals.

[0031] Specifically, 10 monitoring points (M1, M2, M3, M4, M5, M6, M7, M8, M9, M10) were arranged from top to bottom on the side wall of the tailings thickening unit, with a spacing h of 1m between adjacent monitoring points. Pressure data were collected at each monitoring point: 10.78 kPa, 21.57 kPa, 32.42 kPa, 43.69 kPa, 57.14 kPa, 74.32 kPa, 92.91 kPa, 111.73 kPa, 130.58 kPa, and 149.45 kPa. The distances from each monitoring point to the liquid surface were also collected: 1m, 2m, 3m, 4m, 5m, 6m, 7m, 8m, 9m, and 10m.

[0032] S2. Calculate the slurry density ρ at each monitoring point using the following formula. n :

[0033] ρ n =(p n -p n-1 ) / gh;

[0034] In the formula, p n , where n is the pressure value at the monitoring point, g is the gravitational acceleration, and h is the distance between adjacent monitoring points;

[0035] The slurry density ρ at each monitoring point was calculated. n 1100kg / m 3 1101kg / m 3 1107kg / m 3 1150kg / m 3 1372kg / m 3 1753kg / m 3 1897kg / m 3 1920kg / m3 1924kg / m 3 1925kg / m 3 .

[0036] S3. Calculate the slurry concentration C at each monitoring point using the following formula. n :

[0037]

[0038] In the formula, ρ t ρ is the density of tailings. w Density of mineral processing wastewater;

[0039] The slurry concentration C at each monitoring point was calculated. n The percentages were 0.03%, 0.15%, 0.99%, 7.25%, 32.85%, 61.65%, 69.51%, 70.67%, 70.88%, and 70.93%, respectively.

[0040] S4. Based on the slurry concentration and distance from the liquid surface at each monitoring point, a distribution model of slurry concentration within the tailings thickening device is constructed using nonlinear regression:

[0041]

[0042] In the formula, a0, a1, and a2 are the correlation coefficients of the distribution model, l n The distance from the monitoring point to the liquid surface is denoted by e, which is the natural index.

[0043] Specifically, the distribution model constructed based on the data results is as follows:

[0044] That is, a0 = 2.363 × 10 -3 a1 = 3.3 × 10 -5 a2 = -2.03.

[0045] S5. Substitute the distance of the test point from the liquid surface into the above distribution model to obtain the slurry concentration C at the test point.

[0046] Based on the above distribution model, a graph showing the relationship between distance from the liquid surface and slurry concentration can be drawn, such as... Figure 3 As shown in the figure, the slurry concentration is 32.85% at a distance of 5m from the liquid surface, which is similar to the calculated value of 32.93% from the slurry concentration distribution model. Finally, by substituting the distance of the test point from the liquid surface into the above distribution model, the slurry concentration C at the test point can be obtained.

[0047] Example 2

[0048] In this embodiment, the sidewall height of a vertical sand silo in a certain mine is 8.8m, and the tailings density is 3010kg / m³.3 The density of the mineral processing wastewater is 1050 kg / m³ 3 .

[0049] like Figure 1 , 2 and Figure 4 As shown, a method for measuring slurry concentration in a tailings thickening device includes the following steps:

[0050] S1. Obtain the pressure value of each monitoring point. Each monitoring point is located at different heights within the tailings thickening device at equal intervals.

[0051] Specifically, 11 monitoring points (N1, N2, N3, N4, N5, N6, N7, N8, N9, N10, N11) were arranged from top to bottom on the side wall of the tailings thickening unit, with a spacing h of 0.8m between adjacent monitoring points. Pressure data were collected at each monitoring point: 8.62 kPa, 17.26 kPa, 25.95 kPa, 34.97 kPa, 45.42 kPa, 58.53 kPa, 73.01 kPa, 87.81 kPa, 102.66 kPa, 117.52 kPa, and 132.38 kPa. The distances from each monitoring point to the liquid surface were collected: 0.8m, 1.6m, 2.4m, 3.2m, 4.0m, 4.8m, 5.6m, 6.4m, 7.2m, 8.0m, and 8.8m.

[0052] S2. Calculate the slurry density ρ at each monitoring point using the following formula. n :

[0053] ρ n =(p n -p n-1 ) / gh;

[0054] In the formula, p n , where n is the pressure value at the monitoring point, g is the gravitational acceleration, and h is the distance between adjacent monitoring points;

[0055] The slurry density ρ at each monitoring point was calculated. n 1100kg / m 3 1101kg / m 3 1108kg / m 3 1150kg / m 3 1333kg / m 3 1671kg / m 3 1847kg / m 3 1887kg / m 3 1894kg / m 3 1895kg / m 3 1895kg / m 3.

[0056] S3. Calculate the slurry concentration C at each monitoring point using the following formula. n :

[0057]

[0058] In the formula, ρ t ρ is the density of tailings. w Density of mineral processing wastewater;

[0059] The slurry concentration C at each monitoring point was calculated. n The percentages were 2.15%, 2.33%, 3.71%, 8.45%, 25.66%, 55.32%, 60.32%, 63.43%, 65.12%, 65.34%, and 65.66%, respectively.

[0060] S4. Based on the slurry concentration and distance from the liquid surface at each monitoring point, a distribution model of slurry concentration within the tailings thickening device is constructed using nonlinear regression:

[0061]

[0062] In the formula, a0, a1, and a2 are the correlation coefficients of the distribution model, l n The distance from the monitoring point to the liquid surface is denoted by e, which is the natural index.

[0063] Specifically, the distribution model constructed based on the data results is as follows:

[0064] That is, a0 = 5.363 × 10 -3 a1 = 8.32 × 10 -5 a2 = -2.265.

[0065] S5. Substitute the distance of the test point from the liquid surface into the above distribution model to obtain the slurry concentration C at the test point.

[0066] Based on the above distribution model, a graph showing the relationship between distance from the liquid surface and slurry concentration can be drawn, such as... Figure 3 As shown in the figure, the slurry concentration is 63.43% at a distance of 6.4m from the liquid surface, which is similar to the calculated value of 64.07% from the slurry concentration distribution model. Finally, by substituting the distance of the test point from the liquid surface into the above distribution model, the slurry concentration C at the test point can be obtained.

[0067] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, and not to limit them; although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some of the technical features; and these modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the spirit and scope of the technical solutions of the embodiments of the present invention.

Claims

1. A method for measuring slurry concentration in a tailings thickening device, comprising the following steps: S1. Obtain the pressure value of each monitoring point. Each monitoring point is located at different heights within the tailings thickening device at equal intervals. S2. Calculate the slurry density ρ at each monitoring point using the following formula. n : Pn = (pn - Pn-1) / gh; In the formula, p n , where n is the pressure value at the monitoring point, g is the gravitational acceleration, and h is the distance between adjacent monitoring points; S3. Calculate the slurry concentration C at each monitoring point using the following formula. n : In the formula, ρ t ρ is the density of tailings. w Density of mineral processing wastewater; S4. Based on the slurry concentration C at each monitoring point n and distance from the liquid surface l n A distribution model of slurry concentration within a tailings thickening unit was constructed using nonlinear regression: In the formula, a0, a1, and a2 are the correlation coefficients of the distribution model, l n The distance from the monitoring point to the liquid surface is denoted by e, which is the natural index. S5. Substitute the distance of the test point from the liquid surface into the above distribution model to obtain the slurry concentration C at the test point.

2. The method for measuring slurry concentration in a tailings thickening device according to claim 1, characterized in that: Each monitoring point is located on the inner wall of the tailings thickening device.

Images